Lighting uniformity compensation device and method

Abstract

The application belongs to the technical field of photoetching equipment, and discloses an illumination uniformity compensation device and method, wherein the illumination uniformity compensation device comprises: a plurality of compensation plates arranged in sequence along the optical axis direction of an illumination field, and each compensation plate extends along the length direction of the illumination field and is provided with a plurality of compensation steps which are spaced apart from each other and have different heights along the extending direction; and the compensation steps on each compensation plate enter and exit the illumination field along the length direction of the illumination field to shield part of the illumination light. The compensation steps entering the illumination field as a compensation area can shield part of the illumination light, the compensation steps with different heights can realize compensation of different illuminations, and the plurality of compensation plates extend along the length direction of the illumination field and move, so that the compensation steps with different heights are moved to target areas, and uniformity compensation is realized. The device improves the assembly and adjustment efficiency and reduces the control difficulty.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of lithography equipment, and in particular to an illumination uniformity compensation device and method. BACKGROUND

[0002] A projection lithography machine is a device that transfers a mask surface pattern to a substrate surface / silicon surface to form a required pattern, and then integrates a required panel / integrated circuit (IC). The exposure system in the projection lithography machine mainly undertakes the tasks of accurate projection and exposure of a mask pattern. The illumination system provides a uniform illumination spot for the mask surface of the lithography machine, is the energy source of the projection lithography machine, and the uniformity of the illumination spot energy and the illumination of the mask surface are important indicators of the illumination system. The size of the illumination spot energy determines the yield of the lithography machine, and the uniformity of the illumination determines the relative difference in the directional length of the exposure line of the projection lithography machine during exposure, which indirectly affects the resolution of the projection lithography machine. For a scanning optical exposure system with a large illumination field of view, the exposure illumination field of view is mostly a long rectangular structure with a large aspect ratio. Because of the asymmetry of the size of the exposure illumination field of view, the uniformity of the illumination is generally lower than that of the illumination field of view with a symmetric structure.

[0003] The projection lithography machine has a very high requirement for the uniformity of the exposure illumination field of view. In order to compensate for the uniformity of the exposure illumination field of view throughout the life cycle of the projection lithography machine, the existing compensation methods are usually very costly and have low reliability.

[0004] In the prior art, in order to improve the illumination uniformity of the lithography machine, the following two methods are usually used for illumination uniformity compensation: the first illumination uniformity compensation scheme is to plate chromium on the compensation plate to adjust the energy distribution of the substrate surface. However, considering that the optical lenses in the illumination system of the lithography machine have continuous transmittance decay during long-term use, the life cycle of this compensation scheme is too short compared to the overall life cycle of the illumination system, and the compensation plate needs to be replaced constantly, which has high manufacturing cost; the second illumination uniformity compensation scheme is to use a large number of baffles to obtain different light path removal amounts to achieve illumination uniformity compensation. However, a movable mechanism needs to be designed for each baffle, and the movement range and control precision of the movable mechanism directly determine the range and precision of the uniformity compensation, which greatly increases the cost, design difficulty and reliability risk. SUMMARY

[0005] The purpose of the present application is to provide an illumination uniformity compensation device and method to solve the problem that the compensation device structure is complex and the compensation precision and control difficulty cannot be balanced.

[0006] To achieve this purpose, the present application adopts the following technical scheme:

[0007] In a first aspect, the application discloses a lighting uniformity compensation device, which comprises a plurality of compensation plates arranged along the optical axis direction of a lighting field in sequence, wherein each compensation plate extends along the length direction of the lighting field and is provided with a plurality of compensation steps which are spaced apart from each other and have different heights.

[0008] The compensation steps on each compensation plate enter and exit the lighting field along the length direction of the lighting field to shield part of the lighting light.

[0009] The compensation steps entering the lighting field can shield part of the lighting light as compensation areas, the compensation steps with different heights can compensate for different illuminances, and the plurality of compensation plates extend along the length direction of the lighting field and move, so that the compensation steps with different heights are moved to target areas to realize uniformity compensation, the device improves the adjustment efficiency and reduces the control difficulty.

[0010] As a preferred scheme of the lighting uniformity compensation device, the distance between any two adjacent compensation steps in each compensation plate is the same and equal to the length of the lighting field.

[0011] Each compensation plate has only one compensation step in the lighting field, the compensation plate is controlled to move along the length direction of the lighting field to switch the compensation area, and the design is easy to accurately control the switching of the compensation area.

[0012] As a preferred scheme of the lighting uniformity compensation device, the product of the total number of the compensation plates and the length of a single compensation step is equal to the length of the lighting field.

[0013] Each compensation plate has only one compensation step in the lighting field, the compensation steps of all the compensation plates are connected in series along the length direction to seamlessly cover the entire lighting field, all the compensation plates are fully utilized, the minimum length unit of the lighting compensation area corresponds to the length of the compensation step, and the switching of the compensation steps is more easy to accurately control.

[0014] As a preferred scheme of the lighting uniformity compensation device, the compensation steps on any one compensation plate are arranged in an equal-difference height mode.

[0015] The compensation steps on the compensation plate are arranged in an equal-difference height mode, the height difference between any two adjacent compensation steps is the same, and the height of the compensation steps changes by a preset height difference when the compensation plate moves by a length of the lighting field, so that the switching of the compensation steps is more easy to accurately control.

[0016] As a preferred scheme of the lighting uniformity compensation device, any one compensation step comprises a plurality of sub-steps, and the lengths of the sub-steps are the same and the heights of the sub-steps are different.

[0017] The same compensation step is provided with multiple sub-steps with different heights, which further increases the number of compensation areas, improves the compensation accuracy, and increases the number of compensation areas without increasing the number of compensation plates, without increasing the cost and control difficulty.

[0018] As a preferred solution of the above-mentioned illumination uniformity compensation device, the sub-steps on any one of the compensation steps are arranged in an arithmetic progression or a geometric progression.

[0019] The sub-steps on the same compensation step are arranged in an arithmetic progression or a geometric progression, the length of a single sub-step is moved to finely adjust the height of the compensation area, and the tolerance or the geometric progression of the height change corresponds to the compensation accuracy in the same compensation area. The smaller the tolerance value or the geometric progression coefficient value is, the greater the compensation accuracy is.

[0020] As a preferred solution of the above-mentioned illumination uniformity compensation device, the device further comprises:

[0021] A driving mechanism, which is connected to the compensation plate one by one and is used to drive the connected compensation plate to move along the length direction of the illumination field of view.

[0022] The driving mechanism is connected to the compensation plate one by one, and each compensation plate is driven by a separate driving mechanism to realize the separate control of each compensation plate in the illumination field of view.

[0023] As a preferred solution of the above-mentioned illumination uniformity compensation device, the compensation plate is provided in a rollable structure.

[0024] The driving mechanism comprises:

[0025] A first storage box is arranged on one side of the length direction of the illumination field of view, and a first end of the compensation plate is wound and stored in the first storage box; and

[0026] A second storage box is arranged on the other side of the length direction of the illumination field of view, and a second end of the compensation plate is wound and stored in the second storage box, and the second storage box drives the compensation plate together with the first storage box.

[0027] The first storage box and the second storage box are arranged outside the illumination field of view and do not interfere with the illumination field of view. One end of the compensation plate is wound by the first storage box, and the other end of the compensation plate is wound by the second storage box. The first storage box and the second storage box jointly drive the compensation plate to move.

[0028] As a preferred solution of the above-mentioned illumination uniformity compensation device, the first storage box and the second storage box each comprise:

[0029] A box body, a surface of the box body is provided with an opening for the compensation version to enter and exit, an inside of the box body is provided with a receiving cavity, an inside of the receiving cavity is provided with a rotating shaft, the rotating shaft is fixedly connected with an end portion of the compensation version, and

[0030] A power part, a movable end of the power part drives the rotating shaft to rotate.

[0031] The power part drives the rotating shaft to rotate, and then the compensation version enters the opening and is wound on the rotating shaft or the compensation version is driven to extend out of the opening.

[0032] In a second aspect, a lighting uniformity compensation method is provided, which utilizes the lighting uniformity compensation device, and the method comprises the following steps:

[0033] Obtaining illumination data in a lighting field of view;

[0034] Fitting an integral uniformity curve in the lighting field of view according to the illumination data;

[0035] Dividing the integral uniformity curve into a plurality of intervals;

[0036] According to the illumination and target illumination in each interval, determining the compensation step required by each interval;

[0037] Moving the corresponding compensation version to make the compensation step enter the lighting field of view corresponding to the interval;

[0038] Completing the lighting uniformity compensation.

[0039] The method is based on the lighting uniformity compensation device, the integral uniformity curve in the lighting field of view is fitted by fitting the illumination data, the integral uniformity curve is divided into a plurality of intervals, the compensation step required in each interval is determined, and then the corresponding compensation step is moved horizontally to the position of the lighting field of view corresponding to the interval, so that the lighting uniformity compensation is realized, the installation and adjustment efficiency is improved, and the control difficulty is reduced.

[0040] The beneficial effects of the present application are as follows:

[0041] For the lighting uniformity compensation device, the compensation step entering the lighting field of view as a compensation area can shield part of the lighting light, the compensation steps of different heights can realize compensation of different illuminations, the plurality of compensation versions extend along the length direction of the lighting field of view and move, so that after the compensation steps of different heights are moved to the target area, the uniformity compensation is realized, the installation and adjustment efficiency is improved, and the control difficulty is reduced.

[0042] For the illumination uniformity compensation method, the method is based on the illumination uniformity compensation device, the integral uniformity curve in the illumination field of view is fitted through the illumination data, the integral uniformity curve is partitioned, and the required compensation steps in each interval are determined, then the corresponding compensation steps are moved to the illumination field of view position of the interval, so as to realize the illumination uniformity compensation, improve the adjustment efficiency, and reduce the control difficulty. BRIEF DESCRIPTION OF DRAWINGS

[0043] Figure 1 is a structural schematic diagram of the prior art photolithography projection exposure optical system provided by the embodiment one of the present application;

[0044] Figure 2 is a structural schematic diagram of the photolithography projection exposure optical system provided by the embodiment one of the present application, in which the illumination uniformity compensation device is arranged in Figure 1

[0045] Figure 3 is an axial view of the illumination uniformity compensation device in Figure 2 along the X-axis direction;

[0046] Figure 4 is a structural schematic diagram of the compensation plate in the illumination uniformity compensation device provided by the embodiment one of the present application;

[0047] Figure 5 is an enlarged view of the compensation steps in the A ring in Figure 4

[0048] Figure 6 is a structural schematic diagram of the driving mechanism in the illumination uniformity compensation device provided by the embodiment one of the present application;

[0049] Figure 7 is a schematic diagram of the integral uniformity curve one obtained by the step S200 of the illumination uniformity compensation method provided by the embodiment two of the present application;

[0050] Figure 8 is a schematic diagram of the integral uniformity curve two obtained by the step S600 of the illumination uniformity compensation method provided by the embodiment two of the present application. DETAILED DESCRIPTION

[0051] The present application will be further described below in conjunction with the drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the present application, but not to limit the present application. In addition, it should be noted that, for the convenience of description, only the parts related to the present application are shown in the drawings, but not all the structures.

[0052] ​​In the description of the present application, unless specifically defined and limited otherwise, the terms "connected", "connected", "fixed" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the internal communication of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0053] In the present application, unless otherwise specifically defined and limited, "on" or "under" of the first feature to the second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, the first feature "on", "above" and "above" the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The first feature "below", "below" and "below" the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0054] In the description of the present embodiment, the terms "up", "down", "right", and other orientation or position relationships are based on the orientation or position relationship shown in the drawings, and are only for the convenience of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first", "second" are only used to distinguish in the description, and have no special meaning.

[0055] Embodiment one:

[0056] The present embodiment provides a lighting uniformity compensation device, Figure 1The prior art photolithography projection exposure optical system includes a system light source 101, an illumination system 102, a mask 104, a projection objective 105 and a silicon wafer 106. The laser emitted by the system light source 101 is incident into the illumination system 102, which includes beam expanding, collimation, beam stabilization, illumination mode conversion, illumination field formation, knife edge, illumination objective and the like components, which respectively produce the effects of collimating and expanding the incident light, stabilizing, forming a specific pupil, forming a specific illumination field and uniformly illuminating the light, so that the incident light after the illumination system 102 obtains a specific illumination field shape and a specific out-pupil shape on the mask 104. The outgoing light of the mask 104 after being illuminated by the illumination system 102 is projected and imaged onto the silicon wafer 106 by the projection objective 105, and a clear image of the mask 104 is obtained on the silicon wafer 106, so that the photoresist on the silicon wafer 106 can be exposed. The above process completes the exposure process of photolithography, that is, the pattern on the mask 104 is projected and transferred to the silicon wafer 106.

[0057] The illumination field of the photolithography projection exposure system requires high uniformity, and any non-uniform illumination of the mask 104 will be projected onto the silicon wafer 106 through the projection objective 105, causing the actual pattern to deviate from the ideal pattern. In the actual photolithography manufacturing process, the manufacturing errors of the components of the illumination system 102 and the wear of the components during use will introduce non-uniformity to the outgoing light of the illumination system 102 incident on the mask 104. As the feature size of photolithography continues to decrease, the illumination uniformity of the outgoing light of the illumination system 102 is increasingly high, and it is increasingly difficult for only the components in the illumination system 102 to achieve the required illumination uniformity. By using a uniformity compensation device between the illumination system 102 and the mask 104, the energy distribution of the outgoing light of the illumination system 102 can be adjusted, so that the illumination light incident on the mask 104 is more uniform, thereby achieving the purpose of compensating for the pattern uniformity on the silicon wafer 106.

[0058] Figure 2 The illumination uniformity compensation device of the embodiment of the present application is arranged in front of the illumination system 102 of the photolithography projection exposure optical system shown in FIG. 1. Figure 1 As shown in FIG. 2, the illumination uniformity compensation device is arranged in front of the illumination system 102 of the photolithography projection exposure optical system shown in FIG. 1. Figure 2 As shown in FIG. 2, the illumination uniformity compensation device is arranged in front of the illumination system 102 of the photolithography projection exposure optical system shown in FIG. 1.

[0059] The illumination uniformity compensation device includes four compensation masks 100 arranged in sequence along the optical axis direction (X-axis direction) of the illumination field, and each compensation mask 100 extends along the length direction (Y-axis direction) of the illumination field. It can be understood that the four compensation masks 100 can be spaced apart from each other or closely arranged. The compensation mask 100 is a long strip-shaped thin plate structure, and the thickness of the thin plate can be set to millimeter or micrometer level.

[0060] Figure 3 is Figure 2 The four compensation plates 100 are provided with a plurality of compensation steps 1 which are spaced apart and have different heights. The compensation steps 1 shield part of the illumination light as compensation areas. The four compensation plates 100 move in and out of the illumination field of view along the Y-axis direction so that the respective compensation steps 1 shield part of the illumination light. Since the compensation steps 1 have different heights and thus different shielding amounts, moving the four compensation plates 100 along the Y-axis direction causes the compensation steps 1 on the respective compensation plates 100 to be placed at different positions, thereby collectively adjusting the illumination light energy distribution in the illumination field of view and achieving compensation of the illumination uniformity.

[0061] Figure 4 is a structural schematic view of one of the compensation plates 100. The compensation plate 100 is provided with n compensation steps 1. The spacing L between any two adjacent compensation steps 1 is the same. The spacing L is the distance between the same side ends of the two adjacent compensation steps 1, and the spacing L is equal to the length of the illumination field of view. In addition, the spacing L between any two adjacent compensation steps 1 in each compensation plate 100 is set to 40 mm, and the length of the illumination field of view is also 40 mm.

[0062] In this embodiment, the spacing between the two adjacent compensation steps 1 is equal to the length of the illumination field of view. When the compensation plate 100 is moved by a distance equal to the length of the illumination field of view, another compensation step 1 on the compensation plate 100 is placed in the illumination field of view. In addition, there is only one compensation step 1 in the illumination field of view for any one compensation plate 100, thereby facilitating accurate control of switching of the compensation area.

[0063] It should be noted that the present embodiment does not limit the spacing between the two adjacent compensation steps 1 to be the same. For example, the distance between the two adjacent compensation steps 1 on the compensation plate 100 can be set to 10 mm, 20 mm, 25 mm, 40 mm, etc. Alternatively, the spacing between the adjacent compensation steps 1 can also be different from the length of the illumination field of view. The present embodiment is not limited in this way.

[0064] Further, the product of the total number of the compensation plates 100 and the length of a single compensation step 1 is equal to the length of the illumination field of view. There is only one compensation step 1 in the illumination field of view for each compensation plate 100. The compensation steps 1 of the four compensation plates 100 are connected in series along the length direction and seamlessly cover the entire illumination field of view. All the compensation plates 100 and the compensation steps 1 are fully utilized, the minimum length unit of the illumination compensation area corresponds to the length of the compensation step 1, and the switching of the compensation step 1 is more easily and accurately controlled.

[0065] For example, in this embodiment, the length of each compensation step 1 is set to 10 mm, and the total length of the four compensation steps 1 of the four compensation plates 100 is exactly 40 mm.

[0066] As shown in Figure 3 , the four compensation steps 1 do not coincide with each other along the Y-axis direction, i.e. the projections of the four compensation steps 1 along the X-axis direction do not coincide with each other, and the total length is just the length of the illumination field, i.e. 40mm.

[0067] It should be noted that the product of the number of compensation plates 100 and the length of a single compensation step 1 can also be different from the length of the illumination field. For example, the product of the length of a single compensation step 1 and the number of compensation plates 100 can be greater than the length of the illumination field, at this time, the four compensation steps 1 are connected in turn and are greater than the length of the illumination field. That is, one compensation step 1 only partially blocks the light source.

[0068] Preferably, the compensation steps 1 on any one compensation plate 100 are arranged in equal difference in height, i.e. the height difference of adjacent two compensation steps 1 is the same, and each time the compensation plate 100 is moved by a length of the illumination field, the height of the compensation step 1 changes by a preset height difference, which is more easy to accurately control the switching of the compensation step 1.

[0069] For example, the heights of the compensation steps 1 on one of the compensation plates 100 are 0.1mm, 0.2mm, 0.3mm, …, 2mm, a total of 20 steps, i.e. the height difference of adjacent two compensation steps 1 is 0.1mm, and after the compensation plate 100 is moved by 40mm, the height of the compensation step 1 changes by 0.1mm. The heights of the compensation steps 1 on another compensation plate 100 are 0.05mm, 0.1mm, 0.15mm, …, 2mm, a total of 40 steps, i.e. the height difference of adjacent two compensation steps 1 is 0.05mm. After the compensation plate 100 is moved by 40mm, the height of the compensation step 1 changes by 0.05mm. Of course, it can be understood that when the length and interval of each compensation step 1 are the same, the lengths of the two compensation plates 100 must be different. It can also be understood that if the lengths of the two compensation plates 100 are the same, the interval distance and the length of the compensation step 1 will be different.

[0070] Further, the compensation step 1 further comprises a plurality of sub-steps 11, and the lengths of the sub-steps 11 are the same and the heights of the sub-steps 11 are different.

[0071] Referring to Figure 5 , the compensation step 1 comprises two sub-steps 11, and there is a height difference between the two sub-steps 11, and the length of a single sub-step 11 is 5mm, i.e. the compensation plate 100 can switch the sub-step 11 once after moving 5mm. Such an arrangement makes the illumination field 201 corresponding to a compensation step 1 divided into multiple equal parts. Since the compensation accuracy of the compensation device is equal to the width of the equal division of the illumination field, the compensation accuracy of such a compensation device will be improved by multiple times.

[0072] Of course, setting the sub-steps 11 on the single compensation step 1 will obviously increase the difficulty of mechanical design and control system.

[0073] It should be noted that three, four or m sub-steps 11 can also be provided on the compensation step 1, the sub-steps divide the compensation step 1 into equal parts, and the height of each sub-step 11 is different for the compensation step 1. Each time the length of 1 / m compensation step 11 is moved, one sub-step 11 can be switched.

[0074] The same compensation step 1 is provided with multiple sub-steps 11 of different heights, thereby increasing the number of compensation regions, thereby improving the compensation accuracy, and at the same time increasing the number of compensation regions, without increasing the number of compensation plates 100, thereby not increasing the cost and control difficulty.

[0075] Further, the sub-steps 11 on the compensation step 1 are arranged in equal height difference. For example, a compensation step 1 has a height of 2mm, and the compensation step 1 is provided with four sub-steps 11, and the heights of the four sub-steps 11 are 2mm, 1.8mm, 1.6mm and 1.4mm respectively. The length of each sub-step 11 is 2.5mm, and after moving the compensation step 1 by 2.5mm, the sub-step 11 with a height difference of 0.2mm can be switched, and the tolerance of height change corresponds to the compensation accuracy in the same compensation region. The smaller the tolerance value, the greater the compensation accuracy.

[0076] Of course, the number of sub-steps 11 on the compensation step 1 in the embodiments of the present application is not limited to the above, and can be four, or greater than four or less than four. The more the number of sub-steps 11, the greater the compensation accuracy.

[0077] As shown in Figure 2 , the illumination uniformity compensation device further comprises a driving mechanism 200, which is connected with the compensation plate 100 one by one and is used to drive the connected compensation plate 100 to move along the length direction of the illumination field. As shown in Figure 2 , the illumination uniformity compensation device further comprises four driving mechanisms 200, each of which is connected with one compensation plate 100, that is, each compensation plate 100 is driven by a separate driving mechanism 200, realizing the separate control of each compensation plate 100 in the illumination field.

[0078] Further, the compensation plate 100 is provided in a rollable structure. In combination with Figure 5 and Figure 6The driving mechanism 200 comprises a first receiving box 2 and a second receiving box 3, the first receiving box 2 is arranged at the left side of the length direction of the illumination field, the left end of the compensation plate 100 is wound and received in the first receiving box 2; the second receiving box 3 is arranged at the right side of the length direction of the illumination field, the right end of the compensation plate 100 is wound and received in the second receiving box 3, and the second receiving box 3 drives the compensation plate 100 to move left or right together with the first receiving box 2.

[0079] The first receiving box 2 and the second receiving box 3 are arranged outside the illumination field and do not interfere with the illumination field, the first receiving box 2 winds the left end of the compensation plate 100, the second receiving box 3 winds the right end of the compensation plate 100, and the first receiving box 2 and the second receiving box 3 jointly drive the compensation plate 100 to move. It can be understood that, for example, the first receiving box 2 on the left side pulls the compensation plate 100 to gradually receive it, the second receiving box 3 on the right side simultaneously outputs the right end of the compensation plate 100 to the left, and then jointly drives the compensation plate 100 to move left.

[0080] In the embodiment of the application, the first receiving box 2 and the second receiving box 3 have the same structure, thereby reducing the product manufacturing cost.

[0081] Taking the first receiving box 2 as an example, the first receiving box 2 comprises a box body 20 and a power part 21, the box body 20 has a top cover, a bottom disc and a side wall between the top cover and the bottom disc, the top cover, the bottom disc and the side wall surround to form a receiving cavity, the side wall is provided with a strip-shaped opening, and the compensation plate 100 can enter the receiving cavity from the opening on the side wall. The power part 21 is arranged below the bottom disc.

[0082] It should be noted that the inside of the receiving cavity is provided with a rotating shaft, one end of the compensation plate 100 is fixedly connected to the rotating shaft and can be wound on the rotating shaft, and the movable end of the power part 21 penetrates the bottom disc of the box body 20 and is connected and drives the rotating shaft to rotate, the power part 21 can drive the rotating shaft to rotate clockwise or counterclockwise, thereby winding the compensation plate 100 on the rotating shaft or outputting the compensation plate 100 from the rotating shaft.

[0083] In the embodiment of the application, the power part 21 is arranged as a brushless motor, and the output shaft of the brushless motor is coaxially connected with the rotating shaft.

[0084] Preferably, the output rotation angle of the power unit 21 in the first storage box 2 is from α1 to the maximum value αmax. When the output rotation angle is α1, it is the initial angle of the power unit 21; when the output angle is αmax, it is the angle after the power unit 21 has rotated x times. The power unit 21 can output the target position of any compensation step 1 on the compensation plate 100. On the one hand, there is a predetermined fixed distance between this target position and the box body 20 of the first storage box 2. On the other hand, for any compensation step 1, there is a fixed rotation angle from the initial state of the first storage box 2 to the target position. Therefore, if it is necessary to move a specific compensation step 1 to the target position, the power unit 21 outputs a corresponding preset rotation angle. That is, for example, rotating the output shaft of the brushless motor 720° can move the first compensation step 1 to the target position. If the output shaft of the brushless motor continues to rotate 720°, it can move the second compensation step 1 to the target position. At this time, the first compensation step 1 continues to move towards the second storage box 3.

[0085] Once the target position is determined, the positions to which all the required compensation steps 1 have moved can be determined, which will facilitate the control of the power unit 21.

[0086] Of course, for ease of control, the rotation angle of the power unit 21 (brushless motor) can be matched and calculated with the speed of the lossless motor. The brushless motor can output a compensation step 1 to the target position for one time t after starting. For example, after the brushless motor starts for 100 milliseconds, the first compensation step 1 can be moved to the target position. After the brushless motor starts for 200 milliseconds, the second compensation step 1 can be moved to the target position. At this time, the first compensation step 1 continues to move towards the second storage box 3.

[0087] Example 2:

[0088] This application provides a lighting uniformity compensation method, utilizing the lighting uniformity compensation device provided in Embodiment 1.

[0089] The method for compensating for lighting uniformity includes the following steps:

[0090] S100. Obtain illuminance data within the illumination field of view. Specifically, in the scanning exposure machine, the compensation device is placed at the light-emitting end face of the quartz rod of the illumination system 102, and the illuminance data within the exposure illumination field of view is measured by the ESS of the silicon wafer surface.

[0091] S200. Fit the integral uniformity curve 1 within the illumination field of view based on the illuminance data. This integral uniformity curve 1 is as follows: Figure 7 As shown. According to Figure 7 It can be seen that within the range represented by its horizontal axis (the range of its location), the illuminance represented by its vertical axis fluctuates considerably.

[0092] S300, the integral uniformity curve is divided into four intervals. That is, along the X-axis direction of the integral uniformity curve, the X-axis scale is divided into four equal parts at -40 to 40 scales, and each interval corresponds to an X-axis scale of 20 units. In the embodiment of the present application, the four intervals are sequentially set as a first interval, a second interval, a third interval and a fourth interval from left to right. Figure 7

[0093] S400, according to the illuminance in each interval and the target illuminance, the required compensation steps of each interval are determined.

[0094] For example, the required compensation degree of the first interval corresponds to the eighth sub-step 11 of the first compensation version 100, the required compensation degree of the second interval corresponds to the fifteenth sub-step 11 of the second compensation version 100, the required compensation degree of the third interval corresponds to the second sub-step 11 of the third compensation version 100, and the required compensation degree of the fourth interval corresponds to the twelfth sub-step 11 of the fourth compensation version 100.

[0095] S500, the first storage box 2 and the second storage box 3 are started at the same time, and the corresponding compensation version 100 is moved to make the compensation step 1 enter the corresponding field of view of the interval. It can be understood that this step needs to be repeated four times for the four compensation versions 100, that is, each compensation version 100 needs to be displaced once.

[0096] That is, the eighth sub-step 11 of the first compensation version 100 is moved to the corresponding field of view of the first interval by the first storage box 2 and the second storage box 3 of the first group of driving mechanisms 200, the fifteenth sub-step 11 of the second compensation version 100 is moved to the corresponding field of view of the second interval by the first storage box 2 and the second storage box 3 of the second group of driving mechanisms 200, the second sub-step 11 of the third compensation version 100 is moved to the corresponding field of view of the third interval by the first storage box 2 and the second storage box 3 of the third group of driving mechanisms 200, and the twelfth sub-step 11 of the fourth compensation version 100 is moved to the corresponding field of view of the fourth interval by the first storage box 2 and the second storage box 3 of the fourth group of driving mechanisms 200.

[0097] S600, the illumination uniformity compensation is completed. The integral uniformity curve after the illumination uniformity compensation is as shown in FIG. 6. Figure 8 As can be seen from the X-axis scale of -40 to 40, the illuminance basically remains horizontal, and the fluctuation amplitude is obviously smaller than that of the integral uniformity curve before the compensation. Figure 7

[0098] The method is based on an illumination uniformity compensation device. The integral uniformity curve in the illumination field of view is fitted by the illuminance data, the integral uniformity curve is divided into intervals, and the required compensation steps in each interval are determined. Then, the corresponding compensation steps are moved horizontally to the position of the illumination field of view corresponding to the interval, so as to realize the illumination uniformity compensation, improve the installation and adjustment efficiency, and reduce the control difficulty.​​

[0099] Obviously, the above-mentioned embodiments of the present application are only examples for clearly illustrating the present application, and are not intended to limit the implementation modes of the present application. Various obvious changes, re-adjustments and substitutions can be made by those skilled in the art without departing from the protection scope of the present application. It is unnecessary and impossible to enumerate all the implementation modes here. Any modification, equivalent substitution and improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the claims of the present application.

Claims

1. An illumination uniformity compensation device, characterized by, The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator.

2. The illumination uniformity compensation device of claim 1, wherein, The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator.

3. The illumination uniformity compensation device of claim 2, wherein, The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator.

4. The illumination uniformity compensation device of claim 3, wherein, The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator.

5. The illumination uniformity compensation device of claim 4, wherein, The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator.

6. The illumination uniformity compensation device of claim 5, wherein, The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator.

7. Illumination uniformity compensation device according to any of claims 1-6, characterized in that The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator.

8. The illumination uniformity compensation device of claim 7, wherein, The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator.

9. The illumination uniformity compensation device of claim 8, wherein, The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator.

10. A method of illumination uniformity compensation, characterized by, The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and the compensation plate (100) is arranged in the light field of the illuminator. The compensation plate (100) is arranged in the light field of the illuminator, and

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