A device and method for continuously producing a ternary gas mixture
By using a gas flow meter and two mixing systems in the preparation of C4F7N/CO2/O2 mixed gas, the problems of uneven mixing and mixing ratio deviation were solved, and high-precision and high-efficiency mixed gas preparation was achieved.
Patent Information
- Application Number
- CN202310088925.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-02-09
- Publication Date
- 2025-12-16
- Estimated Expiration
- 2043-02-09
AI Technical Summary
Existing technologies for preparing C4F7N/CO2/O2 mixed gases suffer from problems of uneven mixing and mixing ratio deviation, especially in electrical equipment with high precision requirements where it is difficult to meet the mixing ratio accuracy of ±1%.
A ternary mixed gas continuous preparation device is adopted, which controls three gas inlets through a gas flow meter and uses two sets of mixing systems and a compressor to achieve uninterrupted gas mixing and output, thereby reducing system errors and improving the accuracy of the mixing ratio.
Without reducing the gas mixing speed, the accuracy of the gas mixing ratio is significantly improved, the system error and calibration difficulty are reduced, the cost is lowered, and an uninterrupted gas mixing process is achieved.
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Figure CN116036900B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to a kind of ternary gas continuous preparation device and method. BACKGROUND
[0002] In recent years, the environmental protection insulation gas C4F7N / CO2 / O2 has excellent insulation and arc extinguishing performance, which is widely used in various medium and high voltage electrical equipment. As an important indicator affecting the insulation and arc extinguishing performance of mixed gas, the mixing ratio is one of the focuses and difficulties of power system operation and maintenance. Investigation found that the CO2 volume fraction in domestic C4F7N / CO2 / O2 mixed gas insulation equipment is generally about 80%, and the volume fractions of C4F7N and O2 are similar, each about 10%.
[0003] Currently, there are two methods to prepare C4F7N / CO2 / O2 mixed gas on the market, namely partial pressure gas preparation method and dynamic gas preparation method. Among them, the partial pressure gas preparation method is to charge different component gases according to the mixing ratio step by step according to the partial pressure principle of mixed gas. However, the C4F7N / CO2 / O2 mixed gas prepared by the partial pressure gas preparation method is not mixed before being charged into the gas chamber, and it needs to be mixed uniformly in the gas chamber for a long time. If it is not mixed uniformly, it will affect the insulation and arc extinguishing performance of the equipment. In addition, the State Grid requires that the deviation of the mixing ratio of the mixed gas should not exceed ±1%, and the partial pressure gas preparation method mostly uses the method of measuring the pressure of the gas chamber to measure the gas volume charged into the gas chamber, which has low accuracy. Compared with the partial pressure gas preparation method, the dynamic gas preparation method has made certain progress in mixing speed and mixing ratio accuracy, although it is more complex.
[0004] Currently, the C4F7N / CO2 / O2 dynamic gas preparation device on the market mainly measures the gas flow of C4F7N, CO2 and O2 by setting three gas flow meters, and designs a mixing device at the rear end of the flow meter to ensure that the three gases are fully mixed before being charged into the gas chamber. However, through the mixing ratio detection of the mixed gas prepared by the dynamic gas preparation device, it is found that the actual mixing ratio is within the standard range, but still has a certain deviation from the standard value. Analysis shows that the gas preparation error is mainly caused by the three gas flow meters inside. According to the complex system error analysis method, the system error is generally composed of the system error of each sub-module inside the system, and with the increase of the system error items, the system error between them shows a superposition effect, and the total system error also increases. In addition, since the range of the gas flow meter is calibrated under the condition of pure nitrogen gas, when measuring and controlling the flow of a certain gas in actual application, the system needs to be calibrated according to the conversion factor between the gas and nitrogen. When the number of gas flow meters increases, the complexity of system calibration also increases. Therefore, although the dynamic gas preparation device manufacturers use high-precision gas flow meters, under the condition of superposition of system errors of three gas flow meters, the mixing ratio of the prepared mixed gas still has a certain deviation from the set value. SUMMARY
[0005] The purpose of the present application is to provide a ternary gas mixture continuous preparation device and method, by which three kinds of gas are controlled by a gas flow meter, the gas flow meter fills gas into a back-end mixing tank according to a preset flow rate, the gas in the mixing tank is mixed by a compressor, and the mixed gas in the mixing tank is pressurized and output by the compressor after mixing is completed; by providing two mixing modules, the gas flow meter can be automatically switched between the two mixing modules to realize uninterrupted gas distribution.
[0006] In order to achieve the above purpose, the technical scheme of the present application is:
[0007] A ternary gas mixture continuous preparation device, comprising three kinds of gas sources, namely a first gas source, a second gas source and a third gas source, wherein: the three kinds of gas sources are connected to a gas flow meter through a pressure reducing valve and an electronic regulating valve respectively, the output of the gas flow meter is connected to a first and a second mixing system, a controller is connected to the first, second and third electronic regulating valves of the three kinds of gas sources and the mixing system, and the controller controls the two mixing systems to alternately receive the output of the three kinds of mixed gas.
[0008] Further, the mixing system comprises a mixing tank, a compressor and fourth to eighth electronic regulating valves, wherein: the gas input interface of the mixing tank is connected to one end of the fourth electronic regulating valve, the gas output interface of the mixing tank is connected to one end of the fifth electronic regulating valve, the other end of the fourth electronic regulating valve is connected to the output of the gas flow meter, the gas input interface of the mixing tank is also connected to one end of the sixth electronic regulating valve, the other end of the sixth electronic regulating valve is connected to the inlet of the compressor, the outlet of the compressor is connected to the other end of the fifth electronic regulating valve, the inlet of the compressor is also connected to one end of the seventh electronic regulating valve, the other end of the seventh electronic regulating valve is connected to the gas output interface of the mixing tank, the other end of the fifth electronic regulating valve is connected to one end of the eighth electronic regulating valve, and the other end of the eighth electronic regulating valve is a gas mixing output port of the mixing system.
[0009] Further, a ninth electronic regulating valve for vacuum discharge is connected to the gas mixing output interface of the mixing system.
[0010] Further, the maximum output flow rate of the gas flow meter is 80% to 90% of the full scale range of the gas flow meter.
[0011] Further, the three kinds of gas sources are C4F7N, CO2 and O2.
[0012] Further, the range of the output flow rate of the gas flow meter is set by nitrogen calibration.
[0013] A continuous preparation method of a ternary mixed gas is based on a continuous preparation device of the ternary mixed gas, and a first and a second mixing system each comprises a mixing tank, a compressor and fourth to eighth electronic regulating valves, wherein: the gas input interface of the mixing tank is connected to one end of the fourth electronic regulating valve, the gas output interface of the mixing tank is connected to one end of the fifth electronic regulating valve, the other end of the fourth electronic regulating valve is connected to the output of the gas flow meter, the gas input interface of the mixing tank is also connected to one end of the sixth electronic regulating valve, the other end of the sixth electronic regulating valve is connected to the inlet of the compressor, the outlet of the compressor is connected to the other end of the fifth electronic regulating valve, the inlet of the compressor is also connected to one end of the seventh electronic regulating valve, the other end of the seventh electronic regulating valve is connected to the gas output interface of the mixing tank, the other end of the eighth electronic regulating valve is connected to the other end of the fifth electronic regulating valve, and the other end of the eighth electronic regulating valve is the gas output port of the mixing system; the preparation method comprises the following steps:
[0014] (1) Connect the steel cylinders containing C4F7N, CO2 and O2 to the corresponding interfaces of the first, second and third electronic regulating valves of the device through pressure reducing valves, and use the compressors of the first and second mixing systems to vacuumize the entire device and the connected pipelines;
[0015] (2) After vacuumization, open the valves of the steel cylinders containing C4F7N, CO2 and O2, and set the target mixing ratio of the three high-purity gases as a%:b%:c%, wherein a% is the proportion of C4F7N gas, b% is the proportion of CO2 gas, and c% is the proportion of O2 gas;
[0016] (3) Set the output flow of the gas flow meter, preset the single gas inlet time of the mixing tank as T1 and the mixing time as T2, and the T2 time includes the T1 time, and determine the time of each gas flowing through the flow meter within the inlet time T1 according to the target mixing ratio and the output flow of the gas flow meter;
[0017] (4) In the first mixing system, close the seventh, eighth, fourth, sixth, fifth and ninth electronic regulating valves of the first and second mixing systems within 0-T2 time and 0-T1 time, open the remaining electronic regulating valves, configure the first, second and third electronic regulating valves according to the target mixing ratio, and open them in turn; the gas enters the mixing tank of the first mixing system for mixing;
[0018] (5) When the T1 time of the first mixing system arrives, the fourth electronic regulating valve of the first mixing system, the seventh electronic regulating valve and the eighth electronic regulating valve of the second mixing system are closed, and the fourth electronic regulating valve and the fifth electronic regulating valve of the second mixing system are opened, while the rest of the valves remain unchanged. The first electronic regulating valve, the second electronic regulating valve and the third electronic regulating valve are opened in sequence according to the target mixing ratio. The gas enters the mixing tank of the second mixing system for mixing. During the T1-T2 time of the second mixing system, the compressors of the two mixing systems are working for mixing. When the T2 time of the first mixing system arrives and during the 0-T1 time of the second mixing system, the configured gas still enters the mixing tank of the second mixing system. At this time, the sixth electronic regulating valve and the fifth electronic regulating valve of the first mixing system are closed, the eighth electronic regulating valve of the first mixing system is opened, and the rest of the valves remain unchanged. The compressor of the first mixing system is working for pressurization, and the gas in the mixing tank of the first mixing system is outputted by pressurization. The compressor of the second mixing system continues to mix.
[0019] (6) When the T1 time of the second mixing system arrives, the seventh electronic regulating valve of the first mixing system and the fourth electronic regulating valve of the second mixing system are closed, while the fourth electronic regulating valve and the fifth electronic regulating valve of the first mixing system are opened, and the rest of the valves remain unchanged. The first electronic regulating valve, the second electronic regulating valve and the third electronic regulating valve are opened in sequence according to the target mixing ratio. The gas enters the mixing tank of the first mixing system for mixing. During the 2T1-2T2 time of the first mixing system, the compressors of the two mixing systems are working for mixing. When the T2 time of the second mixing system arrives and during the 0-2T1 time of the first mixing system, the configured gas still enters the mixing tank of the first mixing system. At this time, the sixth electronic regulating valve and the fifth electronic regulating valve of the first mixing system are closed, the eighth electronic regulating valve of the second mixing system is opened, and the rest of the valves remain unchanged. The compressor of the second mixing system is working for pressurization, and the gas in the mixing tank of the second mixing system is outputted by pressurization. The compressor of the first mixing system continues to mix. The first mixing system reenters the 0-T2 time. Return to step (5) until the preparation is completed.
[0020] The scheme is further: the range of the set gas flowmeter output flow is 0-Q / (k%*0.625), which is calibrated by nitrogen. Wherein: Q is the unit time flow of the gas flowmeter output C4F7N gas, and k% is the proportion of the maximum output flow of the gas flow to the full range of the gas flowmeter.
[0021] The determination of the time of each gas flowing through the flow meter within the inlet time T1 is t1Q: t2 1.1808Q: t3 1.5888Q = a%: b%: c%, wherein: t1+t2+t3 = T1, t1Q is the flow of C4F7N gas in T1 time, t2 1.1808Q is the flow of CO2 gas in T1 time, and t3 1.5888Q is the flow of O2 gas in T1 time.
[0022] The scheme is further that: the k% is 80% to 90%.
[0023] The scheme is further that: a ninth electronic regulating valve for vacuum discharge is connected to the mixed gas output interface of the mixing system.
[0024] The beneficial effects of the present application are: in the case of high CO2 proportion in the C4F7N / CO2 / O2 mixed gas, a gas flow meter with a range based on the CO2 output flow is selected, the number of gas flow meters is reduced without reducing the gas distribution speed, the system error and system calibration difficulty are reduced, the mixed ratio accuracy of the configured C4F7N / CO2 / O2 mixed gas is improved, and the cost is saved.
[0025] The present application controls the gas volume by passing the three-way inlet gas through one gas flow meter, and the gas flow meter fills gas into the rear-end mixing tank according to the preset flow; the gas in the mixing tank is mixed by the compressor, and when the mixing is completed, the mixed gas in the mixing tank is pressurized and output by the compressor; by setting two sets of mixing systems, the gas flow meter can automatically switch between the two sets of mixing systems to realize uninterrupted gas distribution, thereby ensuring that the gas flow meter is always in working condition, and effectively improving the gas distribution efficiency.
[0026] The present application will be described in detail below in conjunction with the drawings and embodiments. BRIEF DESCRIPTION OF DRAWINGS
[0027] Fig. 1 is a schematic view of the device structure of the present application;
[0028] Fig. 2 is a timing diagram of the method of the present application. DETAILED DESCRIPTION
[0029] Example 1:
[0030] A three-component mixed gas continuous preparation device, such as Figure 1As shown, the ternary gas mixture continuous preparation device includes three gas sources, namely a first gas source C4F7N, a second gas source CO2 and a third gas source O2, wherein: the three gas sources pass through first pressure reducing valve 1, second pressure reducing valve 2, third pressure reducing valve 3 and corresponding first electronic regulating valve 4, second electronic regulating valve 5, third electronic regulating valve 6 respectively, the three electronic regulating valves are simultaneously connected with a gas flow meter 7, the output of the gas flow meter 7 is connected with two sets of mixing systems, namely first mixing system A and second mixing system B, a controller is connected with the first electronic regulating valve 4, the second electronic regulating valve 5, the third electronic regulating valve 6 of the three gas sources and the two sets of mixing systems, namely the first mixing system A and the second mixing system B, and the controller controls the first mixing system to alternately receive the three gases after mixing and output.
[0031] The two sets of mixing systems respectively include a mixing tank 9, a compressor 10 and fourth to eighth electronic regulating valves, wherein: the input interface of the mixing tank gas 9 is connected with one end of the fourth electronic regulating valve 11, the gas output interface of the mixing tank 9 is connected with one end of the fifth electronic regulating valve 12, the other end of the fourth electronic regulating valve 11 is connected with the output of the gas flow meter 7, the gas input interface of the mixing tank 9 is also connected with one end of the sixth electronic regulating valve 13, the other end of the sixth electronic regulating valve 13 is connected with the inlet of the compressor 10, the outlet of the compressor 10 is connected with the other end of the fifth electronic regulating valve 12, the inlet of the compressor is also connected with one end of the seventh electronic regulating valve 14, the other end of the seventh electronic regulating valve 14 is connected with the gas output interface of the mixing tank 9, the other end of the fifth electronic regulating valve 12 is simultaneously connected with one end of the eighth electronic regulating valve 15, the other end of the eighth electronic regulating valve 15 is connected with the gas output port 16 of the mixing system. The gas output interface of the mixing system is connected with the ninth electronic regulating valve 17 as a vacuum discharge. The range of the output flow of the gas flow meter is set by nitrogen.
[0032] Example 2:
[0033] A continuous preparation method of a ternary mixed gas is based on the method of the continuous preparation device of the ternary mixed gas in Example 1. The content of Example 1 is applicable to this example. Therefore, the first and second two sets of mixing systems respectively include a mixing tank 9, a compressor 10, and fourth to eighth electronic regulating valves. The input interface of the mixing tank gas 9 is connected to one end of the fourth electronic regulating valve 11, the gas output interface of the mixing tank 9 is connected to one end of the fifth electronic regulating valve 12, the other end of the fourth electronic regulating valve 11 is connected to the output of the gas flow meter 7, the gas input interface of the mixing tank 9 is also connected to one end of the sixth electronic regulating valve 13, the other end of the sixth electronic regulating valve 13 is connected to the inlet of the compressor 10, the outlet of the compressor 10 is connected to the other end of the fifth electronic regulating valve 12, the inlet of the compressor is also connected to one end of the seventh electronic regulating valve 14, the other end of the seventh electronic regulating valve 14 is connected to the gas output interface of the mixing tank 9, the other end of the fifth electronic regulating valve 12 is connected to one end of the eighth electronic regulating valve 15, and the other end of the eighth electronic regulating valve 15 is connected to the gas output interface of the mixing system; the ninth electronic regulating valve 17 connected to the gas output interface of the mixing system is used as a vacuum discharge; and the preparation method steps include:
[0034] (1) Connect the steel cylinders containing C4F7N, CO2, and O2 to the corresponding interfaces of the first, second, and third electronic regulating valves of the device through pressure reducing valves, and use the compressors of the first and second mixing systems to vacuumize the entire device and the connecting pipelines;
[0035] (2) After vacuumization, open the valves of the steel cylinders containing C4F7N, CO2, and O2, and set the target mixing ratio a%:b%:c% of the three high-purity gases, wherein a% is the proportion of C4F7N gas, b% is the proportion of CO2 gas, and c% is the proportion of O2 gas;
[0036] (3) Set the output flow of the gas flow meter, preset the single gas inlet time of the mixing tank as T1 and the mixing time as T2, and T2 includes T1, and determine the time of each gas flowing through the flow meter within the inlet time T1 according to the target mixing ratio and the output flow of the gas flow meter;
[0037] (4) In the first mixing system, close the seventh, eighth, fourth, sixth, fifth, and ninth electronic regulating valves in the time 0-T2 and the time 0-T1, open the remaining electronic regulating valves, open the first, second, and third electronic regulating valves according to the target mixing ratio, and configure the first mixing system to mix the gas in the mixing tank;
[0038] (5) When the T1 time of the first mixing system arrives, the fourth electronic regulating valve 11 of the first mixing system, the seventh electronic regulating valve 14 and the eighth electronic regulating valve 15 of the second mixing system are closed, and the fourth electronic regulating valve 11 and the fifth electronic regulating valve 12 of the second mixing system are opened, and the remaining valves remain unchanged; the first electronic regulating valve 4, the second electronic regulating valve 5 and the third electronic regulating valve 6 are opened in sequence according to the target mixing ratio; the gas enters the mixing tank of the second mixing system for mixing; in the T1-T2 time of the second mixing system, the compressors of the two mixing systems are working for mixing; when the T2 time of the first mixing system arrives and in the 0-T1 time of the second mixing system, the gas is still configured to enter the mixing tank of the second mixing system; at this time, the sixth electronic regulating valve 13 and the fifth electronic regulating valve 12 of the first mixing system are closed, the eighth electronic regulating valve 15 of the first mixing system is opened, and the remaining valves remain unchanged; the compressor of the first mixing system is working for pressurization, and the gas in the mixing tank of the first mixing system is outputted by pressurization; the compressor of the second mixing system continues to mix;
[0039] (6) When the T1 time of the second mixing system arrives, the seventh electronic regulating valve 14 of the first mixing system and the fourth electronic regulating valve 11 of the second mixing system are closed, and the fourth electronic regulating valve 11 and the fifth electronic regulating valve 12 of the first mixing system are opened, and the remaining valves remain unchanged; the first electronic regulating valve 4, the second electronic regulating valve 5 and the third electronic regulating valve 6 are opened in sequence according to the target mixing ratio; the gas enters the mixing tank of the first mixing system for mixing; in the 2T1 (second T1)-2T2 (second T2) time of the first mixing system, the compressors of the two mixing systems are working for mixing; when the T2 time of the second mixing system arrives and in the 0-2T1 time of the first mixing system, the gas is still configured to enter the mixing tank of the first mixing system; at this time, the sixth electronic regulating valve 13 and the fifth electronic regulating valve 12 of the first mixing system are closed, the eighth electronic regulating valve 15 of the second mixing system is opened, and the remaining valves remain unchanged; the compressor of the second mixing system is working for pressurization, and the gas in the mixing tank of the second mixing system is outputted by pressurization; the compressor of the first mixing system continues to mix; the first mixing system reenters the 0-T2 time; return to step (5) until the preparation is completed.
[0040] The range of the output flow of the gas flow meter is 0-Q / (k%*0.625), which is calibrated by nitrogen, wherein Q is the unit time flow of the C4F7N gas output by the gas flow meter, and k% is the proportion of the maximum output flow of the gas flow meter to the full range of the gas flow meter; the k% is 80% to 90%.
[0041] The determination of each gas flowing through the flow meter in the time T1 is t1Q: t21.1808Q: t31.5888Q = a%: b%: c%, wherein: t1 + t2 + t3 = T1, t1Q is the flow of C4F7N gas in T1, t21.1808Q is the flow of CO2 gas in T1, and t31.5888Q is the flow of O2 gas in T1.
[0042] Wherein: the gas flow meter output flow Qv is k% of the full scale, and the gas flow meter automatically calculates the time of three gases flowing through the gas flow meter in T1 under the flow Qv according to the set target mixing ratio; as the gas flow meter range selection: the planned output flow of this embodiment is Q m 3 / h, and the selected gas flow meter range is not less than the output flow of CO2 required for configuring the target mixing ratio under the output flow Q (for example, the output flow of the gas analyzer is required to be 300 L / min, the target mixing ratio of C4F7N / CO2 / O2 is 10%:80%:10%, and the output flow of CO2 is 240 L / min, so the gas flow meter range should be not less than 240 L / min).
[0043] In this embodiment, in order to improve the measurement accuracy, the maximum output flow of the gas flow meter is 80% to 90% of the full scale of the gas flow meter. And the range of the output flow of the gas flow meter is calibrated with nitrogen. The length of time T2 is greater than the length of time T1, and of course the time T1 ≤ the time T2 can also be set.
[0044] Gas flow meter range selection:
[0045] Suppose the output flow of this embodiment is not less than Q m 3 / h, then the actual output flow of the front-end flow meter needs to be not less than Q m 3 / h. According to k% of the full scale of the gas flow meter (at this time the error is the lowest), the actual maximum output flow of the gas flow meter should be Q / k%. Generally, the range of the flow meter is calibrated with nitrogen, and the conversion coefficients of different gases and nitrogen are different, so it is necessary to further calculate the actual flow of each component gas. According to the relevant information, the conversion coefficients of C4F7N, CO2 and O2 are 0.625, 0.738 and 0.993 respectively. Since the conversion coefficient of C4F7N is the lowest, that is, the actual flow of C4F7N is the lowest under the full scale of the gas flow meter. Therefore, if the actual flow of C4F7N under the maximum range k% is not less than Q, then the actual flow of CO2 and O2 under the maximum range k% is certainly not less than Q, and the output mixed gas flow of the rear stage is also certainly not less than Q. Therefore, the range of the gas flow meter is 0~Q / (k%×0.625).
[0046] The gas flow meter calculates the flow time of each gas in a period T1:
[0047] The flow meter range is known to be 0~Q / (k%*0.625), and the output flow is k% full scale flow. The actual flow of C4F7N, CO2, O2 is Q, 1.1808Q, 1.5888Q respectively. Given the mixing ratio a%:b%:c%, let t1, t2, t3 be the flow time of each gas in a period T1, then t1, t2, t3 can be calculated by the following two equations:
[0048] t1+t2+t3=T1
[0049] t1Q:t21.1808Q:t31.5888Q=a%:b%:c%
[0050] The above-mentioned three-component mixed gas continuous preparation device and method embodiment controls the gas volume through one gas flow meter for each of the three gas inlets, and the gas flow meter fills gas into the back-end mixing tank according to the preset flow; the gas in the mixing tank is mixed by the compressor, and when the mixing is completed, the mixed gas in the mixing tank is pressurized and output by the compressor; by setting two sets of mixing systems, the gas flow meter can automatically switch between the two sets of mixing systems to realize uninterrupted gas distribution, thereby ensuring that the gas flow meter is always in working condition and effectively improving the gas distribution efficiency.
Claims
1. A continuous preparation apparatus for a ternary mixed gas, comprising three gas sources, namely a first gas source, a second gas source, and a third gas source, characterized in that, Three gas sources are connected to a gas flow meter simultaneously through a pressure reducing valve and an electronic regulating valve. The output of the gas flow meter is connected to the first and second mixing systems. A controller is connected to the first electronic regulating valve, the second electronic regulating valve, the third electronic regulating valve and the mixing system of the three gas sources respectively. The controller controls the two mixing systems to alternately receive the three gases and output them after mixing. The maximum output flow rate of the gas flow meter is 80% to 90% of its full scale. The range setting of the output flow of the gas flow meter is a set range calibrated with nitrogen. The mixing system includes a mixing tank, a compressor, and fourth to eighth electronic regulating valves, wherein: the gas input interface of the mixing tank is connected to one end of the fourth electronic regulating valve, the gas output interface of the mixing tank is connected to one end of the fifth electronic regulating valve, the other end of the fourth electronic regulating valve is connected to the output of the gas flow meter, the gas input interface of the mixing tank is also connected to one end of the sixth electronic regulating valve, the other end of the sixth electronic regulating valve is connected to the compressor inlet, the compressor outlet is connected to the other end of the fifth electronic regulating valve, the compressor inlet is also connected to one end of the seventh electronic regulating valve, the other end of the seventh electronic regulating valve is connected to the gas output interface of the mixing tank, the other end of the fifth electronic regulating valve is simultaneously connected to one end of the eighth electronic regulating valve, and the other end of the eighth electronic regulating valve is the mixed gas output port of the mixing system.
2. The ternary mixed gas continuous preparation apparatus according to claim 1, characterized in that, A ninth electronic regulating valve for vacuum discharge is connected to the gas mixing output interface of the mixing system.
3. The ternary mixed gas continuous preparation apparatus according to claim 1, characterized in that, The three gas sources are C4F7N, CO2, and O2.
Citation Information
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