A coating with nitride and oxide and its preparation method and application

Abstract

The present application discloses a coating having nitrides and oxides, as well as a preparation method and application. The coating includes a TiAlN layer, a CrAlO layer, and a CrAlON layer deposited sequentially. The preparation method includes the following steps: S1, cleaning the substrate; S2, in-situ etching the substrate surface in a coating chamber; S3, preparing a TiAlN layer on the substrate surface using a cathode arc evaporation deposition method; S4, preparing a CrAlO layer on the TiAlN layer using a cathode arc evaporation deposition method; S5, preparing a CrAlON layer on the CrAlO layer using a cathode arc evaporation deposition method. The coating prepared in the present application has a multilayer structure including a TiAlN layer, a CrAlO layer, and a CrAlON layer. The TiAlN layer is deposited on the substrate surface to improve the bonding strength between the coating and the substrate, and the CrAlON layer is deposited on the CrAlO layer, so that a dense oxide film can be quickly formed at high temperatures, thereby improving the high temperature resistance of the coating.

Description

Technical Field

[0001] The present application relates to the technical field of coating preparation, and in particular to a coating having nitride and oxide, and a preparation method and application thereof. Background Art

[0002] Vapor deposition coating is a key technology for improving the performance of cutting tools. Vapor deposition technology can produce coated tools that combine the high toughness of cemented carbide with the high hardness and wear resistance of the surface coating. With the development of advanced manufacturing technology, the emergence and application of various new difficult-to-machine materials have made cutting conditions even more challenging, placing higher demands on tool surface coatings.

[0003] Al2O3 coatings have excellent wear resistance and high-temperature stability, can serve in harsh high-temperature environments, and have a good cutting life. However, the CVD method is currently basically used to prepare Al2O3 coatings. This method has a high deposition temperature of up to 1000°C, and is easy to diffuse into the coating with matrix elements, so the range of matrix selection is relatively small. PVD technology can overcome the above-mentioned defects, but it is difficult to deposit stable Al2O3 using PVD technology. Studies have found that the lattice constants of α-Cr2O3 and α-Al2O3 are similar, and α-(Cr, Al)2O3 has been successfully prepared. Its performance is comparable to that of α-Al2O3, and it is expected to replace α-Al2O3 coatings prepared by CVD in the future.

[0004] While PVD-prepared α-(Cr, Al)2O3 coatings offer excellent wear resistance and high-temperature stability, their application to industrial cutting tools presents a series of challenges. For example, the physical properties of the PVD oxide coating differ significantly from those of the carbide tool substrate. To achieve effective cutting applications for the oxide coating, good adhesion between the coating and the tool substrate is crucial. However, currently, no robust process exists to achieve this bond. Summary of the Invention

[0005] In order to solve at least one of the above technical problems, the present application provides a coating having nitride and oxide, a preparation method and an application thereof, and the technical solution adopted is as follows.

[0006] The method for preparing the coating having nitride and oxide provided in this application includes the following process:

[0007] S1, cleaning substrate;

[0008] S2, in-situ etching of the substrate surface in the coating chamber;

[0009] S3, preparing a TiAlN layer on the substrate surface by using a cathode arc evaporation deposition method;

[0010] S4, preparing a CrAlO layer on the TiAlN layer by using a cathodic arc evaporation deposition method;

[0011] S5, preparing a CrAlON layer on the CrAlO layer by using a cathode arc evaporation deposition method.

[0012] In some embodiments of the present application, the thickness of the TiAlN layer is 1.5 to 3.5 μm, the thickness of the CrAlO layer is 0.5 to 2.5 μm, and the thickness of the CrAlON layer is 0.1 to 0.5 μm.

[0013] In certain embodiments of the present application, in the TiAlN layer, the Al content is 10 to 35 at %, the Ti content is 10 to 35 at %, and the N content is 30 to 55 at %.

[0014] In some embodiments of the present application, in the CrAlO layer, the Al content is 10 to 25 at %, the Cr content is 10 to 25 at %, and the O content is 55 to 65 at %.

[0015] In certain embodiments of the present application, in the CrAlON layer, the Al content is 10 to 25 at %, the Cr content is 10 to 25 at %, the O content is 15 to 30 at %, and the N content is 15 to 30 at %.

[0016] In some embodiments of the present application, during the deposition of the TiAlN layer, nitrogen is introduced, the pressure in the coating chamber is 1 to 3 Pa, and the target current density of the arc target is 0.5 to 1.5 A / cm 2 , substrate bias is -40 to -150V.

[0017] In some embodiments of the present application, during the deposition of the CrAlO layer, nitrogen is turned off and oxygen is introduced. The pressure in the coating chamber is 0.6 to 2 Pa, and the target current density of the arc target is 0.4 to 1 A / cm 2 , the substrate bias is -100 to -200V.

[0018] In some embodiments of the present application, during the deposition of the CrAlON layer, nitrogen and oxygen are introduced, the pressure in the coating chamber is 0.6 to 2 Pa, and the target current density of the arc target is 0.5 to 1.5 A / cm 2 , the substrate bias is -100 to -200V.

[0019] The coating provided in the present application is obtained by the preparation method as described above, and the coating comprises a TiAlN layer, a CrAlO layer and a CrAlON layer deposited in sequence.

[0020] The coating provided in the present application is deposited on the surface of a tool, the material of which is one of high-speed steel, cemented carbide, metal ceramic, ceramic and cubic boron nitride. The tool is used for mechanical processing, and the mechanical processing includes at least one of turning, milling, drilling, boring and grinding.

[0021] The embodiments of the present application have at least the following beneficial effects: the coating prepared in the present application has a multilayer structure including a TiAlN layer, a CrAlO layer and a CrAlON layer. The TiAlN layer is deposited on the surface of the substrate to improve the bonding strength between the coating and the substrate. The CrAlON layer is deposited on the CrAlO layer, so that a dense oxide film can be quickly formed at high temperature, thereby improving the high temperature resistance of the coating. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] The aspects and advantages described and / or attached in the embodiments of the present application will become apparent and easily understood in conjunction with the following drawings. It should be noted that the embodiments embodied in the following drawings are exemplary and are only used to explain the present application and are not to be construed as limiting the present application.

[0023] Figure 1 These are scanning electron microscope images of the cross-sectional morphologies of the two coating fractures of Example 1 and Comparative Example 1.

[0024] Figure 2 These are scanning electron microscope images of the fracture cross-sectional morphologies of the two coatings of Example 1 and Comparative Example 1 after oxidation treatment at 950° C. for 5 hours.

[0025] Figure 3 The flank wear curves of two coated tools in Example 1 and Comparative Example 1 when continuously turning 20Cr alloy steel are shown. DETAILED DESCRIPTION

[0026] The following combination Figures 1 to 3 Embodiments of the present application are described in detail, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, and are not to be construed as limiting the present application.

[0027] In the description of this application, it should be understood that if the terms "center", "middle", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "axial", "radial", "circumferential" and the like appear, the orientation or position relationship indicated is based on the orientation or position relationship shown in the accompanying drawings, which is only for the convenience of describing this application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application. In addition, features defined as "first" and "second" may explicitly or implicitly include one or more of such features. In the description of this application, unless otherwise specified, "multiple" means two or more.

[0028] In the description of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and internal connections between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.

[0029] The present application relates to a coating having nitride and oxide, which is prepared by a cathode arc evaporation deposition method. Specifically, the coating comprises a TiAlN layer, a CrAlO layer and a CrAlON layer deposited in sequence.

[0030] The present application relates to the application of a coating having nitrides and oxides, wherein the coating is deposited on the surface of a tool, wherein the material of the tool is one of high-speed steel, cemented carbide, cermet, ceramic and cubic boron nitride, and the tool is used for mechanical processing, wherein the mechanical processing includes at least one of turning, milling, drilling, boring and grinding, and the tool can process medium and low carbon steel, cast iron or stainless steel materials.

[0031] The present application relates to a method for preparing a coating having nitrides and oxides. The prepared coating has strong bonding force, high temperature resistance and excellent cutting life.

[0032] The preparation method includes the following process.

[0033] S1, cleaning the substrate, ultrasonically cleaning the substrate and drying it.

[0034] S2, in-situ etching of the substrate surface in the coating chamber.

[0035] S3, preparing a TiAlN layer on the surface of the substrate by using a cathode arc evaporation deposition method to obtain a nitride layer.

[0036] S4, preparing a CrAlO layer on the TiAlN layer by using a cathode arc evaporation deposition method to obtain an oxide layer.

[0037] S5, preparing a CrAlON layer on the CrAlO layer by using a cathode arc evaporation deposition method to obtain an oxynitride layer.

[0038] It is understood that the introduction of a nitride layer as a transition layer between the substrate and the oxide layer increases the bonding strength between the oxide layer and the substrate surface, and the addition of an oxynitride layer on the surface of the oxide layer further enhances the coating's high-temperature resistance and cutting life. This preparation method boasts simple process, strong operability, good controllability, and low production costs. The resulting hard coating exhibits strong bonding strength and excellent wear resistance, making it suitable for surface protection of cutting tool products and offering excellent economic benefits.

[0039] In step S2, an ion source is used to ionize an inert gas to generate high-energy ions, thereby performing in-situ etching on the substrate surface. Specifically, argon gas is introduced, the pressure in the coating chamber is 0.6 to 3 Pa, the ion source is turned on to generate high-energy ions, the ion source output power is set to 2 to 5 kW, the substrate bias voltage is set to -400 to -800 V, and the high-energy ions are attracted to ion-etch the substrate for a bombardment time of 20 to 60 minutes. Furthermore, the bombardment time is 10 to 45 minutes.

[0040] In step S3, during the TiAlN layer deposition process, nitrogen is introduced, the pressure in the coating chamber is 1 to 3 Pa, and the target current density of the arc target is 0.5 to 1.5 A / cm 2 , the substrate bias voltage is -40 to -150 V. Further, the deposition time is 50 to 120 min.

[0041] In step S4, during the deposition of the CrAlO layer, the nitrogen gas is turned off and oxygen gas is introduced. The pressure in the coating chamber is 0.6 to 2 Pa, and the target current density of the arc target is 0.4 to 1 A / cm 2 , the substrate bias voltage is -100 to -200 V. Further, the deposition time is 30 to 100 minutes.

[0042] In step S5, during the deposition of the CrAlON layer, nitrogen and oxygen are introduced, the pressure in the coating chamber is 0.6 to 2 Pa, and the target current density of the arc target is 0.5 to 1.5 A / cm 2 , the substrate bias voltage is -100 to -200 V. Further, the deposition time is 10 to 40 minutes.

[0043] The thickness of the TiAlN layer is 1.5 to 3.5 μm, the thickness of the CrAlO layer is 0.5 to 2.5 μm, and the thickness of the CrAlON layer is 0.1 to 0.5 μm. Furthermore, the thickness of the TiAlN layer is 2 to 3 μm, the thickness of the CrAlO layer is 1 to 2 μm, and the thickness of the CrAlON layer is 0.2 to 0.3 μm. It is understood that the thicknesses of the nitride layer, the oxide layer, and the oxynitride layer can be the same or different.

[0044] In some examples, the thickness of the TiAlN layer is 1.5 μm, the thickness of the CrAlO layer is 0.5 μm, the thickness of the CrAlON layer is 0.1 μm, and the total thickness of the coating is 2.1 μm.

[0045] In some examples, the thickness of the TiAlN layer is 2 μm, the thickness of the CrAlO layer is 1 μm, the thickness of the CrAlON layer is 0.2 μm, and the total thickness of the coating is 3.2 μm.

[0046] In some examples, the thickness of the TiAlN layer is 2.5 μm, the thickness of the CrAlO layer is 1.5 μm, the thickness of the CrAlON layer is 0.3 μm, and the total thickness of the coating is 4.3 μm.

[0047] In some examples, the thickness of the TiAlN layer is 3 μm, the thickness of the CrAlO layer is 2 μm, the thickness of the CrAlON layer is 0.4 μm, and the total thickness of the coating is 5.4 μm.

[0048] In the TiAlN layer, the Al content is 10 to 35 at %, the Ti content is 10 to 35 at %, and the N content is 30 to 55 at %.

[0049] In the CrAlO layer, the Al content is 10 to 25 at %, the Cr content is 10 to 25 at %, and the O content is 55 to 65 at %.

[0050] In the CrAlON layer, the Al content is 10 to 25 at %, the Cr content is 10 to 25 at %, the O content is 15 to 30 at %, and the N content is 15 to 30 at %.

[0051] The contents of this application are described in detail below with reference to specific embodiments. It should be noted that the following description is merely an illustrative illustration and is not a specific limitation to this application.

[0052] Example 1

[0053] The tool substrate, made of cemented carbide, was ultrasonically cleaned and dried before being placed in the coating chamber. The chamber temperature and vacuum were adjusted to the desired conditions. The substrate was then glow-cleaned, and 300 sccm of argon was introduced. The substrate bias was set to -1000 V for 30 minutes. The substrate was then etched, with 100 sccm of argon introduced. The ion source was activated, with the pressure set to 0.7 Pa, the substrate bias to -500 V, and the ion source power set to 2.5 kW for 15 minutes.

[0054] Turn off the argon and ion source, introduce 300 sccm of nitrogen, turn on the TiAl target, set the target current to 80A, the substrate bias to -40V, and the pressure to 3Pa. Deposit a TiAlN layer for 30 minutes with a thickness of 1μm. Change the substrate bias to -80V and continue depositing the TiAlN layer for 30 minutes with a thickness of 1μm.

[0055] The TiAl target and nitrogen were turned off, and 90 sccm of oxygen was introduced into the coating chamber. The gas pressure was 0.8 Pa, the target current was 50 A, and the substrate bias was -150 V. The CrAlO layer was deposited for 30 min and the coating thickness was 1 μm.

[0056] 150 sccm nitrogen was introduced into the coating chamber, the oxygen flow rate was reduced to 10 sccm, the target current and substrate bias remained unchanged, and a CrAlON layer was deposited with a deposition time of 10 min and a thickness of 0.2 μm.

[0057] Through the above deposition process, a coating with a TiAlN / CrAlO / CrAlON multilayer structure can be obtained.

[0058] Example 2

[0059] The tool substrate, made of cemented carbide, was ultrasonically cleaned and dried before being placed in the coating chamber. The chamber temperature and vacuum were adjusted to the desired conditions. The substrate was then glow-cleaned, and 300 sccm of argon was introduced. The substrate bias was set to -1000 V for 30 minutes. The substrate was then etched, with 100 sccm of argon introduced. The ion source was activated, with the pressure set to 0.7 Pa, the substrate bias to -500 V, and the ion source power set to 2.5 kW for 15 minutes.

[0060] Turn off the argon gas and ion source, introduce 300 sccm of nitrogen, turn on the TiAl target, set the target current to 80A, the substrate bias to -40V, and the pressure to 3Pa. Deposition of the TiAlN layer was completed in 45 minutes with a thickness of 1.5μm. Change the substrate bias to -80V and continue depositing the TiAlN layer for 45 minutes with a thickness of 1.5μm.

[0061] The TiAl target and nitrogen were turned off, and 90 sccm of oxygen was introduced into the coating chamber. The gas pressure was 0.8 Pa, the target current was 50 A, and the substrate bias was -150 V. The CrAlO layer was deposited for 45 min and the coating thickness was 1.5 μm.

[0062] 150 sccm nitrogen was introduced into the coating chamber, the oxygen flow rate was reduced to 10 sccm, the target current and substrate bias remained unchanged, and the CrAlON layer was deposited for 15 minutes with a thickness of 0.3 μm.

[0063] After the above deposition process, a coating with a TiAlN / CrAlO / CrAlON multilayer structure can be obtained. Compared with Example 1, the thickness of the coating is increased, and the residual stress and hardness will also increase accordingly. However, excessive residual stress may cause peeling of the coating. Therefore, we need to select a relatively appropriate coating thickness to obtain the best cutting performance.

[0064] Comparative Example 1

[0065] The tool substrate, made of cemented carbide, was ultrasonically cleaned and dried before being placed in the coating chamber. The chamber temperature and vacuum were adjusted to the desired conditions, followed by a glow clean. Argon was introduced at 300 sccm, and the substrate bias was set to -1000 V for 30 minutes. Then, argon was introduced at 100 sccm, and the ion source was activated with a pressure of 0.7 Pa, a substrate bias of -500 V, and an ion source power of 2.5 kW. The substrate was then etched for 15 minutes.

[0066] Turn off the argon and ion source, introduce 300 sccm of nitrogen, turn on the TiAl target, set the target current to 80A, the substrate bias to -40V, and the pressure to 3Pa. Deposit a TiAlN layer for 30 minutes with a thickness of 1μm. Change the substrate bias to -80V and continue depositing the TiAlN layer for 30 minutes with a thickness of 1μm.

[0067] The TiAl target and nitrogen were turned off, and 90 sccm of oxygen was introduced into the coating chamber. The gas pressure was 0.8 Pa, the target current was 50 A, and the substrate bias was -150 V. The CrAlO layer was deposited for 30 min with a thickness of 1 μm.

[0068] After the above deposition, a coating with a TiAlN / CrAlO multilayer structure is obtained.

[0069] Comparative Example 2

[0070] The tool substrate, made of cemented carbide, was ultrasonically cleaned and dried before being placed in the coating chamber. The chamber temperature and vacuum were adjusted to the desired conditions, followed by a glow clean. Argon was introduced at 300 sccm, and the substrate bias was set to -1000 V for 30 minutes. Then, argon was introduced at 100 sccm, and the ion source was activated with a pressure of 0.7 Pa, a substrate bias of -500 V, and an ion source power of 2.5 kW. The substrate was then etched for 15 minutes.

[0071] Turn off the argon gas and ion source, introduce 300 sccm nitrogen, turn on the TiAl target, set the target current to 80 A, the substrate bias to -50 V, and the gas pressure to 3 Pa, and deposit a TiAlN transition layer with a deposition time of 10 min and a thickness of 0.3 μm.

[0072] The TiAl target and nitrogen were turned off, and 90 sccm of oxygen was introduced into the coating chamber. The gas pressure was 0.8 Pa, the target current was 50 A, and the substrate bias was -150 V. The CrAlO layer was deposited for 30 min with a thickness of 1 μm.

[0073] After the above deposition, a CrAlO coating is obtained. Compared with Comparative Example 1, which lacks the TiAlN bottom layer, the physical properties of CrAlO and the cemented carbide substrate are quite different. Even with a 300nm nitride transition layer, its bonding strength is far inferior to that of Comparative Example 1, and the coating cutting performance is relatively poor. Compared with Example 1, which lacks the TiAlN bottom layer and the CrAlON surface layer, the coating is relatively poor in bonding strength and high-temperature oxidation performance, and thus the coating cutting performance is also poor.

[0074] Comparative Example 3

[0075] The tool substrate, made of cemented carbide, was ultrasonically cleaned and dried before being placed in the coating chamber. The chamber temperature and vacuum were adjusted to the desired conditions, followed by a glow clean. Argon was introduced at 300 sccm, and the substrate bias was set to -1000 V for 30 minutes. Then, argon was introduced at 100 sccm, and the ion source was activated with a pressure of 0.7 Pa, a substrate bias of -500 V, and an ion source power of 2.5 kW. The substrate was then etched for 15 minutes.

[0076] Turn off the argon gas and ion source, introduce 300 sccm nitrogen, turn on the TiAl target, set the target current to 80 A, the substrate bias to -50 V, and the gas pressure to 3 Pa, and deposit a TiAlN transition layer with a deposition time of 10 min and a thickness of 0.3 μm.

[0077] The TiAl target and nitrogen were turned off, and 90 sccm of oxygen was introduced into the coating chamber. The gas pressure was 0.8 Pa, the target current was 50 A, and the substrate bias was -150 V. The CrAlO layer was deposited for 30 min with a thickness of 1 μm.

[0078] 150 sccm nitrogen was introduced into the coating chamber, the oxygen flow rate was reduced to 10 sccm, the target current and substrate bias remained unchanged, and the CrAlON layer was deposited for 15 minutes with a thickness of 0.3 μm.

[0079] After the above deposition, a CrAlO / CrAlON coating is obtained. Compared with Comparative Example 1, there is also no bottom layer of TiAlN, and the coating bonding is far inferior to Comparative Example 1. Compared with Comparative Example 2, there is more CrAlON on the surface. CrAlON will oxidize at high temperature to form a denser CrAlO coating, and the high-temperature oxidation performance of the coating is greatly improved. However, due to the lack of the bottom layer of TiAlN, its bonding strength and cutting performance are relatively poor. Compared with Example 1, due to the lack of the bottom layer of TiAlN, the bonding performance of the coating to the substrate is poor, and the cutting performance is also relatively poor.

[0080] Combined with attachment Figure 1 , the layered structure of the two coatings can be clearly seen in the figure.

[0081] Combined with attachment Figure 2 After the coating was oxidized at 950℃ for 5h, Figure 2 The coating in a is completely oxidized, while the Figure 2 In b, due to the presence of a CrAlON layer on the coating surface, the coating is almost not oxidized, indicating that the high-temperature oxidation resistance of the coating has been greatly improved.

[0082] Combined with attachment Figure 3 The coating obtained in Example 1 has a tool life that is approximately doubled due to the addition of a CrAlON layer on the surface, indicating that adding a layer of CrAlON on the surface can significantly increase the tool life.

[0083] In the description of this specification, if the reference terms "one embodiment," "some examples," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples" appear, it means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described can be combined in any appropriate manner in any one or more embodiments or examples.

[0084] The above describes the implementation methods of the present application in detail in conjunction with the accompanying drawings, but the present application is not limited to the above implementation methods. Various changes can be made within the scope of knowledge possessed by ordinary technicians in the technical field without departing from the purpose of the present application.

[0085] In the description of this application, if the "," appears in the patent title, it indicates an "and" relationship, not an "or" relationship. For example, if the patent title is "A, B", it means that the content protected by this application is: the technical solution of the subject name A and the technical solution of the subject name B.

Claims

1. A method for preparing a coating having nitride and oxide, characterized in that: include S1, cleaning substrate; S2, in-situ etching of the substrate surface in the coating chamber; S3, preparing a TiAlN layer on the substrate surface by using a cathode arc evaporation deposition method; S4, preparing a CrAlO layer on the TiAlN layer by using a cathodic arc evaporation deposition method; S5, a CrAlON layer is prepared on the CrAlO layer by cathode arc evaporation deposition method, nitrogen and oxygen are introduced, the pressure in the coating chamber is 0.6 to 2 Pa, and the target current density of the arc target is 0.5 to 1.5 A / cm 2 , substrate bias voltage is -100 to -200 V, and deposition time is 10 to 40 min; In the CrAlON layer, the Al content is 10 to 25 at %, the Cr content is 10 to 25 at %, the O content is 15 to 30 at %, and the N content is 15 to 30 at %.

2. The preparation method according to claim 1, wherein: The thickness of the TiAlN layer is 1.5 to 3.5 μm, the thickness of the CrAlO layer is 0.5 to 2.5 μm, and the thickness of the CrAlON layer is 0.1 to 0.5 μm.

3. The preparation method according to claim 1, wherein: In the TiAlN layer, the Al content is 10 to 35 at %, the Ti content is 10 to 35 at %, and the N content is 30 to 55 at %.

4. The preparation method according to claim 1, wherein: In the CrAlO layer, the Al content is 10 to 25 at %, the Cr content is 10 to 25 at %, and the O content is 55 to 65 at %.

5. The preparation method according to any one of claims 1 to 4, characterized in that: During the TiAlN layer deposition process, nitrogen gas was introduced, the pressure in the coating chamber was 1 to 3 Pa, and the target current density of the arc target was 0.5 to 1.5 A / cm 2 , substrate bias is -40 to -150V.

6. The preparation method according to claim 5, characterized in that: During the deposition of the CrAlO layer, the nitrogen gas was turned off and oxygen was introduced. The pressure in the coating chamber was 0.6 to 2 Pa, and the target current density of the arc target was 0.4 to 1 A / cm 2 , the substrate bias is -100 to -200V.

7. A coating having nitride and oxide, characterized in that: The coating is obtained by the preparation method according to any one of claims 1 to 6, and the coating comprises a TiAlN layer, a CrAlO layer and a CrAlON layer deposited sequentially.

8. Application of a coating having nitride and oxide, characterized in that: The coating according to claim 7 is deposited on the surface of a tool, the material of the tool is one of high-speed steel, cemented carbide, cermet, ceramic and cubic boron nitride, and the tool is used for mechanical processing, and the mechanical processing includes at least one of turning, milling, drilling, boring and grinding.

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