A lunar dust removal test system and test method based on electrostatic effect

Abstract

This application relates to the field of aerospace technology. Specifically, it relates to a lunar dust removal test system and test method based on electrostatic effect. The system includes a dust removal platform, a high-voltage power supply, dust removal electrodes, and a weighing device arranged in a vacuum chamber, where: the dust removal platform is of a guide rail and slide structure; the dust removal electrodes include an upper electrode plate and a lower electrode plate. The upper electrode plate is located directly above the lower electrode plate and is arranged parallel to the lower electrode plate; the high-voltage power supply includes an upper electrode high-voltage power supply and a lower electrode high-voltage power supply. The upper electrode high-voltage power supply is connected to the upper electrode plate; the lower electrode high-voltage power supply is connected to the lower electrode plate; the weighing device is a mass balance. The overall dust removal of this application is a combination of active and passive integration. First, the contact force between lunar dust particles and the contact surface is reduced, and then the lunar dust particles are separated from the protected surface by electrostatic force for dust removal testing, which can quickly and accurately test the efficiency of lunar dust removal and lay a foundation for the subsequent rapid dust removal of deposited lunar dust.

Description

Technical Field

[0001] This application relates to the field of aerospace technology. Specifically, it relates to a lunar dust removal test system and test method based on the electrostatic effect. Background Art

[0002] Lunar dust is the biggest obstructive environment in lunar exploration missions. In previous lunar surface exploration missions, lunar dust has deposited on the surface of lunar exploration equipment, reducing the performance of the equipment and even causing failures, becoming the biggest harmful environmental factor in subsequent long-term lunar surface exploration.

[0003] In response to the problems caused by lunar dust deposition, research scholars have been developing lunar dust removal methods that can be used for cleaning. In the patent with the application number CN108580440A, a lunar dust removal system powered by PLZT is disclosed. The positive and negative electrodes of PLZT are connected to the protective surface, but its surface is not treated with passive protection and does not have a conductive layer, resulting in a low dust removal efficiency. In the invention with the application number CN202110174664X, an inverted triangular lunar dust conductive protection film is disclosed, but it belongs to pure passive lunar dust removal, with poor application flexibility.

[0004] In response to the above existing problems, there is no test scheme in the prior art that uses a combination of active and passive methods for dust removal on the lunar dust deposition surface, and in the existing test schemes, the dust removal efficiency of lunar dust cannot be quickly and accurately tested. Summary of the Invention

[0005] This application provides a lunar dust removal test system and test method based on the electrostatic effect. Through a combination of active and passive methods, the dust removal efficiency of lunar dust can be quickly and accurately tested, laying a foundation for subsequent rapid dust removal on the surface of equipment with severe lunar dust deposition.

[0006] To achieve the above object, this application provides a lunar dust removal test system based on the electrostatic effect, including a dust removal platform, a high-voltage power supply, a dust removal electrode, and a weighing device arranged in a vacuum chamber, where: the dust removal platform is of a rail slide structure; the dust removal electrode includes an upper electrode plate and a lower electrode plate. The upper electrode plate is arranged at the clamping end of the dust removal platform through a fixture, the lower electrode plate is arranged at the upper end of the weighing device, the upper electrode plate is directly above the lower electrode plate and is arranged parallel to the lower electrode plate; the high-voltage power supply includes an upper electrode high-voltage power supply and a lower electrode high-voltage power supply. The upper electrode high-voltage power supply is connected to the upper electrode plate to provide a positive voltage for it; the lower electrode high-voltage power supply is connected to the lower electrode plate to provide a negative voltage for it; the weighing device is a mass balance, and its bottom surface is arranged parallel to the bottom surface of the dust removal platform.

[0007] Further, the dust removal platform includes a base slide rail, a slide table bracket, a slide table support rod, and a connecting rod, where: The slide table bracket is arranged between two base slide rails and can slide back and forth along the X-axis on the base slide rail; A guide rail is arranged on one side of the slide table bracket; The slide table support rod is arranged on the guide rail of the slide table bracket and can slide up and down along the Z-axis on the guide rail; The connecting rod is fixed in the middle of the slide table support rod, and the lower part is fixedly connected to the upper electrode plate through a fixture; Through the dust removal platform, the upper electrode plate can move in multiple directions.

[0008] Further, the upper electrode plate is a flexible copper thin film electrode, and a nano-silver conductive lunar dust adsorption coating is provided on the lower surface; The lower electrode plate is a protective electrode with conductive properties, and a nano-silver conductive lunar dust protection coating is provided on the upper surface.

[0009] Further, the area of the upper electrode plate ≥ the area of the lower electrode plate.

[0010] Further, the thicknesses of both the nano-silver conductive lunar dust adsorption coating and the nano-silver conductive lunar dust protection coating are 5nm - 10nm.

[0011] Further, the distance between the upper electrode plate and the lower electrode plate is 0.5cm - 5.0cm.

[0012] Further, the vacuum degree inside the vacuum chamber where it is located is 10 -4 Pa.

[0013] In addition, the present application also provides a test method using a lunar dust removal test system based on the electrostatic effect, including the following steps: Step 1: Connect the upper electrode plate to the clamping end of the dust removal platform through a fixture; Step 2: Lay a layer of lunar dust with a known mass on the upper surface of the lower electrode plate, and then attach it to the upper surface of the weighing device; Step 3: Connect the upper electrode bottom plate and the lower electrode plate to the high-voltage power supply respectively to conduct; Step 4: Close the vacuum chamber door, raise the internal temperature of the vacuum chamber to 220°C and maintain it at 220°C until the mass of the lunar dust no longer changes; Step 5: Evacuate the inside of the vacuum chamber to make the vacuum degree reach 10-4Pa; Step 6: Record the mass of the lunar dust on the surface of the lower electrode plate through a mass balance; Step 7: Adjust the distance position between the upper electrode plate and the lower electrode plate, turn on the high-voltage power supply, supply power to the upper electrode plate and the lower electrode plate, and set it to the voltage required for testing; Step 8: Record the change of the mass of the lunar dust on the surface of the lower electrode over time at different moments; Step 9: When the result of the mass balance no longer changes, horizontally move the upper electrode plate away, turn off the high-voltage power supply, record the mass of the lunar dust at this moment, and calculate the dust removal efficiency; Step 10: Open the vacuum chamber, make the pressure inside the chamber atmospheric pressure, take out the sample, and continue the next group of tests.

[0014] A lunar dust removal test system and test method based on the electrostatic effect provided by the present invention have the following beneficial effects:

[0015] This application uses DC high voltage, with its current in the order of μA and low power consumption. The upper electrode plate is a flexible electrode, which can adapt to the protected surface with characteristics such as large area and irregularity, and has a wide adaptability range. The overall dust removal is a combination of active and passive integration. First, the contact force between the lunar dust particles and the contact surface is reduced, and then the electrostatic force is used to make the lunar dust particles leave the protected surface for dust removal testing, which can quickly and accurately test the efficiency of lunar dust removal, laying a foundation for the subsequent rapid dust removal of deposited lunar dust and ensuring the accuracy and lifespan of lunar exploration equipment. Brief Description of the Drawings

[0016] The drawings forming a part of this application are used to provide a further understanding of this application, making other features, objectives, and advantages of this application more obvious. The schematic embodiments and descriptions of the drawings of this application are used to explain this application and do not constitute an improper limitation to this application. In the drawings:

[0017] Figure 1 is a schematic diagram of a lunar dust removal test system based on the electrostatic effect provided by an embodiment of this application;

[0018] Figure 2 is a comparison diagram before and after dust removal of the lunar dust removal test system based on the electrostatic effect;

[0019] In the figure: 1 - dust removal platform, 11 - base slide rail, 12 - slide table bracket, 13 - slide table support rod, 14 - connecting rod, 21 - upper electrode high voltage power supply, 22 - lower electrode high voltage power supply, 31 - upper electrode plate, 32 - lower electrode plate, 4 - weighing device. Detailed Embodiments

[0020] In order to enable those skilled in the art to better understand the solution of this application, the technical solutions in the embodiments of this application will be clearly and completely described below in conjunction with the drawings in the embodiments of this application. Obviously, the described embodiments are only a part of the embodiments of this application, rather than all the embodiments. Based on the embodiments in this application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the scope of protection of this application.

[0021] It should be noted that the terms "first", "second", etc. in the description, claims and the above-mentioned drawings of this application are used to distinguish similar objects, and do not necessarily describe a specific order or sequence. It should be understood that the data used in this way can be interchanged under appropriate circumstances, so as to implement the embodiments of this application described herein. In addition, the terms "include", "have" and any of their variations are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device that includes a series of steps or units does not necessarily limit to those steps or units clearly listed, but may include other steps or units not clearly listed or inherent to these processes, methods, products or devices.

[0022] In this application, the orientation or positional relationship indicated by the terms "upper", "lower", "left", "right", "front", "rear", "top", "bottom", "inner", "outer", "middle", "vertical", "horizontal", "lateral", "longitudinal", etc. is based on the orientation or positional relationship shown in the drawings. These terms are mainly used to better describe this application and its embodiments, and are not used to limit that the indicated devices, elements or components must have a specific orientation, or be constructed and operated in a specific orientation.

[0023] Moreover, in addition to being used to represent an orientation or positional relationship, some of the above terms may also be used to represent other meanings. For example, the term "upper" may also be used to represent a certain attachment relationship or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in this application can be understood according to specific circumstances.

[0024] In addition, the meaning of the term "plurality" should be two or more.

[0025] It should be noted that, without conflict, the embodiments in this application and the features in the embodiments can be combined with each other. The following will refer to the drawings and combine the embodiments to detail this application.

[0026] Such as Figure 1As shown in the figure, the present application provides a lunar dust removal test system based on the electrostatic effect, which includes a dust removal platform 1, a high-voltage power supply, a dust removal electrode, and a weighing device 4 arranged in a vacuum chamber, where: the dust removal platform 1 is a guide rail sliding table structure; the dust removal electrode includes an upper electrode plate 31 and a lower electrode plate 32. The upper electrode plate 31 is arranged at the clamping end of the dust removal platform 1 through a fixture, and the lower electrode plate 32 is arranged at the upper end of the weighing device 4. The upper electrode plate 31 is directly above the lower electrode plate 32 and is arranged parallel to the lower electrode plate 32; the high-voltage power supply includes an upper electrode high-voltage power supply 21 and a lower electrode high-voltage power supply 22. The upper electrode high-voltage power supply 21 is connected to the upper electrode plate 31 to provide a positive voltage for it; the lower electrode high-voltage power supply 22 is connected to the lower electrode plate 32 to provide a negative voltage for it; the weighing device 4 is a mass balance, and its bottom surface is arranged parallel to the bottom surface of the dust removal platform 1.

[0027] Specifically, during the long-term stay on the lunar surface, a large amount of lunar dust will be deposited on the lunar exploration equipment. In order to avoid the reduction of equipment accuracy, shortening of service life or even failure caused by excessive deposition of lunar dust, it is necessary to remove the lunar dust in time. The lunar dust removal test system based on the electrostatic effect provided by the embodiment of the present application enables the lunar dust on the dust removal surface to leave the surface under the action of the electrostatic force through the electrostatic effect, and after being adsorbed by the dust removal electrode, the purpose of efficient removal is achieved. Among them, the dust removal platform 1 plays a role of fixing and supporting on the one hand, and is used to control the position of the dust removal electrode on the other hand. It is integrally composed of a guide rail sliding table structure. According to the actual position where dust needs to be removed, it can control the dust removal electrode to move in multiple directions to achieve accurate positioning of the dust removal position. The dust removal electrode includes an upper electrode plate 31 and a lower electrode plate 32. The two electrode plates are arranged parallel to each other up and down. The upper electrode plate 31 is arranged above and is a movable electrode plate, which is connected to the clamping end of the dust removal platform 1 through a fixture. Driven by the dust removal platform 1, it can move in multiple directions; the lower electrode plate 32 is arranged below and is a fixed electrode plate, which is connected to the fixed end of the weighing device 4 through a fixture or directly attached to the upper surface of the weighing device 4. The lower electrode plate 32 is fixed on the weighing device 4 and is mainly used to place the lunar dust to be removed for testing. The high-voltage power supply is mainly used to supply power to the upper electrode plate 31 and the lower electrode plate 32. The upper electrode high-voltage power supply 21 is connected to the upper electrode plate 31 through a wire to provide a positive voltage for it, and the lower electrode high-voltage power supply 22 is connected to the lower electrode plate 32 through a wire to provide a negative voltage for it. The voltages of the upper and lower electrode plates 32 are the same, but the polarities are opposite. In this way, the lunar dust arranged between the upper electrode plate 31 and the lower electrode plate 32 will leave the surface of the lower electrode plate 32 under the drive of the electric field force and thus be removed. The weighing device 4 is integrally arranged below the lower electrode plate 32, and its bottom surface is parallel to the bottom surface of the dust removal platform 1. Preferably, it is a mass balance with a measurement accuracy of 0.0001 mg, and is mainly used to measure the mass of the lunar dust before and after dust removal, so as to obtain the dust removal efficiency.

[0028] Further, the dust removal platform 1 includes a base slide rail 11, a slide table bracket 12, a slide table support rod 13, and a connecting rod 14, where: The slide table bracket 12 is arranged between the two base slide rails 11 and can slide back and forth along the X-axis on the base slide rail 11; A guide rail is arranged on one side of the slide table bracket 12; The slide table support rod 13 is arranged on the guide rail of the slide table bracket 12 and can slide up and down along the Z-axis on the guide rail; The connecting rod 14 is fixed in the middle of the slide table support rod 13, and the lower part is fixedly connected to the upper electrode plate 31 through a clamp; Through the dust removal platform 1, the upper electrode plate 31 can achieve multi-directional movement.

[0029] Specifically, in the embodiment of the present application, the dust removal platform 1 is preferably a guide rail slide table structure, that is, it includes a base slide rail 11, a slide table bracket 12, a slide table support rod 13, and a connecting rod 14. Among them, two base slide rails 11 are arranged and symmetrically arranged on the left and right. The slide table bracket 12 is connected to the two base slide rails 11 on the left and right through the slide rails and can slide back and forth along the X-axis on the base slide rail 11; A guide rail is arranged on one side of the slide table bracket 12; The slide table support rod 13 is arranged on the guide rail of the slide table bracket 12 and can slide up and down along the Z-axis on the guide rail; In this way, through the dust removal platform 1 with the guide rail slide table structure, the upper electrode plate 31 fixed below the connecting rod 14 can move in multiple directions along the front, back, up, and down according to the actual dust removal position, so as to achieve a comprehensive and flexible removal of the deposited dust on the surface; Of course, according to the position of the actual dust removal test, the dust removal platform 1 can also choose a three-axis guide rail slide table structure, so that the upper electrode plate 31 can move comprehensively in three directions and six degrees of freedom along the X-axis direction, Y-axis direction, and Z-axis direction, ensuring the flexibility of the dust removal test. In order to ensure the accuracy of the moving position, the position accuracy of the upper electrode plate 31 moving in each direction is 0.1 mm.

[0030] Further, the upper electrode plate 31 is a flexible copper thin film electrode, and a nano-silver conductive dust adsorption coating is provided on the lower surface; The lower electrode plate 32 is a protective electrode with conductive properties, and a nano-silver conductive dust protection coating is provided on the upper surface. The upper electrode plate 31 is mainly used to realize the function of conductive adsorption of dust, and adsorbs dust particles through the action of electrostatic force; The lower electrode plate 32 is mainly used to realize the function of conductive dust removal. It can not only reduce the van der Waals force between the dust particles and the contact surface, but also charge the dust particles, so that they leave the lower electrode plate 32 under the action of the electric field force.

[0031] Further, the area of the upper electrode plate 31 ≥ the area of the lower electrode plate 32, so that the electric field can cover the surface area of the dust to be removed, achieving a better dust removal effect.

[0032] Furthermore, the thicknesses of both the nano - silver conductive lunar dust adsorption coating and the nano - silver conductive lunar dust protection coating are 5nm - 10nm. The upper electrode plate 31 is coated with a nano - silver conductive lunar dust adsorption coating with a thickness of 5nm - 10nm, mainly to enhance the conductivity of the upper electrode plate 31; the lower electrode plate 32 is coated with a nano - silver conductive lunar dust protection coating with a thickness of 5nm - 10nm, mainly to balance conductivity and low - surface - energy characteristics. Conductivity is mainly achieved through nano - silver particles, and the low - surface - energy is mainly provided by the trimethylsiloxane protection coating.

[0033] Furthermore, the distance between the upper electrode plate 31 and the lower electrode plate 32 is 0.5cm - 5.0cm. To ensure the dust removal effect, the distance between the upper electrode plate 31 and the lower electrode plate 32 is preferably 0.5cm - 5.0cm, which can be adjusted by the Z - axis guide rail slide; and the dust removal voltage range of the overall electrode plate is 500V - 10000V, which can be adjusted by the high - voltage power supply.

[0034] Specifically, the lunar dust removal test system based on the electrostatic effect provided by the embodiments of the present application combines active dust removal and passive dust removal. The active part is to supply power to the upper electrode plate 31 and the lower electrode plate 32 through the high - voltage power supply, so that the lunar dust particles deposited between them are charged and then driven by the electric field force to leave the protected surface; while the passive part refers to that the lower electrode plate 32 has the functions of conductivity and dust - repellency without energy, which can reduce the van der Waals force between the lunar dust and the contact electrode; that is, the whole system first reduces the contact force between the lunar dust particles and the contact surface, and then uses the electrostatic force to make the lunar dust particles leave the protected surface to achieve the dust removal effect.

[0035] Furthermore, the vacuum degree inside the vacuum chamber is 10 -4 Pa. The whole system is arranged inside the vacuum chamber. Before dust removal, it is necessary to evacuate the inside of the vacuum chamber; during dust removal, the vacuum degree inside the vacuum chamber is maintained at 10 -4 Pa.

[0036] In addition, the present application also provides a test method using a lunar dust removal test system based on the electrostatic effect, including the following steps: Step 1: Connect the upper electrode plate 31 to the clamping end of the dust removal platform 1 through a fixture; Step 2: Lay a layer of lunar dust with a known mass on the upper surface of the lower electrode plate 32, and then attach it to the upper surface of the weighing device 4; Step 3: Connect the upper electrode bottom plate and the lower electrode plate 32 to the high-voltage power supply respectively and conduct electricity; Step 4: Close the vacuum chamber door, raise the internal temperature of the vacuum chamber to 220°C and maintain it at 220°C until the mass of the lunar dust no longer changes; Step 5: Evacuate the inside of the vacuum chamber to make the vacuum degree reach 10-4 Pa; Step 6: Record the mass of the lunar dust on the surface of the lower electrode plate 32 through the mass balance; Step 7: Adjust the distance between the upper electrode plate 31 and the lower electrode plate 32, turn on the high-voltage power supply, supply power to the upper electrode plate 31 and the lower electrode plate 32, and set it to the voltage required for testing; Step 8: Record the change of the mass of the lunar dust on the surface of the lower electrode over time at different moments; Step 9: When the result of the mass balance no longer changes, horizontally move the upper electrode plate 31 away, turn off the high-voltage power supply, record the mass of the lunar dust at this moment, and calculate the dust removal efficiency; Step 10: Open the vacuum chamber, make the pressure in the chamber atmospheric pressure, take out the sample, and continue the next group of tests.

[0037] Specifically, using the above test method, the lunar dust removal test system based on the electrostatic effect of the present application is described in more detail through the tests of the dust removal effect and efficiency, where:

[0038] Examples 1-5

[0039] The simulated lunar dust is obtained by sieving method to obtain 5 groups of lunar dust with particle size ranges of 50-63μm, 75-100μm, 115-350μm, 350-500μm and >500μm respectively. Sprinkle the weighed lunar dust with the same mass but different particle size ranges on the lower electrode plate 32, and record them as Examples 1-5 in turn. Brush them with a brush to make them as uniform as possible. After applying a voltage of 1500V to the electrode plate, the distribution of the lunar dust on the lower electrode plate 32 is as Figure 2 shown. Through comparison, it can be seen that the dust removal effect is relatively obvious.

[0040] Examples 6-9

[0041] The simulated lunar dust is obtained by sieving method to obtain the experimental test particle size range of 50-63μm. Sprinkle the weighed lunar dust with the same mass and the same particle size range on the lower electrode plate 32, and record them as Examples 6-9 in turn. And set the voltages of the electrode plates in Examples 6-9 to 500V, 1000V, 1500V and 2000V respectively. In this way, the dust removal efficiency under different voltages can be tested. Specifically as shown in Table 1, it can be seen from Table 1 that the higher the voltage, the higher the dust removal efficiency.

[0042] Table 1 Dust removal efficiency of simulated lunar dust with a particle size of 50 - 63μm at different voltages

[0043] Example Voltage (V) Dust removal efficiency 6 500 0.37％ 7 1000 6.97％ 8 1500 13.01％ 9 2000 28.56％

[0044] Examples 10 - 13

[0045] The simulated lunar dust was obtained by sieving to get an experimental test particle size range of 75 - 100μm. The lunar dust with the same mass and the same particle size range was weighed and sprinkled on the lower electrode plate 32, and were sequentially recorded as Examples 10 - 13. The voltages of the electrode plates in Examples 10 - 13 were set to 500V, 1000V, 1500V, and 2000V respectively. In this way, the dust removal efficiency at different voltages can be tested. Specifically, as shown in Table 2, it can be seen from Table 2 that when the voltage is 1000V, the dust removal efficiency increases rapidly from 3.83% to 77.69%. When the voltage is 2000V, the dust removal efficiency is 91.10%, achieving high - efficiency dust removal. Comparing Table 1 and Table 2, it can be known that when the voltage is the same, the dust removal efficiency of lunar dust particles with a particle size of 75 - 100μm is higher than that of lunar dust particles with a particle size of 50 - 63μm, indicating that larger - sized lunar dust particles are easier to remove.

[0046] Table 2 Dust removal efficiency of simulated lunar dust with a particle size of 75 - 100μm at different voltages

[0047] Example Voltage (V) Dust removal efficiency 10 500 3.83％ 11 1000 77.69％ 12 1500 89.44％ 13 2000 91.10％

[0048] Examples 14 - 17

[0049] The simulated lunar dust was obtained by sieving to get an experimental test particle size range of 115 - 350μm. The lunar dust with the same mass and the same particle size range was weighed and sprinkled on the lower electrode plate 32, and were sequentially recorded as Examples 14 - 17. The voltages of the electrode plates in Examples 14 - 17 were set to 500V, 1000V, 1500V, and 2000V respectively. The dust removal efficiency at different voltages can be tested. Specifically, as shown in Table 3, it can be seen from Table 3 that the higher the voltage, the higher the dust removal efficiency. When the voltage is greater than 1000V, the increase in dust removal efficiency is not obvious. It indicates that for lunar dust particles with a particle size range of 115 - 350μm, the voltage of 1000V or 1500V can be selected according to the actual situation for removal. For high - precision surface cleaning, the voltage can be appropriately increased to achieve a better cleaning effect.

[0050] Table 3 Dust removal efficiency of simulated lunar dust with a particle size of 115 - 350μm at different voltages

[0051]

[0052]

[0053] Examples 18 - 21

[0054] The simulated lunar dust was sieved to obtain the test particle size with a particle size range of 350 - 500 μm. The lunar dust with the same mass and the same particle size range was weighed and sprinkled on the lower electrode plate 32, and were sequentially recorded as Examples 18 - 21. The voltages of the electrode plates in Examples 18 - 21 were respectively set to 500V, 1000V, 1500V, and 2000V, and the dust removal efficiencies under different voltages could be obtained. As shown in Table 4 specifically, by comparing Table 3 and Table 4, it can be seen that for the lunar dust particles with a particle size of 350 - 500 μm, the dust removal efficiencies at voltages of 500V and 1000V are lower than those of the lunar dust with a particle size of 115 - 350 μm, but when the voltage is 1500V and 2000V, the dust removal efficiency is high, and the maximum dust removal efficiency can reach 94.65%.

[0055] Table 4 Dust removal efficiency of simulated lunar dust with a particle size of 350 - 500 μm under different voltages

[0056] Example Voltage (V) Dust removal efficiency 18 500 1.42％ 19 1000 76.93％ 20 1500 91.71％ 21 2000 94.65％

[0057] Therefore, the lunar dust dust removal test system based on the electrostatic effect provided by the embodiments of the present application combines active dust removal and passive dust removal. First, the contact force between the lunar dust particles and the contact surface is reduced, and then the lunar dust particles are made to leave the protected surface by electrostatic force for dust removal testing, which can quickly and accurately test the dust removal efficiency of lunar dust, laying a foundation for the subsequent rapid dust removal of deposited lunar dust and ensuring the accuracy and service life of lunar exploration equipment.

[0058] The above are only the preferred embodiments of the present application and are not used to limit the present application. For those skilled in the art, various changes and modifications can be made to the present application. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included within the protection scope of the present application.

Claims

1. A lunar dust removal test system based on electrostatic effect, characterized in that, It includes a dust removal platform, a high-voltage power supply, dust removal electrodes and a weighing device arranged in a vacuum chamber, where: The dust removal platform is of a guide rail sliding table structure; The dust removal electrodes include an upper electrode plate and a lower electrode plate. The upper electrode plate is arranged at the clamping end of the dust removal platform through a fixture. The lower electrode plate is arranged at the upper end of the weighing device. The upper electrode plate is directly above the lower electrode plate and is arranged parallel to the lower electrode plate; The high-voltage power supply includes an upper electrode high-voltage power supply and a lower electrode high-voltage power supply. The upper electrode high-voltage power supply is connected to the upper electrode plate to provide a positive voltage for it; the lower electrode high-voltage power supply is connected to the lower electrode plate to provide a negative voltage for it; The weighing device is a mass balance, and its bottom surface is arranged parallel to the bottom surface of the dust removal platform; The dust removal platform includes a base slide rail, a slide table bracket, slide table support rods and a connecting rod, where: The slide table bracket is arranged between the two base slide rails and can slide back and forth along the X-axis on the base slide rail; One side of the slide table bracket is provided with a guide rail; The slide table support rods are arranged on the guide rail of the slide table bracket and can slide up and down along the Z-axis on the guide rail; The connecting rod is fixed in the middle of the slide table support rods and is fixedly connected to the upper electrode plate through a fixture at the lower part; Through the dust removal platform, the upper electrode plate can achieve multi-directional movement; The upper electrode plate is a flexible copper thin film electrode, and a nano-silver conductive lunar dust adsorption coating is arranged on the lower surface; the lower electrode plate is a protective electrode with conductive properties, and a nano-silver conductive lunar dust protection coating is arranged on the upper surface; The distance between the upper electrode plate and the lower electrode plate is 0.5 cm - 5.0 cm; The vacuum degree inside the vacuum chamber is 10 -4 Pa; The position accuracy of the upper electrode plate moving in each direction is 0.1 mm; Combining active dust removal and passive dust removal, first the contact force between lunar dust particles and the contact surface is reduced as a whole, and then the lunar dust particles are made to leave the protected surface by electrostatic force to achieve the dust removal effect.

2. The dust removal test system for lunar dust based on the electrostatic effect according to claim 1, characterized in that, The area of the upper electrode plate ≥ the area of the lower electrode plate.

3. The lunar dust removal test system based on the electrostatic effect according to claim 2, characterized in that, The thicknesses of both the nano-silver conductive lunar dust adsorption coating and the nano-silver conductive lunar dust protection coating are 5 nm - 10 nm.

4. A testing method using the lunar dust removal testing system based on electrostatic effect according to any one of claims 1-3, characterized in that, It includes the following steps: Step 1: Connect the upper electrode plate to the clamping end of the dust removal platform through a fixture; Step 2: Lay a layer of lunar dust with a known mass on the upper surface of the lower electrode plate, and then apply it to the upper surface of the weighing device; Step 3: Connect the upper electrode bottom plate and the lower electrode plate to the high-voltage power supply respectively to conduct electricity; Step 4: Close the vacuum chamber door, raise the internal temperature of the vacuum chamber to 220 °C and maintain it at 220 °C until the mass of the lunar dust no longer changes; Step 5: Evacuate the interior of the vacuum chamber to a vacuum degree of 10 -4 Pa; Step 6: Record the mass of the lunar dust on the surface of the lower electrode plate through the mass balance; Step 7: Adjust the distance position between the upper electrode plate and the lower electrode plate, turn on the high-voltage power supply, supply power to the upper electrode plate and the lower electrode plate, and set it to the voltage required for testing; Step 8: Record the change of the mass of the lunar dust on the surface of the lower electrode with time at different moments; Step 9: When the result of the mass balance no longer changes, horizontally move the upper electrode plate away, turn off the high-voltage power supply, record the mass of the lunar dust at this moment, and calculate the dust removal efficiency; Step 10: Open the vacuum chamber. After the pressure inside the chamber reaches atmospheric pressure, take out the sample and continue with the next set of tests.

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