Single crystal furnace upper furnace cylinder cleaning device and single crystal furnace

Abstract

The application provides a single-crystal furnace upper furnace cylinder cleaning device and relates to the technical field of single-crystal furnace cleaning devices.The single-crystal furnace upper furnace cylinder cleaning device comprises a climbing assembly and a cleaning and collecting assembly.The cleaning and collecting assembly comprises a driving motor, a cleaning turntable, a cleaning brush and a vacuum suction pipe.The cleaning turntable is internally provided with a hollow cavity, and the circumferential sidewall of the cleaning turntable is uniformly provided with suction ports.The cleaning turntable is located above the driving motor, the driving motor is connected with the climbing assembly, the driving end of the driving motor is connected with the cleaning turntable, the circumferential sidewall of the cleaning turntable is connected with the cleaning brush, the bottom of the cleaning turntable is rotationally connected with the vacuum suction pipe, the hollow cavity of the cleaning turntable is in communication with the vacuum suction pipe, the cleaning brush is in contact with the inner wall of the upper furnace cylinder, and the cleaning brush is rotated to brush and wash the oxide attached to the inner wall of the upper furnace cylinder into small particles.The oxide particles washed out are sucked out through the suction ports and the vacuum suction pipe, so that the oxide particles and dust after being brushed by the cleaning brush can be directly cleaned out.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of single crystal furnace cleaning devices, and particularly relates to a single crystal furnace upper furnace cylinder cleaning device and single crystal furnace. BACKGROUND

[0002] A semiconductor single crystal growth furnace is necessary equipment in a process of converting polycrystalline silicon into single crystal silicon, and single crystal silicon is a basic raw material in the semiconductor industry. Some oxides are attached to a furnace chamber in the semiconductor single crystal growth process. In order to ensure the cleaning of the single crystal furnace upper furnace cylinder, manual work is usually performed. At present, the single crystal furnace upper furnace cylinder cleaning is manual work, which is time-consuming and low in work efficiency.

[0003] In the prior art, a utility model with the application number 202320851152.7 discloses a tool for cleaning a single crystal furnace auxiliary chamber, specifically discloses that a rib is installed inside a cleaning ring, a circular ring is connected in the middle of the rib, external threads that are matched with the threads of a weight are arranged on the circular ring, a cleaning brush head is installed outside the cleaning ring, the weight is installed inside the single crystal furnace auxiliary chamber through a tungsten wire rope, and the weight is threadedly connected with the circular ring. The cleaning ring is connected with the weight, the cleaning ring is driven to move up and down by operating the weight, the cleaning brush head can be in full contact with the inner wall of the auxiliary chamber, the problem that cleaning is not in place due to the limitation of a handheld rod during manual cleaning is effectively solved, and the safety hazards of bumping personnel and equipment during the process of taking the tool are eliminated. However, the oxides attached to the single crystal furnace upper furnace cylinder are solid particles. During the up-and-down cleaning process of the cleaning brush head, the oxide particles become dust and are separated from the inner wall of the upper furnace cylinder, so that the upper furnace cylinder is cleaned. However, the oxide dust will be deposited and attached to the inner wall of the upper furnace cylinder after a period of time, resulting in incomplete cleaning of the upper furnace cylinder. SUMMARY

[0004] Therefore, the application provides a single crystal furnace upper furnace cylinder cleaning device with complete cleaning.

[0005] It is also necessary to provide a single crystal furnace.

[0006] The technical scheme adopted by the application to solve the technical problems is:

[0007] The utility model provides a single crystal furnace furnace cylinder cleaning device, including climbing assembly, the cleaning collection assembly, the cleaning collection assembly includes drive motor, cleaning carousel, cleaning brush, vacuum adsorption pipe, the inside of cleaning carousel is provided hollow cavity, the circumferential lateral wall of cleaning carousel evenly opens adsorption mouth, cleaning carousel is located drive motor top, drive motor is connected with climbing assembly, the drive end of drive motor is connected with cleaning carousel, the circumferential lateral wall of cleaning carousel is connected with cleaning brush, the bottom of cleaning carousel is rotatably connected with vacuum adsorption pipe, and hollow cavity of cleaning carousel is communicated with vacuum adsorption pipe to the oxide that cleaning brush cleans is adsorbed out through adsorption mouth, vacuum adsorption pipe.

[0008] Preferably, the adsorption port is opened near one end of the cleaning brush, and the other end of the adsorption port is opened.

[0009] Preferably, the climbing assembly includes a walking wheel, a contraction part, and a connecting part. The connecting part is located below the drive motor and above the contraction part. The walking wheel is connected to the contraction part to drive the walking wheel to extend and retract, so that the walking wheel supports the inner wall of the upper furnace cylinder. The contraction part is connected to the connecting part, and the connecting part is connected to the drive motor.

[0010] Preferably, a micro motor is arranged on the walking wheel to drive the walking wheel to move.

[0011] Preferably, the connecting part includes a connecting plate, the contraction part includes a lifting drive, a drive rod, and a rotating rod. The side of the connecting plate is rotatably connected to the rotating rod. The middle of the connecting plate is connected to the lifting drive. One end of the drive rod is rotatably connected to the lifting drive. The other end of the drive rod is rotatably connected to one end of the rotating rod. The other end of the rotating rod is rotatably connected to the walking wheel. The lifting drive is elongated or shortened to drive the drive rod to expand or tighten the rotating rod.

[0012] Preferably, the drive rod, the rotating rod, and the walking wheel are multiple. The rotating rods are evenly arranged on the connecting plate.

[0013] Preferably, the cleaning carousel is in the shape of a round cake. The cleaning brush is elastic, and the diameter of the cleaning brush is greater than the diameter of the upper furnace cylinder of the single crystal furnace. After the elastic deformation of the cleaning brush, the cleaning brush is adapted to the inner diameter of the upper furnace cylinder of the single crystal furnace.

[0014] Preferably, the lifting drive is a lead screw. The connecting part includes a connecting sleeve. The connecting sleeve is located above the connecting plate. One end of the lead screw passes through the connecting plate and is located in the connecting sleeve. The middle of the lead screw is threadedly connected to the connecting plate. The other end of the lead screw is rotatably connected to the drive rod.

[0015] A single crystal furnace, comprising the single crystal furnace upper furnace cylinder cleaning device, the upper furnace cylinder, the climbing assembly is in contact with the inner wall of the upper furnace cylinder.

[0016] Compared with the prior art, the present application has the beneficial effects that:

[0017] The single crystal furnace upper furnace cylinder cleaning device provided by the present application, the climbing assembly climbs upward, drives the cleaning and collecting assembly to move upward, and the cleaning and collecting assembly moves upward at the same time, the driving motor drives the cleaning turntable to rotate, the cleaning turntable drives the cleaning brush to rotate, the cleaning brush is in contact with the inner wall of the upper furnace cylinder, rotates to brush the oxide attached to the inner wall of the upper furnace cylinder into small particles, and then the oxide particles and dust brushed out are adsorbed out through the adsorption port and the vacuum adsorption pipe, so that the oxide particles and dust brushed by the cleaning brush can be directly cleaned out, the deposition of oxide dust is reduced, the upper furnace cylinder is cleaned thoroughly and completely. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 It is a structural schematic view of the single crystal furnace upper furnace cylinder cleaning device.

[0019] Figure 2 It is a front view of the single crystal furnace upper furnace cylinder cleaning device.

[0020] Figure 3 It is a partial enlarged view of the cleaning turntable and the cleaning brush.

[0021] Figure 4 It is a front view of the single crystal furnace.

[0022] Figure 5 It is a sectional view of the isolation valve.

[0023] Figure 6 It is a structural schematic view of the second flange.

[0024] Figure 7 It is an angle schematic view of the purge hole in a top view state.

[0025] In the figure: single crystal furnace 10, isolation valve 100, connecting purge part 110, first flange 111, second flange 112, purge hole 1121, annular cavity 1122, breather pipe 113, opening and closing part 120, air cylinder driving part 121, flexible shaft 122, isolation valve body 123, shell 124, containing cavity 1241, upper furnace cylinder 200, single crystal furnace upper furnace cylinder cleaning device 300, climbing assembly 310, walking wheel 311, contraction part 312, lifting driving part 3121, driving rod 3122, rotating rod 3123, connecting part 313, connecting plate 3131, connecting sleeve 3132, cleaning and collecting assembly 320, driving motor 321, cleaning turntable 322, suction port 3221, cleaning brush 323, vacuum suction pipe 324, shielding cover 325, vacuum exhaust pipe 400. DETAILED DESCRIPTION

[0026] The technical solutions and technical effects of the embodiments of the application are further described in detail below in combination with the drawings of the application.

[0027] Please refer to Figures 1 to 3 A single crystal furnace upper furnace cylinder cleaning device 300, comprising a climbing assembly 310 and a cleaning and collecting assembly 320, the cleaning and collecting assembly 320 comprising a driving motor 321, a cleaning turntable 322, a cleaning brush 323 and a vacuum suction pipe 324, the cleaning turntable 322 is internally provided with a hollow cavity, the circumferential sidewall of the cleaning turntable 322 is uniformly provided with suction ports 3221, the cleaning turntable 322 is located above the driving motor 321, the driving motor 321 is connected with the climbing assembly 310, the driving end of the driving motor 321 is connected with the cleaning turntable 322, the circumferential sidewall of the cleaning turntable 322 is connected with the cleaning brush 323, the bottom of the cleaning turntable 322 is rotationally connected with the vacuum suction pipe 324, and the hollow cavity of the cleaning turntable 322 is in communication with the vacuum suction pipe 324, so as to adsorb the oxides cleaned by the cleaning brush 323 through the suction ports 3221 and the vacuum suction pipe 324.

[0028] Compared with the prior art, the beneficial effects of the present application are that:

[0029] The single crystal furnace upper furnace cylinder cleaning device 300 provided by the application, the climbing assembly 310 climbs upward, drives the cleaning and collecting assembly 320 to move upward, and the cleaning and collecting assembly 320 moves upward, the driving motor 321 drives the cleaning turntable 322 to rotate, the cleaning turntable 322 drives the cleaning brush 323 to rotate, the cleaning brush 323 contacts the inner wall of the upper furnace cylinder, and the oxide attached to the inner wall of the upper furnace cylinder 200 is changed into small particles through rotary brushing, and the oxide particles and dust brushed out are adsorbed through the adsorption port 3221 and the vacuum adsorption pipe 324, so that the oxide particles and dust brushed by the cleaning brush 323 can be directly cleaned out, the deposition of oxide dust is reduced, the upper furnace cylinder is cleaned thoroughly and completely.

[0030] In addition, when the driving motor 321 drives the cleaning turntable 322 to rotate and the cleaning turntable 322 drives the cleaning brush 323 to rotate, because the rotation directions are always the same, the upper furnace cylinder 200 is cleaned, and the oxide separated from the upper furnace cylinder 200 is always gathered around the cleaning brush 323 under the cooperation of the adsorption port 3221 and the adsorption force, so that the oxide particles and dust cannot fall into the clean area of the upper furnace cylinder 200 and cannot cause secondary pollution.

[0031] Further, the adsorption port 3221 is large in opening at one end close to the cleaning brush 323, and the adsorption port 3221 is large in opening at one end away from the cleaning brush 323. During the adsorption of the vacuum adsorption pipe 324, the end of the adsorption port 3221 with large opening collects oxide particles and dust, and with the decrease of the diameter of the adsorption port 3221, the oxide particles and dust adsorbed into the adsorption port 3221 rotate in a spiral shape into the hollow cavity inside the cleaning turntable 322, so that large oxide particles collide with the inner wall of the adsorption port 3221 and other granular oxides in the rotating process, so that the particles gradually become smaller, more easily enter the hollow cavity inside the cleaning turntable 322 from the small opening of the adsorption port 3221, and also avoid the small opening of the adsorption port 3221 from being blocked.

[0032] Further, the upper and lower parts of the cleaning turntable 322 are provided with shielding covers 325 in the circumferential direction, and the two shielding covers 325 form a V shape. The diameter of the shielding cover 325 is smaller than the diameter of the upper furnace cylinder 200 of the single crystal furnace 10 and is greater than the outer diameter of the cleaning turntable 322. The driving motor 321 drives the cleaning turntable 322 to rotate, and at the same time, the cleaning brush 323 is driven to rotate. The air around the cleaning turntable 322 is also disturbed to rotate. The two shielding covers 325 cooperate with the suction port 3221 to form a negative pressure space, which forms a suction force on the air outside the shielding cover 325, so that the dust does not rotate due to the rotation of the surrounding air, but flows to the suction port 3221 along the air flow guided by the negative pressure space formed by the two shielding covers 325. On the other hand, the shielding cover 325 forms a shielding to avoid the direct falling of the particulate oxides due to gravity.

[0033] Further, the climbing assembly 310 includes a walking wheel 311, a contraction part 312, and a connecting part 313. The connecting part 313 is located below the driving motor 321 and above the contraction part 312. The walking wheel 311 is connected to the contraction part 312 to drive the walking wheel 311 to extend and retract, so that the walking wheel 311 is supported by the inner wall of the upper furnace cylinder. The contraction part 312 is connected to the connecting part 313, and the connecting part 313 is connected to the driving motor 321.

[0034] Further, a micro motor is arranged on the walking wheel 311 to drive the walking wheel 311 to move.

[0035] Further, the connecting part 313 includes a connecting plate 3131, the contraction part 312 includes a lifting driving element 3121, a driving rod 3122, and a rotating rod 3123. The side part of the connecting plate 3131 is rotationally connected to the rotating rod 3123. The middle part of the connecting plate 3131 is connected to the lifting driving element 3121. One end of the lifting driving element 3121 is rotationally connected to the driving rod 3122. The other end of the driving rod 3122 is rotationally connected to one end of the rotating rod 3123. The other end of the rotating rod 3123 is rotationally connected to the walking wheel 311. The lifting driving element 3121 is elongated and shortened to drive the driving rod 3122 to drive the rotating rod 3123 to open and tighten.

[0036] Further, the driving rod 3122, the rotating rod 3123, and the walking wheel 311 are a plurality of, and the rotating rods 3123 are uniformly arranged on the connecting plate 3131.

[0037] Further, the driving rod 3122, the rotating rod 3123, and the walking wheel 311 are three.

[0038] Further, the cleaning turntable 322 is a round cake, the cleaning brush 323 is elastic, the diameter of the cleaning brush 323 is greater than the diameter of the upper furnace cylinder 200 of the single crystal furnace, and the cleaning brush 323 is adapted to the inner diameter of the upper furnace cylinder 200 of the single crystal furnace 10 after elastic deformation.

[0039] Further, the lifting driving member 3121 is a screw rod, the connecting part 313 includes a connecting sleeve 3132 located above the connecting plate 3131, one end of the screw rod passes through the connecting plate 3131 and is located in the connecting sleeve 3132, the middle part of the screw rod is threadedly connected with the connecting plate 3131, and the other end of the screw rod is rotationally connected with the driving rod 3122. When the screw rod moves downward, the driving rod 3122 drives the rotating rod 3123 to extend and contact the inner wall of the upper furnace cylinder 200 of the single crystal furnace 10, so that a supporting force is formed, and the walking wheel 311 is made of a material with a large friction coefficient to prevent the single crystal furnace upper cylinder cleaning device 10 from falling.

[0040] Further, the lifting driving member 3121 is a telescopic cylinder, the telescopic cylinder is connected with the connecting plate 3131, and the telescopic end of the telescopic cylinder is connected with the driving rod 3122.

[0041] Please refer to Figure 4 A single crystal furnace 10 includes the single crystal furnace upper cylinder cleaning device 300, the upper furnace cylinder 200, and the isolation valve 100 as described above, the climbing assembly 310 contacts the inner wall of the upper furnace cylinder 200, and the upper furnace cylinder 200 is connected with the isolation valve 100.

[0042] Please refer to Figures 5 to 7The isolation valve 100 comprises a connection and purging part 110 and an opening and closing part 120. The connection and purging part 110 comprises a first flange 111, a second flange 112, and a vent pipe 113. The second flange 112 is internally provided with an annular cavity 1122 and a plurality of purging holes 1121 which are uniformly arranged on the inner side of the second flange 112 and are inclined in the same direction. The purging holes 1121 are in communication with the annular cavity 1122. The first flange 111 and the second flange 112 are symmetrically arranged above and below the opening and closing part 120. The upper furnace cylinder 200 is connected to the upper end surface of the first flange 111. The first flange 111 is connected to the upper end of the opening and closing part 120. The lower end of the opening and closing part 120 is connected to the second flange 112. The vent pipe 113 is connected to the second flange 112 to be in communication with the annular cavity 1122. By blowing argon into the vent pipe 113 and the annular cavity 1122, the argon is blown out of the purging holes 1121 which are inclined in the same direction. The argon forms a vortex gas film rotating on the inner ring wall of the second flange 112 to prevent the generation of miscellaneous flow and the accumulation of oxides on the opening and closing part 120.

[0043] Specifically, the isolation valve 100 is provided with a plurality of purging holes 1121 which are inclined in the same direction. Before the secondary feeding starts, argon is introduced into the vent pipe 113 and enters the annular cavity 1122 and is blown out through the purging holes 1121. On the one hand, the argon stabilizes the gas field in the single crystal furnace 10 to avoid the formation of miscellaneous flow after the opening and closing part 120 is opened and to reduce the generation of oxides. On the other hand, the argon forms a vortex gas film on the inner ring wall of the second flange 112 to blow away the oxides and prevent the accumulation and condensation of the oxides on the opening and closing part 120, thereby protecting the cleanliness of the inner wall of the opening and closing part 120. After the secondary feeding is completed, the oxides are discharged to reduce the probability of falling into the quartz crucible, thereby reducing the yield of the crystal rod and the number of NG. In addition, the isolation valve does not need to be frequently cleaned, thereby reducing the labor and improving the equipment utilization rate.

[0044] Further, the arc length interval between the purging holes 1121 is 4-8 cm.

[0045] Further, the diameter of the purging holes 1121 is 5-10 mm.

[0046] Further, the purging holes 1121 are located on the same plane, and the horizontal plane inclination angle A of the purging holes 1121 is 10-30°.

[0047] Further, the blowing hole 1121 is inclined at an angle A of 15° in the horizontal plane, and the blowing holes 1121 are arranged in the same direction, so that the argon gas blown out of one blowing hole 1121 is blown onto the next blowing hole 1121, so that a vortex gas film is formed on the inner ring wall of the second flange 112, preventing the accumulation and caking of oxides around the isolation valve body 123.

[0048] Further, the opening and closing part 120 comprises a cylinder driving part 121, a flexible shaft 122, an isolation valve body 123, and a housing 124, the cylinder driving part 121 and the flexible shaft 122 are located outside the housing 124, the housing 124 is connected with the outer circumferential surface of the first flange 111 and the second flange 112, one side of the housing 124 and the first flange 111 and the second flange 112 form a containing cavity 1241, the cylinder driving part 121 is connected with one end of the flexible shaft 122, the other end of the flexible shaft 122 is connected with the isolation valve body 123 through a shaft coupling, when the isolation valve body 123 is closed, the electromagnetic valve is opened, the isolation valve body 123 is appropriately moved upward, the wear is reduced, the cylinder driving part 121 drives the isolation valve body 123 to rotate between the first flange 111 and the second flange 112, the electromagnetic valve is closed, the isolation valve body 123 is attached to the lower end surface of the second flange 112, so that the isolation valve body 123 is closed, when the isolation valve body 123 is opened, the electromagnetic valve is opened, the isolation valve body 123 is appropriately moved upward, the cylinder driving part 121 drives the isolation valve body 123 to rotate into the containing cavity 1241, so that the isolation valve body 123 is opened, and the upper furnace cylinder 200 and the middle furnace cylinder 400 are connected.

[0049] Specifically, the first flange 111, the second flange 112, and the isolation valve body 123 are coaxial, and the distance between the first flange 111 and the second flange 112 is greater than the height of the isolation valve body 123.

[0050] In the Czochralski single crystal, the argon gas of 70 slm-90 slm is always introduced into the single crystal furnace 10, and the flow state of the whole gas goes from top to bottom. In the process of secondary feeding, the isolation valve body 123 is opened, the gas flow state in the furnace body is destroyed, and the mixed flow will gather with the oxides at the isolation valve. Therefore, before the secondary feeding, the argon gas of 60 slm is introduced into the gas pipe 113, the argon gas enters the annular cavity 1122, and is purged through the purge hole 1121 with an arc length interval of 5 cm and a diameter of 8 mm, so as to stabilize the gas field in the single crystal furnace 10 and avoid the formation of mixed flow after the isolation valve body 123 is rotated to the containing cavity 1241, thereby reducing the generation of oxides. The inclination directions of a plurality of purge holes 1121 are consistent, and the argon gas blown out of one purge hole 1121 is blown to the next purge hole 1121 during the argon gas purging process, so that the introduced argon gas forms a vortex gas film on the inner ring wall of the second flange 112, preventing the oxides from gathering and caking around the isolation valve. When the secondary feeding is completed, the isolation valve body 123 is closed, the argon gas of 70 slm-90 slm is continuously introduced into the Czochralski single crystal furnace 10, and the argon gas of 60 slm is continuously introduced into the gas pipe 113, and the pressure is kept at 2 kpa. The argon gas introduced into the gas pipe 113 is less than the argon gas introduced into the single crystal furnace 10, so that the oxides in the vortex gas gradually spiral downward under the guidance of the vortex gas, until they move to the vacuum exhaust pipe 400 and are exhausted, reducing the oxides in the single crystal furnace 10, thereby reducing the risk of the oxides falling into the quartz crucible and polluting the silicon solution, reducing the NG probability, and reducing the number of times of cleaning the isolation valve body 123 by the staff.

[0051] The above disclosure is only the preferred embodiment of the present application, and of course cannot limit the scope of the rights of the present application. Those skilled in the art can understand that the whole or part of the above-mentioned embodiment can be implemented, and equivalent changes made according to the claims of the present application still belong to the scope covered by the present application.

Claims

1. A single crystal furnace characterized by comprising: The single crystal furnace upper furnace cylinder cleaning device, the upper furnace cylinder and the isolation valve are connected, the single crystal furnace upper furnace cylinder cleaning device comprises a climbing assembly and a cleaning and collecting assembly, the cleaning and collecting assembly comprises a driving motor, a cleaning turntable, a cleaning brush and a vacuum suction pipe, the cleaning turntable is internally provided with a hollow cavity, the circumferential sidewall of the cleaning turntable is uniformly provided with suction ports, the cleaning turntable is located above the driving motor, the driving motor is connected with the climbing assembly, the driving end of the driving motor is connected with the cleaning turntable, the circumferential sidewall of the cleaning turntable is connected with the cleaning brush, the bottom of the cleaning turntable is rotationally connected with the vacuum suction pipe, and the hollow cavity of the cleaning turntable is in communication with the vacuum suction pipe, so that the oxides cleaned by the cleaning brush are sucked out through the suction ports and the vacuum suction pipe; the climbing assembly is in contact with the inner wall of the upper furnace cylinder. The isolation valve comprises a connecting and purging part and an opening and closing part, the connecting and purging part comprises a first flange, a second flange and a breather pipe, the second flange is internally provided with an annular cavity, the inner side of the second flange is uniformly provided with a plurality of purging holes, the purging holes are inclined in the same direction, the purging holes are in communication with the annular cavity, the first flange and the second flange are symmetrically arranged above and below the opening and closing part, the upper end surface of the first flange is connected with the upper end of the opening and closing part, the lower end of the opening and closing part is connected with the second flange, the breather pipe is connected with the second flange to be in communication with the annular cavity, argon is blown into the inside of the breather pipe and the annular cavity, so that the argon is blown out from the purging holes with the same inclined direction, the argon forms a vortex gas film rotating on the inner ring wall of the second flange, prevents the generation of miscellaneous flow, and prevents the aggregation of oxides in the opening and closing part, so as to reduce the probability of the oxides falling into the quartz crucible in the secondary feeding process, and further reduce the yield of the crystal bar.

2. The single crystal furnace of claim 1, wherein: The end of the suction port close to the cleaning brush is large in opening, and the end of the suction port away from the cleaning brush is large in opening.

3. The single crystal furnace of claim 1 or 2, wherein: The upper part and the lower part of the cleaning turntable are provided with shielding covers along the circumference, the two shielding covers form a V shape, the diameter of the shielding cover is smaller than the diameter of the single crystal furnace upper furnace cylinder and larger than the outer diameter of the cleaning turntable.

4. The single crystal furnace of claim 1, wherein: The climbing assembly comprises a walking wheel, a contraction part and a connecting part, the connecting part is located below the driving motor and above the contraction part, the walking wheel is connected with the contraction part to drive the walking wheel to stretch and retract, so that the walking wheel supports the inner wall of the upper furnace cylinder, the contraction part is connected with the connecting part, and the connecting part is connected with the driving motor.

5. The single crystal furnace of claim 4, wherein: A micro motor is arranged on the walking wheel to drive the walking wheel to move.

6. The single crystal furnace of claim 4, wherein: The connecting part comprises a connecting plate, the contraction part comprises a lifting driving element, a driving rod and a rotating rod, the side part of the connecting plate is rotationally connected with the rotating rod, the middle part of the connecting plate is connected with the lifting driving element, one end of the driving rod is rotationally connected with the lifting driving element, the other end of the driving rod is rotationally connected with one end of the rotating rod, the other end of the rotating rod is rotationally connected with the walking wheel, the lifting driving element is elongated or shortened to drive the driving rod to drive the rotating rod to be opened or tightened.

7. The single crystal furnace of claim 6, wherein: The driving rod, the rotating rod and the walking wheel are multiple, and the rotating rods are uniformly arranged on the connecting plate.

8. The single crystal furnace of claim 1, wherein: The cleaning turntable is in the shape of a round cake, the cleaning brush is elastic, the diameter of the cleaning brush is greater than the diameter of the furnace cylinder of the single crystal furnace, and the cleaning brush is adapted to the inner diameter of the furnace cylinder of the single crystal furnace after elastic deformation.

9. The single crystal furnace of claim 6, wherein: The lifting driving element is a lead screw, the connecting part comprises a connecting sleeve, the connecting sleeve is located above the connecting plate, one end of the lead screw passes through the connecting plate and is located in the connecting sleeve, the middle part of the lead screw is threadedly connected with the connecting plate, and the other end of the lead screw is rotationally connected with the driving rod.

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