Magnet system and sputter device

Abstract

A magnet system and a sputter device are provided. According to various embodiments, a magnet system (100) for a sputter device (300) can comprise: a support frame (414); a magnet carrier (102) having a first mounting area (1002a) and a second mounting area (1002b); a first support device (404) mounted at the magnet carrier (102) by means of the first mounting area (1002a); a second support device (404) mounted at the magnet carrier (102) by means of the second mounting area (1002b), wherein the first mounting area (1002a) and / or the second mounting area (1002b) are designed such that an orientation of the first support device (404) and the second support device (404) relative to each other mounted at the magnet carrier (102) can be changed; wherein the first support device (404) and the second support device (404) are designed for engaging each other with the support frame (414) to form a support device for supporting the magnet carrier (102).

Description

Technical Field

[0001] Various embodiments relate to magnet systems and sputtering equipment. Background Technology

[0002] Generally, workpieces or substrates can be processed, such as machining, coating, heating, etching, and / or structural alteration. Methods for coating substrates include, for example, cathodic atomization (so-called sputtering), which is a type of physical vapor deposition (PVD). For example, one or more layers can be deposited on a substrate by means of sputtering (i.e., via a sputtering process). For this purpose, a gas that forms a plasma can be ionized by means of a cathode, where the material to be deposited (the target material) can be atomized by means of the plasma formed therein. The atomized target material can then be directed to the substrate, where it can be deposited and form a layer.

[0003] Modifications to cathode atomization are achieved through sputtering using a magnetron, known as magnetron sputtering or reactive magnetron sputtering. Here, a magnetic field can be used to support plasma formation. To generate the magnetic field, a magnet system can be positioned at the target material or at the cathode (also called the magnetron cathode) to create a ring-shaped plasma channel, or orbital, on the target material surface (target surface), within which plasma can form. The target material can then be atomized in the region of the plasma channel exposed to the plasma (also called the atomization region). During reactive magnetron sputtering, the atomized target material undergoes an additional chemical reaction, and the resulting reaction products are deposited as a layer on the substrate.

[0004] The spatial distribution of plasma channels and the associated atomization rate are highly sensitive to the spatial distribution of the magnetic field. Therefore, magnet systems are of particular importance for various process characteristics, such as process stability, reproducibility, target utilization, and uniformity. In this context, there is a fundamental need for improvements, such as simplifying magnet systems and / or reducing interference effects. Summary of the Invention

[0005] According to various implementation methods, it is clearly recognized that the deflection of the magnet system is a variable influencing this interference. More precisely, the deflection of the magnet system is typically greater than the deflection of the target. Therefore, the distance between the magnet system and the target varies with the target length during target consumption, with the distance being at its maximum or minimum precisely in the direction of gravity.

[0006] The main component of a tubular magnetron is the magnet system that generates a magnetic field (i.e., a magnetic field) to form a track. The strength of the magnetic field over the length of the tubular target has a significant impact on the uniformity of the functional layer deposited on the substrate. Therefore, layer uniformity can be specifically adjusted by varying the field strength in different regions. For this reason, the magnet system is typically designed to allow for setting the spacing between the magnet and the target surface.

[0007] Since the adjustability of the magnet height difference is limited, an attempt is made to achieve the most uniform state possible in the magnet system and environment, such as a uniform pressure distribution, which also affects the uniformity of the functional layers.

[0008] However, this method can only reduce other deviations to a limited extent, such as the gravitational deflection of components, like the tubes between supports and the carrier. This is because the spacing of the supports cannot usually be chosen without restriction, and the factors affecting deflection (bending stiffness and self-weight) cannot be arbitrarily adjusted. Here, a tubular target is used as an example. The span of the supports (by means of end blocks) is preset by the substrate width. The supporting tubes between the end blocks are self-supporting and thus deflect in the direction of gravity. In a carrier with a uniform mass distribution over its length, the deflection (v) is proportional to the specific mass (q) divided by the elastic modulus (E) multiplied by the surface moment of inertia (I) according to the following relationship:

[0009] v~q / E*I.

[0010] Here, the amount of target material (e.g., thickness) affects q and I, and the type of target material affects q and E. Therefore, the deflection of the target is a function of the type and amount of target material, where the amount of target material decreases over time due to its consumption. Conversely, the magnet system in the target tube exhibits time-constant deflection between the support points because, under normal conditions, the factors affecting deflection remain constant. Consequently, the relative orientation (e.g., spacing) between the magnet system and the target varies depending on the type of target material (e.g., when using different targets), the magnetic field strength, and the state of target material consumption.

[0011] According to various embodiments, a magnet system is provided that enables the modification of the magnet system's deflection (e.g., to match the deflection of a target) or at least adjusts it such that the spacing variation (e.g., at the end of the target tube) is adjusted according to a preset value. The provided magnet system can be used, for example, in a tubular magnetron (e.g., for use in a PVD process). Attached Figure Description

[0012] The attached diagram shows

[0013] Figure 1 and Figure 2 Magnet systems according to various embodiments are shown in various views;

[0014] Figure 3A Sputtering apparatuses according to various embodiments are shown, and Figure 3B The magnet system of the sputtering apparatus is shown; and

[0015] Figures 4 to 10 Magnet systems according to various embodiments are shown in various views. Detailed Implementation

[0016] The following detailed description refers to the accompanying drawings, which form part of this description and illustrate specific embodiments in which the invention can be carried out for illustrative purposes. In this regard, directional terms such as “upper,” “lower,” “front,” “rear,” “front portion,” “rear portion,” etc., are used in relation to the orientation of the one or more drawings described. Because components of the embodiments can be positioned in multiple different orientations, the directional terms are used for illustrative purposes and are not intended to be limiting in any way. It should be understood that other embodiments can be used and structural or logical changes can be made without departing from the scope of the invention. It should be understood that features of the different exemplary embodiments described herein can be combined with each other unless specifically stated otherwise. Therefore, the following detailed description should not be construed as limiting, and the scope of the invention is defined by the appended claims.

[0017] Within the scope of this specification, the terms "connection," "link," and "coupled" are used to describe direct and indirect connections (e.g., ohmic and / or conductive, such as conductive connections), direct or indirect links, and direct or indirect couplings. In the accompanying drawings, identical or similar elements are given the same reference numerals wherever appropriate.

[0018] According to various embodiments, the term "coupled" or "coupled" can be understood as (e.g., mechanical, hydrostatic, thermal, and / or electrical) direct or indirect connection and / or interaction. For example, multiple elements can be coupled to each other along an interaction chain, and interactions can be exchanged along the interaction chain, such as fluid (thus also called fluid-guided coupling). For example, two mutually coupled elements can exchange their interactions with each other, such as mechanical, hydrostatic, thermal, and / or electrical interactions. The coupling of multiple vacuum components (e.g., valves, pumps, chambers, etc.) to each other can include: they are fluid-guided coupled to each other. According to various embodiments, "connection" can be understood as mechanical (e.g., physical or physical) coupling, such as by means of direct physical contact. Connectors can be designed to: transmit mechanical interactions (e.g., forces, torques, etc.).

[0019] Here, the term "support device" refers to a device designed to support (e.g., guide the positioning and / or hold) one or more components. A support device may, for example, have one or more support members for each component (which is supported by means of the support device) to support (e.g., guide the positioning and / or hold) the component. Each support member of the support device may be designed to provide one or more degrees of freedom (e.g., one or more translational degrees of freedom and / or one or more rotational degrees of freedom) to which the component can move. Examples of support members include: radial support members, axial support members, radial thrust support members, and linear support members (also known as linear guides).

[0020] In some embodiments, a support device is provided that supports (e.g., holds) a component (e.g., a carrier) at multiple locations on the component (also referred to as support locations or support points), for example, receiving the weight of the component at each support location. Each of the multiple support locations may be provided by means of a (e.g., a movable) bracket of the support device. A fixed support (i.e., a non-movable bracket) blocks all three translational degrees of freedom of the support location and provides the support location with one or more optional rotational degrees of freedom (i.e., enabling one or more torsional movements of the support location). A floating support (i.e., a movable bracket) provides the support location with at least one translational degree of freedom and one or more optional rotational degrees of freedom; that is, the floating support blocks only one or two translational degrees of freedom of the support location (e.g., translational degree of freedom along the direction of gravity).

[0021] The term "sputtering" refers to the atomization of material (also known as a coating material or target material) using plasma, which is provided as a so-called target material. Thus, the atomized components of the target material are separated from each other and can, for example, be stacked to form a layer. Sputtering can be performed using a so-called sputtering apparatus, which may have a magnet system (the sputtering apparatus is thus also called a magnetron). For sputtering, the magnetron can be placed in a vacuum process chamber, allowing sputtering to be performed in a vacuum. For this purpose, the environmental conditions (process conditions) within the vacuum process chamber (e.g., pressure, temperature, gas composition, etc.) can be set or adjusted during sputtering. For example, the vacuum process chamber can be designed to be airtight, dustproof, and / or vacuum-sealed, allowing a gas atmosphere with a predetermined composition or predetermined pressure (e.g., according to a predetermined value) to be provided within the vacuum process chamber. For example, an ion-forming gas (process gas) or a gas mixture (e.g., composed of a process gas and a reactant gas) can be provided in the process chamber. For example, in reactive magnetron sputtering, the atomized material can react with a reactive gas (e.g., having oxygen, nitrogen and / or carbon), and the resulting reaction products (e.g., dielectrics) can be separated.

[0022] Sputtering can be performed using a so-called tubular magnetron, in which a tubular target (also called a tubular target or tubular cathode) rotates axially around a magnet system. For example, the tubular target can have a tube on which target material can be fixed as a layer on the outer surface and can partially cover the side surface of the tube. However, the tubular target can also be formed from target material. The sputtering of the target material can be influenced by adjusting the magnet system or by changing the magnetic field thereby generating it, thus affecting the spatial distribution of the target material that is stripped away.

[0023] The tubular cathode and magnet system can be supported by means of a support device (also called a target support device), which can support the tubular cathode in a manner rotatable relative to the magnet system. The support device may, for example, have one or more end blocks, wherein each end block of the support device holds an end segment of the tubular cathode or magnet system. The support device (e.g., one or more of its end blocks) can also provide a supply to the tubular cathode (e.g., supply of electrical power, rotational motion, and / or cooling fluid). Alternatively, if the sputtering equipment is configured as a dual-tube configuration, the sputtering equipment or its support device may also be designed to: hold two target materials together with the magnet system disposed therein (also called a dual magnetron).

[0024] According to various embodiments, the end block of the sputtering apparatus (and thus also called the drive end block) may have a drive system for transmitting rotational motion to the tubular cathode, the drive system being coupled, for example, to a driver. Alternatively or additionally, the end block of the sputtering apparatus (also called the dielectric end block) may be designed to deliver and discharge cooling fluid (e.g., a water-based mixture) that can be guided through the cathode.

[0025] However, a single end block (also called a compact end block) can also be used, which incorporates both a drive system and fluid lines, thus collectively providing the functions of both a drive end block and a media end block. For example, the side of the tubular target opposite the compact end block can extend freely (i.e., be freely suspended), a configuration known as a cantilever configuration. The compact end block can be mounted in a cantilever configuration on the sidewall of a vacuum chamber through which the axis of rotation of the tubular target extends. However, the side of the tubular target opposite the compact end block can also be supported by a support block (clearly, a mating support), a configuration known as a support block configuration. Support blocks can also be provided by means of passive end blocks, i.e., end blocks that do not exchange energy or material with the tubular target but merely support it.

[0026] According to various embodiments, the magnet system may have a length ranging from about 0.5 m to about 6 m (extended along the longitudinal direction and / or the axis of rotation of the target), for example, a length ranging from about 2 m to about 5 m and / or a length greater than 3 m.

[0027] A magnet system can be multipole, meaning it has multiple magnetic poles. The first magnetic pole (also called the outer pole) can extend along a self-closed path (also called a loop path), and the second magnetic pole can be positioned within a region surrounded by the loop path (also called the inner pole). For example, the loop path can be elliptical.

[0028] Each magnetic pole may have multiple pole pieces, such as magnets, arranged sequentially (hence also called a row of magnets or a magnet bar), each of which is magnetized or has a magnetized portion. For example, each magnet bar may have at least 10 (e.g., at least 100) pole pieces, such as magnets, per meter. For example, each magnetic pole may have one or more magnet bars. For example, three magnet bars arranged between the end members of a magnet system may essentially provide the middle region of the magnet system (clearly, an inner pole, a magnet bar on each side of the inner pole, and an outer pole).

[0029] Here, the term "pole body" refers to a body having a magnetic material (also known as a magnetic material) or formed therefrom. A pole body may, for example, be adjacent to or a portion thereof. For example, the magnetic material may be ferromagnetic or ferrimagnetic. The magnetic material may have hard magnetic material and / or soft magnetic material or be formed of hard magnetic material and / or soft magnetic material. The magnetic material may have magnetic polarization, such as magnetization, to provide a dipole.

[0030] For example, hard magnetic materials can have a coercivity greater than about 500 kA / m, such as greater than about 1000 kA / m. For example, hard magnetic materials can be part of or form part of one or more permanent magnets (also called permanent magnets). A body made of hard magnetic materials can be understood as a permanent magnet (also called a permanent magnet pole body). For example, hard magnetic materials can contain chemical compounds and / or alloys.

[0031] For example, hard magnetic materials may contain elements such as iron, cobalt, and / or nickel (e.g., ferrite). Hard magnetic materials may contain rare earth metals (such as neodymium, samarium, praseodymium, dysprosium, terbium, and / or gadolinium), iron, cobalt, and / or nickel, or be formed therefrom. For example, hard magnetic materials may contain at least neodymium, iron, and / or boron, or be formed therefrom, for example, by their chemical compounds. Alternatively or additionally, hard magnetic materials may contain at least aluminum, nickel, and / or cobalt, or be formed therefrom, for example, by their chemical compounds. Alternatively or additionally, hard magnetic materials may contain at least samarium and / or cobalt, or be formed therefrom, for example, by their chemical compounds.

[0032] For example, hard magnetic materials can have a composition of neodymium-iron-boron (Nd2Fe) 14 B) or samarium-cobalt (SmCo5 and Sm2Co) 17Or formed thereof. More generally, hard magnetic materials (e.g., the permanent magnet or each permanent magnet) may have rare earth magnetic materials (e.g., neodymium iron boron (NdFeB) or samarium cobalt (SmCo)), ferrite magnetic materials (e.g., hard ferrite magnets), bismuth alcohol magnetic materials and / or aluminum-nickel-cobalt magnetic materials or formed thereof.

[0033] For example, soft magnetic materials can have a coercive field strength of less than about 500 kA / m, for example less than about 100 kA / m, for example less than about 10 kA / m, for example less than about 1 kA / m. Soft magnetic materials can be, for example, alloys of iron, nickel and / or cobalt, steel, powder materials and / or soft ferrites (e.g., nickel-tin and / or manganese-tin) or formed therefrom.

[0034] For example, magnetic (e.g., soft magnetic and / or hard magnetic) materials may have a value of about 10 or greater, such as about 100 or greater, such as about 10 3 Or larger, for example, about 10 4 Or larger, for example, about 10 5 Or a higher permeability.

[0035] Typically, the outer and inner poles can be spaced apart and / or differ from each other in their magnetization direction and / or the number of their magnets. In the simplest case, the magnetization directions of the outer and inner poles are exactly opposite, e.g., antiparallel. However, in more complex implementations, the magnetization directions can also be inclined to each other, e.g., forming an angle (also known as magnetization deviation). For example, the magnetization deviation can be approximately 90° or greater (e.g., 120° or greater, e.g., 150° or greater, e.g., 160° or greater, e.g., 170° or greater, e.g., approximately 180°).

[0036] In an exemplary embodiment, the inner pole may be magnetized toward (e.g., magnetic) a magnet carrier and / or away from the target material, and the outer pole may be magnetized away from (e.g., magnetic) a magnet and / or toward the target material. Alternatively, the outer pole may be magnetized toward (e.g., magnetic) a magnet carrier and / or away from the target material, and the inner pole may be magnetized away from (e.g., magnetic) a magnet carrier and / or toward the target material. In an exemplary embodiment, the outer and inner poles, for example, their magnetization orientation, may be designed (e.g., oriented and / or configured) such that they (optionally together with magnetic material in the environment) provide a tunnel-like or even parallel magnetic field line orientation to the target surface.

[0037] A magnet herein can be understood as an exemplary pole body, comprising a magnetized material and explicitly designed as a permanent magnet. For example, a magnet may be a rare-earth magnet (e.g., neodymium iron boron (NdFeB) or samarium cobalt (SmCo)), a ferrite magnet, a bismuth alcohol magnet, and / or an AlNiCo magnet. The description of magnets herein can be similarly applied to other types of pole bodies.

[0038] A magnet system (e.g., its magnetic rod) may optionally have multiple sequentially arranged and / or spatially separated (e.g., multi-pole) segments (also called magnet systems or groups of magnet systems), two of which (also called reversing segments or end members) are located at the end sides of the magnet system (clearly, at the ends of the magnet system), and one or more optional segments (also called intermediate members) are located between the end members. For example, a loop path may have two straight segments in each intermediate member, with an inner pole disposed between the two straight segments. In each end member, the loop path may extend in an arc and / or at an angle. Here, exemplary reference is made to a magnet system having multiple groups of magnet systems, wherein the description in this respect may also be applied to an unsegmented magnet system, or the description of groups of magnet systems may similarly apply to multiple groups of magnet systems, and vice versa.

[0039] The term "nonmagnetic" can be understood as essentially magnetically neutral, such as being slightly paramagnetic or diamagnetic. For example, the term "nonmagnetic" can be understood as having a permeability of essentially 1, that is, in the range of about 0.9 to about 1.1. Examples of nonmagnetic materials include: graphite, aluminum, platinum, copper, nonmagnetic high-quality steel, and ceramics (e.g., oxides).

[0040] Figure 1 A magnet system 100 according to various embodiments is illustrated in schematic detail, for example, shown in the direction 101 (also referred to as the reference direction 101) along which the magnet system 100 extends longitudinally.

[0041] The magnet system 100 may have multiple magnets 104 and a support mechanism 160, the support mechanism being designed to support the magnets 104 of the system 100. The support mechanism 160 may have at least one (i.e., one or more) carriers 102, 202 (also referred to as magnet carriers), the first carrier 102 of the magnet carriers (also referred to as the first magnet carrier or system carrier) being designed to support one or more magnet system groups 150 of the magnet system 100 (e.g., their magnets 104).

[0042] The magnet system 100 may, for example, have one or more magnet system groups 150 per magnet carrier 102, such as multiple magnet system groups 150 per magnet carrier 102. For example, the magnet system 100 (e.g., each magnet carrier 102) may have two or more magnet system groups 150, such as three or more magnet system groups 150.

[0043] Each magnet system group 150 may have multiple (e.g., three or more) magnets 104 and may optionally be designed in an adjustable manner. The magnets 104 of the magnet system group 150 may, for example, be magnetized, such as having magnetization in a direction toward or away from the magnet carrier 102 (also referred to as the magnetization direction). At least two magnets 104 of each magnet system group 150 may have different magnetization directions from each other.

[0044] Examples of components or implementations of the magnet carrier 102 include: tubes (e.g., spray gun tubes), plates (e.g., metal plates), contour carriers, etc. For example, the magnet carrier 102 may have or be constituted by contour carriers, such as having a U-shaped contour, such as a double U-shaped contour (also known as an H-shaped contour).

[0045] Each adjustable magnet system assembly 150 may have an adjustment device 150s, which is disposed, for example (e.g., partially), between the magnet carrier 102 and / or the magnets 104 of the magnet system assembly 150. The adjustment device 150s may be designed to change the spatial distribution of the magnetic field 120 generated by the magnet system assembly 150, for example, by changing the spatial distribution (e.g., position and / or alignment) of one or more magnets 104 of the magnet system assembly 150.

[0046] For example, the adjustment device 150s may be a component of the support mechanism 160 and may be designed to change the spatial position and / or alignment of at least one magnet of the magnet system 100.

[0047] An exemplary component of the adjustment device 150s includes: a support device 116 (also referred to as a group support device) and / or an actuator 106. The adjustment device 150s (e.g., its group support device 116 and / or actuator 106) can connect the magnet 104 or each magnet 104 of the magnet system group 150 to the magnet carrier 102.

[0048] If one or more magnet system groups 150 of the magnet system 100 are adjustable, or if the magnet system 100 has one or more adjustment devices 150s, then the support mechanism 160, for example, the support structure of the magnet system group 150, may have a second carrier 202 (also called a second magnet carrier or group carrier), the second carrier being designed to support the plurality of magnets 104 of the magnet system group 150 (see also...). Figure 2In this case, the group or each group carrier 202 may be magnetic (thus providing a so-called return carrier) and the magnetic carrier 102 may be non-magnetic. If the magnetic system 100 does not have group carriers 202, then the magnetic carrier 102 may be magnetic (thus providing a so-called return carrier). In some embodiments, the return carrier may be plate-shaped or have at least one plate (thus also referred to as a return plate).

[0049] The support device 116 may provide one or more translational degrees of freedom 111 for the magnet 104, wherein the first translational degree of freedom 111 may be along the reference direction 101 and / or one or more second translational degrees of freedom 111 may be transverse to the reference direction 101.

[0050] Actuator 106 may be designed to mechanically move magnet 104 according to or each translational degree of freedom 111 (also referred to as the actuation process). For this purpose, actuator 106 may be coupled to magnet 104 and magnet carrier 102 such that, when actuator 106 is adjusted, the orientation (i.e., alignment and / or position) of magnet 104 relative to magnet carrier 102 can be changed, for example, according to a target state.

[0051] To generate motion, actuator 106 may have an electromechanical transducer (e.g., an electric motor or a piezoelectric actuator). The electromechanical transducer may be designed to generate translational motion (e.g., in the case of a linear electric motor) or rotational motion (e.g., in the case of a rotary electric motor). To transmit motion to magnet 104, actuator 106 may optionally have a transmission (also referred to as an actuator transmission).

[0052] To supply electrical power (also known as supply power) to actuator 106 and / or to transmit control signals to actuator 106, actuator 106 may be coupled to one or more electrical lines 108. In principle, control signals and supply power can be transmitted together via line 108. However, these control signals and supply power can also be transmitted via separate lines 108.

[0053] The magnet system group 100 or each magnet system group 150 may have multiple magnets 104, such as multiple magnets per actuator 106. For example, the magnet system group 150 (e.g., each actuator 106) may have at least three magnets 104 or more, such as at least six magnets 104 or more, such as at least nine magnets 104 or more, such as at least 12 magnets 104 or more, such as at least 15 magnets 104 or more, such as at least 21 magnets 104 or more, such as at least 30 magnets 104 or more.

[0054] Figure 2A schematic perspective view is shown of a magnet system 100 according to various embodiments 200.

[0055] According to various embodiments, each of the magnet system 100, such as its magnet system group 150, may have multiple, for example, three rows of magnets arranged in a spatially separated manner, 204a, 204i, which are fixed to a common group carrier 202 (e.g., magnetically coupled thereto). Each magnet row 204a, 204i may have multiple magnets arranged in a row in a single magnetization direction. The magnets may be arranged and aligned such that the magnet rows 204a, 204i arranged side by side have opposite magnetization directions. For example, the two outer magnet rows 204a may be magnetized away from the magnet carrier 102, while the centrally located magnet row 204i may be magnetized towards the magnet carrier 102 (or vice versa).

[0056] At least the middle magnet row 204i, which is disposed between the two outer magnet rows 204, can extend longitudinally in direction 101. Alternatively or additionally, a gap extending longitudinally along direction 101 (also referred to as the longitudinally extending direction 101) can be disposed between two directly adjacent magnet rows 204, the gap separating the magnet rows from each other in space.

[0057] Figure 3A The sputtering apparatus 300 according to various embodiments is illustrated in schematic side view or cross-sectional view, and Figure 3B The magnet system 100 of the sputtering apparatus 300 is shown in schematic detail figure 300b.

[0058] The sputtering apparatus 300 may have a support device 350 (also called a target support device) for rotatably supporting a tubular target 302 (also called a tubular target). The target support device 350 may have one or two end blocks 312a, 312b, to which the tubular target 302 may be rotatably supported, for example, rotatable about a rotation axis 311. For this purpose, the target support device 350 (e.g., each end block 312a, 312b) may have one or more corresponding rotatable support members. For example, each rotatable support member may rotatably support a target connector 301 (e.g., having a flange), to which the tubular target 302 may be connected. The rotation axis 311 may be along direction 101.

[0059] The first end block 312a of the target support device 350 can be designed as a drive end block 312a, i.e., having a drive system 302a for rotating the tubular target 302. The second end block 312b or the first end block 312a of the target support device 350 can be designed as a medium end block 312b, i.e., for conveying and discharging cooling fluid (e.g., water) and / or for supplying electrical power to the tubular cathode 302. The cooling fluid can be guided through the tubular target 302.

[0060] The drive system 302a can be connected to or have a drive device (e.g., a motor) located outside the drive end block 312a. Torque can be connected to the tubular target 302 by means of the drive system 302a to drive the rotational movement of the tubular target 302.

[0061] Furthermore, the sputtering apparatus 300 may include a magnet system 100, which is held by means of a support device 350, for example, in a fixed position and / or anti-rotational manner. For example, it maintains a fixed alignment relative to the support device 350 when the tubular target 302 (around the magnet carrier 102) rotates. The axis of rotation 311 or direction 101 may be parallel to the longitudinal extension of the magnet carrier 102. The axis of rotation 311 may optionally be located within the magnet system 100.

[0062] The support device 350 may have a target connector 301 for each end block 312a, 312b, by means of which a tubular target 302 can be connected, for example, to a drive system 302a and / or to a cooling fluid supply device (e.g., having one or more fluid lines). For example, the target connector 301 may have a detachable connection that allows for the installation and removal of the tubular target 302.

[0063] In detailed figure 300b, two magnet system groups 150 are exemplarily shown, each having a group carrier 202; a plurality of magnets 104 coupled to each other (e.g., magnetically) via the group carrier 202; and an electric actuator 106 designed to adjust the orientation of the group carrier 202 or the magnets 104 relative to the magnet carrier 102 and / or relative to each other in response to an electrical control signal supplied to the actuator 106. For example, the actuator 106 may be designed to transmit translational motion (e.g., along or laterally to direction 101) to one of the two magnet system groups 150. The actuator 106 may have, for example, an electric motor 106m and an optional transmission 106g. The transmission 106g may connect the motor 106m to the group carrier 202.

[0064] Figure 4A schematic side view or cross-sectional view (viewed along a reference direction) shows a magnet system 100 according to various embodiments 400, wherein the magnet system 100 has a longitudinally extending magnetic rod 352 (also referred to as a magnetic strip).

[0065] The magnetic rod 352 has a support mechanism 160 and a plurality of magnets 104, such as a magnet carrier 102 and a magnet system group 150 or a plurality of magnet system groups 150 arranged sequentially (along the longitudinal extension or rotation axis 311 of the magnetic rod 352).

[0066] As explained above, the magnet carrier 102 may have a profile carrier or be constituted therewith, for example, having a U-shaped profile, such as (as shown) a double U-shaped profile (also known as an H-shaped profile), etc. The U-shaped profile (or double U-shaped profile) achieves high stability and provides sufficient structural space for one or more additional components 402 of the magnet system 100.

[0067] Examples of additional components 402 of the magnet system 100 include: regulating device 150s or at least its actuator 106 and / or set of support devices 116, electrical components 450 (e.g., processor or other circuit, generator, inverter, etc.).

[0068] In some, but not necessarily all, embodiments, the magnet system 100 has a frame 414 (also referred to as a support frame 414) and one or more support devices 404, such as a first support device 404 and a second support device 404 (see also...). Figure 9 ).

[0069] The support device or each support device 404 can be mounted on the magnetic rod 352 (e.g., its magnet carrier 102) and can be spliced ​​together with the support frame 414 (e.g., in a manner that engages with each other) to form a support member (e.g., a floating support) for the magnetic rod 352. For example, the support frame 414 and the support device 404 splice together to form a support point (e.g., a floating support). Alternatively, multiple support points (also referred to as multi-point support) can be provided for the magnet 352 by means of multiple support devices 404 mounted on the magnetic rod 352 and spliced ​​together with the support frame 414. For example, the support frame 414 can have two support members 414a, 414b (also referred to as frame support members) between which the magnetic rod 352 is disposed, wherein the support device or each support device 404 has one support member 404a, 404b for each support member 414a, 414b, and the magnetic rod 352 is disposed between the support members.

[0070] In an exemplary embodiment, the support member or each support member 404a, 404b has bolts (also referred to as support bolts) or is constituted therefrom. For example, a multi-point support device may have one support device 404 at each support location, and each support device 404 has two support bolts as support members 404a, 404b, with a magnet carrier 102 disposed between the support members.

[0071] In an exemplary embodiment, the support frame 414 may have two tracks (e.g., guide tracks) as support members 414a, 414b, or the frame support members 414a, 414b may be track-shaped. For example, each guide track may have a groove (and thus a groove profile) extending along the reference direction 101 and / or along the longitudinal extension of the magnet carrier 102 (also referred to as the system carrier).

[0072] In some, but not all, embodiments, the magnet system 100 includes: a housing 406g (clearly a hollow body) having an internal space 406h (also referred to as the housing interior), a magnetic rod 352 disposed within the internal space, and / or a cooling trap 408. The cooling trap 408 may be adjacent to or at least partially (i.e., partially or completely) disposed therein and designed to dry the internal space 406h. For example, the cooling trap 408 may have one or more fluid lines 408f, such as two or more (e.g., three, four, or more than four) fluid lines 408f.

[0073] In an exemplary embodiment, the cooling trap 408 has one or more pairs of fluid lines 408f, with frame support members 414a, 414b (e.g., guide rails) or at least a segment of the frame support members 414a, 414b disposed between the fluid lines. Alternatively or additionally, the cooling trap 408 has one or more fluid lines 408f that contact, for example, its frame support members 414a, 414b, and are optionally connected thereto. This increases heat transfer between them and / or the rigidity of the support frame 414.

[0074] In a particularly simple and inexpensive implementation, the housing 406g is tubular (e.g., having a housing tube). This increases the compactness and / or rigidity of the magnet system 100.

[0075] The magnet carrier 102 has, for example, a carrier outline and carries each set of carriers 202 (e.g., a return plate 202), the magnet 104 carried by means of the set of carriers 202, and optional electrical or electronic devices 402.

[0076] Figure 5A schematic side view or cross-sectional view of a magnet system 100 according to various embodiments 500 is shown, wherein the magnet system 100 has a chamber 406 (also referred to as system chamber 406) (e.g., fluid-sealed, e.g., vacuum-sealed), which has a housing 406g and one or more covers 406d (also referred to as interface covers 406d or housing covers). The cover 406d, or each cover 406d, may be designed to be closed (e.g., fluid-sealed, e.g., vacuum-sealed) at the end side (e.g., in a direction extending longitudinally from the magnetic rod 352 or the rotation axis 311 or toward the longitudinal extension of the magnetic rod 352 or the rotation axis 311). Optionally, at least one interface cover 406d of the system chamber 406 may be designed to supply (and thus also referred to as a supply cover) the magnet system group 150 or each magnet system group 150 of the magnet system 100, e.g., supplying mechanical and / or electrical energy. For this purpose, the supply cover 406d may have a transmission stage, a generator, a communication interface, and / or a rotating feedthrough.

[0077] Figure 6 A schematic perspective view of the magnet system 100 according to various embodiments 600 is shown, with the end side of the housing 406g as an indication. The housing 406g may have one or more openings 602 (also referred to as housing openings 602) on its end side, exposing the internal space 406h of the housing, and may be covered by an optional interface cover 406d if necessary. The housing 406g may be supported by a target support device 350, for example, disposed or housed between its support portions (e.g., end blocks 312a, 312b).

[0078] The magnet carrier 102 can be supported in the housing 406g in a point manner, for example by means of a support frame 414, such as by means of multiple support points (also referred to as a multi-point support device). This simplifies the adjustment of the deformation (e.g., gravitational deflection) of the system carrier, which depends less on the deformation (e.g., gravitational deflection) of the housing 406g.

[0079] For example, a multi-point support device may have at least two or more support points, such as at least three or more support points, such as at least four or more support points.

[0080] In an exemplary embodiment, the housing 406g has a rigid housing, which enables a cost-effective and particularly stable implementation. In an exemplary embodiment, alternative to this or others, one or more frame support members 414a, 414b of the support frame 414 have grooves (also referred to as groove profiles) extending longitudinally along the reference direction 101 and / or the magnet carrier 102 (also known as the system carrier), into which, for example, the support device 404 engages. This simplifies the adjustment of the multi-point support device.

[0081] In an exemplary embodiment, the tubular housing 406g has a tube 604 (also referred to as housing tube 604) and one or more flanges 606 (e.g., one flange 606 for each housing opening 602), wherein each flange 606 is water-tightly connected to the end side of the tube (e.g., welded) and / or penetrated by the housing opening 602. Each flange 606 of the housing 406g has a sealing surface 606d and one or more mounting areas 606m (e.g., each has threads), wherein each mounting area 606m is designed to mate with an interface cover 406b so that the interface cover 406d can be mounted at the mounting area 606m (for axial fixation of the interface cover).

[0082] Optionally, each flange 606 of the housing 406g has one or more openings 606o (also referred to as interface openings 606o), through which fluid lines 408f (e.g., pipes) of the cooling sink 408 extend. For example, the housing 406g may have two or more (e.g., three, four, or more than four) interface openings 406o for each flange 606. For example, each fluid line 408f may be water-tightly connected to the flange 606 (e.g., welded) and / or coupled to a guide rail.

[0083] The multi-point support device will now be explained based on a two-point support device, i.e., a double-supported magnet carrier 102, which is easy to implement in design. It is understood that the explanation in this respect can be similarly applied to more than two support locations.

[0084] In an exemplary embodiment, the magnet system 100 has a housing 406g, which is watertight at its ends by means of two interface covers 406d. Each interface cover 406d has a support bolt, and the system chamber 406 receives the end block by means of the support bolt.

[0085] Figure 7 The diagram illustrates a magnet system 100 according to various embodiments 700, showing multiple configurations 700a to 700c of the magnet system 100 that differ from each other in orientation (also referred to as support orientation) in which a first support device 404 and a second support device 404 are mounted relative to each other on a magnet carrier 102. Hereinafter, the difference in the distance 701 (also referred to as support spacing 701) between the first support device 404 and the second support device 404, or between the two support portions, is referred to as an exemplary difference in support orientation.

[0086] In the support diagram, the magnet carrier 102 and the housing 406g are represented by schematic curved lines. Due to differences in the support spacing, the various configurations 700a to 700c differ in the curved lines of the magnet carrier 102.

[0087] In configuration 700a, it is clear that the support spacing 701 is small, for example, less than 50% of the longitudinal extension 102l of the magnet carrier 102. In configuration 700a, the curvature of the magnet carrier 102 travels in the opposite direction to the curvature of the housing 406g. In configuration 700b, it is clear that the support spacing 701 is large, for example, greater than 90% of the longitudinal extension 102l of the magnet carrier 102. In configuration 700b, the curvature of the magnet carrier 102 is oriented in the same direction as the curvature of the housing 406g.

[0088] In configuration 700c, it is clear that the support spacing 701 is adjusted to the smallest possible deflection of the housing 406g, for example, within a range between 50% of the longitudinal extension 102l of the magnet carrier 102 and 90% of the longitudinal extension 102l of the system carrier, for example, within a range between 60% and 80% of the longitudinal extension 102l of the magnet carrier 102.

[0089] In configuration 700c, the support spacing 701 can be designed, for example, such that the deflection of the magnet carrier 102 in the middle is as large as that at the ends. In other words, the deflection can be substantially compensated.

[0090] The deflection of the magnet carrier 102 can be adjusted, for example, according to a preset, by changing the multi-point support device, such as the support spacing 701, the support orientation, and / or the number of support portions (or support devices 404) used to support the magnet carrier 102. The preset can be, for example, a function of the deflection of the housing 406g and / or the deflection of the target 302.

[0091] For example, a multi-point support device can be designed to enable asymmetric deflection and / or tilting of the magnet carrier 102. Based on the influencing variables related to deflection (e.g., bending stiffness and / or self-weight), the required support spacing for the desired deflection can be determined by calculating the coupled system consisting of the housing 406g and the magnet carrier 102.

[0092] Figure 8 A schematic perspective detail of the frame support components 414a and 414b is shown for the magnet system 100 according to various embodiments 700, wherein the frame support components 414a and 414b are designed as guide rails.

[0093] The guide rail, or each guide rail 414a, 414b, has, for example, a groove profile and / or is connected (e.g., welded) to each fluid line (e.g., a line pipe) of the guide line 408f of the cooling sink 408. These connections simultaneously increase the rigidity of the guide rail.

[0094] The slot profile is simplified: a magnet carrier 102 is introduced into the housing 406g, and one or more support devices 404 are mounted on the system carrier. For example, a magnet carrier 102 with one or more support devices 404 mounted thereon can be introduced into the housing 406g from the end side, such that each support device 404 engages in a slot in the slot profile (also called a guide slot) and is pushed into the housing 406g along the slot.

[0095] Figure 9 A schematic perspective detail of the end side of the magnetic strip 352 is shown for a magnet system 100 according to various embodiments 900, wherein each support device 404 has two support bolts 902 as support components.

[0096] The magnet system 100 may have two or more support devices 404 (e.g., one support device 404 per support location), each support device 404 having two support bolts 902 as support members, with the magnet carrier 102 disposed between the support members. Each support bolt 902 may protrude from the magnet carrier 102.

[0097] In an exemplary embodiment, a magnet carrier 102, on which two or more support devices 404 are mounted, is pushed into a housing 406g (e.g., its housing tube 604) in such a way that each support device 404 is form-fitted into a guide slot of a guide rail. The magnet carrier 102 is supported in each guide rail of the support frame 414 by means of support bolts 902 in a form-fitting manner.

[0098] Figure 10 A schematic detail illustration of a magnet carrier 102 is provided, illustrating a magnet system 100 according to various embodiments, the system carrier having a plurality of mounting regions 1002a, 1002b. Each of the plurality of mounting regions 1002a, 1002b of the magnet carrier 102 can be designed such that a support device 404 can be mounted thereon. For example, each mounting region 1002a, 1002b can have one or more form-fitting profiles 904, at which the support device can be mounted in a form-fitting manner. Examples of form-fitting profiles 904 include: a depth (e.g., a groove), a protrusion, a notch (e.g., a thread), and a longitudinal groove (e.g., for a bayonet closure).

[0099] For example, multiple mounting areas 1002a, 1002b can be arranged sequentially (e.g., in a row) along reference direction 101. Alternatively or additionally, mounting areas 1002a, 1002b can be arranged equidistantly from each other.

[0100] In an exemplary embodiment, the plurality of mounting regions 1002a, 1002b may be designed in the same manner as each other, such that the support device can be mounted in a conversion mounting manner (i.e., interchangeably) from a first mounting region 1002a of the plurality of mounting regions 1002a, 1002b to a second mounting region 1002b of the plurality of mounting regions 1002a, 1002b. In other words, each mounting region 1002a, 1002b of the support device may provide at least one location (also referred to as a mounting position) in which the support device may be mounted at the mounting region.

[0101] According to various embodiments, the multiple mounting areas 1002a, 1002b may have one or more mounting areas (also referred to as multi-position mounting areas) that provide multiple mounting positions for a support device, which can (optionally) be mounted in the multi-position mounting area. Each multi-position mounting area may have more than two mounting positions, for example, arranged equidistantly from each other, arranged in a regular pattern (also referred to as a mounting grid), or merged together.

[0102] For example, the number of mounting regions 1002a, 1002b (e.g., multi-position mounting regions) in the plurality of mounting regions 1002a, 1002b of the magnet carrier 102 may be greater than the number of support portions and / or greater than two or more, such as three, four or more than four. Alternatively or additionally, the number of mounting positions in each of the plurality of mounting regions 1002a, 1002b of the magnet carrier 102 may be two or more, such as three, four or more than four.

[0103] In a preferred exemplary embodiment, each multi-position mounting area has two or more shape-fitting profiles 904 (e.g., retractions) spaced apart from each other, and each shape-fitting profile 904 provides multiple positions for mounting a support device at the multi-position mounting area. In alternative or other embodiments, one or more shape-fitting profiles of each multi-position mounting area are designed (e.g., as elongated holes, tracks, or grooves) such that the shape-fitting profile provides multiple positions for mounting a support device at the multi-position mounting area, in which the support device can be mounted (e.g., steplessly) at the multi-position mounting area. The shape-fitting profile may, for example, have two segments designed identically to each other, such that the support device can be transferred from a first mounting position at the first segment of the two segments to a second mounting position at the second segment of the two segments.

[0104] For example, two or more shape-fitting profiles 904 can be arranged sequentially along reference direction 101. More than two shape-fitting profiles 904 can be arranged equidistant from each other, for example, arranged in a regular pattern (also known as a shape-fitting grid). Two or more shape-fitting profiles 904 can be designed in the same way as each other, such that the support device can be transferred from a first mounting position at the first shape-fitting profile 904 to a second mounting position at the second shape-fitting profile 904.

[0105] In an exemplary embodiment of the mounting grid, the magnet carrier 102 provides a mounting position every 65 mm, in which (additional) support bolts 902 can be used, or support bolts 902 already installed therein can be converted for mounting.

[0106] In an exemplary embodiment, the magnet system 100 includes a tubular housing 406g having a magnet carrier 102 disposed therein. The tubular housing 406g has a housing tube 604 and two guide rails 414a, 414b disposed therein. The magnet carrier 102 can be supported at the guide rails by means of a plurality of support bolts 902 (e.g., two support bolts at each support location). For example, the support bolts 902 can be guided along or opposite to a reference direction 101 in the guide rails 414a, 414b disposed on both sides of the magnet carrier 102.

[0107] In addition to or besides the mounting grid used for the support bolts, the support bolts 902 can also be transferred steplessly (e.g., by means of elongated holes). This can certainly make installation more difficult, for example, when the spacing between the support bolts must be remeasured during installation to position them with sufficient precision.

[0108] Additional exemplary embodiments of various components of the magnet system 100 are explained below, which simplify construction and / or installation.

[0109] In an exemplary embodiment of the support device 404 (e.g., its bearing pin), the support device is made of copper and / or tin, such as their alloys (e.g., bronze), or is constructed of them. This is inexpensive. Alternatively or additionally, the support device 404 (e.g., its support bolt) is made of a non-magnetic material, such as copper, aluminum, bronze, etc., or is constructed of them. This reduces interference from magnetic fields.

[0110] In an exemplary embodiment of the support frame 414 (e.g., its guide rails), the support portion is made of iron, an alloy thereof (e.g., high-quality steel), or is made of iron. This is inexpensive. Alternatively or additionally, the support frame 414 (e.g., its guide rails) is made of a non-magnetic material, such as non-magnetic high-quality steel, or is made of non-magnetic steel. This reduces interference from magnetic fields.

[0111] In an example embodiment, one or more support devices 404 of the magnet system 100 have ball bearings. This simplifies pushing the magnet carrier 102 into the housing 406g or guide rail. For example, one or more support devices 404 of the magnet system 100 have ball bearings, such as one ball bearing for each support bolt, which is fixed at the end of the support bolt (e.g., mounted thereon).

[0112] When the system carrier is pushed into the housing 406g, using individual support bolts relative to the support rails is advantageous because it reduces friction and the magnet system is less dependent on shape and orientation tolerances. Additional advantages provided by the guide rails include: the guide rails can be connected to the housing 406g, for example, only at the end sides (i.e., self-supporting installation). Thus, the guide rails can yield slightly during system carrier installation or removal, thereby reducing the risk of jamming.

[0113] The following describes various examples related to the descriptions above and the contents shown in the accompanying figures.

[0114] Example 1 is a magnet system for a sputtering apparatus (i.e., a sputtering apparatus magnet system), which includes: (e.g., a non-magnetic) support frame; a (e.g., a non-magnetic) magnet carrier having a first mounting region and a second mounting region; a first (e.g., a non-magnetic) support device mounted on the magnet carrier by means of the first mounting region; and (e.g., a non-magnetic) second support device mounted on the magnet carrier by means of the second mounting region, wherein the first mounting region and / or the second mounting region are designed to allow for changes in (spatial) orientation (e.g., alignment and / or spacing between them), with the first and second support devices mounted relative to each other on the magnet carrier in such orientation; wherein the first and second support devices are designed to: form a support device (also called a magnet carrier support device) for supporting the magnet carrier (e.g., self-supporting between the first and second support devices) in a manner that fits together with support portions (e.g., form-fitting), such as a multi-point support device, for example, engaging with each other with support portions (e.g., form-fitting). The support device can provide, for example, multiple support points for the magnet carrier (clearly, a multi-point support device) (hence also called a multi-point support device). The magnet carrier can, for example, be self-supporting between a first support device and a second support device.

[0115] Example 2 is a magnet system according to Example 1, wherein a first mounting area of ​​the first support device provides multiple (e.g., equidistant and / or sequentially arranged in a row) mounting positions in which the first support device can be mounted at the first mounting area.

[0116] Example 3 is a magnet system according to Example 2, wherein a plurality of mounting positions are spaced apart from each other, and / or wherein the plurality of mounting positions have a first mounting position and a second mounting position, wherein a first support device may be mounted (e.g., selectively) in the first and second mounting positions at a first mounting area, wherein the first and second mounting positions are spaced apart from each other.

[0117] Example 4 is a magnet system according to Example 3, wherein the first mounting region is designed such that the first support device can be mounted at the first mounting region at each of a plurality of mounting positions (e.g., the first and second mounting positions); and / or wherein the plurality of mounting positions are equidistant and / or sequentially arranged.

[0118] Example 5 is a magnet system according to one of Examples 1 or 4, wherein a second mounting area of ​​the second support device provides a plurality of (e.g., equidistant and / or sequentially arranged in a row) additional mounting positions in which the second support device can be mounted at the second mounting area.

[0119] Example 6 is a magnet system according to Example 5, wherein a plurality of additional mounting positions are spaced apart from each other; and / or wherein the plurality of additional mounting positions have a first additional mounting position and a second additional mounting position, wherein a second support device may be mounted in the first additional mounting position and the second additional mounting position (e.g., selectively) at a second mounting area, wherein the first additional mounting position and the second additional mounting position are spaced apart from each other.

[0120] Example 7 is a magnet system according to Example 6, wherein the second mounting region is designed such that the second support device can be mounted in the second mounting region at each of the additional multiple mounting positions (e.g., additional first and additional second mounting positions); and / or wherein the multiple additional mounting positions are equidistant and / or sequentially arranged.

[0121] Example 8 is a magnet system according to one of Examples 1 to 7, wherein the first support device and / or the second support device are designed to form a floating bearing (i.e., a movable bracket) in such a way as to be spliced ​​together with a support frame (e.g., in a form-fitting manner).

[0122] Example 9 is a magnet system according to one of Examples 1 to 8, wherein the first support device and the second support device are designed in a manner of the same type as each other, such that the support devices can be installed in a manner that allows them to be interchanged.

[0123] Example 10 is a magnet system according to one of Examples 1 to 9, wherein a first support device and / or a second support device have two support members, and a magnet carrier is disposed between the two support members.

[0124] Example 11 is a magnet system according to one of Examples 1 to 10, further comprising: a plurality of magnets arranged sequentially, the magnets being carried by means of a magnet carrier, wherein the plurality of magnets arranged sequentially preferably provide a plurality of magnet rows arranged side by side and / or at least two magnetic poles (e.g., an inner pole and an outer pole surrounding the inner pole).

[0125] Example 12 is a magnet system according to one of Examples 1 to 11, wherein the first support device and / or the second support device has ball bearings, wherein the first support device and / or the second support device preferably has bolts at which the ball bearings are fixed.

[0126] Example 13 is a magnet system according to one of Examples 1 to 12, wherein a support portion (e.g., each of its guide rails) has a slot or groove profile (e.g., extending longitudinally), into which a first support device and / or a second support device engages.

[0127] Example 14 is a magnet system according to one of Examples 1 to 13, wherein a first mounting area and / or a second mounting area have a plurality of openings arranged in a grid.

[0128] Example 15 is a magnet system according to one of Examples 1 to 14, wherein a first mounting area has a first grid, and a first support device can be mounted on a magnet carrier according to the first grid; and / or wherein a second mounting area has a second grid, and a second support device can be mounted on a magnet carrier according to the second grid; wherein the first grid and the second grid are preferably designed in the same manner.

[0129] Example 16 is a magnet system according to one of Examples 1 to 15, wherein a first support device and a second support device can be mounted on a magnet carrier in a manner that is interchangeable with each other.

[0130] Example 17 is a magnet system according to one of Examples 1 to 16, wherein the support portion has one or more guide rails, and a first support device and / or a second support device are engaged in the guide rails.

[0131] Example 18 is a magnet system according to one of Examples 1 to 17, wherein the support frame and the first support device and / or the second support device are joined to each other in a form-fitting manner.

[0132] Example 19 is a magnet system according to one of Examples 1 to 18, wherein the support frame has a greater bending stiffness than the magnet carrier.

[0133] Example 20 is a magnet system according to one of Examples 1 to 19, wherein the first support device and / or the second support device has one or more protrusions, preferably one or more bolts.

[0134] Example 21 is a magnet system according to one of Examples 1 to 20, wherein a first support device and / or a second support device have two bolts, and a magnet carrier is disposed between the two bolts.

[0135] Example 22 is a magnet system according to any one of Examples 1 to 21, further comprising: a preferably tubular housing with a support frame disposed therein; wherein the support frame is preferably connected to the housing in a positionally fixed manner relative to the housing; and / or wherein the housing has a greater bending stiffness than the magnet carrier and / or the support frame.

[0136] Example 23 is a magnet system according to Example 22, wherein the housing has an opening (e.g., a housing opening) through which the magnet carrier can be introduced into the housing when the magnet carrier is engaged with the support frame; and / or wherein fluid lines are provided in the housing.

[0137] Example 24 is a magnet system according to one of Examples 1 to 23, further comprising: a plurality of magnets held by means of a magnet carrier.

[0138] Example 25 is a magnet system of Example 24, and also includes a plurality of components, each of which has: at least one magnet among a plurality of magnets; an actuator by means of which at least one magnet is coupled to a magnet carrier, wherein the actuator is designed to: manipulate in response to a change in the spatial relationship of at least one magnet relative to the magnet carrier.

[0139] Example 26 is a sputtering apparatus comprising: a support device, preferably having one or more end blocks, the support device providing a rotation axis for rotatably supporting a sputtering target; and a magnet system according to one of Examples 1 to 25, the magnet system being supported in a position-fixed manner by means of the support device relative to the rotation axis and / or the support device (e.g., supported within the sputtering target).

[0140] Example 27 is a sputtering apparatus according to Example 26, wherein the support apparatus further comprises: a fixed support for carrying a magnet system; and / or a rotating support for rotatably supporting a sputtering target.

[0141] Example 28 is a sputtering apparatus according to Example 27, wherein the support apparatus further comprises: a connector rotatably supported by means of a rotating support member, the connector being used to connect a sputtering target, wherein the connector has a through opening that exposes a fixed support member and / or the fixed support member extends into the through opening.

Claims

1. A magnet system (100) for a sputtering apparatus (300), the magnet system (100) comprising: • Support frame (414); • A magnet carrier (102) having a first mounting area (1002a) and a second mounting area (1002b); • A first support device is mounted on the magnet carrier (102) by means of the first mounting area (1002a); • A second support device, which is mounted on the magnet carrier (102) by means of the second mounting area (1002b). • The first mounting area (1002a) and / or the second mounting area (1002b) are configured such that the orientation of the first support device and the second support device relative to each other at the magnet carrier (102) can be changed; • The first support device and the second support device are spliced ​​together with the support frame (414) to form a support device for supporting the magnet carrier (102); The support frame (414) has a greater bending stiffness than the magnet carrier (102).

2. The magnet system (100) according to claim 1, wherein the first mounting area (1002a) of the first support device provides a plurality of mounting positions, wherein the first support device is capable of being mounted at the first mounting area (1002a) in the mounting positions.

3. The magnet system (100) according to claim 2, wherein the plurality of mounting positions are spaced apart from each other; wherein the plurality of mounting positions have a first mounting position and a second mounting position, and the first support device is capable of being mounted at the first mounting area (1002a) in either the first mounting position or the second mounting position, wherein the first mounting position and the second mounting position are spaced apart from each other.

4. The magnet system (100) according to claim 2 or 3, wherein the first mounting area (1002a) is configured such that the first support device can be mounted at any position among the plurality of mounting positions at the first mounting area (1002a); wherein the plurality of mounting positions are equidistantly arranged and / or sequentially arranged.

5. The magnet system (100) according to any one of claims 1 to 3, wherein the first support device and the second support device are designed in the same manner as each other, such that the first support device and the second support device are installed in a manner that allows them to be interchanged with each other.

6. The magnet system (100) according to any one of claims 1 to 3, further comprising: • A plurality of magnets arranged in sequence, the magnets being carried by means of the magnet carrier (102), wherein the plurality of magnets arranged in sequence provide a plurality of magnet rows arranged in sequence.

7. The magnet system (100) according to any one of claims 1 to 3, wherein the first support device and / or the second support device has a ball bearing, wherein the first support device and / or the second support device has a bolt, and the ball bearing is fixed at the bolt.

8. The magnet system (100) according to any one of claims 1 to 3, wherein the support frame (414) has one or more guide rails, and the first support device and / or the second support device are engaged in the guide rails.

9. The magnet system (100) of claim 8, wherein each guide rail has a slot into which the first support device and / or the second support device engages.

10. The magnet system (100) according to any one of claims 1 to 3, further comprising: • A tubular housing, in which the support frame (414) is disposed; • The support frame (414) is connected to the housing in a fixed position relative to the housing.

11. A sputtering apparatus (300), comprising: • A target support device having one or more end blocks, the target support device providing a rotation axis for rotatably supporting a sputtering target; • The magnet system (100) according to any one of claims 1 to 10, wherein the magnet system is supported in a fixed position relative to the rotation axis by means of the target support device.

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