A hollow cathode ion source neutralizer tantalum tube insulator structure

Abstract

The application discloses a hollow cathode ion source neutralizer tantalum tube insulating piece structure, which adds an additional insulating distance on the outer wall of the reaction part of the hollow cathode tantalum tube, reduces the effective discharge area of the hollow cathode tantalum tube and the keeper shell, and enables the ignition working energy of the hollow cathode neutralizer to act on the port of the hollow cathode tantalum tube, so that the energy required for ignition and arc is reduced, and the gas demand is also reduced. The hollow cathode tantalum tube (2), the keeper shell (1) and the small ceramic insulating piece (3) are arranged in sequence, a tantalum tube insulating tube (4) is further arranged on the outer wall of the small ceramic insulating piece (3) close to the hollow cathode tantalum tube (2), and a groove (5) is arranged on the tantalum tube insulating tube (4).

Description

Technical Field

[0001] This invention relates to the field of plasma coating equipment technology, specifically to a tantalum tube insulating structure for a hollow cathode ion source neutralizer. Background Technology

[0002] like Figure 1 As shown, in the prior art, the hollow cathode tantalum tube 2 and the keeper housing 1 rely on a small insulating ceramic component 3 for normal operation. The portion between the insulating ceramic component 3 and the end of the hollow cathode tantalum tube 2 is called the reaction section. This results in a large area of ​​the hollow cathode tantalum tube 2 being exposed to the keeper housing 1. During operation, if the gas pressure in the keeper chamber is in the ionization zone, it will cause multiple discharge points in the reaction section between the keeper housing 1 and the hollow cathode tantalum tube 2. This is because, in most cases, it is desirable for the hollow cathode tantalum tube 2 to operate on the inner hollow tube wall. Furthermore, during the startup of the hollow cathode, the hollow cathode tantalum tube 2 and the keeper housing 1 are under a momentary high-voltage pulse. Excessive exposure will lead to multiple discharge points during startup, resulting in unstable startup. Additionally, the operating temperature of the hollow cathode tantalum tube 2 during operation causes the tantalum material itself to volatilize. After volatilization, a nanoscale sputtered conductive film will form on the surface of the insulating ceramic component 3. This will cause a short circuit between the hollow cathode tantalum tube 2 and the keeper housing 1, reducing its service life. Summary of the Invention

[0003] The purpose of this invention is to design an insulating structure for a hollow cathode ion source neutralizer tantalum tube. By adding an extra insulating distance to the outer wall of the reaction section of the hollow cathode tantalum tube, the effective discharge area of ​​the hollow cathode tantalum tube and the keeper shell is reduced. This allows all the ignition energy of the hollow cathode neutralizer to be applied at the port of the hollow cathode tantalum tube, thereby reducing the energy required for ignition and arc initiation, and also reducing the gas demand.

[0004] The present invention is achieved through the following technical solution: a tantalum tube insulating component structure for a hollow cathode ion source neutralizer, comprising a keeper shell, a hollow cathode tantalum tube, and an insulating small ceramic component. A tantalum tube insulating tube is also provided on the outer wall of the hollow cathode tantalum tube near the insulating small ceramic component, and a groove is provided on the tantalum tube insulating tube.

[0005] To further improve the realization of the tantalum tube insulating structure of the hollow cathode ion source neutralizer described in this invention, the following structure is specifically adopted: multiple levels of grooves are provided on the tantalum tube insulating tube.

[0006] To further improve the realization of the tantalum tube insulating structure of the hollow cathode ion source neutralizer described in this invention, the following structure is specifically adopted: each level of the groove is formed by an inward concavity around the circumference of the tantalum tube insulating tube, and each level of the groove is parallel to each other.

[0007] To further improve the realization of the tantalum tube insulating structure of the hollow cathode ion source neutralizer described in this invention, the following structure is specifically adopted: the width of the groove is greater than or equal to the depth of the groove.

[0008] To further improve the realization of the tantalum tube insulating component structure of the hollow cathode ion source neutralizer described in this invention, the following structure is specifically adopted: the ratio between the depth of the groove and the distance between the bottom of the groove and the inner wall of the tantalum tube insulating tube is 1:1~4.

[0009] To further improve the realization of the tantalum tube insulating structure of the hollow cathode ion source neutralizer described in this invention, the following structure is specifically adopted: the length of the tantalum tube insulating tube accounts for 2 / 3 to 3 / 4 of the length of the reaction section of the hollow cathode tantalum tube.

[0010] To further improve the realization of the tantalum tube insulating structure of the hollow cathode ion source neutralizer described in this invention, the following structure is specifically adopted: the tantalum tube insulating tube is made of ceramic material.

[0011] Compared with the prior art, the present invention has the following advantages and beneficial effects:

[0012] This invention improves the insulation between the hollow cathode tantalum tube and the keeper shell by using multi-level grooves in the tantalum tube insulation tube. The reason is that the volatilization of metal materials generally has the characteristic of linear propagation. Thus, a metal film will form on the high points of the tantalum tube insulation tube surface, but the possibility of forming a conductive metal film at multiple concave points is very small or almost non-existent. This improves the insulation between the hollow cathode tantalum tube and the keeper shell. The improved insulation will increase the service life of the neutralizer by about 3 times and reduce the frequency of maintenance and cleaning.

[0013] The present invention adds a tantalum tube insulation tube to the surface of the hollow cathode tantalum tube, which can effectively reduce the waste heat absorption of the lower surface of the hollow cathode tantalum tube by the keeper shell. Because the thermal conductivity of ceramic is relatively low, this reduces the temperature rise of the coating. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the tantalum tube insulation structure of a hollow cathode ion source neutralizer in the prior art.

[0015] Figure 2 This is a schematic diagram of the structure of the present invention.

[0016] Figure 3This is a schematic diagram of the tantalum tube insulating tube structure described in this invention.

[0017] Among them, 1-keeper shell, 2-hollow cathode tantalum tube, 3-insulating small ceramic part, 4-tantalum tube insulation tube, 5-groove. Detailed Implementation

[0018] The present invention will be further described in detail below with reference to embodiments, but the implementation of the present invention is not limited thereto.

[0019] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention. Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention.

[0020] In the description of this invention, it should be understood that the orientation or positional relationship indicated by terms, etc., is based on the orientation or positional relationship shown in the drawings and is only for the convenience of describing this invention and simplifying the description, and is not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this invention.

[0021] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, "a plurality of" means two or more, unless otherwise explicitly specified.

[0022] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," "setting," "layout," and "fixing," etc., should be interpreted broadly. For example, they can refer to fixed connections, detachable connections, or integral connections. The specific means used are not limited to conventional mechanical connection methods such as screwing, interference fit, riveting, and threaded auxiliary connections. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0023] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0024] Example 1:

[0025] like Figures 2-3 As shown, a hollow cathode ion source neutralizer tantalum tube insulation structure utilizes an additional insulation distance added to the outer wall of the reaction section of the hollow cathode tantalum tube to reduce the effective discharge area of ​​the hollow cathode tantalum tube and the keeper shell. This allows all the ignition energy of the hollow cathode neutralizer to be applied at the port of the hollow cathode tantalum tube, thereby reducing the energy required for ignition and arc initiation, and also reducing the gas demand. The structure includes a keeper shell 1, a hollow cathode tantalum tube 2, and an insulating small ceramic component 3. A tantalum tube insulation tube 4 is also provided on the outer wall of the hollow cathode tantalum tube 2 near the insulating small ceramic component 3, and a groove 5 is provided on the tantalum tube insulation tube 4.

[0026] As a preferred configuration, an additional tantalum tube insulation tube 4 is added to the outer wall of the near-insulating small ceramic part 3 of the hollow cathode tantalum tube 2, i.e., at the reaction section of the hollow cathode tantalum tube 2, and a groove 5 is formed on the tantalum tube insulation tube 4. During operation, argon gas is introduced into the hollow cathode tantalum tube 2, and at the reaction section, it is activated by a high-voltage electric field with the keeper shell 1 and enters a constant current mode to emit electrons through the hollow cathode effect. Because an additional tantalum tube insulation tube 4 is added at the reaction section, i.e., an additional insulation distance is added, the effective discharge area of ​​the hollow cathode tantalum tube and the keeper shell is reduced, thereby enabling all the ignition energy of the hollow cathode neutralizer to act at the port of the hollow cathode tantalum tube, thus reducing the energy required for ignition and arc initiation, and also reducing the gas demand.

[0027] The design of groove 5 further improves the insulation between the hollow cathode tantalum tube and the keeper shell. This is because the volatilization of metal materials generally has the characteristic of linear propagation. As a result, a metal film will form on the high points of the tantalum tube's insulating surface, but the possibility of forming a conductive metal film at multiple recessed points is very small or almost non-existent. This improves the insulation between the hollow cathode tantalum tube and the keeper shell. The improved insulation will increase the lifespan of the neutralizer by about 3 times and reduce the frequency of maintenance and cleaning.

[0028] Example 2:

[0029] This embodiment is a further optimization based on the above embodiments. The similarities with the aforementioned technical solutions will not be repeated here. Figure 2 , Figure 3 As shown, to further improve the tantalum tube insulation structure of the hollow cathode ion source neutralizer described in this invention, the following structure is specifically adopted: the groove 5 on the tantalum tube insulation tube 4 is provided with multiple levels, which can be set to 3 to 8 levels according to the actual situation in the specific design, with 5 levels being preferred.

[0030] Example 3:

[0031] This embodiment is a further optimization based on any of the above embodiments. The similarities with the aforementioned technical solutions will not be repeated here. Figure 2 , Figure 3 As shown, to further better realize the tantalum tube insulating component structure of the hollow cathode ion source neutralizer described in this invention, the following structure is specifically adopted: each level of the groove 5 is formed by a concave indentation around the circumference of the tantalum tube insulating tube 4, and each level of the groove 5 is parallel to each other.

[0032] Example 4:

[0033] This embodiment is a further optimization based on any of the above embodiments. The similarities with the aforementioned technical solutions will not be repeated here. Figure 2 , Figure 3 As shown, to further better realize the tantalum tube insulating structure of the hollow cathode ion source neutralizer described in this invention, the following configuration structure is specifically adopted: the width of the groove 5 is greater than or equal to the depth of the groove 5, preferably, the width of the groove 5 is greater than the depth of the groove 5, and further, the ratio of the width of the groove 5 to the depth of the groove 5 is 3:1.

[0034] Example 5:

[0035] This embodiment is a further optimization based on any of the above embodiments. The similarities with the aforementioned technical solutions will not be repeated here. Figure 2 , Figure 3 As shown, to further improve the tantalum tube insulation structure of the hollow cathode ion source neutralizer described in this invention, the following configuration is specifically adopted: the ratio of the depth of the groove 5 to the distance between the bottom of the groove 5 and the inner wall of the tantalum tube insulation tube 4 is 1:1~4, and preferably the ratio of the depth of the groove 5 to the distance between the bottom of the groove 5 and the inner wall of the tantalum tube insulation tube 4 is 1:2.4.

[0036] Example 6:

[0037] This embodiment is a further optimization based on any of the above embodiments. The similarities with the aforementioned technical solutions will not be repeated here. Figure 2, Figure 3 As shown, to further better realize the tantalum tube insulating component structure of the hollow cathode ion source neutralizer described in this invention, the following configuration structure is specifically adopted: the length of the tantalum tube insulating tube 4 accounts for 2 / 3 to 3 / 4 of the length of the reaction section of the hollow cathode tantalum tube 2, and preferably the length of the tantalum tube insulating tube 4 accounts for 0.6 of the length of the reaction section of the hollow cathode tantalum tube 2.

[0038] Example 7:

[0039] This embodiment is a further optimization based on any of the above embodiments. The similarities with the aforementioned technical solutions will not be repeated here. Figure 2 , Figure 3 As shown, in order to better realize the tantalum tube insulating structure of the hollow cathode ion source neutralizer described in this invention, the following structure is specifically adopted: the tantalum tube insulating tube 4 is made of ceramic material.

[0040] Example 8:

[0041] This embodiment is a further optimization based on any of the above embodiments. The similarities with the aforementioned technical solutions will not be repeated here. Figure 2 , Figure 3 As shown, a tantalum tube insulating structure for a hollow cathode ion source neutralizer includes a keeper shell 1, a hollow cathode tantalum tube 2, and an insulating small ceramic component 3. A tantalum tube insulating tube 4 made of ceramic material is also provided on the outer wall of the hollow cathode tantalum tube 2 near the insulating small ceramic component 3. A groove 5 is provided on the tantalum tube insulating tube 4, and the groove 5 is arranged in five levels. Each level of groove 5 is formed by a concave indentation around the circumference of the tantalum tube insulating tube 4, and each level of groove 5 is parallel to each other. The ratio of the width to the depth of the groove 5 is 3:1, the ratio of the depth of the groove 5 to the distance between the bottom of the groove 5 and the inner wall of the tantalum tube insulating tube 4 is 1:2.4, and the length of the tantalum tube insulating tube 4 accounts for 0.6 of the length of the reaction section of the hollow cathode tantalum tube 2.

[0042] During operation, argon gas is introduced into the hollow cathode tantalum tube 2. At the reaction section, it is activated by a high-voltage electric field with the keeper shell 1 and enters a constant current mode to emit electrons through the hollow cathode effect. Because an additional tantalum tube insulation tube 4 is added at the reaction section, that is, an additional insulation distance is added, the effective discharge area of ​​the hollow cathode tantalum tube and the keeper shell is reduced. As a result, all the ignition energy of the hollow cathode neutralizer can be applied to the port of the hollow cathode tantalum tube, thereby reducing the energy required for ignition and arc initiation, and also reducing the gas demand.

[0043] The design of groove 5 further improves the insulation between the hollow cathode tantalum tube and the keeper shell. This is because the volatilization of metal materials generally has the characteristic of linear propagation. As a result, a metal film will form on the high points of the tantalum tube's insulating surface, but the possibility of forming a conductive metal film at multiple recessed points is very small or almost non-existent. This improves the insulation between the hollow cathode tantalum tube and the keeper shell. The improved insulation will increase the lifespan of the neutralizer by about 3 times and reduce the frequency of maintenance and cleaning.

[0044] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Any simple modifications or equivalent changes made to the above embodiments based on the technical essence of the present invention are within the protection scope of the present invention.

Claims

1. A hollow cathode ion source neutralizer tantalum tube insulation structure, comprising a keeper shell (1), a hollow cathode tantalum tube (2), and an insulating small ceramic component (3), characterized in that: A tantalum tube insulating tube (4) is also provided on the outer wall of the near-insulating small ceramic part (3) of the hollow cathode tantalum tube (2), and a groove (5) is provided on the tantalum tube insulating tube (4); The tantalum tube insulating tube (4) has multiple levels of grooves (5); each level of groove (5) is formed by recessing around the circumference of the tantalum tube insulating tube (4), and each level of groove (5) is parallel to each other; The width of the groove (5) is greater than or equal to the depth of the groove (5); the ratio between the depth of the groove (5) and the distance between the bottom of the groove (5) and the inner wall of the tantalum tube insulating tube (4) is 1:1~4.

2. The structure of the tantalum tube insulating component of the hollow cathode ion source neutralizer according to claim 1, characterized in that: The length of the tantalum tube insulating tube (4) is 2 / 3 to 3 / 4 of the length of the reaction section of the hollow cathode tantalum tube (2).

3. The structure of the tantalum tube insulating component of the hollow cathode ion source neutralizer according to claim 1, characterized in that: The tantalum tube insulation tube (4) is made of ceramic material.

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