Two-dimensional material mechanical magnetic measurement device and its preparation method and application

Abstract

The present invention relates to a two-dimensional material mechanical magnetic measurement device, a preparation method and an application thereof. The method mainly involves dissociating the two-dimensional material to be measured on a substrate to obtain a two-dimensional material with a stable morphology. The two-dimensional material is then transferred to the free end of a cantilever beam in an organic solvent. During this process, the organic solvent is inserted between the two-dimensional material to be measured and the substrate due to the difference in binding energy between the two-dimensional material to be measured, the substrate and the organic solvent, thereby facilitating stable separation between the two-dimensional material to be measured and the substrate. At the same time, in the organic solvent, the two-dimensional material has good adhesion to the cantilever beam, so that the two-dimensional material with a stable morphology can be attached to the cantilever beam, thereby obtaining a two-dimensional material mechanical magnetic measurement device. The mechanical magnetic measurement device can be used to mechanically detect the magnetism of the two-dimensional material, providing a new approach to the magnetic detection of two-dimensional materials.

Description

Technical Field

[0001] The present invention relates to the field of magnetic measurement technology, and in particular to a two-dimensional material mechanical magnetic measurement device, a preparation method and an application thereof. Background Art

[0002] With the continuous expansion of research in physics, electrical devices, and spin storage, the study of two-dimensional materials is also deepening. Testing the magnetic properties of two-dimensional materials is crucial for optimizing their performance parameters. However, traditional testing methods are often limited to basic magnetic characterization of single crystals before dissociation, resulting in relatively limited testing methods. Summary of the Invention

[0003] Based on this, it is necessary to provide a two-dimensional material mechanical magnetic measurement device and its preparation method and application. Through this preparation method, a mechanical magnetic measurement device that can mechanically detect the magnetism of two-dimensional materials can be prepared, providing a new idea for the magnetic detection of two-dimensional materials.

[0004] In order to solve the above technical problems, the technical solution of this application is:

[0005] A method for preparing a two-dimensional material mechanical magnetic measurement device comprises the following steps:

[0006] dissociating the two-dimensional material to be tested on a substrate;

[0007] immersing the cantilever beam, the two-dimensional material to be tested, and the substrate in an organic solvent;

[0008] In the organic solvent, the two-dimensional material to be tested is separated from the substrate, and the two-dimensional material to be tested is transferred to a preset position of the free end of the cantilever beam, so that the two-dimensional material to be tested is attached to the preset position.

[0009] In one embodiment, separating the two-dimensional material to be tested from the substrate includes: using a probe to lift the two-dimensional material to be tested on the substrate.

[0010] In one embodiment, after the two-dimensional material to be tested on the substrate is lifted up by a probe, the two-dimensional material to be tested is supported by the probe, the cantilever beam is moved so that the preset position of the free end of the cantilever beam is located below the two-dimensional material to be tested, and the probe is moved so that the two-dimensional material to be tested is close to and attached to the preset position.

[0011] In one embodiment, the method further includes fixing a cantilever beam on the substrate, wherein the cantilever beam and the two-dimensional material to be measured are located at different positions on the substrate.

[0012] In one embodiment, the organic solvent includes at least one of acetone, ethanol and isopropanol.

[0013] In one embodiment, the width of the cross section at the preset position is greater than the width of the cross section at other positions of the free end of the cantilever beam.

[0014] In one embodiment, the thickness of the cantilever beam is 200 nm to 3000 nm.

[0015] In one embodiment, the length of the cantilever beam is 100 μm to 500 μm.

[0016] In one embodiment, the width of the cantilever beam is 5 μm to 20 μm.

[0017] In one embodiment, the material of the cantilever beam includes at least one of silicon and silicon dioxide.

[0018] A two-dimensional material mechanical magnetic measurement device is prepared by the preparation method described in any of the above embodiments.

[0019] A two-dimensional material mechanical magnetic measurement method comprises the following steps:

[0020] The above-mentioned two-dimensional material mechanical magnetic measurement device is used;

[0021] The magnetism of the two-dimensional material is measured by changing the intrinsic vibration frequency of the cantilever beam of the two-dimensional material mechanical magnetometry device with the magnetic field.

[0022] A two-dimensional material electrical device comprises an electrode and the above-mentioned two-dimensional material mechanical magnetometry device; the electrode is led out from the two-dimensional material to be measured in the two-dimensional material mechanical magnetometry device for electrical connection with an external electrical component.

[0023] In the preparation method of the above-mentioned two-dimensional material mechanical magnetic measurement device, the two-dimensional material to be measured is mainly dissociated on the substrate to obtain a morphologically stable two-dimensional material. Then, the two-dimensional material is transferred to the free end of the cantilever beam in an organic solvent. During this process, the organic solvent is inserted between the two-dimensional material to be measured and the substrate due to the difference in binding energy between the two-dimensional material to be measured, the substrate and the organic solvent, so as to facilitate the stable separation between the two-dimensional material to be measured and the substrate. At the same time, in the organic solvent, there is good adhesion between the two-dimensional material and the cantilever beam, so that the morphologically stable two-dimensional material can be attached to the cantilever beam, thereby obtaining a two-dimensional material mechanical magnetic measurement device. The magnetism of the two-dimensional material can be mechanically detected by the mechanical magnetic measurement device, providing a new idea for the magnetic detection of two-dimensional materials. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1This is a schematic structural diagram of the transfer equipment used in the preparation method of the two-dimensional material mechanical magnetic measurement device in one embodiment of the present application.

[0025] Figure 2 This is a schematic structural diagram of a two-dimensional material mechanical magnetic measurement device in one embodiment of the present application.

[0026] Figure 3 for Figure 2 Schematic diagram of the structure of the two-dimensional material mechanical magnetic measurement device from another angle.

[0027] Figure 4 Schematic diagram of the structure of a two-dimensional electrical device in one embodiment of the present application.

[0028] Figure 5 This is a magnetic characterization diagram of the two-dimensional material in Example 1 of this application.

[0029] Description of the marks in the figure:

[0030] 100. Transfer device; 101. Container; 102. Transfer platform; 103. Fixing plate; 104. Screw; 105. Clip; 106. Silicon substrate; 107. Cantilever beam; 1071. Preset position; 108. Two-dimensional material; 200. Unetched portion of silicon wafer; 300. Metal electrode; 400. Thin film. DETAILED DESCRIPTION

[0031] To make the above-mentioned objects, features, and advantages of the present invention more readily apparent, specific embodiments of the present invention are described in detail below with reference to the accompanying drawings. The following description sets forth numerous specific details to facilitate a full understanding of the present invention. However, the present invention can be implemented in many other ways than those described herein, and those skilled in the art may make similar modifications without departing from the scope of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0032] In the present invention, unless otherwise specified or limited, the terms "installed," "connected," "connect," "fixed," etc. should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integration; mechanical connection, electrical connection; direct connection, or indirect connection through an intermediate medium; internal communication between two components, or interaction between two components, unless otherwise specified. Those skilled in the art will understand the specific meanings of the above terms in the present invention based on specific circumstances.

[0033] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "plurality" means at least two, such as two, three, etc., unless otherwise specifically defined.

[0034] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the art to which this invention pertains. The terms used herein in the specification of the present invention are for the purpose of describing specific embodiments only and are not intended to limit the present invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0035] One embodiment of the present application provides a method for preparing a device for mechanical magnetic measurement of two-dimensional materials. The method comprises the following steps: dissociating the two-dimensional material to be measured on a substrate; immersing a cantilever beam, the two-dimensional material to be measured, and the substrate in an organic solvent; separating the two-dimensional material to be measured from the substrate in the organic solvent, and transferring the two-dimensional material to be measured to a predetermined position at the free end of the cantilever beam, so that the two-dimensional material to be measured adheres to the predetermined position. In the method of this embodiment, a morphologically stable two-dimensional material is obtained by dissociating the two-dimensional material to be measured on the substrate. The two-dimensional material is then transferred to the free end of the cantilever beam in an organic solvent. During this process, the organic solvent is inserted between the two-dimensional material to be measured and the substrate, utilizing the difference in binding energy between the two-dimensional material to be measured, the substrate, and the organic solvent, thereby facilitating stable separation between the two-dimensional material to be measured and the substrate. Furthermore, in the organic solvent, the two-dimensional material and the cantilever beam exhibit good adhesion, allowing the morphologically stable two-dimensional material to adhere to the cantilever beam, thereby obtaining a device for mechanical magnetic measurement of two-dimensional materials. This device can be used to mechanically detect the magnetism of two-dimensional materials, providing a new approach to magnetic detection of two-dimensional materials.

[0036] It can be understood that the binding energy between the two-dimensional material to be measured and the organic solvent is smaller than the binding energy between the two-dimensional material to be measured and the substrate.

[0037] It is understood that the two-dimensional material to be tested is insoluble in organic solvents. It is also understood that the two-dimensional material to be tested can be obtained by mechanical dissociation. Optionally, the two-dimensional material to be tested is a material bound by van der Waals forces. Further, optionally, Scotch or other adhesive tape can be used to press and dissociate the material three times, then firmly adhered to the substrate, and the two-dimensional material to be tested can be attached to the substrate using the heat of a finger. Optionally, the two-dimensional material to be tested is a diamagnetic two-dimensional material.

[0038] In a specific example, the thickness of the two-dimensional material to be tested is nanometer-sized. Optionally, the thickness of the two-dimensional material to be tested is less than or equal to 1 μm. The two-dimensional material to be tested can be selected by observing its color under a metallographic microscope. When selecting the two-dimensional material to be tested, the size of the two-dimensional material to be tested can be selected based on the size of a preset position on the cantilever beam. Optionally, the length of the two-dimensional material to be tested is 1 μm to 100 μm, and the width of the two-dimensional material to be tested is 1 μm, 10 μm, 20 μm, 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, 80 μm, 90 μm, 100 μm, etc. The width of the two-dimensional material to be tested is 1 μm, 10 μm, 20 μm, 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, 80 μm, 90 μm, 100 μm, etc. Further optionally, the two-dimensional material to be tested is a CrPS two-dimensional material, which has a length of 9 μm and a width of 3 μm. Optionally, the two-dimensional material to be tested is a CrPS4 two-dimensional material.

[0039] In a specific example, before the cantilever beam, the two-dimensional material to be measured and the substrate are immersed in the organic solvent, the step of fixing the cantilever beam on the substrate is also included. Fixing the cantilever beam on the substrate can improve the stability of the cantilever beam, reduce the influence of the cantilever beam on the two-dimensional material during the transfer of the two-dimensional material to be measured, and facilitate the two-dimensional material to be measured to be accurately attached to the preset position of the free end of the cantilever beam. It is understandable that when the cantilever beam is fixed on the substrate, the cantilever beam and the two-dimensional material to be measured are located at different positions of the substrate. It is also understandable that when the cantilever beam is fixed on the substrate, the cantilever beam and the two-dimensional material to be measured can be fixed on different substrates respectively.

[0040] In one specific example, when the cantilever beam is fixed to the substrate, the preset position is located on the surface of the cantilever beam away from the substrate. It will be appreciated that the preset position is located on the surface of the cantilever beam away from the substrate. When the two-dimensional material to be tested is transferred to the preset position near the free end of the cantilever beam, the two-dimensional material to be tested can be directly attached to the preset position, thereby facilitating the transfer and attachment of the two-dimensional material to be tested.

[0041] In one specific example, separating the two-dimensional material to be tested from the substrate includes using a probe to lift the two-dimensional material to be tested from the substrate. This lifting action allows the two-dimensional material to be gradually separated from the substrate, allowing the organic solvent to gradually enter between the two-dimensional material to be tested and the substrate, thereby separating the two-dimensional material to be tested. During the separation process, the lifting action of the probe can reduce the impact on the two-dimensional material to be tested, thereby avoiding unnecessary damage to the two-dimensional material to be tested.

[0042] Furthermore, after using a probe to lift the two-dimensional material to be tested on the substrate, the two-dimensional material to be tested is supported by the probe, and the cantilever beam is moved so that the preset position of the free end of the cantilever beam is located below the two-dimensional material to be tested. The probe is moved so that the two-dimensional material to be tested is close to and attached to the preset position.

[0043] It is understandable that after the two-dimensional material to be tested on the substrate is lifted up by the probe, the two-dimensional material to be tested is supported by the probe, and the two-dimensional material to be tested can be supported by the probe so that the two-dimensional material to be tested is suspended in the organic solvent. When the two-dimensional material to be tested is supported by the probe, multiple probes can be used to support the two-dimensional material to be tested to improve the stability of the support for the two-dimensional material to be tested. For example, when the two-dimensional material to be tested is supported by the probe, two probes can be used to support the two-dimensional material to be tested. Optionally, when the two-dimensional material to be tested is supported by the probe, the number of probes can also be 3, 4, 5, etc. It is also understandable that the probe can be controlled by a manipulator.

[0044] In a specific example, when a probe is used to lift the two-dimensional material to be measured on the substrate, one probe is used. When the probe is used to lift the two-dimensional material to be measured on the substrate and then supports the two-dimensional material to be measured, two probes are used.

[0045] Optionally, the probe is a glass probe. Optionally, the glass probe can be purchased from a commercial product or obtained by glass drawing. As an example of the probe size, the probe tip diameter is nanometer-scale, such as within 1000nm, and another example is 10nm to 1000nm. Optionally, the probe tip diameter is 10nm, 20nm, 50nm, 80nm, 100nm, 150nm, 200nm, 300nm, 400nm, 500nm, etc.

[0046] In a specific example, after the two-dimensional material to be tested is attached to the preset position, the method further includes: removing the organic solvent.

[0047] As an example of a selection of the organic solvent, optionally, the organic solvent includes at least one of acetone, ethanol and isopropyl alcohol.

[0048] As some structural examples of the cantilever beam, the shape of the preset position is polygonal, circular or elliptical. Optionally, the polygon may be a triangle, a quadrilateral, a pentagon, a hexagon, a heptagon, an octagon, etc. Optionally, the width of the cross section of the preset position is greater than the width of the cross section at other positions of the free end of the cantilever beam. By setting the width of the cross section of the preset position to be greater than the width of the cross section at other positions of the free end of the cantilever beam, a larger attachment area can be provided for the attachment of the two-dimensional material to be tested, which is conducive to making the two-dimensional material to be tested more stably attached to the cantilever beam. At the same time, by setting a preset position with a larger area, when multiple two-dimensional materials to be tested need to be attached, multiple two-dimensional materials to be tested can be attached at the preset position.

[0049] It is understood that the overall structure of the cantilever beam is in the form of an elongated strip, with a preset position formed near the end of the elongated cantilever beam. It is also understood that the overall structure of the cantilever beam can also be a micrometer line with a preset position provided on the micrometer line.

[0050] Optionally, a preset position of a corresponding shape may be cut or etched on the cantilever beam by cutting or etching.

[0051] Alternatively, when preparing the cantilever beam, the entire piece of cantilever beam material may be cut and / or etched to obtain a cantilever beam having a corresponding free end and a predetermined position. Alternatively, the cantilever beam may be a cantilever beam from a commercial atomic force microscope, and the cantilever beam may be etched using focused ion beam etching to obtain a cantilever beam of the corresponding shape.

[0052] As some examples of cantilever beam dimensions, the thickness of the cantilever beam ranges from 200 nm to 3000 nm. For two-dimensional materials with larger magnetic signals or larger volumes, a cantilever beam with a thickness of 1000 nm to 3000 nm can be selected. For two-dimensional materials with smaller magnetic signals or smaller volumes, a cantilever beam with a thickness of 200 nm to 1000 nm can be selected. Alternatively, the cantilever beam has a thickness of 200 nm, 300 nm, 500 nm, 800 nm, 1000 nm, 1500 nm, 2000 nm, 2500 nm, or 3000 nm. The cantilever beam has a length of 100 μm to 500 μm. Alternatively, the cantilever beam has a length of 100 μm, 200 μm, 300 μm, 400 μm, 500 μm, or the like. The cantilever beam has a width of 5 μm to 20 μm. Optionally, the width of the cantilever beam is 5 μm, 8 μm, 10 μm, 12 μm, 15 μm, 18 μm, 20 μm, etc. It is understood that the width of the cantilever beam refers to the overall width of the cantilever beam, and refers to the width of the cross section at positions other than the preset position of the free end of the cantilever beam.

[0053] In a specific example, the material of the cantilever beam includes at least one of silicon and silicon dioxide. In this case, the cantilever beam has good mechanical properties, which is conducive to improving the stability of the two-dimensional material mechanical magnetic measurement device.

[0054] In a specific example, the substrate is a silicon substrate. It is understood that when preparing the two-dimensional material mechanical magnetic measurement device, a clean silicon substrate is used. The silicon substrate can be cleaned using an organic solvent combined with ultrasonic cleaning or other methods.

[0055] Another embodiment of the present application provides a device for measuring the mechanical magnetism of two-dimensional materials. This device is fabricated using the aforementioned method. This device can be used to detect the magnetism of two-dimensional materials through mechanical information testing, providing a new approach to magnetic detection of two-dimensional materials.

[0056] See also Figure 1 , which shows the structure of a transfer device 100 used in a method for preparing a two-dimensional material mechanical magnetic measurement device according to one embodiment of the present application. The transfer device can accommodate an organic solvent and is used to separate the two-dimensional material to be measured from the substrate and transfer the two-dimensional material to a predetermined position at the free end of the cantilever beam, where it adheres to the predetermined position.

[0057] See also Figure 2 The cantilever beam 107 is obtained by etching the silicon wafer. After etching, the cantilever beam 107 extends from the unetched portion 200 of the silicon wafer.

[0058] The transfer device 100 includes a container 101 and a transfer platform 102 located within the container 101. A fixing plate 103 is provided between the edge of the transfer platform 102 and the inner wall of the container 101, which secures the transfer platform 102. Screws 104 and clips 105 are provided on the transfer platform 102. The screws 104 can pass through the clips 105 to secure the clips 105. The clips 105 are used to secure a silicon substrate 106 located on the transfer platform 102.

[0059] When preparing the two-dimensional material mechanical magnetic measurement device, the cantilever beam 107 is fixed on the silicon substrate 106, with the preset position 1071 of the cantilever beam 107 facing upward, and the two-dimensional material 108 is dissociated onto the silicon substrate 106. It can be understood that Figure 1 In the structure shown, the cantilever beam 107 and the two-dimensional material 108 correspond to different silicon substrates 106. Then, an organic solvent is injected into the container 101, and the cantilever beam 107, the two-dimensional material 108, and the substrate 106 are immersed in the organic solvent. In the cantilever beam 107, the overall structure of the cantilever beam 107 is a long strip. The preset position 1071 is located at the free end of the cantilever beam 107. The preset position 1071 is an octagon (see Figure 3 The width of the cross section at the preset position 1071 is greater than the width of the cross section at other positions of the free end of the cantilever beam 107 .

[0060] When preparing a device for measuring the mechanical magnetism of two-dimensional materials, separating the two-dimensional material to be measured from the substrate involves using a glass probe to lift the two-dimensional material 108 to be measured from the substrate 106. Then, two glass probes are used to support the two-dimensional material 108 to be measured. A cantilever beam 107 is moved so that a preset position 1071 of the free end of the cantilever beam 107 is located below the two-dimensional material 108 to be measured. The probes are then moved so that the two-dimensional material 108 to be measured approaches and adheres to the preset position 1071.

[0061] After the two-dimensional material 108 to be tested is attached to the preset position 1071, the organic solvent in the container 101 is drained. The transfer platform 102 is then tilted and gently blown with nitrogen or helium to quickly evaporate the organic solvent. After the organic solvent evaporates, the two-dimensional material mechanical magnetic measurement device is obtained. After obtaining the two-dimensional material mechanical magnetic measurement device, the magnetism of the two-dimensional material can be mechanically tested. Optionally, the mechanical test can be performed using differential torque magnetic testing.

[0062] Optionally, when removing the two-dimensional material mechanical magnetic measuring device from the transfer device, it can be removed directly by mechanical pressing, focused ion beam etching or other means.

[0063] Another embodiment of the present application provides a method for mechanical magnetometry of two-dimensional materials. This method comprises the following steps: using the aforementioned two-dimensional material mechanical magnetometry device; and measuring the magnetism of the two-dimensional material by observing the change in the intrinsic vibration frequency of the cantilever beam of the two-dimensional material mechanical magnetometry device as a function of the magnetic field. Optionally, the change in the intrinsic vibration frequency of the cantilever beam of the two-dimensional material mechanical magnetometry device as a function of the magnetic field is monitored under a weak infrared laser.

[0064] In a specific example, the two-dimensional material mechanical magnetometry method includes the following steps: fix the two-dimensional material mechanical magnetometry device on the test platform, and then install the piezoelectric element into the cavity; when the laser is working, use a microscope to adjust the laser focus waist to the minimum to ensure the maximum signal. Through the piezoelectric element, in conjunction with the photodetector, the focused light beam is aimed at the position to be detected, and the thermal noise spectrum of the system is observed to determine whether there is a vibration mode, and the vibration mode is recorded at the same time. After the cavity is sealed, a rough vacuum is drawn to 1×10 -5 mbar, then placed in the magnet and continuously evacuated to maintain a high vacuum state. The temperature is kept constant to ensure that the magnet is working properly, and then the field is scanned and the frequency of the sensor is recorded.

[0065] Another embodiment of the present application provides a two-dimensional material electrical device. The device comprises electrodes and a two-dimensional material mechanical magnetometry device prepared using the above-described preparation method. The electrodes are extended from the two-dimensional material to be measured in the two-dimensional material mechanical magnetometry device for electrical connection to an external electrical component.

[0066] See also Figure 4 , which shows the structure of a two-dimensional electrical device in one embodiment of the present application. It includes a metal electrode 300 and the aforementioned two-dimensional material mechanical magnetometry device. The metal electrode 300 is extended from the two-dimensional material 108 to be measured in the two-dimensional material mechanical magnetometry device for electrical connection to an external electrical component.

[0067] In a specific example, the two-dimensional electrical device further includes a thin film 400, which covers the surface of the two-dimensional material to be tested 108. The thin film 400 and the two-dimensional material to be tested 108 are combined to form a heterojunction structure.

[0068] The following are specific examples.

[0069] Example 1

[0070] In this example, the cantilever beam is made of silicon dioxide and has a long, strip-shaped structure with a length of 200 μm, a width of 20 μm, and a thickness of 300 nm. The preset position is an octagon, with the distance between opposing sides of the octagon being 35 μm. The two-dimensional material to be tested is CrPS4, with a length of 9 μm and a width of 3 μm. The organic solvent is ethanol.

[0071] In this embodiment, the two-dimensional material mechanical magnetism measurement method includes the following steps: monitoring the change of the intrinsic vibration frequency of the cantilever beam of the two-dimensional material mechanical magnetism measurement device with the magnetic field under weak infrared laser, and measuring the magnetic properties of the two-dimensional material by the change of the intrinsic vibration frequency of the cantilever beam of the two-dimensional material mechanical magnetism measurement device with the magnetic field. Figure 5 shown. Figure 5 The horizontal axis represents the intensity of the magnetic field, and the vertical axis represents the frequency shift of the cantilever beam, which directly reflects the magnitude of the mechanical dynamic torque. Figure 5 The process of spin sudden rotation can be observed, which can be used to calibrate the magnetism of two-dimensional materials.

[0072] The technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, not all possible combinations of the technical features in the above-mentioned embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0073] The above-described embodiments merely represent several implementation methods of the present invention, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the patent. It should be noted that a person skilled in the art may make several modifications and improvements without departing from the concept of the present invention, and these modifications and improvements fall within the scope of protection of the present invention. Therefore, the scope of protection of the patent for this invention shall be based on the appended claims, and the description and drawings may be used to interpret the content of the claims.

Claims

1. A method for preparing a two-dimensional material mechanical magnetic measurement device, characterized in that: The steps include: dissociating the two-dimensional material to be tested on a substrate; immersing the cantilever beam, the two-dimensional material to be tested, and the substrate in an organic solvent; In the organic solvent, separating the two-dimensional material to be tested from the substrate, and transferring the two-dimensional material to be tested to a preset position of the free end of the cantilever beam, so that the two-dimensional material to be tested adheres to the preset position; Separating the two-dimensional material to be tested from the substrate includes: using a probe to lift the two-dimensional material to be tested on the substrate.

2. The method for preparing the two-dimensional material mechanical magnetic measurement device according to claim 1, characterized in that: After using a probe to lift the two-dimensional material to be tested on the substrate, the two-dimensional material to be tested is supported by the probe, and the cantilever beam is moved so that the preset position of the free end of the cantilever beam is located below the two-dimensional material to be tested. The probe is moved so that the two-dimensional material to be tested is close to and attached to the preset position.

3. The method for preparing the two-dimensional material mechanical magnetic measurement device according to claim 1, characterized in that: The method further includes fixing a cantilever beam on the substrate, wherein the cantilever beam and the two-dimensional material to be measured are located at different positions on the substrate.

4. The method for preparing the two-dimensional material mechanical magnetic measurement device according to claim 1, characterized in that: The organic solvent includes at least one of acetone, ethanol and isopropyl alcohol.

5. The method for preparing the two-dimensional material mechanical magnetic measurement device according to claim 1, characterized in that: The width of the cross section at the preset position is greater than the width of the cross section at other positions of the free end of the cantilever beam.

6. The method for preparing a two-dimensional material mechanical magnetic measurement device according to any one of claims 1 to 5, characterized in that: The cantilever beam satisfies at least one of the following characteristics: (1) The thickness of the cantilever beam is 200 nm to 3000 nm; (2) The length of the cantilever beam is 100 μm to 500 μm; (3) The width of the cantilever beam is 5 μm to 20 μm; (4) The material of the cantilever beam includes at least one of silicon and silicon dioxide.

7. A two-dimensional material mechanical magnetic measurement device, characterized in that: Prepared by the preparation method according to any one of claims 1 to 6.

8. A method for measuring the magnetic field of two-dimensional materials, characterized in that: The steps include: The two-dimensional material mechanical magnetic measurement device according to claim 7 is used; The magnetism of the two-dimensional material is measured by changing the intrinsic vibration frequency of the cantilever beam of the two-dimensional material mechanical magnetometry device with the magnetic field.

9. A two-dimensional material electrical device, characterized in that: It comprises an electrode and the two-dimensional material mechanical magnetometry device as described in claim 7; the electrode is led out from the two-dimensional material to be measured in the two-dimensional material mechanical magnetometry device for electrical connection with an external electrical component.

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