Device and method for measuring the amount of photoacid generator leaching in photoresist

Abstract

The present invention relates to a device and method for measuring the amount of photoacid generator leached from photoresist. The device comprises a carrier plate, a soft gasket, a pressure cap, and a water pump. The upper surface of the carrier plate is provided with a water groove, the soft gasket is provided with a water hole, the water hole and the upper surface of the water groove are identical in shape, the soft gasket is placed on the upper surface of the carrier plate, the water hole and the water groove are positioned to coincide with each other, a wafer is placed on the upper surface of the soft gasket, the side of the wafer coated with photoresist is in contact with the soft gasket, the carrier plate is provided with a water inlet and a water outlet, the two ends of the water groove are respectively connected to the water inlet and the water outlet, the water pump is connected to the water inlet via a water pipe, and the pressure cap is pressed against the upper end of the wafer. The device has a simple structure and can greatly facilitate the measurement of the amount of photoacid generator leached from photoresist.

Description

Technical Field

[0001] The invention relates to a device and a method for measuring the amount of photoacid generator leaching in photoresist, belonging to the technical field of semiconductor photoresist. Background Art

[0002] Immersion lithography is a new photolithography technique that has become a mainstream advanced lithography technology. Immersion lithography improves resolution by inserting a liquid medium between the lithography machine and the wafer surface, replacing the traditional gas medium. However, water flowing over the photoresist surface presents several challenges, primarily due to physical or chemical interactions between the photoresist and water. A major concern is that water can extract photoacid generator molecules and alkaline additives from the photoresist.

[0003] The chemical leached from the photoresist has a huge impact on the performance of the photolithography: the leaching of the photoacid generator will cause the formation of specific defects after development. More seriously, the photoacid generator and free acid contained in the water will damage the expensive optical system of the exposure machine. Therefore, it is necessary to set a specification for the leaching amount of the photoacid generator. ASML sets the leaching amount of the photoacid generator to 1.6*10 -12 mol / cm 2 For the above reasons, it is very important to evaluate the amount of photoacid generator leaching from the photoresist when deionized water flows through the hydrophobic coating on top of the dry photoresist.

[0004] After deionized water flows through the hydrophobic layer on top of the photoresist, the hydrogen ion content in the deionized water is measured, thereby realizing the measurement of the amount of photoacid generator leached in the photoresist. However, there is currently no relevant suitable equipment and method for treating the deionized water flowing through the hydrophobic layer on top of the photoresist. Summary of the Invention

[0005] The present invention addresses the deficiencies in the prior art and provides a device and method for measuring the amount of photoacid generator leached in photoresist. The device has a simple structure and can greatly facilitate the measurement of the amount of photoacid generator leached in photoresist.

[0006] The technical solution of the present invention for solving the above-mentioned technical problems is as follows: a device for measuring the amount of photoacid generator leaching in photoresist, the device comprising a carrying plate, a soft gasket, a pressure cover and a water pump, the upper surface of the carrying plate is provided with a water groove, the soft gasket is provided with a water hole, the water hole and the upper surface of the water groove are exactly the same in shape, the soft gasket is placed on the upper surface of the carrying plate, the water hole and the water groove are positioned coincident, a wafer is placed on the upper surface of the soft gasket, the side of the wafer coated with photoresist is in contact with the soft gasket, the carrying plate is provided with a water inlet and a water outlet, the two ends of the water groove are respectively connected to the water inlet and the water outlet, the water pump is connected to the water inlet through a water pipe, and the upper end of the wafer is pressed with the pressure cover.

[0007] The beneficial effects of the present invention are as follows: after the water delivery pump is started, deionized water is passed through the water passage groove, and the position where the wafer contacts the water passage hole will contact the deionized water, while the position where the wafer does not contact the water passage hole will not contact the deionized water. The experimenter can measure the hydrogen ion content in the deionized water that contacts the wafer, thereby determining the leaching of the photoacid generator in the photoresist on the wafer; and the experimenter can adjust the water delivery pump according to the measurement requirements to control the flow rate and flow of the deionized water. The area of ​​the water passage hole is the area of ​​the wafer contacting the deionized water. By calculating the area of ​​the water passage hole and the flow rate of the deionized water, the leaching of the photoacid generator per unit area of ​​the photoresist coated under a unit amount of water can be determined. The device has a simple structure and can greatly facilitate the measurement of the amount of photoacid generator leached in the photoresist.

[0008] On the basis of the above technical solution, the present invention can also be improved as follows:

[0009] Furthermore, the upper surface of the supporting plate is provided with at least one water passage groove, and the soft gasket is provided with at least one water passage hole. The number of the water passage grooves and the water passage holes is the same, and the shape and position of the water passage hole and the upper surface of the water passage groove are completely matched.

[0010] The beneficial effect of adopting the above further scheme is that the setting of multiple water grooves and multiple water holes makes it easier for experimenters to simultaneously measure the photoacid generator leaching conditions of photoresist coatings at different positions on the wafer, facilitates the setting of parallel experiments, and improves work efficiency.

[0011] Furthermore, each of the water-passing grooves is independently connected to a set of water inlets and water outlets, and each water inlet is connected to a separate water pump via a water pipe.

[0012] The beneficial effect of adopting the above further scheme is that each water groove is separately connected to a water pump, so that different water pumps can be set with different flow rates, thereby making it convenient for experimenters to investigate different flow rates of deionized water on one wafer, facilitating the implementation of comparative tests, improving efficiency, reducing the use of wafers, and reducing testing costs.

[0013] Furthermore, a carrying groove is provided at the upper end of the carrying plate, and the soft gasket and the wafer are placed in the carrying groove. The shape of the carrying groove is exactly the same as that of the soft gasket, and the shape of the soft gasket is exactly the same as that of the wafer.

[0014] The beneficial effect of adopting the above-mentioned further scheme is that the setting of the supporting groove and the soft gasket facilitates the fixation of the wafer position, and avoids the rotation of the wafer after deionized water is passed into the water groove, which leads to the final detection error. In addition, the setting of the soft gasket also protects the wafer, avoiding the breakage of the wafer caused by the pressing of the pressure cover.

[0015] Furthermore, the upper end surface of the carrier plate is provided with a matching concave platform, and the lower end surface of the pressure cover is provided with a matching convex platform, and the matching convex platform and the matching concave platform fit together;

[0016] A pressing platform is provided on the lower end surface of the pressure cover, and the pressing platform cooperates with the bearing groove. The pressing platform is placed in the bearing groove to press the wafer and the soft gasket tightly.

[0017] The beneficial effect of adopting the above-mentioned further scheme is that the structural setting of the carrier plate and the pressure cover is more conducive to the tight pressing of the pressure cover on the wafer, the soft gasket and the carrier plate, avoiding the rotation of the wafer during the test, and avoiding the position on the wafer that is not in contact with the water hole from being soaked with water, resulting in errors in the test results.

[0018] Furthermore, a fixing buckle is provided between the pressure cover and the carrying plate.

[0019] The beneficial effect of adopting the above further solution is that the provision of the fixing buckle can further ensure a tight press fit between the pressure cover and the carrier plate.

[0020] Furthermore, a through-groove pipe is provided inside the supporting plate, and both ends of the water groove are connected to the water inlet and the water outlet through the through-groove pipe respectively; the water pump connected to the water inlet is a peristaltic pump.

[0021] The beneficial effect of adopting the above further scheme is that the water-passing groove connects the water inlet and the water outlet through the through groove pipe, which is more conducive to setting a fixed upper surface area of ​​the water-passing groove, thereby facilitating processing and calculation, and the use of a peristaltic pump is more conducive to the control of flow rate and flow velocity.

[0022] Furthermore, the water outlet is connected to the waste liquid collector through a drain pipe, and the inner walls of the drain pipe and the waste liquid collector are both made of materials that are resistant to organic solvents, acids, and alkalis.

[0023] The beneficial effect of adopting the above further scheme is that the deionized water flowing through the water groove is collected in the waste liquid collector. The staff can directly take the liquid in the waste liquid collector for testing to determine the amount of photoacid generator leached in the photoresist. In addition, by setting up the waste liquid collector, the discharge of waste liquid can also be effectively avoided, which is beneficial to environmental protection.

[0024] Furthermore, the supporting plate, pressure cover, and water pipe are made of organic solvent-resistant, acid-resistant, and alkali-resistant materials. The materials of the supporting plate and pressure cover include but are not limited to polypropylene (PP) and polytetrafluoroethylene (PFET); the water pipe is made of silicone material, and the soft gasket is made of silicone material.

[0025] The beneficial effect of adopting the above further solution is that the use of organic solvent-resistant, acid-resistant and alkali-resistant materials can effectively avoid corrosion and extend the service life.

[0026] The present invention also discloses a method for measuring the amount of photoacid generator leached in a photoresist. The device of the present invention is used to measure the amount of photoacid generator leached in a photoresist. The measuring method is as follows:

[0027] Place the wafer on the soft gasket, with the coated surface of the wafer in direct contact with the soft gasket, and install the pressure cover on the carrier plate. Press the pressure cover to ensure that the carrier plate, the soft gasket, the wafer and the pressure cover are tightly fitted together.

[0028] The water delivery pump is started, and deionized water flows through the water passage groove, and the water passage groove and the water passage hole allow the deionized water to directly contact the wafer; the flow rate and flow of the deionized water are controlled by the water delivery pump according to the experimental test requirements;

[0029] After stopping the water pump, open the pressure cover, remove the wafer, and detect the liquid flowing out of the water outlet to determine the leaching of the photoacid generator in the photoresist.

[0030] The method for measuring the amount of photoacid generator leached in photoresist is simple to operate, can realize the investigation of the effect of water flow rate and water flow rate on the leaching of photoacid generator, and is more conducive to the measurement of the amount of photoacid generator leached in photoresist. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figure 1 1 is a top view of the device for measuring the amount of photoacid generator leached from photoresist described in Example 1;

[0032] Figure 2 for Figure 1 AA section view;

[0033] Figure 3 This is a front view of the gland described in Example 1;

[0034] Figure 4 This is a front view of the carrier plate described in Example 1;

[0035] Figure 5 is a top view of the carrier plate described in Example 1;

[0036] Figure 6 is a top view of the soft gasket described in Example 1;

[0037] Figure 7 2 is a top view of the device for measuring the amount of photoacid generator leaching in photoresist described in Example 2;

[0038] Figure 8 is a top view of the carrier plate described in Example 2;

[0039] Figure 9 is a top view of the soft gasket described in Example 2;

[0040] In the figure, 1. supporting plate; 2. soft gasket; 3. pressure cover; 4. water pump; 5. water groove; 6. water hole; 7. wafer; 8. water inlet; 9. water outlet; 10. water pipe; 11. supporting groove; 12. matching concave platform; 13. matching convex platform; 14. pressing platform; 15. fixing buckle; 16. through-groove pipe; 17. drain pipe; 18. waste liquid collector. DETAILED DESCRIPTION

[0041] To make the above-mentioned objects, features, and advantages of the present invention more readily apparent, specific embodiments of the present invention are described in detail below. The following description sets forth numerous specific details to facilitate a full understanding of the present invention. However, the present invention can be implemented in many other ways than those described herein, and those skilled in the art may make similar modifications without departing from the scope of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0042] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art of the present invention. The terms used in the specification of the present invention herein are only for the purpose of describing specific embodiments and are not intended to limit the present invention.

[0043] Example 1

[0044] like Figure 1-6As shown, a device for measuring the amount of photoacid generator leaching in photoresist includes a carrier plate 1, a soft gasket 2, a pressure cover 3 and a water pump 4. The upper end of the carrier plate 1 is provided with a carrier groove 11, and the soft gasket 2 and the wafer 7 are placed in the carrier groove 11. The shape of the carrier groove 11 is exactly the same as that of the soft gasket 2, and the shape of the soft gasket 2 is exactly the same as that of the wafer 7.

[0045] like Figure 2 、 Figure 5 and Figure 6 As shown, a water-passing groove 5 is provided in the carrying groove 11 of the carrying plate 1, and a water-passing hole 6 is provided in the soft gasket 2. The water-passing hole 6 has the same shape as the upper surface of the water-passing groove 5. The soft gasket 2 is placed on the upper surface of the carrying plate 1, and the water-passing hole 6 coincides with the position of the water-passing groove 5. A wafer 7 is placed on the upper surface of the soft gasket 2, and the side of the wafer 7 coated with photoresist is in contact with the soft gasket 2. The upper end of the wafer 7 is pressed against the pressure cover 3.

[0046] like Figure 2-Figure 4 As shown, the upper end surface of the carrier plate 1 is provided with a mating recess 12, and the lower end surface of the pressure cover 3 is provided with a mating protrusion 13. The mating protrusion 13 and the mating recess 12 are mutually engaged. The lower end surface of the pressure cover 3 is provided with a pressing platform 14, which is mated with the carrying groove 11. The pressing platform 14 is placed in the carrying groove 11 to press the wafer 7 and the soft gasket 2. A fixing buckle 15 is provided between the pressure cover 3 and the carrier plate 1.

[0047] like Figure 1-2 As shown, water inlet 8 and water outlet 9 are provided on both sides of the supporting plate 1, and a through groove pipe 16 is opened inside the supporting plate 1. The two ends of the water groove 5 are connected to the water inlet 8 and the water outlet 9 through the through groove pipe 16 respectively; the water pump 4 is connected to the water inlet 8 through the water pipe 10, and the water pump 4 is a peristaltic pump.

[0048] like Figure 1 As shown, the water outlet 9 is connected to the waste liquid collector 18 via a drain pipe 17. The inner walls of the drain pipe 17 and the waste liquid collector 18 are all made of materials resistant to organic solvents, acids, and alkalis. The carrier plate 1, gland 3, and water pipe 10 are also made of materials resistant to organic solvents, acids, and alkalis. The soft gasket 2 is made of silicone, the drain pipe 17 and the water pipe 10 are silicone tubes, the inner wall of the waste liquid collector 18 is made of glass ceramic, and the carrier plate 1 and gland 3 are made of polytetrafluoroethylene.

[0049] A method for measuring the amount of photoacid generator leached from a photoresist is used, wherein the device described in this embodiment is used to measure the amount of photoacid generator leached from a photoresist. The method for measuring the amount of photoacid generator leached from a photoresist is as follows:

[0050] Place the wafer 7 on the soft gasket 2, with the coated surface of the wafer 7 in direct contact with the soft gasket 2, and install the pressure cover 3 on the carrier plate 1. Through the pressing of the pressure cover 3, the carrier plate 1, the soft gasket 2, the wafer 7 and the pressure cover 3 are tightly fitted together;

[0051] The water delivery pump 4 is started, and the deionized water flows through the water passage groove 5. The water passage groove 5 and the water passage hole 6 allow the deionized water to directly contact the wafer 7. The flow rate and flow of the deionized water are controlled by the water delivery pump 4 according to the experimental test requirements.

[0052] After the water delivery pump 4 is stopped, the pressure cover 3 is opened, the wafer 7 is removed, and the liquid in the waste liquid collector 18 is taken for testing to determine the leaching amount of the photoacid generator in the photoresist.

[0053] Example 2

[0054] like Figure 7-Figure 9 As shown, a device for measuring the amount of photoacid generator leaching in photoresist includes a carrier plate 1, a soft gasket 2, a pressure cover 3 and two water pumps 4. The upper end of the carrier plate 1 is provided with a carrier groove 11, and the soft gasket 2 and the wafer 7 are placed in the carrier groove 11. The shape of the carrier groove 11 is exactly the same as that of the soft gasket 2, and the shape of the soft gasket 2 is exactly the same as that of the wafer 7.

[0055] Two parallel water grooves 5 are provided in the carrying groove 11 of the carrying plate 1, and two parallel water holes 6 are provided in the soft gasket 2. The water holes 6 have exactly the same shape as the upper surface of the water grooves 5. The soft gasket 2 is placed in the carrying groove 11, and the water holes 6 coincide with the positions of the water grooves 5. A wafer 7 is placed on the upper surface of the soft gasket 2, and the side of the wafer 7 coated with photoresist is adhered to the soft gasket 2, and the upper end of the wafer 7 is pressed against the pressure cover 3.

[0056] The upper end surface of the carrier plate 1 is provided with a mating recess 12, and the lower end surface of the pressure cover 3 is provided with a mating protrusion 13. The mating protrusion 13 and the mating recess 12 are mutually engaged. The lower end surface of the pressure cover 3 is provided with a pressing platform 14. The pressing platform 14 cooperates with the carrying groove 11. The pressing platform 14 is placed in the carrying groove 11 to press the wafer 7 and the soft gasket 2. A fixing buckle 15 is provided between the pressure cover 3 and the carrier plate 1.

[0057] like Figure 8As shown, one side of the carrier plate 1 is provided with two water inlets 8, which are respectively connected to the two water-passing grooves 5; the other side of the carrier plate 1 is provided with two water outlets 9, which are respectively connected to the two water-passing grooves 5. A through-groove pipe 16 is provided inside the carrier plate 1, and the two ends of the water-passing groove 5 are respectively connected to the water inlet 8 and the water outlet 9 through the through-groove pipe 16; Figure 7 As shown, each of the water inlets 8 is connected to the liquid outlet of the water pump 4 through a water pipe 10, and the water pump 4 is a peristaltic pump.

[0058] Each water outlet 9 is connected to a waste liquid collector 18 via a separate drain pipe 17. The inner walls of the drain pipe 17 and waste liquid collector 18 are all made of materials resistant to organic solvents, acids, and alkalis. The carrier plate 1, gland 3, and water pipe 10 are also made of materials resistant to organic solvents, acids, and alkalis. The soft gasket 2 is made of silicone, the drain pipe 17 and water pipe 10 are silicone tubes, the inner wall of the waste liquid collector 18 is made of glass ceramic, and the carrier plate 1 and gland 3 are made of polytetrafluoroethylene.

[0059] A method for measuring the amount of photoacid generator leached from a photoresist is used, wherein the device described in this embodiment is used to measure the amount of photoacid generator leached from a photoresist. The method for measuring the amount of photoacid generator leached from a photoresist is as follows:

[0060] Place the wafer 7 on the soft gasket 2, with the coated surface of the wafer 7 in direct contact with the soft gasket 2, and install the pressure cover 3 on the carrier plate 1. Through the pressing of the pressure cover 3, the carrier plate 1, the soft gasket 2, the wafer 7 and the pressure cover 3 are tightly fitted together;

[0061] The two water pumps 4 are started at the same time, and deionized water flows through the water groove 5. The water groove 5 and the water hole 6 allow the deionized water to directly contact the wafer 7. According to the experimental detection requirements, the two water pumps 4 respectively control the different flow rates and flow rates of the deionized water, so that two sets of data under different flow rate conditions can be obtained by using one wafer 7.

[0062] After the water delivery pump 4 is stopped, the pressure cover 3 is opened, the wafer 7 is removed, and the liquid in the two waste liquid collectors 18 is taken for testing to determine the leaching amount of the photoacid generator in the photoresist.

[0063] The technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, not all possible combinations of the technical features in the above-mentioned embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0064] The above-described embodiments merely illustrate several implementations of the present invention, and while their descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent. It should be noted that a person skilled in the art would be able to make numerous variations and improvements without departing from the spirit of the present invention, all of which fall within the scope of protection of the present invention. Therefore, the scope of protection of the patent for this invention shall be determined by the appended claims.

Claims

1. A device for measuring the amount of photoacid generator leaching in photoresist, characterized in that: The device comprises a carrier plate (1), a soft gasket (2), a pressure cover (3) and a water pump (4); the upper surface of the carrier plate (1) is provided with a water groove (5); the soft gasket (2) is provided with a water hole (6); the water hole (6) and the upper surface of the water groove (5) have the same shape; the soft gasket (2) is placed on the upper surface of the carrier plate (1); the water hole (6) and the water groove (5) are positioned at the same position; a wafer (7) is placed on the upper surface of the soft gasket (2); a side of the wafer (7) coated with photoresist is in contact with the soft gasket (2); the carrier plate (1) is provided with a water inlet (8) and a water outlet (9); the two ends of the water groove (5) are respectively in communication with the water inlet (8) and the water outlet (9); the water pump (4) is in communication with the water inlet (8) through a water pipe (10); the upper end of the wafer (7) is pressed against the pressure cover (3); The upper surface of the carrier plate (1) is provided with at least one water-passing groove (5), and the soft gasket (2) is provided with at least one water-passing hole (6). The number of the water-passing grooves (5) and the number of the water-passing holes (6) are the same, and the shape and position of the upper surface of the water-passing grooves (5) are completely matched. A carrying groove (11) is provided at the upper end of the carrying plate (1), and the soft gasket (2) and the wafer (7) are placed in the carrying groove (11). The shape of the carrying groove (11) is exactly the same as that of the soft gasket (2), and the shape of the soft gasket (2) is exactly the same as that of the wafer (7).

2. The device for measuring the amount of photoacid generator leaching in photoresist according to claim 1, characterized in that: Each of the water-passing grooves (5) is independently connected to a set of water inlets (8) and water outlets (9), and each water inlet (8) is connected to a separate water pump (4) via a water pipe (10).

3. The device for measuring the amount of photoacid generator leaching in photoresist according to claim 1, characterized in that: The upper end surface of the carrier plate (1) is provided with a matching recess (12), and the lower end surface of the pressure cover (3) is provided with a matching boss (13), and the matching boss (13) and the matching recess (12) fit together; The lower end surface of the pressure cover (3) is provided with a pressing platform (14), and the pressing platform (14) cooperates with the supporting groove (11). The pressing platform (14) is placed in the supporting groove (11) to press the wafer (7) and the soft gasket (2) tightly.

4. The device for measuring the amount of photoacid generator leaching in photoresist according to claim 3, characterized in that: A fixing buckle (15) is provided between the pressure cover (3) and the carrying plate (1).

5. The device for measuring the amount of photoacid generator leaching in photoresist according to claim 1, characterized in that: A through-groove pipe (16) is provided inside the carrier plate (1), and the two ends of the water-passing groove (5) are respectively connected to the water inlet (8) and the water outlet (9) through the through-groove pipe (16); the water delivery pump (4) connected to the water inlet (8) is a peristaltic pump.

6. The device for measuring the amount of photoacid generator leaching in photoresist according to claim 1, characterized in that: The water outlet (9) is connected to the waste liquid collector (18) via a drain pipe (17), and the inner walls of the drain pipe (17) and the waste liquid collector (18) are both made of organic solvent-resistant, acid-resistant, and alkali-resistant materials.

7. The device for measuring the amount of photoacid generator leaching in photoresist according to any one of claims 1 to 6, characterized in that: The supporting plate (1), the pressure cover (3), and the water pipe (10) are made of materials resistant to organic solvents, acids, and alkalis; and the soft gasket (2) is made of silica gel.

8. A method for measuring the amount of photoacid generator leached from a photoresist, characterized in that: The device according to any one of claims 1 to 7 is used to measure the amount of photoacid generator leached in the photoresist, wherein the method of the measurement is: The wafer (7) is placed on the soft gasket (2), with the coated surface of the wafer (7) in direct contact with the soft gasket (2), and the pressure cover (3) is installed in conjunction with the carrier plate (1), so that the carrier plate (1), the soft gasket (2), the wafer (7) and the pressure cover (3) are tightly fitted together by pressing the pressure cover (3); The water delivery pump (4) is started, and the deionized water flows through the water passage groove (5), and the water passage groove (5) and the water passage hole (6) allow the deionized water to directly contact the wafer (7); according to the experimental detection requirements, the flow rate and flow of the deionized water are controlled by the water delivery pump (4); After stopping the water delivery pump (4), the pressure cover (3) is opened, the wafer (7) is removed, and the liquid from the water outlet (9) is taken out for testing to determine the leaching condition of the photoacid generator in the photoresist.

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