Silicon material cleaning device for single crystal silicon preparation

By designing a silicon material cleaning device with multiple overflow notches and annular overflow tanks, the problems of uneven water flow direction and inconvenient cleaning of fine silicon wafers are solved, and a more uniform rinsing effect and a more convenient cleaning process are achieved.

CN118080451BActive Publication Date: 2025-03-11JIANGSU JINGPIN NEW ENERGY CO LTD
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Patent Information

Application Number
CN202410286204.X
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-03-13
Publication Date
2025-03-11
Estimated Expiration
2044-03-13

AI Technical Summary

Technical Problem

During the rinsing process of existing silicon material cleaning devices, the water flow direction is uneven, resulting in good rinsing effect of silicon material in some directions, while insufficient rinsing effect of other directions. At the same time, small silicon wafers are prone to fall into the overflow tank, making it inconvenient to clean.

Method used

A silicon material cleaning device including a cylinder, a bearing part, a surround plate and a connecting plate is designed. The device realizes uniform control of the water flow direction and erosion cleaning of the overflow groove by providing a plurality of overflow notches and an annular overflow grooves on the side wall of the cylinder, and combined with the adjustment function of the plug unit.

Benefits of technology

The silicon material is rinsed more evenly, the rinsing effect is improved, and the fine silicon material falling into the overflow tank is conveniently cleaned through the adjustment function of the plug unit.

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Abstract

The present application discloses a silicon material cleaning device for preparing single crystal silicon, comprising a cylinder, a bearing part, a surrounding plate, and a connecting plate connecting the bottom end of the surrounding plate and the outer wall of the cylinder; the bearing part comprises a bearing plate and a plurality of inner supporting legs, and the bearing plate has a plurality of water-permeable holes; the connecting plate is connected to a downpipe; the side wall of the cylinder is connected to a water inlet pipe; an annular overflow groove is formed between the surrounding plate, the connecting plate and the outer wall of the cylinder, and the cylinder has a water outlet hole connected to the overflow groove. In the silicon material cleaning device of the present application, the silicon material to be cleaned is placed on the bearing plate, and the water flows through the water-permeable holes and overflows from a plurality of overflow recesses into the overflow groove, and then is discharged through the downpipe, so that the silicon material at different positions in the cylinder is rinsed more evenly, so that the rinsing effect is better. By adjusting the position of the plug unit, the overflow groove can be flushed, so that the fine silicon material falling into the overflow groove can be washed away and cleaned.
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Description

Technical Field

[0001] The present invention relates to the technical field of single crystal silicon, and more specifically, to a silicon material cleaning device for preparing single crystal silicon. Background Art

[0002] Silicon cleaning is a process to remove pollutants and impurities from the surface of silicon materials. In semiconductor manufacturing and the solar industry, silicon is a key material whose quality and purity directly affect the performance and reliability of the product. Silicon materials are usually affected by various pollutants and impurities during the production process, such as dust, oil, etc. These pollutants will affect the performance and quality of silicon materials, and may affect the stability and reliability of the product during subsequent processing.

[0003] Silicon material cleaning usually includes pickling and rinsing. Rinsing refers to the step of rinsing the silicon material after chemical treatment such as pickling to remove residual acid or other chemicals. Rinsing usually uses pure water or a specific rinsing liquid to rinse the silicon material to ensure that there are no residual chemicals on the surface. In the existing silicon material cleaning device, when rinsing the silicon material, water enters from the bottom while overflowing from the overflow hole on the top. Since the overflow hole is only on one side, the direction of the water flow will be biased towards the direction of the overflow hole, resulting in a good rinsing effect for the silicon material in some directions, and insufficient rinsing effect for the silicon wafers in other directions. In addition, some cleaning devices are provided with an annular groove for catching overflow water, but as the overflow water flow rises, some small silicon wafers will fall into the annular groove along the rising water flow, which is not very convenient for cleaning and collecting these small silicon wafers. Summary of the invention

[0004] The present invention aims to overcome the defects of the prior art and provide a silicon material cleaning device for preparing single crystal silicon.

[0005] In order to achieve the above-mentioned purpose, the present invention provides the following technical solutions: a silicon material cleaning device, comprising a cylinder, a bearing part installed in the cylinder, a surrounding plate surrounding the cylinder, and a connecting plate connecting the bottom end of the surrounding plate and the outer wall of the cylinder; the bearing part comprises a bearing plate and a plurality of inner supporting legs, the bearing plate has a plurality of water-permeable holes; the connecting plate is connected to a downpipe; the side wall of the cylinder is connected to a water inlet pipe; an annular overflow groove is formed between the surrounding plate, the connecting plate and the outer wall of the cylinder, and the cylinder has a water outlet hole connected to the overflow groove.

[0006] Furthermore, the bearing plate also has a through hole portion; the diameter of the through hole portion is larger than the diameter of the water permeable hole.

[0007] Therefore, the bearing portion can be hooked up through the through hole using a hook or other tool.

[0008] Furthermore, a plurality of external supporting legs are fixedly connected to the bottom of the cylinder; and a water inlet pipe valve is provided at the water inlet pipe.

[0009] By fixing a plurality of external supporting legs at the bottom of the cylinder, the stability and load-bearing capacity of the entire device can be increased, and the water inlet pipe valve can conveniently control and adjust the water inlet flow to achieve the best cleaning effect.

[0010] Furthermore, it also includes a plug unit; the top of the cylinder has a plurality of overflow recesses, and the plurality of overflow recesses are distributed in a circular shape with equal spacing; the surrounding plate has a limiting through hole connected to the overflow groove; the plug unit includes an end plate, a limiting rod connected to the end plate and passing through the limiting through hole, an end block fixedly connected to the end of the limiting rod, a circular insertion plate fixedly connected to the end plate and capable of being inserted into the water outlet, and an arc plate fixedly connected to the insertion plate, the limiting rod has a plurality of first circular rubber protrusions, The insertion plate is provided with a plurality of annular second rubber protrusions; the arc panel is provided with two side through holes, and the arc panel is also provided with a water-guiding protrusion located between the two side through holes, the top of the water-guiding protrusion is in the shape of an arc surface, and extends from the end of the arc panel to the end plate; an arc block is fixedly connected to the end of the arc panel, the arc block is provided with a limiting plug block, and the inner side wall of the cylinder is provided with a limiting plug hole cooperating with the limiting plug block; the drain pipe is provided with a bottom cover portion screwed with the drain pipe thread, and the bottom cover portion has a plurality of drain holes.

[0011] By adjusting the position of the plug unit, the overflow tank can be flushed, so that the fine silicon material falling into the overflow tank can be flushed away, making cleaning easier.

[0012] Furthermore, the angle between the plane where the upper surface of the connecting plate is located and the horizontal plane is between 5-15 degrees.

[0013] Furthermore, the downpipe is located at the lowest point of the connecting plate.

[0014] This makes it convenient to discharge water and to flush and clean the silicon material in the overflow tank with water.

[0015] Furthermore, there are two of each of the limit plug block and the limit socket, and the cross-sections of the limit plug block and the limit socket are both circular.

[0016] Through two limit blocks and limit holes, accurate positioning of the arc panel and the cylinder can be achieved.

[0017] Furthermore, the number of the inner supporting legs and the number of the outer supporting legs are eight, and an arc-shaped notch is formed between two adjacent inner supporting legs.

[0018] Thereby increasing the stability of the device and ensuring that the device remains balanced and stable during operation.

[0019] Furthermore, the plurality of water-permeable holes are divided into a plurality of circles, and the water-permeable holes in the same circle are distributed in a circular shape with equal intervals.

[0020] Thereby, a more uniform water permeability effect can be achieved, and the cleaning effect of the silicon material cleaning device can be improved.

[0021] Beneficial effects:

[0022] 1. In the silicon material cleaning device of the present application, the silicon material to be cleaned is placed on the supporting plate, and water flows through the water-permeable holes and overflows from multiple overflow recesses into the overflow trough, and then is discharged through the downpipe, thereby achieving a more uniform rinsing of the silicon material at different positions in the cylinder, thereby achieving a better rinsing effect.

[0023] 2. The silicon material cleaning device of the present application can flush the overflow trough by adjusting the position of the plug unit, thereby flushing away the fine silicon material that has fallen into the overflow trough, which is beneficial to the cleaning and collection of the fine silicon material. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 This is a schematic diagram of normal rinsing;

[0025] Figure 2 This is a schematic diagram of the overflow tank flushing;

[0026] Figure 3 A first-person perspective diagram of component separation;

[0027] Figure 4 This is an enlarged schematic diagram of area A;

[0028] Figure 5 A second perspective diagram for separating components;

[0029] Figure 6 This is a magnified schematic diagram of area B.

[0030] Explanation of the reference numerals: 1 cylinder; 1.1 water inlet pipe; 1.2 water outlet hole; 1.3 outer supporting leg; 1.4 overflow recess; 2 bearing portion; 2.1 bearing plate; 2.2 inner supporting leg; 2.3 water-permeable hole; 2.4 through-hole portion; 3 surrounding plate; 4 connecting plate; 4.1 downpipe; 4.2 bottom cover portion; 5.1 end plate; 5.2 limiting rod; 5.2.1 first rubber protrusion; 5.3 end block; 5.4 insert plate; 5.4.1 second rubber protrusion; 5.5 arc panel; 5.5.1 side through hole; 5.5.2 water-guiding protrusion; 6 arc block; 6.1 limiting plug block. DETAILED DESCRIPTION

[0031] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, and should not be construed as limiting the present invention.

[0032] The present invention provides Figure 1-6 A silicon material cleaning device for preparing single crystal silicon is shown, comprising a cylinder 1, a bearing part 2 installed in the cylinder, a surrounding plate 3 surrounding the cylinder, and a connecting plate 4 connecting the bottom end of the surrounding plate 3 and the outer wall of the cylinder 1; the bearing part 2 comprises a bearing plate 2.1 and a plurality of inner supporting legs 2.2, and the bearing plate 2.1 has a plurality of water-permeable holes 2.3; the connecting plate 4 is connected to a downpipe 4.1; the side wall of the cylinder 1 is connected to a water inlet pipe 1.1; an annular overflow groove is formed between the surrounding plate 3, the connecting plate 4 and the outer wall of the cylinder 1, and the cylinder 1 has a water outlet hole 1.2 connected to the overflow groove.

[0033] The bearing plate 2.1 also has a through hole portion 2.4; the diameter of the through hole portion 2.4 is larger than the diameter of the water-permeable hole 2.3; a plurality of outer supporting legs 1.3 are fixedly connected to the bottom of the cylinder 1; and the water inlet pipe 1.1 has a water inlet pipe valve.

[0034] The silicon material cleaning device also includes a plug unit; the top of the cylinder 1 has a plurality of overflow recesses 1.4, and the plurality of overflow recesses 1.4 are distributed in a circular shape with equal spacing; the surrounding plate 3 has a limiting through hole connected to the overflow groove; the plug unit includes an end plate 5.1, a limiting rod 5.2 connected to the end plate and passing through the limiting through hole, an end block 5.3 fixedly connected to the end of the limiting rod, a circular insertion plate 5.4 fixedly connected to the end plate and capable of being inserted into the water outlet 1.2, and an arc panel 5.5 fixedly connected to the insertion plate, the limiting rod 5.2 has a plurality of circular first rubber protrusions 5.2.1, and the insertion plate 5.4 has a plurality of circular second rubber protrusions 5.4.1; The arc panel 5.5 has two side through holes 5.5.1, and the arc panel 5.5 also has a water-guiding protrusion 5.5.2 located between the two side through holes 5.5.1, and the top of the water-guiding protrusion 5.5.2 is in the shape of an arc surface and extends from the end of the arc panel 5.5 to the end plate 5.1; the end of the arc panel 5.5 is fixedly connected with an arc block 6, and the arc block 6 has a limit plug 6.1, and the inner side wall of the cylinder 1 has a limit plug hole that cooperates with the limit plug 6.1; the downpipe 4.1 has a bottom cover part 4.2 that is screwed with the downpipe 4.1, and the bottom cover part 4.2 has a plurality of downpipe holes; the angle between the plane where the upper surface of the connecting plate 4 is located and the horizontal plane is between 5-15 degrees.

[0035] There are two limit plugs 6.1 and two limit sockets, and the cross-sections of the limit plugs 6.1 and the limit sockets are both circular; there are eight inner supporting legs 2.2 and eight outer supporting legs 1.3; there is an arc-shaped notch between two adjacent inner supporting legs 2.2; the multiple water-permeable holes 2.3 are divided into multiple circles, and the water-permeable holes 2.3 in the same circle are distributed in a circular shape with equal spacing.

[0036] Working principle: During normal rinsing, the silicon material is placed in a silicon material basket containing silicon material, and the silicon material basket is placed on the carrier plate, such as Figure 1 As shown, water is injected from the water inlet pipe and passes through the water permeable hole, and the water overflows from multiple overflow notches, enters the overflow groove, and flows down from the downpipe. Since the water overflows from multiple overflow notches distributed around a circle, the rising direction of the water flow in the cylinder is uniform and stable, so that the silicon materials at different positions in the cylinder are rinsed more evenly.

[0037] With long rinsing time, some tiny silicon materials will flow up with the water flow and fall into the overflow tank, and adhere to the bottom of the overflow tank (the water flow at the overflow of the normal overflow notch is small and not enough to wash it away). Figure 2 In the state shown, the water above the water outlet will quickly flow out of the water outlet, with a large water flow, and flow out to the side holes on both sides through the water guide protrusion, thereby flushing the overflow tank, and the fine silicon material inside can be flushed to the downpipe, and the fine silicon material will fall on the bottom cover. When performing the above operation, the water inlet pipe remains unchanged. The first rubber protrusion at the limit rod can have a sealing effect on the one hand, and on the other hand, the friction force of the first rubber protrusion on the limit rod is stable. Figure 2 The second rubber protrusion at the insertion plate has a sealing effect on the one hand, and on the other hand, the friction force of the second rubber protrusion can also keep the plug unit stable in the state shown. Figure 1 Status shown.

[0038] Although the present invention has been illustrated and described with respect to the preferred embodiments, it will be appreciated by those skilled in the art that various changes and modifications may be made to the present invention without departing from the scope of the present invention as defined by the claims.

Claims

1. A silicon material cleaning device for preparing single crystal silicon, characterized in that: The invention comprises a cylinder, a bearing part installed in the cylinder, a surrounding plate surrounding the cylinder, and a connecting plate connecting the bottom end of the surrounding plate and the outer wall of the cylinder; the bearing part comprises a bearing plate and a plurality of inner supporting legs, and the bearing plate has a plurality of water-permeable holes; the connecting plate is connected to a downpipe; the side wall of the cylinder is connected to a water inlet pipe; an annular overflow groove is formed between the surrounding plate, the connecting plate and the outer wall of the cylinder, and the cylinder has a water outlet hole connected to the overflow groove; the silicon material cleaning device also comprises a plug unit; the top of the cylinder has A plurality of overflow recesses, the plurality of overflow recesses are distributed in an annular manner with equal spacing; the surrounding plate is provided with a limiting through hole connected to the overflow groove; the plug unit comprises an end plate, a limiting rod connected to the end plate and passing through the limiting through hole, an end block fixedly connected to the end of the limiting rod, a circular insert plate fixedly connected to the end plate and capable of being inserted into the water outlet, and a curved plate fixedly connected to the insert plate, the limiting rod is provided with a plurality of circular first rubber protrusions, and the insert plate is provided with a plurality of circular second rubber protrusions; The arc panel is provided with two side through holes, and the arc panel is also provided with a water-guiding protrusion located between the two side through holes, the top of the water-guiding protrusion is in the shape of an arc surface, and extends from the end of the arc panel to the end plate; the end of the arc panel is fixedly connected with an arc block, the arc block is provided with a limiting plug block, and the inner side wall of the cylinder body is provided with a limiting plug hole matching with the limiting plug block; the drain pipe is provided with a bottom cover part screwed with the drain pipe thread, and the bottom cover part has a plurality of drain holes; the angle between the plane where the upper surface of the connecting plate is located and the horizontal plane is between 5-15 degrees.

2. The silicon material cleaning device for preparing single crystal silicon according to claim 1, characterized in that: The bearing plate also has a through hole portion; the diameter of the through hole portion is larger than the diameter of the water permeable hole.

3. The silicon material cleaning device for preparing single crystal silicon according to claim 1, characterized in that: A plurality of outer supporting legs are fixedly connected to the bottom of the cylinder; and a water inlet pipe valve is provided at the water inlet pipe.

4. The silicon material cleaning device for preparing single crystal silicon according to claim 1, characterized in that: There are two limit plugs and two limit holes, and the cross sections of the limit plugs and the limit holes are both circular.

5. The silicon material cleaning device for preparing single crystal silicon according to claim 1, characterized in that: There are eight inner supporting legs and eight outer supporting legs each; an arc-shaped notch is formed between two adjacent inner supporting legs.

6. The silicon material cleaning device for preparing single crystal silicon according to claim 1, characterized in that: The plurality of water-permeable holes are divided into a plurality of circles, and the water-permeable holes in the same circle are distributed in a circular shape with equal intervals.

Citation Information

Patent Citations

  • Circulating tank structure

    CN109701936A