Vapor deposition apparatus

Abstract

The application provides a kind of gas deposition equipment, by setting reaction cavity and being arranged in reaction cavity and being loaded with substrate support unit's bearing device;Bearing device is equipped with bottom opening inner cavity, outer cavity surrounded in inner cavity, and at least 2 gas guide channels surrounded in inner cavity;Gas driving device is suspended in inner cavity, and the bottom of substrate support unit is rotationally connected to the top of gas driving device;Bearing device is also equipped with gas inlet channel communicated with outer cavity;At least 2 gas guide channels are communicated with outer cavity, communicated with inner cavity through inner cavity side wall and configured to provide rotating gas flow to inner cavity to drive gas driving device to rotate, which prolongs the gas path of driving gas escaping upward, and most of the driving gas can be discharged from the bottom opening of inner cavity after driving gas driving device to rotate, so as to reduce or prevent the influence of upward escape of driving gas on film forming uniformity.

Description

Technical Field

[0001] This invention relates to the field of semiconductors, and more particularly to vapor deposition equipment. Background Technology

[0002] Chemical vapor deposition (CVD) is a process that uses gas-phase chemical reactions to deposit solid thin films onto a substrate surface. Some CVD deposition processes, such as metal-organic chemical vapor deposition (MOCVD), require controlled epitaxial growth of the film and have high requirements for film uniformity.

[0003] Reference Figure 1 In the deposition chamber 10, a substrate carrier 20 is provided with a substrate tray 30. Reactive gas ejected from the top of the deposition chamber 10 flows towards each substrate 40, forming a laminar flow to achieve vapor phase deposition. Due to gas diffusion, the gas exhibits a significant concentration gradient from the center to the edge after ejection, thus affecting film uniformity. This effect is particularly pronounced when the substrate 40 is large. To reduce the impact of reactive gas concentration on uniformity, existing technologies design the substrate tray 30 to rotate via gas drive, thereby homogenizing the gas flow field above the substrate 40.

[0004] However, during the gas-driven process, the substrate disk 30 is suspended above the carrier 20, which makes it easy for the driving gas to be discharged between the substrate disk 30 and the carrier 20. This can affect the gas flow field above the substrate 40 and thus affect the film uniformity. Summary of the Invention

[0005] The purpose of this invention is to provide a vapor deposition apparatus that can uniformly flow the gas field above the substrate and reduce or prevent the influence of the driving gas on the film uniformity.

[0006] The vapor deposition apparatus provided by the present invention includes:

[0007] The reaction chamber and the support device disposed in the reaction chamber and loaded with the substrate support unit;

[0008] The bearing device is provided with an inner cavity with a bottom opening, an outer cavity surrounding the inner cavity, and at least two airflow channels surrounding the inner cavity;

[0009] A pneumatic drive device is suspended inside the inner cavity, and the top of the pneumatic drive device is rotatably connected to the bottom of the substrate support unit.

[0010] The supporting device is also provided with an air intake channel communicating with the outer cavity;

[0011] The at least two airflow channels connect to the outer cavity and communicate with the inner cavity through the side wall of the inner cavity to provide rotating airflow into the inner cavity to drive the air drive device to rotate.

[0012] The beneficial effects of the vapor deposition apparatus of the present invention are as follows: the support device is provided with a bottom-opening inner cavity, an outer cavity surrounding the inner cavity, and at least two airflow channels surrounding the inner cavity; a gas-driven device is suspended in the inner cavity, and the top of the gas-driven device is rotatably connected to the bottom of the substrate support unit; the support device is also provided with an inlet airflow channel communicating with the outer cavity; the at least two airflow channels communicate with the outer cavity, and are connected to the inner cavity via the side wall of the inner cavity and configured to provide rotating airflow into the inner cavity to drive the gas-driven device to rotate. This means that the driving gas does not directly drive the substrate disk to rotate as in the prior art, but enters the inner cavity through the inlet airflow channel, the outer cavity, and at least two airflow channels and drives the gas-driven device to rotate, thereby driving the substrate support unit to rotate. This extends the upward escape path of the driving gas, and most of the driving gas can be discharged from the bottom opening of the inner cavity after driving the gas-driven device to rotate, thereby reducing or preventing the upward escape of the driving gas from affecting the film uniformity.

[0013] Optionally, the vapor deposition apparatus further includes a gas supply channel and a rotating device rotatably connected to the support device. One end of the gas supply channel extends within the rotating device and extends toward the inlet channel through the contact point between the rotating device and the support device, thus achieving interconnection.

[0014] Optionally, the rotating device includes a central rotating device rotatably connected to the middle part of the bearing device, or a side rotating device rotatably connected to the side of the bearing device.

[0015] Optionally, the vapor deposition apparatus further includes a supply gas channel connected to the inlet gas channel, and an inlet gas control device disposed in the supply gas channel.

[0016] Optionally, the vapor deposition apparatus further includes a bottom opening communicating with the inner cavity and an exhaust channel extending outside the reaction chamber.

[0017] Optionally, the vapor deposition apparatus may further include an exhaust control device disposed in the exhaust channel.

[0018] Optionally, the pneumatic drive device and the inner cavity are dynamically sealed or clearance-fitted.

[0019] Optionally, the supporting device includes a seat groove and a central support unit, the central support unit and the seat groove forming the inner cavity, the outer cavity and the airflow channel, and the central support unit and the substrate support unit having a clearance fit or auxiliary fit.

[0020] Optionally, at least one rolling element is movably embedded on the top surface of the central support unit, and the top of the rolling element is in contact with or has a gap with the bottom surface of the self-rotating seat to achieve the auxiliary engagement.

[0021] Optionally, at least a portion of the inner wall of the top of the seat groove is in contact with at least a portion of the inner wall of the top of the central support unit, so that the seat groove and the central support unit are relatively stationary.

[0022] Optionally, the air-driven device includes a blade structure suspended within the inner cavity across the bottom opening of the inner cavity.

[0023] Optionally, the bearing device includes a seat groove and a central support unit. The bottom surface of the central support unit is provided with a central closed groove, and the bottom surface of the seat groove is provided with an exhaust opening that communicates with the inside and outside. The bottom structure of the seat groove surrounding the exhaust opening and the central closed groove form the inner cavity.

[0024] Optionally, the supporting device includes a seat groove and a central support unit. The bottom outer diameter of the central support unit is smaller than the bottom inner diameter of the seat groove, and the bottom outer diameter of the central support unit is smaller than its top outer diameter. At least a portion of the bottom surface of the central support unit fits against a portion of the inner bottom surface of the seat groove to form the outer cavity.

[0025] Optionally, the supporting device includes a seat groove and a central support unit. The bottom surface of the central support unit or the inner bottom surface of the seat groove is provided with at least two channels extending radially around the inner cavity. At least a portion of the bottom surface of the central support unit is attached to a portion of the inner bottom surface of the seat groove and forms the at least two airflow channels.

[0026] Optionally, the bottom surface of the central support unit is provided with a closed groove and at least two channels opened around the closed groove, wherein the channels are through grooves.

[0027] Optionally, the bottom surface of the seat groove is provided with an exhaust opening for communication between the inside and outside, and at least two channels are provided around the exhaust opening, the channels being closed channels. Attached Figure Description

[0028] Figure 1 This is a schematic diagram of the working state of a deposition chamber in the prior art;

[0029] Figure 2This is a schematic diagram of the internal structure of a vapor deposition apparatus provided in an embodiment of the present invention;

[0030] Figure 3 for Figure 2 The diagram shows a top view of a vapor deposition apparatus. The dashed lines represent structures that are obscured, and the arrows indicate the direction of gas flow.

[0031] Figure 4 This is a schematic diagram of the structure of a central support unit provided in an embodiment of the present invention;

[0032] Figure 5 This is a schematic diagram of another central support unit provided in an embodiment of the present invention;

[0033] Figure 6 This is a schematic diagram of the structure of a substrate support unit provided in an embodiment of the present invention;

[0034] Figure 7 for Figure 6 A schematic diagram of the bottom structure;

[0035] Figure 8 This is a schematic diagram of the structure of the air-driven device provided in an embodiment of the present invention;

[0036] Figure 9 This is a schematic diagram of the internal structure of another vapor deposition apparatus provided in an embodiment of the present invention;

[0037] Figure 10 This is a schematic diagram of the assembly structure of a vapor deposition device and an edge rotating part provided in an embodiment of the present invention.

[0038] Explanation of reference numerals in the attached figures:

[0039] 10. Deposition chamber; 20. Carrier; 30. Slide tray; 40. Substrate;

[0040] 1. Supporting device; 2. Substrate support unit; 3. Airflow channel; 4. Air drive device; 5. Air inlet channel; 6. Inner cavity; 7. Outer cavity; 8. Edge rotating part;

[0041] 11. Seat groove; 12. Central support unit; 13. Stepped structure; 14. Exhaust opening; 15. Central area;

[0042] 41. Air drive shaft; 42. Blade; 43. Connecting part;

[0043] 111. Channel;

[0044] 121. Central closed groove; 122. Through groove; 123. Top opening;

[0045] 1221, First sidewall; 1222, Second sidewall. Detailed Implementation

[0046] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions in the embodiments of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without inventive effort are within the scope of protection of this invention. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by those skilled in the art. The terms "comprising" and similar expressions used herein mean that the element or object preceding the word covers the element or object listed following the word and its equivalents, but do not exclude other elements or objects.

[0047] This invention provides a vapor deposition apparatus, such as... Figure 2 and Figure 3 As shown, it includes: a reaction chamber (not shown) and a support device 1 disposed in the reaction chamber and loaded with a substrate support unit 2; the support device 1 has an inner cavity 6 with an exhaust opening 14, the exhaust opening 14 being located at the bottom of the inner cavity 6 to achieve a bottom opening; the support device 1 also has an outer cavity 7 surrounding the inner cavity 6, and at least two airflow channels 3 surrounding the inner cavity 6; a pneumatic drive device 4 is suspended in the inner cavity 6, the top of the pneumatic drive device 4 being rotatably connected to the bottom of the substrate support unit 2; the support device 1 also has an inlet airflow channel 5 communicating with the outer cavity 7; the at least two airflow channels 3 communicate with the outer cavity 7, and are connected to the inner cavity 6 via the side wall of the inner cavity 6 and configured to provide rotating airflow into the inner cavity 6 to drive the pneumatic drive device 4 to rotate.

[0048] In existing technologies, the substrate disk 30 is suspended within the carrier 20 by driving gas and rotated under the drive of a rotating airflow. However, to effectively rotate the substrate disk 30 and achieve uniform flow of the gas above the substrate 40, a gap is required between the substrate disk 30 and the carrier 20 to avoid affecting the rotation of the substrate disk 30. Furthermore, the gas flow rate between these gaps must reach a certain level to effectively drive the rotation. It is evident that the flow rate of the driving gas escaping upwards from between the carrier 20 and the substrate disk 30 is directly proportional to the driving effect and also directly proportional to the gap. The flow rate of the driving gas directly affects the gas flow field above the substrate 40 supported by the substrate disk 30, which is detrimental to uniform flow.

[0049] In this embodiment of the invention, after the driving gas enters the inlet channel 5, it first flows along the outer cavity 7 surrounding the inner cavity 6, and then is split by at least two guide channels 3. The outer cavity 7 and the guide channels 3 cooperate with each other to achieve a uniform flow of the driving gas, resulting in high stability of the driving gas that finally enters the inner cavity 6. This prevents the substrate support unit 2 from accelerating too quickly and improves the stability of the air drive device 4. Moreover, the outer cavity 7 reduces the complexity of controlling each guide channel 3. In addition, the rotation of the substrate support unit 2 in this invention is not directly driven by gas, but by mechanical (i.e., air drive device 4). As long as the matching relationship between the inner cavity 6 and the air drive device 4 is reasonably designed according to the required flow rate, the distance between the substrate support unit 2 and the support device 1 only needs to be considered so as not to affect the rotation of the substrate support unit 2. Therefore, the distance between the substrate support unit 2 and the support device 1 can be minimized to the greatest extent to reduce the adverse effects of gas escaping upward on the reaction gas flow field. Furthermore, after the gas drives the gas drive device 4 through the inner cavity 6, it is discharged downward through the exhaust opening 14 of the inner cavity 6, so that most of the driving gas is discharged downward, which further reduces the flow rate of the driving gas flowing towards the substrate support unit 2, thereby reducing the adverse effects of the driving gas escaping upward on the reaction gas flow field.

[0050] In this embodiment of the invention, the driving gas is a non-reactive gas. The non-reactive gas does not react with the reactive gas. Furthermore, the non-reactive gas also does not react with the structures it comes into contact with, such as the substrate support unit 2, the carrier device 1, and the gas-driven device 4.

[0051] In some embodiments, in order to reduce or avoid upward escape of airflow, the air drive device 4 and the inner cavity 6 are dynamically sealed or clearance-fitted.

[0052] In some embodiments, such as Figure 2 , Figure 3 and Figure 5 As shown, the supporting device 1 includes a seat groove 11 and a central support unit 12. The central support unit 12 and the seat groove 11 form the inner cavity 6, the outer cavity 7 and the airflow channel 3. In order to reduce or avoid the upward escape of airflow, the central support unit 12 and the substrate support unit 2 are fitted with a clearance.

[0053] In some embodiments, the central support unit 12 and the substrate support unit 2 have an auxiliary fit. In some embodiments, at least one rolling element is movably embedded on the top surface of the central support unit 12, and the top of the rolling element is in contact with or has a gap with the bottom surface of the substrate support unit 2. In a specific embodiment, the rolling element is a ball bearing, and at least one receiving groove is provided on the top surface of the central support unit 12 facing the substrate support unit 2, and a ball bearing is placed in each receiving groove so that the ball bearing can roll in the receiving groove to achieve movable embedding. The diameter of the ball bearing is greater than the depth of the corresponding receiving groove. The bottom surface of the substrate support unit 2 opposite to the central support unit 12 makes rolling contact with each ball bearing. The degree of rolling contact is necessary to not hinder the rotation of the substrate support unit 2 and not affect the uniform flow of airflow above the substrate. In some specific embodiments, the bottom surface of the substrate support unit 2 opposite to the central support unit 12 does not contact each ball bearing, and the distance between them is a clearance fit. In some specific embodiments, adjacent balls in the same receiving groove are in contact with each other and can roll relative to each other to reduce or prevent airflow from passing between adjacent balls.

[0054] In some embodiments, the receiving groove is arranged around the axis of the pneumatic drive device 4.

[0055] In some embodiments, the receiving slots are annular slots, and at least two receiving slots are arranged in annular array around the axis of the air drive device 4.

[0056] In some embodiments, N central support units 12 are provided, each central support unit 12 and a corresponding seat groove 11 are provided one-to-one; where N is a positive integer, and the specific number can be adjusted according to actual needs; the N central support units 12 are distributed at intervals on the bearing device 1, and each central support unit 12 is provided with a corresponding base plate support unit 2. In some embodiments, the number of central support units 12 is at least 2. In some embodiments, each of the central support units 12 is distributed around the central part of the bearing device 1. For example, as shown... Figure 3 and Figure 4 As shown, a total of 6 central support units 12 are provided on the support device 1. The 6 central support units 12 are distributed around the central region 15 of the support device 1, and each central support unit 12 is provided with a corresponding base plate support unit 2.

[0057] In some specific embodiments, at least a portion of the inner wall of the top of the seat groove 11 is in contact with at least a portion of the inner wall of the top of the central support unit 12, so that the seat groove 11 and the central support unit 12 are relatively stationary, thereby reducing or preventing the escape of driving gas from between the central support unit 12 and the seat groove 11.

[0058] In some embodiments, to avoid reducing the rotational efficiency of the drive air-driven device 4 due to excessively rapid exhaust, such as... Figure 2 As shown, the air-driven device 4 is suspended inside the inner cavity 6 through the exhaust opening 14.

[0059] In some specific embodiments, the pneumatic drive device 4 includes a pneumatic drive shaft 41, the top of which is rotatably connected to the bottom of the substrate support unit 2. The pneumatic drive shaft 41 is located between the substrate support unit 2 and the top opening 123 of the inner cavity 6, or passes through the top opening 123 of the inner cavity 6. For example, see... Figure 2 as well as Figures 6 to 8 The air-driven device 4 includes an air-driven shaft 41, a connecting part 43, and two blades 42. The two blades 42, which are disposed on the side of the air-driven shaft 41 and face each other, form a blade structure. The connecting part 43 is fixedly disposed on the top of the air-driven shaft 41 and passes through the closed groove 121 through the middle support unit 12, and is rotatably connected to the bottom of the base plate support unit 2 to drive the base plate support unit 2 to rotate. The radial length of the blade structure formed by the two blades 42 is greater than the inner diameter of the exhaust opening (i.e., exhaust opening 14) to achieve a cross-exhaust opening arrangement.

[0060] The air-driven shaft 41 is suspended within the inner cavity 6, and each of the blades 42 is disposed on the side of the air-driven shaft 41 to drive the air-driven shaft 41 to rotate under the action of airflow. For example, Figure 6 and Figure 8 As shown, the air-driven shaft 41 is cylindrical with a protruding top forming a connecting part 43. The connecting part 43 penetrates the top opening 123 of the central support unit 12, which is located in the middle of the enclosed groove 121. Two blades 42 are disposed on the sidewall of the air-driven shaft 41. It is worth noting that the fit between the connecting part 43 and the top opening 123 is designed to not hinder rotation and minimize air leakage; for example, the connecting part 43 may have a clearance fit with the top opening 123, or a dynamic seal may exist between the two. Each blade 42 is suspended within the inner cavity 6. After gas enters the inner cavity 6, it drives the blades 42 to rotate the air-driven shaft 41. The number and specific structure of the blades 42 are not limited. Figure 8 As shown, their number and shape can be flexibly adjusted.

[0061] In some other specific embodiments, the supporting device 1 includes a seat groove 11 and a central support unit 12. The bottom surface of the central support unit 12 is provided with a closed groove 121, and the bottom surface of the seat groove 11 is provided with an exhaust opening 14. The bottom structure of the seat groove 11 surrounding the exhaust opening and the closed groove 121 form the inner cavity 6.

[0062] In some embodiments, in order to achieve uniform flow of the driving gas and ensure the stability of the rotation of the pneumatic drive device 4, such as... Figure 2 and Figure 5 As shown, the supporting device 1 includes a seat groove 11 and a central support unit 12. The bottom outer diameter of the central support unit 12 is smaller than the bottom inner diameter of the seat groove 11, and the bottom outer diameter of the central support unit 12 is smaller than its top outer diameter. At least a portion of the bottom surface of the central support unit 12 fits against a portion of the inner bottom surface of the seat groove 11 to form the outer cavity 7.

[0063] In some specific embodiments, such as Figure 2 and Figure 5 As shown, the sidewall of the seat groove 11 is a stepped surface, which includes a first vertical surface, a horizontal connecting surface, and a second vertical surface; the top outer wall of the middle support unit 12 is in close contact with the first vertical surface and the horizontal connecting surface; the bottom outer wall of the middle support unit 12, the second vertical surface, and part of the bottom surface of the seat groove 11 adjacent to the second vertical surface together form an outer cavity 7, wherein the horizontal connecting surface and the second vertical surface constitute a stepped structure 13.

[0064] In other specific embodiments, such as Figure 9 As shown, the sidewall of the seat groove 11 is a plane, and the plane includes a first vertical plane; the top outer wall of the middle support unit 12 is closely fitted with the upper section of the first vertical plane; the bottom outer wall of the middle support unit 12, the lower section of the first vertical plane, and part of the bottom surface of the seat groove 11 adjacent to the lower section of the first vertical plane together form an outer cavity 7, that is, there is no step structure 13 in this embodiment.

[0065] In some embodiments, in order to cooperate with the outer cavity 7 to achieve a uniform flow of the driving gas and ensure the stability of the rotation of the pneumatic drive device 4, such as... Figure 3 and Figure 5 As shown, the number of airflow channels 3 is at least two, and they extend radially around the inner cavity 6, causing the airflow guided into the inner cavity 6 to rotate in the same circumferential direction. Air is supplied to each airflow channel 3 through the outer cavity 7. If the outer cavity 7 is not provided, with at least two airflow channels 3, each airflow channel 3 would require an additional corresponding inlet airflow channel 5 for connection. Providing the outer cavity 7 significantly reduces the number of inlet airflow channels 5 without affecting the airflow guiding effect.

[0066] Minimizing the number of air inlet channels 5 within the support device 1 has the following advantages: Since the temperature uniformity of the substrate bottom surface plays a crucial role in film formation quality, and the heater is positioned below the support device 1, it heats each substrate through the heat conduction of the support device 1. Therefore, the fewer the number of flow channels within the support device 1, the less interference with heat conduction, and the better it is for the temperature uniformity of each substrate.

[0067] In other embodiments, such as Figure 2 and Figure 5 As shown, the supporting device 1 includes a seat groove 11 and a central support unit 12. The bottom surface of the central support unit 12 or the inner bottom surface of the seat groove 11 is provided with at least two channels 111 extending radially around the inner cavity 6. At least a portion of the bottom surface of the central support unit 12 is attached to a portion of the inner bottom surface of the seat groove 11 and forms the at least two airflow channels 3.

[0068] In some specific embodiments, the bottom surface of the central support unit 12 is provided with a central closed groove 121 and at least two channels formed around the central closed groove 121, wherein the channels are through grooves 122 located between the inner cavity 6 and the outer cavity 7. For example, as shown... Figure 6 and Figure 7 The through groove 122 shown has one end connected to the inner cavity 6 and the other end penetrating part of the side wall at the bottom of the central support unit 12. The inner bottom surface of the seat groove 11 is as shown. Figure 4 The surface shown is smooth, and the bottom surface of the central support unit 12 is fitted with part of the inner bottom surface of the seat groove 11 to form a... Figure 3 The airflow channel 3 is shown. In addition, each of the through channels 122 includes a first sidewall 1221 and a second sidewall 1222 opposite to each other. Each through channel 122 is radially distributed around the closed channel 121, and the first sidewall 1221 of each through channel 122 is tangent to the outer sidewall of the central closed channel 121 in the same circumference, so that the driving gas is ejected from each airflow channel 3 into the closed channel 121 to form a rotating guided airflow.

[0069] In other specific embodiments, the bottom surface of the seat groove 11 is provided with an exhaust opening 14 and at least two channels 111 formed around the exhaust opening 14, wherein the channels 111 are closed channels. For example, the bottom surface of the central support unit 12 is smooth, and the bottom surface of the seat groove 11 is provided with channels 111, one end of which communicates with the inner cavity 6, and the other end communicates with the outer cavity 7. The bottom surface of the central support unit 12 and part of the inner bottom surface of the seat groove 11 are fitted together to form a... Figure 3 The airflow channel 3 shown is connected at both ends to the outer cavity 7 and the inner cavity 6, respectively. Each channel 111 is configured to form a rotating guide airflow after the airflow is ejected into the inner cavity 6, as detailed above.

[0070] In some embodiments, in order to improve the compactness of the vapor deposition equipment structure and reduce the impact on the rotation of the support device 1, a supply gas channel and a rotating device rotatably connected to the support device 1 are also included. One end of the supply gas channel extends within the rotating device and extends toward the inlet gas channel 5 through the fitting between the rotating device and the support device 1, and is interconnected.

[0071] In some specific embodiments, the rotating device includes a central rotating device rotatably connected to the middle part of the bearing device 1, or a side rotating device rotatably connected to the side of the bearing device 1.

[0072] In some embodiments, in order to regulate the intake air and ensure its stability, the vapor deposition apparatus further includes a supply air channel communicating with the intake air channel 5, and an intake air control device disposed in the supply air channel.

[0073] In some embodiments, to avoid excessive exhaust affecting the process gas flow field within the cavity and thus the film formation, the vapor deposition apparatus further includes an exhaust opening 14 communicating with the inner cavity 6 and extending to an exhaust channel outside the reaction cavity.

[0074] In some specific embodiments, in order to regulate the exhaust and ensure its stability, the vapor deposition apparatus further includes an exhaust control device disposed in the exhaust channel.

[0075] In some embodiments, refer to Figure 4 The central region 15 of the supporting device 1 is a hollow structure, and the air intake channel 5 is connected to the central region 15. Gas is supplied as driving gas to the air intake channel 5 through the central region 15.

[0076] Specifically, the central region 15 can be used to rotatably set the central rotating device for driving the bearing device 1 to rotate. Part of the outer side wall of the central rotating device is attached to the side wall of the central region 15. The air supply channel can extend along the axial direction of the central rotating device to the attachment point between the central rotating device and the central region 15 and through the attachment point, and then communicate with the air inlet channel 5 to provide driving gas.

[0077] In other embodiments, such as Figure 2 and Figure 10 As shown, the air intake channel 5 extends from the edge of the support device 1 toward the outer cavity 7. The top of the edge rotating part 8 is rotatably connected to the edge of the support device 1 to drive the support device 1 to rotate.

[0078] Specifically, the air supply channel can extend along the axial direction of the edge rotating part 8 to the contact point between the edge rotating part 8 and the edge of the bearing device 1 and through the contact point, and then communicate with the air intake channel 5 to provide driving gas.

[0079] In some embodiments, the number of air intake channels 5 is the same as the number of central support regions to connect corresponding regions, when the number of air intake channels 5 is at least 2.

[0080] While embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of the invention as set forth in the claims. Furthermore, the invention described herein may have other embodiments and can be implemented or carried out in various ways.

Claims

1. A vapor deposition apparatus characterized by comprising: include: The reaction chamber and the support device disposed in the reaction chamber and loaded with the substrate support unit; The bearing device is provided with an inner cavity with a bottom opening, an outer cavity surrounding the inner cavity, and at least two airflow channels surrounding the inner cavity; A pneumatic drive device is suspended inside the inner cavity, and the top of the pneumatic drive device is rotatably connected to the bottom of the substrate support unit. The supporting device is also provided with an air intake channel communicating with the outer cavity; The at least two airflow channels connect to the outer cavity, communicate with the inner cavity via the side wall of the inner cavity, and are configured to provide rotating airflow into the inner cavity to drive the air drive device to rotate.

2. The vapor deposition apparatus according to claim 1, wherein It also includes an air supply channel and a rotating device rotatably connected to the bearing device. One end of the air supply channel extends within the rotating device and extends toward the air inlet channel through the fitting area between the rotating device and the bearing device, thus achieving interconnection. The rotating device includes a central rotating device rotatably connected to the middle part of the bearing device, or a side rotating device rotatably connected to the side of the bearing device.

3. The vapor deposition apparatus according to claim 1, wherein It also includes a supply air passage that connects to the intake air passage, and an intake control device disposed in the supply air passage.

4. The vapor deposition apparatus according to claim 1, wherein It also includes an exhaust channel that connects to the bottom opening of the inner cavity and extends to the outside of the reaction chamber.

5. A vapour deposition apparatus as claimed in claim 4, wherein, It also includes an exhaust control device disposed in the exhaust channel.

6. The vapor deposition apparatus according to claim 1, wherein The pneumatic drive device and the inner cavity are dynamically sealed or clearance-fitted.

7. The vapor deposition apparatus according to claim 1, wherein The supporting device includes a seat groove and a central support unit. The central support unit and the seat groove form the inner cavity, the outer cavity and the airflow channel. The central support unit and the substrate support unit are either clearance-fitted or auxiliary-fitted.

8. A vapour deposition apparatus as claimed in claim 7, wherein, At least one rolling element is movably embedded on the top surface of the central support unit. The top of the rolling element is in contact with or has a gap with the bottom surface of the substrate support unit to achieve the auxiliary fit.

9. The vapor deposition apparatus according to claim 7, wherein At least a portion of the inner wall of the top of the seat groove is in contact with at least a portion of the inner wall of the top of the central support unit, so that the seat groove and the central support unit are relatively stationary.

10. The vapor deposition apparatus according to claim 1, wherein The air-driven device includes a blade structure that is suspended within the inner cavity across the bottom opening of the inner cavity.

11. A vapour deposition apparatus as claimed in claim 10, wherein, The supporting device includes a seat groove and a central support unit. The bottom surface of the central support unit has a central closed groove, and the bottom surface of the seat groove has an exhaust opening that communicates with the inside and outside. The bottom structure of the seat groove surrounding the exhaust opening and the central closed groove form the inner cavity.

12. The vapor deposition apparatus of claim 1, wherein, The supporting device includes a seat groove and a central support unit. The bottom outer diameter of the central support unit is smaller than the bottom inner diameter of the seat groove, and the bottom outer diameter of the central support unit is smaller than the top outer diameter. At least a portion of the bottom surface of the central support unit fits against a portion of the inner bottom surface of the seat groove to form the outer cavity.

13. The vapor deposition apparatus of claim 1, wherein, The supporting device includes a seat groove and a central support unit. The bottom surface of the central support unit or the inner bottom surface of the seat groove is provided with at least two channels extending radially around the inner cavity. At least a portion of the bottom surface of the central support unit is attached to a portion of the inner bottom surface of the seat groove and forms the at least two airflow channels.

14. A vapour deposition apparatus as claimed in claim 13, wherein, The bottom surface of the middle supporting unit is provided with a closed groove and the at least two channels around the closed groove, and the channels are through grooves.

15. The vapor deposition apparatus according to claim 13, wherein The inner bottom surface of the seat groove is provided with an exhaust opening for communication between the inside and the outside, and the at least two channels around the exhaust opening, and the channels are closed grooves.

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