Photocatalytic auxiliary equipment for polishing silicon carbide wafer

By incorporating a small photocatalyst and a stirring system into the silicon carbide wafer polishing equipment, the problem of insufficient contact time between the polishing slurry and the ultraviolet light source was solved, achieving full activation of the photocatalyst and uniform mixing of the polishing slurry, thus improving the polishing quality.

CN118322087BActive Publication Date: 2025-11-28ANHUI WEIXIN CHANGJIANG SEMICON MATERIAL CO LTD
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Patent Information

Application Number
CN202410679896.4
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-05-29
Publication Date
2025-11-28
Estimated Expiration
2044-05-29

AI Technical Summary

Technical Problem

In the existing silicon carbide wafer polishing process, the contact time between the polishing slurry and the ultraviolet light source is too short, resulting in some photocatalysts not being activated and unable to exert their photocatalytic effect to the maximum extent.

Method used

A small photocatalyst is installed inside the mixing tank, consisting of an opaque outer shell and a translucent inner liner. The inner liner is equipped with multiple translucent baffles and an ultraviolet light source. Combined with a stirring system, the illumination time of the polishing liquid is extended and the mixture is stirred evenly to ensure the full activation of the photocatalyst.

Benefits of technology

It extends the activation time of the photocatalyst, improves the mixing uniformity and concentration consistency of the polishing slurry, and enhances the polishing effect on silicon carbide wafers.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application discloses a kind of silicon carbide wafer polishing with photocatalytic auxiliary equipment, including the mixing liquid storage tank with stirring system, the inner chamber of the mixing liquid storage tank is provided with small photocatalytic device, the small photocatalytic device includes the light-tight shell with gas outlet pipe in upper end, the upper end of the light-tight shell is provided with the liquid suction pipe with pump body, the liquid outlet end of the liquid suction pipe is located in the inner chamber of the light-tight shell, the lower end of the liquid suction pipe is close to the bottom of the mixing liquid storage tank and is provided, the inner chamber of the light-tight shell is coaxially provided with light transmission inner container, and the bottom of the light transmission inner container is provided with opening, and the lower end of the light transmission inner container and the inner chamber bottom of the light-tight shell are provided with gap.In the inner chamber of mixing liquid storage tank is provided with small photocatalytic device, can extend the illumination time of titanium dioxide in polishing liquid, and stratified illumination, so that titanium dioxide is fully and uniformly illuminated, and it is beneficial to the activation of titanium dioxide particles.
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Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of silicon carbide wafer processing, in particular to a photocatalytic auxiliary equipment for polishing silicon carbide wafer. BACKGROUND

[0002] Silicon carbide wafer is a material used for LED solid-state lighting and high-frequency device manufacturing. The production process of silicon carbide wafer includes ingot rolling, multi-wire sawing, grinding and chamfering, wafer polishing, wafer cleaning, and wafer final testing. Wafer polishing is one of the most important steps, and its polishing quality directly affects the quality of the subsequent use of silicon carbide wafer.

[0003] When polishing the silicon carbide wafer, in order to ensure the polishing effect of the outer surface of the silicon carbide wafer, light catalytic assisted polishing is usually used. Under the irradiation of ultraviolet light of a specific wavelength, the photocatalyst (such as TiO2 particles) in the polishing liquid is activated, and a photo-generated electron and a hole are generated on its surface. These photo-generated holes have strong oxidizing properties and can effectively capture water molecules and OH- in the polishing liquid, and then generate hydroxyl radicals (·OH) with stronger oxidizing ability. These hydroxyl radicals undergo oxidation on the surface of the silicon carbide wafer to form a soft oxidation layer, and then the oxidation layer is removed by mechanical action to achieve the planarization of the silicon carbide surface. This process can improve the surface quality and optical performance of the silicon carbide wafer and improve its mechanical properties such as hardness, strength, and wear resistance, thereby enhancing its overall function and performance.

[0004] The existing polishing equipment for polishing the silicon carbide wafer is provided with an ultraviolet light source. The polishing liquid containing TiO2 particles discharged from the liquid outlet is irradiated by the ultraviolet light source to activate the photocatalyst in the polishing liquid. In this process, due to the short contact time of the polishing liquid with the ultraviolet light source, part of the photocatalyst in the polishing liquid is not activated, and the photocatalytic effect of the photocatalyst cannot be maximized. Therefore, the present application provides a photocatalytic auxiliary equipment for polishing silicon carbide wafer to meet the needs. SUMMARY

[0005] The purpose of the present application is to provide a photocatalytic auxiliary equipment for polishing silicon carbide wafer to solve the technical problem that the contact time of the existing polishing liquid with the ultraviolet light source is too short, resulting in part of the photocatalyst in the polishing liquid not being activated.

[0006] To achieve the above object, the application provides the following technical scheme: a kind of silicon carbide wafer polishing photocatalytic auxiliary equipment, the mixed liquid storage tank is used to configure, store polishing liquid, including the mixed liquid storage tank with stirring system, the inner chamber of the mixed liquid storage tank is provided with small photocatalyst, the small photocatalyst includes the light-tight shell with gas pipe at the upper end, the upper end of the light-tight shell is provided with the liquid suction pipe with pump body, the liquid outlet end of the liquid suction pipe is located in the inner chamber of the light-tight shell, the lower end of the liquid suction pipe is close to the bottom of the mixed liquid storage tank and is provided, the inner chamber of the light-tight shell is coaxially provided with light-transmitting inner container, and the bottom of the light-transmitting inner container is provided with an opening, the lower end of the light-transmitting inner container and the inner chamber bottom of the light-tight shell are provided with a gap, the inner chamber wall of the light-tight inner container is provided with a plurality of light-transmitting partitions from bottom to top at equal intervals, and a plurality of ultraviolet light sources are provided on the upper and lower ends of each light-transmitting partition and the inner chamber wall of the light-tight shell, each light-transmitting partition is provided with a notch, and the notch and the inner wall of the light-tight inner container form an overflow gap, from bottom to top, a plurality of notches are arranged at intervals of one left and one right, the light-transmitting inner container is provided with a liquid outlet pipe penetrating the light-tight shell, and the liquid inlet end of the liquid outlet pipe is located above the uppermost light-transmitting partition.

[0007] As a preferred embodiment in the present embodiment, the liquid outlet end of the liquid suction pipe is provided with a rotary joint, the outer wall of the liquid outlet end of the rotary joint is provided with a plurality of liquid discharge pipes in a circular table manner, and the liquid discharge ends of the plurality of liquid discharge pipes are curved to the same side;

[0008] The shaft centers of the light-transmitting inner container and the plurality of light-transmitting partitions are fixedly provided with barrels, a spacing is provided between adjacent two barrels, and a rotating ring with a stirring rod on the outer wall is provided at the spacing, and except for the lowermost rotating ring, the upper and lower ends of the rotating ring are sealingly and rotatably connected to the upper and lower ends of adjacent two barrels through sealing bearings, the inner cavities of the rotating rings are provided with drive gear rings, the upper end of the lowermost rotating ring is sealingly and rotatably connected to the upper barrel and the mounting barrel fixed at the bottom of the inner chamber of the light-tight shell through sealing bearings, and the inner ring walls of the plurality of rotating rings are provided with driven gear rings;

[0009] The bottom of the rotating end of the rotary joint is fixedly provided with a rotating shaft, the lower end of the rotating shaft penetrates through the plurality of barrels and is rotatably connected to the mounting barrel, a plurality of drive gear rings are mounted on the rotating shaft, and the plurality of drive gear rings and the plurality of driven gear rings are one-to-one corresponding.

[0010] As a preferred embodiment in the present embodiment, a speed regulating unit is further included for adjusting the rotating speed of each rotating ring, so that the rotating speed of the rotating ring from bottom to top decreases from large to small and then increases from small to large.

[0011] As a preferred embodiment in the embodiment, the speed regulating unit comprises four first transmission gears of the same specification and small diameter, and two second transmission gears of the same specification and large diameter, the diameter of the second transmission gears being twice that of the first transmission gears;

[0012] The swivels are arranged in five groups, and in addition to the swivel in the middle group, the inner walls of the swivels are provided with first driven tooth rings of the same specification, and the inner cavity wall of the swivel in the middle group is fixed with a second driven tooth ring through a connecting rod;

[0013] From bottom to top, the inner cavities of the swivels in the first group and the fifth group are provided with two first transmission gears, the two first transmission gears are arranged in a straight line and meshed and connected, the first driven tooth ring is meshed and connected with the driving tooth ring through the two first transmission gears, the inner cavities of the swivels in the second group and the fourth group are provided with one second transmission gear, the first driven tooth ring is meshed and connected with the driving tooth ring through the second transmission gear, and the second driven tooth ring in the third group is directly meshed and connected with the driving tooth ring.

[0014] As a preferred embodiment in the embodiment, the rotary joints are all arranged to be curved to the left side, that is, when the high-speed fluid is introduced into the light-tight shell through the pump body through the liquid suction pipe, the rotary joints rotate counterclockwise.

[0015] As a preferred embodiment in the embodiment, the light intensity of the ultraviolet light source is 540 lux to 680 lux, and the mass of titanium dioxide in the polishing liquid accounts for 1.3% to 2.4% of the mass of the entire polishing liquid.

[0016] As a preferred embodiment in the embodiment, the stirring system comprises a motor and a plurality of stirring pieces with spiral stirring blades, and the plurality of stirring pieces are all meshed and connected with the large gear installed on the output end of the motor through the small gears arranged on the upper ends of the stirring pieces.

[0017] In summary, the technical effects and advantages of the present application are as follows:

[0018] 1. The present application has a reasonable structure, a small photocatalyst is arranged in the inner cavity of the mixed liquid storage tank, the illumination time of titanium dioxide in the polishing liquid can be prolonged, and the illumination is layered, so that the titanium dioxide is fully and uniformly illuminated, which is beneficial to the activation of all titanium dioxide particles.

[0019] 2. In the present application, the polishing liquid in different height layers is stirred at different speeds during illumination, which can avoid the deposition of titanium dioxide particles and improve the mixing effect, so that the concentrations of the polishing liquid in each height layer are consistent, which is beneficial to improving the processing effect of the polishing liquid on the silicon carbide wafer.

[0020] 3、 The mixing rod collides with the polishing liquid moving along the overflow path when rotating, and the polishing liquid is mixed more uniformly. BRIEF DESCRIPTION OF DRAWINGS

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiments or prior art description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0022] Figure 1 It is a cross-sectional structure schematic diagram of the present application;

[0023] Figure 2 It is Figure 1 It is a cross-sectional structure schematic diagram of the opaque shell in the present application;

[0024] Figure 3 It is Figure 2 It is a partial cross-sectional structure schematic diagram of the light-transmitting inner container in the present application;

[0025] Figure 4 It is Figure 3 It is a partial cross-sectional structure schematic diagram of the cylinder body in the present application;

[0026] Figure 5 It is Figure 4 It is an enlarged structure schematic diagram of A in the present application;

[0027] Figure 6 It is Figure 4 It is an enlarged structure schematic diagram of B in the present application;

[0028] Figure 7 It is Figure 4 It is an enlarged structure schematic diagram of C in the present application.

[0029] In the figure: 1, mixed liquid storage tank; 2, stirring system; 3, opaque shell; 4, liquid suction pipe; 5, pump body; 6, light-transmitting inner container; 7, rotary joint; 8, liquid discharge pipe; 9, light-transmitting partition plate; 10, cutout; 11, ultraviolet light source; 12, liquid outlet pipe; 13, cylinder body; 14, rotating shaft; 15, rotating ring; 16, stirring rod; 17, first driven gear ring; 18, driving gear ring; 19, first transmission gear; 20, second transmission gear; 21, second driven gear ring; 22, gas outlet pipe; 23, mounting cylinder. DETAILED DESCRIPTION

[0030] With reference to the drawings of the embodiments of the present application, the technical solutions in the embodiments of the present application will be described clearly and completely. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments of the present application, all the other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of the present application.

[0031] Embodiment: Reference Figures 1-3 The application discloses a kind of carbonized silicon wafer polishing photocatalytic auxiliary equipment, mixed liquid storage tank 1 is used to configure, store polishing liquid, including mixed liquid storage tank 1 with stirring system 2, the inner cavity of mixed liquid storage tank 1 is provided with small photocatalyst, small photocatalyst includes the light-tight shell 3 with gas outlet pipe 22 in upper end, the upper end of light-tight shell 3 is provided with the liquid suction pipe 4 with pump body 5, the liquid outlet end of liquid suction pipe 4 is located in the inner cavity of light-tight shell 3, the lower end of liquid suction pipe 4 is close to the bottom of mixed liquid storage tank 1 setting, the inner cavity of light-tight shell 3 is coaxially provided with light transmission inner container 6, and the bottom of light transmission inner container 6 is open setting, gap is arranged between the lower end of light transmission inner container 6 and the inner cavity bottom of light-tight shell 3, multiple light transmission partitions 9 are arranged on the inner cavity wall of light transmission inner container 6 from bottom to top at equal intervals, and multiple ultraviolet light sources 11 are arranged on the upper and lower ends of each light transmission partition 9 and the inner cavity wall of light-tight shell 3, each light transmission partition 9 is provided with cutout 10, and overflow gap is formed between cutout 10 and the inner wall of light-tight inner container 6, from bottom to top, multiple cutouts 10 are arranged at intervals of left and right, light transmission inner container 6 is provided with liquid outlet pipe 12 penetrating light-tight shell 3, and the liquid inlet end of liquid outlet pipe 12 is located above the uppermost light transmission partition 9.

[0032] In work, the mixed storage tank 1 is used for storing the polishing liquid mixed and containing the photocatalyst, i.e. titanium dioxide particles, and in order to ensure that the titanium dioxide particles are deposited at the bottom of the mixed storage tank 1, the stirring system 2 is always in working state. The polishing liquid mixed uniformly is pumped to the gap between the inner wall of the light-proof shell 3 and the light-transmitting inner container 6 by the pump body 5, and finally flows into the transparent inner container 6. As the liquid level in the transparent inner container 6 gradually rises, when the liquid level rises to the height of the liquid outlet of the liquid outlet pipe 12 (it takes a period of time for the liquid level to rise to the liquid outlet, and this process provides sufficient illumination time for the polishing liquid, which can maximize the activation of titanium dioxide), the polishing liquid is discharged through the liquid outlet pipe 12. In this process, multiple transparent partitions 9 are arranged at intervals, and the transparent partitions 9 are provided with ultraviolet light sources 11, and the overflow gaps are arranged at intervals from left to right and from bottom to top, so that the water flow in the transparent inner container 6 first overflows from the left side to the top, and then flows horizontally to the right side, and then flows upward through the overflow gap, and then flows to the left side, and so on, so that the polishing liquid flows zigzag upward in the transparent inner container 6 and passes through all the transparent partitions 9, so that the titanium dioxide particles in the polishing liquid are fully and uniformly illuminated, which is beneficial to the activation of the titanium dioxide particles.

[0033] It should be noted that: 1. The liquid outlet pipe 12 is a short pipe and needs to be close to the existing polishing liquid falling point to avoid the liquid outlet pipe 12 being too long, which causes the polishing liquid to be transported in the pipeline for too long and leads to the decrease of the catalytic activity of the polishing liquid; 2. A small photocatalyst is arranged in the mixed storage tank 1, which can effectively save power compared with directly illuminating and catalyzing the mixed storage tank 1, and because the internal space of the small photocatalyst is small, the ultraviolet light can uniformly irradiate the polishing liquid in each part of the internal space, which is beneficial to the activation of the titanium dioxide particles; 3. The ultraviolet light source 11 arranged on the polishing equipment cooperates with the catalytic auxiliary equipment, and after the photocatalyst is activated, if there is no continuous irradiation of the ultraviolet light source 11, the activation degree will decrease after a period of time. In order to ensure that the polishing liquid discharged remains at a high activation degree, a group of ultraviolet light sources 11 need to be arranged outside, which can restore the activation degree to a certain extent. The ultraviolet light can provide energy to make the photocatalyst regain activity, so as to continue to participate in the catalytic reaction and further improve the catalytic effect.

[0034] As a preferred embodiment in the embodiment, as shown in Figures 2-4 The liquid outlet end of the liquid suction pipe 4 is provided with a rotary joint 7, and a plurality of liquid discharge pipes 8 are arranged on the outer wall of the liquid outlet end of the rotary joint 7 in a circular table manner, and the liquid discharge ends of the plurality of liquid discharge pipes 8 are curved to the same side;

[0035] The shaft center of the light-transmitting inner container 6 and the light-transmitting partition plates 9 is fixedly provided with a cylinder 13. The adjacent two cylinders 13 are provided with a spacing, and the spacing is provided with a rotating ring 15 with a stirring rod 16 on the outer wall. Except for the lowermost rotating ring 15, the upper and lower ends of the rotating ring 15 are sealingly and rotatably connected to the upper and lower ends of the adjacent two cylinders 13 through sealing bearings. The inner cavity of the rotating ring 15 is provided with a driven gear ring. The upper end of the lowermost rotating ring 15 is sealingly and rotatably connected to the upper cylinder 13 and the mounting cylinder 23 fixed in the inner cavity of the light-tight shell 3 through sealing bearings. The inner ring wall of the rotating ring 15 is provided with a driven gear ring.

[0036] The rotating end of the rotary joint 7 is fixedly provided with a rotating shaft 14, and the lower end of the rotating shaft 14 penetrates through the plurality of cylinders 13 and is rotatably connected to the mounting cylinder 23. A plurality of driving gear rings 18 are mounted on the rotating shaft 14, and the plurality of driving gear rings 18 and the plurality of driven gear rings are one-to-one toothed.

[0037] When the high-pressure water is pumped into the rotary joint 7 through the pump body 5, the high-pressure water is discharged from the liquid discharge pipe 8, and the reaction force of the water makes the rotary joint 7 drive the rotating shaft 14 to rotate, and the rotating rotating shaft 14 drives the plurality of stirring rods 16 on the rotating ring 15 to rotate at the same time, so as to stir and mix the polishing liquid in each height layer, improve the uniformity of light, and prevent the titanium dioxide particles in the polishing liquid from forming a deposit to affect the concentration of titanium dioxide in the discharged polishing liquid.

[0038] It should be noted that the upper end of the rotating shaft 14 is sealingly and rotatably arranged with the cylinder 13, and the cooperation of the plurality of cylinders 13 and the mounting cylinder 23 and the rotating sealing arrangement of the rotating ring 15, the cylinder 13 and the mounting cylinder 23 make the rotating shaft 14 and the driven gear ring located in the sealed space, and the sealed space is composed of the plurality of cylinders 13 and the mounting cylinder 23, which can prevent the polishing liquid from entering the sealed space and can avoid reducing the rotating speed of the rotating shaft 14 (the reduction of the rotating speed will affect the mixing effect of the stirring rod 16 on the polishing liquid), and also avoid the accumulation of titanium dioxide solid particles in the sealed space, so as to avoid the movement of the rotating shaft 14 being stuck.

[0039] As a preferred embodiment in the present embodiment, a speed regulating unit is further included for adjusting the rotating speed of each rotating ring 15, so that the rotating speed of the rotating ring 15 from bottom to top decreases and then increases.

[0040] In actual use, the bottom of the light-transmitting inner container 6 is prone to titanium dioxide accumulation, so the bottom stirring rod 16 needs to be set to a large speed to effectively avoid titanium dioxide accumulation at the bottom. After the polishing liquid at the bottom is well mixed, the polishing liquid is less likely to produce titanium dioxide precipitation when it moves to the adjacent upper layer (i.e., the adjacent height layer). At this time, the speed of the stirring rod 16 in the height layer can be reduced. When the polishing liquid moves to a certain height layer, the possibility of titanium dioxide precipitation increases, so the speed needs to be increased to increase the mixing effect. Until the mixed liquid is discharged through the liquid outlet pipe 12, under the condition that the rotating force of the rotating shaft 14 is constant, the speed of the rotating ring 15 is designed to decrease from large to small and then increase from small to large. This design can well mix the polishing liquid in each height layer, so that the concentration of the polishing liquid in each height layer is consistent, which is beneficial to improve the processing effect of the polishing liquid on the silicon carbide wafer.

[0041] As a preferred embodiment in the present embodiment, as shown in Figures 4-7 The speed regulating unit includes four first transmission gears 19 of the same specification and small diameter, and two second transmission gears 20 of the same specification and large diameter. The diameter of the second transmission gear 20 is twice that of the first transmission gear 19.

[0042] The rotating ring 15 is provided in five groups. In addition to the middle group of rotating rings 15, the inner walls of the rotating rings 15 are provided with first driven gear rings 17 of the same specification. The inner cavity wall of the middle rotating ring 15 is fixed with a second driven gear ring 21 through a connecting rod.

[0043] From bottom to top, the inner cavities of the first group and the fifth group of rotating rings 15 are provided with two first transmission gears 19, which are arranged in a straight line and meshed and connected. The first driven gear ring 17 is meshed and connected with the driving gear ring 18 through the two first transmission gears 19. The inner cavities of the second group and the fourth group of rotating rings 15 are provided with one second transmission gear 20. The first driven gear ring 17 is meshed and connected with the driving gear ring 18 through the second transmission gear 20. The third group of second driven gear rings 21 is directly meshed and connected with the driving gear ring 18.

[0044] When the large gear drives the small gear to rotate, the speed of the small gear (and the smaller the small gear, the faster the speed) can be increased. The rotating speed of the rotating rings 15 at the bottom and the top is the largest, the rotating speed of the rotating rings 15 of the second group and the fourth group is the second, and the rotating speed of the rotating rings 15 of the third group is the smallest. One rotating shaft 14 can drive multiple rotating rings 15 to stir at different speeds.

[0045] It should be noted that the diameter of the second transmission gear 20 is smaller than the diameter of the driving gear ring 18.

[0046] As a preferred embodiment in the present embodiment, as shown in Figure 3As shown, the rotary joints 7 are all arranged to bend to the left side, that is, when the high-speed fluid is introduced into the light-tight shell 3 through the pump body 5 through the liquid suction pipe 4, the rotary joints 7 rotate counterclockwise.

[0047] As shown that the rotary joints 7 are all arranged to bend to the left side, the rotary joints rotate counterclockwise when working, and then the rotating shaft 14 rotates counterclockwise, and at this time, from bottom to top, the first to fifth groups of rotating rings 15 rotate counterclockwise, clockwise, counterclockwise, clockwise, and counterclockwise, respectively, and cooperate with the overflow movement path of the polishing liquid in the light-tight inner container 6 (from left to right to left to right movement path), so that the stirring rods 16 (except the lowermost stirring rod 16) can collide with the flowing polishing liquid when rotating, and then the polishing liquid is mixed more uniformly.

[0048] As a preferred embodiment in this embodiment, the light intensity of the ultraviolet light source 11 is 540 lux to 680 lux, and the lower the light intensity, the less light energy the photocatalyst absorbs, and the fewer active electrons and holes are generated, which is not conducive to accelerating the polishing reaction, and too high light intensity may require a higher power light source, increasing energy consumption and equipment cost; the mass of titanium dioxide in the polishing liquid accounts for 1.3% to 2.4% of the mass of the entire polishing liquid, and within this concentration range, titanium dioxide particles can be fully dispersed in the polishing liquid to provide enough photocatalytic active sites, while helping to maintain the stability of the polishing liquid, avoiding particle aggregation or separation, thereby maintaining the continuity and stability of the polishing process, and too high concentration may cause the polishing liquid to become too viscous, affecting the polishing effect; and too low concentration may result in insufficient photocatalytic activity and reduced polishing effect.

[0049] As a preferred embodiment in this embodiment, as shown in Figure 1 As shown, the stirring system 2 includes a motor and a plurality of stirring pieces with spiral stirring blades, and the plurality of stirring pieces are all connected with the large gear installed on the output end of the motor through the small gears arranged on the upper ends of the stirring pieces.

[0050] Since the polishing liquid mixed with titanium dioxide particles is prone to form titanium dioxide particle precipitates, the stirring system 2 is arranged to continuously stir and mix the polishing liquid, and the spiral stirring blades have the function of pumping, which can transport the bottom polishing liquid to the upper layer, thereby achieving better stirring effect.

[0051] Finally, it should be noted that the above only describes the preferred embodiments of the present application and is not intended to limit the present application. Although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art will appreciate that the technical solutions described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalent features, and any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A photocatalytic auxiliary device for polishing silicon carbide wafers, comprising a mixing reservoir (1) with a stirring system (2) for configuring and storing the polishing liquid, characterized in that: The inner cavity of the mixed liquid storage tank (1) is provided with a small photocatalyst, which comprises a light-tight shell (3) with a gas outlet pipe (22) at the upper end, a liquid suction pipe (4) with a pump body (5) is arranged at the upper end of the light-tight shell (3), the liquid outlet end of the liquid suction pipe (4) is located in the inner cavity of the light-tight shell (3), the lower end of the liquid suction pipe (4) is arranged close to the bottom of the mixed liquid storage tank (1), the inner cavity of the light-tight shell (3) is coaxially provided with a light-transmitting inner container (6), and the bottom of the light-transmitting inner container (6) is provided with an opening, a gap is arranged between the lower end of the light-transmitting inner container (6) and the inner cavity bottom of the light-tight shell (3), a plurality of light-transmitting partitions (9) are arranged on the inner cavity wall of the light-transmitting inner container (6) at equal intervals from bottom to top, and a plurality of ultraviolet light sources (11) are arranged on the upper and lower ends of each light-transmitting partition (9) and the inner cavity wall of the light-tight shell (3), a notch (10) is arranged on each light-transmitting partition (9), and the notch (10) and the inner wall of the light-tight inner container (6) form an overflow gap, from bottom to top, a plurality of notches (10) are arranged at intervals of one left and one right, and a liquid outlet pipe (12) penetrating through the light-tight shell (3) is arranged on the light-transmitting inner container (6), and the liquid inlet end of the liquid outlet pipe (12) is located above the uppermost light-transmitting partition (9); A rotating joint (7) is mounted on the liquid outlet end of the liquid suction pipe (4), a plurality of liquid discharge pipes (8) are arranged in a circular table on the outer wall of the liquid outlet end of the rotating joint (7), and the liquid outlet ends of the plurality of liquid discharge pipes (8) are curved to the same side; A cylinder (13) is fixedly arranged at the axis of the light-transmitting inner container (6) and the plurality of light-transmitting partitions (9), a gap is arranged between the adjacent two cylinders (13), and a rotating ring (15) with a stirring rod (16) on the outer wall is arranged at the gap, and except for the lowermost rotating ring (15), the upper and lower ends of the rotating ring (15) are sealingly and rotatably connected to the upper and lower ends of the adjacent two cylinders (13) through sealing bearings, a driven gear ring is arranged in the inner cavity of the rotating ring (15), the upper end of the lowermost rotating ring (15) is sealingly and rotatably connected to the upper cylinder (13) and the mounting cylinder (23) fixed in the inner cavity of the light-tight shell (3) through sealing bearings, and a driven gear ring is arranged on the inner ring wall of the plurality of rotating rings (15); A rotating shaft (14) is fixedly arranged at the bottom of the rotating end of the rotating joint (7), the lower end of the rotating shaft (14) penetrates through the plurality of cylinders (13) and is rotatably connected to the mounting cylinder (23), a plurality of driving gear rings (18) are mounted on the rotating shaft (14), and the plurality of driving gear rings (18) correspond to the plurality of driven gear rings one by one; It also includes a speed regulation unit for adjusting the speed of each rotating ring (15), so that the speed of the rotating ring (15) from bottom to top decreases first and then increases; The speed regulating unit comprises four first transmission gears (19) of the same specification and small diameter, and two second transmission gears (20) of the same specification and large diameter, the diameter of the second transmission gears (20) being twice that of the first transmission gears (19); The rotating rings (15) are arranged in five groups, and the inner walls of the rotating rings (15) of all the groups except the middle group are provided with first driven tooth rings (17) of the same specification, and the inner cavity walls of the rotating rings (15) of the middle group are fixed with second driven tooth rings (21) through connecting rods; From bottom to top, the inner cavities of the rotating rings (15) of the first group and the fifth group are provided with two first transmission gears (19), the two first transmission gears (19) are arranged in line and meshed and connected, the first driven tooth ring (17) is meshed and connected with the driving tooth ring (18) through the two first transmission gears (19), the inner cavities of the rotating rings (15) of the second group and the fourth group are provided with one second transmission gear (20), the first driven tooth ring (17) is meshed and connected with the driving tooth ring (18) through the second transmission gear (20), and the second driven tooth ring (21) of the third group is directly meshed and connected with the driving tooth ring (18).

2. The photocatalyst auxiliary device for polishing a silicon carbide wafer according to claim 1, characterized by: The rotary joints (7) are all arranged to be curved to the left, that is, when the pump body (5) passes high-speed fluid into the light-tight shell (3) through the liquid suction pipe (4), the rotary joints (7) rotate counterclockwise.

3. The light catalytic auxiliary device for polishing silicon carbide wafer according to claim 1, characterized in that: The light intensity of the ultraviolet light source (11) is 540 lux to 680 lux, and the mass of titanium dioxide in the polishing liquid accounts for 1.3% to 2.4% of the mass of the entire polishing liquid.

4. The light catalytic auxiliary device for polishing silicon carbide wafer according to claim 1, characterized in that: The stirring system (2) comprises a motor and a plurality of stirring pieces with spiral stirring blades, and the plurality of stirring pieces are all meshed and connected with a large gear installed at the output end of the motor through small gears arranged at the upper ends of the stirring pieces.

Citation Information

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