A kind of anti-disproportionation reaction system for preparing trichlorosilane

Abstract

The present invention relates to the technical field of polysilicon production, and in particular to a deproportionation reaction system for preparing trichlorosilane, wherein a material input pipe is connected to a deproportionation reaction column 1 through a pipeline 1; a material input pipe is connected to a deproportionation reaction column 2 through a pipeline 2; a material input pipe is connected to a deproportionation reaction column 3 through a pipeline 3; a material inlet 1 is provided on a mixer 1; a material inlet 2 is provided on a mixer 2; a connecting pipe 1 is respectively connected to pipeline 1, pipeline 2, pipeline 3, mixer 1 and mixer 2; a material output pipe is connected to a deproportionation reaction column 1 through a pipeline 4; a material output pipe is connected to a deproportionation reaction column 2 through a pipeline 5; a material output pipe is connected to an output port of a deproportionation reaction column 3 through a pipeline 6; a connecting pipe 2 is respectively connected to pipeline 4, pipeline 5, pipeline 6, mixer 1 and mixer 2. The present invention can fully utilize the adsorption and catalytic properties of deproportionation resin and extend the service life of deproportionation resin.

Description

Technical Field

[0001] The invention relates to the technical field of polysilicon production, and in particular to a deproportionation reaction system for preparing trichlorosilane. Background Art

[0002] At present, most polysilicon enterprises use the modified Siemens method to produce polysilicon. Trichlorosilane is the basic raw material for producing polysilicon. In order to improve the quality of polysilicon, the purity of trichlorosilane is required to be high. Polysilicon manufacturers generally use the chemical process of silicon dichloride to obtain trichlorosilane. Silicon dichloride from the external system is mixed with silicon tetrachloride and silicon tetrachloride returned from the pre-separation system according to a certain molar ratio or mass ratio, and then sent to the anti-disproportionation reaction column. The anti-disproportionation reaction column is controlled within a certain temperature range. Under the action of anti-disproportionation resin as a catalyst, silicon dichloride reacts with silicon tetrachloride to form trichlorosilane. The catalyst used for anti-disproportionation is mainly a macroporous ion exchange resin loaded with ammonia and ammonium salts, which has the function of catalysis and adsorption of boron impurities.

[0003] In the distillation process system of the prior art, the anti-disproportionation reaction column is operated as a single column, and a single column is on standby; however, when the boron impurity content brought by the distillation process is too high, the boron impurities cannot be effectively removed by a single anti-disproportionation reaction column; moreover, when the anti-disproportionation reaction column is in operation, once the boron impurities at the anti-disproportionation outlet exceed the standard, it is considered that the anti-disproportionation resin has failed and needs to be replaced. At this time, the performance of the anti-disproportionation resin as a catalyst is not fully utilized, resulting in a waste of resources; or the catalytic performance of the anti-disproportionation resin fails, resulting in a decrease in the outlet conversion rate, which exceeds the index, then the anti-disproportionation resin is considered to have failed and needs to be replaced. At this time, the adsorption performance of the anti-disproportionation resin is not fully utilized, which also causes a waste of resources. Summary of the invention

[0004] In view of this, the present invention provides a deproportionation reaction system for preparing trichlorosilane, the main purpose of which is to fully utilize the adsorption and catalytic properties of the deproportionation resin, extend the service life of the deproportionation resin, and reduce the waste of the deproportionation resin.

[0005] In order to achieve the above object, the present invention mainly provides the following technical solutions:

[0006] An embodiment of the present invention provides a deproportionation reaction system for preparing trichlorosilane, comprising: a deproportionation reaction column 1, a deproportionation reaction column 2, a deproportionation reaction column 3, a mixer 1, a mixer 2, a material input pipe, a connecting pipe 1, a connecting pipe 2 and a material output pipe;

[0007] The material input pipe is connected to the input port of the anti-disproportionation reaction column 1 through the pipeline 1; the pipeline 1 is provided with a control valve 1; the material input pipe is connected to the input port of the anti-disproportionation reaction column 2 through the pipeline 2; the pipeline 2 is provided with a control valve 19; the material input pipe is connected to the input port of the anti-disproportionation reaction column 3 through the pipeline 3; the pipeline 3 is provided with a control valve 2;

[0008] The input end of the mixer 1 is provided with a control valve 9; the output end of the mixer 1 is provided with a control valve 7; the mixer 1 is provided with a material inlet 1;

[0009] The input end of the mixer 2 is provided with a control valve 11; the output end of the mixer 1 is provided with a control valve 8; the mixer 2 is provided with a material inlet 2;

[0010] The connecting pipe 1 is respectively connected with the pipeline 1, the pipeline 2, the pipeline 3, the output end of the mixer 1 and the output end of the mixer 2;

[0011] The connecting pipe 1 for connecting the pipeline 1 with the output end of the mixer 1 is provided with a control valve 6;

[0012] The connecting pipe 1 for connecting the pipeline 2 with the output end of the mixer 1 is provided with a control valve 5;

[0013] A control valve 4 is provided on the connecting pipe 1 for connecting the pipeline 2 with the output end of the mixer 2;

[0014] The connecting pipe 1 for connecting the pipeline 3 with the output end of the mixer 2 is provided with a control valve 3;

[0015] The pipeline 2 is provided with a control valve 20; the control valve 20 is arranged between the connecting pipe 1 and the material input pipe;

[0016] The material output pipe is connected to the output port of the anti-disproportionation reaction column 1 through the pipeline 4; the pipeline 4 is provided with a control valve 17; the material output pipe is connected to the output port of the anti-disproportionation reaction column 2 through the pipeline 5; the pipeline 5 is provided with a control valve 10; the material output pipe is connected to the output port of the anti-disproportionation reaction column 3 through the pipeline 6; the pipeline 6 is provided with a control valve 18;

[0017] The connecting pipe 2 is respectively connected with the pipeline 4, the pipeline 5, the pipeline 6, the input end of the mixer 1 and the input end of the mixer 2;

[0018] The connecting pipe 1 for connecting the pipeline 4 with the input end of the mixer 1 is provided with a control valve 12;

[0019] A control valve 13 is provided on the connecting pipe 1 for connecting the pipeline 5 with the input end of the mixer 1;

[0020] A control valve 14 is provided on the connecting pipe 1 for connecting the pipeline 5 with the input end of the mixer 2;

[0021] The connecting pipe 1 for connecting the pipeline 6 with the input end of the mixer 2 is provided with a control valve 15;

[0022] The pipeline five is provided with a control valve sixteen; the control valve sixteen is arranged between the connecting pipe two and the material output pipe.

[0023] Further, the control valve one, the control valve two, the control valve three, the control valve four, the control valve five, the control valve six, the control valve seven, the control valve eight, the control valve nine, the control valve ten, the control valve eleven, the control valve twelve, the control valve thirteen, the control valve fourteen, the control valve fifteen, the control valve sixteen, the control valve seventeen, the control valve eighteen, the control valve nineteen and the control valve twenty are all electric valves.

[0024] Further, it also includes: a control device;

[0025] The control device is connected to the control valve one, the control valve two, the control valve three, the control valve four, the control valve five, the control valve six, the control valve seven, the control valve eight, the control valve nine, the control valve ten, the control valve eleven, the control valve twelve, the control valve thirteen, the control valve fourteen, the control valve fifteen, the control valve sixteen, the control valve seventeen, the control valve eighteen, the control valve nineteen and the control valve twenty respectively for control.

[0026] Furthermore, a flow monitoring device 1 is provided on the material input pipe.

[0027] Furthermore, a flow monitoring device 2 is provided on the material inlet 1.

[0028] Furthermore, a flow monitoring device three is provided on the material inlet two.

[0029] Furthermore, the flow monitoring device 1, the flow monitoring device 2 and the flow monitoring device 3 are respectively connected to the control device.

[0030] Furthermore, a sampling port 1 is provided on the pipeline 4; and a sampling valve 1 is provided on the sampling port 1.

[0031] Furthermore, a sampling port 2 is provided on the pipeline 5; and a sampling valve 2 is provided on the sampling port 2.

[0032] Furthermore, a sampling port three is provided on the pipeline six; and a sampling valve three is provided on the sampling port three.

[0033] By means of the above technical solution, the anti-disproportionation reaction system for preparing trichlorosilane of the present invention has at least the following advantages:

[0034] The adsorption and catalytic performance of the anti-disproportionate resin can be fully utilized, the service life of the anti-disproportionate resin can be extended, and the waste of the anti-disproportionate resin can be reduced.

[0035] The above description is only an overview of the technical solution of the present invention. In order to more clearly understand the technical means of the present invention and implement it according to the contents of the specification, the following is a detailed description of the preferred embodiments of the present invention in conjunction with the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] Figure 1 A schematic diagram of a deproportionation reaction system for preparing trichlorosilane provided in one embodiment of the present invention;

[0037] Figure 2 A schematic diagram of a deproportionation reaction system for preparing trichlorosilane is provided in accordance with another embodiment of the present invention.

[0038] As shown in the figure:

[0039] 101 is an anti-disproportionation reaction column 1, 102 is an anti-disproportionation reaction column 2, 103 is an anti-disproportionation reaction column 3, 201 is a mixer 1, 202 is a mixer 2, 301 is a material inlet 1, 302 is a material inlet 2, 401 is a material input pipe, 402 is a material output pipe, 501 is a sampling valve 1, 502 is a sampling valve 2, 503 is a sampling valve 3, 1 is a control valve 1, 2 is a control valve 2, 3 is a control valve 3, 4 is a control valve 4, 5 is a control valve 5, 6 is a control valve 6, 7 is a control valve 7, 8 is a control valve 8, 9 is a control valve 9, 10 is a control valve 10, 11 is a control valve 11, 12 is a control valve 12, 13 is a control valve 13, 14 is a control valve 14, 15 is a control valve 15, 16 is a control valve 16, 17 is a control valve 17, 18 is a control valve 18, 19 is a control valve 19, and 20 is a control valve 20. DETAILED DESCRIPTION

[0040] In order to further explain the technical means and effects adopted by the present invention to achieve the predetermined invention purpose, the specific implementation methods, structures, features and effects of the present invention application are described in detail below in conjunction with the accompanying drawings and preferred embodiments. In the following description, different "one embodiment" or "embodiment" does not necessarily refer to the same embodiment. In addition, specific features, structures, or characteristics in one or more embodiments may be combined in any suitable form.

[0041] like Figure 1 and Figure 2 As shown, an embodiment of the present invention provides an anti-disproportionation reaction system for preparing trichlorosilane, comprising: an anti-disproportionation reaction column 101, an anti-disproportionation reaction column 2 102, an anti-disproportionation reaction column 3 103, a mixer 1 201, a mixer 202, a material input pipe 401, a connecting pipe 1, a connecting pipe 2 and a material output pipe 402; the material input pipe 401 is connected to the input port of the anti-disproportionation reaction column 101 through a pipe 1; a control valve 1 is provided on the pipe 1; the material input pipe 401 is connected to the input port of the anti-disproportionation reaction column 2 102 through a pipe 2 The pipe 2 is connected to the input port of the anti-disproportionation reaction column 3 103; a control valve 2 is provided on the pipe 3; a control valve 9 is provided on the input end of the mixer 201; a control valve 7 is provided on the output end of the mixer 201; a material inlet 301 is provided on the mixer 201; a control valve 11 is provided on the input end of the mixer 202; a control valve 8 is provided on the output end of the mixer 201; a material inlet 302 is provided on the mixer 202;

[0042] The connecting pipe one is connected with pipeline one, pipeline two, pipeline three, the output end of mixer one 201 and the output end of mixer two 202 respectively; the connecting pipe one for connecting pipeline one with the output end of mixer one 201 is provided with a control valve six 6; the connecting pipe one for connecting pipeline two with the output end of mixer one 201 is provided with a control valve five 5; the connecting pipe one for connecting pipeline two with the output end of mixer two 202 is provided with a control valve four 4; the connecting pipe one for connecting pipeline three with the output end of mixer two 202 is provided with a control valve three 3; the pipeline two is provided with a control valve twenty 20; the control valve twenty 20 is provided between the connecting pipe one and the material input pipe 401.

[0043] The material output pipe 402 is connected to the output port of the anti-disproportionation reaction column 1 101 through the pipeline 4; the control valve 17 17 is arranged on the pipeline 4; the material output pipe 402 is connected to the output port of the anti-disproportionation reaction column 2 102 through the pipeline 5; the control valve 10 10 is arranged on the pipeline 5; the material output pipe 402 is connected to the output port of the anti-disproportionation reaction column 3 103 through the pipeline 6; the control valve 18 18 is arranged on the pipeline 6; the connecting pipe 2 is respectively connected to the pipeline 4, the pipeline 5, the pipeline 6, the input end of the mixer 1 201 and the input end of the mixer 2 202; A control valve 12 is provided on the connecting pipe 1 for connecting the pipeline 4 and the input end of the mixer 1 201; a control valve 13 is provided on the connecting pipe 1 for connecting the pipeline 5 and the input end of the mixer 1 201; a control valve 14 is provided on the connecting pipe 1 for connecting the pipeline 5 and the input end of the mixer 2 202; a control valve 15 is provided on the connecting pipe 1 for connecting the pipeline 6 and the input end of the mixer 2 202; a control valve 16 is provided on the pipeline 5; the control valve 16 is provided between the connecting pipe 2 and the material output pipe 402.

[0044] When control valve 1, control valve 5, control valve 7, control valve 9, control valve 10, control valve 12, control valve 16, and control valve 19 are opened, the remaining valves are closed; dichlorosilane is first removed from impurities through the anti-disproportionation reaction column 101, and then mixed with silicon tetrachloride in the mixer 201, and then passed into the anti-disproportionation reaction column 2 102 for anti-disproportionation reaction and impurity removal. Only dichlorosilane is passed into the anti-disproportionation reaction column 101, and the anti-disproportionation resin in the anti-disproportionation reaction column 101 mainly functions to adsorb boron impurities; a mixture of dichlorosilane and silicon tetrachloride is passed into the anti-disproportionation reaction column 2 102, and at this time, the anti-disproportionation resin in the anti-disproportionation reaction column 2 102 plays a role in adsorbing and removing boron impurities and catalysis.

[0045] When control valve 1, control valve 3, control valve 4, control valve 5, control valve 7, control valve 9, control valve 12, and control valve 18 are opened, the remaining valves are closed; dichlorosilane is first removed from impurities through the anti-disproportionation reaction column 101, and then mixed with silicon tetrachloride in the mixer 201, and then passed into the anti-disproportionation reaction column 3 103 for anti-disproportionation reaction and impurity removal. Only dichlorosilane is passed into the anti-disproportionation reaction column 101, and the anti-disproportionation resin in the anti-disproportionation reaction column 101 mainly functions to adsorb boron impurities, and a mixture of dichlorosilane and silicon tetrachloride is passed into the anti-disproportionation reaction column 3 103; at this time, the anti-disproportionation resin in the anti-disproportionation reaction column 3 103 plays a role in adsorbing and removing boron impurities and catalysis.

[0046] When control valve 3 3, control valve 8 8, control valve 10 10, control valve 11 11, control valve 14 14, control valve 18 18, control valve 19 19, control valve 20 20 are opened, the other valves are closed; dichlorosilane is first removed by anti-disproportionation reaction column 2 102, and then mixed with silicon tetrachloride in mixer 2 202, and then passed into anti-disproportionation reaction column 3 103 for anti-disproportionation reaction and impurity removal. Only dichlorosilane is passed into anti-disproportionation reaction column 2 102, and the anti-disproportionation resin in anti-disproportionation reaction column 2 102 mainly functions to adsorb boron impurities; a mixture of dichlorosilane and silicon tetrachloride is passed into anti-disproportionation reaction column 3 103, and the anti-disproportionation resin in anti-disproportionation reaction column 3 103 plays a role in adsorbing and removing boron impurities and catalysis.

[0047] When control valve 6, control valve 7, control valve 9, control valve 10, control valve 13, control valve 17, control valve 19, control valve 20 are opened, the other valves are closed; dichlorosilane is first removed by anti-disproportionation reaction column 2 102, and then mixed with silicon tetrachloride in mixer 1 201, and then passed into anti-disproportionation reaction column 101 for anti-disproportionation reaction and impurity removal. Only dichlorosilane is passed into anti-disproportionation reaction column 2 102, and the anti-disproportionation resin in anti-disproportionation reaction column 2 102 mainly functions to adsorb boron impurities; a mixture of dichlorosilane and silicon tetrachloride is passed into anti-disproportionation reaction column 101, and the anti-disproportionation resin in anti-disproportionation reaction column 101 plays a role in adsorbing and removing boron impurities and catalysis.

[0048] When control valve 2, control valve 4, control valve 5, control valve 6, control valve 8, control valve 11, control valve 15, and control valve 17 are opened, the remaining valves are closed; dichlorosilane is first removed from impurities by anti-disproportionation reaction column 3 103, and then mixed with silicon tetrachloride in mixer 202, and then passed into anti-disproportionation reaction column 1 101 for anti-disproportionation reaction and impurity removal. Only dichlorosilane is passed into anti-disproportionation reaction column 3 103, and the anti-disproportionation resin in anti-disproportionation reaction column 3 103 mainly functions to adsorb boron impurities; a mixture of dichlorosilane and silicon tetrachloride is passed into anti-disproportionation reaction column 1 101, and the anti-disproportionation resin in anti-disproportionation reaction column 1 101 plays a role in adsorbing and removing boron impurities and catalysis.

[0049] When control valve 2, control valve 4, control valve 8, control valve 10, control valve 11, control valve 15, control valve 16, and control valve 19 are opened, the remaining valves are closed; dichlorosilane is first removed from impurities by anti-disproportionation reaction column 3 103, and then mixed with silicon tetrachloride in mixer 202, and then passed into anti-disproportionation reaction column 2 102 for anti-disproportionation reaction and impurity removal. Only dichlorosilane is passed into anti-disproportionation reaction column 3 103, and the anti-disproportionation resin in anti-disproportionation reaction column 3 103 mainly functions to adsorb boron impurities; a mixture of dichlorosilane and silicon tetrachloride is passed into anti-disproportionation reaction column 2 102, and the anti-disproportionation resin in anti-disproportionation reaction column 2 102 plays a role in adsorbing and removing boron impurities and catalysis.

[0050] An embodiment of the present invention provides a deproportionation reaction system for preparing trichlorosilane, which can fully utilize the adsorption and catalytic properties of the deproportionation resin, extend the service life of the deproportionation resin, and reduce the waste of the deproportionation resin.

[0051] An embodiment of the present invention provides a deproportionation reaction system for preparing trichlorosilane, wherein dichlorodihydrosilane first passes through a first deproportionation reaction column to adsorb boron impurities, and then is mixed with silicon tetrachloride and enters a second deproportionation reaction column to adsorb boron impurities again, thereby achieving the purpose of double adsorption and improving the removal effect of boron impurities.

[0052] An embodiment of the present invention provides a deproportionation reaction system for preparing trichlorosilane. During operation, dichlorodihydrosilane first passes through a deproportionation reaction column 101, where deproportionation resin is used for adsorption and boron removal, and then enters a mixer 201 and is mixed with silicon tetrachloride before entering a deproportionation reaction column 2 102. In the deproportionation reaction column 2 102, deproportionation resin is used for secondary boron removal and deproportionation reaction. When the boron impurity content at the outlet of the deproportionation reaction column 101 exceeds the standard, the original operation mode is changed, and dichlorodihydrosilane is removed. First, it passes through the anti-disproportionation reaction column 2 102, where the anti-disproportionation resin in the anti-disproportionation reaction column 2 102 performs adsorption and boron removal, then enters the mixer 1 201 and mixes with silicon tetrachloride before entering the anti-disproportionation reaction column 101, where the anti-disproportionation resin in the anti-disproportionation reaction column 101 performs secondary boron removal and anti-disproportionation reaction; when the anti-disproportionation reaction column 1 101 or the anti-disproportionation reaction column 2 102 fails, the anti-disproportionation reaction column 3 103 is activated, and the failed anti-disproportionation reaction column 1 101 or the anti-disproportionation reaction column 2 102 is used as a spare column to replace the resin. The functions of the anti-disproportionation reaction column 1 101, the anti-disproportionation reaction column 2 102, and the anti-disproportionation reaction column 3 103 are switched to each other, and the catalytic performance and adsorption performance of the anti-disproportionation resin are fully utilized, the service life of the anti-disproportionation resin is extended, and the efficiency is improved.

[0053] According to practice, the volume of the anti-disproportionation reaction column 101, the anti-disproportionation reaction column 2 102 and the anti-disproportionation reaction column 3 103 is 6 cubic meters, and 4 cubic meters of resin are installed inside; the flow rate of dichlorosilane is controlled at 1m³ / h, and the boron impurities are first adsorbed through the anti-disproportionation reaction column 101, and then mixed with silicon tetrachloride with a flow rate of 2m³ / h and enter the anti-disproportionation reaction column 2 102 to adsorb boron impurities and perform anti-disproportionation reaction. When the performance of part of the resin in the anti-disproportionation reaction column 101 or the anti-disproportionation reaction column 2 102 fails, the operation mode is changed, and the dichlorosilane first enters the anti-disproportionation reaction column 2 102, and then mixes with silicon tetrachloride and enters the anti-disproportionation reaction column 101, and continues to be used until the adsorption performance and catalytic performance of the resin in the anti-disproportionation reaction column 101 or the anti-disproportionation reaction column 2 102 are completely invalid, and then replaced. At this time, the average service life of the anti-disproportionation resin can be extended by 3 months.

[0054] As a preferred embodiment of the above-mentioned embodiments, control valve 1, control valve 2, control valve 3, control valve 4, control valve 5, control valve 6, control valve 7, control valve 8, control valve 9, control valve 10, control valve 11, control valve 12, control valve 13, control valve 14, control valve 15, control valve 16, control valve 17, control valve 18, control valve 19, and control valve 20 are all electric valves to facilitate the control of each control valve. Further preferably, an embodiment of the present invention provides an anti-disproportionation reaction system for preparing trichlorosilane, which also includes: a control device; the control device is connected to control valve 1, control valve 2, control valve 3, control valve 4, control valve 5, control valve 6, control valve 7, control valve 8, control valve 9, control valve 10, control valve 11, control valve 12, control valve 13, control valve 14, control valve 15, control valve 16, control valve 17, control valve 18, control valve 19, and control valve 20, respectively, and can realize automatic control of each control valve.

[0055] As a preferred embodiment of the above, a flow monitoring device 1 is provided on the material input pipe 401, which is used to monitor the flow of dichlorosilane input by the material input pipe 401, so as to facilitate automatic control. Further preferably, a flow monitoring device 2 is provided on the material inlet 1 301, which is used to monitor the flow of silicon tetrachloride input to the mixer 1 201, so as to facilitate automatic control. Further preferably, a flow monitoring device 3 is provided on the material inlet 2 302, which is used to monitor the flow of silicon tetrachloride input to the mixer 2 202, so as to facilitate automatic control. Further preferably, the flow monitoring device 1, the flow monitoring device 2 and the flow monitoring device 3 are respectively connected to the control device, so as to record and analyze the flow data through the control device, and each control valve can also be controlled according to the data.

[0056] As a preferred embodiment of the above embodiment, a sampling port 1 is provided on the pipeline 4; a sampling valve 1 501 is provided on the sampling port 1, and the sampling valve 1 501 is used to control the opening and closing of the sampling port 1, so as to facilitate sampling and detection of the material after adsorption or anti-disproportionation reaction output by the anti-disproportionation reaction column 101.

[0057] Further preferably, a sampling port 2 is provided on the pipeline 5; a sampling valve 2 502 is provided on the sampling port 2, and the sampling valve 2 502 is used to control the opening and closing of the sampling port 2, so as to facilitate sampling and testing of the material after adsorption or anti-disproportionation reaction output by the anti-disproportionation reaction column 2 102.

[0058] Further preferably, a sampling port three is provided on the pipeline six; a sampling valve three 503 is provided on the sampling port three, and the sampling valve three 503 is used to control the opening and closing of the sampling port three, so as to facilitate sampling and detection of the material after adsorption or anti-disproportionation reaction output by the anti-disproportionation reaction column three 103.

[0059] Further explanation, although the terms first, second, etc. can be used to describe various elements in this article, these terms should not limit these elements. These terms are only used to distinguish one element from another element. For example, the first element can be called the second element, and, similarly, the second element can be called the first element, and these terms are only used to distinguish one element from another element. This does not depart from the scope of exemplary embodiments. Similarly, element one and element two do not represent the order of elements, and these terms are only used to distinguish one element from another element. As used herein, the term "and / or" includes any combination and all combinations of one or more associated listed items.

[0060] In the description of the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0061] The standard parts used in the present invention can all be purchased from the market, and special-shaped parts can be customized according to the instructions and the drawings. The specific connection methods of each part adopt conventional means such as mature bolts, rivets, welding, etc. in the prior art. Machinery, parts and equipment all adopt conventional models in the prior art, and the circuit connection adopts the conventional connection method in the prior art, which will not be described in detail here.

[0062] The above description is only a preferred embodiment of the present invention and does not limit the present invention in any form. Any simple modification, equivalent change and modification made to the above embodiment according to the technical essence of the present invention still falls within the scope of the technical solution of the present invention.

Claims

1. A deproportionation reaction system for preparing trichlorosilane, characterized in that: Dichlorosilane first passes through the anti-disproportionation reaction column 1, and is adsorbed and removed by the anti-disproportionation resin in the anti-disproportionation reaction column 1, and then enters the mixer 1 and is mixed with silicon tetrachloride and then enters the anti-disproportionation reaction column 2, and the anti-disproportionation resin in the anti-disproportionation reaction column 2 undergoes an anti-disproportionation reaction; when the boron impurity content at the outlet of the anti-disproportionation reaction column 1 exceeds the standard, the original operation mode is changed, and the dichlorosilane first passes through the anti-disproportionation reaction column 2, and is adsorbed and removed by the anti-disproportionation resin in the anti-disproportionation reaction column 2, and then enters the mixer 1 and is mixed with silicon tetrachloride and then enters the anti-disproportionation reaction column 1, and the anti-disproportionation resin in the anti-disproportionation reaction column 1 undergoes an anti-disproportionation reaction; when the anti-disproportionation reaction column 1 or the anti-disproportionation reaction column 2 fails, the anti-disproportionation reaction column 3 is activated, and the failed anti-disproportionation reaction column 1 or the anti-disproportionation reaction column 2 is used as a spare column to replace the resin.

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