Drawing device

Abstract

The drawing head moving mechanism (42) of the drawing device (1) moves the head unit (43) horizontally along the head moving path between a first drawing position and a second drawing position. The gas delivery portion (5) is arranged along the head moving path. The gas flow path (51) of the gas delivery portion (5) extends from the first drawing position to the second drawing position along the head moving path. The gas delivery port is provided at a portion of the gas flow path (51) opposite to the head unit (43) and delivers gas toward the gas inlet of the head cover (44). The delivery position switching portion switches the position of the gas delivery port between a first delivery position opposite to the head unit (43) located at the first drawing position and a second delivery position opposite to the head unit (43) located at the second drawing position. Thus, the temperature of the drawing head moving along the head moving path can be well adjusted.

Description

Technical Field

[0001] The invention relates to a drawing device for drawing on a substrate. Background Art

[0002] Conventionally, patterns are drawn by irradiating light onto a photosensitive material formed on a semiconductor substrate, a printed circuit board, or a glass substrate for an organic EL display device or a liquid crystal display device (hereinafter referred to as a "substrate").

[0003] In a drawing device that performs this drawing, if the temperature of the projection optical system, etc., fluctuates in the drawing head that emits light toward the substrate, the magnification, focal position, and drawing position may fluctuate. Therefore, the drawing device disclosed in Japanese Patent No. 6117594 (Document 1) discloses a technique in which a temperature-regulating air duct extending from a temperature regulator is disposed within a housing that houses the multiple drawing heads in the drawing unit. Temperature-regulated air is supplied from the air outlet of the air duct into the housing, thereby maintaining the temperature of the multiple drawing heads.

[0004] In recent years, in order to improve the production capacity of drawing devices, the following scheme has been proposed: two stages and one drawing unit are set in one drawing device, and while drawing the substrate on one stage, the substrate on the other stage is replaced or aligned.

[0005] In such a drawing device, if the drawing head temperature is adjusted as described in Document 1, the temperature adjustment air duct will change shape as the drawing unit moves from above one stage to above the other. However, deformation of the air duct disrupts the flow of air delivered from the outlet into the drawing unit housing, resulting in air flow loss or uneven flow distribution, leading to inadequate temperature adjustment of the drawing head. Summary of the Invention

[0006] The present invention is directed to a drawing apparatus for drawing on a substrate, and an object of the present invention is to properly regulate the temperature of a drawing head that moves along a head movement path.

[0007] A drawing device of a preferred embodiment of the present invention comprises: a substrate holding portion that holds the substrate in a horizontal state; a substrate moving mechanism that causes the above-mentioned substrate holding portion to move horizontally along a substrate moving path; a head unit that has a drawing head that is arranged above the above-mentioned substrate holding portion and irradiates light on the above-mentioned substrate to draw a pattern, and a head cover that accommodates the above-mentioned drawing head internally; the drawing head moving mechanism that causes the above-mentioned head unit to move horizontally between a first head position and a second head position along a head moving path that intersects the above-mentioned substrate moving path when viewed from above; and a gas delivery portion that is arranged along the above-mentioned head moving path and can supply temperature-regulated gas to the interior of the above-mentioned head cover when the above-mentioned head unit is located at either the above-mentioned first head position or the above-mentioned second head position. The above-mentioned gas delivery part includes: a gas flow path for supplying the above-mentioned gas to flow, which extends along the above-mentioned head movement path from the above-mentioned first head position to the above-mentioned second head position and supplies the gas to flow; a gas delivery port, which is provided at a position of the above-mentioned gas flow path opposite to the above-mentioned head unit and delivers the above-mentioned gas toward the gas inlet of the above-mentioned head cover; and a delivery position switching part, which switches the position of the above-mentioned gas delivery port between a first delivery position opposite to the above-mentioned head unit located at the above-mentioned first head position and a second delivery position opposite to the above-mentioned head unit located at the above-mentioned second head position.

[0008] According to this drawing device, the temperature of the drawing head moving along the head movement path can be adjusted satisfactorily.

[0009] Preferably, an opening portion extending from the first delivery position to the second delivery position is provided in the gas flow path. The delivery position switching portion includes an opening and closing portion that opens and closes the first region of the opening that is opposite to the head unit located at the first head position and the second region that is opposite to the head unit located at the second head position, respectively. By opening the first region of the opening and closing the second region using the opening and closing portion, the position of the gas delivery port becomes the first delivery position. By closing the first region of the opening and opening the second region using the opening and closing portion, the position of the gas delivery port becomes the second delivery position.

[0010] Preferably, the gas delivery outlet is arranged in a manner capable of moving along the head movement path at a portion of the gas flow path opposite to the head unit, and moves between the first delivery position and the second delivery position synchronously with the movement of the head unit between the first head position and the second head position through the delivery position switching portion.

[0011] Preferably, the gas delivery port includes a plurality of delivery holes distributed in a portion of the gas flow path facing the head unit.

[0012] Preferably, the gas delivery port faces the projection optical system of the drawing head and is arranged on both sides of a position in the width direction, avoiding a position facing the center of the projection optical system in the width direction.

[0013] Preferably, the drawing device further includes: a temperature sensor for measuring the temperature of the drawing head; and a temperature adjustment unit for adjusting the temperature of the gas supplied to the gas delivery unit based on an output from the temperature sensor.

[0014] Preferably, the head unit further includes another drawing head, the other drawing head being adjacent to the drawing head within the head cover and arranged along the head movement path together with the drawing head, for irradiating the substrate with light to draw a pattern. The gas delivery port includes: a delivery area facing the drawing head; and another delivery area spaced apart from the delivery area and facing the other drawing head.

[0015] Preferably, the head unit further includes another drawing head, the other drawing head being adjacent to the drawing head within the head cover and arranged along the head movement path together with the drawing head, for irradiating light onto the upper main surface of the substrate to draw a pattern. A partition wall is provided in an area of ​​the head cover opposite the gas inlet to separate the drawing head from the other drawing heads.

[0016] Preferably, the drawing device further comprises: another substrate holding portion, arranged adjacent to the substrate holding portion, for holding the substrate in a horizontal position; and another substrate moving mechanism, arranged side by side with the substrate moving mechanism in a direction intersecting the substrate moving path, for horizontally moving the other substrate holding portion along another substrate moving path parallel to the substrate moving path. The first head position is a first drawing position above the substrate holding portion, for irradiating light onto the substrate on the substrate holding portion. The second head position is a second drawing position above the other substrate holding portion, for irradiating light onto the substrate on the other substrate holding portion.

[0017] The above-mentioned objects and other objects, features, aspects and advantages will become more apparent from the following detailed description of the present invention with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 This is a perspective view showing a drawing device according to one embodiment.

[0019] Figure 2 This is a diagram showing the configuration of a computer.

[0020] Figure 3 This is a block diagram showing the functions of the control unit.

[0021] Figure 4 This is the front view of the head unit.

[0022] Figure 5 It is a side view of the head unit.

[0023] Figure 6 It is a diagram schematically showing a gas delivery unit and structures related to the gas delivery unit.

[0024] Figure 7 This is a side view of the head unit and the gas delivery section.

[0025] Figure 8 This is a rear view of the gas flow path.

[0026] Figure 9 This is a cross-sectional view of the gas flow path and the head unit.

[0027] Figure 10 This is a rear view of the gas flow path.

[0028] Figure 11 This is the front view of the head unit.

[0029] Figure 12 It is a rear view showing another preferred example of the gas flow path.

[0030] Figure 13 It is a rear view showing another preferred example of the gas flow path.

[0031] Figure 14 This is a cross-sectional view of the gas flow path and the head unit.

[0032] Description of Reference Numerals

[0033] 1 Drawing device

[0034] 5, 5a, 5b Gas delivery section

[0035] 9 substrate

[0036] 21a Stage 1

[0037] 21b Stage 2

[0038] 22a First moving mechanism

[0039] 22b Second moving mechanism

[0040] 41 Drawing Head

[0041] 42 Drawing head moving mechanism

[0042] 43 head unit

[0043] 44 Hood

[0044] 51, 51a, 51b Gas flow path

[0045] 53 opening

[0046] 54, 54b delivery position switching unit

[0047] 55 Temperature Sensor

[0048] 56, 56a, 56b Gas outlet

[0049] 57 Temperature Control Unit

[0050] 91 Upper surface (of substrate)

[0051] 413 Projection Optical System

[0052] 441 Gas inlet

[0053] 443 Partition Wall

[0054] 531 delivery hole

[0055] 534, 535 delivery area

[0056] 541 Opening and Closing Department DETAILED DESCRIPTION

[0057] Figure 1 This is a perspective view of a drawing device 1 according to one embodiment of the present invention. The drawing device 1 is a dual-stage direct drawing device that irradiates a photosensitive material on a substrate 9 with spatially modulated light in the form of a roughly light beam and draws a pattern by scanning the irradiation area of ​​the light on the substrate 9. Figure 1 In FIG, three directions orthogonal to each other are indicated by arrows as the X direction, the Y direction, and the Z direction. Figure 1 In the example shown, the X direction and the Y direction are horizontal directions perpendicular to each other, and the Z direction is a vertical direction. The same applies to the other drawings.

[0058] The substrate 9 is a plate-shaped member, for example, having a generally rectangular shape when viewed from above. For example, the substrate 9 is a printed circuit board. On the principal surface (hereinafter also referred to as "upper surface 91") on the (+Z) side of the substrate 9, a resist film made of a photosensitive material is provided on a copper layer. In the drawing device 1, a circuit pattern is drawn (i.e., formed) on this resist film on the substrate 9. Furthermore, the type and shape of the substrate 9 can be varied in various ways.

[0059] The rendering apparatus 1 includes a first conveying mechanism 2a, a second conveying mechanism 2b, an imaging unit 3, a rendering unit 4, a gas delivery unit 5, a frame 7, and a control unit 10. The control unit 10 controls the first conveying mechanism 2a, the second conveying mechanism 2b, the imaging unit 3, the rendering unit 4, and the gas delivery unit 5.

[0060] Figure 2 This is a diagram showing the structure of the computer 100 included in the control unit 10. The computer 100 is a general computer including a processor 101, a memory 102, an input / output unit 103, and a bus 104. The bus 104 is a signal circuit that connects the processor 101, the memory 102, and the input / output unit 103. The memory 102 stores programs and various information. The processor 101 utilizes the memory 102 and executes various processes (for example, numerical calculations, image processing) according to the programs stored in the memory 102. The input / output unit 103 includes a keyboard 105 and a mouse 106 for receiving input from the operator, and a display 107 for displaying output from the processor 101. In addition, the control unit 10 may be a programmable logic controller (PLC) or a circuit board, or a combination of these parts and one or more computers.

[0061] Figure 3 1 is a block diagram showing the functions of the control unit 10 implemented by the computer 100. Figure 3 , the components other than the control unit 10 are also shown. The control unit 10 includes a storage unit 111, an imaging control unit 112, a detection unit 113, a drawing control unit 114, an air supply control unit 115, and a temperature control unit 116. The storage unit 111 is mainly implemented by the memory 102 and stores various information such as data of a pattern to be drawn on the substrate 9 (i.e., drawing data).

[0062] The imaging control unit 112, detection unit 113, rendering control unit 114, air supply control unit 115, and temperature control unit 116 are primarily implemented by the processor 101. The imaging control unit 112 controls the imaging unit 3, the first conveying mechanism 2a, and the second conveying mechanism 2b, causing the imaging unit 3 to capture images of the upper surfaces 91 of the substrates 9 on the first conveying mechanism 2a and the second conveying mechanism 2b. These images are sent to and stored in the storage unit 111. The detection unit 113 uses these images to detect the positions of the substrates 9 on the first conveying mechanism 2a and the second conveying mechanism 2b. The rendering control unit 114 controls the rendering unit 4, the first conveying mechanism 2a, and the second conveying mechanism 2b based on the positions of the substrates 9 detected by the detection unit 113 and the rendering data pre-stored in the storage unit 111, thereby causing the rendering unit 4 to render the substrates 9 on the first conveying mechanism 2a and the second conveying mechanism 2b. The air supply control unit 115 controls the supply of gas by the gas supply unit 5. The temperature control unit 116 controls the temperature of the gas supplied from the gas supply unit 5 by controlling the temperature adjustment unit 57 described later.

[0063] Figure 1The frame 7 shown is the main base portion on which the various structures of the rendering device 1 are installed. The frame 7 has a base 71 that is roughly rectangular, and a first gantry portion 72 and a second gantry portion 73 that are gate-shaped and span the base 71. The second gantry portion 73 is arranged close to the (+Y) side of the first gantry portion 72. In the following description, the first gantry portion 72 and the second gantry portion 73 are also collectively referred to as the "gantry portion 74." The gantry portion 74 is fixed relative to the base 71. The first conveying mechanism 2a and the second conveying mechanism 2b are mounted on the base 71. The first gantry portion 72 supports the imaging unit 3. The second gantry portion 73 supports the rendering unit 4. The frame 7 is placed on a pedestal that is omitted in the figure.

[0064] The first conveying mechanism 2a and the second conveying mechanism 2b are mechanisms for holding and moving the substrate 9 below the imaging unit 3 and the drawing unit 4 (i.e., on the (-Z) side). The second conveying mechanism 2b is located adjacent to the (+X) side of the first conveying mechanism 2a. The first conveying mechanism 2a and the second conveying mechanism 2b have substantially the same structure.

[0065] The first conveying mechanism 2a includes a first stage 21a and a first moving mechanism 22a. The first stage 21a is a generally flat substrate holding portion that holds the substrate 9 in a generally horizontal state from below. The first stage 21a is, for example, a vacuum chuck that holds the lower surface of the substrate 9 by suction. The first stage 21a may also have a structure other than a vacuum chuck. The upper surface 91 of the substrate 9 placed on the first stage 21a is generally perpendicular to the Z direction (i.e., the vertical direction) and generally parallel to the X and Y directions.

[0066] The first moving mechanism 22a is a substrate moving mechanism that moves the substrate 9 together with the first stage 21a approximately horizontally along a substrate moving path parallel to the Y direction (that is, moves in a direction approximately parallel to the upper surface 91 of the substrate 9). In the following description, the above-mentioned substrate moving path of the substrate 9 based on the first moving mechanism 22a is also referred to as the "first substrate moving path". The first moving mechanism 22a causes the first stage 21a supported on the guide rail 221a to move linearly in the Y direction along the guide rail 221a below the imaging unit 3 and the drawing unit 4. As a result, the substrate 9 held on the first stage 21a moves in the Y direction. In the following description, the Y direction is also referred to as the "substrate moving direction". The driving source of the first moving mechanism 22a is, for example, a linear servo motor or a component in which a motor is mounted on a ball screw. The structure of the first moving mechanism 22a can also be changed in various ways.

[0067] The second conveying mechanism 2b includes a second stage 21b and a second moving mechanism 22b. The second stage 21b is arranged adjacent to the side (i.e., (+X) side) of the first stage 21a, which serves as a substrate holding portion, and is another substantially flat substrate holding portion that holds the substrate 9 in a substantially horizontal state from the bottom side. The upper surface of the second stage 21b is arranged at approximately the same height as the upper surface of the first stage 21a in the vertical direction (i.e., the Z direction). The second stage 21b is, for example, a vacuum chuck that adsorbs and holds the lower surface of the substrate 9. The second stage 21b may also have a structure other than a vacuum chuck. The upper surface 91 of the substrate 9 placed on the second stage 21b is approximately perpendicular to the Z direction and approximately parallel to the X and Y directions. The upper surface 91 of the substrate 9 held on the second stage 21b is located at approximately the same height in the vertical direction (i.e., approximately the same position in the Z direction) as the upper surface 91 of the substrate 9 held on the first stage 21a.

[0068] The second moving mechanism 22b is another substrate moving mechanism arranged in parallel with the first moving mechanism 22a in a direction intersecting the substrate moving direction (ie, the Y direction). Figure 1 In the example shown, the first moving mechanism 22a and the second moving mechanism 22b are arranged side by side in the X direction, with the second moving mechanism 22b adjacent to the side of the first moving mechanism 22a on the (+X) side. The first moving mechanism 22a and the second moving mechanism 22b are located at approximately the same height in the vertical direction. The second moving mechanism 22b moves the substrate 9 and the second stage 21b approximately horizontally along another substrate movement path (hereinafter also referred to as the "second substrate movement path") that is approximately parallel to the first substrate movement path.

[0069] The second moving mechanism 22b causes the second stage 21b supported on the guide rail 221b to move linearly in the Y direction (i.e., the substrate movement direction) along the guide rail 221b below the imaging unit 3 and the drawing unit 4. As a result, the substrate 9 held on the second stage 21b moves in the Y direction. The moving direction of the second stage 21b based on the second moving mechanism 22b is roughly parallel to the moving direction of the first stage 21a based on the first moving mechanism 22a. The driving source of the second moving mechanism 22b is, for example, a linear servo motor or a component in which a motor is mounted on a ball screw. The structure of the second moving mechanism 22b can also be changed in various ways.

[0070] The first and second substrate movement paths are fixed paths relative to the base 71 of the frame 7. The first substrate movement path is determined, for example, based on the guide rail 221a of the first movement mechanism 22a described above. The second substrate movement path is determined, for example, based on the guide rail 221b of the second movement mechanism 22b described above. Alternatively, the first and second substrate movement paths may be determined based on other structures.

[0071] The first moving mechanism 22a and the second moving mechanism 22b extend in the (-Y) direction from a position closer to the (+Y) side than the second gantry 73, pass below the rendering unit 4 supported by the second gantry 73 and below the imaging unit 3 supported by the first gantry 72, and protrude toward the (-Y) side from the first gantry 72. The first gantry 72 and the Y-direction centers of the first moving mechanism 22a and the second moving mechanism 22b are located at approximately the same position in the Y direction.

[0072] In the drawing apparatus 1, the substrate 9 is loaded and unloaded relative to the first stage 21a while the first stage 21a is positioned on the (-Y) side relative to the first gantry unit 72. Furthermore, the substrate 9 is loaded and unloaded relative to the second stage 21b while the second stage 21b is positioned on the (-Y) side relative to the first gantry unit 72.

[0073] As described above, the first gantry 72 and the second gantry 73 are arranged across the first and second conveying mechanisms 2a, 2b. The first gantry 72 includes two pillars extending in the Z direction on either side of the first and second conveying mechanisms 2a, 2b in the X direction, and a beam connecting the upper ends of the two pillars. This beam extends in the X direction above the first and second conveying mechanisms 2a, 2b. The two pillars of the first gantry 72 are connected to the base 71 at their (-Z)-side ends. The second gantry 73 includes two pillars extending in the Z direction on either side of the first and second conveying mechanisms 2a, 2b in the X direction, and a beam connecting the upper ends of the two pillars. This beam extends in the X direction above the first and second conveying mechanisms 2a, 2b. The two pillars of the second gantry 73 are connected to the base 71 at their (-Z)-side ends.

[0074] The imaging unit 3 includes multiple Figure 1 In the example shown, there are two cameras 31 and a camera moving mechanism 32. The multiple cameras 31 are arranged in the X direction and are movably mounted on the beam portion of the first gantry portion 72. The camera moving mechanism 32 is mounted on the beam portion to move the multiple cameras 31 in the X direction along the beam portion. The driving source of the camera moving mechanism 32 is, for example, a linear servo motor or a component with a motor mounted on a ball screw. Figure 1 In the example shown, the interval between the two imaging heads 31 in the X direction can be changed. In addition, the number of imaging heads 31 in the imaging unit 3 may be one or three or more.

[0075] Each shooting head 31 is a camera having a shooting sensor and an optical system (not shown). Each shooting head 31 is, for example, an area camera that acquires a two-dimensional image. The shooting sensor is, for example, provided with a plurality of CCDs (Charge Coupled Devices) and other elements arranged in a matrix. In each shooting head 31, the reflected light of the illumination light directed from the light source (not shown) to the upper surface 91 of the substrate 9 is guided to the shooting sensor via the optical system. The shooting sensor receives the reflected light from the upper surface 91 of the substrate 9 and acquires an image of a roughly rectangular shooting area. As the above-mentioned light source, various light sources such as LEDs (Light Emitting Diodes) can be used. In addition, each shooting head 31 may also be another type of camera such as a line camera.

[0076] In the rendering device 1, the plurality of imaging heads 31 are moved between a first imaging position above the first conveying mechanism 2a and a second imaging position above the second conveying mechanism 2b by the imaging head moving mechanism 32. Figure 1 , the plurality of imaging heads 31 are located at a first imaging position. The plurality of imaging heads 31 capture images of the upper surface 91 of the substrate 9 on the first stage 21a at the first imaging position. Furthermore, the plurality of imaging heads 31 capture images of the upper surface 91 of the substrate 9 on the second stage 21b at a second imaging position.

[0077] The rendering unit 4 includes a head unit 43 and a rendering head moving mechanism 42. The head unit 43 is movably mounted on the beam portion of the second gantry portion 73. The rendering head moving mechanism 42 is mounted on the beam portion and moves the head unit 43 in the X direction along the beam portion. The driving source of the rendering head moving mechanism 42 is, for example, a linear servo motor or a motor-mounted ball screw.

[0078] Figure 4 This is a front view of the head unit 43 as viewed from the (−Y) side. Figure 5 This is a side view of the head unit 43 viewed from the (-X) side. Figure 5 In FIG. 1 , a head cover 44 described later is shown in cross section, and the internal structure of the head cover 44 is drawn with solid lines.

[0079] The head unit 43 includes a drawing head 41 and a head cover 44. Figure 4 In the example shown, the head unit 43 includes six drawing heads 41. The six drawing heads 41 are arranged at approximately the same position in the Y direction and the Z direction, and are arranged adjacent to each other approximately parallel to the X direction. The head cover 44 houses the six drawing heads 41. The head cover 44 is a shell composed of a thin plate member that surrounds the six drawing heads 41. Each drawing head 41 and the head cover 44 are connected to the first stage 21a and the second stage 21b (see FIG. Figure 1) is arranged on the upper side. In addition, the number of the drawing heads 41 accommodated in the head cover 44 can also be 1, and can also be changed in various ways within the range of more than 2.

[0080] The plurality of drawing heads 41 irradiate light onto the substrate 9 to draw a pattern. The plurality of drawing heads 41 have substantially the same structure. Each drawing head 41 includes an illumination optical system 411, a spatial light modulator 412, a projection optical system 413, and a focus sensor 415. The illumination optical system 411 guides light from a light source (not shown) to the spatial light modulator 412. Figure 4 , only a part of the structure of the illumination optical system 411 is shown. As a light source, various light sources such as LD (Laser Diode) can be used. The spatial light modulator 412 modulates the light from the illumination optical system 411 and guides it to the projection optical system 413. As the spatial light modulator 412, various elements such as DMD (Digital MicroMirror Device) or GLV (Grating Light Valve) (registered trademark of Silicon LightMachines (Sunnyvale, California)) can be used. The projection optical system 413 guides the light modulated by the spatial light modulator 412 to the upper surface 91 of the substrate 9. The focusing sensor 415 is arranged at a position approximately the same as the objective lens 414 provided at the lower end of the projection optical system 413 in the vertical direction, and is used to adjust the focus of the drawing head 41.

[0081] exist Figure 4 and Figure 5 In the illustrated example, the illumination optical system 411, spatial light modulator 412, and projection optical system 413 of each drawing head 41 are largely housed within a head cover 44. The lower portion of the objective lens 414 and the focus sensor 415 protrude downward from the lower end of the head cover 44. Alternatively, in the head unit 43, the entire structure of the drawing head 41 may be housed within the head cover 44.

[0082] A substantially rectangular opening 441 extending in the X direction is provided on the (-Y) side surface of the head cover 44. As described later, the opening 441 is an inlet for the gas delivered from the gas delivery unit 5 and is also referred to as "gas inlet 441" in the following description.

[0083] exist Figure 4 and Figure 5In the example shown, the gas inlet 441 is provided on a surface substantially perpendicular to the Y direction within a groove 442 provided on the surface of the head cover 44 on the (-Y) side and extending in the X direction. The groove 442 is formed by recessing a portion of the surface of the head cover 44 on the (-Y) side in the (+Y) direction, and is a substantially rectangular space extending substantially parallel to the X direction. In addition, the gas inlet 441 is opposite to the six drawing heads 41 arranged side by side in the X direction in the Y direction. The length of the gas inlet 441 in the X direction is longer than the length of the area in the X direction where the six drawing heads 41 are provided. Figure 4 and Figure 5 In the illustrated example, the gas inlet 441 is opposed to the projection optical systems 413 of the six imaging heads 41 in the Y direction.

[0084] exist Figure 1 In the drawing device 1 shown, the head unit 43 (i.e., a plurality of drawing heads 41 and a head cover 44) is moved along a predetermined movement path by the drawing head moving mechanism 42 between a first drawing position above the first conveying mechanism 2a and a second drawing position above the second conveying mechanism 2b. Figure 1 , the head unit 43 is located at the second drawing position. The movement path of the head unit 43 (hereinafter also referred to as "head movement path") extends approximately parallel to the X direction at a position spaced upward from the first substrate movement path and the second substrate movement path, and intersects the first substrate movement path and the second substrate movement path approximately perpendicularly in a plan view. In addition, the plurality of drawing heads 41 (see Figure 4 ) are arranged along the head movement path. The head movement path is a path fixed to the second gantry portion 73 of the frame 7, and is determined based on, for example, a guide rail provided on the second gantry portion 73. In addition, the head movement path can also be determined based on other structures.

[0085] When the head unit 43 is located at the first drawing position, the plurality of drawing heads 41 (see Figure 4 ) draws a pattern on the upper surface 91 of the substrate 9 on the first stage 21a. Furthermore, when the head unit 43 is located at the second drawing position, the plurality of drawing heads 41 draw a pattern on the upper surface 91 of the substrate 9 on the second stage 21b. In the following description, the first drawing position and the second drawing position are also referred to as the "first head position" and the "second head position," respectively.

[0086] When drawing a pattern at the first drawing position, modulated (i.e., spatially modulated) light is irradiated from the multiple drawing heads 41 of the drawing unit 4 toward the substrate 9 on the first stage 21a below. Furthermore, in parallel with this light irradiation, the substrate 9 is horizontally moved in the Y direction (i.e., the substrate movement direction) by the first moving mechanism 22a. As a result, the irradiation area of ​​light from the multiple drawing heads 41 is scanned in the Y direction on the substrate 9, drawing a pattern (e.g., a circuit pattern) on the substrate 9. The first moving mechanism 22a is a scanning mechanism that moves the irradiation area of ​​light from each drawing head 41 in the Y direction on the substrate 9.

[0087] exist Figure 1 In the example shown, the drawing of the substrate 9 is performed in a so-called single-pass (one-pass) manner. Specifically, the first stage 21a is moved relative to the multiple drawing heads 41 in the Y direction by the first moving mechanism 22a, and the irradiation area of ​​the light from the multiple drawing heads 41 is scanned only once in the Y direction on the upper surface 91 of the substrate 9. Thus, the drawing of the substrate 9 is completed. Furthermore, in the drawing device 1, the drawing of the substrate 9 can also be performed using a multi-pass method that repeatedly moves the first stage 21a in the Y direction and the head unit 43 in the X direction. The drawing of the pattern at the second drawing position is the same as the drawing of the pattern at the first drawing position described above, except that the first stage 21a and the first moving mechanism 22a are replaced by the second stage 21b and the second moving mechanism 22b.

[0088] The gas delivery unit 5 includes a gas flow path 51 and a flow path support portion 52. The gas flow path 51 is arranged close to the head unit 43 on the (-Y) side of the head unit 43. The gas flow path 51 is a roughly rectangular parallelepiped component that extends from the first drawing position to the second drawing position along the head movement path and roughly parallel to the X direction. In detail, the gas flow path 51 extends roughly parallel to the X direction along the head movement path from a position opposite to the first drawing position in the Y direction to a position opposite to the second drawing position in the Y direction. The length of the gas flow path 51 in the X direction is longer than the length of the head unit 43 in the X direction. Inside the gas flow path 51, a space is provided over the substantially entire length of the gas flow path 51 in the longitudinal direction (i.e., the X direction), and this space serves as a flow path for gas flow.

[0089] The flow path support portion 52 is a tubular member extending upward from both ends of the gas flow path 51 in the X direction. Figure 1 Although not shown in the figure, the flow path support portion 52 is fixed to the frame 7 and supports the gas flow path 51 from above. The gas flow path 51 is indirectly fixed to the frame 7 via the flow path support portion 52 and does not move. The flow path support portion 52 also connects the gas flow path 51 with the gas supply source 59 described later (see Figure 6) is connected to the gas supply source 59 and supplies gas from the gas flow path 51. In addition, the method of supporting the gas flow path 51 based on the flow path support portion 52 can be changed in various ways. For example, the flow path support portion 52 can also support the gas flow path 51 from below.

[0090] Figure 6 This figure schematically illustrates the gas delivery unit 5 and the structures associated with the gas delivery unit 5. In the rendering apparatus 1, the flow path support portion 52 of the gas delivery unit 5 is connected to a gas supply source 59 via a pipe 58. The gas supply source 59 is typically located outside the rendering apparatus 1. The gas supplied from the gas supply source 59 to the gas delivery unit 5 is, for example, compressed air. Various gases other than compressed air can also be used as this gas. A temperature control unit 57 is provided midway between the pipe 58. This temperature control unit 57 adjusts the temperature of the gas supplied from the gas supply source 59 to the gas delivery unit 5. A known temperature control device, such as a Peltier-type or heat pump-type temperature control device, can be used as the temperature control unit 57.

[0091] The temperature-controlled gas (so-called temperature-controlled gas) supplied from the gas supply source 59 to the gas delivery unit 5 is delivered in the (+Y) direction from the gas delivery port 56 provided on the (+Y) side of the gas flow path 51 toward the gas inlet 441 provided in the head cover 44 of the head unit 43. The temperature-controlled gas delivered from the gas delivery port 56 is supplied to the interior of the head cover 44 via the gas inlet 441.

[0092] A temperature sensor 55 for measuring the temperature of the drawing head 41 is provided inside the head cover 44. Figure 6 In the example shown, the temperature sensor 55 is arranged on the (+Y) side of the projection optical system 413 of the drawing head 41. Figure 6 Schematic diagram of the drawing head 41 is omitted except for the projection optical system 413. The temperature sensor 55 measures the temperature of the projection optical system 413 in the drawing head 41, where temperature changes have a relatively large influence on the drawing quality.

[0093] The temperature of the drawing head 41 measured by the temperature sensor 55 (hereinafter also referred to as "measured temperature") is sent to the control unit 10 (see Figure 3 The temperature control unit 116 of the control unit 10 controls the temperature control unit 57 based on the measured temperature of the drawing head 41 output from the temperature sensor 55, so that the temperature control unit 57 adjusts the temperature of the gas supplied to the gas delivery unit 5. In this way, the temperature of the gas supplied from the gas delivery unit 5 to the inside of the head cover 44 is adjusted, and the temperature of the drawing head 41 (at Figure 6 In the example shown, the temperature of the projection optical system 413 is maintained at a temperature substantially the same as a predetermined target temperature.

[0094] The temperature sensor 55 can measure the temperature of, for example, a representative drawing head 41 among the six drawing heads 41, or it can measure the temperature of two or more drawing heads 41. When measuring the temperature of two or more drawing heads 41, for example, the arithmetic average of the temperatures of the two or more drawing heads 41 measured by the temperature sensor 55 is transmitted to the control unit 10 as the measured temperature. For example, an infrared non-contact temperature sensor is used as the temperature sensor 55. Furthermore, various contact or non-contact temperature sensors can also be used as the temperature sensor 55. Furthermore, the temperature sensor 55 can also be located on the outside of the head cover 44 as long as it can measure the temperature of the drawing heads 41 with high accuracy.

[0095] Figure 7 This is a side view of the head unit 43 and the gas delivery portion 5 as viewed from the (-X) side. Figure 7 In, with Figure 5 Likewise, the hood 44 is shown in cross section, with the structure inside the hood 44 being drawn with solid lines. Figure 7 In the illustrated example, the gas flow path 51 is disposed within the groove 442 of the head cover 44, close to the (+Y) side surface of the groove 442. The gas flow path 51 branches toward the (-Y) side of the head cover 44, with a small gap between the gas flow path 51 and the head cover 44. The gas flow path 51 is disposed in the Z direction at a position opposite the gas inlet 441 of the head cover 44 in the Y direction.

[0096] Figure 8 This is a rear view of the (+Y) side surface of the gas flow path 51 (i.e., the portion facing the head cover 44 of the head unit 43) as viewed from the (+Y) side. Figure 8 In FIG. 4 , the head cover 44 and the gas inlet 441 of the head unit 43 located at the second drawing position are also drawn with dotted lines. Figure 9 4 is a cross-sectional view obtained by cutting the gas flow path 51 and the head unit 43 at a position where the gas inlet 441 is provided in the Z direction. Figure 9 In FIG, only a portion of the head unit 43 on the (−Y) side is shown.

[0097] An opening 53 is provided on the (+Y) side surface of the gas flow path 51, which extends over substantially the entire length in the X direction. The opening 53 penetrates the (+Y) side surface of the gas flow path 51 and communicates with the internal space of the gas flow path 51. Figure 8 In the example shown, the opening 53 is a collection of a plurality of small, substantially circular delivery holes 531 (ie, through holes). Figure 8In the illustrated example, the plurality of delivery holes 531 are dispersed in a matrix in the X and Z directions. For example, the plurality of delivery holes 531 are distributed approximately evenly in the X and Z directions. In this embodiment, the sidewall on the (+Y) side of the gas flow path 51 is formed from a punched plate (e.g., a perforated metal plate) having the plurality of delivery holes 531 formed therein.

[0098] In addition, Figure 8 In the example shown, the opening 53 is a generally rectangular region with sides generally parallel to the X direction or the Z direction, and is a region circumscribing the delivery holes 531 located on the outer edges of the (+X) side, (-X) side, (+Z) side, and (-Z) side, among the plurality of delivery holes 531 included in the region. Figure 8 In FIG. 5 , the opening 53 is surrounded by a two-dot chain line.

[0099] like Figure 8 As shown, when the head unit 43 is located at the second drawing position, approximately half of the (+X) side of the opening 53 is opposite to the head unit 43. In addition, when the head unit 43 is located at the first drawing position, approximately half of the (-X) side of the opening 53 is opposite to the head unit 43. In the following description, the area of ​​the opening 53 that is opposite to the head cover 44 of the head unit 43 located at the first drawing position (i.e., approximately half of the area on the (-X) side of the opening 53) is also referred to as the "first area 532". In addition, the area of ​​the opening 53 that is opposite to the head cover 44 of the head unit 43 located at the second drawing position (i.e., approximately half of the area on the (+X) side of the opening 53) is also referred to as the "second area 533". Figure 8 In FIG, the first region 532 and the second region 533 are respectively surrounded by two-dot chain lines.

[0100] exist Figure 8 In the example shown, the first region 532 is a generally rectangular region with sides generally parallel to the X or Z direction. It circumscribes the delivery holes 531 located on the outer edges of the (+X), (-X), (+Z), and (-Z) sides of the plurality of delivery holes 531 included in this region. The same applies to the second region 533. Furthermore, the same applies to the delivery regions 534 and 535 described later.

[0101] In the gas delivery unit 5, the first region 532 and the second region 533 of the opening 53 are independently opened and closed by the opening and closing portion 541 of the delivery position switching portion 54. Figure 8 and Figure 9In the illustrated example, the opening and closing section 541 includes two plate-like members 542 and 543 arranged side by side in the X-direction within the interior space of the gas flow path 51. The plate-like members 542 and 543 are generally rectangular flat plate members that are approximately perpendicular to the Y-direction and are positioned close to the inner surface of the (+Y)-side sidewall of the gas flow path 51. The plate-like member 542 entirely overlaps the first region 532 of the opening 53 in the Y-direction. The plate-like member 543 entirely overlaps the second region 533 of the opening 53 in the Y-direction.

[0102] The opening and closing section 541 further includes a member moving mechanism 544 for moving the plate member 542 in the Y direction, and a member moving mechanism 545 for moving the plate member 543 in the Y direction. The driving sources of the member moving mechanisms 544 and 545 are, for example, linear servo motors or a motor mounted on a ball screw.

[0103] When the plate-shaped member 542 is moved in the (+Y) direction by the member moving mechanism 544 and abuts the (+Y)-side sidewall of the gas flow path 51, the first region 532 of the opening 53 is closed. On the other hand, when the plate-shaped member 542 is moved in the (-Y) direction by the member moving mechanism 544 and moves away from the (+Y)-side sidewall of the gas flow path 51, the first region 532 of the opening 53 is opened. Furthermore, when the plate-shaped member 543 is moved in the (+Y) direction by the member moving mechanism 545 and abuts the (+Y)-side sidewall of the gas flow path 51, the second region 533 of the opening 53 is closed. On the other hand, when the plate-shaped member 543 is moved in the (-Y) direction by the member moving mechanism 545 and moves away from the (+Y)-side sidewall of the gas flow path 51, the second region 533 of the opening 53 is opened.

[0104] In the gas delivery section 5, when the head unit 43 is located at the second drawing position, as shown in FIG. Figure 9 As shown, by using the air supply control unit 115 of the control unit 10 (see Figure 3 ) controls the delivery position switching unit 54 to open the second area 533 of the opening 53 and close the first area 532. Specifically, by controlling the component moving mechanisms 544 and 545 using the air supply control unit 115, the plate-shaped component 542 abuts against the side wall on the (+Y) side of the gas flow path 51 to cover all the multiple delivery holes 531 arranged in the first area 532, and the plate-shaped component 543 moves away from the side wall on the (+Y) side of the gas flow path 51 in the (-Y) direction. As a result, gas is delivered from the second area 533 of the opening 53 toward the head unit 43, and gas is not delivered from the first area 532. That is, the second area 533 of the opening 53 becomes the gas delivery outlet 56 that delivers gas toward the head unit 43. In the following description, the position of the gas delivery outlet 56 at this time is also referred to as the "second delivery position."

[0105] On the other hand, when the head unit 43 is in the first drawing position, the air supply control unit 115 of the control unit 10 controls the delivery position switching unit 54, opening the first region 532 of the opening 53 and closing the second region 533. Specifically, the air supply control unit 115 controls the component moving mechanisms 544 and 545, causing the plate-shaped member 542 to move away from the (+Y) side wall of the gas flow path 51 in the (-Y) direction. The plate-shaped member 543 then abuts the (+Y) side wall of the gas flow path 51, covering all of the delivery holes 531 arranged in the second region 533. Consequently, gas is delivered from the first region 532 of the opening 53 toward the head unit 43, while gas is not delivered from the second region 533. In other words, the first region 532 of the opening 53 serves as the gas delivery outlet 56 that delivers gas toward the head unit 43. In the following description, the position of the gas delivery outlet 56 at this time is also referred to as the "first delivery position." The first delivery position is located at substantially the same position as the second delivery position in the Y direction and the Z direction, and is located on the (−X) side of the second delivery position.

[0106] In the gas delivery unit 5, the position of the gas delivery port 56 is switched by the delivery position switching unit 54 between a first delivery position, which faces the head unit 43 in the Y direction when the head unit 43 is in the first drawing position, and a second delivery position, which faces the head unit 43 in the Y direction when the head unit 43 is in the second drawing position. This allows temperature-controlled gas to be supplied from the gas delivery port 56 to the interior of the head cover 44, regardless of whether the head unit 43 is in the first or second drawing position. Furthermore, an opening 53 is provided in the (+Y)-side sidewall of the gas flow path 51, extending substantially the entire length in the X direction from the first delivery position to the second delivery position.

[0107] Figure 10 and Figure 8 Similarly, this is a rear view of the surface on the (+Y) side of the gas flow path 51 as viewed from the (+Y) side. Figure 10 In FIG. 5 , a portion of the projection optical system 413 of the plurality of drawing heads 41 located on the (+Y) side of the gas flow path 51 is also drawn with a thin solid line. Figure 10 , the state in which the head unit 43 is located at the first drawing position and the first region 532 of the opening 53 serves as the gas delivery port 56 (ie, the gas delivery port 56 is located at the first delivery position) is shown.

[0108] exist Figure 10 In the example shown, the plurality of delivery holes 531 arranged in the first area 532 are divided into seven groups arranged in the X direction. The plurality of delivery holes 531 included in each group are arranged substantially evenly in a matrix in the X direction and the Z direction. Figure 10In the figure, the area where the multiple delivery holes 531 included in each group are arranged (hereinafter also referred to as the "delivery area") is surrounded by a double-dashed line. The first area 532 includes six delivery areas 534 of approximately equal size and one delivery area 535 whose width in the X direction is smaller than that of the delivery areas 534. Delivery area 535 is arranged on the (-X) side relative to the six delivery areas 534. Each delivery area 534 and delivery area 535 is a roughly rectangular area. Furthermore, the number of delivery holes 531 included in each delivery area 534 and 535 can be varied in various ways.

[0109] The six delivery areas 534 are spaced apart from each other in the X direction. In other words, in two adjacent delivery areas 534 in the X direction, the shortest distance in the X direction between a delivery hole 531 in one delivery area 534 and a delivery hole 531 in the other delivery area 534 is greater than the distance in the X direction between two adjacent delivery holes 531 in each delivery area 534. Furthermore, the delivery area 535 is also spaced apart in the X direction from the delivery area 534 closest to the (-X) side of the six delivery areas 534.

[0110] The six delivery areas 534 are connected to the gas inlet 441 of the head cover 44 (see Figure 7 ) are opposed to the projection optical systems 413 of the six drawing heads 41 in the Y direction. Specifically, the X-direction center of each delivery region 534 is located at approximately the same position in the X direction as the X-direction center of the opposing drawing head 41. This prevents the gas supplied from the gas delivery port 56 of the gas flow path 51 to the interior of the head cover 44 from being biased toward any particular drawing head 41, enabling efficient and substantially uniform temperature control of the six drawing heads 41.

[0111] In addition, Figure 10 In the example shown, the delivery area 535 does not face any of the drawing heads 41. For example, during the aforementioned multi-pass drawing method in which the head unit 43 moves in the X direction, the delivery area 535 covers the (-X)-direction movement range of the drawing head 41 closest to the (-X) side among the six drawing heads 41. Specifically, when the drawing head 41 closest to the (-X) side is located at the first drawing position, gas is supplied to it from the delivery area 534 and the delivery area 535 closest to the (-X) side.

[0112] In the second region 533, the arrangement of the plurality of delivery holes 531, the arrangement of the delivery areas 534 and 535, and the positional relationship between the delivery areas 534 and 535 and the plurality of drawing heads 41 when the head unit 43 is in the second drawing position are substantially the same as those described above for the first region 532. For example, when the head unit 43 is in the second drawing position, the six delivery areas 534 in the second region 533 face the projection optical systems 413 of the six drawing heads 41 in the Y direction via the gas inlet 441 of the head cover 44.

[0113] Figure 11 This is a front view of the head unit 43 viewed from (-Y). As described above, the gas inlet 441 faces the six drawing heads 41 in the Y direction. In the area facing the gas inlet 441 in the head cover 44, a partition wall 443 is provided between each two drawing heads 41 adjacent in the X direction. Figure 11 In the illustrated example, seven partition walls 443 are disposed between each of the six projection optical systems 413, and on the (+X) and (-X) sides of each of the six projection optical systems 413. The seven partition walls 443 have approximately the same shape and size. The partition walls 443 are flat plate-shaped members that are approximately perpendicular to the X direction. The partition walls 443 preferably extend from a position closer to the (+Y) side of the projection optical system 413 to a position closer to the (-Y) side of the projection optical system 413. The length of the partition walls 443 in the Z direction is longer than the length of the gas inlet 441 in the Z direction, and the partition walls 443 vertically bisect the entire length of the gas inlet 441 in the Z direction when viewed from above. Thus, by providing the partition walls 443 separating two adjacent drawing heads 41 in the region facing the gas inlet 441 within the head cover 44, it is possible to prevent gas from being supplied from the gas delivery unit 5 to one drawing head 41, thereby enabling efficient and substantially uniform temperature regulation of the six drawing heads 41.

[0114] Next, explain Figure 1 The process of drawing a pattern on a substrate 9 in the drawing device 1 shown in FIG. When drawing a pattern in the drawing device 1, first, the substrate 9 is loaded onto the first stage 21a, and the imaging head 31 located at the first imaging position performs alignment processing on the substrate 9. Then, the head unit 43 located at the first imaging position draws a pattern on the substrate 9 on the first stage 21a. At this time, the gas delivery unit 5 is switched to the delivery position switching unit 54 (see FIG. Figure 9 ) The position of the gas outlet 56 is set to the first delivery position, and the temperature-controlled gas is supplied from the gas delivery unit 5 to the interior of the head cover 44 of the head unit 43 located at the first drawing position. Figure 4) is maintained at a temperature substantially equal to the predetermined target temperature. Furthermore, in parallel with the drawing of the substrate 9 on the first stage 21a, the substrate 9 is loaded onto the second stage 21b, and alignment processing of the substrate 9 is performed using the imaging head 31 moved to the second imaging position.

[0115] When the drawing of the pattern on the substrate 9 on the first stage 21a is completed, the head unit 43 moves from the first drawing position to the second drawing position and begins drawing the pattern on the substrate 9 on the second stage 21b. At this point, the gas delivery port 56 in the gas delivery unit 5 is switched from the first delivery position to the second delivery position by the delivery position switching unit 54, and temperature-controlled gas is supplied from the gas delivery unit 5 to the interior of the head cover 44 of the head unit 43 in the second drawing position. This maintains the temperature of the multiple drawing heads 41 at approximately the same target temperature. Furthermore, as described above, since the gas delivery unit 5 is fixed to the frame 7, it does not move even when the head unit 43 moves.

[0116] In parallel with the drawing process on the substrate 9 on the second stage 21b, the drawing apparatus 1 unloads the finished substrate 9 on the first stage 21a from the drawing apparatus 1 and loads a new substrate 9 onto the first stage 21a, where alignment processing and other processes are performed. In this way, the drawing apparatus 1 alternates between drawing on the substrates 9 on the first stage 21a and the second stage 21b, thereby improving throughput. Furthermore, when the head unit 43 is in either the first or second drawing position, temperature-controlled gas is supplied from the gas delivery unit 5 to regulate the temperature of the drawing head 41.

[0117] Furthermore, the gas delivery unit 5 can also be applied to drawing devices other than the dual-stage drawing device 1. For example, in a drawing device having only a single stage for holding the substrate 9, when performing multi-pass drawing, the gas delivery unit 5 can supply temperature-regulated gas to the head unit 43, which is moving stepwise in the sub-scanning direction. In this case, when the head unit 43 is in the first head position, which is one position in the sub-scanning direction, the gas delivery port 56 in the gas delivery unit 5 is positioned at the first delivery position; when the head unit 43 is in the second head position, which is another position in the sub-scanning direction, the gas delivery port 56 is positioned at the second delivery position. Thus, temperature-regulated gas can be supplied to the interior of the head cover 44 regardless of whether the head unit 43 is in the first or second head position.

[0118] As described above, the drawing device 1 for drawing on a substrate 9 includes a substrate holder (e.g., the first stage 21a), a substrate moving mechanism (e.g., the first moving mechanism 22a), a head unit 43, a drawing head moving mechanism 42, and a gas delivery unit 5. The substrate holder holds the substrate 9 in a horizontal position. The substrate moving mechanism moves the substrate holder horizontally along a substrate movement path. The head unit 43 includes a drawing head 41 and a head cover 44. The drawing head 41 is positioned above the substrate holder and irradiates the substrate 9 with light to draw a pattern. The head cover 44 houses the drawing head 41. The drawing head moving mechanism 42 moves the head unit 43 horizontally between a first head position and a second head position (in the above example, between the first and second drawing positions) along a head movement path that intersects the substrate movement path when viewed from above. The gas delivery unit 5 is positioned along the head movement path. The gas delivery unit 5 can supply temperature-controlled gas to the interior of the head cover 44 regardless of whether the head unit 43 is in the first or second head position.

[0119] The gas delivery unit 5 includes a gas flow path 51 for gas flow, a gas delivery port 56, and a delivery position switching unit 54. The gas flow path 51 extends along the head movement path from the first head position to the second head position. The gas delivery port 56 is provided at a portion of the gas flow path 51 that faces the head unit 43 and delivers gas toward the gas inlet 441 of the head cover 44. The delivery position switching unit 54 switches the position of the gas delivery port 56 between a first delivery position facing the head unit 43 in the first head position and a second delivery position facing the head unit 43 in the second head position.

[0120] In this manner, in the rendering apparatus 1, the position of the gas outlet 56 in the gas flow path 51, which extends from the first head position to the second head position, is switched between the first and second delivery positions. This allows the gas flow path 51 to be moved with the movement of the head unit 43, without causing the gas flow path 51 to move. Temperature-regulated gas can be supplied to the head unit 43 in either the first or second head position. Therefore, compared to a situation where the gas flow path 51 also moves in conjunction with the movement of the head unit 43, adverse effects caused by changes in the shape of the piping, etc., that supplies gas to the gas flow path 51 (e.g., a reduction in the flow rate of gas delivered from the gas outlet 56 or uneven flow distribution) can be prevented. Consequently, the temperature of the rendering head 41 can be effectively regulated as it moves along the head movement path.

[0121] As described above, the gas flow path 51 preferably includes an opening 53 extending from the first delivery position to the second delivery position. Furthermore, the delivery position switching unit 54 preferably includes an opening / closing unit 541 that opens and closes the first region 532 of the opening 53 that faces the head unit 43 in the first head position and the second region 533 that faces the head unit 43 in the second head position. In the rendering apparatus 1, the opening / closing unit 541 opens the first region 532 of the opening 53 and closes the second region 533, thereby placing the gas delivery port 56 in the first delivery position. Furthermore, the opening / closing unit 541 closes the first region 532 of the opening 53 and opens the second region 533, thereby placing the gas delivery port 56 in the second delivery position. This configuration allows the gas delivery port 56 in the gas delivery unit 5 to be easily switched between the first and second delivery positions.

[0122] As described above, the gas outlet 56 preferably includes a plurality of outlet holes 531 distributed in the portion of the gas flow path 51 facing the head unit 43. This improves the uniformity of the flow rate of the gas delivered from the gas outlet 56.

[0123] The drawing device 1 preferably further includes a temperature sensor 55 for measuring the temperature of the drawing head 41, and a temperature adjustment unit 57 for adjusting the temperature of the gas supplied to the gas delivery unit 5 based on the output from the temperature sensor 55. This allows for highly accurate adjustment of the temperature of the gas supplied from the gas delivery unit 5 into the head cover 44. As a result, the temperature of the drawing head 41 can be well maintained at approximately the same target temperature.

[0124] As described above, the head unit 43 preferably further includes another drawing head 41 for drawing a pattern by irradiating light onto the substrate 9. This other drawing head 41 is adjacent to the drawing head 41 within the head cover 44 and is arranged along the head movement path (in the above example, along the X direction) along with the drawing head 41. Thus, by including multiple drawing heads 41 in the head unit 43, the throughput of the drawing device 1 can be increased.

[0125] Preferably, the gas delivery port 56 of the gas delivery unit 5 includes a delivery region 534 facing the aforementioned drawing head 41, and another delivery region 534 spaced apart from the delivery region 534 and facing the aforementioned other drawing heads 41. This prevents the gas supplied from the gas delivery unit 5 into the head cover 44 from being biased toward any one of the multiple drawing heads 41. Consequently, the temperatures of the multiple drawing heads 41 can be efficiently and evenly adjusted.

[0126] Furthermore, in the head unit 43, a partition wall 443 is preferably provided in a region of the head cover 44 that faces the gas inlet 441, separating the aforementioned drawing head 41 from the other drawing heads 41. This prevents the gas supplied from the gas delivery unit 5 into the head cover 44 from being biased toward a particular drawing head 41 among the multiple drawing heads 41. As a result, the temperatures of the multiple drawing heads 41 can be efficiently and substantially evenly regulated.

[0127] As described above, the drawing apparatus 1 preferably further includes another substrate holding portion (the second stage 21b in the above example) and another substrate moving mechanism (the second moving mechanism 22b in the above example). This other substrate holding portion is positioned adjacent to the aforementioned substrate holding portion (the first stage 21a in the above example) and holds the substrate 9 in a horizontal position. This other substrate moving mechanism is positioned side by side with the aforementioned substrate moving mechanism (the first moving mechanism 22a in the above example) in a direction intersecting the substrate movement path (the first substrate movement path in the above example). This other substrate moving mechanism moves the other substrate holding portion horizontally along another substrate movement path (the second substrate movement path in the above example) that is parallel to the substrate movement path. The first head position is the first drawing position above the substrate holding portion (the first stage 21a), where light is irradiated onto the substrate 9 on the substrate holding portion. Furthermore, the second head position is the second drawing position above the other substrate holding portion (the second stage 21b), where light is irradiated onto the substrate 9 on the other substrate holding portion.

[0128] As described above, the drawing device 1 can effectively regulate the temperature of the drawing head 41 as it moves along the head movement path. Therefore, the structure of the drawing device 1 is particularly suitable for a dual-stage drawing device 1 having a head unit 43 that moves a relatively large distance between a first drawing position on the first stage 21a and a second drawing position on the second stage 21b.

[0129] In the rendering apparatus 1 , the shape of the gas delivery port 56 in the gas delivery unit 5 can be changed in various ways. Figure 12 This is a rear view showing another preferred gas flow path 51a, which is different from the above Figure 10In the gas flow path 51a, the multiple delivery holes 531 are dispersedly arranged at positions opposing the projection optical systems 413 of the multiple drawing heads 41 in the Y direction, but are not arranged at positions opposing the X-direction center (i.e., the widthwise center) of each projection optical system 413 in the Y direction. In other words, in the gas delivery section 5a, the gas delivery ports 56a of the gas flow path 51a oppose the projection optical systems 413 of the drawing heads 41, but avoid positions opposing the widthwise center of the projection optical systems 413 and are arranged on both sides of that position in the width direction (i.e., on the (+X) and (-X) sides). This prevents the flow of gas delivered from the gas delivery ports 56a into the head cover 44 from colliding with the widthwise center of the projection optical system 413 and becoming turbulent, allowing the gas to flow smoothly from the (+X) and (-X) sides of the projection optical system 413 to the (+Y) side of the projection optical system 413. As a result, the temperature of the entire projection optical system 413 can be effectively regulated.

[0130] In the rendering apparatus 1 , the structure of the delivery position switching unit 54 in the gas delivery unit 5 can be changed in various ways. Figure 13 This is a rear view showing another preferred gas flow path 51b, which is different from the above Figure 8 correspond. Figure 14 is a cross-sectional view showing the gas flow path 51b, which is similar to the above Figure 9 Corresponding. Figure 13 and Figure 14 In the example shown, a substantially rectangular opening 548 extending in the X direction is provided on the side wall of the gas flow path 51b on the (+Y) side. The opening 548 is opposite to the gas inlet 441 of the head unit 43 in the Y direction. The opening 548 extends from a position opposite to the head unit 43 in the first drawing position in the Y direction to a position opposite to the head unit 43 in the second drawing position in the Y direction. Figure 14 , the head unit 43 is drawn in a state where it is located at the first drawing position.

[0131] In the internal space of the gas flow path 51b, there is provided a first region 532 (see Figure 8 ) is arranged approximately perpendicular to the Y direction. The movable member 546, which has a plurality of delivery holes 531 corresponding to the respective delivery holes 531, is arranged approximately perpendicular to the Y direction. The movable member 546 abuts the inner surface of the side wall on the (+Y) side of the gas flow path 51b. The movable member 546 extends toward the (+X) and (-X) sides relative to the region 549 where the plurality of delivery holes 531 are provided, covering the entire opening 548 from the (-Y) side. Delivery holes 531 are not provided in the regions of the movable member 546 that are closer to the (+X) and (-X) sides relative to the region 549, and gas does not pass through these regions.

[0132] The movable member 546 is moved in the X direction by the member moving mechanism 547 of the delivery position switching unit 54b. The driving source of the member moving mechanism 547 is, for example, a linear servo motor or a member in which a motor is mounted on a ball screw. Figure 13 and Figure 14 As shown, by positioning the region 549 of the movable member 546 in which the plurality of delivery holes 531 are provided at a position opposing the head unit 43 in the first drawing position in the Y direction, the gas delivery port 56 b is positioned at the first delivery position. Furthermore, by moving the movable member 546 in the (+X) direction and positioning the region 549 in which the plurality of delivery holes 531 are provided at a position opposing the head unit 43 in the second drawing position in the Y direction, the gas delivery port 56 b is positioned at the second delivery position.

[0133] In this manner, the gas outlet 56b is arranged in the gas flow path 51b so as to be movable along the head movement path at a portion of the gas flow path 51b that is opposite the head unit 43 (i.e., the sidewall on the (+Y) side). The gas outlet 56b is moved between the first and second delivery positions by the delivery position switching unit 54b in synchronization with the movement of the head unit 43 between the first and second head positions. In this manner, the position of the gas outlet 56b in the gas delivery unit 5b can be easily switched between the first and second delivery positions by moving a single gas outlet 56b in the X direction, without moving the gas flow path 51b, in a manner substantially similar to the above.

[0134] The above-described rendering device 1 can be modified in various ways.

[0135] For example, the arrangement of the plurality of delivery holes 531 in the gas delivery unit 5 is not limited to Figure 8 and Figure 12 The arrangement shown can be modified in various ways. For example, the multiple delivery holes 531 do not need to be arranged in a plurality of delivery areas 534 corresponding to the multiple drawing heads 41. Instead, they can be distributed roughly evenly in the area facing the multiple drawing heads 41. The same applies to the gas delivery portions 5a and 5b.

[0136] Furthermore, the shape of the delivery holes 531 provided in the gas delivery section 5, as viewed from the Y direction, need not be limited to a circle and may be other shapes (e.g., an elliptical or rectangular shape). Furthermore, in the gas delivery section 5, the gas delivery port 56 need not be a collection of multiple delivery holes 531. For example, it may be a plurality of slits extending in the X or Z direction, or a single large rectangular opening. The same applies to the gas delivery sections 5a and 5b.

[0137] The structure for switching the positions of the gas delivery ports 56 and 56 b is not limited to the structure of the delivery position switching parts 54 and 54 b described above, and may be modified in various ways.

[0138] In the head unit 43 , the above-mentioned partition wall 443 may be omitted.

[0139] In the head unit 43, the temperature of the drawing head 41 measured by the temperature sensor 55 is not necessarily limited to the temperature of the projection optical system 413, and may also be the temperature of a structure other than the projection optical system 413. Alternatively, the temperature sensor 55 may be omitted. In this case, the temperature of the gas supplied from the gas supply source 59 to the gas flow path 51 is maintained at, for example, a predetermined temperature lower than the aforementioned target temperature.

[0140] The drawing device 1 can also detect the position of, for example, semiconductor substrates, glass substrates for flat panel displays such as liquid crystal displays and organic EL displays, glass substrates for photomasks, and substrates for solar cells.

[0141] The configurations in the above-described embodiment and various modifications may be appropriately combined as long as they do not contradict each other.

[0142] Although the invention has been described in detail, the above description is illustrative and not restrictive. Therefore, it can be said that various modifications and aspects can be implemented without departing from the scope of the invention.

[0143] Reference to related applications

[0144] This application claims the benefit of priority from Japanese patent application JP2021-137848 filed on August 26, 2021, the disclosure of which is incorporated herein in its entirety.

Claims

1. A drawing device for drawing on a substrate, characterized in that: have: a substrate holding portion that holds the substrate in a horizontal state; a substrate moving mechanism that causes the substrate holding portion to move horizontally along a substrate moving path; a head unit having a drawing head disposed above the substrate holding portion and configured to irradiate light onto the substrate to draw a pattern, and a head cover accommodating the drawing head; a drawing head moving mechanism that moves the head unit horizontally between a first head position and a second head position along a head moving path that intersects the substrate moving path in a plan view; as well as a gas delivery portion arranged along the head movement path and capable of supplying temperature-regulated gas to the interior of the head cover when the head unit is located at either the first head position or the second head position; The gas delivery unit includes: a gas flow path extending from the first head position to the second head position along the head movement path and through which the gas flows; a gas delivery port provided at a portion of the gas flow path facing the head unit and configured to deliver the gas toward the gas inlet of the head cover; and A delivery position switching unit switches the position of the gas delivery port between a first delivery position facing the head unit located at the first head position and a second delivery position facing the head unit located at the second head position.

2. The drawing device according to claim 1, wherein: The gas flow path is provided with an opening extending from the first delivery position to the second delivery position. The delivery position switching unit includes an opening and closing unit that opens and closes a first area of ​​the opening that faces the head unit located at the first head position and a second area that faces the head unit located at the second head position. The opening and closing portion opens the first region of the opening and closes the second region, thereby setting the position of the gas delivery port to the first delivery position. The opening and closing section closes the first region of the opening and opens the second region, whereby the position of the gas delivery port becomes the second delivery position.

3. The drawing device according to claim 1, wherein: The gas delivery outlet is arranged in a manner capable of moving along the head movement path at a portion of the gas flow path opposite to the head unit, and moves between the first delivery position and the second delivery position in synchronization with the movement of the head unit between the first head position and the second head position through the delivery position switching portion.

4. The drawing device according to any one of claims 1 to 3, characterized in that: The gas delivery port includes a plurality of delivery holes distributed at a portion of the gas flow path facing the head unit.

5. The drawing device according to any one of claims 1 to 3, characterized in that: The gas delivery ports are opposed to the projection optical system of the drawing head and are arranged on both sides in the width direction of a position that is opposed to the center of the projection optical system in the width direction, avoiding the position.

6. The drawing device according to any one of claims 1 to 3, characterized in that: Also features: a temperature sensor for measuring the temperature of the drawing head; and A temperature adjustment unit adjusts the temperature of the gas supplied to the gas delivery unit based on the output from the temperature sensor.

7. The drawing device according to any one of claims 1 to 3, characterized in that: The head unit further includes another drawing head, which is adjacent to the drawing head in the head cover and arranged along the head movement path together with the drawing head, and irradiates light onto the substrate to draw a pattern. The gas delivery outlet has: a delivery area opposite to the drawing head; and Another delivery area is spaced apart from the delivery area and faces the other drawing head.

8. The drawing device according to any one of claims 1 to 3, characterized in that: The head unit further includes another drawing head, which is adjacent to the drawing head in the head cover and arranged along the head movement path together with the drawing head, and irradiates light onto the upper main surface of the substrate to draw a pattern. A partition wall is provided in a region of the head cover facing the gas inlet to separate the drawing head from the other drawing heads.

9. The drawing device according to any one of claims 1 to 3, characterized in that: Also features: another substrate holding portion, which is arranged adjacent to the substrate holding portion and holds the substrate in a horizontal state; and Another substrate moving mechanism is arranged side by side with the substrate moving mechanism in a direction intersecting the substrate moving path, so that the other substrate holding portion moves horizontally along another substrate moving path parallel to the substrate moving path. The first head position is a first drawing position above the substrate holding portion for irradiating light onto the substrate on the substrate holding portion. The second head position is a second drawing position above the other substrate holding portion at which light is irradiated onto the substrate on the other substrate holding portion.

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