Single-pole plate quality detection device, method, server and computer readable storage medium

Abstract

The application provides a single-pole plate quality detection device, method, server and computer readable storage medium; the detection device comprises: a reaction side detection plate configured to contact a reaction side of a single-pole plate; a cooling side detection plate configured to contact a cooling side of the single-pole plate; a measurement assembly electrically connected to the reaction side detection plate and the cooling side detection plate, respectively, for measuring contact resistance; a pressure applying structure configured to apply pressure to at least one of the reaction side detection plate and the cooling side detection plate when the reaction side detection plate and the cooling side detection plate contact two sides of the single-pole plate, respectively; the pressure applying structure applies at least two different preset pressures to at least one of the reaction side detection plate and the cooling side detection plate for determining whether the single-pole plate is deformed or whether the coating is qualified. The detection device of the embodiment of the application aims to find out the cause of poor contact resistance of the single-pole plate.

Description

Technical Field

[0001] This application relates to the field of fuel cell testing technology, specifically to a device, method, server, and computer-readable storage medium for testing the quality of a single plate. Background Technology

[0002] A hydrogen fuel cell consists of multiple individual cells stacked together. The anode plate of one of two adjacent cells contacts the cathode plate of the other for electrical conductivity. The contact resistance between the anode and cathode plates of two adjacent cells is a crucial parameter affecting the performance of the hydrogen fuel cell. Therefore, the contact resistance of the single-pole plates (anode plates and cathode plates) needs to be tested before assembly to determine their usability.

[0003] Many factors influence the quality of a monopolar plate, including design factors, plate deformation, and coating quality. However, current technologies can determine whether a monopolar plate is of acceptable quality, but cannot determine the reasons for its failure. Summary of the Invention

[0004] This application provides a device, method, server, and computer-readable storage medium for detecting the quality of monopolar plates, with the aim of identifying the causes of poor monopolar plate quality.

[0005] Therefore, this application proposes a method for detecting the contact resistance of a single-plate, used in a single-plate quality testing device. The single-plate quality testing device includes: a reaction-side testing plate and a cooling-side testing plate disposed opposite to each other, and a pressure-applying structure for providing pressure to at least one of the reaction-side testing plate and the cooling-side testing plate; the method includes:

[0006] The control reaction-side detection plate and the cooling-side detection plate are in contact with the reaction side and cooling side opposite to the monopolar plate, respectively; wherein, the reaction-side detection plate and the cooling-side detection plate are electrically connected to the measurement component;

[0007] The pressure-applying structure is controlled to apply a first preset pressure to at least one of the reaction-side detection plate and the cooling-side detection plate, and a first contact resistance is obtained;

[0008] The pressure-applying structure is controlled to apply a second preset pressure to at least one of the reaction-side detection plate and the cooling-side detection plate, and a second contact resistance is obtained; wherein the first preset pressure is less than the second preset pressure;

[0009] Determine whether the first contact resistance and the second contact resistance meet the standards.

[0010] If the first contact resistance and the second contact resistance meet the standards, then the contact resistance of the monopolar plate meets the standards; if the first contact resistance does not meet the standards but the second contact resistance does, then the reason for the non-compliance of the contact resistance is determined to be the deformation of the monopolar plate; if both the first contact resistance and the second contact resistance do not meet the standards, then the reason for the non-compliance of the contact resistance is determined to be the substandard coating quality of the monopolar plate.

[0011] Optionally, the reaction-side detection plate includes a first detection plate; the first detection plate has a first active detection area and a first non-detection area disposed around the first active detection area;

[0012] The step of controlling the reaction-side detection plate and the cooling-side detection plate to contact the reaction side and cooling side opposite to the monopolar plate respectively includes:

[0013] The first active detection area is controlled to maintain contact with the active reaction area of ​​the monopolar plate, and the first non-detection area is controlled to maintain a distance from the inactive reaction area of ​​the monopolar plate.

[0014] Optionally, the reaction-side detection plate includes a second detection plate, the second detection plate having a second active detection area and a first edge detection area disposed around the second active detection area;

[0015] The step of controlling the reaction-side detection plate and the cooling-side detection plate to contact the reaction side and cooling side opposite to the monopolar plate respectively includes:

[0016] The second active detection area and the active reaction area of ​​the monopolar plate are kept in contact, and the first edge detection area is kept in contact with the inactive reaction area of ​​the monopolar plate.

[0017] Optionally, the reaction-side detection plate includes a third detection plate, the third detection plate having a second non-detection area and a second edge detection area disposed around the second non-detection area.

[0018] The step of controlling the reaction-side detection plate and the cooling-side detection plate to contact the reaction side and cooling side opposite to the monopolar plate respectively includes:

[0019] The second edge detection area is controlled to contact the inactive reaction area of ​​the monopolar plate, while the second non-detection area and the active reaction area of ​​the monopolar plate are kept at a distance.

[0020] Optionally, the cooling side detection plate includes a flow channel detection area and a third edge detection area surrounding the flow channel detection area;

[0021] The step of controlling the reaction-side detection plate and the cooling-side detection plate to contact the reaction side and cooling side opposite to the monopolar plate respectively includes:

[0022] The flow channel detection area is controlled to contact the cooling flow channel area of ​​the monopolar plate, and the third edge detection area is controlled to contact the flow channel edge area of ​​the monopolar plate.

[0023] Optionally, the step of controlling the pressure-applying structure to apply a second preset pressure to at least one of the reaction-side detection plate and the cooling-side detection plate, and obtaining a second contact resistance, includes: if the first contact resistance is substandard, controlling the pressure-applying structure to apply a second preset pressure to at least one of the reaction-side detection plate and the cooling-side detection plate, and obtaining a second contact resistance.

[0024] This application also proposes a contact resistance measuring device for a single plate, comprising:

[0025] A reaction-side detection plate is disposed facing the reaction side of the monopolar plate and is used to contact the reaction side.

[0026] A cooling-side detection plate is disposed facing the cooling side of the monopole plate and is used to contact the cooling side;

[0027] A measuring component, which is electrically connected to the reaction-side detection plate and the cooling-side detection plate respectively, is used to measure contact resistance;

[0028] A pressure-applying structure configured to apply pressure to at least one of the reaction-side detection plate and the cooling-side detection plate when the reaction-side detection plate is in contact with the reaction side and the cooling-side detection plate is in contact with the cooling side; and

[0029] Processor, the processor being configured as follows:

[0030] The reaction-side detection plate and the cooling-side detection plate are respectively in contact with the reaction side and cooling side opposite to the monopolar plate; wherein, the reaction-side detection plate and the cooling-side detection plate are respectively electrically connected to the measurement component;

[0031] The pressure-applying structure is controlled to apply a first preset pressure to at least one of the reaction-side detection plate and the cooling-side detection plate, and a first contact resistance is obtained;

[0032] The pressure-applying structure is controlled to apply a second preset pressure to at least one of the reaction-side detection plate and the cooling-side detection plate, and a second contact resistance is obtained; wherein the first preset pressure is less than the second preset pressure;

[0033] Determine whether the first contact resistance and the second contact resistance meet the standards.

[0034] If the first contact resistance and the second contact resistance meet the standards, then the contact resistance of the monopolar plate meets the standards; if the first contact resistance does not meet the standards but the second contact resistance does, then the reason for the non-compliance of the contact resistance is determined to be the deformation of the monopolar plate; if both the first contact resistance and the second contact resistance do not meet the standards, then the reason for the non-compliance of the contact resistance is determined to be the substandard coating quality of the monopolar plate.

[0035] Optionally, the pressure-applying structure includes:

[0036] A first clamping plate is disposed on the side of the reaction-side detection plate opposite to the monopolar plate, and is used to contact the first clamping plate; and

[0037] The second clamping plate is disposed on the side of the cooling side detection plate away from the single electrode plate and is used to contact the second clamping plate;

[0038] The first clamping plate and the second clamping plate are configured to jointly apply the first preset pressure and the second preset pressure to the monopolar plate at different times.

[0039] This application also proposes a server comprising: one or more processors; a memory; and one or more applications, wherein the one or more applications are stored in the memory and configured to be executed by the processor to implement the single-plate quality detection method as described above.

[0040] This application also proposes a computer-readable storage medium having a computer program stored thereon, the computer program being loaded by a processor to perform the steps in the method for detecting the quality of a single plate as described above.

[0041] The technical solution of this application embodiment applies different pressures to at least one of the reaction-side detection plate and the cooling-side detection plate using a pressure-applying structure, obtaining two different contact resistances to determine whether the manufacturing quality of the monopolar plate meets the standards and the reasons for any non-compliance. Specifically, if both the first and second contact resistances meet the standards, the manufacturing quality of the monopolar plate meets the standards. If the first contact resistance does not meet the standards, the reasons for the non-compliance may be deformation of the monopolar plate or substandard coating quality. Therefore, in the technical solution of this application embodiment, the pressure-applying structure applies a second preset pressure to at least one of the reaction-side detection plate and the cooling-side detection plate. Since the second preset pressure is greater than the first preset pressure, the monopolar plate is flattened under the action of the second preset pressure, and its deformation is reduced. If the first contact resistance does not meet the standards, but the second contact resistance does, then the reason for the non-compliance of the plate quality is determined to be deformation of the monopolar plate. If both the first and second contact resistances do not meet the standards, then the reason for the non-compliance of the plate quality is substandard coating quality of the monopolar plate. Attached Figure Description

[0042] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0043] Figure 1 This is a schematic flowchart of the method for detecting the quality of a single-plate provided in an embodiment of this application;

[0044] Figure 2 This is a flowchart illustrating the first embodiment of the method for detecting the quality of a single-plate provided in this application.

[0045] Figure 3 This is a flowchart illustrating the second embodiment of the method for detecting the quality of a single-plate provided in this application.

[0046] Figure 4 This is a flowchart illustrating the third embodiment of the method for detecting the quality of a single-plate provided in this application.

[0047] Figure 5 This is a flowchart illustrating the fourth embodiment of the method for detecting the quality of a single-plate provided in this application.

[0048] Figure 6 This is a schematic diagram of the structure of the single-plate quality detection device provided in the embodiments of this application;

[0049] Figure 7This is another structural schematic diagram of the single-plate quality detection device provided in the embodiments of this application;

[0050] Figure 8 This is a schematic diagram of the structure of the first detection plate in the single-plate quality detection device provided in the embodiments of this application;

[0051] Figure 9 This is a schematic diagram of the structure of the second detection plate in the single-plate quality detection device provided in the embodiments of this application;

[0052] Figure 10 This is a schematic diagram of the structure of the third detection plate in the single-plate quality detection device provided in the embodiments of this application.

[0053] List of reference numerals

[0054]

[0055] Detailed Implementation

[0056] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0057] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include one or more of the stated features. In the description of this invention, "a plurality of" means two or more, unless otherwise explicitly specified.

[0058] In this application, the term "exemplary" is used to mean "serving as an example, illustration, or description." Any embodiment described as "exemplary" in this application is not necessarily to be construed as being more preferred or advantageous than other embodiments. The following description is provided to enable any person skilled in the art to make and use the invention. Details are set forth in the following description for purposes of explanation. It should be understood that those skilled in the art will recognize that the invention can be made without using these specific details. In other instances, well-known structures and processes will not be described in detail to avoid obscuring the description of the invention with unnecessary detail. Therefore, the invention is not intended to be limited to the embodiments shown, but is consistent with the broadest scope of the principles and features disclosed in this application.

[0059] Contact resistance between individual cells is a crucial parameter affecting the performance of hydrogen fuel cells. Therefore, before assembly, the contact resistance of the anode and cathode plates (collectively referred to as monopole plates) in each cell needs to be tested to ensure the assembled cells meet the performance requirements of the hydrogen fuel cell. In existing technology, monopole plates with substandard contact resistance are marked as defective and not assembled, leading to material waste. However, it has been verified that some monopole plates with substandard contact resistance can be repaired to meet the requirements, for example, due to deformation or poor coating quality.

[0060] However, existing technologies do not further determine the reasons for the substandard quality of monopolar plates, leading to material waste. Therefore, this application proposes a method for detecting the quality of monopolar plates, aiming to identify the causes of substandard contact resistance, so as to rework monopolar plates with substandard contact resistance, thereby avoiding resource waste and saving production costs.

[0061] Before describing the embodiments of this application, the structure of the monopolar plate will be first described. The monopolar plate has two opposing sides in the thickness direction, one side being the reaction side and the other the cooling side. The reaction side faces the membrane electrode of the single cell after assembly. The cooling side, together with the monopolar plate of another single cell, forms a cooling channel. The reaction side is further divided into an active reaction region and an inactive reaction region. The active reaction region is used to contact the membrane electrode of the single cell; the inactive reaction region surrounds the active reaction region. The cooling side is divided into a cooling channel region and a channel edge region, with the channel edge region surrounding the cooling channel region. The cooling channel region and the active reaction region are correspondingly arranged in the thickness direction, and the channel edge region and the inactive reaction region are correspondingly arranged in the thickness direction.

[0062] Combination Figure 1 and Figure 6 As shown, based on the above brief introduction of the monopolar plate 100, this application embodiment proposes a method for detecting the contact resistance of the monopolar plate 100, including:

[0063] S100, the reaction-side detection plate 200 and the cooling-side detection plate 300 are respectively in contact with the reaction side 100a and cooling side 100b opposite to the monopolar plate 100; wherein, the reaction-side detection plate 200 and the cooling-side detection plate 300 are respectively electrically connected to the measuring component 500; the measuring component 500 includes a power supply, an ammeter, and a voltmeter. The reaction-side detection plate 200 and the cooling-side detection plate 300 are respectively connected to the positive (or negative) terminal and then the negative (or positive) terminal of the power supply to form an electrical circuit. The ammeter is used to measure the current value in the electrical circuit. The voltmeter is used to measure the voltage value between the reaction-side detection plate 200 and the cooling-side detection plate 300. The resistance, i.e., the contact resistance, can be measured using Ohm's law.

[0064] S200, the pressure application structure 400 is controlled to apply a first preset pressure to at least one of the reaction-side detection plate 200 and the cooling-side detection plate 300, and obtain a first contact resistance;

[0065] S300, the pressure-applying structure 400 is controlled to apply a second preset pressure to at least one of the reaction-side detection plate 200 and the cooling-side detection plate 300, and to obtain a second contact resistance; wherein, the first preset pressure is less than the second preset pressure;

[0066] S400, determine whether the first contact resistance and the second contact resistance meet the standards.

[0067] If the first contact resistance and the second contact resistance meet the standards, then the manufacturing quality of the monopolar plate 100 meets the standards; if the first contact resistance does not meet the standards but the second contact resistance does, then the reason for the substandard quality is determined to be the deformation of the monopolar plate 100; if both the first contact resistance and the second contact resistance do not meet the standards, then the reason for the substandard quality is determined to be the unqualified coating quality of the monopolar plate 100.

[0068] The technical solution of this application embodiment applies different pressures to at least one of the reaction-side detection plate 200 and the cooling-side detection plate 300 through the pressure-applying structure 400, obtaining two different contact resistances to determine whether the contact resistance of the monopolar plate 100 meets the standard and the reason for non-compliance. Specifically, if the first contact resistance and the second contact resistance meet the standard, then the contact resistance of the monopolar plate 100 meets the standard. If the first contact resistance is substandard, the reason for the substandard contact resistance may be the deformation of the monopolar plate 100 or the unqualified coating quality. Therefore, in the technical solution of this application embodiment, the pressure-applying structure 400 applies a second preset pressure to at least one of the reaction-side detection plate 200 and the cooling-side detection plate 300. Since the second preset pressure is greater than the first preset pressure, under the action of the second preset pressure, the monopolar plate 100 is flattened, its deformation disappears, and the second contact resistance is normal. Then, if the first contact resistance is substandard and the second contact resistance is qualified, it is determined that the reason for the substandard quality is the deformation of the monopolar plate 100. If both the first contact resistance and the second contact resistance are substandard, it indicates that the substandard quality is due to the unqualified coating quality of the monopolar plate 100.

[0069] In this embodiment, the first contact resistance has a corresponding first resistance threshold range; the second contact resistance has a corresponding second resistance threshold range. If the first contact resistance falls within the first resistance threshold range, the first contact resistance meets the standard; otherwise, it does not. If the second contact resistance falls within the second resistance threshold range, the second contact resistance meets the standard; otherwise, it does not.

[0070] In the embodiments, the pressure-applying structure can apply pressure to the reaction-side detection plate when the cooling-side detection plate supports the cooling side; the pressure-applying structure can also apply pressure to the cooling-side detection plate when the reaction detection plate supports the reaction side; the pressure-applying structure can also simultaneously apply equal and opposite pressures to both the cooling-side detection plate and the reaction detection plate.

[0071] In this embodiment, the difference between the first preset pressure and the second preset pressure is specifically set according to the detection requirements, and no specific limitation is made in this application. For example, the difference between the two is 5 MPa, 8 MPa, etc.

[0072] The contact resistance of the active reaction zone is a crucial testing parameter for the single-plate 100; therefore, it is essential to focus on testing the contact resistance of the active reaction zone during inspection. For example... Figure 8As shown, in the technical solution of this application, the reaction-side detection plate 200 includes a first detection plate 210, used to detect whether a defect has occurred in the active reaction region of the monopolar plate 100. Specifically, the reaction-side detection plate 200 includes a first detection plate 210; the first detection plate 210 has a first active detection region 211 and a first non-detection region 212 disposed around the first active detection region 211. The first active detection region 211 is of suitable size and shape to the active reaction region, and can cover the active reaction region to achieve sufficient contact with it. Figure 2 As shown, the step of controlling the reaction-side detection plate 200 and the cooling-side detection plate 300 to contact the reaction side 100a and cooling side 100b of the monopolar plate 100 respectively includes: controlling the first active detection region 211 to maintain contact with the active reaction region of the monopolar plate 100, and controlling the first non-detection region 212 to maintain a distance from the inactive reaction region of the monopolar plate 100. That is, during the detection process, the first active detection region 211 is in contact with the active reaction region, while the first non-detection region 212 is kept at a distance from the inactive reaction region of the monopolar plate 100. Therefore, the measurement result can reflect whether the contact resistance of the active reaction region meets the standard and determine the reason for the non-compliance when the contact resistance does not meet the standard.

[0073] In some embodiments, the contact resistance of both the inactive and active reaction regions of the monopolar plate 100 is crucial. In the technical solution of this application, the reaction-side detection plate 200 includes a second detection plate 220 for detecting whether the monopolar plate 100 as a whole has malfunctioned. As an optional implementation of the above embodiments, the reaction-side detection plate 200 includes the second detection plate 220. Figure 9 As shown, the second detection plate 220 has a second activity detection area 221 and a first edge detection area 222 disposed around the second activity detection area 221; Figure 3 As shown, the step of controlling the reaction-side detection plate 200 and the cooling-side detection plate 300 to contact the reaction side 100a and cooling side 100b of the monopolar plate 100, respectively, includes: controlling the second active detection area 221 to maintain contact with the active reaction area of ​​the monopolar plate 100, and the first edge detection area 222 to maintain contact with the inactive reaction area of ​​the monopolar plate 100. That is, during the detection process, the second active detection area 221 is in contact with the active reaction area, while the first edge detection area 222 is also in contact with the inactive reaction area of ​​the monopolar plate 100. Therefore, the measurement results can determine whether the quality of the monopolar plate 100 meets the standard and, if the contact resistance is substandard, the reason for its substandard performance.

[0074] However, in this embodiment, if the monopolar plate 100 malfunctions, it is impossible to determine where the malfunction occurs. Therefore, in order to locate the location of the malfunction affecting the contact resistance of the monopolar plate 100 for easier repair, after detection by the second detection plate 220, if a malfunction of the monopolar plate 100 is found, it can be retested by the first detection plate 210 to determine the cause of the malfunction. If a malfunction is found in the monopolar plate 100, it can be determined that the active reaction region of the monopolar plate 100 is faulty; if the contact resistance measured by the first detection plate 210 is normal, it can be preliminarily determined that the active reaction region of the monopolar plate 100 is good. At this time, a measurement can be performed by the third detection plate 230 to finally determine whether there is a malfunction in the inactive reaction region of the monopolar plate 100.

[0075] Therefore, as an optional implementation of the above embodiments, the reaction-side detection plate 200 includes a third detection plate 230. Figure 10 As shown, the third detection plate 230 has a second non-detection area 231 and a second edge detection area 232 disposed around the second non-detection area 231. Figure 4 As shown, the step of controlling the reaction-side detection plate 200 and the cooling-side detection plate 300 to contact the reaction side 100a and cooling side 100b of the monopolar plate 100, respectively, includes: controlling the second edge detection area 232 to contact the inactive reaction area of ​​the monopolar plate 100, while the second non-detection area 231 and the active reaction area of ​​the monopolar plate 100 remain spaced apart. That is, during the detection process, the second non-detection area 231 remains spaced apart from the active reaction area, while the second edge detection area 232 remains in contact with the inactive reaction area of ​​the monopolar plate 100. Therefore, the measurement results can determine whether the contact resistance of the inactive reaction area of ​​the monopolar plate 100 meets the standard, and if the contact resistance does not meet the standard, the reason for the non-compliance can be identified.

[0076] In the above embodiments, the first detection plate 210, the second detection plate 220, and the third detection plate 230 can be used individually according to the location of the monopolar plate 100 that needs to be detected. That is, the first detection plate 210, the second detection plate 220, and the third detection plate 230 respectively detect the active reaction area of ​​the monopolar plate 100, the entire monopolar plate 100, and the inactive reaction area of ​​the monopolar plate 100.

[0077] In the above embodiments, the first detection plate 210, the second detection plate 220, and the third detection plate 230 can be used together to determine where the malfunction occurs in the monopolar plate 100. For example, in use, the monopolar plate 100 as a whole can be tested first using the second detection plate 220; if the contact resistance of the second detection plate 220 is faulty, the contact resistance of the active detection area can be retested using the first detection plate 210 and / or the contact resistance of the inactive detection area can be retested using the third detection plate 230, so as to finally determine where the malfunction occurs in the monopolar plate 100.

[0078] As an optional implementation of the above embodiments, since the contact resistance of the reaction side 100a has a greater impact on the performance of the monopole plate 100 than the contact resistance of the cooling side 100b, the cooling side detection plate 300 generally includes a flow channel detection area and a third edge detection area disposed around the flow channel detection area. Figure 5 As shown, the step of controlling the reaction-side detection plate 200 and the cooling-side detection plate 300 to contact the reaction side 100a and cooling side 100b of the monopolar plate 100 respectively includes: controlling the flow channel detection area to contact the cooling flow channel area of ​​the monopolar plate 100, and the third edge detection area to contact the flow channel edge area of ​​the monopolar plate 100. In the technical solution of this application embodiment, the cooling-side detection plate 300 does not need to separately measure the cooling flow channel area and flow channel edge area of ​​the cooling side 100b. During the detection process, the cooling-side detection plate 300 can be in contact with the cooling side 100b of the monopolar plate 100 at all times, and only the first detection plate 210, the second detection plate 220 and the third detection plate 230 are controlled to contact the reaction side 100a of the monopolar plate 100.

[0079] As an optional implementation of the above embodiments, the pressure applying structure 400 is first controlled to apply a first preset pressure to at least one of the reaction-side detection plate 200 and the cooling-side detection plate 300, and a first contact resistance is obtained. If the first contact resistance is substandard, the pressure applying structure 400 is then controlled to apply a second preset pressure to at least one of the reaction-side detection plate 200 and the cooling-side detection plate 300, and a second contact resistance is obtained. In some embodiments, to improve detection efficiency, the pressure testing structure is first controlled to apply a first preset pressure to at least one of the reaction-side detection plate 200 and the cooling-side detection plate 300, and the first contact resistance is obtained at this time. If the first contact resistance meets the standard, the electrode plate is considered good, and it is not necessary to increase the applied pressure by controlling the pressure applying structure 400. If the first contact resistance is substandard, the electrode plate is defective. To further determine whether the substandard contact resistance is due to deformation or poor coating quality, the pressure applying structure 400 is increased to a second preset pressure. At this point, the second contact resistance is obtained. If the second contact resistance is substandard, both the first and second contact resistances are substandard, indicating a problem with the coating quality of the electrode plate. If the second contact resistance is satisfactory, the electrode plate is deformed. In this embodiment, detection efficiency can be improved, adapting to the pace of mass production.

[0080] like Figure 7 As shown, this application also proposes a contact resistance measuring device for a single plate 100, comprising:

[0081] A reaction-side detection plate 200 is disposed facing the reaction side 100a of the monopolar plate 100 and is used to contact the reaction side 100a.

[0082] A cooling-side detection plate 300 is disposed facing the cooling side 100b of the monopole plate 100 and is used to contact the cooling side 100b.

[0083] Measurement component 500, which is electrically connected to the reaction-side detection plate 200 and the cooling-side detection plate 300 respectively, is used to measure contact resistance;

[0084] A pressure-applying structure 400 is configured to apply pressure to at least one of the reaction-side detection plate 200 and the cooling-side detection plate 300 when the reaction-side detection plate 200 is in contact with the reaction side 100a and the cooling-side detection plate 300 is in contact with the cooling side 100b; and

[0085] Processor 600, wherein processor 600 is configured as follows:

[0086] The reaction-side detection plate 200 and the cooling-side detection plate 300 are controlled to contact the reaction side 100a and cooling side 100b opposite to the monopolar plate 100, respectively; wherein the reaction-side detection plate 200 and the cooling-side detection plate 300 are electrically connected to the measurement component 500.

[0087] The pressure-applying structure 400 applies a first preset pressure to at least one of the reaction-side detection plate 200 and the cooling-side detection plate 300, and obtains a first contact resistance;

[0088] The pressure-applying structure 400 is controlled to apply a second preset pressure to at least one of the reaction-side detection plate 200 and the cooling-side detection plate 300, and to obtain a second contact resistance; wherein the first preset pressure is less than the second preset pressure;

[0089] Determine whether the first contact resistance and the second contact resistance meet the standards.

[0090] If the first contact resistance and the second contact resistance meet the standard, then the contact resistance of the monopolar plate 100 meets the standard; if the first contact resistance does not meet the standard but the second contact resistance does, then the reason for the non-compliance of the contact resistance is determined to be the deformation of the monopolar plate 100; if both the first contact resistance and the second contact resistance do not meet the standard, then the reason for the non-compliance of the contact resistance is determined to be the unqualified coating quality of the monopolar plate 100.

[0091] The processor 600 in the detection device is configured to execute the steps of the aforementioned detection method, and therefore possesses the technical advantages of the aforementioned embodiments, which will not be elaborated further here.

[0092] As an optional implementation of the above embodiments, the pressure-applying structure 400 includes: a first pressing plate 410, which is disposed on the side of the reaction-side detection plate 200 opposite to the monopolar plate 100, for contact with the reaction-side detection plate 200; and a second pressing plate 420, which is disposed on the side of the cooling-side detection plate 300 opposite to the monopolar plate 100, for contact with the cooling-side detection plate 300. In embodiments, the first pressing plate 410 and the second pressing plate 420 can apply pressure to the reaction-side detection plate 200 and the coolant-side detection plate via a hydraulic cylinder or a pneumatic cylinder.

[0093] This application also proposes a server comprising: one or more processors; a memory; and one or more applications, wherein the one or more applications are stored in the memory and configured to be executed by the processor to implement the single-plate quality detection method as described above.

[0094] The processor may include one or more processing cores, such as a quad-core processor or an octa-core processor. The processor can be implemented using at least one hardware form of DSP (Digital Signal Processing), FPGA (Field-Programmable Gate Array), or PLA (Programmable Logic Array). The processor may also include a main processor and coprocessors. The main processor, also known as a CPU (Central Processing Unit), is used to process data in the wake-up state; the coprocessor is a low-power processor used to process data in the standby state. In some embodiments, the processor may integrate a GPU (Graphics Processing Unit), which is responsible for rendering and drawing the content required to be displayed on the screen. The processor may also include an AI (Artificial Intelligence) processor, which handles operations related to the single-plate quality detection method, enabling the single-plate quality detection method model to train and learn autonomously, improving efficiency and accuracy.

[0095] The memory may include one or more computer-readable storage media, which may be non-transitory. The memory may also include high-speed random access memory and non-volatile memory, such as one or more disk storage devices or flash memory devices. In some embodiments, the non-transitory computer-readable storage media in the memory are used to store at least one instruction, which is executed by a processor to implement the monopole plate quality detection method provided in the method embodiments of this application.

[0096] The foregoing has provided a detailed description of a device, method, server, and computer-readable storage medium for detecting the quality of a single-plate, as provided in the embodiments of this application. Specific examples have been used to illustrate the principles and implementation methods of the present invention. The descriptions of the embodiments above are only for the purpose of helping to understand the method and core ideas of the present invention. At the same time, those skilled in the art will recognize that, based on the ideas of the present invention, there will be changes in the specific implementation methods and application scope. Therefore, the content of this specification should not be construed as a limitation of the present invention.

Claims

1. A method of monopolar plate quality detection, characterized by, A single plate quality detection device, comprising: a reaction side detection plate and a cooling side detection plate arranged oppositely; a pressure applying structure for providing pressure to at least one of the reaction side detection plate and the cooling side detection plate; the method comprises: controlling the reaction side detection plate and the cooling side detection plate to contact the reaction side and the cooling side of the single plate oppositely, respectively; wherein the reaction side detection plate and the cooling side detection plate are electrically connected with a measurement assembly, respectively; controlling the pressure applying structure to apply a first preset pressure to at least one of the reaction side detection plate and the cooling side detection plate, and obtaining a first contact resistance; controlling the pressure applying structure to apply a second preset pressure to at least one of the reaction side detection plate and the cooling side detection plate, and obtaining a second contact resistance; wherein the first preset pressure is less than the second preset pressure; determining whether the first contact resistance and the second contact resistance are qualified; wherein if the first contact resistance and the second contact resistance are qualified, the contact resistance of the single plate is qualified; if the first contact resistance is not qualified and the second contact resistance is qualified, it is determined that the unqualified reason of the contact resistance is the deformation of the single plate; if the first contact resistance and the second contact resistance are both not qualified, it is determined that the unqualified reason of the contact resistance is the unqualified quality of the coating of the single plate.

2. The detection method of claim 1, wherein, The reaction side detection plate comprises a first detection plate; the first detection plate has a first active detection area and a first non-detection area arranged around the first active detection area; The step of controlling the reaction side detection plate and the cooling side detection plate to contact the reaction side and the cooling side of the single plate oppositely, respectively, comprises: controlling the first active detection area to keep contact with the active reaction area of the single plate, and controlling the first non-detection area to keep spacing from the non-active reaction area of the single plate.

3. The detection method of claim 1, wherein, The reaction side detection plate comprises a second detection plate, and the second detection plate has a second active detection area and a first edge detection area arranged around the second active detection area; The step of controlling the reaction side detection plate and the cooling side detection plate to contact the reaction side and the cooling side of the single plate oppositely, respectively, comprises: controlling the second active detection area to keep contact with the active reaction area of the single plate, and controlling the first edge detection area to keep contact with the non-active reaction area of the single plate.

4. The detection method as described in claim 1, characterized in that, The reaction side detection plate comprises a third detection plate, and the third detection plate has a second non-detection area and a second edge detection area arranged around the second non-detection area, The step of controlling the reaction side detection plate and the cooling side detection plate to contact the reaction side and the cooling side of the single plate oppositely, respectively, comprises: controlling the second edge detection area to keep contact with the non-active reaction area of the single plate, and controlling the second non-detection area to keep spacing from the active reaction area of the single plate.

5. The detection method as described in claim 1, characterized in that, The cooling side detection plate comprises a flow channel detection area and a third edge detection area arranged around the flow channel detection area; The step of controlling the reaction side detection plate and the cooling side detection plate to contact the reaction side and the cooling side of the single plate oppositely, respectively, comprises: controlling the flow channel detection area to keep contact with the cooling flow channel area of the single plate, and controlling the third edge detection area to keep contact with the flow channel edge area of the single plate.

6. The detection method as described in claim 1, characterized in that, The step of controlling the pressure applying structure to apply a second preset pressure to at least one of the reaction side detection plate and the cooling side detection plate and obtaining a second contact resistance comprises: In the case that the first contact resistance is not up to standard, the pressure applying structure is controlled to apply a second preset pressure to at least one of the reaction side detection plate and the cooling side detection plate and obtain a second contact resistance.

7. A monopolar plate quality detection device, characterized by comprising: Comprise: a reaction side detection plate arranged on a reaction side of a monopolar plate for contacting the reaction side; a cooling side detection plate arranged on a cooling side of the monopolar plate for contacting the cooling side; a measurement assembly electrically connected to the reaction side detection plate and the cooling side detection plate respectively for measuring contact resistance; a pressure applying structure configured to apply pressure to at least one of the reaction side detection plate and the cooling side detection plate when the reaction side detection plate contacts the reaction side and the cooling side detection plate contacts the cooling side; and a processor configured to: control the reaction side detection plate and the cooling side detection plate to contact the reaction side and the cooling side of the monopolar plate respectively; wherein the reaction side detection plate and the cooling side detection plate are electrically connected to the measurement assembly respectively; control the pressure applying structure to apply a first preset pressure to at least one of the reaction side detection plate and the cooling side detection plate and obtain a first contact resistance; control the pressure applying structure to apply a second preset pressure to at least one of the reaction side detection plate and the cooling side detection plate and obtain a second contact resistance; wherein the first preset pressure is less than the second preset pressure; determine whether the first contact resistance and the second contact resistance are up to standard, if the first contact resistance and the second contact resistance are up to standard, the contact resistance of the monopolar plate is up to standard; if the first contact resistance is not up to standard and the second contact resistance is up to standard, it is determined that the cause of the non-standard contact resistance is the deformation of the monopolar plate; if the first contact resistance and the second contact resistance are both not up to standard, it is determined that the cause of the non-standard contact resistance is the unqualified coating quality of the monopolar plate.

8. The detection device of claim 7, wherein, The pressure applying structure comprises: a first compression plate arranged on a side of the reaction side detection plate away from the monopolar plate for contacting the first compression plate; and a second compression plate arranged on a side of the cooling side detection plate away from the monopolar plate for contacting the second compression plate; wherein the first compression plate and the second compression plate are configured to jointly apply the first preset pressure and the second preset pressure to the monopolar plate at different time instants.

9. A server, characterized by The server comprises: one or more processors; a memory; and one or more application programs, wherein the one or more application programs are stored in the memory and configured to be executed by the processor to implement the monopolar plate quality detection method of any one of claims 1 to 6.

10. A computer-readable storage medium, characterized in that, A computer-readable recording medium having stored thereon a computer program, the computer program being loaded by a processor to execute the steps of the monopolar plate quality detection method of any one of claims 1 to 6.

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