Gas purification device, gas purification method and application thereof

Abstract

The present invention discloses a gas purification device, a gas purification method and its application. The device is provided with an adsorption carrier inlet at the top and an adsorption carrier outlet at the bottom, a gas inlet at the side wall, and a purified gas outlet at the side wall opposite to the gas inlet. A first slope is provided on the side wall between the adsorption carrier inlet and the gas inlet, and a second slope is provided on the side wall between the adsorption carrier outlet and the purified gas outlet. A distributor is provided horizontally above the gas inlet and the gas outlet in the cavity of the device. The adsorption carrier fed into the adsorption carrier inlet passes through the distributor and is discharged via the adsorption carrier outlet. Two or more partition plates are provided in the distributor, and the interval between each two adjacent partition plates increases from the gas inlet side to the purified gas outlet side. In this device, the dirt adsorbed on the surface of the adsorption carrier will not be excessive, thus avoiding clogging.

Description

Technical Field

[0001] The present invention relates to the field of coal chemical industry, and in particular to a gas purification device, a gas purification method and applications thereof. Background Art

[0002] In the coal chemical industry, the target material is typically powder, which can easily cause blockage in processing equipment. For gas dust removal, pellet bed dust collectors are often used, utilizing ceramic balls to filter and purify the gas. In pellet bed dust collectors, ceramic balls are used as solid filter media. As the gas passes through the balls, impurities such as tar and ash carried by the gas are adsorbed onto the balls, resulting in a purified gas.

[0003] In a granular bed dust collector, the solid filter media is constantly moving. For example, the ceramic balls continuously move downward, causing the adsorbed tar and ash to move out of the filtration zone and into the regeneration zone for regeneration. Simultaneously, clean ceramic balls move into the filtration zone to adsorb and filter the dust-laden gas. Furthermore, the dust-laden gas flows horizontally through the ceramic ball filtration zone. Therefore, this device is called a cross-flow granular bed dust collector.

[0004] In the cross-flow granular bed dust collector described above, when the ceramic balls in the filter zone absorb excessive amounts of tar and ash, their outer surfaces become dirty and sticky, leading to adhesion between the balls. This is one of the main causes of equipment blockage. To prevent ball blockage, the first step is to minimize the amount of dirt adsorbed on the ball surface, let alone to the point where the balls adhere to each other.

[0005] In summary, the present invention aims to solve the technical problems in the prior art and prevent ceramic balls from sticking and clogging the equipment while removing dust from the gas. Summary of the Invention

[0006] In response to the above-mentioned problems existing in the prior art, the present invention provides a gas purification device, a gas purification method and its application. The gas purification device of the present invention can enable the adsorption carrier to form a continuous flow rate and density gradient inside the device. While ensuring that the dust-laden gas is fully purified, it can avoid adhesion between the adsorption carriers due to excessive adsorption of dirt, which may cause blockage of the equipment.

[0007] A first aspect of the present invention provides a gas purification device, wherein the top of the device is provided with an adsorption carrier inlet, the bottom is provided with an adsorption carrier outlet, the side wall of the device is provided with a gas inlet, and the side wall opposite to the gas inlet is provided with a purified gas outlet, a first slope is provided on the side wall between the adsorption carrier inlet and the gas inlet, and a second slope is provided on the side wall between the adsorption carrier outlet and the purified gas outlet;

[0008] A distributor is horizontally arranged above the gas inlet and the gas outlet in the cavity of the device, and the adsorption carrier fed into the adsorption carrier inlet passes through the distributor and is discharged through the adsorption carrier outlet;

[0009] Two or more partition plates are provided in the distributor, and the interval between every two adjacent partition plates becomes larger from the gas inlet side to the purified gas outlet side.

[0010] The gas purification device provided by the present invention can control the adsorption carrier to form different flow velocities and distribution densities in different areas inside the device. While adsorbing and purifying the gas, it can avoid excessive adsorption of dirt on the surface of the adsorption carrier, which causes adhesion and thus causes blockage of the gas purification device.

[0011] In particular, the present invention utilizes a layout of partitions with increasing spacing to achieve varying spatial density distributions of adsorbents within the device. Specifically, the adsorbent density is lowest near the gas inlet, where the adsorbents fall in a manner similar to free fall. Meanwhile, the adsorbents near the purified gas outlet are densely packed, with a density approaching bulk density, and slowly descend. The transition between these two states of adsorbent density is nearly continuous.

[0012] In the gas purification device provided by the present invention, the adsorption carriers therein form different distribution densities in different areas within the device, with the distribution density of the adsorption carriers gradually increasing from the gas inlet side to the purified gas outlet side. Specifically, in the area above the distributor, the adsorption carriers are in a dense phase accumulation state. In the area below the distributor, due to the action of the distributor, the adsorption carriers move downward from the gas inlet side to the purified gas outlet side, sequentially through dilute phase flow, transition flow, and dense phase flow states. Before the adsorption carrier outlet at the bottom of the device, the adsorption carriers are densely accumulated again, forming an effective gas seal.

[0013] Therefore, in the gas purification device of the present invention, the adsorption carrier that first comes into contact with the dirty gas introduced through the gas inlet falls rapidly in a manner close to free fall, and quickly leaves the filtration area in a dilute phase flow state, so that the amount of dirt adsorbed on the surface of the adsorption carrier in this area will not be excessive. The adsorption carrier in the middle area passes through the filtration area inside the device at a medium speed in a state similar to just being poured out, so that the dirt adsorbed on the outer surface of the adsorption carrier will not be excessive. In the area near the outlet end of the purified gas, the adsorption carrier therein slowly moves downward at a dense phase flow rate, further adsorbing the dirt in the gas, and the amount of dirt adsorbed on the outer surface of the adsorption carrier will not be excessive.

[0014] In the present invention, the distribution density of the adsorption carrier can be varied from low to high within a single device, thereby reducing the pressure loss caused by gas penetrating the adsorption carrier and preventing clogging due to excessive adsorption by the adsorption carrier. Furthermore, the distribution density of the adsorption carrier can be flexibly adjusted as needed, thereby flexibly adapting to different operating conditions and process requirements.

[0015] In different embodiments of the present invention, different numbers of partition plates may be provided in the distributor according to different device scales and processing requirements.

[0016] According to some embodiments of the gas purification device of the present invention, both ends of the partition plate are fixed to the inner wall of the distributor, and the middle portion of the partition plate is raised.

[0017] According to a preferred embodiment of the gas purification device of the present invention, the interval between the partition plates is 10 to 300 mm.

[0018] According to a preferred embodiment of the gas purification device of the present invention, the interval between the partition plates is 20 to 200 mm.

[0019] According to some embodiments of the gas purification device of the present invention, the partition plate is composed of two strips connected by one end thereof, that is, in an inverted "V" shape.

[0020] According to some embodiments of the gas purification device of the present invention, the connection ends of the two strips are connected at a fixed angle or an adjustable angle.

[0021] According to some embodiments of the gas purification device of the present invention, the angle between the two strips of the separator plate is 0 to 90 degrees. For example, the angle between the two strips can be 0°, 5°, 10°, 15°, 20°, 25°, 30°, 35°, 40°, 45°, 50°, 55°, 60°, 65°, 70°, 75°, 80°, 85°, 90°, and any value and combination range therebetween.

[0022] According to a preferred embodiment of the gas purification device of the present invention, the angle between the two strips of the partition plate is 50° to 70°.

[0023] According to some embodiments of the gas purification device of the present invention, the angle-adjustable partition plate is similar to a door hinge. In this structure, the axis for adjusting the partition plate angle extends outside the gas purification device. Once the desired angle is reached, the angle is fixed with a locking nut.

[0024] In various embodiments of the present invention, by controlling the angle between the two strips of the separator, the width of the adsorption carrier passing through can be varied, thereby controlling the spacing between the separators to control the amount of adsorption carrier falling. Furthermore, by varying the width of the strips, the spacing between the separators can be controlled to further control the amount of adsorption carrier falling. Preferably, in various embodiments of the present invention, the width of the strips is 20 to 300 mm, more preferably 30 to 150 mm.

[0025] According to some embodiments of the gas purification device of the present invention, the width of the distributor ranges from 10 to 1000 mm. This corresponds to the total thickness of the adsorption carriers in the gas purification device. In the gas purification device of the present invention, distributors with this width range can fully purify the gas without causing adhesion between the adsorption carriers.

[0026] In some embodiments of the present invention, by setting a distributor, the number of adsorption carriers falling to different areas can be controlled. Combined with the effect of the shape structure of the gas purification device of the present invention on the flow of the adsorption carrier, the transition of the distribution density of the adsorption carrier between different areas inside the device can be made smoother, so that the horizontal distribution of the adsorption carrier from the gas inlet side to the purified gas outlet side presents a continuous transition from sparse to dense, reaching the optimal state.

[0027] According to some embodiments of the gas purification device of the present invention, the upper cavity of the device includes a first guide vane unit, and the lower cavity of the device includes a second guide vane unit, and a gas channel connecting the gas inlet and the purified gas outlet is formed between the first guide vane unit and the second guide vane unit;

[0028] The first guide plate unit includes a plurality of first guide plates arranged vertically, and the vertical distance between the top of the first guide plate and the plane where the adsorption carrier inlet is located decreases from the gas inlet side to the purified gas outlet side;

[0029] The second guide plate unit includes a plurality of second guide plates arranged vertically, and the vertical distance between the bottom of the second guide plate and the plane where the adsorption carrier outlet is located increases from the gas inlet side to the purified gas outlet side.

[0030] In the gas purification device of the present invention, by providing a first guide vane unit and a second guide vane unit, it is possible to ensure that adsorption carriers with different distribution densities will not flow across each other. Moreover, the first guide vane and the second guide vane are disconnected in the entire gas flow channel from the gas inlet to the purified gas outlet, that is, there is no guide vane blocking the gas flow channel, and the blockage of the device due to scaling of the guide vane is avoided. Moreover, since the gas flows from the gas inlet side to the purified gas outlet side, it has a certain driving effect on the adsorption carriers inside the device. Combined with the air sealing effect formed by the accumulation of adsorption carriers in the lower part of the device, the adsorption carriers between the filter areas with different distribution densities will not flow across the guide vanes. The gas can only flow horizontally along the channel disconnected between the first guide vane and the second guide vane to the purified gas outlet, and no cross flow will be formed.

[0031] In different embodiments of the present invention, different numbers of guide vanes may be provided in the first guide vane unit and the second guide vane unit according to the amount of dirt entrained in the gas to be treated, and the filtration area inside the gas purification device may be set to three or more layers of filtration areas with different adsorption carrier distribution densities, and by controlling the flow velocity and thickness of the adsorption carriers in different areas, the purification effect and pressure drop effect of the dust-laden gas to be treated can be optimized and balanced while avoiding adhesion between the adsorption carriers.

[0032] Furthermore, in different embodiments of the present invention, the number of first guide plates and second guide plates is not limited, and the number of first guide plates and second guide plates can be the same or different. In addition, the bottom end of the first guide plate and the top end of the second guide plate can correspond to each other or be staggered.

[0033] According to some embodiments of the gas purification device of the present invention, the first guide vanes are arranged in the distributor, and the interval between every two adjacent first guide vanes increases from the gas inlet side to the purified gas outlet side.

[0034] According to a specific embodiment of the gas purification device of the present invention, the first guide plate is arranged in the distributor, that is, the first guide plate is arranged as the partition plate.

[0035] According to some embodiments of the gas purification device of the present invention, the angle of the first slope with respect to the horizontal direction is 10° to 80°. For example, the angle of the first slope with respect to the horizontal direction can be 10°, 15°, 20°, 25°, 30°, 35°, 40°, 45°, 50°, 55°, 60°, 65°, 70°, 75°, 80°, and any value and combination range therebetween.

[0036] According to a preferred embodiment of the gas purification device of the present invention, the angle between the first slope and the horizontal direction is 50° to 70°.

[0037] According to a specific embodiment of the gas purification device of the present invention, the angle between the first slope and the horizontal direction is equal to or similar to the angle of repose of the adsorption carrier.

[0038] In various embodiments of the present invention, the distributor distributes the adsorption carrier, resulting in a near-free-falling, rather than densely packed, adsorption carrier at the gas inlet. Consequently, there is no need for shutters or other devices at the gas inlet opening, thus preventing accumulation and clogging of the adsorption carrier there.

[0039] According to some embodiments of the gas purification device of the present invention, the angle of the second slope with respect to the horizontal direction is 10° to 80°. For example, the angle of the second slope with respect to the horizontal direction can be 10°, 15°, 20°, 25°, 30°, 35°, 40°, 45°, 50°, 55°, 60°, 65°, 70°, 75°, 80°, and any value and combination range therebetween.

[0040] According to a preferred embodiment of the gas purification device of the present invention, the angle between the second slope and the horizontal direction is preferably 50° to 70°.

[0041] According to a specific embodiment of the gas purification device of the present invention, the angle between the second slope and the horizontal direction is slightly larger than the repose angle of the adsorption carrier.

[0042] According to some embodiments of the gas purification device of the present invention, the vertical distance between every two adjacent first guide vanes is 20 to 500 mm, preferably 40 to 200 mm.

[0043] According to some embodiments of the gas purification device of the present invention, the vertical distance between every two adjacent second guide vanes is 20 to 500 mm, preferably 40 to 200 mm.

[0044] In the present invention, by discontinuing the first and second guide plates, a gas flow channel is formed within the cavity between the gas inlet and the purified gas outlet, ensuring smooth passage of gas after passing through the adsorption carrier. In some embodiments of the present invention, the area of the gas flow channel is equal to or slightly larger than the flow area of the gas conduit between the gas inlet and the purified gas outlet.

[0045] According to some embodiments of the gas purification device of the present invention, the adsorption carrier is a porcelain ball having a particle size of 1 to 20 mm. For example, the particle size of the porcelain ball can be 1 mm, 2 mm, 3 mm, 4 mm, 5 mm, 6 mm, 7 mm, 8 mm, 9 mm, 10 mm, 11 mm, 12 mm, 13 mm, 14 mm, 15 mm, 16 mm, 17 mm, 18 mm, 19 mm, 20 mm, and any value and combination range therebetween.

[0046] According to a preferred embodiment of the gas purification device of the present invention, the particle size of the porcelain balls is 2 to 8 mm.

[0047] According to some embodiments of the gas purification device of the present invention, the total thickness of the adsorption carriers inside the device is 10 to 1000 mm. In the gas purification device of the present invention, adsorption carriers within this thickness range can fully purify the gas without causing adhesion between the adsorption carriers.

[0048] According to some embodiments of the gas purification device according to the present invention, a baffle is provided at the lower part of the second guide vane, a slide is provided on the second guide vane, the baffle is located on the slide and moves up and down on the second guide vane, a rotating shaft is provided on the baffle, and the other end of the rotating shaft is located outside the purification device.

[0049] In various embodiments of the present invention, a baffle disposed below the second guide plate can regulate the falling velocity of the adsorbent carrier in the area where it is located, forming a dense accumulation zone at the bottom of the device, blocking gas flow and preventing gas short-circuiting. Furthermore, the baffle can be moved up and down on the second guide plate via a slide. Adjusting the flow gap below the baffle can control the amount of adsorbent carrier falling in the lower filtration area. Movement of the baffle can be achieved by adjusting a rotating shaft located outside the purification device.

[0050] According to some embodiments of the gas purification device according to the present invention, a rotating plate is provided on the second guide vane, the rotating plate is located on the upper part of the baffle, one end of the rotating plate is fixed on the second guide vane and rotates with the second guide vane as the rotating axis.

[0051] According to some embodiments of the gas purification device of the present invention, the rotation angle of the rotating plate is 0 to 90°. For example, the rotation angle of the rotating plate can be 0°, 5°, 10°, 15°, 20°, 25°, 30°, 35°, 40°, 45°, 50°, 55°, 60°, 65°, 70°, 75°, 80°, 85°, 90°, and any value and combination range therebetween.

[0052] According to a preferred embodiment of the gas purification device of the present invention, the rotation angle of the rotating plate is 50° to 70°.

[0053] According to a specific embodiment of the gas purification device of the present invention, the rotation angle of the rotating plate is the same as the horizontal angle of the second slope.

[0054] In different embodiments of the present invention, a rotating plate is provided in the gas purification device of the present invention, and a funnel-like shape can be formed at the lower part of the second guide plate through the rotation of the rotating plate, so that the adsorption carrier near the purified gas outlet side can fall evenly as a whole, avoiding the formation of a dead zone on the adsorption carrier near the gas outlet side. If it does not flow for a long time, it will cause excessive adsorption of dirt on the surface of the adsorption carrier, blocking the flow channel of the adsorption carrier and the purified gas outlet.

[0055] Furthermore, in the filtration area near the purified gas outlet, the adsorption carrier slowly moves downward at a dense phase flow rate and accumulates at a natural accumulation angle. In some embodiments of the present invention, the purified gas outlet is positioned above the accumulation line of the adsorption carrier, allowing the purified gas to exit the device smoothly. Therefore, there is no need for devices such as shutters at the purified gas outlet.

[0056] According to some embodiments of the gas purification device of the present invention, a third slope is provided on the side wall between the gas inlet and the adsorption carrier outlet, and the third slope is close to the gas inlet.

[0057] According to some embodiments of the gas purification device of the present invention, the angle of the third slope with respect to the horizontal direction is 30° to 80°. For example, the angle of the third slope with respect to the horizontal direction can be 30°, 35°, 40°, 45°, 50°, 55°, 60°, 65°, 70°, 75°, 80°, and any value and combination range therebetween.

[0058] According to a preferred embodiment of the gas purification device of the present invention, the angle between the third slope and the horizontal direction is 50° to 70°.

[0059] In different embodiments of the present invention, by providing a third slope between the gas inlet and the adsorption carrier outlet, the adsorption carrier can be effectively prevented from directly falling into the gas pipeline.

[0060] According to a specific embodiment of the gas purification device described herein, five first guide vanes are vertically arranged within the upper cavity, dividing the filter area of the upper cavity into three filter zones. Five second guide vanes are vertically arranged within the lower cavity, dividing the filter area of the lower cavity into three filter zones. Multiple dividers are installed within the distributor, each forming an inverted V-shape. The dividers are fixedly connected at an angle, with the acute angle of the inverted V-shape measuring 55°. The gas inlet is located on the left sidewall of the device, and the purified gas outlet is located on the right sidewall. Ceramic balls serve as adsorption carriers to absorb contaminants such as tar and ash from the gas. The spatial distribution density of the ceramic balls increases from left to right, sequentially from the dilute phase flow filter zone to the transitional flow filter zone, and finally to the dense phase flow filter zone. The spatial distribution density of the ceramic balls is highest within the dense phase flow filter zone, approaching their bulk density.

[0061] In this specific embodiment, the bottoms of the two rightmost second guide vanes are independently provided with a first baffle and a second baffle. The first and second baffles are capable of regulating the falling speed of the ceramic balls within the filter area separated by the two rightmost second guide vanes. Simultaneously, a densely packed area is formed at the bottom of the gas purification device, acting as a gas seal to block gas and prevent gas from short-circuiting between different filter areas. Furthermore, the first and second baffles can be moved up and down on the second guide vanes via a slide, and the flow gap below the baffles is adjusted to control the amount of ceramic balls falling into the filter area at the bottom of the device.

[0062] Furthermore, by installing a rotating plate below the second guide vane in the right-hand ceramic ball dense-phase flow filtration zone and rotating it in conjunction with a rotating shaft located outside the device, a symmetrical, funnel-shaped discharge port is formed between the rotating plate and the second guide vane. This controls the uniform downward flow of densely packed ceramic balls and avoids the formation of a dead zone on the far right side of the device. The rotating angle of the rotating plate is adjusted by a rotating shaft located outside the device and fixed with a locking nut.

[0063] In the above-described embodiment, the porcelain balls in the dilute-phase flow filtration zone are the first to come into contact with the polluted gas to be treated. The balls are sparsely distributed, resulting in low flow resistance. They fall rapidly, in a near-free-fall motion, and quickly pass through the filtration zone, preventing excessive surface adsorption of pollutants. The porcelain balls in the transitional flow filtration zone, controlled by a distributor, move through the filtration zone at a moderate speed, similar to a freshly poured state, preventing excessive surface adsorption of pollutants. The porcelain balls in the dense-phase flow filtration zone, controlled by the first and second baffles, slowly descend in a dense phase, further absorbing pollutants from the gas without excessive surface adsorption. By controlling the flow rate and distribution density of the porcelain balls in these three different filtration zones, and by calculating the thickness of the filtration zones within these three zones, and by combining these three zones, the above-described configuration maximizes pollutant adsorption while ensuring that all balls do not absorb excessive pollutants and that the balls do not adhere to each other, thereby preventing clogging and minimizing pressure drop at the gas inlet and purified gas outlet.

[0064] The gas purification device provided by the present invention controls the distribution density and flow velocity of the adsorption carrier in different filtration areas so that impurities such as tar and ash adsorbed on the surface of the adsorption carrier will not cause the adsorption carriers to adhere to each other, thereby avoiding the occurrence of blockage conditions.

[0065] The second aspect of the present invention provides a gas purification method according to the above-mentioned gas purification device, wherein the gas purification method includes: gas is input into the gas purification device through the gas inlet, an adsorption carrier is sent into the gas purification device through the adsorption carrier inlet, the adsorption carrier contacts the gas and adsorbs and purifies the gas, and the obtained purified gas is discharged through the purified gas outlet, and the adsorption carrier is discharged through the adsorption carrier outlet, wherein the spatial distribution density of the adsorption carrier increases successively from the gas inlet side to the purified gas outlet side.

[0066] A third aspect of the present invention provides an application of the aforementioned gas purification device or method in gas dust removal. Preferably, the application is in a gas dust removal process in the coal chemical industry, but is not limited thereto.

[0067] Beneficial effects of the present invention:

[0068] The gas purification device provided by the present invention controls the distribution density and flow velocity of the adsorption carrier in different filtration areas so that impurities such as tar and ash adsorbed on the surface of the adsorption carrier will not be excessive, thereby avoiding the adsorption carriers from adhering to each other and thus avoiding the occurrence of blockage conditions. BRIEF DESCRIPTION OF THE DRAWINGS

[0069] Figure 1 This is a schematic structural diagram of the variable flow rate cross-flow granular bed gas purification device provided in Example 1 of the present invention.

[0070] Figure 2 This is a top view of the distributor provided in Example 1 of the present invention.

[0071] Figure 3 This is a side sectional view of the distributor provided in Example 1 of the present invention.

[0072] Figure 4 This is a schematic structural diagram of the first baffle provided in Example 1 of the present invention.

[0073] Description of Reference Numerals

[0074] 110, gas inlet; 120, purified gas outlet; 130, adsorption carrier inlet; 140, adsorption carrier outlet;

[0075] 210, first slope; 220, second slope; 230, third slope;

[0076] 310, first guide vane; 320, second guide vane;

[0077] 400, distributor; 410, partition plate;

[0078] 510, first baffle; 520, second baffle; 530, slideway; 540, shaft seal; 550, rotating shaft; 560, handle;

[0079] 600. Transfer to another board. DETAILED DESCRIPTION

[0080] In order to make the present invention easier to understand, the present invention will be described in detail below with reference to embodiments and drawings. These embodiments are only for illustration and do not limit the application scope of the present invention.

[0081] The test method used in the embodiment of the present invention is as follows:

[0082] The method for testing the amount of dirt adsorbed on a porcelain ball surface is as follows: a certain number of porcelain balls after adsorption are taken and their total weight is weighed. The balls are then subjected to high-temperature calcination to completely burn the combustible components in the dirt. The ash adhering to the surface of the balls is then removed by vibration. The weight of the regenerated balls is then calculated. The difference between the two weights is the weight of the adsorbed dirt. The average adsorption capacity per ball is then calculated by dividing the dirt weight by the number of balls.

[0083] [Example 1]

[0084] like Figure 1As shown, the gas purification device in this embodiment is a variable flow rate cross-flow granular bed gas purification device. The device is provided with an adsorption carrier inlet 130 at the top and an adsorption carrier outlet 140 at the bottom. A gas inlet 110 is provided on the left sidewall, and a purified gas outlet 120 is provided on the right sidewall. A first slope 210 with an angle of 55° to the horizontal direction is provided on the sidewall between the adsorption carrier inlet 130 and the gas inlet 110. The first slope 210 is connected to the adsorption carrier inlet 130. A second slope 220 with an angle of 55° to the horizontal direction is provided on the sidewall between the adsorption carrier outlet 140 and the purified gas outlet 120. The second slope 220 is connected to the adsorption carrier outlet 140. A third slope 230 with an angle of 55° to the horizontal direction is provided on the sidewall between the gas inlet 110 and the adsorption carrier outlet 140. The third slope 230 is close to the gas inlet 110.

[0085] Five first guide vanes 310 are vertically arranged in the upper cavity of the device of this embodiment, and five second guide vanes 320 are arranged in the lower cavity. From left to right, the vertical distance between the top of the first guide vanes 310 and the plane where the adsorption carrier inlet 130 is located gradually decreases, while the vertical distance between the bottom of the second guide vanes 320 and the plane where the adsorption carrier outlet 140 is located gradually increases. In other words, the first guide vanes 310 form a slope between them, and the second guide vanes 320 also form a slope between them, and this slope has the same inclination as the first slope 210 and the second slope 220.

[0086] The device of this embodiment has a distributor 400 disposed horizontally inside, and the distributor 400 is close to the top end of the first guide plate 310. Figure 2 and Figure 3 As shown, a plurality of partition plates 410 are provided inside the distributor 400. The plurality of partition plates 410 are all in an inverted "V" shape inside the distributor. In this embodiment, the partition plates 410 are angle-fixed connection structures, and the angle at the acute angle of the inverted "V" shape is 55°. The intervals between the plurality of partition plates 410 gradually increase from left to right, and the interval values are 30, 40, 55, 78, 113, and 166, respectively. In different embodiments, the unit of the interval value is not limited, but it is necessary to ensure that each interval value uses the same unit, for example, it can be millimeter (mm) or centimeter (cm).

[0087] The lower parts of the two second guide plates 320 close to the rightmost side are provided with a first baffle 510 and a second baffle 520 respectively. Figure 4As shown, taking the first baffle 510 as an example, slideways 530 are provided on both sides of the second guide plate 320, and the first baffle 510 is located between the slideways 530. The rotating shaft 550 is controlled by a handle 560 located outside the device and the first baffle 510 is further controlled, so that the first baffle 510 moves up and down on the second guide plate 320 and is fixed by a shaft seal 540.

[0088] A rotating plate 600 is provided at the lower portion of the second guide plate 320 on the far right side. One end of the rotating plate 600 is fixed to the second guide plate 320 , and the other end of the rotating plate 600 rotates around the second guide plate 320 as a rotation axis.

[0089] The interior of the device provided in this embodiment is divided into a dilute phase flow filtration zone, a transition flow filtration zone, and a dense phase flow filtration zone from left to right. In these three filtration zones, the average flow velocities of the porcelain balls are 5 m / s, 0.21 m / s, and 0.03 m / s, respectively, and the average distribution density of the porcelain balls is 580 kg / m 3 , 980kg / m 3 、1210kg / m 3 .

[0090] In the area close to the dense phase flow filtration zone, the ceramic balls slowly move downward at the dense phase flow rate and are stacked according to the natural stacking angle. In addition, the position of the purified gas outlet 120 is set above the stacking line of the ceramic balls so that the purified gas can be discharged smoothly from the device.

[0091] [Example 2]

[0092] use Figure 1 The variable flow rate cross-flow particle bed gas purification device purifies and adsorbs the dust-containing pyrolysis gas in the coal pyrolysis process.

[0093] In the experimental simulation of the pyrolyzer under the pressure of 6kPa, the dust content of the dust-laden pyrolysis gas before purification is 4.5kg / m 3 The ball circulation flow rate is 860kg / h, and the dust content of the dedusted pyrolysis gas is 0.17kg / m 3 The average amount of dirt adsorbed on a single ball was 1.4 mg, and the dirt was evenly distributed across the balls. Experiments showed that the balls did not adhere to each other at all. The experimental device operated continuously for 72 hours without clogging, and achieved a dust removal efficiency of 96%.

[0094] The above description is only a preferred embodiment of the present invention. It should be noted that for those skilled in the art, under the technical enlightenment provided by the present invention, as common knowledge in the art, other equivalent variations and improvements can be made, which should also be considered as the scope of protection of the present invention.

Claims

1. A gas purification device, comprising: an adsorption carrier inlet at the top of the device, an adsorption carrier outlet at the bottom of the device, a gas inlet at a side wall of the device, and a purified gas outlet at a side wall opposite to the gas inlet; a first slope at the side wall between the adsorption carrier inlet and the gas inlet, and a second slope at the side wall between the adsorption carrier outlet and the purified gas outlet; A distributor is horizontally arranged above the gas inlet and the gas outlet in the cavity of the device, and the adsorption carrier fed into the adsorption carrier inlet passes through the distributor and is discharged through the adsorption carrier outlet; The distributor is provided with two or more partition plates, and the interval between each two adjacent partition plates becomes larger from the gas inlet side to the purified gas outlet side; The upper cavity of the device includes a first guide vane unit, and the lower cavity of the device includes a second guide vane unit. A gas channel connecting the gas inlet and the purified gas outlet is formed between the first guide vane unit and the second guide vane unit. The first guide plate unit includes a plurality of first guide plates arranged vertically, and the vertical distance between the top of the first guide plate and the plane where the adsorption carrier inlet is located decreases from the gas inlet side to the purified gas outlet side; The second guide plate unit includes a plurality of second guide plates arranged vertically, and the vertical distance between the bottom of the second guide plate and the plane where the adsorption carrier outlet is located increases from the gas inlet side to the purified gas outlet side.

2. The gas purification device according to claim 1, characterized in that: Both ends of the partition plate are fixed on the inner wall of the distributor, and the middle part of the partition plate is raised.

3. The gas purification device according to claim 2, characterized in that: The interval between the partition plates is 10 to 300 mm.

4. The gas purification device according to claim 3, characterized in that: The interval between the partition plates is 20 to 200 mm.

5. The gas purification device according to any one of claims 1 to 4, characterized in that: The partition plate is composed of two strips connected by one end thereof.

6. The gas purification device according to claim 5, characterized in that: The connection ends of the two strips are connected at fixed angles or at adjustable angles.

7. The gas purification device according to claim 6, characterized in that: The angle between the two strips of the partition plate is 0-90°.

8. The gas purification device according to claim 7, characterized in that: The angle between the two strips of the partition plate is 50° to 70°.

9. The gas purification device according to any one of claims 1 to 4, characterized in that: The first guide vanes are arranged in the distributor, and the interval between every two adjacent first guide vanes increases from the gas inlet side to the purified gas outlet side.

10. The gas purification device according to any one of claims 1 to 4, characterized in that: The angle between the first slope and the horizontal direction is 10° to 80°; and / or, The angle between the second slope and the horizontal direction is 10° to 80°; and / or, The vertical distance between every two adjacent first guide plates is 20 to 500 mm; and / or, The vertical distance between each two adjacent second guide plates is 20 to 500 mm; and / or, The adsorption carrier is a porcelain ball, and the particle size of the porcelain ball is 1 to 20 mm.

11. The gas purification device according to claim 10, characterized in that: The angle between the first slope and the horizontal direction is 50° to 70°; and / or, The angle between the second slope and the horizontal direction is 50° to 70°; and / or, The vertical distance between every two adjacent first guide plates is 40 to 200 mm; and / or, The vertical distance between each two adjacent second guide plates is 40 to 200 mm; and / or, The adsorption carrier is a porcelain ball, and the particle size of the porcelain ball is 2 to 8 mm.

12. The gas purification device according to any one of claims 1 to 4, characterized in that: A baffle is provided at the lower portion of the second guide plate, a slide is provided on the second guide plate, the baffle is located on the slide and moves up and down on the second guide plate, a rotating shaft is provided on the baffle, and the other end of the rotating shaft is located outside the purification device; and / or, The second guide plate is provided with a rotating plate, which is located at the upper part of the baffle. One end of the rotating plate is fixed on the second guide plate and rotates around the second guide plate as a rotating axis. The rotation angle of the rotating plate is 0 to 90 degrees.

13. The gas purification device according to claim 12, characterized in that: The rotation angle of the rotating plate is 50° to 70°.

14. The gas purification device according to any one of claims 1 to 4, characterized in that: A third slope is provided on the side wall between the gas inlet and the adsorption carrier outlet, and the third slope is close to the gas inlet.

15. The gas purification device according to claim 14, characterized in that: The angle between the third slope and the horizontal direction is 30° to 80°.

16. The gas purification device according to claim 15, characterized in that: The angle between the third slope and the horizontal direction is 50° to 70°.

17. A gas purification method according to the gas purification device according to any one of claims 1 to 16, characterized in that: The gas purification method includes: gas is input into the gas purification device through the gas inlet, an adsorption carrier is sent into the gas purification device through the adsorption carrier inlet, the adsorption carrier contacts the gas and adsorbs and purifies the gas, the obtained purified gas is discharged through the purified gas outlet, and the adsorption carrier is discharged through the adsorption carrier outlet, wherein the spatial distribution density of the adsorption carrier increases successively from the gas inlet side to the purified gas outlet side.

18. Use of the gas purification device according to any one of claims 1 to 16 or the gas purification method according to claim 17 in gas dust removal.

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