A method and system for cleaning a quartz tube

Abstract

The application discloses a quartz tube cleaning method and system, and the method comprises the following steps: when a cleaning instruction is received, a hooking mechanism is called by a processor in a quartz tube cleaning device to hook a quartz tube, the quartz tube is moved to a first concentrated sulfuric acid tank for over-acid cleaning, after the over-acid cleaning is completed, the quartz tube is moved to a second concentrated sulfuric acid tank for second over-acid cleaning by the hooking mechanism, and the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered; after the recovery is completed, pure water is injected into the first concentrated sulfuric acid tank, the hooking mechanism is called to move the quartz tube to the first concentrated sulfuric acid tank again, the quartz tube is washed with the pure water for a preset water flushing time, when the pure water washing is completed, the hooking mechanism is called to move the quartz tube to a cleaning tank, the quartz tube is washed by a cleaning assembly in the cleaning tank and is dried, and then the quartz tube is moved to a target storage position, so that the automatic cleaning of the quartz tube is realized, and the cleaning efficiency and the cleaning cleanliness of the quartz tube are effectively improved.

Description

Technical Field

[0001] This invention relates to the field of quartz tube cleaning technology, and in particular to a method and system for cleaning quartz tubes. Background Technology

[0002] Gallium arsenide (GaAs) and indium phosphide (IP) substrates have applications in the manufacture of high-frequency, high-power devices, fiber optic communications, wireless transmission, and radio astronomy. RF devices made using IPA substrates have demonstrated excellent performance in applications such as satellites and radar. They are highly competitive in the RF front-end of radar and communication systems and in analog / mixed-signal wide-bandwidth circuits, making them suitable for applications such as high-speed data processing and high-precision wide-bandwidth A / D conversion. Furthermore, IPA-based RF devices, such as low-noise amplifiers, modules, and receivers, are widely used in satellite communications, millimeter-wave radar, and active and passive millimeter-wave imaging equipment. At bandwidth levels above 100 GHz, IPA-based RF devices offer significant advantages in backhaul networks and point-to-point communication networks. In the future, IPA substrates are expected to become the mainstream substrate material for RF devices in 6G and even 7G wireless transmission networks.

[0003] However, diffusion furnaces are required before and after crystal and wafer growth and annealing. Quartz tubes are an essential component in diffusion furnaces, and their cleanliness affects the quality of the finished wafer. However, cleaning quartz tubes is a time-consuming and labor-intensive process. Existing quartz tube cleaning methods typically involve manually placing the quartz tubes in concentrated sulfuric acid heated to 60-80±5℃ and then manually rinsing them with water guns and brushes.

[0004] The above method, due to the presence of concentrated sulfuric acid, can easily lead to burns if not handled properly. Furthermore, the cleaning process of the quartz tube is carried out manually, which results in low cleaning efficiency and an inability to guarantee the cleanliness of the quartz tube. Summary of the Invention

[0005] This invention provides a method and system for cleaning quartz tubes, which solves the technical problems of existing technologies where the presence of concentrated sulfuric acid can easily cause burns if the operation is not done properly, and the cleaning process of quartz tubes is carried out manually, resulting in low cleaning efficiency and inability to guarantee the cleanliness of the quartz tubes.

[0006] This invention provides a quartz tube cleaning method, applied to a processor within a quartz tube cleaning device, the quartz tube cleaning device comprising a hooking mechanism, a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank, and a cleaning tank; the method includes:

[0007] When a cleaning command is received, the hooking mechanism is activated to hook the quartz tube;

[0008] The hooking mechanism is invoked to move the quartz tube to the first concentrated sulfuric acid tank for acid cleaning.

[0009] The quartz tube is moved to the second concentrated sulfuric acid tank for acid cleaning using the hooking mechanism, and the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered. Pure water is then injected into the first concentrated sulfuric acid tank.

[0010] The quartz tube is moved back to the first concentrated sulfuric acid tank by the hooking mechanism, and the quartz tube is rinsed with pure water for a preset rinsing time.

[0011] After the pure water rinsing is completed, the hooking mechanism is invoked to move the quartz tube to the cleaning tank for rinsing and drying, and then it is moved to the target storage location.

[0012] Optionally, the quartz tube cleaning device further includes an acid storage component and an inlet pipe connected to the first concentrated sulfuric acid tank. The acid storage component is connected to the first concentrated sulfuric acid tank via an acid-resistant pipe, and a circulation pump is installed on the acid-resistant pipe. The steps of moving the quartz tube to the second concentrated sulfuric acid tank for acid cleaning via the hooking mechanism, recovering the concentrated sulfuric acid in the first concentrated sulfuric acid tank, and injecting pure water into the first concentrated sulfuric acid tank include:

[0013] The quartz tube is moved to the second concentrated sulfuric acid tank for acid cleaning via the hooking mechanism.

[0014] The circulation pump is turned on to recover concentrated sulfuric acid from the first concentrated sulfuric acid tank to the acid storage component along the acid-resistant pipeline, and the liquid level of concentrated sulfuric acid in the first concentrated sulfuric acid tank is monitored in real time.

[0015] When the liquid level is lower than the first preset liquid level threshold, the water inlet pipe is opened to inject pure water into the first concentrated sulfuric acid tank until the water level in the first concentrated sulfuric acid tank reaches the preset inlet height.

[0016] Optionally, the acid storage assembly includes a heating device; the method further includes:

[0017] After the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered to the acid storage component, the heating device is activated to heat and keep the recovered concentrated sulfuric acid at a preset heating temperature.

[0018] Optionally, the bottom of the first concentrated sulfuric acid tank is also provided with a drain outlet; the step of moving the quartz tube back to the first concentrated sulfuric acid tank by the hook mechanism and rinsing the quartz tube with pure water for a preset rinsing time includes:

[0019] When the water level in the first concentrated sulfuric acid tank reaches the preset inlet height, the quartz tube is moved back into the first concentrated sulfuric acid tank for soaking by the hooking mechanism.

[0020] When the soaking time reaches the preset soaking duration, open the drain outlet until the water level in the first concentrated sulfuric acid tank drops to zero.

[0021] The water inlet pipe is connected, and the quartz tube is sprayed and rinsed according to the preset spraying time. The drain outlet is then opened until the preset spraying time is reached.

[0022] Optionally, the quartz tube cleaning device further includes a storage hook mechanism, and the cleaning tank is equipped with a cleaning brush head assembly and a placement rack; the step of calling the hook mechanism to move the quartz tube to the cleaning tank for rinsing and drying after the pure water rinsing is completed, and then moving it to the target storage location, includes:

[0023] After the pure water rinsing is completed, the quartz tube is moved to the placement rack and released by the hooking mechanism;

[0024] The cleaning brush head assembly is used to rinse and dry the quartz tube;

[0025] The storage hook mechanism is invoked to hook the dried quartz tube and move it to the target storage location.

[0026] Optionally, the cleaning brush head assembly includes a cleaning brush, a water rinsing head, and an air blowing head arranged in sequence; the step of using the cleaning brush head assembly to rinse and dry the quartz tube includes:

[0027] The cleaning brush is inserted into the quartz tube and cleaned for a preset time before being removed.

[0028] The flushing head is inserted into the quartz tube and flushed for a preset time before being removed.

[0029] The air blowing head is moved into the interior of the quartz tube, and air is blown into the interior of the quartz tube at a first preset temperature for a preset first blowing time;

[0030] The air blowing head is activated to blow air into the interior of the quartz tube at a second preset temperature for a preset second blowing time, and then removed.

[0031] Optionally, the method further includes:

[0032] After the pure water rinsing is completed, the circulation pump is turned on, and the concentrated sulfuric acid in the acid storage component is introduced into the first concentrated sulfuric acid tank along the acid-resistant pipe until the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank reaches the second preset liquid level threshold.

[0033] Jump to execute the step of calling the hooking mechanism to hook the quartz tube when a cleaning command is received.

[0034] Optionally, the concentrated sulfuric acid in the first concentrated sulfuric acid tank is concentrated sulfuric acid at a temperature of 60-90℃;

[0035] The concentrated sulfuric acid in the second concentrated sulfuric acid tank is concentrated sulfuric acid at room temperature.

[0036] Optionally, both the first concentrated sulfuric acid tank and the second concentrated sulfuric acid tank are equipped with ultrasonic components; the acid cleaning includes:

[0037] When the quartz tube is moved to the first concentrated sulfuric acid tank or the second concentrated sulfuric acid tank, the ultrasonic component is turned on at a specific frequency to acid wash the quartz tube.

[0038] The ultrasonic component in the first concentrated sulfuric acid tank is activated for 60 seconds, and the ultrasonic component in the second concentrated sulfuric acid tank is activated for 30 seconds.

[0039] This invention also provides a quartz tube cleaning system, a processor applied within a quartz tube cleaning device, the quartz tube cleaning device comprising a hooking mechanism, a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank, and a cleaning tank; the system includes:

[0040] The hooking call module is used to call the hooking mechanism to hook the quartz tube when a cleaning command is received;

[0041] A primary acid cleaning module is used to call the hooking mechanism to move the quartz tube to the first concentrated sulfuric acid tank for acid cleaning;

[0042] The secondary acid washing module is used to move the quartz tube to the second concentrated sulfuric acid tank for acid washing via the hooking mechanism, and to recover the concentrated sulfuric acid in the first concentrated sulfuric acid tank and inject pure water into the first concentrated sulfuric acid tank.

[0043] The pure water rinsing module is used to move the quartz tube back to the first concentrated sulfuric acid tank through the hook mechanism and rinse the quartz tube with pure water for a preset rinsing time.

[0044] The rinsing and drying module is used to, after the pure water rinsing is completed, call the hook mechanism to move the quartz tube to the cleaning tank for rinsing and drying, and then move it to the target storage location.

[0045] As can be seen from the above technical solutions, the present invention has the following advantages:

[0046] This invention utilizes a processor within a quartz tube cleaning device. Upon receiving a cleaning command, the processor activates a hooking mechanism to pick up the quartz tube and move it to a first concentrated sulfuric acid tank for acid cleaning. After acid cleaning, the hooking mechanism moves the quartz tube to a second concentrated sulfuric acid tank for a second acid cleaning. Simultaneously, the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered. After recovery, pure water is injected into the first concentrated sulfuric acid tank, and the hooking mechanism is activated again to move the quartz tube to the first concentrated sulfuric acid tank. The quartz tube is then rinsed with pure water for a preset rinsing time. After rinsing with pure water, the hooking mechanism moves the quartz tube to a cleaning tank. The cleaning components in the cleaning tank rinse and dry the tube before moving it to the target storage location. Thus, through a process involving secondary acid washing and a specially designed cleaning component in the cleaning tank, automated cleaning of quartz tubes is achieved, effectively improving the cleaning efficiency and cleanliness of the quartz tubes. Attached Figure Description

[0047] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0048] Figure 1 A flowchart illustrating the steps of a quartz tube cleaning method provided in an embodiment of the present invention;

[0049] Figure 2 A flowchart illustrating the steps of a quartz tube cleaning method according to another embodiment of the present invention;

[0050] Figure 3 This is a schematic diagram of a quartz tube cleaning device provided in an embodiment of the present invention;

[0051] Figure 4 This is a detailed structural diagram of a cleaning tank provided in an embodiment of the present invention;

[0052] Figure 5 This is a structural block diagram of a quartz tube cleaning system provided in an embodiment of the present invention. Detailed Implementation

[0053] This invention provides a method and system for cleaning quartz tubes, which addresses the technical problems of existing technologies where the presence of concentrated sulfuric acid can easily lead to burns if not handled properly, and where the cleaning process of quartz tubes is carried out manually, resulting in low cleaning efficiency and inability to guarantee the cleanliness of the quartz tubes.

[0054] To make the objectives, features, and advantages of this invention more apparent and understandable, the technical solutions of the embodiments of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the embodiments described below are only some embodiments of this invention, and not all embodiments. Based on the embodiments of this invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this invention.

[0055] Please see Figure 1 , Figure 1 A flowchart illustrating the steps of a quartz tube cleaning method provided in an embodiment of the present invention.

[0056] This invention provides a quartz tube cleaning method, applied to a processor within a quartz tube cleaning device. The quartz tube cleaning device includes a hooking mechanism, a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank, and a cleaning tank. The method includes:

[0057] Step 101: When a cleaning command is received, the hooking mechanism is invoked to hook the quartz tube;

[0058] Quartz tubes are a special industrial glass made of silicon dioxide, which is an excellent basic material. In this embodiment, the quartz tubes referred to specifically refer to various types of quartz tubes used in the wafer manufacturing process, including but not limited to contaminated or slightly contaminated quartz tubes.

[0059] The hooking mechanism refers to a device that can move to different concentrated sulfuric acid tanks and cleaning tanks via a two-axis track and can hook up quartz tubes of different sizes. Its material can be acid-resistant materials such as Teflon.

[0060] In this embodiment of the application, in response to an externally input cleaning command, a hooking mechanism is invoked to hook the quartz tube from a predetermined position to begin cleaning the quartz tube.

[0061] It should be noted that the cleaning command can be generated by the user pressing a button on the quartz tube cleaning device, or in response to the placement operation of the quartz tube on the hook mechanism, or in response to the command of the upstream or downstream equipment. This application embodiment does not limit this.

[0062] Step 102: Use the hooking mechanism to move the quartz tube to the first concentrated sulfuric acid tank for acid cleaning;

[0063] After the hooking mechanism picks up the quartz tube, it is further activated to move the quartz tube above the first concentrated sulfuric acid tank. Then, the quartz tube is lowered and immersed in the hot concentrated sulfuric acid in the first concentrated sulfuric acid tank. For example, the quartz tube is placed in the hot concentrated sulfuric acid for 60 seconds, and at the same time, the ultrasonic vibration is turned on (frequency of 40 Hz), thereby achieving the acid cleaning of the quartz tube.

[0064] It should be noted that, in order to prevent the quartz tube from falling, the hooking mechanism maintains the hooking and fixing operation on the quartz tube when it is immersed in the hot concentrated sulfuric acid in the first concentrated sulfuric acid tank.

[0065] Step 103: The quartz tube is moved to the second concentrated sulfuric acid tank for acid cleaning by the hooking mechanism, and the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered. Pure water is injected into the first concentrated sulfuric acid tank.

[0066] To further improve the cleaning cleanliness, after the first concentrated sulfuric acid tank is used for acid cleaning, the hook mechanism is used to move the quartz tube to the second concentrated sulfuric acid tank for acid cleaning.

[0067] Meanwhile, the concentrated sulfuric acid in the first concentrated sulfuric acid tank can be recovered through specialized recovery equipment, such as an acid storage component, to maintain the temperature of the concentrated sulfuric acid in the first concentrated sulfuric acid tank and prevent a decrease in cleaning efficiency.

[0068] In addition, the working mode of the first concentrated sulfuric acid tank is switched to the flushing mode. When the liquid level of the concentrated sulfuric acid drops to the first preset liquid level threshold, water is injected into the first concentrated sulfuric acid tank through a special water inlet pipe until the water level reaches the preset water inlet height, so as to provide a pure water environment for subsequent rinsing of the quartz tube after acidification.

[0069] Step 104: The quartz tube is moved back to the first concentrated sulfuric acid tank by the hooking mechanism, and the quartz tube is rinsed with pure water for the preset rinsing time.

[0070] After the quartz tube has been thoroughly acid-cleaned in the second concentrated sulfuric acid tank, the hook mechanism can be used to move the quartz tube back to the first concentrated sulfuric acid tank, and the quartz tube can be rinsed with pure water for the preset rinsing time.

[0071] It should be noted that the pure water rinsing process can first soak the quartz tube for a certain period of time, and then drain the pure water in the first concentrated sulfuric acid tank before spray rinsing, so as to ensure that the concentrated sulfuric acid remaining in the quartz tube can be initially cleaned.

[0072] Step 105: After the pure water rinsing is completed, the hook mechanism is called to move the quartz tube to the cleaning tank for rinsing and drying, and then to the target storage location.

[0073] In this embodiment, after rinsing with pure water, the hooking mechanism is invoked to move the quartz tube to the placement rack in the cleaning tank. After rinsing and drying by the cleaning brush head assembly set in the cleaning tank, the hooking mechanism is invoked again to move the quartz tube to the target storage location, thereby completing the cleaning of the quartz tube.

[0074] It should be noted that after the hooking mechanism moves the quartz tube to the placement rack, since the placement rack can fix the quartz tube, in order to improve the cleaning efficiency of the quartz tube, the hooking mechanism can temporarily detach from the quartz tube at this time. After the quartz tube is rinsed and dried, it can be hooked again and moved to the target storage location.

[0075] In addition, after the hooking mechanism disengages from the quartz tube, it can continue to respond to cleaning commands to hook new quartz tubes for cleaning. After the quartz tube is rinsed and dried, it is hooked and moved to the target storage location by another storage hooking mechanism.

[0076] In this embodiment, when the processor in the quartz tube cleaning device receives a cleaning command, it calls a hooking mechanism to hook the quartz tube and move it to the first concentrated sulfuric acid tank for acid cleaning. After the acid cleaning is completed, the hooking mechanism moves the quartz tube to the second concentrated sulfuric acid tank for a second acid cleaning. At the same time, the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered. After the recovery is completed, pure water is injected into the first concentrated sulfuric acid tank, and the hooking mechanism is called to move the quartz tube back to the first concentrated sulfuric acid tank. The quartz tube is rinsed with pure water for a preset rinsing time. After the pure water rinsing is completed, the hooking mechanism is called to move the quartz tube to the cleaning tank. After rinsing and drying by the cleaning components in the cleaning tank, the quartz tube is moved to the target storage location. Thus, through the secondary acid washing and the cleaning process of the specially designed cleaning components in the cleaning tank, the quartz tube is automatically cleaned, effectively improving the cleaning efficiency and cleanliness of the quartz tube.

[0077] Please see Figure 2-3 , Figure 2 This is a flowchart illustrating the steps of a quartz tube cleaning method provided in an embodiment of the present invention. Figure 3 This is a schematic diagram of a quartz tube cleaning device provided in an embodiment of the present invention.

[0078] This invention provides a quartz tube cleaning method, applied to a processor within a quartz tube cleaning device. The quartz tube cleaning device includes a hooking mechanism 1, a first concentrated sulfuric acid tank 2, a second concentrated sulfuric acid tank 3, and a cleaning tank 4. The method includes:

[0079] Step 201: When a cleaning command is received, the hooking mechanism 1 is invoked to hook the quartz tube;

[0080] Step 202: Use hook mechanism 1 to move the quartz tube to the first concentrated sulfuric acid tank 2 for acid cleaning;

[0081] In the embodiments of this application, the specific implementation process of steps 201-202 is similar to that of steps 101-102, and will not be repeated here.

[0082] Furthermore, both the first concentrated sulfuric acid tank 2 and the second concentrated sulfuric acid tank 3 are equipped with ultrasonic components; the acid cleaning includes:

[0083] When the quartz tube is moved to the first concentrated sulfuric acid tank 2 or the second concentrated sulfuric acid tank 3, the ultrasonic component is turned on at a specific frequency to acid wash the quartz tube.

[0084] The ultrasonic component in the first concentrated sulfuric acid tank 2 is activated for 60 seconds, and the ultrasonic component in the second concentrated sulfuric acid tank 3 is activated for 30 seconds.

[0085] In this embodiment, the first concentrated sulfuric acid tank 2 and the second concentrated sulfuric acid tank 3 are also provided with an ultrasonic component, which can be installed at the bottom of the first concentrated sulfuric acid tank 2 and the second concentrated sulfuric acid tank 3 to provide ultrasonic cleaning function.

[0086] When the quartz tube is moved into the first concentrated sulfuric acid tank 2 or the second concentrated sulfuric acid tank 3 and immersed in the corresponding concentrated sulfuric acid, the ultrasonic component can be turned on at a specific frequency to provide ultrasonic vibration to achieve the acid washing operation of the quartz tube.

[0087] It should be noted that the specific frequency of the ultrasonic component can be 40 Hz. To reduce resource consumption while ensuring cleaning cleanliness, the operating time of the ultrasonic component in the first concentrated sulfuric acid tank 2 can be set to 60 seconds, and the operating time of the ultrasonic component in the second concentrated sulfuric acid tank 3 can be set to 30 seconds. The quartz tube is immersed in hot concentrated sulfuric acid for 60 seconds, while the ultrasonic vibration is activated simultaneously. After passing through the hot concentrated sulfuric acid, it is transferred to a cold concentrated sulfuric acid tank for acid rinsing for 30 seconds, while the ultrasonic vibration is activated simultaneously, until the required operating time is met, at which point the ultrasonic component is turned off.

[0088] Step 203: The quartz tube is moved to the second concentrated sulfuric acid tank 3 by the hooking mechanism 1 for acid cleaning, and the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 is recovered. Pure water is injected into the first concentrated sulfuric acid tank 2.

[0089] In one example of this application, the quartz tube cleaning device further includes an acid storage component 5 and an inlet pipe connected to the first concentrated sulfuric acid tank 2. The acid storage component 5 is connected to the first concentrated sulfuric acid tank 2 via an acid-resistant pipe, which is equipped with a circulation pump. Step 203 may include the following sub-steps:

[0090] The quartz tube is moved to the second concentrated sulfuric acid tank 3 by the hooking mechanism 1 for acid cleaning.

[0091] Turn on the circulation pump to recover the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 to the acid storage component 5 along the acid-resistant pipeline, and monitor the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 in real time.

[0092] When the liquid level is lower than the first preset liquid level threshold, the water inlet pipe is opened to inject pure water into the first concentrated sulfuric acid tank 2 until the water level in the first concentrated sulfuric acid tank 2 reaches the preset water inlet height.

[0093] The acid storage component 5 refers to the component used to store the hot concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 and to heat and maintain its temperature. The acid storage component 5 and the first concentrated sulfuric acid tank 2 are connected via an acid-resistant pipe, which can also be equipped with an acid- and alkali-resistant, high-temperature-resistant circulation pump to achieve rapid storage and output of concentrated sulfuric acid. In addition, the first concentrated sulfuric acid tank 2 is also connected to a water inlet pipe, which connects to a pure water storage tank or other pure water supply component.

[0094] In this embodiment, the hooking mechanism 1 is invoked to move the quartz tube to the second concentrated sulfuric acid tank 3 for acid cleaning. The acid cleaning process can be referred to the above process and will not be repeated here.

[0095] While the quartz tube is being acid-washed in the second concentrated sulfuric acid tank 3, a circulation pump is activated. This pump provides suction to recover concentrated sulfuric acid from the first concentrated sulfuric acid tank 2 along the acid-resistant pipe and store it in the acid storage component 5. Simultaneously, the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 is monitored in real time, for example, through a pre-installed liquid level sensor or level gauge. When the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 is lower than a first preset liquid level threshold, it indicates that most of the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 has been recovered to the acid storage component 5. To perform a preliminary water wash of the quartz tube, the inlet pipe can be opened to inject pure water into the first concentrated sulfuric acid tank 2 until the water level in the first concentrated sulfuric acid tank 2 reaches a preset inlet height. Then, the inlet pipe is closed to stop the injection of pure water.

[0096] Furthermore, the acid storage assembly 5 is equipped with a heating device; the method also includes the following steps:

[0097] After the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 is recovered to the acid storage component 5, the heating device is activated to heat and keep the recovered concentrated sulfuric acid at the preset heating temperature.

[0098] The heating device refers to the device used to heat and keep the concentrated sulfuric acid warm within the acid storage assembly 5. It can be a spiral heating tube surrounding the cavity containing the concentrated sulfuric acid within the acid storage assembly 5, and / or a fixed heater at the bottom of the acid storage assembly 5.

[0099] In this embodiment of the application, when the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 is recovered to the acid storage component 5, in order to keep the temperature of the concentrated sulfuric acid within a certain range, the heating device in the acid storage component 5 can be activated to heat the recovered concentrated sulfuric acid according to the preset heating temperature, and then keep it warm after reaching the heating temperature.

[0100] Optionally, the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 is concentrated sulfuric acid at a temperature of 60-90℃;

[0101] The concentrated sulfuric acid in the second concentrated sulfuric acid tank 3 is concentrated sulfuric acid at room temperature.

[0102] Step 204: The quartz tube is moved back to the first concentrated sulfuric acid tank 2 by the hooking mechanism 1, and the quartz tube is rinsed with pure water for the preset rinsing time.

[0103] In one example of the present invention, the bottom of the first concentrated sulfuric acid tank 2 is also provided with a drain outlet; step 204 may include the following sub-steps:

[0104] When the water level in the first concentrated sulfuric acid tank 2 reaches the preset inlet height, the quartz tube is moved back into the first concentrated sulfuric acid tank 2 for soaking by the hooking mechanism 1.

[0105] When the soaking time reaches the preset soaking duration, open the drain outlet until the water level in the first concentrated sulfuric acid tank 2 drops to zero.

[0106] Connect the water inlet pipe and spray the quartz tube according to the preset spraying time, and open the drain outlet until the preset spraying time is reached.

[0107] In this embodiment, after the secondary acid washing of the quartz tube is completed, the residual concentrated sulfuric acid on the quartz tube needs to be rinsed with pure water. While the quartz tube is being acid-washed in the second concentrated sulfuric acid tank 3, the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 has been recovered to the acid storage component 5 and pure water has been injected. When the pure water level reaches the preset inlet height, it indicates that the first concentrated sulfuric acid tank 2 is ready for pure water rinsing. The quartz tube can be removed from the second concentrated sulfuric acid tank 3 by the hook mechanism 1 and moved back into the first concentrated sulfuric acid tank 2 for immersion to further dilute the residual concentrated sulfuric acid. When the immersion time reaches the preset immersion duration, the initial water washing of the quartz tube is completed. At this time, the drain is opened to discharge the contaminated pure water in the first concentrated sulfuric acid tank 2 until the water level in the first concentrated sulfuric acid tank 2 drops to zero. Then, the inlet water pipe is opened to further spray and rinse the quartz tube according to the preset spray duration. Meanwhile, in order to reduce the water accumulation in the first concentrated sulfuric acid tank 2 and avoid dilution of the next concentrated sulfuric acid injection, the drain outlet can be opened to drain the water until the preset spraying time is reached. After the drainage is completed, the drain outlet is closed to wait for the next concentrated sulfuric acid injection of the acid storage component 5.

[0108] It should be noted that after the drain outlet is opened, a vacuum suction device can be installed to enhance the drainage function of the drain outlet through vacuum suction, thereby further improving the cleaning efficiency.

[0109] In one example of this application, the method further includes the following steps:

[0110] After the pure water rinsing is completed, the circulation pump is turned on, and the concentrated sulfuric acid in the acid storage component 5 is introduced into the first concentrated sulfuric acid tank 2 along the acid-resistant pipeline until the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 reaches the second preset liquid level threshold.

[0111] When a cleaning command is received, the procedure for hooking the quartz tube by hooking mechanism 1 is invoked.

[0112] In this embodiment, after the pure water rinsing is completed, to facilitate the subsequent acid cleaning of another quartz tube, the circulation pump can be activated to provide thrust, and the concentrated sulfuric acid in the acid storage component 5 can be introduced back into the first concentrated sulfuric acid tank 2 along the acid-resistant pipe until the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 reaches the second preset liquid level threshold. Because there is a heating device in the acid storage component 5, the concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 can achieve good heat preservation, ensuring the hot concentrated sulfuric acid cleaning of the next quartz tube. The process then jumps to step 201 to await the next cleaning instruction, and the hooking mechanism 1 is invoked to continue hooking the other quartz tube.

[0113] In practice, cleaning instructions can be set in the form of instruction groups. In this case, after the hooking mechanism 1 releases the quartz tube to the placement rack 41, it can continue to hook new quartz tubes.

[0114] Please see Figure 4 , Figure 4 This is a detailed structural diagram of a cleaning tank according to an embodiment of the present invention.

[0115] In this embodiment, the cleaning tank 4 is equipped with a cleaning brush head assembly 42 and a placement rack 41. The quartz tube cleaning device may also include a storage hook mechanism (not shown in the figure). The quartz tube can be moved onto the placement rack 41 by the hook mechanism 1 and then released. The cleaning brush head assembly 42 can then be used to further clean, rinse, and blow dry the quartz tube, thereby completing the entire cleaning process of the quartz tube.

[0116] Step 205: After rinsing with pure water is completed, the quartz tube is moved to the placement rack 41 and released by the hook mechanism 1;

[0117] In this embodiment, once the quartz tube is rinsed with pure water, the cleaning of the outer surface of the quartz tube is complete. However, since the pure water spray can only rinse the outer surface of the quartz tube, some concentrated sulfuric acid may still remain inside the quartz tube. In order to improve the cleanliness of the inside of the quartz tube, the quartz tube can be moved to the placement rack 41 in the cleaning tank 4 by the hook mechanism 1, and the quartz tube can be released to wait for the cleaning brush head assembly 42 in the cleaning tank 4 to perform further cleaning.

[0118] Optionally, the inner surface of the placement rack 41 is provided with multiple rotating wheels. There is friction between the rotating wheels and the quartz tube, which can maintain the stability of the quartz tube on the placement rack 41. The rotating wheels rotate in the same direction at a preset speed to drive the quartz tube to rotate, thereby improving the cleaning effect inside the quartz tube.

[0119] Step 206: Use the cleaning brush head assembly 42 to rinse and dry the quartz tube;

[0120] In one example of the present invention, the cleaning brush head assembly 42 includes a cleaning brush 421, a water rinsing head 422, and an air blowing head 423 arranged sequentially; step 206 may include the following sub-steps:

[0121] The cleaning brush 421 is inserted into the quartz tube and cleaned for the preset cleaning time before being removed.

[0122] The flushing head 422 is inserted into the quartz tube and flushed for a preset time before being removed.

[0123] The air blowing head 423 is moved into the interior of the quartz tube, and air is blown into the interior of the quartz tube at the first preset temperature for the first preset blowing time.

[0124] After blowing air into the quartz tube at the second preset temperature for the second preset blowing time, the tube is removed.

[0125] The cleaning brush head assembly 42 includes a cleaning brush 421, a water rinsing head 422, and an air blowing head 423 arranged in sequence, which can be arranged vertically in sequence. All three are fixedly mounted on one side of the same support plate, while the other side can be equipped with a moving mechanism driven by a motor or other means. This moving mechanism allows the cleaning brush head assembly 42 to move up and down, enabling the cleaning brush 421, water rinsing head 422, and air blowing head 423 to move sequentially to the same horizontal plane as the quartz tube. Simultaneously, the moving mechanism can also drive the cleaning brush head assembly 42 to move back and forth, allowing the cleaning brush 421, water rinsing head 422, and air blowing head 423 to sequentially enter the interior of the quartz tube for cleaning.

[0126] In this embodiment, since pure water cleaning may leave some concentrated sulfuric acid and / or pure water residue, the cleaning brush 421 can be inserted into the quartz tube first. The cleaning brush 421 is driven to rotate according to a preset cleaning time to clean the inner wall of the quartz tube before being removed. The cleaning time can be set to 30 seconds. After cleaning the quartz tube with the brush, the height of the cleaning brush head assembly 42 can be adjusted to move the rinsing head 422 to the same horizontal plane as the quartz tube and align it with the opening of the quartz tube. The rinsing head 422 is then inserted into the quartz tube and rinsed for a preset rinsing time, which can also be set to 30 seconds. A similar process is then followed, adjusting the position of the air blowing head 423 and inserting it into the quartz tube. Air is blown into the quartz tube at a first preset temperature for a preset first air blowing time, which can be set to 30 seconds. The gas is then heated to a second preset temperature, and air is blown into the quartz tube at the second preset temperature for a second air blowing time before being removed. The second blowing time can be set to 30-60 seconds to allow the inside of the quartz tube to reach a dry state.

[0127] It should be noted that the gas output by the air blowing head 423 can be an inert gas such as nitrogen, the first preset temperature can be room temperature, and the second preset temperature can be 30℃.

[0128] Step 207: Call the storage hook mechanism to hook the dried quartz tube and move it to the target storage location.

[0129] To further improve the cleaning efficiency of quartz tubes, after the hooking mechanism 1 releases the quartz tube, the next quartz tube can be hooked. Under this premise, another storage hooking mechanism can be called to hook the dried quartz tube and move it to the target storage location for storage.

[0130] Specifically, when the air blowing head 423 is removed from the inside of the quartz tube, a corresponding trigger command is generated to call the storage hooking mechanism to hook the dried quartz tube.

[0131] In the specific implementation, a Teflon cleaning hook is used as the hooking mechanism 1 to hook the quartz tube. After the acid storage component 5 heats the concentrated sulfuric acid to 75±5℃, the hot concentrated sulfuric acid is introduced into the first concentrated sulfuric acid tank 2 (e.g., 20 liters) by starting the acid- and alkali-resistant and high-temperature-resistant circulating pump. Then, the cleaning hook is used to move the quartz tube into the hot concentrated sulfuric acid for 60 seconds, while simultaneously activating ultrasonic vibration cleaning at a frequency of 40 Hz. After the hot concentrated sulfuric acid cleaning is completed, the quartz tube is moved into the second concentrated sulfuric acid tank 3 for acid cleaning for 30 seconds using the cleaning hook, while simultaneously activating ultrasonic vibration cleaning at a frequency of 40 Hz. At the same time, the acid- and alkali-resistant and high-temperature-resistant circulating pump is started to recover the hot concentrated sulfuric acid in the first concentrated sulfuric acid tank 2 back to the acid storage component 5 for heat preservation, and the working mode of the first concentrated sulfuric acid tank 2 is switched to flushing mode, with approximately 40 liters of pure water injected into the tank through the water inlet pipe. After the pure water is injected, the cleaning hook lifts the quartz tube from the second concentrated sulfuric acid tank 3 and moves it into the first concentrated sulfuric acid tank 2 for immersion for 10 seconds. The drain outlet is then opened to quickly drain the pure water from the first concentrated sulfuric acid tank 2. After draining the pure water, the quartz tube is sprayed and rinsed for 120 seconds through the water inlet pipe. After the spray rinsing is completed, the quartz tube is moved to the placement rack 41 in the cleaning tank 4 and fixed. The placement rack 41 rotates the quartz tube at 20 revolutions per minute. First, a special brush is used to clean the tube for 30 seconds, then a special water rinsing head 422 is used to rinse the tube for 30 seconds, and then room temperature nitrogen is blown through a special nitrogen blowing pipe for 30 seconds. The nitrogen is then heated to 30°C and dried with hot air, completing the tube washing process. The dried quartz tube is then hooked by the storage hook mechanism and moved to the target storage location.

[0132] In existing technologies, the quartz tube is manually placed in heated concentrated sulfuric acid (temperature: 70±5℃) and then in cold concentrated sulfuric acid. Employees first place the quartz tube on a PVC hook, then two employees lift the hook with both hands and place it into the concentrated sulfuric acid tank for acid treatment. After acid treatment, employees rinse with water guns and brushes, and then allow it to dry. In contrast, the quartz tube cleaning method of this application embodiment can quickly and automatically clean the quartz tube without manual operation, effectively reducing the risk of human contact with concentrated sulfuric acid.

[0133] In this embodiment, when the processor in the quartz tube cleaning device receives a cleaning command, it calls a hooking mechanism to hook the quartz tube and move it to the first concentrated sulfuric acid tank for acid cleaning. After the acid cleaning is completed, the hooking mechanism moves the quartz tube to the second concentrated sulfuric acid tank for a second acid cleaning. At the same time, the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered. After the recovery is completed, pure water is injected into the first concentrated sulfuric acid tank, and the hooking mechanism is called to move the quartz tube back to the first concentrated sulfuric acid tank. The quartz tube is rinsed with pure water for a preset rinsing time. After the pure water rinsing is completed, the hooking mechanism is called to move the quartz tube to the cleaning tank. After rinsing and drying by the cleaning components in the cleaning tank, the quartz tube is moved to the target storage location. Thus, through the secondary acid washing and the cleaning process of the specially designed cleaning components in the cleaning tank, the quartz tube is automatically cleaned, effectively improving the cleaning efficiency and cleanliness of the quartz tube.

[0134] Please see Figure 5 , Figure 5 A structural block diagram of a quartz tube cleaning system is provided.

[0135] This invention also provides a quartz tube cleaning system, a processor applied within a quartz tube cleaning device, the quartz tube cleaning device comprising a hook mechanism, a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank, and a cleaning tank; the system includes:

[0136] The hooking call module 301 is used to call the hooking mechanism to hook the quartz tube when a cleaning command is received;

[0137] The primary acid cleaning module 302 is used to call the hooking mechanism to move the quartz tube to the first concentrated sulfuric acid tank for acid cleaning.

[0138] The secondary acid washing module 303 is used to move the quartz tube to the second concentrated sulfuric acid tank for acid washing via a hooking mechanism, and to recover the concentrated sulfuric acid in the first concentrated sulfuric acid tank and inject pure water into the first concentrated sulfuric acid tank.

[0139] The pure water rinsing module 304 is used to move the quartz tube back to the first concentrated sulfuric acid tank through the hook mechanism and rinse the quartz tube with pure water according to the preset rinsing time.

[0140] The rinsing and drying module 305 is used to call the hook mechanism to move the quartz tube to the cleaning tank for rinsing and drying after the pure water rinsing is completed, and then move it to the target storage location.

[0141] Optionally, the quartz tube cleaning device also includes an acid storage component and an inlet pipe connected to the first concentrated sulfuric acid tank. The acid storage component is connected to the first concentrated sulfuric acid tank via an acid-resistant pipe, which is equipped with a circulation pump. The secondary acid washing module 303 is specifically used for:

[0142] The quartz tube is moved to the second concentrated sulfuric acid tank for acid cleaning via a hooking mechanism.

[0143] Turn on the circulation pump to recover the concentrated sulfuric acid in the first concentrated sulfuric acid tank to the acid storage component along the acid-resistant pipeline, and monitor the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank in real time.

[0144] When the liquid level is lower than the first preset liquid level threshold, the water inlet pipe is opened to inject pure water into the first concentrated sulfuric acid tank until the water level in the first concentrated sulfuric acid tank reaches the preset water inlet height.

[0145] Optionally, the acid storage assembly includes a heating element; the system also includes:

[0146] After the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered to the acid storage component, the heating device is activated to heat and keep the recovered concentrated sulfuric acid at the preset heating temperature.

[0147] Optionally, the bottom of the first concentrated sulfuric acid tank is also provided with a drain outlet; the pure water rinsing module 304 is specifically used for:

[0148] When the water level in the first concentrated sulfuric acid tank reaches the preset inlet height, the quartz tube is moved back into the first concentrated sulfuric acid tank for soaking by the hooking mechanism.

[0149] When the soaking time reaches the preset soaking time, open the drain outlet until the water level in the first concentrated sulfuric acid tank drops to zero.

[0150] Connect the water inlet pipe and spray the quartz tube according to the preset spraying time, and open the drain outlet until the preset spraying time is reached.

[0151] Optionally, the quartz tube cleaning device also includes a storage hook mechanism, and the cleaning tank is equipped with a cleaning brush head assembly and a placement rack; the rinsing and drying module 305 includes:

[0152] The placement drive submodule is used to move the quartz tube onto the placement rack and release it via a hook mechanism after the pure water rinsing is completed;

[0153] The cleaning brush head component calls a submodule to flush and dry the quartz tube.

[0154] The storage and movement submodule is used to call the storage hook mechanism to hook the dried quartz tube and move it to the target storage location.

[0155] Optionally, the cleaning brush head assembly includes a cleaning brush, a water rinsing nozzle, and an air blowing nozzle arranged in sequence; the cleaning brush head assembly calls sub-modules specifically for:

[0156] The cleaning brush is inserted into the quartz tube and cleaned for the preset cleaning time before being removed.

[0157] The flushing head is inserted into the quartz tube and flushed for the preset time before being removed.

[0158] The air blowing head is moved into the interior of the quartz tube, and air is blown into the interior of the quartz tube at a first preset temperature for a first preset blowing time;

[0159] After blowing air into the inside of the quartz tube at the second preset temperature for the second preset blowing time, the tube is removed.

[0160] Optionally, the system also includes:

[0161] The concentrated sulfuric acid introduction module is used to turn on the circulation pump after the pure water rinsing is completed, and introduce the concentrated sulfuric acid in the acid storage component into the first concentrated sulfuric acid tank along the acid-resistant pipeline until the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank reaches the second preset liquid level threshold.

[0162] The loop module is used to jump to the execution step of calling the hooking mechanism to hook the quartz tube when a cleaning command is received.

[0163] Optionally, the concentrated sulfuric acid in the first concentrated sulfuric acid tank is concentrated sulfuric acid at a temperature of 60-90℃;

[0164] The concentrated sulfuric acid in the second concentrated sulfuric acid tank is concentrated sulfuric acid at room temperature.

[0165] Optionally, both the first and second concentrated sulfuric acid tanks are equipped with ultrasonic components; the acid cleaning includes:

[0166] When the quartz tube is moved to the first or second concentrated sulfuric acid tank, the ultrasonic component is activated at a specific frequency to acid-wash the quartz tube.

[0167] The ultrasonic component in the first concentrated sulfuric acid tank is activated for 60 seconds, and the ultrasonic component in the second concentrated sulfuric acid tank is activated for 30 seconds.

[0168] Those skilled in the art will clearly understand that, for the sake of convenience and brevity, the specific working process of the above-described device and module can be referred to the corresponding process in the foregoing method embodiments, and will not be repeated here.

[0169] In the several embodiments provided in this application, it should be understood that the disclosed apparatus and methods can be implemented in other ways. For example, the apparatus embodiments described above are merely illustrative; for instance, the division of modules is only a logical functional division, and in actual implementation, there may be other division methods. For example, multiple modules or components may be combined or integrated into another system, or some features may be ignored or not executed. Furthermore, the shown or discussed mutual coupling or direct coupling or communication connection may be through the use of some interfaces; the indirect coupling or communication connection between apparatuses or modules may be electrical, mechanical, or other forms.

[0170] The modules described as separate components may or may not be physically separate. The components shown as modules may or may not be physical modules; that is, they may be located in one place or distributed across multiple network modules. Some or all of the modules can be selected to achieve the purpose of this embodiment according to actual needs.

[0171] The above-described embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit it. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for cleaning quartz tubes, characterized in that, A processor is applied within a quartz tube cleaning apparatus, the quartz tube cleaning apparatus comprising a hooking mechanism, a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank, and a cleaning tank; the method includes: When a cleaning command is received, the hooking mechanism is activated to hook the quartz tube; The hooking mechanism is invoked to move the quartz tube to the first concentrated sulfuric acid tank for acid cleaning. The quartz tube is moved to the second concentrated sulfuric acid tank for acid cleaning using the hooking mechanism, and the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered. Pure water is then injected into the first concentrated sulfuric acid tank. The quartz tube is moved back to the first concentrated sulfuric acid tank by the hooking mechanism, and the quartz tube is rinsed with pure water for a preset rinsing time. After the pure water rinsing is completed, the hooking mechanism is invoked to move the quartz tube to the cleaning tank for rinsing and drying, and then it is moved to the target storage location. The quartz tube cleaning device further includes an acid storage component and an inlet pipe connected to the first concentrated sulfuric acid tank. The acid storage component is connected to the first concentrated sulfuric acid tank via an acid-resistant pipe, and a circulation pump is installed on the acid-resistant pipe. The steps of moving the quartz tube to the second concentrated sulfuric acid tank for acid cleaning via the hooking mechanism, recovering the concentrated sulfuric acid in the first concentrated sulfuric acid tank, and injecting pure water into the first concentrated sulfuric acid tank include: The quartz tube is moved to the second concentrated sulfuric acid tank for acid cleaning via the hooking mechanism. The circulation pump is turned on to recover concentrated sulfuric acid from the first concentrated sulfuric acid tank to the acid storage component along the acid-resistant pipeline, and the liquid level of concentrated sulfuric acid in the first concentrated sulfuric acid tank is monitored in real time. When the liquid level is less than the first preset liquid level threshold, the water inlet pipe is opened to inject pure water into the first concentrated sulfuric acid tank until the water level in the first concentrated sulfuric acid tank reaches the preset water inlet height. The acid storage assembly is equipped with a heating device; the method further includes: After the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered to the acid storage component, the heating device is activated to heat and keep the recovered concentrated sulfuric acid at a preset heating temperature. The bottom of the first concentrated sulfuric acid tank is also provided with a drain outlet; the step of moving the quartz tube back to the first concentrated sulfuric acid tank through the hook mechanism and rinsing the quartz tube with pure water for a preset rinsing time includes: When the water level in the first concentrated sulfuric acid tank reaches the preset inlet height, the quartz tube is moved back into the first concentrated sulfuric acid tank for soaking by the hooking mechanism. When the soaking time reaches the preset soaking duration, open the drain outlet until the water level in the first concentrated sulfuric acid tank drops to zero. The water inlet pipe is connected, and the quartz tube is sprayed and rinsed according to the preset spraying time. The drain outlet is then opened until the preset spraying time is reached.

2. The method according to claim 1, characterized in that, The quartz tube cleaning device further includes a storage hook mechanism, and the cleaning tank is equipped with a cleaning brush head assembly and a placement rack; the step of using the hook mechanism to move the quartz tube to the cleaning tank for rinsing and drying after the pure water rinsing is completed, and then moving it to the target storage location, includes: After the pure water rinsing is completed, the quartz tube is moved to the placement rack and released by the hooking mechanism; The cleaning brush head assembly is used to rinse and dry the quartz tube; The storage hook mechanism is invoked to hook the dried quartz tube and move it to the target storage location.

3. The method according to claim 2, characterized in that, The cleaning brush head assembly includes a cleaning brush, a water rinsing nozzle, and an air blowing nozzle arranged in sequence; the step of using the cleaning brush head assembly to rinse and dry the quartz tube includes: The cleaning brush is inserted into the quartz tube and cleaned for a preset time before being removed. The flushing head is inserted into the quartz tube and flushed for a preset time before being removed. The air blowing head is moved into the interior of the quartz tube, and air is blown into the interior of the quartz tube at a first preset temperature for a preset first blowing time; The air blowing head is activated to blow air into the interior of the quartz tube at a second preset temperature for a preset second blowing time, and then removed.

4. The method according to claim 1, characterized in that, The method further includes: After the pure water rinsing is completed, the circulation pump is turned on, and the concentrated sulfuric acid in the acid storage component is introduced into the first concentrated sulfuric acid tank along the acid-resistant pipe until the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank reaches the second preset liquid level threshold. Jump to execute the step of calling the hooking mechanism to hook the quartz tube when a cleaning command is received.

5. The method according to claim 1, characterized in that, The concentrated sulfuric acid in the first concentrated sulfuric acid tank is concentrated sulfuric acid at a temperature of 60-90℃; The concentrated sulfuric acid in the second concentrated sulfuric acid tank is concentrated sulfuric acid at room temperature.

6. The method according to claim 1, characterized in that, Both the first and second concentrated sulfuric acid tanks are equipped with ultrasonic components; the acid cleaning includes: When the quartz tube is moved to the first concentrated sulfuric acid tank or the second concentrated sulfuric acid tank, the ultrasonic component is turned on at a specific frequency to acid wash the quartz tube. The ultrasonic component in the first concentrated sulfuric acid tank is activated for 60 seconds, and the ultrasonic component in the second concentrated sulfuric acid tank is activated for 30 seconds.

7. A quartz tube cleaning system, characterized in that, A processor applied within a quartz tube cleaning apparatus for performing the quartz tube cleaning method as described in any one of claims 1 to 6, the quartz tube cleaning apparatus comprising a hooking mechanism, a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank, and a cleaning tank; the system comprising: The hooking call module is used to call the hooking mechanism to hook the quartz tube when a cleaning command is received; A primary acid cleaning module is used to invoke the hooking mechanism to move the quartz tube to the first concentrated sulfuric acid tank for acid cleaning; The secondary acid washing module is used to move the quartz tube to the second concentrated sulfuric acid tank for acid washing via the hooking mechanism, and to recover the concentrated sulfuric acid in the first concentrated sulfuric acid tank and inject pure water into the first concentrated sulfuric acid tank. A pure water rinsing module is used to move the quartz tube back to the first concentrated sulfuric acid tank through the hook mechanism and rinse the quartz tube with pure water for a preset rinsing time. The rinsing and drying module is used to call the hooking mechanism to move the quartz tube to the cleaning tank for rinsing and drying after the pure water rinsing is completed, and then move it to the target storage location. The quartz tube cleaning device further includes an acid storage component and an inlet pipe connected to the first concentrated sulfuric acid tank. The acid storage component is connected to the first concentrated sulfuric acid tank via an acid-resistant pipe, which is equipped with a circulation pump. The secondary acid washing module is specifically used for: The quartz tube is moved to the second concentrated sulfuric acid tank for acid cleaning via the hooking mechanism. The circulation pump is turned on to recover concentrated sulfuric acid from the first concentrated sulfuric acid tank to the acid storage component along the acid-resistant pipeline, and the liquid level of concentrated sulfuric acid in the first concentrated sulfuric acid tank is monitored in real time. When the liquid level is less than the first preset liquid level threshold, the water inlet pipe is opened to inject pure water into the first concentrated sulfuric acid tank until the water level in the first concentrated sulfuric acid tank reaches the preset water inlet height. The acid storage assembly is equipped with a heating device; the system also includes: After the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered to the acid storage component, the heating device is activated to heat and keep the recovered concentrated sulfuric acid at a preset heating temperature. The bottom of the first concentrated sulfuric acid tank is also provided with a drain outlet; the pure water rinsing module is specifically used for: When the water level in the first concentrated sulfuric acid tank reaches the preset inlet height, the quartz tube is moved back into the first concentrated sulfuric acid tank for soaking by the hooking mechanism. When the soaking time reaches the preset soaking duration, open the drain outlet until the water level in the first concentrated sulfuric acid tank drops to zero. The water inlet pipe is connected, and the quartz tube is sprayed and rinsed according to the preset spraying time. The drain outlet is then opened until the preset spraying time is reached.

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