A plasma seed uniform treatment machine with multi-stage air-screen cleaning function
By designing a plasma seed uniform treatment machine with multi-stage air screen cleaning and selection function, the problems of unclean cleaning and drug damage during seed pre-soiling treatment are solved, and efficient and environmentally friendly uniform seed treatment is achieved, which improves seed vitality and stress resistance and improves crop yield.
Patent Information
- Application Number
- CN202310910991.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-07-24
- Publication Date
- 2025-07-25
- Estimated Expiration
- 2043-07-24
Smart Images

Figure CN116889971B_ABST
Abstract
Description
Technical Field
[0001] The invention relates to a plasma seed uniform processing machine with a multi-stage wind screen cleaning function, belonging to the technical field of agricultural machinery. Background Art
[0002] Seeds are one of the basic materials in the agricultural production process, and seed processing refers to the whole process of various processing of various seeds from harvest to sowing. Harvested forage seeds contain unfilled seeds, broken seeds, immature seeds, insect-eaten seeds, etc., and are also mixed with other crop seeds, weed seeds, straw and soil, sand, dust, etc. Some seeds of grasses often have awns, glumes and other attachments that are difficult to remove. In order to ensure the sowing quality of seeds and the smooth progress of drying and cleaning, the seeds should be de-awned. De-awning can be done by using a de-awning machine or by pressing and screening with a ring roller. There is still a phenomenon of unclean cleaning before seed sowing, so cleaning and grading the seeds again before seed sowing can improve the uniformity and efficiency of plasma treatment.
[0003] Conventional methods for seed pre-sowing treatment include coating, mixing with pesticides, chemical delinting, and soaking seeds with pesticides. These methods play a certain role in sterilization, disease prevention, and yield increase, but are prone to pesticide damage and soil damage. In addition, they cannot truly improve the overall disease resistance, cold resistance, drought resistance, and other stress resistance of the seeds themselves to adapt to the environment. Plasma seed treatment is the most representative physical pre-sowing treatment method. This method simulates the environment in which light, electricity, magnetism, and active particles coexist in space, forcing plasma to bombard the surface of single-grain seeds to achieve the effect of seed surface etching. It can cause microstructural changes in the seed coat, enhance the permeability and water absorption of seeds, and improve the germination potential and germination rate of seeds; high-energy particles that transition into the ion state transfer energy to seeds through collisions or electromagnetic waves, thereby improving seed vitality, extending the growth cycle, and increasing the number of crop mowing times and biological yields; plasma treatment can also enhance resistance to biological and abiotic stresses. This method can enable crops to maintain a good growth advantage throughout the growth cycle and have a positive effect on crop growth.
[0004] The plasma seed uniform treatment machine with multi-stage wind screening cleaning function can realize the graded cleaning and plasma uniform coating treatment of irregular seeds such as alfalfa, and has the function of impurity removal, which can sort seeds in real time and complete impurity removal. At the same time, the sorted seeds are evenly coated with plasma, and the seed surface is bombarded to achieve the effect of etching, thereby enhancing seed vitality and increasing crop yield. Summary of the invention
[0005] The object of the present invention is to provide a plasma seed uniform treatment machine with multi-stage air-screen cleaning function for the pre-sowing problems of seeds of high-quality forage and feed such as alfalfa seeds. It has complete functions, is easy to operate, economical and applicable, has low cost, and high intelligence. During the treatment process, it has good cleaning and grading performance, uniform plasma coating, high efficiency, can quickly, accurately and effectively feed materials evenly in real time, stably adapt to grading and cleaning, and uniformly coat the seeds with plasma. Explore an efficient, low-loss and environmentally friendly pre-sowing treatment method for integrating agricultural machinery and agronomy for seeds such as alfalfa seeds, and improve the growth trend and biological output of crops such as alfalfa during the entire growth cycle.
[0006] To achieve the above object, the technical solution of the present invention is: In the first aspect, the present invention provides a plasma seed uniform treatment machine with multi-stage air-screen cleaning function, including a uniform feeding system, a multi-stage cleaning system, a sedimentation and impurity removal system, a plasma cavity seed feeding system, a plasma generation system, a cell excitation and seed collection system, a frame and a power source system;
[0007] The uniform feeding system 1 is the head feeding mechanism of the plasma seed uniform treatment machine, and the main body is installed on the cleaning screen frame 206, and is used to evenly and stably feed the seeds in the hopper 101 into the multi-stage cleaning system under the drive of the vibration main shaft 112 and the vibration eccentric connecting rod 110; the hopper 101 is bolted to the main support frame 703 through the hopper side ear 114, and the spring screw 109 is connected to the discharge baffle 102 and the upper support bottom plate 103 through a chute, and the distance between the discharge baffle 102 and the bottom discharge port of the hopper is adjusted by adjusting the spring screw 109 and the relative chute connection position to adjust the seed feeding amount; the upper support bottom plate 103 is connected to the two side vibration rib plates 108 through the vibration auxiliary shaft 104, playing a role of small-amplitude vibration excitation; the small rocker arms 105 are installed at both ends of the vibration auxiliary shaft 104 and are connected to the auxiliary swing arms 106, playing a role of overall support of the feeding screen and increasing the amplitude; the auxiliary swing arms 106 are connected to the feeding screen support 111 by pins; between the paired feeding screen supports 111, a uniformly feeding screen 107 with adjustable inclination angle is installed, the top of the feeding screen support 111 is connected to the main swing arm 113 by a pin, and the lower end of the main swing arm 113 is installed with a vibration main shaft 112; the vibration main shaft 112 is connected to the impurity collecting auger shaft 307 through a belt drive, and an eccentric wheel is installed on the vibration main shaft 112; one end of the eccentric connecting rod 110 is connected to the eccentric wheel, and the other end of the eccentric connecting rod 110 is fixedly connected to the bottom surface of the uniformly feeding screen 107, playing a role of overall vibration excitation and uniform seed dropping of the feeding system.
[0008] As a further solution of the present invention, the multi-stage cleaning system 2 includes an inoculation device, a multi-stage sorting screen, a frame, a vibration device, and a seed metering device. The main body is installed on the main frame 701 and is connected to the uniform feeding system at the upper end; the inoculation device includes a diversion hood 201, an inoculation plate 202, a seed guiding plate 203, an inoculation height adjustment device 216, a debris shield 204, a seed dropping screen 205, and a debris cleaning plate 222; the upper end of the diversion hood 201 is movably connected to the inner wall of the impurity inlet channel 318 of the sedimentation and impurity removal system, and the lower end is movably connected to the inoculation plate 202, which functions to divert the easily detachable dust in the seeds into the sedimentation and impurity removal system; the lower end of the inoculation plate 202 is fixedly connected to the inoculation height adjustment device 216 and realizes the adjustment of the inoculation height with the telescopic movement of the electric cylinder; the seed guiding plate 203 is fixedly connected to the debris shield 204 at a certain angle, and the middle baffle is fixedly connected to the debris cleaning plate 222, which functions to divert the seeds sliding from the inoculation plate into the multi-stage sorting screen and enclose a closed debris cleaning cavity with the debris cleaning plate 222; the debris shield 204 is installed on the cleaning screen frame 206; the multi-stage sorting screen includes a seed dropping screen 205, a cleaning screen frame 206, a large debris discharge port 207, a cleaning mesh screen II 212, a secondary cleaning screen 213, a cleaning mesh screen I 214, a primary cleaning screen 215, a tertiary cleaning screen 220, a seed blocking plate 224, and a seed thinning scraper 225. The seed dropping screen 205 is installed on the cleaning screen frame 206, which functions to catch the seeds falling from the seed guiding plate 203, screen the seeds onto the seed blocking plate 224, and at the same time discharge larger debris through the large debris discharge port 207 installed at the end of the seed dropping screen 205. A number of holes corresponding to irregular seed shapes are arrayed on the seed dropping screen 205 (taking alfalfa seeds as an example, the hole diameter is about 1.6 mm and the length is 2.5 mm) to ensure the smooth falling of the corresponding seeds; the cleaning screen frame 206 is integrally installed on the main frame 701, and the main body of the multi-stage sorting screen is installed inside the cleaning screen frame 206; the seed blocking plate 224 is fixedly connected to the cleaning screen frame 206 at a certain angle, which functions to buffer the seeds falling from the seed dropping screen 205 and throw the seeds to the front end of the primary cleaning screen 215; the primary cleaning screen 215 is movably connected to the cleaning mesh screen I 214 in a drawer shape, and a number of smaller irregular seed shape holes are arrayed on the screen surface (taking alfalfa seeds as an example, the hole diameter is about 1.3 mm and the length is 2.2 mm); the cleaning mesh screen I 214 is movably connected to the cleaning screen frame 206, and the main body is a grid-shaped screen rod and an arc-shaped elastic tooth. The arc-shaped elastic tooth functions to strike the bottom of the primary cleaning screen 215 to provide vibration to dredge the blocked seeds; the seed thinning scraper 225 is installed on the bottom surface of the cleaning mesh screen I 214 and is fixedly connected to the frame bracket of the cleaning mesh screen I, which functions to buffer the seeds falling from the primary cleaning screen 215 and dredge the stacked and blocked seeds on the secondary cleaning screen 213; the secondary cleaning screen 213 is movably connected to the cleaning mesh screen II 212 in a drawer shape, and a number of extremely small irregular seed shape holes are arrayed on the screen surface (taking alfalfa seeds as an example, the hole diameter is about 1.1 mm and the length is 1.8 mm); the cleaning screen II 212 is movably connected to the cleaning screen frame 206 in a drawer shape, and the main body is a grid-shaped sieve rod and arc-shaped spring teeth. The arc-shaped spring teeth play a role in hitting the bottom of the secondary cleaning screen 213 to provide vibration excitation to dredge blocked seeds; the tertiary cleaning screen 220 is a rectangular steel plate, installed at the bottom of the cleaning screen II 212, and fixedly connected to the cleaning screen frame 206 at a certain angle, playing a role in screening small seeds; the frame includes a cleaning screen frame 206 and cleaning screen legs 209. The cleaning screen frame 206 is directly installed on the main frame 701 through the cleaning screen legs 209, playing a role in supporting the entire sorting system; the vibration excitation device includes a sorting motor 210, a transmission guard 211, and a two-stage eccentric connecting rod 221. The sorting motor 210 is connected to the transmission guard 211 through a shaft and is installed together at one end where the cleaning screen frame 206 is connected to the cleaning screen legs 209, and is connected to the two-stage eccentric connecting rod 221 through belt drive. One end of the two-stage eccentric connecting rod 221 is located at the bottom of the tertiary cleaning screen 220 and is fixedly connected to the cleaning screen frame 206, playing a role in providing adjustable-frequency vibration excitation for the entire multi-stage cleaning system; the seed discharging device includes a primary seed discharging port 223, a secondary seed discharging port 218, a tertiary seed discharging port 219, a large impurity discharging port 207, and a sedimentation impurity discharging port 217; the primary seed discharging port 223 is installed on the cleaning screen frame 206, located between the cleaning screen I 214 and the primary cleaning screen 215, and is used to discharge the primary seeds on the screen surface of the primary cleaning screen 215; the secondary seed discharging port 218 is installed on the cleaning screen frame 206, located between the cleaning screen II 212 and the secondary cleaning screen 213, and is used to discharge the secondary seeds on the screen surface of the secondary cleaning screen 213; the tertiary seed discharging port 219 is installed on the cleaning screen frame 206, located at the end of the tertiary cleaning screen 220, and is used to discharge the tertiary seeds on the screen surface of the tertiary cleaning screen 220.
[0009] As a further solution of the present invention, the sedimentation and impurity removal system 3 includes a dust removal port, a sedimentation device, an intake fan, a diversion adjustment device, and a waste discharge device; the main body of the dust removal port 309 is installed on the sedimentation device frame 301, and the outlet end is connected to an external smoke and dust collection device; the sedimentation device includes a sedimentation device frame 301, a sedimentation chamber shield 306, a sedimentation chamber 310, an intake channel 313, and an arc-shaped diversion baffle 319. The sedimentation device frame 301 is installed at the upper end of the cleaning sieve frame 206. There is a rectangular inoculation plate 202 installation port on one side of the frame to facilitate the inoculation plate 202 to pass through and complete the installation; the sedimentation chamber 310 is enclosed and closed by the sedimentation chamber shield 306, enabling larger particle dust and other sundries to complete sedimentation under the action of wind force and self-weight; the intake channel 313 is installed outside the sedimentation device frame 301 and is fixedly connected to the intake fan 315, serving to introduce the air flow generated by the intake fan 315 into the sedimentation chamber 310; the arc-shaped diversion baffle 319 is movably connected to the sedimentation device frame 301, and its installation inclination angle can be adjusted according to requirements to achieve smoke and dust diversion in different directions; the diversion adjustment device includes a cleaning plate 222, a diversion hood 201, a rotating gear 311, a linkage rack 312, an adjustment handwheel 302, and a diversion baffle 317. The cleaning plate 222 is embedded in the rectangular installation port on one side of the sedimentation device frame 301, and its installation inclination angle can be adjusted; the diversion hood 201 is installed in the chute of the sedimentation device frame 301 and is connected to the diversion baffle 317, moving along the chute as the diversion baffle 317 expands and contracts to adjust the opening and closing of the impurity intake channel 318; the linkage rack 312 is installed on the inner wall of the sedimentation device frame 301 and meshes with the rotating gear 311. The rotating gear 311 and the adjustment handwheel 302 are connected by a shaft. As the adjustment handwheel 302 rotates, it drives the linkage rack 312 to expand and contract, completing the adjustment of the opening degrees of the intake channel 313 and the impurity intake channel 318; the diversion baffle 317 is fixedly connected to the bottom of the linkage rack 312; the waste discharge device includes a waste discharge port 303, a waste collection channel 304, a waste collection auger shaft 307, a transmission bracket 308, a dust outlet 314, a sedimentation cleaning port 217, and a waste collection auger 316. The waste collection auger 316 is installed on the inner wall of the sedimentation chamber shield 306, serving to buffer and gather the sediment; the waste discharge port 303 is installed on the sedimentation device frame 301 at the lower end of the sedimentation cleaning port 217, serving to divert and discharge sundries in a reverse direction; the waste collection channel 304 is installed on the sedimentation device frame 301, serving to divert the sundries discharged from the waste discharge port 303 into the waste collection pipe 208; the waste collection auger shaft 307 is connected to the transmission bracket 308 and passes through the waste collection auger 316, and the auger is driven to rotate by belt transmission; the dust outlet 314 is installed on the secondary seed discharging port 218, serving to send the seeds to the air inlet; the sedimentation cleaning port 217 is installed on the waste discharge port 303 at the lower end of the waste collection auger 316, perpendicular to the waste discharge port 303, serving to collect sundries and discharge them outward;The intake fan 315 is installed on the bottom plate 305 of the sedimentation device, which serves to provide wind power to clean the attachments on the seed surface. An air outlet is reserved on the intake fan and is connected to the air inlet of the plasma generating device; the bottom plate 305 of the sedimentation device is fixedly connected to the main frame 701, which serves as the overall support for the sedimentation and impurity removal system.
[0010] As a further solution of the present invention, the plasma chamber seed inlet system 4 includes a primary seed inlet pipe 401, a central pipe 402, a secondary seed inlet pipe 403, a seed inlet volume regulating valve 404, and a seed dropping pipe 405; the primary seed inlet pipe 401 is sleeved at the end of the primary seed discharging port 223, and the pipe body is embedded on one side of the inner wall of the central pipe 402, which serves to guide the cleaned primary seeds into the central pipe 402; the central pipe 402 is installed on the plasma generating device frame and is placed between two adjacent plasma generating devices; the secondary seed inlet pipe 403 is sleeved at the end of the secondary seed discharging port 218, and the pipe body is embedded on the other side of the inner wall of the central pipe 402, which serves to guide the cleaned secondary seeds into the central pipe 402; the seed inlet volume regulating valve 404 is installed at the intersection of the primary seed inlet pipe 401, the secondary seed inlet pipe 403 and the central pipe 402, which serves to adjust the seed flow rate and monitor the operation quality; the seed dropping pipe 405 is respectively connected to the primary seed inlet pipe 401, the secondary seed inlet pipe 403 and the seed inlet volume regulating valve 404, and is respectively installed between the plasma generating device group I 505 and the plasma generating device group II 507 and between the plasma generating device group II 505 and the plasma generating device group III 507.
[0011] As a further solution of the present invention, the plasma generating system 5 includes an adjustable suspension, a plasma generating device group, and an intake valve; the adjustable suspension includes an upper cantilever 501, a telescopic reinforcing rod 503, an insulating panel 502, a support frame 504, a plasma bracket 506, a lifting adjustment device 509, and a plasma mounting frame 510. The upper cantilever 501 is foldably mounted within the support frame 504 and is pivotally connected by a pin shaft, which serves to link the lifting of the overall suspension to adjust the distance between the plasma generating device and the eyelet excitation system; the telescopic reinforcing rod 503 is mounted at both ends of the plasma bracket 506, which serves to assist in increasing the supporting force during suspension adjustment; the insulating panel 502 is mounted above the upper cantilever 501, which serves to isolate high-voltage current and provide dust protection; the support frame 504 is mounted at the lower end of the upper cantilever 501, which serves as the overall support for the plasma generating system; the plasma bracket 506 is mounted on the support frame 504, which serves to support the plasma generating device group; the lifting adjustment device 509 is mounted on the connecting pin shaft between the upper cantilever 501 and the support frame 504, which directly serves to adjust the lifting of the suspension; the plasma mounting frame 510 is mounted inside the telescopic reinforcing rod 503 and is used to directly mount the plasma bionic device group; the plasma generating device group includes a plasma generating device I 505, a plasma generating device II 507, a plasma generating device III 511, a plasma generating device V 512, a plasma generating device IV 513, and a plasma generating device VI 514. Each plasma generating device is composed of 3 plasma generating substrates mounted on the plasma mounting frame 510 and is arrayed in 6 groups along the horizontal direction parallel to the plasma bracket 506 to form a plasma generating group; the plasma generating substrate includes a conduit, an insulating substrate, a safety valve group, an insulating protection base, a safety substrate, and an electrode plate. The conduit includes an anode wire conduit 5011, an air inlet pipe 5002, and a cathode wire conduit 5003, and the conduit is mounted on the insulating substrate 5004; the insulating substrate 5004 is mounted inside the insulating protection base 5009, and there are conduit through holes and safety valve group mounting positions inside the insulating substrate; the safety valve group 5010 is mounted inside the insulating substrate 5004, which serves to protect the plasma generating device; the safety substrate 5005 is mounted below the insulating protection base 5009 and is two symmetrically arranged trapezoidal insulators; the electrode plate includes a positive electrode plate 5007 and a negative electrode plate 5006, and the electrode plate is mounted inside the insulating protection base and is respectively connected to the wires inside the anode wire conduit 5011 and the cathode wire conduit 5003; the air inlet pipe 5002 passes through the entire base and is placed in the middle of the electrode plate, which serves to deflect the plasma generated after discharge into a certain shape; the intake pipe 5008 is mounted inside the central pipe 402 and is used to connect to each air inlet pipe 5002, which serves to adjust the intake air volume and control the plasma generating area.
[0012] As a further solution of the present invention, the eye-hole vibration and seed collection system 6 includes a primary seed vibration device, a secondary seed vibration device, a primary seed collection sieve, a secondary seed collection sieve, a seed collection frame, and a driving motor; the primary seed vibration device 604 is installed directly below the plasma generating device group composed of the plasma generating device I 505 and the plasma generating device VI 514. After cleaning, the primary seeds fall into the eye-holes of the primary seed vibration device 604 through the seed dropping pipeline 405. The seeds jump and move forward under the vibration effect to achieve uniform plasma coating. There are several eye-holes with a diameter of about 1.3 mm and a depth of 1.4 mm arrayed on the primary seed vibration device 604, and negative pressure holes are opened at the bottom of the eye-holes; the secondary seed vibration device 603 is installed directly below the plasma generating device group composed of the plasma generating device II 507 and the plasma generating device V 512. After cleaning, the primary seeds fall into the eye-holes of the primary seed vibration device 604 through the seed dropping pipeline 405 on the other side. The seeds jump and move forward under the vibration effect of the vibration motor to achieve uniform plasma coating. There are several eye-holes with a diameter of about 1.1 mm and a depth of 1.2 mm arrayed on the secondary seed vibration device 603, and negative pressure holes are opened at the bottom of the eye-holes; the primary seed collection sieve 605 is installed on the seed collection frame 609. The driving roller 611 is driven by the driving motor I 607 to drive the belt to rotate. The sieve surface is a belt with flexible rod strips, which serves to collect and buffer the seeds after plasma treatment; the secondary seed collection sieve 601 is installed on the seed collection frame 609. The driving roller 611 is driven by the driving motor II 608 to drive the belt to rotate. The sieve surface is a belt with flexible rod strips, which serves to collect and buffer the seeds after plasma treatment; the lower end of the seed collection frame 609 is installed on the main frame 701 by the adjusting plate 612, which can adjust the installation position of the seed collection system. The upper end is connected to the support frame 504. The driving motor I 607 and the driving motor II 608 are controlled by the safety controller 602 to play an emergency stop protection role. Seed collection transmission bases 606 are installed at both ends of the seed collection frame; a gear transmission system for driving the auxiliary vibration roller 610 is installed on the seed collection transmission base 606; the auxiliary vibration roller 610 is installed on the seed collection frame 609, directly below the primary seed vibration device 604, the secondary seed vibration device 603, the primary seed collection sieve 605, and the secondary seed collection sieve 601, which serves to provide vibration for the sieve surface to improve the uniformity of the plasma coating treatment and reduce seed congestion; a negative pressure chamber 613 is installed directly below the primary seed vibration device 604 and the secondary seed vibration device 603. The negative pressure chamber 613 is installed on the seed collection frame 609, below the auxiliary vibration roller 610. The air inlet pipe of the negative pressure chamber 613 is connected to the negative pressure fan 708, which serves to provide negative pressure drainage wind force for the seeds on the vibration device, increasing the plasma coating time on the seed surface.
[0013] As a further solution of the present invention, the frame and the power source system 7 include a main frame 701, a large debris box 702, a main support frame 703, a fine debris box 704, a distribution box 705, main support legs 706, floor supports 707, a negative pressure fan 708, casters 709, and an intake fan 315; the main frame 701 is the main frame of a plasma seed uniform treatment machine with a multi-stage air-screen cleaning function, which supports the whole machine and installs and connects the frame of each system; the lower end of the main support frame 703 is installed on the main frame 701, and the upper end is fixedly connected to the hopper, which supports the uniform feeding system 1 and the multi-stage cleaning system 2; the main support legs 706 are the main load-bearing parts of the main frame 701, which are installed around both ends of the main frame 701 and mainly install and connect each component frame of the concave vibration and seed collection system 6; the floor supports 707 are installed on the cross beam of the main frame 701 inside the main support legs 706, which play the role of grounding and bearing weight and stabilizing the machine body; the casters 709 are installed at the four ends of the bottom cross beam of the main frame 701, which play the role of auxiliary support and moving the whole machine; the large debris box 702 is a movable part placed on the surface of the main frame 701, which collects the larger debris discharged from the large debris discharge port 207; the fine debris box 704 is a movable part placed on the surface of the main frame 701, which collects the debris discharged from the debris collection pipe 208; the distribution box 705 is the main power source, which can output high and low voltage currents to provide power for each working motor, electrode, etc., to ensure the operation of each system; the negative pressure fan 708 is installed at the bottom of the main frame 701 and is connected to the pipeline of the negative pressure bin 613, which plays the role of providing negative pressure drainage wind force; the intake fan 315 is installed on the surface of the main frame 701, which plays the role of providing a deburring air source for the attachments on the surface of the secondary seeds.
[0014] On the other hand, the present invention provides a plasma seed uniform treatment machine with a multi-stage air-screen cleaning function, and the seeds can be processed by using any one of the systems described in claims 1-7.
[0015] The beneficial effects of the present invention are:
[0016] A plasma seed uniform treatment machine with multi-stage air-screen cleaning function provided by the present invention aims at uniformly treating seeds such as alfalfa with plasma. Based on the overall scheme of air-screen cleaning - negative pressure drainage - indentation vibration type plasma seed uniform wrapping, a seed treatment machine is provided, which is composed of a uniform feeding system, a multi-stage cleaning system, a sedimentation and impurity removal system, a plasma cavity seed feeding system, a plasma generation system, an indentation vibration and seed collection system, a frame and a power source system. It has complete functions, is easy to operate, economically applicable, low in cost, and high in intelligence. During the treatment process, it has good cleaning and grading performance, uniform plasma wrapping, and high efficiency. It can quickly, accurately, and effectively carry out real-time uniform feeding, stably adapt to grading and cleaning, and carry out plasma uniform wrapping treatment in stages, exploring an efficient, low-loss, and environmentally friendly pre-sowing treatment method for integrating agricultural machinery and agronomy for seeds such as alfalfa seeds, improving the growth trend and biological output of alfalfa and other crops during the entire growth cycle. It provides favorable conditions for the high-quality and high-efficiency supply of high-quality forage, greatly reduces the cost and operation time, improves the efficiency, has good economic and social benefits, and has a very broad market prospect. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 is an axonometric view of the plasma seed uniform treatment machine of the present invention;
[0018] Figure 2 is an axonometric view of the uniform feeding system of the present invention;
[0019] Figure 3 is the front view of the multi-stage cleaning system of the present invention;
[0020] Figure 4 is Figure 3 the sectional view taken along line A-A of
[0021] Figure 5 is the front view of the sedimentation and impurity removal system of the present invention;
[0022] Figure 6 is Figure 5 the sectional view taken along line B-B of
[0023] Figure 7 is the front view of the plasma cavity seed feeding system of the present invention;
[0024] Figure 8 is Figure 7 the sectional view taken along line C-C of
[0025] Figure 9 is the front view of the plasma generation system of the present invention;
[0026] Figure 10 is Figure 9 the sectional view taken along line D-D of
[0027] Figure 11 It is a schematic structural diagram of the plasma generating device of the present invention;
[0028] Figure 12 It is an axonometric view of the eye-hole excitation and seed collection system of the present invention;
[0029] Figure 13 It is a combined front view of the plasma generating system, the eye-hole excitation and seed collection system of the present invention;
[0030] Figure 14 is Figure 13 the E-E sectional view of
[0031] Figure 15 It is the front view of the plasma seed uniform treatment machine with multi-stage air-screen cleaning function of the present invention.
[0032] Figures 1 - 15 Each label in
[0033] 1 - Uniform feeding system, 101 - Hopper, 102 - Discharge baffle, 103 - Upper support bottom plate, 104 - Vibration secondary shaft, 105 - Small rocker arm, 106 - Secondary swing arm, 107 - Feeding sieve, 108 - Vibration rib plate, 109 - Spring screw, 110 - Eccentric connecting rod, 111 - Feeding sieve support, 112 - Vibration main shaft, 113 - Main swing arm, 2 - Multi - stage cleaning system, 201 - Deflector hood, 202 - Inoculation plate, 203 - Seed guiding plate, 204 - Debris shield, 205 - Seed - dropping sieve, 206 - Cleaning sieve frame, 207 - Large debris discharge port, 208 - Debris collection pipe, 209 - Cleaning sieve support leg, 210 - Sorting motor, 211 - Transmission shield, 212 - Cleaning mesh sieve II, 213 - Secondary cleaning sieve, 214 - Cleaning mesh sieve I, 215 - Primary cleaning sieve, 216 - Inoculation height adjustment device, 217 - Settling and debris - removing port, 218 - Secondary seed discharge port, 219 - Tertiary seed discharge port, 220 - Tertiary cleaning sieve, 221 - Two - stage eccentric connecting rod, 222 - Debris - removing plate, 223 - Primary seed discharge port, 224 - Seed - blocking plate, 225 - Seed - thinning scraper, 3 - Settling and debris - removing system, 301 - Settling device frame, 302 - Adjusting handwheel, 303 - Debris discharge port, 304 - Debris collection channel, 305 - Settling device bottom plate, 306 - Settling chamber shield, 307 - Debris collection auger shaft, 308 - Transmission support, 309 - Dust removal port, 310 - Settling chamber, 311 - Rotating gear, 312 - Linkage rack, 313 - Air inlet channel, 314 - Dust outlet, 315 - Air inlet fan, 316 - Debris collection auger, 317 - Deflector baffle, 318 - Impurity inlet channel, 319 - Arc - shaped deflector baffle, 4 - Plasma chamber seed - feeding system, 401 - Primary seed - feeding pipe, 402 - Central pipe, 403 - Secondary seed - feeding pipe, 404 - Seed - feeding volume regulating valve, 405 - Seed - dropping pipe, 5 - Plasma generation system, 501 - Upper cantilever, 502 - Insulating panel, 503 - Telescopic reinforcing rod, 504 - Support frame, 505 - Plasma generator I, 506 - Plasma bracket, 507 - Plasma generator, 508 - Air inlet valve, 509 - Lifting and adjusting device, 510 - Plasma mounting rack, 511 - Plasma generator III, 512 - Plasma generator V, 513 - Plasma generator IV, 514 - Plasma generator VI, 5011 - Anode wire pipe, 5002 - Air inlet pipe, 5003 - Cathode wire pipe, 5004 - Pipe installed on insulating matrix, 5005 - Safety matrix, 5006 - Cathode electrode plate, 5007 - Anode electrode plate, 5008 - Air inlet duct, 5009 - Insulating protection base, 5010 - Safety valve group, 6 - Eye - hole vibration and seed - collection system, 601 - Secondary seed - collection sieve, 602 - Safety controller, 603 - Secondary seed vibration device, 604 - Primary seed vibration device, 605 - Primary seed - collection sieve, 606 - Seed - collection drive base, 607 - Driving motor I, 608 - Driving motor II, 609 - Seed - collection rack610 - Auxiliary excitation roller, 611 - Driving roller, 612 - Adjusting plate, 613 - Negative pressure bin, 7 - Frame and power source system, 701 - Main frame, 702 - Large debris box, 703 - Main support frame, 704 - Fine debris box, 705 - Distribution box, 706 - Main support leg, 707 - Floor support, 708 - Negative pressure fan, 709 - Caster wheel., Specific embodiments
[0034] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0035] Example 1: As Figures 1 - 15 shown, in a first aspect, the present invention provides a plasma seed uniform treatment machine with multi - stage air - screening and cleaning functions, including a uniform feeding system, a multi - stage cleaning system, a sedimentation and impurity removal system, a plasma chamber seed feeding system, a plasma generation system, an indentation excitation and seed collection system, and a frame and power source system;
[0036] As Figures 1 - 2 shown, the uniform feeding system 1 is the head feeding mechanism of the plasma seed uniform treatment machine, and the main body is installed on the cleaning screen frame 206, and is used to uniformly and stably feed the seeds in the hopper 101 into the multi - stage cleaning system under the drive of the vibration main shaft 112 and the vibration eccentric connecting rod 110; the hopper 101 is bolt - connected to the main support frame 703 through the hopper side ear 114, and the spring screw 109 is connected to the discharge baffle 102 and the upper support bottom plate 103 through a chute, and the distance between the discharge baffle 102 and the bottom discharge port of the hopper is adjusted by adjusting the relative connection position of the spring screw 109 and the chute to adjust the seed feeding amount; the upper support bottom plate 103 is connected to the two - side vibration rib plates 108 through the vibration auxiliary shaft 104, playing a role of small - amplitude excitation; the small rocker arms 105 are installed at both ends of the vibration auxiliary shaft 104 and are connected to the auxiliary swing arms 106, playing a role of overall support of the feeding screen and increasing the amplitude; the auxiliary swing arms 106 are connected to the feeding screen support 111 by pins; an evenly - feeding screen 107 with adjustable inclination is installed between the paired feeding screen supports 111, the top of the feeding screen support 111 is connected to the main swing arm 113 by a pin, and the lower end of the main swing arm 113 is installed with the vibration main shaft 112; the vibration main shaft 112 is connected to the impurity - collecting auger shaft 307 through a belt drive, and an eccentric wheel is installed on the vibration main shaft 112; one end of the eccentric connecting rod 110 is connected to the eccentric wheel, and the other end of the eccentric connecting rod 110 is fixedly connected to the bottom surface of the evenly - feeding screen 107, playing a role of overall excitation of the feeding system for uniform seed dropping.
[0037] As Figures 3 - 4As shown in the figure, the multi-stage cleaning system 2 includes an inoculation device, a multi-stage sorting screen, a frame, a vibration device, and a seed metering device. The main body is installed on the main frame 701 and is connected to the uniform feeding system at the upper end; the inoculation device includes a diversion cover 201, an inoculation plate 202, a seed guide plate 203, an inoculation height adjustment device 216, a debris shield 204, a seed dropping screen 205, and a debris cleaning plate 222; the upper end of the diversion cover 201 is movably connected to the inner wall of the impurity inlet channel 318 of the sedimentation and impurity removal system, and the lower end is movably connected to the inoculation plate 202, which functions to divert the easily-detachable dust in the seeds into the sedimentation and impurity removal system; the lower end of the inoculation plate 202 is fixedly connected to the inoculation height adjustment device 216 and realizes the adjustment of the inoculation height with the expansion and contraction of the electric cylinder; the seed guide plate 203 is fixedly connected to the debris shield 204 at a certain angle, and the middle baffle is fixedly connected to the debris cleaning plate 222, which functions to divert the seeds sliding from the inoculation plate into the multi-stage sorting screen and enclose a closed debris cleaning cavity with the debris cleaning plate 222; the debris shield 204 is installed on the cleaning screen frame 206; the multi-stage sorting screen includes a seed dropping screen 205, a cleaning screen frame 206, a large debris discharge port 207, a cleaning mesh screen II 212, a secondary cleaning screen 213, a cleaning mesh screen I 214, a primary cleaning screen 215, a tertiary cleaning screen 220, a seed retaining plate 224, and a seed thinning scraper 225. The seed dropping screen 205 is installed on the cleaning screen frame 206, which functions to catch the seeds falling from the seed guide plate 203, screen the seeds to the seed retaining plate 224, and at the same time discharge larger debris through the large debris discharge port 207 installed at the end of the seed dropping screen 205. There are a number of holes corresponding to irregular seed shapes (taking alfalfa seeds as an example, the hole diameter is about 1.6 mm and the length is 2.5 mm) arrayed on the seed dropping screen 205 to ensure the smooth falling of the corresponding seeds; the cleaning screen frame 206 is integrally installed on the main frame 701, and the main body of the multi-stage sorting screen is installed inside the cleaning screen frame 206; the seed retaining plate 224 is fixedly connected to the cleaning screen frame 206 at a certain angle, which functions to buffer the seeds falling from the seed dropping screen 205 and throw the seeds to the front end of the primary cleaning screen 215; the primary cleaning screen 215 is movably connected to the cleaning mesh screen I 214 in a drawer shape, and there are a number of smaller holes corresponding to irregular seed shapes (taking alfalfa seeds as an example, the hole diameter is about 1.3 mm and the length is 2.2 mm) arrayed on the screen surface; the cleaning mesh screen I 214 is movably connected to the cleaning screen frame 206, and the main body is a grid-shaped screen rod and an arc-shaped spring tooth. The arc-shaped spring tooth functions to strike the bottom of the primary cleaning screen 215 and provide vibration to dredge the blocked seeds; the seed thinning scraper 225 is installed on the bottom surface of the cleaning mesh screen I 214 and is fixedly connected to the frame bracket of the cleaning mesh screen I, which functions to buffer the seeds falling from the primary cleaning screen 215 and dredge the stacked and blocked seeds on the secondary cleaning screen 213; the secondary cleaning screen 213 is movably connected to the cleaning mesh screen II 212 in a drawer shape, and there are a number of extremely small holes corresponding to irregular seed shapes (taking alfalfa seeds as an example, the hole diameter is about 1.1 mm and the length is 1.8 mm); the cleaning screen II 212 is movably connected to the cleaning screen frame 206 in a drawer shape, and its main body is a grid-shaped sieve rod and arc-shaped elastic teeth. The arc-shaped elastic teeth play a role in hitting the bottom of the secondary cleaning screen 213 to provide vibration excitation to dredge blocked seeds; the tertiary cleaning screen 220 is a rectangular steel plate, installed at the bottom of the cleaning screen II 212, and fixedly connected to the cleaning screen frame 206 at a certain angle, playing a role in screening small seeds; the frame includes the cleaning screen frame 206 and the cleaning screen support legs 209. The cleaning screen frame 206 is directly installed on the main frame 701 through the cleaning screen support legs 209, playing a role in supporting the entire sorting system; the vibration excitation device includes a sorting motor 210, a transmission guard 211, and a two-stage eccentric connecting rod 221. The sorting motor 210 is connected to the transmission guard 211 through a shaft, and they are installed together at one end where the cleaning screen frame 206 is connected to the cleaning screen support legs 209, and are connected to the two-stage eccentric connecting rod 221 through belt drive. One end of the two-stage eccentric connecting rod 221 is located at the bottom of the tertiary cleaning screen 220 and is fixedly connected to the cleaning screen frame 206, playing a role in providing adjustable-frequency vibration excitation for the entire multi-stage cleaning system; the seed discharging device includes a primary seed discharging port 223, a secondary seed discharging port 218, a tertiary seed discharging port 219, a large impurity discharging port 207, and a sedimentation impurity discharging port 217; the primary seed discharging port 223 is installed on the cleaning screen frame 206, located between the cleaning screen I 214 and the primary cleaning screen 215, and is used to discharge the primary seeds on the screen surface of the primary cleaning screen 215; the secondary seed discharging port 218 is installed on the cleaning screen frame 206, located between the cleaning screen II 212 and the secondary cleaning screen 213, and is used to discharge the secondary seeds on the screen surface of the secondary cleaning screen 213; the tertiary seed discharging port 219 is installed on the cleaning screen frame 206, located at the end of the tertiary cleaning screen 220, and is used to discharge the tertiary seeds on the screen surface of the tertiary cleaning screen 220. All the screens are detachable and replaceable.
[0038] Such as Figures 5 - 6As shown, the sedimentation and impurity removal system 3 includes a dust removal port, a sedimentation device, an intake fan, a diversion adjustment device, and a waste discharge device; the main body of the dust removal port 309 is installed on the sedimentation device frame 301, and the outlet end is connected to an external smoke and dust collection device; the sedimentation device includes a sedimentation device frame 301, a sedimentation chamber shield 306, a sedimentation chamber 310, an intake channel 313, and an arc-shaped diversion baffle 319. The sedimentation device frame 301 is installed at the upper end of the cleaning sieve frame 206. There is a rectangular inoculation plate 202 installation opening on one side of the frame to facilitate the inoculation plate 202 to pass through and complete the installation; the sedimentation chamber 310 is enclosed and closed by the sedimentation chamber shield 306, which enables larger particle dust and other sundries to complete sedimentation under the action of wind force and self-weight; the intake channel 313 is installed outside the sedimentation device frame 301 and is fixedly connected to the intake fan 315, which serves to introduce the air flow generated by the intake fan 315 into the sedimentation chamber 310; the arc-shaped diversion baffle 319 is movably connected to the sedimentation device frame 301 and can adjust the installation inclination according to requirements to achieve smoke and dust diversion in different directions; the diversion adjustment device includes a cleaning plate 222, a diversion cover 201, a rotating gear 311, a linkage rack 312, an adjustment handwheel 302, and a diversion baffle 317. The cleaning plate 222 is embedded in the rectangular installation opening on one side of the sedimentation device frame 301 and can adjust the installation inclination; the diversion cover 201 is installed in the chute of the sedimentation device frame 301 and is connected to the diversion baffle 317, and moves along the chute as the diversion baffle 317 expands and contracts to adjust the opening and closing of the impurity intake channel 318; the linkage rack 312 is installed on the inner wall of the sedimentation device frame 301 and meshes with the rotating gear 311. The rotating gear 311 and the adjustment handwheel 302 are connected by a shaft, and as the adjustment handwheel 302 rotates, it drives the linkage rack 312 to expand and contract to complete the opening degree adjustment of the intake channel 313 and the impurity intake channel 318; the diversion baffle 317 is fixedly connected to the bottom of the linkage rack 312; the waste discharge device includes a waste discharge port 303, a debris collection channel 304, a debris collection auger shaft 307, a transmission support 308, a dust outlet 314, a sedimentation cleaning port 217, and a debris collection auger 316. The debris collection auger 316 is installed on the inner wall of the sedimentation chamber shield 306, which serves to buffer and gather the sediment; the waste discharge port 303 is installed on the sedimentation device frame 301 at the lower end of the sedimentation cleaning port 217, which serves to divert and discharge sundries in the reverse direction; the debris collection channel 304 is installed on the sedimentation device frame 301, which serves to divert the sundries discharged from the waste discharge port 303 into the debris collection pipe 208; the debris collection auger shaft 307 is connected to the transmission support 308 and passes through the debris collection auger 316, and the auger is driven to rotate by belt transmission; the dust outlet 314 is installed on the secondary seed discharging port 218, which serves to send the seeds to the air inlet; the sedimentation cleaning port 217 is installed on the waste discharge port 303 at the lower end of the debris collection auger 316 and is perpendicular to the waste discharge port 303, which serves to collect sundries and discharge them outward;The intake fan 315 is installed on the bottom plate 305 of the sedimentation device and serves to provide wind power to clean the attachments on the seed surface. An air outlet is provided on the intake fan and is connected to the air inlet of the plasma generating device. The bottom plate 305 of the sedimentation device is fixedly connected to the main frame 701 and serves as the overall support for the sedimentation and impurity removal system.
[0039] As Figures 7 - 8 shown, the plasma chamber seed feeding system 4 includes a primary seed feeding pipe 401, a central pipe 402, a secondary seed feeding pipe 403, a seed feeding volume regulating valve 404, and a seed dropping pipe 405. The primary seed feeding pipe 401 is sleeved at the end of the primary seed discharging port 223, and the pipe body is embedded on one side of the inner wall of the central pipe 402, serving to guide the cleaned primary seeds into the central pipe 402. The central pipe 402 is installed on the plasma generating device frame and is located between two adjacent plasma generating devices. The secondary seed feeding pipe 403 is sleeved at the end of the secondary seed discharging port 218, and the pipe body is embedded on the other side of the inner wall of the central pipe 402, serving to guide the cleaned secondary seeds into the central pipe 402. The seed feeding volume regulating valve 404 is installed at the intersection of the primary seed feeding pipe 401, the secondary seed feeding pipe 403, and the central pipe 402, serving to adjust the seed flow rate and monitor the operation quality. The seed dropping pipe 405 is respectively connected to the primary seed feeding pipe 401, the secondary seed feeding pipe 403, and the seed feeding volume regulating valve 404, and is respectively installed between the plasma generating device group I 505 and the plasma generating device group II 507, and between the plasma generating device group II 505 and the plasma generating device group III 507. The seed dropping pipe 405 is arranged inside the central pipe 402.
[0040] As Figures 9 - 11As shown, the plasma generating system 5 includes an adjustable suspension, a plasma generating device group, and an air intake valve; the adjustable suspension includes an upper cantilever 501, a telescopic reinforcing rod 503, an insulating panel 502, a support frame 504, a plasma bracket 506, a lifting adjustment device 509, and a plasma mounting frame 510. The upper cantilever 501 is folded and installed in the support frame 504, and is movably connected through a pin shaft to play a role in linking the lifting of the entire suspension to adjust the distance between the plasma generating device and the socket excitation system; the telescopic reinforcing rod 503 is installed at both ends of the plasma bracket 506 to assist in increasing the supporting force when the suspension is adjusted; the insulating panel 502 is installed above the upper cantilever 501 to isolate the high voltage The support frame 504 is installed at the lower end of the upper cantilever 501, and plays the role of supporting the plasma generating system as a whole; the plasma bracket 506 is installed on the support frame 504, and plays the role of supporting the plasma generating device group; the lifting adjustment device 509 is installed on the connecting pin between the upper cantilever 501 and the support frame 504, and plays the role of directly adjusting the lifting of the suspension; the plasma mounting frame 510 is installed on the inner side of the telescopic reinforcing rod 503, and is used to directly install the plasma bionic device group; the plasma generating device group includes a plasma generating device I 505, a plasma generating device II 507, a plasma generating device III 511, and a plasma generating device V 5 12. Plasma generating device IV 513 and plasma generating device VI 514, each of which is composed of three plasma generating substrates mounted on a plasma mounting frame 510, and arranged in 6 groups in a horizontal direction parallel to a plasma bracket 506, forming a plasma generating group; the plasma generating substrate comprises a conduit, an insulating substrate, a safety valve group, an insulating protection base, a safety substrate, and an electrode plate; the conduit comprises an anode wire tube 5011, an air inlet tube 5002, and a cathode wire tube 5003, and the conduit is mounted on an insulating substrate 5004; the insulating substrate 5004 is mounted on an insulating protection base 5009, and a conduit through hole and a safety valve group mounting position are reserved inside the insulating substrate; the safety valve group 50 10 is installed in the insulating base 5004 to protect the plasma generating device; the safety base 5005 is installed below the insulating protection base 5009 and is two symmetrically arranged trapezoidal insulators; the electrode plate includes an anode electrode plate 5007 and a cathode electrode plate 5006, and the electrode plates are installed in the insulating protection base and connected with the wires in the anode wire tube 5011 and the cathode wire tube 5003 respectively; the air inlet pipe 5002 passes through the entire base and is placed in the middle of the electrode plate to guide the plasma generated after the discharge into a certain shape; the air inlet pipe 5008 is installed in the central pipe 402 and is used to connect with each air inlet pipe 5002 to adjust the air intake amount and control the plasma generating area.
[0041] likeFigures 12 - 14 As shown, the indentation excitation and seed collection system 6 includes a primary seed excitation device, a secondary seed excitation device, a primary seed collection sieve, a secondary seed collection sieve, a seed collection frame, and a drive motor; the amplitudes of the primary seed excitation device and the secondary seed excitation device can be adjusted in real time.
[0042] The first-stage seed vibration device 604 is installed directly below the plasma generation device group composed of the plasma generation device I 505 and the plasma generation device VI 514. After cleaning, the first-stage seeds fall into the eyelets of the first-stage seed vibration device 604 through the seed dropping pipeline 405. The seeds jump and move forward under the vibration action to achieve uniform plasma wrapping. There are several eyelets with a diameter of about 1.3 mm and a depth of 1.4 mm arrayed on the first-stage seed vibration device 604, and negative pressure holes are opened at the bottom of the eyelets; the second-stage seed vibration device 603 is installed directly below the plasma generation device group composed of the plasma generation device II 507 and the plasma generation device V 512. After cleaning, the first-stage seeds fall into the eyelets of the first-stage seed vibration device 604 through the seed dropping pipeline 405 on the other side. The seeds jump and move forward under the vibration action of the vibration motor to achieve uniform plasma wrapping. There are several eyelets with a diameter of about 1.1 mm and a depth of 1.2 mm arrayed on the second-stage seed vibration device 603, and negative pressure holes are opened at the bottom of the eyelets; the first-stage seed collecting sieve 605 is installed on the seed collecting frame 609. The driving roller 611 is driven by the driving motor I 607 to drive the belt to rotate. The sieve surface is a belt with flexible strip rods, which serves to collect and buffer the seeds after plasma treatment; the second-stage seed collecting sieve 601 is installed on the seed collecting frame 609. The driving roller 611 is driven by the driving motor II 608 to drive the belt to rotate. The sieve surface is a belt with flexible strip rods, which serves to collect and buffer the seeds after plasma treatment; the lower end of the seed collecting frame 609 is installed on the main frame 701 by the adjusting plate 612, which can realize the adjustment of the installation position of the seed collecting system. The upper end is connected to the support frame 504. The driving motor I 607 and the driving motor II 608 are controlled by the safety controller 602, which plays a role in emergency stop protection. Seed collecting transmission bases 606 are installed at both ends of the seed collecting frame; a gear transmission system for driving the auxiliary vibration roller 610 is installed on the seed collecting transmission base 606; the auxiliary vibration roller 610 is installed on the seed collecting frame 609, directly below the first-stage seed vibration device 604, the second-stage seed vibration device 603, the first-stage seed collecting sieve 605, and the second-stage seed collecting sieve 601, which serves to provide vibration for the sieve surface to improve the uniformity of plasma wrapping treatment and reduce seed congestion; the installation positions of the first-stage seed collecting sieve 605 and the second-stage seed collecting sieve 601 are lower than those of the first-stage seed vibration device 604 and the second-stage seed vibration device 603. A negative pressure bin 613 is installed directly below the first-stage seed vibration device 604 and the second-stage seed vibration device 603. The negative pressure bin 613 is installed on the seed collecting frame 609, below the auxiliary vibration roller 610. The air inlet pipe of the negative pressure bin 613 is connected to the negative pressure fan 708, which serves to provide negative pressure drainage wind force for the seeds on the vibration device and increase the plasma wrapping time on the seed surface. Under the combined action of the first-stage seed vibration device, the second-stage seed vibration device, and the negative pressure fan, the seeds realize the transformation among the static state, the suspended state, and the jumping state.
[0043] Such as Figure 15As shown in the figure, the frame and power source system 7 includes a main frame 701, a large debris box 702, a main support frame 703, a fine debris box 704, a distribution box 705, main legs 706, floor supports 707, a negative pressure fan 708, casters 709, and an intake fan 315; the main frame 701 is the main frame of the plasma seed uniform treatment machine, which supports the whole machine and installs and connects the frame of each system; the lower end of the main support frame 703 is installed on the main frame 701, and the upper end is fixedly connected to the hopper, which supports the uniform feeding system 1 and the multi-stage cleaning system 2; the main legs 706 are the main load-bearing parts of the main frame 701, which are installed around both ends of the main frame 701 and mainly install and connect the frames of each component of the concave vibration and seed collection system 6; the floor supports 707 are installed on the cross beam of the main frame 701 inside the main legs 706, which play the role of grounding and bearing weight and stabilizing the machine body; the casters 709 are installed at the four ends of the bottom cross beam of the main frame 701, which play the role of auxiliary support and moving the whole machine; the large debris box 702 is a movable part placed on the surface of the main frame 701, which collects the larger debris discharged from the large debris discharge port 207; the fine debris box 704 is a movable part placed on the surface of the main frame 701, which collects the debris discharged from the debris collection pipe 208; the distribution box 705 is the main power source, which can output high and low voltage currents to provide power for each working motor, electrode, etc. to ensure the operation of each system; the negative pressure fan 708 is installed at the bottom of the main frame 701 and is connected to the pipeline of the negative pressure bin 613, which plays the role of providing negative pressure drainage wind force; the intake fan 315 is installed on the surface of the main frame 701, which plays the role of providing a deburring air source for the attachments on the surface of the secondary seeds.
[0044] In this embodiment, in a multi-stage air-screen cleaning plasma seed uniform treatment machine provided by the present invention, with the goal of uniformly treating seeds such as alfalfa with plasma, based on the overall scheme of air-screen cleaning - negative pressure drainage - concave vibration type plasma seed uniform coating, a seed treatment machine composed of a uniform feeding system, a multi-stage cleaning system, a sedimentation and impurity removal system, a plasma chamber seed inlet system, a plasma generation system, a concave vibration and seed collection system, and a frame and power source system is provided. It has complete functions, is easy to operate, is economical and applicable, has a low cost, and has a high degree of intelligence. During the treatment process, it has good cleaning and grading performance, uniform plasma coating, high efficiency, can quickly, accurately and effectively carry out real-time uniform feeding, stably adapt to grading and cleaning, and carry out plasma uniform coating treatment in stages, exploring an efficient, low-loss and environmentally friendly pre-sowing treatment method for alfalfa seeds and other seeds that combines agricultural machinery and agronomy, improving the growth potential and biological output of alfalfa and other crops during the entire growth cycle. It provides favorable conditions for the high-quality and high-efficiency supply of high-quality forage, greatly reduces the cost and operation time, and greatly improves the efficiency and reduces the power consumption.
[0045] The specific working process of the plasma seed uniform treatment machine with multi-stage air-screen cleaning function is as follows: The frame and power source system provide basic conditions such as support, transportation, and power supply for the whole machine; after the seeds are uniformly fed into the hopper of the seed uniform feeding system, the seeds that meet the diameter requirements fall into the multi-stage cleaning system, and the larger sundries and other components that do not meet the requirements are discharged through the large waste discharge port; the seeds entering the multi-stage cleaning system jump under the action of vibration, and the small-sized seeds fall into the secondary cleaning device, and the seeds that meet the requirements are discharged from the primary seed metering device and filled into the plasma treatment chamber through the plasma chamber seed inlet system. The seeds falling into the secondary cleaning device continue to complete the cleaning, and the seeds that meet the conditions enter the fan treatment part through the secondary seed metering device. After the attachments are removed, they are filled into the plasma treatment chamber through the plasma chamber seed inlet system. The extremely small tertiary seeds are discharged through the tertiary seed metering device and recycled; the fine sundries, dust, etc. generated by the vibration during the feeding process are sucked into the sedimentation and impurity removal system. Under the action of the diversion device, the lighter sundries are discharged from the dust removal port, and the remaining sundries are discharged from the sedimentation chamber under the action of the auger; after the seeds enter the plasma generation system, they are evenly distributed in the eyelet vibration and seed collection system, and the eyelet filling and plasma uniform coating of the seeds are completed under the dual vibration of the active and passive. The seeds continuously jump forward under the action of vibration, pass through multiple plasma regions, and complete the uniform coating treatment on the surface with the assistance of negative pressure drainage. The treated seeds fall into the seed collection sieve to complete the collection.
[0046] Generally, it saves consumables and space, provides favorable conditions for realizing high-quality and efficient pre-sowing treatment of crop seeds such as forage, greatly reduces costs and operation time, improves efficiency, has good economic and social benefits, and has a very broad market prospect.
[0047] The specific embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments. Within the scope of knowledge possessed by those of ordinary skill in the art, various deformations and combinations can be made without departing from the essence of the present invention, and these deformations and combinations are still within the protection scope of the present invention.
Claims
1. A plasma seed uniform treatment machine with a multi-stage air-screen cleaning function, characterized in that: It includes a uniform feeding system, a multi-stage cleaning system, a sedimentation impurity removal system, a plasma chamber seed feeding system, a plasma generation system, a concave vibration and seed collection system, a frame and a power source system; Seeds enter the multi-stage cleaning system through the uniform feeding system, and after being cleaned and graded through the cooperation of the multi-stage cleaning system and the sedimentation impurity removal system, they enter the plasma generation system through the plasma chamber seed feeding system, and the plasma generation system performs plasma treatment on the seeds; The uniform feeding system is the head feeding mechanism of the plasma seed uniform treatment machine, and the main body is installed on the cleaning screen frame, and is used to uniformly and stably feed the seeds in the hopper into the multi-stage cleaning system under the drive of the vibration main shaft and the eccentric connecting rod. The spring screw connects the discharge baffle and the upper support bottom plate through a chute. The upper support bottom plate is connected to the vibration rib plates on both sides through the vibration auxiliary shaft. The small rocker arms are installed at both ends of the vibration auxiliary shaft and are connected to the auxiliary swing arms. The auxiliary swing arms are connected to the feeding screen brackets by pins. An adjustable inclination feeding screen is installed between the paired feeding screen brackets. The top of the feeding screen bracket is connected to the main swing arm by a pin. The lower end of the main swing arm is installed with a vibration main shaft, and an eccentric wheel is installed on the vibration main shaft. One end of the eccentric connecting rod is connected to the eccentric wheel, and the other end is fixedly connected to the bottom surface of the feeding screen; The plasma generation system includes an adjustable suspension, a plasma generation device group, and an air inlet valve; The adjustable suspension includes an upper cantilever, a telescopic reinforcing rod, an insulating panel, a support frame, a plasma bracket, a lifting adjustment device, and a plasma mounting bracket. The upper cantilever is foldably installed in the support frame and is movably connected by a pin shaft, which plays a role in linking the overall suspension to lift and adjust the distance between the plasma generation device and the concave vibration system; The telescopic reinforcing rods are installed at both ends of the plasma bracket. The insulating panel is installed above the upper cantilever. The support frame is installed at the lower end of the upper cantilever. The plasma bracket is installed on the support frame. The lifting adjustment device is installed on the connecting pin shaft between the upper cantilever and the support frame, which plays a role in directly adjusting the suspension to lift; The plasma mounting bracket is installed inside the telescopic reinforcing rod.
2. The plasma seed uniform treatment machine with multi-stage air-screen cleaning function according to claim 1, characterized in that The multi-stage cleaning system includes an inoculation device, a multi-stage sorting screen, an excitation device, and a seeding device. The main body is installed on the main frame, and the upper end is connected to the uniform feeding system; the inoculation device includes a guide cover, an inoculation plate, a seed guide plate, an inoculation height adjustment device, a debris shield, a seed drop screen, and a debris cleaning plate; the upper end of the guide cover is movably connected to the inner wall of the debris inlet channel of the sedimentation and debris removal system, and the lower end is movably connected to the inoculation plate; the lower end of the inoculation plate is fixedly connected to the inoculation height adjustment device, and moves with the extension of the electric cylinder. The seed guide plate is fixedly connected to the debris shield at a certain angle, and the middle baffle is fixedly connected to the debris cleaning plate, and encloses a closed debris cleaning cavity with the debris cleaning plate; the debris shield is installed on the cleaning screen frame; the multi-stage sorting screen includes a seed drop screen, a cleaning screen frame, a large debris discharge port, a cleaning mesh screen II, a secondary cleaning screen, a cleaning mesh screen I, a primary cleaning screen, a tertiary cleaning screen, a seed baffle, and a seed thinning scraper. The seed drop screen is installed on the cleaning screen frame to catch the seeds falling from the seed guide plate. The seeds are screened and dropped onto the seed-dropping screen, and the seed-dropping screen is provided with a plurality of holes corresponding to irregular seed shapes in an array, and the seed-dropping screen is fixedly connected to the cleaning screen frame at a certain angle, and the first-level cleaning screen is movably connected to the cleaning screen I in a drawer shape, and a plurality of smaller irregular seed-shaped holes are arranged on the screen surface; the cleaning screen I is movably connected to the cleaning screen frame, and the main body is a grid-shaped screen rod and an arc-shaped spring tooth, and the arc-shaped spring tooth plays the role of hitting the bottom of the first-level cleaning screen to provide vibration to clear the blocked seeds. ; The thinning scraper is installed on the bottom surface of the cleaning screen I and is fixedly connected to the frame bracket of the cleaning screen I; the vibration excitation device includes a sorting motor, a transmission shield, and a two-stage eccentric connecting rod. The sorting motor is connected to the transmission shield through a shaft, and is installed together at one end where the cleaning screen frame is connected to the cleaning screen leg, and is connected to the two-stage eccentric connecting rod through a belt drive. One end of the two-stage eccentric connecting rod is located at the bottom of the three-stage cleaning screen and is fixedly connected to the cleaning screen frame, thereby providing adjustable frequency excitation for the entire multi-stage cleaning system.
3. The plasma seed uniform treatment machine with a multi-stage air-screen cleaning function according to claim 1, characterized in that, The sedimentation and impurity removal system includes a dust removal port, a sedimentation device, an intake fan, a diversion adjustment device, and a waste discharge device; the main body of the dust removal port is installed on the frame of the sedimentation device, and the outlet end is connected to an external smoke and dust collection device; the sedimentation device includes a sedimentation device frame, a sedimentation chamber shield, a sedimentation chamber, an intake channel, and an arc-shaped diversion baffle. The sedimentation device frame is installed at the upper end of the cleaning sieve frame, and there is a rectangular inoculation plate installation opening on one side of the frame. The sedimentation chamber is enclosed and closed by the sedimentation chamber shield. The intake channel is installed outside the sedimentation device frame and is fixedly connected to the intake fan; the arc-shaped diversion baffle is movably connected to the sedimentation device frame and can adjust the installation inclination angle according to requirements to achieve smoke and dust diversion in different directions; the diversion adjustment device includes a cleaning plate, a diversion cover, a rotating gear, a linkage rack, an adjustment handwheel, and a diversion baffle. The cleaning plate is embedded in the rectangular installation opening on one side of the sedimentation device frame and can adjust the installation inclination angle; the diversion cover is installed in the chute of the sedimentation device frame and is connected to the diversion baffle, and moves along the chute as the diversion baffle expands and contracts to adjust the opening and closing of the impurity intake channel; the linkage rack is installed on the inner wall of the sedimentation device frame and meshes with the rotating gear. The rotating gear and the adjustment handwheel are connected by a shaft, and as the adjustment handwheel rotates, it drives the linkage rack to expand and contract to complete the adjustment of the opening degrees of the intake channel and the impurity intake channel; the waste discharge device includes a waste discharge port, a impurity collection channel, a impurity collection auger shaft, a transmission support, a dust outlet, a sedimentation cleaning port, and a impurity collection auger. The impurity collection auger is installed on the inner wall of the sedimentation chamber shield; the waste discharge port is installed on the sedimentation device frame at the lower end of the sedimentation cleaning port, the impurity collection channel is installed on the sedimentation device frame, the impurity collection auger shaft is connected to the transmission support and passes through the impurity collection auger, and the auger is driven to rotate by belt transmission; the dust outlet is installed on the secondary seed discharge port and serves to send the seeds to the air inlet; the sedimentation cleaning port is installed on the waste discharge port at the lower end of the impurity collection auger and is perpendicular to the waste discharge port. The intake fan is installed on the bottom plate of the sedimentation device, and there is an air outlet on the intake fan connected to the air inlet of the plasma generating device.
4. The plasma seed uniform treatment machine with multi-stage air-screen cleaning function according to claim 1, characterized in that, The plasma generating device group includes Plasma Generator I, Plasma Generator II, Plasma Generator III, Plasma Generator V, Plasma Generator IV, and Plasma Generator VI. Each plasma generating device is composed of 3 plasma generating substrates mounted on a plasma mounting frame, and 6 groups are arrayed horizontally along the direction parallel to the plasma bracket to form a plasma generating group. The plasma generating substrate includes a conduit, an insulating substrate, a safety valve group, an insulating protection base, a safety substrate, and an electrode plate. The conduit includes an anode wire conduit, an air inlet pipe, and a cathode wire conduit, and the conduit is mounted on the insulating substrate. The insulating substrate is mounted inside the insulating protection base, and there are conduit through holes and safety valve group mounting positions left inside the insulating substrate. The safety valve group is mounted inside the insulating substrate to protect the plasma generating device. The safety substrate is mounted below the insulating protection base and is composed of two symmetrically arranged trapezoid-like insulators. The electrode plate includes a positive electrode plate and a negative electrode plate, and the electrode plate is mounted inside the insulating protection base and is respectively connected to the internal wires of the anode wire conduit and the cathode wire conduit. The air inlet pipe passes through the entire base and is placed in the middle of the electrode plate to play a role in guiding the plasma generated after discharge into a certain shape. The air inlet pipe is mounted inside the central pipe and is used to connect to each air inlet pipe.
5. The plasma seed uniform treatment machine with multi-stage air-screen cleaning function according to claim 1, characterized in that, The eye-hole vibration and seed collection system includes a primary seed vibration device, a secondary seed vibration device, a primary seed collection sieve, a secondary seed collection sieve, a seed collection frame, and a driving motor. The primary seed vibration device is mounted directly below the plasma generating device group composed of Plasma Generator I and Plasma Generator VI. After cleaning, the primary seeds fall into the eye-holes of the primary seed vibration device through the seed dropping pipe. The seeds jump and move forward under the vibration effect to achieve uniform plasma coating. There are several eye-holes with a diameter of about 1.3 mm and a depth of 1.4 mm arrayed on the primary seed vibration device, and negative pressure holes are opened at the bottom of the eye-holes. The primary seed collection sieve is mounted on the seed collection frame, and the driving roller driven by Driving Motor I drives the belt to rotate. The sieve surface is a flexible belt with rod-shaped strips to collect and buffer the seeds after plasma treatment. The lower end of the seed collection frame is mounted on the main frame by an adjusting plate, and the upper end is connected to the support frame. Driving Motor I and Driving Motor II are controlled by a safety controller to play an emergency stop protection role. Seed collection transmission bases are mounted at both ends of the seed collection frame. A gear transmission system for driving the auxiliary vibration roller is mounted on the seed collection transmission base. The auxiliary vibration roller is mounted on the seed collection frame and is located directly below the primary seed vibration device, the secondary seed vibration device, the primary seed collection sieve, and the secondary seed collection sieve. A negative pressure bin is mounted directly below the primary seed vibration device and the secondary seed vibration device. The negative pressure bin is mounted on the seed collection frame and is located below the auxiliary vibration roller. The air inlet pipe of the negative pressure bin is connected to a negative pressure fan.
Citation Information
Patent Citations
Multi-stage air-screen seed cleaning machine and cleaning method
CN117019631A