Isolation ring clamp and physical vapor deposition chamber incorporating isolation ring clamp

Abstract

Apparatuses for physical vapor deposition are provided herein. In certain embodiments, a clamp for use in a physical vapor deposition (PVD) chamber includes a clamp body and an outwardly extending shelf extending from the clamp body, wherein the outwardly extending shelf includes a clamping surface configured to clamp an isolation ring to a chamber body of the PVD chamber, wherein a height of the outwardly extending shelf is about 15 percent to about 40 percent of a height of the clamp body, and wherein the clamp body includes a central opening configured to hold a fastener in the central opening.

Description

TECHNICAL FIELD

[0001] Embodiments of the present disclosure generally relate to physical vapor deposition processing equipment. BACKGROUND

[0002] Certain physical vapor deposition (PVD) chambers often include a ceramic isolation ring disposed between electrically conductive components of the PVD chamber. For example, the ceramic isolation ring electrically isolates a PVD source (e.g., a sputtering target) from a source adapter (anode). The isolation ring is a boundary of the PVD vacuum chamber. The inventors have observed that during opening of the chamber, the isolation ring can get stuck to the target O-ring and can fall down, damage and / or injure or can injure the process kit and / or the source adapter of the PVD chamber in the PVD chamber. Damage to the above parts or components is very costly and jeopardizes proper PVD chamber performance.

[0003] Accordingly, the inventors have provided improved apparatuses for PVD processing. SUMMARY

[0004] Apparatuses for clamping an isolation ring and PVD chambers incorporating the same are provided herein. In certain embodiments, a clamp for use in a PVD chamber includes a clamp body and an outwardly extending shelf extending from the clamp body, wherein the outwardly extending shelf includes a clamping surface configured to clamp an isolation ring to a chamber body of the PVD chamber, wherein a height of the outwardly extending shelf is about 15 percent to about 40 percent of a height of the clamp body, and wherein the clamp body includes a central opening configured to hold a fastener in the central opening.

[0005] In certain embodiments, a clamp for use in a processing chamber includes a clamp body and an outwardly extending shelf extending from the clamp body, wherein the outwardly extending shelf includes a clamping surface configured to clamp an isolation ring to a chamber body of the processing chamber, wherein the outwardly extending shelf includes a target-facing surface that is angled at about 30 degrees to about 85 degrees, and wherein the clamp body includes a central opening configured to hold a fastener in the central opening.

[0006] In certain embodiments, a processing chamber includes a chamber lid disposed on top of a chamber body that defines an interior space therein, the chamber lid including a target assembly and the chamber body including an upper chamber adapter, an isolation ring disposed on the upper chamber adapter, wherein the target assembly is supported on the isolation ring, an O-ring disposed between the target assembly and the isolation ring, and one or more isolation ring clamps disposed around the isolation ring to clamp the isolation ring to the upper chamber adapter.

[0007] Other and further embodiments of the present disclosure are described below. Attached Figure Description

[0008] The embodiments of this disclosure, which have been briefly summarized above and discussed in more detail below, can be understood by referring to the illustrative embodiments of this disclosure depicted in the accompanying drawings. However, the drawings illustrate only general embodiments of this disclosure and should therefore not be considered as limiting the scope, as other embodiments with equivalent effects are permissible.

[0009] Figure 1 According to certain embodiments of this disclosure, a schematic cross-sectional view of the processing chamber is depicted.

[0010] Figure 2 According to certain embodiments of this disclosure, a cross-sectional view of the target and surrounding structure is depicted.

[0011] Figure 3A According to certain embodiments of this disclosure, a top view of an isolation ring clamp is depicted.

[0012] Figure 3B According to certain embodiments of this disclosure, a cross-sectional side view of an isolation ring clamp is depicted.

[0013] Figure 4 According to certain embodiments of this disclosure, a cross-sectional view of the target and surrounding structure is depicted.

[0014] Figure 5 According to certain embodiments of this disclosure, isometric views of an isolation ring clamp are depicted.

[0015] Figure 6 According to certain embodiments of this disclosure, a cross-sectional view of the target and surrounding structure is depicted.

[0016] Figure 7 According to certain embodiments of this disclosure, isometric views of an isolation ring clamp are depicted.

[0017] To facilitate understanding, the same element symbols have been used as much as possible to represent the same elements in the common diagram. The diagrams are not drawn to scale and have been simplified for clarity. Elements and features of one embodiment may be beneficially incorporated into other embodiments without further explanation. Detailed Implementation

[0018] Embodiments of improved apparatus for physical vapor deposition (PVD) processing equipment are provided herein. An isolation ring is disposed between a target assembly and an upper chamber adapter of the PVD processing equipment to electrically isolate the target assembly from the upper chamber adapter (anode). The improved apparatus includes one or more clamps configured to clamp the isolation ring to the upper chamber adapter to advantageously avoid the isolation ring from sticking to the target assembly when the target assembly is removed or replaced. Sticking of the isolation ring to the target assembly can cause the isolation ring to be damaged or to damage other chamber components. In certain embodiments, the inventive apparatus includes a target assembly having a chamfered upper peripheral edge to increase the high voltage creepage distance from the target assembly to ground, as described herein. The chamfered upper peripheral edge advantageously exposes a ledge of the isolation ring disposed between the target assembly and the chamber body. The one or more clamps can be used to clamp the isolation ring to the upper chamber adapter via the ledge.

[0019] Figure 1 According to certain embodiments of the present disclosure, a schematic cross-sectional view of a physical vapor deposition chamber or processing chamber 100 is depicted. In certain embodiments, the processing chamber 100 has a chamber lid 135 disposed on top of a chamber body 136 that defines an interior space 148 therein. In certain embodiments, the chamber lid 135 includes a target assembly 138. In certain embodiments, the target assembly 138 includes a target 106 and a target backing plate 146. The target 106 includes a material to be deposited on a substrate 104 during sputtering, such as a metal or a metal oxide. In certain embodiments, the target material is a dielectric material, such as silicon or silicon oxide or aluminum oxide. In certain embodiments, the target backing plate 146 can include a conductive material, such as copper-zinc, copper-chromium, or the same material as the target, so that RF and DC power can be coupled to the target 106 via the target backing plate 146. Alternatively, the target backing plate 146 can be non-conductive and can include a conductive element (not shown), such as an electrical feedthrough or the like.

[0020] The processing chamber 100 contains a substrate support pedestal 102 for receiving a substrate 104 on the support pedestal 102. The substrate support pedestal 102 can be positioned in a grounded surrounding wall 108, which can be a chamber wall as shown or a grounded shroud. The substrate support pedestal 102 has a material receiving surface facing a major surface of the target 106 and supports a substrate 104 to be sputter coated in a planar position opposite the major surface of the target 106. The substrate support pedestal 102 can support the substrate 104 in the interior space 148 of the processing chamber 100.

[0021] The processing chamber 100 further includes a process shroud 174. The process shroud 174 generally comprises an annular body disposed around at least a portion of the target 106 and the substrate support pedestal 102. In some embodiments, the process shroud 174 is connected to lugs 176 of the upper chamber adapter 142 of the chamber body 136. The target assembly 138 is supported on an isolation ring 180 at the top of the process shroud 174. The isolation ring 180 can be made of a ceramic material or other non-conductive material. The process shroud 174 is made of a conductive material, such as an aluminum alloy, stainless steel, or the like. The process shroud 174 serves to protect other chamber components from processing damage and / or contamination.

[0022] One or more isolation ring clamps 144 are disposed around the isolation ring 180 to clamp the isolation ring 180 to the upper chamber adapter 142. In some embodiments, the one or more isolation ring clamps 144 are spaced around the isolation ring 180. The one or more isolation ring clamps 144 are generally made of a non-conductive material, such as a polymeric material or a ceramic material. In some embodiments, the one or more isolation ring clamps 144 have a height of about 0.75 inches to about 1.5 inches.

[0023] In some embodiments, a heater 166 is coupled to the processing chamber 100 and is configured to heat the process shroud 174 convectively. In some embodiments, the process shroud 174 is heated to a temperature of about 40 degrees Celsius to about 70 degrees Celsius. The inventors have observed that heating the process shroud 174 reduces the temperature gradient of the process shroud 174, resulting in less particle peeling of the process shroud 174.

[0024] The process shroud 174 extends downward and can include a generally tubular portion having a generally fixed diameter. The process shroud 174 extends downward along the walls of the upper chamber adapter 142 and the grounded enclosing wall 108 to below the top surface of the substrate support pedestal 102 and back up to the top surface of the substrate support pedestal 102. When the substrate support pedestal 102 is in the lower loading position, a cover ring 186 is placed on top of an upwardly extending inner portion 188 of the process shroud 174, but when the substrate support pedestal 102 is in the upper deposition position, the cover ring 186 is placed on the outer periphery of the substrate support pedestal 102 to protect the substrate support pedestal 102 from sputter deposition. An additional deposition ring (not shown) can be used to shield the periphery of the substrate 104 from deposition.

[0025] The processing chamber includes a feed structure 110 for coupling RF and DC energy to the target 106. The feed structure is a device for coupling RF energy and optionally DC energy to the target or to an assembly containing the target as described herein. The feed structure 110 includes a body 112 having a first end 114 and a second end 116 opposite the first end 114. In some embodiments, the body 112 further includes a central opening 115 disposed through the body 112 from the first end 114 to the second end 116.

[0026] The first end 114 of the feed structure 110 can be coupled to an RF power source 118 and optionally to a DC power source 120, which can be utilized to provide RF and DC energy, respectively, to the target 106. For example, the DC power source 120 can be utilized to apply a negative voltage or bias to the target 106. In some embodiments, the RF energy supplied by the RF power source 118 can be at a frequency in the range from about 2 MHz to about 60 MHz, or for example, a non-limiting frequency such as 2 MHz, 13.56 MHz, 27.12 MHz, or 60 MHz can be used. In some embodiments, multiple RF power sources (i.e., two or more) can be provided to supply RF energy at multiple frequencies. The feed structure 110 can be fabricated from a suitable electrically conductive material to conduct the RF and DC energy from the RF power source 118 and the DC power source 120.

[0027] The second end 116 of the body 112 is coupled to a source distribution plate 122. The source distribution plate includes a hole 124 disposed through the source distribution plate 122 and aligned with the central opening 115 of the body 112. The source distribution plate 122 can be fabricated from a suitable electrically conductive material to conduct the RF and DC energy from the feed structure 110.

[0028] The source distribution plate 122 can be coupled to the target 106 via an electrically conductive member 125. The electrically conductive member 125 can be a tubular member having a first end 126 coupled to a target-facing surface 128 of the source distribution plate 122 proximate a peripheral edge of the source distribution plate 122. The electrically conductive member 125 further includes a second end 130 coupled to a source distribution plate-facing surface 132 of the target 106 (or to a target backplate 146 of the target 106) proximate a peripheral edge of the target 106.

[0029] A cavity 134 can be defined by the interior-facing wall of the electrically conductive member 125, the target-facing surface 128 of the source distribution plate 122, and the source distribution plate-facing surface 132 of the target 106. The cavity 134 is fluidly coupled to the central opening 115 of the body 112 via the hole 124 of the source distribution plate 122. As Figure 1As shown in the cross-section, the cavity 134 and the central opening 115 of the body 112 can be utilized to at least partially house one or more portions of the rotatable magnetron assembly 136. In certain embodiments, the cavity 134 can be at least partially filled with a cooling fluid, such as water (H20) or the like.

[0030] A ground shield 140 can be provided to cover the outer side surface of the lid of the processing chamber 100. The ground shield 140 can be coupled to ground, such as via a ground connection of the chamber body 136. The ground shield 140 has a central opening to allow the feed structure 110 to pass through the ground shield 140 to couple to the source distribution plate 122. The ground shield 140 can include any suitable electrically conductive material, such as aluminum, copper, or the like. An isolation gap 139 is provided between the outer surface of the ground shield 140 and the source distribution plate 122, the electrically conductive member 125, and the target 106 (and / or the target backing plate 146) to avoid direct routing of RF and DC energy to ground. The isolation gap can be filled with air or some other suitable dielectric material, such as ceramic, plastic, or the like.

[0031] Figure 2 According to certain embodiments of the present disclosure, a cross-sectional view of a target assembly and surrounding structures is depicted. In certain embodiments, the target assembly 138 includes a chamfered peripheral edge 252. In certain embodiments, the chamfered peripheral edge 252 exposes a ledge 250 at an upper peripheral region of the isolation ring 180.

[0032] In certain embodiments, the target assembly 138 includes an O-ring groove 204 on a lower peripheral edge of the target assembly 138. An O-ring 210 is disposed in the O-ring groove 204 to form a seal between the target assembly 138 and the isolation ring 180. In certain embodiments, the upper chamber adapter 142 includes a second O-ring groove 206 on a sealing surface 224 of the upper chamber adapter 142. A second O-ring 218 can be disposed in the second O-ring groove 206 to form a seal between the upper chamber adapter 142 and the isolation ring 180.

[0033] In use, the O-ring 210 can cause the isolation ring 180 to stick to the target assembly 138. The processing chamber 100 includes one or more isolation ring clamps 230. In certain embodiments, the one or more isolation ring clamps 230 are Figure 1One or more isolation ring clamps 144. The one or more isolation ring clamps 144 clamp the isolation ring 180 to the upper chamber adapter 142 to advantageously avoid the isolation ring 180 from sticking to the target assembly 138 when the target assembly 138 is lifted. The second O-ring 218 can cause the upper chamber adapter 142 to stick to the isolation ring 180. In certain embodiments, the lower surface 200 of each of the one or more isolation ring clamps 230 is coplanar with the lower surface 214 of the isolation ring 180 to advantageously permit tool access between the isolation ring 180 and the upper chamber adapter 142 to separate the two components.

[0034] In certain embodiments, each of the one or more isolation ring clamps 230 is disposed in a pocket 262 formed on an upper surface 238 of the upper chamber adapter 142. In certain embodiments, the pocket 262 extends radially outward from an interior surface of the upper chamber adapter 142. In certain embodiments, a lower surface 226 of the pocket 262 is coplanar with a sealing surface 224 of the upper chamber adapter 142.

[0035] In certain embodiments, the one or more isolation ring clamps 230 include two clamps. In certain embodiments, the one or more isolation ring clamps 230 include two or more clamps arranged at regular intervals around the isolation ring 180. In certain embodiments, the one or more isolation ring clamps 230 are diametrically opposed around the isolation ring 180.

[0036] In certain embodiments, the one or more isolation ring clamps 230 include a clamp body 264 and an outwardly extending shelf 236 extending from the clamp body 264. In certain embodiments, the outwardly extending shelf 236 has a height of about 15 to about 40 percent of a height of the clamp body 264. The outwardly extending shelf 236 includes a clamping surface 254 configured to clamp the isolation ring 180. In certain embodiments, the clamping surface 254 is a lower surface of the outwardly extending shelf 236. In certain embodiments, the one or more isolation ring clamps 230 include a central opening 232. In certain embodiments, the one or more isolation ring clamps 230 are coupled to the upper chamber adapter 142 via one or more fasteners 240 extending through the central opening 232 of each of the one or more isolation ring clamps 230 and into the upper chamber adapter 142. In certain embodiments, a washer 242 is disposed between each of the one or more fasteners 240 and an abutment 246 formed in the central opening 232.

[0037] Figure 3A According to certain embodiments of the present disclosure, a top view of a clamp of the one or more isolation ring clamps 230 is depicted. Figure 3BAccording to certain embodiments of the present disclosure, a cross-sectional side view of a clip of one or more isolation ring clips 230 is depicted. Each of the one or more isolation ring clips 230 generally includes an outwardly extending shelf 236 on a first side 306 and an opposing second side 308. In certain embodiments, the second side 308 or a side opposite the outwardly extending shelf 236 includes a beveled sidewall 310A, 310B. In certain embodiments, the one or more isolation ring clips 230 have a shape that corresponds to a shape of the pocket 262.

[0038] In certain embodiments, a lower portion 320 of the central opening 232 has a diameter that is less than an upper portion 322 of the central opening 232, where an interface between the upper portion 322 and the lower portion 320 defines the standoff 246. In certain embodiments, the outwardly extending shelf 236 includes a beveled target-facing surface 316. In certain embodiments, the target-facing surface 316 extends downward and outward at a substantially fixed angle. In certain embodiments, the fixed angle is about 45 degrees to about 85 degrees. In certain embodiments, the outwardly extending shelf 236 extends about 0.04 inches to about 0.14 inches from the clip body 264. In certain embodiments, the target-facing surface 316 extends downward from the upper surface 302 of each of the one or more isolation ring clips 230.

[0039] Figure 4 According to certain embodiments of the present disclosure, a cross-sectional view of a target assembly 138 and surrounding structure is depicted. Figure 5 According to embodiments of the present disclosure, an isometric view of a clip of one or more isolation ring clips 430 is depicted. In certain embodiments, the one or more isolation ring clips 430 are Figure 1one or more isolation ring clamps 430. In certain embodiments, one or more isolation ring clamps 430 are similar to one or more isolation ring clamps 230, except that one or more isolation ring clamps 430 have a horizontal slot 410 extending from a first side 406 of one or more isolation ring clamps 430 to a center opening 432 of one or more isolation ring clamps 430. In certain embodiments, horizontal slot 410 extends from first side 406 of isolation ring clamp 430 at least to an opposing second side of isolation ring clamp 430. Horizontal slot can extend into second side but not all the way through second side. A stress relief radius can be provided at the end of horizontal slot 410, such as a hole formed with a diameter slightly larger than the width of horizontal slot 410, to reduce stress and the likelihood of breakage or failure of the clamp from repeated cycling of the clamp. One or more isolation ring clamps 430 include outwardly extending shelves 436 that extend from a clamp body 464 similar to outwardly extending shelves 236. Horizontal slot 410 extending through clamp body 464 advantageously provides flexibility to one or more isolation ring clamps 430, forcing outwardly extending shelves 436 over isolation ring 180 (i.e., a self-clamping feature). In certain embodiments, the self-clamping feature can facilitate use of one or more isolation ring clamps 430 with a target assembly 138 having a peripheral edge 252 with no chamfer or a less chamfered.

[0040] Figure 6 A cross-sectional view depicting a target and surrounding structure is depicted in accordance with certain embodiments of the disclosure. Figure 7 An isometric view of a clamp of one or more isolation ring clamps 630 is depicted in accordance with embodiments of the disclosure. In certain embodiments, one or more isolation ring clamps 630 include a vertical slot 610 to provide flexibility to one or more isolation ring clamps 630. Vertical slot 620 partially defines a front wall 714 having outwardly extending shelves 636.

[0041] Front wall 714 acts as a flexible member or spring, such that shelves 636 can be pushed (i.e., retracted) upon installation of isolation ring 180 or installation of one or more isolation ring clamps 630 after isolation ring 180. When front wall 714 is retracted, vertical slot 610 advantageously provides space for front wall 714 to retract or push out from a normal upright position, thus providing a biasing force toward the normal upright or un-retracted position. The biasing force forces front wall 714 toward isolation ring 180, such that outwardly extending shelves 636 extend over the edge of isolation ring 180 (i.e., a self-clamping feature). In certain embodiments, the self-clamping feature can facilitate use of one or more isolation ring clamps 630 with a target assembly 138 having a peripheral edge 252 with a chamfer as shown in Figure 2 Figure 6 ​​

[0042] The one or more isolation ring clamps 630 include a clamp body 664 and an outwardly extending shelf 636 extending from the clamp body 664. The outwardly extending shelf 636 includes a target-facing surface 612 that is angled. In certain embodiments, the target-facing surface 612 includes an upper portion 620 having a first slope. In certain embodiments, the target-facing surface 612 includes a lower portion 622 having a second slope. In certain embodiments, the second slope is different than the first slope. In certain embodiments, the first slope is about 45 degrees to about 85 degrees downwardly and outwardly from an upper surface 702 of the one or more isolation ring clamps 630. In certain embodiments, the second slope is about 30 degrees to about 50 degrees downwardly and outwardly from the upper surface 702 of the one or more isolation ring clamps 630. In certain embodiments, the second slope is less than the first slope to advantageously extend between the target assembly 138 and the isolation ring 180. In certain embodiments, the lower portion 622 has a vertical height of about 0.02 inches to about 0.05 inches.

[0043] In certain embodiments, the vertical slot 610 includes an upper portion 640 and a lower portion 650. In certain embodiments, the upper portion 640 of the vertical slot 610 is wider than the lower portion 650 to advantageously increase the flexibility of the one or more isolation ring clamps 630. The upper portion 640 extends between the outwardly extending shelf 636 and the central opening 632 of the one or more isolation ring clamps 630. In certain embodiments, the vertical slot 610 extends through a standoff 646 in the central opening 632. In certain embodiments, the width of the upper portion 640 is defined between a pair of first surfaces 716 and an opposing second surface 718. In certain embodiments, the pair of first surfaces 716 taper downwardly and toward the second surface 718.

[0044] While the foregoing is directed to embodiments of the present disclosure, other and further embodiments of the disclosure can be devised without departing from its basic scope.

Claims

1. A clamp for use in a physical vapor deposition (PVD) chamber, comprising: a clamp body and an outwardly extending shelf extending from the clamp body, wherein the outwardly extending shelf includes a clamping surface configured to clamp an isolation ring to a chamber body of the PVD chamber, wherein a height of the outwardly extending shelf is about 15 percent to about 40 percent of a height of the clamp body, and wherein the clamp body includes a central opening configured to hold a fastener in the central opening.

2. The clamp of claim 1, wherein the clamp body includes a vertical slot extending from an upper surface of the clamp body.

3. The clamp of claim 2, wherein the vertical slot includes an upper portion and a lower portion, wherein the upper portion is wider than the lower portion.

4. The clamp of claim 1, wherein the clamp body includes a horizontal slot extending from a first side of the clamp body to the central opening.

5. The clamp of claim 1, wherein the clamp is made of a polymeric material.

6. The clamp of any of claims 1-5, wherein the outwardly extending shelf includes a target-facing surface that is angled.

7. The clamp of claim 6, wherein the target-facing surface is angled at an angle of about 45 degrees to about 85 degrees.

8. The clamp of claim 6, wherein the target-facing surface includes an upper portion having a first slope and a lower portion having a second slope, wherein the second slope is different than the first slope.

9. The clamp of claim 6, wherein the target-facing surface is angled at a fixed angle.

10. The clamp of any of claims 1-5, wherein the clamp body includes a beveled sidewall on a side of the clamp body opposite the outwardly extending shelf.

11. The clamp of any of claims 1-5, wherein the outwardly extending shelf extends about 0.04 inches to about 0.14 inches from the clamp body.

12. The clamp of claim 11, wherein the clamp body has a height of about 0.75 inches to about 1.5 inches.

13. The clamp of any of claims 1-5, wherein the clamp body has a height of about 0.75 inches to about 1.5 inches.

14. A processing chamber, comprising: a chamber lid disposed on top of a chamber body, the chamber body defining an interior space therein, the chamber lid including a target assembly and the chamber body including an upper chamber adapter; an isolation ring disposed on the upper chamber adapter, wherein the target assembly is supported on the isolation ring; an O-ring disposed between the target assembly and the isolation ring; and one or more isolation ring clamps disposed around the isolation ring to clamp the isolation ring to the upper chamber adapter.

15. The processing chamber of claim 14, wherein the one or more isolation ring clamps are the isolation ring clamps of any of claims 1-5.

16. The processing chamber of claim 14, wherein the one or more isolation ring clamps include two or more clamps disposed at regular intervals around the isolation ring.

17. The process chamber of claim 14, wherein the one or more isolation ring clamps are disposed in pockets formed on an upper surface of the upper chamber adapter.

18. The process chamber of claim 14, wherein the one or more isolation ring clamps include a central opening and a fastener is disposed in the central opening to couple the one or more isolation ring clamps to the upper chamber adapter.

19. The process chamber of claim 14, wherein the target assembly includes a target and a target backing plate.

20. The process chamber of claim 14, wherein the target assembly includes a chamfered peripheral edge.

Images