Mask unit, mask plate manufacturing method and mask plate

Abstract

The present invention provides a method for manufacturing a mask unit and a mask plate, and the mask plate, wherein the method for manufacturing the mask unit comprises: simulating the stretching process of the mask unit to obtain deformation data of the mask unit; wherein the mask unit comprises standard points and a plurality of row groups distributed along the stretching direction of the stretching of the stretching, and the deformation data comprises first deformation data of the standard points; the row group to be compensated is determined according to the deformation data, and the row group to be compensated is compensated, and the compensation process comprises: compensating the row group to be compensated based on the first deformation data, so that the compensated row group is located at a preset position of the mask unit after the stretching of the stretching, and the compensated mask unit is obtained. The present invention can improve the position accuracy of the film layer evaporated by the above-mentioned mask unit.

Description

Technical Field

[0001] The present invention relates to the field of mask technology, and in particular to a method for manufacturing a mask unit, a method for manufacturing a mask plate, and a mask plate. Background Art

[0002] Organic Light Emitting Diode (OLED) is a device that emits light by being driven by electric current. It usually requires a mask plate to evaporate the film layers such as the pixels of the OLED, that is, the film layer evaporation area of ​​the OLED is defined by the opening of the mask plate (such as the red sub-pixel evaporation area, the green sub-pixel evaporation area, the blue sub-pixel evaporation area, etc.). However, the existing mask plates generally have defects such as poor evaporation accuracy, which affects the position accuracy of the film layer after evaporation. Summary of the invention

[0003] The present invention provides a mask unit, a method for manufacturing a mask plate, and a mask plate, so as to at least solve the problems of poor evaporation precision of the mask plate existing in the prior art.

[0004] According to one aspect of the present invention, a method for manufacturing a mask unit is provided, comprising: simulating a net stretching process of the mask unit to obtain deformation data of the mask unit; wherein the mask unit comprises standard points and a plurality of row groups distributed along a stretching direction of the net stretching, each of the row groups comprises a plurality of openings distributed along a second direction, and the second direction is perpendicular to the stretching direction; the deformation data comprises first deformation data of the standard points; a row group to be compensated is determined according to the deformation data, and the row group to be compensated is compensated, and the compensation process comprises: compensating the row group to be compensated based on the first deformation data, so that the compensated row group is located at a preset position of the mask unit after the net stretching, and a compensated mask unit is obtained.

[0005] In some embodiments, determining the row group to be compensated according to the deformation data includes: determining the deformation amount of at least part of the row group according to the deformation data; determining a compensation cutoff line according to the deformation amount; and determining the row group located between the edge of the mask unit and the compensation cutoff line in the stretching direction as the row group to be compensated. In this way, it is easy to determine the row group to be compensated, effectively compensate the row group to be compensated, and at the same time take into account improving the compensation efficiency.

[0006] In some embodiments, the standard point is located between the edge of the mask unit and the compensation cutoff line. In this way, the standard point has a larger deformation amount. The row group to be compensated is compensated based on its deformation amount (ie, the first deformation data), which can improve the compensation accuracy.

[0007] In some embodiments, the mask unit includes multiple evaporation areas distributed along the stretching direction, each of the evaporation areas includes multiple row groups, and the standard point is located in the evaporation area closest to the edge of the mask unit in the stretching direction, so as to further improve the compensation accuracy.

[0008] In some embodiments, in the vapor deposition area where the standard point is located, the difference in the number of row groups located on opposite sides of the standard point is less than or equal to 1. In this way, the standard point is basically located in the middle of the vapor deposition area and has an appropriate deformation amount, which facilitates further improving the compensation accuracy.

[0009] In some embodiments, the standard point is a positioning mark line provided on the mask unit, or is a row of the row group, which is beneficial to further improve the compensation accuracy of the row group to be compensated based on the first deformation data.

[0010] In some embodiments, the deformation amount of the row group to be compensated is greater than a set threshold value, and the set threshold value is 0.5-1 μm. In this way, it is convenient to improve both the evaporation accuracy and the compensation efficiency of the mask unit after compensation.

[0011] In some embodiments, compensating the row group to be compensated based on the first deformation data includes: compensating the row group to be compensated based on the distance between the row group to be compensated and the standard point to the same baseline in the stretching direction and the first deformation data, so as to further improve the compensation efficiency.

[0012] In some embodiments, compensating the row group to be compensated based on the first deformation data includes: fitting and generating a first compensation curve based on the distance between the row group to be compensated and the standard point to the same baseline in the stretching direction and the first deformation data, and compensating the row group to be compensated according to the first compensation curve so that the compensated row group is located at the preset position of the mask unit after being stretched by the stretching net. In this way, the first compensation curve has better smoothness, can better match the position of each opening in the row group, and improve the opening position accuracy of the mask unit after compensation.

[0013] Another aspect of the present invention provides a method for manufacturing a mask plate, comprising: manufacturing a mask unit according to the above-mentioned method for manufacturing a mask unit; stretching the mask unit and welding it to the frame to obtain the mask plate.

[0014] According to another aspect of the present invention, a mask plate is provided, comprising a frame and a mask unit manufactured according to the above-mentioned method for manufacturing a mask unit, wherein the mask unit is welded to the frame after being stretched by a net.

[0015] In the present invention, the stretching process of the mask unit is simulated to obtain the deformation after the stretching, and then the row group to be compensated of the mask unit is compensated according to the deformation. Specifically, the row group to be compensated is compensated based on the first deformation data, so that the compensated row group is located at the preset position of the mask unit after the stretching. In this way, when the mask unit is stretched and welded to a frame to make a mask plate, and then the mask plate is used for film vapor deposition, a high position accuracy of the vapor deposition area can be guaranteed, thereby ensuring the position accuracy of the film layer evaporated by the mask plate, avoiding the phenomenon of OLED color mixing, etc.

[0016] In addition, the present invention sets standard points and compensates each row group to be compensated based on the first deformation data of the standard points, which not only has a more accurate compensation effect, but also has a simpler process, is easy to operate, improves compensation efficiency, and is conducive to practical application. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic structural diagram of a mask unit before stretching according to an embodiment of the present invention;

[0018] Figure 2 It is a structural schematic diagram of a mask plate obtained by welding a mask unit to a frame after being stretched by a net according to an embodiment of the present invention;

[0019] Figure 3 It is a schematic diagram showing a first compensation curve generated by fitting and its fitting formula in one embodiment of the present invention.

[0020] Description of reference numerals:

[0021] 1: mask unit;

[0022] 11: Evaporation area;

[0023] 10: Open your mouth;

[0024] 100: baseline;

[0025] 101: first side;

[0026] 102: Second side;

[0027] 110: standard point;

[0028] 120: compensation cut-off line;

[0029] 130: middle position of the mask unit;

[0030] 140, 150, 160: first deformation curve;

[0031] 170: second deformation curve;

[0032] L0: The distance from the standard point to the reference line in the stretching direction;

[0033] L1: The distance from the row group to be compensated to the reference line in the stretching direction;

[0034] F1: The force direction of the first side of the mask unit when the net is stretched;

[0035] F2: the force direction of the second side of the mask unit when the net is stretched;

[0036] 2: Framework. DETAILED DESCRIPTION

[0037] In order to enable those skilled in the art to better understand the scheme of the present invention, the present invention is further described in detail below. The specific implementation methods listed below are only for describing the principles and features of the present invention. The examples are only used to explain the present invention and are not intended to limit the scope of the present invention. Based on the embodiments of the present invention, all other implementation methods obtained by ordinary technicians in the field without creative work are within the scope of protection of the present invention.

[0038] In the related art, the mask plate generally has defects such as poor evaporation accuracy, which affects the position accuracy of the film layer after evaporation.

[0039] After long-term research, the inventors found that in the evaporation process of OLED pixels, a fine metal mask (FMM) is mainly used to control the position of the organic material deposited on the substrate, thereby completing the evaporation of the pixel. The FMM is composed of a mask unit (sheet), a frame (Frame), auxiliary materials and other structures, and the opening of the mask is set on the mask unit. The mask unit is generally welded to the frame, but if it is welded freely, the mask unit will have a certain amount of droop, which is easy to deform during the evaporation process, increasing the evaporation shadow, and causing red (R), green (G), blue (B) color crossover and other phenomena.

[0040] Therefore, it is usually necessary to stretch the mask unit and then weld it to the frame, that is, to apply a certain tension to the mask unit to keep it balanced and avoid sagging. However, after being stretched, the mask unit is deformed by the tension, causing the opening position of the mask unit to change, thereby affecting the position accuracy of the film layer after evaporation, such as causing the pixel position accuracy (PPA) to deviate, resulting in OLED color mixing and other phenomena.

[0041] In view of the above problems, an embodiment of the present invention provides a method for manufacturing a mask unit, comprising: simulating a stretching process of the mask unit 1 to obtain deformation data of the mask unit 1; wherein, Figure 1 and Figure 2As shown, the mask unit 1 includes a stretching direction (parallel to Figure 1 and Figure 2 The invention relates to a standard point 110 and a plurality of row groups distributed along a first direction in the stretching direction, each row group comprising a plurality of openings 10 distributed along a second direction, and the second direction is perpendicular to the stretching direction; the deformation data comprises first deformation data of the standard point 110; the row group to be compensated is determined according to the deformation data, and the row group to be compensated is compensated. Specifically, the compensation process comprises: compensating the row group to be compensated based on the first deformation data, so that the compensated row group is located at a preset position of the mask unit 1 after being stretched by the stretching net, and obtaining the compensated mask unit 1.

[0042] In this way, the positions of the openings 10 of each row group of the mask unit 1 in the stretching direction can be compensated. When the compensated mask unit 1 is stretched and welded to the frame 2, the positions of the openings 10 of each row group can be located at the preset positions of the mask unit 1. When the mask plate is used for film evaporation, a high position accuracy of the evaporation area 11 is guaranteed, thereby ensuring the position accuracy of the film layer evaporated by the mask plate, avoiding the phenomenon of OLED color mixing.

[0043] In addition, the embodiment of the present invention sets the standard point 110 and compensates each row group to be compensated based on the first deformation data of the standard point 110, which not only has a more accurate compensation effect, but also has a simpler process, is easy to operate, improves compensation efficiency, and is conducive to practical application.

[0044] For example, Figure 1 and Figure 2 As shown, the first direction (stretching direction) is parallel to the length direction of the mask unit 1 , and the second direction is parallel to the width direction of the mask unit 1 .

[0045] Specifically, in the mask unit 1, the openings 10 of each row group are used to evaporate the film layer such as the pixel of the OLED, that is, when evaporating the film layer such as the pixel of the OLED, the organic material used is deposited on the substrate through these openings 10 to form the corresponding film layer. It can be understood that compensating the row group to be compensated specifically refers to compensating the position of the openings 10 in the row group to be compensated, so that after the compensated mask unit 1 is stretched by the net, the position of the openings 10 therein can be located at a preset position.

[0046] Specifically, the compensation is to reversely compensate the position of the opening 10. For example, taking the original position of a certain opening 10 as the reference point, through the above simulation, the position offset of the opening 10 is A (i.e., offset by A relative to the original position), then the offset of the position of the opening 10 after compensation is -A. That is, the mask unit 1 has a first side 101 and a second side 102 relative to each other, and the direction from the first side 101 to the second side 102 is parallel to the above stretching direction. Through the simulation, the opening 10 is offset toward the first side 101 relative to its original position, and the offset is A1, then the position of the opening 10 after compensation is offset toward the second side 102 relative to its original position, and the offset is A2, and the values ​​of A1 and A2 are equal.

[0047] In some embodiments, determining the row group to be compensated according to the deformation data as described above may include: determining the deformation amount of at least part of the row group according to the deformation data; determining the compensation cutoff line according to the deformation amount; and determining the row group located between the edge of the mask unit and the compensation cutoff line in the stretching direction as the row group to be compensated.

[0048] In the stretching direction, the deformation of the row group closer to the edge of the mask unit 1 is greater, and the deformation of the row group closer to the middle position 130 of the mask unit 1 is smaller. Therefore, the deformation of at least part of the row groups can be obtained to determine the row group whose deformation is closest to the set threshold, and then determine the compensation cutoff line 120 (the deformation of the compensation cutoff line 120 after the stretching deformation of the tensioning net can be basically equal to the set threshold, and specifically can be kept close to a straight line). The deformation of the row group located between the edge of the mask unit 1 and the compensation cutoff line 120 is greater than the set threshold, and is determined to be a row group to be compensated, and the row group to be compensated needs to be compensated; while the deformation of the row group located between the middle position 130 of the mask unit 1 and the compensation cutoff line 120 is less than the set threshold, and no compensation is required.

[0049] The threshold value may be set to be 0.5-1 μm, for example, 0.5 μm, 0.8 μm, 1 μm, etc. The value range of the threshold value may be set according to actual conditions.

[0050] Specifically, Figure 1 and Figure 2As shown, the distances from the middle position 130 of the mask unit 1 to the first side 101 and the second side 102 of the mask unit 1 are substantially equal, that is, in the first direction, the parts located on the opposite sides of the middle position 130 of the mask unit 1 are axially symmetrical with the middle position 130 as the symmetry axis. The determined compensation cutoff line includes the compensation cutoff line 120 located between the middle position 130 and the first side 101 and the compensation cutoff line 120 located between the middle position 130 and the second side 102. The deformation amount of the row group located between the two compensation cutoff lines 120 is small (less than the set threshold value), and no compensation is required. The row group located between the first side 101 and the compensation cutoff line 120 and the row group located between the second side 102 and the compensation cutoff line 120 are used as row groups to be compensated, and compensation is performed according to the above compensation process.

[0051] Generally, the standard point 110 has a large deformation, which may be greater than a set threshold. Specifically, the standard point 110 may be located between the edge of the mask unit 1 and the compensation cutoff line 120, so that the deformation of the standard point 110 is greater than the set threshold.

[0052] Specifically, Figure 1 and Figure 2 As shown, the mask unit 1 includes a plurality of evaporation areas 11 distributed along the stretching direction, each evaporation area 11 includes a plurality of row groups, and the standard point 110 can be located in the evaporation area 11 closest to the edge of the mask unit 1 in the stretching direction, for example, in the evaporation area 11 closest to the first side 101 or in the evaporation area closest to the second side 102.

[0053] In some embodiments, the standard point 110 may be located in the middle of the above-mentioned evaporation area 11 , and in the evaporation area 11 where the standard point 110 is located, the difference in the number of row groups located on opposite sides of the standard point 110 is less than or equal to 1.

[0054] Specifically, the above-mentioned standard point 110 can be a positioning mark line (Mark) set on the mask unit 1, that is, before the net is stretched, a row of symbol marks can be set at the preset position of the mask unit 1 to form a positioning mark line; or, the above-mentioned standard point 110 is a row group, which can be specifically a row group to be compensated, generally specifically a line connecting the centers of each opening 10 in the row group.

[0055] In some embodiments, compensating the row group to be compensated based on the first deformation data may specifically include: compensating the row group to be compensated based on the distance between the row group to be compensated and the standard point to the same reference line in the stretching direction and the first deformation data.

[0056] Specifically, when the net is stretched, the mask unit 1 is subjected to forces at two opposite ends of the stretching direction (such as Figure 1 The force direction F1 of the first side 101 and the force direction F2 of the second side 102 of the middle mask unit 1 are such that the shape of the evaporation area 11 after being deformed by the force is barrel-shaped (such as Figure 2 As shown). Generally, in the stretching direction, the position offset (deformation) of the row group closer to the edge (first side 101 and second side 102) of the mask unit 1 is relatively larger, and the position offset of the row group closer to the middle position 130 of the mask unit 1 is relatively smaller. The above-mentioned standard point 110 and the row group of the mask unit 1 are distributed along the stretching direction. Therefore, based on this change trend, the deformation amount and the amount to be compensated of the row group to be compensated can be converted according to the deformation of the standard point 110 and the position of the row group to be compensated and the standard point 110 in the stretching direction (the distance between the two and the same reference line 100 in the stretching direction) (the direction of the amount to be compensated of the row group to be compensated is opposite to its deformation amount, and the value is the same), and the row group to be compensated is compensated according to the converted amount to be compensated.

[0057] The reference line 100 is perpendicular to the stretching direction, and the reference line 100 may be parallel to the second direction. The reference line 100 may be an edge (such as the first side 101 or the second side 102) of the mask unit 1 in the stretching direction. Figure 1 ), but not limited thereto.

[0058] Specifically, the deformation amount (first deformation data) of the standard point 110 can be scaled proportionally according to the distance between the row group to be compensated and the standard point 110 to the same reference line 100 in the stretching direction to obtain the deformation amount and compensation amount of the row group to be compensated.

[0059] For example, the deformation amount of the standard point 110 is △p0, the distance between the standard point 110 and the reference line 100 in the stretching direction is L0, the distance between a row group to be compensated and the reference line 100 in the stretching direction is L1, the deformation amount of the row group to be compensated is △p1, the row group to be compensated, the reference line 100, and the standard point 110 are, for example, respectively located between the middle position 130 and the first side 101, and the reference line 100 can specifically be the edge of the first side 101 of the mask unit 1 (such as Figure 1 As shown), △p1 can be calculated according to the following formula:

[0060] △p1×L1=△p0×L0.

[0061] When the row group to be compensated between the middle position 130 and the second side 102 is compensated by the formula △p1×L1=△p0×L0, the reference line 100 and the standard point 110 can be located between the middle position 130 and the second side 102, and the reference line 100 can be the edge of the second side 102 of the mask unit 1. That is, there are two reference lines 100, and the two reference lines 100 are respectively located on opposite sides of the mask unit 1 (one of which is located on the first side 101 and the other is located on the second side 102). There are two standard points 110, and the two standard points 110 are respectively located on opposite sides of the mask unit 1, that is, one of them is close to the first side 101, specifically, it can be located between the first side 101 and the compensation cutoff line 120 located between the middle position 130 and the first side 101; the other is close to the second side 102, specifically, it can be located between the second side 102 and the compensation cutoff line 120 located between the middle position 130 and the second side 102. The two standard points 110 can be axisymmetric with the middle position 130 as the symmetry axis, but are not limited to this. Among them, the reference line 100 located on the first side 101 and the standard point 110 close to the first side 101 are used to determine the deformation amount of the row group to be compensated between the middle position 130 and the first side 101, and the reference line 100 located on the second side 102 and the standard point 110 close to the second side 102 are used to determine the deformation amount of the row group to be compensated between the middle position 130 and the second side 102.

[0062] Alternatively, in another embodiment, when the row group to be compensated between the middle position 130 and the second side 102 is compensated by the formula △p1×L1=△p0×L0, the reference line 100 and the standard point 110 may be located between the middle position 130 and the first side 101, that is, the number of the reference line 100 and the standard point 110 may be one respectively, and the deformation amount of the row group to be compensated between the middle position 130 and the first side 101 and the row group to be compensated between the middle position 130 and the second side 102 are determined based on the same reference line 100 and the same standard point 110. Specifically, since the row groups located on the opposite sides of the middle position 130 are basically axially symmetrical with the middle position 130 as the axis of symmetry, wherein the deformation orientations of the axially symmetrical row groups to be compensated are opposite, the deformation amount △p1 of the row group to be compensated between the middle position 130 and the first side 101 can be obtained according to the formula △p1×L1=△p0×L0, and then the deformation amount -△p1 of the row group to be compensated between the middle position 130 and the second side 102 which is axially symmetrical with the row group to be compensated between the middle position 130 and the first side 101 can be obtained, so as to compensate the row group to be compensated between the middle position 130 and the second side 102.

[0063] It can be understood that the deformation of each opening 10 in the row group to be compensated is calculated by the above formula, thereby obtaining the deformation of the row group to be compensated. Compensating the row group to be compensated refers to compensating the position of the row group to be compensated so that each opening 10 is located at a preset position after being stretched by the net.

[0064] The distance between the standard point 110 and the reference line 100 in the stretching direction and the distance between the row group to be compensated and the reference line 100 in the stretching direction refer to the distance between these points when the mask unit 1 is not stretched by the net (ie before the net is stretched).

[0065] In addition, before the net is stretched, the standard point 110 is basically a straight line, and the line connecting the positions of the openings 10 in each row group (specifically, it can be the line connecting the centers of these openings 10) is also basically a straight line. After the mask unit 1 is stretched by the net, the standard point 110 and the positions of the openings 10 in each row group to be compensated are offset. Since the forces at different positions are different, the deformation amounts of different positions of the openings 10 are also different. Therefore, the line connecting the positions of the openings 10 in each row group to be compensated (specifically, it can be the line connecting the centers of these openings 10) usually forms a deformation curve (such as Figure 2 In the figure, the first deformation curve 140 of the first row group of the first evaporation zone 11 from the first side 101, the first deformation curve 150 of the second row group, and the first deformation curve 160 of the ninth row group), the standard point 110 is also deformed to form a deformation curve.

[0066] In some embodiments, the row group to be compensated is compensated based on the first deformation data, which can specifically include: based on the distance between the row group to be compensated and the standard point 110 to the same baseline 100 in the stretching direction and the first deformation data, a first compensation curve is fitted and generated, and the row group to be compensated is compensated according to the first compensation curve, so that the compensated row group is located at a preset position of the mask unit 1 after being stretched by the net. In this way, the first compensation curve has better smoothness and good operability, can better match the position of each opening 10 in the row group, and improves the position accuracy of the opening 10 of the mask unit 1 after compensation.

[0067] In specific implementation, when compensating a row group to be compensated, the deformation of multiple openings 10 in the row group to be compensated can be calculated according to the above formula △p1×L1=△p0×L0, and the selected multiple openings 10 can be arranged at basically equal intervals in the second direction. The calculated multiple deformation data are fitted into a first compensation curve to compensate for the row group to be compensated.

[0068] Specifically, a first fitting formula (i.e., a formula corresponding to the first compensation curve) can be obtained according to the first compensation curve, and then the compensation amount of each opening 10 in the row group to be compensated is calculated according to the first fitting formula to compensate the position of each opening 10. Exemplarily, Figure 3 A first fitting curve of a row group to be compensated and its corresponding first fitting formula in an embodiment are shown. The positions of the openings 10 in the row group to be compensated can be calculated according to the first fitting formula to compensate for the positions of the openings 10 .

[0069] In addition, if Figure 1 As shown, the openings 10 of each evaporation area 11 in the mask unit 1 are arranged in an array to form the above-mentioned multiple row groups distributed along the first direction, and multiple column groups distributed along the second direction (the column groups include multiple openings 10 distributed along the first direction / stretching direction), as shown in FIG. Figure 2 As shown, after being stretched by the net, the mask unit 1 is deformed in the second direction.

[0070] Embodiments of the present invention may further include a process of positionally compensating for the deformation of the mask unit 1 in the second direction. For example, in some embodiments, the deformation data of the mask unit 1 also includes second deformation data of the mask unit 1 in the second direction. The column group may be compensated according to the second deformation data so that the compensated column group is located at a preset position after being stretched by the net.

[0071] Generally, before the net is stretched, the connection line of the sites of the openings 10 in each column group (specifically, the connection line of the centers of the openings 10) is basically a straight line. After the mask unit 1 is stretched by the net, the positions of the openings 10 in each column group are offset. Since the forces at different positions are different, the deformation amounts of the positions of the openings 10 are also different. Therefore, the connection line of the sites of the openings 10 in each column group is deformed to form a deformation curve (such as Figure 2 FIG. 1 is a second deformation curve 170 of two column groups on opposite sides of the first vapor deposition area 11 in the second direction starting from the first side 101 of the mask unit 1).

[0072] In a specific implementation, when compensating a column group, a second compensation curve may be fitted according to the second deformation data, and then the column group may be compensated according to the second compensation curve.

[0073] Specifically, the deformation amounts of the plurality of openings 10 in the column group can be obtained according to the second deformation data. The plurality of openings 10 used can be arranged at substantially equal intervals in the first direction. The plurality of calculated deformation amount data are fitted into a second compensation curve to compensate the column group.

[0074] A second fitting formula (ie, a formula corresponding to the second compensation curve) can be obtained according to the second compensation curve, and then the compensation amount of each opening 10 in the column group is calculated according to the second fitting formula to compensate the position of each opening 10 .

[0075] like Figure 1 and Figure 2 As shown, the mask unit 1 generally includes a plurality of vapor deposition areas 11 , and the deformation conditions of a column group of the same column of the vapor deposition areas 11 are substantially the same or similar, so the same compensation curve can be used for compensation.

[0076] In specific implementation, the above-mentioned mask unit can be modeled (i.e., a mask unit model is constructed) by conventional simulation software in the field such as mechanical simulation software, and its stretching process is simulated to obtain the deformation data of the mask unit. Through the above compensation process, the compensated positions of each opening in the mask unit are obtained, and then a mold with openings that meet these positions is made, and the mold is covered on the substrate as a mask structure (Mask), and then the substrate is etched by photolithography and other methods to etch openings corresponding to the openings at specific positions on the mold on the substrate, so that the substrate is made into a compensated mask unit, and after the mask unit is stretched, each opening therein is located at a preset position, thereby improving the evaporation accuracy. Furthermore, the modeling method using simulation software can compensate the mask unit and improve the evaporation accuracy; at the same time, the operation is simple and fast, which is conducive to reducing costs and facilitating popularization and promotion.

[0077] The method for manufacturing a mask plate provided by an embodiment of the present invention comprises: manufacturing a mask unit 1 according to the method for manufacturing the mask unit 1 described above; and welding the mask unit 1 to a frame 2 after stretching the mesh to obtain a mask plate.

[0078] The mask plate provided in the embodiment of the present invention comprises a frame 2 and a mask unit 1 manufactured according to the above-mentioned mask unit manufacturing method. The mask unit 1 is welded to the frame 2 after being stretched. The mask plate can be specifically manufactured according to the above-mentioned mask plate manufacturing method.

[0079] As described above, the position of the opening 10 in the mask unit 1 is compensated through the above process, so that after being stretched by the tensioning net, the opening 10 in the mask unit 1 can be located at a preset position, so that it can more accurately match the preset position of the film layer to be evaporated (such as OLED pixels, etc.), thereby improving the evaporation accuracy and avoiding color mixing and other phenomena.

[0080] In the description of the present invention, terms such as "first" and "second" are used only for descriptive purposes, such as distinguishing between components to more clearly illustrate / explain the technical solution, and cannot be understood as indicating or implying the number of the indicated technical features or the order with substantial significance.

[0081] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for manufacturing a mask unit, characterized in that: include: The net stretching process of the mask unit is simulated to obtain deformation data of the mask unit; wherein the mask unit includes standard points and a plurality of row groups distributed along the stretching direction of the net stretching, each of the row groups includes a plurality of openings distributed along a second direction, and the second direction is perpendicular to the stretching direction; the deformation data includes first deformation data of the standard points; the number of the standard points is two, and the two standard points are respectively located on opposite sides of the mask unit; Determining the row groups to be compensated on both sides of the mask unit according to the deformation data of the two standard points, and compensating the row groups to be compensated, wherein the compensation process includes: compensating the row groups to be compensated based on the first deformation data, so that the compensated row groups are located at the preset position of the mask unit after being stretched by the stretching net, thereby obtaining a compensated mask unit; The compensating the row group to be compensated based on the first deformation data includes: compensating the row group to be compensated based on the distance between the row group to be compensated and the standard point to the same reference line in the stretching direction and the first deformation data.

2. The method for manufacturing a mask unit according to claim 1, characterized in that: The step of determining the row group to be compensated according to the deformation data comprises: determining a deformation amount of at least a portion of the row groups according to the deformation data; determining a compensation cutoff line according to the deformation amount; In the stretching direction, the row group located between the edge of the mask unit and the compensation cut-off line is determined as the row group to be compensated.

3. The method for manufacturing a mask unit according to claim 2, characterized in that: The standard point is located between the edge of the mask unit and the compensation cut-off line.

4. The method for manufacturing a mask unit according to claim 1, characterized in that: The mask unit includes a plurality of evaporation areas distributed along the stretching direction, each of the evaporation areas includes a plurality of the row groups, and the standard point is located in the evaporation area closest to the edge of the mask unit in the stretching direction.

5. The method for manufacturing a mask unit according to claim 4, characterized in that: In the vapor deposition area where the standard point is located, the difference in the number of row groups located on two opposite sides of the standard point is less than or equal to 1.

6. The method for manufacturing a mask unit according to any one of claims 1 to 5, characterized in that: The standard point is a positioning mark line arranged on the mask unit or a row of the row group.

7. The method for manufacturing a mask unit according to claim 1 or 2, characterized in that: The deformation amount of the row group to be compensated is greater than a set threshold value, and the set threshold value is 0.5-1 μm.

8. The method for manufacturing a mask unit according to claim 1, characterized in that: The compensating the row group to be compensated based on the first deformation data includes: Based on the distance between the row group to be compensated and the standard point to the same baseline in the stretching direction and the first deformation data, a first compensation curve is fitted and generated, and the row group to be compensated is compensated according to the first compensation curve so that the compensated row group is located at the preset position of the mask unit after being stretched by the stretching net.

9. A method for manufacturing a mask plate, characterized in that: include: Manufacturing a mask unit according to the method for manufacturing a mask unit according to any one of claims 1 to 8; The mask unit is stretched and welded to a frame to obtain the mask plate.

10. A mask plate, characterized in that: The invention comprises a frame and a mask unit manufactured according to the method for manufacturing a mask unit according to any one of claims 1 to 8, wherein the mask unit is welded to the frame after being stretched by a net.

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