Laser annealing apparatus

Abstract

The application provides a laser annealing device. The laser annealing device comprises a laser generating module, a laser shaping module, a beam combining module and a focusing module arranged on a main laser light path. A laser beam emitted by the laser generating module is shaped into two or more sub laser beams by the laser shaping module. The two or more sub laser beams are combined by the beam combining module and converged by the focusing module to form a light spot on a focal plane. The laser shaping module further comprises a half shadow adjusting unit for adjusting the width proportion of the half shadow in the light spot. By adjusting the width proportion of the half shadow in the light spot, the energy distribution of the output light spot of the laser annealing device can be adjusted to meet different annealing process requirements, so that the laser annealing device has high process compatibility.

Description

Technical Field

[0001] This invention relates to the field of laser annealing, and in particular to a laser annealing apparatus. Background Technology

[0002] In laser annealing, the laser annealing apparatus needs to anneal different materials, and the required annealing depth and activation rate vary depending on the material (e.g., thin substrate, thick substrate). For example, in shallow laser annealing, the energy (or energy intensity) of the laser beam irradiating the substrate surface needs to be distributed as much as possible within the peak energy range, minimizing the average optical power of the annealed surface, i.e., maximizing the flat-top area of ​​the spot and minimizing the penumbra size. The penumbra size refers to the distance from the edge of the spot to the peak energy region of the spot. In deep annealing, to increase the annealing depth, multiple spots are usually overlapped to ensure the highest possible dwell temperature. Compared to shallow laser annealing, the penumbra size also needs to be appropriately increased to ensure the uniformity of the accumulated energy of the overlapping spots. That is, while ensuring the consistency of the key parameters (nominal size) of the spots, the penumbra size of the spots in the overlapping direction should be appropriately increased.

[0003] Therefore, in order to meet the different annealing process requirements, in actual use, when faced with combinations of different annealing depth and activation rate requirements, it is necessary to change the energy distribution of different laser spots to improve the relevant process adaptability. However, the energy distribution of the output laser spot of the currently used laser annealing device has poor adjustability, resulting in poor process compatibility. If multiple laser annealing devices are used to complete annealing processes with different requirements, the cost is high and the performance difference of the laser annealing devices is large, which is not conducive to process design. Summary of the Invention

[0004] This invention provides a laser annealing device whose output spot energy distribution can be adjusted to meet different annealing process requirements and has high process compatibility.

[0005] This invention provides a laser annealing apparatus, comprising a laser generating module and a laser shaping module, a beam combining module, and a focusing module disposed on the main laser optical path. A laser beam emitted by the laser generating module is shaped into two or more sub-laser beams by the laser shaping module. These sub-laser beams are then combined by the beam combining module and converged by the focusing module to form a light spot on the focal plane. The laser shaping module further includes a penumbra adjustment unit, which is used to adjust the width ratio of the penumbra in the light spot.

[0006] Optionally, the penumbra adjustment unit includes a first micro-optical element disposed at the rear end of the laser shaping module and movable in and out, the first micro-optical element including a micromirror array arranged perpendicular to the main laser optical path.

[0007] Optionally, the penumbra adjustment unit further includes a second micro-optical element disposed on the main laser optical path, the second micro-optical element comprising a micromirror array arranged perpendicular to the main laser optical path.

[0008] Optionally, the laser annealing device further includes a parameter adjustment module, which is used to set the parameters in the main laser optical path.

[0009] Optionally, the parameter adjustment module includes a compensation module and / or a focal plane adjustment module disposed on the main laser optical path. The compensation module is used to compensate for the optical path difference between the two or more sub-laser beams; the focal plane adjustment module is used to adjust the focal plane position of the light spot on the main laser optical path.

[0010] Optionally, the laser annealing device includes a control module, which controls the laser generating module to output a laser beam to the laser shaping module, and controls the penumbra adjustment unit to move in or out of the laser shaping module.

[0011] Optionally, the laser generation module includes a laser, a beam splitting system for splitting the laser emitted by the laser, an energy attenuator for adjusting the energy of the laser output by the beam splitting system according to a set attenuation ratio, and a shutter, wherein the shutter sends pulsed laser to the laser shaping module.

[0012] Optionally, the light spot has a flat-topped energy distribution.

[0013] Optionally, the laser annealing apparatus further includes an energy sensor and / or a camera disposed around the light spot, wherein the energy sensor is used to monitor the energy distribution of the light spot on the focal plane, and the camera is used to measure the morphology of the light spot.

[0014] Optionally, the laser annealing apparatus further includes a temperature monitoring module, which is used to monitor the surface temperature of the material irradiated by the laser spot.

[0015] The laser annealing apparatus of the present invention includes a laser generating module and a laser shaping module, a beam combining module, and a focusing module disposed on the main laser optical path. The laser beam emitted by the laser generating module is shaped into two or more sub-laser beams by the laser shaping module. These sub-laser beams are then combined by the beam combining module and converged by the focusing module to form a single spot on the focal plane. The laser shaping module further includes a penumbra adjustment unit, which is used to adjust the width ratio of the penumbra in the spot. In this laser annealing apparatus, the energy distribution of the output spot can be adjusted using the laser shaping module, and in particular, the width ratio of the penumbra in the spot can be adjusted using the penumbra adjustment unit. Therefore, the same laser annealing apparatus can meet different annealing process requirements, improving the process compatibility of the laser annealing apparatus. It also avoids the problem of using multiple different laser annealing apparatuses to meet different annealing requirements, thus reducing the difficulty of process design. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of a laser annealing apparatus according to an embodiment of the present invention.

[0017] Figure 2 This is an optical system diagram of a laser annealing apparatus according to an embodiment of the present invention, where the penumbra adjustment unit includes only the first micro-optical element.

[0018] Figure 3 This is a schematic diagram of the system structure of a laser annealing apparatus according to an embodiment of the present invention, where the penumbra adjustment unit includes only the first micro-optical element.

[0019] Figure 4 A simulation diagram of the light spot in a laser annealing apparatus according to an embodiment of the present invention, where the penumbra adjustment unit only includes the first micro-optical element.

[0020] Figure 5 The image shown is of a penumbra adjustment unit in a laser annealing apparatus according to an embodiment of the present invention, which includes only the first micro-optical element and is an image of a light spot.

[0021] Figure 6 This is a comparison chart of the measured results and design results of the focal plane position of the laser annealing apparatus according to an embodiment of the present invention, in which the penumbra adjustment unit only includes the first micro-optical element.

[0022] Figure 7 This is a schematic diagram of the system structure of a laser annealing apparatus according to an embodiment of the present invention, in which the penumbra adjustment unit includes a first micro-optical element and a second micro-optical element.

[0023] Figure 8 This is a schematic diagram showing the position of the penumbra adjustment unit in a laser annealing apparatus according to an embodiment of the present invention, when it includes a first micro-optical element and a second micro-optical element.

[0024] Figure 9 This is a simulation diagram of the light spot in a penumbra adjustment unit comprising a first micro-optical element and a second micro-optical element, according to an embodiment of the present invention.

[0025] Explanation of reference numerals in the attached figures: 100-Control module; 101-First energy sensor; 102-Pulse waveform sensor; 105-Temperature monitoring module; 300-Laser; 301-First beam splitter; 301'-Second beam splitter; 302-Energy attenuator; 303-Shutter; 304-Laser shaping module; 3041-First micro-optical element; 3042-Second micro-optical element; 305-Compensation module; 306-Focal plane adjustment module; 307-Beam combining module; 308-Focusing module; 309-Material transfer module; 3091-Support assembly; 3092-Bearing assembly; 3093-Material; 310-Second energy sensor. Detailed Implementation

[0026] The laser annealing apparatus proposed in this invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of this invention will become clearer from the following description. It should be noted that the drawings are all in a very simplified form and use non-precise proportions, and are only used to facilitate and clarify the illustration of the embodiments of this invention.

[0027] To meet the requirements of different annealing processes and improve process compatibility, this embodiment provides a laser annealing apparatus. Figure 1 This is a schematic diagram of a laser annealing apparatus according to an embodiment of the present invention. Figure 1 As shown, the laser annealing device includes a laser generating module and a laser shaping module 304, a beam combining module 307, and a focusing module 308 disposed on the main laser optical path. The laser beam emitted by the laser generating module is shaped into two or more sub-laser beams by the laser shaping module 304 (for example, the two or more sub-laser beams have different optical axes). The two or more sub-laser beams are combined by the beam combining module 307 and converged by the focusing module 308 to form a light spot on the focal plane. The laser shaping module 304 also includes a movable penumbra adjustment unit, which is used to adjust the width ratio of the penumbra in the light spot.

[0028] Specifically, such as Figure 1 As shown, in this embodiment, the laser shaping module 304, the beam combining module 307, and the focusing module 308 are arranged sequentially on the main laser optical path. However, this is not a limitation; in other embodiments, the arrangement order of the laser shaping module, the beam combining module, and the focusing module on the main laser optical path can be adjusted as needed.

[0029] The laser generation module may include a laser 300, a beam splitting system for splitting the laser emitted by the laser 300, an energy attenuator 302 for adjusting the energy of the laser output by the beam splitting system according to a set attenuation ratio, and a shutter 303, which sends pulsed laser to the laser shaping module 304.

[0030] In this embodiment, the laser generation module may include one or more lasers 300. The laser 300 may be a solid-state laser, a semiconductor laser, a fiber laser, or an excimer laser, etc. When the laser generation module includes two or more lasers 300, laser beam combining can be achieved through polarization or fiber coupling to realize coaxial output of the laser beam.

[0031] The beam splitting system may include a first beam splitter 301, which can be used to split the laser beam output by the laser 300 according to a set ratio, so that a larger proportion of the laser can pass through the first beam splitter 301 and enter the subsequent optical module (e.g., the laser shaping module 304).

[0032] like Figure 1 As shown, the laser annealing apparatus may further include a first energy sensor 101 and a pulse waveform sensor 102. The first energy sensor 101 can sample the energy of the laser beam output by the laser 300 (for example, the first energy sensor 101 can sample the energy of a single laser pulse), and the pulse waveform sensor 102 can sample the waveform of the laser beam output by the laser 300 (for example, the pulse waveform sensor 102 can sample the waveform of a single laser pulse).

[0033] The beam splitting system may further include a second beam splitter 301'. A smaller proportion of the laser beam split from the first beam splitter 301 is irradiated by the second beam splitter 301' and then split by the second beam splitter 301'. The beams are then transmitted to the first energy sensor 101 and the pulse waveform sensor 102, respectively, so that the energy and waveform of the laser output by the laser 300 can be detected, so as to adjust the laser output by the laser 300.

[0034] In this embodiment, the light spot can have a flat-top energy distribution. The width ratio of the penumbra in the light spot is the penumbra size, which can be defined as the width of one side of the light spot cross-section between 13.5% and 90% of the peak intensity.

[0035] In this embodiment, the laser annealing apparatus may further include a parameter adjustment module, which can be used to set parameters in the main laser optical path. The parameters set by the parameter adjustment module may include, but are not limited to, the optical path difference of the sub-laser beams and the focal plane position of the laser spot.

[0036] The laser beam emitted by the laser generation module is shaped into two or more sub-laser beams by the laser shaping module 304. The optical axes of the two or more sub-laser beams may be different. After adjustment by the penumbra adjustment unit, an optical path difference inevitably exists between the two or more sub-laser beams. In order to adjust the optical path difference between the two or more sub-laser beams, the parameter adjustment module may include a compensation module. Figure 1 As shown, in the main laser beam path, the compensation module 305 can be disposed after the laser shaping module 304 and before the beam combining module 307. The compensation module 305 may include a cylindrical lens.

[0037] like Figure 1 As shown, the parameter adjustment module may further include a focal plane adjustment module 306, which can be used to adjust the focal plane position of the light spot on the main laser optical path. Since the focal plane of the laser beam adjusted by the penumbra adjustment unit is prone to shifting, the focal plane adjustment module can maintain the focal plane position of the laser beam on the main laser optical path. In one embodiment, the focal plane adjustment module 306 can be positioned after the compensation module 305 and before the beam combining module 307 on the main laser optical path. The position of the focal plane adjustment module 306 relative to the beam combining module 307 is adjustable. By adjusting the distance between the focal plane focusing module 306 and the beam combining module 307, the focal plane position of the light spot formed after the laser beam is focused by the focusing module 308 on the main laser optical path can be adjusted, ensuring the spatial consistency of the final imaging focusing position of the laser annealing device.

[0038] Due to the advantages of micro-optical elements (MLAs) such as small size, light weight, flexible design and manufacturing, and low production cost, in order to reduce the size and weight of the laser shaping module 304 and enable its flexible use in the laser annealing apparatus while reducing the cost of the laser annealing apparatus, in this embodiment, the penumbra adjustment unit may include micro-optical elements. The micro-optical elements are multiple imaging units (micromirrors) with dimensions on the micrometer or nanometer scale fabricated on a substrate, for example, formed as a microlens array. The micro-optical elements can be used to adjust the width ratio of the penumbra in the light spot.

[0039] Figure 2 This is an optical system diagram of a laser annealing apparatus according to an embodiment of the present invention, where the penumbra adjustment unit includes only the first micro-optical element. Figure 3 This is a schematic diagram of the system structure of a laser annealing apparatus according to an embodiment of the present invention, where the penumbra adjustment unit includes only the first micro-optical element. Figure 2 and Figure 3 As shown, the penumbra adjustment unit may include a first micro-optical element 3041 disposed at the rear end of the laser shaping module 304 and movable in and out. The first micro-optical element 3041 includes a micromirror array arranged perpendicular to the main laser optical path.

[0040] like Figure 2 and Figure 3 As shown, the laser beam emitted by laser 300 is collimated and expanded before entering the laser shaping module 304. After being shaped by the laser shaping module 304, it forms two or more sub-laser beams with different axes. The two or more sub-laser beams are compensated for the optical path difference by the compensation module 305 and then enter the focal plane adjustment module 306. After the focal plane position is adjusted by the focal plane adjustment module 306 and the beam is combined by the beam combining module 307, it illuminates the focusing module 308. After being focused by the focusing module 308, a light spot of nominal size is formed on the material surface. The first micro-optical element 3041 in the laser shaping module 304 is used to adjust the width ratio of the penumbra in the light spot, and the adjustment of the first micro-optical element 3041 does not affect the nominal size of the light spot. The shaping module may also include other optical elements besides the micro-optical element, such as two or more diffractive optical elements (DOEs), which can be used to adjust the nominal size of the light spot.

[0041] The laser annealing device outputs light spots of different shapes, such as striped or circular spots. Figure 4 A simulation diagram of the light spot in a laser annealing apparatus according to an embodiment of the present invention, where the penumbra adjustment unit only includes the first micro-optical element. Figure 5 An image of the light spot in the penumbra adjustment unit of the laser annealing apparatus according to an embodiment of the present invention, which includes only the first micro-optical element. For example... Figure 4 and Figure 5 As shown, the light spot is a narrow-sided strip-shaped light spot. The light spot is wider in the X-axis and narrower in the Y-axis. The first micro-optical element 3041 can adjust the width of the penumbra in the light spot. Since the light spot is narrower in the Y-axis, the penumbra width ratio in the Y-axis is more sensitive. The first micro-optical element 3041 can significantly adjust the penumbra width ratio in the Y-axis.

[0042] like Figure 4As shown, when the penumbra adjustment unit only includes the first micro-optical element 3041, the penumbra size of the light spot in the Y-axis can be adjusted to about 30 micrometers through the adjustment of the first micro-optical element 3041. Figure 6 This is a comparison chart of the measured results and design results of the focal plane position of the laser annealing apparatus according to an embodiment of the present invention, in which the penumbra adjustment unit only includes the first micro-optical element. Figure 6 In the diagram, the narrow side direction is the Y-axis direction, and 0 represents the centerline of the Y-axis direction. For example... Figure 6 As shown, when the penumbra adjustment unit only includes the first micro-optical element 3041, the laser beam output by the laser 300, after penumbra adjustment by the first micro-optical element 3041, and then compensation by the compensation module 305 and adjustment by the focal plane adjustment module 306, the measured focal plane position of the light spot modulated by the laser annealing device is basically consistent with the design result (simulation narrow edge result).

[0043] Figure 7 This is a schematic diagram of the system structure of a laser annealing apparatus according to an embodiment of the present invention, in which the penumbra adjustment unit includes a first micro-optical element and a second micro-optical element. In this embodiment, the penumbra adjustment unit may further include a second micro-optical element 3042 disposed on the main laser optical path (e.g., located before the first micro-optical element 3041), and the second micro-optical element 3042 may include a micromirror array arranged perpendicular to the main laser optical path. In this embodiment, the width ratio of the penumbra in the light spot is adjusted by moving the first micro-optical element 3041 in or out. In another embodiment, the width ratio of the penumbra in the light spot can also be adjusted by moving the second micro-optical element 3042 in or out.

[0044] like Figure 7 As shown, the laser beam emitted by the laser 300 is collimated and expanded before being incident on the second micro-optical element 3042 and the first micro-optical element 3041 in sequence. After penumbra adjustment by the first micro-optical element 3041 and the second micro-optical element 3042, it is incident on the compensation module 305. After the optical path difference is adjusted by the compensation module 305, it is incident on the focal plane adjustment module 306. After the focal plane position is adjusted by the focal plane adjustment module 305 and the beam is combined by the beam combining module 307, it is incident on the focusing module 308. After being focused by the focusing module 308, a light spot is formed on the surface of the material.

[0045] Figure 8 This is a schematic diagram showing the position of the penumbra adjustment unit in a laser annealing apparatus according to an embodiment of the present invention, when it includes a first micro-optical element and a second micro-optical element. For example... Figure 8As shown, the first micro-optical element 3041 and the second micro-optical element 3042 can be arranged opposite to each other. The first micro-optical element 3041 includes an array of micromirrors arranged perpendicular to the main laser optical path, and each micromirror has a focal length of f. In this embodiment, the focal length of the first micro-optical element 3041 is the same as the focal length of the micromirrors. The shape and structure of the second micro-optical element 3042 can be the same as those of the first micro-optical element 3041.

[0046] When the penumbra adjustment unit includes a first micro-optical element 3041 and a second micro-optical element 3042, the focal length of the first micro-optical element 3041 and the second micro-optical element 3042 is f, and the first micro-optical element 3041 can be positioned at the focal plane of the second micro-optical element 3042. The focal length formed by the focusing module 308 after the two or more sub-laser beams are combined is the spot focal length F. The focal length f of the first micro-optical element 3041 and the second micro-optical element 3042 and the spot focal length F satisfy the following relationship: (1), where p is the diameter of each micromirror on the first micro-optical element 3041 and the second micro-optical element 3042, and D is the nominal size of the light spot. In order to obtain a light spot of a certain nominal size and a predetermined penumbra size, the first micro-optical element 3041 and the second micro-optical element 3042 can be designed or selected according to the above relationship (1).

[0047] Figure 9 This is a simulation diagram of the light spot in a penumbra adjustment unit comprising a first micro-optical element and a second micro-optical element, according to an embodiment of the present invention. Figure 9 As shown, when the laser shaping module 304 includes a first micro-optical element 3041 and a second micro-optical element 3042, the penumbra width ratio of the light spot in the Y-axis direction can be adjusted by the penumbra adjustment of the first micro-optical element 3041 and the second micro-optical element 3042. For example, the penumbra width ratio (penumbra size) of the light spot in the Y-axis direction can be adjusted to less than 10 micrometers.

[0048] contrast Figure 4 and Figure 9 It can be seen that by changing the number of micro-optical elements in the penumbra adjustment unit, that is, by moving the first micro-optical element 3041 in or out, and by using the compensation module 305 to compensate for the optical path difference between two or more sub-laser beams after passing through the laser shaping module 304, and then adjusting the relative position between the focal plane adjustment module 306 and the beam combining module 307, the laser annealing device can form a spot with a fixed nominal size but different penumbra size (for example, different penumbra sizes along the Y-axis of the spot) at the same imaging focusing position, thereby meeting different annealing process requirements and improving the process compatibility of the laser annealing device.

[0049] Continue to refer to Figure 1 The laser annealing apparatus may further include a control module 100, which can be used to control the laser generating module to output a laser beam to the laser shaping module 304, and to control the penumbra adjustment unit to move in or out of the laser shaping module 304. For example, the control module 100 can adjust the energy and waveform of the laser beam output by the laser 300 according to the detection results of the first energy sensor 101 and the pulse waveform sensor 102, and can move the first micro-optical element 3041 and / or the second micro-optical element 3042 in or out according to process requirements.

[0050] The laser annealing apparatus may further include a material transfer module 309. Specifically, the material transfer module 309 may include a support component 3091 and a carrier component 3092. The support component 3091 can provide a horizontal support plane, and the carrier component 3092 is located on the support plane provided by the support component 3091 and can move on the support plane. The material 3093 can be placed on the carrier component 3092 and can move under the drive of the carrier component 3092.

[0051] The laser annealing apparatus may further include a second energy sensor and / or a camera, wherein the second energy sensor can be used to monitor the energy distribution of the light spot on the focal plane, and the camera can be used to measure the morphology of the light spot. Figure 1 The second energy sensor 310 can be disposed around the light spot. The camera (not shown in the figure) can be disposed above (or diagonally above) the focal plane of the light spot. The second energy sensor 310 and the camera can respectively feed back the detection results of the energy distribution and morphology of the light spot to the control module 100, so that the control module 100 can control and adjust the laser generation module and the laser shaping module 304, which helps to obtain a light spot with a set energy and a set morphology, and improves the laser annealing effect.

[0052] To monitor the surface temperature of the material 3093 irradiated by the laser spot, the laser annealing apparatus may further include a temperature monitoring module 105. The control module 100 can adjust the laser generation module based on the surface temperature of the material 3093 detected by the temperature monitoring module 105, thereby improving the temperature control accuracy of the laser annealing apparatus and enhancing the laser annealing effect of the material 3093. (Reference) Figure 1 The temperature monitoring module 105 may include a temperature probe, which may be an infrared temperature probe, and the temperature probe may be positioned above the material 3093.

[0053] The laser annealing apparatus of this embodiment includes a laser generating module and a laser shaping module 304, a beam combining module 307, and a focusing module 308 arranged sequentially on the main laser optical path. The laser beam emitted by the laser generating module is shaped by the laser shaping module 304 into two or more sub-laser beams with different axes. The two or more sub-laser beams are combined by the beam combining module 307 and converged by the focusing module 308 to form a light spot of nominal size on the focal plane. The laser shaping module 304 also includes a penumbra adjustment unit that can be moved in and out. The penumbra adjustment unit is used to adjust the width ratio of the penumbra in the light spot. In this laser annealing apparatus, the energy distribution of the output spot can be adjusted using the laser shaping module 304. In particular, by moving the penumbra adjustment unit in or out of the laser shaping module, the width ratio of the penumbra in the spot can be adjusted. Thus, the same laser annealing apparatus can meet different annealing process requirements, improving the process compatibility of the laser annealing apparatus. It can also avoid the problem of using multiple different laser annealing apparatuses to meet different annealing requirements, which helps to reduce the difficulty of process design.

[0054] The above description is merely a description of preferred embodiments of the present invention and is not intended to limit the scope of the present invention. Any person skilled in the art can make possible changes and modifications to the technical solutions of the present invention by utilizing the methods and techniques disclosed above without departing from the spirit and scope of the present invention. Therefore, any simple modifications, equivalent changes and alterations made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solutions of the present invention shall fall within the protection scope of the technical solutions of the present invention.

Claims

1. A laser annealing apparatus, characterized in that, The system includes a laser generation module and a laser shaping module, a beam combining module, and a focusing module disposed on the main laser optical path. The laser beam emitted by the laser generation module is shaped into two or more sub-laser beams by the laser shaping module. The two or more sub-laser beams are combined by the beam combining module and converged by the focusing module to form a light spot on the focal plane. The laser shaping module also includes a penumbra adjustment unit, which is used to adjust the width ratio of the penumbra in the light spot. The width ratio of the penumbra in the light spot is defined as the width of one side of the light spot cross section between 13.5% peak intensity and 90% peak intensity. The penumbra adjustment unit includes a first micro-optical element disposed at the rear end of the laser shaping module and movable into or out of the main laser optical path. The first micro-optical element includes a micromirror array arranged perpendicular to the main laser optical path.

2. The laser annealing apparatus as described in claim 1, characterized in that, The penumbra adjustment unit further includes a second micro-optical element disposed on the main laser optical path, the second micro-optical element comprising a micromirror array arranged perpendicular to the main laser optical path.

3. The laser annealing apparatus as described in claim 1, characterized in that, The laser annealing device also includes a parameter adjustment module, which is used to set the parameters in the main laser optical path.

4. The laser annealing apparatus as described in claim 3, characterized in that, The parameter adjustment module includes a compensation module and / or a focal plane adjustment module disposed on the main laser optical path. The compensation module is used to compensate for the optical path difference between the two or more sub-laser beams; the focal plane adjustment module is used to adjust the focal plane position of the light spot on the main laser optical path.

5. The laser annealing apparatus as described in claim 1, characterized in that, The laser annealing device includes a control module, which controls the laser generating module to output a laser beam to the laser shaping module, and controls the penumbra adjustment unit to move in or out of the laser shaping module.

6. The laser annealing apparatus as described in claim 1, characterized in that, The laser generation module includes a laser, a beam splitting system for splitting the laser emitted by the laser, an energy attenuator for adjusting the energy of the laser output by the beam splitting system according to a set attenuation ratio, and a shutter, which sends pulsed laser to the laser shaping module.

7. The laser annealing apparatus according to any one of claims 1 to 6, characterized in that, The light spot has a flat-topped energy distribution.

8. The laser annealing apparatus according to any one of claims 1 to 6, characterized in that, The laser annealing apparatus further includes an energy sensor and / or a camera disposed around the light spot. The energy sensor is used to monitor the energy distribution of the light spot on the focal plane, and the camera is used to measure the morphology of the light spot.

9. The laser annealing apparatus according to any one of claims 1 to 6, characterized in that, The laser annealing device also includes a temperature monitoring module, which is used to monitor the surface temperature of the material irradiated by the laser spot.

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