Composition for preparing low dielectric constant glass, low dielectric constant glass, preparation method and application thereof

Abstract

The present application provides a composition for preparing low-dielectric-constant glass, low-dielectric-constant glass, and its preparation method and application, relating to the field of low-dielectric-constant glass technology. The composition includes SiO2, Al2O3, B2O3, MgO, CaO, BaO, Li2O, Na2O, Ag2O, Ce2O3, and a clarifier, wherein the clarifier includes at least one of sulfate, fluoride, nitrate, halide, tin oxide, and stannous oxide. The present application reduces the dielectric constant of the glass by precisely controlling the ratio of the above composition, thereby reducing signal attenuation and improving transmission quality and distance. Simultaneously, the hardness and Young's modulus of the glass are increased, thereby improving the strength and wear resistance of the glass.

Description

Technical Field

[0001] The present invention relates to the technical field of low dielectric constant glass, and in particular to a composition for preparing low dielectric constant glass, low dielectric constant glass, and a preparation method and application thereof. Background Art

[0002] 5G communications technology, an advanced technology with higher signal frequencies, faster information transmission speeds, and more stable signal transmission and reception, is gradually changing people's lives. 5G signals transmit at high speeds and high frequencies, but with poor signal penetration, they require transmission media materials with low dielectric constants and signal attenuation. Traditional glass substrates no longer meet these requirements. Low-dielectric glass has a wide range of applications in the 5G information industry, such as in semiconductor packaging, MEMS, and IC packaging.

[0003] Patent CN101012105B discloses a low dielectric constant glass: SiO2: 50-60%; Al2O3: 6-9.5%; B2O3: 30.5-35%; CaO: 0-5%; MgO: 0-5%; ZnO: 0.5-5%; TiO2: 0.5-3%; Na2O: 0-1.5%; K2O: 0-1.5%; LiO: 0-1.5%; the B2O3 content in the glass is too high, volatilizing severely during production and use, resulting in poor component uniformity and poor water resistance.

[0004] CN 110139841 A discloses a low-dielectric glass frit comprising: SiO2: 45.0-58.0w%; B2O3: 18.0-26.0w%; Al2O3: 16.0-23.0w%; P2O5: 0.25-12.0w%; CaO: 0.25-5.00w%; CaO+MgO: 0.25w% and less than 5.00w%; Fe2O3: less than 0.80w%; and TiO2: less than 0.50w%. The glass has a T3 forming temperature (the temperature at which the viscosity reaches 1000 poise) as high as 1354-1456°C, making it unsuitable for efficient continuous production in a tank furnace.

[0005] Patent CN 113544102 A discloses a glass substrate for 5G high-frequency devices. The weight percentages of the components are as follows: SiO2: 50-72%; Al2O3: 0-22%; B2O3: 15-38%; Li2O+Na2O+K2O: 0%-3%; MgO+CaO+SrO+BaO: 0%-12%. However, the excessive SiO2 and B2O3 content results in a Young's modulus of less than 50 GPa, making it difficult to meet the rigidity requirements of large panels in subsequent manufacturing processes.

[0006] Low-dielectric glass is a high-silicon, high-boron glass with low alkali and alkaline earth metal content. This results in high viscosity and difficulty in clarifying and homogenizing the glass. Furthermore, the low-dielectric glass used in 5G environments is thin and requires high quality cutting, leading to low efficiency when using laser cutting. Summary of the Invention

[0007] In order to solve the technical problems in the prior art such as high dielectric constant of glass and signal delay and attenuation under high-frequency and high-speed conditions, the present invention provides a composition for preparing low dielectric constant glass.

[0008] In a first aspect, the present application provides a composition for preparing a low dielectric constant glass, comprising the following components in weight percentage: 61-68% SiO2, 1-10% Al2O3, 15-28% B2O3, 0.5-5% MgO, 0.5-5% CaO, 0.01-5% BaO, 0.01-3% Li2O, 0.05-3% Na2O, 0.01-0.2% Ag2O, 0.05-0.5% Ce2O3, and 0.01-0.5% of a clarifier, wherein the clarifier comprises at least one of sulfate, fluoride, nitrate, halide, tin oxide, and stannous oxide;

[0009] Define K1=(mass percentage of Ag2O / mass percentage of BaO), and K1 is 0.01-1;

[0010] Define K2 = (mass percentage of Ag2O / mass percentage of Ce2O3), and K2 is 0.01-1;

[0011] Define K3=(mass percentage of Ag2O / mass percentage of Li2O), and K3 is 0.01-1.

[0012] The proportion of the above-mentioned composition is precisely controlled and contains an appropriate amount of silicon-oxygen tetrahedral structural units (SiO2) and boron-oxygen tetrahedral structural units (B2O3), which can form an irregular continuous network and a tight frame structure, thereby reducing the dielectric constant of the glass. By controlling the content of silicon-oxygen tetrahedral structural units (SiO2) and boron-oxygen tetrahedral structural units (B2O3) in the glass, the absorption and attenuation of electromagnetic signals in the glass material can be reduced. This is very important for signal transmission in optical fiber communications and high-frequency circuit transmission in electronic devices. Glass materials with low dielectric constants can reduce signal attenuation and improve transmission quality and distance. Further, by adding an appropriate amount of aluminum oxide (Al2O3), the hardness and Young's modulus of the glass can be increased, thereby improving the strength and wear resistance of the glass. The appropriate addition of alkaline earth metal oxides (MgO, CaO, BaO) and alkali metal oxides (Li2O, Na2O) can reduce the high-temperature viscosity of glass, thereby lowering its melting point and improving its solubility and formability. Furthermore, their addition can enhance the glass's water resistance and chemical stability, allowing it to maintain stability under various environmental conditions. The addition of variable-valence transition metal oxides (Ce2O3) and clarifiers can alter the glass's optical properties, such as reflectivity, transmittance, and refractive index. This helps adjust the glass's optical performance to suit diverse applications.

[0013] The specific selection of the clarifier is not particularly limited in this application, and can be various commonly used options in the art, for example, the sulfate can be sodium sulfate, the nitrate can be sodium nitrate and / or potassium nitrate, the chloride can be sodium chloride and / or strontium chloride, and the fluoride can be calcium fluoride.

[0014] In some embodiments of the present application, the composition includes the following components in weight percentage: 62-66% SiO2, 3-8% Al2O3, 18-25% B2O3, 1-4% MgO, 1-4% CaO, 0.05-3% BaO, 0.05-2% Li2O, 0.05-2% Na2O, 0.01-0.15% Ag2O, 0.1-0.4% Ce2O3, and 0.05-0.3% clarifier.

[0015] In some embodiments of the present application, K1 is 0.01-0.6; and / or, K2 is 0.01-0.6; and / or, K3 is 0.01-0.6.

[0016] In a second aspect, the present application provides a method for preparing low dielectric constant glass, using the above-mentioned composition as a preparation raw material. The method for preparing the low dielectric constant glass includes: screening the components in the composition and then contacting and mixing them to obtain a mixed material; and sequentially melting and molding the mixed material to obtain the low dielectric constant glass.

[0017] This preparation method can solve the problems of low dielectric constant glass, such as high viscosity, difficulty in clarification, high volatility and uneven composition.

[0018] In some embodiments of the present application, the melting process includes: using a tank furnace for melting, controlling the top temperature of the furnace to 1300-1550°C; the temperature of the molten glass within the furnace to 1500-1590°C; and the bottom temperature of the furnace to 1560-1620°C. The tank furnace melting process allows for glass melting in a controlled environment. By adjusting the furnace temperature and hotspot location, the stability and uniformity of the molten glass can be ensured. Furthermore, by reducing the volatilization of B2O3 and the consumption of fining agents, the stability of the glass composition is ensured.

[0019] In some embodiments of the present application, the temperature at the top of the pool furnace is 1520-1525°C.

[0020] In some embodiments of the present application, the above-mentioned melting process further includes: providing a pipeline at the passage of the molten glass to guide the molten glass to the equipment for forming process.

[0021] In some embodiments of the present application, a stirring device is provided in the pipeline, and the stirring speed is controlled to be 12-30 r / min.

[0022] By setting up a stirring device and adjusting the stirring rod speed to 12-30r / min, the temperature and composition of the glass liquid can be evenly mixed, and the small uneven parts in the glass liquid can be further diffused, thereby making the average time before the glass is formed more stable, which is conducive to the uniform forming and quality control of the glass. By designing the path length and adjusting the flow rate, the average time before the glass liquid is formed is ensured, and the glass liquid is in a laminar state, which reduces disturbances and unevenness and is conducive to the uniform and stable forming of the glass.

[0023] In some embodiments of the present application, the molding process includes: when the glass thickness is greater than 1 mm, using the float method or the rolling method to mold; and / or, when the glass thickness is 0.3-1 mm, using the overflow method to mold; and / or, when the glass thickness is less than 0.2 mm, using the multi-stage drawing method to mold.

[0024] In some embodiments of the present application, the mesh number of the sieve is 50-80. Passing through a 50-80 mesh sieve helps to improve the stability of the raw material particle size, thereby facilitating uniform mixing and reducing the difficulty of melting.

[0025] In a third aspect, the present application provides a low dielectric constant glass produced by the above-mentioned preparation method.

[0026] In a fourth aspect, the present application provides an application of the above-mentioned composition or the above-mentioned low dielectric constant glass in the field of 5G communication technology. DETAILED DESCRIPTION

[0027] In order to make the purpose, technical solutions and advantages of the present invention clearer, the technical solutions of the present invention will be clearly and completely described below.

[0028] If the specific conditions are not specified in the examples, the experiments were carried out under conventional conditions or those recommended by the manufacturer. All reagents or instruments used, if the manufacturer is not specified, are commercially available conventional products.

[0029] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments may be combined with each other.

[0030] The present invention provides a composition for preparing a low dielectric constant glass, comprising the following components in weight percentage: 61-68% SiO2, 1-10% Al2O3, 15-28% B2O3, 0.5-5% MgO, 0.5-5% CaO, 0.01-5% BaO, 0.01-3% Li2O, 0.05-3% Na2O, 0.01-0.2% Ag2O, 0.05-0.5% Ce2O3, 0.01 ~0.5% of a clarifier, the clarifier comprising one or more of SnO2, F element, Cl element and S element; wherein, K1 is defined as (mass percentage of Ag2O / mass percentage of BaO), and K1 is 0.01-1; K2 is defined as (mass percentage of Ag2O / mass percentage of Ce2O3), and K2 is 0.01-1; K3 is defined as (mass percentage of Ag2O / mass percentage of Li2O), and K3 is 0.01-1.

[0031] In the above-mentioned composition, SiO2 is a glass-forming oxide, forming an irregular continuous network of silicon-oxygen tetrahedral structural units, which serves as the glass's skeleton. When the SiO2 content is too low, the integrity of the glass network is compromised, foreign ions migrate more easily within the glass, and ion displacement polarization and orientation polarization of polar bonds increase, resulting in electromagnetic signal absorption and a consequent decrease in electromagnetic wave transmittance. This also reduces the glass's strength and chemical stability. When the SiO2 content is too high, the glass becomes difficult to melt, exhibits high viscosity, is difficult to clarify and homogenize, and increases production costs. Therefore, the SiO2 content of the present invention is limited to between 61% and 68%.

[0032] B2O3 is also a glass-forming oxide. Its boron oxide tetrahedrons [BO4] form a dense framework, effectively reducing the absorption and attenuation of electromagnetic signals passing through the glass substrate. However, if the B2O3 content continues to increase, the glass lacks sufficient free oxygen, increasing the number of layered boron oxide triangles [BO3] and decreasing the content of boron oxide tetrahedrons [BO4]. This results in a loose glass network and chemical instability. Excessive boron oxide content also increases volatilization and can easily lead to uneven glass composition. Therefore, the B2O3 content in the present invention is limited to between 15% and 28%.

[0033] Al2O3 is an intermediate oxide. Aluminum oxide can reduce the crystallization tendency of glass and increase its hardness and Young's modulus. Because aluminum oxide tetrahedra are more stable than boron oxide tetrahedra, aluminum ions in glass structural units preferentially acquire free oxygen to form aluminum oxide tetrahedra. Excess free oxygen then reacts with boron oxide triangles to transform into boron oxide tetrahedra. Therefore, the aluminum oxide content cannot be too high. In the present invention, the aluminum oxide content is limited to between 1 and 10%.

[0034] In the composition of this application, MgO, CaO, and BaO are all alkaline earth metal oxides. Their addition can effectively reduce the high-temperature viscosity of the glass, thereby improving the glass's meltability and formability, facilitating manufacturing, and contributing to improved water resistance and chemical stability. However, excessive amounts of these oxides can lead to glass network fractures and deteriorate dielectric properties. Therefore, in this application, the MgO content is limited to between 0.5% and 5%, the CaO content is limited to between 0.5% and 5%, and the BaO content is limited to between 0.01% and 5%.

[0035] Li2O and Na2O are alkali metal oxides. Their addition is beneficial to improving the melting and forming characteristics of glass and lowering the liquidus temperature of glass. In this application, Li2O is used together with Ag2O and Ce2O3. During the laser processing, tiny crystalline phases can be formed at the processing position, slowing down the formation and expansion of microcracks during the processing. However, too high an alkali metal oxide content will lead to a loose glass structure, and the dielectric constant and dielectric loss of the glass will increase. Therefore, the Li2O content in this application is limited to between 0.01 and 3%, and the Na2O content is limited to between 0.05 and 3%.

[0036] Ce2O3 is a variable-valence transition metal oxide. Under laser-induced conditions, it undergoes a redox reaction with Ag2O, altering the properties of the glass at the irradiation location. This reduces the transmission and loss of laser energy, facilitating efficient glass processing. It also forms a lithium silicate microcrystalline phase, mitigating cracking at the processing location. However, excessive Ce2O3 content increases the liquidus temperature and degrades dielectric properties. This application uses 0.01-0.2% Ag2O and 0.05-0.5% Ce2O3.

[0037] Sulfates, fluorides, nitrates, halides, tin oxide, and stannous oxide are added to clarifiers to reduce bubble defects in glass products. However, in order to reduce glass coloration, crystallization, and cost, the glass product should not contain too many clarifier elements. Therefore, the total content of the clarifier in this application is controlled at 0.01-0.5%.

[0038] In this application, the range of K1 is limited in order to control the ratio of Ag2O and BaO, improve the laser cutting yield, and avoid the deterioration of dielectric properties. The range of K2 is limited in order to control the ratio of Ag2O and Ce2O3, reduce the transmission and loss of laser, and improve processing efficiency; the range of K3 is limited in order to control the ratio of Ag2O and Li2O, control the content of lithium silicate crystal phase, improve the laser cutting yield, and avoid the deterioration of dielectric properties.

[0039] The present invention also provides a low dielectric constant glass, and a method for preparing the glass includes the following steps:

[0040] (1) The components of the above composition are passed through a 50-80 mesh sieve and then mixed, and then added to a tank furnace via a screw feeder; the upper space of the tank furnace is heated by a natural gas flame, which can effectively control the temperature and heat distribution in the furnace, and the temperature hotspot is controlled at 1520-1525°C; the glass liquid in the tank furnace is heated by a tin oxide electrode, and the hotspot temperature at the bottom of the tank furnace is controlled at 1575-1585°C. The daily melting capacity of the tank furnace is 1-20 tons / day, and preferably 5-15 tons / day.

[0041] The tank furnace melting process allows glass to be melted in a controlled environment. By adjusting the melting volume, furnace temperature, and hotspot location, the stability and uniformity of the molten glass can be ensured. Furthermore, by reducing B2O3 volatilization and clarifier consumption, the stability of the glass composition is guaranteed.

[0042] During the melting process, by adjusting the oxygen and fuel ingredients, the oxygen content in the flue gas emissions in the pool furnace is lower than 2%, so that a reducing atmosphere or a neutral atmosphere is maintained at the upper liquid surface of the pool furnace, which is beneficial to the quality stability of the glass liquid and the improvement of the molding quality.

[0043] (2) Set up corresponding pipes at the passage of glass liquid to guide the molten glass liquid to the equipment for molding treatment, set up a stirring device in the pipe, and control the stirring speed to 12-30r / min

[0044] By installing a stirring device in the pipeline and adjusting the speed of the stirring rod, the temperature and composition of the glass liquid can be evenly mixed. This ensures an average time of 20-50 minutes before the glass liquid is formed, and makes the glass liquid laminar, reducing disturbances and unevenness, which is conducive to uniform and stable glass forming.

[0045] Furthermore, ion chromatography is used to detect and monitor the content of trace elements in finished glass products. If a deviation in composition is found, the cause is investigated and the content and performance of trace elements in the glass are stabilized through fine-tuning of the composition, adjustment of the melting process, or a combination of the two.

[0046] In the embodiments of the present application, glass products with a thickness of 1 mm or more are formed using the float or rolling method; glass products with a thickness between 0.3 and 1 mm are formed using the overflow method; and glass products with a thickness below 0.2 mm are formed using the multi-stage drawing method. The float and rolling methods are two commonly used glass manufacturing methods suitable for producing glass with a thickness greater than 1 mm. In the float method, after the glass raw materials are melted, a continuous glass ribbon is formed on the surface of the molten metal. The ribbon of glass then floats on the molten metal pool to form a uniform glass sheet. In the rolling method, after the glass raw materials are heated and softened at high temperature, they are rolled to the desired thickness by methods such as rolling, and then cooled and solidified to form a glass sheet. The overflow method is a forming method used to produce glass with a thickness of 0.3 to 1 mm. In the overflow method, the glass raw materials are melted and placed in a molten pool. The temperature and viscosity of the molten pool are then adjusted to allow the glass raw materials to overflow from the pool. After cooling and solidification, the glass sheets are formed. The multi-stage drawing method is a forming method used to produce glass with a thickness of less than 0.2mm. In the multi-stage drawing method, the glass raw material is melted and then continuously drawn and cooled. The drawing machine gradually reduces the thickness of the glass to form a glass film of the desired thickness.

[0047] The present application will be described in detail below with reference to specific embodiments.

[0048] Examples 1-10

[0049] According to the component contents in Table 1, the corresponding raw material particles were passed through a 50-mesh sieve and then added to the tank furnace via a screw feeder for melting. The upper space of the tank furnace was heated by a natural gas flame, with a hot spot temperature of 1520-1525°C. The molten glass in the tank furnace was heated using tin oxide electrodes, with a temperature of 1560-1570°C and a hot spot temperature of 1575-1585°C at the bottom of the tank furnace. A pipe was installed in the glass liquid passage, and a stirring device was installed in the pipe. The stirring rod speed was controlled at 20 r / min.

[0050] Example 11

[0051] This embodiment is basically the same as Example 1, except that: the melting temperature is different, the upper space of the pool furnace is heated by a natural gas flame, and the temperature is 1595-1605°C; the glass liquid in the pool furnace is heated by a tin oxide electrode, the temperature of the glass liquid in the pool furnace is 1500-1510, and the temperature of the bottom of the pool furnace is 1540-1545°C.

[0052] Example 12

[0053] This embodiment is basically the same as embodiment 1, except that no stirring device is provided, that is, no stirring process is performed.

[0054] Comparative Example 1:

[0055] This comparative example is basically the same as Example 1, except that Ag2O and Ce2O3 are not added. The composition and ratio of the composition are shown in Table 1.

[0056] Comparative Example 2:

[0057] This comparative example is basically the same as Example 1, except that Ag2O, Ce2O3, BaO and Na2O are not added; the composition and ratio of the composition are shown in Table 1.

[0058] Comparative Example 3:

[0059] This comparative example is basically the same as Example 1, except that Ag2O, Ce2O3, BaO and Li2O are not added; the composition and ratio of the composition are detailed in Table 1.

[0060] Table 1

[0061]

[0062]

[0063] Table 1 (Continued)

[0064]

[0065] Table 1 (Continued)

[0066]

[0067] Test example

[0068] The glasses prepared in Examples 1-12 and Comparative Examples 1-3 were subjected to performance tests, including dielectric constant, signal attenuation, T3 temperature, liquidus temperature TL, expansion coefficient, Young's modulus, glass bubble rate, laser cutting yield, and average density difference. The specific test results are shown in Table 2.

[0069] The specific test methods are as follows:

[0070] (1) Dielectric constant and dielectric loss: According to the test method in ASTM-D150, the glass is sliced, ground and polished, and then its dielectric constant is tested.

[0071] (2) The sample was made into a glass sheet with a size of 7 mm × 4 mm × 2 mm and a surface roughness of less than 3 μm. The intensity of the signal before and after passing through the sample was tested using a known vector network analyzer, and the attenuation of the signal passing through the sample was calculated.

[0072] (3) T3 temperature: The temperature at which the viscosity reaches 1000 poise. The test method refers to the test method in ASTM C-965 to measure the high temperature viscosity of glass.

[0073] (4) Liquidus temperature TL: The liquidus temperature of the glass is determined by the gradient furnace method in ASTM C-829.

[0074] (5) Expansion coefficient test: Refer to GB / T 16920-2015 to test the expansion coefficient of the sample.

[0075] (6) The Young's modulus of the sample was tested using the pulse excitation method.

[0076] (7) Glass bubble rate: When producing 1350mm*1160mm*0.5mm products, continuously extract 1000 glass plates and count the number of bubbles larger than 0.1mm. After conversion, calculate the average number of bubbles per kilogram of glass.

[0077] (8) Laser cutting yield: Using a picosecond laser cutting device with a laser power set to 30W, a glass sheet with a thickness of 0.1 mm is continuously cut with a straight knife without applying any external force. The percentage of glass that automatically disengages along the set cutting trajectory.

[0078] (9) Average density difference: Randomly select 15 glass sheets within 1 hour and measure the average density of the sample and the density deviation of the standard sample.

[0079] Table 2

[0080]

[0081] Table 2 (Continued)

[0082]

[0083] Table 2 (Continued)

[0084]

[0085]

[0086] As can be seen in Table 2, a comparison of Examples 1 and 11 reveals that an inappropriate melting process rapidly increases the bubble rate in the glass. A comparison of Examples 1 and 12 reveals that the lack of a stirring step results in uneven melting of the samples, leading to a larger average density difference. In Comparative Example 1, the absence of Ag2O and Ce2O3 reduces the cutting yield of the sample.

[0087] It should be noted that the embodiments described above are only used to explain the present application and do not constitute any limitation to the present application. The present application has been described with reference to typical embodiments, but it should be understood that the words used therein are descriptive and explanatory words, rather than restrictive words. The present application may be modified as specified within the scope of the claims of the present application, and the present application may be revised without departing from the scope and spirit of the present application. Although the present application described therein relates to specific methods, materials and embodiments, it does not mean that the present application is limited to the specific examples disclosed therein. On the contrary, the present application can be extended to all other methods and applications with the same function.

Claims

1. A composition for preparing low dielectric constant glass, characterized in that: It includes the following components in weight percentage: 61-68% SiO2, 1-10% Al2O3, 15-28% B2O3, 0.5-5% MgO, 0.5-5% CaO, 0.01-5% BaO, 0.01-3% Li2O, 0.05-3% Na2O, 0.01-0.2% Ag2O, 0.05-0.5% Ce2O3, and 0.01-0.5% of a clarifier, wherein the clarifier comprises at least one of sulfate, fluoride, nitrate, halide, tin oxide, and stannous oxide; The Ag2O and Ce2O3 are used to induce crystal phase formation during the laser cutting process to inhibit microcrack propagation, and satisfy the following ratio relationship: Define K1=(mass percentage of Ag2O / mass percentage of BaO), and K1 is 0.01-0.6; Define K2 = (mass percentage of Ag2O / mass percentage of Ce2O3), and K2 is 0.01-0.6; Define K3 = (mass percentage of Ag2O / mass percentage of Li2O), and K3 is 0.01-0.

6.

2. The composition according to claim 1, characterized in that It includes the following components in weight percentage: 62-66% SiO2, 3-8% Al2O3, 18-25% B2O3, 1-4% MgO, 1-4% CaO, 0.05-3% BaO, 0.05-2% Li2O, 0.05-2% Na2O, 0.01-0.15% Ag2O, 0.1-0.4% Ce2O3, 0.05-0.3% clarifier.

3. A method for preparing low dielectric constant glass, characterized in that: Using the composition according to claim 1 or 2 as a preparation raw material, the preparation method comprises: The components in the composition are screened and then contacted and mixed to obtain a mixed material; the mixed material is sequentially melted and formed to obtain the low dielectric constant glass.

4. The preparation method according to claim 3, characterized in that The melting process includes: using a pool furnace for melting, controlling the temperature of the top of the pool furnace to be 1300-1550°C; the temperature of the glass liquid in the pool furnace to be 1500-1590°C; and the temperature of the bottom of the pool furnace to be 1560-1620°C.

5. The preparation method according to claim 4, characterized in that The temperature at the top of the pool furnace is 1520-1525°C.

6. The preparation method according to claim 5, characterized in that The melting process further includes: providing a pipe at the passage of the molten glass to guide the molten glass to the equipment for performing the molding process.

7. The preparation method according to claim 6, characterized in that A stirring device is provided in the pipeline, and the stirring speed is controlled to be 12-30 r / min.

8. The preparation method according to any one of claims 3 to 7, characterized in that The molding process includes: When the glass thickness is greater than 1 mm, the glass is formed by the float process or the calendering process; and / or, when the glass has a thickness of 0.3-1 mm, an overflow molding method is used; And / or, when the glass is produced with a thickness less than 0.2 mm, a multi-stage drawing method is used for forming.

9. The preparation method according to any one of claims 3 to 7, characterized in that The mesh number of the sieve is 50-80.

10. A low dielectric constant glass obtained by the method according to any one of claims 3 to 9.

11. Use of the composition according to claim 1 or 2 or the low dielectric constant glass according to claim 10 in the field of 5G communication technology.

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