An integrated processing equipment

Abstract

The present application provides an integrated processing equipment, including a base, a rotating device and a flow guide device. The rotating device includes an inclination adjustment unit and a rotation unit. The inclination adjustment unit is arranged on the base, and the rotation unit is connected to the inclination adjustment unit. The rotation unit is used to carry the workpiece and can drive the workpiece to rotate around a first axis; the inclination adjustment unit is used to drive the rotation unit to rotate around a second axis having an angle with the first axis. The flow guide device includes a frame, a liquid storage part and a flow guide part. The frame is connected to the inclination adjustment unit. The liquid storage part and the flow guide part are both connected to the frame. The liquid storage part is used to transport liquid to the flow guide part, and the liquid can flow to the workpiece positioned on the rotation unit through the flow guide part. The inclination of the workpiece relative to the horizontal plane can be adjusted as needed, thereby adjusting the distance that the fluid reaches the workpiece surface and reducing the impact force; the rate at which the fluid flows on the workpiece surface can also be adjusted, thereby facilitating the control of processing quality and improving the yield rate of finished products.

Description

Technical Field

[0001] The present invention relates to the field of processing technology, and in particular to an integrated processing device. Background Art

[0002] The development process is an intermediate step in the photolithography process. Its purpose is to remove part of the photoresist on the wafer and form a three-dimensional physical pattern, so as to accurately copy the circuit structure on the mask to the photoresist layer of the silicon wafer. During the development process, the fluid and the photoresist in the exposed area will undergo an acid-base neutralization reaction. After development, the residues in the reaction must be removed by deionized water. The focus of development is to ensure that the feature size (the minimum line width of semiconductor devices in integrated circuit manufacturing) meets the requirements. If the feature size meets the requirements, it is considered that all geometric features generated during processing meet the requirements. There are three traditional development processes: immersion development, continuous spray development, and rotary immersion development. The existing continuous spray development is to spray the fluid onto the wafer in a mist form, while the wafer rotates at a speed of 100r / min to 500r / min.

[0003] The inventors have found that the existing developing equipment has the following disadvantages:

[0004] The scope of application is narrow and the cost is high. Summary of the invention

[0005] The object of the present invention is to provide an integrated processing equipment which can meet the processing requirements of workpieces of different sizes, has strong adaptability, a wide range of applications and low cost.

[0006] The embodiment of the present invention is achieved as follows:

[0007] The present invention provides an integrated processing device, comprising:

[0008] abutment;

[0009] A rotating device, the rotating device comprising an inclination adjustment unit and a rotation unit, the inclination adjustment unit being arranged on the base, the rotation unit being connected to the inclination adjustment unit, the rotation unit being used to carry a workpiece and drive the workpiece to rotate around a first axis; the inclination adjustment unit being used to drive the rotation unit to rotate around a second axis having an angle with the first axis;

[0010] And a flow guide device, the flow guide device includes a frame, a liquid storage member and a flow guide member, the frame is connected to the inclination adjustment unit, the liquid storage member and the flow guide member are both connected to the frame, the liquid storage member is used to transport liquid to the flow guide member, and the liquid can flow through the flow guide member to the workpiece positioned on the rotating unit.

[0011] In an optional embodiment, the inclination adjustment unit includes a first driver and a mounting platform, the first driver is connected to the base platform, the mounting platform is connected to the first driver, and the first driver is used to drive the mounting platform to rotate around the first axis;

[0012] The rotating unit and the frame are both connected to the mounting platform.

[0013] In an optional embodiment, the mounting table is provided with a liquid collecting trough and a drainage port connected to the liquid collecting trough; the base is provided with a liquid collecting cavity, and the drainage port is connected to the liquid collecting cavity; the rotating unit is arranged in the liquid collecting trough; the liquid collecting trough is used to collect liquid falling from the workpiece, and can enter the liquid collecting cavity from the drainage port.

[0014] In an optional embodiment, the rotating unit includes a second drive, a rotating disk and a positioning assembly, the second drive is connected to the mounting table, the rotating disk is connected to the second drive, the second drive is used to drive the rotating disk to rotate around the second axis; the positioning assembly is connected to the rotating disk, and the positioning assembly is used to position a workpiece located on the rotating disk.

[0015] In an optional embodiment, the positioning assembly includes a plurality of clamping blocks, each of which is connected to the rotating disk, and the plurality of clamping blocks jointly define a clamping area for clamping the workpiece, and at least one of the plurality of clamping blocks can move relative to the rotating disk to adjust the size of the clamping area.

[0016] In an optional embodiment, the guide member is provided with a liquid outlet side, and the guide member is movably connected to the frame for adjusting the distance between the liquid outlet side and the frame, thereby adjusting the distance between the liquid outlet side and a workpiece positioned on the rotating unit.

[0017] In an optional embodiment, the guide member is slidably connected to the frame in an extension direction of the second axis to adjust the distance between the liquid outlet side and the frame.

[0018] In an optional embodiment, the flow guide device also includes a locking unit, which is simultaneously connected to the flow guide member and the frame, and the locking unit has a locking state and an unlocking state that can be switched to each other. When in the locked state, the flow guide member and the frame are relatively fixed in the extension direction of the second axis; when in the unlocked state, the flow guide member can slide relative to the frame in the extension direction of the second axis.

[0019] In an optional embodiment, the liquid storage component is slidably connected to the frame in an extension direction of the second axis to adjust the distance of the liquid storage component relative to the flow guide component.

[0020] In an optional embodiment, the liquid storage component is provided with a first chamber and a second chamber which are independent of each other, the first chamber has a first outlet, and the first chamber is used to store fluid; the second chamber has a second outlet, and the second chamber is used to store cleaning fluid.

[0021] The beneficial effects of the embodiments of the present invention are:

[0022] In summary, the integrated processing equipment provided by this embodiment can be applied to the development scene. Specifically, when developing the workpiece, the workpiece is positioned on the rotating unit, and then the inclination of the workpiece relative to the horizontal plane is adjusted accordingly through the inclination adjustment unit according to the thickness of the workpiece, that is, the inclination of the workpiece relative to the guide member is adjusted, and the fluid flowing from the guide member to the workpiece surface has a small impact on the workpiece surface, and is not easy to damage the workpiece surface, and the development quality is high. Since the angle between the workpiece and the guide member can be adjusted as needed according to the different thickness of the workpiece, it can adapt to the development of workpieces of different sizes, and can ensure the development quality, with a wide range of applications, and does not need to design special development equipment for workpieces of different sizes, thereby reducing costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments are briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without creative work.

[0024] Figure 1 A schematic structural diagram of an integrated processing device according to an embodiment of the present invention from one perspective;

[0025] Figure 2 A structural schematic diagram of the integrated processing equipment according to another embodiment of the present invention;

[0026] Figure 3 It is a partial structural schematic diagram of the integrated processing equipment according to an embodiment of the present invention;

[0027] Figure 4 It is a schematic structural diagram of a rotating disk and a positioning assembly according to an embodiment of the present invention;

[0028] Figure 5 It is a schematic structural diagram of a frame and a locking unit according to an embodiment of the present invention;

[0029] Figure 6 It is a structural schematic diagram of a locking unit according to an embodiment of the present invention;

[0030] Figure 7 A schematic structural diagram of a flow guide member according to an embodiment of the present invention;

[0031] Figure 8 Schematic diagram of the structure of the liquid storage component according to an embodiment of the present invention.

[0032] icon:

[0033] 001-first axis; 002-second axis; 100-base; 110-liquid collecting chamber; 120-water pump; 130-mounting block; 200-rotating device; 210-tilt adjustment unit; 211-first driver; 212-mounting platform; 2121-base; 2122-plate; 2123-liquid collecting tank; 2124-liquid discharge port; 220-rotating unit; 221-second driver; 222-rotating Disk; 223-positioning assembly; 300-flow guide device; 310-frame; 311-fixing plate; 312-fixing rod; 313-adjusting rod; 320-liquid storage member; 321-first outlet; 322-second outlet; 330-flow guide member; 331-liquid outlet side; 332-clamping hole; 3321-first hole section; 3322-second hole section; 340-locking unit; 341-clamping rod; 342-annular protrusion. DETAILED DESCRIPTION

[0034] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Generally, the components of the embodiments of the present invention described and shown in the drawings here can be arranged and designed in various different configurations.

[0035] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the invention claimed for protection, but merely represents selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0036] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0037] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inside", "outside", etc. indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, or the positions or positional relationships in which the product of the invention is usually placed when in use. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific position, be constructed and operated in a specific position, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", "third", etc. are only used to distinguish the description, and cannot be understood as indicating or implying relative importance.

[0038] In addition, the terms "horizontal", "vertical" and the like do not mean that the components are required to be absolutely horizontal or suspended, but can be slightly tilted. For example, "horizontal" only means that its direction is more horizontal than "vertical", and does not mean that the structure must be completely horizontal, but can be slightly tilted.

[0039] In the description of the present invention, it is also necessary to explain that, unless otherwise clearly specified and limited, the terms "set", "install", "connect", and "connect" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0040] At present, in the field of semiconductor processing, when developing a workpiece, the workpiece is generally positioned on a turntable, and then the fluid is guided to the surface of the workpiece. The workpiece is continuously rotated to achieve development in the entire circumferential direction. After the workpiece and the turntable are positioned, the angle of the turntable is fixed, and the angle of the workpiece relative to the horizontal plane is fixed and cannot be adjusted. When the workpiece size is different, the height of the workpiece and the outflow side of the fluid will change. When the fluid reaches the surface of the workpiece, the impact force will change, and the impact force is likely to damage the workpiece, reducing the yield of the finished product.

[0041] Please combine Figure 1-Figure 8 In view of this, the designer designed an integrated processing equipment that can be used in the development field. It can adjust the inclination angle of the workpiece relative to the horizontal plane as needed, thereby adjusting the distance the fluid reaches the workpiece surface and reducing the impact force; it can also adjust the flow rate of the developer on the workpiece surface, thereby facilitating the control of development quality and improving the yield of finished products.

[0042] See also Figure 1-Figure 3In this embodiment, the integrated processing equipment includes a base 100, a rotating device 200 and a guide device 300. The base 100 is used to be fixed on a support surface, and the support surface can be a workbench or the ground. The rotating device 200 includes an inclination adjustment unit 210 and a rotation unit 220. The inclination adjustment unit 210 is arranged on the base 100, and the rotation unit 220 is connected to the inclination adjustment unit 210. The rotation unit 220 is used to carry the workpiece and can drive the workpiece to rotate around the first axis 001; the inclination adjustment unit 210 is used to drive the rotation unit 220 to rotate around a second axis 002 that has an angle with the first axis 001. The guide device 300 includes a frame 310, a liquid storage member 320 and a guide member 330. The frame 310 is connected to the tilt adjustment unit 210. The liquid storage member 320 and the guide member 330 are both connected to the frame 310. The liquid storage member 320 is used to transport liquid to the guide member 330. The liquid can flow through the guide member 330 to the workpiece positioned on the rotating unit 220.

[0043] It should be noted that, in this embodiment, the first axis 001 is perpendicular to the second axis 002, and the second axis 002 substantially coincides with the horizontal plane. Obviously, in other embodiments, the first axis 001 and the second axis 002 may also be at other angles other than 0° and 90°. At the same time, the second axis 002 may have a non-zero angle with the horizontal plane.

[0044] In this embodiment, optionally, the base 100 is set as a square platform, and the base 100 has a first plate surface and a second plate surface opposite to each other, the first plate surface is used to be fixed on the support surface, the second plate surface faces upward, and two mounting blocks 130 are arranged on the second plate surface, and the two mounting blocks 130 are both square blocks, and the two mounting blocks 130 are arranged at intervals. A bearing hole is set on each mounting block 130, and the two bearing holes on the two mounting blocks 130 are coaxially arranged. Further, a liquid collecting chamber 110 is set on the base 100, and the liquid collecting chamber 110 has an opening located on the second plate surface, and a water pump 120 is set in the liquid collecting chamber 110.

[0045] See also Figure 2In this embodiment, optionally, the inclination adjustment unit 210 includes a first driver 211, a mounting platform 212 and a bearing (not shown), the first driver 211 is set as a motor, the first driver 211 is fixed on the second plate surface, the number of bearings is two, the two bearings are respectively embedded in the bearing holes on the two mounting blocks 130, and the output shaft of the first driver 211 is simultaneously penetrated in the inner rings of the two bearings, so that the output shaft of the first driver 211 is rotatably connected with the two mounting blocks 130 around the second axis 002 through the two bearings. The mounting platform 212 is fixed on the output shaft of the first driver 211 and can rotate with the output shaft, that is, after the mounting platform 212 is installed on the output shaft, the mounting platform 212 and the output shaft are relatively fixed in the circumferential direction of the output shaft. For example, the mounting platform 212 can be fixedly connected to the output shaft through a spline or a pin. Further, the mounting platform 212 includes a connected base 2121 and a plate body 2122, and the base 2121 is sleeved outside the output shaft and fixedly connected to the output shaft. The plate body 2122 is provided with a liquid collecting groove 2123 and a liquid discharge port 2124 connected to the liquid collecting groove 2123. A through hole is provided in the middle of the liquid collecting groove 2123. The through hole is a cylindrical hole, and a sealing bearing is provided in the through hole. The liquid in the liquid collecting groove 2123 can be discharged into the liquid collecting chamber 110 through the liquid discharge port 2124.

[0046] In other embodiments, optionally, the inclination adjustment unit 210 also includes an angle measurer, which is connected to the first driver 211 and is used to detect the rotation angle of the output shaft of the first driver 211, so as to obtain the rotation angle of the mounting table 212, and then obtain the angle of the mounting table 212 relative to the horizontal plane, and finally obtain the angle of the workpiece relative to the horizontal plane.

[0047] See also Figure 1 and Figure 4 In this embodiment, optionally, the rotating unit 220 includes a second driver 221, a rotating disk 222 and a positioning assembly 223, and the second driver 221 is configured as a motor. The second driver 221 is fixed on the base 2121, and the output shaft of the second driver 221 is inserted into the sealed bearing, and the output shaft of the second driver 221 extends into the liquid collecting tank 2123. The rotating disk 222 can be a circular disk, and the rotating disk 222 is located in the liquid collecting tank 2123. The rotating disk 222 is fixedly connected to the output shaft, and the axis of the rotating disk 222 is colinear with the axis of the output shaft. The positioning assembly 223 is disposed on the rotating disk 222, and the positioning assembly 223 is used to position the workpiece located on the rotating disk 222 so that the workpiece does not move relative to the rotating disk 222 during the development process.

[0048] Optionally, the positioning assembly 223 includes a plurality of positioning blocks, all of which are connected to the rotating disk 222, and at least one of the plurality of positioning blocks can slide relative to the rotating disk 222 along the radial direction of the rotating disk 222, thereby adjusting the position of the positioning block relative to the rotating disk 222. It should be understood that the plurality of positioning blocks are used to cooperate with each other to clamp the workpiece, and the plurality of positioning blocks together enclose a clamping area. When the positioning blocks move relative to the rotating disk 222, the size of the clamping area changes, thereby being able to adapt to the clamping of different workpieces, having a wide range of uses, and low cost.

[0049] It should be noted that each of the multiple positioning blocks can be configured to slide relative to the rotating disk 222, with a wide adjustment range, flexible adjustment, and more types of workpieces that can be clamped. Obviously, in other embodiments, only one of the multiple positioning blocks can be configured to be movable relative to the rotating disk 222, and the function of adjusting the size of the clamping area can also be achieved.

[0050] In addition, the positioning block can be fixed to the rotating disk 222 by screws, and a plurality of threaded holes can be arranged on the rotating disk. When the screws are screwed into different threaded holes, the radial position of the positioning block relative to the rotating disk 222 can change, so that after adjusting the size of the clamping area, the size of the clamping area can be kept unchanged to stably clamp the workpiece.

[0051] See also Figure 5 In this embodiment, optionally, the frame 310 includes a fixing plate 311, a fixing rod 312 and an adjusting rod 313. The fixing plate 311 is set as a rectangular plate, and the fixing plate 311 is fixed to the base 2121 by screws. One end of the fixing rod 312 is connected to the fixing plate 311, and the other end is connected to the adjusting rod 313. The number of the fixing rods 312 and the adjusting rods 313 are both two, and the first ends of the two fixing rods 312 are connected to the base 2121, and the other ends of the two fixing rods 312 are fixedly connected to the two adjusting rods 313 respectively. The two adjusting rods 313 are perpendicular to the second axis 002, and are arranged at intervals in the extension direction of the second axis 002.

[0052] Furthermore, each adjusting rod 313 is slidably connected to the corresponding fixed rod 312, and the sliding direction of the adjusting rod 313 and the fixed rod 312 is parallel to the guiding direction of the guide member 330 to guide the liquid to flow toward the workpiece. In this way, when the workpiece positioned on the rotating disk 222 is small in size, the position of the adjusting rod 313 relative to the fixed rod 312 can be adjusted to make the guide member 330 closer to or farther away from the workpiece, so that the liquid flowing out of the guide member 330 can fall smoothly on the workpiece.

[0053] In the present embodiment, optionally, the guide member 330 is slidably matched with the frame 310 through a locking unit 340, and the locking unit 340 has a locking state and an unlocking state that can be switched with each other. When in the locked state, the guide member 330 and the frame 310 are relatively fixed in the extension direction of the second axis 002; when in the unlocked state, the guide member 330 can slide relative to the frame 310 in the extension direction of the second axis 002, so that the guide member 330 can move relative to the frame 310, and thus move relative to the rotating disk 222, thereby adjusting the distance between the guide member 330 and the rotating disk 222, and finally adjusting the distance between the guide member 330 and the surface of the workpiece located on the rotating disk 222. Such a design enables the guide member 330 to be adjusted in position according to workpieces of different thicknesses, so that the distance between the guide member 330 and the workpiece is always maintained within a reasonable distance range. The liquid guided by the guide member 330 and flowing from the liquid outlet side 331 of the guide member 330 to the surface of the workpiece can evenly cover the surface of the workpiece, thereby improving the work quality.

[0054] See also Figure 6 Optionally, the locking unit 340 includes a plurality of clamping rods 341, each adjusting rod 313 is provided with at least one clamping rod 341, and each clamping rod 341 is provided with an annular protrusion 342 evenly spaced in the extending direction of the axis of the clamping rod 341. The clamping rod 341 is arranged perpendicular to the adjusting rod 313. The number of the clamping rods 341 on each adjusting rod 313 can be one, two, or three.

[0055] See also Figure 7Optionally, the flow guide 330 is configured as a square plate, and one side of the flow guide 330 is configured as a liquid outlet side 331. The flow guide 330 is provided with a clamping hole 332 that penetrates the flow guide 330 in the thickness direction thereof, and the clamping hole 332 includes a first hole section 3321 and a second hole section 3322 that are connected, and the first hole section 3321 and the second hole section 3322 are both arc hole sections, and the aperture of the first hole section 3321 is larger than the space of the second hole section 3322. The number of the clamping holes 332 on the flow guide 330 is designed according to the number of the clamping rods 341, and the number of the clamping holes 332 is equal to the number of the clamping rods 341 and corresponds one to one, and each clamping rod 341 can be plugged into a corresponding clamping hole 332. Furthermore, the clamping rod 341 can move between the first hole section 3321 and the second hole section 3322. When the clamping rod 341 is located in the first hole section 3321, the locking unit 340 is in an unlocked state, and the clamping rod 341 can move relative to the flow guide 330 in the axis extension direction of the first hole section 3321, thereby adjusting the position of the flow guide 330. After moving to the set position, the clamping rod 341 is slid into the second hole section 3322, and the annular protrusion 342 is used to clamp the flow guide 330. At this time, the locking unit 340 is in a locked state, so that the flow guide 330 and the clamping rod 341 are fixed in the axis extension direction of the clamping rod 341. The adjustment operation of the position of the flow guide 330 relative to the frame 310 is convenient and flexible.

[0056] Obviously, in other embodiments, the guide member 330 may also be configured to rotate with the frame 310 , so as to adjust the distance between the liquid outlet side 331 and the workpiece.

[0057] See also Figure 8 In this embodiment, optionally, the liquid storage member 320 is provided with a first chamber and a second chamber that are independent of each other, the first chamber has a first outlet 321 and a first inlet, the first chamber is used to store a fluid, and the fluid may be a developer, etc.; the second chamber has a second outlet 322 and a second inlet, and the second chamber is used to store a cleaning fluid. In actual operation, when development is required, the first chamber is replenished with fluid through the first inlet, the fluid is discharged from the first outlet 321 and falls on the guide member 330, and flows from the liquid outlet side 331 of the guide member 330 to the surface of the workpiece. When the development is completed, when the workpiece needs to be cleaned, the cleaning fluid in the second chamber is discharged from the second outlet 322, so that it flows to the surface of the workpiece through the guide member 330.

[0058] Furthermore, the first outlet 321 and the second outlet 322 are both strip-shaped outlets, and the first outlet 321 and the second outlet 322 extend along the extension direction of the second axis 002. In this way, the liquid flowing out of the first outlet 321 and the second outlet 322 can be in a water curtain shape, and can flow to the flow guide member 330 more evenly.

[0059] In this embodiment, the working mode of the integrated processing equipment includes, for example:

[0060] The workpiece is placed on the rotating disk 222, and the workpiece is clamped on the rotating disk 222 by moving the positioning block. Then, the inclination adjustment unit 210 is used to drive the mounting table 212 to rotate, thereby driving the rotating disk 222, the workpiece, the rotating unit 220 and the guide device 300 to change the inclination angle with respect to the horizontal plane at the same time. After the inclination adjustment is completed, the height of the guide plate relative to the workpiece is adjusted, and then the development and cleaning operations are performed. Obviously, in other steps, the distance between the guide plate and the workpiece can be adjusted first, and then the inclination angle of the workpiece can be adjusted, which is feasible.

[0061] The integrated processing equipment provided in this embodiment can process workpieces of different shapes and sizes, wherein the size of the workpiece includes the outer contour size and thickness of the workpiece, and the shape of the workpiece can be round, square, etc., with a wide processing range, a wide range of uses, and low cost. At the same time, the inclination angle and distance of the workpiece relative to the guide plate can be adjusted according to the requirements of the workpiece, meeting the processing requirements of multiple requirements, and the processing quality is high.

[0062] It should be noted that the integrated processing equipment can also be applied to other operating scenarios, for example, in acid coating or coating operations.

[0063] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. An integrated processing equipment, characterized in that: include: abutment; A rotating device, the rotating device comprising an inclination adjustment unit and a rotation unit, the inclination adjustment unit being arranged on the base, the rotation unit being connected to the inclination adjustment unit, the rotation unit being used to carry a workpiece and drive the workpiece to rotate around a first axis; the inclination adjustment unit being used to drive the rotation unit to rotate around a second axis having an angle with the first axis; and a flow guiding device, the flow guiding device comprising a frame, a liquid storage member and a flow guiding member, the frame being connected to the tilt adjustment unit, the liquid storage member and the flow guiding member being both connected to the frame, the liquid storage member being used to convey liquid to the flow guiding member, and the liquid being able to flow to a workpiece positioned on the rotating unit through the flow guiding member; The guide member is provided with a liquid outlet side, and the guide member is movably connected to the frame body, and is used to adjust the distance between the liquid outlet side and the frame body, thereby adjusting the distance between the liquid outlet side and the workpiece positioned on the rotating unit; The guide member is slidably connected to the frame in the extension direction of the second axis to adjust the distance between the liquid outlet side and the frame; The flow guide device also includes a locking unit, which is connected to the flow guide member and the frame at the same time. The locking unit has a locking state and an unlocking state that can be switched to each other. When in the locked state, the flow guide member and the frame are relatively fixed in the extension direction of the second axis; when in the unlocked state, the flow guide member can slide relative to the frame in the extension direction of the second axis.

2. The integrated processing equipment according to claim 1, characterized in that: The tilt adjustment unit includes a first driver and a mounting platform, wherein the first driver is connected to the base platform, the mounting platform is connected to the first driver, and the first driver is used to drive the mounting platform to rotate around the first axis; The rotating unit and the frame are both connected to the mounting platform.

3. The integrated processing equipment according to claim 2, characterized in that: The mounting platform is provided with a liquid collecting trough and a liquid discharge port connected to the liquid collecting trough; the base is provided with a liquid collecting cavity, and the liquid discharge port is connected to the liquid collecting cavity; the rotating unit is arranged in the liquid collecting trough; the liquid collecting trough is used to collect liquid falling from the workpiece, and the liquid can enter the liquid collecting cavity from the liquid discharge port.

4. The integrated processing equipment according to claim 2, characterized in that: The rotating unit includes a second driver, a rotating disk and a positioning assembly, the second driver is connected to the mounting table, the rotating disk is connected to the second driver, the second driver is used to drive the rotating disk to rotate around the second axis; the positioning assembly is connected to the rotating disk, and the positioning assembly is used to position a workpiece located on the rotating disk.

5. The integrated processing equipment according to claim 4, characterized in that: The positioning assembly includes a plurality of clamping blocks, each of which is connected to the rotating disk. The plurality of clamping blocks jointly define a clamping area for clamping a workpiece, and at least one of the plurality of clamping blocks can move relative to the rotating disk to adjust the size of the clamping area.

6. The integrated processing equipment according to claim 1, characterized in that: The liquid storage component is slidably connected to the frame in the extending direction of the second axis to adjust the distance between the liquid storage component and the flow guide component.

7. The integrated processing equipment according to claim 6, characterized in that: The liquid storage element is provided with a first chamber and a second chamber which are independent of each other. The first chamber has a first outlet and is used to store fluid; the second chamber has a second outlet and is used to store cleaning fluid.

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