Leveling device and semiconductor process equipment
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-12-06
- Publication Date
- 2026-08-14
AI Technical Summary
[0003]通常采用调平装置对下电极在倾俯方向上的角度和在滚动方向上的角度进行调节,以实现对下电极的平行度的调节,但是,现有技术采用的调平装置是利用单独的两个机构分别调节下电极在倾俯方向和滚动方向上的角度,这不仅导致零件数量多、结构复杂,加工成本高,而且调节范围较小,如果下电极的安装误差较大,可能会导致调平装置调节至极限位置也无法实现调平需求
[0056]本发明提供的调平装置,其调平轴组件采用一体式的转轴结构实现活动部件相对于固定部件分别在两个方向上转动,即,利用相互垂直,且固定连接的第一转轴和第二转轴,可以通过第一调平组件和第二调平组件调节活动部件相对于固定部件分别围绕第一转轴和第二转轴转动的角度,以实现对半导体工艺设备的待调平件的平行度的调节,这种一体式的转轴结构可以使活动部件在两个方向上转动的旋转中心位于同一位置,相比于现有技术节省了一套转轴结构,使用的零件数量更少,结构更简单,从而可以降低加工成本。而且,由于活动部件在两个方向上的转动均是利用转轴来实现,转轴转动的角度范围很容易通过调整相应部件的尺寸来增大,从而可以满足多种不同的调平需求,提高调平装置的通用性。
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Figure CN117747398B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of semiconductor manufacturing, and more specifically, to a leveling device and semiconductor process equipment. Background Technology
[0002] In IC (integrated circuit) manufacturing processes, as feature sizes continue to decrease, capacitively coupled plasma (CCP) etching equipment plays an increasingly important role in the etching field. CCP etching involves discharging upper and lower electrodes to ionize process gases, generating plasma that bombards the wafer surface to complete the etching process. The parallelism between the upper and lower electrodes significantly affects the uniformity of the generated plasma, thus having a crucial impact on the uniformity of the wafer surface etching process. Furthermore, because CCP etching requires precise control over the plasma generation area, ensuring the parallelism of the upper and lower electrodes is paramount.
[0003] A leveling device is typically used to adjust the angles of the lower electrode in the tilting and rolling directions to achieve parallelism adjustment. However, the existing leveling device uses two separate mechanisms to adjust the angles of the lower electrode in the tilting and rolling directions, which not only results in a large number of parts, complex structure, and high processing costs, but also a small adjustment range. If the installation error of the lower electrode is large, the leveling device may not be able to achieve the leveling requirement even when adjusted to its limit position. Summary of the Invention
[0004] The present invention aims to solve at least one of the technical problems existing in the prior art, and proposes a leveling device and semiconductor process equipment, which can reduce the number of parts, simplify the structure, thereby reducing the processing cost, and also increase the adjustment range to meet a variety of different leveling needs.
[0005] To achieve the purpose of this invention, a leveling device is provided, applied to semiconductor process equipment, including a fixed component, a movable component, a leveling shaft assembly, a first leveling assembly, and a second leveling assembly, wherein the fixed component and the movable component are disposed opposite to each other; the movable component is used to be fixedly connected to the component to be leveled in the semiconductor process equipment;
[0006] The leveling shaft assembly includes a first rotating shaft and a second rotating shaft, wherein the first rotating shaft extends along a first horizontal direction and is rotatably connected to the movable component; the second rotating shaft extends along a second horizontal direction perpendicular to the first horizontal direction and is rotatably connected to the fixed component, and one end of the second rotating shaft is fixedly connected to the first rotating shaft.
[0007] The first leveling component is used to adjust the angle at which the movable component rotates relative to the fixed component around the first rotating axis;
[0008] The second leveling component is used to adjust the angle at which the movable component rotates relative to the fixed component around the second axis.
[0009] Optionally, a rotating shaft mating groove is formed on the surface of the movable component relative to the fixed component, the first rotating shaft is rotatably disposed in the rotating shaft mating groove, and the outer peripheral surface of the first rotating shaft mates with the inner surface of the rotating shaft mating groove;
[0010] The connection portion of the second rotating shaft to the first rotating shaft has a reserved gap in the circumferential direction around the first rotating shaft between the rotating shaft mating groove and the second rotating shaft, so that the connection portion can rotate around the first rotating shaft in the rotating shaft mating groove.
[0011] Optionally, a limiting protrusion is formed on the outer peripheral surface of the first rotating shaft, and a limiting recess is formed in the rotating shaft mating groove. The limiting recess and the limiting protrusion cooperate to limit the position of the first rotating shaft in the first horizontal direction.
[0012] The limiting recess and the limiting protrusion have the reserved gap in the circumferential direction around the first rotating shaft; the second rotating shaft is fixedly connected to the limiting protrusion.
[0013] Optionally, the leveling shaft assembly further includes a first screw and a first washer, wherein the first screw passes through the movable part from the side of the movable part away from the fixed part and is threadedly connected to the first rotating shaft to restrict the first rotating shaft in the rotating shaft mating groove;
[0014] A first groove is formed on the surface of the movable part away from the fixed part. The first washer is sleeved on the first screw and is located between the bottom surface of the first groove and the screw head of the first screw. The first washer includes two first spherical washers that are stacked on top of each other, and the spherical surfaces of the two first spherical washers cooperate with each other.
[0015] Optionally, the fixing component is provided with a rotating shaft mating hole that extends through the fixing component along the second horizontal direction, and the second rotating shaft is rotatably disposed in the rotating shaft mating hole; the outer peripheral surface of the second rotating shaft mates with the inner surface of the rotating shaft mating hole.
[0016] Optionally, the leveling shaft assembly further includes a second screw, a shaft end cap, and a bearing, wherein,
[0017] The shaft end cap is disposed on the side of the fixed component away from the movable component and corresponds to the mating hole of the rotating shaft. The shaft end cap is rotatably connected to the fixed component through the bearing.
[0018] The second screw passes through the shaft end cap from the side away from the fixing component along the second horizontal direction and is threadedly connected to the second shaft.
[0019] Optionally, the axis of the second rotating shaft intersects the vertical axes of the fixed component and the movable component, and also intersects the midpoint of the axis of the first rotating shaft.
[0020] Optionally, the first leveling component is disposed below or above the leveling shaft assembly, and includes a first adjusting member and a first fastening component, wherein the first adjusting member passes through the movable component, and one end of the first adjusting member abuts against the fixed component, and the first adjusting member is configured to be adjustable in length relative to the protruding portion of the movable component protruding toward the fixed component;
[0021] The first fastening assembly is used to securely connect the first adjusting member, the fixed member, and the movable member.
[0022] Optionally, the first adjusting member includes an adjusting nut, and a threaded hole is provided in the movable member that passes through the movable member in the second horizontal direction. One end of the adjusting nut passes through the threaded hole and abuts against the fixed member. The outer peripheral surface of the adjusting nut is provided with an external thread, and the adjusting nut is threadedly connected to the threaded hole through the external thread, so that the length of the protruding part of the adjusting nut can be adjusted by rotating the adjusting nut.
[0023] Optionally, the first fastening assembly includes a tension bolt and an adaptive nut, wherein,
[0024] The tensioning bolt passes sequentially through the first adjusting member and the fixed member from the side of the movable member away from the fixed member;
[0025] The adaptive nut is located on the side of the fixed component away from the movable component and is threadedly connected to the tension bolt. By tightening the adaptive nut, the first adjusting component, the fixed component, and the movable component are fixedly connected. Furthermore, the adaptive nut can move relative to the fixed component in the circumferential direction around the second axis of rotation to achieve coaxiality with the tension bolt.
[0026] Optionally, the first fastening assembly further includes a second washer and a third washer, wherein,
[0027] A second groove is provided on the surface of the fixed component relative to the movable component. The second washer is disposed in the second groove and sleeved on the tension bolt. One end of the adjusting nut abuts against the second washer. The second washer includes two second spherical washers stacked on top of each other.
[0028] A third groove is provided at the end of the first adjusting member away from the fixed component. The third washer is disposed in the third groove and is located between the bottom surface of the third groove and the bolt head of the tensioning bolt. The third washer includes two third spherical washers stacked on top of each other.
[0029] The spherical surfaces of the two second spherical washers engage with each other, and the spherical surfaces of the two third spherical washers engage with each other, so that the tensioning bolt can rotate with the rotation of the moving part.
[0030] Optionally, a fourth groove is provided on the surface of the fixed component away from the movable component, the adaptive nut is disposed in the fourth groove, and there is a reserved gap between the adaptive nut and the fourth groove in the circumferential direction around the second axis of rotation, so that the adaptive nut can move relative to the fixed component in the circumferential direction around the second axis of rotation.
[0031] Optionally, the second leveling component is disposed diagonally below or diagonally above the leveling shaft assembly, and includes a second adjusting member and a cam, wherein one end of the second adjusting member is fixedly connected to the fixed component;
[0032] The cam is rotatably mounted in the movable component, and the cam is provided with an arc-shaped guide rail and a drive shaft. One end of the drive shaft is fixedly connected to the cam, and the drive shaft is coaxial with the rotation axis of the cam. The drive shaft is used to drive the cam to rotate when subjected to a rotational driving force. The extension direction of the arc-shaped guide rail is configured such that the distance between the arc-shaped guide rail and the rotation axis of the cam increases from one end of the arc-shaped guide rail to the other end.
[0033] The other end of the second adjusting member, away from the fixed component, slides in cooperation with the arc-shaped guide rail so that when the drive shaft drives the cam to rotate, it slides along the arc-shaped guide rail, thereby driving the movable component to rotate around the second rotating shaft.
[0034] Optionally, the second adjusting member includes a columnar sliding member and a limiting member disposed at one end of the columnar sliding member, wherein,
[0035] A fifth groove is provided on the surface of the fixed component relative to the movable component for accommodating the limiting member. The limiting member is fixedly connected to the fixed component by a first fastening screw. The outer peripheral surface shape of the limiting member is adapted to the inner surface shape of the fifth groove and is configured to limit the rotation of the columnar sliding member.
[0036] The other end of the columnar slider, away from the limiting member, slides in cooperation with the arc-shaped guide rail.
[0037] Optionally, the second leveling assembly further includes a second fastening assembly for rotatably mounting the cam in the movable part; the second fastening assembly includes a cam end cap and two cam bearings, wherein...
[0038] A sixth groove is provided on the surface of the movable part away from the fixed part for accommodating the cam, and a first shaft hole is provided on the bottom surface of the sixth groove. A limit shaft is coaxially provided on the side of the cam away from the drive shaft, and the limit shaft is rotatably disposed in the first shaft hole through one of the cam bearings.
[0039] The cam end cap is located on the side of the movable part away from the fixed part, and is fixedly connected to the movable part by a second fastening screw. The cam end cap covers the opening of the sixth groove to confine the cam in the sixth groove.
[0040] The end of the drive shaft away from the cam passes through the cam end cover; and another cam bearing is provided between the drive shaft and the cam end cover to enable the drive shaft to rotate relative to the cam end cover.
[0041] Optionally, the second fastening assembly further includes a drive nut and a third screw, wherein a second shaft hole is provided on the drive nut, and one end of the drive shaft away from the cam extends into the second shaft hole; the third screw passes through the drive nut from the side of the drive nut away from the drive shaft along the extension direction of the drive shaft and is threadedly connected to the drive shaft.
[0042] Optionally, the second fastening assembly further includes a first set screw and a second set screw, wherein the first set screw passes through the drive nut radially along the drive shaft from the outer peripheral surface of the drive nut and abuts against the outer peripheral surface of the drive shaft, thereby limiting the relative rotation between the drive nut and the drive shaft;
[0043] The second set screw passes through the movable part radially along the cam and abuts against the outer peripheral surface of the cam, thereby limiting the relative rotation between the cam and the movable part.
[0044] Optionally, on the radial section of the cam, the line connecting the center of the orthographic projection of the second adjusting member at one end of the arc-shaped guide rail and the rotation center of the cam is the first line, and the line connecting the center of the orthographic projection of the second adjusting member at the other end of the arc-shaped guide rail and the rotation center of the cam is the second line.
[0045] The angle between the first line and the second line is 180°.
[0046] Optionally, on the radial section of the cam, the center of the orthographic projection of the second adjusting member lies on the arcuate trajectory sliding between the two ends of the arcuate guide rail, which satisfies the following parametric equation:
[0047] x(t) = (π / 2 × t + 12) × sin(t)
[0048] y(t) = (π / 2 × t + 12) × cos(t)
[0049] Where t is a parameter, and when the center of the orthographic projection of the second adjusting member is located at one end of the arc-shaped guide rail, t = t1 = 0; when the center of the orthographic projection of the second adjusting member is located at the other end of the arc-shaped guide rail, t = t2 = π.
[0050] As another technical solution, the present invention also provides a semiconductor process equipment, including a process chamber and a carrier device disposed in the process chamber for carrying a wafer, and further including the leveling device provided by the present invention for adjusting the levelness of the carrier surface of the carrier device; wherein, the carrier device includes a base, the base passing through the fixed component via a cantilever and being fixedly connected to the movable component.
[0051] Optionally, a positioning structure is provided between the cantilever and the movable component, the positioning structure being used to define the relative position of the cantilever and the movable component.
[0052] Optionally, it may also include a lifting mechanism;
[0053] A lifting guide rail is provided on the outer side wall of the process chamber, and the fixing component is slidably connected to the lifting guide rail in the vertical direction through a guide rail slider;
[0054] The lifting mechanism is used to drive the fixed component to rise and fall, so as to realize the overall lifting and lowering of the leveling device.
[0055] The present invention has the following beneficial effects:
[0056] The leveling device provided by this invention employs an integrated rotating shaft structure in its leveling shaft assembly to enable the movable component to rotate in two directions relative to the fixed component. Specifically, using a first and a second rotating shaft that are perpendicular to each other and fixedly connected, the angles of rotation of the movable component relative to the fixed component around the first and second rotating shafts can be adjusted via the first and second leveling components, respectively, to adjust the parallelism of the component to be leveled in the semiconductor process equipment. This integrated rotating shaft structure ensures that the rotation center of the movable component in both directions is located at the same position. Compared to existing technologies, it saves one set of rotating shaft structures, uses fewer parts, and has a simpler structure, thereby reducing processing costs. Furthermore, since the rotation of the movable component in both directions is achieved using rotating shafts, the range of rotation angles can be easily increased by adjusting the dimensions of the corresponding components, thus meeting various different leveling requirements and improving the versatility of the leveling device.
[0057] The semiconductor process equipment provided by the present invention, by adopting the leveling device provided by the present invention, can reduce the number of parts, simplify the structure, thereby reducing processing costs, and also increase the adjustment range, thereby meeting a variety of different leveling requirements and improving the versatility of the leveling device. Attached Figure Description
[0058] Figure 1 This is a schematic diagram of the structure of a semiconductor process equipment provided in an embodiment of the present invention;
[0059] Figure 2 This is a diagram showing the connection structure between the leveling device and the base provided in an embodiment of the present invention.
[0060] Figure 3 A view of the leveling device provided in an embodiment of the present invention on the side away from the base;
[0061] Figure 4 This is an exploded view of the positioning structure between the moving part and the cantilever used in an embodiment of the present invention;
[0062] Figure 5 This is a first partial cross-sectional view of the leveling device provided in an embodiment of the present invention at the location of the rotating shaft structure;
[0063] Figure 6 This is an exploded view of the leveling shaft assembly used in an embodiment of the present invention;
[0064] Figure 7 This is a second partial cross-sectional view of the leveling device provided in an embodiment of the present invention at the location of the rotating shaft structure;
[0065] Figure 8 This is a third partial cross-sectional view of the leveling device provided in the embodiment of the present invention at the location of the rotating shaft structure;
[0066] Figure 9 This is a fourth partial cross-sectional view of the leveling device provided in the embodiment of the present invention at the location of the rotating shaft structure;
[0067] Figure 10 This is a fifth partial cross-sectional view of the leveling device provided in the embodiment of the present invention at the position of the rotating shaft structure;
[0068] Figure 11 This is a sixth partial cross-sectional view of the leveling device provided in the embodiment of the present invention at the location of the rotating shaft structure;
[0069] Figure 12 This is a seventh partial cross-sectional view of the leveling device provided in the embodiment of the present invention at the location of the rotating shaft structure;
[0070] Figure 13 A partial cross-sectional view of the leveling device provided in an embodiment of the present invention at the position of the first leveling component;
[0071] Figure 14 This is a process diagram of adjustment using the first leveling component in an embodiment of the present invention;
[0072] Figure 15 This is a first partial cross-sectional view of the leveling device provided in an embodiment of the present invention at the location of the second leveling component;
[0073] Figure 16 This is a partial structural diagram of the leveling device provided in an embodiment of the present invention at the positions of the first and second leveling components;
[0074] Figure 17 This is a structural diagram of the arc-shaped guide rail of the cam used in an embodiment of the present invention;
[0075] Figure 18 This is a second partial cross-sectional view of the leveling device provided in an embodiment of the present invention at the location of the second leveling component;
[0076] Figure 19 This is a third partial cross-sectional view of the leveling device provided in an embodiment of the present invention at the location of the second leveling component. Detailed Implementation
[0077] To enable those skilled in the art to better understand the technical solutions of the present invention, the leveling device and semiconductor process equipment provided by the present invention will be described in detail below with reference to the accompanying drawings.
[0078] The leveling device provided in this embodiment of the invention is applied to semiconductor process equipment, such as capacitively coupled plasma (CCP) equipment. Please refer to the accompanying documentation. Figure 1 and Figure 2The device includes a process chamber 100 and an upper electrode and a lower electrode disposed within the process chamber 100, wherein, Figure 1 The process chamber 100 is schematically shown only with a dashed box. The lower electrode is located below the upper electrode and also serves as a support device for the wafer S. The support device includes a base 102, which extends beyond the side wall 101 of the process chamber 100 via a cantilever 103 and is fixedly connected to a leveling device 200. The leveling device 200 is used to adjust the levelness of the support surface of the base 102 to ensure that the parallelism of the upper and lower electrodes meets the requirements.
[0079] Specifically, the leveling device 200 provided in this embodiment of the invention includes a fixed component 1, a movable component 2, a leveling shaft assembly, a first leveling assembly, and a second leveling assembly. The fixed component 1 and the movable component 2 are arranged opposite to each other. The fixed component 1 is, for example, a frame of any shape such as a rectangle or a square, and the movable component 2 is, for example, a plate of any shape such as a rectangle or a square. Preferably, the frame shape of the fixed component 1 is the same as the plate shape of the movable component 2.
[0080] In some embodiments, the fixed component 1 and the movable component 2 are arranged opposite each other in a direction parallel to the extension direction (i.e., the Y direction) of the cantilever 103, and the frame of the fixed component 1 and the plate of the movable component 2 are both perpendicular to the extension direction of the cantilever 103. The fixed component 1 is located between the movable component 2 and the side wall 101 of the process chamber 100. One end of the cantilever 103 passes through the space enclosed by the frame of the fixed component 1 and is fixedly connected to the movable component 2, for example, by a plurality of screws.
[0081] In some embodiments, a positioning structure is provided between the cantilever 103 and the movable component 2. This positioning structure is used to define the relative position between the cantilever 103 and the movable component 2. With the help of the positioning structure, the positioning between the cantilever 103 and the movable component 2 can be achieved, reducing assembly errors between the base 102 and the movable component 2. This ensures that changes in the angle of the movable component 2 can be accurately fed back to the bearing surface of the base 102, thereby ensuring the adjustment accuracy of the levelness of the bearing surface of the base 102. The positioning structure can have various structures, for example, such as... Figure 3 and Figure 4 As shown, the positioning structure includes multiple positioning pins 103a and multiple positioning holes 21, and each positioning pin 103a is provided in a one-to-one correspondence with each positioning hole 21. Each positioning pin 103a is provided on one of the two mating surfaces of the cantilever 103 and the movable part 2 that are opposite to each other, and each positioning hole 21 is provided on the other of the two mating surfaces of the cantilever 103 and the movable part 2 that are opposite to each other.
[0082] It should be noted that the leveling components of the semiconductor process equipment are not limited to the aforementioned support device. In practical applications, the leveling device 200 can also be used to fixally connect with other leveling components of the semiconductor process equipment, such as the upper electrode, to adjust the levelness of other leveling components.
[0083] Please refer to the following: Figures 5 to 10 The leveling shaft assembly includes a first rotating shaft 31 and a second rotating shaft 32. The first rotating shaft 31 extends along a first horizontal direction (i.e., the X direction) and is rotatably connected to the movable part 2. The second rotating shaft 32 extends along a second horizontal direction perpendicular to the first horizontal direction (i.e., the Y direction) and is rotatably connected to the fixed part 1. One end of the second rotating shaft 32 is fixedly connected to the first rotating shaft 31, that is, the first rotating shaft 31 and the second rotating shaft 32 are connected to form an integrated rotating shaft structure. The first leveling component 4 is used to adjust the angle of rotation of the movable part 2 relative to the fixed part 1 around the first rotating shaft 31; the second leveling component 5 is used to adjust the angle of rotation of the movable part 2 relative to the fixed part 1 around the second rotating shaft 32.
[0084] In some embodiments, the first horizontal direction (i.e., the X direction) is perpendicular to the extension direction of the cantilever 103, and the second horizontal direction (i.e., the Y direction) is parallel to the extension direction of the cantilever 103. In this case, the angle of the base 102 in the tilt direction can be adjusted by using the first leveling assembly 4 to adjust the angle of rotation of the movable member 2 relative to the fixed member 1 about the first pivot 31. The angle of the base 102 in the rolling direction can be adjusted by using the second leveling assembly 5 to adjust the angle of rotation of the movable member 2 relative to the fixed member 1 about the second pivot 32. The so-called change in the angle of the base 102 in the tilt direction refers to the change in the radial centerline of the base 102 perpendicular to the extension direction of the cantilever 103 (i.e., the Y direction). Figure 2 The height on both sides of the dashed line O1 in the figure changes; the so-called angular change of the base 102 in the rolling direction refers to the change of the base 102 along the radial centerline parallel to the extension direction of the cantilever 103 (i.e., Figure 2 The height on both sides of the dashed line O2 in the figure changes.
[0085] The leveling device 200 provided in this embodiment of the invention employs an integrated rotating shaft structure to enable the movable part 2 to rotate in two directions relative to the fixed part 1. Specifically, using a first rotating shaft 31 and a second rotating shaft 32 that are perpendicular to each other and fixedly connected, the angles at which the movable part 2 rotates relative to the fixed part 1 around the first rotating shaft 31 and the second rotating shaft 32 can be adjusted by the first leveling component 4 and the second leveling component 5, thereby adjusting the parallelism of the component to be leveled in the semiconductor process equipment. This integrated rotating shaft structure allows the rotation center of the movable part 2 to be located at the same position in both directions (i.e., the location of the integrated rotating shaft structure). Compared to the prior art, this saves one set of rotating shaft structures, uses fewer parts, and has a simpler structure, thus reducing processing costs. Furthermore, since the rotation of the movable part 2 in both directions is achieved using rotating shafts, the range of rotation angles can be easily increased by adjusting the dimensions of the corresponding components, thereby meeting various different leveling requirements and improving the versatility of the leveling device 200.
[0086] In some embodiments, such as Figure 6 As shown, a rotating shaft mating groove 22 is formed on the surface of the movable part 2 relative to the fixed part 1. The first rotating shaft 31 is rotatably disposed in the rotating shaft mating groove 22, and the outer circumferential surface of the first rotating shaft 31 mates with the inner surface of the rotating shaft mating groove 22 to restrict the radial degree of freedom of movement of the first rotating shaft 31. The connecting part of the second rotating shaft 32 and the first rotating shaft 31 has a reserved gap with the rotating shaft mating groove 22 in the circumferential direction around the first rotating shaft 31, so that the connecting part can rotate around the first rotating shaft 31 in the rotating shaft mating groove 22. Since the second rotating shaft 32 is perpendicular to the first rotating shaft 31, one end of the second rotating shaft 32 extends into the rotating shaft mating groove 22 and is fixedly connected to the first rotating shaft 31. Therefore, sufficient rotational space needs to be reserved in the rotating shaft mating groove 22 for the connection between the second rotating shaft 32 and the first rotating shaft 31, i.e., the aforementioned reserved gap. This ensures that, while meeting the leveling requirements within the rotational angle range of the first rotating shaft 31, the connection between the second rotating shaft 32 and the first rotating shaft 31 will not interfere with the groove wall of the rotating shaft mating groove 22 during rotation. In practical applications, the rotational angle range of the first rotating shaft 31 can be easily increased by adjusting the shape and size of the rotating shaft mating groove 22 and other corresponding components, thereby meeting various different leveling requirements and improving the versatility of the leveling device 200.
[0087] Specifically, such as Figures 6 to 8As shown, the aforementioned rotating shaft mating groove 22 includes a first groove 22a for accommodating the shaft body of the first rotating shaft 31, and a second groove 22b for accommodating the connecting portion of the second rotating shaft 32 and the first rotating shaft 31. The inner surface of the first groove 22a mates with the outer circumferential surface of the shaft body of the first rotating shaft 31 to restrict the radial freedom of movement of the first rotating shaft 31. The inner surface of the second groove 22b and the outer surface of the connecting portion have the aforementioned reserved gap in the circumferential direction surrounding the first rotating shaft 31; that is, the vertical width of the second groove 22b is greater than the vertical width of the first groove 22a to ensure that the connecting portion does not interfere with the groove wall of the second groove 22b during rotation.
[0088] In some embodiments, a limiting protrusion 33 is formed on the outer peripheral surface of the first rotating shaft 31, and a limiting recess is formed in the rotating shaft mating groove 22. The limiting recess and the limiting protrusion 33 cooperate to limit the position of the first rotating shaft 31 in the first horizontal direction, that is, to limit the degree of freedom of movement of the first rotating shaft 31 in its axial direction, thereby limiting the first rotating shaft 31 to only rotate. The limiting recess and the limiting protrusion 33 have the aforementioned reserved gap in the circumferential direction around the first rotating shaft 31; the second rotating shaft 32 is fixedly connected to the limiting protrusion 33. That is, the limiting protrusion 33 is the connection part between the second rotating shaft 32 and the first rotating shaft 31, and the limiting recess is the aforementioned second groove 22b. On this basis, the surfaces of the limiting recess and the limiting protrusion 33 that are opposite to each other in the first horizontal direction (i.e., the axial direction of the first rotating shaft 31) cooperate to limit the degree of freedom of movement of the first rotating shaft 31 in its axial direction. In one specific embodiment, the aforementioned limiting protrusion 33 is a cube, and the first rotating shaft 31 enters the cube from one side surface and exits from the opposite side surface. Optionally, the two shaft segments of the first rotating shaft 31 on both sides of the cube are of equal length. One end of the second rotating shaft 32 is connected to the surface of the cube facing the fixing member 1, in which case, as shown... Figure 6 As shown, the first rotating shaft 31 and the second rotating shaft 32 form a T-shaped integrated rotating shaft structure.
[0089] In some embodiments, the leveling shaft assembly further includes a fastening structure for confining the first rotating shaft 31 within the rotating shaft mating groove 22 and preventing it from dislodging from the rotating shaft mating groove 22. This fastening structure can have various structures, such as... Figures 9 to 10 As shown, the leveling shaft assembly also includes a first screw 34 and a first washer 35. The first screw 34 passes through the movable part 2 from the side of the movable part 2 away from the fixed part 1 and is threadedly connected to the first rotating shaft 31 to confine the first rotating shaft 31 within the rotating shaft mating groove 22. Furthermore, as... Figure 10As shown, a first groove 23 is formed on the surface of the movable part 2 away from the fixed part 1. A first washer 35 is sleeved on the first screw 34 and is located between the bottom surface of the first groove 23 and the screw head of the first screw 34. The first washer 35 includes two first spherical washers 35a stacked on top of each other. The spherical surfaces of the two first spherical washers 35a cooperate with each other so that when the movable part 2 rotates around the first rotating shaft 31 and / or the second rotating shaft 32, by rotating one of the first spherical washers 35a relative to the other, the first screw 34 can automatically adapt to the angle change of the movable part 2, so as not to interfere with the rotation of the movable part 2 and to maintain connection with the first rotating shaft 31.
[0090] In some embodiments, such as Figure 6 , Figures 8 to 10 As shown, a rotating shaft mating hole 11 is provided in the fixed component 1, which passes through the fixed component 1 along the second horizontal direction (i.e., the Y direction). The second rotating shaft 32 is rotatably disposed in the rotating shaft mating hole 11. The outer peripheral surface of the second rotating shaft 32 mates with the inner surface of the rotating shaft mating hole 11 to restrict the degree of freedom of movement of the second rotating shaft 32 in its radial direction.
[0091] In some embodiments, the leveling shaft assembly further includes a fastening structure for confining the second rotating shaft 32 within the rotating shaft mating hole 11 and preventing it from dislodging from the rotating shaft mating hole 11. This fastening structure can have various configurations. For example, the leveling shaft assembly also includes a second screw 38, a shaft end cap 37, and a bearing 36. The shaft end cap 37 is disposed on the side of the fixed member 1 away from the movable member 2 and corresponds to the rotating shaft mating hole 11. The shaft end cap 37 is rotatably connected to the fixed member 1 via the bearing 36. Specifically, the bearing 36 is stacked on the surface of the fixed member 1 away from the movable member 2, and the shaft end cap 37 is stacked on the surface of the bearing 36 away from the fixed member 1. The second screw 38 passes through the shaft end cap 37 from the side of the shaft end cap 37 away from the fixed member 1 along a second horizontal direction (i.e., the Y direction) and is threadedly connected to the second rotating shaft 32.
[0092] In some embodiments, such as Figure 11 As shown, the axis of the second rotating shaft 32 mentioned above (i.e., Figure 11 The centerline of the second rotating shaft 32 in the direction perpendicular to the paper intersects the vertical axis A1 of the fixed component 1 and the movable component 2, and also intersects the midpoint of the axis A2 of the first rotating shaft 31. Since the vertical axis A1 of the fixed component 1 and the movable component 2 intersects the radial centerline of the base 102 parallel to the extension direction of the cantilever 103 (i.e., Figure 2The dotted line O2 in the diagram intersects with the axis of the second rotating shaft 32. By making the axis of the second rotating shaft 32 intersect with the axis A1 of the fixed component 1 and the movable component 2 in the vertical direction, the orthographic projection of the axis of the second rotating shaft 32 on the radial section of the base 102 can be made to coincide with the radial centerline of the base 102 parallel to the extension direction of the cantilever 103 (i.e., Figure 2 The dotted line O2 in the figure coincides with the fixed part 1, so that when adjusting the angle of rotation of the movable part 2 relative to the fixed part 1 around the second rotating axis 32, that is, when adjusting the base 102 around its radial center line parallel to the extension direction of the cantilever 103 (i.e., Figure 2 The angle of rotation of the dotted line O2 in the figure. Based on this, by making the axis of the second rotating shaft 32 intersect the midpoint of the axis A2 of the first rotating shaft 31, the first rotating shaft 31 can be made symmetrical with respect to the axis of the second rotating shaft 32, which is beneficial to make the moving part 2 be subjected to uniform force.
[0093] In some embodiments, the first leveling component 4 is disposed below or above the leveling shaft component, for example, as shown below. Figure 11 As shown, the integrated rotating shaft structure formed by the first rotating shaft 31 and the second rotating shaft 32 is, for example, located near the upper edge of the movable part 2, while the first leveling component 4 is located below the leveling shaft assembly. Preferably, the axis of the first leveling component 4 in the second horizontal direction intersects the axis A1 of the fixed part 1 and the movable part 2 in the vertical direction.
[0094] like Figure 12 and Figure 13 As shown, the first leveling assembly 4 includes a first adjusting member 41 and a first fastening assembly. The first adjusting member 41 passes through the movable member 2, and one end of the first adjusting member 41 abuts against the fixed member 1. The length of the protruding portion of the first adjusting member 41 relative to the movable member 2 protruding towards the fixed member 1 is adjustable. The first fastening assembly is used to fix the first adjusting member 41, the fixed member 1, and the movable member 2 together. By adjusting the length of the protruding portion of the first adjusting member 41 relative to the movable member 2 protruding towards the fixed member 1, the distance between the movable member 2 and the fixed member 1 at the position of the first adjusting member 41 can be changed, that is, the angle of rotation of the movable member 2 around the first rotating shaft 31 can be changed, thereby adjusting the angle of the base 102 in the tilt direction. Specifically, as shown... Figure 14 As shown in Figure (1), before adjustment, if there is a height difference between the two sides of the radial centerline of the base 102 perpendicular to the extension direction of the cantilever 103, Figure 14In Figure (1), the left side height of the bearing surface 102a of the base 102 is lower than its right side height. Therefore, the distance between the movable part 2 and the fixed part 1 at the position of the first adjusting member 41 can be reduced by decreasing the length of the protruding portion of the first adjusting member 41 relative to the movable part 2 protruding towards the fixed part 1. At this time, the movable part 2 rotates around the first pivot 31, causing the left side height of the bearing surface 102a of the base 102 to increase and the right side height to decrease. Specifically, the movable part 2 rotates clockwise so that its angle relative to the vertical direction (i.e., the Z direction) changes from angle a to 0°. The distance between the movable part 2 and the fixed part 1 at the position of the first adjusting member 41 decreases from D1 to D2, ultimately achieving the desired result. Figure 14 The effect of consistent height on the left and right sides is shown in Figure (2).
[0095] The aforementioned first adjusting member 41 can have various structures. For example, the first adjusting member 41 includes an adjusting nut, in which a threaded hole is provided in the movable member 2 along the second horizontal direction (i.e., the Y direction), penetrating the movable member 2. One end of the adjusting nut passes through the threaded hole and abuts against the fixed member 1. The outer circumferential surface of the adjusting nut is provided with an external thread, and the adjusting nut is threadedly connected to the threaded hole through the external thread, so that the length of the protruding part of the adjusting nut can be adjusted by rotating the adjusting nut. Specifically, as shown in the figure... Figure 13 As shown, the adjusting nut includes an external thread section 41a and a nut section 41b disposed at one end of the external thread section 41a. One end of the external thread section 41a passes through a threaded hole and abuts against the fixed member 1, and the external thread section 41a is threadedly connected to the threaded hole. The nut section 41b is located on the side of the movable member 2 away from the fixed member 1 and can be used as a manual knob. Optionally, a scale for indicating the rotation angle is provided on the outer circumferential surface of the nut section 41b.
[0096] The aforementioned first fastening assembly can have various structures. For example, the first fastening assembly includes a tension bolt 42 and an adaptive nut 43. The tension bolt 42 passes sequentially through the first adjusting member 41 and the fixed member 1 from the side of the movable member 2 away from the fixed member 1. The adaptive nut 43 is located on the side of the fixed member 1 away from the movable member 2 and is threadedly connected to the tension bolt 42. By tightening the adaptive nut 43, the first adjusting member 41, the fixed member 1, and the movable member 2 are fixedly connected. Furthermore, the adaptive nut 43 can move relative to the fixed member 1 in the circumferential direction around the second rotating shaft 32 to achieve coaxiality with the tension bolt 42. That is, when the movable member 2 rotates around the first rotating shaft 31 and / or the second rotating shaft 32, the adaptive nut 43 can automatically adapt to the positional change of the tension bolt 42 in the circumferential direction around the second rotating shaft 32 as the movable member 2 rotates, without interfering with the rotation of the movable member 2, and can maintain connection with the tension bolt 42. The positions of the first adjusting member 41, the fixed member 1, and the movable member 2 can be locked by threading the self-adaptive nut 43 with the tension bolt 42. During adjustment, the tension bolt 42 can be loosened first, and then the adjusting nut can be rotated to adjust the distance between the movable member 2 and the fixed member 1 at the position of the first adjusting member 41. After the adjustment is completed, the tension bolt 42 is tightened to lock the positions of the first adjusting member 41, the fixed member 1, and the movable member 2.
[0097] In some embodiments, when the movable component 2 rotates around the first pivot 31 and / or the second pivot 32, in order to enable the tension bolt 42 to automatically adapt to the angle change of the movable component 2 without interfering with the rotation of the movable component 2 and to maintain connection with the adaptive nut 43, the first fastening assembly further includes a second washer 44 and a third washer 45. A second groove is provided on the surface of the fixed component 1 relative to the movable component 2. The second washer 44 is disposed in the second groove and sleeved on the tension bolt 42. One end of the adjusting nut abuts against the second washer 44. The second washer 44 includes two overlapping second spherical washers 44a. A third groove is provided at the end of the first adjusting member 41 away from the fixed component 1. The third washer 45 is disposed in the third groove and located between the bottom surface of the third groove and the bolt head of the tension bolt 42. The third washer 45 includes two overlapping third spherical washers 45a. The spherical surfaces of the two second spherical washers 44a engage with each other, and the spherical surfaces of the two third spherical washers 45a engage with each other, so that when the movable part 2 rotates around the first rotating shaft 31 and / or the second rotating shaft 32, by rotating one of the second spherical washers 44a relative to the other, and rotating one of the third spherical washers 45a relative to the other, the tension bolt 42 can automatically adapt to the angular changes of the movable part 2.
[0098] In some embodiments, such as Figure 8 and Figure 13 As shown, a fourth groove 12 is provided on the surface of the fixed component 1 facing away from the movable component 2. The adaptive nut 43 is disposed in the fourth groove 12, and there is a reserved gap between the adaptive nut 43 and the fourth groove 12 in the circumferential direction around the second rotating shaft 32, so that the adaptive nut 43 can move relative to the fixed component 1 in the circumferential direction around the second rotating shaft 32. The aforementioned fourth groove 12 can be used to restrict the degree of freedom of movement of the adaptive nut 43 in the vertical direction (i.e., the Z direction) and reserve sufficient rotation space in the circumferential direction around the second rotating shaft 32, i.e., the aforementioned reserved gap, to ensure that during the rotation of the movable component 2, the adaptive nut 43 can automatically adapt to the positional change of the tension bolt 42 in the circumferential direction around the second rotating shaft 32 as the movable component 2 rotates, so as not to interfere with the rotation of the movable component 2, and to maintain connection with the tension bolt 42.
[0099] In some embodiments, the second leveling component 5 is disposed diagonally below or diagonally above the leveling shaft assembly, for example, as... Figure 11 As shown, the integrated rotating shaft structure formed by the first rotating shaft 31 and the second rotating shaft 32 is, for example, located near the upper edge of the movable part 2. The first leveling component 4 is located below the integrated rotating shaft structure, and the second leveling component 5 is located diagonally below the integrated rotating shaft structure and to one side of the first leveling component 4. Preferably, the axis of the second leveling component 5 in the first horizontal direction (i.e., the X direction) is at the same height as the axis of the first leveling component 4 in the first horizontal direction.
[0100] like Figure 15 and Figure 16 As shown, the second leveling assembly 5 includes a second adjusting member 51 and a cam 52. One end of the second adjusting member 51 is fixedly connected to the fixed member 1. The cam 52 is rotatably disposed in the movable member 2, and the cam 52 is provided with an arc-shaped guide rail 521 and a drive shaft 53. One end of the drive shaft 53 is fixedly connected to the cam 52, and the drive shaft 53 is coaxial with the rotation axis of the cam 52. Specifically, the cam 52 is a circular cam, and its center is its rotation axis. The drive shaft 53 is used to drive the cam 52 to rotate when subjected to a rotational driving force. This rotational driving force can be manual, for example, but in practical applications, it can also be achieved by a drive source.
[0101] like Figure 16 and Figure 17 As shown, the extending direction of the aforementioned arc-shaped guide rail 521 is set as follows (e.g., arc-shaped guide rail 521). Figure 17 The distance R between the arc-shaped center line 521a of the arc-shaped guide rail 521 and the rotation axis O3 of the cam 52 originates from one end of the arc-shaped guide rail 521 (e.g., Figure 17 (from the left end) to the other end (e.g.) Figure 17 The distance R increases from the right end of the arc guide rail 521 to the rotation axis of the cam 52. The other end of the second adjusting member 51 away from the fixed member 1 slides with the arc guide rail 521 so that it slides along the arc guide rail 521 when the drive shaft 53 drives the cam 52 to rotate. Since the distance R changes with the sliding of the second adjusting member 51, the cam 52 will rotate relative to the stationary second adjusting member 51. This will drive the movable member 2, which is fixed relative to the cam 52, to rotate around the second rotating shaft 32. Thus, when the cam 52 is rotated counterclockwise or clockwise, the movable member 2 can be driven to rotate counterclockwise or clockwise around the second rotating shaft 32, thereby adjusting the angle of the base 102 in the rolling direction.
[0102] In some embodiments, such as Figure 15 , Figure 16 and Figure 18 As shown, the second adjusting member 51 includes a columnar sliding member 51a and a limiting member 51b disposed at one end of the columnar sliding member 51a. A fifth groove 14 is provided on the surface of the fixed member 1 relative to the movable member 2 to accommodate the limiting member 51b. The limiting member 51b is fixedly connected to the fixed member 1 by a first fastening screw 54. The outer peripheral surface shape of the limiting member 51b is adapted to the inner surface shape of the fifth groove 14 and is configured to restrict the rotation of the columnar sliding member 51a. Optionally, both the outer peripheral surface shape of the limiting member 51b and the inner surface shape of the fifth groove 14 are rectangular or square. The other end of the columnar sliding member 51a, away from the limiting member 51b, slides in engagement with the arc-shaped guide rail 521.
[0103] In some embodiments, the second leveling assembly further includes a second fastening assembly for rotatably mounting the cam 52 in the movable member 2. The second fastening assembly can have various structures, for example, such as... Figure 15 , Figure 18 and Figure 19 As shown, the device includes a cam end cap 56 and two cam bearings. A sixth groove 23 is provided on the surface of the movable part 2 away from the fixed part 1 to accommodate the cam 52. A first shaft hole 231 is provided on the bottom surface of the sixth groove 23. A limiting shaft 522 is coaxially provided on the side of the cam 52 facing away from the drive shaft 53. The limiting shaft 522 is rotatably disposed in the first shaft hole 231 via one of the cam bearings 55a. The limiting shaft 522 can limit the position of the cam 52 in the sixth groove 23, while also allowing the cam 52 to rotate within the sixth groove 23.
[0104] The cam end cap 56 is located on the side of the movable part 2 away from the fixed part 1, and is fixedly connected to the movable part 2 by the second fastening screw 561. The cam end cap 56 covers the opening of the sixth groove 23 to confine the cam 52 in the sixth groove 23 and prevent the cam 52 from coming out of the sixth groove 23. Moreover, a second shaft hole is provided on the drive nut 57, and the end of the drive shaft 53 away from the cam 52 passes through the cam end cap 56 so that it can extend out of the cam end cap 56 to receive external driving force and drive the cam 52 to rotate. In addition, another cam bearing 55b is provided between the drive shaft 53 and the cam end cap 56 to allow the drive shaft 53 to rotate relative to the cam end cap 56.
[0105] In some embodiments, to facilitate manual rotation of the drive shaft 53, the second fastening assembly may further include a drive nut 57 and a third screw 58. A second shaft hole is provided on the drive nut 57, and the end of the drive shaft 53 away from the cam 52 passes through the cam end cap 56 and extends into the second shaft hole. Preferably, a limiting groove 531 is provided at the end of the drive shaft 53 away from the cam 52, and correspondingly, a limiting protrusion is provided on the wall of the second shaft hole. The limiting protrusion cooperates with the limiting groove 531 to limit the relative rotation between the drive shaft 53 and the drive nut 57. The third screw 58 passes through the drive nut 57 from the side of the drive nut 57 away from the drive shaft 53 along the extending direction of the drive shaft 53 and is threadedly connected to the drive shaft 53. The drive nut 57 and the drive shaft 53 can be fixedly connected by the third screw 58. The drive nut 57 can be used as a manual knob to drive the drive shaft 53 and the cam 52 to rotate synchronously. Optionally, the outer circumferential surface of the drive nut 57 is provided with a scale for indicating the rotation angle. In some embodiments, the second fastening assembly further includes a first set screw 571 and a second set screw 59. The first set screw 571 passes radially through the drive nut 57 from its outer peripheral surface along the drive shaft 53 and abuts against the outer peripheral surface of the drive shaft 53, thereby limiting the relative rotation between the drive nut 57 and the drive shaft 53. The second set screw 59 passes radially through the movable member 2 along the cam 52 and abuts against the outer peripheral surface of the cam 52, thereby limiting the relative rotation between the cam 52 and the movable member 2. After adjustment, the first set screw 571 and the second set screw 59 can be used to lock the relative positions of the drive nut 57 and the drive shaft 53, and the relative positions of the cam 52 and the movable member 2, respectively.
[0106] In some embodiments, such as Figure 17 As shown, on the radial section of the cam 52, the center of the orthographic projection of the second adjusting member 51 is located at one end of the arc-shaped guide rail 521 (i.e., Figure 17The line connecting the center B1 shown in the diagram and the rotation center O3 of the cam 52 is the first line L1. The center of the orthographic projection of the second adjusting member 51 is located at the other end of the arc-shaped guide rail 521 (i.e., Figure 17 The line connecting the center (B2) shown in the diagram and the rotation center of the cam 52 is the second line L2; the angle between the first line L1 and the second line L2 is 180°. Thus, the cam 52 can rotate 90° clockwise or counterclockwise.
[0107] Alternatively, on the radial section of the cam 52, the center of the orthographic projection of the second adjusting member 51 lies on the arcuate trajectory of the sliding between the two ends of the arcuate guide rail 521 (i.e., Figure 17 The arc-shaped centerline 521a) of the arc-shaped guide rail 521 satisfies the following parametric equation:
[0108] x(t) = (π / 2 × t + 12) × sin(t)
[0109] y(t) = (π / 2 × t + 12) × cos(t)
[0110] Where t is a parameter, and the center of the orthographic projection of the second adjusting member 51 is located at one end of the arc-shaped guide rail 521 (i.e., Figure 17 When the center B1 shown in the figure is located, t = t1 = 0; when the center of the orthographic projection of the second adjusting member 51 is located at the other end of the arc-shaped guide rail 521 (i.e., Figure 17 When the center B2 is located (as shown in the figure), t = t2 = π.
[0111] An arc-shaped trajectory satisfying the above parametric equations can achieve a smooth transition within the range of 0° to 180°, that is, realize the rotation axis of the arc-shaped guide rail 521 and the cam 52 (e.g. Figure 17 The distance R between the arc-shaped center lines 521a) of the arc-shaped guide rail 521 increases from one end to the other. This allows the cam 52 to rotate by a preset unit angle (e.g., 1°), corresponding to a specific value in the distance R between the rotation axes of the arc-shaped guide rail 521 and the cam 52. Therefore, the rotation angle of the movable part 2 around the second rotating shaft 32 can be adjusted by controlling the rotation angle of the cam 52. In practical applications, the limit range of the distance R between the rotation axes of the arc-shaped guide rail 521 and the cam 52 can be adjusted by changing the parameters of the above parametric equation, thus meeting various different leveling requirements.
[0112] As another technical solution, this embodiment of the invention also provides a semiconductor process equipment, including a process chamber 100 and a carrier device disposed in the process chamber 100 for carrying wafers, and also includes the leveling device 200 provided in this embodiment of the invention for adjusting the levelness of the carrier surface of the carrier device; wherein, the carrier device includes a base 102, the base 102 passing through the fixed component 1 via a cantilever 103 and fixedly connected to the movable component 2.
[0113] The semiconductor process equipment provided in this embodiment of the invention, for example, is applied to a capacitively coupled plasma (CCP) apparatus. This apparatus includes a process chamber 100 and an upper electrode and a lower electrode disposed within the process chamber 100. The lower electrode is located below the upper electrode and also serves as a wafer-carrying device. Figure 1 and Figure 2 As shown, the support device includes a base 102, which extends beyond the side wall 101 of the process chamber 100 via a cantilever 103 and is fixedly connected to a leveling device 200. The leveling device 200 is used to adjust the levelness of the support surface of the base 102 to ensure that the parallelism of the upper and lower electrodes meets the requirements.
[0114] Specifically, the leveling device 200 provided in this embodiment of the invention includes a fixed component 1, a movable component 2, a leveling shaft assembly, a first leveling assembly, and a second leveling assembly. The fixed component 1 and the movable component 2 are arranged opposite to each other. The fixed component 1 is, for example, a frame of any shape such as a rectangle or a square, and the movable component 2 is, for example, a plate of any shape such as a rectangle or a square. Preferably, the frame shape of the fixed component 1 is the same as the plate shape of the movable component 2.
[0115] In some embodiments, the fixed component 1 and the movable component 2 are arranged opposite to each other in a direction parallel to the extension of the cantilever 103, and the frame of the fixed component 1 and the plate of the movable component 2 are both perpendicular to the extension of the cantilever 103. The fixed component 1 is located between the movable component 2 and the base 102. One end of the cantilever 103 passes through the space enclosed by the frame of the fixed component 1 and is fixedly connected to the movable component 2, for example, by a plurality of screws.
[0116] In some embodiments, a positioning structure is provided between the cantilever 103 and the movable component 2. This positioning structure is used to define the relative position between the cantilever 103 and the movable component 2. With the help of the positioning structure, the positioning between the cantilever 103 and the movable component 2 can be achieved, reducing assembly errors between the base 102 and the movable component 2. This ensures that changes in the angle of the movable component 2 can be accurately fed back to the bearing surface of the base 102, thereby ensuring the adjustment accuracy of the levelness of the bearing surface of the base 102. The positioning structure can have various structures, for example, such as... Figure 3 As shown, the positioning structure includes multiple positioning pins 103a and multiple positioning holes 21, and each positioning pin 103a is provided in a one-to-one correspondence with each positioning hole 21. Each positioning pin 103a is provided on one of the two mating surfaces of the cantilever 103 and the movable part 2 that are opposite to each other, and each positioning hole 21 is provided on the other of the two mating surfaces of the cantilever 103 and the movable part 2 that are opposite to each other.
[0117] In some embodiments, the semiconductor process equipment further includes a lifting mechanism. This lifting mechanism is connected to the fixed component 1 and drives the fixed component 1 to rise and fall. During the rising and falling process, the fixed component 1 drives the movable component 2 and the base connected to it via a cantilever to rise and fall synchronously, thereby achieving the overall lifting and falling of the leveling device 200. Furthermore, a lifting guide rail 104 is provided on the outer side of the side wall 101 of the process chamber 100. The fixed component 1 is slidably connected to the lifting guide rail 104 in the vertical direction via a guide rail slider 105. During the rising and falling process, the fixed component 1 rises and falls along the lifting guide rail 104, which serves as a guide.
[0118] The semiconductor process equipment provided in this embodiment of the invention can reduce the number of parts and simplify the structure by using the leveling device 200 provided in this embodiment of the invention, thereby reducing processing costs and increasing the adjustment range to meet various different leveling requirements and improve the versatility of the leveling device 200.
[0119] It is understood that the above embodiments are merely exemplary implementations used to illustrate the principles of the present invention, and the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also considered to be within the scope of protection of the present invention.
Claims
1. A leveling device, applied to semiconductor process equipment, characterized in that, It includes a fixed component, a movable component, a leveling shaft assembly, a first leveling assembly, and a second leveling assembly, wherein the fixed component and the movable component are disposed opposite to each other; the movable component is used to be fixedly connected to the component to be leveled in the semiconductor process equipment; The leveling shaft assembly includes a first rotating shaft and a second rotating shaft, wherein the first rotating shaft extends along a first horizontal direction and is rotatably connected to the movable component; the second rotating shaft extends along a second horizontal direction perpendicular to the first horizontal direction and is rotatably connected to the fixed component, and one end of the second rotating shaft is fixedly connected to the first rotating shaft. The first leveling component is used to adjust the angle at which the movable component rotates relative to the fixed component around the first rotating axis; The second leveling component is used to adjust the angle at which the movable component rotates relative to the fixed component around the second axis.
2. The leveling device according to claim 1, characterized in that, The movable component has a rotating shaft mating groove formed on its surface relative to the fixed component. The first rotating shaft is rotatably disposed in the rotating shaft mating groove, and the outer peripheral surface of the first rotating shaft mates with the inner surface of the rotating shaft mating groove. The connection portion of the second rotating shaft to the first rotating shaft has a reserved gap in the circumferential direction around the first rotating shaft between the rotating shaft mating groove and the second rotating shaft, so that the connection portion can rotate around the first rotating shaft in the rotating shaft mating groove.
3. The leveling device according to claim 2, characterized in that, A limiting protrusion is formed on the outer peripheral surface of the first rotating shaft, and a limiting recess is formed in the rotating shaft mating groove. The limiting recess and the limiting protrusion cooperate to limit the position of the first rotating shaft in the first horizontal direction. The limiting recess and the limiting protrusion have the reserved gap in the circumferential direction around the first rotating shaft; the second rotating shaft is fixedly connected to the limiting protrusion.
4. The leveling device according to claim 2, characterized in that, The leveling shaft assembly further includes a first screw and a first washer, wherein the first screw passes through the movable part from the side of the movable part away from the fixed part and is threadedly connected to the first rotating shaft to restrict the first rotating shaft in the rotating shaft mating groove; A first groove is formed on the surface of the movable part away from the fixed part. The first washer is sleeved on the first screw and is located between the bottom surface of the first groove and the screw head of the first screw. The first washer includes two first spherical washers that are stacked on top of each other, and the spherical surfaces of the two first spherical washers cooperate with each other.
5. The leveling device according to claim 1, characterized in that, The fixing component is provided with a rotating shaft mating hole that extends through the fixing component along the second horizontal direction, and the second rotating shaft is rotatably disposed in the rotating shaft mating hole; the outer peripheral surface of the second rotating shaft mates with the inner surface of the rotating shaft mating hole.
6. The leveling device according to claim 5, characterized in that, The leveling shaft assembly also includes a second screw, a shaft end cap, and a bearing, wherein... The shaft end cap is disposed on the side of the fixed component away from the movable component and corresponds to the mating hole of the rotating shaft. The shaft end cap is rotatably connected to the fixed component through the bearing. The second screw passes through the shaft end cap from the side away from the fixing component along the second horizontal direction and is threadedly connected to the second shaft.
7. The leveling device according to claim 1, characterized in that, The axis of the second rotating shaft intersects the vertical axes of the fixed component and the movable component, and also intersects the midpoint of the axis of the first rotating shaft.
8. The leveling device according to any one of claims 1-7, characterized in that, The first leveling component is disposed below or above the leveling shaft assembly, and includes a first adjusting member and a first fastening component, wherein the first adjusting member passes through the movable component, and one end of the first adjusting member abuts against the fixed component, and the first adjusting member is configured to be adjustable in length relative to the protruding portion of the movable component protruding toward the fixed component; The first fastening assembly is used to securely connect the first adjusting member, the fixed member, and the movable member.
9. The leveling device according to claim 8, characterized in that, The first adjusting member includes an adjusting nut. A threaded hole is provided in the movable part, which passes through the movable part along the second horizontal direction. One end of the adjusting nut passes through the threaded hole and abuts against the fixed part. An external thread is provided on the outer peripheral surface of the adjusting nut. The adjusting nut is threaded to the threaded hole through the external thread, so that the length of the protruding part of the adjusting nut can be adjusted by rotating the adjusting nut.
10. The leveling device according to claim 9, characterized in that, The first fastening assembly includes a tension bolt and an adaptive nut, wherein, The tensioning bolt passes sequentially through the first adjusting member and the fixed member from the side of the movable member away from the fixed member; The adaptive nut is located on the side of the fixed component away from the movable component and is threadedly connected to the tension bolt. By tightening the adaptive nut, the first adjusting component, the fixed component, and the movable component are fixedly connected. Furthermore, the adaptive nut can move relative to the fixed component in the circumferential direction around the second axis of rotation to achieve coaxiality with the tension bolt.
11. The leveling device according to claim 10, characterized in that, The first fastening assembly further includes a second washer and a third washer, wherein, A second groove is provided on the surface of the fixed component relative to the movable component. The second washer is disposed in the second groove and sleeved on the tension bolt. One end of the adjusting nut abuts against the second washer. The second washer includes two second spherical washers stacked on top of each other. A third groove is provided at the end of the first adjusting member away from the fixed component. The third washer is disposed in the third groove and is located between the bottom surface of the third groove and the bolt head of the tensioning bolt. The third washer includes two third spherical washers stacked on top of each other. The spherical surfaces of the two second spherical washers engage with each other, and the spherical surfaces of the two third spherical washers engage with each other, so that the tensioning bolt can rotate with the rotation of the moving part.
12. The leveling device according to claim 10, characterized in that, A fourth groove is provided on the surface of the fixed component away from the movable component. The adaptive nut is disposed in the fourth groove, and there is a reserved gap between the adaptive nut and the fourth groove in the circumferential direction around the second axis of rotation, so that the adaptive nut can move relative to the fixed component in the circumferential direction around the second axis of rotation.
13. The leveling device according to any one of claims 1-7, characterized in that, The second leveling component is disposed diagonally below or diagonally above the leveling shaft assembly, and includes a second adjusting member and a cam, wherein one end of the second adjusting member is fixedly connected to the fixed component; The cam is rotatably mounted in the movable component, and the cam is provided with an arc-shaped guide rail and a drive shaft. One end of the drive shaft is fixedly connected to the cam, and the drive shaft is coaxial with the rotation axis of the cam. The drive shaft is used to drive the cam to rotate when subjected to a rotational driving force. The extension direction of the arc-shaped guide rail is configured such that the distance between the arc-shaped guide rail and the rotation axis of the cam increases from one end of the arc-shaped guide rail to the other end. The other end of the second adjusting member, away from the fixed component, slides in cooperation with the arc-shaped guide rail so that when the drive shaft drives the cam to rotate, it slides along the arc-shaped guide rail, thereby driving the movable component to rotate around the second rotating shaft.
14. The leveling device according to claim 13, characterized in that, The second adjusting member includes a columnar sliding member and a limiting member disposed at one end of the columnar sliding member, wherein, A fifth groove is provided on the surface of the fixed component relative to the movable component for accommodating the limiting member. The limiting member is fixedly connected to the fixed component by a first fastening screw. The outer peripheral surface shape of the limiting member is adapted to the inner surface shape of the fifth groove and is configured to limit the rotation of the columnar sliding member. The other end of the columnar slider, away from the limiting member, slides in cooperation with the arc-shaped guide rail.
15. The leveling device according to claim 13, characterized in that, The second leveling assembly further includes a second fastening assembly for rotatably mounting the cam in the movable part; the second fastening assembly includes a cam end cap and two cam bearings, wherein... A sixth groove is provided on the surface of the movable part away from the fixed part for accommodating the cam, and a first shaft hole is provided on the bottom surface of the sixth groove. A limit shaft is coaxially provided on the side of the cam away from the drive shaft, and the limit shaft is rotatably disposed in the first shaft hole through one of the cam bearings. The cam end cap is located on the side of the movable part away from the fixed part, and is fixedly connected to the movable part by a second fastening screw. The cam end cap covers the opening of the sixth groove to confine the cam in the sixth groove. The end of the drive shaft away from the cam passes through the cam end cover; and another cam bearing is provided between the drive shaft and the cam end cover to enable the drive shaft to rotate relative to the cam end cover.
16. The leveling device according to claim 15, characterized in that, The second fastening assembly further includes a drive nut and a third screw, wherein a second shaft hole is provided on the drive nut, and the end of the drive shaft away from the cam extends into the second shaft hole; the third screw passes through the drive nut from the side of the drive nut away from the drive shaft along the extension direction of the drive shaft, and is threadedly connected to the drive shaft.
17. The leveling device according to claim 16, characterized in that, The second fastening assembly further includes a first set screw and a second set screw, wherein the first set screw passes through the drive nut radially along the drive shaft from the outer peripheral surface of the drive nut and abuts against the outer peripheral surface of the drive shaft, thereby limiting the relative rotation between the drive nut and the drive shaft; The second set screw passes through the movable part radially along the cam and abuts against the outer peripheral surface of the cam, thereby limiting the relative rotation between the cam and the movable part.
18. The leveling device according to claim 13, characterized in that, On the radial section of the cam, the line connecting the center of the orthographic projection of the second adjusting member at one end of the arc-shaped guide rail and the rotation center of the cam is the first line, and the line connecting the center of the orthographic projection of the second adjusting member at the other end of the arc-shaped guide rail and the rotation center of the cam is the second line. The angle between the first line and the second line is 180°.
19. The leveling device according to claim 18, characterized in that, On the radial section of the cam, the center of the orthographic projection of the second adjusting member lies in the arcuate trajectory that slides between the two ends of the arcuate guide rail, satisfying the following parametric equation: x(t) = (π / 2 × t + 12) × sin(t) y(t) = (π / 2 × t + 12) × cos(t) Wherein, t is an angle parameter in radians, which varies continuously between 0 and π. When the center of the orthographic projection of the second adjusting member is located at one end of the arc-shaped guide rail, t=0; when the center of the orthographic projection of the second adjusting member is located at the other end of the arc-shaped guide rail, t=π.
20. A semiconductor process apparatus, comprising a process chamber and a support device disposed within the process chamber for supporting a wafer, characterized in that, It also includes a leveling device as described in any one of claims 1-19, for adjusting the levelness of the bearing surface of the bearing device; wherein the bearing device includes a base, the base passing through the fixed component via a cantilever and being fixedly connected to the movable component.
21. The semiconductor process equipment according to claim 20, characterized in that, A positioning structure is provided between the cantilever and the movable component, the positioning structure being used to define the relative position of the cantilever and the movable component.
22. The semiconductor process equipment according to claim 20, characterized in that, It also includes a lifting mechanism; A lifting guide rail is provided on the outer side wall of the process chamber, and the fixing component is slidably connected to the lifting guide rail in the vertical direction through a guide rail slider; The lifting mechanism is used to drive the fixed component to rise and fall, so as to realize the overall lifting and lowering of the leveling device.
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