Evaporator for prolonging the life of a crystal oscillator

Abstract

The application relates to the field of semiconductors, in particular to a crystal vibration piece life prolonging evaporation machine, a plurality of shielding parts of the crystal vibration piece life prolonging evaporation machine are uniformly arranged around a shielding plate rotation axis, and a hollow part is arranged between adjacent shielding parts; a hollow channel is arranged on the hollow part; the hollow channel and the shielding part rotation swept plane are all blocked between a plating source and the crystal vibration piece. The crystal vibration piece life prolonging evaporation machine has the beneficial effects that the path of evaporation material evaporated from the plating source to the crystal vibration piece is blocked by the shielding part at times and connected by the hollow channel at times. Therefore, the setting of the shielding plate makes the crystal vibration piece plated with less film. Not only does the setting make the detection film thickness precision of the crystal vibration piece higher, but also makes the crystal vibration piece in a lower load state for a long time, thereby prolonging the service life of the crystal vibration piece.

Description

Technical Field

[0001] The present invention relates to the field of semiconductors, and in particular to an evaporation machine capable of extending the life of a crystal oscillator. Background Art

[0002] In the field of LED semiconductor chips, vacuum evaporation machines are often used to coat films on wafers; a crystal oscillator is installed in the evaporation machine to calculate the coating thickness.

[0003] The main structure of the crystal oscillator is quartz crystal, which has a piezoelectric effect. If a thin film is coated on the surface of the crystal, the inherent oscillation frequency of the crystal will change; in other words, the greater the mass carried by the crystal oscillator, the lower its oscillation frequency.

[0004] However, the relationship between the bearing mass of a crystal oscillator and its oscillation frequency is not linear. As the oscillation frequency decreases, not only does the crystal oscillator's film thickness detection become inaccurate, but it can also easily fail under long-term heavy loads. This is especially true when evaporating high-density materials like gold and platinum, significantly reducing the lifespan of the crystal oscillator and increasing production costs. There is an urgent need in the art for a structure that can extend the lifespan of a crystal oscillator. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to provide a vapor deposition machine that can extend the life of a crystal oscillator, which not only extends the service life of the crystal oscillator but also makes the film thickness detection structure accurate.

[0006] In order to solve the above technical problems, the present invention adopts a technical solution: an evaporation machine for extending the life of a crystal oscillator, the evaporation machine comprising an evaporation chamber, a plating source and a crystal oscillator disposed in the evaporation chamber, the crystal oscillator being connected to a film thickness meter, the evaporation machine for extending the life of the crystal oscillator comprising a shielding plate, the shielding plate being arranged to rotate, the axis around which the shielding plate rotates being perpendicular to the shielding plate;

[0007] The shielding plate includes a plurality of shielding portions and a plurality of hollow portions; the plurality of shielding portions are evenly arranged around the shielding plate rotation axis, the hollow portions are arranged between adjacent shielding portions; and the hollow portions are provided with hollow channels;

[0008] The hollow channel and the plane swept by the shielding portion during rotation are both blocked between the plating source and the crystal oscillator.

[0009] The beneficial effect of the present invention is that in the evaporation machine for extending the life of the crystal oscillator, the plating source evaporates the evaporation material and then evaporates it on the wafer or evaporates it on the crystal oscillator through a shielding plate.

[0010] The baffle rotates because it features a hollow channel and a blocking portion. Therefore, the path of the deposited material from the coating source to the crystal oscillator is sometimes blocked by the blocking portion and sometimes connected by the hollow channel. Therefore, the baffle reduces the amount of film deposited on the crystal oscillator. Adjusting the correction factor of the film thickness gauge allows the gauge to accurately calculate the film thickness on the wafer after receiving the oscillation frequency of the crystal oscillator.

[0011] The coating thickness of the crystal oscillator in the evaporation machine for extending the life of the crystal oscillator provided by the present invention is thinner than the coating thickness on the wafer, which not only makes the detection film thickness of the crystal oscillator more accurate, but also keeps the crystal oscillator in a low load state for a long time, thereby extending the service life of the crystal oscillator. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 This is a schematic diagram of the overall structure of an evaporation machine for extending the life of a crystal oscillator according to a specific embodiment of the present invention;

[0013] Figure 2 A schematic diagram of a portion of the structure of an evaporation machine for extending the life of a crystal oscillator according to a specific embodiment of the present invention;

[0014] Description of labels:

[0015] 1. Plating source; 2. Crystal oscillator; 3. Shielding plate; 31. Shielding part; 32. Hollow channel; 33. Snap-on protrusion; 4. Plating pot; 5. Planetary track; 6. Rotating ring. DETAILED DESCRIPTION

[0016] To illustrate the technical content, achieved objectives and effects of the present invention in detail, the following description is given in conjunction with the embodiments and accompanying drawings.

[0017] Please refer to Figure 1-2 A vapor deposition machine for extending the life of a crystal oscillator, the vapor deposition machine comprising a vapor deposition chamber, a plating source 1 and a crystal oscillator 2 being provided in the vapor deposition chamber, the crystal oscillator 2 being connected to a film thickness meter, the vapor deposition machine for extending the life of the crystal oscillator comprising a shielding plate 3, the shielding plate 3 being arranged to rotate, the axis around which the shielding plate 3 rotates being perpendicular to the shielding plate 3;

[0018] The shielding plate 3 includes a plurality of shielding portions 31 and a plurality of hollow portions; the plurality of shielding portions 31 are evenly arranged around the rotation axis of the shielding plate 3, and the hollow portions are arranged between adjacent shielding portions 31; and the hollow portions are provided with hollow channels 32;

[0019] The plane swept by the hollow channel 32 and the shielding portion 31 during rotation is blocked between the plating source 1 and the crystal oscillator 2 .

[0020] From the above description, it can be seen that the beneficial effect of the present invention is that in the evaporation machine for extending the life of the crystal oscillator, the plating source 1 evaporates the evaporation material and then evaporates it on the wafer or evaporates it on the crystal oscillator 2 through the shielding plate 3.

[0021] The shielding plate 3 rotates because it is provided with a hollow channel 32 and a shielding portion 31. Therefore, the path of the deposited material from the deposition source 1 to the crystal oscillator 2 is sometimes blocked by the shielding portion 31 and sometimes connected by the hollow channel 32. Therefore, the installation of the shielding plate 3 reduces the amount of film deposited on the crystal oscillator 2. The correction coefficient of the film thickness gauge is adjusted so that the gauge can calculate the correct film thickness on the wafer after receiving the oscillation frequency of the crystal oscillator 2.

[0022] The coating thickness of the crystal oscillator plate 2 in the evaporation machine for extending the life of the crystal oscillator plate provided by the present invention is thinner than the coating thickness on the wafer, which not only makes the detection film thickness of the crystal oscillator plate 2 more accurate, but also keeps the crystal oscillator plate 2 in a low load state for a long time, thereby extending the service life of the crystal oscillator plate 2.

[0023] Furthermore, it also includes a plating pot 4, and the plating source 1, the plating pot 4, the shielding plate 3 and the crystal oscillator 2 are arranged in sequence from bottom to top.

[0024] As can be seen from the above description, the plating pot 4 is used to place wafers, and the above arrangement provides a reasonable spatial arrangement structure of a plating source 1, a plating pot 4, a shielding plate 3 and a crystal oscillator 2.

[0025] Furthermore, a ring-shaped planetary rail 5 is horizontally provided on the inner wall of the evaporation chamber, and the plating pot 4 is slidably connected to the planetary rail 5 .

[0026] As can be seen from the above description, the coating pot 4 is arranged to rotate so that the wafers can be coated more evenly.

[0027] Furthermore, the cross section of the shielding plate 3 is circular, and the cross section of the hollow channel is fan-shaped; the radius of the hollow channel 32 is set along the radius of the shielding plate 3.

[0028] From the above description, it can be seen that because the crystal oscillator plate 2 can be arbitrarily arranged in the length direction of the radius of the baffle 3, the above arrangement ensures that no matter where the crystal oscillator plate 2 is arranged, the ratio of the film thickness deposited thereon to the film thickness on the wafer remains unchanged.

[0029] Furthermore, the total cross-sectional area of ​​the plurality of hollow channels 32 is 0.35-0.65 times the area of ​​the shielding plate 3 .

[0030] As can be seen from the above description, a reasonable size of the hollow channel 32 is provided.

[0031] Furthermore, it also includes a rotating ring 6 and a motor. The rotating ring 6 is horizontally arranged, and the entire circumference of the outer ring of the rotating ring 6 is slidably connected to the evaporation chamber; the motor is connected to the rotating ring 6, and the baffle 3 covers and is fixed to the inner ring of the rotating ring 6.

[0032] It can be seen from the above description that a simple and efficient structure for driving the shielding plate 3 to rotate is provided.

[0033] Furthermore, a snap-fit ​​groove is provided on the inner ring of the rotating ring 6 , and a snap-fit ​​protrusion 33 corresponding to the snap-fit ​​groove is provided on the edge of the shielding plate 3 , and the shielding plate 3 is fixedly connected to the rotating ring 6 via the snap-fit ​​groove.

[0034] As can be seen from the above description, a detachable structure of the shielding plate 3 is provided to facilitate cleaning of the shielding plate 3 or vapor deposition of certain materials with lower density. When the shielding plate 3 is no longer needed, the shielding plate 3 can be removed.

[0035] Furthermore, it also includes a plating pot 4, which is fixedly connected to the rotating ring 6.

[0036] As can be seen from the above description, the plating pot 4 is also driven to rotate by the rotating ring 6, and the same set of structures is used to simultaneously drive the shielding plate 3 and the plating pot 4 to rotate, so that the structure of the evaporation machine for extending the life of the crystal oscillator is simple.

[0037] The application background of the evaporation machine for extending the life of the crystal oscillator piece of the present invention is: when the coating process needs to save the usage of the crystal oscillator piece 2.

[0038] Example 1

[0039] Please refer to Figure 1-2 A vapor deposition machine for extending the life of a crystal oscillator, the vapor deposition machine comprising a vapor deposition chamber, a plating source 1 and a crystal oscillator 2 being provided in the vapor deposition chamber, the crystal oscillator 2 being connected to a film thickness meter, characterized in that the vapor deposition machine for extending the life of the crystal oscillator comprises a shielding plate 3, the shielding plate 3 being arranged to rotate, and the axis around which the shielding plate 3 rotates is perpendicular to the shielding plate 3;

[0040] The shielding plate 3 includes a plurality of shielding portions 31 and a plurality of hollow portions; the plurality of shielding portions 31 are evenly arranged around the rotation axis of the shielding plate 3, and the hollow portions are arranged between adjacent shielding portions 31; and the hollow portions are provided with hollow channels 32;

[0041] The plane swept by the hollow channel 32 and the shielding portion 31 during rotation is blocked between the plating source 1 and the crystal oscillator 2 .

[0042] The evaporation machine for extending the life of the crystal oscillator further includes a plating pot 4, a rotating ring 6 and a motor. The plating source 1, the plating pot 4, the shielding plate 3 and the crystal oscillator 2 are arranged in sequence from bottom to top.

[0043] An annular planetary track 5 is horizontally provided on the inner wall of the evaporation chamber, and the plating pot 4 is slidably connected to the planetary track 5 .

[0044] The cross section of the shielding plate 3 is circular, and the cross section of the hollow channel is fan-shaped; the radius of the hollow channel 32 is set along the radius of the shielding plate 3.

[0045] The total cross-sectional area of ​​the plurality of hollow channels 32 is 0.35-0.65 times the area of ​​the shielding plate 3 .

[0046] The rotating ring 6 is arranged horizontally, and the entire circumference of the outer ring of the rotating ring 6 is slidably connected to the evaporation chamber; the motor is connected to the rotating ring 6 through transmission, and the shielding plate 3 covers and is fixed to the inner ring of the rotating ring 6.

[0047] The inner ring of the rotating ring 6 is provided with a snap-fitting groove, and the edge of the shielding plate 3 is provided with a snap-fitting protrusion 33 corresponding to the snap-fitting groove. The shielding plate 3 is fixedly connected to the rotating ring 6 through the snap-fitting groove.

[0048] The plating pot 4 is fixedly connected to the rotating ring 6 .

[0049] The use and principle of the evaporation machine for extending the life of the crystal oscillator of the present invention:

[0050] The staff places the wafer on the plating pot 4. When the evaporation machine for extending the life of the crystal oscillator is started, the motor drives the rotating ring 6 to rotate. The baffle 3 and the plating pot 4 are connected to the horizontal rotating ring 6, so the rotating ring 6 drives the baffle 3 and the plating pot 4 to rotate. At the same time, the evaporation material evaporated by the plating source 1 is emitted from the bottom to the top of the entire evaporation chamber. Because the entire circumference of the outer ring of the rotating ring 6 is slidably connected to the evaporation chamber, and the baffle 3 covers the inner ring of the rotating ring 6, the structure of the rotating ring 6 and the baffle 3 completely blocks the path of the evaporation material volatilizing upward. However, a hollow channel 32 is provided on the baffle 3, and the evaporation material can be evaporated on the crystal oscillator 2 through the hollow channel 32.

[0051] The top-down projection of the crystal oscillator plate 2 always lies on the plane swept by the rotation of the hollow channel 32, and the top-down projection of the crystal oscillator plate 2 always lies on the plane swept by the rotation of the shielding portion 31. As a result, the evaporated material sometimes deposits onto the crystal oscillator plate 2, while sometimes being blocked by the shielding plate 3. This results in the coating thickness on the crystal oscillator plate 2 being less than that on the wafer. The operator simply adjusts the correction factor of the film thickness gauge to obtain the thickness of the coating on the wafer from the gauge.

[0052] Since the coating thickness on the crystal oscillator plate 2 is relatively thin, the load on the crystal oscillator plate 2 during each evaporation is always relatively low, thereby extending the service life of the crystal oscillator plate 2 .

[0053] Correction coefficient acquisition and correction coefficient verification example:

[0054] A control experiment was conducted using an experimental evaporation machine. This experimental evaporation machine, with the exception of the shielding plate, was identical in structure to the evaporation machine used to extend the life of the crystal oscillator in Example 1. Both the experimental and experimental evaporation machines were used to deposit the same metal at the same rate. The ratio of the film thickness gauge data from the experimental evaporation machine to the uncorrected film thickness gauge data from Example 1 was used as the correction factor.

[0055] It has been verified that when the plating source of the evaporation machine for extending the life of the crystal oscillator described in Example 1 evaporates the same metal, regardless of the evaporation rate, the data of the film thickness meter after correction by the correction coefficient is basically consistent with the film thickness data measured by the step profiler on the wafer.

[0056] The above descriptions are merely embodiments of the present invention and are not intended to limit the patent scope of the present invention. Any equivalent transformations made using the contents of the present invention's description and drawings, or directly or indirectly applied in related technical fields, are also included in the patent protection scope of the present invention.

Claims

1. An evaporation machine for extending the life of a crystal oscillator, the evaporation machine comprising an evaporation chamber, a plating source and a crystal oscillator disposed in the evaporation chamber, the crystal oscillator being connected to a film thickness gauge, characterized in that: The evaporation machine for extending the life of the crystal oscillator comprises a shielding plate, the shielding plate is arranged to rotate, and the axis around which the shielding plate rotates is perpendicular to the shielding plate; The shielding plate includes a plurality of shielding portions and a plurality of hollow portions; the plurality of shielding portions are evenly arranged around the shielding plate rotation axis, the hollow portions are arranged between adjacent shielding portions; and the hollow portions are provided with hollow channels; The hollow channel and the plane swept by the shielding portion during rotation are both blocked between the plating source and the crystal oscillator; The cross section of the shielding plate is circular, and the cross section of the hollow channel is fan-shaped; the radius of the hollow channel is set along the radius of the shielding plate; The total cross-sectional area of ​​the plurality of hollow channels is 0.35-0.65 times the area of ​​the shielding plate; It also includes a rotating ring and a motor. The rotating ring is arranged horizontally, and the entire circumference of the outer ring of the rotating ring is slidably connected to the evaporation chamber; the motor is connected to the rotating ring through transmission, and the baffle covers and is fixed to the inner ring of the rotating ring.

2. The evaporation machine for extending the life of a crystal oscillator according to claim 1, characterized in that: It also includes a plating pot, and the plating source, the plating pot, the shielding plate and the crystal oscillator are arranged in sequence from bottom to top.

3. The evaporation machine for extending the life of a crystal oscillator according to claim 2, characterized in that: An annular planetary track is horizontally arranged on the inner wall of the evaporation chamber, and the plating pot is slidably connected to the planetary track.

4. The evaporation machine for extending the life of a crystal oscillator according to claim 1, characterized in that: The inner ring of the rotating ring is provided with a clamping groove, the edge of the shielding plate is provided with a clamping protrusion corresponding to the clamping groove, and the shielding plate is fixedly connected to the rotating ring through the clamping groove.

5. The evaporation machine for extending the life of a crystal oscillator according to claim 1, characterized in that: It also includes a plating pot, which is fixedly connected to the rotating ring.

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