Transparent display device

Abstract

A transparent display device can reduce or minimize light transmission loss due to a touch sensor and a touch line, and can ensure separation of a touch sensor electrode of the touch sensor from a cathode electrode of a light emitting element. The transparent display device includes a substrate provided with a plurality of transmission regions and a non-transmission region including a plurality of light emitting regions; a plurality of light emitting elements disposed in the plurality of light emitting regions of the substrate, respectively, including an anode electrode, a light emitting layer, and a cathode electrode; a plurality of touch sensors disposed in the plurality of transmission regions of the substrate, respectively, including a touch sensor electrode; and a first undercut structure arranged along an edge of the transmission region to separate the cathode electrode from the touch sensor electrode, including a plurality of eaves.

Description

Technical Field

[0001] This disclosure relates to transparent display devices. Background Technology

[0002] Recently, research has been actively conducted on transparent display devices in which users can view objects or images positioned on opposite sides of the display device. The transparent display device includes a display area for displaying images, wherein the display area may include a transmissive area and a non-transmissive area capable of transmitting external light, and the transmissive area may have high light transmittance.

[0003] Transparent display devices can be equipped with multiple touch sensors and multiple touch lines to achieve touch functionality. However, the problem with transparent display devices is that it is not easy to form multiple touch sensors and multiple touch lines, or the manufacturing process is complex, and the light transmittance may be reduced due to the multiple touch sensors and multiple touch lines. Summary of the Invention

[0004] This disclosure was made in view of the above problems, and the purpose of this disclosure is to provide a transparent display device that can reduce or minimize the loss of light transmittance caused by touch sensors and touch lines.

[0005] Another object of this disclosure is to provide a transparent display device that ensures the separation of the touch sensor electrode of the touch sensor from the cathode electrode of the light-emitting element.

[0006] In addition to the purposes set forth above, other purposes and features of this disclosure will be readily apparent to those skilled in the art from the following description of this disclosure.

[0007] According to one aspect of this disclosure, the above and other objectives can be achieved by providing a transparent display device comprising: a substrate having a plurality of transmissive regions and a non-transmissive region including a plurality of light-emitting regions; a plurality of light-emitting elements respectively disposed in the plurality of light-emitting regions on the substrate, including an anode electrode, a light-emitting layer and a cathode electrode; a plurality of touch sensors respectively disposed in the plurality of transmissive regions on the substrate, including touch sensor electrodes; and a first undercut structure disposed along the edge of the transmissive regions to separate the cathode electrodes from the touch sensor electrodes, including a plurality of eaves. Attached Figure Description

[0008] The above and other objects, features and advantages of this disclosure will become more clearly understood from the following detailed description taken in conjunction with the accompanying drawings, in which:

[0009] Figure 1 This is a plan view showing a transparent display panel;

[0010] Figure 2It shows the setting Figure 1 A schematic diagram illustrating an example of pixels in region A;

[0011] Figure 3 It shows the setting Figure 2 A view of examples of signal lines, touch lines, and touch sensors in area B;

[0012] Figure 4 It is a view showing the connection relationship between multiple touch blocks and multiple touch lines;

[0013] Figure 5 It is a view showing the connection relationship between multiple touch lines and multiple touch sensors in a touch area;

[0014] Figure 6 It is shown Figure 3 A cross-sectional view of an example of the I-I' line;

[0015] Figure 7 This is a view showing an example of setting up a cathode electrode, a touch sensor electrode, and a metal pattern;

[0016] Figure 8 It shows the setting Figure 6 An enlarged view of the first undercut structure in region D;

[0017] Figure 9 It is shown Figure 3 A magnified view of an example in region C;

[0018] Figure 10 It is shown Figure 9 A cross-sectional view of an example of line II-II';

[0019] Figure 11 It is shown Figure 3 A magnified view of another example of region C;

[0020] Figure 12 It is shown Figure 11 A cross-sectional view of an example of line III-III';

[0021] Figure 13 It is shown Figure 3 A cross-sectional view of another example of line I-I';

[0022] Figure 14 It shows the setting Figure 13 An enlarged view of an example of the first undercut structure in region E;

[0023] Figure 15 This is a view showing the encapsulation layer disposed in the first undercut structure when the first undercut structure includes a single eave;

[0024] Figure 16 It shows the setting Figure 13 An enlarged view of another example of the first undercut structure in region E; and

[0025] Figures 17A to 17G illustrate the formation Figure 13 A view of the process of the first undercut structure. Detailed Implementation

[0026] The advantages and features of this disclosure, and its implementation methods, will become clearer from the following description of embodiments in conjunction with the accompanying drawings. However, this disclosure may be implemented in various forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided to make this disclosure thorough and complete, and to fully convey the scope of this disclosure to those skilled in the art. Furthermore, this disclosure is defined only by the scope of the claims.

[0027] The shapes, dimensions, ratios, angles, and numbers disclosed in the accompanying drawings used to describe embodiments of this disclosure are merely examples, and therefore, this disclosure is not limited to the details shown. Throughout the specification, the same reference numerals refer to the same elements. In the following description, detailed descriptions of relevant known functions or configurations will be omitted where it is determined that such descriptions would unnecessarily obscure the focus of this disclosure. Where terms such as “comprising,” “having,” and “including” are used in this specification, additional terms may be added unless “only” is used. Unless otherwise stated, singular terms may include plural forms.

[0028] When interpreting a component, it is interpreted as including a range of errors, although this is not explicitly described.

[0029] When describing positional relationships, such as when the positional relationship is described as "above", "over", "below", and "next to", one or more parts may be arranged between two other parts, unless "only" or "directly" is used.

[0030] It should be understood that although the terms "first," "second," etc., may be used herein to describe various elements, these elements should not be limited by these terms. These terms are used only to distinguish one element from another. For example, without departing from the scope of this disclosure, a first element may be referred to as a second element, and similarly, a second element may be referred to as a first element.

[0031] In describing the elements of this disclosure, the terms “first,” “second,” etc., may be used. These terms are intended to identify the corresponding element from other elements, and the basis, order, or number of the corresponding elements is not limited by these terms. The statement that an element is “connected” or “coupled” to another element should be understood to mean that the element can be directly connected or coupled to the other element, but unless specifically mentioned otherwise, it can be directly connected or coupled to another element, or a third element can be inserted between the corresponding elements.

[0032] Features of various embodiments of this disclosure may be coupled or combined with each other in part or in whole, and may interoperate with each other and be technically driven in various ways as will be fully understood by those skilled in the art. Embodiments of this disclosure may be performed independently of each other or may be performed together in an interdependent relationship.

[0033] Figure 1 This is a schematic plan view showing a transparent display panel.

[0034] In the following text, the X-axis represents the line parallel to the scan line, the Y-axis represents the line parallel to the data line, and the Z-axis represents the height direction of the transparent display device 100.

[0035] Although the specification has been described based on an embodiment of the transparent display device 100 according to this disclosure as an organic light-emitting display device, the transparent display device 100 may be implemented as a liquid crystal display device, a plasma display panel (PDP), a quantum dot light-emitting display (QLED) or an electrophoretic display device.

[0036] Reference Figure 1 According to one embodiment of the present disclosure, a transparent display device 100 includes a transparent display panel 110. The transparent display panel 110 may include a display area DA provided with pixels for displaying images and a non-display area NDA for not displaying images.

[0037] The display area DA can be provided with a first signal line SL1, a second signal line SL2, and pixels. The non-display area NDA can be provided with a pad area PA and at least one gate driver 205, and pads are provided in the pad area PA.

[0038] The first signal line SL1 may extend in a first direction (e.g., the Y-axis direction). The first signal line SL1 may intersect with the second signal line SL2 in the display area DA. The second signal line SL2 may extend in the display area DA in a second direction (e.g., the X-axis direction). Pixels may be disposed in the area where the first signal line SL1 is disposed, or in the area where the first signal line SL1 and the second signal line SL2 intersect each other, and emit predetermined light to display an image.

[0039] Gate driver 205 is connected to the scan line and supplies scan signals to the scan line. Gate driver 205 can be disposed in the non-display area NDA on one or both sides of the display area DA of the transparent display panel 110 by means of in-panel gate driver (GIP) or tape-on auto-pack (TAB) method.

[0040] In addition to the first signal line SL1, the second signal line SL2, and the pixels, the transparent display panel 110 may also include touch lines and a touch sensor to enable touch functionality. See below for further details. Figures 2 to 12 Describe the touch line and touch sensor in detail.

[0041] Figure 2 It shows the setting Figure 1 A schematic diagram of an example of pixels in region A. Figure 3 It shows the setting Figure 2 A diagram showing examples of signal lines, touch lines, and touch sensors in region B.

[0042] Reference Figure 2 and Figure 3 The display area DA includes a transmissive area TA and a non-transmissive area NTA. The transmissive area TA is the area through which most external incident light passes, while the non-transmissive area NTA is the area through which most external incident light cannot pass. Due to the transmissive area TA, users can view objects or backgrounds arranged on the rear surface of the transparent display panel 110.

[0043] The non-transmissive region NTA may include a first non-transmissive region NTA1, a second non-transmissive region NTA2, and a plurality of pixels P. Pixels P may be located in the first non-transmissive region NTA1, or in the overlapping region of the first non-transmissive region NTA1 and the second non-transmissive region NTA2, and pixel P emits predetermined light to display an image. The emitting region EA may correspond to the region in pixel P from which light is emitted.

[0044] like Figure 2 As shown, each of pixel P may include at least one of a first sub-pixel SP1, a second sub-pixel SP2, a third sub-pixel SP3, and a fourth sub-pixel SP4. The first sub-pixel SP1 may include a first emitting region EA1 that emits light of a first color. The second sub-pixel SP2 may include a second emitting region EA2 that emits light of a second color. The third sub-pixel SP3 may include a third emitting region EA3 that emits light of a third color. The fourth sub-pixel SP4 may include a fourth emitting region EA4 that emits light of a fourth color.

[0045] The first to fourth light-emitting regions EA1, EA2, EA3, and EA4 can emit different colors of light. For example, the first light-emitting region EA1 can emit green light. The second light-emitting region EA2 can emit red light. The third light-emitting region EA3 can emit blue light. The fourth light-emitting region EA4 can emit white light. However, the light-emitting regions are not limited to this example. Each pixel P can also include sub-pixels that emit light of colors other than red, green, blue, and white. Furthermore, the arrangement order of sub-pixels SP1, SP2, SP3, and SP4 can be changed in various ways.

[0046] The first non-transmissive region NTA1 may extend in the display region DA in a first direction (e.g., the Y-axis direction) and may be configured to at least partially overlap with the light-emitting regions EA1, EA2, EA3, and EA4. A plurality of first non-transmissive regions NTA1 may be provided in the transparent display panel 110, and a transmissive region TA may be provided between two adjacent first non-transmissive regions NTA1. In the first non-transmissive region NTA1, a first signal line SL1 extending in the first direction (e.g., the Y-axis direction) and a touch line TL extending in the first direction (e.g., the Y-axis direction) may be spaced apart from each other.

[0047] For example, the first signal line SL1 may include at least one of the pixel power line VDDL, the common power line VSSL, the reference line REFL, and the data lines DL1, DL2, DL3, and DL4.

[0048] The pixel power line VDDL can supply a first power supply to the driving transistor DTR of each of the sub-pixels SP1, SP2, SP3, and SP4 located in the display area DA. The first power supply can be an anode power supply.

[0049] The common power line VSSL can supply a second power supply to the cathode electrodes of sub-pixels SP1, SP2, SP3, and SP4 located in the display area DA. In this case, the second power supply can be a cathode power supply. The cathode power supply can be a common power supply commonly supplied to sub-pixels SP1, SP2, SP3, and SP4.

[0050] The common power line VSSL can supply a second power source to the cathode electrode through the cathode contact portion CCT. The cathode contact portion CCT can be disposed between the transmission region TA and the common power line VSSL. The power connection line VCL can be disposed between the common power line VSSL and the cathode contact portion CCT. One end of the power connection line VCL can be connected to the common power line VSSL through the first contact hole CH1, and the other end can be connected to the cathode contact portion CCT. The cathode electrode can be connected to the cathode contact portion CCT. Therefore, the cathode electrode can be electrically connected to the common power line VSSL through the power connection line VCL and the cathode contact portion CCT.

[0051] The reference line REFL supplies initialization voltage (or reference voltage) to the driving transistor DTR of each of the sub-pixels SP1, SP2, SP3, and SP4 located in the display area DA. The reference line REFL can be positioned between multiple data lines DL1, DL2, DL3, and DL4. For example, the reference line REFL can be positioned at the center of the multiple data lines DL1, DL2, DL3, and DL4, that is, between the second data line DL2 and the third data line DL3.

[0052] The reference line REFL can branch and connect to multiple sub-pixels SP1, SP2, SP3, and SP4. Specifically, the reference line REFL can be connected to the circuit elements of multiple sub-pixels SP1, SP2, SP3, and SP4 to supply an initialization voltage (or reference voltage) to each of the sub-pixels SP1, SP2, SP3, and SP4.

[0053] When the reference line REFL is positioned close to the edge of the first non-transmissive region NTA1, the deviation between the connection lengths of the circuit elements from the branch point to the plurality of sub-pixels SP1, SP2, SP3, and SP4 is increased. In a transparent display panel 110 according to one embodiment of the present disclosure, the reference line REFL is positioned in the middle region of the first non-transmissive region NTA1, thereby reducing or minimizing the deviation between the connection lengths of the circuit elements to each of the plurality of sub-pixels SP1, SP2, SP3, and SP4. Therefore, the reference line REFL can uniformly supply signals to the circuit elements of the plurality of sub-pixels SP1, SP2, SP3, and SP4.

[0054] Each of the data lines DL1, DL2, DL3, and DL4 can supply a data voltage to sub-pixels SP1, SP2, SP3, and SP4. For example, the first data line DL1 can supply a first data voltage to the first driving transistor of the first sub-pixel SP1, the second data line DL2 can supply a second data voltage to the second driving transistor of the second sub-pixel SP2, the third data line DL3 can supply a third data voltage to the third driving transistor of the third sub-pixel SP3, and the fourth data line DL4 can supply a fourth data voltage to the fourth driving transistor of the fourth sub-pixel SP4.

[0055] In a transparent display panel 110 according to one embodiment of the present disclosure, touch lines TL may be further provided in a first non-transmissive region NTA1. At least two touch lines TL may be provided in a first non-transmissive region NTA1. When multiple touch lines TL are provided in the transmissive region TA of the transparent display panel 110, the light transmittance may be degraded due to the multiple touch lines TL.

[0056] Furthermore, slits, particularly elongated linear or rectangular shapes, can be provided between the multiple touch lines TL. When external light passes through the slits, diffraction may occur. According to diffraction, when light passes through the slits, light corresponding to a plane wave can be transformed into a spherical wave, and interference may occur within the spherical wave. Therefore, constructive and destructive interferences occur within the spherical wave, resulting in irregular light intensity for the external light passing through the slits. Consequently, in the transparent display panel 110, the sharpness of objects or images located on opposite sides may be reduced. For this reason, the multiple touch lines TL are preferably located in the first non-transmissive region NTA1, rather than in the transmissive region TA.

[0057] like Figure 3 As shown, multiple touch lines TL can be arranged between the first signal line SL1 in the first non-transmissive region NTA1 and the transmissive region TA. For example, six touch lines TL1, TL2, TL3, TL4, TL5, and TL6 can be arranged in one first non-transmissive region NTA1. Three of the six touch lines TL1, TL2, and TL3 can be arranged between the pixel power line VDDL and the transmissive region TA, and the other three touch lines TL4, TL5, and TL6 can be arranged between the common power line VSSL and the transmissive region TA, but are not limited to this arrangement. It is required that the multiple touch lines TL do not overlap with the circuit regions CA1, CA2, CA3, and CA4 in which circuit elements are disposed, and various modifications can be made according to the arrangement order of the multiple touch lines TL and the first signal line SL1.

[0058] According to one embodiment of this disclosure, a transparent display panel 110 includes pixels P between adjacent transmissive regions TA, and each pixel P may include light-emitting regions EA1, EA2, EA3, and EA4 in which light-emitting elements are disposed to emit light. Since the non-transmissive regions NTA in the transparent display panel 110 are small, circuit elements can be configured to at least partially overlap with the light-emitting regions EA1, EA2, EA3, and EA4. That is, the light-emitting regions EA1, EA2, EA3, and EA4 may include circuit regions CA1, CA2, CA3, and CA4 in which circuit elements are disposed.

[0059] For example, the circuit region may include: a first circuit region CA1, wherein a circuit element connected to a first sub-pixel SP1 is provided; a second circuit region CA2, wherein a circuit element connected to a second sub-pixel SP2 is provided; a third circuit region CA3, wherein a circuit element connected to a third sub-pixel SP3 is provided; and a fourth circuit region CA4, wherein a circuit element connected to a fourth sub-pixel SP4 is provided.

[0060] In a transparent display panel 110 according to one embodiment of the present disclosure, multiple touch lines TL do not overlap with circuit regions CA1, CA2, CA3 and CA4, thereby reducing or minimizing the parasitic capacitance of the touch lines TL caused by circuit elements.

[0061] Furthermore, the transparent display panel 110 according to one embodiment of this disclosure can reduce the horizontal distance difference between touch lines TL. Since at least two transistors and capacitors are disposed in circuit regions CA1, CA2, CA3, and CA4, it may be difficult for the touch lines TL to be formed into a straight line in circuit regions CA1, CA2, CA3, and CA4, and it may be difficult to have a constant horizontal distance. Therefore, the horizontal distance difference between touch lines TL increases, thereby potentially resulting in very low uniformity of parasitic capacitance.

[0062] In a transparent display panel 110 according to one embodiment of the present disclosure, the touch lines TL can be configured not to overlap with the circuit regions CA1, CA2, CA3 and CA4, thereby reducing the influence of circuit elements and simultaneously reducing the horizontal distance difference between the touch lines TL to improve the uniformity of parasitic capacitance.

[0063] The second non-transmissive region NTA2 may extend in the display region DA in a second direction (e.g., the X-axis direction) and may be configured to at least partially overlap with the light-emitting regions EA1, EA2, EA3, and EA4. A plurality of second non-transmissive regions NTA2 may be provided in the transparent display panel 110, and a transmissive region TA may be provided between two adjacent second non-transmissive regions NTA2. The second signal line SL2 and the touch bridge wiring TBL may be configured to be spaced apart from each other in the second non-transmissive regions NTA2.

[0064] The second signal line SL2 may extend in a second direction (e.g., the X-axis direction) and may include, for example, a scan line SCANL. The scan line SCANL may supply scan signals to the sub-pixels SP1, SP2, SP3, and SP4 of pixel P.

[0065] The touch bridge connector TBL can connect any one of multiple touch lines TL to a touch sensor TS. The touch bridge connector TBL can be connected to any one of the multiple touch lines TL via the second contact hole CH2. Furthermore, the touch bridge connector TBL can extend in a second direction (e.g., the X-axis direction) while simultaneously connecting to at least two touch sensors TS extending in the second direction (e.g., the X-axis direction).

[0066] In one embodiment, the touch bridge wiring TBL may include multiple layers, such as two layers. The touch bridge wiring TBL may include a first touch bridge wiring disposed in a first layer in a region overlapping with the first non-transmissive region NTA1, and a second touch bridge wiring disposed in a second layer in a region not overlapping with the first non-transmissive region NTA1. A first touch bridge wiring may be connected at one end to a second touch bridge wiring via a third contact hole CH3, and at the other end to another second touch bridge wiring via a fourth contact hole CH4. For example, the first layer may be the same layer as the gate electrode of the driving transistor, and the second layer may be the same layer as the source and drain electrodes of the driving transistor.

[0067] In a transparent display panel 110 according to one embodiment of the present disclosure, multiple touch lines TL can be provided in a first non-transmissive region NDA1 that is not a second non-transmissive region NTA2, thereby preventing the light transmittance from deteriorating due to the multiple touch lines TL. Figure 3 As shown, a second non-transmissive region NTA2 extending in a second direction (e.g., the X-axis direction) intersects with adjacent transmissive regions TA. When the width of the second non-transmissive region NTA2 intersecting with the transmissive region TA increases, the size of the transmissive region TA necessarily decreases.

[0068] When multiple touch lines TL are arranged in the second non-transmissive region NTA2, the width of the second non-transmissive region NTA2 increases to accommodate a large number of lines, and the size of the transmissive region TA decreases. That is, the light transmittance of the transparent display panel 110 may be reduced due to the multiple touch lines TL.

[0069] In a transparent display panel 110 according to one embodiment of the present disclosure, multiple touch lines TL are arranged in a first non-transmissive region NTA1, and a single touch bridge wire TBL for connecting multiple touch sensors TS is provided in a second non-transmissive region NTA2. Therefore, the transparent display panel 110 according to one embodiment of the present disclosure can reduce or minimize the reduction in the size of the transmissive region TA or the reduction in light transmittance caused by the multiple touch lines TL and the touch bridge wire TBL.

[0070] A touch sensor TS can be disposed in a transmission area TA. The touch sensor TS can be disposed in each of multiple transmission areas TA, and its capacitance may change during user contact. A touch driver (not shown) can be connected to multiple touch sensors TS via multiple touch lines TL to detect changes in the capacitance of the multiple touch sensors TS.

[0071] In the following text, reference will be made to Figure 4 and Figure 5 This section describes in more detail the connection relationships between multiple touch sensors (TS), multiple touch lines (TL), and multiple touch bridge wires (TBL).

[0072] Figure 4 This diagram illustrates the connection relationships between multiple touch blocks and multiple touch lines. Figure 5 This is a diagram showing the connection relationship between multiple touch lines and multiple touch sensors in a touch block.

[0073] Reference Figures 4 to 5 According to one embodiment of this disclosure, the transparent display panel 110 may include a plurality of touch blocks TB. Each of the plurality of touch blocks TB may include a plurality of pixels P and a plurality of transmissive regions TA, wherein the plurality of transmissive regions TA are configured to correspond one-to-one with the plurality of pixels P as basic units for determining the user's touch position. For example, each of the plurality of touch blocks TB may include 12×15 pixels P and 12×15 touch sensors TS. In this case, when the image resolution is 1920×1080, the touch resolution may be 160×72.

[0074] In this case, the touch sensor TS may include a touch sensor electrode TSE. The touch sensor electrode TSE may include the same material as the cathode electrode CE of the pixel P in the same layer. In this configuration, the touch sensor electrode TSE and the cathode electrode CE can be spaced apart from each other.

[0075] In a transparent display panel 110 according to one embodiment of the present disclosure, when each of the plurality of touch lines TL is connected to one of the plurality of touch blocks TB, a change in capacitance of a touch sensor TS disposed in the connected touch block TB can be sensed. That is, the plurality of touch lines TL disposed in the transparent display panel 110 can correspond one-to-one with the plurality of touch blocks TB. Therefore, in the transparent display panel 110, the number of touch lines TL can be the same as the number of touch blocks TB. For example, when the number of touch blocks TB is 160×72, the number of touch lines TL can also be 160×72, and can be connected to the touch driver TIC.

[0076] As described above, in order to form the same number of touch lines TL as the number of touch blocks TB, at least two touch lines TL should be provided in a first non-transmissive area NTA1. For example, when the image resolution is 1920×1080 and the touch resolution is 160×72, six touch lines TL1, TL2, TL3, TL4, TL5 and TL6 can be provided in a first non-transmissive area NDA1, such as... Figure 3 As shown, this is to form 160×72 touch lines TL in the transparent display panel 110.

[0077] like Figure 5 As shown, multiple touch sensors TS disposed in a touch block TB can be connected to one of multiple touch lines TL disposed in the touch block TB. For example, twelve first non-transmissive regions NTA1 can be disposed in a touch block TB, and six touch lines TL1, TL2, TL3, TL4, TL5, and TL6 can be disposed in each of the twelve first non-transmissive regions NTA1. Therefore, a touch block TB can be provided with 72 touch lines TL1, ..., TL72. In this case, the multiple touch sensors TS disposed in a touch block TB can be connected to a specific touch line TL among the 72 touch lines TL1, ..., TL72. At this time, the specific touch line TL can be connected to the multiple touch sensors TS arranged in the second direction (e.g., the X-axis direction) through a touch bridge wire TBL extending in the second direction (e.g., the X-axis direction). Therefore, the multiple touch sensors TS disposed in a touch block TB can be electrically connected through the specific touch line TL and the touch bridge wire TBL.

[0078] Each of the multiple touch lines TL can correspond one-to-one with a touch block TB. Therefore, multiple touch blocks TB are connected to different touch lines and are thus electrically isolated from each other. Each touch line TL can connect multiple touch sensors TS disposed in the corresponding touch block TB to the touch driver TIC. Specifically, each touch line TL can transmit the changing capacitance provided by the touch sensors TS disposed in the touch block TB to the touch driver TIC. The touch driver TIC can sense the changing capacitance and determine the user's touch position. Furthermore, each touch line TL can provide the sensing voltage generated by the touch driver TIC to the touch sensors TS disposed in the touch block TB.

[0079] In the following text, reference will be made to Figures 6 to 12 The light-emitting element of the light-emitting area EA, the touch sensor TS of the transmission area TA, and the connection relationship between the touch sensor and the touch bridge cable TBL are described in more detail.

[0080] Figure 6 It is shown Figure 3 A cross-sectional view of line I-I' as an example. Figure 7 This is a diagram showing an example with a cathode electrode, a touch sensor electrode, and a metal pattern. Figure 8 It shows the setting Figure 6 An enlarged view of the first undercut structure in region D.

[0081] Reference Figure 3 as well as Figures 6 to 8 The first non-transmissive region NTA1 includes circuit regions CA1, CA2, CA3, and CA4 in which at least one transistor and a capacitor are disposed. The first non-transmissive region NTA1 may be provided with pixel power lines VDDL, common power lines VSSL, reference lines REFL, data lines DL, and touch lines TL, which extend in a first direction (Y-axis direction) and are configured not to overlap with circuit regions CA1, CA2, CA3, and CA4. The second non-transmissive region NTA2 may include touch bridge wiring TBL and scan lines SCANL extending in a second direction (X-axis direction).

[0082] At least one transistor may include a drive transistor DTR and a switching transistor. The switching transistor may be switched according to a scan signal supplied to the scan line SCANL to charge a capacitor with the data voltage supplied from the data line DL.

[0083] The driving transistor DTR switches according to the data voltage charged in the capacitor to generate data current from the power supply provided by the pixel power line VDDL, and supplies the data current to the first electrode 120 of sub-pixels SP1, SP2, SP3, and SP4. The driving transistor DTR may include an active layer ACT, a gate electrode GE, a source electrode SE, and a drain electrode DE.

[0084] like Figure 6 As shown, a light-shielding layer LS can be disposed above the first substrate 111. The light-shielding layer LS can be used to shield external light incident on the active layer ACT in the region where the driving transistor DTR is disposed. The light-shielding layer LS may comprise a single layer or multiple layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu) or alloys thereof.

[0085] According to one embodiment of the present disclosure, a transparent display panel 110 may form at least one of pixel power lines VDDL, common power lines VSSL, reference lines REFL, data lines DL, and touch lines TL in the same layer as the light shielding layer LS. For example, some of the reference lines REFL, common power lines VSSL, and touch lines TL may include the same material as the light shielding layer LS, and may be disposed in the same layer as the light shielding layer LS, but are not limited thereto.

[0086] A buffer layer BF can be disposed above the optical shielding layer LS. The buffer layer BF is used to protect the transistor DTR from water that permeates through the first substrate 111, which is easily permeable by water, and the buffer layer BF may include inorganic layers, such as silicon oxide layer (SiOx), silicon nitride layer (SiNx), or a multilayer of silicon oxide layer and silicon nitride layer.

[0087] An active layer ACT for driving transistor DTR can be disposed above the buffer layer BF. The active layer ACT can include silicon-based semiconductor materials or oxide-based semiconductor materials.

[0088] A gate insulating layer GI can be disposed above the active layer ACT of the driving transistor DTR. The gate insulating layer GI can be disposed in the non-transmissive region NTA and the transmissive region TA. The gate insulating layer GI may include inorganic layers, such as silicon oxide layers (SiOx), silicon nitride layers (SiNx), or multiple layers of silicon oxide layers and silicon nitride layers.

[0089] The gate electrode GE of the driving transistor DTR can be disposed above the gate insulating layer GI. The gate electrode GE of the driving transistor DTR may comprise a single layer or multiple layers made of one or an alloy of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd) and copper (Cu).

[0090] An interlayer dielectric layer (ILD) can be disposed above the gate electrode GE of the driving transistor DTR. The ILD can be disposed within the non-transmissive region NTA and the transmissive region TA. However, the ILD can have a first opening region OA1 that exposes the gate insulating layer GI or the buffer layer BF along the edge of the transmissive region TA, thereby forming a first undercut structure UC1 in the transmissive region TA. The ILD can include inorganic layers, such as silicon oxide (SiOx), silicon nitride (SiNx), or a multilayer of silicon oxide and silicon nitride layers.

[0091] The source electrode SE and drain electrode DE of the driving transistor DTR can be disposed above the interlayer dielectric layer ILD. The source electrode SE and drain electrode DE of the driving transistor DTR can be connected to the active layer ACT of the driving transistor DTR through a fifth contact hole CH5, which passes through the gate insulating layer GI and the interlayer dielectric layer ILD. The source electrode SE and drain electrode DE of the driving transistor DTR can be made of a single layer or multiple layers made of one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd) and copper (Cu) or their alloys.

[0092] In a transparent display panel 110 according to one embodiment of the present disclosure, at least one of the pixel power line VDDL, common power line VSSL, reference line REFL, data line DL, and touch line TL can be disposed in the same layer as the source electrode SE and drain electrode DE of the driving transistor DTR. For example, the pixel power line VDDL, data line DL, and touch line TL can be made of the same material as the source electrode SE and drain electrode DE in the same layer as the source electrode SE and drain electrode DE, but are not limited thereto.

[0093] A first passivation layer PAS1 for insulating the driving transistor DTR can be disposed above the source electrode SE and drain electrode DE. The first passivation layer PAS1 can be disposed in the non-transmissive region NTA and the transmissive region TA. However, the first passivation layer PAS1 can have a first opening region OA1, which is formed to expose the gate insulating layer GI or the buffer layer BF along the edge of the transmissive region TA to form a first undercut structure UC1. Figure 6 and Figure 8As shown, the first opening region OA1 of the first passivation layer PAS1 may at least partially overlap with the first opening region OA1 of the interlayer dielectric layer ILD, but is not limited thereto.

[0094] A second passivation layer PAS2 can be disposed above the first passivation layer PAS1. The second passivation layer PAS2 can be disposed in the non-transmissive region NTA and the transmissive region TA. However, in order to form the first undercut structure UC1, a second opening region OA2 can be formed along the edge of the transmissive region TA, similar to the first opening region OA1 of the first passivation layer PAS1. In this case, the second opening region OA2 can overlap with at least a portion of the first opening region OA1 of the first passivation layer PAS1.

[0095] The first passivation layer PAS1 and the second passivation layer PAS2 may include inorganic layers, such as silicon oxide layer (SiOx), silicon nitride layer (SiNx), or multiple layers thereof.

[0096] A planarization layer PLN can be disposed above the second passivation layer PAS2 to flatten the step difference caused by the driving transistor DTR and multiple signal lines. The planarization layer PLN can be disposed in the non-transmissive region NTA. The planarization layer PLN can be provided with a third opening region OA3, which overlaps with the transmissive region TA to form a first undercut structure UC1. In this case, the third opening region OA3 can overlap with at least a portion of the first opening region OA1 of the first passivation layer PAS1 and at least a portion of the second opening region OA2 of the second passivation layer PAS2. Furthermore, the third opening region OA3 can completely overlap with the touch sensor TS.

[0097] The planarization layer PLN may include an organic layer, such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin.

[0098] According to one embodiment of this disclosure, a transparent display panel 110 can form a first undercut structure UC1 by using a planarization layer PLN and multiple inorganic insulating layers (e.g., a first passivation layer PAS1 and a second passivation layer PAS2, and an interlayer dielectric layer ILD). Specifically, the first undercut structure UC1 may include multiple eaves EV. The first undercut structure UC1 may include a first eave EV1 of the planarization layer PLN and a second eave EV2 of the second passivation layer PAS2.

[0099] In one embodiment, the transparent display panel 110 may further include a metallic pattern MP to increase the number of eaves EV in the first undercut structure UC1. The metallic pattern MP may be disposed between the first passivation layer PAS1 and the second passivation layer PAS2. Figure 7As shown, the metal pattern MP can be disposed along the edge of the transmission region TA and can have a planar closed shape. The metal pattern MP is configured to form a first undercut structure UC1 and can be electrically floating. That is, the metal pattern MP may not be electrically connected to other signal lines.

[0100] Thus, when the metal pattern MP is disposed between the first passivation layer PAS1 and the second passivation layer PAS2, the first undercut structure UC1 may also include the third eaves EV3 of the metal pattern MP.

[0101] The first eaves EV1 can be formed such that the planarization layer PLN protrudes more than the plurality of inorganic insulating layers, such as the first passivation layer PAS1, the second passivation layer PAS2, the interlayer dielectric layer ILD, and the metallic pattern MP, in the direction of the transmission region TA. In this case, the first eaves EV1 can overlap with at least a portion of the first opening region OA1 of the first passivation layer PAS1 and at least a portion of the second opening region OA2 of the second passivation layer PAS2.

[0102] Therefore, the first undercut structure UC1 can expose at least a portion of the lower surface of the planarization layer PLN. The first undercut structure UC1 may not include the multiple inorganic insulating layers such as the first passivation layer PAS1, the second passivation layer PAS2, the interlayer dielectric layer ILD, and the metal pattern MP below the exposed lower surface, and may form a gap space with the gate insulating layer GI or the buffer layer BF.

[0103] The first eaves EV1 can be formed by a first wet etching process. For example, the first wet etching process can be buffer oxide etching (BOE), and considering its properties, it can be isotropic etching. In a transparent display panel 110 according to one embodiment of the present disclosure, the first wet etching process can be performed on the second passivation layer PAS2 to etch the second passivation layer PAS2 disposed below the edge region of the planarization layer PLN, thereby etching the lower surface of the planarization layer PLN.

[0104] The second eave EV2 can be formed such that the second passivation layer PAS2 protrudes more than some of the inorganic insulating layers, such as the first passivation layer PAS1, the interlayer dielectric layer ILD, and the metallic pattern MP, in the direction of the transmission region TA. In this case, the second eave EV2 can overlap with at least a portion of the first opening region OA1 of the first passivation layer PAS1. In this case, the width of the second opening region OA2 of the second passivation layer PAS2 can be smaller than the width of the first opening region OA1 of the first passivation layer PAS1.

[0105] Therefore, the first undercut structure UC1 can expose at least a portion of the lower surface of the second passivation layer PAS2. The first undercut structure UC1 may not include some of the multiple inorganic insulating layers such as the first passivation layer PAS1, the interlayer dielectric layer ILD, and the metal pattern MP below the exposed lower surface, and may form a gap space with the gate insulating layer GI or the buffer layer BF.

[0106] The second eaves EV2 can be formed by a second wet etching process. Considering the characteristics, the second wet etching process can be isotropic etching. In a transparent display panel 110 according to one embodiment of the present disclosure, the second wet etching process can be performed on the metal pattern MP to etch the metal pattern MP disposed below the edge region of the second passivation layer PAS2, thereby etching the lower surface of the second passivation layer PAS2.

[0107] The third eave EV3 can be formed such that the metal pattern MP protrudes more than some of the inorganic insulating layers, such as the first passivation layer PAS1 and the interlayer dielectric layer ILD, in the direction of the transmission region TA. In this case, the third eave EV3 can overlap with at least a portion of the first opening region OA1 of the first passivation layer PAS1. Therefore, the first undercut structure UC1 can expose at least a portion of the lower surface of the metal pattern MP. The first undercut structure UC1 may not include some of the inorganic insulating layers, such as the first passivation layer PAS1 and the interlayer dielectric layer ILD, below the exposed lower surface, and can form a gap space with the gate insulating layer GI or the buffer layer BF.

[0108] The third eaves EV3 can be formed by a third wet etching process. The third wet etching process can be BOE, and considering its characteristics, it can be isotropic etching. In a transparent display panel 110 according to one embodiment of the present disclosure, the third wet etching process can be performed on the first passivation layer PAS1, such that the first passivation layer PAS1 disposed below the edge region of the metal pattern MP is etched, thereby exposing the lower surface of the metal pattern MP.

[0109] The first undercut structure UC1 is disposed within the transmission region TA and may have a planar closed shape. For example, the first undercut structure UC1 may be disposed along the edge of the transmission region TA, such as... Figure 7 As shown. At this time, the first undercut structure UC1 can be configured to surround the touch sensor TS.

[0110] In a transparent display panel 110 according to one embodiment of the present disclosure, a first undercut structure UC1 can be formed using a planarization layer PLN and a plurality of inorganic insulating layers, such that the light transmittance can be reduced less due to the first undercut structure UC1.

[0111] A first electrode 120, an organic light-emitting layer 130, a second electrode 140, and a dam 125 can be disposed above the planarization layer PLN1.

[0112] A first electrode 120 may be provided above the planarization layer PLN for each of the sub-pixels SP1, SP2, SP3, and SP4. The first electrode 120 is not provided in the transmission region TA. The first electrode 120 may be connected to the driving transistor DTR. Specifically, the first electrode 120 may be connected to one of the source electrode SE and drain electrode DE of the driving transistor DTR through contact holes (not shown) passing through the planarization layer PLN and the first passivation layer PAS1 and the second passivation layer PAS2.

[0113] The first electrode 120 may include a metallic material with high reflectivity, such as a stacked structure of aluminum and titanium (Ti / Al / Ti), a stacked structure of aluminum and ITO (ITO / Al / ITO), an Ag alloy, a stacked structure of Ag alloy and ITO (ITO / Ag alloy / ITO), a MoTi alloy, and a stacked structure of MoTi alloy and ITO (ITO / MoTi alloy / ITO). The Ag alloy may be an alloy of silver (Ag), palladium (Pd), copper (Cu), etc. The MoTi alloy may be an alloy of molybdenum (Mo) and titanium (Ti). The first electrode 120 may be an anode electrode.

[0114] A dam 125 can be disposed above the planarization layer PLN. The dam 125 can be configured to at least partially cover the edge of the first electrode 120 and expose a portion of the first electrode 120. Therefore, the dam 125 can solve the problem of degraded luminous efficiency due to current concentration at the end of the first electrode 120.

[0115] The dam 125 can define the light-emitting regions EA1, EA2, EA3, and EA4 of sub-pixels SP1, SP2, SP3, and SP4. The light-emitting regions EA1, EA2, EA3, and EA4 of sub-pixels SP1, SP2, SP3, and SP4 represent regions in which the first electrode 120, the light-emitting layer 130, and the cathode electrode CE are sequentially stacked, such that holes from the first electrode 120 and electrons from the cathode electrode CE combine with each other in the light-emitting layer 130 to emit light. In this case, the region where the dam 125 is provided can become a non-light-emitting region NEA because no light is emitted from it, and the region where the dam 125 is not provided and the first electrode is exposed can become a light-emitting region EA. The dam 125 can include an organic layer, such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin.

[0116] An organic light-emitting layer 130 may be disposed above the first electrode 120. The organic light-emitting layer 130 may include a hole transport layer, a light-emitting layer, and an electron transport layer. In this case, when a voltage is applied to the first electrode 120 and the cathode electrode CE, holes and electrons move to the light-emitting layer through the hole transport layer and the electron transport layer, respectively, and the holes and electrons combine with each other in the light-emitting layer to emit light.

[0117] In one embodiment, the organic light-emitting layer 130 may be a common layer disposed in sub-pixels SP1, SP2, SP3, and SP4. In this case, the light-emitting layer may be a white light-emitting layer for emitting white light.

[0118] In another embodiment, an organic light-emitting layer 130 can be provided for each of the sub-pixels SP1, SP2, SP3, and SP4. For example, a green light-emitting layer for emitting green light can be provided in the first sub-pixel SP1, a red light-emitting layer for emitting red light can be provided in the second sub-pixel SP2, a blue light-emitting layer for emitting blue light can be provided in the third sub-pixel SP3, and a white light-emitting layer for emitting white light can be provided in the fourth sub-pixel SP4. In this case, no organic light-emitting layer 130 is provided in the transmissive region TA.

[0119] The organic light-emitting layer 130 can be separated by the first undercut structure UC1, resulting in a discontinuity between the non-transmissive region NTA and the transmissive region TA. Specifically, the organic light-emitting layer 130 can be divided by the first undercut structure UC1 into an organic light-emitting layer 131 disposed in the non-transmissive region NTA and an organic light-emitting layer 132 disposed in the transmissive region TA. That is, the organic light-emitting layer 131 disposed in the non-transmissive region NTA and the organic light-emitting layer 132 disposed in the transmissive region TA of the organic light-emitting layer 130 can be spaced apart from each other by the first undercut structure UC1.

[0120] A second electrode 140 can be disposed above the organic light-emitting layer 130 and the embankment 125. When the second electrode 140 is deposited over the entire surface, it can be separated by the first undercut structure UC1, resulting in a discontinuity between the non-transmissive region NTA and the transmissive region TA. Specifically, the second electrode 140 can be divided by the first undercut structure UC1 into a second electrode CE disposed in the non-transmissive region NTA and a second electrode TSE disposed in the transmissive region TA.

[0121] The second electrode CE disposed in the non-transmissive region NTA can be a cathode electrode CE, and can also be a component constituting the light-emitting element. The cathode electrode CE can be connected to the cathode contact portion CCT to receive power from the common power line VSSL. The cathode electrode CE can be a common layer disposed together in sub-pixels SP1, SP2, SP3, and SP4 to apply the same voltage to the sub-pixels.

[0122] The second electrode 140 disposed in the transmission region TA can be a touch sensor electrode TSE, and can be a component constituting the touch sensor TS. The end of the touch sensor electrode TSE can be disposed below the first eaves EV1 and the second eaves EV2 of the first undercut structure UC1. The touch sensor electrode TSE can be connected to the touch contact electrode TCT to provide capacitance changes to the touch line TL.

[0123] The second electrode 140, which includes the cathode electrode CE and the touch sensor electrode TSE, may include a transparent conductive material (TCO) that can transmit light, such as ITO and IZO, or a semi-transmissive conductive material, such as magnesium (Mg), silver (Ag), or an alloy of magnesium (Mg) and silver (Ag). When the second electrode 140 includes a semi-transmissive conductive material, the luminous efficiency can be improved through the microcavity.

[0124] An encapsulation layer 150 can be disposed above the light-emitting element and the touch sensor TS. The encapsulation layer 150 can be disposed above the cathode electrode CE and the touch sensor electrode TSE to at least partially cover the cathode electrode CE and the touch sensor electrode TSE.

[0125] The encapsulation layer 150 is used to prevent oxygen or water from penetrating into the organic light-emitting layer 130, the cathode electrode CE, and the touch sensor electrode TSE. For this purpose, the encapsulation layer 150 may include at least one inorganic layer and at least one organic layer.

[0126] A color filter CF can be disposed above the encapsulation layer 150. The color filter CF can also be disposed above one surface of the second substrate 112 facing the first substrate 111. In this case, the first substrate 111 with the encapsulation layer 150 and the second substrate 112 with the color filter CF can be bonded to each other via an adhesive layer 160. Here, the adhesive layer 160 can be an optically clear resin (OCR) layer or an optically clear adhesive (OCA) film.

[0127] For each of sub-pixels SP1, SP2, SP3, and SP4, a color filter CF can be configured for patterning. A black matrix BM can be placed between the color filters CF. The black matrix BM can be placed between sub-pixels SP1, SP2, SP3, and SP4 to prevent color mixing between adjacent sub-pixels SP1, SP2, SP3, and SP4. In addition, the black matrix BM can prevent externally incident light from being reflected by multiple lines (such as scan lines SCANL, pixel power lines VDDL, common power lines VSSL, reference lines REFL, data lines DL, etc.) placed between sub-pixels SP1, SP2, SP3, and SP4.

[0128] In a transparent display panel 110 according to one embodiment of the present disclosure, the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element can be formed in the same layer through a first undercut structure UC1. The transparent display panel 110 according to one embodiment of the present disclosure has simple touch processing and does not require a separate mask for the touch sensor electrode TSE.

[0129] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, the first undercut structure UC1 includes multiple ridges EV, thereby preventing short circuits between the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element. Since the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element are deposited simultaneously on the same layer, they can be connected to each other without separation, potentially leading to defects. Providing multiple first undercut structures UC1 reduces the short circuit defects between the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element. However, while multiple first undercut structures UC1 effectively separate the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element, this may reduce the size of the touch sensor TS and degrade touch performance.

[0130] In a transparent display panel 110 according to one embodiment of the present disclosure, two or more ridges EV are formed in a first undercut structure UC1, such that the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element can be separated from each other. Therefore, in the transparent display panel 110 according to one embodiment of the present disclosure, short-circuit defects between the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element can be reduced without reducing the size of the touch sensor TS.

[0131] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, a first undercut structure UC1 is formed using a planarization layer PLN and a plurality of inorganic insulating layers, thereby reducing or minimizing the loss of light transmittance due to the first undercut structure UC1.

[0132] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, a touch line TL is disposed below the light-emitting element, thereby preventing the light-emitting efficiency of pixel P from being degraded due to the touch line TL.

[0133] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, the touch line TL is configured not to overlap with the circuit regions CA1, CA2, CA3 and CA4, thereby reducing or minimizing the influence of circuit elements and improving the uniformity of parasitic capacitance.

[0134] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, multiple touch lines TL are provided in a first non-transmissive region NTA1, and only one touch bridge wire TBL for connecting multiple touch sensors TS is provided in a second non-transmissive region NTA2, so that the reduction in size of the transmissive region TA or the reduction in light transmittance caused by the multiple touch lines TL and the touch bridge wire TBL can be reduced or minimized.

[0135] Multiple touch sensors TS, including one touch block TB, can be connected to touch line TL via bridging cable TBL. In a transparent display panel 110 according to one embodiment of the present disclosure, touch connection portion TC can be disposed between touch sensor TS and bridging cable TBL to connect touch sensor TS and bridging cable TBL.

[0136] In the following text, reference will be made to Figures 9 to 12 Detailed description of the touch connection component TC.

[0137] Figure 9 It is shown Figure 3 A magnified view of an example from region C. Figure 10 It is shown Figure 9 A cross-sectional view of an example of line II-II'. Figure 11 It is shown Figure 3 A magnified view of another example of region C, and Figure 12 It is shown Figure 11 A cross-sectional view of an example of line III-III'.

[0138] Reference Figure 3 and Figures 9 to 12Each of a plurality of touch sensors TS can be connected to a touch bridge wiring TBL via a touch connection portion TC. The touch connection portion TC may at least partially overlap the touch sensor TS at one end and at least partially overlap the touch bridge wiring TBL at the other end to connect the touch sensor TS to the touch bridge wiring TBL. The touch connection portion TC may include, for example... Figure 9 and Figure 10 The touch connection line TCL and touch contact electrode TCT are shown.

[0139] The touch connection cable (TCL) connects the touch bridge cable (TBL) to the touch sensor (TS). Specifically, one end of the touch connection cable (TCL) connects to the touch bridge cable (TBL), while the other end connects to the touch contact electrode (TCT) via the sixth contact hole (CH6). The touch connection cable (TCL) can then be connected to the touch sensor (TS) via the touch contact electrode (TCT).

[0140] Touch connection lines (TCLs) can be formed in a layer disposed between the first substrate 111 and the driving transistor (DTR). In one embodiment, the touch connection lines (TCLs) can be formed of the same material in the same layer as the light-shielding layer (LS). The touch connection lines (TCLs) can extend through the first undercut structure (UC1). The first undercut structure (UC1) can be formed by a wet etching process. In a transparent display panel 110 according to one embodiment of the present disclosure, the touch connection lines (TCLs) can be formed on the same layer as the light-shielding layer (LS), thereby preventing the touch connection lines (TCLs) from being lost during the wet etching process used to form the first undercut structure (UC1).

[0141] The touch contact electrode TCT can be disposed in the transmissive region TA. The touch contact electrode TCT can be disposed between the touch connection line TCL and the touch sensor electrode TSE to electrically connect the touch connection line TCL and the touch sensor electrode TSE. The touch contact electrode TCT can be connected to the touch connection line TCL through the sixth contact hole CH6.

[0142] Furthermore, at least a portion of the upper surface of the touch contact electrode TCT can be exposed through the second undercut structure UC2, and the touch sensor electrode TSE can be connected to the exposed upper surface of the touch contact electrode TCT. Specifically, the touch contact electrode TCT can be formed in a layer disposed between the buffer layer BF and the second passivation layer PAS2. In one embodiment, the touch contact electrode TCT can be disposed between the interlayer dielectric layer ILD and the first passivation layer PAS1. That is, the touch contact electrode TCT can be formed in the same layer as the source electrode SE and drain electrode DE of the driving transistor DTR.

[0143] In this configuration, the first passivation layer PAS1 may have a fourth opening region OA4, which is formed to expose at least a portion of the upper surface of the touch contact electrode TCT. The second passivation layer PAS2 may have a fifth opening region OA5, which overlaps with at least a portion of the fourth opening region OA4 of the first passivation layer PAS1. Therefore, the upper surface of the touch contact electrode TCT can be exposed through the fourth opening region OA4 of the first passivation layer PAS1 and the fifth opening region OA5 of the second passivation layer PAS2.

[0144] Meanwhile, in a transparent display panel 110 according to one embodiment of the present disclosure, an organic pattern OP can be formed to form a second undercut structure UC2. The organic pattern OP can be disposed above the second passivation layer PAS2 in the transmissive region TA. The organic pattern OP can be formed on the same layer as the planarization layer PLN and can be made of the same material as the planarization layer PLN.

[0145] The second undercut structure UC2 can be formed such that the organic pattern OP is configured to overlap with at least a portion of the fourth opening region OA4 of the first passivation layer PAS1 and at least a portion of the fifth opening region OA5 of the second passivation layer PAS2. The second undercut structure UC2 may include a fifth eave EV5.

[0146] The fifth eaves EA5 can be formed such that the end of the organic pattern OP protrudes more than the first passivation layer PAS1 in the fourth opening region OA4, or more than the second passivation layer PAS2 in the fifth opening region OA5. The fifth eaves EV5 can be formed by a first wet etching process for forming the first eaves EV1 of the first undercut structure UC1 and a third wet etching process for forming the third eaves EV3 of the first undercut structure UC1.

[0147] Therefore, the second undercut structure UC2 can expose at least a portion of the lower surface of the organic pattern OP. The second undercut structure UC2 does not have the first passivation layer PAS1 and the second passivation layer PAS2 disposed below the exposed lower surface, and can form a gap space with the touch contact electrode TCT.

[0148] The second undercut structure UC2 can be disposed in the area where the first undercut structure UC1 is formed. That is, the second undercut structure UC2 can be disposed in the area where the touch sensor TS is disposed.

[0149] Touch sensor electrodes (TSE) can be deposited on the exposed upper surface of touch contact electrodes (TCT) to form contact areas (CA). The touch sensor electrodes (TSE) can be disconnected and discontinuously connected to the organic pattern (OP) via a second undercut structure (UC2). The touch sensor electrodes (TSE) can contact the upper surface of the touch contact electrodes (TCT), which is exposed through a gap between the lower surface of the organic pattern (OP) and the touch contact electrodes (TCT).

[0150] Therefore, the touch sensor electrode TSE can be electrically connected to the touch contact electrode TCT. The touch contact electrode TCT can transmit the capacitance change of the touch sensor electrode TSE to the touch line TL through the touch connection line TCL and the touch bridge connection line TBL.

[0151] In a transparent display panel 110 according to one embodiment of the present disclosure, a second undercut structure UC2 is formed using a planarization layer PLN and a plurality of inorganic insulating layers, such that the loss of light transmittance can be reduced or minimized due to the second undercut structure UC2.

[0152] exist Figure 9 and Figure 10 In this embodiment, the touch contact electrode TCT is disposed in the same layer as the source electrode SE and drain electrode DE of the driving transistor DTR, and its upper surface is in contact with the touch sensor electrode TSE, but is not limited thereto.

[0153] In another embodiment, the touch contact electrode TCT can be as follows: Figure 11 and Figure 12 The layer shown is positioned between the first passivation layer PAS1 and the second passivation layer PAS2.

[0154] Specifically, Figure 11 and Figure 12 The touch connection portion TC shown may include a touch connection line TCL, a connection electrode CTE, and a touch contact electrode TCT.

[0155] The touch connection cable TCL can be positioned between the touch bridge cable TBL and the touch sensor TS to connect the touch bridge cable TBL and the touch sensor TS. Specifically, one end of the touch connection cable TCL can be connected to the touch bridge cable TBL, while the other end is connected to the connection electrode CTE through the sixth contact hole CH6. The touch connection cable TCL can be connected to the touch sensor electrode TSE through the connection electrode CTE and the touch contact electrode TCT.

[0156] The touch connection line (TCL) can be formed in a layer disposed between the first substrate 111 and the driving transistor (DTR). In one embodiment, the touch connection line (TCL) can be formed of the same material in the same layer as the light-shielding layer (LS).

[0157] A connection electrode CTE can be disposed in the transmissive region TA to connect the touch connection line TCL to the connection electrode CTE. One end of the connection electrode CTE can be connected to the touch connection line TCL through the sixth contact hole CH6, and the other end can be connected to the touch contact electrode TCT through the seventh contact hole CH7. The connection electrode CTE can be disposed between the interlayer dielectric layer ILD and the first passivation layer PAS1. That is, the connection electrode CTE can be formed on the same layer as the source electrode SE and drain electrode DE of the driving transistor DTR.

[0158] exist Figure 11 and Figure 12 In this embodiment, the touch contact electrode TCT is shown connected to the touch connection line TCL via the connection electrode CTE, but is not limited thereto. In another embodiment, the touch contact electrode TCT may be directly connected to the touch connection line TCL.

[0159] The touch contact electrode TCT can be disposed in the transmission area TA. The touch contact electrode TCT can be disposed between the connecting electrode CTE and the touch sensor electrode TSE to electrically connect the touch connection line TCL to the touch sensor electrode TSE. The touch contact electrode TCT can be connected to the connecting electrode CTE through the seventh contact hole CH7, and can also be electrically connected to the touch connection line TCL through the connecting electrode CTE.

[0160] Furthermore, the side of the touch contact electrode TCT can be exposed by the second undercut structure UC2, and the touch sensor electrode TSE can be connected to the exposed side. Specifically, the touch contact electrode TCT can be formed in a layer disposed between the buffer layer BF and the second passivation layer PAS2. In one embodiment, the touch contact electrode TCT can be disposed between the first passivation layer PAS1 and the second passivation layer PAS2. That is, the touch contact electrode TCT can be disposed in a layer with the same metal pattern MP as the first undercut structure UC1.

[0161] In this configuration, the first passivation layer PAS1 may have a fourth opening region OA4, which is formed to expose at least a portion of the upper surface of the interlayer dielectric layer ILD. The second passivation layer PAS2 may have a fifth opening region OA5, which is formed to overlap with at least a portion of the fourth opening region OA4 of the first passivation layer PAS1. The side of the touch contact electrode TCT may be exposed between the first passivation layer PAS1 and the second passivation layer PAS2 through the fourth opening region OA4 of the first passivation layer PAS1 and the fifth opening region OA5 of the second passivation layer PAS2.

[0162] In one embodiment, the touch contact electrode TCT may be configured to overlap with at least a portion of the fourth opening region OA4 of the first passivation layer PAS1. In this case, at least a portion of the lower surface of the touch contact electrode TCT may be exposed.

[0163] Simultaneously, the organic pattern OP can be disposed above the second passivation layer PAS2 in the transmission region TA. The organic pattern OP can be formed on the same layer as the planarization layer PLN, and can be made of the same material as the planarization layer PLN.

[0164] Figure 11 and Figure 12 The second undercut structure UC2 shown may include multiple eaves EV. Specifically, the second undercut structure UC2 may include a fifth eave EV5 of the organic pattern OP and a sixth eave EV6 of the second passivation layer PAS2. In one embodiment, the second undercut structure UC2 may also include a seventh eave EV7 of the touch contact electrode TCT.

[0165] The fifth eaves EV5 can be formed such that the end of the organic pattern OP protrudes more than the first passivation layer PAS1 in the fourth opening region OA4, or more than the second passivation layer PAS2 in the fifth opening region OA5. The fifth eaves EV5 can be formed by a first wet etching process used to form the first eaves EV1 of the first undercut structure UC1.

[0166] Therefore, the second undercut structure UC2 can expose at least a portion of the lower surface of the organic pattern OP. The second undercut structure UC2 may not include the first passivation layer PAS1, the second passivation layer PAS2, and the touch contact electrode TCT below the exposed lower surface, and may form a gap space with the interlayer dielectric layer ILD.

[0167] The sixth eave EV6 can be formed such that the end of the second passivation layer PAS2 protrudes more than the touch contact electrode TCT or the first passivation layer PAS1 in the fourth opening region OA4. The sixth eave EV6 can be formed by a second wet etching process used to form the second eave EV2 of the first undercut structure UC1.

[0168] Therefore, the second undercut structure UC2 can expose at least a portion of the lower surface of the second passivation layer PAS2. The second undercut structure UC2 may not include the first passivation layer PAS1 and the touch contact electrode TCT below the exposed lower surface, and may form a gap space with the interlayer dielectric layer ILD.

[0169] The seventh eave EV7 can be formed such that the end of the touch contact electrode TCT protrudes more than the first passivation layer PAS1 in the fourth opening region OA4. The seventh eave EV7 can be formed by a third wet etching process used to form the third eave EV3 for forming the first undercut structure UC1.

[0170] Therefore, the second undercut structure UC2 can expose the sides of the touch contact electrode TCT. In one embodiment, the second undercut structure UC2 can expose at least a portion of the lower surface of the touch contact electrode TCT. The second undercut structure UC2 may not include the first passivation layer PAS1 below the exposed lower surface and may form a gap space with the interlayer dielectric layer ILD.

[0171] The second undercut structure UC2 can be disposed in the area where the first undercut structure UC1 is formed. That is, the second undercut structure UC2 can be disposed in the area where the touch sensor TS is disposed.

[0172] Touch sensor electrodes (TSEs) can be deposited on the exposed sides of touch contact electrodes (TCTs) to form contact areas (CAs). In one embodiment, touch sensor electrodes (TSEs) can also be deposited on the lower surface of touch contact electrodes (TCTs).

[0173] The touch sensor electrode TSE can be disconnected and discontinuously connected to the organic pattern OP via the second undercut structure UC2. The touch sensor electrode TSE can contact the side or bottom surface of the touch contact electrode TCT, which is exposed through the gap between the bottom surface of the organic pattern OP and the interlayer dielectric layer ILD.

[0174] Therefore, the touch sensor electrode TSE can be electrically connected to the touch contact electrode TCT. The touch contact electrode TCT can transmit the capacitance change of the touch sensor electrode TSE to the touch line TL through the touch connection line TCL and the touch bridge connection line TBL.

[0175] Figure 11 and Figure 12 The transparent display panel 110 shown is Figure 9 and Figure 10 The difference in the transparent display panel 110 shown is that the touch sensor electrode TSE contacts the side or lower surface of the touch contact electrode TCT. Figure 11 and Figure 12 In the transparent display panel 110 shown, since the upper surface of the touch contact electrode TCT does not need to be exposed, the touch contact electrode TCT does not need to be formed with a shape like... Figure 9 The large area shown. Therefore, with Figure 9 and Figure 10 Compared to the transparent display panel 110 shown, Figure 11 and Figure 12 The transparent display panel 110 shown can reduce the area of ​​the touch contact electrode TCT. Since the touch contact electrode TCT is made of opaque or semi-transparent metallic material, therefore... Figure 11 and Figure 12 The transparent display panel 110 shown can reduce light transmittance loss due to the touch contact electrode TCT. That is, with... Figure 9 and Figure 10 Compared to the transparent display panel 110 shown, Figure 11 and Figure 12 The transparent display panel 110 shown can improve the light transmittance of the transmission area TA.

[0176] In addition, Figure 11 and Figure 12 In the transparent display panel 110 shown, the touch sensor electrode 110 can contact the lower surface and the side surface of the touch sensor electrode TSE. Therefore, even if the planar area of ​​the touch sensor electrode TSE is reduced, Figure 11 and Figure 12 The transparent display panel 110 shown can also adequately ensure the contact area between the touch sensor electrode TSE and the touch contact electrode TCT.

[0177] Figures 6 to 8 The first undercut structure UC1 shown includes, but is not limited to, a metallic pattern MP. Even without the metallic pattern MP, the first undercut structure UC1 can form multiple eaves EV. Referring below... Figures 13 to 1 7G describes another example of the first undercut structure.

[0178] Figure 13 It is shown Figure 3 Another example of a cross-sectional view of line I-I'. Figure 14 It shows the setting Figure 13 An enlarged view of an example of the first undercut structure in region E. Figure 15 This is a view showing the encapsulation layer disposed in the first undercut structure when the first undercut structure includes a single eave. Figure 16 It shows the setting Figure 13 An enlarged view of another example of the first undercut structure in region E, and Figures 17A to 17G are illustrations of the formation Figure 13 A view of the process of the first undercut structure.

[0179] According to another embodiment of this disclosure, the first undercut structure UC1 can be formed using a planarization layer PLN and multiple inorganic insulating layers (e.g., a first passivation layer PAS1 and a second passivation layer PAS2, and an interlayer dielectric layer ILD). Specifically, the first undercut structure UC1 may include multiple eaves EV. The first undercut structure UC1 may include a first eave EV1 of the planarization layer PLN, a second eave EV2 of the second passivation layer PAS2, and a fourth eave EV4.

[0180] The first eave EV1 can be formed such that the planarization layer PLN protrudes more than the plurality of inorganic insulating layers (e.g., the first passivation layer PAS1, the second passivation layer PAS2, and the interlayer dielectric layer ILD) in the direction of the transmission region TA. In this case, the first eave EV1 can overlap with at least a portion of the first opening region OA1 of the first passivation layer PAS1 and at least a portion of the second opening region OA2 of the second passivation layer PAS2.

[0181] Therefore, the first undercut structure UC1 can expose at least a portion of the lower surface of the planarization layer PLN. The first undercut structure UC1 may not include multiple inorganic insulating layers (e.g., the first passivation layer PAS1, the second passivation layer PAS2, and the interlayer dielectric layer ILD below the exposed lower surface), and may form a gap space with the gate insulating layer GI or the buffer layer BF.

[0182] The second eaves EV2 and the fourth eaves EV4 can be formed such that the second passivation layer PAS2 protrudes more than some of the plurality of inorganic insulating layers (e.g., the first passivation layer PAS1 and the interlayer dielectric layer ILD) in the direction of the transmission region TA. In this case, the second eaves EV2 and the fourth eaves EV4 can overlap with at least a portion of the first opening region OA1 of the first passivation layer PAS1. In this case, the width of the second opening region OA2 of the second passivation layer PAS2 can be smaller than the width of the first opening region OA1 of the first passivation layer PAS1.

[0183] The second eaves EV2 and the fourth eaves EV4 can be positioned at different heights. The second eaves EV2 can be positioned at a first height h1 from the first substrate 111, and the fourth eaves EV4 can be positioned at a second height h2 from the first substrate 111. In this case, the second height h2 can be less than the first height h1.

[0184] Furthermore, the positions of the ends of the second eaves EV2 and the fourth eaves EV4 can differ from each other. The end of the second eaves EV2 can protrude more than the end of the fourth eaves EV4 in the direction of the transmission zone TA.

[0185] The first eaves EV1, the second eaves EV2, and the fourth eaves EV4 can be formed using either a wet etching process or a dry etching process. More specifically, as shown in Figure 17A, the driving transistor DTR and multiple signal lines DL4, VSSL, TL4, TL5, and TL6 can be disposed above the first substrate 111. The first passivation layer PAS1 can be disposed above the driving transistor DTR and the multiple signal lines DL4, VSSL, TL4, TL5, and TL6. The first passivation layer PAS1 can be deposited on the entire surface of the display area.

[0186] like Figure 17b As shown, a sacrificial pattern PT can be formed on the first passivation layer PAS1. The sacrificial pattern PT can be a metallic pattern. Next, as shown in FIG17C, a second passivation layer PAS2 can be deposited on the entire surface of the display area on the first passivation layer PAS1 and the sacrificial pattern PT.

[0187] like Figure 17d As shown, the planarization layer PLN can be formed by patterning on the second passivation layer PAS2. In this case, the planarization layer PLN can be disposed in the non-transmissive region NTA, and may not be disposed in the transmissive region TA.

[0188] Then, the second passivation layer PAS2 can be etched, as shown in Figure 17E.

[0189] In one embodiment, at least a portion of the second passivation layer PAS2 can be etched using a first wet etching process to form the second opening region OA2. For example, the first wet etching process can be BOE, and considering its characteristics, it can be isotropic etching. In a transparent display panel 110 according to another embodiment of the present disclosure, the second passivation layer PAS2 can be subjected to a first wet etching process to form the second opening region OA2, thereby forming the first eaves EV1. Therefore, in a transparent display panel 110 according to another embodiment of the present disclosure, the second passivation layer PAS2 disposed below the edge region of the planarization layer PLN is etched, such that at least a portion of the lower surface of the planarization layer PLN can be exposed.

[0190] In another embodiment, the second passivation layer PAS2 can be formed by a dry etching process.

[0191] Next, as shown in FIG17F, the sacrificial pattern PT can be etched. In one embodiment, the sacrificial pattern PT can be removed by a second wet etching process. Therefore, a second wet etching process can be performed on the sacrificial pattern PT according to another embodiment of the present disclosure to remove the sacrificial pattern PT, thereby forming the second edging EV2. Thus, in the transparent display panel 110 according to another embodiment of the present disclosure, the sacrificial pattern PT disposed below the edge region of the second passivation layer PAS2 is removed, and at the same time, at least a portion of the lower surface of the second passivation layer PAS2 can be exposed.

[0192] Next, as shown in Figure 17G, the first passivation layer PAS1 can be etched.

[0193] In one embodiment, at least a portion of the first passivation layer PAS1 can be etched by a third wet etching process to form a first opening region OA1. For example, the third wet etching process can be BOE, and considering its characteristics, it can be isotropic etching. In a transparent display panel 110 according to another embodiment of the present disclosure, a third wet etching process can be performed on the first passivation layer PAS1 to form the first opening region OA1, thereby forming a fourth eave EA4. Therefore, in a transparent display panel 110 according to another embodiment of the present disclosure, the first passivation layer PAS1 disposed below a portion of the second passivation layer PAS2 is etched, and at the same time, at least a portion of the lower surface of the second passivation layer PAS2 can be exposed.

[0194] The first undercut structure UC1 formed by the above manufacturing process can expose at least a portion of the lower surface of the second passivation layer PAS2. The first undercut structure UC1 may not include some of the multiple inorganic insulating layers, such as the first passivation layer PAS1 and the interlayer dielectric layer ILD below the exposed lower surface, and may form a gap space with the gate insulating layer GI or the buffer layer BF.

[0195] The first undercut structure UC1 is disposed in the transmission region TA and may have a planar closed shape. For example, the first undercut structure UC1 may be formed along the edge of the transmission region TA. In this case, the first undercut structure UC1 may be formed around the touch sensor TS.

[0196] and Figures 6 to 8 Unlike the first undercut structure UC1 shown, the first undercut structure UC1 according to another embodiment of this disclosure does not include the metal pattern MP, and can be provided with multiple eaves EV1, EV2, and EV3 formed using only a planarization layer PLN and multiple inorganic insulating layers. Therefore, compared with Figures 6 to 8 Compared to the transparent display panel 110 shown, Figure 13 and 14The transparent display panel 110 shown can improve light transmittance.

[0197] Furthermore, in another embodiment of the first undercut structure UC1 according to this disclosure, such as Figure 15 As shown, compared to the first undercut structure UC1 which only includes one eave EV, the encapsulation layer 150 can be uniformly deposited across the entire surface without breaks. Specifically, the encapsulation layer 150 can be disposed on the cathode electrode CE and the touch sensor electrode TSE. In this case, the encapsulation layer 150 can be formed to at least partially cover the first undercut structure UC1 disposed between the cathode electrode CE and the touch sensor electrode TSE.

[0198] However, when Figure 15 As shown, when an eaves EV is formed using a wet etching process, isotropic etching is performed, allowing the eaves EV to be formed with a greater depth in the horizontal direction. That is, in Figure 15 In this process, the second distance d2 between the ends of the interlayer dielectric layer ILD below the first undercut structure UC1 can be increased at the point where the eaves EV and the second passivation layer PAS2 meet. When the encapsulation layer 150 (particularly the inorganic layer 151) is deposited on the first undercut structure UC1 formed as described above, the encapsulation layer 150 as... Figure 15 As shown, the transparent display panel 110 is disconnected from the first undercut structure UC1 and not connected, which may degrade the encapsulation performance of the transparent display panel 110.

[0199] According to another embodiment of this disclosure, the first undercut structure UC1 is formed by multiple wet etching processes to create multiple eaves EV1, EV2, and EV4, such that the horizontal depth of each of the multiple eaves EV1, EV2, and EV4 may be reduced. That is, in Figure 14 In the process, the first distance d1 between the ends of the second passivation layer PAS2 can be less than Figure 15 The second distance d2 is at the point where the first eaves EV1 and the second passivation layer PAS2 meet.

[0200] In the first undercut structure UCl according to another embodiment of this disclosure, the encapsulation layer 150 (particularly the inorganic layer 151) can be connected without being disconnected. Therefore, the encapsulation performance of the transparent display panel 110 can be improved.

[0201] Furthermore, according to another embodiment of this disclosure, the first undercut structure UCl can be formed by a dry etching process to create the first overhang EVl. Since the dry etching process performs anisotropic etching, the third distance d3 between the ends of the second passivation layer PAS2 can be less than [the specified value]. Figure 14 The first distance d1 is at the point where the first eaves EV1 and the second passivation layer PAS2 meet. Therefore, the encapsulation performance of the transparent display panel 110 can be further improved.

[0202] Based on this disclosure, the following beneficial effects can be obtained.

[0203] In this disclosure, the touch sensor electrode of the touch sensor and the cathode electrode of the light-emitting element can be formed simultaneously using a first undercut structure, thereby simplifying the touch process and eliminating the need for a separate mask for the touch sensor electrode.

[0204] Furthermore, in this disclosure, since the first undercut structure includes multiple overhangs, the touch sensor electrode of the touch sensor and the cathode electrode of the light-emitting element can be effectively separated from each other without reducing the area of ​​the touch sensor. Therefore, short circuits between the touch sensor electrode of the touch sensor and the cathode electrode of the light-emitting element can be prevented.

[0205] Furthermore, in this disclosure, the horizontal length of the eaves of the first undercut structure can be reduced. Therefore, in this disclosure, the encapsulation layer can be connected to the first undercut structure without being disconnected, and the encapsulation performance of the display panel can be improved.

[0206] Furthermore, in this disclosure, the first undercut structure is formed using a planarization layer and multiple inorganic insulating layers, which reduces or minimizes the loss of light transmittance due to the first undercut structure.

[0207] Furthermore, in this disclosure, the touch sensor electrode and the touch contact electrode can be connected to each other using a second undercut structure. In this case, the second undercut structure is formed using only a planarization layer and multiple inorganic insulating layers, enabling a contact structure between the touch sensor electrode and the touch contact electrode without sacrificing light transmittance due to the second undercut structure.

[0208] Furthermore, in this disclosure, the touch sensor electrode contacts the side or lower surface of the touch contact electrode through a second undercut structure, thereby reducing the area of ​​the touch contact electrode. Therefore, this disclosure can reduce light transmittance loss caused by the touch contact electrode.

[0209] It will be apparent to those skilled in the art that the present disclosure is not limited to the described embodiments and drawings, and that various substitutions, modifications, and variations can be made to the present disclosure without departing from its spirit or scope. Therefore, the scope of the present disclosure is defined by the appended claims, and all variations or modifications derived from the meaning, scope, and equivalent concepts of the claims are intended to fall within the scope of the present disclosure.

Claims

1. A transparent display device, comprising: A substrate having multiple transmissive regions and non-transmissive regions including multiple light-emitting regions; A plurality of light-emitting elements are respectively arranged in a plurality of light-emitting regions on the substrate, and each of the plurality of light-emitting elements includes an anode electrode, a light-emitting layer and a cathode electrode; A plurality of touch sensors are respectively arranged in a plurality of transmissive regions on the substrate, and each of the plurality of touch sensors includes a touch sensor electrode; as well as A first undercut structure is arranged along the edge of the transmission region and separates the cathode electrode from the touch sensor electrode. The first undercut structure includes multiple eaves.

2. The transparent display device according to claim 1, wherein, The first undercut structure includes: A first passivation layer is disposed on the substrate, the first passivation layer including a first opening region disposed along the edge of the transmission region; A second passivation layer is disposed on the first passivation layer, the second passivation layer including a second opening region configured to at least partially overlap with the first opening region; A planarization layer is disposed on the second passivation layer, the planarization layer including a third opening region configured to at least partially overlap with the first opening region and the second opening region; The first eaves are formed such that the planarization layer protrudes further than the second passivation layer in the direction of the transmission region, so as to overlap with at least a portion of the second opening region; and The second eave is formed such that the second passivation layer protrudes more than the first passivation layer in the direction of the transmission region, so as to overlap with at least a portion of the first opening region.

3. The transparent display device according to claim 2, wherein, The first undercut structure includes: A metallic pattern disposed between the first passivation layer and the second passivation layer; and The third eave is formed such that the metal pattern protrudes more than the first passivation layer in the direction of the transmission area, so as to overlap with at least a portion of the first opening area.

4. The transparent display device according to claim 3, wherein, The metal pattern is arranged along the edge of the transmissive area.

5. The transparent display device according to claim 3, wherein, The metal pattern is electrically levitated.

6. The transparent display device according to claim 2, wherein, The ends of the touch sensor electrodes are positioned below the first and second eaves.

7. The transparent display device according to claim 2, wherein, The width of the second opening region is smaller than the width of the first opening region.

8. The transparent display device according to claim 2, wherein, The third opening area completely overlaps with the touch sensor.

9. The transparent display device according to claim 2, wherein, The first undercut structure also includes a fourth eave, which is formed such that the second passivation layer protrudes more than the first passivation layer in the direction of the transmission region. The fourth eave is located at a different height than the second eave.

10. The transparent display device according to claim 9, wherein, The second eaves are positioned at the first height. The fourth eaves are positioned at a second height, lower than the first height, and The end of the second eaves protrudes more in the direction of the transmission area than the end of the fourth eaves.

11. The transparent display device of claim 1, further comprising a touch contact electrode arranged to overlap with the touch sensor electrode in the transmissive region and to contact the touch sensor electrode via a second undercut structure.

12. The transparent display device according to claim 11, wherein, The second undercut structure includes: A first passivation layer is disposed on the substrate, the first passivation layer including a fourth opening region disposed in the transmission region; A second passivation layer is disposed on the first passivation layer in the transmission region, the second passivation layer including a fifth opening region configured to at least partially overlap with the fourth opening region; and An organic pattern is disposed on a second passivation layer in the transmission region and is configured to overlap with at least a portion of the fourth opening region and at least a portion of the fifth opening region.

13. The transparent display device according to claim 12, wherein, The touch contact electrode is disposed below the first passivation layer, and the upper surface of the touch contact electrode is exposed through the fourth opening region and the fifth opening region. The touch sensor electrode is in contact with the exposed upper surface of the touch contact electrode.

14. The transparent display device according to claim 13, further comprising a driving transistor disposed between the first passivation layer and the substrate. in, The touch contact electrode is disposed in the same layer as the source electrode and drain electrode of the driving transistor.

15. The transparent display device according to claim 12, wherein, The touch contact electrode is disposed between the first passivation layer and the second passivation layer, and the side of the touch contact electrode is exposed through the fifth opening region. The touch sensor electrode contacts the exposed side of the touch contact electrode.

16. The transparent display device according to claim 15, wherein, The touch sensor electrode has a lower surface exposed through the fourth opening region, and The touch sensor electrode is in contact with the exposed lower surface of the touch contact electrode.

17. The transparent display device according to claim 15, further comprising: A driving transistor is disposed between the first passivation layer and the substrate; The connecting electrode is disposed below the first passivation layer. The connection electrode is disposed in the same layer as the source and drain electrodes of the driving transistor, and The touch contact electrode is connected to the connection electrode through a contact hole.

18. The transparent display device according to claim 12, wherein, The second undercut structure also includes a fifth eave, wherein the organic pattern is provided in the fifth opening region.

19. The transparent display device according to claim 11, further comprising: Multiple touch lines are disposed in a non-transmissive area on the substrate and extend in a first direction; as well as A bridging wire, disposed in a non-transparent region on the substrate and extending in a second direction, connects at least two touch sensors arranged in the second direction to one of the plurality of touch lines. The touch contact electrode is electrically connected to the bridge wire.

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