A fully automatic exposure machine
By combining a cage-like frame clamp and CCD positioning in the automatic exposure machine, the problems of equipment damage and low automation were solved, achieving efficient automated transport and precise positioning of substrates, thus improving production efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-12-28
- Publication Date
- 2026-03-24
AI Technical Summary
Existing automatic exposure machines are prone to damage when dealing with PCBs of varying thicknesses, and their low level of automation results in low production efficiency.
By combining a pig cage frame clamp and CCD positioning, the automated conveying and precise positioning of the substrate is achieved. The loading and unloading efficiency is improved by a six-station rotating hopper, and precise exposure operations are performed by combining a robotic arm and a linear motor.
It improves substrate positioning accuracy, reduces substrate wear, enables fully automated operation, reduces human resource input, and improves processing efficiency.
Smart Images

Figure CN115955777B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The application relates to the technical field of PCB exposure, and particularly relates to a full-automatic exposure machine. BACKGROUND
[0002] In a PCB manufacturing process, one of the most critical processes is transferring a film image to a substrate: a photosensitive material is first coated on the substrate, then the photosensitive material coated on the substrate is subjected to light radiation, so that the solubility changes, and the resin of the non-photosensitive part does not undergo polymerization reaction, and under the action of a developing solution, the resin of the non-photosensitive part is dissolved, and the photosensitive material of the photosensitive part undergoes polymerization reaction and is solidified on the substrate to form an image, which is an exposure process. An automatic exposure machine is a machine device for transferring image information on a film or other transparent body to a surface coated with a photosensitive substance through UVLED parallel light emitted by turning on a lamp, and is an indispensable main production device in the semiconductor manufacturing, PCB and passive component industries.
[0003] After a large amount of retrieval, the prior art of CN106814555B is found, which discloses an automatic exposure machine. The automatic exposure machine usually adopts a mechanical hand to realize material conveying, but when different thicknesses of PCBs are dealt with, the equipment is prone to damage due to the lack of thickness compensation measures. The automatic exposure machine comprises a rack, a conveying guide rail arranged on the rack along a material feeding direction, a movable guide plate arranged on the conveying guide rail, a mechanical hand arranged on the guide plate and capable of moving linearly in a vertical direction and used for fixing the material, a driving device arranged correspondingly to the mechanical hand and used for driving the mechanical hand to move, and a push rod and a first elastic member used for pushing the mechanical hand to ascend and pulling the mechanical hand to descend. In the case that the material is relatively thick, the mechanical hand has been in full contact with the material, but the push rod of the driving device will still descend and separate from the mechanical hand due to the stroke, at this time, the driving device is connected with the mechanical hand through the first elastic member, and has the function of thickness compensation, and is safer to use.
[0004] To sum up, the exposure machine is one of the key devices for completing pattern transfer, and plays a very important role in the manufacturing process of PCBs. The existing manual exposure machine needs manual work for the alignment between a film and a piece to be exposed, one operator and 2-3 auxiliary workers are needed for one manual exposure machine. In recent years, exposure machines using a camera for automatic alignment have appeared on the market, and each device also needs an operator. Due to the limitation of the technical conditions of the device, in most cases, only single-side automatic alignment can be carried out, and thus the production efficiency is much lower than that of the manual exposure machine. In order to solve the problem that the existing exposure machine needs manual operation and has low automation degree, resulting in low production efficiency, a full-automatic exposure machine is provided. SUMMARY
[0005] The present application aims to provide a full-automatic exposure machine to solve the problems in the background art.
[0006] To achieve the above object, the present application provides the following technical solution: a full-automatic exposure machine, comprising a substrate alignment mechanism, a rotary feeding bin, a material taking manipulator, a carrying manipulator, a CCD alignment mechanism, an exposure mechanism, a rotary discharging bin and an exposure system, the exposure mechanism is symmetrically provided with the carrying manipulators on both sides, and the rotary feeding bin and the rotary discharging bin are respectively arranged at the ends of the two carrying manipulators away from each other.
[0007] The CCD alignment mechanism is arranged between the rotary feeding bin and the exposure mechanism, and the exposure system is arranged above the exposure mechanism.
[0008] Preferably, the rotary feeding bin comprises a feeding divider, a feeding guide rod, a feeding clamp bin base, a feeding pigsty bin clamp and a feeding lifting mechanism.
[0009] The feeding lifting mechanism is connected with the feeding clamp bin base, and the feeding divider and the substrate alignment mechanism are arranged on one side of the feeding clamp bin base, the feeding pigsty bin clamps are distributed in a circular array on the surface of the feeding clamp bin base, the number of the feeding pigsty bin clamps is six, and the feeding guide rods are symmetrically distributed on both sides of the feeding pigsty bin clamps.
[0010] Preferably, the rotary discharging bin comprises a discharging divider, a discharging guide rod, a discharging clamp bin base, a discharging pigsty bin clamp and a discharging lifting mechanism.
[0011] The discharging lifting mechanism is connected with the discharging clamp bin base, and the discharging divider and the substrate alignment mechanism are arranged on one side of the discharging clamp bin base, the discharging pigsty bin clamps are distributed in a circular array on the surface of the discharging clamp bin base, the number of the discharging pigsty bin clamps is six, and the discharging guide rods are symmetrically distributed on both sides of the discharging pigsty bin clamps.
[0012] Preferably, the material taking manipulator comprises a material taking driving motor, a material taking linear guide rail, a material taking component fixing seat, a material taking vacuum suction block, a material taking cylinder lifting mechanism and a suction block support.
[0013] The material taking driving motor and the material taking linear guide rail are carried on the upper end of the material taking component fixing seat, and the suction block support is arranged on one side of the material taking component fixing seat, and the material taking vacuum suction block and the material taking cylinder lifting mechanism are respectively arranged on one side of the suction block support.
[0014] Preferably, the carrying manipulator comprises a carrying driving motor, a carrying linear guide rail, a carrying component fixing seat, a Y-shaped suction block and a carrying cylinder lifting mechanism.
[0015] The carrying driving motor and the carrying linear guide rail are arranged above the carrying member fixing seat, and the carrying cylinder lifting mechanism is arranged in the carrying linear guide rail, and the Y-shaped suction block is arranged in the carrying cylinder lifting mechanism.
[0016] Preferably, the CCD alignment mechanism comprises an alignment support, a flip cover, a front-rear adjusting mechanism, a rotation adjusting mechanism and a left-right adjusting mechanism.
[0017] The flip cover is arranged above the alignment support, and the front-rear adjusting mechanism, the rotation adjusting mechanism and the left-right adjusting mechanism are arranged on the surface of the flip cover.
[0018] Preferably, the exposure mechanism comprises a linear motor, an alignment platform, a high-precision lifting mechanism, a mechanical positioning mechanism and a drag chain.
[0019] The exposure mechanism body is the high-precision lifting mechanism, the mechanical positioning mechanism is arranged above the high-precision lifting mechanism, the alignment platform is arranged below the high-precision lifting mechanism, and the linear motor and the drag chain are arranged on the side of the alignment platform.
[0020] Preferably, the exposure system comprises an exposure output port, an exposure mechanism driving motor, an exposure mechanism linear guide rail, a water cooling system and a parameter adjusting module.
[0021] The exposure system is driven by the exposure mechanism driving motor and the exposure mechanism linear guide rail, and the exposure output port is arranged below the exposure system.
[0022] Preferably, an artificial inspection microscope is arranged above the exposure mechanism, and a man-machine control box is arranged on the side of the exposure mechanism.
[0023] Preferably, photoelectric sensing systems are arranged in the rotating feeding bin, the material taking manipulator, the carrying manipulator, the CCD alignment mechanism, the exposure mechanism, the rotating discharging bin and the exposure system.
[0024] Compared with the prior art, the beneficial effects of the present application are that the pig cage bin clamp is adopted, so that the substrates can avoid contacting each other, the wear between the substrates can be reduced, the positioning precision of the substrates can be greatly improved by adopting the CCD positioning and mechanical positioning double positioning mode, and the full-automatic operation mode can be realized, so that the human resource investment required by manual operation can be reduced and the processing efficiency can be improved. BRIEF DESCRIPTION OF DRAWINGS
[0025] Figure 1 It is an appearance front view structural schematic diagram of the exposure machine of the present application.
[0026] Figure 2 It is an appearance front view structural schematic diagram of the rotating feeding bin of the present application.
[0027] Figure 3It is the main view structural schematic diagram of the taking manipulator of the application;
[0028] Figure 4 It is the main view structural schematic diagram of the carrying manipulator of the application;
[0029] Figure 5 It is the main view structural schematic diagram of the CCD alignment mechanism of the application;
[0030] Figure 6 It is the main view structural schematic diagram of the exposure mechanism of the application;
[0031] Figure 7 It is the main view structural schematic diagram of the rotary discharging bin of the application;
[0032] Figure 8 It is the main view structural schematic diagram of the exposure system of the application.
[0033] In the figure: 1, substrate alignment mechanism; 2, rotary feeding bin; 21, feeding divider; 22, feeding guide rod; 23, feeding clamp bin base; 24, feeding pig cage bin clamp; 25, feeding lifting mechanism; 3, taking manipulator; 31, taking driving motor; 32, taking linear guide rail; 33, taking component fixing base; 34, taking vacuum suction block; 35, taking cylinder lifting mechanism; 36, suction block support; 4, carrying manipulator; 41, carrying driving motor; 42, carrying linear guide rail; 43, carrying component fixing base; 44, Y-shaped suction block; 45, carrying cylinder lifting mechanism; 5, CCD alignment mechanism; 51, alignment support; 52, flip cover; 53, front and back adjusting mechanism; 54, rotary adjusting mechanism; 55, left and right adjusting mechanism; 6, man-machine control box; 7, exposure mechanism; 71, linear motor; 72, alignment platform; 73, high-precision lifting mechanism; 74, mechanical positioning mechanism; 75, drag chain; 8, artificial inspection microscope; 9, rotary discharging bin; 91, discharging divider; 92, discharging guide rod; 93, discharging clamp bin base; 94, discharging pig cage bin clamp; 95, discharging lifting mechanism; 10, exposure system; 101, exposure output; 102, exposure mechanism driving motor; 103, exposure mechanism linear guide rail; 104, water cooling system; 105, parameter adjusting module. DETAILED DESCRIPTION
[0034] The technical solutions in the embodiments of the application will be clearly and completely described below with reference to the drawings in the embodiments of the application. Obviously, the described embodiments are only part of the embodiments of the application, rather than all the embodiments of the application. Based on the embodiments in the application, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the application.
[0035] Please refer to Figures 1 to 8 The application provides three embodiments:
[0036] Embodiment one:
[0037] A full-automatic exposure machine, comprising a substrate alignment mechanism 1, a rotary loading bin 2, a material taking manipulator 3, a carrying manipulator 4, a CCD alignment mechanism 5, an exposure mechanism 7, a rotary unloading bin 9 and an exposure system 10, the exposure mechanism 7 is symmetrically provided with the carrying manipulator 4 on both sides, and the two carrying manipulators 4 are respectively provided with the rotary loading bin 2 and the rotary unloading bin 9 at the ends away from each other.
[0038] The CCD alignment mechanism 5 is arranged between the rotary loading bin 2 and the exposure mechanism 7, and the exposure system 10 is arranged above the exposure mechanism 7.
[0039] The rotary loading bin 2 comprises a loading divider 21, a loading guide rod 22, a loading clamp bin base 23, a loading pig cage bin clamp 24 and a loading lifting mechanism 25.
[0040] The loading lifting mechanism 25 is connected with the loading clamp bin base 23, and the loading divider 21 and the substrate alignment mechanism 1 are arranged on one side of the loading clamp bin base 23, the loading pig cage bin clamp 24 is distributed in a circular array on the surface of the loading clamp bin base 23, the number of the loading pig cage bin clamp 24 is six, and the loading guide rod 22 is symmetrically distributed on both sides of the loading pig cage bin clamp 24.
[0041] The substrate is loaded through the six-station rotary loading bin 2, the loading divider 21 realizes the functions of automatically switching the loading bin and positioning the position of the loading bin of the six-station rotary loading bin, the substrate alignment mechanism 1 ensures that the wafer does not protrude from the bin clamp, and the loading lifting mechanism 25 realizes the continuity of wafer loading through the control system and the photoelectric sensing system.
[0042] The rotary unloading bin 9 comprises an unloading divider 91, an unloading guide rod 92, an unloading clamp bin base 93, an unloading pig cage bin clamp 94 and an unloading lifting mechanism 95.
[0043] The unloading lifting mechanism 95 is connected with the unloading clamp bin base 93, and the unloading divider 91 and the substrate alignment mechanism 1 are arranged on one side of the unloading clamp bin base 93, the unloading pig cage bin clamp 94 is distributed in a circular array on the surface of the unloading clamp bin base 93, the number of the unloading pig cage bin clamp 94 is six, and the unloading guide rod 92 is symmetrically distributed on both sides of the unloading pig cage bin clamp 94. The substrate is loaded through the six-station rotary unloading bin 9, the unloading divider 91 realizes the functions of automatically switching the loading bin and positioning the position of the loading bin of the six-station rotary loading bin, the substrate alignment mechanism 1 ensures that the wafer does not protrude from the bin clamp, and the unloading lifting mechanism 95 realizes the continuity of wafer loading through the control system and the photoelectric sensing system. The use of the six-station pig cage bin clamp for the material receiving module can layer the whole batch of products into the feeding bin, which improves the efficiency of the whole machine and reduces the wear between the products compared with the traditional loading and unloading.
[0044] Embodiment two:
[0045] The material taking manipulator 3 is composed of a material taking driving motor 31, a material taking linear guide rail 32, a material taking component fixing seat 33, a material taking vacuum suction block 34, a material taking cylinder lifting mechanism 35 and a suction block support 36;
[0046] The material taking driving motor 31 and the material taking linear guide rail 32 are carried on the upper end of the material taking component fixing seat 33, and the suction block support 36 is arranged on one side of the material taking component fixing seat 33, and the material taking vacuum suction block 34 and the material taking cylinder lifting mechanism 35 are arranged on one side of the suction block support 36. The function of automatically sucking the material sheet in the six-station rotary material loading bin 2 and the rotary material unloading bin 9 is realized. The material sheet is conveyed, so that the linkage of the whole machine is achieved.
[0047] The carrying manipulator 4 is composed of a carrying driving motor 41, a carrying linear guide rail 42, a carrying component fixing seat 43, a Y-shaped suction block 44 and a carrying cylinder lifting mechanism 45;
[0048] The carrying driving motor 41 and the carrying linear guide rail 42 are constructed above the carrying component fixing seat 43, and the carrying cylinder lifting mechanism 45 is carried inside the carrying linear guide rail 42, and the Y-shaped suction block 44 is arranged inside the carrying cylinder lifting mechanism 45. The personnel puts the bin clamp loaded with material into the rotary material loading bin 2, the material loading divider 21 operates, the bin clamp with material is replaced into the material loading station, the material loading lifting mechanism 25 lifts the material loading pig cage bin clamp 24 to the specified height, the material taking manipulator 3 carries the substrate, performs coarse positioning, the carrying manipulator 4 carries the substrate and sends it into the CCD alignment mechanism 5. The CCD is used for positioning, after positioning is completed, the CCD alignment mechanism 5 runs below the exposure mechanism 7, performs exposure, after exposure is completed, the material taking manipulator 3 carries the substrate and sends the material into the rotary material unloading bin 9.
[0049] Embodiment three:
[0050] The CCD alignment mechanism 5 is composed of an alignment support 51, a flip cover 52, a front and rear adjusting mechanism 53, a rotary adjusting mechanism 54 and a left and right adjusting mechanism 55. Through the front and rear adjusting mechanism 53, the rotary adjusting mechanism 54 and the left and right adjusting mechanism 55, the front and rear adjusting alignment of the film sheet to the substrate sheet, the left and right adjusting alignment, the rotary adjusting alignment are realized, so that the substrate positioning is more accurate. The product is preliminarily positioned before the product is placed in the CCD alignment mechanism 5, the positioning time of the product on the CCD alignment mechanism 5 is reduced, and the efficiency is improved.
[0051] The flip cover 52 is arranged above the alignment support 51, and the front and rear adjusting mechanism 53, the rotary adjusting mechanism 54 and the left and right adjusting mechanism 55 are all carried on the surface of the flip cover 52.
[0052] The exposure mechanism 7 is composed of a linear motor 71, a positioning platform 72, a high-precision lifting mechanism 73, a mechanical positioning mechanism 74 and a drag chain 75, which realizes the exposure and conveying of the material sheet, thereby achieving the linkage of the whole machine.
[0053] The exposure mechanism 7 is mainly composed of the high-precision lifting mechanism 73, the mechanical positioning mechanism 74 is arranged above the high-precision lifting mechanism 73, and the positioning platform 72 is arranged below the high-precision lifting mechanism 73.
[0054] The exposure system 10 is composed of an exposure output port 101, an exposure mechanism driving motor 102, an exposure mechanism linear guide rail 103, a water cooling system 104 and a parameter adjustment module 105, and the exposure output port 101 is composed of four-inch LED parallel light sources.
[0055] The exposure system 10 is driven by the exposure mechanism driving motor 102 and the exposure mechanism linear guide rail 103, and the exposure output port 101 is located below the exposure system 10.
[0056] An artificial inspection microscope 8 is arranged above the exposure mechanism 7, and a man-machine control box 6 is arranged on one side of the exposure mechanism 7, so that customers can conveniently copy and analyze according to the system record data.
[0057] The rotating upper material bin 2, the material taking manipulator 3, the carrying manipulator 4, the CCD positioning mechanism 5, the exposure mechanism 7, the rotating lower material bin 9 and the exposure system 10 are all equipped with photoelectric sensing systems.
[0058] The personnel places the bin clamp filled with materials into the rotating upper material bin 2, the upper material divider 21 operates, the bin clamp with materials is replaced into the upper material station, the upper material lifting mechanism 25 lifts the upper material pig cage bin clamp 24 to a specified height, the material taking manipulator 3 carries the substrate, performs coarse positioning, the carrying manipulator 4 carries the substrate, sends it into the CCD positioning mechanism 5, uses the CCD to perform positioning, after positioning is completed, the CCD positioning mechanism 5 runs below the exposure mechanism 7, performs exposure, after exposure is completed, the material taking manipulator 3 carries the substrate, and sends the materials into the rotating lower material bin 9. The six-station pig cage bin clamp is used for the material receiving module, can layer the whole batch of products into the material supply bin, compared with the traditional material feeding and discharging, improves the efficiency of the whole machine, and reduces the abrasion between the products, preliminarily positions the products before the products are placed into the CCD positioning mechanism 5, reduces the positioning time of the products on the CCD positioning mechanism 5, and improves the efficiency.
[0059] And the CCD positioning mechanism 5 and the mechanical positioning double positioning system are adopted, which greatly improves the positioning precision of the substrate and reduces the positioning time.
[0060] It will be apparent to those skilled in the art that the application is not limited to the details of the above-exemplified embodiments and that the present application can be implemented in other particular forms without departing from the spirit or essential characteristics of the present application. The embodiments should therefore be considered in all respects as illustrative and not restrictive, the scope of the application being indicated by the appended claims rather than by the above description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. No reference signs in the claims should be considered as limiting the scope of the claims with respect to the figures of the patent document.
Claims
1. A fully automatic exposure machine, comprising a substrate alignment mechanism (1), a rotary loading bin (2), a material handling robot (3), a transport robot (4), a CCD alignment mechanism (5), an exposure mechanism (7), a rotary unloading bin (9), and an exposure system (10), characterized in that: The exposure mechanism (7) is symmetrically provided with handling manipulators (4) on both sides, and the two handling manipulators (4) are respectively provided with a rotating loading bin (2) and a rotating unloading bin (9) at opposite ends. The rotating feeding bin (2) includes a feeding divider (21), a feeding guide rod (22), a feeding clamp base (23), a feeding cage frame clamp (24), and a feeding lifting mechanism (25). The feeding lifting mechanism (25) is connected to the feeding clamp base (23), and the feeding divider (21) and the substrate tidying mechanism (1) are both located on one side of the feeding clamp base (23). The feeding pig cage frame clamps (24) are distributed in a circular array on the surface of the feeding clamp base (23). There are six feeding pig cage frame clamps (24), and the feeding guide rods (22) are symmetrically distributed on both sides of the feeding pig cage frame clamps (24). A CCD alignment mechanism (5) is provided between the rotary feeding hopper (2) and the exposure mechanism (7), and an exposure system (10) is provided above the exposure mechanism (7). The exposure mechanism (7) includes a linear motor (71), an alignment platform (72), a high-precision lifting mechanism (73), a mechanical positioning mechanism (74), and a drag chain (75). The main body of the exposure mechanism (7) is a high-precision lifting mechanism (73). A mechanical positioning mechanism (74) is provided above the high-precision lifting mechanism (73), and an alignment platform (72) is provided below the high-precision lifting mechanism (73). A linear motor (71) and a drag chain (75) are respectively provided on one side of the alignment platform (72). The exposure system (10) includes an exposure output port (101), an exposure mechanism drive motor (102), an exposure mechanism linear guide rail (103), a water cooling system (104), and a parameter adjustment module (105). The exposure system (10) is driven by the exposure mechanism drive motor (102) and the exposure mechanism linear guide (103), and the exposure output port (101) is located below the exposure system (10).
2. The fully automatic exposure machine according to claim 1, characterized in that: The rotating feed bin (9) includes a feed divider (91), a feed guide rod (92), a feed clamp base (93), a feed cage frame clamp (94), and a feed lifting mechanism (95). The feeding lifting mechanism (95) is connected to the feeding clamp base (93), and the feeding divider (91) and the substrate tidying mechanism (1) are both located on one side of the feeding clamp base (93). The feeding pig cage frame clamps (94) are distributed in a circular array on the surface of the feeding clamp base (93). There are six feeding pig cage frame clamps (94), and the feeding guide rods (92) are symmetrically distributed on both sides of the feeding pig cage frame clamps (94).
3. The fully automatic exposure machine according to claim 1, characterized in that: The material handling robot (3) consists of a material handling drive motor (31), a material handling linear guide rail (32), a material handling component fixing seat (33), a material handling vacuum suction block (34), a material handling cylinder lifting mechanism (35), and a suction block bracket (36); The upper end of the material picking component fixing seat (33) is equipped with a material picking drive motor (31) and a material picking linear guide rail (32), and a suction block bracket (36) is provided on one side of the material picking component fixing seat (33). A material picking vacuum suction block (34) and a material picking cylinder lifting mechanism (35) are respectively provided on one side of the suction block bracket (36).
4. The fully automatic exposure machine according to claim 1, characterized in that: The handling robot (4) includes a handling drive motor (41), a handling linear guide rail (42), a handling component fixing seat (43), a Y-shaped suction block (44), and a handling cylinder lifting mechanism (45). A transport drive motor (41) and a transport linear guide rail (42) are constructed above the transport component fixing seat (43), and a transport cylinder lifting mechanism (45) is mounted inside the transport linear guide rail (42). A Y-shaped suction block (44) is provided inside the transport cylinder lifting mechanism (45).
5. The fully automatic exposure machine according to claim 1, characterized in that: The CCD alignment mechanism (5) includes an alignment bracket (51), a flip cover (52), a front and rear adjustment mechanism (53), a rotation adjustment mechanism (54), and a left and right adjustment mechanism (55). The flip cover (52) is positioned above the alignment bracket (51), and the front-to-back adjustment mechanism (53), the rotation adjustment mechanism (54), and the left-to-right adjustment mechanism (55) are all mounted on the surface of the flip cover (52).
6. The fully automatic exposure machine according to claim 1, characterized in that: A manual inspection microscope (8) is provided above the exposure mechanism (7), and a human-machine control box (6) is provided on one side of the exposure mechanism (7).
7. The fully automatic exposure machine according to claim 1, characterized in that: The rotating feeding bin (2), the material handling robot (3), the handling robot (4), the CCD alignment mechanism (5), the exposure mechanism (7), the rotating unloading bin (9), and the exposure system (10) are all equipped with photoelectric sensing systems.
Citation Information
Patent Citations
An automatic exposure machine
CN106814555B
Device for assembling conductive rubber on circuit board
CN113923888A
Full-automatic proximity exposure machine
CN114690589A
3D glass cover plate numerical control exposure machine
CN209215864U