Repairing material, method for producing repairing material, and repairing method

Abstract

The application relates to a repairing material, a manufacturing method of the repairing material and a repairing method. The repairing material comprises 45-50% of silicon dioxide, 15-20% of aluminum oxide, 5-10% of titanium dioxide and 20-25% of zirconium dioxide. By adding zirconium dioxide with good chemical stability, super-high hardness and toughness and adding titanium dioxide with strong adsorption capacity, not easy to chemically react and high melting point in the silicon dioxide and the aluminum oxide, the thermal expansion coefficient of a repairing layer formed by the repairing material is close to that of a protective layer of a carbon-based element, and the repairing layer also has the advantages of high thermal conductivity, oxidation resistance, wear resistance and acid and alkali corrosion resistance in a high-temperature environment.

Description

Technical Field

[0001] This application relates to the field of carbon-based material repair technology, and in particular to a repair material, a method for manufacturing the repair material, and a repair method using the repair material. Background Technology

[0002] Graphite disks are widely used in many stages of semiconductor product manufacturing. They are one of the best substrates for the epitaxial growth of single-crystal silicon (Si) and third-generation semiconductor gallium nitride (GaN), and are also a core component of epitaxial furnaces. Silicon carbide (SiC) coatings are typically prepared on the surface of graphite disks using methods such as physical vapor deposition (PVD), chemical vapor deposition (CVD), or spraying to form silicon carbide-coated graphite disks. The resulting silicon carbide-coated graphite disks generally have a dense, non-porous surface and exhibit properties such as oxidation resistance, acid and alkali resistance, erosion resistance, and corrosion resistance.

[0003] However, in actual production processes, issues such as chipping, cracking, or partial peeling of the silicon carbide coating often occur, causing graphite powder to overflow from the graphite disk and affecting the crystal quality of the formed epitaxial layer. Moreover, the overflowing graphite powder floats in the reaction chamber of the epitaxial furnace, interfering with the flow field and thus affecting product performance and increasing production costs.

[0004] Therefore, how to repair the silicon carbide coating of the silicon carbide coated graphite disk to prevent graphite powder from overflowing or leaking is a problem that urgently needs to be solved by those skilled in the art. Summary of the Invention

[0005] In view of the shortcomings of the prior art, the purpose of this application is to provide a repair material, a method for manufacturing the repair material, and a repair method using the repair material, which aims to repair the silicon carbide coating of a silicon carbide coated graphite disk, extend the service life of the graphite disk, and reduce production costs.

[0006] This application provides a repair material comprising 45% to 50% by mass of silicon dioxide, 15% to 20% by mass of aluminum oxide, 5% to 10% by mass of titanium dioxide, and 20% to 25% by mass of zirconium dioxide.

[0007] The aforementioned repair material comprises 45% to 50% silica, 15% to 20% alumina, 5% to 10% titanium dioxide, and 20% to 25% zirconium dioxide by mass. By adding zirconium dioxide, which exhibits good chemical stability, extremely high hardness and toughness, and titanium dioxide, which has strong adsorption capacity, is less prone to chemical reactions, and has a high melting point, the thermal expansion coefficient of the repair layer formed by the repair material is close to that of the protective layer of carbon-based components. Furthermore, the repair layer also possesses advantages such as high thermal conductivity, oxidation resistance, wear resistance, and acid and alkali corrosion resistance in high-temperature environments.

[0008] Optionally, the repair material may further include sodium polyether disilicate at a mass percentage of less than or equal to 2%.

[0009] Optionally, the repair material may further include polytetrafluoroethylene at a mass percentage of less than or equal to 2%.

[0010] Optionally, the repair material further includes a dispersant comprising 2% or less by mass, wherein the dispersant is an aqueous solution of sodium silicate or potassium silicate.

[0011] Optionally, the repair material further includes a surface improver comprising 2% by mass, wherein the surface improver is disodium lauryl sulfosuccinate monoester.

[0012] Optionally, the repair material further includes an active diluent of less than or equal to 2% by mass, a photoinitiator of less than or equal to 2% by mass, and an ultraviolet stabilizer of less than or equal to 2% by mass, wherein the active diluent is ethylene glycol diacrylate, the photoinitiator is 2-hydroxy-2-methyl-1-phenyl-1-propanone, and the ultraviolet stabilizer is 2-hydroxy-4-n-octyloxybenzophenone.

[0013] Optionally, the particle size range of the repair material is 0.05 μm to 1 μm.

[0014] Based on the same inventive concept, this application also provides a method for manufacturing a repair material, the method comprising:

[0015] We offer perfluoropolyether, zeolite powder, polytetrafluoroethylene powder, reactive diluents, dispersants, ceramic powder, titanium dioxide powder, zirconium dioxide powder, surface modifiers, photoinitiators, and UV stabilizers.

[0016] The perfluoropolyether is mixed with the zeolite powder to generate a first mixture;

[0017] The polytetrafluoroethylene powder is added to the first mixture to obtain the second mixture;

[0018] The ceramic powder, the titanium dioxide powder, the zirconium dioxide powder, the reactive diluent, and the dispersant are added to the second mixture to obtain a third mixture;

[0019] The surface improver, the photoinitiator, and the UV stabilizer are added to the third mixture to obtain a repair material, wherein the repair material comprises 45% to 50% by mass of silica, 15% to 20% by mass of alumina, 5% to 10% by mass of titanium dioxide, 20% to 25% by mass of zirconium dioxide, polyether disilicate, polytetrafluoroethylene, the reactive diluent, the dispersant, the surface improver, the photoinitiator, and the UV stabilizer.

[0020] The above-mentioned repair preparation method includes: providing perfluoropolyether, zeolite powder, polytetrafluoroethylene powder, reactive diluent, dispersant, ceramic powder, titanium dioxide powder, zirconium dioxide powder, surface improver, photoinitiator, and UV stabilizer; mixing the perfluoropolyether and the zeolite powder to generate a first mixture; adding the polytetrafluoroethylene powder to the first mixture to obtain a second mixture; adding the ceramic powder, titanium dioxide powder, zirconium dioxide powder, reactive diluent, and dispersant to the second mixture to obtain a third mixture; and adding the surface improver, photoinitiator, and UV stabilizer to the third mixture to obtain a repair material. Therefore, by adding zirconium dioxide, which has good chemical stability, ultra-high hardness and toughness, and titanium dioxide, which has strong adsorption capacity, is not easily chemically reactive, and has a high melting point, to silica and alumina, the thermal expansion coefficient of the repair layer formed by the repair material is close to that of the protective layer of the carbon-based element. Furthermore, the repair layer also has advantages such as high thermal conductivity, oxidation resistance, wear resistance, and acid and alkali corrosion resistance in high-temperature environments.

[0021] Optionally, the mass percentage of the polyether disilicate, the polytetrafluoroethylene, the reactive diluent, the dispersant, the surface improver, the photoinitiator, and the UV stabilizer is less than or equal to 2%.

[0022] Optionally, the total mass percentage of the polyether disilicate, the polytetrafluoroethylene, the reactive diluent, the dispersant, the surface improver, the photoinitiator, and the UV stabilizer is less than or equal to 5%.

[0023] Based on the same inventive concept, this application also provides a repair method, the repair method comprising:

[0024] A carbon-based element assembly is provided, the carbon-based element assembly including a carbon-based element and a protective layer, wherein the protective layer is peeled off, and / or the protective layer is cracked, and / or the protective layer is peeled off and the carbon-based element has a dent;

[0025] Inorganic adhesive and the above-mentioned repair material are applied sequentially to the detached area of ​​the protective layer, and / or the cracked area of ​​the protective layer, and / or the detached area of ​​the protective layer and the recessed area of ​​the carbon-based element to form a repair layer.

[0026] The repair layer is left to stand for a preset time and then photocured, baked, and sintered in sequence.

[0027] The repair layer is then polished.

[0028] Optionally, the surface of the repair layer is 0.2 mm to 0.5 mm higher than the surface of the carbon-based element.

[0029] The above-mentioned repair method includes: providing a carbon-based element assembly, the carbon-based element assembly including a carbon-based element and a protective layer, wherein the protective layer is detached, and / or, the protective layer is cracked, and / or, the protective layer is detached and the carbon-based element has a depression; sequentially applying inorganic adhesive and repair material to the detached area of ​​the protective layer, and / or, the cracked area of ​​the protective layer, and / or, the detached area of ​​the protective layer and the depression of the carbon-based element to form a repair layer; allowing it to stand for a preset time and sequentially performing photocuring and baking and sintering on the repair layer; and polishing the repair layer. Therefore, the above-mentioned repair method repairs the carbon-based element and the protective layer on the surface of the carbon-based element, preventing graphite powder overflow and smoothing the surface of the carbon-based element. The repair layer formed by the repair material has a low coefficient of thermal expansion, high thermal conductivity, and is resistant to oxidation, wear, and acid and alkali corrosion at high temperatures. The repair material used in the above-mentioned repair method is low-cost, and the repair time is short, which can effectively extend the service life of the carbon-based element and significantly reduce production costs. Attached Figure Description

[0030] Figure 1 A schematic flowchart illustrating the manufacturing method of the first repair material provided in this application embodiment;

[0031] Figure 2 A schematic flowchart illustrating the manufacturing method of the second repair material provided in this application embodiment;

[0032] Figure 3 This is a flowchart illustrating the repair method provided in an embodiment of this application.

[0033] Explanation of reference numerals in the attached figures:

[0034] S10-S20 - Method for preparing repair materials;

[0035] S110-S150 - Method for preparing repair materials;

[0036] S210-S240 - Repair methods. Detailed Implementation

[0037] To facilitate understanding of this application, a more complete description will be provided below with reference to the accompanying drawings. Preferred embodiments of this application are shown in the drawings. However, this application can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a more thorough and complete understanding of the disclosure of this application.

[0038] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the specification of this application is for the purpose of describing particular embodiments only and is not intended to be limiting of this application.

[0039] Graphite disks are widely used in many stages of semiconductor product manufacturing. They are one of the best substrates for the epitaxial growth of single-crystal silicon (Si) and third-generation semiconductor gallium nitride (GaN), and are also a core component of epitaxial furnaces. Silicon carbide (SiC) coatings are typically prepared on the surface of graphite disks using methods such as physical vapor deposition (PVD), chemical vapor deposition (CVD), or spraying to form silicon carbide-coated graphite disks. The resulting silicon carbide-coated graphite disks generally have a dense, non-porous surface and exhibit properties such as oxidation resistance, acid and alkali resistance, erosion resistance, and corrosion resistance. However, in actual production processes, issues such as chipping, cracking, or partial detachment of the silicon carbide coating often occur, causing graphite powder to overflow from the graphite disk and affecting the crystal quality of the formed epitaxial layer. Furthermore, the overflowing graphite powder floats in the reaction chamber of the epitaxial furnace, interfering with the flow field and thus affecting product performance and increasing production costs.

[0040] Based on this, this application aims to provide a solution that can solve the above-mentioned technical problems, which can repair the silicon carbide coating of the silicon carbide coated graphite disk to prevent graphite powder from overflowing or leaking. The details will be described in subsequent embodiments.

[0041] The repair materials, the methods for making the repair materials, and the repair methods described in this application are as follows.

[0042] The first embodiment of this application provides a repair material for forming a repair layer to repair the protective layer on the surface of a carbon-based element. The repair material may include at least silicon dioxide (SiO2), aluminum oxide (Al2O3), titanium dioxide (TiO2), and zirconium dioxide (ZrO2).

[0043] In the embodiments of this application, the carbon-based element may be a graphite disk, and the protective layer may be a silicon carbide layer.

[0044] It is understood that the zirconium dioxide possesses good chemical stability, extremely high hardness, and toughness, which can improve the corrosion resistance, heat resistance, and seismic performance of the repair layer formed by the repair material. The titanium dioxide has strong adsorption capacity, is not prone to chemical reactions, and has a high melting point, which can improve the smoothness of the repair layer.

[0045] In this embodiment of the application, the mass percentage of silicon dioxide in the repair material can be 45% to 50%, for example, 45%, 46%, 46.5%, 48%, 49%, 50%, or other values, and this application does not impose specific limitations on this. The mass percentage of alumina is 15% to 20%, for example, 15%, 15.5%, 17%, 18.5%, 19%, 20%, or other values, and this application does not impose specific limitations on this. The mass percentage of titanium dioxide is 5% to 10%, for example, 5%, 6%, 6.5%, 8%, 9%, 9.5%, 10%, or other values, and this application does not impose specific limitations on this. The mass percentage of zirconium dioxide is 20% to 25%, for example, 20%, 21%, 22%, 22.6%, 23%, 23.9%, 25%, or other values, and this application does not impose specific limitations on this. Wherein, the mass percentage refers to the ratio of the mass of the component to the mass of the repair material.

[0046] In this embodiment of the application, the repair material may further include polyether disilicate sodium, polytetrafluoroethylene, reactive diluent, dispersant, surface improver, photoinitiator and ultraviolet stabilizer.

[0047] Understandably, the polyether disilicate can improve the corrosion resistance of the repair layer. The polytetrafluoroethylene (PTFE) serves as a lubricant, facilitating ball milling of the repair material. The reactive diluent increases the adhesion of the repair material to the carbon-based element, effectively dissolves the photoinitiator, and increases the photocuring efficiency of the photoinitiator. The dispersant prevents the aggregation of the components of the repair material, ensuring uniform dispersion. The surface improver enhances the wettability between the repair layer formed by the repair material and the carbon-based element, increasing the bonding force between them. The photoinitiator is used for curing under ultraviolet light, thereby curing the repair material. The ultraviolet stabilizer has antioxidant properties, preventing ultraviolet light from damaging other components (polymers) of the repair material.

[0048] In the embodiments of this application, the mass percentage of the polyether disilicate sodium, the polytetrafluoroethylene, the reactive diluent, the dispersant, the surface improver, the photoinitiator and the ultraviolet stabilizer is less than or equal to 2%, for example, 0.1%, 0.5%, 1%, 1.3%, 1.7%, 2% or other values, but this application does not impose specific limitations on this.

[0049] In this embodiment of the application, the total mass percentage of the polyether disilicate, the polytetrafluoroethylene, the reactive diluent, the dispersant, the surface modifier, the photoinitiator, and the UV stabilizer is less than or equal to 5%.

[0050] In an exemplary embodiment, the reactive diluent may be ethylene glycol diacrylate (HDDA). The dispersant may be an aqueous solution of sodium silicate or potassium silicate.

[0051] In an exemplary embodiment, the surface improver may be disodium lauryl sulfosuccinate monoester, with the chemical formula ROCO-CH2-CH(SO3Na)-COONa.

[0052] In an exemplary embodiment, the photoinitiator may be 2-hydroxy-2-methyl-1-phenyl-1-propanone, with the chemical formula C6H5COC(CH3)2OH.

[0053] In an exemplary embodiment, the UV stabilizer may be 2-hydroxy-4-n-octyloxybenzophenone.

[0054] In this embodiment of the application, the repair material may further include trace amounts of alkali metals, trace amounts of alkali metal oxides, and trace amounts of silicate minerals.

[0055] In an exemplary embodiment, the particle size range of the repair material may be from 0.05 μm to 1 μm, for example, 0.05 μm, 0.1 μm, 0.3 μm, 0.45 μm, 0.60 μm, 0.7 μm, 0.85 μm, 0.9 μm, 1 μm, or other values. This application does not impose any specific limitations on this.

[0056] In an exemplary embodiment, the repair material may be in the form of a paste.

[0057] In summary, the repair material provided in this application includes 45% to 50% silica, 15% to 20% alumina, 5% to 10% titanium dioxide, and 20% to 25% zirconium dioxide by mass. By adding zirconium dioxide, which has good chemical stability, extremely high hardness and toughness, and titanium dioxide, which has strong adsorption capacity, is not prone to chemical reaction and has a high melting point, to silica and alumina, the coefficient of thermal expansion of the repair layer formed by the repair material is close to that of the protective layer of the carbon-based element. Furthermore, the repair layer also has advantages such as high thermal conductivity, oxidation resistance, wear resistance, and acid and alkali corrosion resistance in high-temperature environments.

[0058] Based on the same inventive concept, the second embodiment of this application provides a method for manufacturing a repair material, used to produce the aforementioned repair material. For details regarding the repair material involved in the manufacturing method of the repair material in the second embodiment, please refer to the relevant description of the repair material in the first embodiment; it will not be repeated here. Please refer to... Figure 1 , Figure 1 This is a flowchart illustrating a method for manufacturing a first type of repair material according to an embodiment of this application. The method for manufacturing the repair material may include at least the following steps.

[0059] S10 provides ceramic powder, titanium dioxide powder, and zirconium dioxide powder.

[0060] Specifically, the ceramic powder includes silicon dioxide and aluminum oxide.

[0061] S20. The ceramic powder, the titanium dioxide powder, and the zirconium dioxide powder are mixed in a predetermined mass ratio to form a repair material, wherein the repair material includes 45% to 50% silicon dioxide, 15% to 20% alumina, 5% to 10% titanium dioxide, and 20% to 25% zirconium dioxide by mass.

[0062] In summary, the method for manufacturing the repair material provided in this application includes: providing ceramic powder, titanium dioxide powder, and zirconium dioxide powder; and mixing the ceramic powder, titanium dioxide powder, and zirconium dioxide powder according to a predetermined mass ratio to form the repair material. Therefore, by adding zirconium dioxide, which has good chemical stability, extremely high hardness and toughness, and titanium dioxide, which has strong adsorption capacity, is not prone to chemical reactions, and has a high melting point, to silicon dioxide and alumina, the thermal expansion coefficient of the repair layer formed by the repair material is close to that of the protective layer of the carbon-based element. Furthermore, the repair layer also has advantages such as high thermal conductivity, oxidation resistance, wear resistance, and acid and alkali corrosion resistance in high-temperature environments.

[0063] Please see Figure 2 , Figure 2 This is a schematic flowchart illustrating a method for manufacturing a second type of repair material provided in an embodiment of this application.

[0064] S110 provides perfluoropolyether, zeolite powder, polytetrafluoroethylene powder, reactive diluent, dispersant, ceramic powder, titanium dioxide powder, zirconium dioxide powder, surface modifier, photoinitiator and UV stabilizer.

[0065] Specifically, the ceramic powder includes silicon dioxide and aluminum oxide.

[0066] S120. The perfluoropolyether is mixed with the zeolite powder to generate a first mixture.

[0067] Specifically, the temperature of the reaction vessel is adjusted to a first preset temperature, and the perfluoropolyether and the zeolite powder are placed in the reaction vessel and stirred for 2 to 3 hours to generate a first mixture, which includes sodium polyether disilicate. The sodium polyether disilicate is generated by a chemical reaction between the perfluoropolyether and the zeolite powder.

[0068] In the embodiments of this application, the first preset temperature can be 90°C to 110°C, for example, 90°C, 92°C, 95°C, 99°C, 100°C, 105°C, 108°C, 110°C, or other values. This application does not impose specific limitations on this.

[0069] In an exemplary embodiment, the chemical formula of the perfluoropolyether is (C3F6O). x C5F 12 O, the chemical formula of the zeolite powder is A m B p O2 p·nH2O, where A can be cations such as calcium (Ca), sodium (Na), potassium (K), barium (Ba), and strontium (Sr), B can be aluminum (Al) and silicon (Si), p is the valence of the cation, m is the number of cations, and n is the number of water molecules. In the embodiments of this application, the zeolite powder is Na 12 [(AlO2) 12 (SiO2) 12 Let's take 27H2O as an example.

[0070] S130. The polytetrafluoroethylene powder is added to the first mixture to obtain a second mixture.

[0071] Specifically, the temperature of the reaction vessel is adjusted to a second preset temperature, the polytetrafluoroethylene powder is added to the first mixture, and after stirring for 2 to 3 hours, it is cooled to obtain a second mixture, which includes the polyether disilicate sodium and polytetrafluoroethylene.

[0072] In this embodiment of the application, the second preset temperature can be 200°C to 220°C, for example, 200°C, 202°C, 205°C, 209°C, 210°C, 205°C, 208°C, 220°C, or other values. This application does not impose any specific restrictions on this.

[0073] S140. The ceramic powder, the titanium dioxide powder, the zirconium dioxide powder, the active diluent, and the dispersant are added to the second mixture to obtain a third mixture.

[0074] Specifically, the ceramic powder, the titanium dioxide powder, the zirconium dioxide powder, the reactive diluent, and the dispersant are added to the second mixture, and then mixed, stirred, and ball-milled sequentially for 8 to 16 hours to obtain the third mixture. The third mixture includes the silicon dioxide, the alumina, the titanium dioxide, the zirconium dioxide, the polyether disilicate, the polytetrafluoroethylene, the reactive diluent, and the dispersant.

[0075] S150. The surface improver, the photoinitiator, and the UV stabilizer are added to the third mixture to obtain a repair material, wherein the repair material comprises 45% to 50% by mass of silica, 15% to 20% by mass of alumina, 5% to 10% by mass of titanium dioxide, 20% to 25% by mass of zirconium dioxide, polyether disilicate, polytetrafluoroethylene, the reactive diluent, the dispersant, the surface improver, the photoinitiator, and the UV stabilizer.

[0076] Specifically, the surface improver, the photoinitiator, and the UV stabilizer are added to the third mixture, and the mixture is then subjected to mixing, stirring, and ball milling for 8 to 16 hours to obtain the repair material.

[0077] In this embodiment, the repair material includes the silica, the alumina, the titanium dioxide, the zirconium dioxide, the polyether disilicate, the polytetrafluoroethylene, the reactive diluent, the dispersant, the surface improver, the photoinitiator, and the ultraviolet stabilizer.

[0078] In summary, the method for preparing the repair material provided in this application includes: providing perfluoropolyether, zeolite powder, polytetrafluoroethylene powder, reactive diluent, dispersant, ceramic powder, titanium dioxide powder, zirconium dioxide powder, surface improver, photoinitiator, and ultraviolet stabilizer; mixing the perfluoropolyether and the zeolite powder to generate a first mixture; adding the polytetrafluoroethylene powder to the first mixture to obtain a second mixture; adding the ceramic powder, titanium dioxide powder, zirconium dioxide powder, reactive diluent, and dispersant to the second mixture to obtain a third mixture; and adding the surface improver, photoinitiator, and ultraviolet stabilizer to the third mixture to obtain the repair material. Therefore, by adding zirconium dioxide, which has good chemical stability, ultra-high hardness and toughness, and titanium dioxide, which has strong adsorption capacity, is not prone to chemical reaction and has a high melting point, to silicon dioxide and aluminum oxide, the coefficient of thermal expansion of the repair layer formed by the repair material is close to that of the protective layer of the carbon-based element. In addition, the repair layer also has the advantages of high thermal conductivity, oxidation resistance, wear resistance and acid and alkali corrosion resistance in high temperature environment.

[0079] Based on the same inventive concept, the third embodiment of this application provides a repair method using the above-mentioned repair material, for forming a repair layer using the repair material to repair the carbon-based element and the protective layer on the surface of the carbon-based element. The repair method of the third embodiment of this application involves the repair material or the method of manufacturing the repair material; please refer to the relevant descriptions of the repair material in the first embodiment or the method of manufacturing the repair material in the second embodiment, which will not be repeated here.

[0080] Please see Figure 3 , Figure 3 This is a schematic flowchart illustrating the repair method provided in an embodiment of this application. The repair method may include at least the following steps.

[0081] S210. A carbon-based element assembly is provided, the carbon-based element assembly including a carbon-based element and a protective layer, wherein the protective layer is detached, and / or the protective layer is cracked, and / or the protective layer is detached and the carbon-based element has a dent.

[0082] Specifically, a carbon-based element assembly is provided, comprising a carbon-based element and a protective layer, wherein the protective layer peels off, and / or cracks, and / or the protective layer peels off and the carbon-based element has a dent. The carbon-based element assembly is baked at a high temperature of 1300°C to dissociate nitrides adhering to the surface of the carbon-based element assembly, and then the dust on the surface of the carbon-based element assembly is blown away with nitrogen gas to clean the carbon-based element assembly.

[0083] In an exemplary embodiment, the depressions in the carbon-based element refer to honeycomb-like depressions formed on the surface of the carbon-based element by corrosion of ammonia (NH3) or chlorine (Cl2).

[0084] S220. Inorganic adhesive and repair material are sequentially applied to the detached areas of the protective layer, and / or the cracked areas of the protective layer, and / or the detached areas of the protective layer and the recessed areas of the carbon-based element to form a repair layer.

[0085] In an exemplary embodiment, the inorganic adhesive possesses advantages such as resistance to high temperatures above 1300°C and resistance to acids and alkalis, and is mainly composed of refractory ceramics such as aluminosilicates and polymers. The inorganic adhesive can be formulated by adding metal oxides such as alumina, silicon oxide, lead oxide, and zinc oxide to a sodium silicate base.

[0086] In an exemplary embodiment, if the protective layer is peeling off and the carbon-based element has a dent, step S120 needs to be repeated until the surface of the repair layer is 0.2 mm to 0.5 mm higher than the surface of the carbon-based element, for example, 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, or other values. This application does not impose specific limitations on this.

[0087] S230, allow the repair layer to stand for a preset time and then sequentially perform photocuring, baking, and sintering on the repair layer.

[0088] After standing, the repair material is photocured and the repair layer is baked at low temperature and sintered at high temperature.

[0089] Specifically, after applying the inorganic adhesive and the repair material, the carbon-based component assembly is left to stand for a preset time; the thicker the repair material is applied, the longer the standing time. The repair material is then irradiated with ultraviolet light to allow it to initially cure. The carbon-based component assembly is placed in a baking chamber at a third preset temperature for 2 to 3 hours to allow moisture and air in the inorganic adhesive and the repair material to evaporate. The carbon-based component assembly is then placed in a sintering chamber, and the temperature inside the sintering chamber is slowly raised to a fourth preset temperature, maintained for 2.5 to 3 hours, and then slowly lowered to room temperature, with a heating rate of less than 1.5°C / min.

[0090] In this embodiment, the preset time can be greater than or equal to 2 hours, for example, 2 hours, 2.5 hours, 3 hours, 3.5 hours, or other values, and this application does not impose specific limitations on it. The third preset temperature can be from 90℃ to 110℃, for example, 90℃, 92℃, 95℃, 99℃, 100℃, 105℃, 108℃, 110℃, or other values; the third preset temperature can be 1300℃, and this application does not impose specific limitations on it.

[0091] S240. Polish the repair layer.

[0092] Specifically, a diamond file is used to polish the repair layer to make its surface smooth, thus completing the repair.

[0093] In summary, the repair method provided in this application includes: providing a carbon-based element assembly, the carbon-based element assembly including a carbon-based element and a protective layer, wherein the protective layer is detached, and / or, the protective layer is cracked, and / or, the protective layer is detached and the carbon-based element has a depression; sequentially applying inorganic adhesive and repair material to the detached area of ​​the protective layer, and / or, the cracked area of ​​the protective layer, and / or, the detached area of ​​the protective layer and the depression of the carbon-based element to form a repair layer; allowing it to stand for a preset time and sequentially performing photocuring on the repair layer and low-temperature baking and high-temperature sintering on the repair layer; and polishing the repair layer. Therefore, the above repair method repairs the carbon-based element and the protective layer on the surface of the carbon-based element, preventing graphite powder from overflowing and smoothing the surface of the carbon-based element. The repair layer formed by the repair material has a low coefficient of thermal expansion, high thermal conductivity, and is resistant to oxidation, wear, and acid and alkali corrosion at high temperatures. The repair method uses low-cost repair materials and requires little repair time, which can effectively extend the service life of the carbon-based components and significantly reduce production costs.

[0094] It should be understood that the application of this application is not limited to the examples above. Those skilled in the art can make improvements or modifications based on the above description, and all such improvements and modifications should fall within the protection scope of the appended claims.

Claims

1. A patching material, characterized in that, The repairing material further comprises polyether organo disilicate sodium with a mass percentage less than or equal to 2%.

2. The patch material of claim 1, wherein, The repairing material further comprises polytetrafluoroethylene with a mass percentage less than or equal to 2%.

3. The patch material of claim 1, wherein, The repairing material further comprises dispersant with a mass percentage less than or equal to 2%, the dispersant being sodium silicate aqueous solution or potassium silicate aqueous solution.

4. The patch material of claim 1, wherein, The repairing material further comprises surface improver with a mass percentage less than or equal to 2%, the surface improver being disodium lauryl sulfosuccinate.

5. The patch material of claim 1, wherein, The repairing material further comprises active diluent with a mass percentage less than or equal to 2%, photoinitiator with a mass percentage less than or equal to 2% and ultraviolet stabilizer with a mass percentage less than or equal to 2%, wherein the active diluent is ethylene glycol diacrylate, the photoinitiator is 2-hydroxy-2-methyl-1-phenyl-1-propanone and the ultraviolet stabilizer is 2-hydroxy-4-n-octyloxybenzophenone.

6. The patch material of claim 1, wherein, The particle size of the repairing material ranges from 0.05 um to 1 um.

7. The patch material according to any one of claims 1 to 6, wherein The manufacturing method of the repairing material comprises:

8. A method for producing a patching material for producing a patching material, characterized by, providing perfluoropolyether, zeolite powder, polytetrafluoroethylene powder, active diluent, dispersant, ceramic powder, titanium dioxide powder, zirconium dioxide powder, surface improver, photoinitiator and ultraviolet stabilizer; mixing the perfluoropolyether and the zeolite powder to generate a first mixture; adding the polytetrafluoroethylene powder into the first mixture to obtain a second mixture; adding the ceramic powder, the titanium dioxide powder, the zirconium dioxide powder, the active diluent and the dispersant into the second mixture to obtain a third mixture; adding the surface improver, the photoinitiator and the ultraviolet stabilizer into the third mixture to obtain the repairing material, wherein the repairing material comprises silicon dioxide with a mass percentage of 45% to 50%, alumina with a mass percentage of 15% to 20%, titanium dioxide with a mass percentage of 5% to 10%, zirconium dioxide with a mass percentage of 20% to 25%, polyether organo disilicate sodium, polytetrafluoroethylene, the active diluent, the dispersant, the surface improver, the photoinitiator and the ultraviolet stabilizer. The mass percentage of the polyether organo disilicate sodium, the polytetrafluoroethylene, the active diluent, the dispersant, the surface improver, the photoinitiator and the ultraviolet stabilizer is less than or equal to 2%.

9. The method of claim 8, wherein the patch material is formed by a process comprising: The sum of the mass percentages of the polyether organo disilicate sodium, the polytetrafluoroethylene, the active diluent, the dispersant, the surface improver, the photoinitiator and the ultraviolet stabilizer is less than or equal to 5%.

10. The method of claim 9, wherein the patch material is prepared by a method comprising: The repairing method comprises:

11. A method of repairing, characterized by providing a carbon-based element assembly, the carbon-based element assembly comprising a carbon-based element and a protective layer, wherein the protective layer is peeled off, and / or the protective layer is cracked, and / or the protective layer is peeled off and the carbon-based element has a recess; ​ At the peeling-off of the protective layer, and / or, at the cracking of the protective layer, and / or, at the peeling-off of the protective layer and the concave of the carbon-based element, in turn, apply inorganic glue and the repairing material as claimed in any one of claims 1-7 to form a repairing layer; After standing for a preset time, in turn, light-cure the repairing layer and bake and sinter the repairing layer; Grind the repairing layer.

12. The repair method of claim 11 wherein, The surface of the repairing layer is 0.2mm to 0.5mm higher than the surface of the carbon-based element.

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