A preparation method of a structural green glass for reducing the influence of the observation angle on the human eye

Abstract

The present invention relates to a preparation method of a structural green glass for weakening the influence of the observation angle on the human eye, which is characterized in that: S1, cleaning and drying a rigid glass substrate; S2, preparing a rough diffusing layer with an etching depth of 60-150 μm on the glass substrate by means of a sandblasting process; S3, successively preparing ZrO X N Y thin films with a refractive index of 2.0-2.2 and a thickness of 100-200 nm, a refractive index of 1.7-1.8 and a thickness of 80-140 nm, a refractive index of 2.0-2.2 and a thickness of 120-180 nm, and a refractive index of 1.7-1.8 and a thickness of 30-90 nm on the surface of the rough diffusing layer. Advantages of the present invention: The rough diffusing layer can effectively increase the diffuse reflection effect on the glass surface and improve the transmittance of the glass body; by using a reactive plasma deposition process to obtain high- and low-refractive-index dielectric layers, the damage to the microstructure of the rough diffusing layer can be reduced, and the integrity of the microstructure on the surface of the rough diffusing layer can be improved; the prepared structural green glass has a high color saturation and a wide color gamut space, and can achieve good color uniformity when observed at a reflection angle not greater than 75°.

Description

Technical Field

[0001] The present invention belongs to the technical field of glass, relates to the field of structurally colored glass, and particularly relates to a preparation method of structurally green glass that reduces the influence of the observation angle on the human eye. Background Art

[0002] Structural color is various colors generated by the scattering, diffraction or interference of light with different wavelengths by an ordered micro-nano structure. Compared with traditional pigment coloring, it has unique advantages such as bright colors, never fading, and color controllability. At present, the preparation method of forming structural green by using a single dielectric layer or multiple dielectric layers is increasingly applied to the field of photovoltaic glass, and the green photovoltaic glass prepared by this method is also widely used as a packaging material in thin-film-based battery modules, silicon-based battery modules and perovskite-based battery modules.

[0003] Different from traditional pigment coloring, when these green components are applied to building-integrated photovoltaics, the change of the observation angle will cause the change of the component color, and it is impossible to form a unified overall appearance color. In addition, the color saturation of green is low, and the color gamut space distribution is narrow. The above factors seriously restrict the popularization and application of green components in the field of building-integrated photovoltaics.

[0004] Patent Publication No. CN104736338B discloses a laminated glass window with color reflection and high daylight transmittance suitable for a solar energy system. The laminated glass window with green reflection and high daylight transmittance includes a substrate. The outer surface of the substrate forms a rough structure layer by acid etching, and an interference filter layer is prepared on its inner surface by in-line magnetron sputtering. When the interference filter layer is designed as 5 or 7 layers, the preparation process is too complicated, and when it is designed as 3 layers, the color saturation of green is relatively low. For example, the best color saturation of green given in the examples has an a value of -20.0 and a b value of 8.02, which cannot meet the increasing demand for colors in the photovoltaic building field. In addition, this method cannot solve the problem of color stability when the reflection angle is greater than 60°.

[0005] Patent Publication No. CN103144381A discloses a green low-emissivity energy-saving glass. By using the method of vacuum cathodic magnetron sputtering on a high-quality float substrate, a first bottom dielectric layer, a second barrier layer, a third dielectric layer, a fourth functional layer Ag layer, and fifth and sixth protective layers are sequentially deposited. The green low-emissivity glass prepared by this method is similar in appearance to the effect of directly depositing a low-emissivity film on the original green glass, and the transmitted color is close to neutral. However, the preparation process is cumbersome, and the functional Ag layer containing precious metals has a high cost. Summary of the Invention

[0006] The object of the present invention is to solve the problems existing in the prior art, and provide a preparation method of structural green glass that reduces the influence of the viewing angle on the human eye. This method can prepare structural green glass with uniform color, bright color, and little influence of the viewing angle.

[0007] To achieve the above object, the technical solution adopted by the present invention is as follows:

[0008] A preparation method of structural green glass that reduces the influence of the viewing angle on the human eye, characterized by comprising the following steps:

[0009] S1. Use a rigid glass substrate. First, put the glass substrate into a cleaning solution, soak it, then wash it successively with deionized water and ethanol, dry it with nitrogen, and then clean the upper surface of the glass substrate with plasma.

[0010] S2. Use a sandblasting process to prepare a rough diffusing layer on the glass substrate. The rough diffusing layer is a glass body structure layer, and the thickness, i.e., the etching depth, is 60 - 150 μm, and the surface roughness, i.e., the root mean square value Rq of the profile average deviation, is 1.1 - 10 μm.

[0011] S3. Use a reactive plasma deposition process to prepare a first high refractive index dielectric layer on the surface of the rough diffusing layer. The first high refractive index dielectric layer is a ZrO X N Y film with a thickness of 100 - 200 nm, and the refractive index range is 2.0 - 2.2.

[0012] S4. Use a reactive plasma deposition process (conformal) to prepare a second low refractive index dielectric layer on the surface of the first high refractive index dielectric layer. The second low refractive index dielectric layer is a ZrO X N Y film with a thickness of 80 - 140 nm, and the refractive index range is 1.7 - 1.8.

[0013] S5. Use a reactive plasma deposition process to prepare a third high refractive index dielectric layer on the surface of the second low refractive index dielectric layer. The third high refractive index dielectric layer is a ZrO X N Y film with a thickness of 120 - 180 nm, and the refractive index range is 2.0 - 2.2.

[0014] S6. Use a reactive plasma deposition process to prepare a fourth low refractive index dielectric layer on the surface of the third high refractive index dielectric layer. The fourth low refractive index dielectric layer is a ZrO X N Y film with a thickness of 30 - 90 nm, and the refractive index range is 1.7 - 1.8.

[0015] Further, in step S1, the cleaning solution is a mixture of hydrogen peroxide and concentrated sulfuric acid. The volume ratio of hydrogen peroxide to concentrated sulfuric acid is 3:7. The mass fraction of hydrogen peroxide is 30%. The temperature of the cleaning solution is 30 - 40°C, and the soaking time is 10 - 15 min. After soaking, it is washed 6 times successively with deionized water and ethanol.

[0016] Further, in step S1, the plasma cleaning uses a plasma cleaning device, with a single Ar gas as the carrier gas. The working pressure in the equipment chamber is maintained at 2 - 15 Pa. The working power supply uses a radio frequency power supply with a power of 100 - 300 w. The Ar gas flow rate is 10 - 20 sccm, and the etching and cleaning time is 15 - 30 min.

[0017] Further, in step S2, the sandblasting process uses a sandblasting etching machine. The nozzle diameter is 6 mm. The distance between the nozzle and the glass substrate is 5 - 40 cm. The pressure range is 0.1 - 0.5 MPa. The rotational speed of the stage is 20 - 200 r / min. The sandblasting particle size is 10 μm, and the etching time is 1 - 5 min.

[0018] Further, in steps S3 and S5, the reactive plasma deposition process uses a reactive plasma deposition device. The evaporation target is a ZrN target. The discharge gas is Ar, and the reactive gas is O 2 ₂. The working pressure in the plasma cathode chamber is 150 Pa. The working pressure in the vacuum coating chamber is 0.01 - 1 Pa. The plasma source current is 30 A. The Ar gas flow rate of the plasma source is 55 sccm. The Ar gas flow rate in the reaction chamber is 70 ccm, and the O 2 ₂ flow rate is 8 sccm, and the reaction time is 10 - 15 min.

[0019] Further, in steps S4 and S6, the reactive plasma deposition process uses a reactive plasma deposition device. The evaporation target is a ZrN target. The discharge gas is Ar, and the reactive gas is O 2 ₂. The working pressure in the plasma cathode chamber is 150 Pa. The working pressure in the vacuum coating chamber is 0.01 - 1 Pa. The plasma source current is 30 A. The Ar gas flow rate of the plasma source is 55 sccm. The Ar gas flow rate in the reaction chamber is 70 ccm, and the O 2 ₂ flow rate is 2 sccm, and the reaction time is 5 - 12 min.

[0020] Further, in step S1, the rigid glass substrate is one of float glass and rolled glass.

[0021] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0022] 1. The present invention uses a sandblasting process to form a rough diffusing layer on the glass body, which can effectively increase the diffuse reflection effect on the glass surface and improve the transmittance of the glass body; the high and low refractive index dielectric layers (i.e., the overall conformal structure layer) obtained by the reactive plasma deposition process can reduce the damage to the microstructure of the rough diffusing layer by the existing processes (such as the magnetron sputtering process), and improve the integrity of the surface microstructure of the rough diffusing layer (the magnetron sputtering process generates high-energy particles during sputtering, which will damage the surface microstructure of the bottom layer, i.e., the rough diffusing layer, during deposition, thereby reducing the color stability and uniformity of the structured colored glass).

[0023] 2. The present invention uses the combination of high and low refractive indices of the same zirconium oxynitride material to effectively expand the color gamut, increase the color saturation and extend the service life, while reducing the types of materials and process flows required for preparation, thereby reducing the production cost, and the preparation process does not include acid etching treatment that pollutes the environment.

[0024] 3. The structured green glass prepared by the present invention has high color saturation and a wide color gamut space, and the structured green glass can achieve good color uniformity when observed at a reflection angle not greater than 75°. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 is a process flow chart for preparing a structured green glass that reduces the influence of the observation angle on the human eye;

[0026] Figure 2 is a schematic structural diagram of a structured green glass that reduces the influence of the observation angle on the human eye;

[0027] Figure 3 is a surface topography diagram of the actual sample prepared in Example 1;

[0028] Figure 4 is a diagram of the actual sample prepared in Example 1;

[0029] Figure 5 is a chromaticity coordinate diagram of the actual sample prepared in Example 1;

[0030] Figure 6 is a transmittance curve diagram of the actual sample prepared in Example 1 observed at 0° and 75° angles;

[0031] Figure 7 is a reflectance curve diagram of the actual sample prepared in Example 1 observed at 0° and 75° angles. EMBODIMENTS

[0032] Combined with Figure 1 , the present invention is further described as follows:

[0033] A preparation method of a structured green glass that reduces the influence of the observation angle on the human eye, and the specific implementation steps are as follows: Example

[0034] S1. Use float glass as substrate 1. First, prepare a cleaning solution, which is a mixture of hydrogen peroxide and concentrated sulfuric acid with a volume ratio of 3:7. The mass fraction of the used hydrogen peroxide is 30%. Put substrate 1 into the cleaning solution at a temperature of 30°C. After soaking for 15 minutes, wash it 6 times successively with deionized water and absolute ethanol. After drying with nitrogen, put substrate 1 into a plasma cleaning device to clean its upper surface. Use pure Ar gas as the carrier gas. The working pressure of the device chamber is maintained at 2 Pa. The working power supply uses a radio frequency power supply with a power of 100 W. The Ar gas flow rate is 10 sccm, and the etching and cleaning time is 30 minutes;

[0035] S2. Use a sandblasting process to prepare a rough diffusing layer 2 on the upper surface of glass substrate 1. Use a sandblasting etching machine. Place substrate 1 on the stage of the sandblasting etching machine. The nozzle diameter is 6 mm. The distance between the nozzle and glass substrate 1 is 5 cm. The pressure is set to 0.1 MPa. The stage rotation speed is 20 r / min. The sandblasting particle size is 10 μm. The etching time is 1 minute to obtain the rough diffusing layer 2. This layer is a glass body structure layer, which can effectively increase the diffuse reflection effect of the glass surface and improve the transmittance of the glass body. The thickness, i.e., the etching depth, is 60 μm, and the surface roughness, i.e., the root mean square value Rq of the profile average deviation, is 1.1 μm;

[0036] S3. Use a reactive plasma deposition process to prepare a first high refractive index dielectric layer 3 on the surface of the rough diffusing layer 2. Use a reactive plasma deposition device. The evaporation target is a ZrN target. The discharge gas is Ar, and the reaction gas is O 2 , The working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.2 Pa, the plasma source current is 30 A, the plasma source Ar gas flow rate is 55 sccm, the Ar gas flow rate in the reaction chamber is 70 ccm, the O2 gas flow rate is 8 sccm, and the reaction time is 12 minutes to obtain a first high refractive index dielectric layer 3 with a refractive index of 2.2 and a thickness of 150 nm;

[0037] S4. Use a reactive plasma deposition process to prepare a second low refractive index dielectric layer 4 on the surface of the first high refractive index dielectric layer 3. Use a reactive plasma deposition device. The evaporation target is a ZrN target. The discharge gas is Ar, and the reaction gas is O 2 , The working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.1 Pa, the plasma source current is 30 A, the plasma source Ar gas flow rate is 55 sccm, the Ar gas flow rate in the reaction chamber is 70 ccm, the O2 gas flow rate is 2 sccm, and the reaction time is 10 minutes to obtain a second low refractive index dielectric layer 4 with a refractive index of 1.8 and a thickness of 120 nm;

[0038] S5. Prepare the third high refractive index dielectric layer 5 on the surface of the second low refractive index dielectric layer 4 by reactive plasma deposition process. Use a reactive plasma deposition equipment. The evaporation target is a ZrN target, the discharge gas is Ar, and the reaction gas is O 2 , the working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.2 Pa, the plasma source current is 30 A, the plasma source Ar flow rate is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, the O2 flow rate is 8 sccm, and the reaction time is 10 min. The third high refractive index dielectric layer 5 with a refractive index of 2.2 and a thickness of 130 nm is obtained;

[0039] S6. Prepare the fourth low refractive index dielectric layer 6 on the surface of the third high refractive index dielectric layer 5 by reactive plasma deposition process. Use a reactive plasma deposition equipment. The evaporation target is a ZrN target, the discharge gas is Ar, and the reaction gas is O 2 , the working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.1 Pa, the plasma source current is 30 A, the plasma source Ar flow rate is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, the O2 flow rate is 2 sccm, and the reaction time is 3 min. The fourth low refractive index dielectric layer 6 with a refractive index of 1.8 and a thickness of 40 nm is obtained.

[0040] Perform chromaticity test on the green glass of the structure for weakening the influence of the observation angle on the human eye in this embodiment. When the light is vertically incident from the upper surface of the glass along the normal direction and the observation is along the vertical incident direction, which is recorded as the 0° angle, the multi-angle colorimeter measures the color coordinate L* value as 68.0, the a* value as -50.2, and the b* value as 47.1. When observing at a 75° angle, the multi-angle colorimeter measures the color difference △L* value as 1.0%, the △a* value as 0.5%, and the △b* value as 0.5%. The total visible light transmittance is 82.6%, and the total visible light reflectance is 15.8%. Example

[0041] S1. Use rolled glass as the substrate 1. First, prepare a cleaning solution, which is a mixture of hydrogen peroxide and concentrated sulfuric acid with a volume ratio of 3:7. The mass fraction of the used hydrogen peroxide is 30%. Put the substrate 1 into the cleaning solution, the temperature of the cleaning solution is 40 °C, soak for 10 min and then wash 6 times with deionized water and absolute ethanol in sequence; after drying with nitrogen, put the substrate 1 into a plasma cleaning equipment to clean its upper surface. Use pure Ar gas as the carrier gas, the working pressure in the equipment chamber is kept at 15 Pa, the working power supply uses a radio frequency power supply with a power of 300 W, the Ar gas flow rate is 20 sccm, and the etching and cleaning time is 15 min;

[0042] S2. A rough diffusing layer 2 is prepared on the upper surface of the glass substrate 1 by means of a sandblasting process. Using a sandblasting etching machine, the substrate 1 is placed on the stage of the sandblasting etching machine. The nozzle diameter is 6 mm, the distance between the nozzle and the glass substrate 1 is 40 cm, the pressure is set at 0.5 MPa, the rotational speed of the stage is 200 r / min, the sandblasting particle size is 10 μm, and the etching time is 5 min to obtain the rough diffusing layer 2. This layer is a glass body structure layer, which can effectively increase the diffuse reflection effect on the glass surface, improve the transmittance of the glass body. The thickness, i.e., the etching depth, is 150 μm, and the surface roughness, i.e., the root mean square value Rq of the profile average deviation, is 10 μm;

[0043] S3. A first high refractive index dielectric layer 3 is prepared on the surface of the rough diffusing layer 2 by means of a reactive plasma deposition process. Using a reactive plasma deposition device, the evaporation target is a ZrN target, the discharge gas is Ar, and the reaction gas is O 2 , the working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.01 Pa, the plasma source current is 30 A, the plasma source Ar flow rate is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, the O2 flow rate is 8 sccm, and the reaction time is 12 min to obtain the first high refractive index dielectric layer 3 with a refractive index of 2.1 and a thickness of 100 nm;

[0044] S4. A second low refractive index dielectric layer 4 is prepared on the surface of the first high refractive index dielectric layer 3 by means of a reactive plasma deposition process. Using a reactive plasma deposition device, the evaporation target is a ZrN target, the discharge gas is Ar, and the reaction gas is O 2 , the working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.01 Pa, the plasma source current is 30 A, the plasma source Ar flow rate is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, the O2 flow rate is 2 sccm, and the reaction time is 11 min to obtain the second low refractive index dielectric layer 4 with a refractive index of 1.75 and a thickness of 80 nm;

[0045] S5. A third high refractive index dielectric layer 5 is prepared on the surface of the second low refractive index dielectric layer 4 by means of a reactive plasma deposition process. Using a reactive plasma deposition device, the evaporation target is a ZrN target, the discharge gas is Ar, and the reaction gas is O 2 , the working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.01 Pa, the plasma source current is 30 A, the plasma source Ar flow rate is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, the O2 flow rate is 8 sccm, and the reaction time is 15 min to obtain the third high refractive index dielectric layer 5 with a refractive index of 2.1 and a thickness of 120 nm;

[0046] S6. Prepare the fourth low-refractive-index dielectric layer 6 on the surface of the third high-refractive-index dielectric layer 5 by reactive plasma deposition process. Use a reactive plasma deposition device with a ZrN target as the evaporation target, Ar as the discharge gas, and O as the reactive gas. 2 The working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.01 Pa, the plasma source current is 30 A, the Ar flow rate of the plasma source is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, the O2 flow rate is 2 sccm, and the reaction time is 5 min. The fourth low-refractive-index dielectric layer 6 with a refractive index of 1.75 and a thickness of 30 nm is obtained.

[0047] Perform colorimetric tests on the green glass structure that reduces the influence of the observation angle on the human eye in this embodiment. When the light is perpendicularly incident from the upper surface of the glass along the normal direction and observed along the perpendicular incident direction, which is recorded as the 0° angle, the color coordinates L*, a*, and b* measured by a multi-angle color difference meter are 65.0, -48.0, and 43.2 respectively. When observed at a 75° angle, the color difference △L*, △a*, and △b* measured by the multi-angle color difference meter are 1.2%, 0.7%, and 0.7% respectively. The total visible light transmittance is 82.0%, and the total visible light reflectance is 17.0%. Example

[0048] S1. Use float glass as the substrate 1. First, prepare a cleaning solution, which is a mixture of hydrogen peroxide and concentrated sulfuric acid with a volume ratio of 3:7. The mass fraction of the hydrogen peroxide used is 30%. Place the substrate 1 in the cleaning solution at a temperature of 35°C. After soaking for 12 min, wash it 6 times successively with deionized water and absolute ethanol. After drying with nitrogen, place the substrate 1 in a plasma cleaning device to clean its upper surface. Use pure Ar gas as the carrier gas. The working pressure of the device chamber is maintained at 7 Pa, the working power supply uses a radio frequency power supply with a power of 200 W, the Ar gas flow rate is 15 sccm, and the etching and cleaning time is 23 min.

[0049] S2. Prepare a rough diffusing layer 2 on the upper surface of the glass substrate 1 by sandblasting process. Use a sandblasting etching machine. Place the substrate 1 on the stage of the sandblasting etching machine. The nozzle diameter is 6 mm, the distance between the nozzle and the glass substrate 1 is 25 cm, the pressure is set to 0.3 MPa, the stage rotation speed is 150 r / min, the sandblasting particle size is 10 μm, and the etching time is 3 min to obtain the rough diffusing layer 2. This layer is the glass body structure layer, which can effectively increase the diffuse reflection effect of the glass surface and improve the transmittance of the glass body. The thickness, i.e., the etching depth, is 120 μm, and the surface roughness, i.e., the root mean square value Rq of the profile average deviation, is 7 μm.

[0050] S3. Prepare the first high refractive index dielectric layer 3 on the surface of the rough diffusive layer 2 by reactive plasma deposition process. Use a reactive plasma deposition equipment. The evaporation target is a ZrN target, the discharge gas is Ar, and the reaction gas is O 2 , the working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 1 Pa, the plasma source current is 30 A, the plasma source Ar flow rate is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, the O2 flow rate is 8 sccm, and the reaction time is 12 min to obtain the first high refractive index dielectric layer 3 with a refractive index of 2.0 and a thickness of 200 nm;

[0051] S4. Prepare the second low refractive index dielectric layer 4 on the surface of the first high refractive index dielectric layer 3 by reactive plasma deposition process. Use a reactive plasma deposition equipment. The evaporation target is a ZrN target, the discharge gas is Ar, and the reaction gas is O 2 , the working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 1 Pa, the plasma source current is 30 A, the plasma source Ar flow rate is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, the O2 flow rate is 2 sccm, and the reaction time is 12 min to obtain the second low refractive index dielectric layer 4 with a refractive index of 1.7 and a thickness of 140 nm;

[0052] S5. Prepare the third high refractive index dielectric layer 5 on the surface of the second low refractive index dielectric layer 4 by reactive plasma deposition process. Use a reactive plasma deposition equipment. The evaporation target is a ZrN target, the discharge gas is Ar, and the reaction gas is O 2 , the working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.2 Pa, the plasma source current is 30 A, the plasma source Ar flow rate is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, the O2 flow rate is 8 sccm, and the reaction time is 10 min to obtain the third high refractive index dielectric layer 5 with a refractive index of 2.0 and a thickness of 180 nm;

[0053] S6. Prepare the fourth low refractive index dielectric layer 6 on the surface of the third high refractive index dielectric layer 5 by reactive plasma deposition process. Use a reactive plasma deposition equipment. The evaporation target is a ZrN target, the discharge gas is Ar, and the reaction gas is O 2 , the working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.1 Pa, the plasma source current is 30 A, the plasma source Ar flow rate is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, the O2 flow rate is 2 sccm, and the reaction time is 8 min to obtain the fourth low refractive index dielectric layer 6 with a refractive index of 1.7 and a thickness of 90 nm.

[0054] The green glass, which is the structure for reducing the influence of the observation angle on the human eye in this embodiment, is subjected to chromaticity testing. When light is perpendicularly incident from the upper surface of the glass along the normal direction and the observation is made along the perpendicular incident direction, which is recorded as the 0° angle, the multi-angle color difference meter measures the color coordinate L* value as 72.1, the a* value as -53.2, and the b* value as 50.1. When observed at a 75° angle, the multi-angle color difference meter measures the color difference △L* value as 1.1%, the △a* value as 0.6%, and the △b* value as 0.6%. The total visible light transmittance is 82.2%, and the total visible light reflectance is 16.8%.

[0055] The above are only the preferred embodiments of the present invention, and do not impose any form of limitation on the present invention; any person skilled in the art can make many possible changes and modifications to the technical solution of the present invention by using the methods and technical contents disclosed above without departing from the scope of the technical solution of the present invention, or modify it into an equivalent embodiment with equivalent changes. Therefore, any simple modification, equivalent replacement, equivalent change, and modification made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solution of the present invention still fall within the scope of protection of the technical solution of the present invention.

Claims

1. A preparation method of a structural green glass that reduces the influence of the observation angle on the human eye, characterized in that it includes the following steps: S1. Use a rigid glass substrate. First, put the glass substrate into a cleaning solution, soak it, then wash it successively with deionized water and ethanol, dry it with nitrogen, and then use plasma to clean the upper surface of the glass substrate; S2. Use a sandblasting process to prepare a rough diffusing layer on the glass substrate. The rough diffusing layer is a glass body structure layer, and the thickness, that is, the etching depth, is 60 - 150 μm, and the surface roughness, that is, the root mean square value Rq of the profile average deviation, is 1.1 - 10 μm; S3. Prepare a first high refractive index dielectric layer on the surface of the rough diffusive layer by reactive plasma deposition process. The first high refractive index dielectric layer is a ZrO X N Y thin film with a thickness of 100 - 200 nm and a refractive index range of 2.0 - 2.2; S4. Prepare a second low-refractive-index dielectric layer on the surface of the first high-refractive-index dielectric layer by reactive plasma deposition process. The second low-refractive-index dielectric layer is a ZrO X N Y thin film with a thickness range of 80 - 140 nm and a refractive index range of 1.7 - 1.8; S5. The third high refractive index dielectric layer is prepared on the surface of the second low refractive index dielectric layer by a reactive plasma deposition process. The third high refractive index dielectric layer is a ZrO X N Y thin film with a thickness range of 120 - 180 nm and a refractive index range of 2.0 - 2.2; S6. The fourth low refractive index dielectric layer is prepared on the surface of the third high refractive index dielectric layer by a reactive plasma deposition process. The fourth low refractive index dielectric layer is a ZrO X N Y thin film with a thickness ranging from 30 to 90 nm and a refractive index ranging from 1.7 to 1.

8.

2. The preparation method of a structural green glass that reduces the influence of the observation angle on the human eye according to claim 1, characterized in that: In step S1, the cleaning solution is a mixture of hydrogen peroxide and concentrated sulfuric acid, the volume ratio of hydrogen peroxide to concentrated sulfuric acid is 3:7, the mass fraction of hydrogen peroxide is 30%, the temperature of the cleaning solution is 30 - 40 °C, the soaking time is 10 - 15 min, and after soaking, it is washed successively with deionized water and ethanol 6 times.

3. The preparation method of a structural green glass that reduces the influence of the observation angle on the human eye according to claim 1, characterized in that: In step S1, the plasma cleaning uses a plasma cleaning device, uses a single Ar gas as the carrier gas, the working pressure of the equipment chamber is maintained at 2 - 15 Pa, the working power supply uses a radio frequency power supply, the power is 100 - 300 w, the Ar gas flow rate is 10 - 20 sccm, and the etching and cleaning time is 15 - 30 min.

4. The preparation method of a structural green glass that reduces the influence of the observation angle on the human eye according to claim 1, characterized in that: In step S2, the sandblasting process uses a sandblasting etching machine, the nozzle diameter is 6 mm, the distance between the nozzle and the glass substrate is 5 - 40 cm, the pressure range is 0.1 - 0.5 MPa, the rotational speed of the stage is 20 - 200 r / min, the sandblasting particle size is 10 μm, and the etching time is 1 - 5 min.

5. The preparation method of a structural green glass that reduces the influence of the observation angle on the human eye according to claim 1, characterized in that: In the reaction plasma deposition processes of steps S3 and S5, a reactive plasma deposition apparatus is used, the evaporation target is a ZrN target, the discharge gas is Ar, and the reaction gas is O 2 , the working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.01 - 1 Pa, the plasma source current is 30 A, the plasma source Ar flow rate is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, and the O 2 flow rate is 8 sccm, and the reaction time is 10 - 15 min.

6. The preparation method of a structural green glass that reduces the influence of the observation angle on the human eye according to claim 1, characterized in that: In the reaction plasma deposition processes in steps S4 and S6, a reaction plasma deposition apparatus is used. The evaporation target is a ZrN target, the discharge gas is Ar, and the reaction gas is O 2 , the working pressure in the plasma cathode chamber is 150 Pa, the working pressure in the vacuum coating chamber is 0.01 - 1 Pa, the plasma source current is 30 A, the Ar flow rate of the plasma source is 55 sccm, the Ar flow rate in the reaction chamber is 70 ccm, and the O 2 flow rate is 2 sccm. The reaction time is 5 - 12 min.

7. The preparation method of a structural green glass that reduces the influence of the observation angle on the human eye according to any one of claims 1 - 6, characterized in that: In step S1, the rigid glass substrate is one of float glass and rolled glass.

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