An integrated film layer for surface enhancement and lubrication of space aluminum structural parts

Abstract

This invention discloses an integrated film for surface strengthening and lubrication of aluminum structural components in space applications. The film comprises a three-layer structure: a base bonding layer, a transition strengthening support layer, and a surface lubricating layer. Through a gradient transition structure at the membrane-substrate interface and ternary nitride reinforcement, the film securely bonds to the substrate and exhibits high hardness. Through the regulation of the surface lubricating components, the film combines both surface strengthening and lubrication functions.

Description

[0001] This application claims priority to patent application number 202311258566X filed on September 26, 2023. Technical Field

[0002] The present invention relates to the technical field of material surface coatings, and in particular to an integrated film layer for surface strengthening and lubrication of space aluminum structural parts. Background Art

[0003] With the completion of China's space station and the deepening exploration of space resources, the demand for lightweight space structures and components is becoming increasingly urgent. Aluminum alloys are widely used due to their light weight, high specific strength, and corrosion resistance, making them an ideal solution for spacecraft weight reduction.

[0004] However, aluminum alloys have problems such as soft texture, high friction coefficient, large wear, easy to be scratched and difficult to lubricate. The surface of aluminum parts is severely worn during relative movement. When used as spatial structures and mechanical components, the surface needs to be protected by an enhanced integrated lubrication film layer.

[0005] The coating used on the surface of existing aluminum structural parts is a sulfuric acid anodized layer, which has the problems of poor lubrication properties and poor wear resistance. Summary of the Invention

[0006] In response to the problems of soft texture, high friction coefficient, large wear, easy scratching and difficulty in lubrication of space aluminum structural parts, the present invention provides an integrated film layer for surface enhanced lubrication of space aluminum structural parts. Specifically, it provides an integrated film layer for surface enhanced lubrication of space aluminum structural parts and its preparation method, so as to improve the mechanical properties and tribological properties of aluminum structural parts.

[0007] The purpose of the invention is achieved through the following solutions:

[0008] The present invention provides an integrated film layer for surface lubrication enhancement of aluminum structural components in space applications. The integrated film layer comprises a primer bonding layer, a transition strengthening support layer, and a surface lubricating layer, which are sequentially deposited on the surface of the aluminum structural component. The film layers are deposited in the following order: first, the primer bonding layer; second, the transition strengthening support layer; and finally, the surface lubricating layer.

[0009] The primer bonding layer is an AlCr alloy layer, wherein the atomic ratio of Al to Cr is in the range of 1:4 to 4:1, and the thickness of the primer bonding layer is in the range of 50 nm to 1000 nm, preferably in the range of 100 nm to 500 nm.

[0010] The main element of the substrate is Al. By introducing an AlCr alloy transition layer and adding a certain amount of Cr element, the compatibility between the film layer and the substrate is improved, the bonding between the film layer and the substrate is enhanced, and the film layer is firmly attached to the surface of the substrate. If the Cr transition layer is added directly, the bonding between the film layer and the aluminum substrate will deteriorate. Adding a Cr transition layer has a good effect on improving the bonding strength of steel substrates (the substrate is steel, Cr has a good match with steel, and the base bonding effect is excellent, which can effectively improve the bonding strength of the film base). However, there are large differences in the thermal expansion coefficient and hardness of Cr and Al. Using Cr as a transition layer for the aluminum substrate is not effective in improving the bonding strength. If excessive Cr is introduced into the transition layer, the compatibility between the film layer and the substrate will be reduced, and the bonding strength of the film base will also deteriorate.

[0011] The transition strengthening support layer is an AlCrN nitride layer. The nitrogen atomic content in the AlCrN nitride layer gradually increases from the inside to the outside, and the atomic ratio of (Al+Cr):N ranges from 1:0 to 1:0.5-1. That is, it gradually increases from the side close to the base bonding layer (1:0) to the side of the surface lubricating layer (1:0.5-1), wherein the atomic ratio of Al:Cr ranges from 1:4 to 4:1; its physical structure includes Al8Cr5, AlN, CrN, and Cr2N. The thickness of the transition strengthening support layer is 50nm-2000nm, preferably 200nm-1000nm. The transition strengthening support layer transitions the film structure from the base layer to the surface lubricating layer. By introducing the nitrogen element into the AlCr alloy layer, an AlCrN layer containing ceramic phases such as AlN, CrN, and Cr2N is formed. The ceramic phase has a higher hardness than the alloy phase and good wear resistance.

[0012] The surface lubricating layer is an AlCrAgN nitride layer, specifically an AlCrN nitride layer containing the Ag element (phases are AlN, CrN, Cr2N, and Ag). The Ag content in the surface lubricating layer is between 0.5 at.% and 60 at.%, preferably between 10 at.% and 50 at.%. The surface lubricating layer has a thickness of 100 nm to 5 μm, preferably between 500 nm and 1.5 μm. The surface lubricating layer introduces Ag into the AlCrN layer, matching the ceramic phase with the lubricating phase Ag, thereby providing lubrication and wear resistance.

[0013] The aluminum structural parts include parts made of pure aluminum and aluminum alloy materials.

[0014] The present invention also provides a method for preparing the integrated film layer for surface enhanced lubrication of space aluminum structural parts, comprising the following steps:

[0015] S1. Preparation of primer bonding layer: a metal AlCr primer bonding layer is deposited on the surface of the space aluminum structural component in Ar gas;

[0016] S2. Preparation of transition strengthening support layer: depositing a layer of AlCrN transition strengthening support layer on the primer bonding layer in an Ar and N2 mixed gas atmosphere;

[0017] S3. Preparation of surface lubricating layer: maintaining the flow rate of the Ar and N2 mixed gas at the end of step S2, depositing a layer of AlCrAgN surface lubricating layer on the transition strengthening support layer to obtain the integrated film layer.

[0018] In step S1, the spatial aluminum structural parts are subjected to acetone ultrasonic cleaning and plasma cleaning in sequence before the bottom bonding layer is deposited. The acetone ultrasonic cleaning is specifically: ultrasonic cleaning in acetone and drying; the plasma cleaning is specifically: in argon (maintaining the gas pressure at 0.2 -1 Pa), and Ar plasma etching and cleaning of space aluminum structural parts.

[0019] The pressure of the Ar gas in step S1 and the Ar and N2 mixed gas in S2 and S3 are all 0.4 Pa-8 Pa. During the preparation process, the gas pressure can be within a certain range during the deposition process of the first two steps. It is preferred to maintain the gas pressure unchanged in step S3 to prevent the consistency of the film structure from changing.

[0020] In step S1, the AlCr target used for deposition has an Al:Cr atomic ratio of 1:2 to 2:1, a target current of 60 to 150A, a bias voltage of -10 to -150V, and a deposition time of 2 to 10 minutes. The preparation of the base bonding layer involves turning on the AlCr target, setting the target current and bias voltage, and depositing a metallic AlCr base layer on the surface of the aluminum structure.

[0021] In step S2, the AlCr target used for deposition maintains the same Al:Cr atomic ratio as in step S1, with a target current of 60 to 150 A, a bias voltage of -10 to -150 V, and a deposition time of 10 to 60 minutes. The transitional strengthening support layer is prepared by turning on the AlCr target, setting the target current and bias voltage, and depositing the AlCrN transitional strengthening support layer on the underlying bonding layer.

[0022] In step S2, the Ar:N2 volume flow ratio in the Ar / N2 gas mixture is uniformly increased from an initial 1:0 to a ratio of 1:1.5 to 2.5, preferably 1:2, over the deposition time. The nitrogen content in the transitional reinforcement support layer is gradually increased from the beginning of deposition. The resulting film structure has no distinct interfaces, good film continuity, and excellent film-substrate bonding. This gradual increase in the ratio avoids sudden changes in the film structure, which could lead to stress points that cause poor film-substrate bonding and cause film peeling and tearing during friction and wear.

[0023] In step S3, the AlCrAg target used for deposition has an Al:Cr atomic ratio consistent with that in step S1, with an Ag atomic content between 0.5 at.% and 60 at.%, preferably between 10 at.% and 50 at.%. The target current is 60 to 150 A, the bias voltage is -10 to -150 V, and the deposition time is 15 to 120 minutes. The surface lubricating layer in the AlCr target is prepared by turning off the AlCr target, turning on the AlCrAg target, setting the target current and bias voltage, and depositing the AlCrAgN surface lubricating layer on the transition strengthening support layer.

[0024] The preparation methods of the primer bonding layer, transition strengthening support layer and surface lubricating layer are all multi-arc ion plating deposition.

[0025] The coating obtained by the present invention is suitable for grinding pairs made of 9Cr18 steel, under a load of 1N and a vacuum degree of 2*10 -3 Pa, at a speed of 1000 rpm, the friction coefficient of the coating is stable below 0.3. The hardness of the integrated film layer is between HV450 and HV2700.

[0026] The present invention also provides an application of the integrated film layer for surface lubrication enhancement of space aluminum structural parts in the manufacture of spacecraft. The film layer is suitable for wear-resistant enhancement and cold welding prevention of the surface of lightweight aluminum space transmission structures and mechanical parts.

[0027] The base material used in the knife mold field is a composite layer commonly used in hard steel materials such as high-speed steel and mold steel. The main working principle is to utilize the amorphous carbon in the surface lubricating layer to achieve a friction-reducing and lubricating effect. The amorphous carbon has an excellent friction-reducing effect in the atmospheric environment, but in a vacuum environment, the amorphous carbon quickly loses hydrogen, and the unsaturated dangling bonds are exposed, which increases the shear force and fails to achieve an effective lubricating effect, and cannot exert the vacuum wear-resistant lubricating effect. Compared with amorphous carbon, Ag has an excellent vacuum lubricating effect. The present invention improves the wear resistance of the film layer by compounding the lubricating phase Ag with the hard phase AlCrN, and introduces the lubricating phase Ag to improve the lubrication properties of the film layer, while giving the film layer a cold welding-proof effect.

[0028] Compared with the prior art, the present invention has the following beneficial effects:

[0029] This invention addresses the issues of aluminum alloys being soft, exhibiting high friction coefficients, high wear, prone to scratching, and difficult to lubricate. Through film layer structure design and component manipulation, this invention utilizes an alloy solid solution phase for interface reinforcement to enhance film-base bonding. A nitride hard phase improves the film's wear resistance and load-bearing properties. In the surface layer, this layer, in conjunction with the lubricating element Ag, creates an integrated, reinforced lubrication film on the surface of aluminum structural components, enhancing their mechanical and tribological properties. This invention is primarily used in aluminum structures and mechanical components in aerospace applications. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Other features, objects and advantages of the present invention will become more apparent upon reading the detailed description of non-limiting embodiments with reference to the following drawings:

[0031] Figure 1 Schematic diagram of the membrane structure of the present invention. DETAILED DESCRIPTION

[0032] The present invention is described in detail below with reference to the accompanying drawings and specific embodiments. The following examples are implemented under the premise of the technical solution of the present invention, provide detailed implementation methods and specific operating procedures, and will help those skilled in the art to further understand the present invention. It should be pointed out that the scope of protection of the present invention is not limited to the following embodiments, and a number of adjustments and improvements made under the premise of the concept of the present invention all fall within the scope of protection of the present invention.

[0033] Example 1

[0034] In this embodiment, an integrated film layer for enhancing lubrication of the surface of space aluminum structural parts is provided, such as Figure 1 As shown, the film comprises a primer bonding layer (AlCr), a transition strengthening support layer (AlCrN), and a surface lubricating layer (AlCrAgN) deposited sequentially on the surface of the aluminum structural part. The preparation steps of the film layer are as follows:

[0035] (1) Acetone ultrasonic cleaning of substrate: The 2A14 substrate was ultrasonically cleaned with acetone for 15 min and dried, and then clamped in the tooling and placed in the deposition equipment.

[0036] (2) Plasma cleaning substrate: vacuum to 3.0×10 -3 Pa, fill the cavity with high-purity argon gas (maintain the pressure at 0.2 -1 Pa), and the substrate was cleaned by Ar plasma etching with a bias voltage of -100 V for 20 min.

[0037] (3) Preparation of the base bonding layer: Ar was introduced into the chamber, the gas pressure was maintained at 1 Pa, the AlCr target (Al:Cr=1:1) was turned on, the target current was set to 80 A, and a metal AlCr base layer was deposited on the surface of the substrate. The bias voltage was -20 V, the deposition time was 5 min, and the layer thickness was 295 nm.

[0038] (4) Preparation of transition strengthening support layer: Ar and N2 mixed gas was introduced into the chamber, and the Ar:N2 flow ratio was increased from 1:0 to 1:2 within 10 minutes. The gas pressure was maintained at 1Pa, and the current of the AlCr target (Al:Cr = 1:1) was maintained at 80A. The AlCrN transition strengthening support layer was deposited on the substrate surface with a bias voltage of -20V, a deposition time of 30 minutes, and a layer thickness of 401nm.

[0039] (5) Preparation of surface lubricating layer: Maintaining Ar:N2 flow ratio of 1:2, gas pressure of 1Pa, turning off the AlCr target, turning on the AlCrAg target (Al:Cr in the target material = 1:1, Ag atomic content 10at.%), setting and maintaining the target current of 80A, and depositing the AlCrAgN surface lubricating layer on the substrate surface. The bias voltage was -20V, the deposition time was 40min, and the layer thickness was 607nm.

[0040] (6) Film performance evaluation

[0041] The vacuum friction performance of the prepared film was tested using a ball-disc friction and wear tester. The test conditions were: ball-disc-rotation mode, G10 grade 9Cr18 steel ball (HRC ≥ 58) with a diameter of 8 mm, normal load 1 N, turntable speed 1000 r / min, vacuum degree 2*10 -3 Pa. The hardness of the film was measured using a nanoindenter.

[0042] The hardness of the prepared film was measured to be HV 1557 and the friction coefficient in the stable section was 0.25.

[0043] Example 2

[0044] In this embodiment, the steps for preparing the film layer are as follows:

[0045] (1) Acetone ultrasonic cleaning of substrate: The 2A14 substrate was ultrasonically cleaned with acetone for 15 minutes and dried, and then clamped in the tooling and placed in the deposition equipment.

[0046] (2) Plasma cleaning substrate: vacuum to 3.0×10 -3 Pa, fill the cavity with high-purity argon gas (maintain the pressure at 0.2 -1 Pa), and the substrate was cleaned by Ar plasma etching with a bias voltage of -100 V for 20 min.

[0047] (3) Preparation of the base bonding layer: Ar was introduced into the chamber, the gas pressure was maintained at 1 Pa, the AlCr target (Al:Cr = 1:1) was turned on, the target current was set to 100 A, and a metal AlCr base layer was deposited on the surface of the substrate. The bias voltage was -20 V, the deposition time was 5 min, and the layer thickness was 350 nm.

[0048] (4) Preparation of transition strengthening support layer: Ar and N2 mixed gas was introduced into the chamber, and the Ar:N2 flow ratio was increased from 1:0 to 1:2 within 10 minutes. The gas pressure was maintained at 1Pa, and the current of the AlCr target (Al:Cr = 1:1) was maintained at 100A. The AlCrN transition strengthening support layer was deposited on the surface of the substrate with a bias voltage of -20V, a deposition time of 20 minutes, and a layer thickness of 449nm.

[0049] (5) Preparation of surface lubricating layer: Maintaining Ar:N2 flow ratio of 1:2, gas pressure of 1Pa, turning off the AlCr target, turning on the AlCrAg target (Al:Cr in the target material = 1:1, Ag atomic content 10at.%), setting and maintaining the target current of 100A, and depositing the AlCrAgN surface lubricating layer on the substrate surface. The bias voltage was -20V, the deposition time was 20min, and the layer thickness was 593nm.

[0050] (6) Film performance evaluation

[0051] The vacuum friction performance of the prepared film was tested using a ball-disc friction and wear tester. The test conditions were: ball-disc-rotation mode, G10 grade 9Cr18 steel ball (HRC ≥ 58) with a diameter of 8 mm, normal load 1 N, turntable speed 1000 r / min, vacuum degree 2*10 -3 Pa. The hardness of the film was measured using a nanoindenter.

[0052] The hardness of the prepared film was measured to be HV 1491 and the friction coefficient in the stable section was 0.27.

[0053] Example 3

[0054] In this embodiment, the steps for preparing the film layer are as follows:

[0055] (1) Acetone ultrasonic cleaning of substrate: The 2A14 substrate was ultrasonically cleaned with acetone for 15 minutes and dried, and then clamped in the tooling and placed in the deposition equipment.

[0056] (2) Plasma cleaning substrate: vacuum to 3.0×10 -3 Pa, fill the cavity with high-purity argon gas (maintain the pressure at 0.2 -1 Pa), and the substrate was cleaned by Ar plasma etching with a bias voltage of -100 V for 20 min.

[0057] (3) Preparation of the base bonding layer: Ar was introduced into the chamber, the gas pressure was maintained at 4 Pa, the AlCr target (Al:Cr=1:2) was turned on, the target current was set to 80 A, and a metal AlCr base layer was deposited on the surface of the substrate. The bias voltage was -20 V, the deposition time was 5 min, and the layer thickness was 310 nm.

[0058] (4) Preparation of transition strengthening support layer: Ar and N2 mixed gas was introduced into the chamber, and the Ar:N2 flow ratio was increased from 1:0 to 1:2 within 10 minutes. The gas pressure was maintained at 4 Pa, and the current of the AlCr target (Al:Cr=1:2) was maintained at 80 A. The AlCrN transition strengthening support layer was deposited on the substrate surface with a bias voltage of -20 V, a deposition time of 40 minutes, and a layer thickness of 533 nm.

[0059] (5) Preparation of surface lubricating layer: Maintaining Ar:N2 flow ratio of 1:2, gas pressure of 4Pa, turning off the AlCr target, turning on the AlCrAg target (Al:Cr in the target material = 1:2, Ag atomic content 10at.%), setting and maintaining the target current of 80A, and depositing the AlCrAgN surface lubricating layer on the substrate surface. The bias voltage is -20V, the deposition time is 40min, and the layer thickness is 645nm.

[0060] (6) Film performance evaluation

[0061] The vacuum friction performance of the prepared film was tested using a ball-disc friction and wear tester. The test conditions were: ball-disc-rotation mode, G10 grade 9Cr18 steel ball (HRC ≥ 58) with a diameter of 8 mm, normal load 1 N, turntable speed 1000 r / min, vacuum degree 2*10 -3 Pa. The hardness of the film was measured using a nanoindenter.

[0062] The hardness of the prepared film was measured to be HV 1306, and the friction coefficient in the stable section was 0.28.

[0063] Example 4

[0064] In this embodiment, the steps for preparing the film layer are as follows:

[0065] (1) Acetone ultrasonic cleaning of substrate: The 2A14 substrate was ultrasonically cleaned with acetone for 15 minutes and dried, and then clamped in the tooling and placed in the deposition equipment.

[0066] (2) Plasma cleaning substrate: vacuum to 3.0×10 -3 Pa, fill the cavity with high-purity argon gas (maintain the pressure at 0.2 -1 Pa), and the substrate was cleaned by Ar plasma etching with a bias voltage of -100 V for 20 min.

[0067] (3) Preparation of the base bonding layer: Ar was introduced into the chamber, the gas pressure was maintained at 8 Pa, the AlCr target (Al:Cr=2:1) ​​was turned on, the target current was set to 100 A, and a metal AlCr base layer was deposited on the surface of the substrate. The bias voltage was -40 V, the deposition time was 5 min, and the layer thickness was 366 nm.

[0068] (4) Preparation of transition strengthening support layer: Ar and N2 mixed gas was introduced into the chamber, and the Ar:N2 flow ratio was increased from 1:0 to 1:2 within 10 minutes. The gas pressure was maintained at 8 Pa, and the current of the AlCr target (Al:Cr=2:1) ​​was maintained at 100 A. The AlCrN transition strengthening support layer was deposited on the substrate surface with a bias voltage of -40 V, a deposition time of 15 minutes, and a layer thickness of 371 nm.

[0069] (5) Preparation of surface lubricating layer: Maintaining Ar:N2 flow ratio of 1:2, gas pressure of 8Pa, turning off the AlCr target, turning on the AlCrAg target (Al:Cr in the target material = 2:1, Ag atomic content 25at.%), setting and maintaining the target current of 100A, and depositing the AlCrAgN surface lubricating layer on the substrate surface with a bias voltage of -40V, a deposition time of 15min, and a layer thickness of 545nm.

[0070] (6) Film performance evaluation

[0071] The vacuum friction performance of the prepared film was tested using a ball-disc friction and wear tester. The test conditions were: ball-disc-rotation mode, G10 grade 9Cr18 steel ball (HRC ≥ 58) with a diameter of 8 mm, normal load 1 N, turntable speed 1000 r / min, vacuum degree 2*10 -3 Pa. The hardness of the film was measured using a nanoindenter.

[0072] The hardness of the prepared film was measured to be HV 1152, and the friction coefficient in the stable section was 0.21.

[0073] Example 5

[0074] In this embodiment, the steps for preparing the film layer are as follows:

[0075] (1) Acetone ultrasonic cleaning of substrate: The 2A14 substrate was ultrasonically cleaned with acetone for 15 minutes and dried, and then clamped in the tooling and placed in the deposition equipment.

[0076] (2) Plasma cleaning substrate: vacuum to 3.0×10 -3 Pa, fill the cavity with high-purity argon gas (maintain the pressure at 0.2 -1 Pa), and the substrate was cleaned by Ar plasma etching with a bias voltage of -100 V for 20 min.

[0077] (3) Preparation of the base bonding layer: Ar was introduced into the chamber, the gas pressure was maintained at 4 Pa, the AlCr target (Al:Cr=2:1) ​​was turned on, the target current was set to 100 A, and a metal AlCr base layer was deposited on the surface of the substrate. The bias voltage was -40 V, the deposition time was 5 min, and the layer thickness was 359 nm.

[0078] (4) Preparation of transition strengthening support layer: Ar and N2 mixed gas was introduced into the chamber, and the Ar:N2 flow ratio was increased from 1:0 to 1:2 within 10 minutes. The gas pressure was maintained at 4 Pa, and the current of the AlCr target (Al:Cr=2:1) ​​was maintained at 100 A. The AlCrN transition strengthening support layer was deposited on the surface of the substrate with a bias voltage of -40 V, a deposition time of 15 minutes, and a layer thickness of 375 nm.

[0079] (5) Preparation of surface lubricating layer: Maintaining Ar:N2 flow ratio of 1:2, gas pressure of 4Pa, turning off the AlCr target, turning on the AlCrAg target (Al:Cr in the target material = 2:1, Ag atomic content 50at.%), setting and maintaining the target current of 100A, and depositing the AlCrAgN surface lubricating layer on the substrate surface. The bias voltage was -40V, the deposition time was 15min, and the layer thickness was 637nm.

[0080] (6) Film performance evaluation

[0081] The vacuum friction performance of the prepared film was tested using a ball-disc friction and wear tester. The test conditions were: ball-disc-rotation mode, G10 grade 9Cr18 steel ball (HRC ≥ 58) with a diameter of 8 mm, normal load 1 N, turntable speed 1000 r / min, vacuum degree 2*10 -3 Pa. The hardness of the film was measured using a nanoindenter.

[0082] The hardness of the prepared film was measured to be HV736, and the friction coefficient in the stable section was 0.18.

[0083] Comparative Example 1

[0084] In this comparative example, the steps for preparing the membrane layer are basically the same as those in Example 1, except that in the preparation of the transition strengthening support layer, the Ar:N2 flow ratio is maintained at 1:2 from the beginning, and there is no gradient transition layer.

[0085] The obtained film layer showed local peeling phenomenon, which proved that the transition strengthening support layer without gradient transition structure had poor bonding strength.

[0086] Comparative Example 2

[0087] In this comparative example, the steps for preparing the film layer are basically the same as those in Example 1, except that the surface lubricating layer does not contain Ag, that is, the Ar:N2 flow ratio is maintained at 1:2, and the AlCrN layer is deposited for 15 minutes.

[0088] The vacuum friction performance of the prepared films was tested using a ball-on-disc tribometer. The test conditions were: ball-on-disc rotation mode, a G10-grade 9Cr18 steel ball (HRC ≥ 58) with an 8mm diameter, a normal load of 1N, a turntable speed of 1000 rpm, and a vacuum of 2*10-3 Pa. The hardness of the films was measured using a nanoindenter.

[0089] The film's hardness was measured to be HV 1601, and its friction coefficient in the stable zone was 0.45. This indicates that the AlCrN film without Ag does not exhibit significant anti-friction and lubricating properties.

[0090] Comparative Example 3

[0091] In this comparative example, the steps for preparing the film layer are basically the same as those in Example 1, except that the surface lubricating layer is prepared by depositing an AlCrSiCN layer and additionally introducing tetramethylsilane (1 / 10 of the N2 flow rate).

[0092] The lubrication mechanism of the AlCrSiCN layer is through the lubrication of hydrogen-containing amorphous carbide. The rapid loss of hydrogen in a vacuum environment causes the lubrication effect of the film to be lost quickly. This type of film is not suitable for a vacuum environment.

[0093] The above describes the specific embodiments of the present invention. It should be understood that the present invention is not limited to the above specific embodiments, and those skilled in the art may make various variations or modifications within the scope of the claims, which do not affect the essence of the present invention.

Claims

1. An integrated film layer for surface enhancement and lubrication of space aluminum structural parts, characterized in that: The integrated film layer comprises a primer bonding layer, a transition strengthening support layer, and a surface lubricating layer deposited in sequence on the surface of the aluminum structural member; The bottom bonding layer is an AlCr alloy layer with a thickness of 50nm-1000nm; The transition strengthening support layer is an AlCrN nitride layer, in which the nitrogen content gradually increases from the inside to the outside, and the atomic ratio of (Al+Cr):N ranges from 1:0 to 1:0.5-1; and the thickness is 50nm-2000nm; The surface lubricating layer is an AlCrAgN nitride layer, the Ag element content is 0.5at.%-60at.%, and the thickness is 100nm-5um.

2. A method for preparing an integrated membrane layer according to claim 1, characterized in that: The following steps are involved: S1. Preparation of primer bonding layer: a metal AlCr primer bonding layer is deposited on the surface of the space aluminum structural component in Ar gas; S2. Preparation of transition strengthening support layer: depositing a layer of AlCrN transition strengthening support layer on the primer bonding layer in an Ar and N2 mixed gas atmosphere; S3. Preparation of surface lubricating layer: maintaining the flow rate of the Ar and N2 mixed gas at the end of step S2, and depositing a layer of AlCrAgN surface lubricating layer on the transition strengthening support layer to obtain the integrated film layer.

3. The preparation method according to claim 2, characterized in that In step S1 , the AlCr target used for deposition has an Al:Cr atomic ratio of 1:2 to 2:1, a target current of 60 to 150 A, a bias voltage of -10 to -150 V, and a deposition time of 2 to 10 min.

4. The preparation method according to claim 2, characterized in that In step S2 , the AlCr target used for deposition has an Al:Cr atomic ratio of 1:2 to 2:1, a target current of 60 to 150 A, a bias voltage of -10 to -150 V, and a deposition time of 10 to 60 min.

5. The preparation method according to claim 2, characterized in that In step S2, the volume flow ratio of Ar:N2 in the Ar and N2 mixed gas is uniformly increased from 1:0 at the beginning to 1:1.5-2.5 during the deposition time.

6. The preparation method according to claim 2, characterized in that In step S3, the AlCrAg target used for deposition has an Al:Cr atomic ratio of 1:2 to 2:1, an Ag atomic content of 0.5 at.% to 60 at.%. The target current is 60 to 150 A, the bias voltage is -10 to -150 V, and the deposition time is 15 to 120 min.

7. Use of the integrated film layer for surface enhancement and lubrication of space aluminum structural parts as claimed in claim 1 in the preparation of spacecraft.

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