Secret opening

Abstract

Disclosed is a reflective component having a semi-transmissive and semi-reflective region and a substantially opaque region. The semi-transmissive and semi-reflective region can function as a sensor opening region. When the component is viewed from a first direction, the difference between the total light reflectance of the component at the substantially opaque region and the sensor opening region is less than 5 percent. Furthermore, when the component is viewed from the first direction, the difference between the color reflectance of the component at the substantially opaque region and the sensor opening region is less than 5 ΔC* units. A sensor positioned in a second direction of the component, in the direction opposite to the first direction, can be used to receive light passing through the component at the sensor opening region.

Description

[0001] Cross-reference to related applications

[0002] This application claims priority under 35 U.S.C. §119(e) to U.S. Provisional Application No. 63 / 014,304, filed on April 23, 2020, entitled “DISCREET OPENING,” the disclosure of which is incorporated herein by reference in its entirety. Technical Field

[0003] The present invention relates generally to thin film coatings and, more particularly, to thin film coatings that provide a close visual appearance match between the substantially opaque regions and the transflective regions of a multi-region reflector. Background Art

[0004] Reflective surfaces are commonly used, particularly in the automotive industry. Furthermore, these reflective surfaces are often incorporated into electro-optical devices to provide variable perceived reflectivity to reduce glare. Similarly, sensors are commonly used in the automotive industry. Therefore, placing sensors behind these reflective surfaces has become a desirable approach. However, placing these sensors behind reflective surfaces often requires transmissive openings to accommodate the sensors. These openings are relatively visible and aesthetically undesirable. Therefore, there is a need for improved reflective surfaces with transmissive areas that allow sensors to be positioned behind reflective surfaces while reducing the visibility of the transmissive areas. Summary of the Invention

[0005] In accordance with the present disclosure, the disadvantages and problems associated with reflective surfaces having transmissive openings have been significantly reduced or eliminated.

[0006] According to one aspect of the present disclosure, a device is disclosed. The device may include a component having a substantially opaque region and a sensor opening region. The substantially opaque region may include a first substrate, a first layer, and a second layer. The first substrate may be substantially transparent in the visible spectrum. The first layer may be positioned relative to the first substrate in a first orientation and may be substantially opaque in the visible spectrum. In some embodiments, the first layer may be at least one of chromium, molybdenum, vanadium, ruthenium, and nickel. The second layer may be positioned relative to the first layer in the first orientation and may be substantially reflective in the visible spectrum. In some embodiments, the second layer may include at least one of silver and a silver alloy, such as a silver-gold alloy containing approximately seven weight percent gold. The sensor opening region may include the first substrate, a third layer, and the second layer. The third layer may have a high refractive index and may be positioned relative to the first substrate in the first orientation. In some embodiments, the third layer may be at least one of silicon, chromium, germanium, tantalum oxide, zirconium oxide, tin oxide, indium tin oxide, or titanium oxide. In some embodiments, the refractive index may be at least approximately 1.9. The second layer may be positioned relative to the third layer in the first orientation. When viewed from a first direction, the difference between the total light reflectance of the component at the substantially opaque region and the sensor opening region may be less than 5 percent. Furthermore, when viewed from the first direction, the difference between the color reflectance of the component at the substantially opaque region and the sensor opening region may be less than 5 ΔC* units. Furthermore, a sensor positioned in a second direction relative to the sensor opening region of the component may be configured to receive light passing through the component at the sensor opening region. The second direction may be opposite to the first direction. In some embodiments, the transmittance of visible light at the sensor opening region may be approximately 7% to 15%.

[0007] In some embodiments, the substantially opaque region may further include a fourth layer disposed between the first and second layers. In some such embodiments, the fourth layer may be ruthenium. Additionally, the sensor opening region may include a fourth layer disposed between the third and second layers.

[0008] In other embodiments, the device may further include a second substrate and an electro-optical medium. The second substrate may be positioned in a spaced relationship relative to the component in the first direction. Furthermore, the second substrate may include a first electrode. The electro-optical medium may be positioned between the component and the second substrate. Furthermore, the component may include a second electrode. In some such embodiments, the second layer may be the second electrode.

[0009] According to another aspect of the present disclosure, a device is disclosed. The device may include a component having a substantially opaque region and a sensor opening region. The substantially opaque region may include a first substrate, a first layer, and a second layer. The first substrate may be substantially transparent in the visible spectrum. The first layer may be positioned in a first orientation relative to the first substrate and may be substantially opaque in the visible spectrum. In some embodiments, the first layer may include at least one of chromium, molybdenum, vanadium, and nickel. The second layer may be positioned in a second orientation relative to the first substrate and may be substantially reflective in the visible spectrum. In some embodiments, the second layer may include at least one of silver and a silver alloy, such as a silver-gold alloy containing approximately seven weight percent gold. The second orientation may be opposite the first orientation. The sensor opening region may include the first substrate, a third layer, and the second layer. The third layer may have a high refractive index and may be positioned in the first orientation relative to the first layer. In some embodiments, the third layer may include at least one of silicon, chromium, germanium, tantalum oxide, zirconium oxide, tin oxide, indium tin oxide, or titanium oxide. In some embodiments, the refractive index of the third layer may be at least approximately 1.9. The second layer may be positioned in the second orientation relative to the third layer. When viewed from the second direction, the difference between the total light reflectance of the component at the substantially opaque region and the sensor opening region may be less than 5 percent. Furthermore, when viewed from the first direction, the difference between the color reflectance of the component at the substantially opaque region and the sensor opening region may be less than 5 ΔC* units. Furthermore, a sensor positioned in the first direction of the sensor opening region of the component can be configured to receive light passing through the component at the sensor opening region. In some embodiments, the transmittance of visible light at the sensor opening region may be approximately 7% to 15%.

[0010] In some embodiments, the component may further include a fourth layer. The fourth layer may be disposed between the second layer and the first substrate. In some such embodiments, the fourth layer may include ruthenium.

[0011] In other embodiments, the device may further include a second substrate and an electro-optical medium. The second substrate may be positioned in a spaced relationship relative to the component in the second direction. Furthermore, the second substrate may include a first electrode. The electro-optical medium may be positioned between the component and the second substrate. Furthermore, the component may include a second electrode. In some such embodiments, the second layer may be the second electrode.

[0012] Advantages of certain embodiments of the present disclosure include reflective surfaces having a stealthy transflective region due to a smaller total reflectivity difference and a lower ΔC* unit between areas within the transflective region and areas outside the transflective region. The stealthy transflective region has the advantage of a desirable aesthetic appearance, where the component appears more uniform. Additionally, some embodiments may have the advantage of not requiring a large area, as the transflective region may be formed without a gradual transition. Furthermore, some embodiments may have the advantage of one or more or all layers being a high deposition rate material. Thus, by using a high deposition rate material to achieve the stealthy transflective region, simpler and more cost-effective production may be achieved.

[0013] After studying the following specification, claims and drawings, those skilled in the art will understand and appreciate these and other aspects, objects and features of the present disclosure. It will also be understood that the features of each embodiment disclosed herein can be used in combination with the features of other embodiments, or as a substitute for the features described. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] In each diagram:

[0015] Figure 1a : Schematic cross-section of an embodiment of a component having a concealed sensor opening.

[0016] Figure 1b : Schematic cross-section of an embodiment of a component having a concealed sensor opening.

[0017] Figure 1c : Schematic cross-section of an embodiment of a component having a concealed sensor opening.

[0018] Figure 2a : Schematic cross-section of an embodiment of a component having a concealed sensor opening.

[0019] Figure 2b : Schematic cross-section of an embodiment of a component having a concealed sensor opening.

[0020] Figure 2c : Schematic cross-section of an embodiment of a component having a concealed sensor opening.

[0021] Figure 3 : Schematic cross-sectional view of an embodiment of an electro-optical element.

[0022] Figure 4 : Graph comparing the optical properties of silicon used for the third layer.

[0023] Figure 5 : Graph comparing visible light, which shows the effect of the third layer consisting of a semiconductor on the transmittance. DETAILED DESCRIPTION

[0024] For the purposes of this description, the specific devices and processes shown in the drawings and described in this disclosure are merely exemplary embodiments of the inventive concepts defined in the appended claims. Therefore, unless the claims expressly state otherwise, the specific features associated with the embodiments disclosed herein should not be considered as limiting.

[0025] When discussing color distribution (i.e., spectrum), it is useful to refer to the 1976 CIELAB chromaticity diagram of the International Commission on Illumination (CIE), commonly referred to as the L*a*b* diagram or quantization scheme. Color technology is relatively complex, but F.W. Billmeyer and M. Saltzman provide a fairly comprehensive discussion in Principles of Color Technology, 2nd edition (1981), published by John Wiley and Sons Inc. This disclosure relates to color technology and uses appropriate terminology, so generally follow that discussion. As used in this application, Y (sometimes also referred to as Cap Y), depending on the context, represents total reflectance or total transmittance. L*, a*, and b* can be used to characterize light parameters in transmission or reflection. According to the L*a*b* quantization scheme, L* represents lightness and is related to the eye-weighted value of reflectance or transmittance (also known as the normalized Y tristimulus value) by the following Y tristimulus value Yref of a white reference: L* = 116*(Y / Yref) - 16. The a* parameter is a color coordinate representing a color gamut ranging from red (positive a*) to green (negative a*), while b* is a color coordinate representing a color gamut ranging from yellow to blue (positive and negative values ​​of b*, respectively). As used in this application, Y (sometimes also referred to as Cap Y) represents the total reflectance weighted to the sensitivity of the human eye to visible light. For example, the absorption spectrum of an electrochromic medium measured at any particular voltage applied to the medium can be converted into a three-digit designation corresponding to a set of L*, a*, and b* values. To calculate a set of color coordinates from a spectral transmittance or reflectance, for example (L * 、a * 、b * ) value, two additional parameters are required. One parameter is the spectral power distribution of the light source or illuminant. This disclosure uses CIE standard illuminant A to simulate the light from the car headlight, and uses CIE standard illuminant D to simulate the light from the car headlight. 65 Simulates daylight. The second parameter is the observer's spectral response. Many of the following examples quote the (reflectance) value Y from the 1964 CIE standard because it corresponds more closely to spectral reflectance than L*. The value of "color magnitude" or C* is defined as and provides a metric for quantifying color neutrality. The metric for "color difference," or ΔC*, is defined as where (a*,b*) and (a*',b*') describe the color of the light obtained in two different measurements.

[0026] A component with a reflective surface can accommodate a sensor located behind it in several ways. While the primary focus of the present disclosure may be on sensors, embodiments of the present disclosure are also applicable to light sources, displays, or similar components that can be used in place of sensors. First, the reflective surface can simply have a non-reflective hole through which the sensor can be optically aligned. However, this approach is not ideal because the sensor opening is easily discernible and therefore less aesthetically pleasing. Second, the reflective surface can have a gradual transition between the opaque area and the semi-transmissive and semi-reflective area to provide a seamless appearance. Such gradual transitions can provide an aesthetically acceptable appearance; however, these transitions are best suited for situations where the gradient can be applied over a relatively large distance. In situations where the sensor opening is small, such as for glare sensors, the available distance may be an issue. Third, the reflective surface can be made semi-transmissive and semi-reflective. However, to prevent objects behind the component from being inadvertently visible, an opaque decal is applied to the back of the component. A disadvantage of this approach is that the decal may increase cost and production complexity.

[0027] The present disclosure relates to an improved component having a transflective region suitable for a sensor, wherein the transflective region has a stealthy appearance. Thus, the improved component can effectively accommodate the sensor while providing a substantially uniform reflectivity therethrough. Furthermore, the improved component may not require a tapered opening.

[0028] Figure 1aFigure 1-c is a schematic cross-sectional view of an embodiment of a member 100 having a covert sensor opening. Member 100 may be a rearview mirror. Member 100 includes a substantially opaque region 101 and a semi-transmissive, semi-reflective region 102. When viewed from a first direction 105, the substantially opaque region 101 may be reflective. In other words, the member 100 may be viewed from a second direction 106. First direction 105 may be perpendicular to the length of member 100. Second direction 106 is opposite first direction 105. In some embodiments, the reflectivity of the substantially opaque region 101 may be equal to and / or less than approximately 80%, 70%, 65%, 60%, 55%, 50%, 45%, or 40%. Furthermore, the transmittance of light in the opaque region 101 may be equal to and / or less than approximately 5%, 4%, 3%, 2%, 1%, 0.5%, or 0.1%. The translucent and semi-reflective area 102 may have a transmittance equal to and / or greater than approximately 6%, 8%, 10%, 15%, 25%, or 35%. The translucent and semi-reflective area 102 may also have a reflectance equal to and / or greater than approximately 40%, 45%, 50%, 55%, 60%, 65%, 70%, or 80% for light coming from the first direction 105. The translucent and semi-reflective area 102 may be a sensor opening area. In some embodiments, the translucent and semi-reflective area 102 may be circular. The component 100 may include a first substrate 110, a first layer 111, a second layer 112, and a third layer 113. In addition, in some embodiments, the component 100 may also include a fourth layer 114.

[0029] The first substrate 110 may be a transparent or substantially transparent material. For example, the first substrate 110 may be borosilicate glass, soda lime glass, float glass, natural and synthetic polymer resins, plastics, and / or a material including a polymer commercially available from Topas Advance Polymers. Although specific substrate materials are disclosed, this is for illustrative purposes only and many other substrate materials may be used.

[0030] like Figure 1aAs shown in FIG. 1 , the first, second, third, and fourth layers 111-114 can be selected so that the transflective region 102 is concealed from view by the component 100 alone. Thus, the layers 111-114 can be selected so that, when viewed from a first direction 105, the difference (ΔY) between the total light reflectance of the first component 100 at the substantially opaque region 101 and the transflective region 102 is less than or equal to 10 percent, 5 percent, 4 percent, 3 percent, 2 percent, or 1 percent. Furthermore, the difference in color reflectance of the first component 100 at the substantially opaque region 101 and the transflective region 102 can be small. For example, the difference in color reflectance can be less than or equal to 10, 5, 4, 3, 2, or 1 ΔC* units when viewed from the first direction 105. In some embodiments, the reflected color can be a neutral color palette, except for minor color differences. Thus, in some embodiments, the absolute values ​​of the a* and / or b* reflectance color metrics can be less than or equal to approximately 10, 7.5, or 5.0. Likewise, the C* metric may be less than or equal to approximately 15, 10, 5.0.

[0031] The first layer 111 can be an opaque or substantially opaque material. For example, the first layer 111 can be chromium, molybdenum, vanadium, ruthenium, nickel, or other suitable metal or light-absorbing material. In addition, the first layer 111 can be arranged in a first direction 105 relative to the first substrate 110. The first direction 105 can be perpendicular to the surface of the first substrate 110. In some embodiments, the first layer 111 can be in adjacent contact with the first substrate 110. The first layer 111 can also be discontinuous, having one or more openings therein. Specifically, the first layer 111 can be arranged in the substantially opaque area 101, while the semi-transmissive and semi-reflective area 102 is defined as not having the first layer 111. In addition, for a given embodiment, the thickness of the first layer 111 can be selected to achieve a desired level of opacity in the opaque area 101. For example, the thickness of the first layer 111 can be equal to or approximately 20, 35, 50, 75, or 100 nm.

[0032] The second layer 112 can be a reflective layer. For example, the second layer 112 can be silver or a silver alloy, such as a silver-gold alloy. In some embodiments, the silver-gold alloy can be 7% gold and 93% silver by weight. Similarly, other silver alloy compositions or compatible reflector metals can be used. In addition, for a given embodiment, the thickness of the second layer 112 can be selected to achieve a desired level of reflectivity. For example, the thickness of the second layer 112 can be approximately 5, 7, 8, 9, 10, 11, 12, 13, 14, 15, or 20 nm. Furthermore, the second layer 112 can be positioned relative to the first layer 111 in the first direction 105. In some embodiments, the second layer 112 can be in abutting contact with the first layer 111. In other embodiments, the second layer 112 can be positioned in a spaced relationship with the first layer 111. The second layer 112 can also be positioned nonlinearly, where portions of the second layer are not positioned in the same plane. The second layer 112 can be positioned in the substantially opaque region 101 and the semi-transmissive and semi-reflective region 102 of the component 100.

[0033] The third layer 113 may be a layer having a high refractive index. The refractive index may be equal to or greater than approximately 1.9, 2.0, 2.1, 2.2, 2.3, 2.4, 3.0, 3.5, 4.0, or 4.5. In addition, the thickness of the third layer 213 may be equal to and / or less than approximately 100, 80, 60, 40, 35, 30, 25, 20, 15, 10, or 5 nm. For example, the third layer 113 may be silicon, silicon carbide, chromium, germanium, tantalum oxide, zirconium oxide, tin oxide, indium tin oxide, titanium oxide, a semiconductor, or other suitable high refractive index material. In addition, the third layer 113 may be arranged relative to the first substrate 110 in the first direction 105. In some embodiments, the third layer 113 may be in adjacent contact with the first substrate 110. In some embodiments, the third layer 113 may be arranged substantially across the entire length of the first substrate 110 ( Figure 1a Thus, the third layer 113 can be positioned in the substantially opaque region 101 and the transflective region 102 of the member 100. In other embodiments, the third layer 113 can be positioned to be confined or substantially confined to the transflective region 102 ( Figure 1b ) and / or the immediate area surrounding the semi-transmissive and semi-reflective area 102 ( Figure 1c ).

[0034] Although visible light performance is generally important, in some embodiments, other regions of the electromagnetic spectrum may be important. For example, the near-infrared (NIR) region may be important, particularly when component 100 is used with an emitter or sensor that operates in the NIR region. The stealthy opening technology taught herein may be accordingly applicable to NIR applications. Specifically, using a semiconductor layer such as silicon in the third layer 113 may increase the transmittance in the NIR region while maintaining a smaller optical difference between the substantially opaque region 101 and the semi-transmissive, semi-reflective region 102 in the visible region. In some embodiments, a semiconductor such as silicon may have enhanced transmission in the NIR region relative to visible light transmittance. For example, the NIR transmittance may be equal to or greater than approximately 1.25, 1.5, or 1.75 times the visible light transmittance.

[0035] In other embodiments, neutral transmission color may be particularly important. Specifically, when component 100 is used with a visible light display or imager. In such embodiments, third layer 113 may be composed of TiO2, SiC, or the like. Thus, absolute values ​​of the transmission a* and / or b* color metrics equal to or less than approximately 12, 7.5, or 5.0 may be achieved.

[0036] The fourth layer 114 can be an adhesion or stabilization layer. For example, the fourth layer 114 can be a layer that promotes adhesion between the first layer 111, the second layer 112, and / or the third layer 113. In some embodiments, the fourth layer 114 can be ruthenium, rhodium, molybdenum, iridium, palladium, nickel, rhenium, or platinum. Furthermore, the fourth layer 114 can be positioned in a first direction 105 relative to the first layer 111 and / or in a second direction 106 relative to the second layer 112. The second direction 106 is opposite the first direction 105. In some embodiments, the fourth layer 114 can be in abutting contact with the first layer 111 and / or the second layer 112. Furthermore, the fourth layer 114 can be positioned in the substantially opaque region 101 and / or the semi-transmissive and semi-reflective region 102 of the component 100. The fourth layer 114 can also be positioned nonlinearly, where portions of the fourth layer are not positioned in the same plane. The thickness of the fourth layer 114 can be selected to achieve a desired reflectivity match, reflectivity intensity, and / or transmittance intensity. In some embodiments, the thickness of the fourth layer 114 may be between 0.5 and 15 nm.

[0037] Figure 2a-c is a cross-sectional representation of member 200 with a covert sensor opening. Member 200 may be a rearview mirror. Member 200 includes a substantially opaque region 201 and a transflective region 202. When viewed from a first direction 105, substantially opaque region 201 may be reflective. First direction 105 may be perpendicular to the length of member 200. In some embodiments, the reflectivity of substantially opaque region 201 may be equal to and / or less than approximately 80%, 70%, 65%, 60%, 55%, 50%, 45%, or 40%. The transmittance of light in substantially opaque region 201 may be equal to and / or less than approximately 5%, 4%, 3%, 2%, 1%, 0.5%, or 0.1%. The transflective region 202 may have a transmittance equal to and / or greater than approximately 6%, 8%, 10%, 15%, 25%, or 35%. The transflective area 202 may also have a reflectivity of light from the first direction 105 of approximately 40%, 45%, 50%, 55%, 60%, 65%, 70%, or 80%. The transflective area 202 may be a sensor opening area. In some embodiments, the transflective area 102 may be circular. The component 200 may include a first substrate 210, a first layer 211, a second layer 212, and a third layer 213. In some embodiments, the component 200 may also include a fourth layer 214.

[0038] The first substrate 210 can be a transparent or substantially transparent material. For example, the first substrate 210 can be borosilicate glass, soda lime glass, float glass, natural and synthetic polymer resins, plastics, and / or a material including a polymer commercially available from Topas Advance Polymers. Although specific substrate materials are disclosed, this is for illustrative purposes only and many other substrate materials may be used.

[0039] like Figure 2aAs shown in FIG. 1-c, the first, second, third, and fourth layers 211-214 can be selected so that the transflective region 202 is concealed from the viewing member 200 when used alone. Thus, the layers 211-214 are selected so that when viewed from the first direction 105, the difference (ΔY) between the total light reflectance of the member 200 at the substantially opaque region 201 and the transflective region 202 is less than or equal to 10 percent, 5 percent, 4 percent, 3 percent, 2 percent, or 1 percent. Additionally, the difference in color reflectance of the member 200 at the substantially opaque region 201 and the transflective region 202 can be small. For example, the difference in color reflectance can be less than or equal to 10, 5, 4, 3, 2, or 1 ΔC* units when viewed from the first direction 105. In some embodiments, the reflected color can be color-neutral, except for minor color differences. Thus, in some embodiments, the absolute values ​​of the a* and / or b* reflectance color metrics can be less than or equal to approximately 10, 7.5, or 5.0. Likewise, the C* metric may be less than or equal to approximately 15, 10, 5.0.

[0040] The first layer 211 can be an opaque or substantially opaque material. For example, the first layer 211 can be chromium, molybdenum, vanadium, ruthenium, nickel, or other suitable metal or light-absorbing material. In addition, the first layer 211 can be arranged in the second direction 106 relative to the first substrate 210. The first direction 105 can be perpendicular to the surface of the first substrate 210. In some embodiments, the first layer 211 can be in adjacent contact with the first substrate 210. The first layer 211 can also be discontinuous, having one or more openings therein. Specifically, the first layer 211 can be arranged in the substantially opaque region 201, while the semi-transmissive and semi-reflective region 202 is defined as not having the first layer 211. In addition, for a given embodiment, the thickness of the first layer 211 can be selected to achieve a desired level of opacity in the opaque region 101. For example, the thickness of the first layer 211 can be equal to or approximately 20, 35, 50, 75, or 100 nm.

[0041] The second layer 212 can be a reflective layer. For example, the second layer 212 can be silver or a silver alloy, such as a silver-gold alloy. In some embodiments, the silver-gold alloy can be 7% gold and 93% silver by weight. Similarly, other silver alloy compositions or compatible reflector metals can be used. In addition, for a given embodiment, the thickness of the second layer 212 can be selected to achieve a desired level of reflectivity. For example, the thickness of the second layer 212 can be approximately 10 to 35 nm. In addition, the second layer 212 can be positioned relative to the first layer 211 in the first direction 105. In some embodiments, the second layer 212 can be in adjacent contact with the first substrate 210. In other embodiments, the second layer 212 can be positioned in a spaced-apart relationship with the first substrate 210. The second layer 212 can be positioned in the substantially opaque region 201 and the semi-transmissive and semi-reflective region 202 of the component 200. In some embodiments, the second layer 212 can be omitted.

[0042] The third layer 213 may be a layer having a high refractive index. The refractive index may be equal to or greater than approximately 1.9, 2.0, 2.1, 2.2, 2.3, 2.4, 3.0, 3.5, 4.0, or 4.5. In addition, the thickness of the third layer 213 may be equal to and / or less than approximately 100, 80, 60, 40, 35, 30, 25, 20, 15, 10, or 5 nm. For example, the third layer 213 may be silicon, chromium, tantalum oxide, zirconium oxide, tin oxide, indium tin oxide, titanium oxide, a semiconductor, or other suitable high refractive index material. In addition, the third layer 213 may be arranged relative to the first layer 211 in the second direction 106. In some embodiments, the third layer 213 may be in adjacent contact with the first layer 211. In other embodiments, the third layer 213 may be arranged in a spaced-apart relationship with the first layer 211. In some embodiments, the third layer 213 may be arranged substantially across the entire length of the first substrate 210 ( Figure 2a Thus, the third layer 213 can be positioned in the substantially opaque region 201 and the semi-transmissive and semi-reflective region 202 of the member 200. In other embodiments, the third layer 213 can be positioned to be confined or substantially confined to the semi-transmissive and semi-reflective region 202 ( Figure 2b ) and / or the immediate area surrounding the semi-transmissive and semi-reflective area 202 ( Figure 2c ).

[0043] Although visible light performance is generally important, in some embodiments, other regions of the electromagnetic spectrum may be important. For example, the near-infrared (NIR) region may be important, particularly when component 200 is used together with an emitter or sensor that operates in the NIR region. The stealthy opening technology taught herein may be accordingly applicable to NIR applications. Specifically, using a semiconductor layer such as silicon in the third layer 213 may increase the transmittance in the NIR region while maintaining a smaller optical difference between the substantially opaque region 201 and the semi-transmissive, semi-reflective region 202 in the visible region. In some embodiments, a semiconductor such as silicon may have enhanced transmission relative to visible light transmittance in the NIR region. For example, the NIR transmittance may be equal to or greater than approximately 1.25, 1.5, or 1.75 times the visible light transmittance.

[0044] In other embodiments, neutral transmission color may be particularly important. Specifically, when component 200 is used with a visible light display or imager. In such embodiments, third layer 213 may be composed of TiO2, SiC, or the like. Thus, absolute values ​​of the transmission a* and / or b* color metrics equal to or less than approximately 12, 7.5, or 5.0 may be achieved.

[0045] The fourth layer 214 may be an adhesion or stabilization layer. For example, the fourth layer 214 may be a layer that promotes adhesion between the second layer 212 and the first substrate 210. In some embodiments, the fourth layer 214 may be ruthenium, rhodium, molybdenum, iridium, palladium, nickel, rhenium, or platinum. Furthermore, the fourth layer 214 may be positioned relative to the first substrate 210 in the first direction 105 and / or relative to the second layer 212 in the second direction 106. In some embodiments, the fourth layer 214 may be positioned in abutting contact with the first substrate 210 and / or the first layer 211. Furthermore, the fourth layer 214 may be positioned in the substantially opaque region 201 and / or the semi-transmissive and semi-reflective region 202 of the component 200. In some embodiments, additional layers, such as a color neutralizing layer, may be present between the first substrate 210 and the fourth layer 214. For example, a dual layer of TiO2 and indium tin oxide (ITO) may be a color neutralizing layer. The thickness of the fourth layer 214 may be selected to achieve a desired reflectivity match, reflectivity intensity, and / or transmittance intensity. In some embodiments, the thickness of the fourth layer 214 may be between 0.5 and 15 nm. In some embodiments, the fourth layer 214 may be omitted.

[0046] Figure 3is a cross-sectional representation of electro-optical element 300. Electro-optical element 300 can be a rearview component. Thus, when viewed from first direction 105, electro-optical element 300 can be used to illustrate the reflection of a scene relative to electro-optical element 300 in first direction 105. In some embodiments, electro-optical element 300 can be electrochromic. Additionally, electro-optical element 300 includes a substantially opaque region 301 and a transflective region 302. Substantially opaque region 301 can be fully or partially reflective. Transflective region 302 can be an open region of device 400. Thus, device 400, such as a sensor, a light-emitting feature, or a display, can be optically aligned with transflective region 302 such that device 400 can be used to receive light passing through the component at transflective region 302. In embodiments where device 400 is a sensor, the sensor can be an optical sensor, such as an imager or a glare sensor. The imager can be a visible spectrum imager, an infrared spectrum imager, or a near infrared imager. The electro-optical element 300 may further include a first substrate 310 , a second substrate 320 , a sealing member 330 , a cavity 340 , and an electro-optical medium 350 .

[0047] The first substrate 310 includes a first surface 311 and a second surface 312. In addition, the first substrate 310 can be made of any of several materials that are transparent or substantially transparent in the visible region of the electromagnetic spectrum, such as borosilicate glass, soda-lime glass, float glass, natural and synthetic polymeric resins, plastics, and / or materials including those commercially available from Topas Advance Polymers. Although specific substrate materials are disclosed, other materials known in the art may be used for illustrative purposes only. In addition, the second surface 312 may include a first electrode. The first electrode is a conductive material. The conductive material is generally transparent in the visible region and is generally resistant to corrosion from the materials contained in the chamber 340. For example, the conductive material may be a transparent conductive oxide (TCO), such as fluorine-doped tin oxide (FTO), indium tin oxide (ITO), or indium zinc oxide (IZO), or may be an insulator metal insulator (IMI) type transparent electrode.

[0048] The second substrate 320 is disposed in a spaced relationship with the first substrate 310 and is disposed in a second direction 106 relative to the first substrate. The second direction 106 is opposite to the first direction 105. The second substrate 320 includes a third surface 323 and a fourth surface 324. In addition, the second substrate 320 may be of Figures 1a-2c In addition, the third surface 323 may include a second electrode. The second electrode is a conductive material. In some embodiments, the second electrode may be the second layer 112, 212.

[0049] The seal 330 is disposed peripherally between the first substrate 310 and the second substrate 320 to define a cavity 340 in conjunction with the second surface 312 and the third surface 323. Furthermore, the seal 350 may comprise any material capable of adhesively bonding to the second surface 312 and the third surface 323 to thereby seal the cavity 340, such that the electro-optical medium 350 does not inadvertently escape from the cavity 340. Alternatively, in some embodiments, the seal 330 may be disposed around the periphery of the first substrate 310 and the second substrate 320 and extend therebetween. Furthermore, in some embodiments, a coating disposed between the seal 330 and the first substrate 310 or the second substrate 320 may be omitted in the region aligned with the seal 330 for various purposes, such as adhesion, corrosion resistance, electrical contact, or curing the seal 330 material with UV light.

[0050] An electro-optic medium 350 is disposed in chamber 340. In some embodiments, electro-optic medium 350 can be an electrochromic medium. Furthermore, electro-optic medium 350 can be configured to enter an activated state during exposure to an electrical potential. In the activated state, electro-optic medium 350 can be configured to exhibit a change in its extinction coefficient relative to an unactivated state at one or more wavelengths in the visible spectrum.

[0051] In operation, light from a first direction 105 can enter the electro-optical element 300, be transmitted through the first substrate 310 and the electro-optical medium 350, be reflected from the second substrate 320 (components 100, 200), and be observed by an observer positioned relative to the electro-optical element 300 in the first direction 105. In addition, when activated, the electro-optical element 300 can reduce the intensity of the light reflected therefrom. The reflection from the second substrate 320 (components 100, 200) may make it difficult to distinguish the semi-transmissive and semi-reflective areas 302 from the opaque areas 301 because the difference in total reflectivity and color reflectivity is low. In addition, the light from the first direction 105 can also be transmitted through the second substrate 320 (components 100, 200) at the semi-transmissive and semi-reflective areas, making it possible to sense the light by a sensor positioned relative to the electro-optical element 300 in the second direction 106.

[0052] Some embodiments of the present disclosure may have the advantage of a reflective surface having a hidden transflective area 102, 202, 302 due to a smaller total reflectivity difference and a lower ΔC* unit between the area within the transflective area 102, 202, 302 and the area outside the transflective area. The hidden transflective area 102, 202, 302 has the advantage of a desirable aesthetic appearance, wherein the component 100, 200 appears more uniform. Additionally, some embodiments may have the advantage of not requiring a large area, as the transflective area 102, 202, 302 may be formed without a gradual transition. Furthermore, some embodiments may have the advantage of one or more or all layers being a high deposition rate material. Thus, by using a high deposition rate material to implement the hidden transflective area 102, 202, 302, a simpler and more cost-effective production may be achieved.

[0053] An example of an electro-optical element 300 having component 100 can be as follows. Unless otherwise noted, the following example was generated using a thin film modeling program such as Essential Macleod. First substrate 310 is clear float glass with a thickness of 1.6 mm. Second substrate 320 is component 100. Furthermore, first electrode 312 is approximately 120 nm thick ITO. Furthermore, first substrate 310 and first substrate 110 of component 100 are separated by approximately 135 microns.

[0054] In one exemplary embodiment, component 100 is as follows. First substrate 110 is clear float glass with a thickness of 1.6 mm. First layer 111 is 17.3 nm of chromium, second layer 112 is 12.3 nm of a silver-gold alloy containing 7% gold and 93% silver by weight, third layer 113 is 26.1 nm of silicon, and fourth layer 114 is 2 nm of ruthenium. The following optical results were actually obtained from a physical sample. At the substantially opaque region 101, the total light reflectance is 65.06%, and the color reflectance is -3.01 for a* and 2.19 for b*. In addition, the transmittance at the substantially opaque region 101 is 4.19%, and the color transmittance is 1.85 for a* and -2.48 for b*. Similarly, at the semi-transmissive and semi-reflective region 102, the total light reflectance is 64.98%, and the color reflectance is -4.65 for a* and 2.07 for b*. In addition, the transmittance at the semi-transmissive and semi-reflective area 102 is 11.87%, and the color transmittance is 5.79 for a* and 20.18 for b*. Therefore, in this exemplary embodiment, the total reflectance difference is 0.08, and ΔC* is 1.64.

[0055] In another exemplary embodiment, the component 100 in the electro-optical element 300 is as follows. The first substrate 110 is a transparent float glass having a thickness of 1.6 mm. The first layer 111 is 21.0 nm of chromium, the second layer 112 is 12.3 nm of a silver-gold alloy containing 7% gold by weight and 93% silver by weight, the third layer 113 is 29.0 nm of silicon, and the fourth layer 114 is 4 nm of ruthenium. Therefore, at the substantially opaque region 101, the total light reflectance is 69.3%, and the color reflectance is -2.7 for a* and 2.6 for b*. Furthermore, the transmittance at the substantially opaque region 101 is 2.0%, and the color transmittance is 1.7 for a* and -0.1 for b*. Similarly, at the semi-transmissive and semi-reflective region 102, the total light reflectance is 69.3%, and the color reflectance is -3.4 for a* and 2.07 for b*. In addition, the transmittance at the semi-transmissive and semi-reflective area 102 is 8.5%, and the color transmittance is 4.7 for a* and 18.6 for b*. Therefore, in this exemplary embodiment, the total reflectance difference is 0.0, and ΔC* is 0.9.

[0056] Additional exemplary embodiments of the electro-optical element 300 with member 100 are included in the following tables 1a-b. In these examples, various reflectivity and transmittance intensities are shown. In addition, the materials used for the first, second, third and fourth layers 111-114 are different to illustrate the realization of different design qualities by changing the corresponding layers. Specifically, table 1a has been given a general introduction to the construction of member 100, and table 1b has been given a general introduction to the resulting properties of the member 100 in the electro-optical element 300.

[0057]

[0058] *Deposited by high pressure deposition processes known in the art to achieve high refractive index.

[0059] The high refractive index is achieved by deposition using high power deposition processes known in the art.

[0060] **Thickness is measured in nm.

[0061]

[0062] Examples 12a and 12b from Tables 1a-b illustrate the effect of the refractive index of semiconducting silicon on component 100. In addition, Figure 41 is a graph comparing the optical properties of silicon. Specifically, the optical constant refractive index (n) and extinction coefficient (k) are plotted as a function of the wavelength of light. One set of curves is for an embodiment in which silicon is deposited by a high-power deposition process known in the art, while another set of curves is for an embodiment in which silicon is deposited by a high-pressure process known in the art. Therefore, it is shown that the refractive index and extinction coefficient vary with different deposition methods. However, Examples 12a and 12b show that similar optical properties can be obtained with different optical constants when adjusting the thickness of the fourth layer 114 to obtain the same reflectivity and transmittance performance of the electro-optical element 300.

[0063] Example 16 shows that the third layer 113 can include multiple sub-layers. Specifically, in Example 16, the third layer 113 includes semiconductor silicon and metallic chromium. Various other combinations of sub-layers can be used.

[0064] Comparison of Examples 1 and 8 shows that comparable visible light reflectance and transmittance values ​​of approximately 65% ​​and 9%, respectively, can be achieved with and without a semiconductor in the third layer 113. Figure 5 As shown, whether the third layer 113 is made of a semiconductor may have a significant impact on the transmittance of the component 100 in the NIR region. Specifically, at about 1000 nm, the transmittance of Example 1 having silicon may be 1.75 times that of Example 8 having TiO2.

[0065] An example of an electro-optical element 300 having a component 200 can be as follows. A first substrate 310 is transparent float glass having a thickness of 1.6 mm. A second substrate 320 is the component 200. Furthermore, a first electrode 312 is approximately 120 nm thick ITO. Furthermore, the first substrate 310 and the first substrate 210 of the component 200 are spaced approximately 135 microns apart.

[0066] In one exemplary embodiment, the structure 200 comprising the electro-optical element 300 is as follows. The first substrate 210 is a transparent float glass having a thickness of 1.6 mm. The first layer 211 is 50 nm of chromium, the second layer 212 is 20 nm of a silver-gold alloy containing 7% gold and 93% silver by weight, the third layer 213 is 30 nm of silicon, and the fourth layer 214 is 0.2 nm of ruthenium. Thus, for the substantially opaque region 201, the total light reflectance is 49.5%, and the transmittance is 0.1%. Furthermore, for the semi-transmissive and semi-reflective region 202, the total light reflectance is 46.4%, and the transmittance is 9.7%. Furthermore, the reflectance difference is approximately 3%, and ΔC* is 4.1 units.

[0067] Additional exemplary embodiments of the electro-optical element 300 with component 200 are included in Tables 2a-b. In these examples, various reflectivity and transmittance intensities are shown. In addition, the materials used for the first, second, third and fourth layers 211-214 are different, to illustrate the realization of different design qualities by changing the corresponding layers. Specifically, Table 2a has been given a general introduction to the construction of component 200, and Table 2b has been given a general introduction to the resulting properties of component 200.

[0068]

[0069] *Deposited by high pressure deposition processes known in the art to achieve high refractive index.

[0070] The high refractive index is achieved by deposition using high power deposition processes known in the art.

[0071] **Thickness is measured in nm.

[0072]

[0073] In this document, relational terms such as "first," "second," and the like are used solely to distinguish one entity or action from another entity or action and do not necessarily require or imply any actual such relationship or order between such entities or actions.

[0074] As used herein, the term "and / or," when used in connection with a list of two or more items, means that any one of the listed items can be used alone, or any combination of two or more of the listed items can be used. For example, if a composition is described as comprising components A, B, and / or C, the composition can comprise: A alone; B alone; C alone; a combination of A and B; a combination of A and C; a combination of A and C; a combination of B and C; or a combination of A, B, and C.

[0075] As used herein, "about" will be understood by one of ordinary skill in the art and will vary to some extent depending on the context in which it is used. If the use of this term is unclear to one of ordinary skill in the art, then "about" will mean up to plus or minus 10% of the particular term, given the context in which it is used.

[0076] The term "substantially" and its variations will be understood by one of ordinary skill in the art to describe values ​​that are equal or approximately equal to a value or feature being described. For example, a "substantially planar" surface is intended to mean a planar or approximately planar surface. Additionally, "substantially" is intended to mean that two values ​​are equal or approximately equal. If there is a usage of the term that is unclear to one of ordinary skill in the art, then based on the context in which it is used, "substantially" may mean values ​​that are within about 10% of each other, such as within about 5% of each other or within about 2% of each other.

[0077] The term "transparent" is used in a relative sense. "Transparent" refers to an optical component or material that is substantially transmissive at the wavelength in question and generally allows light of that wavelength to pass through. The wavelength in question will vary depending on the context. However, if the wavelength in question is not obvious, it will generally refer to visible light.

[0078] The term "transflective" generally refers to an optical configuration that reflects at least a portion of light incident from at least one side and transmits at least a portion of light incident from at least one side. Specifically, "transflective" describes an optical element or component that has a non-zero transmittance level across a range of light wavelengths and also has a non-zero reflectance level within a region. The applicable light wavelength range will vary depending on the context. However, if the relevant light wavelength range is not obvious, the light wavelength range should generally refer to visible light.

[0079] The term "opaque" is used in a relative sense. "Opaque" refers to an optical element or material that is not appreciably transparent or translucent at the wavelength in question, and therefore generally does not allow light of that wavelength to pass through. The wavelength in question will vary depending on the context. However, if the wavelength in question is not appreciably transparent, then the wavelength in question generally refers to visible light.

[0080] The term "comprise" or any other variation thereof is intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that includes a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. An element preceded by "comprises..." does not preclude the presence of additional identical elements in the process, method, article, or apparatus that includes the element, without further constraints.

[0081] It will be understood that while several embodiments have been described in this disclosure, numerous variations, changes, transformations and modifications may occur to those skilled in the art, and that this disclosure is intended to encompass such variations, changes, transformations and modifications as fall within the scope of the appended claims unless the language thereof expressly states otherwise.

Claims

1. A device comprising a member having a concealed sensor opening, wherein the member has: A generally opaque region comprising: a first substrate, which is transparent in the visible spectrum, a first layer disposed in a first direction relative to the first substrate, the first layer being substantially opaque in the visible spectrum, wherein the first layer is in abutting contact with the first substrate, and a second layer disposed in the first direction relative to the first layer, the second layer being reflective in the visible spectrum; as well as A sensor opening area, comprising: the first substrate, a third layer having a refractive index of at least 1.9 and disposed in the first direction relative to the first substrate, and the second layer being positioned in the first direction relative to the third layer; in: When viewed from the first direction: The difference between the total light reflectance of the member at the substantially opaque region and the sensor opening region is less than five percent, and The difference between the color reflectance of the member at the substantially opaque region and the sensor opening region is less than 5 ΔC* units, where a ΔC* unit is defined as where (a*,b*) and (a*',b*') describe the color of the light obtained in two different measurements; and a sensor positioned in a second direction of the sensor opening region of the member capable of receiving light passing through the member at the sensor opening region, the second direction being opposite to the first direction; The reflectivity of the substantially opaque area is equal to or less than 80% and the light transmittance of the substantially opaque area is equal to or less than 5%, and the substantially opaque area means that the reflectivity is equal to or less than 80% and the light transmittance is equal to or less than 5%.

2. The device according to claim 1, wherein: The substantially opaque region further includes a fourth layer disposed between the first layer and the second layer, and The sensor opening area includes the fourth layer disposed between the third layer and the second layer. The device of claim 2 , wherein the fourth layer is ruthenium.

4. The device of claim 1, wherein the third layer is at least one of silicon, chromium, germanium, tantalum oxide, zirconium oxide, tin oxide, indium tin oxide, or titanium oxide. The device of claim 4 , wherein the third layer is chromium. The device of claim 4 , wherein the third layer is silicon.

7. The device of claim 1, wherein the first layer is at least one of: chromium, molybdenum, vanadium, ruthenium, and nickel.

8. The device of claim 1, wherein the second layer is at least one of silver and a silver alloy.

9. The apparatus according to claim 1, further comprising: a second substrate disposed in a spaced relationship relative to the member in the first direction, the second substrate including a first electrode; as well as an electro-optic medium disposed between the member and the second substrate; The component includes a second electrode.

10. The device of claim 9, wherein the second layer is the second electrode. The device according to claim 1 , wherein a transmittance of visible light at the sensor opening area is 7% to 15%.

12. A device comprising a member having a concealed sensor opening, wherein the member has: A generally opaque region comprising: a first substrate, which is transparent in the visible spectrum, a first layer disposed in a first direction relative to the first substrate, the first layer being substantially opaque in the visible spectrum, wherein the first layer is in abutting contact with the first substrate, and a second layer disposed in a second direction relative to the first substrate, the second layer being reflective in the visible spectrum, the second direction being opposite to the first direction; as well as A sensor opening area, comprising: the first substrate, a third layer having a refractive index of at least 1.9, the third layer being disposed in the first direction relative to the first layer, and the second layer being positioned in the second direction relative to the third layer; in: When viewed from the second direction: The difference between the total light reflectance of the member at the substantially opaque region and the sensor opening region is less than five percent, and The difference between the color reflectance of the member at the substantially opaque region and the sensor opening region is less than 5 ΔC* units, where a ΔC* unit is defined as where (a*,b*) and (a*',b*') describe the color of the light obtained in two different measurements; and A sensor positioned in the first direction of the sensor opening region of the member can be used to receive light passing through the member at the sensor opening region; The reflectivity of the substantially opaque area is equal to or less than 80% and the light transmittance of the substantially opaque area is equal to or less than 5%, and the substantially opaque area means that the reflectivity is equal to or less than 80% and the light transmittance is equal to or less than 5%. 13 . The device of claim 12 , wherein the member further comprises a fourth layer disposed between the second layer and the first substrate. The device of claim 13 , wherein the fourth layer is ruthenium.

15. The device of claim 12, wherein the second layer is at least one of silver and a silver alloy.

16. The apparatus according to claim 12, further comprising: a second substrate disposed in a spaced relationship relative to the member in the second direction, the second substrate including a first electrode; as well as an electro-optic medium disposed between the member and the second substrate; The component includes a second electrode. The device of claim 16 , wherein the second layer is the second electrode.

18. The device according to claim 12, wherein a transmittance of visible light at the sensor opening area is 7% to 15%.

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