An oxygen purification system

Abstract

The application is suitable for the technical field of oxygen production system, and discloses an oxygen purification system, which comprises, in sequence, a gas supply device, a buffer, a filter assembly, an adsorption assembly, a compressor, a buffer tank and a collecting device. The buffer is formed with oppositely arranged first and second bottom walls, which are arranged in sequence in the direction of gas flow. The first bottom wall is formed with a first deformation part, so that the first bottom wall is deformed when subjected to external force and forms a first gap for gas flow. The second bottom wall is formed with a second deformation part, so that the second bottom wall is deformed when subjected to external force and forms a second gap for gas flow. By arranging the buffer before the filter assembly, the flow rate of gas in the pipeline can be slowed down, the first and second deformation parts are deformed to slow down the flow rate of gas, and the filtering effect and the purification effect of the gas are improved.

Description

Technical Field

[0001] The present invention relates to the technical field of oxygen production systems, and in particular to an oxygen purification system. Background Art

[0002] Pressure swing adsorption (PSA) oxygen production technology is an air separation technology that produces oxygen. It primarily relies on the varying adsorption capacities of key components of PSA molecular sieves at varying pressures to separate the various gas components in the air. PSA oxygen production equipment is widely used in industries such as chemical, electronics, medical, metallurgy, and environmental management.

[0003] Before oxygen and nitrogen adsorption separation, impurities and moisture in the air need to be filtered through a filter. However, in some existing technologies, the gas flow rate is not slowed down before filtration. Therefore, the residence time of the gas to be purified in the filter is short, resulting in poor filtration effect, which in turn affects the oxygen purification effect. In other technologies, the structure of slowing down the gas flow rate is relatively complex and costly. Summary of the Invention

[0004] The purpose of the present invention is to provide an oxygen purification system, which aims to solve the technical problems of the existing oxygen purification system that slows down the gas flow rate, has a relatively complex structure, high cost and poor purification effect.

[0005] To achieve the above object, the present invention provides the following solutions:

[0006] An oxygen purification system, comprising:

[0007] Gas supply equipment, filter assembly, adsorption assembly, compressor, buffer tank and collection device connected in sequence;

[0008] a buffer member, the buffer member being arranged in a pipeline connecting the gas supply device and the filter assembly, the buffer member being formed with a first bottom wall and a second bottom wall arranged opposite to each other, the first bottom wall and the second bottom wall being arranged sequentially in the direction of gas flow, the first bottom wall being formed with a first deforming portion so that the first bottom wall is deformed when subjected to an external force and a first gap for air flow to pass through is formed, and the second bottom wall being formed with a second deforming portion so that the second bottom wall is deformed when subjected to an external force and a second gap for air flow to pass through is formed;

[0009] The buffer member is formed with a cavity, the cavity is located between the first bottom wall and the second bottom wall, and the first gap and the second gap are respectively communicated with the cavity.

[0010] Optionally, the first bottom wall has a first dividing line, and the first dividing line extends into the cavity to divide the first bottom wall into a plurality of first deformation portions;

[0011] The second bottom wall has a second split line extending into the cavity to split the second bottom wall into a plurality of second deformation portions.

[0012] Optionally, the first deformation portion is provided with a plurality of first vent holes for gas to pass through, the first vent holes being in communication with the cavity.

[0013] The second deformation portion is provided with a plurality of second vent holes for gas to pass through, the second vent holes being in communication with the cavity.

[0014] Optionally, the number of the first vent holes gradually decreases near the center of the first bottom wall, and the number of the second vent holes gradually decreases near the center of the second bottom wall.

[0015] The first vent holes form at least two annular rings with different diameters, and the second vent holes form at least two annular rings with different diameters.

[0016] Optionally, the first vent holes include an annular groove segment and a straight hole segment connected to the annular groove segment, the straight hole segment is arranged near the second bottom wall, the diameters of the straight hole segments are equal, and the diameter of the annular groove segment gradually increases away from the straight hole segment.

[0017] Optionally, the first deformation portion has a plurality of first notches, the first notches enclose a first through hole, the second deformation portion has a plurality of second notches, the second notches enclose a second through hole, and the diameter of the first through hole is greater than the diameter of the second through hole.

[0018] Optionally, the buffer further includes an extension wall, one end of the extension wall is connected to the first bottom wall, the other end of the extension wall is connected to the second bottom wall, the extension wall is in a cylindrical shape, the cavity is enclosed by the first bottom wall, the extension wall, and the second bottom wall, and the first deformation portion and the second deformation portion are made of flexible material.

[0019] Optionally, the oxygen purification system includes a first main line, a second main line, a first branch line, and a second branch line, the adsorption assembly includes a first adsorption tower and a second adsorption tower, the first main line is connected in parallel with the first branch line and the second branch line, the second main line is connected in parallel with the first branch line and the second branch line, the gas supply device, the buffer, and the filter assembly are arranged in sequence on the first main line, the first adsorption tower is arranged on the first branch line, the second adsorption tower is arranged on the second branch line, and the compressor, the buffer tank, and the collection device are arranged in sequence on the second main line.

[0020] Optionally, the oxygen purification system further includes a control valve assembly, the control valve assembly including a first one-way valve, a first solenoid valve, a second solenoid valve, a first control valve, a second control valve and a third control valve, the first one-way valve being arranged between the buffer and the filter assembly, the first solenoid valve being arranged on the first branch and located before the first adsorption tower, the second solenoid valve being arranged on the second branch and located before the second adsorption tower, the first control valve being arranged on the first branch and located between the second main road and the first adsorption tower, the second control valve being arranged on the second branch and located between the second main road and the second adsorption tower, and the third control valve being arranged between the cache tank and the collection device;

[0021] The oxygen purification system further includes an oxygen concentration sensor, which is disposed in the buffer tank.

[0022] Optionally, the oxygen purification system further includes a third branch, a fourth branch, and a fifth branch, and the control valve assembly further includes a fourth control valve, a fifth control valve, and a sixth control valve, one end of the third branch is connected to the cache tank, and the other end is connected to the first main road and is located after the filter assembly, the fourth control valve is provided on the third branch, the fourth branch is connected to the first adsorption tower, the fifth control valve is provided on the fourth branch, the fifth branch is connected to the second adsorption tower, and the sixth control valve is provided on the fifth branch;

[0023] The oxygen purification system further includes a power pump, which is used to provide power for air flow.

[0024] Compared with the prior art, the present invention has the following beneficial effects:

[0025] The oxygen purification system provided by the present invention can slow down the flow rate of gas in the pipeline by providing a buffer member before the filter assembly. The first deformable portion and the second deformable portion are made of flexible materials. The buffer member is provided in the pipeline. The fast-flowing gas impacts the buffer member, and the first deformable portion and the second deformable portion are deformed to achieve the purpose of slowing down the flow rate of gas. At the same time, two barrier layers of the first deformable portion and the second deformable portion are provided to slow down the flow rate of gas. After two decelerations, the flow rate of gas passing through the filter assembly is greatly reduced, thereby extending the time the gas stays in the filter assembly, which is beneficial to improving the filtering effect and purification effect of the gas. In addition, the buffer member of the present application has a simple structure, which is beneficial to reducing the cost of the oxygen purification system. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed in the embodiments or prior art description. Obviously, the drawings in the following description only show some embodiments of the present application, and for those skilled in the art, other drawings can also be obtained from the structures shown in these drawings without any creative effort.

[0027] Figure 1 is a schematic diagram of an oxygen purification system provided by an embodiment of the present application;

[0028] Figure 2 is a schematic diagram of installation of a buffer in a pipeline provided by an embodiment of the present application;

[0029] Figure 3 is a schematic diagram of a buffer structure in one perspective provided by an embodiment of the present application;

[0030] Figure 4 is a schematic diagram of a buffer structure in another perspective provided by an embodiment of the present application;

[0031] Figure 5 is a sectional view of the buffer provided by an embodiment of the present application;

[0032] Figure 6 is Figure 5 is a local enlarged schematic diagram of A in FIG. 1.

[0033] Explanation of reference numerals:

[0034] 100, oxygen purification system; 110, gas supply device; 120, buffer; 121, first bottom wall; 1211, first deformation part; 1212, first division line; 1213, first air hole; 1213A, annular groove section; 1213B, straight hole section; 1214, first notch; 122, second bottom wall; 1221, second deformation part; 1222, second division line; 1223, second air hole; 1224, second notch; 123, cavity; 124, extension wall; 130, filter assembly; 140, adsorption assembly; 141, first adsorption tower; 142, second adsorption tower; 150, compressor; 160, buffer tank; 170, collection device; 1801, first main path; 1802, second main path; 1803, first branch path; 1804, second branch path; 1805, third branch path; 1806, fourth branch path; 1807, fifth branch path; 1808, power pump; 1809, oxygen concentration sensor; 190, control valve assembly; 191, first one-way valve; 192, first electromagnetic valve; 193, second electromagnetic valve; 194, first control valve; 195, second control valve; 196, third control valve; 197, fourth control valve; 198, fifth control valve; 199, sixth control valve. DETAILED DESCRIPTION

[0035] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. All other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making any creative efforts shall fall within the scope of protection of the present invention.

[0036] It should be noted that all directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of the present invention are only used to explain the relative position relationship and movement status of various components in a certain specific posture. If the specific posture changes, the directional indication will also change accordingly.

[0037] It should also be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be an intervening element. When an element is referred to as being "connected to" another element, it may be directly connected to the other element or indirectly connected to the other element through an intervening element.

[0038] In addition, the descriptions of "first", "second", etc. in the present invention are for descriptive purposes only and should not be understood as indicating or implying their relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" or "second" may explicitly or implicitly include at least one of such features. In addition, the technical solutions between the various embodiments can be combined with each other, but this must be based on the fact that they can be implemented by ordinary technicians in this field. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such combination of technical solutions does not exist and is not within the scope of protection required by the present invention.

[0039] like Figures 1-6As shown, an oxygen purification system 100 includes a gas supply device 110, a buffer 120, a filter assembly 130, an adsorption assembly 140, a compressor 150, a cache tank 160, and a collection device 170 that are connected in sequence. The buffer 120 is provided in a pipeline connecting the gas supply device 110 and the filter assembly 130. The buffer 120 is formed with a first bottom wall 121 and a second bottom wall 122 that are arranged opposite to each other. The first bottom wall 121 and the second bottom wall 122 are arranged in sequence in the direction of gas flow. The first bottom wall 121 is formed with a first deformation portion 1211, so that the first bottom wall 121 is deformed when subjected to an external force and a first gap is formed for gas flow to pass through. The second bottom wall 122 is formed with a second deformation portion 1221, so that the second bottom wall 122 is deformed when subjected to an external force and a second gap is formed for gas flow to pass through. The buffer member 120 defines a cavity 123, which is located between the first bottom wall 121 and the second bottom wall 122. The first gap and the second gap are respectively connected to the cavity 123. For example, the gas to be purified produced by the gas supply device 110 passes through the first bottom wall 121 and the second bottom wall 122 in sequence. The gas to be purified impacts the first bottom wall 121, causing the first deformed portion 1211 to bend toward the end closer to the cavity 123, thereby slowing down the flow of the gas for the first time. The gas to be purified then passes through the second bottom wall 122, causing the second deformed portion 1221 to bend toward the end farther from the cavity 123, thereby slowing down the flow of the gas for the second time.

[0040] like Figure 1 、 Figure 3 、 Figure 4 As shown, the oxygen purification system 100 provided by the present invention can slow down the flow rate of the gas in the pipeline by setting a buffer 120 before the filter assembly 130. The first deformable portion 1211 and the second deformable portion 1221 are made of flexible materials. The buffer 120 is set in the pipeline. The fast-flowing gas impacts the buffer 120, and the first deformable portion 1211 and the second deformable portion 1221 are deformed to achieve the purpose of slowing down the gas flow rate. At the same time, two barrier layers of the first deformable portion 1211 and the second deformable portion 1221 are set to slow down the gas flow rate. After two speed reductions, the flow rate of the gas when passing through the filter assembly 130 is greatly reduced, thereby extending the time of the gas in the filter assembly 130, which is beneficial to improving the filtering effect and purification effect of the gas. In addition, the buffer 120 of the present application has a simple structure, which is beneficial to reducing the cost of the oxygen purification system 100.

[0041] like Figure 2 As shown, in this embodiment, the buffer 120 is placed in the pipeline by opening a groove in the pipeline. At the same time, the buffer 120 is made of a flexible material, that is, when the buffer 120 is placed in the pipeline, the buffer 120 can be placed in by deforming.

[0042] like Figure 3 、 Figure 4 、 Figure 5 As shown, as an embodiment, the first bottom wall 121 has a first dividing line 1212, which extends into the cavity 123 to divide the first bottom wall 121 into a plurality of first deformable portions 1211; the second bottom wall 122 has a second dividing line 1222, which extends into the cavity 123 to divide the second bottom wall 122 into a plurality of second deformable portions 1221. Exemplarily, the first bottom wall 121 is circular, and there are multiple first dividing lines 1212 that divide the first bottom wall 121 into the plurality of first deformable portions 1211, and the plurality of first dividing lines 1212 all pass through the center of the first bottom wall 121. It can be understood that the divided first deformable portions 1211 are fan-shaped. The second bottom wall 122 is circular, and the second dividing lines 1222 have multiple second deformation portions 1221 that divide the second bottom wall 122. Each of the second dividing lines 1222 passes through the center of the second bottom wall 122. It can be understood that the divided second deformation portions 1221 are fan-shaped. The first gap is caused by the first deformation portion 1211 being deformed by the impact of the airflow, causing the first dividing line 1212 to expand, thereby creating a gap for the gas to be purified to pass through. The second gap is caused by the second deformation portion 1221 being deformed by the impact of the airflow, causing the second dividing line 1222 to expand, thereby creating a gap for the gas to be purified to pass through.

[0043] like Figure 3 、 Figure 4 、 Figure 5 As shown, as an embodiment, the first deformable portion 1211 is distributed with a plurality of first vents 1213 for gas to pass through, and the first vents 1213 are in communication with the cavity 123; the second deformable portion 1221 is distributed with a plurality of second vents 1223 for gas to pass through, and the second vents 1223 are in communication with the cavity 123. For example, the first vents 1213 and the second vents 1223 are circular holes, and the first vents 1213 and the second vents 1223 are for the gas to be purified to pass through. In other words, in addition to being able to pass through the buffer member 120 through the first and second gaps, the gas to be purified can also pass through the buffer member 120 through the first vents 1213 and the second vents 1223.

[0044] like Figure 3 、 Figure 4 、 Figure 5 As shown, as an embodiment, the number of the first air holes 1213 gradually decreases near the center of the first bottom wall 121, and the number of the second air holes 1223 gradually decreases near the center of the second bottom wall 122; the first air holes 1213 constitute at least two rings with different diameters, and the second air holes 1223 constitute at least two rings with different diameters.

[0045] like Figure 3 、 Figure 5 、 Figure 6 As shown, as an embodiment, the first vent 1213 includes an annular groove section 1213A and a straight hole section 1213B connected to the annular groove section 1213A. The straight hole section 1213B is located near the second bottom wall 122. The diameters of each portion of the straight hole section 1213B are equal, while the diameter of the annular groove section 1213A gradually increases in the direction away from the straight hole section 1213B. For example, the opening of the annular groove section 1213A gradually increases, which facilitates the entry of the gas to be purified into the first vent 1213. The annular groove section 1213A has an inclined wall, so the gas to be purified first collides with the inclined wall of the annular groove section 1213A, thereby reducing the flow rate of the gas to be purified.

[0046] like Figure 3 、 Figure 4 、 Figure 5 As shown, as an embodiment, the first deformable portion 1211 has a first notch 1214, and multiple first notches 1214 enclose a first opening. The second deformable portion 1221 has a second notch 1224, and multiple second notches 1224 enclose a second opening, and the diameter of the first opening is greater than the diameter of the second opening. Exemplarily, the multiple first notches 1214 enclose a circle, and the center of the circle coincides with the center of the first bottom wall 121. The multiple second notches 1224 enclose a circle, and the center of the circle coincides with the center of the second bottom wall 122.

[0047] like Figure 3 、 Figure 4 、 Figure 5 As shown, as an embodiment, the buffer member 120 further includes an extension wall 124, one end of which is connected to the first bottom wall 121 and the other end is connected to the second bottom wall 122. The extension wall 124 is cylindrical, and the cavity 123 is enclosed by the first bottom wall 121, the extension wall 124, and the second bottom wall 122. The first deformable portion 1211 and the second deformable portion 1221 are both made of a flexible material. For example, the buffer member 120 is cylindrical, with the first bottom wall 121 and the second bottom wall 122 respectively connected to the ends of the extension wall 124.

[0048] like Figure 1 、 Figure 3 、 Figure 4As shown, as an embodiment, the oxygen purification system 100 includes a first main path 1801, a second main path 1802, a first branch path 1803 and a second branch path 1804, the adsorption component 140 includes a first adsorption tower 141 and a second adsorption tower 142, the first main path 1801 is connected in parallel with the first branch path 1803 and the second branch path 1804 respectively, the second main path 1802 is connected in parallel with the first branch path 1803 and the second branch path 1804 respectively, the gas supply equipment 110, the buffer part 120, and the filter component 130 are sequentially arranged on the first main path 1801, the first adsorption tower 141 is arranged on the first branch path 1803, the second adsorption tower 142 is arranged on the second branch path 1804, the compressor 150, the cache tank 160 and the collection device 170 are sequentially arranged on the second main path 1802.

[0049] like Figure 1 、 Figure 3 、 Figure 4 As shown, as an embodiment, the oxygen purification system 100 also includes a control valve assembly 190, and the control valve assembly 190 includes a first one-way valve 191, a first solenoid valve 192, a second solenoid valve 193, a first control valve 194, a second control valve 195 and a third control valve 196. The first one-way valve 191 is arranged between the buffer 120 and the filter assembly 130, the first solenoid valve 192 is arranged on the first branch 1803 and is located before the first adsorption tower 141, the second solenoid valve 193 is arranged on the second branch 1804 and is located before the second adsorption tower 142, the first control valve 194 is arranged on the first branch 1803 and is located between the second main road 1802 and the first adsorption tower 141, the second control valve 195 is arranged on the second branch 1804 and is located between the second main road 1802 and the second adsorption tower 142, and the third control valve 196 is arranged between the cache tank 160 and the collection device 170. For example, the function of the first one-way valve 191 is to prevent the backflow of the gas to be purified in the filter assembly 130, the function of the first solenoid valve 192 is to prevent the backflow of the gas to be purified in the first adsorption tower 141, and the function of the second solenoid valve 193 is to prevent the backflow of the gas to be purified in the second adsorption tower 142. The function of the first adsorption tower 141 and the second adsorption tower 142 is to perform oxygen and nitrogen adsorption separation. It should be noted that the purpose of providing the first adsorption tower 141 and the second adsorption tower 142 is to enable the two adsorption towers to be switched for use. That is, after the first adsorption tower 141 performs oxygen and nitrogen adsorption separation, the first solenoid valve 192 is closed and the second solenoid valve 193 is opened, and the second adsorption tower 142 is switched to continue the oxygen and nitrogen adsorption separation, thereby improving the purification efficiency of the oxygen purification system 100. At the same time, it is understandable that the first solenoid valve 192 and the second solenoid valve 193 can be replaced by a two-position three-way valve.

[0050] like Figure 1 、 Figure 3 、 Figure 4As shown, as an embodiment, the oxygen purification system 100 also includes a third branch 1805, a fourth branch 1806 and a fifth branch 1807, and the control valve assembly 190 also includes a fourth control valve 197, a fifth control valve 198 and a sixth control valve 199. One end of the third branch 1805 is connected to the cache tank 160, and the other end is connected to the first main road 1801 and is located after the filter assembly 130. The fourth control valve 197 is arranged on the third branch 1805, the fourth branch 1806 is connected to the first adsorption tower 141, the fifth control valve 198 is arranged on the fourth branch 1806, the fifth branch 1807 is connected to the second adsorption tower 142, and the sixth control valve 199 is arranged on the fifth branch 1807. For example, after the first adsorption tower 141 adsorbs oxygen from the gas to be purified, the fifth control valve 198 is opened, and the remaining gas is discharged through the fourth branch 1806. Thereafter, the fifth control valve 198 is closed, and the first control valve 194 is opened, releasing the oxygen absorbed by the first adsorption tower 141 and transporting it to the compressor 150 for compression to increase the oxygen concentration. After the second adsorption tower 142 adsorbs oxygen from the gas to be purified, the sixth control valve 199 is opened, and the remaining gas is discharged through the fifth branch 1807. Thereafter, the sixth control valve 199 is closed, and the second control valve 195 is opened, releasing the oxygen absorbed by the second adsorption tower 142 and transporting it to the compressor 150 for compression to increase the oxygen concentration.

[0051] like Figure 1 、 Figure 3 、 Figure 4 As shown, oxygen purification system 100 further includes an oxygen concentration sensor 1809, which is disposed within buffer tank 160. For example, oxygen concentration sensor 1809 is used to detect the oxygen concentration within buffer tank 160. Before using oxygen purification system 100, a preset oxygen concentration value can be set. When the concentration within buffer tank 160 reaches the preset value, fourth control valve 197 closes and third control valve 196 opens, transferring the purified gas within buffer tank 160 to collection device 170. When the concentration within buffer tank 160 reaches the preset value, fourth control valve 197 opens and third control valve 196 closes, transferring the purified gas within buffer tank 160 to first main path 1801, where the oxygen and nitrogen adsorption separation steps are repeated, followed by compression by compressor 150. This cycle is repeated until the oxygen concentration within buffer tank 160 reaches the preset standard value.

[0052] like Figure 1 、 Figure 3 、 Figure 4As shown, the oxygen purification system 100 further includes a power pump 1808 for providing power for the air flow. For example, two power pumps 1808 may be provided, one of which is provided on the second main path 1802 and located between the buffer tank 160 and the collection device 170, and the other is provided on the third branch path 1805 for transporting the gas in the buffer tank 160 to the first main path 1801 before the adsorption assembly 140.

[0053] like Figure 1 、 Figure 3 、 Figure 4 As shown, the working process of the oxygen purification system 100 of the present application is as follows:

[0054] The gas to be purified is produced by the gas supply device 110, and first flows through the buffer 120 to slow down the flow rate of the gas to be purified in the first main path 1801. After that, the first solenoid valve 192 is opened, and the second solenoid valve 193 is closed. The gas to be purified enters the first adsorption tower 141 for oxygen and nitrogen adsorption separation. When the first adsorption tower 141 is saturated with adsorption, the fifth control valve 198 is opened, and the remaining gas in the first adsorption tower 141 is discharged through the fourth branch 1806. At the same time, the first solenoid valve 192 is closed, the second solenoid valve 193 is opened, and the gas in the second adsorption tower 142 is separated by oxygen and nitrogen adsorption. The same steps as those in the first adsorption tower 141 are performed. Thereafter, the adsorbed oxygen in the first adsorption tower 141 and / or the second adsorption tower 142 is released and enters the compressor 150 for compression before being transported to the buffer tank 160. At this time, the third control valve 196 is closed, and the oxygen concentration sensor 1809 detects the oxygen concentration in the buffer tank 160. When the oxygen concentration in the buffer tank 160 reaches a preset value, the fourth control valve 197 is closed, and the third control valve 196 is opened, transporting the purified gas in the buffer tank 160 to the collection device 170. When the concentration in the buffer tank 160 reaches a preset value, the fourth control valve 197 is opened, and the third control valve 196 is closed, transporting the purified gas in the buffer tank 160 to the first main path 1801, and the oxygen and nitrogen adsorption separation steps are repeated.

[0055] The above description is only a preferred embodiment of the present invention and does not limit the patent scope of the present invention. All equivalent structural transformations made by using the contents of the present invention description and drawings under the inventive concept of the present invention, or direct / indirect application in other related technical fields are included in the patent protection scope of the present invention.

Claims

1. An oxygen purification system, characterized in that: include: Gas supply equipment, filter assembly, adsorption assembly, compressor, buffer tank and collection device connected in sequence; a buffer member, the buffer member being arranged in a pipeline connecting the gas supply device and the filter assembly, the buffer member being formed with a first bottom wall and a second bottom wall arranged opposite to each other, the first bottom wall and the second bottom wall being arranged sequentially in the direction of gas flow, the first bottom wall being formed with a first deforming portion so that the first bottom wall is deformed when subjected to an external force and a first gap for air flow to pass through is formed, and the second bottom wall being formed with a second deforming portion so that the second bottom wall is deformed when subjected to an external force and a second gap for air flow to pass through is formed; The buffer member is formed with a cavity, the cavity is located between the first bottom wall and the second bottom wall, and the first gap and the second gap are respectively communicated with the cavity; The first bottom wall has a first dividing line, and the first dividing line extends into the cavity to divide the first bottom wall into a plurality of first deformation portions; The plurality of first dividing lines all pass through the center of the first bottom wall, and the first deformable portion is fan-shaped; the first deformable portion has a first notch, and the plurality of first notches enclose a first opening; The second bottom wall has a second dividing line, and the second dividing line extends into the cavity to divide the second bottom wall into a plurality of second deformation portions; The plurality of second cutting lines all pass through the center of the second bottom wall, and the second deformable portion is fan-shaped; the second deformable portion has a second notch, and the plurality of second notches enclose a second opening, and the diameter of the first opening is greater than the diameter of the second opening; The first deformable portion is provided with a plurality of first vent holes for gas to pass through, and the first vent holes are connected to the cavity; The second deformable portion is provided with a plurality of second vent holes for gas to pass through, and the second vent holes are connected to the cavity; The number of the first ventilation holes gradually decreases near the center of the first bottom wall, and the number of the second ventilation holes gradually decreases near the center of the second bottom wall; The first ventilation holes form at least two rings with different diameters, and the second ventilation holes form at least two rings with different diameters.

2. The oxygen purification system according to claim 1, characterized in that: The first vent includes an annular groove section and a straight hole section connected to the annular groove section. The straight hole section is arranged close to the second bottom wall. The diameters of various parts of the straight hole section are equal, and the diameter of the annular groove section gradually increases in the direction away from the straight hole section.

3. The oxygen purification system according to claim 1, wherein: The buffer component also includes an extension wall, one end of which is connected to the first bottom wall, and the other end is connected to the second bottom wall. The extension wall is cylindrical, and the cavity is formed by the first bottom wall, the extension wall and the second bottom wall; the first deformation part and the second deformation part are both made of flexible material.

4. The oxygen purification system according to claim 1, wherein: The oxygen purification system includes a first main road, a second main road, a first branch road and a second branch road. The adsorption component includes a first adsorption tower and a second adsorption tower. The first main road is connected in parallel with the first branch road and the second branch road respectively, and the second main road is connected in parallel with the first branch road and the second branch road respectively. The gas supply equipment, the buffer component, and the filter component are sequentially arranged on the first main road, the first adsorption tower is arranged on the first branch road, the second adsorption tower is arranged on the second branch road, and the compressor, the cache tank, and the collection device are sequentially arranged on the second main road.

5. The oxygen purification system according to claim 4, characterized in that: The oxygen purification system also includes a control valve assembly, which includes a first one-way valve, a first solenoid valve, a second solenoid valve, a first control valve, a second control valve and a third control valve, wherein the first one-way valve is arranged between the buffer and the filter assembly, the first solenoid valve is arranged on the first branch and is located before the first adsorption tower, the second solenoid valve is arranged on the second branch and is located before the second adsorption tower, the first control valve is arranged on the first branch and is located between the second main road and the first adsorption tower, the second control valve is arranged on the second branch and is located between the second main road and the second adsorption tower, and the third control valve is arranged between the cache tank and the collection device; The oxygen purification system further includes an oxygen concentration sensor, which is disposed in the buffer tank.

6. The oxygen purification system according to claim 5, characterized in that: The oxygen purification system further includes a third branch, a fourth branch, and a fifth branch, and the control valve assembly further includes a fourth control valve, a fifth control valve, and a sixth control valve. One end of the third branch is connected to the cache tank, and the other end is connected to the first main road and is located after the filter assembly. The fourth control valve is provided on the third branch, the fourth branch is connected to the first adsorption tower, the fifth control valve is provided on the fourth branch, the fifth branch is connected to the second adsorption tower, and the sixth control valve is provided on the fifth branch. The oxygen purification system further includes a power pump, which is used to provide power for air flow.

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