Exposure apparatus, method of manufacturing flat panel display, and method of manufacturing electronic device

Abstract

Provided is an optical device, an exposure device, a manufacturing method of a flat panel display, and a device manufacturing method. The optical device includes a plurality of laser light sources (20), an output module (30) having a light modulator, and a time divider (50) disposed between the plurality of laser light sources and the output module, which divides in time laser light emitted from the plurality of laser light sources.

Description

[0001] This application claims priority based on U.S. Provisional Application No. 62 / 959,178, filed January 10, 2020, the contents of which are incorporated herein by reference. Technical Field

[0002] This invention relates to an exposure apparatus, a method for manufacturing a flat panel display, and a method for manufacturing electronic devices. Background Technology

[0003] Laser beams are used in various fields. In devices using laser beams, there is a constant desire to improve processing accuracy and energy efficiency. For example, it is desirable to reduce laser beam energy loss, properly control the output intensity of the laser beam, suppress speckle, properly control the timing of beam output, and / or properly control the output beam waveform. Summary of the Invention

[0004] Technical means to solve the problem

[0005] In one aspect of the present invention, the optical device includes: a plurality of laser light sources; an output module having an optical modulator; and a time divider disposed between the plurality of laser light sources and the output module to divide the laser emitted from the plurality of laser light sources in time.

[0006] In another aspect of the invention, the optical device includes: a plurality of laser light sources; a plurality of output modules, each having an optical modulator; and a time divider disposed between the plurality of laser light sources and the plurality of output modules to divide the laser emitted from the plurality of laser light sources in time.

[0007] In another embodiment of the present invention, the optical device includes: a plurality of output modules, each having an optical modulator; a time divider disposed between the plurality of laser light sources and the plurality of output modules, for dividing the laser light emitted from the plurality of laser light sources in time; and a sub-divider disposed between the plurality of laser light sources and the time divider, or between the time divider and the plurality of output modules.

[0008] In another embodiment of the invention, the optical device includes: a laser source; an output module; and a time divider disposed between the laser source and the output module to divide the laser emitted from the laser source in time. The time divider uses multiple reflective surfaces to divide the laser.

[0009] In another embodiment of the invention, the optical device includes: a laser source; a plurality of output modules; and a time divider disposed between the laser source and the plurality of output modules to divide the laser emitted from the laser source in time. The time divider uses a plurality of reflective surfaces to divide the laser.

[0010] In another embodiment of the present invention, the optical device includes: a laser source; an output module having an optical modulator; and an acousto-optic element disposed between the laser source and the output module.

[0011] In another embodiment of the present invention, the optical device includes: a laser source; a plurality of output modules, each having an optical modulator; and an acousto-optic element disposed between the laser source and the output modules.

[0012] In another embodiment of the present invention, the optical device includes: a laser source that emits pulsed light; an output module having an optical modulator; a time divider disposed between the laser source and the output module for dividing the pulsed light in time; and a controller that controls the time divider to divide the pulsed light based on the frequency of the pulsed light.

[0013] In another embodiment of the present invention, the optical device includes: a laser source that emits pulsed light; a plurality of output modules, each having an optical modulator; a time divider disposed between the laser source and the plurality of output modules to divide the pulsed light in time; and a controller that controls the time divider to divide the pulsed light based on the frequency of the pulsed light. Attached Figure Description

[0014] Figure 1 This is a schematic diagram showing various forms of a laser beam system (optical device) including a laser source.

[0015] Figure 2 This is a schematic diagram showing various other forms of laser beam systems (optical devices) including laser light sources.

[0016] Figure 3 This is a diagram illustrating an example of the synthesis control of pulsed laser beams.

[0017] Figure 4 This is a diagram illustrating an example of the synthesis control of a CW laser beam.

[0018] Figure 5 This is a diagram showing an example of an output beam.

[0019] Figure 6 This is a diagram showing another example of an output beam.

[0020] Figure 7 This diagram illustrates an example of using a polygon mirror device as a time divider (rotation device).

[0021] Figure 8 This diagram illustrates an example of using a polygonal mirror device as a time divider (rotation device).

[0022] Figure 9 This diagram illustrates an example of using an optical switching device as a time divider (rotation device).

[0023] Figure 10 This diagram illustrates an example of using an optical switching device as a time divider (rotation device).

[0024] Figure 11 This diagram illustrates an example of using an optical switching device as a sub-divider (dynamic time divider) and using a polygonal mirror device as a time divider (dynamic time divider).

[0025] Figure 12 This diagram illustrates an example of using an electro-optic modulator as a time divider and a polarization beam splitter as a sub-divider (static divider).

[0026] Figure 13 This diagram illustrates an example of using an electro-optic modulator as a sub-splitter (dynamic time divider) and using a polarization beam splitter as a sub-splitter (static divider).

[0027] Figure 14 This diagram illustrates an example of an aperture device positioned on an optical path.

[0028] Figure 15 It is a diagram that roughly represents the overall structure of the exposure device.

[0029] Figure 16 This is a diagram showing an example of the structure of an exposure apparatus.

[0030] Figure 17 This is a graph used to illustrate the relationship between the repetition frequency of a laser beam and the operating frequency of a spatial light modulator (SLM).

[0031] Figure 18 This is a diagram used to illustrate the combination of the light source and the output module.

[0032] Figure 19 This diagram illustrates an example of the structure of an exposure device that does not have an SLM (Surface Mount Technology).

[0033] Figure 20 This is a diagram illustrating an example of the structure of an exposure apparatus equipped with an SLM.

[0034] Figure 21 It is a graph used to illustrate the relationship between pattern linewidth and emission time.

[0035] Figure 22 This is a diagram used to illustrate the energy loss of a light beam.

[0036] Figure 23This is a diagram used to illustrate the time division of a light beam.

[0037] Figure 24 This is a diagram used to illustrate the deviation of the projection positions among multiple SLMs based on the timing of illumination.

[0038] Figure 25 It is a diagram used to illustrate mechanical and / or optical displacement adjustments.

[0039] Figure 26 It is a diagram used to illustrate the displacement adjustment corresponding to the scanning action.

[0040] Figure 27 This is a diagram used to illustrate the displacement adjustment corresponding to another scanning action.

[0041] Figure 28 This is a diagram illustrating an example of the structure of an exposure device required for displacement adjustment.

[0042] Figure 29 This is a diagram showing an example of the structure of an exposure apparatus.

[0043] Figure 30 This is a diagram showing an example of the structure of an exposure apparatus.

[0044] Figure 31 This is a diagram showing an example of the structure of an exposure apparatus.

[0045] Figure 32 This is a diagram showing an example of the structure of an exposure apparatus.

[0046] Figure 33 This is a diagram showing an example of the structure of an exposure apparatus.

[0047] Figure 34 This is a diagram showing an example of the structure of an exposure apparatus.

[0048] Figure 35 This is an example of pattern exposure.

[0049] Figure 36 This is a diagram illustrating an example of the structure of an exposure device required for synchronous control.

[0050] Figure 37 This is a diagram illustrating an example of rotation control for a polygonal mirror.

[0051] Figure 38 This is a diagram illustrating an example of synchronous control of a polygonal mirror.

[0052] Figure 39 It is a diagram used to illustrate the running mechanism of multiple devices.

[0053] Figure 40 This is a diagram illustrating an example of synchronous control of a rotating plate.

[0054] Figure 41 This diagram illustrates an example of synchronous control of a rotating plate that has undergone additional machining.

[0055] [Explanation of reference numerals in the attached figures]

[0056] 20: Laser source

[0057] 30: Output Module

[0058] 40: Controller

[0059] 50: Time Divider

[0060] 51: Polygonal Mirror

[0061] 60: Spatial Light Modulator (SLM)

[0062] 70: Sub-segmenter

[0063] 80: Fiber optic

[0064] 1000: Exposure apparatus (optical apparatus)

[0065] 1100: Light source module

[0066] 1200: Allocation Module

[0067] 1300: Lighting System

[0068] 1310: Lighting Department

[0069] 1330: Projection Lens

[0070] 1400: Substrate carrier

[0071] 1410: Substrate

[0072] 1500: Control System Detailed Implementation

[0073] Hereinafter, embodiments of the present invention will be described with reference to the illustrations. The following detailed description of the present invention is merely illustrative and is not intended to be limiting. The same or identical reference numerals are used throughout the illustrations and the following detailed description.

[0074] Figure 1 and Figure 2 This is a schematic diagram showing various forms of laser beam systems (optical devices) equipped with a laser source. Figure 1 of (a), Figure 1 (b) Figure 1 (c) Figure 1 (d) Figure 2 of (a), Figure 2 (b) Figure 2(c) and Figure 2 In each of the examples of (d), the laser beam system includes a laser source 20.

[0075] In one embodiment, the laser beam system (optical device) includes: a laser source 20, an output module 30, a controller 40, and a time divider 50 optically disposed between the laser source 20 and the output module 30.

[0076] The laser source 20 can be applied to various types. Examples of laser source 20 include gas lasers (helium-neon lasers, argon lasers, carbon dioxide lasers, excimer lasers, nitrogen lasers, etc.), semiconductor lasers, solid-state lasers (yttrium aluminum garnet (YAG) lasers, Nd(neodymium) lasers, ruby ​​lasers, fiber lasers, titanium lasers, etc.), metal lasers (copper vapor-deposited lasers, helium-cadmium lasers, gold vapor-deposited lasers, etc.), and liquid lasers. The technology disclosed herein can be applied to various oscillation modes such as pulsed oscillations and continuous wave (CW) oscillations.

[0077] The output module 30 is configured according to the intended use of the laser beam. For example, the laser beam can be used in optical devices such as laser processing equipment, laser melting equipment, laser welding equipment, laser marking equipment, laser length measuring equipment, semiconductor exposure equipment, flat panel display exposure equipment, circuit board exposure equipment, laser illumination equipment, laser display equipment, laser detection equipment, laser propulsion equipment, laser inspection equipment, laser microscopes, and laser medical devices. The technology disclosed herein can be applied to devices in various fields that include these devices.

[0078] In a particular embodiment, the output module 30 includes a spatial light modulator (SLM) 60. For example, the SLM 60 includes a liquid crystal element, a digital mirror device (digital micro-mirror device (DMD)), a magneto-optical spatial light modulator (MOSLM), etc.

[0079] The time divider (time distributor, dynamic time divider, optical time divider, optical switch, optical shutter, dynamic switch, dynamic shutter, dynamic splitter, optical path switcher) 50 is controlled by the controller 40 and configured to divide the laser beam in time. Examples of time dividers 50 include polygonal mirror devices, galvanometer mirror devices, electro-optic modulators (EOM), acousto-optic modulators (AOM), vibrating devices, and other optical switching devices (liquid crystal switches, etc.). The time-divided beam can be selectively utilized. Furthermore, multiple time-divided beams can be combined, mixed, and / or converged. For example, a selectively extracted beam from the time divider 50 enters the output module 30. In one example, the time-divided beam is guided to multiple optical paths at predetermined spans along the time axis. Multiple time-divided beams (multiple distributed beams) are supplied to multiple paths respectively.

[0080] In a particular embodiment, the time divider 50 is controlled to be driven synchronously with the SLM 60 of the output module 30. For example, a time-divided beam corresponding to the driving timing of the SLM 60 is supplied to the SLM 60. For example, generally, the operating frequency (e.g., image update frequency) of the SLM 60 is lower than the repetition frequency of the pulse beam. The beams in the time-divided beams that correspond to the operating timing of the SLM 60 are selectively utilized. The remaining beams in the time-divided beams can be used for other purposes. In another embodiment, the time divider 50 may be controlled to be driven asynchronously with the SLM 60 of the output module 30.

[0081] In a particular embodiment, the laser beam system includes a plurality of laser sources 20. The number of laser sources 20 can be arbitrarily set. For example, the number of laser sources 20 can be 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20 or more. In one example, beams from the plurality of laser sources 20 are combined, mixed and / or converged via a predetermined device and enter a time divider 50. The beams from the plurality of laser sources 20 can still have relatively high energy values ​​even after being divided by the time divider 50. In another example, beams from the plurality of laser sources 20 enter the time divider 50 independently. In one example, beams from the plurality of pulsed laser sources 20 are set such that their pulse widths and peak values ​​(pulse waveforms, waveform profiles) are substantially the same. In another example, beams from the plurality of pulsed laser sources 20 are set such that at least one of their pulse widths and peak values ​​(pulse waveforms, waveform profiles) is different.

[0082] In configurations that combine multiple laser light sources 20 with an output module 30 having an SLM 60, improvements are made, for example, such as reduced laser beam energy loss, increased energy efficiency, appropriate control of laser beam output intensity, and / or suppression of speckle. In one example, a beam from a time divider 50 is supplied to the SLM 60 at an appropriate time. With the beam supplied to the SLM 60 at optimal timing, energy loss in the SLM 60 is reduced, and a high-energy beam (high-power beam) is output from the output module 30.

[0083] In a particular embodiment, the laser beam system includes multiple output modules 30. For example, a first time-divided beam is supplied to a first output module 30, and a second time-divided beam is supplied to a second output module 30. The number of output modules 30 can be arbitrarily set. For example, the number of output modules 30 can be 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 25, 30, 35, 40, 45, 50, or more.

[0084] In a particular embodiment, each of the multiple output modules 30 has an SLM 60. The multiple SLMs 60 are driven synchronously or asynchronously. In one example, the first SLM 60, the second SLM 60, the third SLM 60, and the fourth SLM 60 are driven at the same time corresponding to a certain time-segmented beam. In another example, the first SLM 60 and the second SLM 60 are driven at the same time corresponding to the first time-segmented beam, and the third SLM 60 and the fourth SLM 60 are driven at another time corresponding to the second time-segmented beam. In yet another example, the first SLM 60 is driven at the time corresponding to the first time-segmented beam, the second SLM 60 is driven at another time corresponding to the second time-segmented beam, the third SLM 60 is driven at yet another time corresponding to the third time-segmented beam, and the fourth SLM 60 is driven at yet another time corresponding to the fourth time-segmented beam.

[0085] In configurations that combine the time divider 50 with multiple SLMs 60, advantages include reduced laser beam energy loss, improved energy efficiency, appropriate control over laser beam output intensity, appropriate control over beam output timing, and / or appropriate control over the output beam waveform. In one example, the beam from the laser source 20 is guided to each of the multiple SLMs 60 in a manner corresponding to the respective drive timings of the multiple SLMs 60. Reducing the beam shielding period (the period during which the beam is not in use) helps improve energy efficiency, reduce light leakage, and / or avoid thermal effects.

[0086] In a particular embodiment, the laser beam system further includes a sub-splitter (time divider, dynamic time divider, optical time divider, optical switch, optical shutter, dynamic switch, dynamic shutter, dynamic splitter, optical path switcher) 70, optically disposed between the laser source 20 and the time divider 50, or optically disposed between the time divider 50 and the output module 30. The sub-splitter 70 includes a dynamic divider or a static divider, configured to separate the laser beam polarization, frequency, or time. A dynamic divider is a structure that separates or divides the laser beam as the divider is driven, while a static divider is a structure that separates or divides the laser beam without being driven by the divider. For example, the same as the time divider can be used as a dynamic divider. For example, examples of static dividers include polarization beam splitters, half mirrors, dichroic mirrors, and frequency splitters. In one example, the time divider 50 and the static divider 70 are sequentially arranged on the optical axis along the beam's direction of travel. In another example, the static divider 70 and the time divider 50, serving as sub-dividers, are sequentially arranged on the optical axis along the direction of the beam's travel. In yet another example, the time divider (pre-position, pre-stage time divider) 70 and the time divider (rear-position, post-stage time divider) 50 are sequentially arranged on the optical axis along the direction of the beam's travel. In one example, multiple time dividers 50 and 70 are combined. In another example, one time divider 50 is combined with multiple static dividers serving as sub-dividers 70. In yet another example, multiple time dividers 50 are combined with one static divider serving as a sub-divider 70. In yet another example, multiple time dividers 50 are combined with multiple static dividers serving as sub-dividers 70. The number of time dividers 50 and sub-dividers 70 can be arbitrarily set. For example, the total number of time dividers 50 and sub-dividers 70 can be 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20 or more.

[0087] In configurations that combine time divider 50 with a static divider as a sub-divider 70, for example, energy loss of the laser beam is reduced, energy efficiency is improved, the output intensity of the laser beam is appropriately controlled, the timing of beam output is appropriately controlled, and / or the waveform of the output beam is appropriately controlled. In one example, the number of beam divisions is increased and / or the beam is divided into multiple segments according to the wavelength range.

[0088] In configurations combining time divider (front position) 70 and time divider (rear position) 50, for example, energy loss of the laser beam is reduced, energy efficiency is improved, the output intensity of the laser beam is appropriately controlled, the timing of beam output is appropriately controlled, and / or the waveform of the output beam is appropriately controlled. In one example, the number of beam divisions is increased, and / or the use of unstable and / or undesirable regions in the time divider is avoided while suppressing energy loss.

[0089] In one example, during the first span on the time axis, the time-divided beam from the previous position time divider 70 enters the subsequent position time divider 50, allowing for the preferential and / or specifically preferred use of the stable and / or preferred regions of the subsequent position time divider 50. Conversely, during the second span on the time axis, the time-divided beam from the previous position time divider 70 substantially does not enter the subsequent position time divider 50, thus avoiding the use of the unstable and / or non-preferred regions of the subsequent position time divider 50. For example, by alternately supplying time-divided beams to the first and second subsequent position time dividers 50, the use of the unstable and / or non-preferred regions in the time dividers 50 can be avoided while utilizing the beams substantially continuously. In other words, each of the subsequent position time dividers 50 has a stable region (preferred region) and an unstable region (non-preferred region). The subsequent position time dividers 50 are driven in such a manner that the stable states during actuation are at different times. The time-divided beams from the ...

[0090] In a particular embodiment, the output module 30 has an optical fiber. The optical fiber is configured to receive multiple time-divided beams from the time divider 50 or the sub-divider 70. In one example, one optical fiber is provided for one output module 30. In another example, multiple optical fibers are provided for one output module 30. In the aforementioned example, multiple time-divided beams from multiple optical fibers are incident on one output module 30.

[0091] In a particular embodiment, the laser beam system has a plurality of output modules 30. Each of the plurality of output modules 30 includes an optical fiber. For example, a time-divided beam at a first timing is supplied to a first optical fiber, and a time-divided beam at a second timing is supplied to a second optical fiber. In one example, one optical fiber is provided for each of the plurality of output modules 30. In another example, multiple optical fibers are provided for each of the plurality of output modules 30. In the aforementioned example, multiple time-divided beams from the multiple optical fibers are incident on each of the plurality of output modules 30.

[0092] Figure 3 This is a diagram illustrating an example of the synthesis control of pulsed laser beams. Figure 4 This is a diagram illustrating an example of the synthesis control of a CW laser beam. Figure 5 and Figure 6 This is a diagram illustrating examples of output beams. In each example, the output power of the laser beam system is controlled.

[0093] In one example, multiple laser beams emitted from multiple light sources 20 are combined. Combining can be performed using an optical system including lenses, beam splitters, halvings, or mirrors. The combined laser beam is incident on a time divider 50, which guides the combined beam (the combined beam of the first pulse) corresponding to the first repetition timing to the first optical fiber 80. Figure 3 (b) Figure 4 (b)). The composite beam corresponding to the second repetition timing (the composite beam of the second pulse) is guided to the second optical fiber 80 via the time divider 50. Figure 3 (c) Figure 4 (c)). The composite beam corresponding to the third repetition timing (the composite beam of the third pulse) is guided to the third optical fiber 80 via the time divider 50. Figure 3 (d) Figure 4 (d)). The composite beam corresponding to the fourth repetition timing (the composite beam of the fourth pulse) is guided to the fourth optical fiber 80 via the time divider 50. Figure 3 of (e) Figure 4 (e)). The composite beam corresponding to the fifth repetition timing (the composite beam of the fifth pulse) is guided to the fifth optical fiber 80 via the time divider 50. Figure 3 of (f), Figure 4 (f)). The first repetition timing, the second repetition timing, the third repetition timing, the fourth repetition timing, and the fifth repetition timing are shifted sequentially. This guides the high-energy (high-power) composite beam to each fiber 80. For example, in the output module 30 with an SLM 60, the timing of the operation of the lower-speed SLM 60 is matched to guide the composite beam to the fiber 80.

[0094] In another example, by applying a combination of time division and synthesis, the output power can be controlled to be different among the multiple output modules 30. For example, a relatively high-energy (high-power) beam can be output from the first output module 30. Figure 5 (a)). A beam of intermediate energy (intermediate power) is output from the second output module 30. Figure 5 (b)). A relatively low-energy (low-power) beam is output from the third output module 30. Figure 5 (c)).

[0095] In yet another example, by applying a combination of time division and synthesis, the waveform of the output beam from one or more output modules 30 is appropriately controlled. Figure 6 of (a), Figure 6 (b)). And / or, the timing of beam output from one or more output modules 30 is properly controlled. Figure 6 (c)).

[0096] In a particular embodiment, a rotating device (rotary switch) is used as the time divider 50. The rotating device is controlled by the controller 40 to rotate, thereby dividing the laser beam in time.

[0097] In one example, a polygonal mirror device is used as a rotating device. Figure 7 The light beam from the laser source 20 is reflected by multiple reflecting surfaces 52 of the polygonal mirror 51, which serves as a time divider 50. Multiple output modules 30 each have an optical fiber 80 with an entrance. In the polygonal mirror device serving as the time divider 50, the light beam is divided in time according to the rotation angle of the polygonal mirror 51. Depending on the rotation angle of the polygonal mirror 51, the light beam reflected by the polygonal mirror 51 is directed toward any one of the entrances (incident surfaces) of the multiple optical fibers 80. That is, by rotating the polygonal mirror 51, the angle of the reflecting surface of the polygonal mirror 51 relative to the light beam changes, and the direction of the light beam reflected by the reflecting surface changes over time. Therefore, the light beam of the first pulse from the laser source 20 is incident on the first optical fiber, and the light beam of the second pulse is incident on a second optical fiber at a different position than the first optical fiber. Multiple optical fibers 80 can be configured for one polygonal mirror 51. The time-divided light beam from the polygonal mirror 51 is assigned to any one of the multiple optical fibers 80. In other words, the polygonal mirror 51 switches the optical fiber to which the light beam is to be incident. Furthermore, in other words, the polygonal mirror 51 switches the position of the optical path of the light beam. At least one lens 85 or 86 is configured between the polygonal mirror 51 and the optical fiber 80 as needed. Figure 8 For example, when the entrance (incident surface) of the fiber 80 is conjugate with the reflecting surface of the polygonal mirror 51, the deviation of the incident position of the beam relative to the fiber 80 (position deviation) is suppressed based on the rotation of the polygonal mirror 51. Furthermore, based on the rotation of the polygonal mirror 51, a small change in the incident angle of the beam relative to the fiber 80 is beneficial for speckle suppression. CW beams can also be used in this configuration instead of pulsed beams.

[0098] In another example, a circular plate-type optical switch is used as a rotating device. Figure 9In the plurality of circular plate-type optical switching devices that serve as time dividers 50, the light beam is divided in time according to the rotation angle of the rotating plate 55. For example, the light beam from the laser source 20 is reflected or transmitted through the optical surfaces 56 and 57 of the rotating plate 55, which serve as the plurality of optical switching devices of the time divider 50, according to the rotation angle of the rotating plate 55. Figure 9 (a)). The rotating plate 55 has optical surfaces (transmitting surfaces) 56 and reflecting surfaces 57 arranged in a circumferential direction. For example, a light beam passing through the rotating plate 55 is directed toward a first path "A", and a light beam reflected by the rotating plate 55 is directed toward a second path "B". Figure 10 Additionally, for example, the beam from the laser source 20 is reflected in different directions at the optical surfaces 56 and 57 of the rotating plate 55, which serve as multiple optical switching devices in the time divider 50, depending on the rotation angle of the rotating plate 55. Figure 9 (b)). The rotating plate 55 has optical surfaces (first reflecting surface) 56 and optical surfaces (second reflecting surface) 57 that are oriented towards different directions. For example, a light beam reflected from the optical surface (first reflecting surface) 56 of the rotating plate 55 is directed towards a first path "A", and a light beam reflected from the optical surface (second reflecting surface) 57 of the rotating plate 55 is directed towards a second path "B". In addition, for example, a light beam from the laser source 20 is reflected at different height positions of the rotating plate 55 depending on the rotation angle of the rotating plate 55. Figure 9 (c) The rotating plate 55 has an optical surface (first reflecting surface) 56 and an optical surface (second reflecting surface) 57 at different heights along the rotation axis. For example, a light beam reflected from the optical surface (first reflecting surface) 56 of the rotating plate 55 is directed toward a first path "A", while a light beam passing through the optical surface (first reflecting surface) 56 and reflected from the optical surface (second reflecting surface) 57 is directed toward a second path "B". Furthermore, the number of beam divisions in the plurality of rotary optical switching devices that serve as the time divider 50 is not limited to 2. The number of divisions can be 3, 4, 5, 6, 7, 8, 9, 10 or more. For example, the rotating plate 55 may have three or more reflecting surfaces with different orientations.

[0099] In a specific embodiment, the circular plate-type optical switch device is used as a sub-divider (dynamic time divider) 70, and the polygonal mirror device is used as a time divider (dynamic time divider) 50. Figure 11In this configuration, the use of the corners of the polygonal mirror 51, which serve as unstable and / or non-preferred regions 59, can be avoided. For example, in the first span on the time axis, a light beam from the optical switching device, which acts as a sub-segmenter 70, travels via path "A" towards a first position within the reflecting surface 52 of the polygonal mirror device, which acts as a time divider 50, and is preferentially and / or specifically and / or preferentially reflected and time-divided by the stable region 58 of the polygonal mirror 51 (reflecting surface 52A). In the second span on the time axis, a light beam from the optical switching device, which acts as a sub-segmenter 70, travels via path "B" towards a reflecting surface 52B, which is different from the reflecting surface 52A of the polygonal mirror device, which acts as a time divider 50, and is preferentially and / or preferably reflected and time-divided by the stable region 58 of the polygonal mirror 51 (reflecting surface 52B). Light beams are supplied alternately to the reflecting surfaces 52A and 52B of the polygonal mirror 51. In the first time span, the beam does not enter the reflecting surface 52B, thus avoiding the use of the unstable region (corner portion) 59 of the polygonal mirror 51 (reflecting surface 52A), that is, the portion (boundary portion) where the reflecting surfaces of the polygonal mirror 51 intersect. In the second time span, the beam does not enter the reflecting surface 52A, thus avoiding the use of the unstable region (corner portion) 59 of the polygonal mirror 51 (reflecting surface 52B). By distributing the time-divided beam, the use of the unstable region in the polygonal mirror 51 (time divider 50) can be avoided while utilizing the beam substantially continuously. Details regarding the avoidance of the use of the unstable region in the polygonal mirror 51 (time divider 50) will be described later. Furthermore, reflecting surfaces 52A and 52B change over time due to the rotation of the polygonal mirror 51. That is, reflecting surface 52A is the surface of the polygonal mirror device that serves as the time divider 50, where the beam is incident via path "A". In addition, the reflecting surface 52B is the surface of the polygonal mirror device that serves as the time divider 50, which is incident on the beam via path "B".

[0100] In a specific implementation, an electro-optic modulator (EOM, EO) is used as the time divider 50, and a polarization beam splitter (PBS) is used as the sub-divider (static divider) 70. Figure 12 In one example, the EOM (Electronic Optical Array) serving as time divider 50 and the PBS (Pulse Filter) serving as sub-divider 70 are sequentially arranged on the optical axis along the direction of beam travel. In this configuration, the beam from the EOM (Electronic Optical Array) serving as time divider 50 is split into multiple beams according to wavelength range by the PBS (Pulse Filter) serving as sub-divider 70. For example, the p-polarized beam from the time-divided beam from the EOM (Electronic Optical Array) serving as time divider 50 passes through the PBS (Pulse Filter) serving as sub-divider 70. The s-polarized beam from the time-divided beam from the EOM (Electronic Optical Array) serving as time divider 50 is reflected by the PBS (Pulse Filter) serving as sub-divider 70.

[0101] In a specific implementation, an electro-optic modulator (EOM, EO) is used as a sub-splitter (dynamic time divider) 70, a polarization beam splitter (PBS) is used as a sub-splitter (static divider) 70, and multiple polygonal mirror devices are used as time dividers 50. Figure 13 Multiple polygonal mirror devices, including polygonal mirrors 51A and 51B, are arranged in a side-by-side position relative to the optical path. In one example, along the direction of beam travel, the EOM (Electronic Oscillator) as a sub-splitter 70, the PBS (Polymer Surface Photometer) as a sub-splitter 70, and the polygonal mirror device as a time divider 50 are sequentially arranged on the optical axis. In this configuration, the beam from the EOM (Electronic Oscillator) as a sub-splitter 70 is branched by the PBS (Polymer Surface Photometer) as a sub-splitter 70 according to the wavelength range. The p-polarized beam transmitted through the PBS (Polymer Surface Photometer 70) is time-divided by the first polygonal mirror 51A, and the s-polarized beam reflected by the PBS (Polymer Surface Photometer 70) is time-divided by the second polygonal mirror 51B.

[0102] In a particular embodiment, the laser beam system further includes an aperture device 90, which is optically disposed between the time divider 50 (or sub-divider 70) and the optical fiber 80 (or output module 30). Figure 14 The aperture device 90 has an aperture 91, the area of ​​which the light beam passes through is controlled by the controller 40. The aperture 91 has multiple openings. In this configuration, for example, in a light beam from the time divider 50, the light beam passing through the first opening of the aperture 91 enters the first optical fiber as a first time-divided beam, and the light beam passing through the second opening enters the second optical fiber as a second time-divided beam. Furthermore, the light intensity of each time-divided beam is adjusted by controlling the opening area of ​​the aperture 91. This configuration is preferably applicable to beams such as CW laser beams with relatively long emission times.

[0103] In one embodiment, the laser beam system is applied to a photolithography system used to manufacture devices (electronic devices or microdevices) such as semiconductor elements, liquid crystal display elements, and organic EL elements. In one example, a batch exposure type exposure apparatus such as a stepper or a scanning exposure type exposure apparatus such as a scanning stepper is used. For example, in the exposure apparatus, a predetermined pattern is formed on each exposure area of ​​a substrate such as a wafer or glass plate via a projection optics system.

[0104] In one example of an exposure apparatus, a pattern formed on a mask (or reticle) held on a mask stage is transferred to a substrate by exposure light from a projection optics system.

[0105] In another example of an exposure device, spatial light modulators (SLMs) are used instead of masks to generate variable patterns on the object surface of the projection optics system (maskless exposure device).

[0106] At least a portion of the structure of various exposure apparatuses may be referenced in this specification, for example, in the disclosures of US2009 / 0117494A1, US2010 / 0099049A1, US2013 / 0222781A1, US2013 / 0278912A1, US2013 / 0314683A1, US2014 / 0320835A1, US2015 / 0077732A1, and US6552775B1.

[0107] In certain embodiments, the laser beam system can be applied to an exposure apparatus that serves as a photography system for manufacturing flat panel displays (liquid crystal display devices, organic EL display devices, etc.).

[0108] Figure 15 and Figure 16 This is a schematic diagram illustrating the structure of one embodiment of the maskless exposure apparatus 1000. The exposure apparatus 1000 includes: a light source module 1100 including a laser light source 20; a distribution module (combination-distribution module) 1200 including a time divider 50 and a sub-divider 70; an illumination system 1300 including an output module (including an optical fiber 80, an illumination optics system (illumination system) 1310, an SLM 60, and a projection optics system (projection lens 1330)) 30; a substrate stage 1400 for mounting a substrate (workpiece) 1410; and a control system 1500 including a controller 40 and a data transmission unit.

[0109] exist Figure 15 and Figure 16In this process, the light source module 1100 emits a laser beam as light energy. The beam from the light source module 1100 is incident on the illumination optics system 1310 via the distribution module 1200. The beam from the illumination optics system 1310 illuminates the SLM 60. The controller 40 generates pattern data based on the exposure pattern to be formed on the substrate 1410. The controller 40 sends the pattern data to the SLM 60 and controls the SLM 60. The SLM 60, controlled by the controller 40, guides the beam from the illumination system onto the substrate 1410 based on the pattern data (also referred to as image data or image). The projection lens 1330 projects the beam from the SLM 60 onto the substrate 1410, imaging a predetermined area on the substrate 1410. Furthermore, when an exposure pattern is formed on the substrate 1410 by multiple SLMs 60, the controller 40 divides the generated pattern data into portions for each SLM 60 and sends the divided pattern data to each SLM 60.

[0110] In an exposure apparatus using a scanning method with a substrate light source (SLM), a laser beam is emitted during the movement of a substrate stage 1400 on which the substrate is placed. The laser beam is guided to the SLM by an illumination optics system 1310. The image to be formed on the SLM is preferably exposed by a single emission of the laser beam. If the image to be formed on the SLM is exposed by two or more emission cycles of the laser beam, the same pattern data is projected onto the substrate with each emission. The substrate 1410 also moves between laser beam emission cycles via the substrate stage 1400; therefore, if the same pattern data is projected onto the substrate, the exposure appears as if it is flowing. If the scanning speed is increased to improve throughput, the distance between laser beam emission cycles becomes longer, resulting in a more flowing image. To increase the scanning speed while minimizing image flow, the single emission time must be shortened. With a short single emission time, the energy of the laser beam irradiating the substrate 1410 via the SLM is lower, resulting in insufficient exposure energy and the possibility of poor exposure (poor photosensitivity). Generally, the operating frequency of an SLM (e.g., image update frequency) is lower than the emission repetition frequency (oscillation frequency) of the laser beam, for example, several kHz to tens of kHz. Figure 17 In the comparative example, the laser beam was 50 kHz (10 W), and the SLM was 10 kHz. For example... Figure 17 and Figure 18 As shown in the comparative example (a), to prevent image flow, a high-energy light source with a low-frequency oscillation frequency that does not cause poor exposure is ideal. However, if wavelength is also taken into consideration, the current selection of laser light sources is extremely limited. The stated values ​​are examples, and the invention is not limited thereto.

[0111] In one embodiment, as in the preceding... Figure 3 and Figure 4 As explained, by combining and time-dividing multiple beams, low-frequency, high-energy beam output can be achieved. Figure 18 In example (b), the distribution module 1200 synthesizes and time-divides beams from five light sources 20. Beams transmitted from the five light sources at a frequency of 50 kHz are synthesized into a high-energy beam. The synthesized beam (50 kHz, high energy) is time-divided by the distribution module 1200 and guided to five SLMs 60 (and five projection lenses 1330). Therefore, the high-energy beam reaches each of the first to fifth SLMs at a frequency of 10 kHz. Furthermore, in Figure 18 Comparative examples of (a) and Figure 18 In example (b), both use a 50W light source across five modules. Furthermore, in... Figure 17 In the comparative example, the laser beam is 50 kHz (10 W), and the SLM is 10 kHz. Therefore, the light is distributed (assigned, switched) to five SLMs by the distribution module 1200. The oscillation frequency of the laser beam is preferably an integer multiple of the image update frequency of the SLMs. In other words, the distribution module 1200 distributes the laser beam to an integer multiple of the stated number of SLMs. This value is an example, and the invention is not limited thereto.

[0112] In one example, the intensity (e.g., pulse energy, average power) E2 of the laser beam illuminating an SLM is equal to or greater than the intensity (e.g., pulse energy, average power) E1 of the laser beam emitted from a laser source. For example, E2 / E1 can be approximately 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 25, 30, 35, 40, 45, 50, 100 or more. Additionally, the frequency (illumination frequency) F2 of the beam illuminating an SLM or the image update frequency F3 of the SLM is lower than the emission repetition frequency (oscillation frequency, source frequency) F1 of the laser source. For example, F2 / F1 (or F3 / F1) can be about 1 / 2, 1 / 3, 1 / 4, 1 / 5, 1 / 6, 1 / 7, 1 / 8, 1 / 9, 1 / 10, 1 / 11, 1 / 12, 1 / 13, 1 / 14, 1 / 15, 1 / 16, 1 / 17, 1 / 18, 1 / 19, 1 / 20, 1 / 25, 1 / 30, 1 / 35, 1 / 40, 1 / 45, 1 / 50, 1 / 100 or less.

[0113] Instead, the combination of multiple beams and time division is as follows: Figure 19 As shown, it can also be applied to systems that do not have an SLM (e.g., exposure devices). Figure 19In the example (exposure apparatus 1000), multiple time-divided beams (multiple assigned beams) are generated for each specified span on the time axis. A relatively low-frequency, high-energy beam is supplied to each of the multiple output modules 30.

[0114] As mentioned above, the number of output modules 30 (the number of allocations) can be arbitrarily set. Figure 20 In this example, the distribution module 1200 synthesizes and time-divides beams from four light sources 20. The time-divided beams are then supplied to four SLM60s (output modules 30).

[0115] exist Figure 21 In the example, the linewidth of the pattern is 2 μm, and the scanning speed is 400 mm / s. For example, when the linewidth of the pattern is allowed to be 10%, the required emission time is within 0.5 μs. The stated values ​​are examples, and the invention is not limited thereto.

[0116] exist Figure 22 In the comparative example (a), the SLM's operating frequency (image update frequency) is 10 kHz. In comparison with... Figure 21 In the same specification example, 10kHz corresponds to 100μs. In a CW light source, when the required emission time is 0.5μs, if the SLM is illuminated after 0.5μs, the same projected image is formed on the moving substrate 1410 because the image on the SLM is not updated, as described above, as if the image is flowing. To prevent image flow, the SLM is not illuminated from 0.5μs until the next update of the image on the SLM, for example, by blocking the light beam in the optical path from the CW light source to the SLM. In this case, the time from 0.5μs until the next update of the image on the SLM is essentially a rest time. In the comparative example, the substrate 1410 is exposed with only 1 / 200th of the energy from the light source.

[0117] Similarly, in Figure 22 In the comparative example (b), the operating frequency (image update frequency) of the SLM is 10 kHz. Only the beam from the pulsed light source that is synchronized with the pulsed light source can be used. In this comparative example, when the light source frequency is 400 kHz, the SLM operating frequency / light source frequency = 1 / 40, utilizing only 1 / 40 of the energy from the light source. That is, only one of the 40 pulses from the pulsed light source oscillates on the SLM; in other words, 39 pulses do not illuminate the SLM, and these 39 pulses do not contribute to the exposure of the substrate 1410. Therefore, in Figure 22 In the comparative examples (a) and (b), insufficient exposure energy may result in poor exposure (poor photosensitivity). The values ​​stated are examples, and the invention is not limited thereto.

[0118] exist Figure 23 In this example, a time-divided beam from the distribution module 1200 is guided along a non-scanning direction (non-scanning direction, Y direction) that intersects the scanning direction (scanning direction, X direction) in which the substrate 1410 moves during exposure to a plurality of SLMs 60 (projection lenses 1330), including a first SLM, a second SLM, and a third SLM. The first SLM, second SLM, and third SLM are arranged along the non-scanning direction that intersects the scanning direction in which the substrate 1410 moves during exposure. The timing of the beam irradiating the second SLM differs from the timing of the beam irradiating the first SLM. Similarly, the timing of the third SLM differs from the timing of the first and second SLMs. For example, the irradiation timings of the plurality of SLMs 60 are sequentially shifted in time. Thus, by using the beam from the distribution module 1200... Figure 22 The energy of the light source that does not contribute to exposure, as shown in the comparative examples (a) and (b), is distributed to different SLMs so that the substrate 1410 can be exposed.

[0119] like Figure 24 As shown, in an exposure apparatus, when the illumination times of multiple SLMs differ, the images on the SLMs are updated at the same time, and the patterned projection position (exposure position) may shift according to the difference in the timing of the beam illumination. For example, compared to the first pulse corresponding to the first SLM (SLM(1)), the projection position of the second pulse corresponding to the second SLM (SLM(2)) is shifted in the scanning direction. In addition, compared to the second pulse corresponding to the second SLM (SLM(2)), the projection position of the third pulse corresponding to the third SLM (SLM(3)) is further shifted in the scanning direction.

[0120] like Figure 25 As shown, by mechanically and / or optically adjusting the exposure apparatus, deviations in the projection position (exposure position) of the pattern are compensated even when the illumination timings differ among multiple SLMs. In one example, based on the deviations in the illumination timings of the multiple SLMs, the shape, mounting position, and / or orientation of the multiple SLMs are mechanically set so that the projected images from the multiple SLMs are in a predetermined positional relationship. Alternatively and / or additionally, the exposure apparatus is optically set so that the projected images from the multiple SLMs are in a predetermined positional relationship based on the deviations in the illumination timings of the multiple SLMs. For example, the position of the projected image on the substrate 1410 is moved by adjusting the optical elements within the projection optics system (projection lens 1330), or the position of the projected image on the substrate 1410 is moved by moving the SLMs relative to the beam.

[0121] like Figure 26As shown, by adjusting the pattern drawing data supplied to multiple SLMs, deviations in the projection position (exposure position) of the pattern can be compensated even when the illumination timings differ among the multiple SLMs. For example, data corresponding to the projection positions that are sequentially displaced along the scanning direction are supplied to the multiple SLMs respectively. In one example, based on the deviations in the illumination timings of the multiple SLMs, at least a portion of the pattern data is corrected so that the projected images from the multiple SLMs are in a predetermined positional relationship. For example, the pattern data supplied to at least one of the multiple SLMs includes correction data that is displaced in a predetermined direction relative to a reference position, based on the different illumination timings. Alternatively and / or additionally, the pattern data may also determine the amount of displacement in a predetermined direction relative to a reference position based on at least one of the following: the moving speed of the substrate stage 1400, the display update frequency of the SLM, the oscillation frequency of the laser beam, the rotation speed of the polygonal mirror device (rotating device) as the time divider 50, and the number of SLMs 60 (projection lenses 1330).

[0122] like Figure 27 As shown, in an exposure apparatus that exposes a pattern on substrate 1410 by switching the scanning direction (e.g., the movement direction of the substrate stage) between the + and - directions (between one direction and its opposite direction), the pattern data supplied to multiple SLMs can be adjusted according to the scanning direction at the corresponding time. For example, the pattern data supplied to at least one of the multiple SLMs includes first correction data of displacement in the + direction relative to the reference position in the scanning direction, and second correction data of displacement in the - direction relative to the reference position in the scanning direction.

[0123] Alternatively and / or additionally, in an exposure apparatus where the scanning direction (e.g., the direction of movement of the substrate stage) switches between a + direction and a - direction (between a direction and its opposite direction), the exposure apparatus can be mechanically and / or optically adjusted at each point in time the scanning direction is switched.

[0124] like Figure 28 As shown, the exposure apparatus (optical device) 1000 may include a drive mechanism 1510 for mechanical adjustment and a drive mechanism 1520 for optical adjustment. Additionally, the exposure apparatus 1000 may include a database 1530 (or storage unit) storing setting parameters and / or programs for data correction. This displacement adjustment may be performed, for example, based on the output of a reference system 1540 including a reference sensor. Furthermore, when the SLM is mounted to the exposure apparatus 1000, if the mounting position is pre-offset, the drive mechanism 1510 may be omitted. However, even if the SLM's mounting position is pre-offset, the drive mechanism 1510 may be used to compensate for mounting errors.

[0125] In one example of an exposure apparatus 1000 where the timing of beam illumination differs among multiple SLMs, the control system 1500 can control at least one of the following based on the respective illumination timings of the multiple SLMs: (a-1) mechanical adjustment of the exposure apparatus 1000 using the drive mechanism 1510, (a-2) optical adjustment of the exposure apparatus 1000 using the drive mechanism 1520, and (a-3) correction of pattern data using the database 1530. For example, a displacement adjustment combining all of (a-1), (a-2), and (a-3) can be performed. Alternatively, a displacement adjustment based on one or a combination of two of (a-1), (a-2), and (a-3) can be performed. In one example, correction of the pattern data is suitable for larger and / or coarser displacement adjustments, while mechanical and / or optical adjustments are suitable for smaller and / or finer displacement adjustments. In another example, methods different from those described can be applied.

[0126] Alternatively and / or additionally, the displacement adjustment can be performed based on the timing of the beam's use. Even during a specified period when the beam is not used (e.g., when no pulse is used), the displacement adjustment compensates for deviations in the pattern's projection position (exposure position). For example, deviations in the pattern's projection position are avoided while selectively using a stable beam during periods of instability.

[0127] In one implementation, such as Figure 29 As shown, the exposure apparatus 1000 includes: a plurality of laser light sources 20; a plurality of output modules 30 having a plurality of SLMs 60; and a polygonal mirror device (rotating device) configured between the plurality of laser light sources 20 and the output modules 30, which serves as a time divider 50 to time-divide and synthesize laser beams emitted from the plurality of laser light sources 20. The beams from the laser light sources 20 are reflected by a plurality of reflecting surfaces 52 of a polygonal mirror 51 in the polygonal mirror device serving as the time divider 50. The beams are time-divided according to the rotation angle of the polygonal mirror 51. According to the rotation angle of the polygonal mirror 51, the beams reflected by the polygonal mirror 51 are distributed to a plurality of SLMs 60 via a plurality of optical fibers 80. In one example, the time-divided beams from the polygonal mirror 51 are distributed to five SLMs 60. For example, beams corresponding to the first pulse, the sixth pulse, etc., are incident on the first SLM. Beams corresponding to the second pulse, the seventh pulse, etc., are incident on the second SLM.

[0128] In one implementation, such as Figure 30As shown, the exposure apparatus 1000 includes: a plurality of laser light sources 20; a plurality of output modules 30 having a plurality of SLMs 60; a polygonal mirror device (rotating device) configured as a time divider 50, disposed between the plurality of laser light sources 20 and the plurality of output modules 30, which divides and combines laser beams emitted from the plurality of laser light sources 20 in time; and an optical switch device configured as a sub-divider 70, disposed between the plurality of laser light sources 20 and the polygonal mirror device as the time divider 50. In one example, in a first span on the time axis, the light beam from the optical switch device as the sub-divider 70 is directed via path "A" towards a first position of the polygonal mirror device as the time divider 50 and reflected at the polygonal mirror 51 (reflecting surface 52A). In a second span on the time axis, the light beam from the optical switch device as the sub-divider 70 is directed via path "B" towards a second position of the polygonal mirror device as the time divider 50 and reflected at the polygonal mirror 51 (reflecting surface 52B). The light beam is supplied alternately to the first and second positions of the polygonal mirror 51. Based on the rotation angle of the polygonal mirror 51, the light beam is further divided in time. That is, in this example, two time dividers are arranged in series along the optical path, and the light beam is divided into two segments in time. In one example, the time-divided light beam from the polygonal mirror 51 is assigned to ten SLMs 60. For example, the light beams corresponding to the first pulse, the eleventh pulse, etc., are incident on the first SLM. The light beams corresponding to the second pulse, the twelfth pulse, etc., are incident on the second SLM. In other words, the light beam reflected by the reflecting surface 52A of the polygonal mirror 51 is guided to the first SLM group ( Figure 30 From the first SLM to the fifth SLM, the beam reflected by reflector 52B is guided to the second SLM group ( Figure 30 (From the sixth SLM to the tenth SLM).

[0129] In one implementation, such as Figure 31As shown, the exposure apparatus 1000 includes: a plurality of laser light sources 20; a plurality of output modules 30 having a plurality of SLMs 60; a plurality of polygonal mirror devices (rotating devices) 50 disposed between the plurality of laser light sources 20 and the plurality of output modules 30, serving as time dividers for the laser beams emitted from and combined from the plurality of laser light sources 20; and an optical switch device 70 disposed between the plurality of laser light sources 20 and the plurality of polygonal mirror devices serving as time dividers 50. The plurality of polygonal mirrors 51A, 51B serving as time dividers 50 are arranged in a side-by-side position relative to the optical path. In one example, in a first span on the time axis, the light beam from the optical switch device serving as the sub-divider 70 is directed toward the polygonal mirror 51A and reflected by the reflective surface of the polygonal mirror 51A. In a second span on the time axis, the light beam from the optical switch device serving as the sub-divider 70 is directed toward the polygonal mirror 51B and reflected by the reflective surface of the polygonal mirror 51B. Based on the rotation angles of polygonal mirrors 51A and 51B, the light beam is further divided in time. In one example, the time-divided beam from polygonal mirror 51A is assigned to five SLMs 60. The time-divided beam from polygonal mirror 51B is assigned to another five SLMs 60. For example, the beams corresponding to the first pulse, eleventh pulse, etc., are incident on the first SLM. The beams corresponding to the sixth pulse, sixteenth pulse, etc., are incident on the sixth SLM. In other words, the beam reflected by polygonal mirror 51A is guided to the first group of SLMs ( Figure 31 From the first SLM to the fifth SLM, the beam reflected by the polygonal mirror 51B is guided to the second SLM group ( Figure 30 (From the sixth SLM to the tenth SLM).

[0130] In one implementation, such as Figure 32As shown, the exposure apparatus 1000 includes: a plurality of laser light sources 20; a plurality of output modules 30 having a plurality of SLMs 60; a plurality of optical switching devices acting as time dividers 50, disposed between the plurality of laser light sources 20 and the plurality of output modules 30, which time-divide and combine laser beams emitted from the plurality of laser light sources 20; and an optical switching device acting as a sub-divider 70, disposed between the plurality of laser light sources 20 and the plurality of optical switching devices acting as time dividers 50. The plurality of optical components 55A, 55B, and 55C of the plurality of optical switching devices acting as time dividers 50 are arranged in a side-by-side position relative to the optical path. In one example, in a first span on the time axis, the beam from the optical switching device acting as a sub-divider 70 is directed toward optical component 55A and time-divided by optical component 55A. In a second span on the time axis, the beam from the optical switching device acting as a sub-divider 70 is directed toward optical component 55B and time-divided by optical component 55B. In the third span on the time axis, the light beam from the optical switching device, which acts as a sub-splitter 70, is directed toward the optical component 55C and time-divided by the optical component 55C. In one example, the time-divided beam from the optical component 55A is assigned to three SLMs 60. The time-divided beam from the optical component 55B is assigned to another three SLMs 60. The time-divided beam from the optical component 55C is further assigned to another three SLMs 60. For example, the beams corresponding to the first pulse, the tenth pulse, etc., are incident on the first SLM. The beams corresponding to the fourth pulse, the thirteenth pulse, etc., are incident on the fourth SLM. The beams corresponding to the seventh pulse, the sixteenth pulse, etc., are incident on the seventh SLM. In other words, the beam time-divided by the optical component 55A is guided to the first SLM group ( Figure 32 From the first SLM to the third SLM, the time-divided beam by optical component 55B is guided to the second SLM group ( Figure 32 From the fourth to the sixth SLM, the beam, time-divided by optical component 55C, is guided to the third SLM group ( Figure 32 (From the seventh SLM to the ninth SLM).

[0131] In one implementation, such as Figure 33As shown, the exposure apparatus 1000 includes: a laser source 20; a plurality of SLMs 60; a plurality of polygonal mirrors 51A, 51B, and 51C serving as time dividers 50, disposed between the laser source 20 and the plurality of SLMs 60; and a plurality of optical switching devices (optical components 75A and 75B) serving as sub-dividers, disposed between the laser source 20 and the plurality of polygonal mirrors 51A, 51B, and 51C. For example, optical components 75A and 75B are rotating plates with reflective and transmittance regions arranged in a circumferential direction. In one example, in a first span on the time axis, the light beam reflected by optical component 75A is directed toward polygonal mirror 51A and reflected by the reflective surface of polygonal mirror 51A. In a second span on the time axis, the light beam transmitted through optical component 75A and reflected by optical component 75B is directed toward polygonal mirror 51B and reflected by the reflective surface of polygonal mirror 51B. In the third span on the time axis, the light beam passing through optical component 75B is directed toward polygonal mirror 51C and reflected by the reflecting surface of polygonal mirror 51C. Based on the rotation angles of polygonal mirrors 51A, 51B, and 51C, the light beam is further divided in time. Based on the rotation of polygonal mirrors 51A-51C, the minute change in the incident angle of the light beam is beneficial for suppressing speckle.

[0132] In one implementation, such as Figure 34 As shown, the exposure apparatus 1000 includes: a plurality of laser light sources 20; a plurality of SLMs 60; a plurality of polygonal mirrors 51A, 51B, 51C, 51D, 51E, and 51F acting as time dividers 50, disposed between the plurality of laser light sources 20 and the plurality of SLMs 60; and a plurality of optical switching devices (optical components 75A, 75B, 75C, 75D, 75E, and 75F) acting as sub-dividers, disposed between the plurality of laser light sources 20 and the plurality of polygonal mirrors 51A-51F. For example, optical components 75A-75F are AOMs (acousto-optic modulators). In one example, in a first span on the time axis, the beam branched by optical component 75C is directed toward polygonal mirror 51C, and the beam branched by optical component 75F is directed toward polygonal mirror 51F. In the second span on the time axis, the beam branched by optical component 75B is directed toward polygonal mirror 51B, and the beam branched by optical component 75E is directed toward polygonal mirror 51E. In the third span on the time axis, the beam branched by optical component 75A is directed toward polygonal mirror 51A, and the beam branched by optical component 75D is directed toward polygonal mirror 51D. The beam is further divided in time according to the rotation angle of polygonal mirrors 51A-51F. Based on the rotation of polygonal mirrors 51A-51F, the small change in the incident angle of the beam is beneficial for speckle suppression.

[0133] exist Figure 35 In the example shown, the substrate 1410 is sequentially exposed using light beams from multiple output modules according to the timing of pulsed emission. That is, multiple patterns are sequentially projected onto the substrate 1410 based on light beams from multiple output modules (1, 2, 3, ..., n) according to the timing of pulsed emission.

[0134] In one implementation, such as Figure 36 As shown, the exposure apparatus 1000 includes a master clock (an oscillator that generates the master clock) 4010 as a reference for synchronization. Figure 36 In the exposure apparatus 1000, at least the laser light source 20, time divider (e.g., polygonal mirror device) 50, sub-divider (e.g., optical switch device) 70, SLM (e.g., DMD) 60, and substrate stage 1400 are driven with reference to the master clock 4010. Figure 37 As shown, origin sensors 4020 are set in each device as needed.

[0135] For example, in Figure 37 In this system, the control system 1500 acquires information related to the rotation of the polygonal mirror 51 based on the output data from the origin sensor 4020. The control system 1500 can control each device based on information from each device and information from the master clock 4010.

[0136] like Figure 38 As shown, the control system 1500 adjusts the rotational speed of the polygonal mirror 51 based on its rotational information to match the clock frequency of the master clock 4010. Furthermore, the control system 1500 adjusts the phase of the polygonal mirror 51 to match the timing of the master clock 4010. As a result, the polygonal mirror 51 is rotated synchronously with the master clock 4010. Regarding the sub-splitter (which serves as the optical switching device of the sub-splitter 70)... Figure 36 It can also be adjusted in the same way.

[0137] Furthermore, the control system 1500 can control the trigger signal for the start of image display in the SLM 60 based on the master clock 4010, that is, it can control the image update frequency. The control system 1500 can also control the operation of the substrate stage 1400 supporting the substrate based on the master clock 4010. Additionally, the control system 1500 can control the operation of the SLM stage 1430 supporting the SLM 60 to eliminate positional deviations from the substrate stage 1400. By operating the SLM stage 1430, the position of the projected image projected onto the substrate 1410 can be moved as described above. Figure 39As shown, by referring to the master clock 4010, the running time of each device is appropriately adjusted, and the relationship between the running times of multiple devices is appropriately set.

[0138] Here, in the time divider 50 and sub-divider 70, if the light beam is incident on the boundary portion of the multiple regions set up for time division, there is a possibility that the emitted light beam becomes unstable. For example, in the previous... Figure 9 In the rotating plate 55 shown in (b), if the light beam is incident on the top or bottom of the boundary portion between the optical surface (first reflecting surface) 56 and the optical surface (second reflecting surface) 57, there is a possibility that the reflected light beam will be scattered or the direction of the light beam will be disordered.

[0139] like Figure 40 As shown, by appropriately controlling the rotation of the rotating plate 55 according to the oscillation timing of the laser source 20, the beam can be prevented from incident on the boundary portion between the optical surface (first reflecting surface) 56 and the optical surface (second reflecting surface) 57 of the rotating plate 55. For example, the rotation of the rotating plate 55 is controlled at the timing between the (n+1)th pulse and the (n+2)th pulse, so that the optical boundary (topmost or bottommost) of the rotating plate 55 is located at the target illumination position of the beam. As a result, the utilization efficiency of the beam is improved.

[0140] Alternatively and / or additionally, the optical boundaries used for segmentation in time divider 50 (or sub-divider 70) can be processed differently than those in other areas. In one example, such as Figure 41 As shown, additional processing is performed near the boundary (near the bottom) between the optical surface (first reflecting surface) 56 and the optical surface (second reflecting surface) 57 of the rotating plate 55. For example, relatively high-precision additional processing is performed near the boundary of the rotating plate 55. Based on the high surface accuracy of the region near the optical boundary, the utilization efficiency of the beam is improved.

[0141] exist Figure 41 In the example, steps 55a and 55b, which serve as additional processing marks, are formed near the boundary (near the bottom) between the optical surface (first reflecting surface) 56 and the optical surface (second reflecting surface) 57 of the rotating plate 55. By appropriately controlling the rotation of the rotating plate 55 according to the oscillation timing of the laser source 20, the beam can be prevented from incident on the steps 55a and 55b of the rotating plate 55. For example, the rotation of the rotating plate 55 is controlled between the (n)th pulse and the (n+1)th pulse, so that the step 55a of the rotating plate 55 is located at the target irradiation position of the beam. Similarly, the rotation of the rotating plate 55 is controlled between the (n+2)th pulse and the (n+3)th pulse, so that the step 55b of the rotating plate 55 is located at the target irradiation position of the beam.

[0142] In one embodiment, the exposure apparatus (exposure apparatus 1000) for exposing a predetermined pattern on a substrate includes: a light source (laser light source 20); a spatial light modulator (SLM 60) for spatially modulating light from the light source (laser light source 20) based on pattern data describing the predetermined pattern; a projection optics system (projection lens 1330) for projecting a projected image of the spatially modulated light onto the substrate; and a light path switcher (time divider 50, sub-divider 70) for switching the light paths of the light sequentially oscillating from the light source (laser light source 20) and guiding them sequentially to the plurality of spatial light modulators (SLMs). The optical path of the light is switched in a manner described in 60), and the optical path switcher (time divider 50, sub-divider 70) includes a first switcher (sub-divider 70) and a second switcher (time divider 50). The first switcher (sub-divider 70) switches the optical path to either a first optical path or a second optical path. The second switcher (time divider 50) switches the light guided to the first optical path to a first group of spatial optical modulators (SLM60) among a plurality of spatial optical modulators, and switches the light guided to the second optical path to a second group of spatial optical modulators (SLM60) among a plurality of spatial optical modulators, respectively guiding the light.

[0143] In one example, the first switcher (sub-splitter 70) includes: a first region for guiding light oscillating from the light source (laser source 20) during a first period to the first optical path; and a second region for guiding light oscillating from the light source (laser source 20) during a second period different from the first period to the second optical path.

[0144] For example, the first region reflects the light, while the second region transmits the light.

[0145] For example, the first region is tilted at a first angle relative to the light, reflecting the light and guiding it to the first optical path, and the second region is tilted at a second angle relative to the light, different from the first angle, reflecting the light and guiding it to the second optical path.

[0146] In another example, the second switcher (time divider 50) has a first reflective surface (reflective surface 52A) that reflects the light toward the first group of spatial light modulators (SLM 60), and a second reflective surface (reflective surface 52B) that reflects and guides the light toward the second group of spatial light modulators (SLM 60).

[0147] The second switcher (time divider 50) has a first switcher (time divider 50, polygon mirror 51A) that directs the light to the spatial light modulators (SLM 60) of the first group, and a second switcher (time divider 50, polygon mirror 51B) that directs the light to the spatial light modulators (SLM 60) of the second group.

[0148] Alternatively and / or additionally, the exposure apparatus (exposure apparatus 1000) includes a data transmission unit (control system 1500) that transmits the pattern data to the spatial light modulator (SLM 60), and the spatial light modulator (SLM 60) has a plurality of first spatial light modulators (SLM 60) and second spatial light modulators (SLM 60) arranged in a second direction intersecting a first direction of movement of the substrate during exposure. The data transmission unit (control system 1500) divides the pattern data into first pattern data to be transmitted to the first spatial light modulator (SLM 60) and second pattern data to be transmitted to the second spatial light modulator (SLM 60), and displaces the positions of the first pattern data and the second pattern data relative to the first direction.

[0149] Alternatively and / or additionally, the exposure apparatus (exposure apparatus 1000) includes a data transmission unit (control system 1500) that transmits the pattern data to the spatial light modulator (SLM 60), and the spatial light modulator (SLM 60) has a first spatial light modulator (SLM 60) and a second spatial light modulator (SLM 60). The data transmission unit (control system 1500) divides the pattern data into first pattern data to be transmitted to the first spatial light modulator (SLM 60) and second pattern data to be transmitted to the second spatial light modulator (SLM 60), and displaces the positions of the first pattern data and the second pattern data relative to each other.

[0150] For example, the second switcher (time divider 50) is a polygonal mirror.

[0151] In one embodiment, the exposure apparatus (exposure apparatus 1000) exposes a predetermined pattern on a substrate moving in a first direction via a first spatial light modulator (SLM 60) and a second spatial light modulator (SLM 60) arranged in a second direction intersecting the first direction. The exposure apparatus (exposure apparatus 1000) includes: a light source (laser light source 20); a data transmission unit (control system 1500) that transmits pattern data based on the specified pattern to the first spatial light modulator (SLM 60) and the second spatial light modulator (SLM 60); a first projection optics system (projection lens 1330) that projects a projection image of the light from the light source (laser light source 20) spatially modulated by the first spatial light modulator (SLM 60) based on the first pattern data onto the substrate, wherein the first pattern data is a part of the pattern data and is transmitted by the data transmission unit (control system 1500); and a second projection optics system (projection lens 1330) that transmits pattern data based on the second pattern data by the second spatial light modulator (SLM 60). 60) The projected image of the light from the light source (laser light source 20) after spatial modulation is projected onto the substrate, the second pattern data being another part of the pattern data and transmitted by the data transmission unit (control system 1500); and the optical path switcher (time divider 50) switches the optical path of the light oscillating sequentially from the light source (laser light source 20) and guides it in the order of the first spatial light modulator (SLM 60) and the second spatial light modulator (SLM 60), and the data transmission unit (control system 1500) divides the pattern data into the first pattern data and the second spatial data, so that the positions of the first pattern data and the second pattern data with respect to the first direction are relatively displaced.

[0152] In one example, the exposure apparatus (exposure apparatus 1000) includes an oscillator (master clock 4010) that emits master clocks that synchronize at least two of the light source (laser source 20), the spatial light modulator (SLM 60), and the optical path switcher (time divider 50).

[0153] For example, the exposure apparatus further includes a synthesizer (distribution module 1200) for combining the light emitted from the plurality of light sources (laser light sources 20), and the optical path switcher (time divider 50) switches the optical path of the light synthesized by the synthesizer (distribution module 1200).

[0154] In one embodiment, a method for manufacturing a flat panel display includes: exposing the substrate using the exposure apparatus (exposure apparatus 1000); and developing the exposed substrate.

[0155] In one embodiment, the device manufacturing method includes: exposing the substrate using the exposure apparatus (exposure apparatus 1000); and developing the exposed substrate.

[0156] Furthermore, the exposure apparatus 1000 can also be used, for example, as a semiconductor lithography system for exposing integrated circuit patterns on wafers or as a lithography system for manufacturing thin-film magnetic heads.

[0157] Furthermore, while the above-described embodiments demonstrate that combining multiple beams through synthesis and time division can achieve low-frequency, high-energy beam output, this is not a limitation. In the case of outputting a high-energy beam from a laser source, it is not necessary to synthesize multiple beams.

[0158] Furthermore, the combination of multiple beams includes the case where the optical axes of laser beams emitted from multiple sources are aligned. Additionally, even when the optical axes of laser beams emitted from multiple sources are not aligned, if these optical axes are sufficiently close, it also includes the output of a high-energy beam, or the combination of beams.

[0159] The lithography system can be constructed by assembling various subsystems to maintain specified mechanical, electrical, and optical precision. To maintain these precisions before and after assembly, each optical system is adjusted to achieve its optical precision. Similarly, the mechanical and electrical systems are adjusted to achieve mechanical and electrical precision. The process of assembling the subsystems in the lithography system includes the mechanical interfaces between the subsystems, circuit wiring connections, and pneumatic piping connections. There is also a process of assembling the subsystems before assembling the lithography system from the various subsystems. If the lithography system is temporarily assembled using various subsystems, all adjustments are performed in a way that reliably maintains precision within the complete lithography system. Furthermore, it is ideal to manufacture the exposure system in a cleanroom where temperature and cleanliness can be controlled.

[0160] Furthermore, the substrate to be exposed is not limited to glass plates; for example, it can be other objects such as wafers, ceramic substrates, film components, or blank masks. Additionally, when the substrate to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and for example, it may include film-like structures (flexible sheet-like components). Moreover, the exposure apparatus of this embodiment is particularly effective when the substrate to be exposed has a side length or diagonal length of 500 mm or more.

[0161] Electronic devices such as liquid crystal display elements (or semiconductor elements) are manufactured through the following steps: a step of designing the function and performance of the device; a step of fabricating a mask (or halftone dot) based on the design steps; a step of fabricating a glass substrate (or wafer); a lithography step of transferring the pattern of the mask (halftone dot) onto the glass substrate using the exposure apparatus and exposure method of each embodiment; a development step of developing the exposed glass substrate; an etching step of removing exposed components other than those with residual resist by etching; a resist removal step of removing unwanted resist after etching; a device assembly step; and an inspection step. In this case, in the lithography step, the exposure method is performed using the exposure apparatus of the embodiment to form a device pattern on the glass substrate, thus enabling the production of highly integrated devices with good manufacturability.

[0162] The system disclosed above achieves its objectives and provides effects. These are illustrative examples of implementation methods and are not intended to limit the structure or design in detail.

Claims

1. An exposure apparatus for exposing a predetermined pattern on a substrate, characterized in that, include: light source; A spatial light modulator that spatially modulates light from the light source based on pattern data describing the specified pattern; The projection optics system projects the spatially modulated light onto the substrate; as well as An optical path switcher switches the optical paths of the light sequentially oscillating from the light source, guiding them sequentially to the spatial light modulators, which are configured with multiple such modulators. The optical path switcher includes a first switcher and a second switcher. The first switcher switches the optical path to either a first optical path or a second optical path. The second switcher directs the light guided to the first optical path to a first group of spatial optical modulators among the plurality of spatial optical modulators, and directs the light guided to the second optical path to a second group of spatial optical modulators among the plurality of spatial optical modulators.

2. The exposure apparatus according to claim 1, wherein the first switcher comprises: The first region guides the light oscillating from the light source during the first period to the first optical path; And a second region that guides the light oscillating from the light source during a second period, different from the first period, to the second optical path.

3. The exposure apparatus according to claim 2, wherein the first region reflects the light. The second region is transparent to the light.

4. The exposure apparatus according to claim 2, wherein the first region is disposed at a first angle relative to the light, reflecting the light and guiding the light to the first optical path. The second region is set at a second angle relative to the light, which is different from the first angle, to reflect the light and guide it to the second optical path.

5. The exposure apparatus according to any one of claims 1 to 4, wherein the second switcher has a first reflective surface and a second reflective surface, the first reflective surface causing the light to be reflected toward the first group of spatial light modulators, and the second reflective surface causing the light to be reflected toward and guided toward the second group of spatial light modulators.

6. The exposure apparatus according to any one of claims 1 to 4, wherein the second switcher has a first switcher and a second switcher, the first switcher directing the light to the first group of spatial light modulators, and the second switcher directing the light to the second group of spatial light modulators.

7. The exposure apparatus according to any one of claims 1 to 4, comprising a data transmission unit for transmitting the pattern data to the spatial light modulator, and The spatial light modulator has a plurality of first spatial light modulators and second spatial light modulators arranged in a second direction intersecting a first direction of substrate movement during exposure. The data transmitting unit divides the pattern data into first pattern data to be transmitted to the first spatial light modulator and second pattern data to be transmitted to the second spatial light modulator, and displaces the positions of the first pattern data and the second pattern data relative to the first direction.

8. The exposure apparatus according to any one of claims 1 to 4, comprising a data transmission unit for transmitting the pattern data to the spatial light modulator, and The spatial light modulator includes a first spatial light modulator and a second spatial light modulator. The data transmitting unit divides the pattern data into first pattern data to be sent to the first spatial light modulator and second pattern data to be sent to the second spatial light modulator, and shifts the positions of the first pattern data and the second pattern data relative to each other.

9. The exposure apparatus according to any one of claims 1 to 4, wherein the second switcher is a polygonal mirror.

10. The exposure apparatus according to any one of claims 1 to 4, comprising an oscillator that emits a master clock that synchronizes at least two of the light source, the spatial light modulator, and the optical path switcher.

11. The exposure apparatus according to any one of claims 1 to 4, further comprising a synthesizer, the synthesizer combining the light emitted from the plurality of said light sources respectively, and The optical path switcher switches the optical path of the light synthesized by the synthesizer.

12. An exposure apparatus, characterized in that, For a substrate moving in a first direction, a predetermined pattern is exposed via a spatial light modulator, the spatial light modulator having a first spatial light modulator and a second spatial light modulator arranged in a second direction intersecting the first direction, the exposure apparatus comprising: light source; The data transmission unit transmits pattern data based on the specified pattern to the first spatial light modulator and the second spatial light modulator; The first projection optics system projects light from the light source, which has been spatially modulated by the first spatial light modulator based on the first pattern data, onto the substrate. The first pattern data is a part of the pattern data and is transmitted by the data transmission unit. The second projection optics system projects light that has been spatially modulated by the second spatial light modulator based on the second pattern data onto the substrate. The second pattern data is another part of the pattern data and is transmitted by the data transmission unit. as well as The optical path switcher switches the optical paths of the light sequentially oscillating from the light source, guiding the light according to the order of the first spatial light modulator and the second spatial light modulator. The data transmission unit divides the pattern data into first pattern data and second pattern data, and based on the timing of the light from the optical path switcher incident on the first spatial light modulator and the second spatial light modulator, it causes the positions of the first pattern data and the second pattern data with respect to the first direction to be relatively displaced.

13. The exposure apparatus of claim 12, further comprising an oscillator that emits a master clock that synchronizes at least two of the light source, the spatial light modulator, and the optical path switcher.

14. The exposure apparatus according to claim 12 or 13, further comprising a synthesizer, the synthesizer combining the light emitted from the plurality of said light sources respectively, and The optical path switcher switches the optical path of the light synthesized by the synthesizer.

15. A method for manufacturing a flat panel display, characterized in that, include: The substrate is exposed using the exposure apparatus according to any one of claims 1 to 14; And developing the exposed substrate.

16. A method for manufacturing an electronic device, characterized in that, include: The substrate is exposed using the exposure apparatus according to any one of claims 1 to 14; as well as The exposed substrate is then developed.

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