Composite membranes, methods of making and using the same

Abstract

The present application relates to the technical field of anti-glare film, and discloses a composite film, a preparation method and application thereof.The composite film comprises an absorbing layer and a low-refractive layer on the absorbing layer, and the absorbing layer contains XY-A-B, wherein X is at least one selected from Ti, Nb, Ta, Cr and Zr, Y is a non-metal element, A is a non-solid solution metal element, and B is a rare earth element, wherein the atomic ratio R1 of A to X satisfies 0 < R1 <= 0.1, and / or the atomic ratio R2 of B to X satisfies 0 < R2 <= 0.1.The composite film according to the present application not only has high strength and toughness, but also can absorb harmful light such as ultraviolet light and blue light to the maximum extent, has high visible light transmittance, and is particularly suitable for use as an anti-glare film.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of anti-glare film, in particular to a composite film and a preparation method and application thereof. BACKGROUND

[0002] When in use, image display devices such as liquid crystal displays, electronic paper, tablet computers and electronic touch display screens usually have an anti-glare film on the outer surface of the screen to prevent glare.

[0003] In patent applications CN114479152B and CN105907287B, the anti-glare layer is formed by coating an anti-glare coating on a transparent substrate to form a coating, and then curing the coating. Nanoparticles are added to the hard coating resin to form a concave-convex shape on the surface, and the scattering of reflected light and the internal scattering caused by the refractive index difference between the hard coating resin and the particles are used to prevent light diffraction. However, the scattering of reflected light can easily cause low contrast, and the scattering of transmitted light can easily cause low image resolution.

[0004] Patent application CN103921487B discloses an anti-glare and visible light anti-reflection bifunctional coated glass and a preparation method thereof, wherein the anti-glare layer and the anti-reflection layer are prepared by a weak acid etching method and a magnetron sputtering method. The steps are complex, and the zinc oxide cannot be accurately controlled in the experimental process by the acid etching method, and can cause environmental pollution.

[0005] Patent application CN100582817C discloses an anti-glare film, wherein a low refractive index layer is synthesized using a fluorine-containing polymer. However, fluorine-containing substances do not meet the environmental protection concept. SUMMARY

[0006] The purpose of the present application is to provide a composite film and a preparation method and application thereof. The composite film has high strength and toughness, can absorb harmful light such as ultraviolet light and blue light to the greatest extent, has high visible light transmittance, and is suitable for use as an anti-glare film.

[0007] To achieve the above purpose, the first aspect of the present application provides a composite film, comprising an absorption layer and a low refractive index layer on the absorption layer, wherein the absorption layer contains XY-A-B, and

[0008] X is at least one selected from Ti, Nb, Ta, Cr and Zr,

[0009] Y is a non-metallic element,

[0010] A is a non-soluble metal element,

[0011] B is a rare earth element,

[0012] wherein the atomic ratio R1 of A to X satisfies: 0 < R1 ≤ 0.1, and / or

[0013] The atomic ratio R2 of B to X satisfies: 0 < R2 ≤ 0.1.

[0014] Preferably, 0.01 ≤ R1 ≤ 0.05.

[0015] Preferably, 0.01 ≤ R2 ≤ 0.05.

[0016] Preferably, the content of Y is 5-35 mol% based on the total atomic mole amount of the absorption layer.

[0017] Preferably, Y is at least one selected from N, B and C.

[0018] Preferably, A is at least one selected from Au, Ag and Cu.

[0019] Preferably, B is at least one selected from Ce, Sm and Ho.

[0020] Preferably, the absorption layer is at least one selected from TiN-Cu-Ce film, TiC-Cu-Ce film, NbN-Cu-Ce film and TiN-Cu-Sm film.

[0021] Preferably, the thickness ratio of the absorption layer to the low refractive index layer is 1:0.5-5.

[0022] Preferably, the thickness of the absorption layer is 10-200 nm.

[0023] Preferably, the thickness of the low refractive index layer is 50-150 nm.

[0024] Preferably, the refractive index of the low refractive index layer is 1.4-1.7.

[0025] More preferably, the low refractive index layer is a SiO2 layer.

[0026] The second aspect of the present application provides a method for preparing the composite film described above, which comprises: forming an absorption layer on a substrate by magnetron co-sputtering of X target material, A target material and B target material in the presence of a reaction gas, and then depositing a low refractive index layer on the absorption layer.

[0027] The third aspect of the present application provides the use of the composite film described above as an anti-glare film.

[0028] Through the above technical solution, in the absorption layer of the composite film, rare earth elements, non-soluble metal elements and non-metal elements are doped, and the atomic ratio between the corresponding metal elements is controlled, so that the composite film not only has high strength and toughness, but also can absorb ultraviolet light and blue light and other harmful light to the greatest extent, has high visible light transmittance, and is particularly suitable for use as an anti-glare film.BRIEF DESCRIPTION OF DRAWINGS BRIEF DESCRIPTION OF DRAWINGS

[0029] Figure 1 is a structural schematic diagram of the anti-glare film prepared in Example 1. DETAILED DESCRIPTION

[0030] The specific embodiments of the present application are described in detail below. It should be understood that the specific embodiments described herein are merely illustrative and explanatory and are not intended to limit the present application.

[0031] The composite film described in the present application comprises an absorbing layer and a low refractive index layer on the absorbing layer, the absorbing layer contains XY-A-B, wherein,

[0032] X is at least one selected from Ti, Nb, Ta, Cr and Zr,

[0033] Y is a non-metallic element,

[0034] A is a non-soluble metallic element,

[0035] B is a rare earth element,

[0036] wherein, the atomic ratio R1 of A to X satisfies: 0 < R1 ≤ 0.1, and / or

[0037] the atomic ratio R2 of B to X satisfies: 0 < R2 ≤ 0.1.

[0038] According to the composite film described in the present application, in the absorbing layer, by doping a rare earth element, a non-soluble metallic element and a non-metallic element, and controlling the atomic ratio between the corresponding metallic elements, the composite film not only has high strength and toughness, but also can absorb harmful light such as ultraviolet light and blue light to the greatest extent, and has high visible light transmittance.

[0039] In a more preferred embodiment, the atomic ratio R1 of A to X satisfies: 0.01 ≤ R1 ≤ 0.05. More preferably, the atomic ratio R1 of A to X satisfies: 0.02 ≤ R1 ≤ 0.04. Most preferably, the atomic ratio R1 of A to X is 0.03. According to the above preferred embodiment, the composite film has lower harmful light (such as ultraviolet light) transmittance and higher visible light transmittance.

[0040] In a more preferred embodiment, the atomic ratio R2 of B to X satisfies: 0.01 ≤ R2 ≤ 0.05. More preferably, the atomic ratio R2 of B to X satisfies: 0.01 ≤ R2 ≤ 0.03. Most preferably, the atomic ratio R2 of B to X is 0.02. According to the above preferred embodiment, the composite film has lower harmful light (such as ultraviolet light) transmittance and higher visible light transmittance.

[0041] In the composite film of the present application, the microstructure of the absorbing layer changes with the increase of the content of the non-metallic element Y. When the content of the non-metallic element Y is low, the microstructure of the absorbing layer is solid solution structure. The solid solution lattice is distorted to a certain extent, which hinders the movement of dislocations, thereby improving the strength and hardness of the absorbing layer. In a specific embodiment, the content of the non-metallic element Y is 5-35 mol%, preferably 10-25 mol%, and further preferably 12-23 mol%, based on the total moles of atoms in the absorbing layer. When the content of the non-metallic element Y in the absorbing layer is within the above range, the composite film not only has high strength and toughness, but also has lower harmful light (such as ultraviolet light) transmittance and higher visible light transmittance.

[0042] In the composite film of the present application, the non-metallic element Y is preferably at least one of N, B and C. When the non-metallic element Y is selected from the above elements, the composite film can have high strength and toughness, and also has lower harmful light (such as ultraviolet light) transmittance and higher visible light transmittance.

[0043] In the composite film of the present application, the absorbing layer incorporates a non-soluble metal element A. With the increase of the content of the non-soluble metal element A, the excess element exists in the form of precipitated particles, which restricts the growth of metal oxide grains, thereby reducing the grain size. According to the Hall-Petch fine-grain strengthening theory, when the grain size in the absorbing layer is reduced, the density of grain boundaries in the crystal is increased, which enhances the hindering effect of dislocation movement, thereby achieving crystal strengthening, thereby enhancing the hardness and toughness of the absorbing layer. In a specific embodiment, the content of the non-soluble metal element A is 0.5-10 mol%, preferably 1-8 mol%, and more preferably 1.5-5 mol%, based on the total moles of atoms in the absorbing layer. When the content of the non-soluble metal element A in the absorbing layer is within the above range, the composite film not only has high strength and toughness, but also has lower harmful light (such as ultraviolet light) transmittance and higher visible light transmittance.

[0044] In the composite film of the present application, the non-soluble metal element A is preferably at least one of Au, Ag and Cu. When the non-soluble metal element A is selected from the above elements, the composite film can have high strength and toughness, and also has lower harmful light (such as ultraviolet light) transmittance and higher visible light transmittance.

[0045] In the composite film, by incorporating rare earth element B in the absorbing layer, the harmful light such as ultraviolet and blue light can be absorbed to the maximum extent. In a specific embodiment, the content of the rare earth element B is 0.5-10 mol%, preferably 0.5-8 mol%, and more preferably 0.7-4 mol%, based on the total atomic mole amount of the absorbing layer. When the content of the rare earth element B in the absorbing layer is within the above range, the composite film not only has high strength and toughness, but also has lower harmful light (such as ultraviolet) transmittance and higher visible light transmittance.

[0046] In the composite film, the rare earth element B is preferably at least one of Ce, Sm and Ho. Among them, Ce has the characteristics of absorbing ultraviolet and good transmittance of visible light, and can realize the absorption of ultraviolet light after being incorporated to achieve the effect of anti-glare; Sm has good absorption effect on 400 nm and 470 nm blue light; Ho has good absorption effect on short-wave blue light, and can significantly enhance the anti-glare performance after being incorporated.

[0047] In the composite film, preferably, the absorbing layer is at least one of TiN-Cu-Ce film, TiC-Cu-Ce film, NbN-Cu-Ce film and TiN-Cu-Sm film. When the absorbing layer uses the above film material, the composite film not only has high strength and toughness, but also has lower harmful light (such as ultraviolet) transmittance and higher visible light transmittance.

[0048] In the composite film, the thickness of the absorbing layer can be 10-200 nm, preferably 20-100 nm, and more preferably 50-70 nm.

[0049] In the composite film, the refractive index of the low refractive index layer is 1.4-1.7.

[0050] In the composite film, the thickness of the low refractive index layer can be 50-150 nm, preferably 60-120 nm, and more preferably 80-110 nm.

[0051] In the composite film, the low refractive index layer can be a conventional selection in the art. In a more preferred embodiment, in order to ensure that the composite film has high strength and toughness, and lower harmful light (such as ultraviolet) transmittance and higher visible light transmittance, the low refractive index layer is selected as a SiO2 layer.

[0052] The application also provides a method for preparing the composite film described above, which comprises: forming an absorbing layer on a substrate by magnetron co-sputtering of X target material, A target material and B target material in the presence of a reaction gas, and then depositing a low refractive index layer on the absorbing layer.

[0053] In the present application, the magnetron co-sputtering can be carried out according to the conventional conditions in the art. In some embodiments, during the magnetron co-sputtering, the sputtering gas is an inert gas (such as Ar2), the sputtering gas flux is 100-500 sccm; the reaction gas flux is 50-200 sccm; the vacuum degree is 0.1 Pa or less, preferably 1x10 -3 Pa to 0.01 Pa, the vacuum degree refers to the absolute pressure; the sputtering power of the X target material is 2-10 kW, the sputtering power of the A target material is 2-10 kW, and the sputtering power of the B target material is 2-10 kW.

[0054] In the present application, the reaction gas can be N2 and / or CH4.

[0055] In the present application, the deposition of the low refractive index layer can be carried out according to the conventional manner in the art. In some embodiments, the process of depositing the low refractive index layer comprises: using a Si target, and introducing oxygen and an inert gas (such as Ar2) for deposition, wherein the power is 2-15 kW, the oxygen flux is 100-500 sccm, and the inert gas flux is 100-500 sccm.

[0056] In the present application, the substrate can be a conventional transparent substrate in the art. In some embodiments, the substrate is at least one of glass, sapphire and PET.

[0057] In the method of the present application, preferably, before the magnetron co-sputtering is carried out, the substrate is subjected to a cleaning treatment. The specific process comprises: removing surface dust and dirt of the substrate in a cleaning line, and then drying to obtain a clean substrate.

[0058] The present application also provides the use of the composite film as described above as an anti-glare film. The composite film of the present application not only has high strength and toughness, but also can absorb harmful light such as ultraviolet light and blue light to the greatest extent, and has high visible light transmittance, and can exhibit good anti-glare effect when used as an anti-glare film.

[0059] The composite film, the preparation method and the use thereof of the present application will be further illustrated by the following examples. The examples are implemented on the premise of the technical solutions of the present application, and detailed implementation modes and specific operation processes are given, but the protection scope of the present application is not limited to the following examples.

[0060] In the following examples, the experimental methods are conventional methods in the art unless otherwise specified. The experimental materials used in the following examples are commercially available unless otherwise specified.

[0061] In the following examples and comparative examples, the properties of the anti-glare film are tested according to the following methods, respectively:

[0062] UV transmittance: The UV transmittance of the coated product was measured using a UV-visible spectrophotometer UV3700;

[0063] 400 nm transmittance: The 400 nm transmittance of the coated product was measured using a UV-visible spectrophotometer UV3700;

[0064] 470 nm transmittance: The 470 nm transmittance of the coated product was measured using a UV-visible spectrophotometer UV3700;

[0065] Visible light transmittance: The visible light transmittance of the coated product was measured using a UV-visible spectrophotometer UV3700;

[0066] Pencil hardness: A Mitsubishi test pencil core of a specified hardness was used to draw 5 lines on the surface to be tested at an angle of 45° with the surface to be tested under a pressure of 1 kgf, with each line being 5-10 mm long. No indentation or scratch was allowed on the outer surface, and an indentation that could be restored within 24 hours was not considered a problem; a small scratch at the starting position (1 / 3 of the total length) was allowed; the camera lens was required to meet the requirements for both the small lens and the coated lens, and no trace was allowed to remain under any angle of observation;

[0067] Crosshatch adhesion: A sharp blade (blade angle 20-30°, blade thickness 0.43±0.03 mm) was used to draw 10x10 1 mm x 1 mm small grids on the surface of the test sample, and each line should be deep enough to reach the bottom layer of the coating; the debris in the test area was brushed clean with a brush; the tested small grid was firmly adhered with adhesive tape with an adhesion of (10±1) N / 25 mm, and the bubbles between the adhesive tape and the coating were squeezed out with a fingernail (note that the fingernail should not damage the adhesive tape; a glass PET film or a soft base film layer was removed with a rubber or a cotton swab to remove bubbles), so as to increase the contact area and force of the adhesive tape with the measured area; after standing for (90±30) s, one end of the adhesive tape was grabbed with the hand, and the adhesive tape was pulled off within 0.5 s in the opposite 60° direction, and the test was repeated once; after the test, the paint coating was examined for peeling with a 5x magnifying lens;

[0068] Haze: A haze meter SGW-810 was used for detection.

[0069] Example 1

[0070] (1) Substrate cleaning

[0071] The glass substrate was taken and the surface dust and dirt were removed on a cleaning line, and then dried to obtain a clean glass substrate.

[0072] (2) Preparation of the absorption layer: TiN-Cu-Ce film

[0073] The Ti target, Cu target and Ce target were selected, and the TiN-Cu-Ce film was formed by magnetron co-sputtering. The vacuum degree of film plating reached 3 x 10 -3 At 30 Pa, the sputtering gas Ar2 was started to be introduced, and the gas flux was 300 sccm; the reaction gas was N2, and the gas flux was 100 sccm. The sputtering power of the Ti target was 28 kW, the sputtering power of the Cu target was 10 kW, and the sputtering power of the Ce target was 5 kW. The TiN-Cu-Ce film with a thickness of 50 nm was formed on the glass substrate, wherein, based on the total atomic mole amount of the absorption layer, the content of Ti was 74.14 mol%, the content of N was 22.16 mol%, the content of Cu was 2.22 mol%, the content of Ce was 1.48 mol%, the atomic ratio R1 of Cu to Ti was 0.03, and the atomic ratio R2 of Ce to Ti was 0.02.

[0074] (3) Depositing a low refractive index layer: SiO2 layer

[0075] The Si target power was turned on with a power of 10 kW, the O2 flow rate was 300 sccm, the Ar2 flow rate was 300 sccm, and the SiO2 layer with a thickness of 100 nm was deposited.

[0076] The prepared anti-glare film was as shown in FIG. 1, and the absorption layer 2 and the low refractive index layer 3 were sequentially arranged from one side of the glass substrate 1. Figure 1

[0077] It was tested that the ultraviolet light transmittance of the anti-glare film was 0.82%, the visible light transmittance reached 93.2%, the pencil hardness was 7H, the cross-hatch adhesion was 5B, and the haze was 3%.

[0078] Example 2

[0079] (1) Substrate cleaning

[0080] The glass substrate was taken, the surface dust and dirt were removed in the cleaning line, and the glass substrate was dried to obtain a clean glass substrate.

[0081] (2) Preparing an absorption layer: TiC-Cu-Ce film

[0082] The Ti target, Cu target and Ce target were selected, and the TiC-Cu-Ce film was formed by magnetron co-sputtering. The vacuum degree of film plating reached 3 x 10 -3 ​Pa, the sputtering gas Ar2was started to be introduced, with a gas flux of 300sccm; the reaction gas CH4was introduced, with a gas flux of 100sccm. The sputtering power of the Ti target was 8kW, the sputtering power of the Cu target was 10kW, and the sputtering power of the Ce target was 5kW. A TiC-Cu-Ce film with a thickness of 60nm was formed on the glass substrate, wherein, based on the total atomic mole amount of the absorption layer, the content of Ti was 77.45mol%, the content of C was 18.68mol%, the content of Cu was 2.32mol%, the content of Ce was 1.55mol%, the atomic ratio R1 of Cu to Ti was 0.03, and the atomic ratio R2 of Ce to Ti was 0.02.

[0083] (3) Depositing a low-refractive layer: SiO2layer

[0084] The Si target power was turned on, with a power of 10kW, O2flow was 300sccm, Ar2flow was 300sccm, and a SiO2layer with a thickness of 110nm was deposited.

[0085] It was tested that the ultraviolet light transmittance of the anti-glare film prepared was 0.95%, the visible light transmittance was 92.5%, the pencil hardness was 7H, the cross-hatch adhesion was 5B, and the haze was 5%.

[0086] Example 3

[0087] (1) Substrate cleaning

[0088] A glass substrate was taken, surface dust and dirt were removed in a cleaning line, and the glass substrate was dried to obtain a clean glass substrate.

[0089] (2) Preparing an absorption layer: NbN-Cu-Ce film

[0090] A Nb target, a Cu target, and a Ce target were selected, and a NbN-Cu-Ce film was formed by magnetron co-sputtering, with a vacuum degree of 3x10 -3 Pa, the sputtering gas Ar2was started to be introduced, with a gas flux of 300sccm; the reaction gas CH4was introduced, with a gas flux of 100sccm. The sputtering power of the Ti target was 8kW, the sputtering power of the Cu target was 10kW, and the sputtering power of the Ce target was 5kW. A TiC-Cu-Ce film with a thickness of 60nm was formed on the glass substrate, wherein, based on the total atomic mole amount of the absorption layer, the content of Ti was 77.45mol%, the content of C was 18.68mol%, the content of Cu was 2.32mol%, the content of Ce was 1.55mol%, the atomic ratio R1 of Cu to Ti was 0.03, and the atomic ratio R2 of Ce to Ti was 0.02.

[0091] (3) Depositing a low-refractive layer: SiO2layer

[0092] The Si target power supply was turned on with a power of 10 kW, O2 flow rate of 300 sccm, and Ar2 flow rate of 300 sccm to deposit a SiO2 layer with a thickness of 80 nm.

[0093] Test results show that the anti-glare film has an ultraviolet light transmittance of 0.54%, a visible light transmittance of 93.4%, a pencil hardness of 6H, a cross-hatch adhesion of 5B, and a haze of 4%.

[0094] Example 4

[0095] (1) Substrate cleaning

[0096] The glass substrate was taken and cleaned in a cleaning line to remove surface dust and dirt, and dried to obtain a clean glass substrate.

[0097] (2) Preparation of the absorption layer: TiN-Cu-Sm film

[0098] Ti target, Cu target, and Sm target were selected, and a TiN-Cu-Sm film was formed by magnetron co-sputtering. When the vacuum degree reached 3 x 10 -3 Pa, the sputtering gas Ar2 was introduced with a flow rate of 300 sccm, and the reaction gas was N2 with a flow rate of 100 sccm. The sputtering power of the Ti target was 8 kW, the sputtering power of the Cu target was 10 kW, and the sputtering power of the Sm target was 5 kW. A TiN-Cu-Sm film with a thickness of 60 nm was formed on the glass substrate, wherein, based on the total atomic mole amount of the absorption layer, the content of Ti was 74.97 mol%, the content of N was 21.28 mol%, the content of Cu was 2.25 mol%, the content of Sm was 1.50 mol%, the atomic ratio R1 of Cu to Ti was 0.03, and the atomic ratio R2 of Sm to Ti was 0.02.

[0099] (3) Deposition of the low-refractive-index layer: SiO2 layer

[0100] The Si target power supply was turned on with a power of 10 kW, O2 flow rate of 300 sccm, and Ar2 flow rate of 300 sccm to deposit a SiO2 layer with a thickness of 110 nm.

[0101] Test results show that the anti-glare film has an ultraviolet light transmittance of 0.54%, a visible light transmittance of 93.4%, a pencil hardness of 6H, a cross-hatch adhesion of 5B, and a haze of 4%.

[0102] Example 5

[0103] A glare-proof film was produced in the same manner as in Example 1, except that, in the process of the magnetron co-sputtering in step (2), the contents of Ti, N, Cu and Ce in the TiN-Cu-Ce film produced were 73.28 mol%, 21.59 mol%, 2.93 mol% and 2.20 mol%, respectively, based on the total atomic moles of the absorbing layer, the atomic ratio Rl of Cu to Ti was 0.04, and the atomic ratio R2 of Ce to Ti was 0.03.

[0104] The glare-proof film was tested to have an ultraviolet light transmittance of 0.95%, a visible light transmittance of 92.3%, a pencil hardness of 6H, a cross-hatch adhesion of 5B, and a haze of 3%.

[0105] Example 6

[0106] A glare-proof film was produced in the same manner as in Example 1, except that, in the process of the magnetron co-sputtering in step (2), the contents of Ti, N, Cu and Ce in the TiN-Cu-Ce film produced were 78.17 mol%, 19.49 mol%, 1.56 mol% and 0.78 mol%, respectively, based on the total atomic moles of the absorbing layer, the atomic ratio Rl of Cu to Ti was 0.02, and the atomic ratio R2 of Ce to Ti was 0.01.

[0107] The glare-proof film was tested to have an ultraviolet light transmittance of 1.08%, a visible light transmittance of 92.1%, a pencil hardness of 5H, a cross-hatch adhesion of 5B, and a haze of 3%.

[0108] Example 7

[0109] A glare-proof film was produced in the same manner as in Example 1, except that, in the process of the magnetron co-sputtering in step (2), the contents of Ti, N, Cu and Ce in the TiN-Cu-Ce film produced were 71.48 mol%, 21.38 mol%, 3.57 mol% and 3.57 mol%, respectively, based on the total atomic moles of the absorbing layer, the atomic ratio Rl of Cu to Ti was 0.05, and the atomic ratio R2 of Ce to Ti was 0.05.

[0110] The glare-proof film was tested to have an ultraviolet light transmittance of 1.15%, a visible light transmittance of 91.7%, a pencil hardness of 5H, a cross-hatch adhesion of 5B, and a haze of 4%.

[0111] Example 8

[0112] A glare-proof film was produced in the same manner as in Example 1, except that, in the process of the magnetron co-sputtering in step (2), the content of Ti was 68.94 mol%, the content of N was 17.28 mol%, the content of Cu was 6.89 mol%, and the content of Ce was 6.89 mol% in the TiN-Cu-Ce film produced, based on the total atomic moles of the absorbing layer, the atomic ratio Rl of Cu to Ti was 0.1, and the atomic ratio R2 of Ce to Ti was 0.1.

[0113] The glare-proof film was tested to have an ultraviolet light transmittance of 1.39%, a visible light transmittance of 90.4%, a pencil hardness of 5H, a cross-hatch adhesion of 5B, and a haze of 5%.

[0114] Comparative Example 1

[0115] A glare-proof film was produced in the same manner as in Example 1, except that, in the process of the magnetron co-sputtering in step (2), no Cu target was used.

[0116] The glare-proof film was tested to have an ultraviolet light transmittance of 0.82%, a visible light transmittance of 90.4%, a pencil hardness of 3H, a cross-hatch adhesion of 5B, and a haze of 3%.

[0117] Comparative Example 2

[0118] A glare-proof film was produced in the same manner as in Example 1, except that, in the process of the magnetron co-sputtering in step (2), no Ce target was used.

[0119] The glare-proof film was tested to have an ultraviolet light transmittance of 14.23%, a visible light transmittance of 91.2%, a pencil hardness of 6H, a cross-hatch adhesion of 5B, and a haze of 5%.

[0120] Comparative Example 3

[0121] A glare-proof film was produced in the same manner as in Example 1, except that, in the process of the magnetron co-sputtering in step (2), the content of Ti was 62.51 mol%, the content of N was 20.61 mol%, the content of Cu was 9.38 mol%, and the content of Ce was 7.50 mol% in the TiN-Cu-Ce film produced, based on the total atomic moles of the absorbing layer, the atomic ratio Rl of Cu to Ti was 0.15, and the atomic ratio R2 of Ce to Ti was 0.12.

[0122] The glare-proof film was tested to have an ultraviolet light transmittance of 3.77%, a visible light transmittance of 88.3%, a pencil hardness of 4H, a cross-hatch adhesion of 4B, and a haze of 6%.

[0123] It can be seen from the test results of the above examples and comparative examples that, in the absorbing layer of the composite film, by doping rare earth elements, non-soluble metal elements and non-metal elements, and controlling the atomic ratio between the corresponding metal elements, the composite film not only has high strength and toughness, but also can absorb harmful light such as ultraviolet light and blue light to the greatest extent, and has high visible light transmittance.

[0124] The above describes the preferred embodiments of the present application, but the present application is not limited thereto. Within the technical concept of the present application, various simple modifications can be made to the technical solutions of the present application, including the combination of various technical features in any other suitable manner, and these simple modifications and combinations should also be considered as disclosed by the present application, and all fall within the protection scope of the present application.

Claims

1. A composite membrane, characterized in that Comprising an absorption layer and a low refractive index layer located on the absorption layer, the absorption layer containing XY-A-B, wherein, X is selected from at least one of Ti, Nb, Ta, Cr, and Zr, Y is selected from at least one of N, B, and C, A is selected from at least one of Au, Ag, and Cu, B is selected from at least one of Ce, Sm, and Ho, wherein, the atomic ratio R1 of A to X satisfies: 0 < R1 ≤ 0.1, and / or the atomic ratio R2 of B to X satisfies: 0 < R2 ≤ 0.

1.

2. The composite membrane according to claim 1, characterized in that 0.01≤R1≤0.05。 3. The composite membrane according to claim 1, characterized in that 0.01≤R2≤0.05。 4. The composite membrane according to any one of claims 1 to 3, characterized in that Based on the total molar amount of atoms in the absorption layer, the content of Y is 5-35 mol%.

5. The composite membrane according to any one of claims 1 to 3, characterized in that The absorption layer is at least one of a TiN-Cu-Ce film, a TiC-Cu-Ce film, a NbN-Cu-Ce film, and a TiN-Cu-Sm film.

6. The composite membrane according to any one of claims 1 to 3, characterized in that The thickness ratio of the absorption layer to the low refractive index layer is 1:0.5-5.

7. The composite membrane according to any one of claims 1 to 3, characterized in that The thickness of the absorption layer is 10-200 nm.

8. The composite membrane according to any one of claims 1 to 3, characterized in that The thickness of the low refractive index layer is 50-150 nm.

9. The composite membrane according to any one of claims 1 to 3, characterized in that The refractive index of the low refractive index layer is 1.4-1.

7.

10. The composite membrane according to any one of claims 1 to 3, characterized in that The low refractive index layer is a SiO2 layer.

11. A method for preparing the composite membrane according to any one of claims 1 to 10, characterized in that: The method includes: forming an absorption layer on a substrate by magnetron co-sputtering of an X target, an A target, and a B target in the presence of a reaction gas, and then depositing a low refractive index layer on the absorption layer.

12. Application of the composite film according to any one of claims 1-10 as an anti-glare film.

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