A gas valve

Abstract

The present invention provides a gas valve, comprising a valve body, and also comprising a proportional adjustment device, a matching portion, and a sealing member. The proportional adjustment device comprises a magnetic conductor and a diaphragm assembly. The magnetic conductor comprises a lower magnetic conductor, and the matching portion comprises a main body portion and an extension portion. The extension portion protrudes downward relative to the main body portion. The sealing member is clamped between the lower magnetic conductor and the main body portion. The lower end surface of the main body portion abuts against the valve body, and the lower end portion of the extension portion abuts against the diaphragm assembly. A flow gap is formed between at least part of the outer peripheral wall of the extension portion and the inner peripheral wall portion of the valve body. The extension portion is provided with a channel, and the gas valve is provided with a accommodating cavity. The gas in the accommodating cavity can flow out through the channel and the flow gap.

Description

Technical Field

[0001] The present invention relates to the technical field of gas control, and in particular to a gas valve. Background Art

[0002] Gas valves are widely used in gas systems. The gas valve includes a valve body, which is provided with a gas flow channel and a proportional control valve port. The gas valve also includes a pressure regulating device, which includes a diaphragm assembly. The diaphragm assembly can approach or move away from the proportional control valve port to act on the gas flow channel, so as to act on the cache back pressure chamber to affect the gas flow of the main valve port. As a technical person in this field, it is necessary to consider that in the event that the diaphragm assembly is damaged, it is necessary to ensure that the gas in the chamber where the diaphragm assembly is located can be discharged to the outside as much as possible, so as to relatively ensure the safety of product use. Summary of the invention

[0003] The main purpose of the present application is to provide a gas valve, in which, when the diaphragm assembly is damaged, the gas in the chamber can be discharged to the outside, thereby relatively ensuring the safety of product use.

[0004] The present application provides a gas valve, comprising a valve body, and also comprising a proportional adjustment device, a matching portion, and a sealing member, wherein the proportional adjustment device comprises a magnetic conductor and a diaphragm assembly, the magnetic conductor comprises a lower magnetic conductor, the matching portion comprises a main body portion and an extension portion, the extension portion protrudes downward relative to the main body portion, the sealing member is clamped between the lower magnetic conductor and the main body portion, the lower end surface of the main body portion abuts against the valve body, the lower end portion of the extension portion abuts against the diaphragm assembly, a flow gap is formed between at least part of the outer peripheral wall of the extension portion and the inner peripheral wall portion of the valve body, the extension portion is provided with a channel, and the gas valve is provided with a accommodating cavity, and the gas in the accommodating cavity can flow out through the channel and the flow gap.

[0005] By adding a matching part, the present invention enables the gas in the chamber to be discharged to the outside when the diaphragm assembly is damaged, thereby relatively ensuring the safety of product use. BRIEF DESCRIPTION OF THE DRAWINGS

[0006] Figure 1 A cross-sectional view of the overall structure of the gas valve provided for this application;

[0007] Figure 2 for Figure 1 An enlarged schematic diagram of the structure of the matching portion;

[0008] It should be noted that this application mainly focuses on the protection of the matching part structure and the matching relationship between the matching part and other parts. As for the internal structure of other proportional adjustment devices such as the dynamic and static iron cores, coil components, and magnetic conductor structures, adaptive improvements can be made according to the needs of customers or gas systems.

[0009] The first embodiment of the present invention is described in detail below in conjunction with the accompanying drawings. Figure 1 As shown, the present invention provides a gas valve, including a valve body, the valve body is provided with an inlet 1a and an outlet 1b, the valve body 1 is also provided with a first valve port 11, a second valve port 12, a third valve port, i.e., a proportional regulating valve port 103, a main valve port 104, and a gas flow channel 105, the valve body of the gas valve can be formed by aluminum alloy die casting, the gas valve also includes a safety electromagnetic drive device 100, a proportional regulating device 200 and a pressure difference regulating device 300, the safety electromagnetic drive device 100 includes a main valve plug and an auxiliary valve plug, the main valve plug can approach or move away from the first valve port 11, the auxiliary valve plug can approach or move away from the auxiliary valve plug 12, the safety electromagnetic drive device 100 is fixedly connected to the valve body 1 as a whole, and the safety electromagnetic drive device 100 is used as a safety control device of the gas valve to ensure the safety of gas use When the first valve port 101 cannot be closed smoothly, the auxiliary valve plug can still close the second valve port 12. The proportional adjustment device 200 includes a diaphragm assembly, which can be close to or away from the third valve port 103. When the diaphragm assembly is relatively close to the third valve port 103, the gas pressure acting on the gas flow channel 105 increases, thereby acting on the buffer back pressure cavity 1A of the differential pressure adjustment device 300, so that the gas flow rate flowing through the main valve port is relatively large; or when the diaphragm assembly is relatively far away from the third valve port 103, the gas pressure acting on the gas flow channel 105 is relatively reduced, thereby reducing the pressure acting on the buffer back pressure cavity 1A of the differential pressure adjustment device 300, and the back pressure diaphragm assembly 302 descends, so that the gas flow rate flowing through the main valve port 104 is relatively small, thereby realizing the regulation of the gas flow rate.

[0010] Refer to the following Figure 1 Combination Figure 2 The matching structure of the gas valve provided in the present application and the matching connection relationship between the matching part and other components are described in detail. Figure 1The ratio adjustment device 200 shown in the figure also includes a magnetic conductive component 201, which includes an upper magnetic conductive body 201, a lower magnetic conductive body 202 and a transition connection portion. The upper magnetic conductive body 201 is connected to the lower magnetic conductive body 202 through the transition connection portion. The gas valve also includes a matching portion 40, which is roughly an inverted L-mounted structure. The matching portion 40 can be formed by metal material, including a main body portion 41 and an extension portion 42. The extension portion 42 protrudes downward relative to the main body portion 41 of the plate-like structure. The main body portion 41 is provided with a receiving groove 412. The gas valve also includes a sealing member 50, and a portion of the sealing member 50 is located in the receiving groove 41. 2, the sealing member 50 is clamped between the main body and the lower magnetic conductor, and one side of the sealing member 50 abuts against the lower magnetic conductor 202, and the other side of the sealing member 50 abuts against the bottom wall of the receiving groove 412. The gas valve is provided with a receiving cavity A1, the matching portion 40, the lower magnetic conductor 202 and the diaphragm assembly 202 roughly define an upper cavity A11 of the receiving cavity A1, and the diaphragm assembly 202 and a part of the valve body 1 roughly define a lower cavity A12 of the receiving cavity A1. By providing the sealing member 50, the gas in the receiving cavity A1 will not leak outward from the sealing portion where the sealing member 50 is located when the diaphragm assembly 202 is damaged, thereby ensuring the gas in the receiving cavity A1. The overall safety performance of the gas valve product is improved. The upper end surface of the part of the main body 41 can be against the lower end surface of the lower magnetic conductor 202, and the lower end surface 411 of the main body 41 is against the end surface of the valve body 1. The main body 41 is generally horizontal in structure. The main body 41 extends generally in the radial direction toward the axial direction away from the proportional adjustment device 200. The extension 42 extends and protrudes generally downward along the axial direction of the proportional adjustment device 200. A flow gap is formed between the outer peripheral wall of at least part of the extension 42 and the inner peripheral wall of the valve body 1. The extension 42 includes a large diameter portion 421 and a small diameter portion 422. The large diameter portion 421 is relatively close to the small diameter portion 422. 22 is closer to the lower magnetic conductor 202, the lower end 423 of the small diameter part 422 is against the diaphragm assembly 202, the outer diameter of the large diameter part 421 is larger than the outer diameter of the small diameter part 422, and the outer peripheral wall of the large diameter part 421 can be matched with the inner peripheral wall of the valve body 1 with a small gap, that is, a first flow gap S2 for gas to flow outward is formed between the outer peripheral wall of the large diameter part 421 and the inner peripheral wall of the valve body 1, and a second flow gap S1 for gas to flow outward is formed between the outer peripheral wall of the small diameter part 422 and the inner peripheral wall of the valve body 1, and S1>S2 is set, and a hole 4221 for gas to flow is also opened on the small diameter part 422. It should be noted that the outer peripheral wall of the large diameter part 421 can also be matched with the inner peripheral wall of the valve body 1 with a small interference fit, and it is only necessary to ensure that the gas can flow out through the hole 4221 through the flow gap S1, and the technical effect of the present invention can also be achieved.

[0011] Through the above arrangement, in general, the gas is filled in the lower chamber A12. When the diaphragm assembly 202 of the proportional adjustment device is damaged, the gas in the lower chamber A12 will continue to flow to the upper chamber A11 through the damaged position. If the sealing performance of the proportional adjustment device 200 and the valve body 1 is good, and there is no time to release the pressure in time, the gas pressure in the accommodating chamber A1 will continue to increase, eventually affecting the normal operation of the product. When the sealing performance of the proportional adjustment device 200 and the valve body 1 is poor, the gas in the accommodating chamber A1 will flow outward through the larger gap between the lower magnetic conductor 202 and the valve body 1. It is easy to exceed the normal gas leakage standard range allowed by the gas valve, and there is also a great safety hazard. The present application optimizes the structure by adding a matching part 40. Even if the diaphragm assembly 202 is damaged, the gas can flow out through the upper chamber A11 through the channel 4221, and then through the larger flow gap S1 through the smaller flow gap S2 and finally flow out. That is, the gas pressure in the accommodating chamber A1 can be released in time, and the leakage of the gas can be controlled through the small holes provided, so that its leakage has a throttling buffer process, thereby relatively ensuring the safety of the gas valve.

[0012] Preferably, the aperture of the hole 4221 can be set to 0.3-0.7. When the hole 4221 is set too small, the gas in the accommodating chamber may not be able to release pressure in time. When the hole 4221 is set too large, the hole cannot play a throttling role.

[0013] The present application provides a gas valve, including a valve body, a proportional adjustment device, a matching part, and a sealing member. The proportional adjustment device includes a magnetic conductor and a diaphragm assembly. The magnetic conductor includes a lower magnetic conductor. The matching part includes a main body and an extension part. The extension part protrudes downward relative to the main body part. The sealing member is clamped between the lower magnetic conductor and the main body part. The lower end surface of the main body part abuts against the valve body, and the lower end portion of the extension part abuts against the diaphragm assembly. A flow gap is formed between the outer peripheral wall of at least part of the extension part and the inner peripheral wall of the valve body. The extension part is provided with a channel, and the gas valve is provided with a accommodating cavity. The gas in the accommodating cavity can flow out through the channel through the flow gap.

[0014] It should be noted that the directional words such as "upper" and "lower" mentioned in the present invention are all described based on the drawings in the specification. They are only used to distinguish the naming methods of different components and should not be considered to have any restrictions on the order of the components. The above are only preferred embodiments of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the present invention. These improvements and modifications should also be regarded as the scope of protection of the present invention.

Claims

1. A gas valve, characterized in that: It includes a valve body, a proportional adjustment device, a matching part, and a sealing member. The proportional adjustment device includes a magnetic conductor and a diaphragm assembly. The magnetic conductor includes a lower magnetic conductor. The matching part includes a main body and an extension part. The extension part protrudes downward relative to the main body. The sealing member is clamped between the lower magnetic conductor and the main body. The lower end surface of the main body abuts against the valve body, and the lower end of the extension abuts against the diaphragm assembly. A flow gap is formed between at least part of the outer peripheral wall of the extension part and the inner peripheral wall of the valve body. The extension part is provided with a channel, and the gas valve is provided with a accommodating cavity. The gas in the accommodating cavity can flow out through the channel and the flow gap.

2. The gas valve according to claim 1, characterized in that: The extension portion includes a large diameter portion and a small diameter portion, the outer diameter of the large diameter portion is larger than the outer diameter of the small diameter portion, a first flow gap is formed between the outer peripheral wall portion of the large diameter portion and the inner peripheral wall portion of the valve body, and a second flow gap is formed between the outer peripheral wall portion of the small diameter portion and the inner peripheral wall portion of the valve body, and the second flow gap is larger than the first flow gap.

3. The gas valve according to claim 1, characterized in that: The main body is provided with a receiving groove, part of the sealing member is located in the receiving groove, one side of the sealing member abuts against the lower end surface of the lower magnetic conductor, and the other side of the sealing member abuts against the bottom wall of the receiving groove.

4. The gas valve according to claim 1, characterized in that: The accommodating chamber includes an upper accommodating chamber and a lower accommodating chamber, and the lower magnetic conductor, the extending portion and the diaphragm assembly define the upper accommodating chamber.

5. The gas valve according to claim 4, characterized in that: The diaphragm assembly and a portion of the valve body define the lower accommodating chamber.

6. The gas valve according to claim 1, characterized in that: The upper end surface of a portion of the main body portion abuts against the lower magnetic conductor.

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