Display panel and manufacturing method thereof

Abstract

The embodiment of the present invention discloses a display panel and a manufacturing method thereof; the display panel comprises a substrate, a light-emitting functional layer, a first electrode layer and an optical adjustment layer, the light-emitting functional layer comprises a plurality of light-emitting units with different light-emitting colors, the optical adjustment layer comprises a semiconductor oxide, the optical adjustment layer comprises at least a first optical layer and a second optical layer, the light-emitting colors of the light-emitting units corresponding to the first optical layer and the second optical layer are different, and the refractive index of at least one film layer of the first optical layer is different from the refractive index of at least one film layer of the second optical layer; the present invention adjusts the oxygen content in the process gas, adjusts the crystal morphology of the semiconductor material, and adjusts the refractive index of the film layer in the optical adjustment layer when forming a film by magnetron sputtering, so as to adapt to the optical requirements of light-emitting units with different light-emitting colors and improve the display effect of pixels with different light-emitting colors.

Description

Technical Field

[0001] The present invention relates to the field of display, and in particular to a display panel and a manufacturing method thereof. Background Art

[0002] In recent years, OLED (Organic Light Emitting Diode) display panels have the characteristics of wide color gamut, fast response, high contrast, simple and thin structure, etc., and are popular among consumers. In the OLED structure, TCO (Transparent Conductive Oxide) materials are widely used in OLED display panels due to their high conductivity, high transmittance and suitable work function. They play the role of flattening the topography, protecting the electrode metal, and compensating for the optical thickness. The common TCO material film forming method is magnetron sputtering. Generally, TCO films of different properties or types require the use of multiple devices. Therefore, the TCO film used for the reflective electrode is usually a single component, and the properties and film thickness of the TCO film corresponding to the light-emitting units of each color are the same. The optimization cost of pixels of different light-emitting colors is relatively high.

[0003] Therefore, a display panel and a manufacturing method thereof are urgently needed to solve the above technical problems. Summary of the invention

[0004] The present invention provides a display panel and a manufacturing method thereof, which can alleviate the current technical problem of high optimization cost for pixels of different luminous colors.

[0005] The present invention provides a display panel, comprising:

[0006] substrate;

[0007] A first electrode layer, located on the substrate;

[0008] an optical adjustment layer, located on the first electrode layer, wherein the optical adjustment layer comprises a semiconductor oxide;

[0009] A light-emitting functional layer, located on the optical adjustment layer, wherein the light-emitting functional layer includes a plurality of light-emitting units with different light-emitting colors;

[0010] Among them, the optical adjustment layer includes at least a first optical layer and a second optical layer, the first optical layer corresponds to the light-emitting unit of one light-emitting color, the second optical layer corresponds to the light-emitting unit of another light-emitting color, and the refractive index of at least one film layer of the first optical layer is different from the refractive index of at least one film layer of the second optical layer.

[0011] In some embodiments, at least one of the first optical layers includes a first sublayer and a second sublayer that are adjacent to each other, and the second sublayer is located between the first sublayer and the light-emitting functional layer; wherein the refractive index of the second sublayer is greater than the refractive index of the first sublayer.

[0012] In some embodiments, the light-emitting functional layer includes at least a first organic sublayer, the first organic sublayer is located on a surface of the second sublayer away from the substrate, and the refractive index of the second sublayer is greater than that of the first organic sublayer.

[0013] In some embodiments, at least one of the first optical layers includes a first sublayer, a second sublayer located on a side of the first sublayer close to the light-emitting functional layer, and a third sublayer located between the second sublayer and the light-emitting functional layer; wherein the refractive index of the second sublayer is smaller than that of the first sublayer, and the refractive index of the second sublayer is smaller than that of the third sublayer.

[0014] In some embodiments, the light-emitting functional layer includes at least a first organic sublayer, the first organic sublayer is located on a surface of the third sublayer away from the substrate, and the refractive index of the third sublayer is greater than that of the first organic sublayer.

[0015] In some embodiments, the number of film layers of the first optical layer is greater than the number of film layers of the second optical layer, and the wavelength of color light corresponding to the first optical layer is greater than the wavelength of color light corresponding to the second optical layer.

[0016] In some embodiments, the thickness of the first optical layer is greater than the thickness of the second optical layer.

[0017] In some embodiments, the display panel also includes: a second electrode layer, located on the side of the light-emitting functional layer away from the first electrode layer; a light extraction layer, located on the side of the second electrode layer away from the light-emitting functional layer, the light extraction layer includes a semiconductor oxide; wherein the light extraction layer includes at least a first extraction layer and a second extraction layer, the first extraction layer corresponds to the light-emitting unit of one light-emitting color, and the second extraction layer corresponds to the light-emitting unit of another light-emitting color, and the refractive index of at least one film layer of the first extraction layer is different from the refractive index of at least one film layer of the second extraction layer.

[0018] In some embodiments, at least one of the first extraction layers includes at least a first extraction sublayer and a second extraction sublayer, the first extraction sublayer is the film layer farthest from the light-emitting unit in the first extraction layer, and the second extraction sublayer is arranged on the surface of the first extraction sublayer close to the second electrode layer; wherein the refractive index of the first extraction sublayer is greater than the refractive index of the second extraction sublayer.

[0019] In some embodiments, the optical adjustment layer further includes a third optical layer, the refractive index of at least one film layer of the first optical layer, the refractive index of at least one film layer of the second optical layer, and the refractive index of at least one film layer of the third optical layer are different from each other, and the luminous colors of the light-emitting units corresponding to the first optical layer, the second optical layer, and the third optical layer are different from each other.

[0020] In some embodiments, the thickness of the first optical layer is greater than that of the second optical layer, and the thickness of the second optical layer is greater than that of the third optical layer; the number of film layers of the first optical layer is greater than the number of film layers of the second optical layer, and the number of film layers of the second optical layer is greater than the number of film layers of the third optical layer; the wavelength of the color light corresponding to the first optical layer is greater than the wavelength of the color light corresponding to the second optical layer, and the wavelength of the color light corresponding to the second optical layer is greater than the wavelength of the color light corresponding to the third optical layer.

[0021] The present invention also provides a method for manufacturing a display panel, comprising:

[0022] providing a first electrode layer;

[0023] Using magnetron sputtering technology, adding oxygen to the process gas, and forming at least a first optical layer and a second optical layer on the first electrode layer using a semiconductor oxide material, wherein the refractive index of at least one film layer of the first optical layer is different from the refractive index of at least one film layer of the second optical layer, so as to form an optical adjustment layer;

[0024] A plurality of light-emitting units with different light-emitting colors are formed on the side of the optical adjustment layer away from the first electrode layer, the first optical layer corresponds to the light-emitting units with one light-emitting color, and the second optical layer corresponds to the light-emitting units with another light-emitting color, so as to form a light-emitting functional layer.

[0025] Beneficial effects of the present invention: The present invention adjusts the oxygen content in the process gas and the crystal morphology of the semiconductor material during film formation by magnetron sputtering, thereby adjusting the refractive index of the film layer in the optical adjustment layer to adapt to the optical requirements of light-emitting units of different luminous colors and improve the display effects of pixels of different luminous colors. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without paying any creative work.

[0027] Figure 1is a schematic structural diagram of a display panel provided by an embodiment of the present invention;

[0028] Figure 2 yes Figure 1 A first enlarged schematic diagram of region A;

[0029] Figure 3 yes Figure 1 A second enlarged schematic diagram of region A;

[0030] Figure 4 yes Figure 1 A third enlarged schematic diagram of region A;

[0031] Figure 5 yes Figure 1 A fourth enlarged schematic diagram of region A;

[0032] Figure 6 yes Figure 1 An enlarged schematic diagram of region C;

[0033] Figure 7 yes Figure 1 An enlarged schematic diagram of region D;

[0034] Figure 8 yes Figure 1 An enlarged schematic diagram of region E;

[0035] Fig. 9 is a flowchart of the steps of a method for manufacturing a display panel provided by an embodiment of the present invention;

[0036] FIG. 10A to FIG. 10C is a schematic flow chart of a method for manufacturing a display panel provided by an embodiment of the present invention;

[0037] Fig.11 It is a schematic diagram of the structure of a display device provided by an embodiment of the present invention. DETAILED DESCRIPTION

[0038] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments in the present invention, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present invention. In addition, it should be understood that the specific implementation methods described herein are only used to illustrate and explain the present invention, and are not used to limit the present invention. In the present invention, unless otherwise specified, the directional words used, such as "upper" and "lower", generally refer to the upper and lower parts of the device in actual use or working state, specifically the drawing direction in the drawings; while "inside" and "outside" refer to the outline of the device.

[0039] In recent years, OLED (Organic Light Emitting Diode) display panels have the characteristics of wide color gamut, fast response, high contrast, simple and thin structure, etc., and are popular among consumers. In the OLED structure, TCO (Transparent Conductive Oxide) materials are widely used in OLED display panels due to their high conductivity, high transmittance and suitable work function. They play the role of flattening the topography, protecting the electrode metal, and compensating for the optical thickness. The common TCO material film forming method is magnetron sputtering. Generally, TCO films of different properties or types require the use of multiple devices. Therefore, the TCO film used for the reflective electrode is usually a single component, and the properties and film thickness of the TCO film corresponding to the light-emitting units of each color are the same. The optimization cost of pixels of different light-emitting colors is relatively high.

[0040] See also Figures 1 to 8 , an embodiment of the present invention provides a display panel 100, comprising:

[0041] Substrate 110;

[0042] A first electrode layer 200, located on the substrate 110;

[0043] An optical adjustment layer 400 is located on the first electrode layer 200, and the optical adjustment layer 400 includes a semiconductor oxide;

[0044] A light-emitting functional layer 300 is located on the optical adjustment layer 400, and the light-emitting functional layer 300 includes a plurality of light-emitting units 310 with different light-emitting colors;

[0045] The optical adjustment layer 400 includes at least a first optical layer 410 and a second optical layer 420, wherein the first optical layer 410 corresponds to the light-emitting unit 310 of one light-emitting color, and the second optical layer 420 corresponds to the light-emitting unit 310 of another light-emitting color, and the refractive index of at least one film layer of the first optical layer 410 is different from the refractive index of at least one film layer of the second optical layer 420.

[0046] The present invention adjusts the oxygen content in the process gas and the crystal morphology of the semiconductor material when forming a film by magnetron sputtering, thereby adjusting the refractive index of the film layer in the optical adjustment layer to meet the optical requirements of light-emitting units of different luminous colors and improve the display effect of pixels of different luminous colors.

[0047] The technical solution of the present invention is now described in conjunction with specific embodiments.

[0048] In this embodiment, please refer to Figure 1 , Figure 2The display panel 100 includes a substrate 110, a first electrode layer 200, a light-emitting functional layer 300, and an optical adjustment layer 400 located between the light-emitting functional layer 300 and the first electrode layer 200. The light-emitting functional layer 300 includes a plurality of light-emitting units 310 with different light-emitting colors. The first electrode layer 200 is located on a light-emitting side away from the light-emitting functional layer 300. The optical adjustment layer 400 includes a semiconductor oxide. The optical adjustment layer 400 includes at least a first optical layer 410 and a second optical layer 420. The refractive index of at least one film layer of the first optical layer 410 is different from the refractive index of at least one film layer of the second optical layer 420. The first optical layer 410 is located between the light-emitting unit 310 of one light-emitting color and the first electrode layer 200. The second optical layer 420 is located between the light-emitting unit 310 of another light-emitting color and the first electrode layer 200. For example, the first optical layer 410 corresponds to the light-emitting unit 310 emitting red light, and the second optical layer 420 corresponds to the light-emitting unit 310 emitting green light. In the figure, the light emitting unit 310 of red light is represented by R, the light emitting unit 310 of green light is represented by G, and the light emitting unit 310 of blue light is represented by B.

[0049] The display panel 100 further includes a second electrode layer 500 located on a side of the light-emitting functional layer 300 away from the first electrode layer 200. A cavity is formed between the first electrode layer 200 and the second electrode layer 500. The microcavity effect can be used to improve the light extraction efficiency and light color purity. For example, the wavelength of red light is greater than the wavelength of green light, and the optical path of red light needs to be greater than the optical path of green light, so as to improve the microcavity effect of red light. When forming a film by magnetron sputtering, oxygen is added to the process gas, and the crystal morphology of the semiconductor material is adjusted by adjusting the oxygen content, so as to adjust the refractive index of the film layer in the optical adjustment layer 400 to meet the optical requirements of the light-emitting units 310 with different light-emitting colors, and improve the display effect of pixels with different light-emitting colors. The principle that the optical path is positively correlated with the refractive index of the film layer is used. For example, the refractive index of the film layer of the optical adjustment layer 400 of the light-emitting unit 310 corresponding to red light is increased to improve the optical path of red light, thereby improving the microcavity effect of red light and improving the light extraction efficiency and light color purity.

[0050] In some embodiments, the light-emitting functional layer 300 can also adjust the length of the microcavity.

[0051] In some embodiments, the first electrode layer 200 is located on the light-emitting side away from the light-emitting functional layer 300, and the material of the first electrode layer 200 has a reflective function and a conductive function. The first electrode layer 200 includes any one or more of Ag, Al, Pt, Mo, Ti, Cu, and Mg, and the thickness of the first electrode layer 200 is 100 nm to 1000 nm.

[0052] In some embodiments, the light-emitting functional layer 300 includes at least a light-emitting material layer, and may also include a hole injection layer, a hole transport layer, an electron transport layer and an electron injection layer, an electron blocking layer between the hole transport layer and the light-emitting material layer, and a hole blocking layer between the light-emitting material layer and the electron transport layer; the light-emitting functional layer 300 may be prepared by one or more of vacuum evaporation, spin coating, printing, physical deposition, and chemical deposition methods.

[0053] In some embodiments, see Figure 1 , Figure 3 , Figure 4 At least one of the first optical layers 410 includes at least two film layers, and the refractive indexes of the at least two film layers of the first optical layer 410 are different.

[0054] The first optical layer 410 includes at least two film layers, and the refractive indices of the at least two film layers of the first optical layer 410 are different. By using the two film layers with different refractive indices, the optical properties of the first optical layer 410 can be changed according to different optical needs to achieve different optical effects and improve the display effect.

[0055] In some embodiments, see Figure 1 , Figure 3 , Figure 4 At least one of the first optical layers 410 includes a first sublayer 411 and a second sublayer 412 that are adjacent to each other, and a refractive index of the first sublayer 411 is different from a refractive index of the second sublayer 412 .

[0056] The first sublayer 411 and the second sublayer 412 with different refractive indices are arranged adjacent to each other, which has a more direct effect on light, reduces the complex influence of the multi-layer film layer on light, reduces the amount of calculation for designing the refractive index of the film layer, and is more conducive to changing the optical properties of the first optical layer 410 according to different optical needs, so as to achieve different optical effects and improve the display effect.

[0057] In some embodiments, see Figure 1 , Figure 3 , Figure 4 , the second sub-layer 412 is located between the first sub-layer 411 and the light-emitting functional layer 300 ; wherein the refractive index of the second sub-layer 412 is greater than the refractive index of the first sub-layer 411 .

[0058] The direction from the first sublayer 411 to the second sublayer 412 is the direction in which light is emitted from the display panel 100. The first sublayer 411 and the second sublayer 412 form a relatively low-high refractive index, which can improve the degree of convergence of light, thereby improving the light extraction efficiency and improving the display effect.

[0059] In some embodiments, see Figure 1 , Figure 6 In the figure (b), the light-emitting functional layer 300 includes at least a first organic sublayer 301, the first organic sublayer 301 is located on the surface of the second sublayer 412 away from the substrate 110, the refractive index of the second sublayer 412 is greater than the refractive index of the first organic sublayer 301, and the refractive index of the second sublayer 412 is greater than the refractive index of the film layer of the light-emitting functional layer 300 closest to the second sublayer 412. The first sublayer 411-the second sublayer 412-the first organic sublayer 301 forms a relatively low-high-low refractive index, and the light can move in multiple ways in the second sublayer 412 by using the optical waveguide principle, thereby increasing the optical path of the light, combining with the microcavity effect, improving the light extraction rate and light color purity, and the increase in the optical path of the light simultaneously reduces the film thickness in disguise, reducing the material cost.

[0060] In some embodiments, if the light-emitting functional layer 300 includes a light-emitting material layer, the first organic sublayer 301 is a light-emitting material layer; if the light-emitting functional layer 300 includes a light-emitting material layer and an electron blocking layer, the first organic sublayer 301 is an electron blocking layer; if the light-emitting functional layer 300 includes a light-emitting material layer, an electron blocking layer and a hole transport layer, the first organic sublayer 301 is a hole transport layer; if the light-emitting functional layer 300 includes a light-emitting material layer, an electron blocking layer, a hole transport layer and a hole injection layer, the first organic sublayer 301 is a hole injection layer.

[0061] In some embodiments, according to different display requirements, the difference between the refractive index of the second sub-layer 412 and the refractive index of the first sub-layer 411, and the difference between the refractive index of the second sub-layer 412 and the refractive index of the film layer of the light-emitting functional layer 300 closest to the second sub-layer 412 are adjusted to achieve different optical effects and improve the display effect.

[0062] In some embodiments, the second sublayer 412 is located between the first sublayer 411 and the light-emitting functional layer 300; wherein, the refractive index of the second sublayer 412 is less than the refractive index of the first sublayer 411, and the first sublayer 411 and the second sublayer 412 form a relatively high-low refractive index, so that the light has a divergent effect, which can further improve the display viewing angle of the light.

[0063] In some embodiments, see Figure 1 , Figure 5At least one of the first optical layers 410 includes a first sublayer 411, a second sublayer 412 located on the side of the first sublayer 411 close to the light-emitting functional layer 300, and a third sublayer 413 located between the second sublayer 412 and the light-emitting functional layer 300; wherein the refractive index of the second sublayer 412 is smaller than the refractive index of the first sublayer 411, and the refractive index of the second sublayer 412 is smaller than the refractive index of the third sublayer 413.

[0064] The first sublayer 411-the second sublayer 412-the third sublayer 413 form a relatively high-low-high refractive index. When the light passes through the second sublayer 412 and the third sublayer 413, the light passes through the low refractive index film layer to the high refractive index film layer, which can increase the degree of light convergence, thereby increasing the light extraction efficiency and improving the display effect.

[0065] In some embodiments, see Figure 1 , Figure 6 In Figure (c), the light-emitting functional layer 300 includes at least a first organic sublayer 301, the first organic sublayer 301 is located on the surface of the third sublayer 413 away from the substrate 110, the refractive index of the third sublayer 413 is greater than the refractive index of the first organic sublayer 301, and the refractive index of the third sublayer 413 is greater than the refractive index of the film layer of the light-emitting functional layer 300 closest to the third sublayer 413. The second sublayer 412-third sublayer 413-first organic sublayer 301 forms a relatively low-high-low refractive index, and the light can move in multiple ways in the third sublayer 413 by using the optical waveguide principle, thereby increasing the optical path of the light, combining with the microcavity effect, improving the light extraction rate and light color purity, and the increase in the optical path of the light simultaneously reduces the film thickness in disguised form, reducing material costs.

[0066] In some embodiments, the refractive index of the first sublayer 411 is different from the refractive index of the third sublayer 413. According to different optical requirements, the difference between the refractive index of the first sublayer 411 and the refractive index of the third sublayer 413 is adjusted to achieve different optical effects and improve display effects.

[0067] For example, if the refractive index of the third sublayer 413 is greater than that of the first sublayer 411, the convergence degree of light can be increased and the light extraction rate can be improved; for example, if the refractive index of the third sublayer 413 is less than that of the first sublayer 411, the scattering degree of light can be increased and the starting angle can be improved.

[0068] In some embodiments, see Figure 1 , Figure 2 The first optical layer 410 may include a film layer, such as a first sub-layer 411, the refractive index of which may be set larger within a suitable range to increase the degree of light convergence and the light extraction rate; at the same time, please refer to Figure 6 In Figure (a), the first electrode layer 200-first sublayer 411-second electrode layer 500 form a relatively low-high-low refractive index. The optical waveguide principle is used to allow light to move in multiple paths in the first sublayer 411, thereby increasing the optical path of the light. Combined with the microcavity effect, the light output rate and light color purity are improved. The increase in the optical path of the light simultaneously reduces the film thickness in disguise, thereby reducing material costs.

[0069] In some embodiments, see Figure 1 , Figure 3 , Figure 5 , the number of film layers of the first optical layer 410 is different from the number of film layers of the second optical layer 420.

[0070] According to the wavelength of different colors of light, different numbers of film layers are matched to improve the optical performance of different colors of light.

[0071] In some embodiments, see Figure 1 , Figure 3 , Figure 5 The number of film layers of the first optical layer 410 is greater than the number of film layers of the second optical layer 420 , and the wavelength of the color light corresponding to the first optical layer 410 is greater than the wavelength of the color light corresponding to the second optical layer 420 .

[0072] In order to improve the microcavity effect, increase the light output rate and light color purity, longer wavelength color light needs to be matched with a film layer with a longer optical path. The number of film layers is positively correlated with the film thickness, and the film thickness is positively correlated with the optical path. At the same time, increasing the number of film layers can also increase the diversity of optical improvement directions and meet different optical needs.

[0073] In some embodiments, see Figure 1 , Figure 3 , Figure 5 , the thickness of the first optical layer 410 is greater than the thickness of the second optical layer 420. The wavelength of the color light corresponding to the first optical layer 410 is greater than the wavelength of the color light corresponding to the second optical layer 420. In the appropriate film thickness range, color light with a longer wavelength needs to be matched with a film layer with a longer optical path. The more film layers there are, the thicker the film layers are, and the longer the film optical path is, the better the microcavity effect can be, and the light extraction rate and light color purity can be increased.

[0074] In some embodiments, see Figure 1 , Figure 3 , Figure 5 The optical adjustment layer 400 further includes a third optical layer 430, and the third optical layer 430 corresponds to a light-emitting unit 310 of a certain light-emitting color. The light-emitting colors of the light-emitting units 310 corresponding to the first optical layer 410, the second optical layer 420, and the third optical layer 430 are different from each other.

[0075] In some embodiments, the refractive index of at least one film layer of the first optical layer 410 , the refractive index of at least one film layer of the second optical layer 420 , and the refractive index of at least one film layer of the third optical layer 430 are different from each other.

[0076] In some embodiments, the refractive index of at least one film layer of the first optical layer 410 is different from the refractive index of at least one film layer of the third optical layer 430 , and the refractive index of at least one film layer of the second optical layer 420 is different from the refractive index of at least one film layer of the third optical layer 430 .

[0077] In some embodiments, see Figure 1 , Figure 3 The light of the light-emitting unit 310 of the light-emitting functional layer 300 can be any one of red, green and blue. It can be understood that the first optical layer 410 can correspond to the red light-emitting unit 310, the second optical layer 420 can correspond to the green light-emitting unit 310, and the third optical layer 430 can correspond to the blue light-emitting unit 310.

[0078] In some embodiments, the structures of the second optical layer 420 and the third optical layer 430 can refer to any of the above structures of the first optical layer 410 and be adjusted according to different color lights, which will not be described in detail herein.

[0079] In some embodiments, see Figure 1 , Figure 5 , the thickness of the first optical layer 410 is greater than the thickness of the second optical layer 420, and the thickness of the second optical layer 420 is greater than the thickness of the third optical layer 430. The number of film layers of the first optical layer 410 is greater than the number of film layers of the second optical layer 420, and the number of film layers of the second optical layer 420 is greater than the number of film layers of the third optical layer 430. The wavelength of the color light corresponding to the first optical layer 410 is greater than the wavelength of the color light corresponding to the second optical layer 420. The wavelength of the color light corresponding to the second optical layer 420 is greater than the wavelength of the color light corresponding to the third optical layer 430.

[0080] In the appropriate film thickness range, longer wavelength color light needs to be matched with a film with a longer optical path. The more film layers there are and the thicker the film layers are, the longer the film optical path is, which can improve the microcavity effect and increase the light output rate and light color purity.

[0081] In some embodiments, the refractive index of any layer in the optical adjustment layer 400 is 1.8 to 2.5, and the material is any one or more semiconductor oxides such as IZO, ITO, AZO, IGZO, etc., and the thickness of the optical adjustment layer 400 is 30nm to 3000nm. The number of film layers in the optical adjustment layer 400 can be 1 to 6 layers, preferably 2 to 3 layers.

[0082] In some embodiments, the display panel 100 further includes an auxiliary adjustment layer located on either or both sides of the optical adjustment layer 400, and the auxiliary adjustment layer includes an organic material. Due to the high refractive index of the optical adjustment layer 400, the organic material of the auxiliary adjustment layer can be reduced, thus saving materials and reducing costs.

[0083] In some embodiments, see Figure 1 , Figure 7 The display panel 100 also includes a second electrode layer 500 located on the side of the light-emitting functional layer 300 away from the first electrode layer 200 and a light extraction layer 600 located on the side of the second electrode layer 500 away from the light-emitting functional layer 300, the light extraction layer 600 includes a semiconductor oxide, the light extraction layer 600 includes at least a first extraction layer 610 and a second extraction layer 620, the first extraction layer 610 corresponds to the light-emitting unit 310 of one light-emitting color, the second extraction layer 620 corresponds to the light-emitting unit 310 of another light-emitting color, and the refractive index of at least one film layer of the first extraction layer 610 is different from the refractive index of at least one film layer of the second extraction layer 620.

[0084] When using magnetron sputtering to form a film, oxygen is added to the process gas. By adjusting the oxygen content, the crystal morphology of the semiconductor material is adjusted, thereby adjusting the refractive index of the film layer in the light extraction layer 600 to adapt to the optical requirements of the light-emitting units 310 of different luminous colors, improve the optical performance, and improve the display effect of pixels of different luminous colors.

[0085] In some embodiments, the second electrode layer 500 is a thin film having a single-layer or multi-layer composite structure, and the material includes any one or more combinations of Ag, Al, Pt, Mo, Ti, Cu, and Mg. The thickness of the second electrode layer 500 is 1 nm to 100 nm.

[0086] In some embodiments, see Figure 1 , Figure 8In Figure (b), at least one of the first extraction layers 610 includes at least a first extraction sublayer 611 and a second extraction sublayer 612, wherein the first extraction sublayer 611 is the film layer farthest from the light-emitting unit 310 in the first extraction layer 610, and the second extraction sublayer 612 is arranged on the surface of the first extraction sublayer 611 close to the second electrode layer 500; wherein the refractive index of the first extraction sublayer 611 is greater than the refractive index of the second extraction sublayer 612.

[0087] The refractive index of the film layer of the first extraction layer 610 that is farthest from the light-emitting unit 310 is relatively high, which can improve the light-gathering effect of the first extraction layer 610 and the light extraction efficiency.

[0088] In some embodiments, see Figure 1 , Figure 8 In Figure (c), the first extraction layer 610 includes a first extraction sublayer 611, a second extraction sublayer 612 and a third extraction layer 630, the first extraction sublayer 611 is the film layer farthest from the light-emitting unit 310 in the first extraction layer 610, the second extraction sublayer 612 is arranged on the surface of the first extraction sublayer 611 close to the second electrode layer 500, and the third extraction sublayer 613 is arranged on the surface of the second extraction sublayer 612 close to the second electrode layer 500; wherein the refractive index of the first extraction sublayer 611 is greater than the refractive index of the second extraction sublayer 612, and the refractive index of the third extraction sublayer 613 is greater than the refractive index of the second extraction sublayer 612.

[0089] In some embodiments, see Figure 1 , Figure 8 As shown in Figure (a), the first extraction layer 610 may include a film layer, such as a first extraction sub-layer 611, and the refractive index of the film layer may be set larger within a suitable range to increase the degree of light convergence and improve the light extraction rate.

[0090] In some embodiments, the refractive index of any layer in the light extraction layer 600 is 1.8 to 2.5, and the material includes any one or more semiconductor oxides such as IZO, ITO, AZO, IGZO, etc. The thickness of the light extraction layer 600 is 30nm to 3000nm.

[0091] In some embodiments, the light extraction layer 600 further includes an organic material having a molecular weight of 100-800.

[0092] In some embodiments, the number of film layers in the light extraction layer 600 can be 1 to 6 layers, preferably 2 to 3 layers.

[0093] In some embodiments, see Figure 1 , Figure 7The light extraction layer 600 also includes a third extraction layer 630, and the third extraction layer 630 corresponds to a light-emitting unit 310 of a certain light-emitting color. The light-emitting colors of the light-emitting units 310 corresponding to the first extraction layer 610, the second extraction layer 620, and the third extraction layer 630 are different from each other.

[0094] In some embodiments, see Figure 1 , Figure 7 It can be understood that the first extraction layer 610 can correspond to the red light emitting unit 310 , the second extraction layer 620 can correspond to the green light emitting unit 310 , and the third extraction layer 630 can correspond to the blue light emitting unit 310 .

[0095] In some embodiments, the structures of the second extraction layer 620 and the third extraction layer 630 can refer to any of the above structures of the first extraction layer 610 and be adjusted according to different colors of light, which will not be described in detail here.

[0096] In some embodiments, the display panel 100 further includes a diffusion layer located on a side of the light extraction layer 600 away from the first electrode layer 200, and the refractive index of the film layer of the diffusion layer closest to the light extraction layer 600 is smaller than the refractive index of the film layer of the light extraction layer 600 closest to the diffusion layer. The diffusion layer is used to diffuse the light, thereby further improving the display viewing angle of the light.

[0097] In some embodiments, see Figure 1 The display panel 100 further includes a substrate 110 and an array substrate 120 located between the substrate 110 and the first electrode layer 200 .

[0098] In some embodiments, the array substrate 120 includes an active layer located on the substrate 110, a first insulating layer located on the active layer, a gate layer located on the first insulating layer, a second insulating layer located on the gate layer, a source and drain layer located on the second insulating layer, and a third insulating layer located on the source and drain layer.

[0099] In some embodiments, the substrate 110 may be a rigid substrate 110 or a flexible substrate 110. The material of the rigid substrate 110 includes but is not limited to glass, ceramic, metal, alloy, silicon wafer, etc.; the material of the flexible substrate 110 includes but is not limited to polyethylene, polystyrene, polyvinyl chloride, polyamide, polyimide, polyethylene naphthalate, polyethylene terephthalate, and homologues and isomers of the above materials, and polymers having hydrocarbon groups or aromatic rings or heterocyclic groups with 1 to 16 carbon atoms, 1 to 9 N atoms, and 1 to 5 O atoms added thereto.

[0100] The present invention adjusts the oxygen content in the process gas and the crystal morphology of the semiconductor material when forming a film by magnetron sputtering, thereby adjusting the refractive index of the film layer in the optical adjustment layer to meet the optical requirements of light-emitting units of different luminous colors and improve the display effect of pixels of different luminous colors.

[0101] See also Fig. 9 The embodiment of the present invention further provides a method for manufacturing a display panel 100, comprising:

[0102] S100, providing a first electrode layer 200;

[0103] S200, using magnetron sputtering technology, adding oxygen to the process gas, and using semiconductor oxide material to form at least a first optical layer 410 and a second optical layer 420 on the first electrode layer 200, wherein the refractive index of at least one film layer of the first optical layer 410 is different from the refractive index of at least one film layer of the second optical layer 420, so as to form an optical adjustment layer 400;

[0104] S300, forming a plurality of light-emitting units 310 with different light-emitting colors on the side of the optical adjustment layer 400 away from the first electrode layer 200, wherein the first optical layer 410 corresponds to the light-emitting units 310 of one light-emitting color, and the second optical layer 420 corresponds to the light-emitting units 310 of another light-emitting color, so as to form a light-emitting functional layer 300.

[0105] The present invention adjusts the oxygen content in the process gas and the crystal morphology of the semiconductor material when forming a film by magnetron sputtering, thereby adjusting the refractive index of the film layer in the optical adjustment layer to meet the optical requirements of light-emitting units of different luminous colors and improve the display effect of pixels of different luminous colors.

[0106] The technical solution of the present invention is now described in conjunction with specific embodiments.

[0107] In this embodiment, the manufacturing method of the display panel 100 includes:

[0108] S100, providing a first electrode layer 200, see Fig. 10A .

[0109] In some embodiments, the first electrode layer 200 is located on the side away from the light output, and the material of the first electrode layer 200 has a reflective function and a conductive function. The first electrode layer 200 includes any one or more of Ag, Al, Pt, Mo, Ti, Cu, and Mg, and the thickness of the first electrode layer 200 is 100 nm to 1000 nm.

[0110] S200, using magnetron sputtering technology, adding oxygen to the process gas, using semiconductor oxide material to form at least a first optical layer 410 and a second optical layer 420 on the first electrode layer 200, the refractive index of at least one film layer of the first optical layer 410 is different from the refractive index of at least one film layer of the second optical layer 420, so as to form an optical adjustment layer 400, see Fig. 10B .

[0111] In some embodiments, step S200 includes:

[0112] S210, using magnetron sputtering technology, adding oxygen to the process gas, and using semiconductor oxide materials to form at least a first optical layer 410, a second optical layer 420, and a third optical layer 430 on the first electrode layer 200, the refractive index of at least one film layer of the first optical layer 410, the refractive index of at least one film layer of the second optical layer 420, and the refractive index of at least one film layer of the third optical layer 430 are different from each other, so as to form an optical adjustment layer 400.

[0113] In some embodiments, the refractive index of at least one film layer of the first optical layer 410 is different from the refractive index of at least one film layer of the third optical layer 430 , and the refractive index of at least one film layer of the second optical layer 420 is different from the refractive index of at least one film layer of the third optical layer 430 .

[0114] In some embodiments, see Figure 1 , Figure 3 , Figure 5 The optical adjustment layer 400 further includes a third optical layer 430, and the third optical layer 430 corresponds to a light-emitting unit 310 of a certain light-emitting color. The light-emitting colors of the light-emitting units 310 corresponding to the first optical layer 410, the second optical layer 420, and the third optical layer 430 are different from each other.

[0115] In some embodiments, see Figure 1 , Figure 5 , the thickness of the first optical layer 410 is greater than the thickness of the second optical layer 420, and the thickness of the second optical layer 420 is greater than the thickness of the third optical layer 430. The number of film layers of the first optical layer 410 is greater than the number of film layers of the second optical layer 420, and the number of film layers of the second optical layer 420 is greater than the number of film layers of the third optical layer 430. The wavelength of the color light corresponding to the first optical layer 410 is greater than the wavelength of the color light corresponding to the second optical layer 420. The wavelength of the color light corresponding to the second optical layer 420 is greater than the wavelength of the color light corresponding to the third optical layer 430.

[0116] In some embodiments, see Figure 1 , Figure 3 The light of the light-emitting unit 310 of the light-emitting functional layer 300 can be any one of red, green and blue. It can be understood that the first optical layer 410 can correspond to the red light-emitting unit 310, the second optical layer 420 can correspond to the green light-emitting unit 310, and the third optical layer 430 can correspond to the blue light-emitting unit 310.

[0117] In some embodiments, the structures of the second optical layer 420 and the third optical layer 430 can refer to any of the above structures of the first optical layer 410 and be adjusted according to different color lights, which will not be described in detail herein.

[0118] In some embodiments, the process gas also includes an inert gas and / or nitrogen, and the inert gas can be argon. By adjusting the oxygen content in the process gas, the crystal morphology of the semiconductor material is adjusted to adjust the refractive index of the film. The refractive index of the film can be adjusted without replacing or adding target materials or magnetron sputtering equipment, thereby reducing the cost of materials and equipment. The proportion of oxygen in the process gas is 0% to 50%, preferably 0.01% to 20%, and the refractive index of the film is adjusted in the range of 1.8 to 2.5.

[0119] S300, forming a plurality of light-emitting units 310 with different light-emitting colors on the side of the optical adjustment layer 400 away from the first electrode layer 200, wherein the first optical layer 410 corresponds to the light-emitting unit 310 with one light-emitting color, and the second optical layer 420 corresponds to the light-emitting unit 310 with another light-emitting color, so as to form a light-emitting functional layer 300, see Fig. 10C .

[0120] In some embodiments, see Figure 1 , Figure 5 The optical adjustment layer 400 further includes a third optical layer 430, and the third optical layer 430 corresponds to a light-emitting unit 310 of a certain light-emitting color. The light-emitting colors of the light-emitting units 310 corresponding to the first optical layer 410, the second optical layer 420, and the third optical layer 430 are different from each other.

[0121] In some embodiments, see Figure 1 , Figure 5 The light of the light-emitting unit 310 of the light-emitting functional layer 300 can be any one of red, green and blue. It can be understood that the first optical layer 410 can correspond to the red light-emitting unit 310, the second optical layer 420 can correspond to the green light-emitting unit 310, and the third optical layer 430 can correspond to the blue light-emitting unit 310.

[0122] In some embodiments, the method for manufacturing the display panel 100 further includes:

[0123] S400, forming a second electrode layer 500 on a side of the light-emitting functional layer 300 away from the first electrode layer 200, see Figure 1 .

[0124] In some embodiments, the second electrode layer 500 is a thin film having a single-layer or multi-layer composite structure, and the material includes any one or more combinations of Ag, Al, Pt, Mo, Ti, Cu, and Mg. The thickness of the second electrode layer 500 is 1 nm to 100 nm.

[0125] S500, using magnetron sputtering technology, adding oxygen to the process gas, using semiconductor oxide material to form at least a first extraction layer 610 and a second extraction layer 620 on the second electrode layer 500, the refractive index of at least one film layer of the first extraction layer 610 is different from the refractive index of at least one film layer of the second extraction layer 620, so as to form a light extraction layer 600, see Figure 1 .

[0126] In some embodiments, see Figure 1 , Figure 7 The light extraction layer 600 also includes a third extraction layer 630, and the third extraction layer 630 corresponds to a light-emitting unit 310 of a certain light-emitting color. The light-emitting colors of the light-emitting units 310 corresponding to the first extraction layer 610, the second extraction layer 620, and the third extraction layer 630 are different from each other.

[0127] In some embodiments, see Figure 1 , Figure 7 It can be understood that the first extraction layer 610 can correspond to the red light emitting unit 310 , the second extraction layer 620 can correspond to the green light emitting unit 310 , and the third extraction layer 630 can correspond to the blue light emitting unit 310 .

[0128] The present invention adjusts the oxygen content in the process gas and the crystal morphology of the semiconductor material when forming a film by magnetron sputtering, thereby adjusting the refractive index of the film layer in the optical adjustment layer to meet the optical requirements of light-emitting units of different luminous colors and improve the display effect of pixels of different luminous colors.

[0129] See also Fig.11 An embodiment of the present invention further provides a display device 10, comprising any of the above-mentioned display panels 100 and a device body 20, wherein the device body 20 and the display panel 100 are combined into a whole.

[0130] The specific structure of the display panel 100 may be referred to any of the above embodiments and drawings of the display panel 100 , and will not be described in detail herein.

[0131] In this embodiment, the device body 20 may include a middle frame, frame glue, etc., and the display device 10 may be a display terminal such as a mobile phone, a tablet, a television, etc., which is not limited here.

[0132] The embodiment of the present invention discloses a display panel and a manufacturing method thereof; the display panel comprises a substrate, a light-emitting functional layer, a first electrode layer and an optical adjustment layer, the light-emitting functional layer comprises a plurality of light-emitting units with different light-emitting colors, the optical adjustment layer comprises a semiconductor oxide, and the optical adjustment layer comprises at least a first optical layer and

[0133] The second optical layer, the luminous colors of the luminous units corresponding to the first optical layer and the second optical layer are different, and the refractive index of at least one film layer of the first optical layer is different from the refractive index of at least one film layer of the second optical layer; the present invention adjusts the oxygen content in the process gas, adjusts the crystal morphology of the semiconductor material, and adjusts the refractive index of the film layer in the optical adjustment layer when forming a film by magnetron sputtering to adapt to the optical requirements of luminous units with different luminous colors and improve the display effect of pixels with different luminous colors.

[0134] The above is a detailed introduction to a display panel and a manufacturing method thereof provided in an embodiment of the present invention. Specific examples are used herein to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention and its core idea. At the same time, for those skilled in the art, according to the idea of ​​the present invention, there will be changes in the specific implementation methods and application scopes. In summary, the content of this specification should not be understood as a limitation on the present invention.

Claims

1. A display panel, characterized in that: include: substrate; A first electrode layer, located on the substrate; an optical adjustment layer, located on the first electrode layer, wherein the optical adjustment layer comprises a semiconductor oxide; A light-emitting functional layer, located on the optical adjustment layer, wherein the light-emitting functional layer includes a plurality of light-emitting units with different light-emitting colors; a second electrode layer, located at a side of the light-emitting functional layer away from the first electrode layer, and a cavity is formed between the first electrode layer and the second electrode layer; Among them, the optical adjustment layer includes at least a first optical layer and a second optical layer, the first optical layer corresponds to the light-emitting unit of one light-emitting color, the second optical layer corresponds to the light-emitting unit of another light-emitting color, the refractive index of at least one film layer of the first optical layer is different from the refractive index of at least one film layer of the second optical layer; the number of film layers of the first optical layer is greater than the number of film layers of the second optical layer, and the wavelength of the color light corresponding to the first optical layer is greater than the wavelength of the color light corresponding to the second optical layer.

2. The display panel according to claim 1, characterized in that: At least one of the first optical layers includes a first sublayer and a second sublayer that are adjacently arranged, and the second sublayer is located between the first sublayer and the light-emitting functional layer; The refractive index of the second sub-layer is greater than the refractive index of the first sub-layer.

3. The display panel according to claim 2, characterized in that: The light-emitting functional layer at least includes a first organic sublayer, which is located on a surface of the second sublayer away from the substrate, and the refractive index of the second sublayer is greater than that of the first organic sublayer.

4. The display panel according to claim 2, characterized in that: At least one of the first optical layers includes a first sublayer, a second sublayer located on a side of the first sublayer close to the light-emitting functional layer, and a third sublayer located between the second sublayer and the light-emitting functional layer; The refractive index of the second sublayer is smaller than that of the first sublayer, and the refractive index of the second sublayer is smaller than that of the third sublayer.

5. The display panel according to claim 4, characterized in that: The light-emitting functional layer at least includes a first organic sublayer, which is located on a surface of the third sublayer away from the substrate, and the refractive index of the third sublayer is greater than that of the first organic sublayer.

6. The display panel according to claim 1, characterized in that: The thickness of the first optical layer is greater than the thickness of the second optical layer.

7. The display panel according to claim 1, characterized in that: The display panel further includes: A light extraction layer, located on a side of the second electrode layer away from the light-emitting functional layer, the light extraction layer comprising a semiconductor oxide; Among them, the light extraction layer includes at least a first extraction layer and a second extraction layer, the first extraction layer corresponds to the light-emitting unit of one light-emitting color, and the second extraction layer corresponds to the light-emitting unit of another light-emitting color, and the refractive index of at least one film layer of the first extraction layer is different from the refractive index of at least one film layer of the second extraction layer.

8. The display panel according to claim 7, characterized in that: At least one of the first extraction layers includes at least a first extraction sublayer and a second extraction sublayer, wherein the first extraction sublayer is a film layer in the first extraction layer farthest from the light-emitting unit, and the second extraction sublayer is arranged on a surface of the first extraction sublayer close to the second electrode layer; Wherein, the refractive index of the first extraction sub-layer is greater than the refractive index of the second extraction sub-layer.

9. The display panel according to claim 1, characterized in that: The optical adjustment layer also includes a third optical layer, the refractive index of at least one film layer of the first optical layer, the refractive index of at least one film layer of the second optical layer, and the refractive index of at least one film layer of the third optical layer are different from each other, and the luminous colors of the light-emitting units corresponding to the first optical layer, the second optical layer, and the third optical layer are different from each other.

10. The display panel according to claim 9, characterized in that: The thickness of the first optical layer is greater than the thickness of the second optical layer, and the thickness of the second optical layer is greater than the thickness of the third optical layer; The number of film layers of the first optical layer is greater than the number of film layers of the second optical layer, and the number of film layers of the second optical layer is greater than the number of film layers of the third optical layer; The wavelength of the color light corresponding to the first optical layer is greater than the wavelength of the color light corresponding to the second optical layer, and the wavelength of the color light corresponding to the second optical layer is greater than the wavelength of the color light corresponding to the third optical layer.

11. A method for manufacturing a display panel, characterized in that: include: providing a first electrode layer; Using magnetron sputtering technology, adding oxygen to the process gas, and using semiconductor oxide material to form at least a first optical layer and a second optical layer on the first electrode layer, wherein the number of film layers of the first optical layer is greater than the number of film layers of the second optical layer, and the refractive index of at least one film layer of the first optical layer is different from the refractive index of at least one film layer of the second optical layer, so as to form an optical adjustment layer; A plurality of light-emitting units with different light-emitting colors are formed on the side of the optical adjustment layer away from the first electrode layer, the first optical layer corresponds to the light-emitting units with one light-emitting color, and the second optical layer corresponds to the light-emitting units with another light-emitting color, so as to form a light-emitting functional layer, and the wavelength of the color light corresponding to the first optical layer is greater than the wavelength of the color light corresponding to the second optical layer; A second electrode layer is formed on a side of the light emitting unit away from the first electrode layer, and a cavity is formed between the second electrode layer and the first electrode layer.

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