Abrasive grinding disc based on concentration difference distribution of abrasive grains and manufacturing method thereof

Abstract

The application provides an abrasive grinding disc based on abrasive particle concentration difference distribution and a manufacturing method thereof, and relates to the technical field of grinding and polishing. The method comprises the following steps: S1, preparing a metal base disc; S2, calculating the abrasive particle concentration of the abrasive block in different regions of the grinding disc based on a workpiece surface quality uniformity model, determining the formula of the abrasive block, and preparing abrasive blocks with different abrasive particle concentrations; S3, pasting the prepared abrasive blocks with different abrasive particle concentrations on the corresponding positions of the metal base disc according to the design, and completing the manufacturing of the grinding disc with different abrasive particle concentration distributions of the abrasive blocks; and S4, installing the manufactured grinding disc on a corresponding grinding machine tool. Through the application, the surface quality uniformity of the ground workpiece and the consistency of the product can be effectively improved.

Description

Technical Field

[0001] This invention relates to the field of grinding and polishing technology, and more specifically, to an abrasive grinding disc based on the differential distribution of abrasive particle concentration and its manufacturing method. Background Technology

[0002] Double-sided planetary grinding is a primary method for achieving efficient and precise machining of thin-film parts such as ceramic substrates, glass panels, semiconductor substrates, and bearing gaskets. The machining process involves placing the part in the planetary wheel hole, with the sun gear driving the planetary wheel to perform planetary motion. Simultaneously, the upper and lower grinding discs apply a certain pressure and relative rotational motion to the workpiece surface. Material removal is achieved through the relative sliding of abrasive grains on the grinding disc surface onto the workpiece surface. This method allows for simultaneous machining of the upper and lower surfaces of the part, resulting in high machining efficiency and excellent surface accuracy.

[0003] With the widespread application of various thin-sheet parts, the requirements for the surface quality and surface accuracy of these parts are becoming increasingly stringent. In double-sided planetary grinding, existing ordinary grinding discs have uniform abrasive grain distribution across all areas. However, when the workpiece undergoes planetary motion relative to the disc surface, the uneven distribution of abrasive grain trajectories on the workpiece surface makes it difficult to guarantee the uniformity of the workpiece surface finish. Furthermore, to improve production efficiency and reduce costs, grinding discs are becoming increasingly larger, and the number of parts processed in a single operation is also increasing, making it difficult to guarantee the consistency of parts produced in batches. Summary of the Invention

[0004] This invention discloses a method for manufacturing an abrasive grinding disc based on the differential distribution of abrasive particle concentration, aiming to improve the problem that the uniformity of workpiece surface processing is difficult to guarantee during grinding in existing double-sided planetary grinding devices due to the uneven distribution of abrasive particle trajectories on the workpiece surface.

[0005] The present invention adopts the following solution:

[0006] This application provides a method for manufacturing an abrasive grinding disc based on the differential distribution of abrasive particle concentration, comprising the following steps:

[0007] S1. Determine the substrate size of the grinding disc according to the application requirements and prepare the metal substrate disc;

[0008] S2. Divide the grinding disc into different areas of grinding blocks. Calculate the abrasive concentration of the grinding blocks in different areas of the grinding disc based on the workpiece surface quality uniformity model. Produce grinding blocks for the corresponding areas according to the above abrasive concentration ratio, and prepare grinding blocks with different abrasive concentrations by sintering.

[0009] S3. Paste the prepared grinding blocks with different abrasive concentrations onto the corresponding positions of the metal base disk according to the design to complete the production of the grinding disk with differentiated abrasive concentration distribution of the grinding blocks.

[0010] S4. Install the prepared grinding disc onto the corresponding grinding machine tool and modify it for double-sided grinding of various parts.

[0011] Furthermore, in step S2, the workpiece surface quality uniformity model is obtained through the following steps and calculations:

[0012] S21. Establish the trajectory equation of the workpiece surface during double-sided grinding.

[0013]

[0014] Among them, Z s Z represents the number of teeth on the sun gear. p Z represents the number of teeth on the planetary gear's disk. f n is the number of teeth on the external gear ring. s n is the rotational speed of the sun gear. p n is the grinding disc rotation speed. w denoted as workpiece rotation speed; e is the center distance between the sun gear and the carrier disk; d is the workpiece eccentricity; L is the position of the abrasive grain on the grinding disk; α is the initial phase angle of the abrasive grain.

[0015] S22. Divide the wafer into several grids and calculate the trajectory length within each grid. The trajectory length calculation equation is as follows:

[0016]

[0017] Where x i,t y is the abscissa of the abrasive grain at time t; i,t x is the ordinate of the abrasive grain at time t; i,t+tp For the time t p The abscissa of the abrasive grains; y i,t+tp For the time t p Post-abrasive grain longitudinal coordinate; t p For time step;

[0018] S23. The ratio of the standard deviation of trajectory length to the mean length within each grid is used as an evaluation index for trajectory distribution uniformity, defined as VCSD; its formula is: Where S is the variance of the trajectory length within each grid; This represents the average length of the trajectory within each grid cell.

[0019] Further, in step S2, the abrasive grain concentration of the grinding block is set based on the workpiece surface quality uniformity model, including the following steps:

[0020] S24. Divide the grinding disc radially from the inside out into ten regions K1, K2, K3...K10; the groove widths of regions K1 to K10 are equal.

[0021] S25. Determine the number of abrasive grains in the grinding blocks within the K1 to K10 region based on the workpiece surface quality uniformity model to achieve optimal workpiece surface quality uniformity.

[0022] S26. Calculate the abrasive spacing in each region based on the number of abrasive grains in the abrasive block determined in S25.

[0023] S27. The abrasive concentration of each region of the grinding block can be calculated based on the abrasive spacing determined in S26.

[0024] Further, in step S2, the grinding disc is divided into several regions radially from the inside to the outside by concentric circular grooves; the groove width between each region is equal; the grinding disc is divided into several grinding blocks within the same region by radial grooves.

[0025] Furthermore, the grinding disc is divided into ten regions K1, K2, K3, ... K10 from the inside to the outside by concentric circular grooves along the radial direction; the groove widths between regions K1 to K10 are equal; and the grinding disc is divided into 20 grinding blocks within the same region by radial grooves.

[0026] Furthermore, the depth of the concentric circular groove is 8mm; the width of the concentric circular groove is 2mm; and the number of concentric circular grooves is 9.

[0027] Furthermore, the depth of the radial groove is 8 mm; the width of the groove is 2 mm; and the number of radial grooves is 20.

[0028] Furthermore, the diameter of the grinding disc is 320mm to 720mm.

[0029] The present invention also provides an abrasive grinding disc, which is manufactured by the abrasive grinding disc manufacturing method based on the abrasive particle concentration difference distribution described in any one of the above-mentioned methods.

[0030] Beneficial effects:

[0031] The grinding disc provided by this invention, based on the uniformity of workpiece surface quality, features different abrasive grain concentration distributions on different areas of the grinding blocks. This ensures uniform trajectory distribution on the workpiece surface under different grinding process parameters, thereby increasing the uniformity of workpiece surface quality. The concentric circular grooves are closed, possessing strong retention capacity, allowing the grinding fluid to quickly fill the entire disc surface, improving the grinding environment, shortening the dry friction stage time, and reducing workpiece deformation, burning, and surface quality degradation caused by dry friction. The radial grooves facilitate the flow of the grinding fluid and promote chip removal. Attached Figure Description

[0032] Figure 1 This is a schematic diagram of the grinding block distribution of the grinding disc in an embodiment of the present invention;

[0033] Figure 2 This is a schematic diagram of the abrasive grain distribution of the grinding disc in an embodiment of the present invention;

[0034] Figure 3 A surface trajectory distribution diagram of a workpiece processed by a conventional grinding wheel;

[0035] Figure 4 This is a trajectory distribution diagram of a workpiece surface processed by a grinding disc with differentiated abrasive particle concentration, according to an embodiment of the present invention.

[0036] Figure 5 This is a comparison chart showing the uniformity of workpiece surface quality processed by a conventional grinding wheel and a grinding wheel with a differential distribution of abrasive grain concentration according to the embodiments of the present invention. Detailed Implementation

[0037] Example 1

[0038] Combination Figure 1 and Figure 2 As shown, this embodiment provides a method for manufacturing an abrasive grinding disc based on the differential distribution of abrasive particle concentration, including the following steps:

[0039] S1. Determine the substrate size of the grinding disc according to the application requirements and prepare the metal substrate disc;

[0040] S2. Divide the grinding disc into different areas of grinding blocks. Calculate the abrasive concentration of the grinding blocks in different areas of the grinding disc based on the workpiece surface quality uniformity model. Produce grinding blocks for the corresponding areas according to the above abrasive concentration ratio, and prepare grinding blocks with different abrasive concentrations by sintering.

[0041] S3. Paste the prepared grinding blocks with different abrasive concentrations onto the corresponding positions of the metal base disk according to the design to complete the production of the grinding disk with differentiated abrasive concentration distribution of the grinding blocks.

[0042] S4. Install the prepared grinding disc onto the corresponding grinding machine tool and modify it for double-sided grinding of various parts.

[0043] In this embodiment, the base of the grinding disc can be set as a disc shape, which is a circular metal base disc. Preferably, the diameter of the grinding disc surface is 320mm to 720mm. Of course, in other embodiments, grinding discs of other sizes can be used as needed. When dividing the grinding disc into regions, the grinding disc is divided into several regions radially from the inside to the outside by concentric circular grooves, and the groove width between each region is equal. The grinding disc is divided into several grinding blocks within the same region by radial grooves. For example, in one embodiment, the grinding disc is divided into ten regions K1, K2, K3, ... K10 radially from the inside to the outside by concentric circular grooves; the groove width between regions K1 to K10 is equal; the grinding disc is divided into 20 grinding blocks within the same region by radial grooves. This embodiment uses a configuration of ten zones, each divided into 20 grinding blocks by radial grooves, as an example. The concentric grooves are set to a depth of 8mm, a width of 2mm, and a number of 9 grooves. The radial grooves are also set to a depth of 8mm, a width of 2mm, and a number of 20 grooves. By creating a closed concentric groove structure, the system has strong retention capacity, allowing the grinding fluid to quickly fill the entire surface, improving the grinding environment, shortening the dry friction stage, and reducing workpiece deformation, burning, and surface quality degradation caused by dry friction. The radial grooves also facilitate the flow of the grinding fluid and aid in chip removal. Of course, the above parameters are only one preferred embodiment and are not limited to this.

[0044] In step S2, the workpiece surface quality uniformity model is obtained through the following steps and calculations:

[0045] S21. Establish the trajectory equation of the workpiece surface during double-sided grinding.

[0046]

[0047] Among them, Z s Z represents the number of teeth on the sun gear. p Z represents the number of teeth on the planetary gear's disk. f n is the number of teeth on the external gear ring. s n is the rotational speed of the sun gear. p n is the grinding disc rotation speed. w denoted as workpiece rotation speed; e is the center distance between the sun gear and the carrier disk; d is the workpiece eccentricity; L is the position of the abrasive grain on the grinding disk; α is the initial phase angle of the abrasive grain.

[0048] S22. Divide the wafer into several grids and calculate the trajectory length within each grid. The trajectory length calculation equation is as follows:

[0049]

[0050] Where xi,t y is the abscissa of the abrasive grain at time t; i,t x is the ordinate of the abrasive grain at time t; i,t+tp For the time t p The abscissa of the abrasive grains; y i,t+tp For the time t p Post-abrasive grain longitudinal coordinate; t p For time step;

[0051] S23. The ratio of the standard deviation of trajectory length to the mean length within each grid is used as an evaluation index for trajectory distribution uniformity, defined as VCSD; its formula is: Where S is the variance of the trajectory length within each grid; This represents the average trajectory length within each grid. Here, VCSD is the trajectory uniformity evaluation index, which can be used to evaluate the uniformity of the trajectory surface quality. The smaller the VCSD, the better the surface quality uniformity. Based on the set VCSD value, the trajectory distribution of the wafer to be processed during grinding by the double-sided planetary grinding machine can be obtained, and the grinding block can be made using this trajectory distribution.

[0052] The abrasive grain concentration of the grinding block can be set using the workpiece surface quality uniformity model, specifically including the following steps:

[0053] S24. Divide the grinding disc radially from the inside out into ten regions K1, K2, K3...K10; the groove widths of regions K1 to K10 are equal.

[0054] S25. Determine the number of abrasive grains in the grinding blocks within the K1 to K10 region based on the workpiece surface quality uniformity model to achieve optimal workpiece surface quality uniformity.

[0055] S26. Calculate the abrasive spacing in each region based on the number of abrasive grains in the abrasive block determined in S25.

[0056] S27. The abrasive concentration of each region of the grinding block can be calculated based on the abrasive spacing determined in S26.

[0057] The determination of the abrasive block formula mentioned here refers to determining the abrasive concentration on each abrasive block in each region. Based on the uniform distribution characteristics of the workpiece trajectory, the abrasive concentration on the abrasive blocks in different regions is determined. The different abrasive blocks are then pasted onto different positions on the metal base disk according to the uniform distribution characteristics of the workpiece trajectory to obtain a grinding disk with differentiated abrasive concentration distribution. This allows for maximum efficiency during grinding, thereby improving the uniformity of the surface quality of the ground workpiece and the consistency of batch products.

[0058] Based on the calculation results of the workpiece surface quality uniformity model, it is found that compared with the ordinary grinding disc with uniformly distributed abrasive grains, the optimized grinding disc, with its abrasive grain concentration gradually decreasing from the inside to the outside in the radial direction, significantly improves the surface quality uniformity of the workpiece and greatly enhances the consistency of the workpiece products. The optimized grinding disc's structure and abrasive grain arrangement are as follows: Figure 1 and Figure 2 As shown. Combined with Figure 3 , Figure 4 and Figure 5 As shown, by comparing with a regular grinding wheel, it can be concluded that the surface trajectory of the processed workpiece obtained by differentiating the abrasive concentration of the grinding blocks in each region in this embodiment is more uniform.

[0059] In this embodiment, the preparation of grinding blocks with different abrasive concentrations by sintering is an existing technology, and its process flow will not be described in detail here.

[0060] This embodiment improves the uniformity of abrasive grain trajectory on the tool surface during double-sided grinding by adjusting the abrasive grain concentration of different areas on the grinding disc surface. This improves the uniformity of the surface quality of the ground workpiece and the consistency of batch products, thus solving the problems of uniformity of part surface processing and consistency of batch parts during double-sided grinding.

[0061] Example 2

[0062] The present invention also provides an abrasive grinding disc, which is manufactured by the above-described method for manufacturing an abrasive grinding disc based on the differential distribution of abrasive particle concentration.

[0063] The abrasive grinding disc produced in this embodiment can ensure that the trajectory distribution on the workpiece surface is uniform under different grinding process parameters, thereby increasing the uniformity of the workpiece surface quality.

[0064] It should be understood that the above are merely preferred embodiments of the present invention, and the scope of protection of the present invention is not limited to the above embodiments. All technical solutions that fall within the scope of the present invention are within the scope of protection of the present invention.

[0065] The accompanying drawings used in the above description of the embodiments only illustrate certain embodiments of the present invention and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained from these drawings without creative effort.

Claims

1. A manufacturing method of an abrasive polishing disc based on abrasive grain concentration difference distribution, characterized by, It comprises the following steps: S1, determining the base size of the grinding disc according to the application needs, and preparing a metal base disc; S2, dividing the grinding disc into different area blocks, calculating the abrasive particle concentration of the grinding disc in different area blocks based on the workpiece surface quality uniformity model, preparing the area blocks according to the above abrasive particle concentration ratio, and preparing the area blocks with different abrasive particle concentrations by sintering method; S3, pasting the prepared area blocks with different abrasive particle concentrations to the corresponding positions of the metal base disc according to the design, and completing the preparation of the grinding disc with different abrasive particle concentration distribution; S4, installing the prepared grinding disc on the corresponding grinding machine for modification for double-sided grinding of various parts; In step S2, the workpiece surface quality uniformity model is obtained by the following steps and calculation: S21, establishing a double-sided grinding workpiece surface trajectory equation, wherein, wherein is the number of sun gear teeth; is the number of carrier gear teeth; is the number of outer ring gear teeth; is the sun gear rotational speed; is the grinding disc rotational speed; is the workpiece rotational speed; is the sun gear and carrier center distance; is the workpiece eccentricity; is the abrasive particle position on the grinding disc; is the abrasive particle initial phase angle; S22, dividing the wafer into a plurality of grids, and calculating the trajectory length in each grid; the trajectory length calculation equation is as follows: ， wherein is the x-coordinate of the abrasive particle at time t; is the y-coordinate of the abrasive particle at time t; is the time elapsed t p is the x-coordinate of the abrasive particle after time t; is the time elapsed t p is the y-coordinate of the abrasive particle after time t; t p is the time step; S23, the ratio of the standard deviation of the length of the trajectory in each grid to the average length of the trajectory is taken as the evaluation index of the uniformity of the trajectory distribution, and is defined as ; Then , S is the variance of the length of the trajectories within each grid; is the average length of the trajectories within each grid. In step S2, the abrasive particle concentration of the grinding block is set based on the workpiece surface quality uniformity model, comprising the following steps: S24, dividing the grinding disc into K1, K2, K3…K10 ten areas from inside to outside along the radial direction by grooves; the groove width between K1 to K10 areas is equal; S25, determining the abrasive particle number of the grinding block in K1 to K10 areas according to the workpiece surface quality uniformity model, so that the workpiece surface quality uniformity is optimal; S26, calculating the abrasive particle spacing in the grinding block in each area according to the abrasive particle number of the grinding block determined in S25; S27, calculating the abrasive particle concentration of the grinding block in each area according to the abrasive particle spacing in the grinding block determined in S26.

2. The method of claim 1, wherein the abrasive polishing pad is formed by a method comprising: The grinding disc is divided into a plurality of grinding blocks by radial grooves in the same area.

3. The method of claim 2, wherein the abrasive grinding disc is made by the steps of: The grinding disc is divided into 20 grinding blocks by radial grooves in the same area. ​ 4. The method of claim 3, wherein the abrasive grinding disc is made by the steps of: The depth of the concentric circular groove is 8mm; the width of the concentric circular groove is 2mm; the number of concentric circular grooves is 9. ​ 5. The method of claim 4, wherein the abrasive grinding disc is made by the steps of: The depth of the radial groove is 8mm; the width of the groove is 2mm; the number of radial grooves is 20. ​ 6. The method of claim 5, wherein the abrasive grinding disc is made by the steps of: The disc surface diameter of the grinding disc is 320mm to 720mm. ​ 7. An abrasive grinding disc, characterized by It is prepared by the preparation method of the abrasive grinding disc with different abrasive particle concentration distribution according to any one of claims 1-6.

Images