A long-life, stable etching solution production equipment

Abstract

This invention relates to the field of etching solution production technology, and provides a long-life stable etching solution production equipment, comprising: a liquid raw material conveying device, a powder raw material conveying device, an inert gas supply device, and a reaction vessel; the liquid raw material conveying device includes a liquid raw material tank, a liquid pump, a first conveying pipe, a first electrically controlled valve, a first vertical pipe, and a first spray pipe; the powder raw material conveying device includes a powder raw material tank, an air pump, a second conveying pipe, a second electrically controlled valve, a third electrically controlled valve, a second vertical pipe, a second spray pipe, a T-junction pipe, and a gas supply pipe; the raw materials for the etching solution include hydrogen peroxide, a modifier, a stabilizer, an organic acid, an inhibitor, a pH adjuster, deionized water, and a solvent. The advantages of this invention are: the liquid raw material is directly conveyed to the reaction vessel by the liquid pump, the powder raw material is mixed with the inert gas, and driven by the air pump, the powder raw material is conveyed to the reaction vessel along with the flowing inert gas, thus efficiently producing a long-life stable etching solution.

Description

Technical Field

[0001] This invention relates to the field of etching solution production technology, and more specifically to a long-life, stable etching solution production equipment. Background Technology

[0002] In current high-generation LCD panel manufacturing processes, the array process requires the use of copper-molybdenum film etching solution, and the etched metal film layer structure is a copper / molybdenum alloy. The copper / molybdenum alloy layer structure film is formed on a substrate such as glass through film formation processes such as sputtering, and then forms an electrode pattern through an etching process using a photoresist as a mask.

[0003] Patent document CN109234736B discloses a high-lifespan copper-molybdenum etching solution and etching method, specifically disclosing an etching solution mother liquor and an etching solution daughter liquor. The main components of the etching solution mother liquor include hydrogen peroxide (10-20% by mass), a modifier (1-10% by mass), a stabilizer (0.5-5% by mass), an organic acid (1-10% by mass), and [other components]. The etching solution contains 0.001-1% inhibitor and 1-10% pH adjuster by mass, with the remainder being deionized water. The main components of the etching solution include 3-10% solvent (relative to the mother liquor), 0.05-0.5% organic acid (relative to the mother liquor), 0.001-0.01% inhibitor, and 0.01-0.1% stabilizer (relative to the mother liquor). The beneficial effects are: the high-lifespan copper-molybdenum etching solution and etching method provided by this invention, by adding a combination of solvent, organic acid, inhibitor, and stabilizer to an etching solution with a certain copper ion concentration, further extends the service life of the etching solution and further improves the stability of the etching quality.

[0004] The aforementioned patent documents also disclose specific types of regulators, stabilizers, organic acids, inhibitors, and pH adjusters, some of which are in powder form at room temperature. For example... Figure 1 As shown, the traditional method of adding powdered raw materials involves placing a container of powdered raw materials above the reactor, then opening the bottom valve of the container. The powdered raw materials fall into the reactor through a pipe due to gravity, and the reactor's mechanical stirring mechanism agitates the solution. After the powdered raw materials are used up, they must be manually moved via stairs or elevator to the container located above the reactor, and then poured into the container. This material handling method is time-consuming and has very low production efficiency.

[0005] Therefore, how to efficiently produce stable etching solutions with long lifespans is a technical problem that urgently needs to be solved in this field. Summary of the Invention

[0006] The technical problem to be solved by the present invention is to provide a long-life stable etching solution production equipment that can efficiently produce long-life stable etching solutions.

[0007] This invention is achieved as follows: a long-life, stable etching solution production device, comprising:

[0008] Liquid raw material conveying device, powder raw material conveying device, inert gas supply device, and reaction vessel;

[0009] The liquid raw material conveying device includes a liquid raw material tank, a liquid pump, a first conveying pipe, a first electrically controlled valve, a first vertical pipe, and a first spray pipe;

[0010] The bottom outlet of the liquid raw material tank is connected to the inlet of the first conveying pipe. The first electrically controlled valve is installed at the bottom outlet of the liquid raw material tank. The outlet of the first conveying pipe is connected to the inlet of the liquid pump. The outlet of the liquid pump is connected to the lower inlet of the first vertical pipe. The upper outlet of the first vertical pipe extends into the top of the reactor and is also connected to the inlet of the first spray pipe.

[0011] The powder raw material conveying device includes a powder raw material tank, an air pump, a second conveying pipe, a second electrically controlled valve, a third electrically controlled valve, a second vertical pipe, a second spray pipe, a three-way pipe, and an air conveying pipe;

[0012] The bottom outlet of the powder raw material tank is connected to the first port of the three-way pipe. The second electrically controlled valve is installed at the bottom outlet of the powder raw material tank. The second port of the three-way pipe is connected to the inlet of the second conveying pipe. The outlet of the second conveying pipe is connected to the inlet of the air pump. The outlet of the air pump is connected to the lower inlet of the second vertical pipe. The upper outlet of the second vertical pipe extends into the top of the reactor and is also connected to the inlet of the second spray pipe. The outlet of the second spray pipe extends downward to the bottom of the reactor. The outlet of the gas conveying pipe is connected to the third port of the three-way pipe. The inlet of the gas conveying pipe is connected to the outlet of the inert gas supply device. The third electrically controlled valve is installed on the gas conveying pipe.

[0013] The raw materials for the etching solution include hydrogen peroxide, regulators, stabilizers, organic acids, inhibitors, pH adjusters, deionized water, and solvents;

[0014] The number of liquid material conveying devices is consistent with the type of liquid material in the etching solution, and the number of powder material conveying devices is consistent with the type of powder material in the etching solution.

[0015] Furthermore, the liquid raw material conveying device has three parts, which are respectively used for the hydrogen peroxide, deionized water and solvent;

[0016] The powder raw material conveying device has five components, which are respectively used for the regulator, stabilizer, organic acid, inhibitor and pH adjuster.

[0017] Furthermore, the regulator is acetanilide, the stabilizer is phenylurea, the organic acid is citric acid, the inhibitor is benzotriazole, and the pH regulator is sodium phosphate.

[0018] Furthermore, the etching solution is divided into a mother etching solution and a daughter etching solution;

[0019] The etching mother solution comprises, by mass percentage, 10-20% of the hydrogen peroxide, 1-10% of the regulator, 0.5-5% of the stabilizer, 1-10% of the organic acid, 0.001-1% of the inhibitor, 1-10% of the pH adjuster, and the balance being deionized water.

[0020] The etching solution comprises, relative to the mass percentage of the mother etching solution, 3-10% of the solvent, 0.05-0.5% of the organic acid, 0.001-0.01% of the inhibitor, and 0.01%-0.1% of the stabilizer.

[0021] Furthermore, it also includes an industrial computer, which is electrically connected to the liquid pump, the gas pump, the first electrically controlled valve, the second electrically controlled valve, the third electrically controlled valve, and the inert gas supply device.

[0022] Furthermore, it also includes a support frame and a weighing sensor, the weighing sensor being fixedly mounted on the support frame, the reaction vessel being placed at the detection end of the weighing sensor, and the weighing sensor being electrically connected to the industrial computer.

[0023] Furthermore, it also includes a gas recovery device, which includes an exhaust pipe, an exhaust valve, a filter, and a dryer;

[0024] The inlet of the exhaust pipe is connected to the top outlet of the reactor. The exhaust valve is installed on the exhaust pipe and is electrically connected to the industrial computer. The outlet of the exhaust pipe is connected to the inlet of the filter. The outlet of the filter is connected to the inlet of the dryer. The outlet of the dryer is connected to the recovery port of the inert gas supply device.

[0025] Furthermore, it also includes an angle adjuster, the second spray pipe is connected to the reactor through the angle adjuster, the inlet of the second spray pipe is connected to the outlet of the second vertical pipe through a hose, and the angle adjuster is electrically connected to the industrial computer.

[0026] Compared with the prior art, the advantages of the present invention are as follows: the liquid raw material is directly transported to the reactor by a liquid pump, the powder raw material is mixed with the inert gas, and under the drive of the air pump, the powder raw material is transported to the reactor along with the flowing inert gas. The powder raw material dissolves in the liquid raw material, and the inert gas rises from the liquid raw material, which plays the role of pneumatic stirring of the solution. There is no need to set up a mechanical stirring mechanism in the reactor, and the staff does not need to carry the powder raw material to the top of the reactor. The powder raw material can be added directly to the raw material tank at the corresponding position, saving time and producing a long-life stable etching solution with high efficiency. Attached Figure Description

[0027] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0028] Figure 1 This is a schematic diagram showing the positions of the raw material tank and the reaction vessel in the background art.

[0029] Figure 2 This is a schematic diagram of the structure of the long-life stable etching solution production equipment of the present invention.

[0030] Figure 3 This is a schematic diagram showing the positions of the liquid raw material conveying device, the powder raw material conveying device, and the reaction vessel in this invention.

[0031] Figure 4 This is a schematic diagram of the inert gas sprayed from the second spray pipe stirring the solution clockwise in this invention.

[0032] Figure 5 This is a schematic diagram of the inert gas sprayed from the second spray pipe stirring the solution counterclockwise in this invention.

[0033] Figure 6 This is a schematic diagram showing the connection between the industrial computer and various devices in this invention.

[0034] Reference numerals: 1. Liquid raw material conveying device; 11. Liquid raw material tank; 12. Liquid pump; 13. First conveying pipe; 14. First electrically controlled valve; 15. First vertical pipe; 16. First spray pipe; 2. Powder raw material conveying device; 21. Powder raw material tank; 22. Air pump; 23. Second conveying pipe; 24. Second electrically controlled valve; 25. Third electrically controlled valve; 26. Second vertical pipe; 27. Second spray pipe; 27. Hose; 271. T-connector; 28. Gas supply pipe; 29. ​​Inert gas supply device; 3. Reactor; 4. Support frame; 41. Weighing sensor; 42. Angle adjuster; 43. Industrial computer; 5. Gas recovery device; 6. Exhaust pipe; 61. Exhaust valve; 62. Filter; 63. Dryer; 64. Detailed Implementation

[0035] This invention provides a long-life stable etching solution production equipment, which overcomes the disadvantage of the prior art where powder raw materials need to be moved to the raw material tank located above the reaction vessel for addition. It achieves the technical effect of adding powder raw materials directly to the corresponding raw material tank without having to move them to the top of the mixing vessel, saving time and producing long-life stable etching solutions with high efficiency.

[0036] The overall concept of the technical solution of this invention is as follows:

[0037] The raw materials for the long-life, stable etching solution are hydrogen peroxide, regulator, stabilizer, organic acid, inhibitor, pH adjuster, deionized water, and solvent. The raw material tanks containing these materials are located at a low position or placed on the ground, allowing workers to add the required materials directly from the ground. The corresponding liquid pump, air pump, first electrically controlled valve, second electrically controlled valve, and third electrically controlled valve operate independently. Liquid raw materials are directly pumped into the reactor by the liquid pump, sprayed from the first nozzle, and fall from the top to the bottom of the reactor cavity. Powdered raw materials are first mixed with inert gas in a three-way pipe, at which point the powder is in a semi-suspended state. Driven by the air pump, the powder is transported to the reactor along with the flowing inert gas, and then sprayed from the second nozzle, whose nozzle is located at the bottom of the reactor cavity. The powder dissolves in the liquid, and the inert gas rises from the liquid, acting as a stirrer for the solution. Raw materials can be fed into the reactor simultaneously or sequentially, depending on the actual production process, by controlling the electrical valves, liquid pumps, and gas pumps. Alternatively, the second electrical valve can be closed and the third electrical valve opened, allowing only inert gas to be introduced into the reactor while the solution is stirred. After thorough stirring, a stable etching solution with a long lifespan is obtained.

[0038] To better understand the above technical solutions, the following will provide a detailed explanation of the technical solutions in conjunction with the accompanying drawings and specific implementation methods.

[0039] See Figures 1 to 6The preferred embodiment of the present invention.

[0040] A long-life, stable etching solution production device, comprising:

[0041] Liquid raw material conveying device 1, powder raw material conveying device 2, inert gas supply device 3, and reaction vessel 4;

[0042] The liquid raw material conveying device 1 includes a liquid raw material tank 11, a liquid pump 12, a first conveying pipe 13, a first electrically controlled valve 14, a first vertical pipe 15, and a first spray pipe 16;

[0043] The bottom outlet of the liquid raw material tank 11 is connected to the inlet of the first conveying pipe 13. The first electrically controlled valve 14 is installed at the bottom outlet of the liquid raw material tank 11. The outlet of the first conveying pipe 13 is connected to the inlet of the liquid pump 12. The outlet of the liquid pump 12 is connected to the lower inlet of the first vertical pipe 15. The upper outlet of the first vertical pipe 15 passes through the top of the reactor 4 and is also connected to the inlet of the first spray pipe 16.

[0044] The powder raw material conveying device 2 includes a powder raw material tank 21, an air pump 22, a second conveying pipe 23, a second electrically controlled valve 24, a third electrically controlled valve 25, a second vertical pipe 26, a second spray pipe 27, a three-way pipe 28, and an air conveying pipe 29.

[0045] The bottom outlet of the powder raw material tank 21 is connected to the first port of the three-way pipe 28. The second electrically controlled valve 24 is installed at the bottom outlet of the powder raw material tank 21. The second port of the three-way pipe 28 is connected to the inlet of the second conveying pipe 23. The outlet of the second conveying pipe 23 is connected to the inlet of the air pump 22. The outlet of the air pump 22 is connected to the lower inlet of the second vertical pipe 26. The upper outlet of the second vertical pipe 26 extends into the top of the reactor 4 and is also connected to the inlet of the second spray pipe 27. The outlet of the second spray pipe 27 extends downward to the bottom of the reactor 4. The outlet of the gas conveying pipe 29 is connected to the third port of the three-way pipe 28. The inlet of the gas conveying pipe 29 is connected to the outlet of the inert gas supply device 3. The third electrically controlled valve 25 is installed on the gas conveying pipe 29.

[0046] The raw materials for the etching solution include hydrogen peroxide, regulators, stabilizers, organic acids, inhibitors, pH adjusters, deionized water, and solvents;

[0047] The number of liquid raw material conveying devices 1 is consistent with the type of liquid raw material in the etching solution, and the number of powder raw material conveying devices 2 is consistent with the type of powder raw material in the etching solution.

[0048] In this embodiment, the liquid raw material is directly transported to the reactor 4 by the liquid pump 12. The powder raw material is mixed with the inert gas. Driven by the air pump 22, the powder raw material is transported to the reactor 4 along with the flowing inert gas. The powder raw material dissolves in the liquid raw material, and the inert gas rises from the liquid raw material, which plays the role of pneumatic stirring of the solution. There is no need to set up a mechanical stirring mechanism in the reactor 4. The staff does not need to carry the powder raw material to the top of the reactor 4. The powder raw material is added directly to the raw material tank at the corresponding position, saving time and producing a long-life stable etching solution with high efficiency.

[0049] The first electrically controlled valve 14 controls whether the liquid raw material in the corresponding liquid raw material tank 11 falls and the falling speed. The second electrically controlled valve 24 controls whether the powder raw material in the corresponding powder raw material tank 21 falls and the falling speed. The third electrically controlled valve 25 controls whether the inert gas enters the corresponding gas supply pipe 29. When both the first electrically controlled valve 14 and the second electrically controlled valve 24 are closed, and either of the third electrically controlled valves 25 and the corresponding gas pump 22 are open, only the inert gas is supplied to the reaction vessel 4, and only the solution is stirred. In this embodiment, the inert gas is neon, helium, or nitrogen.

[0050] The liquid raw material conveying device 1 has three parts, which are respectively used for the hydrogen peroxide, deionized water and solvent;

[0051] The powder raw material conveying device 2 has five components, which are respectively used for the regulator, stabilizer, organic acid, inhibitor and pH adjuster.

[0052] The regulator is acetanilide, the stabilizer is phenylurea, the organic acid is citric acid, the inhibitor is benzotriazole, and the pH adjuster is sodium phosphate.

[0053] The etching solution is divided into a mother etching solution and a daughter etching solution;

[0054] The etching mother solution comprises, by mass percentage, 10-20% of the hydrogen peroxide, 1-10% of the regulator, 0.5-5% of the stabilizer, 1-10% of the organic acid, 0.001-1% of the inhibitor, 1-10% of the pH adjuster, and the balance being deionized water.

[0055] The etching solution comprises, relative to the mass percentage of the mother etching solution, 3-10% of the solvent, 0.05-0.5% of the organic acid, 0.001-0.01% of the inhibitor, and 0.01%-0.1% of the stabilizer.

[0056] When hydrogen peroxide, regulator, stabilizer, organic acid, inhibitor, pH adjuster, and deionized water are delivered to reactor 4, the etching mother solution is obtained after stirring; when solvent, organic acid, inhibitor, and stabilizer are delivered to reactor 4, the etching sub-solution is obtained after stirring.

[0057] The system also includes an industrial computer 5, which is electrically connected to the liquid pump 12, air pump 22, first electrically controlled valve 14, second electrically controlled valve 24, third electrically controlled valve 25, and inert gas supply device 3. The beneficial effect of this technical solution is that the industrial computer 5 can remotely control the operating status of the liquid pump 12, air pump 22, first electrically controlled valve 14, second electrically controlled valve 24, third electrically controlled valve 25, and inert gas supply device 3, thus ensuring orderly production. The industrial computer 5 has an operation panel.

[0058] It also includes a support frame 41 and a weighing sensor 42. The weighing sensor 42 is fixedly mounted on the support frame 41, and the reaction vessel 4 is placed at the detection end of the weighing sensor 42. The weighing sensor 42 is electrically connected to the industrial computer 5. The beneficial effect of this technical solution is that the weighing sensor 42 detects the weight change of the reaction vessel 4 in real time. When raw materials are sequentially fed into the reaction vessel 4, the weight of the added raw materials is the weight increase of the reaction vessel 4. When the addition of a certain raw material reaches a specified threshold, the industrial computer 5 stops adding that raw material in real time, and then adds the next raw material to the reaction vessel 4.

[0059] It also includes a gas recovery device 6, which includes an exhaust pipe 61, an exhaust valve 62, a filter 63, and a dryer 64;

[0060] The inlet of the exhaust pipe 61 is connected to the top outlet of the reactor 4. The exhaust valve 62 is installed on the exhaust pipe 61 and is electrically connected to the industrial computer 5. The outlet of the exhaust pipe 61 is connected to the inlet of the filter 63. The outlet of the filter 63 is connected to the inlet of the dryer 64. The outlet of the dryer 64 is connected to the recovery port of the inert gas supply device 3. The beneficial effect of this technical solution is that the inert gas from the second spray pipe 27 leaves the reactor 4 through the exhaust valve 62. The filter 63 is a water tank containing pure water. The etching solution molecules carried by the inert gas dissolve in the water tank. Then, the inert gas from the filter 63 enters the dryer 64. The dryer 64 removes the water molecules carried by the inert gas. The dried inert gas flows back to the inert gas supply device 3, so the inert gas can circulate, saving costs.

[0061] It also includes an angle adjuster 43. The second spray pipe 27 is connected to the reactor 4 via the angle adjuster 43. The inlet of the second spray pipe 27 is connected to the outlet of the second vertical pipe 26 via a hose 271. The angle adjuster 43 is electrically connected to the industrial computer 5. The beneficial effect of this technical solution is that the angle adjuster 43 modifies the angle direction of the second spray pipe 27 within the reactor 4. This allows the inert gas ejected from the second spray pipe 27 to not only rise but also push the solution, achieving clockwise or counterclockwise stirring of the solution. The angle adjuster 43 is a servo motor.

[0062] The present invention provides a long-life stable etching solution production equipment in which liquid raw materials are directly transported to the reaction vessel 4 by a liquid pump 12, and powder raw materials are transported to the reaction vessel 4 by an inert gas pump 22. The inert gas can also stir the solution. The raw material tank containing these raw materials is located at a low position or placed on the ground. The operator can directly add the required raw materials to the raw material tank while standing on the ground. The operator does not need to carry the powder raw materials to the top of the reaction vessel 4, saving time and producing long-life stable etching solutions with high efficiency.

[0063] While specific embodiments of the present invention have been described above, those skilled in the art should understand that the specific embodiments described are merely illustrative and not intended to limit the scope of the present invention. Equivalent modifications and variations made by those skilled in the art in accordance with the spirit of the present invention should be covered within the scope of protection of the claims of the present invention.

Claims

1. A long-life, stable etching solution production equipment, characterized in that, include: Liquid raw material conveying device, powder raw material conveying device, inert gas supply device, and reaction vessel; The liquid raw material conveying device includes a liquid raw material tank, a liquid pump, a first conveying pipe, a first electrically controlled valve, a first vertical pipe, and a first spray pipe; The bottom outlet of the liquid raw material tank is connected to the inlet of the first conveying pipe. The first electrically controlled valve is installed at the bottom outlet of the liquid raw material tank. The outlet of the first conveying pipe is connected to the inlet of the liquid pump. The outlet of the liquid pump is connected to the lower inlet of the first vertical pipe. The upper outlet of the first vertical pipe extends into the top of the reactor and is also connected to the inlet of the first spray pipe. The powder raw material conveying device includes a powder raw material tank, an air pump, a second conveying pipe, a second electrically controlled valve, a third electrically controlled valve, a second vertical pipe, a second spray pipe, a three-way pipe, and an air conveying pipe; The bottom outlet of the powder raw material tank is connected to the first port of the three-way pipe. The second electrically controlled valve is installed at the bottom outlet of the powder raw material tank. The second port of the three-way pipe is connected to the inlet of the second conveying pipe. The outlet of the second conveying pipe is connected to the inlet of the air pump. The outlet of the air pump is connected to the lower inlet of the second vertical pipe. The upper outlet of the second vertical pipe extends into the top of the reactor and is also connected to the inlet of the second spray pipe. The outlet of the second spray pipe extends downward to the bottom of the reactor. The outlet of the gas conveying pipe is connected to the third port of the three-way pipe. The inlet of the gas conveying pipe is connected to the outlet of the inert gas supply device. The third electrically controlled valve is installed on the gas conveying pipe. The raw materials for the etching solution include hydrogen peroxide, regulators, stabilizers, organic acids, inhibitors, pH adjusters, deionized water, and solvents; The number of liquid material conveying devices is consistent with the type of liquid material in the etching solution, and the number of powder material conveying devices is consistent with the type of powder material in the etching solution.

2. The long-life stable etching solution production equipment according to claim 1, characterized in that, There are three liquid raw material conveying devices, which are respectively used for the hydrogen peroxide, deionized water and solvent; The powder raw material conveying device has five components, which are respectively used for the regulator, stabilizer, organic acid, inhibitor and pH adjuster.

3. The long-life stable etching solution production equipment according to claim 2, characterized in that, The regulator is acetanilide, the stabilizer is phenylurea, the organic acid is citric acid, the inhibitor is benzotriazole, and the pH adjuster is sodium phosphate.

4. The long-life stable etching solution production equipment according to claim 1, characterized in that, The etching solution is divided into a mother etching solution and a daughter etching solution; The etching mother solution comprises, by mass percentage, 10-20% of the hydrogen peroxide, 1-10% of the regulator, 0.5-5% of the stabilizer, 1-10% of the organic acid, 0.001-1% of the inhibitor, 1-10% of the pH adjuster, and the balance being deionized water. The etching solution comprises, relative to the mass percentage of the mother etching solution, 3-10% of the solvent, 0.05-0.5% of the organic acid, 0.001-0.01% of the inhibitor, and 0.01%-0.1% of the stabilizer.

5. The long-life stable etching solution production equipment according to claim 1, characterized in that, It also includes an industrial computer, which is electrically connected to the liquid pump, the gas pump, the first electrically controlled valve, the second electrically controlled valve, the third electrically controlled valve, and the inert gas supply device.

6. The long-life stable etching solution production equipment according to claim 5, characterized in that, It also includes a support frame and a weighing sensor, the weighing sensor being fixedly mounted on the support frame, the reaction vessel being placed at the detection end of the weighing sensor, and the weighing sensor being electrically connected to the industrial computer.

7. The long-life stable etching solution production equipment according to claim 5, characterized in that, It also includes a gas recovery device, which includes an exhaust pipe, an exhaust valve, a filter, and a dryer; The inlet of the exhaust pipe is connected to the top outlet of the reactor. The exhaust valve is installed on the exhaust pipe and is electrically connected to the industrial computer. The outlet of the exhaust pipe is connected to the inlet of the filter. The outlet of the filter is connected to the inlet of the dryer. The outlet of the dryer is connected to the recovery port of the inert gas supply device.

8. The long-life stable etching solution production equipment according to claim 5, characterized in that, It also includes an angle adjuster, the second spray pipe is connected to the reactor through the angle adjuster, the inlet of the second spray pipe is connected to the outlet of the second vertical pipe through a hose, and the angle adjuster is electrically connected to the industrial computer.

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