A sewage treatment device using liquid plasma

Abstract

The invention relates to a sewage treatment device using liquid phase plasma, comprising at least one microwave source, at least two microwave conduits and a processor, wherein the inlets of the two microwave conduits are connected to the outlet of the microwave source for conducting microwave energy; the cross sections of the two microwave conduits are both rectangular, the first microwave conduit comprises a first compression section, and the second microwave conduit comprises a second compression section; the processor is vertical and contains sewage; the position with the smallest tube diameter of the first compression section is connected to the bottom of the processor, the position with the smallest tube diameter of the second compression section is connected to the upper part of the processor, and the top of the processor is provided with an air extraction port for providing sufficient vacuum inside the processor, which is conducive to the generation of liquid phase plasma; a first discharge electrode is provided at a position corresponding to the first compression section at the bottom of the processor, and a second discharge electrode is provided at a position corresponding to the second compression section, which is used to sense microwave energy and discharge to generate plasma.

Description

Technical Field

[0001] The invention belongs to the technical field of sewage treatment, and in particular relates to a sewage treatment device utilizing liquid phase plasma. Background Art

[0002] Wastewater treatment is an important industry in the fields of industrial production and residents' lives. At present, the main treatment methods for industrial wastewater or domestic sewage include physical methods, chemical oxidation methods, and biochemical methods. The physical method mainly uses filtration, static separation, and sedimentation to remove solid pollutants in sewage. It also uses adsorbents to adsorb pollutants in sewage, or uses extractants to extract pollutants. Physical methods are usually used as pretreatment methods. The chemical oxidation method uses chemical oxidants to oxidize and degrade difficult-to-degrade organic matter in sewage, thereby improving the biodegradability of sewage, but the cost of chemical reagents is relatively high. The biochemical method uses anaerobic, anoxic, and aerobic microorganisms to degrade pollutants in sewage. The biochemical method is mainly aimed at sewage with higher biodegradability.

[0003] Plasma, as a medium for treating sewage, is a new type of oxidation treatment method. Liquid plasma contains a large number of active particles, such as OH, O, and H free radicals, especially OH free radicals, which have a high redox potential and are one of the strongest oxidants, and can effectively degrade pollutants. However, there are some problems in practical applications, such as the small amount of liquid plasma, insufficient number of active free radicals, and uneven distribution in sewage, which directly affects the sewage treatment effect. Summary of the invention

[0004] In view of the above problems, the present invention provides a sewage treatment device using liquid plasma, comprising at least one microwave source, at least two microwave conduits and a processor, wherein the inlets of the two microwave conduits are connected to the outlet of the microwave source for conducting microwave energy; the cross sections of the two microwave conduits are both rectangular, the first microwave conduit comprises a first compression section, and the second microwave conduit comprises a second compression section; the processor is vertical and contains sewage;

[0005] The position with the smallest diameter of the first compression section is connected to the bottom of the processor, and the position with the smallest diameter of the second compression section is connected to the upper part of the processor. The top of the processor is provided with an exhaust port for providing sufficient vacuum inside the processor, which is conducive to the generation of liquid plasma.

[0006] A first discharge electrode is provided at the bottom of the processor at a position corresponding to the first compression section, and a second discharge electrode is provided at a position corresponding to the second compression section, for sensing microwave energy and discharging to generate plasma.

[0007] Optionally, the inlets of the two microwave conduits are connected in parallel to the outlet of a microwave source, or the sewage treatment device includes two microwave sources, the inlet of the first microwave conduit is connected to the outlet of the first microwave source, and the inlet of the second microwave conduit is connected to the outlet of the second microwave source, so that the same microwave energy is provided to the two microwave conduits respectively.

[0008] Optionally, the first microwave duct includes a first front section duct, a first compression section, and a first rear section duct connected in sequence, and the second microwave duct includes a second front section duct, a second compression section, and a second rear section duct connected in sequence;

[0009] The first front section catheter, the first rear section catheter, the second front section catheter, and the second rear section catheter are all catheters of equal diameter and have the same diameter.

[0010] Further optionally, the first compression section includes a first front contraction section and a first rear expansion section, and along the direction from the first front section conduit to the first rear section conduit, the tube diameter of the first front contraction section gradually decreases, and the tube diameter of the first rear expansion section gradually increases, and the outlet of the first front contraction section and the inlet of the first rear expansion section are disconnected from each other, so that the bottom of the processor is inserted between the first front contraction section and the first rear expansion section;

[0011] The second compression section includes a second front contraction section and a second rear expansion section. Along the direction from the second front section conduit to the second rear section conduit, the tube diameter of the second front contraction section gradually decreases, and the tube diameter of the second rear expansion section gradually increases. The outlet of the second front contraction section and the inlet of the second rear expansion section are disconnected from each other, so that the upper part of the processor is inserted between the second front contraction section and the second rear expansion section.

[0012] Optionally, the processor is vertically arranged and made of transparent quartz material, and includes a lower cylinder, an expansion part and an upper cylinder from bottom to top, the lower cylinder and the upper cylinder are both cylindrical, and the expansion part is elliptical; a first discharge electrode is provided in the lower cylinder, a second discharge electrode is provided in the upper cylinder, a bottom sealing part is provided at the bottom opening of the lower cylinder, and a top sealing part is provided at the top opening of the upper cylinder, which are used to seal the processor.

[0013] Optionally, the first discharge electrode includes a first metal electrode and a first insulating portion, the first insulating portion is a hollow cylindrical portion, and the bottom is supported on the lower sealing screw; the first metal electrode is inserted into the upper portion of the first insulating portion, and the first metal electrode points vertically upward;

[0014] The second discharge electrode includes a second metal electrode and a second insulating part. The second insulating part is a hollow cylinder with a top supported on the side wall of the processor. The second metal electrode is inserted into the lower part of the second insulating part. The second metal electrode points vertically downward. The liquid in the processor submerges the second insulating part, and the vacuum port is above the liquid surface.

[0015] Optionally, a first ground electrode and a second ground electrode are provided in the processor, the first ground electrode extends from the top opening of the processor and points downward to the first metal electrode, the top of the first ground electrode is connected to a wire, the wire extends from the top opening of the processor and is grounded;

[0016] The second ground electrode extends from the bottom opening of the processor and points upward to the second metal electrode. The bottom of the second ground electrode is connected to a wire, which extends from the bottom opening of the processor and is grounded.

[0017] Optionally, a stirrer is provided inside the processor to keep the liquid in the upper and lower parts of the processor in a flowing state to balance the temperature between the upper and lower parts;

[0018] The motor of the stirrer is arranged above the top sealing part, and the stirring shaft penetrates the top sealing part and extends into the interior of the expansion part.

[0019] Further optionally, the stirring shaft is provided with an openable and closable stirring portion, which includes a plurality of flexible branches, which are evenly distributed along the circumference of the stirring shaft, the bottom of the flexible branch is fixed to the side of the lower part of the stirring shaft, and the top is connected to the bottom of the ring, which is mounted on the stirring shaft. When the ring moves downward, the top of the flexible branch is compressed downward, so that the middle part of the flexible branch bulges outward, and when the stirring shaft rotates, the liquid in the expansion part is stirred.

[0020] Optionally, the first rear section conduit and the second rear section conduit are connected via a third compression section, the third compression section is vertical, and includes a third front contraction section and a third rear expansion section; along the direction from the first rear section conduit to the second rear section conduit, the tube diameter of the third front contraction section gradually decreases, and the tube diameter of the third rear expansion section gradually increases, and the outlet of the third front contraction section and the inlet of the third rear expansion section are disconnected from each other, so that one end of the auxiliary processor is inserted between the third front contraction section and the third rear expansion section, and the other end is connected to the expansion part;

[0021] The auxiliary processor is filled with sewage, and a third discharge electrode is arranged at a position corresponding to the third compression section in the auxiliary processor for sensing the microwave energy of the third compression section and discharging to generate liquid plasma in the auxiliary processor. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 is a schematic structural diagram of the sewage treatment device using liquid phase plasma;

[0023] Figure 2 It is a schematic diagram of the electrodes and stirrer in the processor (the microwave guide tubes, sealing tubes and sealing parts are omitted);

[0024] Figure 3 A schematic diagram of another type of agitator.

[0025] In the accompanying drawings, 1-microwave source, 2-processor, 3-first microwave conduit, 4-first front section conduit, 5-first compression section, 6-first rear section conduit, 7-second microwave conduit, 8-second front section conduit, 9-second compression section, 10-second rear section conduit, 11-vacuum port, 12-first discharge electrode, 13-second discharge electrode, 14-third discharge electrode, 15-first front contraction section, 16-first rear extension section, 17-second front contraction section, 18-second rear extension section, 19-third front contraction section, 20-third rear extension section, 21-first sealing cylinder, 22-second sealing cylinder, 23-third Three sealing cylinders, 24-lower cylinder, 25-expansion part, 26-upper cylinder, 27-bottom sealing part, 28-lower sealing screw, 29-top sealing part, 30-first metal electrode, 31-first insulating part, 32-second metal electrode, 33-second insulating part, 34-third metal electrode, 35-third insulating part, 36-first ground electrode, 37-second ground electrode, 38-third ground electrode, 39-stirring shaft, 40-flexible branch one, 41-ring, 42-sub-processor, 43-side sealing part, 44-side sealing screw, 45-ellipsoid stirring part, 46-flexible branch two. DETAILED DESCRIPTION

[0026] This embodiment provides a sewage treatment device using liquid plasma, such as Figure 1-Figure 3 As shown, it includes at least one microwave source 1, at least two microwave tubes and a processor 2, the inlets of the two microwave tubes are connected to the outlet of the microwave source 1, and are used to conduct microwave energy; the cross-sections of the two microwave tubes are both rectangular, the first microwave tube 3 includes a first compression section 5, and the second microwave tube 7 includes a second compression section 9; the processor 2 is vertical and contains sewage;

[0027] The position with the smallest diameter of the first compression section 5 is connected to the bottom of the processor 2, and the position with the smallest diameter of the second compression section 9 is connected to the upper part of the processor 2. The top of the processor 2 is provided with an exhaust port 11, which is used to provide sufficient vacuum inside the processor 2, which is conducive to the generation of liquid plasma;

[0028] A first discharge electrode 12 is provided at the bottom of the processor 2 at a position corresponding to the first compression section 5, and a second discharge electrode 13 is provided at a position corresponding to the second compression section 9, for sensing microwave energy and discharging to generate plasma.

[0029] Optionally, the inlets of the two microwave tubes are connected in parallel to the outlet of a microwave source, or the sewage treatment device includes two microwave sources, the inlet of the first microwave tube 3 is connected to the outlet of the first microwave source, and the inlet of the second microwave tube 7 is connected to the outlet of the second microwave source, so that the same microwave energy is provided to the two microwave tubes respectively.

[0030] Optionally, the first microwave duct 3 includes a first front section duct 4, a first compression section 5 and a first rear section duct 6 connected in sequence, and the second microwave duct 7 includes a second front section duct 8, a second compression section 9 and a second rear section duct 10 connected in sequence;

[0031] The first front section conduit 4 , the first rear section conduit 6 , the second front section conduit 8 , and the second rear section conduit 10 are all conduits of equal diameter, and have the same diameter.

[0032] Further optionally, the first compression section 5 includes a first front contraction section 15 and a first rear expansion section 16, and along the direction from the first front section conduit 4 to the first rear section conduit 6, the diameter of the first front contraction section 15 gradually decreases, and the diameter of the first rear expansion section 16 gradually increases, and the outlet of the first front contraction section 15 and the inlet of the first rear expansion section 16 are disconnected from each other, so that the bottom of the processor 2 is inserted between the first front contraction section 15 and the first rear expansion section 16;

[0033] The second compression section 9 includes a second front-retracted section 17 and a second rear-expanded section 18. Along the direction from the second front-section conduit 8 to the second rear-section conduit 10, the diameter of the second front-retracted section 17 gradually decreases, and the diameter of the second rear-expanded section 18 gradually increases. The outlet of the second front-retracted section 17 and the inlet of the second rear-expanded section 18 are disconnected from each other, so that the upper part of the processor 2 is inserted between the second front-retracted section 17 and the second rear-expanded section 18.

[0034] Optionally, a first sealing portion is provided between the outlet of the first front-shrinking section 15 and the inlet of the first rear-expanding section 16, for sealing the connection between the outlet of the first front-shrinking section 15, the inlet of the first rear-expanding section 16 and the processor 2 to prevent microwave energy from leaking out;

[0035] The first sealing portion includes a first sealing cylinder 21, which is a hollow cylinder with openings at both ends, and is used for the processor 2 to pass through the first sealing cylinder 21; the first sealing cylinder 21 is provided with a sealing interface on one side facing the first front contraction section 15 and the first rear extension section 16, so that the outlet of the first front contraction section 15 and the inlet of the first rear extension section 16 are respectively inserted into a sealing interface;

[0036] The openings at the upper and lower ends of the first sealing cylinder 21 and the sealing interfaces at both sides are respectively provided with corresponding sealing flanges to seal and close the four openings.

[0037] Optionally, a second sealing portion is provided between the outlet of the second front-shrinking section 17 and the inlet of the second rear-expanding section 18, for sealing the connection between the outlet of the second front-shrinking section 17, the inlet of the second rear-expanding section 18 and the processor 2 to prevent microwave energy from leaking out;

[0038] The second sealing portion includes a second sealing cylinder 22, which is a hollow cylinder with openings at both ends, and is used for the processor 2 to pass through the second sealing cylinder 22; the second sealing cylinder 22 is provided with a sealing interface on one side facing the second front-retracted section 17 and the second rear-expanded section 18, so that the outlet of the second front-retracted section 17 and the inlet of the second rear-expanded section 18 are respectively inserted into a sealing interface;

[0039] The openings at the upper and lower ends of the second sealing cylinder 22 and the sealing interfaces at both sides are respectively provided with corresponding sealing flanges to seal and close the four openings.

[0040] Optionally, the processor 2 is vertically arranged and is made of transparent quartz material. From bottom to top, it includes a lower cylinder 24, an expansion portion 25 and an upper cylinder 26. The lower cylinder 24 and the upper cylinder 26 are both cylindrical, and the expansion portion 25 is elliptical; a first discharge electrode 12 is provided in the lower cylinder 24, and a second discharge electrode 13 is provided in the upper cylinder 26. A bottom sealing portion 27 is provided at the bottom opening of the lower cylinder 24, and a top sealing portion 29 is provided at the top opening of the upper cylinder 26, which are used to seal the processor 2.

[0041] Further optionally, the bottom sealing portion 27 covers the bottom end of the lower cylinder 24 and is connected to the bottom of the first sealing cylinder 21 above by bolts, and the lower sealing screw 28 passes through the bottom sealing portion 27 and blocks the bottom opening of the lower cylinder 24;

[0042] The top sealing portion 29 covers the top end of the upper cylinder 26 and is connected to the top of the second sealing cylinder 22 below via bolts. The air suction port 11 is located between the top sealing portion 29 and the second sealing cylinder 22 .

[0043] Optionally, the first discharge electrode 12 includes a first metal electrode 30 and a first insulating portion 31, the first insulating portion 31 is a hollow cylindrical portion, and the bottom is supported on the lower sealing screw 28; the first metal electrode 30 is inserted into the upper portion of the first insulating portion 31, and the first metal electrode 30 is vertically pointed upward;

[0044] The second discharge electrode 13 includes a second metal electrode 32 and a second insulating portion 33. The second insulating portion 33 is a hollow cylindrical shape, and the top is supported on the side wall of the processor 2. The second metal electrode 32 is inserted into the lower part of the second insulating portion 33. The second metal electrode 32 points vertically downward. The liquid in the processor 2 submerges the second insulating portion 33, and the vacuum port 11 is above the liquid surface.

[0045] Optionally, a first ground electrode 36 and a second ground electrode 37 are provided in the processor 2, the first ground electrode 36 extends from the top opening of the processor 2 and points downward to the first metal electrode 30, the top of the first ground electrode 36 is connected to a wire, the wire extends from the top opening of the processor 2 and is grounded;

[0046] The second ground electrode 37 extends from the bottom opening of the processor 2 and points upward to the second metal electrode 32 . The bottom of the second ground electrode 37 is connected to a wire, which extends from the bottom opening of the processor 2 and is grounded.

[0047] Further optionally, the shapes of the first ground electrode 36 and the second ground electrode 37 are adapted to the inner wall shapes of the lower cylinder 24, the expansion portion 25 and the upper cylinder 26, and the first ground electrode 36 and the second ground electrode 37 are close to the inner wall of the processor 2, and respectively cooperate with the first metal electrode 30 and the second metal electrode 32.

[0048] The vacuum port 11 is connected to a vacuum pump. When in use, the vacuum pump is turned on to keep the vacuum degree in the processor 2 at about 0.08 MPa. One or two microwave generators are turned on, and microwaves are transmitted to two compression sections through two microwave ducts. The two compression sections pass through the upper and bottom of the processor 2 respectively, and the microwave energy is directly coupled to the sewage in the processor 2. The tips of the first metal electrode 30 and the second metal electrode 32 form microbubbles respectively. The electrons in the microbubbles are accelerated under the action of a strong electric field to obtain higher energy. The accelerated electrons collide with water molecules and ionize, causing the bubbles to break down, and then forming an electron avalanche to develop into a liquid plasma. Liquid plasma oxidizes sewage and degrades organic matter in sewage.

[0049] The cross-sections of the two microwave ducts are both rectangular, which is beneficial to reducing the reflection loss of microwaves. The first compression section 5 and the second compression section 9 are respectively inserted into the bottom and the upper part of the processor 2, which can better gather microwave energy. The first discharge electrode 12 and the second discharge electrode 13 correspond to the first compression section 5 and the second compression section 9 respectively, which not only ensures that the microwave plasma is always generated in the liquid, but also the liquid plays the role of cooling the electrode, which greatly slows down the burning of the electrode. The present invention does not need to introduce a carrier gas, but directly excites the plasma in the liquid phase and maintains it stably, which greatly reduces the operating cost and volume of the equipment. The microwave energy of the present invention is directly coupled to the processor 2 through the compression section, which greatly reduces the microwave reflection loss and transmission conversion loss, improves the energy utilization efficiency, and allows the microwave source 1 to work at a higher power, which is beneficial to improve the energy of the liquid phase plasma.

[0050] In addition, in order to fully utilize microwave energy, the present invention sets discharge electrodes at the bottom and top of the processor 2 respectively, and then cooperates with corresponding ground electrodes to induce microwave energy and discharge at two locations to generate liquid plasma; then, the liquid plasma converges at the expansion portion 25.

[0051] Optionally, a stirrer is provided inside the processor 2, so that the liquid in the upper and lower parts of the processor 2 is in a flowing state, the upper and lower temperatures are balanced, and the plasma is fully in contact with the pollutants, thereby improving the processing efficiency;

[0052] The motor of the stirrer is arranged above the top sealing portion 29 , and the stirring shaft 39 passes through the top sealing portion 29 and extends into the interior of the expansion portion 25 .

[0053] Further optionally, the stirring shaft 39 is provided with an openable and closable stirring portion, which includes a plurality of flexible branches 40, which are evenly distributed along the circumference of the stirring shaft 39, the bottom of the flexible branch 40 is fixed to the side of the lower part of the stirring shaft 39, and the top is connected to the bottom of the ring 41, and the ring 41 is sleeved on the stirring shaft 39. When the ring 41 moves downward, the top of the flexible branch 40 is compressed downward, so that the middle part of the flexible branch 40 bulges outward, and when the stirring shaft 39 rotates, the liquid in the expansion part 25 is stirred.

[0054] Before use, the collar 41 is manually pulled upward to make the flexible branch 1 40 close to the stirring shaft 39, the stirring shaft 39 is inserted into the processor 2, and the collar 41 is pushed downward to make the flexible branch 1 40 bulge outward to form a small oval to play a stirring role. The stirring shaft 39 and the top sealing part 29 are rotationally sealed.

[0055] Further optionally, the stirring shaft 39 is provided with a plurality of protruding ellipsoid stirring parts 45 from top to bottom, and the ellipsoid stirring part 45 includes a plurality of flexible branches 46, and the plurality of flexible branches 46 are evenly distributed along the circumference of the stirring shaft 39, and are symmetrically arranged with the stirring shaft as the center, and the upper and lower ends of the flexible branches 46 are fixed on the side of the stirring shaft, and the flexible branches 46 protrude outward and have an arc, so that the longitudinal section of the ellipsoid stirring part 45 is an ellipse;

[0056] There is a distance between two adjacent upper and lower ellipsoid stirring parts 45 , that is, the ellipsoid stirring parts 45 are arranged at intervals.

[0057] Further optionally, the ratio of the maximum width of the ellipsoid stirring portion 45 in the horizontal direction to the inner diameter of the expansion portion 25 at the same height is (0.65-0.85):1, which does not affect the rotation of the ellipsoid stirring portion 45, but can fully disturb the sewage in the expansion portion 25 to promote plasma mixing;

[0058] The ratio of the height of the ellipsoid stirring portion 45 to its maximum width in the horizontal direction is (1.5-2.5):1;

[0059] The distances between the bottom end of the upper ellipsoid stirring portion and the top end of the adjacent lower ellipsoid stirring portion are the same.

[0060] The expansion part 25 of the present invention has a plurality of ellipsoid stirring parts 45. As the inner diameter of the expansion part changes, the width and height of the ellipsoid stirring parts at the corresponding height also change accordingly, so as to fully stir the liquid in the expansion part. Moreover, there is a distance between two adjacent ellipsoid stirring parts. The inventor has found that this form of arranging the ellipsoid stirring parts at intervals can form alternatingly arranged ring stirring and downward cone mixing flow in the expansion part, which can bring better stirring and mixing effects, so that the plasma in the processor itself and the plasma input by the auxiliary processor can be mixed evenly, thereby improving the sewage treatment efficiency.

[0061] Optionally, the first rear section conduit 6 and the second rear section conduit 10 are connected via a third compression section, the third compression section is vertical, and includes a third front contraction section 19 and a third rear expansion section 20; along the direction from the first rear section conduit 6 to the second rear section conduit 10, the diameter of the third front contraction section 19 gradually decreases, and the diameter of the third rear expansion section 20 gradually increases, and the outlet of the third front contraction section 19 and the inlet of the third rear expansion section 20 are disconnected from each other, so that one end of the auxiliary processor 42 is inserted between the third front contraction section 19 and the third rear expansion section 20, and the other end is connected to the expansion portion 25;

[0062] The auxiliary processor 42 is filled with sewage. A third discharge electrode 14 is provided at a position corresponding to the third compression section in the auxiliary processor 42 for sensing the microwave energy of the third compression section and discharging to generate liquid plasma in the auxiliary processor 42 .

[0063] Optionally, a third sealing portion is provided between the outlet of the third front-retracted section 19 and the inlet of the third rear-expanded section 20, for sealing the connection between the outlet of the third front-retracted section 19, the inlet of the third rear-expanded section 20 and the auxiliary processor 42 to prevent microwave energy from leaking out;

[0064] The third sealing portion includes a third sealing cylinder 23, which is a hollow cylinder with openings at both ends, and is used for the auxiliary processor 42 to pass through the third sealing cylinder 23; the third sealing cylinder 23 is provided with a sealing interface on one side facing the third front contraction section 19 and the third rear extension section 20, so that the outlet of the third front contraction section 19 and the inlet of the third rear extension section 20 are respectively inserted into a sealing interface;

[0065] The openings at the left and right ends of the third sealing cylinder 23 and the upper and lower sealing interfaces are respectively provided with corresponding sealing flanges to seal and close the four openings.

[0066] Optionally, a side sealing portion 43 is provided at one end of the sub-processor 42 close to the third sealing portion, and the side sealing portion 43 covers an opening at one end of the sub-processor 42 and is connected to one end of the third sealing tube 23 next to it by bolts. The side sealing screw 44 passes through the side sealing portion 43 and seals the opening of the sub-processor 42.

[0067] Optionally, the third discharge electrode 14 includes a third metal electrode 34 and a third insulating portion 35, the third insulating portion 35 is a hollow cylindrical portion, and one end of the third metal electrode 34 is supported on the side sealing screw 44; the third metal electrode 34 is inserted into the other end of the third insulating portion 35, and the third metal electrode 34 is horizontally directed toward the expansion portion 25;

[0068] A third ground electrode 38 is disposed in the sub-processor 42 , one end of which points to the third metal electrode 34 , and the other end extends into the expansion portion 25 to connect to the first ground electrode 36 or the second ground electrode 37 , thereby achieving indirect grounding of the third ground electrode 38 .

[0069] In order to utilize the excess microwave energy in the first rear section duct 6 and the second rear section duct 10, the present invention uses a third compression section and a sub-processor 42 to introduce the energy of the first rear section duct 6 and the second rear section duct 10 into the third compression section, and then utilizes the third discharge electrode 14 in the sub-processor 42 to discharge, which can also generate plasma, and then mix it with the plasma in the processor 2 through the disturbance of the sub-processor 42 and the agitator.

[0070] Further optionally, the sub-processor 42 is made of transparent quartz, and a plurality of protrusions protruding outward are provided on the outer wall of the sub-processor 42 along the length direction of the sub-processor 42, and the side wall of the protrusion is a circle of symmetrical arcs, for example, the protrusion is elliptical, and there is a straight portion between two adjacent protrusions, so that the inner diameter of the sub-processor 42 increases in the protruding part and remains unchanged in the straight part, thereby making the inner diameter of the sub-processor 42 have an alternating change pattern of expansion and contraction.

[0071] The plasma generated by the discharge of the third discharge electrode 14 is transferred to the processor 2 along the sub-processor 42 under the disturbance of the agitator. When passing through the straight part during the transfer process, the path is shortened and the plasma is accelerated; when passing through the convex part, the path is expanded, the plasma is decelerated and fully mixed with the sewage in the sub-processor 42; in this way, the plasma continuously passes through the convex part and the straight part to be accelerated and mixed, so as to minimize the impact on the liquid phase and plasma in the processor 2.

[0072] Further optionally, the first metal electrode 30, the second sub-processor 42 metal electrode 32, and the third metal electrode 34 are made of the same material, all selected from one or an alloy formed by more than two of platinum, tungsten, iron, nickel, and copper; the first insulating part 31, the second insulating part 33, and the third insulating part 35 are made of the same material, all of which are ceramic and polytetrafluoroethylene; the first ground electrode 36, the second ground electrode 37, and the third ground electrode 38 are made of stainless steel.

[0073] Preferably, the processor 2 is further provided with a first reflector and a second reflector, the first reflector is provided below the first discharge electrode 12, and the upper surface of the first reflector is a mirror surface, which is used to reflect the radio frequency light and energy in the processor 2 upwards;

[0074] The second reflective sheet is disposed above the air exhaust port 11 , and the lower surface of the second reflective sheet is a mirror surface, which is used to reflect the radio frequency light and energy in the processor 2 downward.

[0075] Preferably, the position where the first rear section conduit 6 is connected to the bottom of the third compression section is a right angle corner, where a third reflector is provided, and the position where the second rear section conduit 10 is connected to the top of the third compression section is also a right angle corner, where a fourth reflector is provided;

[0076] The third reflector and the fourth reflector are both tilted, with the mirror reflection surface of the third reflector facing obliquely upward and the mirror reflection surface of the fourth reflector facing obliquely downward, respectively used to reflect the microwave energy transmitted from the first rear section duct 6 and the second rear section duct 10 to the third compression section into the third compression section.

[0077] Preferably, the processor 2 and the sub-processor 42 are both covered with a detachable shielding cover on their outer sides.

Claims

1. A sewage treatment device using liquid plasma, characterized in that: The invention comprises at least one microwave source, at least two microwave conduits and a processor, wherein the inlets of the two microwave conduits are connected to the outlets of the microwave source for conducting microwave energy; the cross sections of the two microwave conduits are both rectangular, the first microwave conduit comprises a first compression section, and the second microwave conduit comprises a second compression section; the processor is vertical and contains sewage; The position with the smallest diameter of the first compression section is connected to the bottom of the processor, and the position with the smallest diameter of the second compression section is connected to the upper part of the processor. The top of the processor is provided with an exhaust port for providing sufficient vacuum inside the processor, which is conducive to the generation of liquid plasma. A first discharge electrode is provided at the bottom of the processor corresponding to the first compression section, and a second discharge electrode is provided at the bottom corresponding to the second compression section, for sensing microwave energy and discharging to generate plasma; The first microwave duct comprises a first front section duct, a first compression section and a first rear section duct connected in sequence, and the second microwave duct comprises a second front section duct, a second compression section and a second rear section duct connected in sequence; The first front section catheter, the first rear section catheter, the second front section catheter, and the second rear section catheter are all catheters of equal diameter, and have the same diameter; The first compression section includes a first front contraction section and a first rear expansion section. Along the direction from the first front section conduit to the first rear section conduit, the diameter of the first front contraction section gradually decreases, and the diameter of the first rear expansion section gradually increases. The outlet of the first front contraction section and the inlet of the first rear expansion section are disconnected from each other, so that the bottom of the processor is inserted between the first front contraction section and the first rear expansion section. The second compression section includes a second front contraction section and a second rear expansion section. Along the direction from the second front section conduit to the second rear section conduit, the diameter of the second front contraction section gradually decreases, and the diameter of the second rear expansion section gradually increases. The outlet of the second front contraction section and the inlet of the second rear expansion section are disconnected from each other, so that the upper part of the processor is inserted between the second front contraction section and the second rear expansion section. The first rear section conduit and the second rear section conduit are connected via a third compression section, the third compression section is vertical and includes a third front contraction section and a third rear expansion section; along the direction from the first rear section conduit to the second rear section conduit, the diameter of the third front contraction section gradually decreases, and the diameter of the third rear expansion section gradually increases, and the outlet of the third front contraction section and the inlet of the third rear expansion section are disconnected from each other, so that one end of the auxiliary processor is inserted between the third front contraction section and the third rear expansion section, and the other end is connected to the processor; The auxiliary processor is filled with sewage, and a third discharge electrode is provided at a position corresponding to the third compression section in the auxiliary processor for sensing the microwave energy of the third compression section and discharging to generate liquid plasma in the auxiliary processor.

2. The sewage treatment device using liquid phase plasma according to claim 1, characterized in that: The processor is vertically arranged, and comprises a lower cylinder, an expansion portion and an upper cylinder from bottom to top, the lower cylinder and the upper cylinder are both cylindrical, and the expansion portion is elliptical; a first discharge electrode is arranged in the lower cylinder, a second discharge electrode is arranged in the upper cylinder, a bottom sealing portion is arranged at the bottom opening of the lower cylinder, and a top sealing portion is arranged at the top opening of the upper cylinder, which are used to seal the processor.

3. The sewage treatment device using liquid plasma according to claim 2, characterized in that: The first discharge electrode comprises a first metal electrode and a first insulating portion, the first insulating portion is a hollow cylindrical portion, and the bottom is supported on the lower sealing screw; the first metal electrode is inserted into the upper portion of the first insulating portion, and the first metal electrode is vertically pointed upward; The second discharge electrode includes a second metal electrode and a second insulating part. The second insulating part is a hollow cylinder with a top supported on the side wall of the processor. The second metal electrode is inserted into the lower part of the second insulating part. The second metal electrode points vertically downward. The liquid in the processor submerges the second insulating part, and the vacuum port is above the liquid surface.

4. The sewage treatment device using liquid plasma according to claim 3, characterized in that: The processor is provided with a first ground electrode and a second ground electrode, the first ground electrode extends from the top opening of the processor and points downward to the first metal electrode, the top of the first ground electrode is connected to a wire, the wire extends from the top opening of the processor and is grounded; The second ground electrode extends from the bottom opening of the processor and points upward to the second metal electrode. The bottom of the second ground electrode is connected to a wire, which extends from the bottom opening of the processor and is grounded.

5. The sewage treatment device using liquid plasma according to claim 1, characterized in that: The processor is provided with a stirrer inside, so that the liquid in the processor is in a flowing state and the temperature is balanced; The motor of the stirrer is arranged above the top sealing part, and the stirring shaft penetrates the top sealing part and extends into the interior of the expansion part.

6. The sewage treatment device using liquid plasma according to claim 5, characterized in that: The stirring shaft is provided with an openable and closable stirring portion, which includes a plurality of flexible branches, which are evenly distributed along the circumference of the stirring shaft. The bottom of the flexible branch is fixed to the side of the lower part of the stirring shaft, and the top is connected to the bottom of the sleeve, which is sleeved on the stirring shaft. When the sleeve moves downward, the top of the flexible branch is compressed downward, so that the middle part of the flexible branch bulges outward, and when the stirring shaft rotates, the liquid in the expansion part is stirred.

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