Reaction chamber opening mechanism, reaction chamber system and semiconductor device processing device

Abstract

The present invention discloses a reaction chamber opening mechanism, a reaction chamber system and a semiconductor device processing device. The chamber opening mechanism includes: at least one lifting mechanism, whose base is connected to the side of the reaction chamber, and whose upper movable end is connected to the chamber cover of the reaction chamber, used to drive the chamber cover to rise and fall; and a mechanical limit device, whose bottom is arranged on the base of the lifting mechanism, and whose top abuts against the lower surface of the chamber cover to support the chamber cover when the chamber cover rises to the upper limit of the stroke. By adopting the above configuration, the present invention can prevent the risk of the chamber cover falling suddenly.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor production, and in particular to a reaction chamber opening mechanism, a reaction chamber system, and a semiconductor device processing device. Background Art

[0002] Vacuum chambers are widely used in semiconductor processing, microelectronics manufacturing, LED production and other fields. They are a kind of high vacuum special container commonly used in semiconductor equipment. The entire process is carried out in a vacuum environment composed of a vacuum chamber and a chamber cover. When the vacuum chamber is working or stopped, the entire vacuum chamber and its internal parts need to be cleaned and repaired, and then the chamber cover needs to be opened to expose the entire aperture of the vacuum chamber, and the chamber cover can be closed after the maintenance is completed.

[0003] At present, traditional high-density plasma chemical vapor deposition (HDPCVD) equipment generally adopts a hand-cranked or manual button-type chamber opening structure, and the operator needs to manually operate near the chamber cover. Due to the chamber cover lifting mechanism currently used, the entire mechanical structure is too complex and bulky, and occupies a large space. The process of lifting the chamber cover is not only difficult to operate and consumes personnel's physical strength, but also the chamber cover is prone to hit other components such as the vacuum chamber during the lifting process, causing other components to loosen or be damaged. More importantly, this way of opening and closing the chamber cover has certain safety hazards. Once the chamber cover suddenly falls, it is easy to injure the operator, causing serious consequences.

[0004] In order to solve the above problems existing in the prior art, an improved reaction chamber opening technology is urgently needed in the art to prevent the risk of the chamber cover falling suddenly. Summary of the invention

[0005] A brief summary of one or more aspects is given below to provide a basic understanding of these aspects. This summary is not an exhaustive overview of all conceived aspects, and is neither intended to identify the key or decisive elements of all aspects nor to define the scope of any or all aspects. Its only purpose is to give some concepts of one or more aspects in a simplified form as a prelude to a more detailed description that will be given later.

[0006] In order to overcome the above-mentioned defects in the prior art, the present invention provides a reaction chamber opening mechanism, a reaction chamber system, and a semiconductor device processing device, which can prevent the risk of a chamber cover suddenly falling.

[0007] Specifically, the above-mentioned reaction chamber opening mechanism provided according to the first aspect of the present invention includes: at least one lifting mechanism, whose base is connected to the side of the reaction chamber, and whose upper movable end is connected to the chamber cover of the reaction chamber, and is used to drive the chamber cover to rise and fall; and a mechanical limit device, whose bottom is arranged on the base of the lifting mechanism, and whose top abuts against the lower surface of the chamber cover to support the chamber cover when the chamber cover rises to the upper limit of the stroke.

[0008] Optionally, in some embodiments, the mechanical limiting device includes a push rod and a locking screw, wherein a positioning pin and a through hole are provided at the bottom of the push rod, and in response to the chamber cover rising to the upper limit of the stroke, the push rod is inserted into the pin hole on the base of the lifting mechanism via the positioning pin, and the locking screw is screwed into the threaded hole on the base of the lifting mechanism through the through hole to fasten the bottom of the push rod to the base of the lifting mechanism and allow the top of the push rod to extend into and abut against the lower surface of the chamber cover.

[0009] Optionally, in some embodiments, an anti-collision block is provided on the top of the push rod, and the anti-collision block is fastened to the base of the lifting mechanism along with the bottom of the push rod, and extends into and abuts against the lower surface of the cavity cover.

[0010] Optionally, in some embodiments, the cavity opening mechanism also includes: a control module, used to control the motor to drive the at least one lifting mechanism to drive the cavity cover to rise and fall; and a first limit switch, arranged below the mechanical limit device, in response to the mechanical limit device being installed to the base of the lifting mechanism, sending a soft interlock signal to the control module to request the control module to prohibit the motor from performing the cavity closing operation.

[0011] Optionally, in some embodiments, an elastic roller is configured in the first limit switch, which rolls in the direction in which the push rod extends into the lower surface of the cavity cover and is compressed and retracted after the push rod extends into the lower surface of the cavity cover. The first limit switch sends the soft interlock signal to the control module in response to the compression and retraction of the elastic roller.

[0012] Optionally, in some embodiments, the cavity opening mechanism further includes: a second limit switch, which is arranged at the lower limit end and / or the upper limit end of the travel of the lifting mechanism, and sends a shutdown signal to the control module in response to the lifting mechanism exceeding its lower limit end and / or the upper limit end of the travel to request the control module to forcibly shut down the motor.

[0013] Optionally, in some embodiments, the first limit switch includes a detector and a sensing block, wherein the detector is installed at the lower limit end and / or the upper limit end of the travel of the lifting mechanism, and the sensing block is installed at the movable end of the lifting mechanism, and in response to detecting the sensing block, the detector sends the shutdown signal to the control module.

[0014] Optionally, in some embodiments, the chamber opening mechanism includes a plurality of lifting mechanisms, wherein each of the lifting mechanisms is driven to rise and fall by a corresponding motor, the base of each of the lifting mechanisms is respectively arranged on a side of the reaction chamber, the upper movable end of each of the lifting mechanisms is respectively connected to one side of the chamber cover, the control module is respectively connected to each of the motors, and sends a control signal to at least one of them to adjust the height of the corresponding upper movable end of at least one side to level the chamber cover.

[0015] Optionally, in some embodiments, the control module is mounted on the cavity cover.

[0016] Optionally, in some embodiments, the cavity opening mechanism further includes: a human-computer interaction interface, remotely connected to the control module via communication, for acquiring input instructions provided by a user, and remotely transmitting the input instructions to the control module.

[0017] Optionally, in some embodiments, the control module includes mutually independent water line troughs and circuit line troughs, wherein the circuit line troughs include mutually independent high-voltage line troughs and low-voltage line troughs.

[0018] Optionally, in some embodiments, a transparent observation window is provided on the surface of the lifting mechanism to display the operation and / or wear condition inside the lifting mechanism.

[0019] In addition, the above-mentioned reaction chamber system provided according to the second aspect of the present invention includes: a reaction chamber; a chamber cover; and the above-mentioned chamber opening mechanism of the reaction chamber, wherein the chamber opening mechanism is respectively connected to the reaction chamber and the chamber cover, and is used to drive the chamber cover to perform chamber opening and chamber closing operations.

[0020] In addition, the processing device of the semiconductor device provided according to the third aspect of the present invention is characterized in that it includes the above-mentioned reaction chamber system. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The above features and advantages of the present invention can be better understood after reading the detailed description of the embodiments of the present disclosure in conjunction with the following drawings. In the drawings, the components are not necessarily drawn to scale, and components with similar related properties or features may have the same or similar reference numerals.

[0022] Figure 1 A schematic structural diagram of a reaction chamber opening mechanism provided in some embodiments of the present invention is shown;

[0023] Figure 2A It shows a schematic diagram of assembling a mechanical limit device according to some embodiments of the present invention;

[0024] Figure 2BA schematic diagram showing a mechanical limit device after assembly according to some embodiments of the present invention is shown;

[0025] Figure 3A , 3B A schematic structural diagram of a first limit switch provided in some embodiments of the present invention is shown;

[0026] Figure 4A , 4B A schematic diagram showing the front and back structures of a lifting mechanism provided according to some embodiments of the present invention; and

[0027] Figure 5 A schematic structural diagram of a second limit switch device provided according to some embodiments of the present invention is shown.

[0028] Reference numerals:

[0029] 10. Reaction chamber system;

[0030] 100 A cavity opening mechanism of the reaction chamber;

[0031] 110 lifting mechanism;

[0032] 111 base;

[0033] 112 Connecting device;

[0034] 113 drive structure;

[0035] 114 Guidance Structure;

[0036] 115 transparent observation window;

[0037] 120 Mechanical limit device;

[0038] 121 ejector rod;

[0039] 122 locking screw;

[0040] 123 Anti-collision block;

[0041] 130 control module;

[0042] 140 Motor;

[0043] 150 first limit switch;

[0044] 151 elastic roller;

[0045] 152 limit switch mounting hole;

[0046] 160 second limit switch;

[0047] 161 induction block;

[0048] 162 detectors;

[0049] 163 Mounting plate;

[0050] 170 movable wire duct;

[0051] 171 Weak-wire duct;

[0052] 172 Power cable duct;

[0053] 173 Waterway Channel;

[0054] 180 fixed wire duct;

[0055] 200 reaction chamber;

[0056] 210 Cavity cover. DETAILED DESCRIPTION

[0057] The following specific embodiments illustrate the implementation of the present invention, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. Although the description of the present invention will be introduced in conjunction with the preferred embodiment, this does not mean that the features of this invention are limited to this implementation. On the contrary, the purpose of introducing the invention in conjunction with the implementation is to cover other options or modifications that may be extended based on the claims of the present invention. In order to provide a deep understanding of the present invention, the following description will include many specific details. The present invention can also be implemented without using these details. In addition, in order to avoid confusion or blurring the focus of the present invention, some specific details will be omitted in the description.

[0058] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0059] In addition, the terms "upper", "lower", "left", "right", "top", "bottom", "horizontal" and "vertical" used in the following description should be understood as the directions shown in the paragraph and the related drawings. Such relative terms are only used for the convenience of description and do not mean that the device described therein must be manufactured or operated in a specific direction, and therefore should not be understood as limiting the present invention.

[0060] It is understood that although the terms "first", "second", "third", etc. may be used herein to describe various components, regions, layers and / or parts, these components, regions, layers and / or parts should not be limited by these terms, and these terms are only used to distinguish different components, regions, layers and / or parts. Therefore, the first component, region, layer and / or part discussed below may be referred to as a second component, region, layer and / or part without departing from some embodiments of the present invention.

[0061] As mentioned above, at present, traditional high-density plasma chemical vapor deposition (HDPCVD) equipment generally adopts a hand-cranked or manual button-type chamber opening structure, and the operator needs to manually operate near the chamber cover. Due to the currently used chamber cover lifting mechanism, the entire mechanical structure is too complex and bulky, and occupies a large space. The process of lifting the chamber cover is not only difficult to operate and consumes personnel's physical strength, but also the chamber cover is prone to hit other components such as the vacuum chamber during the lifting process, causing other components to loosen or be damaged. More importantly, this way of opening and closing the chamber cover has certain safety hazards. Once the chamber cover suddenly falls, it is easy to injure the operator, causing serious consequences.

[0062] In order to solve the above problems existing in the prior art, the present invention provides a reaction chamber opening mechanism, a reaction chamber system, and a semiconductor device processing device, which can prevent the risk of a chamber cover suddenly falling.

[0063] In some non-limiting embodiments, the opening mechanism of the reaction chamber provided by the first aspect of the present invention can be configured in the reaction chamber system provided by the second aspect of the present invention, and the opening mechanism of the reaction chamber provided by the second aspect of the present invention can be further configured in the processing device of the semiconductor device provided by the third aspect of the present invention.

[0064] The working principle of the above-mentioned reaction chamber opening mechanism will be described below in conjunction with some embodiments of reaction chamber systems and semiconductor device processing equipment. Those skilled in the art will understand that these embodiments of reaction chamber systems and semiconductor device processing equipment are only some non-limiting implementation methods provided by the present invention, which are intended to clearly demonstrate the main concept of the present invention and provide some specific solutions that are convenient for the public to implement, rather than to limit all working modes or all functions of the reaction chamber opening mechanism. Similarly, the reaction chamber opening mechanism is also only a non-limiting implementation method provided by the present invention, and does not constitute a limitation on the implementation subjects of these reaction chamber systems, semiconductor device processing equipment, etc.

[0065] Please refer to Figure 1 , Figure 1 A schematic structural diagram of a reaction chamber opening mechanism provided according to some embodiments of the present invention is shown.

[0066] like Figure 1 As shown, in some non-limiting embodiments of the present invention, the reaction chamber system 10 mainly includes: a reaction chamber 200, a chamber cover 210, and a reaction chamber opening mechanism 100, wherein the reaction chamber opening mechanism 100 is respectively connected to the reaction chamber 200 and the chamber cover 210, and is used to drive the chamber cover 210 to perform chamber opening and chamber closing operations.

[0067] Specifically, the reaction chamber opening mechanism 100 mainly includes at least one lifting mechanism 110 and a mechanical stopper 120. The base 111 of the lifting mechanism 110 is connected to the side of the reaction chamber 200, and the upper movable end thereof is connected to the chamber cover 210 of the reaction chamber 200 through a connecting device 112 to drive the chamber cover 210 to rise and fall. The bottom of the mechanical stopper 120 is arranged on the base 111 of the lifting mechanism 110, and the top thereof abuts against the lower surface of the chamber cover 210 to support the chamber cover 210 when the chamber cover 210 rises to the upper limit of the stroke.

[0068] Please see further Figure 2A and Figure 2B , Figure 2A shows a schematic diagram of assembling a mechanical limit device provided in some embodiments of the present invention, Figure 2B A schematic diagram of a mechanical limiting device after assembly is shown according to some embodiments of the present invention.

[0069] like Figure 2A , 2B As shown, in some embodiments of the present invention, the mechanical limiting device 120 includes a push rod 121 and a locking screw 122, wherein a positioning pin and a through hole are provided at the bottom of the push rod 121. When the chamber cover 210 rises to the upper limit of the stroke, for example, when the machine needs to be opened for maintenance, the push rod 121 is inserted into the pin hole on the base 111 of the lifting mechanism 110 through its positioning pin, and the locking screw 122 is screwed into the threaded hole on the base 111 of the lifting mechanism 110 through the through hole, thereby fastening the bottom of the push rod 121 to the base of the lifting mechanism 110, and making the top of the push rod 121 extend into and abut against the lower surface of the chamber cover 210, thereby effectively limiting the chamber cover 210 in terms of mechanical structure to prevent the chamber cover 210 from falling suddenly.

[0070] Optionally, the top rod 121 may be made of aluminum alloy to ensure the strength of the top rod while achieving lightness.

[0071] In some preferred embodiments, a bumper block 123 may be provided at the top of the top rod 121. The bumper block 123 is fastened to the base 111 of the lifting mechanism 110 along with the bottom of the top rod 121, and extends into and abuts against the lower surface of the cavity cover 210. Optionally, the surface of the bumper block 123 may be made of nylon material to reduce the wear on the cavity cover 210 when the mechanical stop device 120 is disassembled and assembled, and when abutting against the cavity cover 210.

[0072] Please continue to see Figure 1 In some embodiments of the present invention, the reaction chamber opening mechanism 100 may further include a control module 130. The control module 130 is used to control the motor 140 to drive the at least one lifting mechanism 110, thereby driving the chamber cover 210 to rise and fall. Optionally, a servo motor may be used for driving in this embodiment.

[0073] Furthermore, the reaction chamber opening mechanism 100 may further include a first limit switch 150, which is disposed below the mechanical limit device 120 to detect whether the mechanical limit device 120 is installed in place. Figure 3A and 3B , Figure 3A , 3B A schematic structural diagram of a first limit switch provided according to some embodiments of the present invention is shown.

[0074] like Figure 3A As shown, the first limit switch 150 is provided with an elastic roller 151, which is fixed to the base 111 of the lifting mechanism 110 by two screws and the limit switch mounting hole 152. Before the mechanical limit device 120 is installed, the elastic roller 151 of the first limit switch 150 is in a naturally extended state, that is, the first limit switch 150 is not triggered. Figure 3B As shown, after the mechanical limit device 120 is installed on the base 111 of the lifting mechanism 110, the elastic roller 151 rolls along the direction in which the push rod 121 extends into the lower surface of the chamber cover 210, and is compressed and retracted after the push rod 121 extends into the lower surface of the chamber cover 210. In response to the compression and retraction of the elastic roller 151, the first limit switch 150 sends a soft interlock signal to the control module 130 to request the control module 130 to prohibit the motor 140 from performing the chamber closing operation, thereby effectively limiting the chamber cover 210 in electrical control to prevent the chamber cover 210 from accidentally falling and damaging the reaction chamber 200 or injuring the operator under the chamber cover 210.

[0075] For further information, see Figure 4A and Figure 4B , Figure 4A , 4B The front and back structural schematic diagrams of the lifting mechanism provided according to some embodiments of the present invention are shown.

[0076] like Figure 4AAs shown, the lifting mechanism 110 includes a driving structure 113 and a guiding structure 114, which are used to convert the rotational motion of the motor 140 into the linear lifting motion of the cavity cover 210. Specifically, the driving structure 113 can be driven by a screw-nut method or a worm-worm meshing method, wherein the nut or the worm is indirectly connected to the connecting device 112 to connect to the cavity cover 210, thereby realizing the automatic lifting of the cavity cover 210 by controlling the rotation of the motor 140. The guiding structure 114 can adopt a guiding method of a linear guide rail or a linear bearing made of stainless steel, so as to greatly improve the guiding motion accuracy of the lifting mechanism 110, so that the lifting mechanism 110 can run for a long time without excessive wear.

[0077] Those skilled in the art will understand that the above-listed drive mechanism and guide mechanism scheme is only a non-limiting implementation method provided by the present invention, which is intended to clearly demonstrate the main concept of the present invention and provide a specific scheme that is easy for the public to implement, rather than to limit the scope of protection of the present invention.

[0078] like Figure 4B As shown, in some preferred embodiments of the present invention, a second limit switch 160 may be further provided at the lower limit end and / or the upper limit end of the travel of the lifting mechanism 110. When the upper movable end of the connecting cavity cover 210 of the lifting mechanism 110 exceeds the lower limit end and / or the upper limit end of the travel, the second limit switch 160 may send a shutdown signal to the control module 130 to request the control module 130 to forcibly shut down the motor 140.

[0079] Specifically, see Figure 5 , Figure 5 FIG. 2 shows a schematic diagram of the structure of a second limit switch device provided in some embodiments of the present invention. Figure 5 As shown, the second limit switch 160 includes a detector 162 and a sensor block 161. The detector 162 is mounted on the lower limit end and / or upper limit end of the travel of the lifting mechanism 110 through a mounting plate 163, and the sensor block 161 is mounted on the movable end of the lifting mechanism 110, that is, the connecting device 112.

[0080] When the connecting device 112 of the lifting mechanism 110 moves within the lifting stroke range, the induction block 161 moves synchronously with the lead screw-nut (or turbine-worm) and does not trigger the detector 162. When the encoder of the motor 140 fails, the motor 140 will drive the connecting device 112 of the lifting mechanism 110 to continue to move, that is, drive the cavity cover 210 to continue to move outside the lifting stroke range. At this time, the induction block 161 triggers the detector 162. After the detector 162 detects the induction block 161, it sends the shutdown signal to the control module 130 to forcibly shut down the motor to prevent the lifting mechanism 110 from being damaged.

[0081] Optionally, a transparent observation window 115 may be further provided on the surface of the lifting mechanism 110 to display the operation and / or wear condition inside the lifting mechanism 110 , so that the staff can perform maintenance on the lifting mechanism 110 in a timely manner.

[0082] Further, in some preferred embodiments, the opening mechanism 100 of the reaction chamber may include a plurality of lifting mechanisms 110. Each lifting mechanism 110 may be driven to rise and fall by a corresponding motor 140, a base 111 of each lifting mechanism 110 is respectively disposed on a side of the reaction chamber 200, and an upper movable end of each lifting mechanism 110 is respectively connected to one side of the chamber cover 210 through a connecting device 112. The control module 130 may be respectively connected to each motor 140 in communication to send a control signal to at least one of them, thereby adjusting the height of the connecting device 112 of the upper movable end of at least one side of the corresponding side to achieve leveling of the chamber cover 210.

[0083] Specifically, the reaction chamber opening mechanism 100 may include a human-machine interface (not shown in the drawings). The human-machine interface is remotely connected to the control module 130 via Ethernet to obtain input instructions provided by the user and transmit the input instructions to the control module 130 remotely.

[0084] In some embodiments, through Ethernet (Ethercat) communication, the control module 130 can issue a control instruction (for example, Top Lid Up / Down) to its internal servo driver based on the above-mentioned user instructions. The driver can simultaneously send the drive instruction to the motors 140 on multiple sides, and drive the connecting devices 112 of the corresponding lifting mechanisms 110 in the early stage to rise and fall through multiple motors 140, thereby controlling the synchronous lifting of multiple ends of the cavity cover 210 to achieve smooth opening and closing of the cavity cover 210.

[0085] Optionally, in other embodiments, through Ethernet (Ethercat) communication, the control module 130 can issue a control instruction to its internal servo driver based on the above-mentioned user instruction, and the driver can simultaneously issue the drive instruction to the motor 140 on one side or both sides to drive the motor 140 on that side to rotate alone, thereby adjusting the lifting and lowering of one side or both sides of the cavity cover 210, with a minimum adjustment amount of 0.5 mm, thereby not only ensuring the leveling accuracy of the multi-side lifting mechanism 110, but also ensuring that the multi-side lifting mechanism 110 can start and stop synchronously.

[0086] In the above embodiment, by adopting the Ethernet (Ethercat) communication method, one instruction can be used to control the start and stop of two or more motors 140 at the same time, so that the signal transmission rate is greatly improved.

[0087] Please continue to see Figure 1 In some preferred embodiments, the control module 130 can be arranged on the chamber cover 210, and the AC power supply cables and water pipes inside the control module 130 are sequentially passed through the movable wire trough 170 (such as a drag chain) and the steel fixed wire trough 180 to finally connect with the external motor 140 and other equipment to be cooled. The movable wire trough 170 can include mutually independent water line troughs 173 and circuit line troughs, wherein the circuit line troughs can further include mutually independent strong line troughs 172 and weak line troughs 171. By arranging the cable troughs and water pipe troughs separately, and the strong cable troughs and weak cable troughs separately, the opening mechanism 100 of the reaction chamber will not have adverse consequences on power supply safety caused by the crossover of strong and weak electricity, and the crossover of water pipes / cables.

[0088] The control module 130 is arranged on the chamber cover 210, and is lifted and lowered together with the chamber cover 210. The lifting stroke range is preferably 0 to 500 mm. When the stroke exceeds the upper and lower limits of 5 mm, the second limit switch 160 on the lifting mechanism 110 will be triggered to forcibly shut down the motor 140 and stop the opening and closing of the chamber. By arranging the control module 130 above the chamber cover 210 instead of placing it on the ground like a traditional structure, the floor space of the machine can be greatly reduced, the maintenance space can be increased, and the space utilization rate of the wafer plant and the maintainability of the machine can be improved.

[0089] So far, a reaction chamber opening mechanism provided by the first aspect of the present invention and a reaction chamber system provided by the second aspect are described in detail. Another aspect of the present invention further provides a semiconductor device processing device including the above reaction chamber system, which will not be described in detail here.

[0090] In summary, the present invention provides a reaction chamber opening mechanism, a reaction chamber system, and a semiconductor device processing device that can not only remotely control the opening and closing of the reaction chamber cover, but also prevent the risk of the chamber cover falling suddenly, thereby improving the maintainability of the machine.

[0091] The previous description of the disclosure is provided to enable any person skilled in the art to make or use the disclosure. Various modifications to the disclosure will be apparent to those skilled in the art, and the general principles defined herein may be applied to other variations without departing from the spirit or scope of the disclosure. Thus, the disclosure is not intended to be limited to the examples and designs described herein, but should be granted the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A reaction chamber opening mechanism, characterized in that: include: At least one lifting mechanism, whose base is connected to the side of the reaction chamber and whose upper movable end is connected to the chamber cover of the reaction chamber, and is used to drive the chamber cover to rise and fall; as well as A mechanical limit device, the bottom of which is arranged on the base of the lifting mechanism, comprises a push rod and a locking screw, wherein a positioning pin and a through hole are provided at the bottom of the push rod, in response to the chamber cover rising to the upper limit of the stroke, the push rod is inserted into the pin hole on the base of the lifting mechanism via the positioning pin, and the locking screw passes through the through hole and is screwed into the threaded hole on the base of the lifting mechanism to fasten the bottom of the push rod to the base of the lifting mechanism, and to make the top of the push rod extend into and abut against the lower surface of the chamber cover to support the chamber cover.

2. The cavity opening mechanism according to claim 1, characterized in that: The top of the push rod is provided with an anti-collision block, and the anti-collision block is fastened to the base of the lifting mechanism along with the bottom of the push rod, and extends into and abuts against the lower surface of the cavity cover.

3. The cavity opening mechanism according to claim 1, characterized in that: Also includes: A control module, used for controlling the motor to drive the at least one lifting mechanism to drive the chamber cover to rise and fall; as well as The first limit switch is arranged below the mechanical limit device, and sends a soft interlock signal to the control module in response to the mechanical limit device being installed to the base of the lifting mechanism, so as to request the control module to prohibit the motor from performing the cavity closing operation.

4. The cavity opening mechanism according to claim 3, characterized in that: An elastic roller is configured in the first limit switch, and the elastic roller rolls along the direction in which the push rod extends into the lower surface of the cavity cover, and is compressed and retracted after the push rod extends into the lower surface of the cavity cover. The first limit switch sends the soft interlock signal to the control module in response to the compression and retraction of the elastic roller.

5. The cavity opening mechanism according to claim 3, characterized in that: Also includes: The second limit switch is arranged at the lower limit end and / or the upper limit end of the travel of the lifting mechanism, and sends a shutdown signal to the control module in response to the lifting mechanism exceeding its lower limit end and / or the upper limit end of the travel to request the control module to forcibly shut down the motor.

6. The cavity opening mechanism according to claim 5, characterized in that: The second limit switch comprises a detector and a sensing block, wherein the detector is installed at the lower limit end and / or the upper limit end of the travel of the lifting mechanism, and the sensing block is installed at the movable end of the lifting mechanism. In response to detecting the sensing block, the detector sends the shutdown signal to the control module.

7. The cavity opening mechanism according to claim 3, characterized in that: The chamber opening mechanism includes a plurality of lifting mechanisms, wherein each lifting mechanism is driven to rise and fall by a corresponding motor, a base of each lifting mechanism is respectively arranged on a side of the reaction chamber, and an upper movable end of each lifting mechanism is respectively connected to one side of the chamber cover. The control module is connected to each of the motors respectively, and sends a control signal to at least one of them to adjust the height of the corresponding upper movable end of at least one side to level the cavity cover.

8. The cavity opening mechanism according to claim 3, characterized in that: The control module is installed on the cavity cover.

9. The cavity opening mechanism according to claim 3, characterized in that: Also includes: The human-computer interaction interface is remotely connected to the control module for acquiring input instructions provided by a user and remotely transmitting the input instructions to the control module.

10. The cavity opening mechanism according to claim 3, characterized in that: The control module includes a water line trough and a circuit line trough that are independent of each other, wherein the circuit line trough includes a strong line trough and a weak line trough that are independent of each other.

11. The cavity opening mechanism according to claim 1, characterized in that: A transparent observation window is provided on the surface of the lifting mechanism for displaying the operation and / or wear condition inside the lifting mechanism.

12. A reaction chamber system, characterized in that: include: Reaction chamber; Cavity cover; as well as The chamber opening mechanism of the reaction chamber according to any one of claims 1 to 11, wherein the chamber opening mechanism is respectively connected to the reaction chamber and the chamber cover, and is used to drive the chamber cover to perform chamber opening and chamber closing operations.

13. A semiconductor device processing device, characterized in that: Comprising the reaction chamber system as claimed in claim 12.

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