Exposure apparatus, measuring apparatus and component manufacturing methods

Abstract

The objective is to provide an exposure apparatus, a measuring apparatus, a measuring method, and a component manufacturing method that, for high-precision exposure, can measure the operating state of a spatial light modulator with high precision within a short time during the exposure intervals using a spatial light modulator. The exposure apparatus includes: an exposure illumination optical system for illuminating the spatial light modulator, the spatial light modulator including a plurality of spatial light modulating devices having reflective surfaces arranged on an array surface; a projection optical system for projecting light from the spatial light modulator onto a substrate to be exposed; a first detection unit for detecting light from the reflective surfaces; a second detection unit for detecting light from the reflective surfaces, and having a wider detection field than the first detection unit; and a position changing mechanism that positions the first and second detection units relative to the spatial light modulator such that the spatial light modulator faces the first detection unit, and the spatial light modulator faces the second detection unit, respectively.

Description

Technical Field

[0001] This invention relates to an exposure apparatus, a measuring device, and a method for manufacturing components. Background Technology

[0002] As a component for forming a pattern to be exposed and transferred, an exposure device is proposed that uses a spatial light modulator such as a digital mirror device that makes the reflectivity of the irradiated light variable in a predetermined direction (Patent Document 1).

[0003] Existing technical documents

[0004] Patent documents

[0005] Patent Document 1: U.S. Patent Application Publication No. 2019 / 0285988 Summary of the Invention

[0006] Based on the first embodiment, the exposure apparatus includes: an exposure illumination optical system for illuminating a spatial light modulator, the spatial light modulator including a plurality of spatial light modulating devices having a reflective surface disposed on an array surface; a projection optical system for projecting light from the spatial light modulator onto a substrate to be exposed; a first detection unit having a first detection optical system for detecting light from the reflective surface; a second detection unit having a second detection optical system for detecting light from the reflective surface, and having a wider detection field of view than the first detection unit; and a position changing mechanism such that the positional relationship between the first detection unit and the second detection unit and the spatial light modulator is one of a first positional relationship in which the spatial light modulator faces the first detection unit and a second positional relationship in which the spatial light modulator faces the second detection unit.

[0007] Based on the second embodiment, the measuring device measures a spatial light modulator, which includes multiple spatial light modulators, each having a reflective surface. The measuring device includes: an illumination system that illuminates light onto an arrangement surface of the reflective surfaces of the multiple spatial light modulators; a detection optical system that forms an image of the arrangement surface based on light from the multiple reflective surfaces; an imaging unit that detects the image of the arrangement surface formed by the detection optical system; and a calculation unit that calculates, based on the amount of light detected by the imaging unit (i.e., the detected light amount), the position information of the reflective surface of the spatial light modulator in the normal direction of the arrangement surface, or position information related to the rotation angle of the reflective surface of the spatial light modulator from the arrangement surface.

[0008] Based on the third form, the measuring device includes: a first detection unit for detecting light from the reflective surface of a spatial light modulator that includes a plurality of spatial light modulators having a reflective surface arranged on an array surface; a second detection unit for detecting light from the reflective surface and having a wider detection field of view than the first detection unit; and a position changing mechanism for making the positional relationship between the first detection unit and the second detection unit and the spatial light modulator one of a first positional relationship in which the spatial light modulator faces the first detection unit and a second positional relationship in which the spatial light modulator faces the second detection unit.

[0009] Based on the fourth form, the measurement method uses a spatial light modulator, which includes multiple spatial light modulators, each having a reflective surface. The measurement method includes: for a first group of spatial light modulators and a second group of spatial light modulators alternately arranged in a first region of an arrangement plane where the reflective surfaces of the multiple spatial light modulators are arranged, setting the reflective surfaces of the first group of spatial light modulators and the second group of spatial light modulators at different positions in the normal direction of the arrangement plane; using a first detection unit, measuring distance information in the normal direction of at least one of the reflective surfaces of the first group and at least one of the reflective surfaces of the second group; and using a camera-type second detection unit, measuring a portion corresponding to the first region. The light intensity of the image is the reference light intensity; based on the measured distance information and the reference light intensity, the correspondence between the distance in the normal direction of the reflecting surfaces of the first group and the second group and the light intensity of the image is calculated; the reflecting surfaces of the spatial light modulators of the third group and the fourth group, which are alternately arranged in the second region different from the first region in the arrangement plane, are set at different positions in the normal direction of the arrangement plane; using the second detection unit, the light intensity of the image corresponding to the second region is measured, i.e., the detected light intensity; based on the detected light intensity and the correspondence, the distance information in the normal direction of the reflecting surfaces of the spatial light modulators of the third group and the fourth group in the second region is calculated.

[0010] Based on the fifth form, the exposure apparatus includes: an exposure illumination optical system for illuminating a spatial light modulator, the spatial light modulator including a plurality of spatial light modulating devices having a reflective surface arranged in an array; a projection optical system for projecting light from the spatial light modulator onto the substrate to be exposed; and a measurement device of the second or third form.

[0011] Based on the sixth type, the component manufacturing method includes: forming a resist on the surface of a substrate; exposing an exposure pattern using an exposure apparatus of the first or fifth type; and forming a circuit pattern based on the exposure pattern. Attached Figure Description

[0012] Figure 1 This is a diagram that schematically illustrates the structure of the measuring device according to the first embodiment.

[0013] picture Figure 2 This is a diagram that roughly represents the structure of a spatial light modulator.

[0014] Figure 3 This is a diagram illustrating an example of the relationship between the designated location sent to the spatial light modulator and the actual set location of the spatial light modulator.

[0015] Figure 4 This is a diagram that roughly illustrates the modulation principle of the amount of light reflected by a spatial light modulator.

[0016] Figure 5 This is an example diagram illustrating the relationship between the amount of light reflected by a spatial light modulator and the height difference of the reflecting surfaces between two groups of spatial light modulators arranged alternately within the spatial light modulator.

[0017] Figure 6 This is a diagram that roughly illustrates the modulation principle of the amount of light reflected by a spatial light modulator of another structure.

[0018] Figure 7 This is a diagram that schematically illustrates the structure of the measuring device according to the second embodiment.

[0019] Figure 8 This is a diagram that schematically illustrates the structure of the exposure apparatus according to the fourth embodiment.

[0020] Figure 9 This is a diagram that schematically illustrates the component manufacturing method of the fifth embodiment.

[0021] [Explanation of Symbols]

[0022] 1, 1a: Measuring device

[0023] 2: Exposure device

[0024] 5: Testing Department

[0025] 5a: Second Inspection Department

[0026] 6: First Testing Department

[0027] 10: Detection optical system

[0028] 10a: Second detection optical system

[0029] 11: Detecting the light source

[0030] 12, 32, 52: Light-transmitting lenses

[0031] 13: Illumination aperture stop

[0032] 14, 54: Branching devices

[0033] 14s, 33s, 34s, 54s: branching surfaces

[0034] 15: Objective lens

[0035] 16: Detection aperture stop

[0036] 16c: Center

[0037] 16o: Opening

[0038] 17, 36: Imaging lenses

[0039] 18: Camera Department

[0040] 19: Camera side

[0041] 20, 20a, 20b, 20r: Spatial light modulator

[0042] 21: Frame

[0043] 22, 22c, 22d: Spatial light modulation devices

[0044] 22a: Spatial light modulators of the first group (spatial light modulators of the third group)

[0045] 22b: Spatial light modulators of Group 2 (spatial light modulators of Group 4)

[0046] 22R, 22Ra, 22Rb, 22Rc, 22Rd: Reflecting surfaces

[0047] 23, 23a, 23b: Opposite electrodes

[0048] 24: Modulation Control Unit

[0049] 25: Control Department (Calculation Department)

[0050] 25a: Second Control Department (Calculation Department)

[0051] 25M, 25Ma: Storage Section

[0052] 25C: Calculation Part

[0053] 27: Position changing mechanism (moving mechanism)

[0054] 28, 28a, 28b: Maintaining section

[0055] 29: Guidance Department

[0056] 30: First detection optical system

[0057] 31: Detecting the light source

[0058] 33: First branch device

[0059] 34: Second branch device

[0060] 35: Objective lens

[0061] 37: Camera Department

[0062] 38: Camera side

[0063] 39: Reference Lens

[0064] 40: Reference Reflector

[0065] 41: Movable support part

[0066] 42: First Control Unit

[0067] 50: Exposure Department

[0068] 51: Exposure light source

[0069] 53: Projection Optical System

[0070] 55: Imaging Optical System

[0071] 56: Projection aperture stop

[0072] 57: Exposed substrate

[0073] 58: Sample Stage

[0074] 59: Platform

[0075] 60: Exposure Control Department (Third Control Department)

[0076] 61: Position Measurement Department

[0077] 62: Ruler board

[0078] A1: First Area

[0079] A2: Second Area

[0080] DLa0: Direct reflection light

[0081] DLa, DLb: Detection light

[0082] DLam: -1st order diffraction light

[0083] DLap: +1st order diffraction light

[0084] DLamm, DLamp, DLapm, DLapp: Diffraction light

[0085] DP: Alignment plane

[0086] DX, DY: Distance

[0087] FI: Proportional Relationship

[0088] FR: Position setting relationship

[0089] H1: Position difference

[0090] H1d: Specifies the position difference

[0091] ILa, ILb: Illuminating light

[0092] NA1, NA2: Numerical aperture

[0093] PDT: Detection Optical Path

[0094] PIL: Illumination optical path

[0095] PIM: Imaging Optical Path

[0096] PRF: Reference Optical Path

[0097] PX: Configuration cycle in the X direction

[0098] PY: Configuration cycle in the Y direction

[0099] RL1, RL2: Correspondence

[0100] RO, RR: Reflected light

[0101] S1, S3, S5, S8, Sa: Control signals

[0102] S2, S4: Image signals

[0103] S6, S7: Information signals

[0104] Sb: Exposure control signal

[0105] Sc: Measurement signal

[0106] Sd: Position control signal

[0107] S100, S101, S102, S103, S104: Steps

[0108] X, Y, Z, -Z: Direction

[0109] θ: Diffraction angle

[0110] υ: Angle / Rotation angle

[0111] 2υ: Angle Detailed Implementation

[0112] (Measuring device according to the first embodiment)

[0113] Figure 1 This is a diagram that schematically illustrates the structure of the measuring device 1 according to the first embodiment. The measuring device 1 of the first embodiment is a device for measuring the operating state of the spatial light modulator 20, and includes... Figure 1 The detection section 5 is represented by a single-dot dashed line.

[0114] exist Figure 1 In the following diagrams, the X, Y, and Z directions indicated by the arrows are orthogonal directions, and each of the X, Y, and Z directions represents the same direction in each diagram. Hereinafter, the directions indicated by each arrow will be referred to as the +X direction, +Y direction, and +Z direction, respectively. Furthermore, the position in the X direction will be called the X position, the position in the Y direction will be called the Y position, and the position in the Z direction will be called the Z position.

[0115] The spatial light modulator 20 is held by a holding part 28, which is movable along the X and Y directions on the guide part 29. Therefore, the spatial light modulator 20 is held relative to the detection part 5 and can move relative to it along the X and Y directions. The holding part 28 and the guide part 29 are also referred to as a moving mechanism 27, either together or separately.

[0116] Figure 2 This is a diagram that schematically represents the structure of a spatial light modulator 20, which is the object of measurement using the measuring device 1. Figure 2 (a) shows a diagram obtained by viewing the spatial light modulator 20 from the -Z direction. Figure 2 (b) indicates Figure 2 The XZ section of the spatial light modulator 20 at the AA cut line in (a).

[0117] On the -Z side of the spatial light modulator 20, a plurality of spatial light modulators 22, each having a reflective surface 22R at its respective -Z side end, are disposed. The plurality of spatial light modulators 22 are configured such that their respective reflective surfaces 22R are substantially aligned with an alignment plane DP, which is an XY plane near the -Z side end of the spatial light modulator 20. As an example, the plurality of spatial light modulators 22 are arranged along the X and Y directions, with an alignment period of PX in the X direction and PY in the Y direction.

[0118] Each spatial light modulator 22 is held in the frame 21 of the spatial light modulator 20 by a retaining member (not shown) with elasticity. A phase-adjusting electrode 23 is disposed on the portion of the frame 21 facing the +Z side of each spatial light modulator 22. When a predetermined voltage as a control signal Sa is applied to the phase-adjusting electrode 23 from the modulation control unit 24, each spatial light modulator 22 moves parallel along the Z direction and is set to a Z position corresponding to the voltage of the control signal Sa applied to the phase-adjusting electrode 23. The modulation control unit 24 sends a control signal Sa to each phase-adjusting electrode 23 based on a control signal S1 supplied from an external source.

[0119] As mentioned above, the alignment plane DP is one of the XY planes, therefore the Z direction is the normal direction relative to the alignment plane DP.

[0120] about Figure 2 The first region A1 and the second region A2, represented by dashed lines in (a), will be described later.

[0121] Figure 3 This diagram illustrates an example of the position setting relationship FR, which is the relationship between the Z-position (specified position, horizontal axis) of the reflective surface 22R specified by control signals S1 and Sa, and the actual Z-position (actual set position, vertical axis) of the reflective surface 22R. The actual set position is the relative position in the Z-direction with respect to the alignment surface DP. If the actual set position is 0 [nm], then the reflective surface 22R becomes a surface aligned with the alignment surface DP.

[0122] The position setting relationship FR deviates from the ideal proportional relationship FI due to manufacturing errors, thermal expansion, and electrical charge of the components constituting the spatial light modulator 20. In a spatial light modulator 20, there are also cases where the position setting relationship FR is different in spatial light modulators 22 with different positions in the arrangement plane DP.

[0123] Reference Figure 1 The structure of the detection unit 5 of the measuring device 1 will be described. The detection unit 5 includes: a detection light source 11, a light-transmitting lens 12, an illumination aperture stop 13, a branching device 14, an objective lens 15, a detection aperture stop 16, an imaging lens 17, an imaging unit 18, and a control unit 25.

[0124] The light-transmitting lens 12, the illumination aperture stop 13, the branching device 14, and the objective lens 15 constitute an illumination system for irradiating the arrangement surface DP of the spatial light modulator 22 that constitutes the spatial light modulator 20.

[0125] Furthermore, the objective lens 15, branching device 14, detection aperture stop 16, and imaging lens 17 included in the portion surrounded by the double-dotted line constitute a detection optical system 10 that forms an image of the array plane DP on the imaging surface 19 of the imaging unit 18, such as a solid-state imaging device.

[0126] The illumination light ILa emitted from the detection light source 11 is substantially parallelized by the light-transmitting lens 12 and its diameter is limited by the illumination aperture stop 13, thus becoming the illumination light ILb. The illumination light ILb is then incident on a branching device 14 such as a beamsplitter, and after being reflected by the branching surface 14s of the branching device 14, it is focused by the objective lens 15. Then, as an illumination beam having a numerical aperture (illumination numerical aperture (NA)) corresponding to the opening diameter of the illumination aperture stop 13, it is irradiated onto the alignment surface DP of the spatial light modulator 20.

[0127] The illumination light ILb passes through multiple reflecting surfaces 22R (refer to) arranged near the alignment surface DP. Figure 2 The light is reflected, and a portion of it becomes the detection light DLa, which is incident on the objective lens 15. The detection light DLa then enters the branching device 14 and is transmitted through the branching surface 14s of the branching device 14, and passes through the detection aperture stop 16, where its diameter is limited, thus becoming the detection light DLb.

[0128] The detection light DLb is focused by the imaging lens 17 and incident on the imaging surface 19 of the imaging unit 18, forming an image of the alignment surface DP on the imaging surface 19. The image of the alignment surface DP is detected by the imaging unit 18, that is, it is converted into an electrical signal through photoelectric conversion, and then sent to the control unit 25 as the image signal S2.

[0129] Hereinafter, the amount of light in each part of the image of the array plane DP detected by the camera pixels constituting the camera unit 18 will also be referred to as "detected light amount".

[0130] The detection light source 11 can be, for example, a semiconductor laser, or a light-emitting diode (LED) with a relatively narrow emission wavelength range. The light-transmitting lens 12, objective lens 15, and imaging lens 17 are not limited to the structure including the number of lenses shown in the figure (two lenses), but can include any number of lenses. Furthermore, they can all include a reflective optical system. The beam splitter 14 is not limited to the aforementioned beam splitter, but can also be a half-mirror including a flat glass plate, etc.

[0131] The control unit 25 sends a control signal S1 to the spatial light modulator 20 to control it so that each spatial light modulator 22 of the spatial light modulator 20 is set to a predetermined Z position during measurement. The control unit 25 calculates the position information of the spatial light modulator 20 based on the image signal S2. Therefore, the control unit 25 can also be referred to as a calculation unit.

[0132] The following is for reference Figure 4 and Figure 5 The principle of measurement of the spatial light modulator 20 based on image signal S2 will be explained.

[0133] Figure 4 This is a diagram that roughly illustrates the principle of modulation of the amount of light of the orthogonally reflected light DLa0 generated by the spatial light modulator 20. Figure 4 (a) and Figure 4 (b) is viewed from the -Z direction. Figure 2 This diagram illustrates an example of the operating state of each of the multiple spatial light modulators 22 disposed in the first region A1 of the spatial light modulator 20 shown in (a). Furthermore, the first region A1 can be any region on the arrangement plane DP of the spatial light modulator 20. Additionally, the number of spatial light modulators 22 included in the first region A1 is not limited to... Figure 2 and Figure 4 The 4×4 shown can also be any other number.

[0134] Figure 4 (c) is viewed from the +Y direction. Figure 4 The spatial light modulator 22 in the first region A1 and the operating state shown in (b) Figure 1 The cross-sectional view obtained through objective lens 15 is shown. Figure 4 In (c), to avoid complicating the figures, the illumination light ILb illuminating the spatial light modulator 20 from the -Z direction is omitted (see Figure 2c). Figure 1 The illustration is shown.

[0135] exist Figure 4 (a) to Figure 4 In (c), the spatial light modulator 22 in which the reflecting surface 22R is arranged approximately in alignment with the alignment surface DP is called the spatial light modulator 22a of the first group. Moreover, the spatial light modulator 22 in which the reflecting surface 22R is arranged away from the alignment surface DP along the +Z direction is called the spatial light modulator 22b of the second group.

[0136] The reflective surface 22R of the spatial light modulator 22a in the first group is labeled with the symbol 22Ra, and the reflective surface 22R of the spatial light modulator 22b in the second group is labeled with the symbol 22Rb. In addition, the spatial light modulator 22a in the first group is marked with a diagonal line extending from the upper left to the lower right, and the spatial light modulator 22b in the second group is marked with a diagonal line extending from the lower left to the upper right to distinguish them.

[0137] The reflective surface 22Ra of the first group of spatial light modulators 22a is set to a designated position 0 (on the alignment surface DP) according to the control signal S1 from the control unit 25 and the control signal Sa from the modulation control unit 24. The reflective surface 22Rb of the second group of spatial light modulators 22b is set to a designated position at a position away from the alignment surface DP along the +Z direction from the designated position difference H1d according to the control signal S1 from the control unit 25 and the control signal Sa from the modulation control unit 24.

[0138] Furthermore, the actual set values ​​of the reflective surface 22Ra of the first group of spatial light modulators 22a and the reflective surface 22Rb of the second group of spatial light modulators 22b are close to their respective designated positions, but they do not necessarily have to be the same as described above.

[0139] The difference between the actual set Z-position of the reflective surface 22Ra of the first group of spatial light modulators 22a and the reflective surface 22Rb of the second group of spatial light modulators 22b is called the position difference H1. The position difference H1 does not necessarily have to be consistent with the specified position difference H1d.

[0140] Furthermore, in Figure 4 In (c), the difference in length between position difference H1 and the specified position difference H1d is extremely small compared to the scale in the figure, and is therefore set to represent the length of the same part.

[0141] exist Figure 4 (a) to Figure 4 In (c), based on the control signal S1 from the control unit 25, a plurality of first-group spatial light modulators 22a and a plurality of second-group spatial light modulators 22b, which have a positional difference H1 in the Z direction, are alternately arranged. Here, "alternate arrangement" means that among the plurality of spatial light modulators 22 arranged along a predetermined direction in the XY plane, the first-group spatial light modulators 22a and the second-group spatial light modulators 22b are arranged in different ways.

[0142] Figure 4(a) shows the operating state of the first group of spatial light modulators 22a and the second group of spatial light modulators 22b, which are arranged alternately along the X and Y directions, in other words, in a black and white checkered pattern.

[0143] Figure 4 (b) shows the operating state in which the spatial light modulators 22a of the first group and the spatial light modulators 22b of the second group are alternately arranged along the X direction, and either the spatial light modulators 22a of the first group or the spatial light modulators 22b of the second group are continuously arranged along the Y direction.

[0144] When illumination light ILb (refer to) is shone onto the reflective surface 22R of each spatial light modulator 22 from approximately the -Z direction... Figure 1 When the reflected light formed by each reflecting surface 22Ra, 22Rb is subjected to a phase difference corresponding to the difference between the actual set position of each reflecting surface 22R at the Z position, i.e., the position difference H1, it is added to the reflected light formed by each reflecting surface 22Ra, 22Rb. Then, based on the phase difference, and the configuration period PX in the X direction and the configuration period PY in the Y direction of the reflecting surface 22R (refer to...), Figure 1 The reflected light is separated into the orthogonal reflected light (described later) and multiple diffracted lights, which are emitted from the alignment plane DP at different emission angles (diffraction angles).

[0145] As mentioned above, Figure 4 (c) indicates that it comes from Figure 4 The diagram shown in (b) illustrates the reflected light of the spatial light modulator 22 in the first region A1 under the operating state. Therefore, the reflected light is separated into positive reflected light DLa0, and diffracted light such as +1st order diffracted light DLap and -1st order diffracted light DLam in the X direction.

[0146] The reflected light DLa0 is emitted in a direction perpendicular to the alignment plane DP (-Z direction). The diffraction angles θ of the +1st order diffracted light DLap and the -1st order diffracted light DLam will be described later.

[0147] Figure 4 (d) is a diagram showing the positions of the positively reflected light DLa0, the +1st order diffracted light DLap, and the -1st order diffracted light DLam in the detection aperture stop 16. In the detection aperture stop 16, an opening 16o with a radius equivalent to the numerical aperture NA2 on the spatial light modulator 20 side of the detection optical system 10 is provided with its center 16c as the center. A shielding part that blocks light is located further outward than the opening 16o.

[0148] about Figure 4 The distances DX and DY shown in (d) will be described later.

[0149] exist Figure 4 (d) also shows the result from Figure 4 The diffracted light generated by the spatial light modulator 22 shown in (a) is described, wherein the spatial light modulators 22a of the first group and the spatial light modulators 22b of the second group, which have different Z positions, are arranged in a black and white grid pattern. Figure 4 The spatial light modulation device 22 shown in (a) generates diffracted light DLapp (X-side order, Y-side order) of (+1st order, +1st order), diffracted light DLapm (X-side order, Y-side order) of (+1st order, -1st order), diffracted light DLamp (X-side order, Y-side order) of (-1st order, +1st order), and diffracted light DLamm (X-side order, Y-side order) of (-1st order, -1st order). Additionally, positively reflected light DLa0 is also generated.

[0150] However, in either case, the first-order diffraction light (DLap, DLam, DLapp, DLapm, DLamp, DLamm) from the spatial light modulator 20 will be blocked by the detection aperture stop 16 and will therefore not reach the camera unit 18.

[0151] On the other hand, the ortho-reflected light DLa0 from the spatial light modulator 20 passes through the opening 16o of the detection aperture stop 16 and the imaging lens 17 to reach the imaging unit 18. Then, an image of the array plane DP is formed on the imaging surface 19 of the imaging unit 18. Therefore, the amount of ortho-reflected light DLa0 from each region, such as the first region A1, on the array plane DP is detected by each imaging pixel included in the imaging unit 18 as the amount of light of the image of each region of the array plane DP, i.e., the detected light amount.

[0152] When the array surface DP is irradiated with illumination light of a specified wavelength, the amount (intensity) of the reflected light DLa0 is determined by the difference between the actual set positions of the spatial light modulators 22a in the first group and the spatial light modulators 22b in the second group, i.e., the position difference H1.

[0153] Figure 5 This is a graph showing the correspondence between the position difference H1 (horizontal axis) of the spatial light modulator 22a in the first group and the spatial light modulator 22b in the second group and the intensity of the positively reflected light DLa0 formed by the spatial light modulator 20 (vertical axis), and the correspondence between RL1 and RL2.

[0154] Figure 5 The horizontal axis is marked with [nm], and the vertical axis is set to have an intensity of 1 when the position difference H1 is 0 [nm].

[0155] The correspondence represented by the solid line RL1 indicates the correspondence when the wavelength of the positively reflected light DLa0 is 546 [nm], which is one example. The correspondence represented by the dashed line RL2 indicates the correspondence when the wavelength of the positively reflected light DLa0 is 193 [nm], which is another example.

[0156] The correspondence RL1 is the relationship represented by the following equation (1) with the wavelength (546 [nm]) of the positively reflected light DLa0 set as λ and the position difference H1.

[0157] RL1={1+cos(4π×H1 / λ)} / 2…(1)

[0158] The correspondence RL2 is the same as that of correspondence RL1.

[0159] The intensity of the positively reflected light DLa0 decreases monotonically with increasing position difference H1, ranging from 0 nm to 1 / 4 of each wavelength. Therefore, the position difference H1 between the first group of spatial light modulators 22a and the second group of spatial light modulators 22b within the first region A1 can be calculated based on the intensity of the positively reflected light DLa0, i.e., the amount of detected light in the image of the first region A1, etc., and based on the correspondence RL1 (RL2).

[0160] Based on the image signal S2 detected by the imaging unit 18 and the corresponding relationship RL1 (or corresponding relationship RL2), the control unit 25 calculates the position difference H1 between the first group of spatial light modulators 22a and the second group of spatial light modulators 22b within the first region A1 and other regions of the spatial light modulator 20. The control unit 25 includes a storage unit 25M such as a solid-state memory or a magnetic memory that pre-stores the corresponding relationship RL1. As described above, the position difference H1 corresponds to the position information of the reflective surface 22R of the spatial light modulator 22 in the normal direction (Z direction) of the alignment plane DP.

[0161] The detection unit 5, including the control unit 25, can perform the measurement multiple times while making the value of the specified position difference H1d different, and calculate the specified position difference H1d for setting the desired position difference H1 based on the calculated multiple position differences H1 and the specified position difference H1d.

[0162] In order to calculate the position difference H1 with higher accuracy, the control unit 25 can also calculate the position difference H1 of the spatial light modulator 22 based on the light quantity of the image of the operating state in the first region A1 and other regions of the spatial light modulator 20 where the position difference H1 is 0 [nm].

[0163] When detecting the reference light quantity, the control unit 25 sends a control signal S1 to the spatial light modulator 20 to control it so that each spatial light modulator 22 is set to the same Z position. Then, similar to the detection of the light quantity, the light quantity distribution of the image of the spatial light modulator 20 array plane DP formed on the imaging surface 19 of the imaging unit 18 is detected as the reference light quantity.

[0164] As an example, the control unit 25 can calculate the position difference H1 of the spatial light modulator 22 based on the value obtained by dividing the detected light quantity in the first region A1 and other regions of the spatial light modulator 20 by the reference light quantity. This can correct for detection errors in the detected light quantity caused by uneven transmittance of the illumination system (12-15) or the detection optical system 10.

[0165] To calculate the position difference H1 with higher accuracy, it is advisable to use regions where the intensity changes significantly with respect to the position difference H1 in correspondences RL1 and RL2. For example, such regions correspond to areas where the intensity value is between 0.8 and 0.2.

[0166] For example, if the spatial light modulator 20, which is to be measured, is required to set the intensity of the positively reflected light DLa0 with a wavelength of 193 [nm] to 0, the spatial light modulator 20 needs to set the position difference H1 to a range of approximately 48 ± 2 [nm] centered on 193 / 4 = 48.25 [nm].

[0167] At this time, if light with a wavelength of 193 nm is also used when detecting the image of the first region A1 of the spatial light modulator 20 using the measuring device 1, then as Figure 5 As shown in the corresponding relationship RL2, the intensity of the positively reflected light DLa0 is approximately 0 relative to its position difference H1. Moreover, the intensity of the positively reflected light DLa0 hardly changes relative to the position difference H1 around 48 [nm]. Therefore, light with a wavelength of 193 [nm] is not suitable for accurately measuring the value of the position difference H1 around 48 [nm].

[0168] On the other hand, if light with a wavelength of 546 nm is used when detecting the image of the first region A1 of the spatial light modulator 20 using the measuring device 1, then as Figure 5 As shown in the corresponding relationship RL2, the intensity of the positively reflected light DLa0 at a position difference H1 of 48 [nm] is about 0.7. Moreover, the intensity of the positively reflected light DLa0 also varies significantly with the position difference H1 around 48 [nm].

[0169] Therefore, when measuring the operation of the spatial light modulator 20, which is required to set the intensity of the positively reflected light DLa0 with a wavelength of 193 [nm] to 0, it is advisable to use light with a wavelength of 546 [nm] as illumination light ILa and illumination light ILb.

[0170] Furthermore, more generally, when measuring the operation of the spatial light modulator 20 where the intensity of the orthogonally reflected light DLa0 at wavelength λ1 is required to be 0, it is preferable to use light with a wavelength λ2 that is 1.5 times or more and 3.3 times or less than wavelength λ1 as illumination light ILa and illumination light ILb. In this case, with a position difference H1 where the intensity of the orthogonally reflected light DLa0 at wavelength λ1 is set to 0, the intensity of the orthogonally reflected light DLa0 at wavelength λ2 can be set to a range of 0.2 to 0.8, allowing for more precise measurement of the value of the position difference H1.

[0171] As described above, in order to achieve high-precision measurement of the position difference H1, it is advisable to prevent the first-order diffracted light from the spatial light modulator 20 from incident on the detector 18. Therefore, in the following, refer again... Figure 4 (a) to Figure 4 (d) will explain the numerical aperture NA2 of the detection optical system 10.

[0172] As mentioned above, from Figure 4 The spatial light modulator 22 in the first region A1 of the operating state shown in (b) generates positively reflected light DLa0, and diffracted light including +1st order diffracted light DLap and -1st order diffracted light DLam directed towards the X direction. The +1st order diffracted light DLap is emitted along a direction inclined at a diffraction angle θ from the -Z direction towards the +X direction. Here, the diffraction angle θ is the angle that satisfies the relationship sin(θ)=λ / (2×PX) when the wavelength of the illumination light ILb is set to λ. Moreover, the -1st order diffracted light DLam is emitted along a direction inclined at a diffraction angle θ from the -Z direction towards the -X direction.

[0173] Furthermore, the illumination light ILb illuminating the alignment plane DP has a defined illumination NA as described above. Therefore, the positively reflected light DLa0, the +1st order diffracted light DLap, and the -1st order diffracted light DLam are also emitted along directions that extend within a defined angular range centered on each of the aforementioned directions.

[0174] As mentioned above, Figure 4 (d) is a diagram showing the positions of the positively reflected light DLa0, the +1st order diffracted light DLap, and the -1st order diffracted light DLam in the detection aperture stop 16. Since the detection aperture stop 16 is positioned on the pupil plane of the objective lens 15, therefore... Figure 4The positions in the X and Y directions of (d) correspond to the sine of the emission angle of the light emitted from the spatial light modulator 20. Specifically, the distance from the center 16c to each point on the detection aperture stop 16 is, for example, the length obtained by multiplying the sine of the emission angle of the light emitted from the spatial light modulator 20 to each point by the focal length of the objective lens 15.

[0175] The center positions of the +1st order diffracted beam DLap and the -1st order diffracted beam DLam in the detection aperture stop 16 are respectively located at a distance DX from the center 16c along the +X and -X directions. Here, the distance DX is the distance equivalent to the sine of the diffraction angle θ, i.e., sin(θ) = λ / (2×PX).

[0176] Therefore, if the numerical aperture NA2 of the spatial light modulator 20 side of the detection optical system 10, i.e. the radius NA2 of the opening 16o, is less than λ / (2×PX), then the +1st order diffraction light DLap and the -1st order diffraction light DLam will be blocked by the detection aperture stop 16 and will not reach the imaging unit 18.

[0177] Figure 4 The center positions of the primary diffracted beams (DLap, DLam, DLapp, DLapm, DLamp, DLamm) shown in (d) are respectively located at distances DX along the ±X direction and distances DY along the ±Y direction from the center 16c of the detection aperture stop 16. Here, the distance DX is equivalent to sin(θ) = λ / (2×PX) as described above, and the distance DY is equivalent to sin(θ) = λ / (2×PY) relative to the arrangement period PY in the Y direction of the reflecting surface 22R.

[0178] Therefore, if the numerical aperture on the spatial light modulator 20 side of the detection optical system 10 is smaller than The diffracted light (DLapp, DLapm, DLamp, DLamm) is blocked by the detection aperture stop 16 and cannot reach the camera part 18.

[0179] When the average of the arrangement period PX in the X direction and the arrangement period PY in the Y direction of the reflective surface 22R is set to P, the numerical aperture of the spatial light modulator 20 side of the detection optical system 10 should be set to approximately smaller than P. Therefore, similarly to the above, the diffracted light (DLapp, DLapm, DLamp, DLamm) can be blocked by the detection aperture stop 16. The arrangement period PX in the X direction of the reflecting surface 22R can also be equal to the arrangement period PY in the Y direction.

[0180] Furthermore, as described above, by utilizing the illumination NA of the illumination light ILb, each diffracted light (DLap, DLam, DLapp, DLapm, DLamp, DLamm) also expands the angular range of the illumination NA of the illumination light ILb. Therefore, the numerical aperture (NA2) of the radius NA2 of the opening 16o on the spatial light modulator 20 side of the detection optical system 10 can also be set to be smaller than the value obtained by further subtracting the illumination NA from the aforementioned values.

[0181] However, if the numerical aperture NA2 on the spatial light modulator 20 side of the detection optical system 10 is too small, the image resolution of the detection optical system will be reduced, making it difficult to accurately separate and detect the image of the first region A1 of the arrangement plane DP of the spatial light modulator 20 from the image of the region outside the first region A1. Therefore, the numerical aperture NA2 on the spatial light modulator 20 side of the detection optical system 10 should preferably be set to a value larger than that determined by λ / (5×P) relative to the wavelength λ of the illumination light ILb and the arrangement period P of the spatial light modulator 22.

[0182] In summary, when the configuration period of the spatial light modulator 22 is set to P and the wavelength of the light to be detected by the detection optical system 10 is set to λ, the numerical aperture NA2 of the spatial light modulator 20 side of the detection optical system 10 should satisfy the following relationship (2).

[0183]

[0184] The wider the field of view of the detection unit 5 included in the measuring device 1, the more spatial light modulators 22 can be measured in a single measurement, thus shortening the measurement time. Therefore, a wider field of view of the detection unit 5 is preferred. However, it is not easy to expand the field of view of the detection unit 5 while maintaining the specified resolution required for measuring the operation of the spatial light modulators 22, that is, while keeping the numerical aperture NA2 on the spatial light modulator 20 side of the detection optical system 10 at or above a specified value.

[0185] Therefore, in the measuring device 1 of the first embodiment, as an example, the product of the outer diameter D [mm] of the field of view of the detection unit 5 on the spatial light modulator 20, that is, the field of view of the detection optical system 10, and the numerical aperture NA2 on the spatial light modulator 20 side of the detection optical system 10 is 0.5 or more.

[0186] Here, the so-called detection field of view refers to the range of the spatial light modulator 20 that captures an image through the imaging surface 19 of the imaging unit 18, and is equivalent to reducing (or enlarging) the range of the imaging surface 19 by the absolute value of the imaging magnification (lateral magnification) of the detection optical system 10.

[0187] In addition, the outer diameter of the detection field of view refers to the maximum length of the length from any end of the detection field of view to the other end.

[0188] Furthermore, when the detection field of the detection unit 5 is narrower than the arrangement plane DP of the spatial light modulator 20 with the spatial light modulator 22, the entire surface of the arrangement plane DP can be measured using the moving mechanism 27. That is, the detection unit 5 can be used to perform multiple measurements while moving the relative position of the spatial light modulator 20 and the detection optical system 10 using the moving mechanism 27, thereby measuring the entire surface of the arrangement plane DP.

[0189] In the above description, it is assumed that the measuring device 1 measures a spatial light modulator 20 having multiple spatial light modulating devices 22 that can move along the Z direction. However, the object measured by the measuring device 1 can also be an angle-modulated spatial light modulator 20r, such as... Figure 6 As shown, it has multiple spatial light modulation devices 22, each of which can rotate within a specified angular range.

[0190] Figure 6 A portion of the spatial light modulator 20r, which is an angle-modulated type observed from the +Y direction, and Figure 1 The cross-sectional view obtained by objective lens 15 is shown, and is consistent with the description. Figure 4 The same diagram as (c). Therefore, refer to it below as well. Figure 1 to Figure 4 The symbols shown in each figure will be explained. Furthermore, in Figure 6 In, with Figure 4 Similarly, to avoid complicating the accompanying drawings, the illumination light ILb directed towards the spatial light modulator 20r from the -Z direction is omitted (see Figure 1). Figure 1 The illustration is shown.

[0191] Each spatial light modulator 22 is held in the frame 21 of the spatial light modulator 20 by a holding member (not shown), which is rotatable within a predetermined angle range about the Y-axis. In the frame 21 of the spatial light modulator 20r, in the portion facing each spatial light modulator 22 towards the +Z side, opposing electrodes 23a and 23b are respectively disposed. When the modulation control unit 24 (not shown) (see reference)... Figure 1 When a predetermined voltage is applied to the opposing electrodes 23a and 23b respectively, each spatial light modulation device 22 is set to an angular position that has been rotated by a predetermined angle corresponding to the voltage applied to the opposing electrodes 23a and 23b.

[0192] A reflective surface 22R is formed on the -Z side of each spatial light modulator 22.

[0193] existFigure 6 In the operating state shown, by applying voltages to the opposing electrodes 23a and 23b, the reflecting surfaces 22Rc of a portion of the spatial light modulators 22c are arranged parallel to the arrangement plane DP. On the other hand, a portion of the spatial light modulators 22d are configured such that their reflecting surfaces 22Rd have rotated by an angle υ from the arrangement plane DP with the Y direction as the rotation center.

[0194] Illumination light illuminating the spatial light modulator 22c (refer to) Figure 1 The light is reflected approximately in the -Z direction by the reflecting surface 22Rc, which is parallel to the alignment plane DP, and enters the objective lens 15 as reflected light RR. Then, it passes through the opening 16o of the detection aperture stop 16 and through the imaging lens 17 to reach the imaging unit 18 (see reference 17). Figure 1 An image of the spatial light modulation device 22c is formed on the imaging surface 19.

[0195] On the other hand, the illumination light illuminating the spatial light modulator 22d, which has been rotated by an angle υ, is reflected by the reflective surface 22Rc in a direction approximately 2φ away from the -Z direction towards the -X direction, and is incident on the objective lens 15 as reflected light RO. Moreover, at least a portion of it is blocked by the detection aperture stop 16.

[0196] Furthermore, as described above, since the illumination light ILb illuminating the array surface DP has a defined illumination NA, the reflected light RR and reflected light RO are also emitted in directions that extend a defined angular range from the stated direction.

[0197] Therefore, on the imaging surface 19 of the imaging unit 18, the intensity of the image corresponding to the portion of the spatial light modulator 22d having a reflective surface 22Rd that has rotated relative to the alignment surface DP decreases accordingly with the rotation angle of the reflective surface 22Rd from the alignment surface DP.

[0198] That is, there is a predetermined correspondence between the rotation angle φ of the reflective surface 22Rd of each region of the alignment surface DP from the alignment surface DP and the amount of light detected as an image of each region of the alignment surface DP by each imaging pixel included in the imaging unit 18.

[0199] Therefore, the control unit 25 of the measuring device 1 can also calculate the position information related to the rotation angle of the reflective surface 22Rd from the arrangement surface DP based on the amount of detected light of the image formed on the imaging surface 19 and detected by the imaging unit 18.

[0200] Furthermore, the rotation axis of each spatial light modulation device 22 is not limited to an axis parallel to the Y direction, but can also be a rotation axis parallel to any direction intersecting the Z axis.

[0201] In addition, during measurement, the reflective surface 22R of the spatial light modulator 22 within the specified area to be measured can also be configured to rotate all of them from the arrangement surface DP by the same angle.

[0202] Furthermore, in the measuring device of the first embodiment, the moving mechanism 27 is configured to move the spatial light modulator 20 relative to the fixed detection unit 5, but the moving mechanism 27 may also move the detection unit 5 relative to the fixed spatial light modulator 20.

[0203] That is, the moving mechanism 27 can be any moving mechanism that moves the relative position of the detection unit 5, including the detection optical system 10, relative to the spatial light modulator 20 in the in-plane direction of the arrangement plane DP.

[0204] (Effects of the measuring device in the first embodiment)

[0205] (1) The measuring device of the first embodiment is a measuring device 1 for measuring a spatial light modulator 20, the spatial light modulator 20 including a plurality of spatial light modulators 22 each having a reflective surface 22R, the measuring device 1 including: an illumination system (12-15) for illuminating light onto an arrangement surface DP of the plurality of spatial light modulators 22 having each reflective surface 22R; and a detection optical system 10 for forming an image of the arrangement surface DP based on the light from the plurality of reflective surfaces 22R. It also includes: an imaging unit 18 for detecting the image of the arrangement surface DP formed by the detection optical system 10; and a control unit 25 for calculating, based on the amount of light detected by the imaging unit 18, i.e., the detection light amount, the position information of the reflective surface 22R of the spatial light modulator 22 in the normal direction (Z direction) of the arrangement surface DP, or the position information related to the rotation angle of the reflective surface 22R of the spatial light modulator 22 from the arrangement surface DP.

[0206] Based on the structure described, the operating status of the spatial light modulation device 22 included in the spatial light modulator 20 can be accurately measured.

[0207] (Measuring device according to the second embodiment)

[0208] The measuring device 1a according to the second embodiment will be described below. In the following description, parts of the measuring device 1a of the second embodiment that are identical in structure to those of the measuring device 1 of the first embodiment will be labeled with the same symbols, and descriptions will be omitted as appropriate. The structures of the spatial light modulator 20, spatial light modulator 22, and reflective surface 22R referred to in the following description will also be described as described above. Figure 2 , Figure 4 and Figure 6 As explained.

[0209] Figure 7This is a schematic diagram illustrating the structure of the measuring device 1a according to the second embodiment. Like the measuring device 1 of the first embodiment, the measuring device 1a of the second embodiment is a device for measuring the operating state of the spatial light modulator 20. The measuring device 1a of the second embodiment includes a first detection unit 6 and a second detection unit 5a, which detect the image of the alignment plane DP of the spatial light modulator 20 based on light from the reflecting surface of the spatial light modulator 20. The second detection unit 5a has a wider detection field of view than the first detection unit 6.

[0210] The measuring device 1a of the second embodiment, like the measuring device 1 of the first embodiment, has a moving mechanism 27. The spatial light modulator 20 is held by a holding portion 28 constituting the moving mechanism 27, and the holding portion 28 can move along the guide portion 29 in the X direction (or further in the Y direction). The moving mechanism 27 in the second embodiment switches the positional relationship between the first detection unit 6 and the second detection unit 5a and the spatial light modulator 20 to either a first positional relationship in which the spatial light modulator 20 faces the first detection unit 6 and a second positional relationship in which the spatial light modulator 20 faces the second detection unit 5a. Therefore, the moving mechanism 27 will also be referred to as the position changing mechanism 27 below.

[0211] The first testing unit 6 includes: Figure 7 The detection light source 31, light-transmitting lens 32, first branch device 33, second branch device 34, objective lens 35, imaging lens 36, reference lens 39, reference reflecting surface 40, movable support part 41, camera part 37 and first control part 42 are located within the area surrounded by a single dotted line.

[0212] As an example, the second detection unit 5a has the same detection unit 5 included in the measuring device 1 of the first embodiment (see reference 5). Figure 1 The second detection unit 5a has the same structure as the detection optical system 10a and control unit 25a of the detection unit 5. Furthermore, in Figure 7 In the diagram, the components constituting the second detection unit 5a are omitted except for the second detection optical system 10a and the second control unit 25a.

[0213] Similar to the control unit 25 included in the measuring device 1 of the first embodiment, the second control unit 25a of the second detection unit 5a calculates the position information of the reflecting surface 22R of the spatial light modulator 22 based on the amount of detected light obtained from the image of the detection array DP. Therefore, the second control unit 25a can also be referred to as the calculation unit.

[0214] In the first detection unit 6, the light-transmitting lens 32, the first branch device 33, the second branch device 34 and the objective lens 35 constitute a first illumination system, which illuminates the arrangement surface DP of the spatial light modulator 22 constituting the spatial light modulator 20.

[0215] Furthermore, the objective lens 35, the second branch device 34, the first branch device 33, and the imaging lens 36 included in the portion surrounded by the double-dotted line constitute a first detection optical system 30 that forms an image of the arrangement plane DP on the imaging surface 38 of the imaging unit 37, such as a solid-state imaging device.

[0216] The illumination light emitted from the detection light source 31 passes through the illumination optical path PIL and is approximately parallelized by the light-transmitting lens 32, and then enters the first branch device 33. After being reflected by the branching surface 33s of the first branch device 33, it enters the second branch device 34. Then, the illumination light is amplitude-divided by the branching surface 34s of the second branch device 34 into light that passes through the transmission branching surface 34s and the detection optical path PDT (detection light), and light that is reflected by the branching surface 34s and passes through the reference optical path PRF (reference light).

[0217] The detection light passing through the detection optical path PDT is focused by the objective lens 35 and illuminates the alignment surface DP of the spatial light modulator 20. Then, the detection light is reflected by the alignment surface DP, passes through the objective lens 35 and the detection optical path PDT again, and arrives at the second branch device 34.

[0218] The reference light passing through the reference optical path PRF is focused by the reference lens 39 and illuminates the reference reflecting surface 40. Then, the reference light is reflected by the reference reflecting surface 40, passes through the reference lens 39 and the reference optical path PRF again, and arrives at the second branch device 34.

[0219] The detection light transmitted through the branch surface 34s of the second branch device 34 and the reference light reflected by the branch surface 34s of the second branch device 34 are combined into one light and pass through the imaging optical path PIM. The light is focused by the imaging lens 36 and incident on the imaging surface 38 of the imaging unit 37.

[0220] That is, the components constituting the first detection unit 6, including the second branch device 34, objective lens 35, imaging lens 36, reference lens 39, reference reflecting surface 40, and movable support 41, constitute a so-called interference microscope unit. Therefore, when the difference in optical path length between the detection optical path PDT and the reference optical path PRF is less than or equal to the coherence length of the illumination light emitted from the detection light source 31, an image (interference image) is formed by the interference of the image of the alignment surface DP formed on the imaging surface 38 with the image of the reference reflecting surface 40 in amplitude. The interference image of the alignment surface DP and the reference reflecting surface 40 is detected by the imaging unit 37, that is, converted into an electrical signal by photoelectric conversion, and sent to the first control unit 42 as the image signal S4.

[0221] The position (X position) of the reference reflecting surface 40 in the ±X direction, which serves as the travel direction of the reference optical path PRF, is movable by the movable support 41 that holds the reference reflecting surface 40. As the reference reflecting surface 40 moves in the X direction, the optical path length of the reference optical path PRF changes, thus changing the intensity of the interference image between the alignment plane DP and the reference reflecting surface 40. A control signal S5 is sent to the movable support 41, and while changing the X position of the reference reflecting surface 40, signal processing is performed on the image signal S4 detected by the imaging unit 37. The first control unit 42 sends the control signal S5 to the movable support 41, and while changing the X position of the reference reflecting surface 40, signal processing is performed on the image signal S4 detected by the imaging unit 37.

[0222] The first control unit 42 measures the Z position of the reflecting surface 22R based on the intensity change of the interference image of the image of the reflecting surface 22R of a spatial light modulator 22 disposed on the alignment plane DP and the image of the reference reflecting surface 40, as well as the X position of the reference reflecting surface 40.

[0223] The interference microscope unit (34-36, 39-41) and the first control unit 42 function as a position measurement unit for measuring the position information of the reflective surface 22R of the spatial light modulation device 22 in the Z direction.

[0224] Furthermore, the structure of the position measurement unit is not limited to the structure of the interference microscope units (34-36, 39-41). For example, instead of moving the reference reflecting surface 40 in the X direction via the movable support 41, the entire first detection unit 6 can be moved in the Z direction, thereby changing the optical path length of the detection optical path PDT. Alternatively, a conjugate surface relative to the alignment surface DP can be formed within the first detection optical system 30, and a Nipkow disc (Nipkow filter) can be arranged on the conjugate surface, thereby enabling the first detection optical system 30 to function as a position measurement unit.

[0225] Since the first detection unit 6 measures the Z position of the reflective surface 22R of each spatial light modulator 22, its resolution can be set to be high. Therefore, the numerical aperture NA1 of the spatial light modulator 20 side of the first detection optical system 30 can also be set to be greater than the numerical aperture NA2 of the spatial light modulator 20 side of the second detection optical system of the second detection unit 5a.

[0226] As an example, the detection light source 31 can also be an LED. Alternatively, if the structure using the Nepokoff disk is employed, the detection light source 31 can also be a laser light source. The light-transmitting lens 32, objective lens 35, and imaging lens 36 are not limited to a structure including the number of lenses shown in the figure (two lenses), but can include any number of lenses. Furthermore, they can all include a reflective optical system. Similar to the branching device 14 in the first embodiment, the first branching device 33 and the second branching device 34 are composed of a beam splitter, or a semi-reflective mirror including a flat glass plate, etc.

[0227] Before measurement, the first control unit 42 sends a control signal S3 to the spatial light modulator 20 to set the position of the reflective surface 22R of the spatial light modulator 22, which is the object of measurement, to a predetermined position. The control signal S3 is the same control signal as the control signal S1 sent from the control unit 25 of the detection unit 5 to the spatial light modulator 20 in the measuring device 1 of the first embodiment.

[0228] Therefore, the first detection unit 6, including the first control unit 42, can detect the difference between the designated position of the reflective surface 22R of the spatial light modulation device 22 and the measured position of the reflective surface 22R, that is, the actual set position of the reflective surface 22R, as the detection result.

[0229] The first detection unit 6, including the first control unit 42, can also use the control signal S3 to set the specified reflective surface 22R at multiple different designated positions, and detect the actual set position of each reflective surface 22R. Therefore, the first control unit 42 can also detect... Figure 3 The position setting relationship FR shown is used as the detection result.

[0230] The first detection unit 6 can detect the position setting relationship FR over the entire range of the designated position of the spatial light modulator 22, or it can detect the position setting relationship FR only for a part of the designated position of the spatial light modulator 22.

[0231] The first control unit 42 in the first detection unit 6 may also send the detection results such as the position setting relationship FR as information signal S6 to the second control unit 25a in the second detection unit 5a. The second control unit 25a in the second detection unit 5a may also use the detection results such as the position setting relationship FR to calculate the position difference H1.

[0232] Specifically, in the second detection unit 5a, which has the same structure as the detection unit 5, the designated position of the reflective surface 22R of the spatial light modulation device 22 specified during measurement can also be a position that has been corrected based on the detection results such as the position setting relationship FR received from the first detection unit 6.

[0233] (Effects of the measuring device in the second embodiment)

[0234] (2) The measuring device 1a of the second embodiment includes: a first detection unit 6, which detects light from the reflective surface 22R for a spatial light modulator 20 including a plurality of spatial light modulators 22 having a reflective surface 22R disposed on the alignment surface DP; and a second detection unit 5a, which is a detection unit for detecting light from the reflective surface 22R, and has a wider detection field of view than the first detection unit 6. Furthermore, it also includes a position changing mechanism 27, which makes the positional relationship between the first detection unit 6 and the second detection unit 5a and the spatial light modulator 20 one of a first positional relationship in which the spatial light modulator 20 faces the first detection unit 6, and a second positional relationship in which the spatial light modulator 20 faces the second detection unit 5a.

[0235] According to the structure, the first detection unit 6 can be used to measure the spatial light modulator 22 within a relatively narrow range of the arrangement plane DP of the spatial light modulator 22 with high precision, and the second detection unit 5a can be used to measure multiple spatial light modulators 22 within a relatively wide range in batches and at high speed.

[0236] However, if there are manufacturing errors in the spatial light modulator 20, the relationship between the intensity of the orthogonally reflected light DLa0 from a specified region of the alignment plane DP and the position difference H1 of the spatial light modulator 22, i.e. Figure 5 The correspondence RL1 shown may sometimes deviate from the relationship represented by equation (1). In such cases, errors may occur in the measured value of the position difference H1 of the spatial light modulation device 22 obtained by the second detection unit 5a.

[0237] In the measuring device 1a of the second embodiment, as described above, the Z position (actual set position) of the reflective surface 22R of the spatial light modulator 22 within the arrangement plane DP of the spatial light modulator 22 can be measured (detected) with high precision using the first detection unit 6. Thus, as explained below, using the first detection unit 6 and the second detection unit 5a, the actual correspondence RL1 between the intensity of the positively reflected light DLa0 and the position difference H1 of the spatial light modulator 22 can be accurately measured.

[0238] (Measurement method of the third embodiment)

[0239] The measurement method of the third embodiment will now be described. The measurement method of the third embodiment is a measurement method using the measuring device 1a of the second embodiment. Furthermore, the following description also includes a description of the measuring device 1a of the second embodiment.

[0240] When measuring the correspondence RL1, the measuring device 1a first uses the position changing mechanism 27 to adjust the first region A1 (referring to the first region A1, which is an arbitrary region in the alignment plane DP of the spatial light modulator 20) to be a region of the spatial light modulator 20. Figure 2 (a) is arranged opposite to the first detection unit 6.

[0241] In the stated state, the first control unit 42 of the first detection unit 6 sends a control signal S3 to the spatial light modulator 20, so as to... Figure 4 (a) or Figure 4 The Z position of the spatial light modulator 22 disposed in the first region A1 is set as shown in (b). That is, the Z positions of the reflective surfaces 22Ra of the first group of spatial light modulators 22a and the reflective surfaces 22Rb of the second group of spatial light modulators 22b disposed alternately in the first region A1 are set to a specified position difference H1d (refer to...). Figure 4 (c)).

[0242] The first detection unit 6 measures the actual set position of at least one of the reflective surfaces 22Ra of the first group of spatial light modulators 22a and the actual set position of at least one of the reflective surfaces 22Rb of the second group of spatial light modulators 22b in the stated state. Then, the first control unit 42 detects the position difference H1, which is the difference between the two measured actual set positions. The position difference H1 is the distance information in the Z direction between the reflective surfaces 22Ra and 22Rb.

[0243] The first control unit 42 of the first detection unit 6 sends the detection results, including the specified position of the reflective surface 22Ra and the reflective surface 22Rb and the measured actual set position, or the specified position difference H1d between the reflective surface 22Ra and the reflective surface 22Rb and the measured position difference H1, as an information signal S6 to the second control unit 25a in the second detection unit 5a.

[0244] Subsequently, the measuring device 1a uses the position changing mechanism 27 to align the first region A1 in the alignment surface DP of the spatial light modulator 20 with the second detection unit 5a. Figure 7 The spatial light modulator 20a, indicated by the dashed line, shows the operating state when the spatial light modulator 20 and the second detection unit 5a are arranged facing each other, and the holding unit 28a, indicated by the dashed line, represents the holding unit 28 at this time.

[0245] In this state, the second control unit 25a of the second detection unit 5a sends a control signal S1, which is the same as the control signal S3 sent by the first control unit 42 of the first detection unit 6 described above, to the spatial light modulator 20. Thus, the reflective surfaces 22Ra of the first group of spatial light modulators 22a and 22Rb of the second group of spatial light modulators 22b, alternately arranged in the first region A1, are similarly set at positions differing by a predetermined positional difference H1d in the Z direction when facing the first detection unit 6. The positional difference H1 between the reflective surfaces 22Ra and 22Rb at this time is known by the detection result sent as an information signal S6 from the first control unit 42 of the first detection unit 6.

[0246] The second detection unit 5a detects the intensity of the positively reflected light DLa0 from the first region A1 in the stated state, i.e., the light formed on the imaging surface 19 (refer to...). Figure 1 The amount of light detected in the image of the first region A1 on the image.

[0247] Then, the calculation unit 25C of the second control unit 25a, which is located in the second detection unit 5a, calculates the correspondence RL1 based on the position difference H1 of the spatial light modulator 22 detected by the first detection unit 6 and the intensity of the orthogonal reflected light DLa0 detected by the second detection unit 5a, i.e., the detected light quantity. The second control unit 25a stores the calculated correspondence RL1 in the storage unit 25Ma.

[0248] As an example, the correspondence RL1 can be determined by optimizing the value of the correction coefficient α or correction coefficient β of equation (3), which is derived from equation (1).

[0249] RL1=α+β×{1+cos(4π×H1 / λ)} / 2…(3)

[0250] That is, the correction coefficient α or correction coefficient β of equation (3) is determined such that the value of RL1 on the left side of equation (3) or equation (4) calculated using the position difference H1 is consistent with the value of the detected light quantity, thereby determining the correspondence based on the detection results. At this time, the correction coefficient β can be set to 1 when the correction coefficient α is a value other than 0, and the correction coefficient α can also be set to 0 when the correction coefficient β is a value other than 1.

[0251] Furthermore, the correspondence RL1 can also be calculated based on multiple sets of position differences H1 and reference light intensity values. That is, the reflective surfaces 22Ra and 22Rb can be set at Z positions with different specified position differences H1d to perform the aforementioned measurements multiple times, and the correction coefficients α and β of equation (3) can be determined based on the obtained multiple sets of position differences H1 and reference light intensity values. When determining the correction coefficients α and β, optimization methods such as the least squares method can be used, for example.

[0252] In addition, when the corresponding relationship RL1 is calculated based on the values ​​of multiple position differences H1 and reference light intensity, the above equation (3) can be omitted and other arbitrary functions such as power series can be used.

[0253] The correspondence RL1 calculated above can also be applied to spatial light modulators 22 arranged in regions other than the first region A1 of the arrangement plane DP of the spatial light modulator 20. Furthermore, using the correspondence RL1, measurements can be taken of spatial light modulators 22 arranged outside the first region A1, for example... Figure 2 The position difference H1 of the spatial light modulation device 22 in any region such as the second region A2 shown in (a).

[0254] For this purpose, the measuring device 1a uses a position changing mechanism 27 to arrange the second region A2 in the arrangement surface DP of the spatial light modulator 20 facing the second detection unit 5a.

[0255] Then, the second control unit 25a of the second detection unit 5a sends a control signal S1 to the spatial light modulator 20, causing each spatial light modulator 22 in the second region A2 to be arranged in the same configuration as described above, spaced apart by a specified position difference H1d in the Z direction. That is, the multiple spatial light modulators 22 in the second region A2 are arranged with... Figure 4 (a) or Figure 4 The configuration within the first region A1 shown in (b) is configured in the same way.

[0256] In the second region A2, it will be equivalent to Figure 4 (a) or Figure 4 The spatial light modulator 22 of the first group shown in (b) is referred to as the spatial light modulator 22 of the third group. In addition, in the second region A2, the spatial light modulator 22 corresponding to the spatial light modulator 22b of the second group is referred to as the spatial light modulator of the fourth group.

[0257] The reflective surface 22R of the spatial light modulator in the third group and the reflective surface 22R of the spatial light modulator in the fourth group are arranged at a specified position difference H1d in the Z direction.

[0258] Furthermore, regarding the spatial light modulator 22 in the second region A2, since the position setting relationship FR was not measured using the first detection unit 6, the actual position difference H1 between the reflective surface 22R of the third group of spatial light modulators and the reflective surface 22R of the fourth group of spatial light modulators is not accurately known.

[0259] The second detection unit 5a detects the intensity of the positively reflected light DLa0 from the second region A2 in the stated state, i.e., the intensity of the image sensor 19 (refer to...). Figure 1The amount of light detected on the image formed on the second region A2.

[0260] The second control unit 25a of the second detection unit 5a measures the position difference H1 of the distance information in the Z direction between the reflective surface 22R of the spatial light modulator in the third group and the reflective surface 22R of the spatial light modulator in the fourth group, based on the detected amount of light and the corresponding relationship RL1 calculated above.

[0261] The second detection unit 5a, including the second control unit 25a, can also perform the measurement multiple times while making the value of the specified position difference H1d different. Then, based on the relationship between the measured and calculated multiple position differences H1 and the specified position difference H1d, the specified position difference H1d used to set the desired position difference H1, i.e., the desired specified position difference, can be calculated.

[0262] As described above, the second detection unit 5a has a wider detection field of view than the first detection unit 6. When both the first region A1 and the second region A2 are within the detection field of view of the second detection unit 5a, after measuring the first region A1 using the second detection unit 5a, the second region A2 can be measured without moving the spatial light modulator 20 using the position changing mechanism 27. This reduces the measurement time. Furthermore, by simultaneously measuring the wide second region A2, the measurement time can be further reduced.

[0263] (Effects of the measurement method in the third embodiment)

[0264] (3) The measurement method of the third embodiment is a measurement method using a spatial light modulator 20, which includes a plurality of spatial light modulators 22 each having a reflective surface 22R. The measurement method includes: for a first group of spatial light modulators 22a and a second group of spatial light modulators 22b alternately arranged in a first region A1 of an arrangement plane DP in which the reflective surfaces 22R of the first group of spatial light modulators 22a and the reflective surfaces 22Rb of the second group of spatial light modulators 22b are set at different positions in the normal direction (X direction) of the arrangement plane DP; and using a first detection unit 6, measuring the distance information in the normal direction of at least one of the reflective surfaces 22Ra of the first group and at least one of the reflective surfaces 22Rb of the second group. Furthermore, the method includes: using a camera-type second detection unit 5a to measure the light intensity of the image corresponding to a portion of the first region A1, i.e., the reference light intensity; and calculating, based on the measured distance information and the reference light intensity, the correspondence RL1 between the distance in the normal direction of the first group of reflecting surfaces 22Ra and the second group of reflecting surfaces 22Rb and the light intensity of the image. The measurement method further includes: setting the reflecting surfaces 22R of the third group of spatial light modulators (22a) and the reflecting surfaces 22R of the fourth group of spatial light modulators (22b), which are alternately arranged in the second region A2 (different from the first region A1) in the arrangement plane DP, at different positions in the normal direction of the arrangement plane DP; using the second detection unit 5a to measure the light intensity of the image corresponding to a portion of the second region A2, i.e., the detected light intensity; and calculating, based on the detected light intensity and the correspondence RL1, the distance information in the normal direction of the reflecting surfaces 22R of the third group of spatial light modulators (22a) and the fourth group of spatial light modulators (22b) in the second region A2.

[0265] Although the measurement of the correspondence RL1 using the first detection unit 6 takes a relatively long time, in the above structure, the correspondence RL1 is measured for the first region A1 within the arrangement plane DP, so that the correspondence RL1 can be used to measure other regions (second region A2) when the second detection unit 5a is used, thus shortening the measurement time.

[0266] (Exposure apparatus of the fourth embodiment)

[0267] Figure 8 This is a diagram that schematically illustrates the structure of the exposure apparatus 2 according to the fourth embodiment. The exposure apparatus 2 of the fourth embodiment includes... Figure 8The measuring device 1a and the exposure unit 50 of the second embodiment are indicated by the dashed line. The measuring device 1a included in the exposure device 2 of the fourth embodiment may include any one of the structures and features described for the measuring device 1a of the second embodiment.

[0268] The exposure unit 50 included in the exposure apparatus 2 of the fourth embodiment is used to expose the image by referring to a reference. Figure 2 and Figure 4 The light and dark pattern modulated by the spatial light modulator 20 is projected onto the projection exposure section on the exposed substrate 57, such as a silicon substrate or a glass substrate on which a photosensitive material is formed.

[0269] As described above, the measuring device 1a of the exposure apparatus 2 in the fourth embodiment includes a first detection unit 6 and a second detection unit 5a. Furthermore, the detection field of the second detection unit is wider than that of the first detection unit 6. In the exposure apparatus 2 of the fourth embodiment, the position changing mechanism 27 sets the spatial light modulator 20 to any one of the following positions: a first position facing the first detection unit 6, a second position facing the second detection unit 5a, and a third position facing the exposure unit 50.

[0270] Figure 8 The spatial light modulator 20b, shown by dashed lines, represents the spatial light modulator 20 set in the first position, and the spatial light modulator 20a, also shown by dashed lines, represents the spatial light modulator 20 set in the second position. Furthermore, the holding portions 28b and 28a, shown by dashed lines, represent the positions of the holding portions 28 when the spatial light modulators 20b and 20a are set in the second and first positions, respectively.

[0271] The positional relationship between the spatial light modulator 20 at the first position and the first detection unit 6 is referred to as the first positional relationship. The positional relationship between the spatial light modulator 20 at the second position and the second detection unit 5a is referred to as the second positional relationship. Furthermore, the positional relationship between the spatial light modulator 20 at the third position and the exposure unit 50 is referred to as the third positional relationship.

[0272] Furthermore, the position changing mechanism 27 can also set the spatial light modulator 20 to either the first position or the second position. In this case, another moving mechanism may also be provided to move the spatial light modulator 20 from the first position or the second position to the third position.

[0273] The exposure unit 50 of the exposure apparatus 2 in the fourth embodiment includes: a light-transmitting lens 52, a branching device 54, an imaging optical system 55, a projection aperture stop 56, a sample stage 58, a stage 59, and a third control unit 60, etc.

[0274] The light-transmitting lens 52 and the branching device 54 constitute an exposure illumination optical system that uses exposure illumination light emitted from the exposure light source 51 to illuminate the arrangement surface DP of the spatial light modulator 20. The branching device 54, the imaging optical system 55, and the projection aperture stop 56 constitute a projection optical system 53 that projects light from the spatial light modulator 20 onto the exposed substrate 57.

[0275] The exposure illumination light emitted from the exposure light source 51 is shaped by the light-transmitting lens 52 and incident on the branching device 54, such as the beam splitter. It is reflected by the branching surface 54s of the branching device 54 and illuminates the alignment surface DP of the spatial light modulator 20. Then, the exposure illumination light is directed to multiple reflecting surfaces 22R (see reference 1) near the alignment surface DP. Figure 2 The light is reflected and then incident on the branching device 54 again, passing through the branching surface 54s of the branching device 54 and then incident on the imaging optical system 55.

[0276] The numerical aperture of the spatial light modulator 20 side of the projection optical system 53 is defined by the projection aperture stop 56 included in the imaging optical system 55. By setting the numerical aperture of the spatial light modulator 20 side of the projection optical system 53 to a predetermined value, the spatial light modulator 22 (refer to the spatial light modulator 22 arranged on the array plane DP of the spatial light modulator 20)... Figure 2 , Figure 4 The first-order diffraction light generated is blocked by the projection aperture stop 56.

[0277] Therefore, by imparting a predetermined displacement to the spatial light modulator 22 disposed in a predetermined region (such as the first region A1) within the alignment plane DP, the amount of light irradiated onto the exposed substrate 57 by the transmission imaging optical system 55 can be locally reduced, thereby projecting the light and dark pattern onto the exposed substrate 57. The third control unit 60 sends a control signal S8, which is the same as the control signals S1 and S3, to the spatial light modulator 20 to impart a predetermined displacement to the predetermined spatial light modulator 22 within the alignment plane DP.

[0278] In the exposure apparatus 2, the substrate 57 to be exposed is placed on a sample stage 58 disposed on a stage 59. The substrate 57 to be exposed can move along the X and Y directions on the stage 59 via the sample stage 58. In addition, the substrate 57 to be exposed can also move a small distance along the Z direction via the sample stage 58, and can then rotate (tilt) by a small angle with the X and Y directions as rotation axes.

[0279] The positions of the substrate 57 to be exposed in the X and Y directions are measured by the position measuring unit 61 via the position of the scale plate 62 provided on the sample stage 58, and are transmitted to the third control unit 60 as measurement signals Sc. Based on the measurement signals Sc, the third control unit 60 sends position control signals Sd to the sample stage 58 to control the substrate 57 to be exposed in a manner that positions it at a predetermined X and Y position.

[0280] The third control unit 60 sends an exposure control signal Sb to the exposure light source 51 to control the emission timing and emission amount of the exposure light source 51.

[0281] The exposure unit 50 may be a scanning type exposure apparatus that scans and exposes the substrate 57 and the sample stage 58 relative to the projection optical system 53 in the XY plane while doing so. Alternatively, it may be a step-and-repeat type exposure apparatus that exposes the substrate 57 and the sample stage 58 while they are fixed relative to the projection optical system 53, and after exposure, moves the substrate 57 and the sample stage 58 sequentially relative to the projection optical system 53.

[0282] As an example, the wavelength of the illumination light emitted from the exposure light source 51 is 450 nm or less. As another example, the wavelength of the illumination light may also be 193 nm. The exposure light source 51 may be assembled inside the exposure unit 50 or disposed outside the exposure unit 50. The illumination light for exposure may be guided from the exposure light source 51 to the exposure unit 50 using a light guiding component such as an optical fiber.

[0283] In the exposure apparatus 2, the operating state of the spatial light modulator 20 can also be measured using the measuring device 1a before the substrate 57 to be exposed is exposed using the exposure unit 50. The measurement of the operating state of the spatial light modulator 20 can be performed, for example, as described in the measurement method of the third embodiment. Furthermore, when measuring the operating state of the spatial light modulator 20, the second detection unit 5a, including the second control unit 25a, calculates the aforementioned desired positional difference for each region of the alignment plane DP of the spatial light modulator 20.

[0284] That is, the second detection unit 5a, including the second control unit 25a, performs the measurement multiple times while making the value of the specified position difference H1d different. Then, based on the relationship between the measured and calculated multiple position differences H1 and the specified position difference H1d, the specified position difference H1d used to set the desired position difference H1, i.e., the desired specified position difference, is calculated for each region of the alignment surface DP of the spatial light modulator 20. Here, the desired position difference H1 refers, for example, to the value of the specified position difference H1d obtained from the measurement. Figure 2The position difference of the minimum intensity of the positively reflected light DLa0 of the spatial light modulator 20 shown is equivalent to 1 / 4 of the wavelength of the illumination light used for exposure.

[0285] The wavelength of the detection light in the second detection unit 5a can also be set to a wavelength that is 1.5 times or more and 3.3 times or less than the wavelength of the illumination light for exposure in the exposure unit 50. That is, as described above, relative to the spatial light modulator 20 used in exposure using the illumination light for exposure (first wavelength λ1), the second detection optical system 10a of the second detection unit 5a can use light with a second wavelength λ2 that is 1.5 times or more and 3.3 times or less than the illumination light for exposure to detect the image of the alignment plane DP.

[0286] The desired specified position difference calculated for each region of the alignment plane DP of the spatial light modulator 20 is sent as an information signal S7 from the second control unit 25a of the second detection unit 5a to the exposure control unit 60. During the exposure of the substrate 57 to be exposed, the exposure control unit 60 sends a control signal S8 to the spatial light modulator 20 based on the desired specified position difference for each region of the alignment plane DP sent from the second control unit 25a, so as to configure each spatial light modulator 22 according to the desired position difference H1.

[0287] Furthermore, in the case where the spatial light modulator 20 is an angle-modulated spatial light modulator 20r (refer to...) Figure 6 The second control unit 25a of the second detection unit 5a calculates the correspondence between the position information of the reflecting surface 22Rd in each region of the alignment plane DP from the rotation angle φ of the alignment plane DP and the amount of light in the image of each region. The second control unit 25a sends the correspondence as an information signal S7 to the exposure control unit 60. In this case, the exposure control unit 60 sends a control signal S8 based on the correspondence to control the angular position of each spatial light modulator 22 of the spatial light modulator 20.

[0288] (Effects of the exposure apparatus in the fourth embodiment)

[0289] (4) The exposure apparatus 2 of the fourth embodiment includes: an exposure illumination optical system (52, 54) for illuminating a spatial light modulator 20, the spatial light modulator 20 including a plurality of spatial light modulating devices 22 having a reflective surface 22R disposed on an array plane DP; a projection optical system 53 for projecting light from the spatial light modulator 20 onto an exposed substrate 57; a first detection unit 6 having a first detection optical system 30 for detecting light from the reflective surface 22R; and a second detection unit 5a having a second detection optical system 10 for detecting light from the reflective surface 22R, and having a wider detection field of view than the first detection unit 6. The exposure apparatus 2 also includes a position changing mechanism, which causes the positional relationship between the first detection unit 6 and the second detection unit 5a and the spatial light modulator 20 to be one of a first positional relationship in which the spatial light modulator 20 faces the first detection unit 6 and a second positional relationship in which the spatial light modulator 20 faces the second detection unit 5a.

[0290] According to the described structure, during the interval between exposing the substrate 57 using the exposure unit 50 and the spatial light modulator 20, the operating status of the spatial light modulator 20 can be measured with high precision in a short time using the first detection unit 6 and the second detection unit 5a. Furthermore, the measurement results can be used to perform high-precision exposure of the substrate 57 using the exposure unit 50. In addition, the measurement time required for the spatial light modulator 20 can be short, thus enabling the realization of an exposure apparatus 2 with high exposure processing capacity, i.e., high productivity.

[0291] (Modification of the exposure apparatus)

[0292] The exposure apparatus 2 of the fourth embodiment (refer to) Figure 8 It includes an exposure unit 50 that uses a spatial light modulator 20 for exposure, and a measuring device 1a according to the second embodiment.

[0293] In contrast, the exposure apparatus of the modified embodiment includes the measuring device 1 of the first embodiment instead of the measuring device 1a of the second embodiment. In this case, the position changing mechanism (or moving mechanism) 27 can move the spatial light modulator 20 between a position facing the exposure unit 50 and a position facing the measuring device 1.

[0294] In the modified exposure apparatus, the same effect as the exposure apparatus of the fourth embodiment can also be obtained.

[0295] (Component manufacturing method according to the fifth embodiment)

[0296] In the component manufacturing method of the fifth embodiment, the exposure apparatus 2 of the fourth embodiment or the exposure apparatus of the modified embodiment is used to manufacture components such as semiconductor integrated circuits, printed circuit boards, and display devices.

[0297] Figure 9 This is a diagram that schematically illustrates the steps of the component manufacturing method according to the fifth embodiment.

[0298] In step S100, a film comprising a dielectric, metal, or semiconductor is formed on the surface of a substrate such as a semiconductor substrate, ceramic substrate, or glass substrate, which is the object to be manufactured as a component. Next, in step S101, a photoresist is formed on the film formed in step S100. The substrate on which the photoresist is formed is... Figure 8 The exposed substrate 57 is shown.

[0299] Then, in step S102, using the exposure apparatus 2 of the fourth embodiment or the exposure apparatus of a modified embodiment, an exposure pattern, serving as a light and dark pattern, is exposed on the resist on the substrate (the substrate to be exposed 57). Then, in step S103, the exposed resist is developed to form a resist pattern. Then, in step S104, the resist pattern is used as a mask to perform etching or ion implantation or other processing on the film formed on the substrate or the surface of the substrate.

[0300] Steps S103 and S104 are processes for forming circuit patterns on a substrate based on the exposure pattern formed on the resist.

[0301] Through the above steps S100 to S104, a circuit pattern constituting the components is formed on the substrate.

[0302] Therefore, after step S104 is completed, the process moves to the next step and steps S100 to S104 are repeated, thereby manufacturing components (semiconductor integrated circuits, printed circuit boards, display components, etc.) that include multiple layers.

[0303] (Effects of the component manufacturing method according to the fifth embodiment)

[0304] The component manufacturing method of the fifth embodiment includes: forming a resist on the surface of a substrate (exposed substrate 57); forming an exposure pattern using the exposure apparatus 2 of the fourth embodiment or an exposure apparatus of a modified embodiment; and forming a circuit pattern based on the exposure pattern.

[0305] Therefore, the substrate can be exposed with high precision and high productivity using the exposure apparatus 2, thus enabling the high-performance components to be manufactured with high productivity.

[0306] This invention is not limited to the above-described contents. Other forms that can be considered within the scope of the technical concept of this invention are also included within the scope of this invention. This embodiment may also combine all or part of the forms described above.

Claims

1. An exposure apparatus comprising: an illumination optical system that illuminates a spatial light modulator including a plurality of spatial light modulating devices having reflecting surfaces arranged on an arrangement surface; a projection optical system that projects light from the spatial light modulator to an exposure substrate; a first detection portion that has a first detection optical system and detects light from the reflecting surfaces; a second detection portion that is a detection portion having a second detection optical system and detecting light from the reflecting surfaces, and that has a wider field of view than the first detection portion; and a position changing mechanism that makes a positional relationship between the first detection portion and the second detection portion and the spatial light modulator one of a first positional relationship in which the spatial light modulator faces the first detection portion and a second positional relationship in which the spatial light modulator faces the second detection portion.

2. The exposure apparatus according to claim 1, wherein the position changing mechanism makes the positional relationship one of the first positional relationship, the second positional relationship, and a third positional relationship in which the spatial light modulator faces the projection optical system.

3. The exposure apparatus according to claim 1 or 2, wherein the first detection portion detects an image of the arrangement surface, the second detection portion detects an image of the arrangement surface.

4. The exposure apparatus according to claim 3, wherein the second detection portion includes a calculation portion that calculates positional information of the reflecting surfaces of the spatial light modulating devices in a normal line direction of the arrangement surface or positional information related to a rotation angle of the reflecting surfaces of the spatial light modulating devices from the arrangement surface, based on an amount of light of the detected image, that is, a detection light amount.

5. The exposure apparatus according to claim 4, wherein the calculation portion of the second detection portion calculates the positional information based on a detection result obtained by the first detection portion and the amount of light of the detected image, that is, the detection light amount, detected by the second detection portion.

6. The exposure apparatus according to claim 3, wherein the illumination optical system illuminates the spatial light modulator with light of a first wavelength λl, the first detection portion detects the image using light of a second wavelength λ2 that is 1.5 times or more and 3.3 times or less of the first wavelength λl.

7. The exposure apparatus according to claim 1 or 2, wherein a numerical aperture of the spatial light modulator side of the first detection optical system is larger than a numerical aperture of the spatial light modulator side of the second detection optical system.

8. The exposure apparatus according to claim 1 or 2, wherein the first detection portion has a position measurement portion that measures positional information of the reflecting surfaces in a normal line direction of the arrangement surface.

9. The exposure apparatus according to claim 8, wherein the position measurement portion includes an interference microscope unit that causes light reflected by the reflecting surfaces of the spatial light modulating devices to interfere with reference light.

10. The exposure apparatus according to claim 8, wherein ​ The position measuring section includes an interference microscope unit that causes light reflected by the reflecting surface of the spatial light modulation device to interfere with reference light, The first detection section includes a plurality of pixels, and light from the reflecting surfaces of the plurality of spatial light modulation devices is detected by the plurality of pixels, The second detection section includes a plurality of pixels including a first pixel, and light from the reflecting surface of each of a plurality of first spatial light modulation devices included in the spatial light modulation device is detected by the first pixel.

11. The exposure apparatus according to any one of claims 1 and 2, wherein When a period of arrangement of the plurality of spatial light modulation devices is set to P, and a wavelength of light detected by the second detection section is set to λ2, A numerical aperture NA on the spatial light modulation device side of the second detection optical system satisfies 。 12. The exposure apparatus according to any one of claims 1 and 2, wherein A product of an outer diameter D [mm] of a detection field of view on the spatial light modulation device side of the second detection optical system and a numerical aperture NA on the spatial light modulation device side of the second detection optical system is 0.5 or more.

13. A measuring device comprising: a first detection section having a first detection optical system and detecting light from a reflecting surface of a spatial light modulation device including a plurality of spatial light modulation devices having reflecting surfaces arranged on an arrangement surface; a second detection section which is a detection section having a second detection optical system and detecting light from the reflecting surface, and which has a wider detection field of view than the first detection section; and a position changing mechanism that causes a positional relationship between the first detection section, the second detection section, and the spatial light modulation device to be one of a first positional relationship in which the spatial light modulation device faces the first detection section, and a second positional relationship in which the spatial light modulation device faces the second detection section.

14. The measurement apparatus according to claim 13, wherein the first detection section detects an image of the arrangement surface, the second detection section detects an image of the arrangement surface.

15. The measurement apparatus according to claim 14, wherein the second detection section includes a calculation section that calculates positional information of the reflecting surface of the spatial light modulation device in a normal line direction of the arrangement surface, or positional information related to a rotation angle of the reflecting surface of the spatial light modulation device from the arrangement surface, on the basis of a light amount of the detected image, that is, a detection light amount.

16. The measurement apparatus according to claim 15, wherein the calculation section of the second detection section calculates the positional information on the basis of a detection result obtained by the first detection section, and the light amount of the detected image, that is, the detection light amount, detected by the second detection section.

17. The measurement apparatus according to any one of claims 14 to 16, wherein a numerical aperture on the spatial light modulation device side of a first detection optical system of the first detection section is larger than a numerical aperture on the spatial light modulation device side of a second detection optical system of the second detection section.

18. The measurement apparatus according to any one of claims 13 to 16, wherein ​ The first detection section has a position measurement section that measures position information of the reflecting surface in a normal direction of the arrangement surface.

19. The measurement device according to claim 18, wherein The position measurement section includes an interference microscope unit that causes light reflected by the reflecting surface of the spatial light modulation device to interfere with reference light.

20. The measurement device according to claim 16, Further comprising a calculation section that calculates a correspondence between the position information of the spatial light modulation device and the amount of detection light of the image in the second detection section based on the position information of the reflecting surface of the spatial light modulation device detected by the first detection section and the amount of detection light of the image detected by the second detection section.

21. An exposure apparatus comprising: an illumination optical system that illuminates a spatial light modulator including a plurality of spatial light modulation devices having reflecting surfaces arranged on a surface; a projection optical system that projects light from the spatial light modulator onto a substrate to be exposed; and the measurement device according to any one of claims 13 to 20.

22. A device manufacturing method comprising: forming a resist on a surface of a substrate; exposing an exposure pattern on the substrate using the exposure apparatus according to any one of claims 1 to 12 or using the exposure apparatus according to claim 21; and forming a circuit pattern based on the exposure pattern.

23. An exposure apparatus comprising: a spatial light modulator including a plurality of spatial light modulation devices having reflecting surfaces; an illumination optical system that illuminates the spatial light modulator; a projection optical system that projects light from the spatial light modulator onto a substrate; a first detection section that has a first detection optical system and detects light from the reflecting surfaces; a second detection section that has a second detection optical system and detects light from the reflecting surfaces, and has a wider field of view than the first detection section; a position changing mechanism that changes a positional relationship between the first detection section, the second detection section, the spatial light modulator, and the projection optical system to one of a first positional relationship in which the first detection section can detect light from the spatial light modulator, a second positional relationship in which the second detection section can detect light from the spatial light modulator, and a third positional relationship in which light from the spatial light modulator is projected onto the substrate through the projection optical system.

24. The exposure apparatus according to claim 23, wherein The second detection section includes a calculation section that calculates position information of the reflecting surfaces or position information related to a rotation angle of the reflecting surfaces based on the amount of light of the detected light.

25. The exposure apparatus according to claim 24, wherein The calculation section calculates the position information based on a detection result obtained by the first detection section and the amount of light.

26. The exposure apparatus according to claim 24, wherein The illumination optical system illuminates the spatial light modulator with light of a first wavelength λ1, ​ ​ The first detection section detects light coming from the reflection surface using light of a second wavelength λ2 that is 1.5 times or more and 3.3 times or less of the first wavelength λ1.

27. The exposure apparatus according to claim 24, wherein A numerical aperture of the spatial light modulator side of a first detection optical system of the first detection section is larger than a numerical aperture of the spatial light modulator side of a second detection optical system of the second detection section.

28. The exposure apparatus according to claim 24, wherein The first detection section has a position measurement section that measures position information of the reflection surface.

29. The exposure apparatus according to claim 27, wherein A product of an outer diameter D [mm] of a detection field of view of the spatial light modulator side of the second detection optical system and a numerical aperture NA of the spatial light modulator side of the second detection optical system is 0.5 or more.

30. The exposure apparatus according to claim 23, wherein The spatial light modulator has a first electrode and a second electrode corresponding to the plurality of spatial light modulation devices, respectively, and changes an angle of the reflection surface in accordance with a voltage applied to the first electrode and the second electrode.

31. The exposure apparatus according to claim 23, wherein The spatial light modulator has an electrode corresponding to the plurality of spatial light modulation devices, respectively, and changes a position of the reflection surface in a normal direction of the reflection surface in accordance with a signal applied to the electrode.

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