Display panel and method of manufacturing the same

Abstract

The application provides a display panel and a manufacturing method thereof. The display panel comprises a functional additional area, an array substrate, a light-emitting functional layer, a thin film packaging layer and a color film layer are arranged in the functional additional area in a stacked manner, the color film layer comprises a first black matrix and color resistance units between the first black matrix; wherein the first black matrix comprises a first main body part and first lap parts on both sides of the first main body part, the first lap parts and the color resistance units have overlapping parts, by making the thickness of the first main body part less than the thickness of the first lap parts, the optical density of the first black matrix in the fingerprint identification optical path is reduced, thereby increasing the optical transmittance of the functional additional area, and meanwhile, the first black matrix can also consider the screen color of the display panel.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a display panel and a method for manufacturing the same. Background Technology

[0002] With the continuous development of the display industry, products such as flexible screens, foldable screens, and rollable screens are constantly entering the market. Flexible organic light-emitting diode (OLED) and flexible active matrix organic light-emitting diode (AMOLED) display panels have broad application prospects in automotive, mobile phones, tablets, computers, and television products. Integrating display, touch, fingerprint recognition, 5G antennas, and ToF technologies into a single display panel has great market potential.

[0003] However, the metal structure in the existing touch layer has too many metal traces, leaving few places to open light-transmitting holes. In addition, the setting of the black matrix (BM) layer in PLP (POL-less, depolarizing film) technology results in low optical fingerprint transmittance, which seriously affects the user experience.

[0004] Therefore, in view of the problem of low optical transmittance when PLP technology is integrated with optical fingerprint recognition in existing display panels, it is necessary to provide a display panel and its manufacturing method to improve this problem. Summary of the Invention

[0005] The purpose of this application is to provide a display panel and a method for manufacturing the same, which can improve the optical transmittance of the display panel while taking into account the color hue of the display panel when the screen is off.

[0006] To achieve the above objectives, the technical solution is as follows.

[0007] A display panel includes a functional supplementary area; wherein the functional supplementary area is provided with:

[0008] Array substrate;

[0009] A light-emitting functional layer is located above the array substrate;

[0010] A thin-film encapsulation layer is located above the light-emitting functional layer;

[0011] A color filter layer is located above the thin film encapsulation layer, and the color filter layer includes a first black matrix and color resist units located between the first black matrix;

[0012] The first black matrix includes a first main body and first overlapping portions located on both sides of the first main body. The first overlapping portions and the color resist unit have overlapping portions. The thickness of the first main body is less than the thickness of the first overlapping portions.

[0013] According to one embodiment of this application, the first black matrix includes a first sub-layer, the first sub-layer including dam structures distributed in a grid, and a first opening is defined between adjacent dam structures;

[0014] A second sub-layer, which covers the dam structure and the first opening;

[0015] The second sub-layer located within the first opening forms the first main body, and the dam structure and the second sub-layer covering the dam structure form the first overlapping part.

[0016] According to one embodiment of this application, the first black matrix includes a first sub-layer, the first sub-layer including dam structures distributed in a grid, and a first opening is defined between adjacent dam structures;

[0017] The second sub-layer is located within the first opening;

[0018] The second sub-layer forms the first main body, and the dam structure forms the first overlapping part.

[0019] According to one embodiment of this application, the first sublayer and the second sublayer are made of different materials, and the light transmittance of the second sublayer is greater than that of the first sublayer.

[0020] According to one embodiment of this application, the thickness of the first main body portion is 30% to 50% of the thickness of the first overlapping portion.

[0021] According to one embodiment of this application, the display panel includes a main display area located outside the functional additional area, and a second black matrix is ​​disposed in the main display area; wherein the thickness of the second black matrix is ​​equal to the thickness of the first overlapping portion.

[0022] According to one embodiment of this application, the width of the first overlapping portion is greater than or equal to 2 μm.

[0023] According to one embodiment of this application, the display panel further includes a touch layer, which is located between the thin film encapsulation layer and the color filter layer, and the touch metal lines of the touch layer correspond to the first main body portion.

[0024] According to one embodiment of this application, the display panel includes a fingerprint recognition sensor, which is located below the array substrate or integrated within the array substrate.

[0025] A method for manufacturing a display panel, comprising:

[0026] Provide an array substrate;

[0027] A light-emitting functional layer and a thin-film encapsulation layer are formed on the array substrate in a stacked manner;

[0028] A first black matrix of uneven thickness is formed on the thin film encapsulation layer in the functional additional area of ​​the display panel using a halftone photomask process. The first black matrix includes a first main body and first overlapping portions located on both sides of the first main body. The thickness of the first main body is less than the thickness of the first overlapping portions.

[0029] Color resist units are formed between the first black matrix, and the color resist units and the first black matrix form a color filter layer.

[0030] Beneficial Effects: This application provides a display panel and a method for manufacturing the same. The display panel includes a functional additional area, in which an array substrate, a light-emitting functional layer, a thin-film encapsulation layer, and a color filter layer are stacked. The color filter layer includes a first black matrix and color resist units located between the first black matrices. The first black matrix includes a first main body and first overlapping portions located on both sides of the first main body. The first overlapping portions and the color resist units have overlapping portions. By making the thickness of the first main body less than the thickness of the first overlapping portions, the OD value of the first black matrix located in the fingerprint recognition optical path is reduced, and the optical transmittance of the functional additional area is increased. At the same time, the first black matrix can also take into account the screen-off hue of the display panel. Attached Figure Description

[0031] Figure 1 This is a plan view of the display panel according to an embodiment of this application;

[0032] Figure 2 This is a schematic diagram of the display panel of the functional additional area in Embodiment 1 of this application;

[0033] Figure 3 This is a schematic diagram of the display panel of the functional additional area in Embodiment 2 of this application;

[0034] Figure 4 This is a schematic diagram of the display panel of the functional additional area in Embodiment 3 of this application;

[0035] Figures 5A-5F A structural schematic diagram of the process of manufacturing the display panel of Embodiment 1 of this application;

[0036] Figures 6A-6H A schematic diagram of the structure during the manufacturing process of the display panel of Embodiment 2 of this application. Detailed Implementation

[0037] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0038] like Figure 1 As shown, Figure 1 This application provides a planar schematic diagram of a PLP display panel based on optical fingerprint recognition. The display panel includes a functional supplementary area 20 and a main display area AA functional supplementary area located outside the functional supplementary area 20, wherein the functional supplementary area 20 is used for fingerprint recognition. Specifically, the functional supplementary area 20 includes an array of optical fingerprint apertures 21. Light enters the fingerprint recognition sensor located within the functional supplementary area 20 through the optical fingerprint apertures 21, and the light path in this process is defined as the optical path of the fingerprint recognition area. However, currently, to achieve a seamless black display, the display panel must be equipped with a black matrix. But the black matrix set in the functional supplementary area 20 will block some light from entering the fingerprint recognition sensor, which may cause recognition delay or insensitivity.

[0039] It should be noted that the main factor affecting the optical transmittance (T) of a display panel is the OD value (optical density, representing the light density absorbed by the detected object) of the black matrix material, and its formula is:

[0040] OD = log 10 (1 / T)(Formula 1)

[0041] According to Beer-Lambert Law:

[0042] A = log e (1 / T)=K*b*c(Formula 2)

[0043] In the formula, A is absorbance, T is transmittance, K is molar absorptivity, which is related to the properties of the absorbing substance and the wavelength λ of the incident light, c is the concentration of the absorbing substance, and b is the thickness of the absorption layer.

[0044] Combining formula 1 and formula 2, we get:

[0045] OD = K * c * b / log e 10 = K0 * b (Formula 3)

[0046] Define K0 = K * c / log e10 can be considered a constant.

[0047] Formula 3 shows that the OD value of a material is directly proportional to its thickness b. Formula 1 shows that the OD value of a material directly determines its transmittance T, and the relationship is exponential. Reducing the thickness b of the material can increase its transmittance exponentially by a factor of 10.

[0048] Therefore, this application provides a display panel and a method for manufacturing the same, which optimizes the structure of the black matrix located in the functional additional area to reduce the OD value of the functional additional area 20, improve optical transmittance, and at the same time take into account the off-screen hue of the display panel to improve the user experience.

[0049] Figure 2 This is a schematic diagram of the display panel structure for the functional additional area according to the first embodiment of this application. Figure 2 As shown, the display panel includes an array substrate 10, which includes a substrate 11 and a driving circuit layer 12 located above the substrate 11; a light-emitting functional layer 13 located above the array substrate 10; a thin-film encapsulation layer 14 located above the light-emitting functional layer 13; a touch layer 15 located above the encapsulation layer; a color filter layer 19 located above the touch layer 15, the color filter layer 19 including a first black matrix 16 and color resist units 17 located between the first black matrix 16; and a PAS layer 18 (Passivation layer) located above the color filter layer 19. The display panel also includes a fingerprint recognition sensor (not shown in the figure), which may be located below the substrate 11 or integrated within the driving circuit layer 12.

[0050] Furthermore, the first black matrix 16 includes a first main body portion 51 and a first overlapping portion 52 located on both sides of the first main body portion 51. The first overlapping portion 52 and the color resist unit 17 have an overlapping portion. The thickness of the first main body portion 51 is less than the thickness of the first overlapping portion 52, thereby reducing the OD value of the first main body portion 51 and improving its optical transmittance.

[0051] It should be noted that the thickness of the first main body 51 is 30% to 50% of the thickness of the first overlapping part 52.

[0052] It should be noted that the fingerprint recognition sensor is aligned with at least one color resist unit 17 and the first black matrix 16 surrounding the color resist unit 17. Light enters the fingerprint recognition sensor through the relatively thin first main body portion 51, thereby reducing the OD value of the first black matrix 16 located in the fingerprint recognition optical path, increasing its optical transmittance, and thus improving the fingerprint recognition sensitivity. Simultaneously, the arrangement of the first main body portion 51 can also accommodate the always-on display panel's hue. It should be noted that, in order to achieve a unified black display on the display panel, the thickness of the first black matrix 16 is at least 1.2 μm. Therefore, the first black matrix 16 has a minimum thickness of 1.2 μm at the first main body portion 51.

[0053] In Embodiment 1, the first overlapping portion 52 of the first black matrix 16 defines the boundary of the color resist unit 17. The color resist unit 17 at least covers the edge of the first overlapping portion 52. Therefore, the width of the first overlapping portion 52 is greater than or equal to 2μm, ensuring that the color resist unit 17 can normally cover the edge of the first overlapping portion 52.

[0054] In this embodiment, a second black matrix is ​​provided within the main display area AA, wherein the thickness of the second black matrix is ​​equal to the thickness of the first overlapping portion. By providing a second black matrix of uniform thickness within the main display area AA, the always-on display hue can be effectively balanced.

[0055] In Embodiment 1, the structure of the driving circuit layer 12 can refer to the film layer structure of the driving circuit layer in existing display panels, and is not limited here. The light-emitting functional layer 13 includes an anode layer, a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, an electron injection layer, and a cathode layer. The light-emitting layer includes at least one sub-pixel 131, which can be any one of a red sub-pixel, a green sub-pixel, and a blue sub-pixel.

[0056] In Embodiment 1, the thin-film encapsulation layer 14 has a three-layer alternating structure of inorganic layer / organic layer / inorganic layer. The inorganic layer material includes, but is not limited to, Al2O3 and SiO2. x SiN x The organic layer material is selected from one or more of the following: SiON, or any combination of two or more of them. The organic layer material is selected from any one or more combinations of epoxy-based organic materials and acrylic-based organic materials. The alternating inorganic / organic / inorganic encapsulation structure itself has a good barrier effect against water, oxygen, or other impurities, thereby effectively protecting the devices in the light-emitting functional layer and improving the lifespan of the display panel. It should be noted that the inorganic and organic layers in the thin-film encapsulation layer 14 can be deposited in overlapping layers multiple times as needed.

[0057] In Embodiment 1, the touch layer 15 can refer to the structure of the touch layer in an existing display panel, such as including an insulating layer 151 and a touch metal line 152. The touch metal line 152 avoids the sub-pixel 131 and corresponds to the first main body 51.

[0058] In Embodiment 1, the color resist unit 17 includes a red color resist, a green color resist, and a blue color resist, and the color resist unit 17 is aligned with the sub-pixel 131.

[0059] In Embodiment 1, the PAS layer 18 can be an organic photoresist, such as a low-temperature OC layer. The PAS layer 18 covers the color filter layer 19, thereby effectively protecting the display panel.

[0060] Figure 3 This is a schematic diagram of the display panel for the functional additional area provided in Embodiment 2 of this application. Figure 3 As shown, the first black matrix 16 in this embodiment has a double-layer overlapping structure, including a first sub-layer 161, which includes dam structures 160 arranged in a grid, with a first opening 61 defining adjacent dam structures 160; and a second sub-layer 162, which covers the dam structures 160 and the first opening 61. The second sub-layer 162 located within the first opening 61 forms the first main body 51, and the dam structures 160 and the second sub-layer 162 covering the dam structures 160 form the first overlapping portion 52. Further, the thickness of the second sub-layer 162 is 30% to 50% of the thickness of the first sub-layer 161. This embodiment uses the thinner second sub-layer 162 as the first main body 51 to reduce the OD value of the first black matrix 16 located in the fingerprint recognition optical path, thereby increasing its optical transmittance and improving fingerprint recognition sensitivity. Simultaneously, the first black matrix 16 with its double-layer overlapping structure can also accommodate the always-on display hue.

[0061] Figure 4 This is a schematic diagram of the display panel for the functional additional area provided in Embodiment 3 of this application. Figure 4As shown, in this embodiment, the first black matrix 16 includes a first sub-layer 161, which includes dam structures 160 arranged in a grid, with a first opening 61 defining adjacent dam structures 160; a second sub-layer 162 is located within the first opening 61; wherein the second sub-layer 162 forms the first main body 51, and the dam structures 160 form the first overlapping portion 52. Further, the thickness of the second sub-layer 162 is 30% to 50% of the thickness of the first sub-layer 161. It should be noted that the materials of the first sub-layer 161 and the second sub-layer 162 in Embodiment 2 or Embodiment 3 can be the same or different. When the materials of the first sub-layer 161 and the second sub-layer 162 are different, the light transmittance of the material of the second sub-layer 162 is greater than that of the material of the first sub-layer 161, thereby effectively increasing the optical transmittance of the functional additional area 20.

[0062] This application provides a method for manufacturing a display panel, used to prepare the aforementioned display panel. The manufacturing method includes the following steps: Figures 5A to 5F , Figures 6A to 6H As shown:

[0063] S1: Provide an array substrate 10.

[0064] Specifically, a substrate 11 is provided, on which a driving circuit layer 12 is formed. The substrate 11 is a flexible substrate, and its material can be polyimide (PI). In addition to polyimide, the substrate 11 can also be formed of any flexible and suitable insulating material, for example, it can be any polymer material selected from polycarbonate (PC), polyethersulfone (PES), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyaryl compounds (PAR), or glass fiber reinforced plastic (FRP).

[0065] S2: A light-emitting functional layer 13, a thin-film encapsulation layer 14, and a touch layer 15 are stacked on the array substrate 10, such as... Figure 5A , Figure 6A As shown.

[0066] Specifically, the step of forming the light-emitting functional layer 13 includes sequentially forming an anode layer, a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, an electron injection layer, and a cathode layer on top of the array substrate 10. It should be noted that the anode layer, hole injection layer, hole transport layer, light-emitting layer, electron transport layer, electron injection layer, and cathode layer of this application can be prepared using methods such as vacuum evaporation, magnetron sputtering, ion plating, DC sputtering, radio frequency sputtering, ion beam sputtering, ion beam assisted deposition, plasma-enhanced chemical vapor deposition, high-density inductively coupled plasma source chemical vapor deposition, ion cluster beam deposition, metal-organic chemical vapor deposition, catalytic chemical vapor deposition, laser pulse deposition, pulsed plasma method, pulsed laser method, electron beam evaporation, sol-gel method, inkjet printing (IJP), electroplating, etc., and this application does not limit the specific methods used.

[0067] Specifically, the thin film encapsulation layer 14 has a three-layer alternating structure of inorganic layer / organic layer / inorganic layer, which can be deposited by chemical vapor deposition (CVD), sputter, atomic layer deposition (ALD), vacuum evaporation, IJP and other methods.

[0068] Specifically, an insulating layer 151 and a touch metal line 152 are prepared on top of the thin film layer by means of physical vapor deposition (PVD) or chemical vapor deposition (CVD).

[0069] S3: A first black matrix 16 of uneven thickness is formed on the touch layer 15 in the functional additional area 20 of the display panel by a halftone photomask process. The first black matrix 16 includes a first main body 51 and a first overlapping part 52 located on both sides of the first main body 51. The thickness of the first main body 51 is less than the thickness of the first overlapping part 52.

[0070] A method for forming the first black matrix 16 of Embodiment 1 includes the following steps:

[0071] S311: A first light-shielding layer 31 is formed on the touch layer 15, such as Figure 5A As shown.

[0072] S312: The first black matrix 16, having the first main body 51 and the first overlapping portion 52, is formed using a halftone photomask process, such as... Figure 5B .

[0073] Specifically, the first light-shielding layer 31 is exposed and developed using the first photomask 41 to form the first main body 51, the first overlapping portion 52 located on both sides of the first main body 51, and the second opening 62 located between the adjacent black matrix 16. The first photomask 41 includes a fully transparent area A, a fully semi-transparent area B, and an opaque area C. The light transmittance of the fully transparent area A is 100%, and the first light-shielding layer 31 located in the fully transparent area A is completely retained, thus forming the first overlapping portion 52; the light transmittance of the fully semi-transparent area B is 30% to 50%, and the fully semi-transparent area B corresponds to the first main body portion 51. This area retains a light-shielding pattern with an initial thickness of 30% to 50% of the first light-shielding layer 31 to form the first main body portion 51. The first main body portion 51 improves the optical transmittance of the functional additional area 20 while also taking into account the screen-off hue of the display panel; the light transmittance of the opaque area C is 0%, and the opaque area corresponds to the second opening 62. The first light-shielding layer 31 located in the opaque area is completely developed and etched, and the light emitted by the light-emitting functional layer 13 is emitted through the second opening 62.

[0074] A method for forming the first black matrix 16 of Embodiment 2 includes the following steps:

[0075] S321: A second light-shielding layer 32 is formed on the touch layer 15, such as... Figure 6A .

[0076] S322: The first sublayer 161 is formed using a halftone photomask process, such as... Figure 6B As shown, the second light-shielding layer 32 is exposed and developed using a second photomask 42 to form a grid-distributed dam structure 160, and a first opening 61 and a second opening 62 between the dams. The second photomask 42 includes a fully transparent area A and an opaque area C. The fully transparent area A corresponds to the dam structure 160 in the first sublayer 161, and the second light-shielding layer 32 located in this area is fully preserved. The opaque area C corresponds to the first opening 61 and the second opening 62, and the second light-shielding layer 32 located in this area is fully developed and etched.

[0077] S323: A third light-shielding layer 33 is formed on the first sub-layer 161, such as Figure 6C .

[0078] S324: The second sublayer 162 is formed using a halftone photomask process, such as... Figure 6DAs shown, the third light-shielding layer 33 is exposed and developed using a third photomask 43 to obtain a second sub-layer 162 with multiple second openings 62. The third photomask 43 includes a fully transparent area A and an opaque area C. The fully transparent area A corresponds to the dam structure 160 and the first opening 61. The third light-shielding layer 33 located in this area is completely retained to form the second sub-layer 162. The second sub-layer 162 located within the first opening 61 forms the first main body 51. The dam structure 160 and the second sub-layer 162 covering the dam structure 160 form the first overlapping part 52. The opaque area C corresponds to the second opening 62. The third light-shielding layer 33 located in this area is completely developed and etched. The light emitted by the light-emitting functional layer 13 is emitted from the second opening 62 in this area.

[0079] S4: Form color resist units 17 one by one between the first black matrix 16, such as Figures 5C to 5E As shown, Figures 6E to 6G As shown.

[0080] Specifically, color resist units 17 are formed one by one in the second opening 62. A red color resist is aligned and formed above the red sub-pixel using a photomask, a green color resist is aligned and formed above the green sub-pixel using a photomask, and a blue color resist is aligned and formed above the blue sub-pixel using a photomask.

[0081] The color filter unit 17 and the first black matrix 16 form a color filter layer 19.

[0082] S5: A PAS layer 18 is formed on the color filter layer 19, such as Figure 5F , Figure 6H As shown.

[0083] Specifically, the material of the PAS layer 18 includes, but is not limited to, organic photoresist, such as low-temperature OC.

[0084] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0085] The beneficial effects of the embodiments of this application are as follows: This application provides a display panel and a method for manufacturing the same. The display panel includes a functional additional area, in which an array substrate, a light-emitting functional layer, a thin film encapsulation layer, and a color filter layer are stacked. The color filter layer includes a first black matrix and color resist units located between the first black matrix. The first black matrix includes a first main body and first overlapping portions located on both sides of the first main body. The first overlapping portions and the color resist units have overlapping portions. By making the thickness of the first main body less than the thickness of the first overlapping portions, the OD value of the first black matrix located in the fingerprint recognition optical path is reduced, thereby increasing the optical transmittance of the functional additional area. At the same time, the first black matrix can also take into account the screen-off hue of the display panel.

[0086] The above description of the embodiments is only for the purpose of helping to understand the technical solutions and core ideas of this application; those skilled in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or make equivalent substitutions for some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A display panel, characterized in that, The display panel includes a functional supplementary area for fingerprint recognition; wherein, the functional supplementary area is provided with: Array substrate; A light-emitting functional layer is located above the array substrate; A thin-film encapsulation layer is located above the light-emitting functional layer; A color filter layer is located above the thin film encapsulation layer, and the color filter layer includes a first black matrix and color resist units located between the first black matrix; The first black matrix includes a first main body and first overlapping portions located on both sides of the first main body. The first overlapping portions and the color resist unit have overlapping portions. The thickness of the first main body is less than the thickness of the first overlapping portions. The thickness of the first main body is 30% to 50% of the thickness of the first overlapping portions.

2. The display panel as described in claim 1, characterized in that, The first black matrix includes a first sub-layer, which includes grid-distributed dam structures, with a first opening defining the space between adjacent dam structures; A second sub-layer, which covers the dam structure and the first opening; The second sub-layer located within the first opening forms the first main body, and the dam structure and the second sub-layer covering the dam structure form the first overlapping part.

3. The display panel as described in claim 1, characterized in that, The first black matrix includes a first sub-layer, which includes grid-distributed dam structures, with a first opening defining the space between adjacent dam structures; The second sub-layer is located within the first opening; The second sub-layer forms the first main body, and the dam structure forms the first overlapping part.

4. The display panel as described in claim 2 or 3, characterized in that, The first sublayer and the second sublayer are made of different materials, and the light transmittance of the second sublayer is greater than that of the first sublayer.

5. The display panel as described in claim 1, characterized in that, The display panel includes a main display area located outside the additional functional area, and a second black matrix is ​​provided in the main display area; The thickness of the second black matrix is ​​equal to the thickness of the first overlapping portion.

6. The display panel as described in claim 1, characterized in that, The width of the first overlapping portion is greater than or equal to 2 μm.

7. The display panel as described in claim 1, characterized in that, The display panel further includes a touch layer, which is located between the thin film encapsulation layer and the color filter layer, and the touch metal lines of the touch layer correspond to the first main body portion.

8. The display panel as described in claim 1, characterized in that, The display panel includes a fingerprint recognition sensor, which is located below the array substrate or integrated within the array substrate.

9. A method for manufacturing a display panel, characterized in that, include: Provide an array substrate; A light-emitting functional layer and a thin-film encapsulation layer are formed on the array substrate in a stacked manner; A first black matrix of uneven thickness is formed on the thin film encapsulation layer within the functional additional area of ​​the display panel using a halftone photomask process. The functional additional area is used for fingerprint recognition. The first black matrix includes a first main body and first overlapping portions located on both sides of the first main body. The thickness of the first main body is less than the thickness of the first overlapping portions, and the thickness of the first main body is 30% to 50% of the thickness of the first overlapping portions. Color resist units are formed between the first black matrix, and the color resist units and the first black matrix form a color filter layer.

Images