Thin-film solar cell edge cleaning insulation test method, test device and application

Abstract

The present invention discloses a method, a testing device, and an application for the clean-edge insulation test of thin-film solar cells. The testing method comprises the following steps: applying a first conductive layer to the clean-edge region of a thin-film solar cell before encapsulation, applying a second conductive layer to the chip region of the thin-film solar cell, and spacing the first conductive layer from the chip region; and testing the resistance between the first conductive layer and the second conductive layer to obtain insulation performance data for the clean-edge region. The method is easy to implement and has high detection efficiency, which helps reduce production costs and improve product yield and production efficiency. The present invention also provides a thin-film solar cell clean-edge insulation testing device, as well as applications of the testing method and testing device.

Description

Technical Field

[0001] The present invention relates to the technical field of solar cells, and in particular to a thin-film solar cell edge cleaning insulation testing method, a testing device and an application thereof. Background Art

[0002] Thin-film solar cells are one of the materials most likely to replace silicon cells due to their strong light absorption capacity, low manufacturing cost, flexibility, stable power generation, and environmental friendliness. Thin-film solar cells generally use a glass substrate, on which a front electrode, a semiconductor layer, and a back electrode are deposited. The semiconductor layer can be amorphous silicon, cadmium telluride, copper indium gallium selenide, perovskite, and other materials. For example, cadmium telluride, a compound semiconductor, is generally used as the absorption layer in solar cells. Because it is a direct bandgap semiconductor with a band gap of 1.45 eV, its theoretical photoelectric conversion efficiency is around 30%. It also has a high light absorption coefficient. Even with a film thickness of only 2 μm, it can absorb 99% of sunlight under AM 1.5 conditions. Cadmium telluride is easy to deposit as a thin film over large areas, and the deposition rate is also high. Therefore, cadmium telluride thin-film solar cells have a low manufacturing cost and are a promising thin-film photovoltaic cell.

[0003] The traditional manufacturing process of thin-film solar cells is to deposit a front electrode on a glass substrate, and then use laser etching to split the front electrode (P1), then deposit a semiconductor layer, perform laser etching (P2), then deposit a back electrode, and then perform laser etching to split the back electrode (P3) to form multiple sub-cells. The above three laser processes are commonly referred to as P1, P2, and P3 processes. Among them, P2 is located between P1 and P3, and the back electrode is connected to the front electrode by filling the groove formed by the P2 process with coated metal to achieve conduction, thereby realizing series connection between the sub-cells. The cell chip after coating can be pressed with packaging materials (such as EVA, PVB, POE, etc.) and glass or PET to form a package protection, and the current is led out to the junction box through a special wiring method on the chip film surface, and output through the positive and negative cables of the junction box to make a power generation component or power generation laminated glass. The packaging structure is such as Figure 1 As shown in the figure, the edges of the cell chip substrate need to be cleaned before packaging, a process known as the P4 process. This ensures that the substrate meets insulation requirements, prevents short circuits, and ensures the package is airtight. Therefore, edge cleaning is an important and indispensable step before the airtight packaging of thin-film solar cell substrates.

[0004] Laser edge cleaning is a commonly used edge cleaning process. The principle is to use the high energy of the laser to focus on the coating on the edge of the substrate to sublimate it, thereby achieving the purpose of removal. Figure 2The image shown is a sample of a P4 laser edge cleaning process. The black area represents the chip (coating area), while the surrounding light-colored area represents the edge cleaning area. Laser edge cleaning typically uses a galvanometer method, which outputs a square or circular laser spot and controls the laser movement speed and frequency. The galvanometer is then used to control the laser spot to effectively remove the coating within the edge cleaning area. In mass production, faster movement speeds are generally used to ensure processing efficiency. The faster the movement speed, the lower the spot overlap. Furthermore, energy loss caused by substrate surface contamination or dust falling into the edge cleaning area can cause poor edge cleaning and is difficult to detect. Currently, methods for testing edge cleaning effectiveness include microscopy, visual inspection, or multimeter testing (point contact between the probe and the glass surface, with the test leads ≤10mm apart and not touching, and a scanning resistance ≥2GΩ). These methods are inefficient and cannot achieve full inspection. They cannot fully detect insulation defects caused by the edge cleaning process, limiting product yield and improving production costs and efficiency. Summary of the Invention

[0005] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention provides a method for testing the insulation of thin-film solar cells using clean edges. This method is easy to implement, has high detection efficiency, and good accuracy, and is beneficial for improving product yield, reducing production costs, and improving production efficiency.

[0006] The present invention also provides a thin-film solar cell edge cleaning test device.

[0007] The present invention also provides a thin-film solar cell production line.

[0008] The present invention also provides an application of the above-mentioned thin-film solar cell edge cleaning insulation testing method or thin-film solar cell edge cleaning testing device.

[0009] Specifically, the first embodiment of the present invention relates to a method for testing the edge cleaning insulation of a thin-film solar cell, comprising the steps of:

[0010] Applying a first conductive layer to the clean edge area of ​​the thin-film solar cell before packaging, and applying a second conductive layer to the chip area of ​​the thin-film solar cell, with the first conductive layer and the chip area spaced apart;

[0011] The resistance between the first conductive layer and the second conductive layer is tested to obtain insulation performance data of the edge clear area.

[0012] The thin-film solar cell edge cleaning insulation testing method according to the first aspect of the present invention has at least the following beneficial effects:

[0013] This method performs an insulation performance test on the edge cleaning area of ​​the thin-film solar cell before packaging. By utilizing the surface contact between the first conductive layer and the edge cleaning area, it is possible to quickly and comprehensively test whether the edge cleaning area has poor insulation, thereby improving the detection efficiency and accuracy. By comprehensively testing the insulation performance of the edge cleaning area, it is possible to prevent defective edge cleaning insulation products from flowing into the subsequent packaging process and causing chip losses. At the same time, the detected defective products can be reworked, which can improve the product yield and reduce production costs.

[0014] The method is easy to implement and has high detection efficiency, and is beneficial to reducing production costs and improving production efficiency.

[0015] According to some embodiments of the present invention, the first conductive layer and / or the second conductive layer is a flexible conductive layer, for example, made of conductive rubber, which has good conformability and can form good ohmic contact with the clear edge area.

[0016] According to some embodiments of the present invention, the first conductive layer is adhered to the edge-clearing region by vacuum adsorption.

[0017] According to some embodiments of the present invention, the second conductive layer is adhered to the chip region by vacuum adsorption.

[0018] According to some embodiments of the present invention, a gap between the first conductive layer and the chip region does not exceed 2 mm.

[0019] While ensuring that the first conductive layer does not contact the chip area, the spacing distance between the first conductive layer and the chip area is reduced to more comprehensively detect the insulation performance of the edge-clearing area.

[0020] According to some embodiments of the present invention, the first conductive layer is continuously distributed along the circumference of the clear edge region, and thus the insulation performance of the clear edge region can be tested in one step.

[0021] According to some embodiments of the present invention, the coverage area of ​​the second conductive layer in the chip region is smaller than the area of ​​the chip region.

[0022] According to some embodiments of the present invention, the second conductive layer is provided in a single configuration, or in multiple configurations at intervals.

[0023] According to some embodiments of the present invention, the thin film solar cell is selected from amorphous silicon, cadmium telluride, copper indium gallium selenide or perovskite type.

[0024] According to some embodiments of the present invention, the resistance is tested using an insulation resistance meter, such as a multimeter or a megohmmeter.

[0025] A second embodiment of the present invention relates to a thin-film solar cell edge cleaning and insulation testing device, comprising:

[0026] base plate;

[0027] a first conductive layer, the first conductive layer being disposed on the base plate and being adapted to be bonded to a clean edge region of the thin-film solar cell before encapsulation, and having a size such that the first conductive layer does not contact a chip region of the thin-film solar cell;

[0028] a second conductive layer, the second conductive layer being disposed on the base plate and being adapted to be bonded to a chip region of the thin-film solar cell;

[0029] An insulation resistance meter is electrically connected to the first conductive layer and the second conductive layer.

[0030] The thin-film solar cell edge cleaning and insulation testing device according to the second embodiment of the present invention has at least the following beneficial effects:

[0031] The first conductive layer achieves surface contact with the edge-clearing area, enabling rapid and comprehensive testing for insulation defects in the contact area, improving detection efficiency and accuracy. This device enables comprehensive testing of the insulation performance of the edge-clearing area, preventing defective edge-clearing insulation products from entering the subsequent packaging process and causing chip loss. Detected defective products can also be reprocessed, improving product yield and reducing production costs.

[0032] The device has a simple structure and high detection efficiency, helping to reduce production costs and improve production efficiency. It can also be used in conjunction with a production line to enable real-time and automated testing of thin-film solar cells before encapsulation. The test results can also be used to optimize and improve the edge cleaning process, further improving production efficiency and yield.

[0033] According to some embodiments of the present invention, the first conductive layer and / or the second conductive layer is a flexible conductive layer, for example, the material may be conductive rubber.

[0034] According to some embodiments of the present invention, a gap between the first conductive layer and the chip region does not exceed 2 mm.

[0035] According to some embodiments of the present invention, the first conductive layer is continuously distributed along the circumference of the clear edge area.

[0036] According to some embodiments of the present invention, a size of the second conductive layer satisfies: a coverage area of ​​the second conductive layer in the chip region is smaller than an area of ​​the chip region.

[0037] According to some embodiments of the present invention, the second conductive layer is provided in a single configuration, or in multiple configurations at intervals.

[0038] According to some embodiments of the present invention, a first support frame and a second support frame are spaced apart from each other on the bottom plate, the first conductive layer is disposed on the first support frame, and the second conductive layer is disposed on the second support frame. A gap is left between the first support frame and the second support frame to facilitate loading and unloading of the thin-film solar cell to be tested.

[0039] According to some embodiments of the present invention, a positioning edge is provided on the first support frame for locating the placement position of the thin-film solar cell to be tested.

[0040] According to some embodiments of the present invention, a protective layer is provided on the surfaces of the first support frame and the second support frame that are in contact with the thin-film solar cell to be tested. The protective layer is located at a position on the surface other than the area where the first conductive layer and the second conductive layer are located, so as to protect the product to be tested from damage during the testing process.

[0041] According to some embodiments of the present invention, the protective layer is Teflon tape.

[0042] According to some embodiments of the present invention, the first support frame and the second support frame are integrally formed with the bottom plate.

[0043] According to some embodiments of the present invention, the base plate is provided with a vacuum adsorption channel, which communicates with the region between the first conductive layer and the second conductive layer. Furthermore, the vacuum negative pressure can be applied to ensure close contact between the thin-film solar cell to be tested and the first and second conductive layers, forming good ohmic contact.

[0044] According to some embodiments of the present invention, a plurality of vacuum guide holes are provided in an area between the first conductive layer and the second conductive layer on the base plate, and the vacuum adsorption channel is connected to the area between the first conductive layer and the second conductive layer through the plurality of vacuum guide holes to improve adsorption uniformity.

[0045] According to some embodiments of the present invention, a vacuum pumping device connected to the vacuum adsorption channel is further included.

[0046] According to some embodiments of the present invention, a robot is further included to realize automatic loading and unloading of the thin-film solar cell to be tested, thereby realizing automated testing.

[0047] According to some embodiments of the present invention, the thin film solar cell is selected from amorphous silicon, cadmium telluride, copper indium gallium selenide or perovskite type.

[0048] According to some embodiments of the present invention, the insulation resistance tester is selected from a multimeter or a megohmmeter.

[0049] A third embodiment of the present invention relates to a method for testing the insulation performance of a clean edge region using the thin-film solar cell clean edge insulation testing device, comprising the following steps:

[0050] The thin-film solar cell before packaging is placed on the thin-film solar cell edge cleaning insulation testing device, so that the edge cleaning area of ​​the thin-film solar cell is bonded to the first conductive layer, and the chip area is bonded to the second conductive layer. The resistance value of the insulation resistance meter is read to obtain the insulation resistance between the edge cleaning area and the chip area.

[0051] The thin-film solar cell edge cleaning insulation test device can be used to test the insulation performance of the edge cleaning area. This can quickly and comprehensively determine whether there are poor insulation problems in the edge cleaning area, preventing defective edge cleaning insulation products from entering the subsequent packaging process and causing chip loss. Detected defective products can also be reprocessed, improving product yield and reducing production costs. This method is highly efficient and easy to operate, and sample loading and unloading can be automated. The test results can also be used to optimize and improve the edge cleaning process, promoting improved production efficiency and yield.

[0052] A fourth embodiment of the present invention provides a thin-film solar cell production line equipped with the above-mentioned thin-film solar cell edge cleaning test device.

[0053] This production line enables online testing of the insulation performance of the edge cleaning area of ​​thin-film solar cells under test, improving production efficiency and finished product yield, while reducing production costs. Based on the test results, the edge cleaning process can also be optimized to better meet actual production needs.

[0054] According to some embodiments of the present invention, the thin-film solar cell production line further includes a robot for automatically loading and unloading the thin-film solar cell to be tested on the thin-film solar cell edge cleaning test device to achieve automated testing.

[0055] A fifth aspect of the present invention provides an application of the above-mentioned thin-film solar cell edge cleaning insulation test method or thin-film solar cell edge cleaning test device in thin-film solar cell production or quality inspection.

[0056] Given that this device or method can quickly and comprehensively detect insulation defects in the edge cleaning area, it is beneficial for improving the production efficiency and yield of thin-film solar cells, while reducing production costs. Furthermore, based on the test results, the edge cleaning process can be optimized to better meet actual needs.

[0057] According to some embodiments of the present invention, the application includes use in a production process or quality inspection of a thin-film solar cell.

[0058] definition

[0059] The “chip area” mentioned herein is the effective coating area of ​​the thin-film solar cell, and the peripheral area of ​​the substrate surface other than the chip area is the edge scanning area.

[0060] Other features and advantages of the present invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0061] Figure 1 Schematic diagram of the packaging structure of existing thin-film solar cells.

[0062] Figure 2 This is a sample photo of a thin-film solar cell chip with edges cleaned by P4 laser.

[0063] Figure 3 A schematic structural diagram of a testing device according to a first embodiment of the present invention.

[0064] Figure 4 This is a test principle diagram of an embodiment of the present invention.

[0065] Reference numerals:

[0066] edge cleaning area 110, chip area 120;

[0067] Bottom plate 200, first support frame 210, positioning edge 211, second support frame 220, vacuum adsorption channel 230, vacuum guide hole 231;

[0068] a first conductive layer 300;

[0069] a second conductive layer 400;

[0070] Insulation resistance meter 500. DETAILED DESCRIPTION

[0071] The embodiments of the present invention are described in detail below. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be understood as limiting the present invention.

[0072] First embodiment

[0073] refer to Figure 3 and Figure 4An embodiment of the present invention provides a thin-film solar cell edge cleaning insulation test device, comprising a base plate 200, with a first conductive layer 300 and a second conductive layer 400 disposed thereon. The first conductive layer 300 is used to bond with the edge cleaning region 110 of the thin-film solar cell before encapsulation, and the second conductive layer 400 is used to bond with the chip region 120 of the thin-film solar cell. The first conductive layer 300 and the second conductive layer 400 are respectively connected to the positive and negative electrodes of an insulation resistance meter 500. By reading the resistance value of the insulation resistance meter 500, the insulation resistance between the edge cleaning region 110 and the chip region 120 is determined, thereby determining whether there is insulation failure in the edge cleaning region 110.

[0074] The first conductive layer 300 achieves surface contact with the edge cleaning area 110, which can quickly and comprehensively test whether there is poor insulation in the edge cleaning area 110, improve detection efficiency and accuracy, and accurately test the insulation performance of the edge cleaning area 110 of the thin-film solar cell before packaging, so as to prevent defective edge cleaning insulation products from flowing into the subsequent packaging process and causing chip losses. At present, the insulation performance screening process of conventional thin-film solar cell mass production lines is to perform dry and wet insulation performance tests after packaging. The specific test method can refer to IEC61215. However, 90% of poor insulation often comes from the effect of P4 edge cleaning, and only 10% comes from the quality of the edge sealing material and the edge sealing process. Therefore, accurately screening defective edge cleaning products is of great significance to improving the yield of packaged products. At the same time, the detected defective products can be reworked to avoid scrapping after assembly, reducing losses and lowering production costs.

[0075] The device has a simple structure and high detection efficiency. It can be connected to the production line to realize real-time detection and automated detection before packaging of thin-film solar cells, which is conducive to reducing production costs and improving yield and production efficiency.

[0076] In this embodiment, a first support frame 210 and a second support frame 220 are provided on a base plate 200. A first conductive layer 300 is provided on the first support frame 210. The first support frame 210 is provided with a positioning edge 211 for positioning the thin-film solar cell to be tested. A second conductive layer 400 is provided on the second support frame 220. A gap is provided between the first and second support frames 210, 220 to facilitate loading and unloading of the thin-film solar cell to be tested.

[0077] To protect the thin-film solar cells under test from damage during loading and unloading, protective layers are provided on the surfaces of the first and second support frames 210 and 220 that contact the sample under test. These layers are located outside the areas where the first and second conductive layers 300 and 400 are located, protecting the thin-film solar cells from damage during testing. The protective layers can be made of smooth Teflon tape, which is non-destructive.

[0078] In some embodiments, the first support frame 210 and the second support frame 220 are integrally formed with the base plate 200 , for example, they are simultaneously prepared in a one-step process, or the first support frame 210 and the second support frame 220 are formed by slotting the base plate 200 .

[0079] The first conductive layer 300 and the second conductive layer 400 are flexible conductive layers, for example, made of conductive rubber. The flexible conductive layer has good adhesion and can form a good ohmic contact with the clear edge area 110. In order to more comprehensively detect the insulation performance of the clear edge area 110, it is advisable to reduce the distance between the first conductive layer 300 and the chip area 120 as much as possible, for example, to control the gap between the two to not exceed 2mm. It can be understood that the first conductive layer 300 is continuously distributed along the circumference of the clear edge area 110, and the insulation performance of the clear edge area 110 can be tested in one step. When the first conductive layer 300 does not completely cover the circumferential area of ​​the clear edge area 110, multiple tests can be performed until the total covering area of ​​the first conductive layer completely covers the circumferential area of ​​the clear edge area 110, thereby also comprehensively testing the insulation performance of the clear edge area 110.

[0080] In this embodiment, one or two second conductive layers 400 are provided, primarily for current diversion. Depending on the actual situation, one or more second conductive layers 400 may be provided in the chip region 120. When there are two or more second conductive layers 400, two or more second support frames 220 are also provided at intervals. To achieve current diversion, the total coverage area of ​​the second conductive layers 400 in the chip region 120 may be smaller than the area of ​​the chip region 120.

[0081] In this embodiment, a vacuum adsorption channel 230 is provided on the base plate 200. One end of the vacuum adsorption channel 230 is connected to the area between the first conductive layer 300 and the second conductive layer 400 (for example, the area between the first support frame 210 and the second support frame 220 in this embodiment), and the other end is used to communicate with a vacuum pump (for example, a vacuum pump). Furthermore, the vacuum negative pressure can be used to make the thin-film solar cell to be tested fit tightly with the first conductive layer 300 and the second conductive layer 400, forming a good ohmic contact. In order to improve the uniformity of adsorption, a plurality of vacuum guide holes 231 are provided on the base plate 200 in the area between the first conductive layer 300 and the second conductive layer 400. The vacuum adsorption channel 230 is connected to the area between the first conductive layer 300 and the second conductive layer 400 through the plurality of vacuum guide holes 231.

[0082] In some embodiments, the insulation resistance meter 500 is a multimeter or a megohmmeter.

[0083] This embodiment has no particular limitation on the type of thin-film solar cell, and may be applicable to amorphous silicon, cadmium telluride, copper indium gallium selenide, or perovskite types.

[0084] In some embodiments, the testing device further includes a manipulator, which is used to automatically load and unload the thin-film solar cell to be tested, thereby achieving automated testing.

[0085] This embodiment also provides a method for testing the insulation performance of the edge-clearing region 110 using the thin-film solar cell testing device, comprising the following steps:

[0086] The thin-film solar cell before packaging is placed on a thin-film solar cell edge cleaning insulation test device, so that the edge cleaning area 110 of the thin-film solar cell is bonded to the first conductive layer 300, and the chip area 120 is bonded to the second conductive layer 400. The resistance value of the insulation resistance meter 500 is read to obtain the insulation resistance between the edge cleaning area 110 and the chip area 120.

[0087] This method has high testing efficiency and is easy to operate. Sample loading and unloading can be automated, and the test results can also be used to optimize and improve the edge cleaning process, thereby promoting the improvement of production efficiency and yield.

[0088] This embodiment also provides a thin-film solar cell production line equipped with the aforementioned thin-film solar cell edge cleaning test device. This production line can perform online testing of the insulation performance of the edge cleaning area of ​​the thin-film solar cell under test, thereby improving the production efficiency and finished product yield of thin-film solar cells and reducing production costs. Based on the test results, the edge cleaning process can also be optimized to better meet actual production needs.

[0089] In some embodiments, the thin-film solar cell production line is further equipped with a robot for automatically loading and unloading the thin-film solar cell to be tested on the testing device, thereby realizing automated testing and improving testing efficiency.

[0090] Second embodiment

[0091] refer to Figure 4 This embodiment provides a method for testing the clean-edge insulation of a thin-film solar cell, comprising the steps of: attaching a first conductive layer 300 to the clean-edge region 110 of a thin-film solar cell before encapsulation, attaching a second conductive layer 400 to the chip region 120 of the thin-film solar cell, with the first conductive layer 300 and the chip region 120 spaced apart; and testing the resistance between the first conductive layer 300 and the second conductive layer 400 to obtain the insulation performance of the clean-edge region 110.

[0092] This method can quickly and comprehensively test whether there are poor insulation in the edge cleaning area 110, improving detection efficiency and accuracy, and preventing defective edge cleaning and insulation products from flowing into the subsequent packaging process and causing chip losses. At the same time, the detected defective products can be reworked, which can improve product yield and reduce production costs. In addition, this method is easy to implement and has high detection efficiency, which can ensure production efficiency.

[0093] In some embodiments, the first conductive layer 300 and the second conductive layer 400 are flexible conductive layers. Regarding the material selection, size or quantity of the first conductive layer 300 and the second conductive layer 400, reference can be made to the relevant description of the first embodiment and no repetitive description is given.

[0094] In some embodiments, the first conductive layer 300 and the second conductive layer 400 are respectively adhered to the surface of the edge cleaning area 110 or the chip area 120 by vacuum adsorption, and close adhesion is achieved by vacuum adsorption.

[0095] In some embodiments, the resistance is tested using an insulation resistance meter 500 , such as a multimeter or a megohmmeter.

[0096] This embodiment has no particular limitation on the type of thin-film solar cell, and may be applicable to amorphous silicon, cadmium telluride, copper indium gallium selenide, or perovskite types.

[0097] Third embodiment

[0098] This embodiment provides an application of the thin-film solar cell edge cleaning test device of the first embodiment or the thin-film solar cell edge cleaning insulation test method of the second embodiment in the production or quality inspection of thin-film solar cells.

[0099] Specifically, the test device or test method can be integrated into the actual production line to optimize and improve the edge cleaning process, or used for quality inspection of thin-film solar cells before packaging, to prevent defective edge cleaning and insulation products from flowing into subsequent packaging processes, reduce losses, enable the reuse of defective products, improve product yield, reduce production costs, and ensure production efficiency.

[0100] This embodiment has no particular limitation on the type of thin-film solar cell, and may be applicable to amorphous silicon, cadmium telluride, copper indium gallium selenide, or perovskite types.

[0101] The embodiments of the present invention are described in detail above with reference to the accompanying drawings, but the present invention is not limited to the above embodiments. Various changes can be made within the scope of knowledge possessed by ordinary technicians in the relevant technical field without departing from the scope of the present invention.

Claims

1. A thin-film solar cell edge cleaning insulation test method, characterized by: Including steps: Applying a first conductive layer to the clean edge area of ​​the thin-film solar cell before packaging, and applying a second conductive layer to the chip area of ​​the thin-film solar cell, with the first conductive layer and the chip area spaced apart; measuring the resistance between the first conductive layer and the second conductive layer to obtain the insulation performance of the edge-clearing area; The gap between the first conductive layer and the chip area does not exceed 2 mm, and the first conductive layer is continuously distributed along the circumference of the clear edge area. Alternatively, when the first conductive layer does not completely cover the circumferential area of ​​the clear edge area, multiple tests can be performed to ensure that the total coverage area of ​​the first conductive layer completely covers the circumferential area of ​​the clear edge area. The chip area is an effective coating area of ​​the thin film solar cell, and the peripheral area of ​​the coating surface except the chip area is a clear edge area.

2. The thin-film solar cell edge cleaning insulation test method according to claim 1, characterized in that: The first conductive layer is a flexible conductive layer; and / or, the first conductive layer is adhered to the edge-clearing area by vacuum adsorption; and / or, the second conductive layer is a flexible conductive layer; and / or, the second conductive layer is adhered to the chip area by vacuum adsorption.

3. The thin-film solar cell edge cleaning insulation test method according to claim 1 or 2, characterized in that: The thin film solar cell is selected from amorphous silicon, cadmium telluride, copper indium gallium selenide or perovskite type; and / or the resistance is tested using an insulation resistance meter.

4. A thin-film solar cell edge cleaning insulation test device, characterized in that: include: base plate; a first conductive layer, the first conductive layer being disposed on the base plate and being adapted to be bonded to the clean edge region of the thin-film solar cell before encapsulation, and wherein the dimensions of the first conductive layer satisfy the following requirements: a gap between the first conductive layer and the chip region of the thin-film solar cell is no greater than 2 mm; the first conductive layer is continuously distributed along the circumference of the clean edge region; or, when the first conductive layer does not completely cover the circumferential region of the clean edge region, multiple tests can be performed to ensure that the total bonding area of ​​the first conductive layer completely covers the circumferential region of the clean edge region; a second conductive layer, the second conductive layer being disposed on the base plate and being adapted to be bonded to a chip region of the thin-film solar cell; an insulation resistance meter, electrically connected to the first conductive layer and the second conductive layer; The chip area is an effective coating area of ​​the thin-film solar cell, and the peripheral area of ​​the coating surface except the chip area is a clear edge area.

5. The thin-film solar cell edge cleaning insulation testing device according to claim 4, characterized in that: A first support frame and a second support frame are provided on the bottom plate and are spaced apart from each other. The first conductive layer is provided on the first support frame, and the second conductive layer is provided on the second support frame.

6. The thin-film solar cell edge cleaning insulation test device according to claim 5, characterized in that: The first support frame is provided with a positioning edge.

7. The thin-film solar cell edge cleaning insulation testing device according to claim 5, characterized in that: The surfaces of the first support frame and the second support frame that are in contact with the thin-film solar cell to be tested are provided with a protective layer, and the protective layer is located at a position on the surface other than the area where the first conductive layer and the second conductive layer are located.

8. The thin-film solar cell edge cleaning insulation test device according to any one of claims 4 to 7, characterized in that: A vacuum adsorption channel is provided on the bottom plate, and the vacuum adsorption channel is communicated with the area between the first conductive layer and the second conductive layer.

9. A thin-film solar cell production line, characterized in that: It comprises the thin-film solar cell edge cleaning insulation testing device as described in any one of claims 4 to 8.

10. Use of the thin-film solar cell edge cleaning insulation test method according to any one of claims 1 to 3 or the thin-film solar cell edge cleaning insulation test device according to any one of claims 4 to 8 in thin-film solar cell production or quality inspection.

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