Light guide device for application to a silicon photonics structure

Abstract

The application discloses a light guide device applied to a silicon photon structure, which comprises a light transceiver and a reflection structure. The reflection structure is arranged on the light transceiver, and the reflection structure has a reflection surface facing the light transceiver, and the reflection surface is used for reflecting at least one light ray transmitted between the light transceiver and a waveguide structure of the silicon photon structure. By means of the light guide device, the complicated process of additionally forming a separate light guide component in the slot hole can be omitted, and the size of the slot hole is reduced, so that the available area on the silicon wafer is increased.

Description

TECHNICAL FIELD

[0001] The present application relates to a light guide device, in particular to a light guide device applied to a silicon photonics structure. BACKGROUND

[0002] Currently, the demand for data processing is increasing, and therefore the requirement for data transmission speed on electronic devices is also increasing. In order to improve the efficiency of signal transmission, using low-cost and low-loss silicon photonics has become one of the solutions.

[0003] In the prior art, the manufacturing of a silicon photonics component is to form a waveguide structure on a silicon wafer, so as to transmit an optical signal. The way of transmitting an optical signal is generally divided into front light guiding and side light guiding. The advantage of front light guiding is that it is easier to align the waveguide structure in the wafer, but the signal loss caused by refraction is large. The signal loss caused by side light guiding is not as large as that of front light guiding, but side light guiding is not easy to align, and when side light guiding is performed, a slot hole is usually first dug on the wafer, and then a light transceiver is inserted into the slot hole to perform the alignment action with the waveguide structure in the wafer. Further, the larger and deeper the slot hole is, the easier the alignment is, but relatively, the area of the slot hole on the silicon wafer also becomes larger, thereby compressing the usage area required for other processes of the silicon wafer.

[0004] As shown in FIG. 1, in the prior art, a light guide component with a mirror structure G can also be arranged in the slot hole. The mirror structure G can reflect the light rays L derived from the waveguide structure to the light transceiver above, but this method needs to form a separate reflection structure in the slot hole, so the process steps are relatively complicated and the size of the slot hole required is large. Figure 1

[0005] Therefore, how to properly improve to overcome the above-mentioned defects has become one of the important issues to be solved in this industry. SUMMARY

[0006] The technical problem to be solved by the present application is that the size of the slot hole in the prior art silicon photonics structure is too large, which compresses the usage area required for other processes of the silicon wafer, and the step of forming a mirror structure in the prior art silicon photonics structure is complicated, which causes the process cost to increase.

[0007] ​To solve the above technical problems, one of the technical solutions adopted by the present application is to provide a light guide device applied to a silicon photon structure, which comprises a light transceiver and a reflection structure. The reflection structure is arranged on the light transceiver, and the reflection structure has a reflection surface facing the light transceiver, and the reflection surface is used to reflect at least one light ray transmitted between the light transceiver and a waveguide structure of the silicon photon structure.

[0008] Preferably, the light guide device applied to the silicon photon structure further comprises a positioning platform, and the light transceiver is connected to the positioning platform, and the light transceiver is moved in three dimensions through the positioning platform.

[0009] Preferably, the silicon photon structure further comprises a silicon substrate, and the waveguide structure is arranged in the silicon substrate, and an upper surface of the silicon substrate forms a slot hole, and the reflection structure is used to extend into the slot hole so that the reflection surface faces the waveguide structure.

[0010] Preferably, when the reflection structure is used to extend into the slot hole, the distance between the bottom surface of the reflection structure and the bottom of the slot hole is less than the distance between the waveguide structure and the bottom of the slot hole.

[0011] Preferably, the reflection surface is a concave curved surface.

[0012] Preferably, the curved surface is a spherical surface.

[0013] To solve the above technical problems, another technical solution adopted by the present application is to provide a light guide device applied to a silicon photon structure, which comprises a positioning platform, a light transceiver and a reflection structure. The light transceiver is arranged on the positioning platform, and the light transceiver is moved in three dimensions through the positioning platform. The reflection structure is arranged on the positioning platform and adjacent to the transceiver, and the reflection structure has a reflection surface facing the light transceiver, and the reflection surface is used to reflect at least one light ray transmitted between the light transceiver and a waveguide structure of the silicon photon structure.

[0014] Preferably, the silicon photon structure further comprises a silicon substrate, and the waveguide structure is arranged in the silicon substrate, and an upper surface of the silicon substrate forms a slot hole, and the reflection structure is used to extend into the slot hole so that the reflection surface faces the waveguide structure.

[0015] Preferably, when the reflection structure is used to extend into the slot hole, the distance between the bottom surface of the reflection structure and the bottom of the slot hole is less than the distance between the waveguide structure and the bottom of the slot hole.

[0016] Preferably, the reflection surface is a concave curved surface.

[0017] Preferably, the curved surface is a spherical surface.

[0018] One of the advantages of the present application is that the light guide device for silicon photon structure provided by the present application can improve the alignment accuracy of the side light guide by arranging the reflection structure on the optical transceiver or by connecting the optical transceiver and the reflection structure through the positioning platform, so that the reflection surface of the reflection structure can reflect at least one light transmitted between the optical transceiver and a waveguide structure of the silicon photon structure. In addition, the present application eliminates the complicated process of forming a separate light guide component by coating, depositing and chemical etching in the slot hole, thereby saving cost and optimizing the light guide efficiency.

[0019] For a more complete understanding of the features and technical content of the present application, please refer to the following detailed description of the present application and the accompanying drawings. However, the provided drawings are only used for reference and illustration, and are not used to limit the present application. BRIEF DESCRIPTION OF DRAWINGS

[0020] Figure 1 A cross-sectional view of a light guide structure of the prior art.

[0021] Figure 2 A cross-sectional view of a light guide device for silicon photon structure according to the first embodiment of the present application.

[0022] Figure 3 A cross-sectional view of a light guide device for silicon photon structure according to the second embodiment of the present application. DETAILED DESCRIPTION

[0023] The following is a description of the embodiments of the present application disclosed herein, which are related to "light guide device for silicon photon structure". Those skilled in the art can understand the advantages and effects of the present application from the disclosure. The present application can be implemented or applied by other different embodiments, and the details in the description can be modified and changed based on different views and applications without departing from the concept of the present application. In addition, it should be stated in advance that the drawings of the present application are only simple schematic illustrations and are not drawn according to the actual size. The following embodiments will further illustrate the technical content of the present application, but the disclosed content is not used to limit the scope of protection of the present application.

[0024] It should be understood that although the terms "first", "second", "third" and the like may be used herein to describe various elements, these elements should not be limited by these terms. These terms are mainly used to distinguish one element from another. In addition, the term "or" used herein may include any one or a combination of the associated listed items.

[0025] First embodiment

[0026] Referring to Figure 2 As shown in FIG. 1, the embodiment of the present application provides a light guide device M applied to a silicon photonics structure A, which comprises a light transceiver 1 and a reflection structure 2. The light transceiver 1 is capable of emitting and / or receiving light. The reflection structure 2 is disposed on the light transceiver 1. The present application is not limited to the coupling manner between the reflection structure 2 and the light transceiver 1. In other embodiments, the reflection structure 2 and the light transceiver 1 can be integrally formed. The reflection structure 2 has a reflection surface 21 facing the light transceiver 1. The reflection surface 21 is capable of reflecting at least one light L transmitted between the light transceiver 1 and a waveguide structure A1 of the silicon photonics structure A.

[0027] In addition, the silicon photonics structure A comprises a silicon substrate A2, a first cover layer A3 and a second cover layer A4 in addition to the waveguide structure A1. The waveguide structure A1 is disposed in the silicon substrate A2. An upper surface A20 of the silicon substrate A2 forms a slot hole A21. For example, the silicon substrate A2 can be a silicon wafer, and the slot hole A21 can be a scribe line on the silicon wafer. In addition, during the formation of the slot hole A21, one of the two side surfaces of the slot hole A21 will form a lower surface A22 (compared to the upper surface A20) so that the surface height of the silicon substrate A2 on both sides of the slot hole A21 is different. The first cover layer A3 and the second cover layer A4 cover the surface A22 of the silicon substrate A2 on the lower side of the slot hole A21, and the waveguide structure A1 is disposed between the first cover layer A3 and the second cover layer A4 (the first cover layer A3 and the second cover layer A4 are located above and below the waveguide structure A1, respectively). The waveguide structure A1, the first cover layer A3 and the second cover layer A4 jointly constitute a side edge A5 of the adjacent slot hole A21, and the port A10 of the waveguide structure A1 for receiving and emitting light is disposed substantially flush with the side edge A5.

[0028] Continuing to refer to Figure 2 As shown in FIG. 1, the refractive index of the waveguide structure A1 is greater than the refractive index of the first cover layer A3 and the second cover layer A4, so that the light L can be emitted after multiple reflections inside the waveguide structure 2. On the other hand, the reflection structure 2 extends into the slot hole A21 so that the reflection surface 21 faces the waveguide structure A1, and the distance H1 between the bottom surface of the reflection structure 2 and the bottom of the slot hole A21 is less than the distance H2 between the waveguide structure A1 and the bottom of the slot hole A21. Therefore, the light L emitted by the waveguide structure A1 can change its path upward by the reflection surface 21 and be received by the light transceiver 1. In addition, it should be noted that, Figure 2The arrow direction of the light ray L in the figure is only for illustration and does not represent the limitation of the path of the light ray. For example, the light ray L can also be emitted by the optical transceiver 1 and, after being reflected by the reflecting surface 21, change the path to be emitted toward the waveguide structure Al and be received by the waveguide structure Al.

[0029] For example, the material of the waveguide structure Al can include lithium niobate (LiNbO3), silicon-on-insulator (SOI), or silicon compound, and the material of the first cover layer A3 and the second cover layer A4 can include silicon dioxide (SiO2), but the present application is not limited thereto. In other embodiments, the material of the second cover layer A4 and the first cover layer A3 can also be different. The slot hole A21 can be formed by a semiconductor process or laser engraving, but the present application is not limited thereto. In addition, the profile of the slot hole A21 is generally in the shape of a U or V, and the average width is less than 60 μm. That is, compared with the slot hole formed in the silicon substrate in the prior art, the width of which is about 300 μm and the depth is 100 μm, the light guide structure of the present application does not need to form an additional light guide component in the slot hole A21, so the size of the formed slot hole A21 can be minimized as much as possible to reserve more available area of the silicon wafer (i.e. the silicon substrate 1).

[0030] For example, the optical transceiver 1 can be a fiber transceiver, which is a device for converting short-distance electrical signals and long-distance optical signals. The optical transceiver 1 includes a transmitting end and a receiving end, and signals are emitted from the transmitting end and transmitted over long distances through an optical fiber. In addition, for example, the reflecting surface 21 is a concave curved surface, and preferably the curved surface is a spherical surface. Therefore, the curvature of the reflecting surface 21 is equal to the curvature of the spherical surface. It should be noted that, since the reflecting surface 21 is a curved surface, the reflecting surface 21 can also be a curved surface with other curvatures, such as an elliptical surface, but the present application is not limited thereto. Figure 2 The figure is a cross-sectional view, so Figure 2 The curvature of the reflecting surface 21 of the reflecting structure 2 in the figure is also equal to the curvature of a circle. In the present application, the curvature of the reflecting surface 21 of the reflecting structure 2 is not limited to the curvature of a circle, and in an embodiment, it can be the curvature of an ellipse.

[0031] In addition, the light guide device M also includes a positioning platform 3, and the optical transceiver 1 is arranged on the positioning platform 3. For example, the positioning platform 3 is a three-dimensional moving platform designed according to a rectangular coordinate system, or the positioning platform 3 can also be a three-dimensional moving platform designed according to a circular coordinate system or a cylindrical coordinate system, and the present application is not limited to the form of the positioning platform 3. Further, the positioning platform 3 can be electrically connected to a control device D, so that the user can control the movement of the optical transceiver 1 by operating the control device D. That is, the optical transceiver 1 can be moved in three dimensions by the positioning platform 3.

[0032] Second embodiment

[0033] Referring to Figure 3 as shown, Figure 3 the light guide device M shown in the figure Figure 2 has a similar structure, which will not be repeated. Comparing Figure 3 with Figure 2 , it can be seen Figure 3 that the light guide device M mainly includes an optical transceiver 1, a reflection structure 2, and a positioning platform 3. The reflection structure 2 has a reflection surface 21 facing the optical transceiver 1. The reflection structure 2 is used to extend into the slot hole A21 so that the reflection surface 21 faces the waveguide structure A1, so that the reflection surface 21 is used to reflect at least one light ray L transmitted between the optical transceiver 1 and a waveguide structure A1 of the silicon photon structure A. In this embodiment, the structure of the reflection surface 21 and the relative position of the reflection structure 2 in the slot hole A21 are the same as those of the first embodiment, which will not be repeated here. The positioning platform 3, such as but not limited to a three-dimensional moving platform of a rectangular coordinate system, a circular coordinate system, or a cylindrical coordinate system, can connect the optical transceiver 1 and the reflection structure 2. The positioning platform 3 can be electrically connected to a control device D, so that the user can control the positioning platform 3 to move the optical transceiver 1 and the reflection structure 2 by operating the control device D, so that the optical transceiver 1 and the reflection structure 2 move in three dimensions, and the user can adjust the relative position between the optical transceiver 1 and the reflection structure 2 by operating the control device D, in other words, the optical transceiver 1 and the reflection structure 2 can be accurately aligned by the positioning platform 3, so that the light ray L can be accurately transmitted between the optical transceiver 1 and the waveguide structure A1.

[0034] Advantages of the embodiments

[0035] The application has the advantages that the light guide device M applied to the silicon photon structure A can set the reflection structure 2 on the optical transceiver 1, or connect the optical transceiver 1 and the reflection structure 2 through the positioning platform 3, so that the reflection surface 21 of the reflection structure 2 can reflect at least one light ray L transmitted between the optical transceiver 1 and a waveguide structure A1 of the silicon photon structure A, which improves the inaccurate alignment of the side light guide in the prior art, and eliminates the need for additional complex processes such as coating, deposition, and chemical etching in the slot hole A21 to form a separate light guide component, thereby saving costs and optimizing light guide efficiency.

[0036] The above disclosure is only the preferred and feasible embodiments of the application, and does not limit the protection scope of the claims of the application, so any equivalent technical changes made according to the content of the specification and drawings of the application are included in the protection scope of the claims of the application.

Claims

1. A light guide device applied to a silicon photonics structure, characterized by, The light guide device comprises: a light transceiver; and a reflection structure arranged on the light transceiver, the reflection structure having a reflection surface facing the light transceiver, the reflection surface being configured to reflect at least one light ray transmitted between the light transceiver and a waveguide structure of the silicon photonics structure; wherein the silicon photonics structure further comprises a silicon substrate, the waveguide structure being arranged in the silicon substrate, an upper surface of the silicon substrate forming a slot hole, the slot hole having a bottom; wherein the reflection structure extends into the slot hole such that the reflection surface faces the waveguide structure, and a distance exists between a bottom surface of the reflection structure and the bottom of the slot hole; wherein a width of the slot hole is less than 60 μm.

2. The light guide for use in a silicon photonics structure according to claim 1, wherein, The light guide device further comprises a positioning platform, the light transceiver being connected to the positioning platform, the light transceiver being capable of three-dimensional movement via the positioning platform.

3. The light guide for use in a silicon photonics structure according to claim 1, wherein, When the reflection structure is used to extend into the slot hole, the distance between the bottom surface of the reflection structure and the bottom of the slot hole is less than the distance between the waveguide structure and the bottom of the slot hole.

4. The light guide for use in a silicon photonics structure of claim 1, wherein, The reflection surface is a concave curved surface.

5. The light guide for use in a silicon photonics structure according to claim 4, wherein, The curved surface is a spherical surface.

6. A light guiding device for application to a silicon photonics structure, characterized in that, The light guide device comprises: a light transceiver; a reflection structure having a reflection surface facing the light transceiver, the reflection surface being configured to reflect at least one light ray transmitted between the light transceiver and a waveguide structure of the silicon photonics structure; and a positioning platform configured to connect the light transceiver and the reflection structure, the light transceiver and the reflection structure being capable of three-dimensional movement and adjusting the relative positions of each other via the positioning platform; wherein the silicon photonics structure further comprises a silicon substrate, the waveguide structure being arranged in the silicon substrate, an upper surface of the silicon substrate forming a slot hole, the slot hole having a bottom; wherein the reflection structure extends into the slot hole such that the reflection surface faces the waveguide structure, and a distance exists between a bottom surface of the reflection structure and the bottom of the slot hole; wherein a width of the slot hole is less than 60 μm.

7. The light guide for use in a silicon photonics structure according to claim 6, wherein, The silicon photonics structure further comprises a silicon substrate, the waveguide structure being arranged in the silicon substrate, an upper surface of the silicon substrate forming a slot hole, the reflection structure being configured to extend into the slot hole such that the reflection surface faces the waveguide structure.

8. The light guide for use in a silicon photonics structure according to claim 7, wherein, When the reflection structure is used to extend into the slot hole, the distance between the bottom surface of the reflection structure and the bottom of the slot hole is less than the distance between the waveguide structure and the bottom of the slot hole.

9. The light guide for use in a silicon photonics structure of claim 6, wherein, The reflection surface is a concave curved surface.

10. The light guide for use in a silicon photonics structure according to claim 9, wherein, The curved surface is a spherical surface.

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