Ceramic substrate pretreatment equipment and working method thereof

Abstract

The present invention relates to the technical field of ceramic substrate pretreatment, and in particular to ceramic substrate pretreatment equipment and a working method thereof, comprising a grinding base, a grinding mechanism, a fan-shaped loading and unloading platform, a material taking driving mechanism and a spraying mechanism, wherein an upper fan-shaped grinding box and a lower fan-shaped grinding box are fixedly mounted on the grinding base through a plurality of support frames, and the grinding mechanism comprises two groups of grinding components, which are respectively arranged on the upper fan-shaped grinding box and the lower fan-shaped grinding box. The present invention, when pretreatment of the ceramic substrate, is not only convenient for simultaneously grinding and polishing the upper and lower surfaces of the ceramic substrate, but also can well control the parallelism of the upper and lower surfaces of the ceramic substrate, and can also perform certain detection on the parallelism of the upper and lower surfaces of the ceramic substrate, and when pretreatment of the ceramic substrate, there is no need for batch processing, and the ceramic substrate can be continuously loaded, thereby greatly improving the pretreatment processing efficiency and processing quality of the ceramic substrate.

Description

Technical Field

[0001] The invention relates to the technical field of ceramic substrate pretreatment, and in particular to a ceramic substrate pretreatment device and a working method thereof. Background Art

[0002] Ceramic substrate refers to a special process board in which copper foil is directly bonded to the surface of an alumina or aluminum nitride ceramic substrate at high temperature. Before metallization, most ceramic substrates need to be surface ground and polished. There are usually two pretreatment methods: single-sided and double-sided. The main purpose is to remove surface attachments, improve flatness, and obtain a thinner metallization layer. Therefore, pretreatment grinding and polishing are crucial for the use of ceramic substrates, and the effect of pretreatment will directly affect the effect of ceramic metallization.

[0003] When the equipment in the prior art performs pre-treatment grinding and polishing on the ceramic substrate, most of the polishing equipment is based on the motion structure of the planetary gear, and adopts the cooperation between the polishing disk and the loading mold to place the ceramic substrate inside the loading mold, and polish the ceramic substrate by rotating the polishing disk. This processing method through unilateral polishing, when pre-treating the surface of one side of the ceramic substrate, after processing one side, the other side of the ceramic substrate needs to be processed. This unilateral grinding and polishing pre-treatment method is difficult to control the parallelism of the upper and lower surfaces of the ceramic substrate during the actual processing process (the smaller the parallelism of the upper and lower surfaces of the ceramic substrate, the better the capacitance and inductance of the substrate can be controlled when the ceramic substrate is metallized and patterned), which affects the normal use of the ceramic substrate. When the double-sided grinding and polishing machines of some ceramic substrates are polishing the ceramic substrate, most of them are not convenient for continuous grinding and polishing pre-treatment of the ceramic substrate, and the processing efficiency is relatively low. Therefore, in order to achieve ultra-smooth and flat surface of the ceramic substrate after pre-treatment, and to improve the processing efficiency, we propose a pre-treatment device for ceramic substrates. Summary of the invention

[0004] 1. Technical issues to be resolved

[0005] In view of the deficiencies in the prior art, the present invention provides a pretreatment device for a ceramic substrate and a working method thereof, which solves the problem that when the polishing equipment in the prior art performs grinding and polishing pretreatment on the ceramic substrate, it is not convenient to control the parallelism of the upper and lower surfaces of the ceramic substrate, thereby affecting the normal use of the ceramic substrate, and the processing effect is low when pretreating the ceramic substrate.

[0006] (II) Technical solution

[0007] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a pretreatment device for a ceramic substrate, comprising a grinding base, a grinding mechanism, a fan-shaped loading and unloading platform, a material taking drive mechanism and a spray mechanism;

[0008] An upper fan-shaped grinding box and a lower fan-shaped grinding box are fixedly mounted on the grinding base via a plurality of support frames;

[0009] The grinding mechanism comprises two groups of grinding components, which are respectively arranged on the upper sector-shaped grinding box and the lower sector-shaped grinding box, and the two groups of grinding components correspond to each other to form a grinding cavity;

[0010] An adjusting component located on the upper sector-shaped grinding box, the adjusting component is installed on the upper sector-shaped grinding box and is partially connected to the grinding component where it is located, and is used to adjust the height of the grinding cavity;

[0011] A detection component located on the lower fan-shaped grinding box, wherein the detection component is arranged inside the lower fan-shaped grinding box and connected to the grinding component where it is located;

[0012] The fan-shaped loading and unloading platform is installed on the lower fan-shaped grinding box, and the fan-shaped loading and unloading platform is provided with a loading groove and a loading assembly for loading ceramic substrates;

[0013] The material taking drive mechanism comprises a plurality of material taking components and a driving grinding component, wherein the driving grinding component is mounted on the upper fan-shaped grinding box and the grinding base and is arranged in the middle of the upper fan-shaped grinding box, and the plurality of material taking components are fixedly mounted on the driving grinding component at equal angles, and are used to take the ceramic substrate on the loading component and automatically grind it;

[0014] The spray mechanism is installed on the grinding base, and part of the sealing sleeve of the lower fan-shaped grinding box is arranged inside the spray mechanism for spraying and cleaning the ceramic substrate during the grinding process.

[0015] On the basis of the above-mentioned scheme, the grinding assembly located on the lower fan-shaped grinding box includes multiple fan-shaped supporting plates, and the multiple fan-shaped supporting plates are longitudinally slidably arranged inside the lower fan-shaped grinding box and partially located above the lower fan-shaped grinding box. The fan-shaped supporting plate close to the side of the unloading groove is detachably fixed with a cleaning cotton plate by multiple bolts one, and the remaining multiple fan-shaped supporting plates are detachably fixed with grinding plates of different mesh sizes by multiple bolts two in turn, and the grinding plate with the largest mesh size is close to the side of the cleaning cotton plate.

[0016] Further on the basis of the above scheme, the adjustment assembly includes multiple adjustment parts, and the multiple adjustment parts are all installed on the upper fan-shaped grinding box and are respectively connected to multiple fan-shaped supporting plates, one side of the adjustment part includes a high-precision electric cylinder, and the high-precision electric cylinder is installed on the upper fan-shaped grinding box, and the output end of the high-precision electric cylinder penetrates downward into the interior of the upper fan-shaped grinding box and is fixedly installed between the fan-shaped supporting plates.

[0017] Preferably, the detection assembly includes a plurality of pressure sensors, and the plurality of pressure sensors are fixedly mounted on the inner bottom wall of the lower fan-shaped grinding box, and the detection ends of the plurality of pressure sensors are fixedly mounted in groups of two on a plurality of fan-shaped supporting plates located on the lower fan-shaped grinding box.

[0018] In order to facilitate the loading of ceramic substrates, the loading assembly includes a loading rack, a telescopic rod with a self-locking function and a carrier tube. The loading rack is detachably fixed on one side of the fan-shaped loading and unloading platform by multiple bolts. One end of the telescopic rod is fixedly installed on the loading rack, and the other end of the telescopic rod is fixedly installed between one side of the carrier tube. A loading cavity is formed between the bottom end of the carrier tube and the fan-shaped loading and unloading platform.

[0019] As a preferred technical solution of the present invention, the driving grinding assembly includes an upper top plate, a driving motor, a driving rod, a rotating block, an upper guide block and a lower guide block. The upper top plate is fixedly mounted above the upper fan-shaped grinding box through a plurality of bearing rods. The driving motor is mounted on the upper top plate. The output end of the driving motor passes downward to the bottom of the upper top plate and is fixedly mounted with one end of the driving rod. The other end of the driving rod is rotatably mounted on the grinding base. The upper guide block and the lower guide block are respectively fixedly mounted on the upper top plate and the grinding base through two connecting tubes, and a guide cavity is formed between the upper guide block and the lower guide block. Part of the driving rod is sleeved inside the two connecting tubes, and the rotating block is fixedly mounted on the driving rod and is located inside the guide cavity.

[0020] As a preferred technical scheme of the present invention, one group of the material picking components includes a guide cylinder, a guide column, a guide spring, a guide slide bar, a Z-rod, a telescopic rod two with a self-locking function and a material picking frame, one side of the guide cylinder is fixedly installed on the rotating block, and part of the guide column is slidably sleeved inside the guide cylinder, the guide spring is fixedly installed between the guide cylinder and the guide column and is located inside the guide cylinder, the guide slide bar is fixedly installed on the guide column, the upper guide block and the lower guide block are both provided with plum blossom-shaped guide grooves, the two sides of the guide slide bar are partially slidably arranged in the two guide grooves, one side of the middle part of the guide slide bar is fixedly installed between one end of the Z-rod, part of the Z-rod passes through the outside of the guide cavity and is fixedly installed at one end of the telescopic rod two, the other end of the telescopic rod two is detachably fixed to one side of the material picking frame by multiple bolts four, and the material picking frame is adapted between the feeding assembly.

[0021] As a further scheme of the present invention, the spray mechanism includes a fan-shaped liquid carrying tank, a liquid supply pump, a spray pipe, multiple groups of atomizing nozzles and multiple groups of fan-shaped filtrate boxes, the fan-shaped liquid carrying tank is fixedly installed on the grinding base, the lower fan-shaped grinding box is partially sealed and sleeved inside the fan-shaped liquid carrying tank, and a plurality of water seepage holes are opened at the bottom end of the lower fan-shaped grinding box, multiple groups of fan-shaped filtrate boxes are partially slidably installed inside the fan-shaped liquid carrying tank, and the other part extends to the outside of the fan-shaped liquid carrying tank, the liquid supply pump is installed on the grinding base and is located on one side of the fan-shaped liquid carrying tank, a liquid outlet pipe 1 is connected between the input end of the liquid supply pump and the fan-shaped liquid carrying tank, and the liquid outlet pipe 1 is arranged below the multiple groups of fan-shaped filtrate boxes, a liquid outlet pipe 2 is connected between the output end of the liquid supply pump and the spray pipe, the spray pipe is fixedly installed on the fan-shaped liquid carrying tank through multiple stabilizing rods, multiple groups of atomizing nozzles are connected to the spray pipe, and multiple groups of atomizing nozzles correspond to the grinding cavity.

[0022] In order to facilitate the storage of the processed ceramic substrates, a storage box for storing the processed ceramic substrates is provided on the grinding base, and the storage box is arranged below the feeding groove.

[0023] The working method of the pretreatment equipment of the ceramic substrate includes the above-mentioned pretreatment equipment of the ceramic substrate, and further includes the following steps:

[0024] Step 1. Before the pretreatment of the ceramic substrate by the pretreatment equipment for grinding and polishing the ceramic substrate, according to the model and shape of the ceramic substrate to be processed, the carrier tube and the material frame compatible with the ceramic substrate are replaced by disassembling bolts three and four, and the ceramic substrate is placed inside the carrier tube. At this time, the ceramic substrate located at the bottom layer is in the loading cavity, and the high-precision electric cylinder is started at the same time. The output end of the high-precision electric cylinder will drive the fan-shaped carrier plate connected thereto to move, and the fan-shaped carrier plate drives the grinding plate to move. The height of the grinding cavity is adjusted according to the thickness of the ceramic substrate to complete the loading operation of the ceramic substrate;

[0025] Step 2, when grinding and polishing the ceramic substrate, start the driving motor, the output end of the driving motor drives the driving rod to rotate, the driving rod drives the rotating block to rotate, the rotating block drives the guide cylinder to move, the guide cylinder drives the guide column to move, the guide column drives the guide slide bar to move, the guide spring is always in an extruded rotation state, under the resilience of the guide spring, the guide slide bar is always in contact with the edge of the plum blossom-shaped guide groove, the movement of the guide column will make the guide slide bar move along the edge of the guide groove, so that the guide slide bar moves in a curve, and at the same time the guide slide bar drives the Z-bar to move, the Z-bar drives the telescopic second to move, the telescopic second drives the material picking frame to move, the material picking frame is U-shaped, by adjusting the length of the telescopic rod one and the telescopic rod two, the movement of the material picking frame through the feeding cavity will drive the ceramic substrate at the feeding cavity to move, it should be noted that the height of the feeding cavity is greater than the thickness of the ceramic substrate and less than twice the thickness of the ceramic substrate, the thickness of the material picking frame is less than the thickness of the ceramic substrate;

[0026] Step 3. After the material picking frame drives the ceramic substrate to move, the driving rod rotates to enter the grinding cavity. First, the ceramic substrate will enter the grinding plate with a smaller mesh number, and will be roughly ground on two grinding plates with smaller mesh numbers. During the rough grinding process, it can be detected by the pressure sensor inside the lower fan-shaped grinding box. When the pressure reading of the pressure sensor is stable, and the pressure sensor detects the set reading, it means that the upper and lower grinding plates of the ceramic substrate are grinding the upper and lower surfaces of the ceramic substrate. When the reading of the pressure sensor is lower than the set value, the high-precision electric cylinder will drive the fan-shaped bearing plate connected thereto to move, squeeze the ceramic substrate, so that the grinding plate can better grind the ceramic substrate. By grinding the double sides of the ceramic substrate, the grinding effect of the ceramic substrate can be greatly improved.

[0027] Step 4: When the ceramic substrate moves in a curve along with the driving rod, the rough grinding of the surface of the ceramic substrate will be transformed into fine grinding as the number of the grinding plate increases, which can greatly improve the grinding effect of the ceramic substrate. It should be noted that since the hardness of the ceramic substrate itself is relatively large, in the actual grinding process, the curve gap and movement length between the guide slide bar and the guide groove can be increased, and the friction speed and friction time between the ceramic substrate and the grinding plate can be increased, so that the ground ceramic substrate can meet the use requirements;

[0028] Step 5. While the ceramic substrate and the grinding plate are being ground and polished, the liquid supply pump needs to be started. The liquid supply pump will pump the grinding liquid required for grinding inside the fan-shaped liquid carrier tank into the inside of the spray pipe through the liquid outlet pipe 1 and the liquid outlet pipe 2. Then the grinding liquid will be sprayed out through the atomizing nozzle to spray and cool the ceramic substrate inside the grinding cavity. At the same time, it will carry impurities ground off the ceramic substrate. The grinding liquid carrying impurities will then flow to the inside of the corresponding fan-shaped filtrate box. After the fan-shaped filtrate box simply filters the grinding liquid, most of the impurities inside the grinding liquid will be filtered out. The filtered grinding liquid will pass through the fan-shaped filtrate box and flow back to the bottom of the fan-shaped liquid carrier tank to be supplied to the liquid supply pump for use, thereby realizing the recycling of the grinding liquid.

[0029] Step 6. After the ceramic substrate is ground and polished by a multi-mesh grinding plate, it finally passes to a cleaning cotton plate. The cleaning cotton plate will clean and wipe the water stains on the grinding surfaces on both sides of the ceramic substrate, thereby obtaining a clean and smooth ceramic substrate. The processed ceramic substrate will fall into the storage box inside the feeding groove when passing through the feeding groove, thereby completing the pretreatment of the ceramic substrate.

[0030] (III) Beneficial effects

[0031] Compared with the prior art, the present invention provides a pretreatment device for a ceramic substrate and a working method thereof, which have the following beneficial effects:

[0032] The present invention can stably place the ceramic substrate through the loading assembly on the loading and unloading platform when pre-processing the ceramic substrate. The height of the grinding cavity can be adjusted according to the thickness of the ceramic substrate through the cooperation of the adjusting assembly. Then, the ceramic substrate in the loading assembly can be driven to move in a curve through the cooperation between the material taking assembly and the driving grinding assembly, so as to realize continuous pre-processing and loading of the ceramic substrate without the need for wave-by-wave loading. When the ceramic substrate moves, the upper and lower surfaces of the ceramic substrate can be ground and polished through the two groups of grinding mechanisms. At the same time, through the cooperation between the detection assembly, the adjustment assembly and the spraying mechanism, when grinding and polishing the two sides of the ceramic substrate, not only the grinding effect of the ceramic substrate can be greatly improved, but also the parallelism of the upper and lower surfaces of the ceramic substrate can be well controlled and detected, thereby improving the overall quality of the ceramic substrate after processing.

[0033] Therefore, when pre-treating the ceramic substrate, the pre-treating equipment of the ceramic substrate is not only convenient for simultaneously grinding and polishing the upper and lower surfaces of the ceramic substrate, but also can well control the parallelism of the upper and lower surfaces of the ceramic substrate, and can perform certain detections on the parallelism of the upper and lower surfaces of the ceramic substrate. Moreover, when pre-treating the ceramic substrate, there is no need to process it in batches, and the ceramic substrate can be continuously fed, which greatly improves the pre-treating efficiency and quality of the ceramic substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] Figure 1 It is a schematic diagram of a partially cutaway three-dimensional structure of the present invention;

[0035] Figure 2 It is a three-dimensional structural schematic diagram of the overall working state of the present invention;

[0036] Figure 3 It is a schematic diagram of the three-dimensional structure of the present invention as a whole from another angle;

[0037] Figure 4 It is a schematic diagram of a partially exploded three-dimensional structure of the grinding base, the lower fan-shaped grinding box and the spray mechanism of the present invention;

[0038] Figure 5 It is a schematic diagram of the three-dimensional structure of the upper guide block, the lower guide block and multiple groups of material taking components of the present invention;

[0039] Figure 6 For the present invention Figure 1 A schematic diagram of the local enlarged structure at point A in the middle;

[0040] Figure 7 For the present invention Figure 1 A schematic diagram of the local enlarged structure at B in the middle;

[0041] Figure 8 For the present invention Figure 1 A schematic diagram of the local enlarged structure at C in the middle;

[0042] Fig. 9 For the present invention Figure 1 A schematic diagram of the local enlarged structure at D in the middle;

[0043] Fig.10 For the present invention Figure 2 Schematic diagram of the local enlarged structure at point E in the middle.

[0044] In the figure: 1. Grinding base; 2. Support frame; 3. Upper fan-shaped grinding box; 4. Lower fan-shaped grinding box; 5. Fan-shaped loading and unloading platform; 6. Fan-shaped bearing plate; 7. Cleaning cotton plate; 8. Grinding plate; 9. High-precision electric cylinder; 10. Pressure sensor; 11. Loading rack; 12. Telescopic rod 1; 13. Plate carrier tube; 14. Upper top plate; 15. Driving motor; 16. Driving rod; 17. Rotating block; 18. Upper guide block; 19. Lower Guide block; 20, connecting tube; 21, guide tube; 22, guide column; 23, guide spring; 24, guide slide rod; 25, Z-shaped rod; 26, telescopic rod 2; 27, material taking frame; 28, fan-shaped liquid carrying tank; 29, liquid supply pump; 30, spray pipe; 31, atomizing nozzle; 32, fan-shaped filtrate box; 33, liquid outlet pipe 2; 34, storage box; 101, grinding mechanism; 102, material taking drive mechanism; 103, spray mechanism. DETAILED DESCRIPTION

[0045] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0046] Example 1

[0047] See also Figures 1 to 10 , a pretreatment device for ceramic substrates, comprising a grinding base 1, a grinding mechanism 101, a fan-shaped loading and unloading platform 5, a material taking drive mechanism 102 and a spray mechanism 103, an upper fan-shaped grinding box 3 and a lower fan-shaped grinding box 4 are fixedly mounted on the grinding base 1 through a plurality of support frames 2;

[0048] like Figure 1 and Figure 4As shown, the grinding mechanism 101 includes two groups of grinding components, which are respectively arranged on the upper fan-shaped grinding box 3 and the lower fan-shaped grinding box 4, and the two groups of grinding components correspond to each other to form a grinding cavity, and the grinding component located on the lower fan-shaped grinding box 4 includes a plurality of fan-shaped supporting plates 6, and the plurality of fan-shaped supporting plates 6 are longitudinally slidably arranged inside the lower fan-shaped grinding box 4 and partially located above the lower fan-shaped grinding box 4. A cleaning cotton plate 7 is detachably fixedly installed on the fan-shaped supporting plate 6 near the side of the material discharge groove by a plurality of bolts, and the remaining plurality of fan-shaped supporting plates 6 are sequentially connected through Grinding plates 8 with different meshes can be detachably fixed by multiple bolts 2, and the grinding plate 8 with the largest mesh is close to one side of the cleaning cotton plate 7. The present invention can perform comprehensive processing and grinding of the ceramic substrate from coarse grinding to fine grinding by setting grinding plates 8 with different meshes. By setting the cleaning cotton plate 7, water stains and impurities remaining on the surface of the ceramic substrate after pretreatment can be cleaned. After a long period of pretreatment, when the friction performance of the grinding plate 8 decreases, or there are too many foreign objects on the cleaning cotton plate 7, the corresponding grinding plate 8 or cleaning cotton plate 7 can be replaced and cleaned by removing bolts 1 and 2;

[0049] An adjusting component located on the upper sector-shaped grinding box 3, the adjusting component is installed on the upper sector-shaped grinding box 3 and is partially connected to the grinding component where it is located, and is used to adjust the height of the grinding cavity. The adjusting component includes a plurality of adjusting parts, and the plurality of adjusting parts are all installed on the upper sector-shaped grinding box 3 and are respectively connected to a plurality of sector-shaped carrying plates 6, wherein one side of the adjusting part includes a high-precision electric cylinder 9, the high-precision electric cylinder 9 is installed on the upper sector-shaped grinding box 3, and the output end of the high-precision electric cylinder 9 penetrates downward to the interior of the upper sector-shaped grinding box 3 and is fixedly installed between the sector-shaped carrying plates 6, and specifically, by starting the high-precision electric cylinder 9, the position of the sector-shaped carrying plate 6 connected thereto can be accurately adjusted;

[0050] The detection component is located on the lower fan-shaped grinding box 4, and the detection component is arranged inside the lower fan-shaped grinding box 4 and connected to the grinding components where it is located. The detection component includes multiple pressure sensors 10, and the multiple pressure sensors 10 are fixedly installed on the inner bottom wall of the lower fan-shaped grinding box 4, and the detection ends of the multiple pressure sensors 10 are respectively fixedly installed in groups of two on multiple fan-shaped supporting plates 6 located on the lower fan-shaped grinding box 4. In the actual installation process, the connecting lines of the multiple pressure sensors 10 are extended to the outside of the lower fan-shaped grinding box 4 and merged into a connecting line. This connecting line can be stabilized on the outer wall of the lower fan-shaped grinding box 4 through a protective box, and then the connecting line extends from one side of the protective box and is connected to the control device through electrical control.

[0051] As mentioned above, the fan-shaped loading and unloading platform 5 is installed on the lower fan-shaped grinding box 4, and the fan-shaped loading and unloading platform 5 is provided with a loading groove and a loading assembly for loading ceramic substrates, wherein the loading assembly includes a loading rack 11, a telescopic rod 12 with a self-locking function and a carrier tube 13, and the loading rack 11 is detachably fixedly installed on one side of the fan-shaped loading and unloading platform 5 by a plurality of bolts 3, one end of the telescopic rod 12 is fixedly installed on the loading rack 11, and the other end of the telescopic rod 26 is fixedly installed between one side of the carrier tube 13, and a loading cavity is formed between the bottom end of the carrier tube 13 and the fan-shaped loading and unloading platform 5, and the carrier tube 13 is adapted to the shape of the ceramic substrate to be processed;

[0052] like Figure 1 and Figure 5 As shown, the above-mentioned material taking drive mechanism 102 includes multiple groups of material taking components and driving grinding components, the driving grinding components are installed on the upper fan-shaped grinding box 3 and the grinding base 1 and are arranged in the middle of the upper fan-shaped grinding box 3, and multiple groups of material taking components are fixedly installed on the driving grinding components at equal angles. The driving grinding components include an upper top plate 14, a driving motor 15, a driving rod 16, a rotating block 17, an upper guide block 18 and a lower guide block 19. The upper top plate 14 is fixedly installed above the upper fan-shaped grinding box 3 through multiple bearing rods, the driving motor 15 is installed on the upper top plate 14, and the output end of the driving motor 15 penetrates downward to the bottom of the upper top plate 14 and is fixedly installed with one end of the driving rod 16, and the other end of the driving rod 16 is rotatably installed on the grinding base 1, the upper guide block 18 and the lower guide block 19 are respectively fixedly installed on the upper top plate 14 and the grinding base 1 through two connecting tubes 20, and a guide cavity is formed between the upper guide block 18 and the lower guide block 19, part of the driving rod 16 is sleeved inside the two connecting tubes 20, and the rotating block 17 is fixedly installed On the driving rod 16 and located inside the guide cavity, one set of material taking components includes a guide cylinder 21, a guide column 22, a guide spring 23, a guide slide 24, a Z-shaped rod 25, a telescopic rod 26 with a self-locking function and a material taking frame 27, one side of the guide cylinder 21 is fixedly mounted on the rotating block 17, a part of the guide column 22 is slidably sleeved inside the guide cylinder 21, the guide spring 23 is fixedly mounted between the guide cylinder 21 and the guide column 22 and located inside the guide cylinder 21, and the guide slide 24 is fixedly mounted on the guide column 22, the upper guide block 18 and the lower guide block 19 are both provided with plum blossom-shaped guide grooves, and the two sides of the guide slide bar 24 are partially slidably arranged inside the two guide grooves, and the middle side of the guide slide bar 24 is fixedly installed between one end of the Z-shaped rod 25, and part of the Z-shaped rod 25 passes through the outside of the guide cavity and is fixedly installed with one end of the telescopic rod 26. The other end of the telescopic rod 26 is detachably fixedly installed with one side of the material taking frame 27 by a plurality of bolts 4, and the material taking frame 27 is adapted to the feeding assembly;

[0053] When in use, the drive motor 15 is started, and the output end of the drive motor 15 drives the drive rod 16 to rotate, the drive rod 16 drives the rotating block 17 to rotate, the rotating block 17 drives the guide cylinder 21 to move, the guide cylinder 21 drives the guide column 22 to move, the guide column 22 drives the guide slide 24 to move, the guide spring 23 is always in an extruded rotation state, and the guide slide 24 is always in contact with the edge of the plum blossom-shaped guide groove due to the rebound force of the guide spring 23. The movement of the guide column 22 causes the guide slide 24 to move along the edge of the guide groove, so that the guide slide 24 moves The guide slide bar 24 drives the Z-shaped rod 25 to move, the Z-shaped rod 25 drives the telescopic rod 2 to move, the telescopic rod 26 drives the material picking frame 27 to move, the material picking frame 27 is set in a U shape, by adjusting the length of the telescopic rod 12 and the telescopic rod 26, when the material picking frame 27 passes through the feeding cavity, it will drive the ceramic substrate at the feeding cavity to move. In actual use, in order to ensure that the driving motor 15 can drive the driving rod 16 to rotate properly, a reduction box in the prior art can be set at the driving motor 15 to control the rotation of the driving rod 16;

[0054] like Figure 1 to Figure 1As shown, the spray mechanism 103 is installed on the grinding base 1, and the lower fan-shaped grinding box 4 is partially sealed and sleeved inside the spray mechanism 103. The spray mechanism 103 includes a fan-shaped liquid carrier tank 28, a liquid supply pump 29, a spray pipe 30, a plurality of groups of atomizing nozzles 31 and a plurality of groups of fan-shaped filtrate boxes 32. The fan-shaped liquid carrier tank 28 is fixedly installed on the grinding base 1, and the lower fan-shaped grinding box 4 is partially sealed and sleeved inside the fan-shaped liquid carrier tank 28. A plurality of water seepage holes are opened at the bottom end of the lower fan-shaped grinding box 4, and the plurality of groups of fan-shaped filtrate boxes 32 are partially slidably installed on the fan-shaped liquid carrier tank 28. The liquid supply pump 29 is installed on the grinding base 1 and is located on one side of the fan-shaped liquid supply tank 28. The input end of the liquid supply pump 29 is connected to the fan-shaped liquid supply tank 28 by a liquid outlet pipe 1, and the liquid outlet pipe 1 is arranged below the multiple groups of fan-shaped filtrate boxes 32. The output end of the liquid supply pump 29 is connected to the spray pipe 30 by a liquid outlet pipe 23. The spray pipe 30 is fixedly installed on the fan-shaped liquid supply tank 28 through multiple stabilizing rods. Multiple groups of atomizing nozzles 31 are all connected to the spray pipe 30, and multiple groups of atomizing nozzles 31 are all connected to the spray pipe 30. Specifically, by starting the liquid supply pump 29, the liquid supply pump 29 will pump the grinding liquid required for grinding inside the fan-shaped liquid carrier box 28 into the inside of the spray pipe 30 through the liquid outlet pipe 1 and the liquid outlet pipe 2 33, and then the grinding liquid will be sprayed out through the atomizing nozzle 31 to spray and cool the ceramic substrate inside the grinding cavity, and at the same time, it will carry impurities ground from the ceramic substrate. The grinding liquid carrying impurities will then flow to the inside of the corresponding fan-shaped filtrate box 32. After the fan-shaped filtrate box 32 simply filters the grinding liquid, most of the impurities inside the grinding liquid will be filtered out. The filtered grinding liquid will pass through the fan-shaped filtrate box 32 and flow back to the bottom of the fan-shaped liquid carrying tank 28 to be supplied to the liquid supply pump 29 for use, thereby realizing the recycling of the grinding liquid. When the impurities filtered inside the fan-shaped filtrate box 32 are too many and are about to reach saturation, the fan-shaped filtrate box 32 can be pulled out from the inside of the fan-shaped liquid carrying tank 28, and the fan-shaped filtrate box 32 can be cleaned or replaced. In order to facilitate the replacement of the grinding liquid inside the fan-shaped liquid carrying tank 28, a drain pipe can be set at the bottom end of the fan blade liquid carrying tank, and then a valve can be set on the drain pipe.

[0055] It should be noted here that when the ceramic substrate passes through the cleaning cotton plate 7, it is necessary to focus on detecting the reading of the pressure sensor 10 at the cleaning cotton plate 7. The parallelism of the upper and lower surfaces of the clean ceramic substrate after processing should be close to 0. Therefore, when passing through the cleaning cotton plate 7, the reading fluctuation on the pressure sensor 10 should also be close to a straight line. When the reading of the pressure sensor 10 exceeds the preset value, it can be explained that the ceramic substrate at this time is a low-quality plate, which can be manually selected.

[0056] In order to facilitate the storage of processed ceramic substrates, a storage box 34 for storing processed ceramic substrates is provided on the grinding base 1. The storage box 34 is arranged below the unloading groove. In actual use, those skilled in the art can replace the storage box 34 with a conveyor belt compatible with the equipment of the present invention, or a small robotic arm without paying any creativity. When the small robotic arm is set, the loading assembly can be replaced, and the ceramic substrates can be loaded by the robotic arm. At the same time, the ceramic substrates after production can be stacked, and the robotic arm can be electrically controlled with the corresponding pressure sensor 10. When the pressure change of the pressure sensor 10 when detecting the ceramic substrate exceeds the preset value, the ceramic substrate can be stored separately by the robotic arm, and the selected ceramic substrates can be centrally processed or re-ground later.

[0057] The above-mentioned high-precision electric cylinder 9, pressure sensor 10, drive motor 15, liquid supply pump 29, etc. are all conventional equipment purchased on the market and known to technical personnel in this field. The model can be selected or customized according to actual needs. For technical personnel in this field, their setting method, installation method and electrical connection method only need to be debugged according to the requirements of their instruction manual, and they will not be described in detail here. The high-precision electric cylinder 9, pressure sensor 10, drive motor 15, liquid supply pump 29, etc. are all provided with matching control switches. The installation position of the control switch is selected according to actual use requirements to facilitate the operator to operate and control.

[0058] Example 2

[0059] Embodiment 2 of the present invention further illustrates the working method of the pretreatment equipment of the ceramic substrate based on Embodiment 1:

[0060] The pretreatment equipment for the ceramic substrate includes the following steps:

[0061] Step 1, before the pretreatment equipment of the ceramic substrate performs grinding and polishing pretreatment on the ceramic substrate, according to the model and shape of the ceramic substrate to be processed, the carrier tube 13 and the material frame 27 adapted to the ceramic substrate are replaced by disassembling bolts three and four, and the ceramic substrate is placed inside the carrier tube 13. At this time, the ceramic substrate located at the bottom layer is in the loading cavity, and the high-precision electric cylinder 9 is started at the same time. The output end of the high-precision electric cylinder 9 will drive the fan-shaped carrier plate 6 connected thereto to move, and the fan-shaped carrier plate 6 drives the grinding plate 8 to move. The height of the grinding cavity is adjusted according to the thickness of the ceramic substrate to complete the loading operation of the ceramic substrate;

[0062] Step 2: When grinding and polishing the ceramic substrate, start the drive motor 15, the output end of the drive motor 15 drives the drive rod 16 to rotate, the drive rod 16 drives the rotating block 17 to rotate, the rotating block 17 drives the guide cylinder 21 to move, the guide cylinder 21 drives the guide column 22 to move, the guide column 22 drives the guide slide 24 to move, the guide spring 23 is always in an extruded rotation state, under the rebound force of the guide spring 23, the guide slide 24 is always in contact with the edge of the plum blossom-shaped guide groove, and the movement of the guide column 22 causes the guide slide 24 to move along the edge of the guide groove. The guide slide bar 24 moves in a curve, and the guide slide bar 24 drives the Z-shaped rod 25 to move, the Z-shaped rod 25 drives the telescopic rod 2 to move, the telescopic rod 26 drives the material picking frame 27 to move, and the material picking frame 27 is set in a U shape. By adjusting the length of the telescopic rod 12 and the telescopic rod 26, when the material picking frame 27 moves through the loading cavity, it will drive the ceramic substrate at the loading cavity to move. It should be noted that the height of the loading cavity is greater than the thickness of the ceramic substrate and less than twice the thickness of the ceramic substrate, and the thickness of the material picking frame 27 is less than the thickness of the ceramic substrate;

[0063] Step 3, after the material picking frame 27 drives the ceramic substrate to move, as the driving rod 16 rotates to enter the interior of the grinding cavity, the ceramic substrate will first enter the grinding plate 8 with a smaller mesh number, and be coarsely ground on the two grinding plates 8 with smaller mesh numbers. During the coarse grinding process, it can be detected by the pressure sensor 10 inside the lower fan-shaped grinding box 4. When the pressure reading of the pressure sensor 10 is stable, and the pressure sensor 10 detects the set reading, it means that the upper and lower grinding plates 8 of the ceramic substrate are grinding the upper and lower surfaces of the ceramic substrate. When the reading of the pressure sensor 10 is lower than the set value, the high-precision electric cylinder 9 will drive the fan-shaped supporting plate 6 connected thereto to move, squeeze the ceramic substrate, so that the grinding plate 8 can better grind the ceramic substrate. By grinding the double-sided ceramic substrate, the grinding effect of the ceramic substrate can be greatly improved;

[0064] Step 4: When the ceramic substrate moves in a curve along with the driving rod 16, the rough grinding of the surface of the ceramic substrate will be transformed into fine grinding as the mesh number of the grinding plate 8 increases, which can greatly improve the grinding effect of the ceramic substrate. It should be noted that, since the hardness of the ceramic substrate itself is relatively large, in the actual grinding process, the curve gap and movement length between the guide slide bar 24 and the guide groove can be increased, and the friction speed and friction time between the ceramic substrate and the grinding plate 8 can be increased, so that the ground ceramic substrate can meet the use requirements;

[0065] Step 5, while the ceramic substrate and the grinding plate 8 are being ground and polished, the liquid supply pump 29 needs to be started. The liquid supply pump 29 will pump the grinding liquid required for grinding inside the fan-shaped liquid carrier box 28 into the inside of the spray pipe 30 through the liquid outlet pipe 1 and the liquid outlet pipe 2 33, and then the grinding liquid will be sprayed out through the atomizing nozzle 31 to spray and cool the ceramic substrate inside the grinding cavity, and at the same time, it will carry impurities ground from the ceramic substrate. The grinding liquid carrying impurities will then flow to the inside of the corresponding fan-shaped filtrate box 32. After the fan-shaped filtrate box 32 simply filters the grinding liquid, most of the impurities inside the grinding liquid will be filtered out. The filtered grinding liquid will pass through the fan-shaped filtrate box 32 and flow back to the bottom of the fan-shaped liquid carrier box 28 to be supplied to the liquid supply pump 29 for use, thereby realizing the recycling of the grinding liquid;

[0066] Step six, after the ceramic substrate is ground and polished by the multi-mesh grinding plate 8, it finally passes to the cleaning cotton plate 7, and the water stains on the grinding surfaces on both sides of the ceramic substrate are cleaned and wiped by the cleaning cotton plate 7, so as to obtain a clean and smooth ceramic substrate. The processed ceramic substrate will fall into the storage box inside the feeding groove when passing through the feeding groove, thereby realizing the pretreatment operation of the ceramic substrate.

[0067] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A pretreatment device for a ceramic substrate, characterized in that: include: A grinding base (1), wherein an upper fan-shaped grinding box (3) and a lower fan-shaped grinding box (4) are fixedly mounted on the grinding base (1) via a plurality of support frames (2); A grinding mechanism (101), the grinding mechanism (101) comprising two groups of grinding components, the two groups of grinding components being respectively arranged on the upper fan-shaped grinding box (3) and the lower fan-shaped grinding box (4), and the two groups of grinding components corresponding to each other to form a grinding cavity; An adjustment component located on the upper sector-shaped grinding box (3), the adjustment component being mounted on the upper sector-shaped grinding box (3) and partially connected to the grinding component where it is located, and being used to adjust the height of the grinding cavity; A detection component located on the lower sector-shaped grinding box (4), the detection component being arranged inside the lower sector-shaped grinding box (4) and connected to the grinding component in which it is located; A fan-shaped loading and unloading platform (5), the fan-shaped loading and unloading platform (5) being mounted on the lower fan-shaped grinding box (4), the fan-shaped loading and unloading platform (5) being provided with a loading groove and a loading assembly for loading ceramic substrates; A material taking drive mechanism (102), the material taking drive mechanism (102) comprising a plurality of groups of material taking components and a driving grinding component, the driving grinding component being mounted on an upper fan-shaped grinding box (3) and a grinding base (1) and arranged in the middle of the upper fan-shaped grinding box (3), the plurality of groups of material taking components being fixedly mounted on the driving grinding component at equal angles, and being used to take materials from a ceramic substrate on a loading component and automatically grind the ceramic substrate; A spray mechanism (103), the spray mechanism (103) being mounted on the grinding base (1), and a portion of the sealing sleeve of the lower sector-shaped grinding box (4) being arranged inside the spray mechanism (103), for spraying and cleaning the ceramic substrate during the grinding process; The driving grinding assembly comprises an upper top plate (14), a driving motor (15), a driving rod (16), a rotating block (17), an upper guide block (18) and a lower guide block (19); The upper top plate (14) is fixedly mounted above the upper fan-shaped grinding box (3) through a plurality of bearing rods, the driving motor (15) is mounted on the upper top plate (14), the output end of the driving motor (15) passes downward to the bottom of the upper top plate (14) and is fixedly mounted to one end of the driving rod (16), the other end of the driving rod (16) is rotatably mounted on the grinding base (1), the upper guide block (18) and the lower guide block (19) are respectively fixedly mounted on the upper top plate (14) and the grinding base (1) through two connecting tubes (20), and a guiding cavity is formed between the upper guide block (18) and the lower guide block (19), a portion of the driving rod (16) is sleeved inside the two connecting tubes (20), and the rotating block (17) is fixedly mounted on the driving rod (16) and is located inside the guiding cavity; One group of the material-retrieving components comprises a guide cylinder (21), a guide column (22), a guide spring (23), a guide slide rod (24), a Z-shaped rod (25), a second telescopic rod with a self-locking function (26), and a material-retrieving frame (27); One side of the guide cylinder (21) is fixedly mounted on the rotating block (17); a portion of the guide column (22) is slidably sleeved inside the guide cylinder (21); the guide spring (23) is fixedly mounted between the guide cylinder (21) and the guide column (22) and is located inside the guide cylinder (21); the guide slide bar (24) is fixedly mounted on the guide column (22); both the upper guide block (18) and the lower guide block (19) are provided with plum blossom-shaped guide grooves; both sides of the guide slide bar (24) are partially slidably arranged inside the two guide grooves; one side of the middle portion of the guide slide bar (24) is fixedly mounted between one end of the Z-shaped rod (25); a portion of the Z-shaped rod (25) penetrates to the outside of the guide cavity and is fixedly mounted to one end of the second telescopic rod (26); the other end of the second telescopic rod (26) is detachably fixedly mounted to one side of the material picking frame (27) by a plurality of bolts (4); the material picking frame (27) is adapted to the feeding assembly.

2. The pretreatment equipment for ceramic substrate according to claim 1, characterized in that: The grinding assembly located on the lower fan-shaped grinding box (4) includes a plurality of fan-shaped supporting plates (6), and the plurality of fan-shaped supporting plates (6) are longitudinally slidably arranged inside the lower fan-shaped grinding box (4) and partially located above the lower fan-shaped grinding box (4). A cleaning cotton plate (7) is detachably fixedly installed on the fan-shaped supporting plate (6) on one side of the material discharge groove by means of a plurality of bolts one, and grinding plates (8) of different mesh sizes are detachably fixedly installed on the remaining plurality of fan-shaped supporting plates (6) in turn by means of a plurality of bolts two, and the grinding plate (8) with the largest mesh size is located close to one side of the cleaning cotton plate (7).

3. The pretreatment equipment for ceramic substrate according to claim 2, characterized in that: The adjustment assembly comprises a plurality of adjustment parts, each of which is mounted on the upper fan-shaped grinding box (3) and is respectively connected to a plurality of fan-shaped supporting plates (6), wherein one side of the adjustment part comprises a high-precision electric cylinder (9), the high-precision electric cylinder (9) is mounted on the upper fan-shaped grinding box (3), and an output end of the high-precision electric cylinder (9) passes downward into the interior of the upper fan-shaped grinding box (3) and is fixedly mounted between the fan-shaped supporting plates (6).

4. The pretreatment equipment for ceramic substrate according to claim 2, characterized in that: The detection assembly comprises a plurality of pressure sensors (10), each of which is fixedly mounted on the inner bottom wall of the lower sector-shaped grinding box (4), and detection ends of the plurality of pressure sensors (10) are fixedly mounted in pairs on a plurality of sector-shaped supporting plates (6) located on the lower sector-shaped grinding box (4).

5. The pretreatment equipment for ceramic substrate according to claim 1, characterized in that: The loading assembly comprises a loading rack (11), a telescopic rod (12) with a self-locking function, and a plate carrier tube (13); The loading rack (11) is detachably fixedly mounted on one side of the fan-shaped loading and unloading platform (5) by means of a plurality of bolts; one end of the telescopic rod (12) is fixedly mounted on the loading rack (11); the other end of the telescopic rod (26) is fixedly mounted between one side of the carrier tube (13); and a loading cavity is formed between the bottom end of the carrier tube (13) and the fan-shaped loading and unloading platform (5).

6. The pretreatment equipment for ceramic substrate according to claim 1, characterized in that: The spray mechanism (103) comprises a fan-shaped liquid carrying tank (28), a liquid supply pump (29), a spray pipe (30), a plurality of groups of atomizing nozzles (31) and a plurality of groups of fan-shaped filtrate boxes (32); The fan-shaped liquid carrying tank (28) is fixedly mounted on the grinding base (1); the lower fan-shaped grinding box (4) is partially sealed and sleeved inside the fan-shaped liquid carrying tank (28); and a plurality of water seepage holes are opened at the bottom end of the lower fan-shaped grinding box (4); a plurality of groups of fan-shaped filtrate boxes (32) are partially slidably mounted inside the fan-shaped liquid carrying tank (28), and the other part extends to the outside of the fan-shaped liquid carrying tank (28); the liquid supply pump (29) is mounted on the grinding base (1) and is located on one side of the fan-shaped liquid carrying tank (28); A first liquid outlet pipe is connected between the input end of the liquid supply pump (29) and the fan-shaped liquid carrying tank (28), and the first liquid outlet pipe is arranged below the plurality of groups of the fan-shaped filtrate boxes (32). A second liquid outlet pipe (33) is connected between the output end of the liquid supply pump (29) and the spray pipe (30), and the spray pipe (30) is fixedly mounted on the fan-shaped liquid carrying tank (28) via a plurality of stabilizing rods. The plurality of groups of atomizing nozzles (31) are all connected to the spray pipe (30), and the plurality of groups of atomizing nozzles (31) correspond to the grinding cavities.

7. The pretreatment equipment for ceramic substrate according to claim 1, characterized in that: The grinding base (1) is provided with a storage box (34) for storing the processed ceramic substrate, and the storage box (34) is arranged below the material discharge groove.

8. A method for operating a ceramic substrate pretreatment device, characterized in that: The pretreatment equipment for the ceramic substrate according to any one of claims 1 to 7 comprises the following steps: S1. Before the ceramic substrate is subjected to grinding and polishing pretreatment, the ceramic substrate pretreatment device removes bolts three and four to replace a carrier tube (13) and a material removal frame (27) that are compatible with the ceramic substrate according to the model and shape of the ceramic substrate to be processed, and the ceramic substrate is placed inside the carrier tube (13). At this time, the ceramic substrate located at the bottom layer is located in the loading cavity. At the same time, the high-precision electric cylinder (9) is started. The output end of the high-precision electric cylinder (9) drives the fan-shaped carrier plate (6) connected thereto to move. The fan-shaped carrier plate (6) drives the grinding plate (8) to move. The height of the grinding cavity is adjusted according to the thickness of the ceramic substrate, thereby completing the loading operation of the ceramic substrate. S2. When grinding and polishing the ceramic substrate, the drive motor (15) is started, and the output end of the drive motor (15) drives the drive rod (16) to rotate, the drive rod (16) drives the rotating block (17) to rotate, the rotating block (17) drives the guide cylinder (21) to move, the guide cylinder (21) drives the guide column (22) to move, the guide column (22) drives the guide slide bar (24) to move, the guide spring (23) is always in a squeezed state, and due to the rebound force of the guide spring (23), the guide slide bar (24) is always in contact with the edge of the plum blossom-shaped guide groove, and the movement of the guide column (22) causes the guide slide bar (24) to move along the edge of the guide groove. The edge moves, causing the guide slide bar (24) to move in a curve, and at the same time the guide slide bar (24) drives the Z-shaped rod (25) to move, the Z-shaped rod (25) drives the telescopic rod 2 (26) to move, the telescopic rod 2 (26) drives the material picking frame (27) to move, the material picking frame (27) is arranged in a U shape, and by adjusting the length of the telescopic rod 1 (12) and the telescopic rod 2 (26), when the material picking frame (27) moves through the loading cavity, it will drive the ceramic substrate at the loading cavity to move. It should be noted that the height of the loading cavity is greater than the thickness of the ceramic substrate and less than twice the thickness of the ceramic substrate, and the thickness of the material picking frame (27) is less than the thickness of the ceramic substrate; S3, when the material picking frame (27) drives the ceramic substrate to move, as the driving rod (16) rotates to enter the interior of the grinding cavity, the ceramic substrate first enters the grinding plate (8) with a smaller mesh number, and is coarsely ground on the two grinding plates (8) with a smaller mesh number. During the coarse grinding process, the pressure sensor (10) inside the lower fan-shaped grinding box (4) is used for detection. When the pressure reading of the pressure sensor (10) is stable and the pressure sensor (10) detects the set reading, it means that the upper and lower grinding plates (8) of the ceramic substrate are grinding the upper and lower surfaces of the ceramic substrate. When the reading of the pressure sensor (10) is lower than the set value, the high-precision electric cylinder (9) drives the fan-shaped supporting plate (6) connected thereto to move, squeezes the ceramic substrate, and enables the grinding plate (8) to better grind the ceramic substrate; S4. When the ceramic substrate moves in a curve along with the driving rod (16), the rough grinding of the surface of the ceramic substrate will be transformed into fine grinding as the mesh number of the grinding plate (8) increases. Since the hardness of the ceramic substrate itself is relatively large, in the actual grinding process, the friction speed and friction time between the ceramic substrate and the grinding plate (8) are increased by increasing the curve gap and movement length between the guide slide bar (24) and the guide groove, so that the ground ceramic substrate can meet the use requirements. S5. While the ceramic substrate and the grinding plate (8) are being ground and polished, the liquid supply pump (29) is started. The liquid supply pump (29) pumps the grinding liquid required for grinding inside the fan-shaped liquid carrier box (28) into the inside of the spray pipe (30) through the liquid outlet pipe 1 and the liquid outlet pipe 2 (33). The grinding liquid is then sprayed out through the atomizing nozzle (31) to spray and cool the ceramic substrate inside the grinding cavity. At the same time, the grinding liquid carries impurities ground from the ceramic substrate. The grinding liquid carrying impurities then flows into the inside of the corresponding fan-shaped filtrate box (32). The fan-shaped filtrate box (32) simply filters the grinding liquid to filter out most of the impurities inside the grinding liquid. The filtered grinding liquid passes through the fan-shaped filtrate box (32) and flows back to the bottom of the fan-shaped liquid carrier box (28) to be supplied to the liquid supply pump (29) for use, thereby realizing the recycling of the grinding liquid. S6. After the ceramic substrate is ground and polished by the multi-mesh grinding plate (8), it finally passes to the cleaning cotton plate (7). The cleaning cotton plate (7) cleans and wipes the water stains on the grinding surfaces on both sides of the ceramic substrate, thereby obtaining a clean ceramic substrate with a smooth surface. After the treatment, the ceramic substrate will fall into the storage box inside the feeding groove when passing through the feeding groove, thereby completing the pretreatment operation of the ceramic substrate.

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