A system and method for reducing the flux of ions entering a calibration load

Abstract

This invention belongs to the field of calibration testing for space particle detection instruments, and particularly relates to a system and method for reducing the flux of ions entering the calibration payload. The system is positioned between the ion source and the detector, and includes: an ion source baffle, a defocusing module, and a receiving baffle. The ion source baffle allows some ions to pass through through a central opening, reducing the ion flux. The defocusing module defocuses the ions passing through the ion source baffle. The receiving baffle allows some ions to enter the detector through a through-hole, further reducing the ion flux. The three parts of this system work together to achieve an adjustable reduction in ion flux, enabling a high-flux ion source to meet the calibration environment requirements of some particle detection instruments with low-flux ion incident intensity.

Description

Technical Field

[0001] This invention belongs to the field of calibration testing of space particle detection instruments, and particularly relates to a system and method for reducing the flux of ions entering the calibration payload. Background Technology

[0002] Various space particle detectors are the primary means of probing the space particle environment. On the ground, these detectors need to simulate the space environment using particles generated by particle accelerators for instrument calibration. Calibration uses ion sources with high beam flux, but the calibrated instruments require low ion flux; otherwise, the instrument sensors will saturate, preventing accurate calibration. While the particle beam flux generated by particle accelerators is usually adjustable, some instruments have a lower upper limit for measuring particle flux. A large number of incident particles can saturate the detector sensors, affecting measurement results. Therefore, it is necessary to reduce the number of particles entering the detector. Summary of the Invention

[0003] This invention addresses the technical deficiency in existing calibration techniques where the flux intensity of some ion sources cannot meet experimental requirements. It proposes a system and method to reduce the ion flux entering the calibration payload, which can effectively reduce the ion flux entering the detector.

[0004] To achieve the above objectives, this invention proposes a system for reducing the ion flux entering a calibration payload, positioned between an ion source and a detector. The system includes: an ion source baffle, a defocusing module, and a receiving baffle; wherein...

[0005] The ion source baffle is used to allow some ions to pass through through the central opening, thereby initially reducing the ion flux.

[0006] The defocusing module is used to defocus ions passing through the ion source baffle.

[0007] The receiving baffle is used to allow some ions to enter the detector through a through-hole, thereby further reducing the ion flux.

[0008] As an improvement to the above system, the ion source baffle is millimeter thick and has an opening with an area of ​​S2 in the center.

[0009] As an improvement to the above system, the ion flux reduced by the ion source baffle is as follows: Where S1 is the area of ​​the ions emitted from the ion source hitting the ion source baffle.

[0010] As an improvement to the above system, the defocusing module includes three metal cylinders with a certain inner diameter: a first cylinder, a second cylinder, and a third cylinder, wherein the first cylinder and the third cylinder are both supplied with 0 volts, and the second cylinder is supplied with a positive high voltage of several thousand to tens of thousands of volts.

[0011] As an improvement to the above system, the defocusing effect of the defocusing module is proportional to the area S3 of the ions hitting the receiving baffle, where S3 satisfies the following formula:

[0012] S3 = f(U, L)

[0013] Where U represents the voltage value added to the second cylinder, L is the distance between the third cylinder and the receiving baffle, and f() represents the functional relationship between U and L.

[0014] As an improvement to the above system, the receiving baffle is millimeter thick and has through holes of different sizes, with a total area of ​​S4.

[0015] As an improvement to the above system, the receiving baffle reduces the ion flux by the following percentage:

[0016] As an improvement to the above system, the reduction in ion flux η is:

[0017] On the other hand, the present invention proposes a method for reducing the flux of ions entering the calibration load, implemented based on the above system, the method comprising:

[0018] The system is positioned between the ion source and the detector;

[0019] Based on the experimental requirements, the reduction ratio η of the ion flux, the area S1 of the ion emitted from the ion source hitting the ion source baffle, and the adjustment of the central opening area S2 of the ion source baffle, the distance L between the third cylinder and the receiving baffle, and the total area S4 of the through holes in the receiving baffle, respectively, make...

[0020] Compared with the prior art, the advantages of the present invention are:

[0021] 1. The percentage reduction in ion flux in the system of the present invention can be dynamically adjusted according to actual needs, which greatly facilitates experimental conditions;

[0022] 2. The system of the present invention can adjust the position of the detector receiving ions by changing the position of the opening of the receiving baffle, so as to meet different experimental requirements;

[0023] 3. The three parts of the system of the present invention work together to achieve an adjustable reduction in the ion flux ratio, so that the high-flux ion source can meet the calibration environment requirements of some particle detection instruments for low-flux ion incident intensity. Attached Figure Description

[0024] Figure 1 This is a schematic diagram of the design cross-section of the present invention;

[0025] Figure 2 This is a block diagram of the system composition for reducing the flux of ions entering the calibration load according to the present invention. Detailed Implementation

[0026] This invention provides a method for reducing the flux intensity of ion beams emitted from an ion source reaching a detector. The lower limit of the adjustable flux intensity of ion sources used for particle detector calibration is limited. Since some instrument calibrations require even lower ion flux intensities to prevent detector saturation, improvements to the experimental environment are necessary. This invention proposes a method for adjusting the reduction of ion flux entering the detector, comprising an ion source baffle for initial flux reduction, three metal cylinders with specific inner diameters, and a receiving baffle. The ion source baffle provides physical shielding of ions, allowing ions to pass through only the open area. The three metal cylinders defocus the ions, causing their emission direction to diverge significantly after passing through the cylinders, further reducing the ion intensity in conjunction with the receiving baffle. The three components work together to achieve an adjustable reduction in ion flux ratio, enabling high-flux ion sources to meet the calibration environment requirements of some particle detection instruments with low-flux ion incident intensity.

[0027] The technical solution of the present invention will be described in detail below with reference to the accompanying drawings and embodiments.

[0028] Example 1

[0029] like Figure 1 As shown, Embodiment 1 of the present invention proposes a system for reducing the flux of ions entering the calibration payload, which is disposed between the ion source and the detector. The system includes: an ion source baffle, a defocusing module and a receiving baffle. Figure 2 This is a block diagram of the system composition for reducing the flux of ions entering the calibration load according to the present invention.

[0030] An ion source baffle is used to allow some ions to pass through through a central opening, thus initially reducing the ion flux.

[0031] The defocusing module is used to defocus ions passing through the ion source baffle; it includes three metal cylinders with a certain inner diameter.

[0032] A receiving baffle is used to allow some ions to enter the detector through a set through-hole, further reducing the ion flux.

[0033] The purpose of this invention is to propose a system for improving the calibration conditions of a particle detector, which can be used to reduce the ion flux entering the particle detector when the ion source beam flux is strong.

[0034] Depending on the energy of the ions emitted from the ion source, a baffle plate typically only a few millimeters thick is sufficient to shield the ions, preventing them from penetrating the plate and achieving physical shielding. Assuming the ion source emission area is S1 and the baffle plate has an opening of area S2 at its center, the percentage reduction in ion flux caused by the baffle plate is:

[0035] Three metal cylinders with specific inner diameters and lengths function to defocus ions passing through the ion source baffle. The first cylinder (… Figure 1 Middle cylinder 1) and third cylinder ( Figure 1 The voltage applied to the middle cylinder 3 is 0V, and the voltage applied to the second cylinder ( Figure 1 A positive voltage of several thousand to tens of thousands of volts is added to the inner cylinder 2. The voltage applied to cylinder 2 affects the focal point of the ions, which in turn affects the area of ​​the ions hitting the receiving baffle, i.e., the defocusing effect. The larger the area S3 hitting the receiving baffle, the better the defocusing effect. S3 is related not only to the focal point position but also to the distance L from the receiving baffle to the cylinder baffle. Therefore, S3 can be expressed as...

[0036] S3 = f(U, L)

[0037] The receiving baffle is also a few millimeters thick and has through-holes of different sizes for ions to pass through and enter the detector. The size of the through-hole area and the location of the openings are designed according to actual needs. Assuming that when the through-hole area is S4, the proportion of ion flux reduced by the receiving baffle is: This method reduces the percentage of ion flux:

[0038]

[0039] Example 2

[0040] Embodiment 2 of the present invention proposes a method for reducing the flux of ions entering a calibration load, based on the system implementation of Embodiment 1, the method comprising:

[0041] The system is positioned between the ion source and the detector;

[0042] Based on the experimental requirements, the reduction ratio η of the ion flux, the area S1 of the ion emitted from the ion source hitting the ion source baffle, and the adjustment of the central opening area S2 of the ion source baffle, the distance L between the third cylinder and the receiving baffle, and the total area S4 of the through holes in the receiving baffle, respectively, make...

[0043] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit it. Although the present invention has been described in detail with reference to the embodiments, those skilled in the art should understand that modifications or equivalent substitutions to the technical solutions of the present invention do not depart from the spirit and scope of the technical solutions of the present invention, and all such modifications or substitutions should be covered within the scope of the claims of the present invention.

Claims

1. A system for reducing the flux of ions into a target load, disposed between an ion source and a detector, characterized in that, The system comprises an ion source baffle, a defocusing module and a receiving baffle, wherein The ion source baffle is used to pass part of the ions through the central opening and preliminarily reduce the ion flux; The defocusing module is used to defocus the ions passing through the ion source baffle; The receiving baffle is used to pass part of the ions into the detector through the set through hole and further reduce the ion flux; The defocusing module comprises three metal cylinders with a certain inner diameter: a first cylinder, a second cylinder and a third cylinder, wherein the first cylinder and the third cylinder are both added with 0-volt voltage, and the second cylinder is added with several thousand to several ten-thousand-volt positive high voltage; The system reduces the proportion of ion flux Wherein, S1 is the area of the ion source emitted ion hitting the ion source baffle, S2 is the area of the opening hole arranged at the center of the ion source baffle, U represents the voltage value added by the second cylinder, L is the distance between the third cylinder and the receiving baffle, f(U, L) represents the functional relationship between U and L, and S4 is the total area of the different size through holes arranged on the receiving baffle.

2. The system for reducing the flux of ions into a selected load of claim 1, wherein, The thickness of the ion source baffle is in millimeter level.

3. The system for reducing the flux of ions into a selected load of claim 1, wherein, The ion source baffle reduces the proportion of ion flux by: where S1 is the area of the ion source exit ions hitting the ion source baffle.

4. The system for reducing the flux of ions into a selected load of claim 1, wherein, The defocusing effect of the defocusing module is proportional to the area S3 of the ions hitting the receiving baffle, and S3 satisfies the following formula: S3 = f(U, L) Wherein, U represents the voltage value added to the second cylinder, L is the distance between the third cylinder and the receiving baffle, and f() represents the functional relationship between U and L.

5. The system for reducing the flux of ions into a selected load of claim 1, wherein, The thickness of the receiving baffle is in millimeter level.

6. The system for reducing the flux of ions into a selected load of claim 1, wherein, The proportion of the ion flux reduced by the receiving baffle is:

7. A method for reducing the ion flux entering the calibration load, which is realized based on the system of claim 1, and the method comprises: Setting the system between the ion source and the detector; According to the experimental requirements, the ion flux ratio η is reduced, the area S1 on which the ions emitted from the ion source hit the ion source baffle, the area S2 of the central opening of the ion source baffle, the distance L between the third cylinder and the receiving baffle, and the total area S4 of the through holes of the receiving baffle are adjusted, so that

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