Mask cooling device, its cooling method, and lithography machine

Abstract

The present invention provides a mask cooling device and a cooling method thereof, and a photolithography machine; the cooling unit is arranged on a side of the mask containing an exposure area, and a gap for the movement of cooling liquid is formed between the cooling unit and the mask, so that the cooling unit and the mask form liquid contact; the movement control device is connected to the cooling unit; the control unit is electrically and / or communicatively connected to the movement control device and the cooling unit respectively; the control unit is used to control the flow rate and speed of the cooling liquid sprayed out by the cooling unit, and to control the movement control device to drive the cooling unit to move with the scanning exposure light beam; in the present invention, liquid contact is formed between the cooling unit and the mask, so that the mask is in direct contact with the cooling liquid. Since the thermal conductivity of the liquid is significantly higher than that of the gas with the same flow rate, a higher cooling effect can be achieved by cooling with the cooling liquid.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor integrated circuit manufacturing technology, and in particular to a mask cooling device and a cooling method thereof, and a photolithography machine. Background Art

[0002] In the manufacture of products such as integrated circuits (ICs) and thin-film transistor-liquid crystal displays (TFT-LCDs), photolithography machines are among the most important and sophisticated pieces of equipment. In recent years, as the size of photolithographic features has decreased, the wavelength of the light source used for exposure has also decreased, correspondingly transitioning from 365nm mercury lamps to 248nm lasers, even 193nm lasers, and even more so, 13.5nm laser plasma sources.

[0003] Regardless of the light source, when light strikes the reticle, some of the light passes through the reticle and, after passing through a specific imaging system, forms the photolithographic image on the substrate surface. Other light is reflected or absorbed by the chromium layer on the reticle. The absorption of the radiation by the chromium layer causes the reticle to expand thermally, causing deformation and affecting the mask ratio. For different exposure light sources, the mask ratio increases with increasing exposure time.

[0004] Current techniques for cooling reticles all rely on spraying gas onto the reticle surface. Specifically, airflow is used to cool specific areas of the reticle through specially designed cavities and holes. However, this method suffers from low cooling efficiency, making it difficult to offset the heat generated by exposure during production, which can cause distortion in the exposed pattern. To address these issues, the present invention proposes a reticle cooling device, cooling method, and photolithography tool. Summary of the Invention

[0005] The purpose of the present invention is to provide a mask cooling device and a cooling method thereof, and a photolithography machine, the purpose of which is to reduce the heating effect generated during the mask exposure process, so that the mask can maintain a stable temperature during continuous exposure, reduce pattern distortion caused by thermal expansion, and thus ensure the accuracy of the photolithography process.

[0006] To achieve the above-mentioned object, the present invention provides a mask cooling device, comprising a movement control device, a cooling unit and a control unit;

[0007] The cooling unit is arranged on a side of the mask containing the exposure area, and a gap for cooling liquid to move is formed between the cooling unit and the mask, so that the cooling unit and the mask are in liquid contact;

[0008] The movement control device is connected to the cooling unit;

[0009] The control unit is electrically and / or communicatively connected to the mobile control device and the cooling unit respectively; wherein, the control unit is used to control the flow rate and speed of the cooling liquid sprayed by the cooling unit, and to control the mobile control device to drive the cooling unit to move with the scanning exposure beam.

[0010] Optionally, the cooling unit includes a liquid supply component, a liquid recovery component and a connecting component;

[0011] The connecting member includes a connecting plate and a supporting groove, wherein the supporting groove is connected to the connecting plate, wherein the opening of the supporting groove is arranged toward the mask;

[0012] The liquid supply component and the liquid recovery component are both disposed in the support groove, and the liquid supply component and the liquid recovery component are arranged side by side in the longitudinal direction and / or the width direction of the support groove.

[0013] Optionally, the liquid supply component includes a liquid infusion tube, a nozzle and a solenoid valve;

[0014] The nozzle is vertically or obliquely arranged in the support groove;

[0015] The infusion tube is fixed on the support groove, and one end of the infusion tube is in the support groove and connected to the liquid inlet of the nozzle, and the other end of the infusion tube is connected to the source of the cooling liquid;

[0016] The solenoid valve is installed on the infusion tube and is arranged close to the nozzle. After receiving the temperature signal, the control unit controls the solenoid valve to operate and change the size of the liquid flow channel of the infusion tube to control the flow rate and speed of the cooling liquid.

[0017] Optionally, the liquid supply member further includes a heat conducting member, the heat conducting member including a heat conducting rod and a support spring, the heat conducting rod being movably disposed on the nozzle, with one end of the heat conducting rod in contact with the surface of the mask, and the other end of the heat conducting rod extending into a guide hole, the guide hole being provided on the nozzle and the liquid infusion tube;

[0018] The support spring is wound and connected to the outside of the heat-conducting rod, and two ends of the support spring are respectively connected to the side wall of the heat-conducting rod and the nozzle.

[0019] Optionally, the guide hole includes a first transverse section, a vertical section, and a second transverse section, and the vertical section is provided between the first transverse section and the second transverse section for connecting the first transverse section and the second transverse section;

[0020] Wherein, one end of the first transverse section away from the vertical section is communicated with the inner cavity of the infusion tube, and one end of the second transverse section away from the vertical section is communicated with the inner cavity of the support groove.

[0021] Optionally, the liquid recovery component includes a liquid pump and a recovery tube, the recovery tube being disposed in the support groove, the recovery tube including a first section and a second section, the first section having a first end and a second end, the second section having a third end and a fourth end, the first section being plugged into the support groove, the first end of the first section extending into the infusion tube, the second end of the first section being connected to a liquid inlet of the liquid pump, the third end of the second section being connected to a liquid outlet of the liquid pump, and the fourth end of the second section being suspended in the inner cavity of the support groove and disposed close to the mask;

[0022] The liquid extraction pump is fixedly arranged on the supporting groove to extract the cooling liquid in the supporting groove into the infusion tube.

[0023] Optionally, the liquid recovery component further includes a blower, which is disposed on the supporting groove, and an air outlet of the blower is disposed toward the mask.

[0024] Optionally, the movement control device includes a driving cylinder and a cylinder arm, one end of the cylinder arm is connected to the connecting plate, and the other end is connected to the driving end of the driving cylinder, wherein the driving direction of the driving cylinder is parallel to the surface of the mask exposure area.

[0025] A mask cooling method, which uses the mask cooling device to cool the mask, specifically comprises the following steps:

[0026] S1: The scanning exposure beam moves relative to the mask to form a projection through the mask;

[0027] S2: The control unit is configured to control the cooling unit to spray cooling liquid to form liquid contact between the cooling unit and the mask;

[0028] S3: The control unit controls the movement control device to drive the cooling unit to move along with the scanning exposure light beam, so as to achieve real-time cooling of the mask.

[0029] A photolithography machine comprises a base for placing the mask and the mask cooling device.

[0030] The beneficial effects of the present invention are as follows:

[0031] In the present invention, liquid contact is formed between the cooling unit and the mask, thereby achieving direct contact between the mask and the cooling liquid. Since the thermal conductivity of the liquid is significantly higher than that of gas with the same flow rate, a higher cooling effect can be achieved by cooling with the cooling liquid. In addition, direct contact with the liquid can also clean the quartz surface of the mask, thereby improving exposure accuracy. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 Schematic diagram of the structure of an embodiment of the present invention;

[0033] Figure 2 It is a schematic structural diagram of the cooling unit of the present invention;

[0034] Figure 3 For the present invention Figure 2 Enlarged diagram of structure B in the middle

[0035] Figure 4 Schematic diagram of the heat conducting member structure of the present invention;

[0036] Figure 5 This is a schematic structural diagram of the liquid recovery component of the present invention;

[0037] Figure 6 Schematic diagram of the structure of the mobile control device of the present invention;

[0038] Figure 7 A schematic diagram of the process structure of the mask cooling method of the present invention;

[0039] Figure 8 It is a schematic diagram of the structure of the photolithography machine of the present invention.

[0040] Reference numerals

[0041] Mask 1,

[0042] Cooling unit 2,

[0043] Liquid supply part 21, nozzle 211, liquid infusion tube 212,

[0044] Liquid recovery unit 22, liquid pump 221, recovery pipe 222,

[0045] Connecting piece 23, supporting groove 231, connecting plate 232,

[0046] Heat conducting member 24, heat conducting rod 241, support spring 242,

[0047] The guide hole 243, the first transverse section 2431, the vertical section 2432, the second transverse section 2433, the movement control device 3, the driving cylinder 31, the cylinder arm 32,

[0048] Abutment 4. DETAILED DESCRIPTION

[0049] In order to make the purpose, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention. Unless otherwise defined, the technical terms or scientific terms used herein should be the common meanings understood by people with ordinary skills in the field to which the present invention belongs. The words "including" and similar words used in this article mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0050] In order to solve the problems existing in the prior art, an embodiment of the present invention provides a mask cooling device for cooling a mask 1 on a lithography machine during photolithography. The mask cooling device includes a movement control device 3, a cooling unit 2 and a control unit (not shown). Figure 1 As shown. The cooling unit 2 is arranged on the side of the mask 1 containing the exposure area, and a gap is formed between the cooling unit 2 and the mask 1 for the movement of cooling liquid, so that the cooling unit 2 and the mask 1 are in liquid contact. In the prior art, during photolithography, the mask 1 is cooled by spraying gas onto the surface of the mask 1. Gas cooling has low cooling efficiency and is difficult to offset the exposure heating during the production process, which will cause the exposure pattern to be distorted. In the present invention, the cooling unit 2 forms liquid contact with the mask 1, realizing direct contact between the mask 1 and the cooling liquid. Since the thermal conductivity of the liquid is significantly higher than that of the gas with the same flow rate, a higher cooling effect can be achieved by cooling with the cooling liquid; and the direct contact of the liquid can also clean the quartz surface of the mask 1, thereby improving the exposure accuracy.

[0051] The mobile control device 3 is connected to the cooling unit 2. The control unit is electrically and / or communicatively connected to the mobile control device 3 and the cooling unit 2 respectively; wherein the control unit is used to control the flow rate and speed of the cooling liquid sprayed out by the cooling unit 2, and to control the mobile control device 3 to drive the cooling unit 2 to move along with the scanning exposure beam. Figure 1 In this example, direction A is the direction of the scanning exposure light beam.

[0052] The scanning exposure beam is emitted by a scanning unit (not shown), which is connected to a drive mechanism (not shown). The drive mechanism is electrically and / or communicatively connected to the control unit to ensure that the cooling unit 2 moves synchronously with the scanning exposure beam. Furthermore, the scanning unit is a laser emitter, and the drive mechanism is a movable cylinder.

[0053] The cooling device also includes a collection unit (not shown), which is arranged on the side of the mask 1 containing the exposure area to collect the temperature signal of the exposure area of the mask 1. The setting of the position of the collection unit in this embodiment can more accurately collect the temperature changes of the photoetching surface of the mask 1, thereby improving the accuracy of the equipment collection. Furthermore, the collection unit can be arranged on the lithography machine and / or on the cooling unit 2, preferably on the cooling unit 2, and can follow the cooling unit 2 to more accurately measure the cooling part and monitor the temperature changes of the mask 1 in real time, thereby making the temperature collection more accurate. Furthermore, the collection unit can be a temperature sensor.

[0054] In this embodiment, the cooling unit 2 includes a liquid supply component 21, a liquid recovery component 22 and a connecting component 23. Figure 2 and Figure 3 The connecting member 23 includes a connecting plate 232 and a supporting groove 231. The supporting groove 231 is connected to the connecting plate 232, wherein the opening of the supporting groove 231 is disposed toward the mask 1. The liquid supply member 21 and the liquid recovery member 22 are both disposed within the supporting groove 231, and the liquid supply member 21 and the liquid recovery member 22 are disposed side by side in the longitudinal and / or width directions of the supporting groove 231.

[0055] Among them, the opening direction of the support groove 231 is set toward the mask 1, so that the gap is formed between the support groove 231 and the mask 1. When the cooling liquid is filled in the gap, the cooling unit 2 can form liquid contact with the mask 1. At the same time, due to the existence of the gap, the hot air between the inner cavity of the support groove 231 and the mask 1 can flow out smoothly through the gap, thereby achieving the effect of heat dissipation. In addition, the size of the gap is small, which can prevent the cooling liquid from flowing out of the inner cavity of the support groove 231 in large quantities, thereby ensuring that the mask 1 in the liquid contact area achieves an effective cooling effect.

[0056] In this embodiment, the liquid supply member 21 includes a liquid infusion tube 212, a nozzle 211 and a solenoid valve (not shown). Figure 3The nozzle 211 is vertically or obliquely arranged in the support groove 231. Preferably, the nozzle 211 is obliquely arranged in the support groove 231. In this way, when the cooling liquid is sprayed from the nozzle 211 toward the mask 1, it can form an acute angle with the mask 1, thereby preventing the cooling liquid from vertically impacting the mask 1 and protecting the mask 1. At the same time, the existence of the acute angle in the cooling liquid spray direction can better cut into the connection between debris and the mask 1, thereby better cleaning the debris.

[0057] The infusion tube 212 is fixed on the support groove 231, and one end of the infusion tube 212 is in the support groove 231 and connected to the liquid inlet of the nozzle 211, and the other end of the infusion tube 212 is connected to the source of the cooling liquid (not shown). Figure 3 The source is used to provide the cooling liquid under pressure.

[0058] The solenoid valve is mounted on the liquid infusion tube 212 and positioned near the nozzle 211. Upon receiving the temperature signal, the control unit controls the operation of the solenoid valve, thereby changing the size of the liquid flow channel in the liquid infusion tube 212 to control the flow rate and speed of the cooling liquid. In this embodiment, the configuration of the solenoid valve allows for better control of the speed and flow of the cooling liquid. Specifically, when the temperature of the reticle 1 is high, the liquid flow channel in the liquid infusion tube 212 is enlarged, allowing more cooling liquid to be sprayed out in the same amount of time. This also increases the flow rate of the cooling liquid, thereby accelerating the cooling rate of the reticle 1 and achieving rapid cooling of the reticle 1.

[0059] In this embodiment, the liquid supply member 21 further includes a heat conducting member 24, see Figure 4 The heat conducting member 24 includes a heat conducting rod 241 and a support spring 242. The heat conducting rod 241 is movably arranged on the nozzle 211, and one end of the heat conducting rod 241 contacts the surface of the mask 1. The other end of the heat conducting rod 241 extends into the guide hole 243. The guide hole 243 is provided on the nozzle 211 and the infusion tube 212. Figure 4 As shown, the heat conducting rod 241 is vertically movably provided on the nozzle 211. The lower end of the heat conducting rod 241 is in direct contact with the mask 1, so that the heat on the mask 1 can be conducted into the guide hole 243, thereby further achieving the effect of heat dissipation.

[0060] The support spring 242 is wound around and connected to the outside of the heat-conducting rod 241. The two ends of the support spring 242 are respectively connected to the side wall of the heat-conducting rod 241 and the nozzle 211. The support spring 242 is used to provide a reset force and a supporting force. Specifically, the movement of the heat-conducting rod 241 relative to the nozzle 211 is carried out under the resistance of the mask 1. Therefore, the movable arrangement of the heat-conducting rod 241 and the nozzle 211 can protect the mask 1. During the movement of the heat-conducting rod 241, the support spring 242 provides support to prevent the heat-conducting rod 241 from falling off the nozzle 211. After the heat-conducting rod 241 loses its resistance to the nozzle 211, the support spring 242 provides a reset force, causing the heat-conducting rod 241 to return to its initial position.

[0061] In this embodiment, please continue to refer to Figure 4 As shown, the guide hole 243 includes a first transverse section 2431, a vertical section 2432, and a second transverse section 2433. The vertical section 2432 is disposed between the first transverse section 2431 and the second transverse section 2433, and is configured to connect the first transverse section 2431 and the second transverse section 2433. The end of the first transverse section 2431 away from the vertical section 2432 communicates with the inner cavity of the infusion tube 212, and the end of the second transverse section 2433 away from the vertical section 2432 communicates with the inner cavity of the support groove 231.

[0062] The setting of the guide hole 243 can be used to guide the flow of the cooling liquid. Specifically, the cooling liquid enters the support groove 231 from the infusion tube 212 through the guide hole 243 without passing through the inner cavity of the nozzle 211. Figure 4 In this embodiment, the first transverse section 2431 is horizontally disposed on the liquid infusion tube 212 and the nozzle 211, the vertical section 2432 is vertically disposed on the nozzle 211, and the second transverse section 2433 is horizontally disposed on the nozzle 211. The first transverse section 2431, the vertical section 2432, and the second transverse section 2433 form a Z-shaped structure. The heat-conducting rod 241 is movably disposed within the vertical section 2432. Furthermore, when the heat-conducting rod 241 conducts heat into the guide holes 243, it removes the heat conducted from the heat-conducting rod 241, thereby indirectly cooling the reticle 1.

[0063] In this embodiment, the liquid recovery unit 22 includes a liquid pump 221 and a recovery pipe 222. Figure 5The recovery tube 222 is disposed in the support groove 231 and includes a first section and a second section. The first section has a first end and a second end, and the second section has a third end and a fourth end. The first section is plugged into the support groove 231, and the first end of the first section extends into the infusion tube 212. The second end of the first section is connected to the liquid inlet of the liquid pump 221, and the third end of the second section is connected to the liquid outlet of the liquid pump 221. The fourth end of the second section is suspended in the inner cavity of the support groove 231 and is disposed close to the mask 1. The liquid pump 221 is fixedly arranged on the support groove 231. During cooling, the fourth end of the second section is inserted into the cooling liquid in the support groove 231. When the liquid pump 221 is working, the fourth end of the second section serves as the inlet of the cooling liquid. Through the suction force of the liquid pump 221, the cooling liquid in the support groove 231 is drawn into the infusion pipe 212. This part of the cooling liquid is mixed with the cooling liquid in the infusion pipe 212, thereby achieving cooling of this part of the cooling liquid, and then is sprayed out again to cool the mask, so as to achieve the recycling of the cooling liquid.

[0064] The second section is tilted relative to the scanning exposure beam, and the end surface of the fourth end is tilted relative to the second section to ensure that the end surface of the fourth end is perpendicular to the scanning exposure beam, that is, parallel to the mask 1.

[0065] The liquid pump 221 can be fixedly installed on the inner side wall or the inner top wall of the support groove 231 , or can be installed on the outer side wall of the support groove 231 .

[0066] In this embodiment, the liquid recovery component 22 further includes a hair dryer (not shown), which is arranged on the support groove 231, and the air outlet of the hair dryer is arranged toward the mask 1. The hair dryer is used to dry the residual cooling liquid on the mask 1, or to blow away the residual debris on the mask 1; when drying the residual cooling liquid on the mask 1, the mask 1 can be further cooled during the evaporation of the cooling liquid; when blowing away the residual debris on the mask 1, the quartz surface of the mask 1 can be kept clean. Specifically, the hair dryer can be arranged on the inner top wall or inner side wall of the support groove 231, but when it is arranged on the inner top wall or inner side wall, it needs to be sealed, or the hair dryer can be arranged on the outer side wall of the support groove 231.

[0067] In this embodiment, the mask cooling device further includes a movement control device 3, see Figure 6As shown. The mobile control device 3 is connected to the cooling unit 2 and controls the cooling unit 2 to move relative to the mask 1 after receiving the temperature signal. The mobile control device 3 includes a drive cylinder 31 and a cylinder arm 32. One end of the cylinder arm 32 is connected to the connecting plate 232, and the other end is connected to the drive end of the drive cylinder 31. The drive direction of the drive cylinder 31 is parallel to the surface of the exposure area of the mask 1. The limitation of the drive direction allows the mobile control device 3 to move parallel to the mask 1 with the cooling unit 2, preventing the surface of the mask 1 from being scratched during tilting movement.

[0068] The motion control device 3 is configured to move the cooling unit 2 relative to the reticle 1. During the photolithography process, the scanning exposure beam constantly moves. The motion control device 3 can move the cooling unit 2 along the upper surface of the reticle 1, thereby cooling the reticle 1 through direct contact with the cooling liquid and evaporation of residual microdroplets.

[0069] The movement control device 3 is arranged on the photolithography machine table.

[0070] See also Figure 7 As shown, the present invention also provides a mask cooling method, which uses the mask cooling device to cool the mask 1, specifically comprising the following steps:

[0071] S1: The scanning exposure beam moves relative to the mask to form a projection through the mask;

[0072] Specifically, the mask has two parts, one part contains chromium metal and the other part does not. The driving mechanism moves the scanning unit relative to the mask. During the movement, when the scanning exposure beam is irradiated on the mask, it is blocked by the part with the chromium metal and can irradiate downwards in the part without the chromium metal, thereby forming a projection process below the mask.

[0073] S2: The control unit is configured to control the cooling unit to spray cooling liquid to form liquid contact between the cooling unit and the mask;

[0074] Specifically, the control unit sends a control signal to the cooling unit, which is a temperature signal collected by the acquisition unit on the reticle. Upon receiving the temperature signal, the control unit controls the cooling unit to spray cooling liquid. Specifically, upon receiving the temperature signal, the control unit controls the movement of a solenoid valve to open the liquid flow channel of the liquid infusion tube 212, or to change the size of the liquid flow channel of the liquid infusion tube 212, thereby spraying cooling liquid onto the reticle 1, or adjusting the flow rate and speed of the cooling liquid.

[0075] S3: The control unit controls the movement control device to drive the cooling unit to move along with the scanning exposure beam, so as to achieve real-time cooling of the mask;

[0076] Specifically, after receiving the temperature signal, the control unit controls the movement control device 3 to move the cooling unit 2 relative to the mask 1. During the movement of the cooling unit 2 relative to the mask 1, the contact between the heat-conducting rod 241 and the mask 1 transfers the heat on the mask 1 to the cooling liquid in the liquid delivery tube 212.

[0077] At the same time, after receiving the temperature signal, the control unit controls the liquid extraction pump 221 to start, and extracts the cooling liquid that has been cooled in the support tank 231 into the infusion pipe 212 through the recovery pipe 222, so that the cooling liquid in the infusion pipe 212 that has not absorbed heat continues to enter the support tank 231.

[0078] Moreover, after receiving the temperature signal, the control unit controls the blower to operate and blow air toward the mask 1 , so as to achieve the effects of drying the mask 1 and further cooling it.

[0079] See also Figure 8 As shown, the present invention further provides a photolithography machine, comprising a base 4 for placing the mask 1, and the mask cooling device.

[0080] In the present invention, liquid contact is formed between the cooling unit 2 and the mask 1, thereby achieving direct contact between the mask 1 and the cooling liquid. Since the thermal conductivity of the liquid is significantly higher than that of the gas with the same flow rate, a higher cooling effect can be achieved by cooling with the cooling liquid. In addition, direct contact with the liquid can also clean the quartz surface of the mask 1, thereby improving exposure accuracy.

[0081] While the embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations of these embodiments are possible. However, it should be understood that such modifications and variations are within the scope and spirit of the present invention as set forth in the claims. Furthermore, the invention described herein is susceptible to other embodiments and may be practiced or implemented in a variety of ways.

Claims

1. A mask cooling device, characterized in that: including a movement control device, a cooling unit and a control unit; The cooling unit is arranged on a side of the mask containing the exposure area, and a gap for cooling liquid to move is formed between the cooling unit and the mask, so that the cooling unit and the mask are in liquid contact; The movement control device is connected to the cooling unit; The control unit is electrically and / or communicatively connected to the mobile control device and the cooling unit respectively; wherein, the control unit is used to control the flow rate and speed of the cooling liquid sprayed by the cooling unit, and to control the mobile control device to drive the cooling unit to move with the scanning exposure beam.

2. The mask cooling device according to claim 1, wherein: The cooling unit includes a liquid supply component, a liquid recovery component and a connecting component; The connecting member includes a connecting plate and a supporting groove, wherein the supporting groove is connected to the connecting plate, wherein the opening of the supporting groove is arranged toward the mask; The liquid supply component and the liquid recovery component are both disposed in the support groove, and the liquid supply component and the liquid recovery component are arranged side by side in the longitudinal direction and / or the width direction of the support groove.

3. The mask cooling device according to claim 2, wherein: The liquid supply component includes a liquid infusion tube, a nozzle and a solenoid valve; The nozzle is vertically or obliquely arranged in the support groove; The infusion tube is fixed on the support groove, and one end of the infusion tube is in the support groove and connected to the liquid inlet of the nozzle, and the other end of the infusion tube is connected to the source of the cooling liquid; The solenoid valve is installed on the infusion tube and is arranged close to the nozzle. After receiving the temperature signal, the control unit controls the solenoid valve to operate and change the size of the liquid flow channel of the infusion tube to control the flow rate and speed of the cooling liquid.

4. The mask cooling device according to claim 3, characterized in that: The liquid supply member further includes a heat conducting member, the heat conducting member including a heat conducting rod and a support spring, the heat conducting rod being movably disposed on the nozzle, with one end of the heat conducting rod in contact with the surface of the mask, and the other end of the heat conducting rod extending into a guide hole provided on the nozzle and the liquid infusion tube; The support spring is wound and connected to the outside of the heat-conducting rod, and two ends of the support spring are respectively connected to the side wall of the heat-conducting rod and the nozzle.

5. The mask cooling device according to claim 4, characterized in that: The guide hole includes a first transverse section, a vertical section and a second transverse section, wherein the vertical section is provided between the first transverse section and the second transverse section for connecting the first transverse section and the second transverse section; Wherein, one end of the first transverse section away from the vertical section is communicated with the inner cavity of the infusion tube, and one end of the second transverse section away from the vertical section is communicated with the inner cavity of the support groove.

6. The mask cooling device according to claim 3, wherein: The liquid recovery component includes a liquid pump and a recovery tube, the recovery tube being disposed in the support groove and including a first section and a second section, the first section having a first end and a second end, the second section having a third end and a fourth end, the first section being plugged into the support groove, the first end of the first section extending into the liquid infusion tube, the second end of the first section being connected to the liquid inlet of the liquid pump, the third end of the second section being connected to the liquid outlet of the liquid pump, and the fourth end of the second section being suspended in the inner cavity of the support groove and disposed close to the mask; The liquid extraction pump is fixedly arranged on the supporting groove to extract the cooling liquid in the supporting groove into the infusion tube.

7. The mask cooling device according to claim 6, wherein: The liquid recovery component further includes a blower, which is arranged on the supporting groove, and an air outlet of the blower is arranged toward the mask.

8. The mask cooling device according to claim 2, wherein: The movement control device includes a driving cylinder and a cylinder arm, one end of the cylinder arm is connected to the connecting plate, and the other end is connected to the driving end of the driving cylinder, wherein the driving direction of the driving cylinder is parallel to the surface of the mask exposure area.

9. A method for cooling a mask, characterized in that: Cooling a mask using the mask cooling device according to any one of claims 1 to 8 specifically comprises the following steps: S1: The scanning exposure beam moves relative to the mask to form a projection through the mask; S2: The control unit is configured to control the cooling unit to spray cooling liquid to form liquid contact between the cooling unit and the mask; S3: The control unit controls the movement control device to drive the cooling unit to move along with the scanning exposure light beam, so as to achieve real-time cooling of the mask.

10. A photolithography machine, characterized in that: The invention comprises a base for placing the mask, and the mask cooling device according to any one of claims 1 to 8.

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