High temperature resistant container cleaning device and method

Abstract

An embodiment of the present invention provides a high-temperature resistant container cleaning device and method, the high-temperature resistant container cleaning device includes a vacuum chamber, a first side of the vacuum chamber is provided with a vacuum pumping system for evacuating the vacuum chamber; a crucible heating control device, which is arranged in the vacuum chamber and is used to heat the crucible arranged inside the crucible heating control device; a reducing gas supply system, which is arranged on the second side of the vacuum chamber and is used to provide reducing gas to the crucible in the vacuum chamber. By forming a high-temperature environment and different crucible opening directions, and thoroughly cleaning the crucible under the action of hot reducing gas, a crucible component that can continue to be used normally is obtained, thereby solving the problems of improving the service life of the crucible, evaporation efficiency and coating quality.

Description

Technical Field

[0001] The present invention relates to the technical field of crucible maintenance, and in particular to a high-temperature resistant container cleaning device and method. Background Art

[0002] In recent years, with the continuous increase in demand for vacuum coating technology and related product production, especially the deposition of various types of functional thin films on the surface of flexible substrates, such as the growth of metal films on the surface of polymer substrates to achieve the preparation of various composite conductive films to meet the application requirements of lithium-ion battery current collector materials. One of the methods of thin film deposition is vacuum evaporation. Vacuum evaporation refers to heating the material and coating it on the substrate in a vacuum environment. Specifically, the metal is heated to the evaporation temperature and then evaporated. The vapor of the evaporated metal is then transferred from the vacuum chamber and condensed on the low-temperature parts. This process can be achieved by vacuum evaporation. The evaporated metal for vacuum evaporation is placed in a crucible. Under normal circumstances, residual oxide impurities are easily seen in the process of reusing the crucible in the vacuum evaporation method. These substances may cause secondary evaporation difficulties (such as aluminum oxide is difficult to evaporate better at high temperatures) or impurity contamination affects the quality of thin film deposition, such as sputtering defects. Therefore, it is very necessary to seek corresponding devices and technologies to solve the impact of harmful or unnecessary residual substances in the crucible.

[0003] In the process of implementing the present invention, the inventors discovered that the prior art has at least the following problems:

[0004] The evaporated metal for vacuum evaporation is placed in a crucible. Under normal circumstances, residual oxide impurities are likely to be seen in the crucible during repeated use of the crucible. These substances may cause difficulties in secondary evaporation, such as difficulty in achieving better evaporation of aluminum oxide at high temperatures, or impurity contamination may affect the quality of thin film deposition, such as splashing defects. These residual impurities in the crucible will reduce the efficiency of the crucible when evaporating the material, shorten the service life of the crucible, and easily make the crucible scrapped. In addition, when the crucible is being coated, the residual impurities in the crucible will cause adverse effects, especially the burn holes in the film product caused by the splashing of residual impurities. Therefore, it is very necessary to seek corresponding devices and technologies to solve the impact of harmful or unnecessary residual substances in the crucible. Summary of the Invention

[0005] In view of this, an object of embodiments of the present invention is to provide a high-temperature resistant container cleaning device and method to effectively remove harmful or unnecessary residual substances in a crucible.

[0006] To achieve the above object, the present invention provides the following technical solutions:

[0007] A high-temperature resistant container cleaning device comprises a vacuum chamber, wherein a vacuum system for evacuating the vacuum chamber is provided on a first side of the vacuum chamber;

[0008] A crucible heating control device is provided in the vacuum chamber, and is used to heat the crucible provided inside the crucible heating control device, and control the opening of the crucible to face downward during the heating process;

[0009] The reducing gas supply system is arranged on the second side of the vacuum chamber and is used for providing reducing gas to the crucible in the vacuum chamber.

[0010] Furthermore, an embodiment of the present invention provides that a storage bin for receiving and discharging crucible residue is provided in the vacuum chamber, and the storage bin is provided below the crucible.

[0011] Furthermore, an embodiment of the present invention provides that the crucible heating control device includes a flip drive mechanism, a support, a graphite heating electrode and a limit plate;

[0012] A turning drive mechanism for clamping and supporting the crucible is fixedly connected to one side of the graphite heating electrode;

[0013] A support is fixedly connected to the vacuum chamber, and the flip driving mechanism is connected to the support via a bearing;

[0014] A heating electrode hole is provided on the graphite heating electrode, the crucible is supportedly connected in the heating electrode hole, and the graphite heating electrode is connected to a limiting plate for supporting the edge of the crucible opening.

[0015] Furthermore, the crucible heating control device can be turned upward so that the opening of the crucible faces upward.

[0016] Furthermore, the heating temperature of the graphite heating electrode is not lower than 1000°C.

[0017] Furthermore, an embodiment of the present invention provides the reducing gas supply system for directly introducing a mixed gas of H2 and CO for a reduction reaction with the residue inside the crucible, and the molar concentration of the mixed gas of H2 and CO is within a safe limit.

[0018] Furthermore, an embodiment of the present invention provides the reducing gas supply system for introducing gas obtained by heating carbon material and causing incomplete combustion of the carbon material into the residue inside the crucible.

[0019] Furthermore, an embodiment of the present invention provides that the crucible is a high-temperature resistant metal crucible or a ceramic crucible that does not contain oxides.

[0020] Furthermore, the graphite heating electrode is provided with a heat-insulating material for ensuring that the temperature of the crucible can be raised to a specified temperature during the heating process, and the heat-insulating material is provided around the crucible.

[0021] Furthermore, a high temperature resistant container cleaning method comprises the following steps:

[0022] S1: Crucible installation and heating: Install the crucible on the crucible heating control device, then the vacuum chamber is evacuated through the vacuum system, and the crucible heating control device starts heating.

[0023] S2: Reducing gas supply: When the crucible heating control device is heating, the reducing gas supply system provides reducing gas, or provides reducing gas when the temperature rises to 700℃;

[0024] S3: Crucible inversion and cleaning: After the excess residue to be evaporated in the crucible is largely melted and flows out of the crucible, the crucible heating control device is reversed so that the crucible opening faces upward. At this time, the material remaining on the inner wall of the crucible continues to evaporate under the action of the reducing gas.

[0025] The above technical solution has the following beneficial effects:

[0026] 1. Improve the efficiency of crucible evaporation of materials;

[0027] 2. Reduce the loss and scrapping of crucibles;

[0028] 3. Reduce the impact of residual impurities in the crucible evaporation product on the quality of the coating film, especially reduce the burn holes of the film product caused by impurity splashing, and improve the film thickness uniformity of the evaporated coating. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0030] Figure 1 This is a front view of a high-temperature resistant container cleaning device according to an embodiment of the present invention;

[0031] Figure 2 is a top view of a crucible heating control device according to an embodiment of the present invention;

[0032] Figure 3 is a cross-sectional view of a crucible according to an embodiment of the present invention;

[0033] Figure 4 This is a front view of another high-temperature resistant container cleaning device according to an embodiment of the present invention;

[0034] Figure 5 This is a flow chart of a high-temperature resistant container cleaning method according to an embodiment of the present invention.

[0035] In the picture:

[0036] 1. Vacuum chamber; 11. Crucible; 11a. Inner diameter edge of crucible hole; 11b. Outer diameter edge of crucible hole; 12. Storage bin; 2. Vacuum pumping system; 3. Crucible heating control device; 31. Flipping drive mechanism; 32. Support; 33. Graphite heating electrode; 34. Limiting plate; 342. Hole of limiting plate; 36. Bearing; 4. Reducing gas supply system. DETAILED DESCRIPTION

[0037] The features and exemplary embodiments of various aspects of the present invention are described in detail below. In the detailed description that follows, many specific details are set forth in order to provide a comprehensive understanding of the present invention. However, it will be apparent to those skilled in the art that the present invention can be implemented without some of these specific details. The following description of the embodiments is intended only to provide a better understanding of the present invention by illustrating examples of the present invention. In the accompanying drawings and the following description, at least some of the well-known structures and techniques are not shown in order to avoid unnecessary ambiguity in the present invention; and, for clarity, the sizes of some structures may be exaggerated. In addition, the features, structures, or characteristics described below may be combined in any suitable manner in one or more embodiments.

[0038] The present invention provides a crucible heating environment that allows residual material to be evaporated to melt and flow out at various times, disposing of most of the residual material and removing, for example, aluminum oxide from the inner surface of an aluminum-evaporating crucible. Specifically, if the aluminum material is not completely evaporated, its surface is susceptible to oxidation at a certain temperature when the crucible is opened. Furthermore, because aluminum oxide has a melting point much higher than that of aluminum metal, if the aluminum oxide on the surface is not removed, the aluminum metal vapor will be trapped by the aluminum oxide layer during the heating process, preventing evaporation.

[0039] Therefore, this embodiment uses a high-temperature melting crucible in an inverted manner to remove aluminum oxide that is washed away by the aluminum material or breaks through the aluminum oxide film due to factors such as gravity. At the same time, similar metal oxides are further reduced under the action of a hot reducing atmosphere. When the temperature continues to rise to, for example, above 1000°C, the remaining metal substances are removed by normal evaporation, and finally a completely clean crucible is obtained.

[0040] See also Figures 1 to 4 , an embodiment of the present invention provides a high-temperature resistant container cleaning device, comprising a vacuum chamber 1, a first side of the vacuum chamber 1 is provided with a vacuum system 2 for evacuating the vacuum chamber 1;

[0041] The crucible array includes a plurality of crucibles 11, which are spaced apart in the vacuum chamber 1 and opened downward. The purpose of the crucible 11 opening downward is that after heating, the bottom and wall of the crucible 11 are heated and melted first, pushing away the oxide (more oxides), and most of the evaporation and oxides will fall off.

[0042] The crucible heating control device 3 is provided in the vacuum chamber 1 and is used to heat the crucible 11 provided inside the crucible heating control device 3 and control the opening of the crucible 11 to face downward during the heating process;

[0043] The reducing gas supply system 4 is provided at the second side of the vacuum chamber 1 and is used to provide reducing gas to the crucible 11 in the vacuum chamber 1 .

[0044] Furthermore, a storage bin 12 for receiving and discharging residues from the crucible 11 is provided in the vacuum chamber 1 , and the storage bin 12 is provided directly below the crucible 11 .

[0045] like Figure 2 As shown, further, the crucible heating control device 3 includes: a flip driving mechanism 31 , a support 32 , a graphite heating electrode 33 and a limiting plate 34 .

[0046] A flipping drive mechanism 31 for clamping and supporting the crucible 11 is fixedly connected to one side of the graphite heating electrode 33. A support 32 is fixedly connected in the vacuum chamber 1. The flipping drive mechanism 31 is connected to the support 32 through a bearing 36. A heating electrode hole is provided on the graphite heating electrode 33. The crucible 11 can be supported and connected in the heating electrode hole, and the graphite heating electrode 33 is connected to a limiting plate 34 for supporting the opening edge of the crucible 11. The limiting plate 34 has a hole 342. When the crucible is open downward, it is supported by the limiting plate 34 to prevent it from falling. The hole 342 of the limiting plate 34 supports the opening edge of the crucible. The hole 342 of the limiting plate is larger than the inner diameter of the crucible and smaller than the outer diameter of the crucible. The limiting plate 34 can be locked to the graphite heating electrode 33 by screws. As shown Figure 2 As shown, the diameter of the hole 342 on the limiting plate is between the inner diameter edge 11a of the crucible hole and the outer diameter edge 11b of the crucible hole.

[0047] The flipping drive mechanism 31 is actuated to enable the residue in the crucible 11 to fall when the crucible 11 is inverted with its opening downward. The crucible heating control device 3 has a component for clamping or supporting the crucible 11, namely the flipping drive mechanism 31, to enable the crucible 11 to fall when the crucible 11 is inverted with its opening downward (what falls is the contents of the crucible 11). In the extreme case, the opening plane of the crucible 11 is parallel to the horizontal plane, forming an angle of A=0°, and pointing vertically downward. More preferred is a component clamped on the side wall of the crucible 11. When a supporting component is used, it should fit into the opening of the crucible 11, and the opening edge of the supporting component should be supported while being away from the inner wall edge of the crucible 11; specifically, with regard to achieving the clamping or support of the crucible 11, the crucible 11 is supported at the hole of the heating electrode, so that when the opening of the crucible 11 is facing downward, the crucible 11 can be prevented from falling. When the crucible 11 is supported downward, the graphite heating electrode 33 is inverted, and the crucible 11 is inverted, supported by the limit plate 34, which supports the edge of the crucible 11.

[0048] Furthermore, the heating temperature of the graphite heating electrode 33 is not less than 1000°C.

[0049] Furthermore, the crucible heating control device 3 can be flipped upward. As the heat treatment maintenance time increases, when the temperature environment is at or above 1000°C, the evaporation rate of common materials increases. At this time, the small amount of material remaining on the inner surface of the crucible 11 (evaporation material) is completely evaporated, resulting in a completely clean crucible 11 free of residual impurities. Specifically, after the storage bin 12 is opened, the remaining evaporation material in the crucible 11 will completely evaporate. The reason why the crucible 11 is initially opened downward is that the evaporation material first melts and then breaks through the oxide layer, thus removing most of the evaporation material and oxide. After the storage bin 12 is opened, the evaporation material will come into contact with air and oxidize.

[0050] Furthermore, the reducing gas supply system 4 is used to directly introduce a mixed gas of H2 and CO for a reduction reaction with the residue inside the crucible 11, and the molar concentration of the mixed gas of H2 and CO is within the safety limit, so as to act as a reducing gas to react chemically with the residue inside the crucible 11.

[0051] like Figure 4 As shown, further, the reducing gas supply system 4 is used to pass gas obtained by heating a carbon material and causing incomplete combustion of the carbon material into the residue inside the crucible 11. The incomplete combustion of the carbon material produces CO, thereby providing sufficient CO reducing gas for the reduction reaction of the residue inside the crucible 11. The CO reducing gas evaporates and reduces the residue simultaneously. The evaporation target is the evaporation material, not the oxide. This method of cleaning the crucible 11, due to the presence of the vacuum chamber 1 and the crucible heating control device 3, the temperature inside the vacuum chamber 1 is relatively high, so it is not necessary to pass in a hot reducing gas. Preferably, the passing in of a hot reducing gas achieves a better cleaning effect.

[0052] Furthermore, the crucible 11 is a high-temperature resistant metal crucible or a ceramic crucible that does not contain oxides.

[0053] Furthermore, the graphite heating electrode 33 of the crucible heating control device 3 is a graphite heating body, and the crucible 11 is arranged in the heating electrode hole on the graphite heating electrode 33, and the graphite heating electrode 33 is provided with an insulation material for ensuring that the temperature of the crucible 11 can be raised to a specified temperature during the heating process, and the insulation material is arranged around the crucible 11.

[0054] In some embodiments, the high temperature resistant container cleaning device further comprises:

[0055] Temperature sensor, used to detect the current heating temperature;

[0056] The crucible heating control device 3 is further configured to control the high-temperature resistant container to be heated with its opening facing downward or tilted downward when the heating temperature is less than a first temperature threshold, so that any residue inside the high-temperature resistant container melts and flows out of the container; when the heating temperature reaches the first temperature threshold, control the high-temperature resistant container to be heated with its opening facing upward or tilted upward; and when the heating temperature reaches a second temperature threshold, stop heating; wherein the second temperature threshold is greater than the first temperature threshold. The first temperature threshold is, for example, 1000°C, and the second temperature threshold is, for example, 1600°C. The crucible heating control device 3 is further configured to trigger or control the reducing gas supply system 4 to provide reducing gas when the heating temperature reaches a third temperature threshold. The third temperature threshold is, for example, 700°C. The crucible heating control device 3 adjusts the posture of the high-temperature resistant container by actuating the flip drive mechanism 31.

[0057] like Figure 5 As shown, a high temperature resistant container cleaning method applied to the above-mentioned high temperature resistant container cleaning device comprises the following steps:

[0058] S1: Crucible 11 installation and heating: The crucible 11 is installed on the crucible heating control device 3, and then the vacuum chamber 1 is evacuated by the vacuum system 2 (for example, 10 -1 Pa), the crucible heating control device 3 starts heating;

[0059] S2: Reducing gas supply: When the crucible heating control device 3 is heating, the reducing gas supply system 4 provides reducing gas, or provides reducing gas when the temperature rises to 700°C;

[0060] S3: Inverting and cleaning the crucible 11: After a large amount of excess residue to be evaporated in the crucible 11 is melted and flows out of the crucible 11, the crucible heating control device 3 is inverted so that the crucible 11 opens upward. At this time, the material remaining on the inner wall of the crucible 11 continues to evaporate under the action of the reducing gas.

[0061] The final heating temperature in step S3 can be controlled at 1600°C.

[0062] Step S3 can be replaced by: after the crucible heating control device 3 raises the temperature to 1000°C or above, and a large amount of excess residue to be evaporated in the crucible 11 is melted and flows out of the crucible 11, the crucible heating control device 3 is reversed so that the opening of the crucible 11 is facing upward. At this time, the material remaining on the inner wall of the crucible 11 continues to evaporate under the action of the reducing gas.

[0063] In a further embodiment, Figure 5 The method shown may further include step S4: cooling after cleaning: after the high-temperature evaporation is confirmed to be complete, heating and introduction of hot reducing gas are stopped, the entire vacuum chamber 1 is allowed to cool, and finally the cleaned crucible 11 is taken out.

[0064] Working principle:

[0065] The maintenance of the device should be carried out in a vacuum environment. The crucible 11 to be maintained is installed on the crucible heating control device 3 (usually placed in the hole of the graphite heating electrode 33), and then the vacuum chamber 1 is evacuated to 10 by the vacuum system 2. - 1 After Pa, heating is started. In the initial state, the crucible 11 is opened downward. When the temperature rises to about 700°C, hot reducing gas is provided (reducing gas can be provided at the beginning). After the temperature rises to 1000°C and above, and a large amount of excess residue to be evaporated in the crucible 11 is melted and flows out of the crucible 11, the heating device is reversed so that the crucible 11 is opened upward. The material remaining on the inner wall of the crucible 11 continues to be evaporated under the action of the reducing gas. The final heating temperature is controlled within 1600°C. After the high-temperature evaporation is confirmed to be complete, the heating and the introduction of hot reducing gas are stopped, the entire vacuum chamber 1 is allowed to cool, and finally the cleaned crucible is taken out.

[0066] This method can effectively eliminate the residues left after the evaporation of common metal materials such as Al and Cu in the crucible. In order to ensure efficient production, the vacuum coating machine usually has a certain temperature after opening. In this case, the metal surface is oxidized, which seals the internal metal material, hindering efficient heating during secondary heating and evaporation. In particular, the formation of high-temperature resistant Al2O3 films cannot be decomposed under the temperature conditions of aluminum evaporation, or the formation of high-melting-point substances such as cuprous oxide, resulting in poor thermal conductivity, hindering effective evaporation, or impurities causing adverse deposition effects, such as droplet splashing causing burn holes. Therefore, this embodiment provides a high-temperature resistant container cleaning device, which creates a high-temperature environment and different crucible opening directions, and thoroughly cleans the crucible under the action of hot reducing gas (first reduced to aluminum, then evaporated to achieve thorough cleaning), thereby obtaining a crucible component that can continue to be used normally, solving the problems of crucible service life, evaporation efficiency and coating quality improvement.

[0067] Related reaction equations:

[0068] Al2O3+3CO=2Al+3CO2;

[0069] Cu2O+CO=2Cu+CO2;

[0070] or

[0071] Al2O3+3H2=2Al+3H2O(g);

[0072] Cu2O+H2=2Cu+H2O(g).

[0073] The graphite heating electrode 33 is provided with a heat-insulating material, surrounding the crucible 11;

[0074] After the evaporation equipment has officially completed the coating, if the chamber is not opened to allow the remaining evaporation material in the crucible 11 to evaporate, ideally, there will be no aluminum oxide in the crucible 11; however, it takes 2-3 hours for the remaining evaporation material in the crucible 11 to evaporate. During this period, the evaporation equipment cannot be used for coating and cannot produce products, resulting in a waste of the evaporation equipment.

[0075] Therefore, usually after the formal coating is completed, the chamber is opened and the crucible 11 is taken out for cleaning. When the chamber is opened, the evaporated material contacts the air and oxidizes. If it is aluminum material, aluminum oxide is formed. In this embodiment, when the crucible 11 is taken out and cleaned in another vacuum chamber, the vacuum coating equipment can replace the cleaned crucible 11 for coating, avoiding long-term shutdown of the coating process.

[0076] When the evaporation material is in the crucible 11, it is melted due to the high temperature. When the evaporation material is sealed, it is solidified on the inner wall of the crucible 11. Therefore, when it is inverted, it needs to be heated to melt the evaporation material so that it can break through the oxide layer.

[0077] In summary, the embodiment of the present invention provides an environment for heating the crucible 11, which can melt and flow out the residual material to be evaporated inside the crucible 11 at different times, dispose of most of the residues, and remove, for example, aluminum oxide on the inner surface of the aluminum evaporation crucible 11.

[0078] If the aluminum material is not completely evaporated, it will be easily oxidized when it has a certain temperature when the warehouse is opened. In addition, because the melting point of aluminum oxide is much higher than that of aluminum metal, if the aluminum oxide on the surface is not removed, the Al metal vapor will be sealed by the aluminum oxide layer during the heating process and will not be able to produce an evaporation effect. Therefore, the high-temperature melting crucible 11 is removed by inverting it (the aluminum oxide is washed away by the aluminum material) or the aluminum oxide film is broken due to factors such as gravity. At the same time, similar metal oxides are further reduced under the action of a hot reducing atmosphere. When the temperature continues to rise to, for example, above 1000°C, the remaining metal substances are removed by normal evaporation, and finally a completely clean crucible 11 is obtained.

[0079] In the description of the present invention, it should be noted that the terms "upper, lower, inner, and outer" and other references to orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings and are intended solely to facilitate and simplify the description of the present invention. They are not intended to indicate or imply that the devices or components referred to must have, be constructed, or operate in a specific orientation, and therefore should not be construed as limitations on the present invention. Furthermore, the terms "first, second, or third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0080] In this disclosure, unless otherwise specified or limited, the terms "mounted," "connected," and "connected" should be interpreted broadly. For example, they may refer to fixed, removable, or integral connections. They may also refer to mechanical, electrical, or direct connections, indirect connections through an intermediary, or internal communication between two components. Those skilled in the art will understand the specific meanings of these terms in this disclosure.

[0081] While the present invention has been described with reference to preferred embodiments, various modifications may be made and equivalent components may be substituted without departing from the scope of the present invention. In particular, the various technical features described in the various embodiments may be combined in any manner, provided no structural conflicts exist. The present invention is not limited to the specific embodiments disclosed herein, but encompasses all technical solutions within the scope of the claims.

Claims

1. A high temperature resistant container cleaning device, characterized in that: include: A vacuum chamber (1), wherein a vacuum pumping system (2) for evacuating the vacuum chamber (1) is provided on a first side of the vacuum chamber (1); A crucible heating control device (3) is provided in the vacuum chamber (1) and is used to heat a crucible (11) provided inside the crucible heating control device (3), and to control the opening of the crucible (11) to face downward during the heating process; A reducing gas supply system (4) is provided on the second side of the vacuum chamber (1) and is used to provide reducing gas to the crucible (11) in the vacuum chamber (1); a storage bin (12) is provided in the vacuum chamber (1) for receiving and discharging residues from the crucible (11), and the storage bin (12) is provided below the crucible (11); The high-temperature resistant container cleaning device further includes: a temperature sensor for detecting a current heating temperature; a crucible heating control device (3) for controlling the high-temperature resistant container to be heated with its opening facing downward or tilted downward when the heating temperature is less than a first temperature threshold; controlling the high-temperature resistant container to be heated with its opening facing upward or tilted upward when the heating temperature reaches the first temperature threshold; and stopping heating when the heating temperature reaches a second temperature threshold; wherein the second temperature threshold is greater than the first temperature threshold.

2. A high temperature resistant container cleaning device according to claim 1, characterized in that: The crucible heating control device (3) comprises a flip driving mechanism (31), a support (32), a graphite heating electrode (33) and a limit plate (34); A flip driving mechanism (31) for clamping and supporting the crucible (11) is fixedly connected to one side of the graphite heating electrode (33); A support (32) is fixedly connected to the vacuum chamber (1), and the flip drive mechanism (31) is connected to the support (32) via a bearing (36); A heating electrode hole is provided on the graphite heating electrode (33), the crucible (11) is supported and connected in the heating electrode hole, and the graphite heating electrode (33) is connected to a limiting plate (34) for supporting the opening edge of the crucible (11).

3. The high temperature resistant container cleaning device according to claim 2, characterized in that: The heating temperature of the graphite heating electrode (33) is not less than 1000°C.

4. The high temperature resistant container cleaning device according to claim 2, characterized in that: The crucible heating control device (3) can be flipped upward so that the opening of the crucible (11) faces upward.

5. The high temperature resistant container cleaning device according to claim 1, characterized in that: The reducing gas supply system (4) is used to directly introduce a mixed gas of H2 and CO for generating a reduction reaction with the residue inside the crucible (11), and the molar concentration of the mixed gas of H2 and CO is within a safe limit range.

6. The high temperature resistant container cleaning device according to claim 1, characterized in that: The reducing gas supply system (4) is used to introduce gas obtained by heating the carbon material and causing incomplete combustion of the carbon material into the residue inside the crucible (11).

7. The high temperature resistant container cleaning device according to claim 1, characterized in that: The crucible (11) is a high-temperature resistant metal crucible or a ceramic crucible that does not contain oxides.

8. The high temperature resistant container cleaning device according to claim 2, characterized in that: The graphite heating electrode (33) is provided with a heat-insulating material for ensuring that the temperature of the crucible (11) can be raised to a specified temperature during the heating process. The heat-insulating material is provided around the crucible (11).

9. A high temperature resistant container cleaning method, applied to a high temperature resistant container cleaning device according to any one of claims 1 to 8, characterized in that: The high temperature resistant container cleaning method comprises the following steps: S1: Crucible (11) installation and heating: The crucible (11) is installed on the crucible heating control device (3), and then the vacuum chamber (1) is evacuated by the vacuum pumping system (2), and the crucible heating control device (3) starts heating; S2: Reducing gas supply: When the crucible heating control device (3) is heating, the reducing gas supply system (4) provides reducing gas, or provides reducing gas when the temperature rises to 700°C; S3: Inversion and cleaning of the crucible (11): After a large amount of excess residue to be evaporated in the crucible (11) is melted and flows out of the crucible (11), the crucible heating control device (3) is reversed so that the opening of the crucible (11) faces upward. At this time, the material remaining on the inner wall of the crucible (11) continues to evaporate under the action of the reducing gas.

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