Gas path monitoring and control method and device for inductively coupled plasma emission spectrometer

Abstract

The present invention discloses a gas path monitoring and control method and device of an inductively coupled plasma emission spectrometer, the device comprising: a CPU; a display connected to the CPU; a main gas path, with a gas supply device and an inductively coupled plasma emission spectrometer connected to both ends; a flow sensor, arranged on the main gas path and connected to the CPU, for collecting the gas flow rate in the main gas path; a gas valve, arranged on the main gas path and connected to the CPU, for controlling the gas flow rate in the main gas path; a motor, arranged on the gas valve and connected to the CPU, for driving the gas valve to close and open; a manual switch, connected to the CPU, for manually opening and closing the gas path monitoring and control device. The present invention solves the problem of gas waste, and can automatically intervene when an abnormality occurs in the gas path. It can also assist engineers in quickly troubleshooting and resolving abnormalities, reduce labor costs and instrument maintenance costs, and improve work efficiency.

Description

Technical Field

[0001] The present invention relates to the technical field of physical and chemical testing, and in particular to a gas path monitoring and control method and device of an inductively coupled plasma emission spectrometer. Background Art

[0002] Inductively Coupled Plasma Optical Emission Spectrometer (ICP-OES) is an instrument that uses high-frequency inductive coupling to generate a plasma discharge light source for atomic emission spectroscopy analysis. It can be used for qualitative and quantitative analysis of more than 70 metal elements and some non-metal elements in samples in geology, chemical industry, biology, medicine, metallurgy, agriculture, etc. It has excellent performance and is widely used.

[0003] ICP-OES usually uses 99.999% high-purity argon as the working gas, and also has the functions of cooling gas, carrier gas, and auxiliary gas. The gas supply rate is about 12-20L / min when working, and about 0.6-3L / min when on standby. Due to the design principle of the instrument itself, the gas path of ICP-OES is not completely closed, and argon still needs to be continuously supplied when on standby. The standby state is a necessary state before the instrument works, but long-term standby will easily cause abnormalities and waste argon.

[0004] The existing gas circuit control method mainly relies on manual work to judge abnormal conditions such as leakage and pressure loss based on the operating status of the equipment. For safety reasons, the gas supply device (compressed gas cylinder) and the gas-using equipment are often set up in different areas. When an abnormality occurs in the gas circuit, engineers need to go back and forth to check and debug, which has high labor costs. In addition, the manual method does not intervene in the gas circuit abnormality in real time, but is a post-investigation and adjustment, which has caused gas waste and does not meet the requirements of energy conservation and environmental protection. Summary of the invention

[0005] In view of the shortcomings of the prior art, the purpose of the present invention is to provide a method and device for monitoring and controlling the gas path of an inductively coupled plasma emission spectrometer. The present invention solves the problem of gas waste and can automatically intervene when an abnormality occurs in the gas path. It can also assist engineers in quickly troubleshooting and solving abnormalities, reduce labor costs and instrument maintenance costs, and improve work efficiency.

[0006] In order to solve the above technical problems, the present invention is implemented by the following technical solutions:

[0007] In one aspect, the present invention provides a gas path monitoring and control method for an inductively coupled plasma emission spectrometer, the gas path monitoring and control method comprising:

[0008] 1) After the system starts, enter various parameters on the display;

[0009] 2) Turn on the manual switch to connect the main gas path between the inductively coupled plasma emission spectrometer and the gas supply device;

[0010] 3) The flow sensor automatically samples and records the gas in the main gas path and feeds it back to the CPU;

[0011] 4) The CPU automatically calculates the gas flow rate and displays the flow rate-time dynamics in real time on the display;

[0012] 5) The CPU automatically counts and performs logical judgments, including the following:

[0013] 5.1) If the real-time gas flow rate is between the first threshold and the second threshold and the second threshold is greater than the first threshold, the CPU determines that it is in a normal state and executes step 3; otherwise, executes the next step;

[0014] 5.2) If the accumulated time of the real-time gas flow rate being greater than the second threshold value exceeds the first time parameter, the CPU determines that it is a gas leakage state and executes step 7; otherwise, executes the next step;

[0015] 5.3) If the accumulated time that the real-time gas flow rate is less than the first threshold value exceeds the second time parameter, the CPU determines that it is in standby state, executes step 7, and executes the next step; otherwise, executes step 5.1;

[0016] 5.4) If the accumulated time when the real-time flow rate is less than or equal to 0 L / min exceeds the third time parameter, the CPU determines that it is in the gas-off state, executes step 6, and executes the next step; otherwise, executes step 5.1;

[0017] 5.5) If the display has issued two yellow warnings, proceed to step 8; otherwise, proceed to step 5.1;

[0018] 6) The CPU controls the display to issue a yellow warning and executes step 3;

[0019] 7) The CPU drives the motor to close the air valve on the main air path and executes step 3;

[0020] 8) Output the result and the air supply device enters sleep mode.

[0021] Preferably, in step 5.1, the value range of the first threshold is 0.6-5 L / min, and the value range of the second threshold is 15-30 L / min.

[0022] Further preferably, the value of the first threshold is 3 L / min, and the value of the second threshold is 20 L / min.

[0023] Preferably, the first time parameter in step 5.2 is set to 10-30s.

[0024] It is further preferred that the second time parameter in step 5.3 needs to be greater than the first time parameter, which can be set to 300-800s.

[0025] It is further preferred that the third time parameter in step 5.4 needs to be greater than the second time parameter, which can be set to 600-1600s.

[0026] Still more preferably, the third parameter time needs to exceed the second parameter time by more than 300 seconds.

[0027] Further preferably, the first time parameter is set to 10s, the second time parameter is set to 600s, and the third time parameter is set to 1200s.

[0028] Preferably, after starting the gas flow monitoring, the actual amount of gas used can be integrated according to the gas flow rate and time. In the fourth step of the operation, a real-time dynamic graph with the ordinate as "flow rate" and the abscissa as "time" has been obtained. The integral of the flow rate on the time scale is the gas consumption (displayed as the area enclosed by the flow rate curve and the coordinate axis on the graph), which can be directly obtained on the computer.

[0029] On the other hand, the present invention provides a gas path monitoring and control device for an inductively coupled plasma emission spectrometer, the gas path monitoring and control device comprising:

[0030] CPU;

[0031] A display connected to the CPU;

[0032] The main gas circuit has two ends connected to the gas supply device and the inductively coupled plasma emission spectrometer respectively;

[0033] A flow sensor, arranged on the main gas path and connected to the CPU, for collecting the gas flow rate in the main gas path;

[0034] A gas valve, arranged on the main gas path and connected to the CPU, for controlling the gas flow rate in the main gas path;

[0035] a motor, disposed on the gas valve and connected to the CPU, for driving the gas valve to close and open; and

[0036] A manual switch is connected to the CPU and is used to manually open and close the gas path monitoring and control device.

[0037] Compared with the prior art, the present invention has the following advantages and beneficial effects:

[0038] The present invention solves the problem of gas waste simply and efficiently, is energy-saving and environmentally friendly, reduces labor costs and equipment maintenance costs, and can monitor and count gas usage in real time, which can help engineers quickly find and solve abnormal conditions. At the same time, the device has a simple structure, low manufacturing cost, and is easy to use. The comprehensive use cost of the inductively coupled plasma emission spectrometer will be greatly reduced.

[0039] The present invention can set corresponding parameters to effectively control abnormal conditions in the gas circuit while monitoring the gas flow. When the gas flow rate is too high, the gas valve can be closed immediately to avoid damage to the equipment. When the gas circuit is in a low flow rate state for a long time, the gas valve can be automatically adjusted to avoid waste of gas and energy, which is energy-saving and environmentally friendly. When the gas circuit is abnormal, the user can be reminded in time to improve the safety and reliability of the system. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] Figure 1 It is a structural schematic diagram of the gas path monitoring and control device of the present invention.

[0041] Figure 2 It is a control principle diagram of the gas path monitoring and control device of the present invention.

[0042] Figure numerals: 1. main gas circuit; 2. flow sensor; 3. gas valve; 4. motor; 5. CPU; 6. display; 7. manual switch. DETAILED DESCRIPTION

[0043] In order to enable those skilled in the art to better understand the technical solution of the present invention, the preferred implementation scheme of the present invention is described below in conjunction with specific embodiments. However, it should be understood that the drawings are only used for exemplary description and cannot be understood as a limitation on this patent. In order to better illustrate this embodiment, some parts of the drawings may be omitted, enlarged or reduced, and do not represent the size of the actual product. For those skilled in the art, it is understandable that some well-known structures and their descriptions in the drawings may be omitted. The positional relationship described in the drawings is only for exemplary description and cannot be understood as a limitation on this patent.

[0044] like Figure 1 As shown, the present invention provides a gas path monitoring and control device for an inductively coupled plasma emission spectrometer, the gas path monitoring and control device comprising:

[0045] CPU5 (central processing unit), with functions such as timing, calculation, and logical judgment;

[0046] Display 6, connected to the CPU 5, has input and output functions, can display time parameters and gas flow rate in real time, and can record and display abnormal conditions;

[0047] The main gas line 1, with two ends connected to a gas supply device (storing purified compressed argon) and an inductively coupled plasma optical emission spectrometer (ICP-OES);

[0048] A flow sensor 2, arranged on the main gas path 1 and connected to the CPU 5, for collecting the gas flow rate in the main gas path 1;

[0049] The gas valve 3 is provided on the main gas path 1 and connected to the CPU 5, and is used to control the gas flow rate in the main gas path 1;

[0050] A motor 4 is provided on the gas valve 3 and connected to the CPU 5, and is used to drive the gas valve 3 to close and open; and

[0051] The manual switch 7 is connected to the CPU 5 and is used to manually open and close the gas path monitoring and control device. The manual switch 7 is a physical entity switch and is the only way to open the device.

[0052] like Figure 2 As shown, CPU5 is connected with 4 structures: manual switch, drive motor, flow sensor and display. The manual switch is equivalent to the indicator light and safety button. When the manual switch is turned off, the device cannot operate normally. Only when the manual switch is turned on can the CPU drive motor to open or close the gas valve.

[0053] Based on the above device, the present invention provides a gas path monitoring and control method for an inductively coupled plasma emission spectrometer, the gas path monitoring and control method comprising:

[0054] 1) After the system is started, various parameters are entered on the display 6, namely, the first threshold value of gas flow rate: 0.6-5L / min, the second threshold value: 15-30L / min, the first time parameter: 10-30s, the second time parameter: 300-800s (the second time parameter must be greater than the first time parameter), the third time parameter: 600-1600s (the third time parameter must be greater than the second time parameter, and in actual operation, the third parameter time exceeds the second parameter time by more than 300s). (This method is explained and demonstrated by taking the commonly used parameters in practice as an example, that is, the first threshold value of flow rate is 3L / min, the second threshold value is 20L / min, the first time parameter is set to 10s, the second time parameter is set to 600s, and the third time parameter is set to 1200s);

[0055] 2) Turn on the manual switch 7 to connect the main gas path 1 between the inductively coupled plasma emission spectrometer and the gas supply device;

[0056] 3) The flow sensor 2 automatically samples and records the gas in the main gas path 1 and feeds back to the CPU;

[0057] 4) The CPU automatically calculates the gas flow rate and displays the "flow rate-time" dynamics in real time on the display 6;

[0058] 5) The CPU automatically counts and performs logical judgment (steps 5.1-5.5), which specifically include the following:

[0059] 5.1) If the real-time gas flow rate is between the first threshold and the second threshold (i.e., 3-20 L / min) and the second threshold is greater than the first threshold, the CPU determines that it is in a normal state and executes step 3; otherwise, executes the next step;

[0060] 5.2) If the accumulated time of the real-time flow rate being greater than the second flow rate threshold (i.e., 20 L / min) exceeds the first time parameter (i.e., 10 s), the CPU determines that it is a leak state and executes step 7; otherwise, executes the next step;

[0061] 5.3) If the accumulated time of the real-time flow rate being less than the first flow rate threshold (i.e., 3 L / min) exceeds the second time parameter (i.e., 600 s), the CPU determines that it is in standby mode, executes step 7, and executes the next step; otherwise, executes step 5.1;

[0062] 5.4) If the accumulated time when the real-time flow rate is less than or equal to 0 L / min exceeds the third time parameter (i.e., 1200 s), the CPU determines that the gas is cut off (the reason may be that the argon gas in the cylinder has been exhausted or the gas line has been closed), executes step 6, and executes the next step; otherwise, executes step 5.1;

[0063] 5.5) If the display 6 has issued two yellow warnings, go to step 8; otherwise go to step 5.1;

[0064] 6) The CPU controls the display 6 to issue a yellow warning and execute step 3;

[0065] 7) The CPU drives the motor 4 to close the gas valve 3 on the main gas circuit 1 (if it needs to enter the working state, open the manual switch 7), and execute step 3;

[0066] 8) Output the result and the air supply device enters sleep mode.

[0067] Among them, when the gas valve on the main gas line is closed, the manual switch is in the LOCK state, and the gas valve setting can only be changed by enabling the manual switch button.

[0068] The present invention sets the value range of the first threshold of the gas path monitoring and control method device of the inductively coupled plasma emission spectrometer to 0.6-5L / min, the value range of the second threshold to 15-30L / min, the first time parameter to 10-30s, and the second time parameter to 300-800s. After starting the flow monitoring, the argon flow rate can be observed in real time on the display screen, and the actual amount of argon gas can be integrated according to the time. When the cumulative time that the flow rate is greater than the upper limit of the flow rate exceeds the first time parameter, the CPU will judge it as a gas leak, and the gas valve 3 will be quickly closed (manual opening is required); when the cumulative time that the real-time flow rate is less than the lower limit of the flow rate exceeds the second time parameter, the CPU will judge it as the device standby, and the gas valve 3 will automatically close to avoid gas waste. If you need to enter the working state, just turn on the manual switch 7, which is very convenient to operate. When the cumulative time that the real-time flow rate is less than or equal to 0L / min exceeds the third time parameter, the CPU will judge it as a gas outage (the reason may be that the argon gas cylinder is exhausted or the gas path is closed), and the display 6 will issue a yellow warning and adjust the device to a sleep state.

[0069] After the introduction of this device, it is easy and quick to understand the usage data of argon gas, timely discover abnormal conditions in the gas circuit, and reduce the large consumption of argon gas when forgetting to manually close the gas cylinder or long-term standby. In addition, it can assist engineers to quickly investigate and solve abnormal conditions, reduce labor costs and instrument maintenance costs, and greatly improve work efficiency. Considering the simple structure, low manufacturing cost, and convenient use of this device, the overall cost of the system will be greatly reduced.

[0070] The above is only a preferred embodiment of the present invention, but the present invention is not limited to the above specific embodiments. Those skilled in the art may make some modifications, supplements or use similar methods instead without departing from the principle of the present invention, which should also be regarded as the protection scope of the present invention.

Claims

1. A gas path monitoring and control method for an inductively coupled plasma emission spectrometer, characterized in that: The gas path monitoring and control method comprises: After the system starts, enter various parameters on the display; Turn on the manual switch to connect the main gas path between the inductively coupled plasma emission spectrometer and the gas supply device; The flow sensor automatically samples and records the gas in the main gas path and feeds it back to the CPU; The CPU automatically calculates the gas flow rate and displays the flow rate-time dynamics in real time on the display; The CPU automatically times and performs logical judgments, including the following: 5.1) If the real-time gas flow rate is between the first threshold and the second threshold and the second threshold is greater than the first threshold, the CPU determines that it is in a normal state and executes step 3; otherwise, executes the next step; 5.2) If the accumulated time of the real-time gas flow rate being greater than the second threshold value exceeds the first time parameter, the CPU determines that it is a gas leakage state and executes step 7; otherwise, executes the next step; 5.3) If the accumulated time that the real-time gas flow rate is less than the first threshold value exceeds the second time parameter, the CPU determines that it is in standby state, executes step 7, and executes the next step; otherwise, executes step 5.1; 5.4) If the accumulated time when the real-time flow rate is less than or equal to 0 L / min exceeds the third time parameter, the CPU determines that it is in the gas-off state, executes step 6, and then executes the next step; otherwise, executes step 5.1; 5.5) If the display has issued two yellow warnings, proceed to step 8; otherwise, proceed to step 5.1; The CPU controls the display to issue a yellow warning and execute step 3; The CPU drives the motor to close the gas valve on the main gas line and executes step 3; Output the result, and the air supply device enters the sleep state; The value range of the first threshold in step 5.1 is 0.6-5 L / min, and the value range of the second threshold is 15-30 L / min; the second time parameter in step 5.3 needs to be greater than the first time parameter, which is set to 300-800s.

2. The gas path monitoring and control method of an inductively coupled plasma emission spectrometer according to claim 1, characterized in that: The value of the first threshold is 3 L / min, and the value of the second threshold is 20 L / min.

3. The gas path monitoring and control method of the inductively coupled plasma optical emission spectrometer according to claim 1, characterized in that: In step 5.2, the first time parameter is set to 10-30s.

4. The gas path monitoring and control method of the inductively coupled plasma optical emission spectrometer according to claim 1, characterized in that: The third time parameter in step 5.4 needs to be greater than the second time parameter, which is set to 600-1600s.

5. The gas path monitoring and control method of the inductively coupled plasma optical emission spectrometer according to claim 4, characterized in that: The third parameter time must exceed the second parameter time by more than 300s.

6. The gas path monitoring and control method of the inductively coupled plasma optical emission spectrometer according to claim 5, characterized in that: The first time parameter is set to 10s, the second time parameter is set to 600s, and the third time parameter is set to 1200s.

7. The gas path monitoring and control method of the inductively coupled plasma optical emission spectrometer according to claim 1, characterized in that: After starting the gas flow monitoring, the actual gas usage is calculated based on the gas flow rate and time integration.

8. A gas path monitoring and control device for an inductively coupled plasma emission spectrometer, used to execute the gas path monitoring and control method for an inductively coupled plasma emission spectrometer according to claim 1, characterized in that: The gas path monitoring and control device comprises: CPU; A display connected to the CPU; The main gas circuit has two ends connected to the gas supply device and the inductively coupled plasma emission spectrometer respectively; A flow sensor, arranged on the main gas path and connected to the CPU, for collecting the gas flow rate in the main gas path; A gas valve, arranged on the main gas path and connected to the CPU, for controlling the gas flow rate in the main gas path; a motor, disposed on the gas valve and connected to the CPU, for driving the gas valve to close and open; and A manual switch is connected to the CPU and is used to manually open and close the gas path monitoring and control device.

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