A thin film vacuum plasma processing apparatus
By utilizing plasma to react with the thin film surface in a thin film vacuum plasma treatment device, and combining expansion and scraping methods, the problem of dirt trapping and residue on the thin film surface is solved, achieving a highly efficient cleaning effect.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 安徽中科大禹科技有限公司
- Filing Date
- 2023-06-05
- Publication Date
- 2026-05-12
AI Technical Summary
When existing vacuum plasma treatment equipment processes tough films, contaminants are easily trapped in the surface crevices, resulting in incomplete cleaning, and the substances generated by the reaction remain on the film surface.
A thin-film vacuum plasma treatment device was designed. By setting up a plasma generator and traction component in the treatment chamber, the plasma is used to react with the thin film surface. The contaminants are removed by expansion and scraping. A secondary cleaning is performed by combining moving components and cleaning components to ensure that the contaminants are in full contact with the plasma and that the residues are completely removed.
This technology enables the effective removal of contaminants from the gaps on the film surface during large-area continuous processing, and thoroughly eliminates the residues generated by the reaction, thereby improving the cleaning effect of the film.
Smart Images
Figure CN116638745B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of plasma processing technology, specifically to a thin-film vacuum plasma processing device. Background Technology
[0002] The development of plasma technology has provided new technologies and processes for the further development of sciences such as materials, energy, information, environmental space, space physics, and geophysics. The application of plasma technology in the processing of thin films such as polymer plastics and textile fibers is also gradually developing. Its main technical point is to achieve a certain vacuum level in the vacuum chamber. As the gas in the vacuum chamber becomes increasingly rarefied, the intermolecular distance and the free movement distance of molecules or ions increase. Under the influence of an electric field, molecules or ions collide with each other to form plasma. This plasma then reacts chemically or physically with the exposed surface of the thin film, thereby achieving cleaning, modification, and other purposes.
[0003] Current vacuum plasma treatment equipment typically employs a continuous pulling method to process thin films, achieving large-area continuous processing. However, for some tough films, contaminants can become trapped in surface crevices, preventing them from reacting with the plasma. Furthermore, some reactants generated from the contaminants on the film may remain on the surface, resulting in incomplete cleaning. Therefore, this invention proposes a thin film vacuum plasma treatment device that can solve the above problems. Summary of the Invention
[0004] The purpose of this invention is to provide a thin-film vacuum plasma processing device to solve the problems mentioned in the background art.
[0005] To achieve the above objectives, the present invention provides the following technical solution: a thin-film vacuum plasma processing device, comprising:
[0006] The processing chamber contains an isolation box for placing film raw materials, and is equipped with a plasma generator and a vacuum suction source.
[0007] The belt has sleeves at both ends for the film to pass through;
[0008] The traction mechanism includes a traction component disposed in the processing chamber and a contact component disposed on each set of the sleeves. The traction component can expand and contract the film through the contact component, so that the plasma reacts with the components on the surface of the film and then scrapes off the residual reactants on the film.
[0009] The collection chamber is connected to the processing chamber via a conveying channel. A movable component is installed in the collection chamber, which allows the film to pass through the conveying channel from the processing chamber and into the collection chamber for winding. A cleaning component is also installed in the collection chamber for cleaning during film winding.
[0010] As a preferred embodiment of the present invention, the material conveying channel is flat-mouthed, and elastic layers are respectively provided on the inner walls of both sides of the material conveying channel. The elastic layers can fit the film passing through the material conveying channel without gaps.
[0011] As a preferred embodiment of the present invention, there are multiple ion generators, which are distributed on different sides of the thin film in the processing chamber.
[0012] As a preferred embodiment of the present invention, the movable component includes a frame box, a truss and a roller located within the frame box, wherein the roller can rotate on the truss to wind up the film.
[0013] As a preferred technical solution of the present invention, the movable component further includes a first telescopic source and a first rotating source. The movable end of the first telescopic source is connected to the frame box, and the output shaft of the first rotating source is connected to a support rod extending to one side. The support rod is detachably connected to the roller body through a fixing member. The support rod drives the roller body to rotate around the output shaft of the power source to wind the film in an oscillating state. After the film is wound up, the first telescopic source drives the truss to move upward so that the film is tightened on the roller body.
[0014] As a preferred technical solution of the present invention, the cleaning component includes an air inlet source and an air outlet source that can generate airflow movement inside the treatment chamber. The air outlet of the air inlet source is connected to multiple sets of air blowing pipes, and the multiple sets of air outlet pipes are located on different sides of the membrane. Each set of air blowing pipes has several air outlets facing the membrane.
[0015] As a preferred technical solution of the present invention, the contact component includes a second telescopic source mounted on the sleeve, a first clamping plate connected to the second telescopic source, and a second clamping plate disposed inside the sleeve. The first clamping plate and the second clamping plate are each provided with a plurality of protruding teeth on the side adjacent to each other.
[0016] As a preferred technical solution of the present invention, the traction assembly includes a straight rail fixed in the collection chamber and a second rotation source. Movable blocks are respectively provided at both ends of the sleeve. The movable blocks are slidably connected to the straight rail, and each set of movable blocks is connected to a set of elastic elements. The output shaft of the second rotation source is connected to a cylinder. A pull rope is wound around the cylinder. The pull rope extends out of the cylinder and connects to the center of the belt.
[0017] As a preferred technical solution of the present invention, the second telescopic source drives the first clamping plate to approach the second clamping plate to clamp the film, and the second rotation source drives the cylinder to wind up the rope and then relax it, so that the belt pulls the film to contract inward and then expands it outward under the action of the elastic element; the second telescopic source drives the first clamping plate away from the second clamping plate to contact the film through the convex teeth, and the second rotation source drives the cylinder to wind up the rope and then relax it, so that the belt pulls the two sets of sleeves to move towards each other along the film and then moves in opposite directions along the film under the action of the elastic element.
[0018] A thin-film vacuum plasma processing method, used in any of the above-described technical solutions, specifically includes the following steps:
[0019] S1. Place the film raw material in the isolation box and allow the film to pass from the processing chamber through the conveying channel into the collection chamber and connect with the moving component;
[0020] S2. The film remains in the processing chamber. The plasma generator generates plasma that comes into contact with both sides of the film. The traction component and the contact component stretch and compress the film, so that the gaps on the film surface are opened. The contaminants come into contact with the plasma and react and decompose. The reactants after reaction and decomposition are scraped off to initially reduce the residue on the film.
[0021] S3. The film after being pulled and processed by the moving component enters the collection chamber for winding. The film is then cleaned a second time by the cleaning component to further remove any residual reactants on the film.
[0022] Compared with the prior art, the beneficial effects of the present invention are: The present invention provides a thin film vacuum plasma treatment device in which the thin film remains in the treatment chamber, the plasma generator can generate plasma that contacts the two sides of the thin film, the traction component and the contact component expand and contract the thin film, so that the gaps on the surface of the thin film are opened, and the dirt comes into contact with the plasma and reacts and decomposes. The reactants after reaction and decomposition are scraped off, thus initially reducing the residue on the thin film.
[0023] The moving component pulls the film into the feeding chamber for winding. During the winding process, the cleaning component performs a secondary cleaning of the film to further remove residual reactants on the film. This enables the contaminants trapped in the gaps on the film surface to fully contact and react with the plasma when processing large areas of film continuously. After preliminary scraping and final cleaning, the residual reactants on the film are removed, improving the film cleaning effect. Attached Figure Description
[0024] Figure 1 This is a schematic diagram of the overall structure of the present invention;
[0025] Figure 2 This is a cross-sectional view of the overall structure of the present invention;
[0026] Figure 3This is a schematic diagram of the interior structure of the room processed by the present invention;
[0027] Figure 4 This is a schematic diagram of the traction component structure of the present invention;
[0028] Figure 5 This is a schematic diagram of the contact component structure of the present invention;
[0029] Figure 6 This is a schematic diagram showing the connection relationship between the sleeve and the straight rail of the present invention;
[0030] Figure 7 This is a schematic diagram of the internal structure of the material collection chamber of the present invention;
[0031] Figure 8 This is a schematic diagram of the cleaning component structure of the present invention;
[0032] Figure 9 This is a schematic diagram of the active component structure of the present invention;
[0033] In the diagram: 100, processing chamber; 110, isolation box; 200, belt body; 210, sleeve body; 211, moving block; 212, elastic element; 300, traction mechanism; 310, traction assembly; 311, straight rail; 312, second rotation source; 313, cylinder; 314, pull rope; 320, contact assembly; 321, second telescopic source; 322, first clamping plate; 323, second clamping plate; 324, protruding tooth; 400, collection chamber; 410, conveying channel; 420, movable assembly; 421, frame box; 422, truss; 423, roller body; 424, first telescopic source; 425, first rotation source; 426, support rod; 430, cleaning assembly; 431, air inlet; 432, air outlet; 433, blower pipe; 434, air outlet. Detailed Implementation
[0034] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention. Example 1
[0035] Please see Figure 1-9 A thin-film vacuum plasma treatment device includes a treatment chamber 100, a belt 200, a traction mechanism 300, and a collection chamber 400.
[0036] Please see Figure 1 , Figure 2The processing chamber 100 is equipped with an isolation box 110 for placing the film raw material. The processing chamber 100 is also equipped with a plasma generator and a vacuum suction source. The processing chamber 100 is equipped with a door. The film raw material is placed in the isolation box 110 by opening the door. The plasma generator and vacuum suction source are not shown in the figure. The vacuum suction source is preferably a vacuum pump, which can perform vacuum treatment on the processing chamber. There are multiple plasma generators, which are distributed on different sides of the film in the processing chamber 100. The plasma generator can generate plasma to contact the two sides of the film.
[0037] Please see Figure 1 , Figure 2 , Figure 3 The belt 200 has sleeves 210 at both ends for the film to pass through. The traction mechanism 300 includes a traction component 310 in the processing chamber 100 and a contact component 320 on each set of sleeves 210. The traction component 310 can expand and contract the film through the contact component 320, so that the plasma reacts with the components on the film surface and then the residual reactants on the film are scraped off. The film can move through the two sets of sleeves 210 to realize continuous processing of large-area films. During the processing, the film can stay in the processing chamber 100. Under the action of the traction component 310 and the contact component 320, the film is expanded and contracted, so that the gaps on the film surface are opened and the dirt reacts and decomposes with the plasma. The reactants after decomposition are scraped off, initially reducing the residue on the film.
[0038] Please see Figure 1 , Figure 2 , Figure 7 The collecting chamber 400 is connected to the processing chamber 100 via a conveying channel 410. The conveying channel 410 is flat and has elastic layers on both sides of its inner walls. The elastic layers can fit the film passing through the conveying channel 410 without gaps, preventing air from the collecting chamber 400 from leaking into the processing chamber 100. A movable component 420 is installed in the collecting chamber 400. The movable component 420 allows the film to pass through the conveying channel 410 after being processed in the processing chamber 100 and enter the collecting chamber 400 for winding. A cleaning component 430 is installed on the collecting chamber 400 for cleaning during film winding. After the film is treated by plasma and the reactants are initially scraped off in the processing chamber 100, it is pulled into the feeding chamber by the movable component 420 for winding. During the winding process, the cleaning component 430 performs a final cleaning of the film to further remove any remaining reactants.
[0039] The film material is placed in the isolation box 110. The film material can be intermittently driven from the processing chamber 100 into the collection chamber 400 for winding by the movable component 420. During this process, the film stays in the processing chamber 100. The plasma generator can generate plasma that contacts both sides of the film. The traction component 310 and the contact component 320 stretch and compress the film, so that the gaps on the film surface are opened and the dirt reacts and decomposes with the plasma. The reactants after reaction and decomposition are scraped off to initially reduce the residue on the film. The movable component 420 pulls the film into the feeding chamber for winding. During the winding process, the cleaning component 430 performs a secondary cleaning of the film to further remove the reactants remaining on the film. This achieves effective contact and reaction of dirt trapped in the gaps on the film surface with the plasma when processing large areas of film continuously. After initial scraping and final cleaning, the reactants remaining on the film are removed, improving the film cleaning effect. Example 2
[0040] Based on Example 1, please refer to Figure 7 , Figure 9 The movable component 420 includes a frame box 421, a truss 422 and a roller 423 located inside the frame box 421. The roller 423 can rotate on the truss 422 to wind up the film. The movable component 420 also includes a first telescopic source 424 and a first rotation source 425. The movable end of the first telescopic source 424 is connected to the frame box 421. The output shaft of the first rotation source 425 is connected to a support rod 426 extending to one side. The support rod 426 drives the roller 423 to rotate around the output shaft of the power source to wind up the film in an oscillating state. After the film is wound up, the first telescopic source 424 drives the truss 422 to move upward so that the film is tightened on the roller 423. The first telescopic source 424 is preferably a telescopic component such as an electric cylinder. The first rotation source 425 is preferably a servo motor. The support rod 426 is detachably connected to the roller 423 by a fixing component such as a screw or bolt, so that the roller 423 can be detached and unloaded after winding is completed.
[0041] Please see Figure 8 , Figure 9 The cleaning components include an air inlet 431 and an air outlet 432 that can generate airflow inside the treatment chamber 100. The air outlet 434 of the air inlet 431 is connected to multiple sets of air ducts 433. The multiple sets of air ducts are located on different sides of the membrane, and each set of air ducts 433 has several air outlets 434 facing the membrane. The air inlet 431 and the air outlet 432 are preferably fans.
[0042] When the film is wound up, the first rotation source 425 drives the roller 423 to rotate around the output shaft of the first rotation source 425 through the support rod 426, that is, the film is wound up in an oscillating state. During the winding process, the film passes between multiple sets of air outlet pipes. The air outlet pipe blows air onto the oscillating film through the air outlet 434. The film falls down under the action of oscillation and air blowing, and the residual reactants are shaken off and blown away. Under the action of the exhaust source 432, the reactants are drawn out from the collection chamber 400 by the airflow. Example 3
[0043] Based on Example 1 or Example 2, please refer to Figure 5 The contact component 320 includes a second telescopic source 321 mounted on the sleeve 210, a first clamping plate 322 connected to the second telescopic source 321, and a second clamping plate 323 disposed inside the sleeve 210. The first clamping plate 322 and the second clamping plate 323 are provided with a plurality of protruding teeth 324 on the side close to each other. The second telescopic source 321 is preferably a telescopic component such as a miniature electric cylinder. The second telescopic source 321 can drive the first clamping plate 322 to approach or move away from the second clamping plate 323 to clamp or release the film. When the film is released, it can contact the protruding teeth 324 on the first clamping plate 322 and the second clamping plate 323.
[0044] Please see Figure 4 , Figure 6 The traction assembly 310 includes a straight rail 311 fixed in the collection chamber 400 and a second rotation source 312. The sleeve 210 has moving blocks 211 at both ends, which slide against the straight rail 311. Each set of moving blocks 211 is connected to a set of elastic elements 212. The output shaft of the second rotation source 312 is connected to a cylinder 313. A pull rope 314 is wound around the cylinder 313. The pull rope 314 extends out of the cylinder 313 and connects to the center of the belt 200. The second rotation source 312 is preferably a servo motor, and the elastic element 212 is preferably a spring. The second rotation source 312 can drive the cylinder 313 to wind up the pull rope 314 and drive the moving blocks 211 to stretch the elastic elements 212 through the belt 200. When the second rotation source 312 stops driving the cylinder 313, the elastic element 212 drives the moving blocks 211 to reset under the elastic action.
[0045] During film processing, the second telescopic source 321 drives the first clamping plate 322 to approach the second clamping plate 323 to clamp the film. The second rotating source 312 drives the cylinder 313 to wind up the rope and then release it, causing the belt 200 to pull the film inward and then stretch it outward under the action of the elastic element 212. This causes the gaps on the film surface to be opened during the contraction and stretching process. The dirt inside the gaps comes into contact with the plasma and reacts and decomposes. After the film has undergone multiple contractions and stretching, the second telescopic source 321 drives the first clamping plate 322 away from the second clamping plate 323. The convex teeth 324 contact the film, and the second rotating source 312 drives the cylinder 313 to wind up the rope and then release it, so that the belt 200 pulls the two sets of sleeves 210 to move towards each other along the film. Then, under the action of the elastic element 212, they move in the opposite direction along the film. During the up and down movement of the sleeves 210, the convex teeth 324 are brought into contact with the film, and the reaction residue on the film surface is initially scraped off. In addition, the film is in motion throughout the process, which can shake off the reactants on it, further improving the removal effect of the reactants. Example 4
[0046] A thin-film vacuum plasma treatment method specifically includes the following steps:
[0047] S1. Place the film raw material in the isolation box 110, and let the film pass from the processing chamber 100 through the conveying channel 410 into the collection chamber 400 and connect with the moving component 420.
[0048] S2. The film remains in the processing chamber 100. The plasma generator generates plasma that comes into contact with both sides of the film. The traction component 310 and the contact component 320 stretch and compress the film, so that the gaps on the surface of the film are opened and the dirt comes into contact with the plasma and reacts and decomposes. The reactants after reaction and decomposition are scraped off to initially reduce the residue on the film.
[0049] S3. The film after being pulled and processed by the moving component 420 enters the collection chamber 400 for winding. The film is then cleaned a second time by the cleaning component 430 to further remove residual reactants on the film.
[0050] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.
Claims
1. A thin-film vacuum plasma processing device, characterized in that, include: The processing chamber contains an isolation box for placing film raw materials, and is equipped with a plasma generator and a vacuum suction source. The belt has sleeves at both ends for the film to pass through; The traction mechanism includes a traction component disposed in the processing chamber and a contact component disposed on each set of the sleeves. The traction component can expand and contract the film through the contact component, so that the plasma reacts with the components on the surface of the film and then scrapes off the residual reactants on the film. The collection chamber is connected to the processing chamber via a conveying channel. A movable component is installed in the collection chamber, which allows the film to pass through the conveying channel from the processing chamber and into the collection chamber for winding. A cleaning component is also installed in the collection chamber for cleaning during film winding. The contact assembly includes a second telescopic source mounted on the sleeve, a first clamping plate connected to the second telescopic source, and a second clamping plate disposed inside the sleeve. The first clamping plate and the second clamping plate are each provided with a plurality of protruding teeth on the side adjacent to each other. The traction assembly includes a straight rail fixed in the collection chamber and a second rotation source. Movable blocks are respectively provided at both ends of the sleeve. The movable blocks are slidably connected to the straight rail, and each set of movable blocks is connected to a set of elastic elements. The output shaft of the second rotation source is connected to a cylinder. A pull rope is wound around the cylinder. The pull rope extends out of the cylinder and connects to the center of the belt. The second telescopic source drives the first clamping plate to approach the second clamping plate to clamp the film. The second rotation source drives the cylinder to wind up the rope and then release it, so that the belt pulls the film inward and then stretches it outward under the action of the elastic element. The second telescopic source drives the first clamping plate away from the second clamping plate and contacts the film through the convex teeth. The second rotation source drives the cylinder to wind up the rope and then release it, so that the belt pulls the two sets of sleeves to move towards each other along the film and then moves in the opposite direction along the film under the action of the elastic element.
2. The thin-film vacuum plasma processing equipment according to claim 1, characterized in that, The material conveying channel is flat and has elastic layers on both sides of its inner wall. The elastic layers can fit the film passing through the material conveying channel without gaps.
3. The thin-film vacuum plasma processing equipment according to claim 1, characterized in that, There are multiple ion generators, distributed on different sides of the thin film within the processing chamber.
4. The thin-film vacuum plasma processing equipment according to claim 1, characterized in that, The movable component includes a frame box, and a truss and rollers located within the frame box, the rollers being able to rotate on the truss to wind up the film.
5. A thin-film vacuum plasma processing device according to claim 4, characterized in that, The active component also includes a first telescopic source and a first rotating source. The movable end of the first telescopic source is connected to the frame box. The output shaft of the first rotating source is connected to a support rod extending to one side. The support rod is detachably connected to the roller body through a fixing member. The support rod drives the roller body to rotate around the output shaft of the power source to wind up the film in an oscillating state. After the film is wound up, the first telescopic source drives the truss to move upward so that the film is tightened on the roller body.
6. The thin-film vacuum plasma processing equipment according to claim 1, characterized in that, The cleaning assembly includes an air inlet and an air outlet that can generate airflow inside the treatment chamber. The air inlet outlet is connected to multiple sets of air ducts, which are located on different sides of the membrane. Each set of air ducts has several air outlets facing the membrane.
7. A thin-film vacuum plasma treatment method, used in the thin-film vacuum plasma treatment apparatus according to any one of claims 1-6, characterized in that, Specifically, it includes the following steps: S1. Place the film raw material in the isolation box and allow the film to pass from the processing chamber through the conveying channel into the collection chamber and connect with the moving component; S2. The film remains in the processing chamber. The plasma generator generates plasma that comes into contact with both sides of the film. The traction component and the contact component stretch and compress the film, so that the gaps on the film surface are opened. The contaminants come into contact with the plasma and react and decompose. The reactants after reaction and decomposition are scraped off to initially reduce the residue on the film. S3. The film after being pulled and processed by the moving component enters the collection chamber for winding. The film is then cleaned a second time by the cleaning component to further remove any residual reactants on the film.